CN116656155A - Solar cell surface moon dust protective coating, preparation method thereof and dust prevention efficiency evaluation method - Google Patents
Solar cell surface moon dust protective coating, preparation method thereof and dust prevention efficiency evaluation method Download PDFInfo
- Publication number
- CN116656155A CN116656155A CN202310579295.1A CN202310579295A CN116656155A CN 116656155 A CN116656155 A CN 116656155A CN 202310579295 A CN202310579295 A CN 202310579295A CN 116656155 A CN116656155 A CN 116656155A
- Authority
- CN
- China
- Prior art keywords
- moon
- dust
- solar cell
- protective coating
- moon dust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000428 dust Substances 0.000 title claims abstract description 192
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 title claims abstract description 165
- 210000004027 cell Anatomy 0.000 title claims abstract description 103
- 239000011253 protective coating Substances 0.000 title claims abstract description 78
- 238000002360 preparation method Methods 0.000 title abstract description 11
- 238000011156 evaluation Methods 0.000 title abstract description 6
- 230000002265 prevention Effects 0.000 title description 2
- 239000012790 adhesive layer Substances 0.000 claims abstract description 28
- 239000002994 raw material Substances 0.000 claims abstract description 24
- 239000011241 protective layer Substances 0.000 claims abstract description 22
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 14
- 239000011737 fluorine Substances 0.000 claims abstract description 14
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000002904 solvent Substances 0.000 claims abstract description 14
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 12
- 239000004205 dimethyl polysiloxane Substances 0.000 claims abstract description 12
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims abstract description 12
- -1 polydimethylsiloxane Polymers 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 34
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 15
- 238000002474 experimental method Methods 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 239000008367 deionised water Substances 0.000 claims description 11
- 229910021641 deionized water Inorganic materials 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 238000009832 plasma treatment Methods 0.000 claims description 5
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical group CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 4
- 238000007598 dipping method Methods 0.000 claims description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 238000006068 polycondensation reaction Methods 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 3
- 238000012216 screening Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims description 2
- 238000003892 spreading Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 7
- 238000010248 power generation Methods 0.000 abstract description 3
- 238000012360 testing method Methods 0.000 description 33
- 238000005470 impregnation Methods 0.000 description 11
- 230000001681 protective effect Effects 0.000 description 11
- 238000002834 transmittance Methods 0.000 description 7
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 241001061257 Emmelichthyidae Species 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/002—Pretreatement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/142—Pretreatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/54—No clear coat specified
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
- G01N2021/945—Liquid or solid deposits of macroscopic size on surfaces, e.g. drops, films, or clustered contaminants
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- General Health & Medical Sciences (AREA)
- Pathology (AREA)
- Plasma & Fusion (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
The application provides a solar cell surface moon dust protective coating, a preparation method thereof and a dustproof efficiency evaluation method, and relates to the field of aerospace. The moon dust protective coating comprises a moon dust protective layer and an adhesive layer which are arranged in a laminated mode, wherein: the raw materials of the moon dust protective layer comprise fluorine-containing silica sol and solvent; the raw materials of the adhesive layer comprise polydimethylsiloxane, a curing agent and a solvent. The moon dust protection coating can realize moon dust protection of the solar cell in a moon surface environment, so that moon dust cannot be deposited on the surface of the solar cell for a long time to cause overheat of the solar cell, shield light absorptivity of the solar cell and reduce power generation efficiency. The moon dust protective coating has strong binding force with the solar cell substrate, has good moon surface environment adaptability, can be used on the track for a long time, has longer service life, and greatly saves cost.
Description
Technical Field
The application relates to the technical field of aerospace, in particular to a solar cell surface moon dust protective coating, a preparation method thereof and a dustproof efficiency evaluation method.
Background
In lunar exploration tasks, solar cell arrays are used for generating electricity as a main power source in orbit. In the lunar actual detection task, the lunar dust splashed by engine plumes is the largest pollution source on the surface of the solar cell array. After the moon dust is deposited on the surface of the solar cell, sunlight can be prevented from entering the solar cell, and overheat of the solar cell array can be caused, so that the power generation efficiency is seriously reduced. Solar cells on lunar rovers and on spacecraft of the Apollo mission, after deposition of the lunar dust, cause the surface temperature to rise to 82 ℃, far exceeding its safe operating temperature range.
For the lunar dust protection of the surface of the solar cell, CN 111471995A realizes a lunar dust protection coating of the surface of the aluminum substrate by a chemical etching method, but the coating is not transparent, and the lunar dust protection of the metal substrate and the solar cell surface substrate has great difference, and besides, the chemical etching method cannot be applied to a large-area solar cell substrate; CN 113731772A adopts a sol-gel method to prepare a self-cleaning anti-reflection film for protecting moon dust, a solution is prepared by mixing silica sol and silica dispersion liquid, and the solution is spin-coated on the surface of a solar cell, but the dust-proof efficiency test is not carried out, the particle size of moon dust particles is far smaller than the diameter of water drops, the single contact angle cannot reflect the dust-proof performance, and the space environmental adaptability is not illustrated; CN 203300671U discloses a solar cell moon dust protection device, but the device needs on-orbit energy supply to realize moon dust protection, and does not belong to passive protection technology; CN 112885504A discloses a moon dust protective film with a regular inverted pyramid structure, wherein the substrate of the moon dust protective film is aluminum metal, and the protective film has a conductive opaque property and cannot be applied to solar cells.
Therefore, a moon dust protective coating is required to be designed for the surface of the solar cell, the solar cell is prevented from being influenced by moon dust deposition under the condition that energy is not consumed on the surface of the moon, and the normal supply of the moon surface active energy is ensured.
In addition, in the previous research, the deposition rate and deposition quality of the moon dust splashed by the plume during the soft landing process cannot be quantitatively calculated, so that the moon dust protection efficiency experiment cannot be tested according to actual on-orbit data. Therefore, a new method for evaluating the dust-proof efficiency of the solar cell surface moon dust protective coating is also provided, which is a technical problem to be solved in the field.
Disclosure of Invention
Therefore, the application mainly aims to provide the solar cell surface moon dust protective coating, the preparation method and the dustproof efficiency evaluation method thereof, which can realize the protection of moon dust under the condition of no external energy supply in a moon surface environment, so that the solar cell can work normally on track, and the energy supply in the long-term moon surface activity process in the subsequent manned moon detection and moon surface long-term resident tasks is ensured.
In order to achieve the above purpose, the present application provides the following technical solutions:
in a first aspect, the application provides a solar cell surface moon dust protective coating comprising a moon dust protective layer and an adhesive layer which are stacked, wherein:
the raw materials of the moon dust protective layer comprise fluorine-containing silica sol and a solvent;
the raw materials of the adhesive layer comprise polydimethylsiloxane, a curing agent and a solvent.
Further, in the raw materials of the adhesive layer, the mass ratio of the polydimethylsiloxane to the curing agent is 1: 10-12, wherein the sum of the mass of the polydimethylsiloxane and the mass of the curing agent accounts for 4-6% of the total mass of the raw materials of the adhesive layer, and the solvent is ethane.
Preferably, in the raw materials of the adhesive layer, the mass ratio of the polydimethylsiloxane to the curing agent is 1:12, the sum of the mass of the polydimethylsiloxane and the mass of the curing agent accounts for 5% of the total mass of the raw materials of the adhesive layer, and the solvent is ethane.
Further, in the raw materials of the moon dust protective layer, the mass percentage of the fluorine-containing silica sol is 0.4-0.6%, the solvent is a mixture of ethanol, ethyl acetate and deionized water, and the mass ratio is 96-98: 0.1 to 0.5:2.0 to 3.0.
Preferably, in the raw material of the lunar dust protective layer, the mass percentage of the fluorine-containing silica sol is 0.4%, the solvent is a mixture of ethanol, ethyl acetate and deionized water, and the mass ratio is 97.5:0.1:2.0.
further, the fluorine-containing silica sol is obtained by hydrolytic polycondensation of methyltrimethoxysilane and tridecafluorooctyltrimethoxysilane.
Further, the thickness of the moon dust protective coating is 250-350 nm, and the roughness is 30-60 nm.
Preferably, the thickness of the moon dust protective coating is 300nm, and the roughness is 30nm.
In a second aspect, the application provides a preparation method of the solar cell surface moon dust protective coating, which comprises the following steps:
(1) Pretreatment of the surface of a solar cell: sequentially performing alcohol wiping, deionized water cleaning and oxygen plasma treatment on the surface of the solar cell, and then placing the solar cell into a vacuum system for standing;
(2) Preparing an adhesive layer by a dip-and-pull method: immersing the solar cell processed in the step (1) in the prepared adhesive layer raw material solution, lifting upwards, forming an adhesive layer on the surface of the solar cell, and then placing the solar cell in a vacuum system for standing;
(3) Preparing a moon dust protective layer by a dipping and pulling method: immersing the solar cell piece treated in the step (2) in the prepared moon-dust protective layer raw material solution, lifting upwards, forming a moon-dust protective layer on the surface of the adhesion layer, and then placing the solar cell piece in a vacuum system for drying.
Further, in the step (1), the number of times of alcohol wiping is 3-6, the number of times of deionized water cleaning is 3-6, the time of oxygen plasma treatment is 2-3 min, and the pressure of a vacuum system is 10 -4 Pa, standing for 1-2 h;
preferably, in the step (1), the number of times of alcohol wiping is 4, the number of times of deionized water cleaning is 4, the time of oxygen plasma treatment is 2min, and the pressure of a vacuum system is 10 -4 Pa, standing time is 2h.
Further, in the step (2), the pulling speed is 10-15 mm/min, and the pulling times are 2-3 times; the temperature of the vacuum system is 50-70 ℃ and the pressure is 10 -4 Pa, standing for 40-60 min;
preferably, in the step (2), the pulling speed is 10mm/min, and the pulling times are 2 times; the temperature of the vacuum system is 70 ℃ and the pressure is 10% -4 Pa, standing time is 40min.
Further, in the step (3), the pulling speed is 10-15 mm/min, and the pulling times are 2-5 times; the temperature of the vacuum system is 30-50 ℃ and the pressure is 10 -4 Pa, and drying time is 10-15 h.
Preferably, in the step (3), the pulling speed is 10mm/min, and the pulling times are 2 times; the temperature of the vacuum system is 30 ℃ and the pressure is 10% -4 Pa, drying time was 10h.
In a third aspect, the application provides a method for evaluating dust-proof efficiency of a solar cell surface moon dust protective coating, wherein an experiment is performed in a vacuum system provided with a moon dust uniform dust-spraying device, the temperature of the vacuum system is kept at 30-35 ℃ during the experiment, and the method for evaluating dust-proof efficiency comprises the following steps:
1) Putting moon dust with certain mass into a moon dust bearing disc of a uniform dust sprinkling device;
2) Putting the sample coated with the moon dust protective coating under a moon dust bearing plate, and pumping the system to 10 -4 Pa vacuum;
3) Opening a dust sprinkling device to uniformly sprinkle moon dust on the surface of the sample;
4) Dividing the surface of the sample into 13 subregions with the number of 1-13;
5) Shooting the surface of the protective coating sprayed with the moon dust in the vacuum system by a camera, judging that the moon dust is uniformly deposited and paved on the surface of the sample, continuing the experiment, and repeating the steps 1) to 3) after replacing the sample if the moon dust is judged to be unevenly deposited or not paved on the surface of the sample until the moon dust is uniformly deposited;
6) Carrying out centrifugal rotation on the sample;
7) After centrifugal rotation, turning over the sample, keeping the sample after turning over, and then shooting a moon dust residual picture on the surface of the sample;
8) Judging that the moon dust residue on the surface of the sample after photographing and overturning is not changed any more, and the number of the moon dust residues before and after the single subarea is not changed along with overturning, and analyzing the dust-proof efficiency of the picture of the moon dust residue;
9) Threshold judgment screening is carried out on areas which are not covered by different subareas and covered by the moon dust, so as to determine the moon dust covered areas in the different subareas;
10 According to the followingCalculating the lunar dust protection efficiency eta of the sample surface, whereinRepresenting the region between 1 and 13 after the experimentNumber of pixels occupied by moon dust, N 1 ~N 13 Representing the total number of pixels of 1 to 13 sub-regions.
Further, in the step 6), the rotation speed of centrifugal rotation is 1300-1500 r/min, the duration of single rotation is 10-20 s, and the rotation times are 2-4 times; in the step 7), the overturning angle is 45-60 degrees, and the overturning angle is kept for 1-3 min after overturning.
Preferably, in the step 6), the rotation speed of centrifugal rotation is 1300-1500 r/min, the duration of single rotation is 10s, and the rotation times are 3 times; in the step 7), the overturning angle is 45 degrees, and the overturning angle is kept for 1min after overturning.
Further, in the step 5), the judgment basis of uniform deposition of the moon dust is as follows: the number of the moon dust particles on 13 sub-areas of the surface of the sample is within 1% of each other; the judgment basis of the moon dust spreading on the surface of the sample is as follows: the area of the moon dust particles on the single subarea is 100 percent.
The technical scheme of the application has the following advantages:
1. the solar cell surface moon dust protective coating provided by the application can realize moon dust protection of the solar cell in a moon surface environment, and the moon dust protective efficiency is improved by 66.3% compared with that of a solar cell sheet without the moon dust protective coating, so that moon dust cannot be deposited on the solar cell surface for a long time to cause overheat of the solar cell, shield the light absorption rate of the solar cell and reduce the power generation efficiency. The moon dust protective coating has strong binding force with the solar cell substrate, has good moon surface environment adaptability, can be used on the track for a long time, has longer service life, and greatly saves cost.
2. The solar cell surface moon dust protective coating provided by the application has high light transmittance, and the light receiving efficiency of the solar cell is not affected, namely, the moon dust protective effect is achieved while the light absorbance of the solar cell is not affected. The transmittance for visible light, ultraviolet light and infrared light is respectively improved by 2.28 percent, 0.64 percent and 3.14 percent compared with that of the protective coating without moon dust.
3. The solar cell surface moon dust protective coating provided by the application has the thickness of about 300nm and has the advantage of light weight; the fluorine-containing silica sol forms 5-10 nm fluorine-containing silica particle aggregate, is used for constructing a micro-nano structure of the moon dust protective coating, has roughness of about 30nm and is far smaller than the average particle size of moon dust particles, and the protection of the moon dust particles with extremely small particle size can be realized.
4. The solar cell surface moon dust protective coating provided by the application has good high temperature resistance, and the performance is unchanged within 300 ℃; has good electron resistance (30 h at 30 KeV) and ultraviolet radiation resistance (32 h at 395nm wavelength); and has good wear resistance.
5. The solar cell surface moon dust protective coating provided by the application belongs to a passive protective coating, does not need to supply energy on the track, and is an energy-saving protective method.
6. The solar cell surface moon dust protective coating provided by the application is prepared by adopting a dipping and pulling method, can be used for a large-area irregular protective surface, and has a great supporting effect on subsequent engineering application.
7. The method for evaluating the dustproof efficiency of the solar cell surface moon dust protective coating provided by the application can realize the efficiency evaluation of moon dust particles with the accuracy of up to 1 mu m, and fine particles adhered to the surface are not considered in the dustproof efficiency obtained by a weighing method, so that the novel method provided by the application greatly improves the dustproof efficiency accuracy.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present application, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a graph of a comparison of surfaces coated with a month dust protective coating and an uncoated month dust protective coating;
fig. 2 is a contact angle test result before and after surface treatment, wherein: (a) Before the surface treatment, the contact angle was 23.2 °, (b) after the surface treatment, the contact angle was 0 °;
fig. 3 is a graph of contact angle test results for month dust protective coatings prepared with different impregnation times, wherein: (a) is example 1, (b) example 2, (c) example 3, (d) example 4;
fig. 4 is a schematic diagram of a surface roughness test of a month dust protective coating prepared with different impregnation times, wherein: (a) is example 1, (b) example 2, (c) example 3;
FIG. 5 is a schematic illustration of coating thickness test of month dust protective coatings prepared with different impregnation times;
FIG. 6 is a schematic view of the numbering of the subregions of a dust efficiency test sample;
fig. 7 is a graph of a surface dust efficiency test coated with a month dust protective coating and an uncoated month dust protective coating, wherein: (a) Is an uncoated surface, (b) is a coated surface of example 2, 1, 3, 7 and 11 represent the corresponding sub-areas in fig. 5.
Detailed Description
The following examples are provided for a better understanding of the present application and are not limited to the preferred embodiments described herein, but are not intended to limit the scope of the application, any product which is the same or similar to the present application, whether in light of the present teachings or in combination with other prior art features, falls within the scope of the present application.
The solar cell used in the embodiment is a three-junction gallium arsenide cell, and the solar cells purchased in Tianjin, ten and eight places are all in the same batch.
The specific experimental procedures or conditions are not noted in the examples and may be followed by the operations or conditions of conventional experimental procedures described in the literature in this field. The materials or instruments used are all conventional products commercially available, including but not limited to those used in the examples of the present application.
Example 1
The embodiment provides a preparation method of a solar cell surface moon dust protective coating, which comprises the following specific steps:
(1) Pretreatment of the surface of a solar cell: solar energy electricityThe surface of the cell is firstly wiped with alcohol for 4 times, then washed with deionized water for 4 times, then treated with oxygen plasma for 2min, and then placed in a vacuum system (10) -4 Standing for 2h in Pa);
(2) Preparing an adhesive layer by a dip-and-pull method: immersing the solar cell processed in the step (1) in the prepared raw material solution of the adhesive layer, lifting up at a speed of 10mm/min for 2 times to form the adhesive layer on the surface of the solar cell, and then placing the solar cell in a vacuum system (10) -4 Standing for 40min in Pa);
(3) Preparing a moon dust protective layer by a dipping and pulling method: immersing the solar cell piece treated in the step (2) in the prepared moon-dust protective layer raw material solution, lifting up at a speed of 10mm/min for 1 time to form a moon-dust protective layer on the surface of the adhesive layer, and then placing the solar cell piece in a vacuum system (10) -4 Pa) is dried for 10h.
The adhesive layer raw material solution in the step (2) is prepared from polydimethylsiloxane, a curing agent and ethane, wherein the mass ratio of the polydimethylsiloxane to the curing agent is 1: the sum of the mass of the polydimethylsiloxane and the curing agent accounts for 5% of the total mass of the raw materials of the adhesive layer.
The moon dust protective layer raw material solution in the step (3) is prepared from fluorine-containing silica sol and solvent, wherein the fluorine-containing silica sol is 0.4 mass percent, the solvent is a mixture of ethanol, ethyl acetate and deionized water, and the mass ratio is 97.5:0.1:2.0. wherein the fluorine-containing silica sol is obtained by hydrolytic polycondensation of methyltrimethoxysilane and tridecafluorooctyltrimethoxysilane, and the specific preparation method comprises the following steps: 1mL of methyltrimethoxysilane and 1mL of tridecafluorooctyltrimethoxysilane are added into a container, stirred at normal temperature for 30 minutes, then 0.2mL of oxalic acid solution is added, stirring is continued for 30 minutes, the container is left for 20 hours, then 7.5mL of ammonia water is added dropwise, and self-polycondensation occurs after aging at normal temperature, so as to obtain the fluorine-containing silica sol.
Example 2
The specific steps of the preparation method for the solar cell surface moon dust protective coating refer to the embodiment 1, and the difference is that the number of times of pulling in the step (3) is 2, the prepared protective surface is shown in fig. 1, the uncoated surface is that any protective coating is not coated on a solar cell glass sheet, and only the solar cell glass sheet is subjected to plasma surface treatment. By comparing the coated and uncoated surfaces, it was found that the surface coated with the protective coating was reflective under light and that the coating did not affect the transparency of the glass before and after coating and no significant blurring effect was found.
Example 3
The specific steps of the preparation method of the solar cell surface moon dust protective coating refer to the embodiment 1, and the difference is that the number of times of lifting in the step (3) is 3.
Example 4
The specific steps of the preparation method of the solar cell surface moon dust protective coating refer to the embodiment 1, and the difference is that the number of times of lifting in the step (3) is 4.
Comparative example the surface of the solar cell was wiped with alcohol for 4 times, then rinsed with deionized water for 4 times, then oxygen plasma treated for 2min, and then placed in a vacuum system (10 -4 Pa) for 2h.
As shown in fig. 2, the contact angles of the sample surfaces before and after the treatment were measured, respectively, and it was found that the contact angle of the sample surfaces after the treatment was almost 0 °.
Experimental example 1 contact Angle test
The solar cell surface moon dust protective coatings prepared in examples 1 to 4 were subjected to contact angle test, and the results are shown in table 1 and fig. 3.
Table 1 results of contact angle measurements for examples 1-4
Experimental example 2 roughness test
Taking the solar cell surface moon dust protective coating prepared in the examples 1-3, and carrying out roughness test on the surface of the solar cell surface moon dust protective coating, wherein the experimental process is as follows: the roughness of the prepared protective coating was measured, and the roughness value was obtained by averaging the results of 5 times, and the results are shown in table 2 and fig. 4.
Table 2 results of roughness test for examples 1 to 3
As shown in fig. 4, as the number of lift-off coating increases, the roughness gradually decreases and the surface micro/nano-scale structure gradually disappears.
Experimental example 3 thickness test
Taking the solar cell surface moon dust protective coating prepared in the examples 1-3, and carrying out thickness test on the surface of the solar cell surface moon dust protective coating, wherein the experimental process is as follows: the film thickness was measured by a film thickness tester, 5 points were selected on the surface, and the measured film thickness results were averaged to obtain the results shown in table 3 and fig. 5.
Table 3 results of thickness testing for examples 1-3
Experimental example 4 light transmittance test
Taking the solar cell surface moon dust protective coating prepared in the examples 1-3, carrying out light transmittance test on the surface of the solar cell surface moon dust protective coating, and taking the surface treated in the comparative example as a reference, wherein the experimental process is as follows: the protective film is tested by a light transmittance tester, and 5 points are selected from a single protective surface, and an average value is obtained. The results are shown in Table 4.
Table 4 results of light transmittance tests of examples 1 to 3
As shown in table 4, the light transmission effect of example 2 was best, and the transmittance was improved by 2.28% (uv light), 0.64% (visible light), and 3.14% (ir light) compared to the uncoated surface (comparative example), respectively.
Experimental example 5 temperature resistance test
Taking the solar cell surface moon dust protective coating prepared in the embodiment 2, and carrying out a temperature resistance test on the solar cell surface moon dust protective coating, wherein the experimental process is as follows: the moon dust protective coating sample is placed in a vacuum system, the temperature is respectively set to be 50 ℃, 100 ℃, 150 ℃, 200 ℃, 250 ℃ and 300 ℃ after the system is vacuumized, the holding time is 30 hours at the target temperature, and the contact angle of the sample surface is measured immediately after the sample is taken out. The results are shown in Table 5.
TABLE 5 example 2 results of temperature resistance test
Experimental example 6 ultraviolet irradiation resistance test
Taking the solar cell surface moon dust protective coating prepared in the embodiment 2, and carrying out ultraviolet irradiation resistance test on the solar cell surface moon dust protective coating, wherein the experimental process is as follows: and (3) placing the moon dust protective coating sample in a vacuum system, placing the sample at a position of 10cm below a vacuum ultraviolet lamp, vacuumizing the system, turning on the vacuum ultraviolet lamp, wherein the wavelength of the vacuum ultraviolet lamp is 395nm, the irradiation time of the ultraviolet lamp is 32h, and taking out the sample after the irradiation is finished to immediately measure the contact angle. The results are shown in Table 6.
TABLE 6 test results of ultraviolet irradiation resistance of example 2
Group of | Number of times of impregnation of the adhesive layer | Number of times of impregnation of protective layer | Duration of ultraviolet light | Contact angle |
Example 2 | 2 | 2 | 32h | 147.25° |
Experimental example 7 Electron radiation resistance test
Taking the solar cell surface moon dust protective coating prepared in the embodiment 2, and carrying out electron radiation resistance test on the solar cell surface moon dust protective coating, wherein the experimental process is as follows: and placing the moon dust protective coating sample in a vacuum system, placing the sample at a position of 15cm below an electron gun, setting the energy of the electron gun to be 30KeV after vacuumizing the system, opening the electron gun to irradiate for 30h, and taking out the sample after the electron irradiation is finished to immediately measure the contact angle. The results are shown in Table 7.
TABLE 7 example 2 Electron radiation resistance test results
Group of | Number of times of impregnation of the adhesive layer | Number of times of impregnation of protective layer | Duration of irradiation | Contact angle |
Example 2 | 2 | 2 | 30h | 145.14° |
Experimental example 8 abrasion resistance test
The solar cell surface moon dust protective coating prepared in the example 2 is taken and subjected to wear resistance test, and the experimental process is as follows: the protective coating was peeled off with an adhesive tape, and the contact angle of the protective coating was measured 20 times after peeling off. The results are shown in Table 8.
Table 8 example 2 abrasion resistance test results
Group of | Number of times of impregnation of the adhesive layer | Number of times of impregnation of protective layer | Contact angle |
Example 2 | 2 | 2 | 150.40° |
Experimental example 9 month dust protection efficiency test
Taking the solar cell surface moon dust protective coating prepared in the embodiment 2, testing the protective efficiency of the solar cell surface moon dust protective coating, and performing an experiment in a vacuum system provided with a moon dust uniform dust spraying device, wherein the temperature of the vacuum system is kept at 30 ℃ in the experiment process, and the experiment process is as follows:
1) Weighing 10g of moon dust, and putting the moon dust into a moon dust bearing disc of a uniform dust sprinkling device;
2) The sample prepared in example 2 was placed 5cm below the moon dust carrying tray and the system was pumped to 10 -4 PaVacuum;
3) Opening a dust sprinkling device to uniformly sprinkle moon dust on the surface of the sample;
4) As shown in fig. 6, the sample surface is divided into 13 sub-areas, numbered 1 to 13 on average;
5) Shooting the surface of the protective coating sprayed with the moon dust in the vacuum system by a camera, judging that the moon dust is uniformly deposited and is paved on the surface of the sample, and continuing the experiment, if the moon dust is judged to be unevenly deposited or is not paved on the surface of the sample, repeating the steps 1) to 3) after the sample is replaced until the moon dust is uniformly deposited, wherein the judgment basis of the moon dust uniform deposition is as follows: the number of the moon dust particles on 13 sub-areas of the sample surface is within 1% of each other, and the judgment basis for the moon dust to be paved on the sample surface is as follows: the area of the moon dust particles on the single subarea is 100%;
6) Carrying out centrifugal rotation on the sample at a rotating speed of 1300-1500 r/min, wherein the single rotation time is 10s, and the rotation times are 3 times;
7) After centrifugal rotation, turning the sample for 45 degrees, keeping for 1min after turning, and then shooting a moon dust residual picture on the surface of the sample;
8) Judging that the moon dust residue on the surface of the sample after photographing and overturning is not changed any more, and the number of the moon dust residues before and after the single subarea is not changed along with overturning, and analyzing the dust-proof efficiency of the picture of the moon dust residue;
9) Threshold judgment screening is carried out on areas which are not covered by different subareas and covered by the moon dust, so as to determine the moon dust covered areas in the different subareas;
10 According to the followingCalculating the lunar dust protection efficiency eta of the sample surface, whereinN represents the number of pixels occupied by the moon dust in the 1-13 subarea after the experiment 1 ~N 13 Representing the total number of pixels of 1 to 13 sub-regions.
The results are shown in Table 9 and FIG. 7.
Table 9 test results of example 2 month dust protection efficiency
Group of | Number of times of impregnation of the adhesive layer | Number of times of impregnation of protective layer | Moon dust protection efficiency |
Example 2 | 2 | 2 | 66.3% |
It is apparent that the above examples are given by way of illustration only and are not limiting of the embodiments. Other variations or modifications of the above teachings will be apparent to those of ordinary skill in the art. It is not necessary here nor is it exhaustive of all embodiments. While still being apparent from variations or modifications that may be made by those skilled in the art are within the scope of the application.
Claims (10)
1. The solar cell surface moon dust protective coating is characterized by comprising a moon dust protective layer and an adhesive layer which are arranged in a laminated mode, wherein:
the raw materials of the moon dust protective layer comprise fluorine-containing silica sol and a solvent;
the raw materials of the adhesive layer comprise polydimethylsiloxane, a curing agent and a solvent.
2. The solar cell surface moon dust protective coating according to claim 1, wherein the mass ratio of the polydimethylsiloxane to the curing agent in the raw materials of the adhesive layer is 1: 10-12, wherein the sum of the mass of the polydimethylsiloxane and the mass of the curing agent accounts for 4-6% of the total mass of the raw materials of the adhesive layer, and the solvent is ethane.
3. The solar cell surface moon-dust protective coating according to claim 1, wherein in the raw material of the moon-dust protective coating, the mass percentage of the fluorine-containing silica sol is 0.4-0.6%, and the solvent is a mixture of ethanol, ethyl acetate and deionized water, and the mass ratio is 96-98: 0.1 to 0.5:2.0 to 3.0.
4. The solar cell surface moon dust protective coating according to claim 1, wherein the fluorine-containing silica sol is obtained by hydrolytic polycondensation of methyltrimethoxysilane and tridecafluorooctyltrimethoxysilane.
5. The solar cell surface moon dust protective coating according to claim 1, wherein the moon dust protective coating has a thickness of 250-350 nm and a roughness of 30-60 nm.
6. The method for preparing the solar cell surface moon dust protective coating according to any one of claims 1 to 5, which is characterized by comprising the following steps:
(1) Pretreatment of the surface of a solar cell: sequentially performing alcohol wiping, deionized water cleaning and oxygen plasma treatment on the surface of the solar cell, and then placing the solar cell into a vacuum system for standing;
(2) Preparing an adhesive layer by a dip-and-pull method: immersing the solar cell processed in the step (1) in the prepared adhesive layer raw material solution, lifting upwards, forming an adhesive layer on the surface of the solar cell, and then placing the solar cell in a vacuum system for standing;
(3) Preparing a moon dust protective layer by a dipping and pulling method: immersing the solar cell piece treated in the step (2) in the prepared moon-dust protective layer raw material solution, lifting upwards, forming a moon-dust protective layer on the surface of the adhesion layer, and then placing the solar cell piece in a vacuum system for drying.
7. The method for preparing the solar cell surface moon dust protective coating according to claim 6, wherein,
in the step (1), the number of times of alcohol wiping is 3-6, the number of times of deionized water cleaning is 3-6, the time of oxygen plasma treatment is 2-3 min, and the pressure of a vacuum system is 10 -4 Pa, standing for 1-2 h;
in the step (2), the pulling speed is 10-15 mm/min, and the pulling times are 2-3 times; the temperature of the vacuum system is 50-70 ℃ and the pressure is 10 -4 Pa, standing for 40-60 min;
in the step (3), the pulling speed is 10-15 mm/min, and the pulling times are 2-5 times; the temperature of the vacuum system is 30-50 ℃ and the pressure is 10 -4 Pa, and drying time is 10-15 h.
8. The method for evaluating the dustproof efficiency of the moon dust protective coating on the surface of the solar cell is characterized in that an experiment is carried out in a vacuum system provided with a moon dust uniform dust spraying device, the temperature of the vacuum system is kept at 30-35 ℃ in the experiment process, and the method for evaluating the dustproof efficiency comprises the following steps:
1) Putting moon dust with certain mass into a moon dust bearing disc of a uniform dust sprinkling device;
2) Putting the sample coated with the moon dust protective coating under a moon dust bearing plate, and pumping the system to 10 -4 Pa vacuum;
3) Opening a dust sprinkling device to uniformly sprinkle moon dust on the surface of the sample;
4) Dividing the surface of the sample into 13 subregions with the number of 1-13;
5) Shooting the surface of the protective coating sprayed with the moon dust in the vacuum system by a camera, judging that the moon dust is uniformly deposited and paved on the surface of the sample, continuing the experiment, and repeating the steps 1) to 3) after replacing the sample if the moon dust is judged to be unevenly deposited or not paved on the surface of the sample until the moon dust is uniformly deposited;
6) Carrying out centrifugal rotation on the sample;
7) After centrifugal rotation, turning over the sample, keeping the sample after turning over, and then shooting a moon dust residual picture on the surface of the sample;
8) Judging that the moon dust residue on the surface of the sample after photographing and overturning is not changed any more, and the number of the moon dust residues before and after the single subarea is not changed along with overturning, and analyzing the dust-proof efficiency of the picture of the moon dust residue;
9) Threshold judgment screening is carried out on areas which are not covered by different subareas and covered by the moon dust, so as to determine the moon dust covered areas in the different subareas;
10 According to the followingCalculating the moon dust protection efficiency of the sample surface, wherein +.>N represents the number of pixels occupied by the moon dust in the 1-13 subarea after the experiment 1 ~N 13 Representing the total number of pixels of 1 to 13 sub-regions.
9. The method for evaluating the dustproof efficiency of the solar cell surface moon dust protective coating according to claim 8, wherein in the step 6), the rotation speed of centrifugal rotation is 1300-1500 r/min, the duration of single rotation is 10-20 s, and the number of rotations is 2-4 times; in the step 7), the overturning angle is 45-60 degrees, and the overturning angle is kept for 1-3 min after overturning.
10. The method for evaluating the dust-proof efficiency of a solar cell surface moon dust protective coating according to claim 8, wherein in step 5), the judgment basis of uniform deposition of moon dust is: the number of the moon dust particles on 13 sub-areas of the surface of the sample is within 1% of each other; the judgment basis of the moon dust spreading on the surface of the sample is as follows: the area of the moon dust particles on the single subarea is 100 percent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310579295.1A CN116656155A (en) | 2023-05-22 | 2023-05-22 | Solar cell surface moon dust protective coating, preparation method thereof and dust prevention efficiency evaluation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310579295.1A CN116656155A (en) | 2023-05-22 | 2023-05-22 | Solar cell surface moon dust protective coating, preparation method thereof and dust prevention efficiency evaluation method |
Publications (1)
Publication Number | Publication Date |
---|---|
CN116656155A true CN116656155A (en) | 2023-08-29 |
Family
ID=87718329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202310579295.1A Pending CN116656155A (en) | 2023-05-22 | 2023-05-22 | Solar cell surface moon dust protective coating, preparation method thereof and dust prevention efficiency evaluation method |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN116656155A (en) |
Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476717A (en) * | 1991-08-22 | 1995-12-19 | Commissariat A L'energie Atomique | Material having antireflection, hydrophobic and abrasion resistance properties and process for depositing an antireflection, hydrophobic and abrasion resistant coating on a substrate |
US20100040867A1 (en) * | 2008-06-05 | 2010-02-18 | Michele Manca | Double layer coating, its preparation and its use for rendering ultra water-repellent and antireflective the surfaces to which it is applied |
US20120040179A1 (en) * | 2009-04-30 | 2012-02-16 | Bakul Champaklal Dave | Anti-Reflective and Anti-Soiling Coatings with Self-Cleaning Properties |
CN103587185A (en) * | 2012-08-14 | 2014-02-19 | 无锡市顺业科技有限公司 | Preparation method of super hydrophobic coating based on super hydrophobic silica and resin |
US20150037570A1 (en) * | 2009-04-30 | 2015-02-05 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings for self-cleaning properties |
CN104540900A (en) * | 2012-08-01 | 2015-04-22 | 3M创新有限公司 | Anti-smudge hard coat and anti-smudge hard coat precursor |
EP2960949A1 (en) * | 2014-06-27 | 2015-12-30 | Panasonic Intellectual Property Management Co., Ltd. | Method of manufacturing solar cell module, method of manufacturing translucent or transparent substrate, and solar cell module |
WO2016064494A2 (en) * | 2014-09-17 | 2016-04-28 | Enki Technology, Inc. | Multi-layer coatings |
US20170015843A1 (en) * | 2014-04-09 | 2017-01-19 | Dow Corning Corporation | Hydrophobic Article |
CN106928759A (en) * | 2017-03-29 | 2017-07-07 | 沧州天瑞星光热技术有限公司 | A kind of automatically cleaning antireflection coatings and preparation method thereof |
CN109370418A (en) * | 2018-09-29 | 2019-02-22 | 武汉疏能新材料有限公司 | A kind of super hydrophobic coating, coating and its preparation method and application |
US20190136073A1 (en) * | 2017-11-08 | 2019-05-09 | King Fahd University Of Petroleum And Minerals | Substrate with a superhydrophobic coating and a method of fabricating thereof |
CN114163907A (en) * | 2021-11-04 | 2022-03-11 | 广东省科学院化工研究所 | Self-cleaning coating and preparation method and application thereof |
JP2022100051A (en) * | 2020-12-23 | 2022-07-05 | 玄々化学工業株式会社 | Primer coating for wood, coating method of wood, and coated wood |
CN114899277A (en) * | 2022-04-29 | 2022-08-12 | 中山大学 | Method for preparing self-cleaning solar cell |
CN115683963A (en) * | 2022-09-19 | 2023-02-03 | 兰州空间技术物理研究所 | Device and method for testing lunar dust deposition uniformity |
-
2023
- 2023-05-22 CN CN202310579295.1A patent/CN116656155A/en active Pending
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476717A (en) * | 1991-08-22 | 1995-12-19 | Commissariat A L'energie Atomique | Material having antireflection, hydrophobic and abrasion resistance properties and process for depositing an antireflection, hydrophobic and abrasion resistant coating on a substrate |
US20100040867A1 (en) * | 2008-06-05 | 2010-02-18 | Michele Manca | Double layer coating, its preparation and its use for rendering ultra water-repellent and antireflective the surfaces to which it is applied |
US20120040179A1 (en) * | 2009-04-30 | 2012-02-16 | Bakul Champaklal Dave | Anti-Reflective and Anti-Soiling Coatings with Self-Cleaning Properties |
US20150037570A1 (en) * | 2009-04-30 | 2015-02-05 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings for self-cleaning properties |
CN104540900A (en) * | 2012-08-01 | 2015-04-22 | 3M创新有限公司 | Anti-smudge hard coat and anti-smudge hard coat precursor |
CN103587185A (en) * | 2012-08-14 | 2014-02-19 | 无锡市顺业科技有限公司 | Preparation method of super hydrophobic coating based on super hydrophobic silica and resin |
US20170015843A1 (en) * | 2014-04-09 | 2017-01-19 | Dow Corning Corporation | Hydrophobic Article |
EP2960949A1 (en) * | 2014-06-27 | 2015-12-30 | Panasonic Intellectual Property Management Co., Ltd. | Method of manufacturing solar cell module, method of manufacturing translucent or transparent substrate, and solar cell module |
WO2016064494A2 (en) * | 2014-09-17 | 2016-04-28 | Enki Technology, Inc. | Multi-layer coatings |
CN106928759A (en) * | 2017-03-29 | 2017-07-07 | 沧州天瑞星光热技术有限公司 | A kind of automatically cleaning antireflection coatings and preparation method thereof |
US20190136073A1 (en) * | 2017-11-08 | 2019-05-09 | King Fahd University Of Petroleum And Minerals | Substrate with a superhydrophobic coating and a method of fabricating thereof |
CN109370418A (en) * | 2018-09-29 | 2019-02-22 | 武汉疏能新材料有限公司 | A kind of super hydrophobic coating, coating and its preparation method and application |
JP2022100051A (en) * | 2020-12-23 | 2022-07-05 | 玄々化学工業株式会社 | Primer coating for wood, coating method of wood, and coated wood |
CN114163907A (en) * | 2021-11-04 | 2022-03-11 | 广东省科学院化工研究所 | Self-cleaning coating and preparation method and application thereof |
CN114899277A (en) * | 2022-04-29 | 2022-08-12 | 中山大学 | Method for preparing self-cleaning solar cell |
CN115683963A (en) * | 2022-09-19 | 2023-02-03 | 兰州空间技术物理研究所 | Device and method for testing lunar dust deposition uniformity |
Non-Patent Citations (2)
Title |
---|
JIAWEI ZHANG等: "Transparent dust removal coatings for solar cell on mars and its Anti-dust mechanism", 《PROGRESS IN ORGANIC COATINGS》, vol. 134, 22 May 2019 (2019-05-22), pages 312 - 322, XP085721781, DOI: 10.1016/j.porgcoat.2019.05.028 * |
张佳威等: "火星车太阳能电池防尘涂层的制备与性能研究", 《复旦学报(自然科学版)》, vol. 58, no. 06, 31 December 2019 (2019-12-31), pages 740 - 746 * |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101681935B (en) | Solar cells for stratospheric and outer space use | |
EP3172260B1 (en) | High gain durable anti-reflective coating | |
US20140261673A1 (en) | Tuning the anti-reflective, abrasion resistance, anti-soiling and self-cleaning properties of transparent coatings for different glass substrates and solar cells | |
US20160085944A1 (en) | Glass coating specification library | |
CN113976409A (en) | Preparation method of self-healing super-hydrophobic magnesium alloy anticorrosive coating | |
CN113277745B (en) | Fingerprint-proof film coating process and glass | |
CN105016624A (en) | Self-cleaning hydrophilic coating liquid and coating method | |
JPH021162B2 (en) | ||
CN116656155A (en) | Solar cell surface moon dust protective coating, preparation method thereof and dust prevention efficiency evaluation method | |
CN115491123A (en) | Self-cleaning hydrophobic non-dusting nano protective coating for photovoltaic glass and preparation method thereof | |
CN113976410A (en) | Low-solar-absorption-ratio organic thermal control coating and preparation method thereof | |
US5885658A (en) | Process for protecting optical properties of a thermal control | |
CN114249545B (en) | Coated glass with ultraviolet shielding function | |
Sibin et al. | Environmental stability of transparent and conducting ITO thin films coated on flexible FEP and Kapton® substrates for spacecraft applications | |
Pütz et al. | Liquid film spray deposition of transparent conducting oxide coatings | |
US3871902A (en) | Method of coating a spacecraft shell surface | |
Yoneda et al. | Mechanical durability of water repellent glass | |
JP2001503798A (en) | Pigments coated with UV radiation absorbers | |
Polizos et al. | Enhanced durability transparent superhydrophobic anti-soiling coatings for CSP applications | |
Qi et al. | Fabrication of 60 wt% SiO2 filled hybrid nanocomposite and its application in erosion-corrosion and radiation resistance | |
Kurapati et al. | Advanced protection against environmental degradation of silver mirror stacks for space application | |
CN109608053B (en) | Preparation method of super-hydrophobic self-cleaning coating for solar cell glass panel | |
Simonis et al. | Porcelain enamelled absorbers, coated by spectral selective tin oxide | |
KR100459378B1 (en) | Method for processing face panel surface of image display apparatus, and image display apparatus provided with face panel having its face processed | |
JP2006351995A (en) | Manufacturing method of photoelectric conversion device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |