CN116543950B - Yellow light slurry, preparation method thereof and application of yellow light slurry in heterojunction solar cell - Google Patents

Yellow light slurry, preparation method thereof and application of yellow light slurry in heterojunction solar cell Download PDF

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CN116543950B
CN116543950B CN202310798890.4A CN202310798890A CN116543950B CN 116543950 B CN116543950 B CN 116543950B CN 202310798890 A CN202310798890 A CN 202310798890A CN 116543950 B CN116543950 B CN 116543950B
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methacrylate
acrylate
monomer
yellow light
additive
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CN116543950A (en
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许迪
高辉
董鹏程
杨艳
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Qianyu Micro Nano Technology Shenzhen Co ltd
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Qianyu Micro Nano Technology Shenzhen Co ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/14—Conductive material dispersed in non-conductive inorganic material
    • H01B1/16—Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells

Abstract

The application discloses yellow light slurry, a preparation method thereof and application thereof in heterojunction solar cells, belonging to the technical field of electronic slurry, wherein the yellow light slurry comprises the following components in percentage by weight: 75-90% of metal powder, 2-10% of solvent, 0.5-5% of additive and 8-24% of photosensitive resin composition; the metal powder comprises the following components in percentage by weight: 60-95% of metal powder with an average particle size of 0.2-0.5 mu m, 5-40% of metal powder with an average particle size of 0.5-1 mu m; the metal powder comprises at least one of silver powder, silver palladium powder, silver coated copper powder, aluminum powder and nickel powder. The yellow light paste can replace the traditional ITO+silver fine grid structure, replace the traditional PVD+photoresist+electroplating thickening process or the direct silver fine grid electrode printing process, realize the better balance of the HIT heterojunction solar cell in the light shielding degree and the resistivity, and obtain higher conversion efficiency.

Description

Yellow light slurry, preparation method thereof and application of yellow light slurry in heterojunction solar cell
Technical Field
The application relates to the technical field of electronic paste and solar cells, in particular to yellow light paste, a preparation method thereof and application thereof in heterojunction solar cells.
Background
A typical heterojunction solar cell is a HIT (HeterojunctionwithIntrinsic Thin-layer) cell and is structurally characterized in that the front side and the back side of single crystal silicon (c-Si) are respectively an intrinsic amorphous silicon (i-a-Si: H) thin layer and a p+ or n+ heavily doped amorphous silicon layer, and transparent electrodes and collector electrodes are prepared outside the amorphous silicon (a-Si: H) on two sides to form the heterojunction solar cell with a symmetrical structure.
The HIT battery has high efficiency, and one of the important reasons is that the HIT battery has a unique and high-quality intrinsic amorphous silicon thin layer, can obviously passivate interface state defects, reduces minority carrier recombination, and improves open-circuit voltage and battery performance.
The high-efficiency solar cell needs to have a good surface electrode conductive film, as shown in fig. 1, and the good surface electrode conductive film needs to have good conductivity and sunlight transmission capability at the same time, however, practical research application finds that the two are always mutually restricted. ITO thin films are generally prepared by magnetron sputtering, with the resistivity of ITO being approximately 8X 10 -4 About Ω·cm, and the light transmittance is 90%. In addition, indium, which is a rare metal, is required for ITO, and in recent years, the price of indium has increased due to the large amount of ITO used.
In addition, since the resistivity of ITO is still much higher than that of simple metal (the resistivity of simple silver is 2X 10 < -6 > omega cm), the sheet resistance is higher to 5-10 ohm/square, and therefore, a silver fine grid line is also printed on the ITO coating layer as an electron collecting electrode. The width of the current precise printing of the HIT silver grid line is about 40-60 um/silver, and because silver is not transparent, a large number of silver grid lines also cause the increase of shading area and the reduction of photoelectric conversion efficiency. For the HIT cell of 9bb 166 size (9 main grid, 166mm size), the shading area of 90 fine grids reached more than 6%, and the effect on the efficiency of the solar cell was very large.
Researchers use electroplated copper to replace ITO coating, but PVD, electroplating thickening and etching processes are needed, and the problems of long process, low yield, high cost, high environmental protection pressure and the like are solved.
Disclosure of Invention
The application aims to overcome the defects of the prior art and provide a yellow light slurry, a preparation method thereof and application thereof in heterojunction solar cells.
In order to achieve the above purpose, the technical scheme adopted by the application is as follows:
a yellow light slurry, comprising the following components in percentage by weight: 65-90% of metal powder, 2-10% of solvent, 0.5-5% of additive and 8-34% of photosensitive resin composition;
the metal powder comprises the following components in percentage by weight: 60-95% of metal powder with an average particle size of 0.2-0.5 mu m, 5-40% of metal powder with an average particle size of 0.5-1 mu m;
the metal powder comprises at least one of silver powder, silver palladium powder, silver coated copper powder, aluminum powder and nickel powder.
As a preferred embodiment of the present application, the additives include leveling agents, defoamers, rheology aids, flexibilizers, photoinitiators, uv absorbers, chain transfer agents, free radical control agents;
the weight ratio of the leveling agent, the defoamer, the rheological additive, the flexible additive, the photoinitiator, the ultraviolet absorber, the chain transfer agent and the free radical control agent is (0.2-1): (0.2-1): (0.2-1): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8).
As a preferred embodiment of the present application, the leveling agent comprises at least one of modified polyether siloxane, acrylate polymer, fluoropolyether siloxane, fluoroacrylate polymer; and/or
The defoamer comprises at least one of dimethyl silane and polysiloxane; and/or
The rheological additive comprises at least one of fumed silica, polyamide wax, polydimethyl silicone oil, organic bentonite, talcum powder, ethyl cellulose and hydroxymethyl cellulose; and/or
The ultraviolet absorbent is at least one selected from 2- (2 ' -hydroxy-5 ' -methylphenyl) benzotriazole, 2, 4-dihydroxybenzophenone, 2- (2 ' -hydroxy-3 ',5' -di-tert-phenyl) -5-chlorobenzotriazole, resorcinol monobenzoate, 2' -thiobis (4-tert-octylphenol oxy) nickel, tris (1, 2, 6-pentamethylpiperidyl) phosphite, 2,4, 6-tris (2 ' -n-butoxyphenyl) -1,3, 5-triazine, 4-benzoyloxy-2, 6-tetramethylpiperidine and hexamethylphosphoric triamide.
As a preferred embodiment of the present application, the flexible additive comprises at least one of 3 (ethoxy) trimethylolpropane triacrylate, 9 (ethoxy) trimethylolpropane triacrylate, 15 (ethoxy) trimethylolpropane triacrylate, polyethylene glycol (200) diacrylate, polyethylene glycol (400) diacrylate, polyethylene glycol (600) diacrylate, polyethylene glycol (1500) diacrylate, epsilon-caprolactone modified bis-pentaerythritol hexaacrylate, lauryl methacrylate, stearyl methacrylate; and/or
The photoinitiator comprises at least one of eta 6-isopropylbenzene ferrocene hexafluorophosphate, 1- [4- (phenylthio) phenyl ] -1, 2-octane dione 2- (O-benzoyl oxime), 1- [ 9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl ] ethanone 1- (O-acetyl oxime), 3- (1-acetoxyimino) ethyl-6- [4- (2-acetoxyethyl dioxothio) -2-methyl ] benzoyl-9-ethylcarbazole; and/or
The chain transfer agent comprises at least one of isooctyl 3-mercaptopropionate, 2, 4-diphenyl-4-methyl-1-pentene, octadecyl mercaptan, isopropanol and sodium formate; and/or
The free radical control agent comprises at least one of p-hydroxyanisole, hydroquinone, phenothiazine, pentaerythritol tetra (3-mercaptopropionate), bis (2, 6-tetramethyl-4-piperidyl) sebacate nitroxide free radical and 4-hydroxy-2, 6-tetramethyl piperidine-1-oxyl free radical.
As a preferred embodiment of the present application, the photosensitive resin composition includes an acidic monomer, a high oxygen content monomer, a backbone monomer, a curing monomer, and an initiator;
the weight ratio of the acidic monomer to the high-oxygen content monomer to the skeleton monomer to the curing monomer to the initiator is (5-10): (5-30): (10-15): (5-25): (0.2 to 5).
As a preferred embodiment of the present application, the acidic monomer includes at least one of acrylic acid, methacrylic acid, glycolic acid; and/or
The high-oxygen-content monomer comprises at least one of polyethylene glycol acrylate, polyethylene glycol methacrylate, ethylene glycol methacrylate and polypropylene glycol methacrylate; and/or
The backbone monomers include at least one of styrene, methyl methacrylate, methyl acrylate, ethyl methacrylate, ethyl acrylate, propyl methacrylate, propyl acrylate, n-butyl methacrylate, n-butyl acrylate, isobutyl methacrylate, isobutyl acrylate, pentyl acrylate, n-hexyl methacrylate, n-hexyl acrylate, n-heptyl methacrylate, n-heptyl acrylate, n-octyl methacrylate, n-octyl acrylate, undecyl methacrylate, undecyl acrylate, tridecyl methacrylate, tridecyl acrylate, pentadecyl methacrylate, pentadecyl acrylate, cetyl methacrylate, cetyl acrylate, stearyl methacrylate, stearyl acrylate, eicosyl methacrylate, behenyl acrylate, behenyl methacrylate, and behenyl acrylate.
As a preferred embodiment of the present application, the curing monomer includes at least one of ethyl 2-isocyanate, triglycidyl methacrylate, hydroxyethyl methacrylate, hydroxypropyl methacrylate, hydroxyethyl acrylate, hydroxypropyl acrylate; and/or
The initiator comprises at least one of azobisethylnitrile, azobisisoheptonitrile and dimethyl azobisisobutyrate.
As a preferred embodiment of the present application, the solvent includes at least one of ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, ethylene glycol methyl ether acetate, propylene glycol methyl ether acetate, and mixed dibasic acid dibasic ester.
The application also provides a preparation method of the yellow light slurry, which comprises the following steps:
uniformly mixing the photosensitive resin composition, the additive and the solvent to obtain a mixed solution, uniformly mixing the mixed solution and the metal powder, and carrying out three-roller grinding and refining to obtain yellow light slurry.
The application also provides application of the yellow light slurry in preparation of heterojunction solar cells.
The application has the beneficial effects that: (1) The yellow light slurry metal grid can replace the traditional ITO+silver fine grid structure and replace the traditional PVD+photoresist+electroplating thickening process, so that better balance of the HIT heterojunction solar cell in light shading degree and resistivity is realized, and higher conversion efficiency is obtained.
Drawings
Fig. 1 is a heterojunction solar cell comprising an ITO thin film as mentioned in the background art.
Fig. 2 is a heterojunction solar cell (double-sided fine grid) prepared from the yellow light paste of the present application.
Fig. 3 is a heterojunction solar cell (single-sided fine grid) prepared from the yellow slurry of the present application.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present application more apparent, the technical solutions in the embodiments of the present application will be clearly and completely described below, and it is apparent that the described embodiments are some embodiments of the present application, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
It should be understood that, in various embodiments of the present application, the sequence number of each process does not mean that the sequence of execution is sequential, and some or all of the steps may be executed in parallel or sequentially, where the execution sequence of each process should be determined by its functions and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.
The weights of the relevant components mentioned in the description of the embodiments of the present application may refer not only to the specific contents of the components, but also to the proportional relationship between the weights of the components, so long as the contents of the relevant components in the description of the embodiments of the present application are scaled up or down within the scope of the disclosure of the embodiments of the present application. Specifically, the mass described in the specification of the embodiment of the application can be mass units known in the chemical industry field such as mu g, mg, g, kg.
In the present application, the specific dispersing and stirring treatment method is not particularly limited.
The reagents or apparatus used in the present application are conventional products commercially available without the manufacturer's knowledge.
The embodiment of the application provides yellow light slurry, which comprises the following components in percentage by weight: 65-90% of metal powder, 2-10% of solvent, 0.5-5% of additive and 8-34% of photosensitive resin composition;
the metal powder comprises the following components in percentage by weight: 60-95% of metal powder with an average particle size of 0.2-0.5 mu m, 5-40% of metal powder with an average particle size of 0.5-1 mu m;
the metal powder comprises at least one of silver powder, silver palladium powder, silver coated copper powder, aluminum powder and nickel powder.
The yellow light slurry provided by the application can replace the traditional ITO+silver fine grid structure and replace the traditional PVD+etching+electroplating thickening process, so that the better balance of the shading degree and the resistivity of the HIT heterojunction solar cell is realized, and the higher conversion efficiency is obtained.
In one embodiment, the additives include leveling agents, defoamers, rheology aids, flexibility additives, photoinitiators, uv absorbers, chain transfer agents, free radical control agents;
the weight ratio of the leveling agent, the defoamer, the rheological additive, the flexible additive, the photoinitiator, the ultraviolet absorber, the chain transfer agent and the free radical control agent is (0.2-1): (0.2-1): (0.2-1): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8).
The specific additive can effectively improve the light transmittance and the conductivity, and effectively improve the stability of the whole formula and the curing strength of the system.
In one embodiment, the leveling agent comprises at least one of a modified polyether siloxane, an acrylate polymer, a fluoropolyether siloxane, and a fluoroacrylate polymer.
In one embodiment, the defoamer comprises at least one of dimethylsilane and polysiloxane.
In one embodiment, the rheology aid comprises at least one of fumed silica, polyamide wax, polydimethyl silicone oil, organobentonite, talc, ethylcellulose, hydroxymethyl cellulose.
In one embodiment, the ultraviolet absorber is selected from at least one of 2- (2 ' -hydroxy-5 ' -methylphenyl) benzotriazole, 2, 4-dihydroxybenzophenone, 2- (2 ' -hydroxy-3 ',5' -di-tert-phenyl) -5-chlorobenzotriazole, resorcinol monobenzoate, 2' -thiobis (4-tert-octylphenoloxy) nickel, tris (1, 2, 6-pentamethylpiperidinyl) phosphite, 2,4, 6-tris (2 ' n-butoxyphenyl) -1,3, 5-triazine, 4-benzoyloxy-2, 6-tetramethylpiperidine, hexamethylphosphoric triamide.
In one embodiment, the flexible additive comprises at least one of 3 (ethoxy) trimethylolpropane triacrylate, 9 (ethoxy) trimethylolpropane triacrylate, 15 (ethoxy) trimethylolpropane triacrylate, polyethylene glycol (200) diacrylate, polyethylene glycol (400) diacrylate, polyethylene glycol (600) diacrylate, polyethylene glycol (1500) diacrylate, epsilon-caprolactone modified di-pentaerythritol hexaacrylate, lauryl methacrylate, stearyl methacrylate.
In one embodiment, the photoinitiator comprises at least one of η6-isopropylbenzene ferrocene hexafluorophosphate, 1- [4- (phenylthio) phenyl ] -1, 2-octanedione 2- (O-benzoyl oxime), 1- [ 9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl ] ethanone 1- (O-acetyl oxime), 3- (1-acetoxyimino) ethyl-6- [4- (2-acetoxyethyldioxothio) -2-methyl ] benzoyl-9-ethylcarbazole.
In one embodiment, the chain transfer agent comprises at least one of isooctyl 3-mercaptopropionate, 2, 4-diphenyl-4-methyl-1-pentene, octadecyl mercaptan, isopropyl alcohol, sodium formate.
In one embodiment, the radical control agent comprises at least one of para-hydroxyanisole, hydroquinone, phenothiazine, pentaerythritol tetrakis (3-mercaptopropionate), bis (2, 6-tetramethyl-4-piperidinyl) sebacate nitroxide, 4-hydroxy-2, 6-tetramethylpiperidin-1-oxyl radical.
In one embodiment, the photosensitive resin composition includes an acidic monomer, a high oxygen content monomer, a backbone monomer, a curing monomer, and an initiator;
the weight ratio of the acidic monomer to the high-oxygen content monomer to the skeleton monomer to the curing monomer to the initiator is (5-10): (5-30): (10-15): (5-25): (0.2 to 5).
The application adds acid monomer and solidifying monomer based on the existing photosensitive resin composition, effectively improves the strength of the whole system, improves the adhesive strength, and further improves the dispersion property of metal powder.
In one embodiment, the acidic monomer includes at least one of acrylic acid, methacrylic acid, glycolic acid.
In one embodiment, the high oxygen content monomer comprises at least one of polyethylene glycol acrylate, polyethylene glycol methacrylate, ethylene glycol methacrylate, polypropylene glycol methacrylate.
In one embodiment, the backbone monomer comprises at least one of styrene, methyl methacrylate, methyl acrylate, ethyl methacrylate, ethyl acrylate, propyl methacrylate, propyl acrylate, n-butyl methacrylate, n-butyl acrylate, isobutyl methacrylate, isobutyl acrylate, pentyl acrylate, n-hexyl methacrylate, n-hexyl acrylate, n-heptyl methacrylate, n-heptyl acrylate, n-octyl methacrylate, n-octyl acrylate, undecyl methacrylate, undecyl acrylate, tridecyl methacrylate, tridecyl acrylate, pentadecyl methacrylate, pentadecyl acrylate, cetyl methacrylate, cetyl acrylate, stearyl methacrylate, stearyl acrylate, eicosyl methacrylate, eicosyl acrylate, docosyl methacrylate, docosyl acrylate.
In one embodiment, the curing monomer includes at least one of 2-isocyanatoethyl methacrylate, triglycidyl methacrylate, hydroxyethyl methacrylate, hydroxypropyl methacrylate, hydroxyethyl acrylate, and hydroxypropyl acrylate.
In one embodiment, the initiator comprises at least one of azobisisobutyronitrile, azobisisoheptonitrile, dimethyl azobisisobutyrate.
In one embodiment, the solvent comprises at least one of ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, ethylene glycol methyl ether acetate, propylene glycol methyl ether acetate, and mixed dibasic acid dibasic ester.
In the present application, the method for preparing the photosensitive resin composition and the additive is not limited, and those skilled in the art know how to prepare them into the photosensitive resin composition and the additive based on the present application.
Illustratively, the method for preparing the additive comprises the following steps:
adding the flexible additive, the photoinitiator, the chain transfer agent and the free radical control agent into a glass reaction kettle with a reflux condenser, introducing argon for protection and stirring at 85 ℃, stirring for 4 hours at 85 ℃ for reaction, adding the flatting agent, the defoamer, the rheological additive and the ultraviolet absorbent, and stirring uniformly to obtain the additive.
Illustratively, the method for preparing the photosensitive resin composition comprises the following steps:
adding an acidic monomer, a high-oxygen-content monomer, a framework monomer, a curing monomer and an initiator into a glass reaction kettle with a reflux condenser, introducing argon for protection and stirring at 85 ℃, and stirring at 85 ℃ for 4 hours for reaction to obtain the photosensitive resin composition.
An embodiment of the present application provides a method for preparing yellow light paste, comprising the steps of:
uniformly mixing the photosensitive resin composition, the additive and the solvent to obtain a mixed solution, uniformly mixing the mixed solution and the metal powder, and carrying out three-roller grinding and refining to obtain yellow light slurry.
An embodiment of the application provides an application of yellow light slurry in preparing heterojunction solar cells.
The following examples are provided to facilitate an understanding of the present application. These examples are not provided to limit the scope of the claims.
Example 1
A yellow light slurry, comprising the following components in percentage by weight: 80% of metal powder, 6% of solvent, 3.5% of additive and 10.5% of photosensitive resin composition;
the metal powder comprises the following components in percentage by weight: 80% of silver powder with an average particle size of 0.4 μm and 20% of silver powder with an average particle size of 0.8 μm.
The additive comprises a leveling agent (TEGO 270 leveling agent), a defoaming agent (dimethyl silane), a rheological additive (fumed silica), a flexible additive (epsilon-caprolactone modified di-pentaerythritol hexaacrylate), a photoinitiator (eta 6-isopropylbenzene ferrocenium hexafluorophosphate), an ultraviolet absorbent (2- (2 '-hydroxy-5' -methylphenyl) benzotriazole), a chain transfer agent (3-mercaptopropionic acid isooctyl ester) and a free radical control agent (p-hydroxyanisole); the weight ratio of the leveling agent, the defoamer, the rheological additive, the flexible additive, the photoinitiator, the ultraviolet absorber, the chain transfer agent and the free radical control agent is 0.5:0.5:0.5:0.4:0.4:0.4:0.4:0.4.
the photosensitive resin composition includes an acid monomer (methacrylic acid), a high oxygen content monomer (polyethylene glycol methacrylate), a backbone monomer (methyl methacrylate), a curing monomer (triglycidyl methacrylate), and an initiator (azobisisobutyronitrile); the weight ratio of the acidic monomer to the high-oxygen content monomer to the skeleton monomer to the curing monomer to the initiator is 8:20:12:15:4.
the solvent comprises ethylene glycol monobutyl ether and propylene glycol monomethyl ether; the weight ratio of the ethylene glycol monobutyl ether to the propylene glycol monomethyl ether is 2:1.
The preparation method of the yellow light slurry comprises the following steps:
uniformly mixing the photosensitive resin composition, the additive and the solvent to obtain a mixed solution, uniformly mixing the mixed solution and the metal powder, and grinding to obtain yellow light slurry.
Example 2
A yellow light slurry, comprising the following components in percentage by weight: 76% of metal powder, 5% of solvent, 4% of additive and 15% of photosensitive resin composition;
the metal powder comprises the following components in percentage by weight: 75% of silver powder having an average particle diameter of 0.4. Mu.m, and 25% of silver powder having an average particle diameter of 0.8. Mu.m.
The additives comprise leveling agents (TEGO 270 leveling agents), defoamers (dimethyl silane), rheology aids (fumed silica), flexible additives (polyethylene glycol (400) diacrylate), photoinitiators (eta 6-isopropylbenzene ferrocene hexafluorophosphate), ultraviolet absorbers (2- (2 '-hydroxy-5' -methylphenyl) benzotriazole), chain transfer agents (2, 4-diphenyl-4-methyl-1-pentene), free radical control agents (p-hydroxyanisole); the weight ratio of the leveling agent, the defoamer, the rheological additive, the flexible additive, the photoinitiator, the ultraviolet absorber, the chain transfer agent and the free radical control agent is 0.5:0.5:0.5:0.5:0.5:0.5:0.5:0.5.
the photosensitive resin composition includes an acid monomer (acrylic acid), a high oxygen content monomer (polyethylene glycol methacrylate), a backbone monomer (propyl methacrylate), a curing monomer (triglycidyl methacrylate), and an initiator (azobisisobutyronitrile); the weight ratio of the acidic monomer to the high-oxygen content monomer to the skeleton monomer to the curing monomer to the initiator is 8:20:12:15:4.
the solvent comprises ethylene glycol monobutyl ether and propylene glycol monomethyl ether; the weight ratio of the ethylene glycol monobutyl ether to the propylene glycol monomethyl ether is 2:1.
The preparation method of the yellow light slurry comprises the following steps:
uniformly mixing the photosensitive resin composition, the additive and the solvent to obtain a mixed solution, uniformly mixing the mixed solution and the metal powder, and grinding to obtain yellow light slurry.
Example 3
A yellow light slurry, comprising the following components in percentage by weight: 80% of metal powder, 10% of solvent, 2% of additive and 8% of photosensitive resin composition;
the metal powder comprises the following components in percentage by weight: 85% of silver powder with an average particle size of 0.4 μm and 15% of silver powder with an average particle size of 0.8 μm.
The additives comprise leveling agents (TEGO 270 leveling agents), defoamers (dimethyl silane), rheology aids (fumed silica), flexible additives (stearyl methacrylate), photoinitiators (1- [4- (phenylsulfanyl) phenyl ] -1, 2-octanedione 2- (O-benzoyl oxime)), ultraviolet absorbers (resorcinol monobenzoate), chain transfer agents (2, 4-diphenyl-4-methyl-1-pentene), free radical control agents (p-hydroxyanisole); the weight ratio of the leveling agent, the defoamer, the rheological additive, the flexible additive, the photoinitiator, the ultraviolet absorber, the chain transfer agent and the free radical control agent is 0.5:0.5:0.5:0.5:0.5:0.5:0.5:0.5.
the photosensitive resin composition includes an acid monomer (acrylic acid), a high oxygen content monomer (polyethylene glycol methacrylate), a backbone monomer (propyl methacrylate), a curing monomer (triglycidyl methacrylate), and an initiator (azobisisobutyronitrile); the weight ratio of the acidic monomer to the high-oxygen content monomer to the skeleton monomer to the curing monomer to the initiator is 8:20:12:15:4.
the solvent comprises ethylene glycol monobutyl ether and propylene glycol monomethyl ether; the weight ratio of the ethylene glycol monobutyl ether to the propylene glycol monomethyl ether is 2:1.
The preparation method of the yellow light slurry comprises the following steps:
uniformly mixing the photosensitive resin composition, the additive and the solvent to obtain a mixed solution, uniformly mixing the mixed solution and the metal powder, and grinding to obtain yellow light slurry.
Comparative example 1
Comparative example 1 differs from example 1 in that the additives are different and all others are the same.
A yellow light slurry, comprising the following components in percentage by weight: 80% of metal powder, 6% of solvent, 3.5% of additive and 10.5% of photosensitive resin composition.
The additives of this comparative example included leveling agents (TEGO 270 leveling agent), defoamers (dimethylsilane), rheology aids (fumed silica), UV absorbers (2- (2 '-hydroxy-5' -methylphenyl) benzotriazole); the weight ratio of the leveling agent to the defoamer to the rheological auxiliary agent to the ultraviolet absorber is 0.5:0.5:0.5:0.4.
comparative example 2
Comparative example 2 is different from example 1 in that the photosensitive resin composition of the present application was the photosensitive resin composition of example 1 of patent CN109143780a, and all other things were the same.
A yellow light slurry, comprising the following components in percentage by weight: 80% of metal powder, 6% of solvent, 3.5% of additive and 10.5% of photosensitive resin composition.
The photosensitive resin composition of this comparative example was prepared as follows: ultrasonic dissolution and mixing were performed on [1&#x2011; hydroxy ≡ # x2011;2 ≡ # x2011; -. Propylene glycol methyl ether (70 g) is added into a glass reaction kettle with a reflux condenser, argon is introduced at 85 ℃ for protection stirring, the mixture is gradually added into the glass reaction kettle by a dropping funnel in a dropwise manner, the temperature is kept at 85 ℃, and stirring is carried out for 4 hours for reaction, so that the photosensitive resin composition is obtained.
Test case
When the yellow light paste of the present application was screen-coated, a double-sided fine grid cell as shown in fig. 2 was formed, and when single-sided coating was performed, a single-sided fine grid cell as shown in fig. 3 was formed,
the yellow pastes of examples 1 to 3 and comparative examples 1 to 2 were screen-coated on the solar cell shown in fig. 2, dried at 90 c, exposed to 100-400mj energy using Mask exposure Mask of a grid pattern, developed with a weak alkaline aqueous solution, and then cured at 180 c, and the resistivity and transmittance are shown in table 1.
The yellow light slurry metal grid can remarkably improve light transmittance and has excellent conductivity.
Finally, it should be noted that the above embodiments are only for illustrating the technical solution of the present application and not for limiting the scope of the present application, and although the present application has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made to the technical solution of the present application without departing from the spirit and scope of the technical solution of the present application.

Claims (7)

1. The application of the yellow light slurry in the preparation of heterojunction solar cells is characterized in that the yellow light slurry is prepared from the following components in percentage by weight: 65-90% of silver powder, 2-10% of solvent, 0.5-5% of additive and 8-34% of photosensitive resin composition;
the silver powder comprises the following components in percentage by weight: 60-95% of silver powder with an average particle size of 0.2-0.5 mu m, 5-40% of silver powder with an average particle size of 0.5-1 mu m;
the additive comprises a leveling agent, a defoaming agent, a rheological additive, a flexible additive, a photoinitiator, an ultraviolet absorber, a chain transfer agent and a free radical control agent;
the weight ratio of the leveling agent, the defoamer, the rheological additive, the flexible additive, the photoinitiator, the ultraviolet absorber, the chain transfer agent and the free radical control agent is (0.2-1): (0.2-1): (0.2-1): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8): (0.2 to 0.8);
the photosensitive resin composition comprises an acid monomer, a high-oxygen-content monomer, a skeleton monomer, a curing monomer and an initiator; the weight ratio of the acidic monomer to the high-oxygen content monomer to the skeleton monomer to the curing monomer to the initiator is (5-10): (5-30): (10-15): (5-25): (0.2 to 5).
2. The use according to claim 1, wherein the leveling agent comprises at least one of a modified polyether siloxane, an acrylate polymer, a fluoropolyether siloxane, a fluoroacrylate polymer; and/or
The defoamer comprises at least one of dimethyl silane and polysiloxane; and/or
The rheological additive comprises at least one of fumed silica, polyamide wax, polydimethyl silicone oil, organic bentonite, talcum powder, ethyl cellulose and hydroxymethyl cellulose; and/or
The ultraviolet absorbent is at least one selected from 2- (2 ' -hydroxy-5 ' -methylphenyl) benzotriazole, 2, 4-dihydroxybenzophenone, 2- (2 ' -hydroxy-3 ',5' -di-tert-phenyl) -5-chlorobenzotriazole, resorcinol monobenzoate, 2' -thiobis (4-tert-octylphenol oxy) nickel, tris (1, 2, 6-pentamethylpiperidyl) phosphite, 2,4, 6-tris (2 ' -n-butoxyphenyl) -1,3, 5-triazine, 4-benzoyloxy-2, 6-tetramethylpiperidine and hexamethylphosphoric triamide.
3. The use according to claim 1, wherein the flexible additive comprises at least one of 3 (ethoxy) trimethylolpropane triacrylate, 9 (ethoxy) trimethylolpropane triacrylate, 15 (ethoxy) trimethylolpropane triacrylate, polyethylene glycol (200) diacrylate, polyethylene glycol (400) diacrylate, polyethylene glycol (600) diacrylate, polyethylene glycol (1500) diacrylate, epsilon-caprolactone modified dipentaerythritol hexaacrylate, lauryl methacrylate, stearyl methacrylate; and/or
The photoinitiator comprises at least one of eta 6-isopropylbenzene ferrocene hexafluorophosphate, 1- [4- (phenylthio) phenyl ] -1, 2-octane dione 2- (O-benzoyl oxime), 1- [ 9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl ] ethanone 1- (O-acetyl oxime), 3- (1-acetoxyimino) ethyl-6- [4- (2-acetoxyethyl dioxothio) -2-methyl ] benzoyl-9-ethylcarbazole; and/or
The chain transfer agent comprises at least one of isooctyl 3-mercaptopropionate, 2, 4-diphenyl-4-methyl-1-pentene, octadecyl mercaptan, isopropanol and sodium formate; and/or
The free radical control agent comprises at least one of p-hydroxyanisole, hydroquinone, phenothiazine, pentaerythritol tetra (3-mercaptopropionate), bis (2, 6-tetramethyl-4-piperidyl) sebacate nitroxide free radical and 4-hydroxy-2, 6-tetramethyl piperidine-1-oxyl free radical.
4. The use according to claim 1, wherein the acidic monomers comprise at least one of acrylic acid, methacrylic acid, glycolic acid; and/or
The high-oxygen-content monomer comprises at least one of polyethylene glycol acrylate, polyethylene glycol methacrylate, ethylene glycol methacrylate and polypropylene glycol methacrylate; and/or
The backbone monomers include at least one of styrene, methyl methacrylate, methyl acrylate, ethyl methacrylate, ethyl acrylate, propyl methacrylate, propyl acrylate, n-butyl methacrylate, n-butyl acrylate, isobutyl methacrylate, isobutyl acrylate, pentyl acrylate, n-hexyl methacrylate, n-hexyl acrylate, n-heptyl methacrylate, n-heptyl acrylate, n-octyl methacrylate, n-octyl acrylate, undecyl methacrylate, undecyl acrylate, tridecyl methacrylate, tridecyl acrylate, pentadecyl methacrylate, pentadecyl acrylate, cetyl methacrylate, cetyl acrylate, stearyl methacrylate, stearyl acrylate, eicosyl methacrylate, behenyl acrylate, behenyl methacrylate, and behenyl acrylate.
5. The use according to claim 1, wherein the curing monomer comprises at least one of 2-isocyanatoethyl methacrylate, triglycidyl methacrylate, hydroxyethyl methacrylate, hydroxypropyl methacrylate, hydroxyethyl acrylate, hydroxypropyl acrylate; and/or
The initiator comprises at least one of azobisethylnitrile, azobisisoheptonitrile and dimethyl azobisisobutyrate.
6. The use according to claim 1, wherein the solvent comprises at least one of ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, ethylene glycol methyl ether acetate, propylene glycol methyl ether acetate, mixed dibasic acid dibasic ester.
7. The use according to claim 1, characterized in that the preparation method of the yellow light paste comprises the following steps:
uniformly mixing the photosensitive resin composition, the additive and the solvent to obtain a mixed solution, uniformly mixing the mixed solution and silver powder, and carrying out three-roller grinding refinement to obtain yellow light slurry.
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CN115331866A (en) * 2022-08-17 2022-11-11 江苏正能电子科技有限公司 Low-temperature curing conductive silver paste based on capillary suspension theory and preparation method thereof

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CN110335700A (en) * 2019-06-28 2019-10-15 乾宇电子材料(苏州)有限公司 High temperature sintering type yellow light electrocondution slurry, conducting wire and preparation method
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