CN116518229A - Device for measuring levelness of base in epitaxial equipment - Google Patents

Device for measuring levelness of base in epitaxial equipment Download PDF

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Publication number
CN116518229A
CN116518229A CN202310510939.1A CN202310510939A CN116518229A CN 116518229 A CN116518229 A CN 116518229A CN 202310510939 A CN202310510939 A CN 202310510939A CN 116518229 A CN116518229 A CN 116518229A
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CN
China
Prior art keywords
bar
bracket
base
screw
levelness
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Pending
Application number
CN202310510939.1A
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Chinese (zh)
Inventor
周晓辉
薛宏伟
袁肇耿
王刚
张志坡
冯聚坤
王凯达
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HEBEI POSHING ELECTRONICS TECHNOLOGY CO LTD
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HEBEI POSHING ELECTRONICS TECHNOLOGY CO LTD
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Priority to CN202310510939.1A priority Critical patent/CN116518229A/en
Publication of CN116518229A publication Critical patent/CN116518229A/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02—Heads
    • F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02—Heads
    • F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
    • F16M11/043—Allowing translations
    • F16M11/045—Allowing translations adapted to left-right translation movement
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02—Heads
    • F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
    • F16M11/043—Allowing translations
    • F16M11/046—Allowing translations adapted to upward-downward translation movement
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02—Heads
    • F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
    • F16M11/043—Allowing translations
    • F16M11/048—Allowing translations adapted to forward-backward translation movement
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon ; Stands for scientific apparatus such as gravitational force meters
    • F16M11/02—Heads
    • F16M11/18—Heads with mechanism for moving the apparatus relatively to the stand
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
    • F16M13/00—Other supports for positioning apparatus or articles; Means for steadying hand-held apparatus or articles
    • F16M13/02—Other supports for positioning apparatus or articles; Means for steadying hand-held apparatus or articles for supporting on, or attaching to, an object, e.g. tree, gate, window-frame, cycle
    • F16M13/022—Other supports for positioning apparatus or articles; Means for steadying hand-held apparatus or articles for supporting on, or attaching to, an object, e.g. tree, gate, window-frame, cycle repositionable
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C9/00—Measuring inclination, e.g. by clinometers, by levels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C9/00—Measuring inclination, e.g. by clinometers, by levels
    • G01C9/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

The application provides a device for measuring the levelness of a base in epitaxial equipment. The device comprises a mounting base, a first bar-shaped bracket, a second bracket, a third bar-shaped bracket, a distance measuring sensor and a controller; the mounting base is arranged on an iron bottom plate of the epitaxial equipment, the first strip-shaped bracket is arranged on the mounting base and is parallel to a first plane, and the first plane is a plane on which the upper surface of the mounting base is positioned; the second bracket comprises a vertical bracket vertical to the first plane and a horizontal bracket parallel to the first plane, and the vertical bracket is connected with the horizontal bracket; the horizontal bracket is positioned on the first strip-shaped bracket and is connected in a sliding way in parallel with the first plane direction; the third bar-shaped bracket is in sliding connection with the vertical bracket in the direction vertical to the first plane and is fixedly connected with the ranging sensor; the distance measuring sensor is used for measuring the vertical distance between the base to be detected and the distance measuring sensor; the controller is used for determining the levelness of the base to be detected based on the vertical distance. According to the method and the device, the measuring accuracy of the levelness of the base can be improved.

Description

Device for measuring levelness of base in epitaxial equipment
Technical Field
The application relates to the technical field of semiconductor processing, in particular to a device for measuring the levelness of a base in epitaxial equipment.
Background
The epitaxial process is a common process in the manufacture of semiconductors, and refers to a process of growing a single crystal film on a single crystal substrate in a substrate crystal orientation by a physical or chemical method.
In general, an epitaxial process apparatus includes a reaction chamber for performing a process, a loading chamber for taking and placing a substrate, and a transfer chamber for transferring a substrate. In the reaction chamber, the susceptor is a platform on which the substrate is processed. In the running process of the epitaxial equipment, the base drives the substrate to rotate at a constant speed through the rotation of the base, gas for an epitaxial process is blown into the reaction cavity, meanwhile, the temperature of the reaction cavity is heated to a high temperature above 1000 ℃ for catalysis, the levelness of the base has an important influence on the consistency of the epitaxial thickness of the substrate, and the consistency of the epitaxial thickness is an important index of whether an epitaxial process product is qualified or not. Therefore, a measuring device is needed to monitor the levelness of the base to be within the standard range.
The existing measuring mode is that a level meter directly measures a static base, levelness in the actual process cannot be measured, meanwhile, as the epitaxial process reaction has a severe requirement on the cleanliness of a product, the level meter is usually placed on a waste base for measurement, and a new base which is actually used cannot be measured in a direct contact mode.
Disclosure of Invention
The application provides a measure base levelness device in epitaxial equipment to solve the problem that the new base that stands by in the prior art can't accurately confirm the levelness in actual technological process.
In a first aspect, the present application provides a device for measuring the levelness of a susceptor in an epitaxial apparatus, the device comprising: the device comprises a mounting base, a first bar-shaped bracket, a second bracket, a third bar-shaped bracket, a distance measuring sensor and a controller; the epitaxial equipment comprises an iron bottom plate and a base to be detected;
the mounting base is positioned on the iron bottom plate, the first bar-shaped bracket is mounted on the mounting base and is parallel to a first plane, and the first plane is a plane in which the upper surface of the mounting base is positioned;
the second bracket comprises a vertical bracket and a horizontal bracket, the horizontal bracket is parallel to the first plane, the vertical bracket is perpendicular to the first plane, and the vertical bracket is fixedly connected with the horizontal bracket; the horizontal bracket is positioned on the first strip-shaped bracket and is in sliding connection with the first strip-shaped bracket in a direction parallel to a first plane;
the third bar-shaped bracket is in sliding connection with the vertical bracket in the direction vertical to the first plane and is fixedly connected with the ranging sensor;
the distance measuring sensor is used for measuring the vertical distance between the base to be detected and the distance measuring sensor in the rotating process;
the controller is used for determining the levelness of the base to be detected based on the vertical distance between the base to be detected and the ranging sensor in the rotating process.
The device for measuring the levelness of the base in the epitaxial equipment not only can determine the levelness of a new base to be detected in the actual process, but also can directly and nondestructively measure the base to be detected; through adjusting the relation of connection of first bar support and horizontal support, can adjust the direction slip of range finding sensor on first plane to through the relation of connection of third bar support and vertical support, can adjust range finding sensor and slide in the direction of perpendicular to first plane, can accurately adjust range finding sensor for the position of the base that waits to detect, improve the measurement accuracy, and through mounting base, first bar support, second support and third bar support, can realize measuring the board of different grade type, the device has very high commonality.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required for the embodiments or the description of the prior art will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural diagram of a device for measuring the levelness of a susceptor in an epitaxial apparatus according to an embodiment of the present application;
fig. 2 is a schematic structural diagram of an epitaxy apparatus according to an embodiment of the present application;
fig. 3 is a schematic structural diagram of a connection between a horizontal bracket and a first bar bracket according to an embodiment of the present application;
fig. 4 is a schematic structural diagram of a connection between a first bar bracket and a mounting base according to an embodiment of the present application;
fig. 5 is a schematic structural diagram of a connection between a vertical bracket and a third bar bracket according to an embodiment of the present application;
FIG. 6 is a schematic view of the vertical distance between a ranging sensor and a base provided in an embodiment of the present application;
FIG. 7 is a schematic diagram of sampling points of a ranging sensor provided by an embodiment of the present application;
fig. 8 is a first scene diagram of a device for measuring the levelness of a susceptor in an epitaxial apparatus according to an embodiment of the present application;
fig. 9 is a second scene diagram of a device for measuring the levelness of a susceptor in an epitaxial apparatus according to an embodiment of the present application;
the symbols contained in the drawings have the following meanings:
11. a mounting base; 12. a first bar-shaped bracket; 13. a second bracket; 131. a vertical support; 132. a horizontal bracket; 14. a third bar-shaped bracket; 15. a ranging sensor; 16. a controller; 21. an iron bottom plate; 22. a base to be detected; 23. a rotating base; 24. an inner ring of the base to be detected; A. a first fixing hole; B. a second fixing hole; C. a third fixing hole; D. a fourth fixing hole; E. a fifth fixing hole; F. a sixth fixing hole; a. a first screw; b. a second screw; c. a third screw; d. a fourth screw; e. a fifth screw; f. a sixth screw; t1, a first strip-shaped groove; t2, a second bar-shaped groove; t3, a third bar-shaped groove; x, a first direction; y, the second direction; z, third direction; l (L) i A vertical distance; m, projection of a ranging sensor on a base to be detected; u, a top view direction of a base levelness device in the epitaxial equipment is measured.
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system configurations, techniques, etc. in order to provide a thorough understanding of the embodiments of the present application. It will be apparent, however, to one skilled in the art that the present application may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.
For the purpose of making the objects, technical solutions and advantages of the present application more apparent, the following description will be made with reference to the accompanying drawings by way of specific embodiments.
Fig. 1 is a schematic structural diagram of a device for measuring levelness of a susceptor in an epitaxial apparatus according to an embodiment of the present application. As shown in fig. 1, the apparatus includes: a mounting base 11, a first bar bracket 12, a second bracket 13, a third bar bracket 14, a ranging sensor 15, and a controller 16. As shown in fig. 2, the epitaxial apparatus includes a ferrous base 21 and a susceptor 22 to be inspected.
The mounting base 11 is located on a ferrous base plate 21. The first bar bracket 12 is installed on the installation base 11, and the first bar bracket 12 is parallel to a first plane, wherein the first plane is a plane where the upper surface of the installation base 11 is located.
The second bracket 13 includes a vertical bracket 131 and a horizontal bracket 132, and the horizontal bracket 132 is parallel to the first plane, the vertical bracket 131 is perpendicular to the first plane, and the vertical bracket 131 is fixedly connected with the horizontal bracket 132. The horizontal bracket 132 is located on the first bar bracket 12 and is slidably connected to the first bar bracket 12 in a direction parallel to the first plane.
The third bar bracket 14 is slidably connected to the vertical bracket 131 in a direction perpendicular to the first plane and fixedly connected to the ranging sensor 15.
The distance measuring sensor 15 is used to measure the vertical distance between the base 22 to be detected and the distance measuring sensor 15 during rotation.
The controller 16 is used for determining the levelness of the base 22 to be detected based on the vertical distance between the base 22 to be detected and the ranging sensor 15 during rotation.
Where U is the top view of the means for measuring the levelness of the susceptor in the epitaxy apparatus and the third bar-shaped support 14 is a side view of the means for measuring the levelness of the susceptor in the epitaxy apparatus.
In the embodiment of the present application, referring to fig. 1, the device is a mounting base 11, a first bar bracket 12, a second bracket 13, a third bar bracket 14, a ranging sensor 15, and a controller 16 in this order from bottom to top.
In this embodiment, the installation base 11 is magnetic force base 11, and magnetic force base 11 adsorbs with on the iron bottom plate 21 of epitaxial equipment through magnetic force, and epitaxial equipment still includes the base 22 that waits to detect.
The first bar bracket 12 is mounted on the mounting base 11 and is parallel to a first plane of the upper surface of the mounting base 11. The second bracket 13 includes a vertical bracket 131 and a horizontal bracket 132, and the vertical bracket 131 is perpendicular to the first plane, and the horizontal bracket 132 is parallel to the first plane, i.e., the vertical bracket 131 and the horizontal bracket 132 are fixedly connected at right angles. The horizontal bracket 132 is located on the first bar bracket 12 and is slidably connected to the first bar bracket 1 in a direction parallel to the first plane. The third bar bracket 14 is slidably connected to the vertical bracket 131 in a direction perpendicular to the first plane, and the third bar bracket 14 is fixedly connected to the ranging sensor 15. The first bar bracket 12, the second bracket 13 and the third bar bracket 14 are all made of aluminum materials, the aluminum materials are light and convenient, the price is low, the structure is stable, and the surfaces of the brackets can be painted with anti-corrosion paint to play a role in corrosion prevention, and the common aluminum materials are aluminum alloy.
The vertical distance between the base 22 to be detected and the ranging sensor 15 is measured by the ranging sensor 15, and the measured vertical distance is transmitted to the controller 16. The controller 16 determines the levelness of the base 22 to be detected according to the vertical distance between the ranging sensor 15 and the base 22 to be detected during the uniform rotation of the base 22 to be detected.
The connection between the ranging sensor 15 and the controller 16 may be performed by a wireless or wired method, and is not limited in the embodiment of the present application. Referring to fig. 1, a connection line between the controller 16 and the ranging sensor 15 is a dotted line, which indicates that the controller 15 and the ranging sensor 16 in fig. 1 are connected wirelessly, and a plurality of vertical distances sent from the ranging sensor 16 are acquired to determine the levelness of the base 22 to be detected currently.
In one possible implementation, the horizontal bracket 132 is provided with a first bar-shaped groove T1, and the length direction of the first bar-shaped groove T1 is the first direction x. The first bar bracket 12 is provided with a first fixing hole A and a second fixing hole B, and the device can also comprise a first screw a and a second screw B.
The first screw a passes through the first bar-shaped groove T1 and the first fixing hole a, and the second screw B passes through the first bar-shaped groove T1 and the second fixing hole B.
The horizontal bracket 132 is adapted to slide in the first direction x when the first screw a and the second screw b are not fastened, and to be fixed to the first bar bracket 12 after the first screw a and the second screw b are fastened.
Specifically, referring to fig. 3, fig. 3 is a top view of the first bar bracket 12 connected to the horizontal bracket 132. The horizontal bracket 132 is provided with a first slot T1, and defines a direction in which the horizontal bracket 132 slides up and down along the first slot T1 as a first direction x. Two holes, namely a first fixing hole A and a second fixing hole B, are formed in the first bar-shaped support and are used for fixedly connecting the horizontal support 132. The device further comprises a first screw a and a second screw b. Wherein, the first screw a passes through the first bar-shaped groove T1 and the first fixing hole A, and the second screw B passes through the first bar-shaped groove T1 and the second fixing hole B. When the first screw a and the second screw b are not fastened, the horizontal bracket 132 slides along the first direction x, and when the first screw a and the second screw b are fastened, the horizontal bracket 132 is fixedly connected with the first bar-shaped groove 12.
In the embodiment of the present application, the first direction x is defined as the positive direction of the first direction x when sliding upward, or the positive direction of the first direction x may be positioned when sliding downward, which is not limited in this embodiment of the present application, and it should be noted that the horizontal bracket 132 slides along the first direction x.
In the present embodiment, the horizontal bracket 132 enables the ranging sensor 15 to slide in the first direction x through the first bar-shaped groove T1, so that the position of the ranging sensor 15 in the first direction x is changed.
In one possible implementation manner, the first bar-shaped bracket 12 is provided with a second bar-shaped groove T2, the length direction of the second bar-shaped groove T2 is a second direction y, and the second direction y is perpendicular to the first direction x; the mounting base 11 is provided with a third fixing hole C and a fourth fixing hole D, and the device can also comprise a third screw C and a fourth screw D;
the third screw C passes through the second bar-shaped groove T2 and the third fixing hole C, and the fourth screw D passes through the second bar-shaped groove T2 and the third fixing hole D;
the first bar bracket 12 is used for sliding along the second direction y when the third screw c and the fourth screw d are not fastened, and is fixed on the mounting base after the third screw c and the fourth screw d are fastened.
Specifically, referring to fig. 4, fig. 4 is a plan view of the connection of the first bar bracket 12 and the mounting base 11. The first bar bracket 12 is provided with a second bar groove T2, and the length direction of the second bar groove T2 is defined as a second direction y, and the second direction y is perpendicular to the first direction x. Two holes, namely a third fixing hole C and a fourth fixing hole D, are formed in the mounting base 11 and are used for fixedly connecting the first bar-shaped support 12. The device further comprises a third screw c and a fourth screw d. Wherein the third screw C passes through the second slot T2 and the third fixing hole C, and the fourth screw D passes through the second slot T2 and the fourth fixing hole D. When the third screw c and the fourth screw d are not fastened, the first bar bracket 12 slides in the second direction y, and when the third screw c and the fourth screw d are fastened, the first bar bracket 12 is fixed to the mounting base 11.
Here, referring to fig. 4, the second direction y is defined as the positive direction of the second direction y when sliding rightward, or the positive direction of the second direction y may be positioned when sliding leftward, which is not limited in the embodiment of the present application, and it should be noted that the first bar bracket 12 slides rightward and leftward along the second direction y.
In the embodiment of the application, the first bar bracket 12 realizes that the ranging sensor 15 slides in the second direction y through the second bar slot T2, so that the position of the ranging sensor 15 changes in the second direction y.
In a possible implementation manner, the vertical bracket 131 is provided with a third strip-shaped groove T3, the third strip-shaped bracket 14 is provided with a fifth fixing hole E and a sixth fixing hole F, and the device can further comprise a fifth screw E and a sixth screw F;
the fifth screw E passes through the third bar-shaped groove T3 and the fifth fixing hole E, and the sixth screw F passes through the third bar-shaped groove T3 and the sixth fixing hole F;
the third bar bracket 14 is used for sliding along the third direction z when the fifth screw e and the sixth screw f are not fastened, and is fixedly connected with the vertical bracket 131 after the fifth screw e and the sixth screw f are fastened.
Specifically, referring to fig. 5, fig. 5 is a side view of the vertical bracket 131 connected to a third bar bracket. The vertical bracket 131 is provided with a third bar-shaped groove T3, the vertical bracket 131 is positioned in a third direction z along the up-and-down sliding direction of the third bar-shaped groove T3, and the third direction z is mutually perpendicular to the first direction x. Two holes, a fifth fixing hole E and a sixth fixing hole F, are formed in the third bar bracket 14 for fixedly connecting the vertical bracket 132. The device further comprises a fifth screw e and a sixth screw f. Wherein, the fifth screw E passes through the third bar-shaped groove T3 and the fifth fixing hole E, and the sixth screw F passes through the third bar-shaped groove T3 and the sixth fixing hole F. The third bar bracket 14 slides along the third direction z when the fifth screw e and the sixth screw f are not fastened, and the third bar bracket 14 is fixed to the vertical bracket 131 when the fifth screw e and the sixth screw f are fastened.
In the embodiment of the present application, the third direction z is defined as the positive direction of the third direction z when sliding upward, and the positive direction of the third direction z may be positioned when sliding downward, which is not limited in this embodiment of the present application, and it should be noted that the third bar bracket 14 slides up and down along the third direction z.
In the embodiment of the application, the vertical bracket 131 realizes that the ranging sensor 15 slides in the third direction z through the third bar-shaped groove T3, so that the distance between the ranging sensor 15 and the base 22 to be detected changes in the third direction z.
In one possible implementation, the controller 16 may be specifically configured to:
when the base 22 to be detected rotates, the distance measuring sensor 15 is controlled to acquire a plurality of vertical distances according to a preset sampling interval, wherein the plurality of vertical distances are the distances in the vertical direction between the base 22 to be detected and the distance measuring sensor 15 when the base 22 to be detected rotates for one circle;
searching a maximum vertical distance and a minimum vertical distance in the plurality of vertical distances, and calculating a difference value of the maximum vertical distance and the minimum vertical distance;
the difference is taken as the levelness of the base 22 to be detected.
Wherein the upper surface of the base 22 to be inspected is circular. Referring to fig. 2, a rotating base 23 is provided on an iron base 21 in the epitaxial apparatus, and the rotating base 23 rotates at a constant speed to drive a base 22 to be detected to rotate at a constant speed.
The ranging sensor 15 is a laser probe 15, the sampling period of the laser probe 15 is defined as a preset sampling interval, the controller 16 controls the laser probe 15 to collect a plurality of vertical distances between the laser probe 15 and the base 22 to be detected according to the preset sampling interval, and the laser probe 15 can ensure that the plurality of measured vertical distances are distances between the laser probe 15 and the base 22 to be detected.
In particular, reference may be made to fig. 6, fig. 7 being a front view of the distance measuring sensor 15 and the base 22 to be detected. The distance measuring sensor 15 is projected as a point M perpendicularly to the base 22 to be detected, and the distance between the laser probe 15 and the point M is a perpendicular distance l i I=1, 2, …, N is the total number of sampling points. Referring to fig. 7, fig. 7 is a top view of the base 22 to be inspected. When the base 22 to be detected rotates clockwise at a constant speed, the laser probe 15 collects vertical distances corresponding to a plurality of sampling points on the base 22 to be detected at preset sampling intervals. Since the value of the levelness is small, which may be about 0.1mm, the vertical distance is about equal to the levelness.
Specifically, when the base 22 to be detected rotates at a constant speed, the vertical distance l between the plurality of laser probes 15 and the base 22 to be detected is collected i . From a plurality of vertical distances l by the controller 16 i The maximum vertical distance l is screened out max And a minimum vertical distance l min For maximum vertical distance l max And a minimum vertical distance l min The difference is calculated and taken as the levelness of the base 22 to be detected.
In one possible implementation, the epitaxy apparatus further comprises a triangular support structure located below the ferrous bottom plate 21 for adjusting the levelness of the susceptor to be inspected; the controller 16 may also be configured to:
judging whether the levelness of the base 22 to be detected is less than or equal to a preset levelness;
if the levelness of the base 22 to be detected is smaller than or equal to the preset levelness, determining that the base 22 to be detected meets the standard process requirement;
if the levelness of the base 22 to be detected is greater than the preset levelness, determining that the base 22 to be detected does not meet the standard process requirement, and generating prompt information for prompting a user to adjust the triangular support structure.
Wherein, epitaxial equipment still includes the triangle bearing structure that is located the below of iron bottom plate 21, through adjusting triangle bearing structure's position, adjusts the levelness of the base 22 that waits to detect.
The device also comprises a warning lamp, the warning lamp is controlled to flash through the prompt information, so that a user is prompted that the levelness of the base 22 to be detected currently does not meet the standard technological requirements, and the triangular support structure needs to be adjusted.
Specifically, the controller 16 determines whether the levelness of the base 22 to be detected is equal to or less than a preset levelness. If the levelness of the base 22 to be detected is less than or equal to the preset levelness, it is determined that the base 22 to be detected meets the standard process requirement, and the method can be applied to the process. If the levelness of the base 22 to be detected is greater than the preset levelness, determining that the base 22 to be detected does not meet the standard process requirement, generating prompt information, and reminding a user that the levelness of the base 22 to be detected currently does not meet the standard process requirement through a warning lamp. For example, if the preset levelness is 0.5mm, if the levelness of the base 22 to be detected is less than or equal to 0.5mm, the base 22 to be detected meets the standard process requirement, and if the levelness of the base 22 to be detected is greater than 0.5mm, the base 22 to be detected does not meet the standard process requirement, and a prompt message is generated to remind the user that the levelness of the base 22 to be detected does not meet the standard process requirement.
In one possible implementation, the apparatus may further include a first drive component and a second drive component; the first driving part is arranged on the first bar bracket 12 and is electrically connected with the controller 16; the second driving part is arranged on the third bar bracket 14 and is electrically connected with the controller 16; the mounting base 11 comprises a first guide rail, and a second guide rail is mounted on the third bar bracket 14 in the length direction;
the controller 16 may also be configured to control the first driving component to drive the first bar bracket 12 to slide on the first rail, and control the second driving component to drive the third bar bracket 14 to slide on the second rail, so that the ranging sensor 15 moves above the inner ring 24 of the base 22 to be detected.
In the embodiment of the application, the first bar bracket 12, the second bracket 13 and the third bar bracket 14 of the device can be manually adjusted, so that the ranging sensor 15 is adjusted in the xyz direction, and also can be adjusted in the xyz direction through an automatic control mode.
The distance measuring sensor 15 is placed above the inner ring 24 of the base 22 to be detected, so as to improve the accuracy of a plurality of measured vertical distances, thereby improving the accuracy of judging the levelness of the base 22 to be detected, and the inner ring 24 of the base 22 to be detected can be specifically shown with reference to fig. 7.
Specifically, first, a first driving member is mounted on the first bar bracket 12, and the first driving member is electrically connected to the controller 16. The lower surface of the first bar bracket 12 is provided with a track chute. The mounting base 11 is provided with a first guide rail. The controller 16 controls the first driving part to drive the first bar bracket 12, so that the track chute of the first bar bracket 12 slides on the first guide rail.
Then, a second driving part is mounted on the third bar bracket 14, and the second driving part is electrically connected to the controller 16. The third bar bracket 14 is provided with a track chute. The vertical bracket 131 is provided with a second guide rail. The controller 16 controls the second driving component to drive the third bar bracket 14, so that the track chute of the third bar bracket 14 slides on the second guide rail.
Finally, a third drive member is mounted on the horizontal bracket 132, and is electrically connected to the controller 16. The lower surface of the horizontal bracket 132 is provided with a track chute. The upper surface of the first bar bracket 12 is provided with a third guide rail. The controller 16 controls the third driving part to drive the horizontal bracket 132, so that the track chute of the horizontal bracket 132 slides on the third guide rail, and the distance measuring sensor 15 moves in the xyz direction and is adjusted to be above the inner ring 24 of the base 22 to be detected.
By means of sliding changes of the first strip-shaped support, the second support and the third strip-shaped support in the xyz direction, the levelness of the base to be detected on different extension devices can be measured, and particularly, referring to fig. 8 and 9, it can be seen that the device has high universality.
The device for measuring the levelness of the base in the epitaxial equipment not only can determine the levelness of a new base to be detected in the actual process, but also can directly and nondestructively measure the base to be detected; through adjusting the relation of connection of first bar support and horizontal support, can adjust the direction slip of range finding sensor on first plane to through the relation of connection of third bar support and vertical support, can adjust range finding sensor and slide in the direction of perpendicular to first plane, can accurately adjust range finding sensor for the position of the base that waits to detect, improve the measurement accuracy, and through mounting base, first bar support, second support and third bar support, can realize measuring the board of different grade type, the device has very high commonality.
It should be understood that the sequence number of each step in the foregoing embodiment does not mean that the execution sequence of each process should be determined by the function and the internal logic of each process, and should not limit the implementation process of the embodiment of the present application in any way.
The above embodiments are only for illustrating the technical solution of the present application, and are not limiting; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application, and are intended to be included in the scope of the present application.

Claims (10)

1. A device for measuring the levelness of a susceptor in an epitaxial apparatus, said device comprising: the device comprises a mounting base, a first bar-shaped bracket, a second bracket, a third bar-shaped bracket, a distance measuring sensor and a controller; the epitaxial equipment comprises an iron bottom plate and a base to be detected;
the mounting base is positioned on the iron bottom plate, the first bar-shaped bracket is mounted on the mounting base and is parallel to a first plane, and the first plane is a plane in which the upper surface of the mounting base is positioned;
the second bracket comprises a vertical bracket and a horizontal bracket, the horizontal bracket is parallel to the first plane, the vertical bracket is perpendicular to the first plane, and the vertical bracket is fixedly connected with the horizontal bracket; the horizontal bracket is positioned on the first strip-shaped bracket and is in sliding connection with the first strip-shaped bracket in a direction parallel to a first plane;
the third bar-shaped bracket is in sliding connection with the vertical bracket in the direction vertical to the first plane and is fixedly connected with the ranging sensor;
the distance measuring sensor is used for measuring the vertical distance between the base to be detected and the distance measuring sensor in the rotating process;
the controller is used for determining the levelness of the base to be detected based on the vertical distance between the base to be detected and the ranging sensor in the rotating process.
2. The device for measuring the levelness of the susceptor in the epitaxial equipment according to claim 1, wherein the horizontal bracket is provided with a first strip-shaped groove, and the length direction of the first strip-shaped groove is a first direction; the first bar-shaped bracket is provided with a first fixing hole and a second fixing hole, and the device further comprises a first screw and a second screw;
the first screw passes through the first bar-shaped groove and the first fixing hole, and the second screw passes through the first bar-shaped groove and the second fixing hole;
the horizontal bracket is used for sliding along the first direction when the first screw and the second screw are not fastened, and is fixed on the first bar bracket after the first screw and the second screw are fastened.
3. The device for measuring the levelness of the susceptor in the epitaxial apparatus according to claim 2, wherein the first bar-shaped bracket is provided with a second bar-shaped groove, the length direction of the second bar-shaped groove is a second direction, and the second direction is perpendicular to the first direction; the mounting base is provided with a third fixing hole and a fourth fixing hole, and the device further comprises a third screw and a fourth screw;
the third screw passes through the second bar-shaped groove and the third fixing hole, and the fourth screw passes through the second bar-shaped groove and the third fixing hole;
the first bar-shaped bracket is used for sliding along the second direction when the third screw and the fourth screw are not fastened, and is fixed on the mounting base after the third screw and the fourth screw are fastened.
4. A device for measuring the levelness of a susceptor in epitaxial equipment according to any one of claims 2 or 3, wherein a third bar-shaped groove is formed on the vertical support, the length direction of the third bar-shaped groove is a third direction, and the third direction is perpendicular to the first direction; the third bar-shaped bracket is provided with a fifth fixing hole and a sixth fixing hole, and the device further comprises a fifth screw and a sixth screw;
the fifth screw passes through the third bar-shaped groove and the fifth fixing hole, and the sixth screw passes through the third bar-shaped groove and the sixth fixing hole;
the third bar-shaped bracket is used for sliding along the third direction when the fifth screw and the sixth screw are not fastened, and is fixedly connected with the vertical bracket after the fifth screw and the sixth screw are fastened.
5. The apparatus for measuring the levelness of a susceptor in an epitaxial device according to claim 1, wherein said controller is specifically configured to:
when the base to be detected rotates, the distance measuring sensor is controlled to acquire a plurality of vertical distances according to a preset sampling interval, wherein the plurality of vertical distances are distances in the vertical direction between the base to be detected and the distance measuring sensor when the base to be detected rotates for one circle;
searching a maximum vertical distance and a minimum vertical distance in the plurality of vertical distances, and calculating a difference value of the maximum vertical distance and the minimum vertical distance;
and taking the difference value as the levelness of the base to be detected.
6. The apparatus for measuring the levelness of a susceptor in an epitaxial apparatus according to claim 5, further comprising a triangular support structure located below said ferrous base plate for adjusting the levelness of the susceptor to be inspected; the controller is further configured to:
judging whether the levelness of the base to be detected is smaller than or equal to a preset levelness;
if the levelness of the base to be detected is smaller than or equal to the preset levelness, determining that the base to be detected meets standard process requirements;
if the levelness of the base to be detected is greater than the preset levelness, determining that the base to be detected does not meet the standard process requirement, and generating prompt information, wherein the prompt information is used for prompting a user to adjust the triangular support structure.
7. The apparatus for measuring the levelness of a susceptor in an epitaxial device of claim 1, wherein the apparatus further comprises a first driving member and a second driving member;
the first driving component is arranged on the first bar-shaped bracket and is electrically connected with the controller;
the second driving part is arranged on the third bar-shaped bracket and is electrically connected with the controller;
the first guide rail is arranged on the mounting base, and the second guide rail is arranged on the vertical support in the length direction;
the controller is further configured to:
the first driving part is controlled to drive the first bar-shaped support to slide on the first guide rail, and the second driving part is controlled to drive the third bar-shaped support to slide on the second guide rail, so that the ranging sensor moves to the position above the inner ring of the base to be detected.
8. The apparatus for measuring the levelness of a susceptor in an epitaxial device of claim 1, wherein said mounting base is a magnetic base for being attached to said ferrous base plate.
9. The apparatus for measuring the levelness of a susceptor in an epitaxial device of claim 1, wherein said ranging sensor is a laser probe.
10. The apparatus for measuring levelness of a susceptor in an epitaxial device of claim 1, wherein the first bar-shaped support, the second bar-shaped support, and the third bar-shaped support are all aluminum supports.
CN202310510939.1A 2023-05-08 2023-05-08 Device for measuring levelness of base in epitaxial equipment Pending CN116518229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202310510939.1A CN116518229A (en) 2023-05-08 2023-05-08 Device for measuring levelness of base in epitaxial equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310510939.1A CN116518229A (en) 2023-05-08 2023-05-08 Device for measuring levelness of base in epitaxial equipment

Publications (1)

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CN116518229A true CN116518229A (en) 2023-08-01

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102025171B1 (en) * 2018-12-26 2019-09-25 한전케이피에스 주식회사 Supporting device for sensor three-dimensional position adjustable
CN212871273U (en) * 2020-10-20 2021-04-02 本钢板材股份有限公司 Three-dimensional vector adjustment sensor support
CN214407428U (en) * 2021-01-27 2021-10-15 京东方科技集团股份有限公司 Flatness detection equipment and system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102025171B1 (en) * 2018-12-26 2019-09-25 한전케이피에스 주식회사 Supporting device for sensor three-dimensional position adjustable
CN212871273U (en) * 2020-10-20 2021-04-02 本钢板材股份有限公司 Three-dimensional vector adjustment sensor support
CN214407428U (en) * 2021-01-27 2021-10-15 京东方科技集团股份有限公司 Flatness detection equipment and system

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Application publication date: 20230801