CN116515160A - Method for producing radiation cooling film - Google Patents

Method for producing radiation cooling film Download PDF

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Publication number
CN116515160A
CN116515160A CN202310495881.8A CN202310495881A CN116515160A CN 116515160 A CN116515160 A CN 116515160A CN 202310495881 A CN202310495881 A CN 202310495881A CN 116515160 A CN116515160 A CN 116515160A
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CN
China
Prior art keywords
slurry
radiation cooling
porous polydimethylsiloxane
cooling film
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202310495881.8A
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Chinese (zh)
Inventor
马瑞华
马东艳
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Panzhihua University
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Panzhihua University
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Filing date
Publication date
Application filed by Panzhihua University filed Critical Panzhihua University
Priority to CN202310495881.8A priority Critical patent/CN116515160A/en
Publication of CN116515160A publication Critical patent/CN116515160A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/28Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2201/00Foams characterised by the foaming process
    • C08J2201/04Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
    • C08J2201/05Elimination by evaporation or heat degradation of a liquid phase
    • C08J2201/0502Elimination by evaporation or heat degradation of a liquid phase the liquid phase being organic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2201/00Foams characterised by the foaming process
    • C08J2201/04Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
    • C08J2201/05Elimination by evaporation or heat degradation of a liquid phase
    • C08J2201/0504Elimination by evaporation or heat degradation of a liquid phase the liquid phase being aqueous
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)

Abstract

The invention discloses a preparation method, in particular a preparation method for a radiation cooling film, and belongs to the technical field of design and manufacture of constructional engineering structures. The preparation method for the radiation cooling film can realize cooling under the irradiation of the sun. The preparation method at least comprises two steps of preparing the porous polydimethylsiloxane slurry and forming the porous polydimethylsiloxane film, wherein the porous polydimethylsiloxane film is formed by coating the prepared porous polydimethylsiloxane slurry on a substrate and then airing in the air.

Description

Method for producing radiation cooling film
Technical Field
The invention relates to a preparation method, in particular to a preparation method for a radiation cooling film, and belongs to the technical field of design and manufacture of constructional engineering structures.
Background
In the daytime, the sunlight irradiates the object to raise the temperature of the object, and particularly in hot summer, strong solar radiation can cause the problems of weakening or damaging the performance of equipment, raising the temperature of a human body and the like. The existing radiation cooling technology is mainly made of silver plates or aluminum plates as substrates and inorganic materials, and the radiation cooling materials are stiff and inflexible, cannot be bent and cannot meet the requirement of shape deformation during equipment/human body movement. How to prepare a material capable of shielding, insulating heat and preserving temperature for equipment and/or human body under strong sunlight irradiation becomes a technical problem which needs to be solved by those skilled in the art.
Disclosure of Invention
The technical problems to be solved by the invention are as follows: the preparation method for the radiation cooling film can realize cooling under the irradiation of the sun.
The technical scheme adopted for solving the technical problems is as follows: a preparation method for a radiation cooling film at least comprises two steps of preparing porous polydimethylsiloxane slurry and forming the porous polydimethylsiloxane film,
the porous polydimethylsiloxane film is formed by coating the prepared porous polydimethylsiloxane slurry on a substrate and then airing and forming in the air.
Further, when preparing the porous polydimethylsiloxane slurry, firstly mixing n-hexane and porous polydimethylsiloxane according to the mass ratio of 5:1, and then stirring for 30-50 minutes at normal temperature to fully mix to prepare the slurry.
The preferable mode of the scheme is that the stirring time is 40 minutes.
Further, after the slurry preparation is completed, deionized water is added into the slurry and a curing agent is added into the slurry to be fully stirred again before the porous polydimethylsiloxane film is formed, so that quick-drying slurry is obtained.
The preferred mode of the scheme is that the porous polydimethylsiloxane film is required to be shaped after being molded, and in the specific process,
and (3) placing the dried sample into an oven, and keeping the drying temperature between 95 and 105 ℃ for drying for at least 50 minutes to finish the shaping work.
Further, the drying temperature was 100 ℃.
The preferable mode of the scheme is that the drying time is 60 minutes.
Further, the substrate is an acrylic plate
The beneficial effects of the invention are as follows: the radiation cooling film is prepared by adopting the steps of preparing porous polydimethylsiloxane slurry and molding the porous polydimethylsiloxane film, wherein the preparation method is realized by coating the prepared porous polydimethylsiloxane slurry on a substrate and then airing and molding in air when the porous polydimethylsiloxane film is molded. The porous structure enhances the reflectivity, so that the prepared porous polydimethylsiloxane film has higher high reflectivity to reflect direct sunlight, and the temperature rise of equipment/human body caused by direct sunlight is reduced; in addition, the prepared porous polydimethylsiloxane film has higher emissivity, and emits heat in equipment/human bodies into the air in the form of infrared microwaves, so that the cooling film has the function of realizing cooling under the irradiation of the sun.
Detailed Description
In order to solve the technical problems in the prior art, the invention provides a preparation method for a radiation cooling film, which can realize cooling under solar irradiation. The preparation method at least comprises two steps of preparing the porous polydimethylsiloxane slurry and forming the porous polydimethylsiloxane film, wherein the porous polydimethylsiloxane film is formed by coating the prepared porous polydimethylsiloxane slurry on a substrate and then airing in the air. The radiation cooling film is prepared by adopting the steps of preparing porous polydimethylsiloxane slurry and molding the porous polydimethylsiloxane film, wherein the preparation method is realized by coating the prepared porous polydimethylsiloxane slurry on a substrate and then airing and molding in air when the porous polydimethylsiloxane film is molded. The cooling film has the function of cooling under the irradiation of the sun.
Correspondingly, in order to improve the preparation efficiency and ensure the quality of the prepared cooling film, when the porous polydimethylsiloxane slurry is prepared, n-hexane and porous polydimethylsiloxane are mixed according to the mass ratio of 5:1, and then stirred for 30-50 minutes at normal temperature, so that the slurry is prepared. The stirring time is 40 minutes. After the slurry preparation is completed, deionized water is added into the slurry before the porous polydimethylsiloxane film is formed, and a curing agent is added into the slurry to be fully stirred again, so that quick-drying slurry is obtained. More specifically, the porous polydimethylsiloxane film is required to be shaped after being molded, and in the specific process,
and (3) placing the dried sample into an oven, and keeping the drying temperature between 95 and 105 ℃ for drying for at least 50 minutes to finish the shaping work. The drying temperature was 100 ℃. The drying time was 60 minutes. The substrate is an acrylic plate.
The technical scheme of the application is further described by the following specific examples:
example 1
The manufacturing steps are as follows:
1. the n-hexane and porous polydimethylsiloxane were mixed in a mass ratio of 5:1 and stirred for 40 minutes for thorough mixing.
2. Deionized water and a porous polydimethylsiloxane curing agent are respectively added into the mixture, and the mixture is fully stirred.
3. The mixed solution is evenly coated on an acrylic plate and dried in the air.
4. The dried sample was placed in an oven at a temperature of 100 c and dried for 1 hour.
Finally, a porous polydimethylsiloxane film is formed, and the film has the functions of reflecting sunlight and dissipating heat of an object in the form of infrared rays.

Claims (8)

1. The preparation method for the radiation cooling film is characterized by comprising the following steps of: the preparation method at least comprises two steps of preparing the porous polydimethylsiloxane slurry and forming the porous polydimethylsiloxane film,
the porous polydimethylsiloxane film is formed by coating the prepared porous polydimethylsiloxane slurry on a substrate and then airing and forming in the air.
2. The method for producing a radiation cooling film according to claim 1, wherein: when the porous polydimethylsiloxane slurry is prepared, n-hexane and porous polydimethylsiloxane are mixed according to the mass ratio of 5:1, and then stirred for 30-50 minutes at normal temperature, and the slurry is prepared by fully mixing.
3. The method for producing a radiation cooling film according to claim 2, wherein: the stirring time is 40 minutes.
4. A method for producing a radiation cooling film according to claim 1, 2 or 3, characterized in that: after the slurry preparation is completed, deionized water is added into the slurry and a curing agent is added into the slurry before the porous polydimethylsiloxane film is formed, and the slurry is fully stirred again to obtain quick-drying slurry.
5. The method for producing a radiation cooling film according to claim 4, wherein: the porous polydimethylsiloxane film is also required to be shaped after being molded, and the specific process is that,
and (3) placing the dried sample into an oven, and keeping the drying temperature between 95 and 105 ℃ for drying for at least 50 minutes to finish the shaping work.
6. The method for producing a radiation cooling film according to claim 5, wherein: the drying temperature was 100 ℃.
7. The method for producing a radiation cooling film according to claim 6, wherein: the drying time was 60 minutes.
8. The method for producing a radiation cooling film according to claim 7, wherein: the substrate is an acrylic plate.
CN202310495881.8A 2023-05-05 2023-05-05 Method for producing radiation cooling film Pending CN116515160A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202310495881.8A CN116515160A (en) 2023-05-05 2023-05-05 Method for producing radiation cooling film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310495881.8A CN116515160A (en) 2023-05-05 2023-05-05 Method for producing radiation cooling film

Publications (1)

Publication Number Publication Date
CN116515160A true CN116515160A (en) 2023-08-01

Family

ID=87389920

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202310495881.8A Pending CN116515160A (en) 2023-05-05 2023-05-05 Method for producing radiation cooling film

Country Status (1)

Country Link
CN (1) CN116515160A (en)

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