CN116479391A - Manufacturing method of superhard scratch-resistant coating cover plate and cover plate - Google Patents
Manufacturing method of superhard scratch-resistant coating cover plate and cover plate Download PDFInfo
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- CN116479391A CN116479391A CN202310289455.9A CN202310289455A CN116479391A CN 116479391 A CN116479391 A CN 116479391A CN 202310289455 A CN202310289455 A CN 202310289455A CN 116479391 A CN116479391 A CN 116479391A
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- scratch
- cover plate
- superhard
- resistant
- layer
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 239000006120 scratch resistant coating Substances 0.000 title claims abstract description 19
- 230000003678 scratch resistant effect Effects 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 238000004544 sputter deposition Methods 0.000 claims abstract description 27
- 238000007747 plating Methods 0.000 claims abstract description 9
- 239000011521 glass Substances 0.000 claims abstract description 8
- 239000011261 inert gas Substances 0.000 claims description 12
- 125000004429 atom Chemical group 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052754 neon Inorganic materials 0.000 claims description 4
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000012780 transparent material Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 5
- 239000003086 colorant Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 238000006748 scratching Methods 0.000 abstract description 2
- 230000002393 scratching effect Effects 0.000 abstract description 2
- 238000005457 optimization Methods 0.000 description 7
- 230000004075 alteration Effects 0.000 description 3
- 238000003763 carbonization Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a manufacturing method of a superhard scratch-resistant coating cover plate and the cover plate, belonging to the field of light-transmitting films of electronic products, comprising the following steps: plating a connecting layer on the substrate; sputtering an ultrahard scratch-resistant layer on the substrate plated with the connecting layer; the base plate, the connecting layer and the superhard scratch-resistant layer form a scratch-resistant cover plate; the superhard scratch-resistant layer is carbonized X. The high-hardness carbonized X is generated, has the characteristic of ultra-high hardness, and can realize the special material effect of plating with the hardness exceeding Mohs hardness 8; the Mohs hardness of the conventional glass substrate is less than 3, and the Mohs hardness after plating the superhard scratch-resistant layer is more than 8, so that the cover plate plated with the superhard scratch-resistant layer is not easy to damage by scratching in use; the cover plate plated with the superhard scratch-resistant flower layer is suitable for 3D products, has no appearance difference such as different colors at the arc edge, and can be used for front and rear covers of mobile phones and watches; and is suitable for both curved and planar products.
Description
Technical Field
The invention relates to a superhard anti-reflection coating, in particular to a manufacturing method of a superhard scratch-resistant coating cover plate and the cover plate.
Background
At present, a mobile phone display screen is usually a glass cover plate, and due to collision friction with objects such as accessories and desktops, gravel or sharp edges are formed on the accessories and the desktops, so that obvious scratches are generated on the mobile phone cover plate. In order to prevent scratch in the prior art, a superhard scratch-resistant layer and other anti-reflection layers are used to form a multi-layer stack. In order to have a good superhard effect, the scratch-resistant layer is very thick, and the film layer can generate very large compressive stress due to long film plating time and thicker film layer, and the stress can obviously lead to deformation of the substrate, so that the appearance of the product is influenced. In order to control the counteracting deformation, the substrate needs to be pre-deformed during the manufacturing process, which increases the complexity of the manufacturing steps.
Therefore, a person skilled in the art provides a manufacturing method of a superhard scratch-resistant coating cover plate and a cover plate, so as to solve the problems in the prior art.
Disclosure of Invention
The invention aims to provide a manufacturing method of a superhard scratch-resistant coating cover plate and the cover plate, which are characterized in that a radio frequency magnetron sputtering reaction process is used for generating high-hardness carbonization X to form a superhard scratch-resistant layer, the superhard scratch-resistant coating cover plate has ultrahigh hardness and thin thickness, and two layers of stacked substrates cannot deform, so that the problems in the prior art are solved.
In order to achieve the above purpose, the present invention provides the following technical solutions:
a manufacturing method of a superhard scratch-resistant coating cover plate comprises the following steps:
plating a connecting layer on the substrate;
sputtering an ultrahard scratch-resistant layer on the substrate plated with the connecting layer; the base plate, the connecting layer and the superhard scratch-resistant layer form a scratch-resistant cover plate;
the superhard scratch-resistant layer is carbonized X.
As a technical optimization scheme of the invention, sputtering the superhard scratch-resistant layer on the substrate plated with the connecting layer comprises the following steps:
placing the substrate plated with the connecting layer in a vacuum environment of inert gas;
and sputtering an intermediate frequency carbon target and an X target on the substrate plated with the connecting layer simultaneously to generate carbon atoms and X atoms, depositing the carbon atoms and the X atoms on the surface of the connecting layer, bombarding the deposited carbon atoms and X atoms by inert gas ions generated by sputtering to obtain high energy, generating interatomic self-combination, and generating carbonized X as a superhard scratch-resistant layer.
As a technical optimization scheme of the invention, the X target is any one of aluminum, chromium, silicon and niobium.
As a technical optimization scheme of the invention, the inert gas introduced in the sputtering process is any one of helium, neon and argon.
As a technical optimization scheme of the invention, the thickness of the superhard scratch-resistant layer is 10-100nm.
As a technical optimization scheme of the invention, the Mohs hardness of the substrate plated with the superhard scratch-resistant layer is more than 8.
As a technical optimization scheme of the invention, the connecting layer is a silicon oxide layer, and the thickness of the silicon oxide layer is smaller than that of the superhard scratch-resistant layer.
As a technical optimization scheme of the invention, the substrate is made of transparent material and is any one of glass, resin or flexible PET.
A superhard scratch-resistant coating cover plate is prepared by the manufacturing method of the cover plate.
Compared with the prior art, the invention has the beneficial effects that:
1. the high-hardness carbonization X is generated by a radio frequency magnetron sputtering reaction process, has the characteristic of ultrahigh hardness, and can realize the special material effect of plating with the hardness exceeding Mohs hardness 8; the Mohs hardness of the conventional glass substrate is less than 3, and the Mohs hardness after plating the superhard scratch-resistant layer is more than 8, so that the cover plate plated with the superhard scratch-resistant layer is not easy to damage by scratching in use;
2. the cover plate plated with the superhard scratch-resistant flower layer is suitable for 3D products, has no appearance difference such as different colors at the arc edge, and can be used for front and rear covers of mobile phones and watches; and is suitable for both curved and planar products.
Drawings
FIG. 1 is a schematic view of the structure of the superhard scratch-resistant layer and substrate combination in the invention.
In the figure: 1. a superhard scratch resistant layer; 2. a connection layer; 3. a substrate.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the present invention, the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate an azimuth or a positional relationship based on that shown in the drawings. These terms are only used to better describe the present invention and its embodiments and are not intended to limit the scope of the indicated devices, elements or components to the particular orientations or to configure and operate in the particular orientations.
Also, some of the terms described above may be used to indicate other meanings in addition to orientation or positional relationships, for example, the term "upper" may also be used to indicate some sort of attachment or connection in some cases. The specific meaning of these terms in the present invention will be understood by those of ordinary skill in the art according to the specific circumstances.
Furthermore, the terms "mounted," "configured," "provided," "connected," and "connected" are to be construed broadly. For example, it may be a fixed connection, a removable connection, or a unitary construction; may be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements, or components. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
Furthermore, the terms "first," "second," and the like, are used primarily to distinguish between different devices, elements, or components (the particular species and configurations may be the same or different), and are not used to indicate or imply the relative importance and number of devices, elements, or components indicated. Unless otherwise indicated, the meaning of "a plurality" is two or more.
How the above technical problems are solved by the solutions of the present application will be described in detail below with reference to the accompanying drawings.
Referring to fig. 1, the invention discloses a manufacturing method of a superhard scratch-resistant coating cover plate, which comprises the following steps:
plating a connecting layer 2 on a substrate 3;
sputtering a superhard scratch-resistant layer 1 on the substrate 3 plated with the connecting layer 2; the base plate 3, the connecting layer 2 and the superhard scratch-resistant layer 3 are stacked to form a scratch-resistant cover plate;
the superhard scratch-resistant layer 1 is carbonized X.
The ultrahard scratch-resistant layer 1 and the connection layer 2 formed using the carbonized X are stacked on the substrate 3 to form a cap plate. Only two layers are stacked, the manufacturing process is simple, the stress generated in the manufacturing process is small, the base plate 3 cannot deform, and the manufactured cover plate can meet the use requirements of cover plates with different sizes.
Optionally, sputtering the super-hard scratch-resistant layer 1 on the substrate 3 coated with the connection layer 2 comprises:
placing the substrate 3 plated with the connection layer 2 in a vacuum environment of inert gas;
the substrate 3 plated with the connecting layer 2 is sputtered with an intermediate frequency carbon target and an X target simultaneously to generate carbon atoms and X atoms, the intermediate frequency carbon target and the X target are deposited on the surface of the connecting layer 2, the inert gas is excited into gas ions by a radio frequency ion source, the deposited carbon atoms and X atoms are bombarded by the inert gas ions generated by sputtering to obtain high energy, and the atoms are self-combined to generate carbonized X as the superhard scratch-resistant layer 1.
By adopting the intermediate frequency carbon target and the X target which are sputtered simultaneously, carbon atoms and X atoms can be generated simultaneously, the efficiency is improved, and the formed superhard scratch-resistant layer 1 is more uniform.
Optionally, the X target is any one of aluminum, chromium, silicon, and niobium.
Any one of aluminum, chromium, silicon and niobium is used as an X target material, and one of aluminum carbide, chromium carbide, silicon carbide and niobium carbide can be formed as the superhard scratch-resistant layer 1 after sputtering. Taking silicon carbide as an example, the super-hard scratch-resistant layer 1 has the advantages of wear resistance, cold and hot impact resistance and the like, and can lead the product to have higher wear resistance and scratch resistance.
Optionally, the inert gas introduced in the sputtering process is any one of helium, neon and argon.
The inert gas can be introduced simultaneously in the process of sputtering the carbon target and the X target, or after sputtering the carbon target and the X target. In order to have better sputtering effect, the vacuum environment before sputtering is introduced can be a high vacuum environment. The inert gases such as helium, neon, argon and the like have better stability, so that carbon atoms and X atoms can obtain higher energy, and then the interatomic self-combination can be efficiently completed.
Alternatively, the super-hard scratch-resistant layer 1 has a thickness of 10-100nm.
The super-hard scratch-resistant layer 1 formed by carbonization X has stronger hardness and scratch resistance, so the sputtering thickness is smaller. Too large a thickness of sputtering will stress the substrate 3, causing the substrate 3 to deform. And the thickness of the sputtering is too large, the sputtering time is long, and the sputtering efficiency is reduced. The sputtering thickness is small, the stress generated on the substrate 3 is small, the substrate 3 cannot deform, therefore, the substrate 3 does not need to be reversely deformed before sputtering, the step of pre-deformation is omitted, and the arc edge of the finally prepared cover plate cannot generate chromatic aberration in the 3D state.
Optionally, the substrate 3 coated with the super hard scratch resistant layer 1 has a mohs hardness greater than 8. The carbide X has higher hardness as the superhard scratch-resistant layer 1, is not easy to collide and wear in use as a screen or other panels, and has higher service life and safety performance.
Optionally, the connection layer 2 is a silicon oxide layer, and the thickness of the silicon oxide layer is smaller than that of the superhard scratch-resistant layer 1.
The ultra-thin silicon oxide is used as the connection layer 2 to increase the adhesion of the carbide X to the substrate 3. The thicknesses of the connecting layer 2 and the superhard scratch-resistant layer 1 are very thin, the stress on the substrate 3 is small, and the substrate 3 cannot deform. And the formed 3D cover plate has no different colors at the arc edge, and is suitable for curved and planar products. Because the thickness is very thin, two layers are stacked, the times of the generated reflection and the generated incident light are less, the reflection light and the incident light are not strong when being cancelled, the arc edge of the glass cover plate product has no obvious chromatic aberration, the reflection-enhancing layer is not required to be added, the light-transmitting effect is good, and the visual experience is good.
Optionally, the substrate 3 is made of transparent material, and is any one of glass, resin or flexible PET.
The material of the substrate 3 may be selected according to practical use requirements, and if the cover plate is used as a display screen of an electronic product, the substrate 3 may be selected as a glass substrate, preferably as glass ceramics.
A superhard scratch-resistant coating cover plate is prepared by the manufacturing method of the cover plate.
The cover plate prepared by the preparation method has the advantages of thin thickness, no color difference at the arc edge and better adaptability to different products.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
The foregoing description is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical solution of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (9)
1. The manufacturing method of the superhard scratch-resistant coating cover plate is characterized by comprising the following steps of:
plating a connecting layer on the substrate;
sputtering an ultrahard scratch-resistant layer on the substrate plated with the connecting layer; the base plate, the connecting layer and the superhard scratch-resistant layer form a scratch-resistant cover plate;
the superhard scratch-resistant layer is carbonized X.
2. The method for manufacturing the superhard scratch-resistant coating cover plate according to claim 1, wherein the step of sputtering the superhard scratch-resistant layer on the substrate plated with the connecting layer comprises the following steps:
placing the substrate plated with the connecting layer in a vacuum environment of inert gas;
and sputtering an intermediate frequency carbon target and an X target on the substrate plated with the connecting layer simultaneously to generate carbon atoms and X atoms, depositing the carbon atoms and the X atoms on the surface of the connecting layer, bombarding the deposited carbon atoms and X atoms by inert gas ions generated by sputtering to obtain high energy, generating interatomic self-combination, and generating carbonized X as a superhard scratch-resistant layer.
3. The method for manufacturing the superhard scratch-resistant coating cover plate according to claim 2, wherein the X target is any one of aluminum, chromium, silicon and niobium.
4. The method for manufacturing the superhard scratch-resistant coating cover plate according to claim 2 or 3, wherein the inert gas introduced in the sputtering process is any one of helium, neon and argon.
5. The method for manufacturing the superhard scratch-resistant coating cover plate according to claim 4, wherein the thickness of the superhard scratch-resistant layer is 10-100nm.
6. The method of claim 5, wherein the mohs hardness of the super hard scratch resistant coated substrate is greater than 8.
7. The method for manufacturing the superhard scratch-resistant coating cover plate according to claim 5, wherein the connecting layer is a silicon oxide layer, and the thickness of the silicon oxide layer is smaller than that of the superhard scratch-resistant layer.
8. The method for manufacturing the superhard scratch-resistant coating cover plate according to claim 2, wherein the substrate is made of transparent material and is any one of glass, resin or flexible PET.
9. The cover plate with the superhard scratch-resistant coating is characterized in that the cover plate is prepared by the cover plate manufacturing method of any one of 1-8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310289455.9A CN116479391A (en) | 2023-03-23 | 2023-03-23 | Manufacturing method of superhard scratch-resistant coating cover plate and cover plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310289455.9A CN116479391A (en) | 2023-03-23 | 2023-03-23 | Manufacturing method of superhard scratch-resistant coating cover plate and cover plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116479391A true CN116479391A (en) | 2023-07-25 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310289455.9A Pending CN116479391A (en) | 2023-03-23 | 2023-03-23 | Manufacturing method of superhard scratch-resistant coating cover plate and cover plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116479391A (en) |
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2023
- 2023-03-23 CN CN202310289455.9A patent/CN116479391A/en active Pending
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