CN116463690A - Linear laser beam auxiliary line anode scanning micro electroforming system - Google Patents
Linear laser beam auxiliary line anode scanning micro electroforming system Download PDFInfo
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- CN116463690A CN116463690A CN202310542458.9A CN202310542458A CN116463690A CN 116463690 A CN116463690 A CN 116463690A CN 202310542458 A CN202310542458 A CN 202310542458A CN 116463690 A CN116463690 A CN 116463690A
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- Prior art keywords
- laser beam
- linear laser
- linear
- anode
- stirring paddle
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- 238000005323 electroforming Methods 0.000 title claims abstract description 35
- 238000003756 stirring Methods 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000011521 glass Substances 0.000 claims abstract description 17
- 238000007493 shaping process Methods 0.000 claims abstract description 12
- 230000000149 penetrating effect Effects 0.000 claims abstract description 3
- 239000003792 electrolyte Substances 0.000 claims description 18
- 239000002313 adhesive film Substances 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 abstract description 27
- 238000009826 distribution Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000003292 glue Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005266 casting Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000010963 304 stainless steel Substances 0.000 description 1
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000003075 superhydrophobic effect Effects 0.000 description 1
- 230000036326 tumor accumulation Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
The invention discloses a linear laser beam auxiliary line anode scanning micro electroforming system, which comprises a stirring paddle, a line anode and a cathode substrate adhered with a glue film pattern, and is characterized in that: the device also comprises a linear laser beam shaping unit, a linear laser beam, a reflecting mirror and light-transmitting glass; the light-transmitting glass is fixed on the bottom surface of the stirring paddle; the linear laser beam is output by the linear laser beam shaping unit, reflected by the reflecting mirror, vertically downward emitted to the stirring paddle and emitted to the cathode substrate after penetrating through the transparent glass; the linear laser beam is parallel to the linear anode; the linear laser beam and the stirring paddle synchronously move. The invention has the advantages that: the electroforming technology adopts linear laser beam to assist line anode scanning, changes the traditional laser spot shape into linear laser beam, greatly improves the electrodeposition speed, and has higher thickness distribution uniformity and better quality of electroformed parts in the manufacture of mask micro-parts.
Description
Technical Field
The invention belongs to the technical field of mask electroforming manufacture, and particularly relates to a linear laser beam auxiliary line anode scanning micro electroforming system.
Background
The mask micro electroforming is one of the main technologies for manufacturing precise micro metal components because of the advantages of high forming precision, good surface quality, compact material, easy shape-property-appearance cooperative control, convenience for batch parallel manufacturing of multi-scale workpieces and the like of the workpieces. However, the existing mask micro electroforming technology has the defects of low electrodeposition speed, long production period, low uniformity of the thickness of a workpiece and the like, and limits wider application to a certain extent.
Aiming at the problem of uniform thickness of the mask micro electroforming, technological workers can obtain satisfactory electroforming effect by optimizing the structural shape and configuration form of a cathode and an anode, adding auxiliary anode or cathode, optimizing the stirring mode of electrolyte and the like. On the basis, if post-treatment operations such as precise machining, grinding, polishing and the like are further carried out, the thickness consistency of the electric casting can completely meet most application requirements. However, the above measures add to the process costs and complexity of operation to a great extent. The publication CN108588803a "an electrodeposition apparatus" employs a unique mask electrodeposition method that is significantly different from the conventional dip tank plating approach based on a large area fixed anode. The method utilizes a stirring paddle carrying an ultra-micro linear anode (inert) to make reciprocating scanning movement close to (not in contact with) the surface of the mask or the surface of the cathode to carry out mask electrodeposition. In the technology, on one hand, an electric field which is conveyed to an electrodeposition space of a cathode mask is highly localized and has extremely short distance, and meanwhile, an anode continuously performs periodic and comprehensive domain reciprocating movement, so that the electric field is uniformly distributed, and on the other hand, a flat bottom stirring paddle which is close to the surface of a cathode or a rubber mold and performs uniform reciprocating movement can generate a laminar flow field, so that a relatively uniformly distributed flow field is obtained. Thus, the method can obtain an electroformed article excellent in thickness uniformity. Theoretically, the electroformed member formed based on this technique does not require a homogenization post-treatment operation. However, the electrodeposition rate of this technique is still not high.
In order to improve the speed and efficiency of mask electrodeposition, continuous efforts are also made in the industry and academia, and irregular measures such as ultrasonic/megasonic stirring, magnetic field driven convection, auxiliary gradient temperature field, high-speed flushing and the like are developed, so that the speed and efficiency of mask electrodeposition can be improved to different degrees, however, the measures are extremely difficult to adapt to a large-area mask electrodeposition scene, and the main reasons are that the energy field is difficult to uniformly act on a large-area surface and the regulation difficulty is great. In addition, the ultrasonic/megasonic agitation is extremely easy to damage a mask or causes the electroformed part to fall off halfway due to the excessively high energy field.
Research and application (research on electrochemical deposition technology based on liquid constraint by Guangdong university of industry Zhu Jiajun and research on jet electrodeposition preparation process of a deposition layer in a superhydrophobic selective area of Nanjing aviation aerospace university Chen Yazai) show that after a laser energy field is superimposed on a jet electrodeposition area, the deposition speed is greatly improved, and the deposition localization (selectivity) is also remarkably improved. The reason is that the photo-thermal effect and the impact effect of the laser can obviously accelerate the convection speed of the electrolyte and the movement speed of charged particles, and increase the conductivity of the electrolyte, thereby greatly improving the exchange current density and the limiting current density of the electrodeposition area, and correspondingly, obviously improving the electrodeposition speed. However, the existing laser composite electrodeposition method also cannot meet the application requirements of large-area mask electroforming. The root cause is that it is difficult for a laser having a very small active area (a spot area of typically not more than 1 square millimeter) to rapidly and efficiently deliver an energy field to a large area (hundreds of square centimeters or more).
In view of the above situation, the present invention provides a linear laser beam assisted line anode scanning micro electroforming system. In the system, long linear laser and long linear line anode are arranged in parallel and very close to each other, and synchronously move in the electroforming process to act on the mask micro electroforming process in a compound energy field mode. The system can be used for preparing the micro electro-casting with high electro-deposition speed, high efficiency and high thickness uniformity.
Disclosure of Invention
The invention aims to provide a linear laser beam auxiliary line anode scanning micro electroforming system so as to realize mask micro electroforming with greatly improved electrodeposition speed, higher thickness distribution uniformity of electroformed parts and better electroformed part quality.
In order to achieve the above purpose, the technical scheme of the invention is as follows.
A linear laser beam assisted line anode scanning micro electroforming system comprises a power supply, a cathode substrate, a stirring paddle, electrolyte, a line anode and a cathode substrate adhered with a glue film pattern, and is characterized in that: the device also comprises a linear laser beam shaping unit, a linear laser beam, a reflecting mirror and light-transmitting glass; the light-transmitting glass is fixed on the bottom surface of the stirring paddle; the linear laser beam is output by the linear laser beam shaping unit, reflected by the reflecting mirror, vertically downward emitted to the stirring paddle and emitted to the cathode substrate after penetrating through the transparent glass; the linear laser beams are respectively positioned at two sides of the linear anode; the linear laser beam is parallel to the linear anode; the linear laser beam and the stirring paddle synchronously move.
The linear laser beam has a light spot width of 0.05-0.1 mm and an unlimited length, and can rapidly and efficiently convey a photo-thermal energy field to a large-area electrodeposition area.
The distance between the linear laser beam and the linear anode is 0.05-0.1 mm.
The distance from the transparent glass to the surface of the adhesive film pattern is 0.05-0.5 mm.
The stirring paddle is made of an acid and alkali corrosion resistant electric insulating material.
The wire anode and the cathode substrate are respectively and electrically connected with the positive electrode and the negative electrode of the power supply.
The adhesive film pattern and the cathode substrate are completely immersed in the electrolyte, the surface of the adhesive film pattern is 1-2 mm below the liquid level of the electrolyte, so that the wire anode can be completely immersed in the electrolyte, excessive liquid can be avoided, the whole stirring paddle is immersed to influence the transmission of laser, and the use amount of the electrolyte is reduced as much as possible.
The surface of the adhesive film pattern is parallel to the horizontal plane.
Compared with the prior art, the invention has the following advantages.
1. Greatly improving the electrodeposition speed
On the one hand, the photo-thermal effect and the impact effect of the laser can obviously accelerate the convection speed of the electrolyte and the movement speed of charged particles, and increase the conductivity of the electrolyte, thereby greatly improving the exchange current density and the limiting current density of an electrodeposition area, and greatly improving the electrodeposition speed; on the other hand, the long linear laser beam with the centimeter level or more is adopted to replace the traditional spot laser beam (the diameter is generally less than 1 millimeter), the scanning area of the laser energy field is increased by several orders of magnitude, and then the photo-thermal energy field can be rapidly and efficiently conveyed to the electrodeposition area of a large area, so that the electrodeposition speed of the whole area of the mask micro electroformed part is greatly improved.
2. The thickness distribution uniformity of the electroformed part is higher
The photo-thermal effect of the laser energy field can improve the liquid phase mass transfer speed and efficiency of each electrodeposition area of the micro electroforming to different degrees, but compared with the liquid phase mass transfer speed and efficiency improvement of the micro electrodeposition area which is originally in a mass transfer limited state, the liquid phase mass transfer speed and efficiency improvement of the macroscopic electrodeposition area which is originally in a good mass transfer environment condition (high mass transfer speed and efficiency) is limited. Under the action of a large-format laser energy field, the difference between the liquid phase mass transfer speed and the efficiency of the electrodeposited areas with different dimensions on the cathode surface can be greatly reduced, and the uniformity of the distribution of the flow field and the material concentration field is further improved, so that the current density and the electrodeposited speed of the electrodeposited whole area are more uniformly distributed, and further, the electroformed piece with higher uniformity of thickness distribution is obtained.
3. The electroformed product has better quality
Based on the technical scheme of the invention, the thickness distribution of the electroformed part is uniform, the liquid phase mass transfer speed and efficiency can be obviously improved, so that the electroformed part has higher precision, fewer defects such as pinholes and tumor accumulation, and better surface quality, and the electroformed part has better overall quality.
Drawings
FIG. 1 is a schematic view of the apparatus of the present invention.
Fig. 2 is a schematic top view of a linear laser beam.
FIG. 3 is a scanning electron microscope image of a linear laser beam assisted line anode scanning micro electroform.
Reference numerals and names in the drawings:
1. stirring paddles; 2. a reflecting mirror; 3. a reflecting mirror; 4. a linear laser beam; 5. a linear laser beam; 6. a linear laser beam shaping unit; 7. a laser generator; 8. a cathode substrate; 9. a film pattern; 10. a wire anode; 11. an electroforming tank; 12. light-transmitting glass; 13. depositing a layer; 14. a work table; 15. an electrolyte; 16. power supply
Detailed Description
The following describes the embodiments of the present invention further with reference to the drawings.
A linear laser beam assisted line anode scanning micro electroforming system is shown in figure 1, and comprises a stirring paddle 1, a line anode 10, a cathode substrate 8 adhered with a glue film pattern 9, a linear laser beam shaping unit 6, a linear laser beam 4, a linear laser beam 5, a reflecting mirror 2, a reflecting mirror 3 and transparent glass 12, wherein the transparent glass 12 is fixed on the bottom surface of the stirring paddle 1, the linear laser beam 4, the linear laser beam 5 is output by the linear laser beam shaping unit 6, reflected by the reflecting mirror 2 and the reflecting mirror 3, vertically and downwards irradiates the stirring paddle 1 and penetrates the transparent glass 12 to irradiate the cathode substrate 8, the linear laser beam 4 is respectively positioned on two sides of the line anode 10, the linear laser beam 4 is parallel to the line anode 10, the linear laser beam 5 and the stirring paddle 1 synchronously move, the anode 10 is a platinum sheet with the purity of 99.99% and the size of 90mm multiplied by 20mm multiplied by 50 mu m, and the stirring paddle 1 is made of acid and alkali corrosion resistant electric insulation material organic glass.
Firstly, a rectangular array adhesive film pattern is manufactured on a cathode substrate 8 made of 304 stainless steel materials with the dimensions of 90mm multiplied by 140mm multiplied by 2mm through the technological processes of pretreatment, spin coating, pre-drying, photoetching, developing and post-drying. Then the cathode substrate 8 adhered with the film pattern 9 is horizontally placed on a workbench 14 in an electroforming tank 11, the wire anode 10 and the cathode substrate 8 are respectively and electrically connected with the anode and the cathode of an electroforming power supply 16, the linear laser beam 4 is regulated, the spot width of the linear laser beam 5 is 0.05mm (see figure 2), the distance between the linear laser beam 4 and the wire anode 10 is 0.05mm, the distance between the transparent glass 12 and the surface of the film pattern 9 is 0.05mm, the surface of the film pattern 9 is 2mm below the liquid level of the electrolyte 15, and the surface of the film pattern 9 is kept parallel to the horizontal plane.
An electrolyte 15 (nickel sulfamate 500g/L, boric acid 15 g/L) was injected into the electroforming tank 11, the electrolyte temperature was maintained at 50.+ -. 1 ℃ and the pH of the electrolyte was maintained at 4.+ -. 0.2. A direct current power supply with voltage of 3V is used, a nanosecond laser generator 7 with wavelength of 532nm and power of 60W is started, the laser generator 7 is turned on, a stirring paddle 1 is driven to start reciprocating linear scanning movement from a starting point position set by a cathode substrate 8 to an end point position, linear laser beams 4 are arranged on two sides, a linear laser beam 5 and the stirring paddle 1 synchronously move, and a linear anode 10 is regulated to scan at a moving speed of 10 mm/s; when the deposited layer 13 reaches the thickness requirement of 1mm, the laser generator 7 and the linear laser beam shaping unit 6 are turned off, the electroforming power supply 16 is turned off, the scanning movement is stopped, the stirring paddle 1 is adjusted to the edge of the cathode substrate 8, the workpiece 16 is taken out, the workpiece is cleaned, dried and separated from the cathode substrate 8, and the electroforming process is completed. The scanning movement of the wire anode 10 is stopped, the laser generator 7 and the linear laser beam shaping unit 6 are turned off, the electroforming power supply 16 is turned off, the stirring paddle 1 is moved to the starting position, the workpiece (see fig. 3) is taken out, washed, dried and separated from the cathode substrate 8, and the electroforming process is completed.
Claims (8)
1. The utility model provides a fine electroforming system of sharp laser beam auxiliary line positive pole scanning, includes power (16), negative pole substrate (8), stirring rake (1), electrolyte (15), line positive pole (10) and has negative pole substrate (8) of glued membrane pattern (9), its characterized in that: the laser beam shaping device also comprises a linear laser beam shaping unit (6), linear laser beams (4) and (5), reflecting mirrors (2) and (3) and light-transmitting glass (12); the light-transmitting glass (12) is fixed on the bottom surface of the stirring paddle (1); the linear laser beams (4) and (5) are output by the linear laser beam shaping unit (6), reflected by the reflecting mirrors (2) and (3), vertically and downwards emitted to the stirring paddle (1) and emitted to the cathode substrate (8) by penetrating the transparent glass (12); the linear laser beams (4) and (5) are respectively positioned at two sides of the linear anode (10); the linear laser beams (4) and (5) are parallel to the linear anode (10); the linear laser beams (4) and (5) move synchronously with the stirring paddle (1).
2. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the light spot width of the linear laser beams (4) and (5) is 0.05-0.1 mm.
3. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the distance between the linear laser beams (4, 5) and the linear anode (10) is 0.05-0.1 mm.
4. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the distance from the transparent glass (12) to the surface of the adhesive film pattern (9) is 0.05-0.5 mm.
5. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the stirring paddle (1) is made of an acid and alkali corrosion resistant electric insulating material.
6. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the wire anode (10) and the cathode substrate (8) are electrically connected with the positive pole and the negative pole of the power supply (16), respectively.
7. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the adhesive film pattern (9) and the cathode substrate (8) are completely immersed in the electrolyte (15), and the surface of the adhesive film pattern (9) is positioned 1-2 mm below the liquid level of the electrolyte (15).
8. The linear laser beam assisted line anode scanning micro electroforming system of claim 1, wherein: the surface of the adhesive film pattern (9) is parallel to the horizontal plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310542458.9A CN116463690A (en) | 2023-05-15 | 2023-05-15 | Linear laser beam auxiliary line anode scanning micro electroforming system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310542458.9A CN116463690A (en) | 2023-05-15 | 2023-05-15 | Linear laser beam auxiliary line anode scanning micro electroforming system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116463690A true CN116463690A (en) | 2023-07-21 |
Family
ID=87173729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310542458.9A Pending CN116463690A (en) | 2023-05-15 | 2023-05-15 | Linear laser beam auxiliary line anode scanning micro electroforming system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116463690A (en) |
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2023
- 2023-05-15 CN CN202310542458.9A patent/CN116463690A/en active Pending
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