CN116463616A - Process chamber, base level monitoring method and control device - Google Patents
Process chamber, base level monitoring method and control device Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The application provides a process chamber, a base level monitoring method and a control device. The process chamber comprises a base, a bell jar, at least two ranging sensors and a control device; the base is positioned in the bell jar; the upper surface of the base is round; the at least two ranging sensors are arranged above the base and are positioned outside the bell jar; the projection positions of the at least two ranging sensors on the base are distributed around the center of the base, and the distances from the center of the base to the center of the base are the same; the at least two distance measuring sensors are used for measuring a plurality of distances from the base in the vertical direction during at least one circle of rotation of the base and transmitting the plurality of distances to the control device; the control device is used for judging whether the base is horizontal or not according to the plurality of distances. The method and the device can monitor the horizontal state of the base after the bell jar is installed, and improve the accuracy of monitoring the horizontal state of the base.
Description
Technical Field
The application relates to the technical field of semiconductor manufacturing, in particular to a process chamber, a base level monitoring method and a control device.
Background
The basic principle of a chemical vapor deposition epitaxial growth process is to deliver a process gas to a process chamber where it is heated to react, thereby depositing a film layer on a wafer. In this process, the wafer is typically placed in a wafer slot in the susceptor so that the susceptor can rotate the wafer continuously. It can be seen that whether the susceptor in the process chamber assembly module is horizontal is important for thickness uniformity, resistivity uniformity and thickness uniformity of the epitaxial wafer.
Currently, there are two monitoring methods for the base level: firstly, the base is corrected to be horizontal before the bell jar is not installed, but the disorder of the base in the direction in the assembly process can cause the level of the base to change, and at the moment, whether the base is horizontal in the bell jar or not cannot be measured; secondly, whether the base is horizontal or not is determined by monitoring the temperature fluctuation of the central position of the base, but the accuracy of the base horizontal monitoring is lower due to the hysteresis of the temperature fluctuation, and the data feedback is not timely, so that the quality of the produced product is unqualified. Therefore, how to monitor the base level after the bell is installed is currently an urgent consideration.
Disclosure of Invention
The application provides a process chamber, a base level monitoring method and a control device, which are used for solving the problem that the base level state cannot be monitored after a bell jar is installed in the prior art.
In a first aspect, the present application provides a process chamber comprising a base, a bell jar, at least two ranging sensors, and a control device;
the base is positioned in the bell jar; the upper surface of the base is round;
the at least two ranging sensors are arranged above the base and are positioned outside the bell jar; the at least two ranging sensors are positioned on the same horizontal plane, the projection positions of the at least two ranging sensors on the base are distributed around the circle center of the base, and the distances from the circle center of the base to the same; the at least two distance measuring sensors are used for measuring a plurality of distances from the distance measuring sensors to the base in the vertical direction in the process of rotating the base at least one circle, and the plurality of distances are sent to the control device;
the control device is used for judging whether the base is horizontal or not according to the distances.
In a second aspect, the present application provides a method of susceptor level monitoring, the method being applied to the process chamber of claim 1, the process chamber comprising a susceptor, a bell jar, at least two ranging sensors, and a control device, the method comprising:
measuring a plurality of distances from the at least two ranging sensors to the base in a vertical direction during at least one rotation of the base, and transmitting the plurality of distances to the control device;
and judging whether the base is horizontal or not according to the distances.
In a third aspect, the present application provides a control device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, the processor implementing the steps of the method according to the first aspect or any one of the possible implementations of the first aspect when the computer program is executed.
The application provides a process chamber, a base level monitoring method and a control device, wherein the level state of a base can be monitored after the bell is installed by installing at least two ranging sensors outside the bell; and by measuring a plurality of distances from at least two ranging sensors to the base in the vertical direction, whether the base is horizontal or not is judged, and the accuracy of monitoring the horizontal state of the base is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required for the embodiments or the description of the prior art will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic view of a process chamber according to an embodiment of the present application;
FIG. 2 is a schematic view of a projection of two ranging sensors evenly distributed according to an embodiment of the present application;
FIG. 3 is a schematic view of measurement points of two ranging sensors provided in an embodiment of the present application on a base;
FIG. 4 is a schematic view of a projection of a non-uniform distribution of two ranging sensors provided by an embodiment of the present application;
FIG. 5 is a schematic view of a projection of three ranging sensors evenly distributed according to an embodiment of the present application;
FIG. 6 is a flow chart of a base level monitoring method according to an embodiment of the present disclosure;
FIG. 7 is a schematic view of a structure of a base level monitor device according to an embodiment of the present disclosure;
fig. 8 is a schematic diagram of a control device according to an embodiment of the present application.
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system configurations, techniques, etc. in order to provide a thorough understanding of the embodiments of the present application. It will be apparent, however, to one skilled in the art that the present application may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.
For the purpose of making the objects, technical solutions and advantages of the present application more apparent, the following description will be made with reference to the accompanying drawings by way of specific embodiments.
Fig. 1 is a schematic structural diagram of a process chamber according to an embodiment of the present application. As shown in fig. 1, the process chamber includes a base 11, a bell jar 12, at least two ranging sensors, and a control device 16.
The base 11 is located within the bell 12. The upper surface of the base 11 is circular.
At least two distance measuring sensors are arranged above the base 11 and outside the bell 12. The at least two ranging sensors are positioned on the same horizontal plane, the projection positions of the at least two ranging sensors on the base 11 are distributed around the circle center of the base 11, and the distances from the circle center of the base 11 are the same. At least two distance measuring sensors are used to measure a plurality of distances to the base 11 in the vertical direction during at least one rotation of the base 11, and the plurality of distances are transmitted to the control device 16.
The control device 16 is used for judging whether the base 11 is horizontal or not according to the plurality of distances.
Since the base 11 is circular, as shown in fig. 1, if at least two ranging sensors include two ranging sensors, namely, the ranging sensor 13 and the ranging sensor 14, the two ranging sensors are located on the same horizontal plane, so that the distances from the two ranging sensors to the vertical direction of the base 11 are the same. Referring to fig. 2, the ranging sensor 13 and the ranging sensor 14 are at the same level and level with the plane of the base 11; the projection positions of the two distance measuring sensors on the base 11 are distributed around the center of the base 11. Referring to fig. 2, the projection position a of the ranging sensor 13 onto the base 11 is the same as the projection position B of the ranging sensor 14 onto the base 11, i.e., ao=bo, from the center O of the base 11.
The control device 16 is connected to at least two distance measuring sensors by wireless or wired means, not being limited herein. Referring to fig. 1, a connection line between the control device 16 and at least two ranging sensors is a dotted line, which indicates that the control device 16 in fig. 1 is wirelessly connected to the at least two ranging sensors, and a plurality of distance data sent by the at least two ranging sensors are acquired to determine whether the base 11 is horizontal.
In one possible implementation, the projection positions of the at least two distance measuring sensors on the base 11 are uniformly distributed around the center O of the base 11. The at least two distance measuring sensors comprise two distance measuring sensors, a first distance measuring sensor 13 and a second distance measuring sensor 14, respectively.
The first distance measuring sensor 13 is used for measuring a first distance l in the vertical direction of N measuring points on the base 11 in a first period when the base 11 rotates at a constant speed 1 ；
The second distance measuring sensor 14 is used for measuring a second distance l in the vertical direction of N measuring points on the base 11 in a first period when the base 11 rotates at a constant speed 2 。
Wherein, referring to fig. 2, two ranging sensors are provided, the projection positions of the two ranging sensors on the base 11 are uniformly distributed around the center O of the base 11, that is, the ranging sensors 13 and 14 equally divide the entire circular base 11 into two parts, and the projection position a of the ranging sensor 13 on the base 11 is the same as the projection position B of the ranging sensor 14 on the base 11, and the distance from the center O of the base 11 is the same.
In the embodiment of the present application, the N measurement points on the base 11 measured by the first ranging sensor 13 and the second ranging sensor 14 respectively are the same number and the same position of measurement points in the first period in which the base 11 rotates at a constant speed. The distribution of measurement points is specifically referred to fig. 3. Based on the same number and positions of measuring points, a first distance l including N measuring points is obtained 1 And a second distance l 2 The distances are specifically referred to in fig. 2.
In one possible implementation, the N/2 measurement points measured by the first ranging sensor 13 during the first half of the first period correspond to the N/2 measurement points measured by the second ranging sensor 14 during the second half of the first period;
the N/2 measurement points measured by the first ranging sensor 13 in the latter half of the first period correspond to the N/2 measurement points measured by the second ranging sensor 14 in the former half of the first period.
In the embodiment of the present application, referring to fig. 3, the base 11 rotates at a uniform speed clockwise (the direction indicated by the arrow in fig. 3). It is assumed that at the start time of one cycle, the point of projection of the first ranging sensor 13 on the base is point a, and the point of projection of the second ranging sensor 14 on the base is point B. The straight line at points a and B in fig. 3 equally divides the base into upper and lower semicircles in fig. 3. In one cycle, the susceptor rotates in the clockwise direction, assuming that the first ranging sensor 13 and the second ranging sensor 14 each measure N measurement points in the cycle. Then, in the first half of the period, the first ranging sensor 13 measures N/2 measurement points of the lower semicircle in fig. 3, and the second ranging sensor 14 measures N/2 measurement points of the upper semicircle in fig. 3; in the latter half of the cycle, the first ranging sensor 13 measures N/2 measurement points of the upper semicircle in FIG. 3, and the second ranging sensor 14 measures N/2 measurement points of the lower semicircle in FIG. 3. That is, the N/2 measurement points measured by the first ranging sensor 13 in the first half of the period correspond to the N/2 measurement points measured by the second ranging sensor 14 in the second half of the period, and are points in the lower semicircle in fig. 3; the N/2 measurement points measured by the first ranging sensor 13 in the latter half of the period correspond to the N/2 measurement points measured by the second ranging sensor 14 in the former half of the period, and are points in the upper semicircle in fig. 3.
Illustratively, referring to fig. 3, the i-th measurement point measured by the first ranging sensor 13 in the first half of one cycle corresponds to the i-th measurement point measured by the second ranging sensor 14 in the second half of one cycle.
In one possible implementation, the control device 16 is specifically configured to:
for each measuring point, the first distance l obtained by measuring the measuring point by the first distance measuring sensor 13 1 A second distance l obtained by measuring the measurement point with the second distance measuring sensor 14 2 Performing difference to obtain a first difference value corresponding to the measurement point;
if the first difference values corresponding to all the measurement points are smaller than or equal to the preset difference value, judging that the base 11 is horizontal;
or, selecting a plurality of target measurement points from all the measurement points, and if the first difference values corresponding to the plurality of target measurement points are smaller than or equal to the preset difference value, determining that the base 11 is horizontal.
In the embodiment of the present application, for each measurement point i of the N measurement points, the first distance l of the i-th measurement point measured by the first distance measuring sensor 13 i1 And a second distance l of the ith measurement point measured by the second distance measuring sensor 14 i2 Is sent to the control device 16, and the control device 16 sends the first distance l to i1 And a second distance l i2 And (3) taking a difference value to obtain a first difference value of the ith measuring point, and obtaining first difference values respectively corresponding to all the measuring points if the calculation processes of the first difference values of the rest measuring points are the same.
Either of the following two judgment conditions may be adopted for the judgment process:
first, it may be determined whether the first difference values of all the measurement points are equal to or less than the preset difference value, and if the first difference values of the measurement points are equal to or less than the preset difference value, it is determined that the base 11 is horizontal.
Second, if the distance between the measurement points of the ranging sensor is relatively close, a plurality of target measurement points can be selected from all the measurement points, and it is determined whether the plurality of target measurement points are all smaller than or equal to a preset difference value, and if the plurality of target measurement points are all smaller than or equal to the preset difference value, it is determined that the base 11 is horizontal.
The target measurement points are selected from all measurement points, and one measurement point can be selected according to a preset number of measurement points at intervals, for example, one measurement point is selected according to one measurement point at intervals, or one measurement point is selected according to two measurement points at intervals. The preset number of specific intervals can be set according to actual conditions and user requirements. It should be noted that the number of intervals cannot be wirelessly spaced, so that the acquired measurement points cannot accurately determine the horizontal state of the base.
In one possible implementation, if two ranging sensors are present, the positions of the two ranging sensors may also be shown with reference to fig. 4, where the projection positions of the two ranging sensors on the base 11 are distributed around the center O of the base 11, and the distances from the center O of the base are the same, i.e. a=b. When the base 11 rotates clockwise at a constant speed, one period may be divided into four 1/4 periods, and the measurement point measured by the first ranging sensor 13 in the first 1/4 period in one period corresponds to the measurement point measured by the second ranging sensor 14 in the second 1/4 period in the period. If three distance measuring sensors exist, the base can be judged whether to be horizontal or not according to the distance corresponding to the measuring points only by ensuring that the corresponding positions of the three distance measuring sensors are in a proportional relation and the measuring points of the corresponding positions are consistent.
In one possible implementation, the at least two ranging sensors include three ranging sensors including a first ranging sensor, a second ranging sensor, and a third ranging sensor, respectively. The projection position a of the first ranging sensor onto the base 11, the projection position B of the second ranging sensor onto the base 11, and the projection position C of the third ranging sensor onto the base 11 are in regular triangles.
In the embodiment of the present application, the ranging sensors may include three ranging sensors, namely, a first ranging sensor, a second ranging sensor, and a third ranging sensor. The projection positions of the three ranging sensors on the base 11 are distributed around the center O of the base 11, and the center distances to the base 11 are the same, i.e., ao=bo=co, and the connection line of the projection position a of the first ranging sensor, the projection position B of the second ranging sensor, and the projection position C of the third ranging sensor may form a regular triangle, referring to fig. 5, the triangle ABC is a regular triangle, i.e., ab=bc=ca.
Based on fig. 5, when the susceptor 11 rotates clockwise at a uniform speed in one cycle, the susceptor 11 is equally divided into an arc AB, an arc BC, and an arc CA, which correspond to the front, middle, and rear three 1/3 cycles of one cycle, respectively. Assume that three ranging sensors respectively measure N measurement points of the base 11 in one cycle. Wherein, in the first 1/3 period in one period, the first ranging sensor measures N/3 measuring points in the arc AC section, the second ranging sensor measures N/3 measuring points in the arc AB section, and the third ranging sensor measures N/3 measuring points in the arc BC section. That is, the N/3 measurement points measured by the first ranging sensor during the first 1/3 of the period, the N/3 measurement points measured by the second ranging sensor during the second 1/3 of the period, and the N/3 measurement points measured by the third ranging sensor during the third 1/3 of the period correspond to, and are points within the arc AC segment of FIG. 5; n/3 measuring points measured by the first ranging sensor in the second 1/3 period of the period, N/3 measuring points measured by the second ranging sensor in the third 1/3 period of the period, and N/3 measuring points measured by the third ranging sensor in the first 1/3 period of the period are corresponding and consistent, and are points in the arc BC section in FIG. 5; n/3 measuring points measured by the first ranging sensor in the third 1/3 period of the period, N/3 measuring points measured by the second ranging sensor in the first 1/3 period of the period, and N/3 measuring points measured by the third ranging sensor in the second 1/3 period of the period are corresponding and consistent, and are points in the arc AB section in FIG. 5.
In one possible implementation, the control device 16 may also be configured to:
selecting a maximum distance and a minimum distance from a plurality of distances measured by any one of at least two ranging sensors;
taking the difference between the maximum distance and the minimum distance to obtain a second difference value corresponding to the ranging sensor;
if the second difference value corresponding to the ranging sensor is smaller than or equal to the preset threshold value, the surface of the base 11 is judged to be flat.
In the embodiment of the present application, a plurality of distances l measured by any one of at least two ranging sensors i Is sent to the control device 16, and the control device 16 selects a maximum distance l from a plurality of distances l max And a minimum distance l min Will be maximum distance l max And a minimum distance l min And performing difference to obtain a second difference value l ', judging whether the second difference value l ' is smaller than or equal to a preset threshold epsilon, and if the second difference value l ' is smaller than or equal to the preset threshold epsilon, judging that the surface of the base 11 is flat, namely indicating that the current base meets the use standard.
Illustratively, a preset threshold ε of 0.7mm is set, a first distance of 18 measurement points measured by the first ranging sensor 13 during a first period is selected, and specific data can be seen in Table 1.
TABLE 1 first distance of 18 measurement points measured by first distance measuring sensor
| position | 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 |
| value | 105.885 | 105.815 | 105.905 | 105.99 | 105.965 | 105.89 | 105.865 | 105.755 | 105.73 |
| position | 10 | 11 | 12 | 13 | 14 | 15 | 16 | 17 | 18 |
| value | 105.635 | 105.455 | 105.615 | 105.65 | 105.665 | 105.67 | 105.815 | 105.82 | 105.795 |
It can be seen that the maximum distance is 105.99mm for the 4 th measurement point and the minimum distance is 105.455mm for the 11 th measurement point, then the second difference l 'is equal to 0.535mm, i.e., l' =l max -l min = 105.99-105.455 =0.535 mm, where l'<Epsilon indicates that the current base surface is flat, i.e., the current base meets the use standard.
In one possible implementation, the relationship between the rotational speed of the base 11 and the acquisition period of the at least two ranging sensors may be:
the base 11 is compared with the number of the distance measuring sensors according to the rotation speed, the corresponding angle between the at least two distance measuring sensors is obtained, the corresponding angle is compared with the rotation speed of the base 11, and the first time length is obtained, wherein the first time length is an integral multiple of the acquisition period of the at least two distance measuring sensors.
In this embodiment, since the upper surface of the base 11 is circular, according to the number N of the distance measuring sensors, the ratio is calculated by the angle of one rotation and the number N of the distance measuring sensors, and the base 11 can be equally divided into N portions, each of which has an angle of 360 °/N. Angular corresponding circumferential distance L for any part i For a circumferential distance L i Calculating the ratio with the rotation speed v of the base 11 to obtain a first time length T 1 Sampling period T for each ranging sensor 0 The integral multiple of the sampling period of each ranging sensor is the rotation speed of the base rotating at a uniform speed at the moment, so that the consistency of the measuring points of each ranging sensor on the base can be ensured.
Illustratively, the rotational speed of the base is set to v, two ranging sensors are provided, then n=2, and the sampling period of each ranging sensor is T 0 The circumference of the base can be equally divided into two semicircles, the angle of each semicircle is 180 degrees, and the corresponding circumference distance of each semicircle is L 1 Then byWherein a is a positive integer of 1 or more.
Also exemplary, setting the rotational speed of the base to v, and two ranging sensors, each ranging sensor having a sampling period of T, is provided, n=3 0 The circumference of the base can be equally divided into one third of circles, the angle of each third of circle is 120 DEG, and the corresponding circumference distance of each third of circle is L 1 Then by Wherein b is a positive integer greater than or equal to 1.
In one possible implementation, the process chamber may further include a reaction chamber upper cover module 18, the reaction chamber upper cover module 17 being horizontally fixed above the bell jar 12, at least two ranging sensors being mounted on the reaction chamber upper cover module 17 and below the reaction chamber upper cover module 17.
In this embodiment, referring to fig. 1, the reaction chamber upper cover module 17 is horizontally fixed on the bell jar 12, and the positions of the reaction chamber upper cover module 17 and the bell jar 12 are unchanged, at least two ranging sensors are fixed on the reaction chamber upper cover module 17, and the at least two ranging sensors are located below the reaction chamber upper cover module 17, so that the at least two ranging sensors can be guaranteed to be in the same horizontal plane.
In one possible implementation, at least two holes are provided above the bell 12, through which at least two distance measuring sensors measure a plurality of distances of the base 11 in the vertical direction, respectively.
In the embodiment of the present application, since the base 11 is installed in the bell jar 12, at least two holes are provided in the bell jar 12, and at least two ranging sensors are installed at positions corresponding to the holes in the bell jar 12, so that the ranging sensors can measure through the base in the Kong Duizhong bell jar 12.
In one possible implementation, the at least two ranging sensors are infrared sensors.
In the embodiment of the present application, at least two ranging sensors may be infrared sensors, and the distance between the infrared sensors and the base 11 is measured by finding the hole on the bell jar 12 and emitting infrared light.
For any infrared sensor, infrared rays are emitted from the hole on the bell 12 perpendicular to the base 11 in the bell 12, and the distance between the infrared sensor and the base is measured, so that the measured distance can be ensured to be the distance between the infrared sensor and the base 11.
In one possible implementation, the process chamber may further include a rotation shaft 15 for rotating the susceptor at a uniform speed.
In a possible implementation, the rotation shaft 15 may further comprise a rotation button, and when it is determined by the control device 16 that the base 11 is not in the horizontal state at the present moment, the rotation button may be adjusted so that the base 11 is in the horizontal state.
The application provides a process chamber, wherein the horizontal state of a base can be monitored after the bell is installed by installing at least two ranging sensors outside the bell; and by measuring a plurality of distances from at least two ranging sensors to the base in the vertical direction, whether the base is horizontal or not is judged, and the accuracy of monitoring the horizontal state of the base is improved.
Fig. 6 is a flowchart of an implementation of the base level monitoring method according to the embodiment of the present application, which is described in detail below:
the method is applied to the process chamber shown in fig. 1, which comprises a base 11, a bell jar 12, at least two distance measuring sensors and a control device 16, the method comprising:
in step 601, a plurality of distances in a vertical direction from at least two ranging sensors to the base are measured during at least one rotation of the base, and the plurality of distances are transmitted to the control device.
In the present embodiment, a plurality of distances in the vertical direction from at least two ranging sensors to the base 11 are measured and transmitted to the control device 16 during at least one rotation of the base 11.
In one possible implementation, if two distance measuring sensors are present, the first distance measuring sensor 13 measures a first distance of the base 11 in the vertical direction, the second distance measuring sensor 14 measures a second distance of the base 11 in the vertical direction, and the first distance and the second distance are sent to the control device 16 for calculation.
In one possible implementation, if there are three distance measuring sensors, the first distance measuring sensor measures a plurality of distances of the base 11 in the vertical direction, the second distance measuring sensor measures a plurality of distances of the base 11 in the vertical direction, and the third distance measuring sensor sends the plurality of distances to the control device 16.
In this application embodiment, when ranging sensor reaches three, both can realize accurately judging whether the base is horizontal, however, according to the user's demand, also can carry out a plurality of ranging sensor and measure again.
In step 602, it is determined whether the base is horizontal based on the plurality of distances.
In the present embodiment, it is determined by the control device 16 whether the base 11 is horizontal or not, based on a plurality of distances measured by at least two ranging sensors.
In one possible implementation, there are two distance measuring sensors, one of which is selected, and the maximum distance l is selected from the plurality of distances measured by the distance measuring sensors max And a minimum distance l min The maximum distance l is controlled by the control device 16 max And a minimum distance l min And calculating the difference value to obtain a second difference value, and if the second difference value is smaller than or equal to a preset threshold value, indicating that the surface of the base 11 is flat, namely indicating that the current base meets the use standard.
When judging that the current base accords with the use standard, for each measuring point, taking the difference between the first distance obtained by measuring the measuring point by the first distance measuring sensor 13 and the second distance obtained by measuring the measuring point by the second distance measuring sensor 14 to obtain a first difference value corresponding to the measuring point, wherein the judging mode comprises the following steps:
if the first differences corresponding to all the measurement points are smaller than or equal to the preset differences, the base 11 is determined to be horizontal.
Or, selecting a plurality of target measurement points from all the measurement points according to preset intervals, if the first difference value corresponding to the plurality of target measurement points is smaller than or equal to the preset difference value, judging that the base 11 is horizontal, wherein the preset intervals can be 1 measurement point apart, 2 measurement points apart, or set according to the user requirement.
The utility model provides a base level monitoring method, a plurality of distances to the base through two at least range finding sensor measurement, whether the base surface is level is judged through a plurality of distances of a range finding sensor first, improve the quality detection precision of base in the use, when the base accords with the use standard, through the distance calculation difference to different range finding sensors at same measuring point, judge whether the base is in the level, can improve the accuracy to base level detection, and the data that need measure is enough, can reduce the error rate of base level detection, thereby improve the qualification rate of product.
It should be understood that the sequence number of each step in the foregoing embodiment does not mean that the execution sequence of each process should be determined by the function and the internal logic of each process, and should not limit the implementation process of the embodiment of the present application in any way.
The following are device embodiments of the present application, for details not described in detail therein, reference may be made to the corresponding method embodiments described above.
Fig. 7 is a schematic structural diagram of a base level monitoring device according to an embodiment of the present application, and for convenience of explanation, only a portion related to the embodiment of the present application is shown, which is described in detail below:
as shown in fig. 7, the base level monitoring device 7 includes:
a measuring module 71 for measuring a plurality of distances from at least two ranging sensors to the base in a vertical direction during at least one rotation of the base, and transmitting the plurality of distances to the control device;
the judging module 72 is configured to judge whether the base is horizontal according to the plurality of distances.
The utility model provides a base level monitoring device, a plurality of distances to the base through two at least range finding sensor measurement, whether the base surface is level through a plurality of distances judgement base of range finding sensor earlier, improve the quality testing precision of base in the use, when the base accords with the use standard, whether the base is in the level through the distance calculation difference to different range finding sensor at same measuring point measurement, can improve the accuracy to base level detection, and the data that need measure is enough, can reduce the error rate of base level detection, thereby improve the qualification rate of product.
Fig. 8 is a schematic diagram of a control device according to an embodiment of the present application. As shown in fig. 8, the control device 8 of this embodiment includes: a processor 80, a memory 81 and a computer program 82 stored in the memory 81 and executable on the processor 80. The steps of the various base level monitoring method embodiments described above, such as steps 601 through 602 shown in fig. 6, are implemented by the processor 80 when executing the computer program 82. Alternatively, the processor 80, when executing the computer program 82, performs the functions of the modules of the apparatus embodiments described above, such as the functions of the modules 71-72 shown in fig. 7.
By way of example, the computer program 82 may be partitioned into one or more modules that are stored in the memory 81 and executed by the processor 80 to complete the present application. The one or more modules/units may be a series of computer program instruction segments capable of performing the specified functions, which instruction segments are used to describe the execution of the computer program 82 in the control means 8. For example, the computer program 82 may be split into modules 71 to 72 shown in fig. 7.
The control device 8 may be a computing device such as a desktop computer, a notebook computer, a palm computer, a cloud server, etc. The control device 8 may include, but is not limited to, a processor 80, a memory 81. It will be appreciated by those skilled in the art that fig. 8 is merely an example of the control device 8 and does not constitute a limitation of the control device 8, and may include more or less components than illustrated, or may combine certain components, or different components, e.g., the control device may further include an input-output device, a network access device, a bus, etc.
The processor 80 may be a central processing unit (Central Processing Unit, CPU), other general purpose processors, digital signal processors (Digital Signal Processor, DSP), application specific integrated circuits (Application Specific Integrated Circuit, ASIC), field programmable gate arrays (Field-Programmable Gate Array, FPGA) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, or the like. A general purpose processor may be a microprocessor or the processor may be any conventional processor or the like.
The memory 81 may be an internal storage unit of the control device 8, such as a hard disk or a memory of the control device 8. The memory 81 may be an external storage device of the control apparatus 8, such as a plug-in hard disk, a Smart Media Card (SMC), a Secure Digital (SD) Card, a Flash memory Card (Flash Card) or the like, which are provided in the control apparatus 8. Further, the memory 81 may also include both an internal memory unit and an external memory device of the control device 8. The memory 81 is used for storing the computer program and other programs and data required by the control device. The memory 81 may also be used to temporarily store data that has been output or is to be output.
It will be apparent to those skilled in the art that, for convenience and brevity of description, only the above-described division of the functional units and modules is illustrated, and in practical application, the above-described functional distribution may be performed by different functional units and modules according to needs, i.e. the internal structure of the apparatus is divided into different functional units or modules to perform all or part of the above-described functions. The functional units and modules in the embodiment may be integrated in one processing unit, or each unit may exist alone physically, or two or more units may be integrated in one unit, where the integrated units may be implemented in a form of hardware or a form of a software functional unit. In addition, specific names of the functional units and modules are only for convenience of distinguishing from each other, and are not used for limiting the protection scope of the present application. The specific working process of the units and modules in the above system may refer to the corresponding process in the foregoing method embodiment, which is not described herein again.
In the foregoing embodiments, the descriptions of the embodiments are emphasized, and in part, not described or illustrated in any particular embodiment, reference is made to the related descriptions of other embodiments.
Those of ordinary skill in the art will appreciate that the various illustrative elements and algorithm steps described in connection with the embodiments disclosed herein may be implemented as electronic hardware, or combinations of computer software and electronic hardware. Whether such functionality is implemented as hardware or software depends upon the particular application and design constraints imposed on the solution. Skilled artisans may implement the described functionality in varying ways for each particular application, but such implementation decisions should not be interpreted as causing a departure from the scope of the present application.
In the embodiments provided in the present application, it should be understood that the disclosed apparatus/terminal and method may be implemented in other manners. For example, the apparatus/terminal embodiments described above are merely illustrative, e.g., the division of the modules or units is merely a logical function division, and there may be additional divisions when actually implemented, e.g., multiple units or components may be combined or integrated into another system, or some features may be omitted or not performed. Alternatively, the coupling or direct coupling or communication connection shown or discussed may be an indirect coupling or communication connection via interfaces, devices or units, which may be in electrical, mechanical or other forms.
The units described as separate units may or may not be physically separate, and units shown as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
In addition, each functional unit in each embodiment of the present application may be integrated in one processing unit, or each unit may exist alone physically, or two or more units may be integrated in one unit. The integrated units may be implemented in hardware or in software functional units.
The integrated modules/units, if implemented in the form of software functional units and sold or used as stand-alone products, may be stored in a computer readable storage medium. Based on such understanding, the present application implements all or part of the flow of the method of the above embodiments, and may also be implemented by a computer program to instruct related hardware, where the computer program may be stored in a computer readable storage medium, where the computer program, when executed by a processor, may implement the steps of each of the base level monitoring method embodiments described above. Wherein the computer program comprises computer program code which may be in source code form, object code form, executable file or some intermediate form etc. The computer readable medium may include: any entity or device capable of carrying the computer program code, a recording medium, a U disk, a removable hard disk, a magnetic disk, an optical disk, a computer Memory, a Read-Only Memory (ROM), a random access Memory (Random Access Memory, RAM), an electrical carrier signal, a telecommunications signal, a software distribution medium, and so forth. It should be noted that the computer readable medium may include content that is subject to appropriate increases and decreases as required by jurisdictions in which such content is subject to legislation and patent practice, such as in certain jurisdictions in which such content is not included as electrical carrier signals and telecommunication signals.
The above embodiments are only for illustrating the technical solution of the present application, and are not limiting; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application, and are intended to be included in the scope of the present application.
Claims (10)
1. The process chamber is characterized by comprising a base, a bell jar, at least two ranging sensors and a control device;
the base is positioned in the bell jar; the upper surface of the base is round;
the at least two ranging sensors are arranged above the base and are positioned outside the bell jar; the at least two ranging sensors are positioned on the same horizontal plane, the projection positions of the at least two ranging sensors on the base are distributed around the circle center of the base, and the distances from the circle center of the base to the same; the at least two distance measuring sensors are used for measuring a plurality of distances from the distance measuring sensors to the base in the vertical direction in the process of rotating the base at least one circle, and the plurality of distances are sent to the control device;
the control device is used for judging whether the base is horizontal or not according to the distances.
2. The process chamber of claim 1, wherein the projected locations of the at least two ranging sensors on the base are evenly distributed around the center of the base, the at least two ranging sensors comprising two ranging sensors, a first ranging sensor and a second ranging sensor, respectively;
the first distance measuring sensor is used for measuring first distances in the vertical direction of N measuring points on the base in a first period of uniform rotation of the base;
the second distance measuring sensor is used for measuring second distances in the vertical direction of the N measuring points on the base in the first period of uniform rotation of the base.
3. The process chamber of claim 2, wherein the N/2 measurement points measured by the first ranging sensor during a first half of the first period correspond to the N/2 measurement points measured by the second ranging sensor during a second half of the first period;
n/2 measuring points measured by the first distance measuring sensor in the latter half of the first period are correspondingly consistent with N/2 measuring points measured by the second distance measuring sensor in the former half of the first period.
4. Process chamber according to claim 2, characterized in that the control means are specifically adapted to:
for each measuring point, taking a difference between a first distance obtained by measuring the measuring point by the first distance measuring sensor and a second distance obtained by measuring the measuring point by the second distance measuring sensor to obtain a first difference value corresponding to the measuring point;
if the first difference values corresponding to all the measurement points are smaller than or equal to the preset difference value, judging that the base is horizontal;
or selecting a plurality of target measuring points from all the measuring points, and judging that the base is horizontal if the first difference values corresponding to the target measuring points are smaller than or equal to the preset difference value.
5. The process chamber of claim 1, wherein the at least two ranging sensors comprise three ranging sensors, including a first ranging sensor, a second ranging sensor, and a third ranging sensor, respectively, wherein a projected position of the first ranging sensor onto the base, a projected position of the second ranging sensor onto the base, and a projected position of the third ranging sensor onto the base are in a regular triangle.
6. The process chamber of claim 1, wherein the control device is further configured to:
selecting a maximum distance and a minimum distance from a plurality of distances measured by any one of the at least two ranging sensors;
the maximum distance and the minimum distance are subjected to difference to obtain a second difference value corresponding to the ranging sensor;
and if the second difference value corresponding to the distance measuring sensor is smaller than or equal to a preset threshold value, judging that the surface of the base is flat.
7. The process chamber of claim 1, wherein the rotational speed of the susceptor is related to the acquisition period of the at least two ranging sensors by:
comparing the angle of the base rotating by one circle with the number of the distance measuring sensors according to the rotating speed to obtain corresponding angles between the at least two distance measuring sensors, and comparing the corresponding angles with the rotating speed of the base to obtain a first time length which is an integral multiple of the acquisition period of the at least two distance measuring sensors.
8. The process chamber of claim 1, further comprising a reaction chamber upper lid module horizontally secured above the bell jar, the at least two ranging sensors mounted on the reaction chamber upper lid module and located below the reaction chamber upper lid module;
at least two holes are formed above the bell jar, and the at least two distance measuring sensors measure a plurality of distances of the base in the vertical direction through the at least two holes;
the at least two ranging sensors are infrared sensors.
9. A method of base level monitoring, characterized in that the method is applied to the process chamber of claim 1, the process chamber comprising a base, a bell jar, at least two ranging sensors, and a control device, the method comprising:
measuring a plurality of distances from the at least two ranging sensors to the base in a vertical direction during at least one rotation of the base, and transmitting the plurality of distances to the control device;
and judging whether the base is horizontal or not according to the distances.
10. A control device comprising a memory, a processor and a computer program stored in the memory and executable on the processor, characterized in that the processor implements the steps of the base level monitoring method as claimed in claim 9 when the computer program is executed by the processor.
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|---|---|---|---|
| CN202310465096.8A CN116463616A (en) | 2023-04-26 | 2023-04-26 | Process chamber, base level monitoring method and control device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310465096.8A CN116463616A (en) | 2023-04-26 | 2023-04-26 | Process chamber, base level monitoring method and control device |
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| CN116463616A true CN116463616A (en) | 2023-07-21 |
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