CN116457521A

CN116457521A - Textile processing apparatus and textile processing method

Info

Publication number: CN116457521A
Application number: CN202180055547.XA
Authority: CN
Inventors: 萨沙·奥尔; 尤尔根·法特西彻; 西洛·费希尔; 西格弗里德·鲍尔
Original assignee: Weijie Co
Current assignee: Weijie Co
Priority date: 2020-08-14
Filing date: 2021-08-12
Publication date: 2023-07-18
Also published as: DE102020121472A1; WO2022034182A1

Abstract

Textile processing apparatus (1) comprising: a processing chamber; a textile supply unit configured to supply textiles (2) to the processing chamber; and a vapor supply unit configured to supply plasma-activated water vapor having a predetermined vapor property to the processing chamber.

Description

Textile processing apparatus and textile processing method

The present invention relates to a textile processing apparatus and a textile processing method.

Textile processing devices and textile processing methods are known in principle from the prior art. Accordingly, it is an object of the present disclosure to provide an improved textile processing apparatus and an improved textile processing method.

This object is first achieved by a textile processing device comprising: a processing chamber; a textile supply unit configured to supply textiles to the processing chamber; and a vapor supply unit configured to supply plasma-activated water vapor having a predetermined vapor property to the processing chamber.

A textile processing apparatus according to the present disclosure is for processing textiles through at least one processing step. The textile is, for example, a garment such as a pair of pants, a jacket or a shirt. For example, textiles have been at least partially manufactured or finished in previous processing steps.

The textile processing apparatus first includes a processing chamber. The processing chamber is an at least partially enclosed space in which the textile can be processed, i.e. treated. The process is particularly carried out with plasma activated vapors, wherein the textile is exposed to the vapors in the process chamber, as described below. By means of the steam treatment, a particularly smooth and simultaneous disinfection and deodorization of the textile can be achieved.

For this purpose, the process chamber comprises, for example, at least one wall, for example two walls, further comprising, for example, two walls, a floor and a ceiling. In particular, the process chamber is used to provide a process space for the textile product in which a controlled and defined atmosphere can be at least partially created, as will be explained below.

The textile processing apparatus further comprises a textile supply unit by means of which the textile may be supplied to the processing chamber. In the simplest case, the textile supply unit provides a holder, such as a clip, hook or hanger, for the textile, to which the textile is attached.

In an embodiment, the textile supply unit is configured to supply the textile to the processing chamber by moving the textile forward (e.g., by pushing). The textile supply unit may also be configured to remove textiles from the processing chamber, in particular after processing.

In particular, the textile supply unit may also be configured to supply textiles from previous processing steps of the textiles to the processing chamber and thus to the textile processing apparatus itself.

The textile processing apparatus further includes a vapor supply unit configured to supply plasma-activated water vapor having at least one predetermined vapor property to the processing chamber. For this purpose, the vapor supply unit is specifically configured as a plasma vapor supply unit. The plasma-activated water vapor has in particular the property of having both a disinfecting effect and a deodorizing effect on textiles.

The plasma-activated water vapor is, for example, water vapor generated by plasma-activated water and/or water vapor that has been activated by plasma. Plasma activated water vapor may be generated using, for example, a Dielectric Barrier Discharge (DBD) plasma nozzle in combination with a water evaporator. Typically, the plasma is thereby generated at atmospheric pressure, i.e. atmospheric pressure.

For this purpose, the vapor supply unit comprises, or has access to, for example, one or more vapor atomizers or vapor nozzles configured to supply, for example, plasma-activated water vapor from a reservoir to the processing chamber.

The plasma-activated water vapor has in particular a deodorizing and/or disinfecting effect. Thus, textiles processed (i.e., treated) with plasma-activated water vapor become particularly clean.

The plasma-activated water vapor includes at least one predetermined vapor property. Vapor properties are, for example, vapor temperature, vapor pressure, vapor humidity, and/or vapor saturation. Such properties are predetermined, for example by a preset in the vapour provision unit and/or a preset of the vapour generation process. The vapor property may also be or include a supply duration. For example, plasma activated water vapor may be supplied to the process chamber for a period of one second, ten seconds, 30 seconds, one minute, and/or 90 seconds.

In this case, the vapor property is a property that the vapor exhibits immediately before being supplied to the process chamber or when being supplied to the process chamber. In particular, the at least one predetermined vapor property may be a vapor property corresponding to a vapor property provided by a textile processing device.

For example, the textile may be a product made of synthetic fibers (e.g., polyamide) that require and/or allow for higher temperatures and/or shorter supply durations and/or lower vapor pressures for processing, in which case the predetermined vapor property is or includes, for example, a higher vapor temperature (e.g., 130 ℃) and/or shorter supply durations (e.g., 30 seconds) and/or lower vapor pressures (e.g., 0.2 bar).

On the other hand, if the textile is a product made of natural fibers (e.g., cotton) that require and/or allow lower temperatures and/or longer supply durations and/or higher vapor pressures for processing, the predetermined vapor properties may be or include, for example, lower vapor temperatures (e.g., 120 ℃) and/or longer supply durations (e.g., 90 seconds) and/or higher vapor pressures (e.g., 1.0 bar).

Plasma activated water vapor may be supplied to the process chamber, particularly on a periodic, and/or occasion-related basis. For example, plasma activated water vapor may be supplied to the process chamber every minute, every 30 seconds, every ten seconds, or every second. Alternatively or additionally, the plasma activated water vapor may occur each time the textile is supplied again to the process chamber. This may be detected, for example, by switches, motion sensors, and/or cameras.

The textile processing device has the advantage of producing particularly good cleaning results. In particular, the textile processing device achieves particularly good disinfection and deodorization of textiles.

The textile processing apparatus may be further developed such that the textile processing apparatus further comprises a vapor detection unit configured to detect at least one vapor parameter of the plasma-activated water vapor supplied to the processing chamber and a vapor control unit configured to change a vapor property of the plasma-activated water vapor supplied to the processing chamber in response to the detected vapor parameter.

The vapor parameter is, for example, the vapor temperature, vapor pressure, vapor humidity, and/or vapor saturation of the plasma activated water vapor supplied to the process chamber.

For example, the vapor parameter is the vapor temperature, vapor pressure, vapor humidity, and/or vapor saturation of the plasma activated water vapor directly supplied by the vapor supply unit, or the vapor parameter is directly detected at the vapor supply unit.

Alternatively or additionally, the vapor parameter may also be the vapor temperature, vapor pressure, vapor humidity and/or vapor saturation of the vapor-air mixture generated in the process chamber, or the vapor parameter may be detected at a location spaced apart from the vapor supply unit (e.g., at a center or central point of the process chamber and/or at or near the textile).

Such vapor parameters may occur through suitable sensors, in particular one or more temperature sensors, one or more pressure sensors, and/or one or more saturation sensors. The sensor may be arranged, for example, in and/or at the processing chamber and/or in and/or at the textile processing device.

In particular, the vapor parameter may be detected on a periodic, and/or occasion-related basis. For example, the vapor parameter may be detected every minute, every 30 seconds, every ten seconds, every second, every 500 milliseconds, or every millisecond. Alternatively or additionally, the steam parameter may occur each time the textile is supplied again to the process chamber. This may be detected, for example, by switches, motion sensors, and/or cameras. Further alternatively or additionally, the vapor parameters may occur in accordance with a supply of plasma activated water vapor to the process chamber, e.g., simultaneously with or before or after the supply of plasma activated water vapor, e.g., one second, ten seconds, 30 seconds, or one minute before or after the supply of plasma activated water vapor.

The detected vapor parameter may be the same as or proportional to the at least one predetermined vapor property, but is not required.

For example, if the vapor temperature of the plasma-activated water vapor supplied to the process chamber is directly detected at the vapor supply unit, the vapor property changed by the vapor control unit may be the same as or proportional to the detected vapor parameter.

On the other hand, if the vapor property is, for example, the vapor temperature of a vapor-air mixture generated in the process chamber, the vapor parameter may not correspond to and/or be proportional to the vapor property.

The vapor control unit may be configured as a simple control element, such as a PID controller. Alternatively or additionally, the vapor control unit may contain and/or have access to a microprocessor-based or computer-based control system. Similarly, the vapor control unit may access the vapor supply unit to change the vapor properties.

The vapor property is specifically changed by changing the value of the predetermined vapor property. For example, the value of the vapor property may be increased or decreased by the vapor control unit. For example, the vapor properties may change as the detected vapor parameter (i.e., the actual parameter) deviates from the set point parameter, specifically from a predetermined threshold.

The vapor properties may specifically be changed on a periodic, and/or occasion-related basis. For example, the vapor properties may change every minute, every 30 seconds, every ten seconds, every second, every 500 milliseconds, or every millisecond. Alternatively or additionally, the vapour property may occur in dependence on the detection of the vapour parameter, e.g. simultaneously with the detection of the vapour parameter or temporally before or after the detection of the vapour parameter, e.g. one second, ten seconds, 30 seconds or one minute before or after the detection of the vapour parameter.

With reference to the above embodiment, if a textile made of polyester is supplied to the process chamber and plasma activated water vapor is supplied to the process chamber at 130 ℃ for a period of 30 seconds, then immediately after the end of the 30 second supply duration, the vapor parameters, for example, in the vicinity of the textile can be detected. Such a detected vapour parameter may be, for example, a vapour temperature of 110 ℃ generated in the atmosphere of the process chamber after a supply duration. This may be 110 ℃, in particular because the textile is made of a particularly dense or thick fabric, which means that the vapor does not spread optimally.

For this purpose, for example, a set point parameter of 115 ℃ can be stored for the textile, wherein the threshold value is 3 ℃. Based thereon, the vapor temperature of the plasma activated water vapor supplied again to the process chamber after a rest period of, for example, 30 seconds is then changed in response to a deviation of the detected actual vapor parameter value from the vapor parameter set point value of 5 ℃.

Such a change may include, for example, increasing the vapor temperature of the plasma-activated water vapor by 3 ℃, increasing from 130 ℃ to 133 ℃, and then supplying the plasma-activated water vapor with the increased vapor temperature to the process chamber.

An advantage of this embodiment is that the textile product can be processed particularly gently and individually. In particular, such textile processing apparatus allows for automatic consideration of factors such as textile thickness, textile size and/or textile weight without requiring any adjustments to the textile processing apparatus.

The textile processing apparatus may be further developed such that the vapor detection unit is further configured to detect a plasma vapor parameter of the plasma activated water vapor supplied to the processing chamber, and wherein the vapor control unit is further configured to change a plasma vapor property of the plasma activated water vapor supplied to the processing chamber in response to the detected plasma vapor parameter.

In addition to the general vapor parameters described above, the plasma vapor parameters are parameters related to plasma activation. For example, the plasma vapor parameter is the ionization degree of water vapor generated by plasma activation. This may be detected by a suitable sensor (e.g., a capacitor) in or at the process chamber.

In addition to the general vapor properties described above, the plasma vapor properties are properties related to plasma activation. For example, the plasma vapor properties are pulse duration, frequency, and/or power applied to the water or water vapor during plasma activation.

It should be appreciated that the vapor control unit is further configured to change a plasma vapor property of the plasma-activated water vapor supplied to the process chamber in response to the detected vapor parameter.

It should further be appreciated that the vapor control unit is further configured to provide a vapor property of the plasma-activated water vapor supplied to the process chamber in response to the detected plasma vapor parameter.

This embodiment thus has the advantage of being particularly suitable for deodorizing and/or sanitizing textiles.

The textile processing apparatus may be further developed by further comprising a hot air supply unit configured to supply hot air having predetermined hot air properties to the processing chamber.

For this purpose, the hot air supply unit includes, for example, a blower and a heater. The hot air supply unit is configured to supply hot air having at least one predetermined hot air property to the process chamber. The hot air properties are for example the hot air temperature, the residual hot air humidity and/or the amount of hot air. This is predetermined, for example, by a preset in the hot air supply unit and/or a preset of the hot air generating process. The hot air property may also be or include the duration of the supply. For example, hot air may be supplied to the process chamber for a period of one second, ten seconds, 30 seconds, one minute, and/or 90 seconds.

In this regard, the hot air property is a property that the hot air exhibits immediately before or when supplied to the process chamber. In particular, the at least one predetermined hot air property may be a hot air property corresponding to a hot air property provided by the textile processing device.

As in the above examples, if the textile is a product made of synthetic fibers (e.g., polyester) that require and/or allow for higher temperatures and/or shorter supply durations for drying, the predetermined hot air properties may be or include, for example, higher hot air temperatures (e.g., 150 ℃) and/or shorter supply durations (e.g., 20 seconds).

On the other hand, if the textile is a product made of natural fibers (e.g., cotton) that require higher drying temperatures and/or allow for longer supply durations and/or, the predetermined hot air properties may be or include, for example, higher hot air temperatures (e.g., 180 ℃) and/or longer supply durations (e.g., 60 seconds).

The hot air may be supplied to the process chamber, in particular on a periodic, periodic and/or occasion-related basis. For example, the process chamber may be supplied with hot air every minute, every 30 seconds, every ten seconds, or every second. Alternatively or additionally, the hot air may occur after each supply of plasma activated water vapor to the process chamber.

The hot air supply unit is used to dry the textile with hot air after processing with plasma activated water vapor and thus remove any residual vapor or water in the textile. Furthermore, the hot air supply unit is used for smoothing textiles and also for ironing textiles, in particular by pressing the textiles against the walls of the processing chamber.

An advantage of this embodiment is that the textile may be dried after the processing step of supplying the plasma-activated water vapor. Thus, immediately after processing, the textile may be sent to further processing steps, such as packaging.

The textile processing apparatus may be further developed by further comprising a hot air detection unit configured to detect a hot air parameter of the hot air supplied to the processing chamber and a hot air control unit configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected hot air parameter.

For example, the hot air parameter is a hot air temperature, a residual hot air humidity and/or a hot air amount of the hot air directly supplied by the hot air supply unit, or the hot air parameter is directly detected at the hot air supply unit.

Alternatively or additionally, the hot air parameter may also be the hot air temperature, the residual hot air humidity and/or the amount of hot air of the hot air-air mixture generated in the process chamber, or the hot air parameter may be detected at a location spaced apart from the hot air supply unit, such as the center or central point of the process chamber and/or at or near the textile product.

Such hot air parameters may occur by means of suitable sensors, in particular one or more temperature sensors, one or more pressure sensors and/or one or more humidity sensors. The sensor may be arranged, for example, in and/or at the processing chamber and/or in and/or at the textile processing device.

In particular, the hot air parameters may be detected on a periodic, and/or occasion-related basis. For example, the hot air parameter may be detected every minute, every 30 seconds, every ten seconds, every second, every 500 milliseconds, or every millisecond. Alternatively or additionally, the hot air parameter may occur in accordance with a supply of plasma activated water vapor to the process chamber, e.g., simultaneously with the supply of plasma activated water vapor or temporarily before or after the supply of plasma activated water vapor, e.g., one second, ten seconds, 30 seconds, or one minute before or after the supply of plasma activated water vapor. Further alternatively or additionally, the hot air parameter may occur in dependence of the hot air supply to the process chamber, for example simultaneously with or before or after the hot air supply, for example one second, ten seconds, 30 seconds or one minute before or after the hot air supply.

The detected hot air parameter may be the same as or proportional to the at least one predetermined hot air property, but is not required.

For example, if the hot air temperature of the hot air supplied to the process chamber is directly detected at the hot air supply unit, the hot air properties changed by the hot air control unit may be matched or proportional to the detected hot air parameters.

On the other hand, if the hot air property is, for example, the hot air temperature of a hot air-air mixture generated in the process chamber, the hot air parameter may not match and/or be proportional to the hot air property.

The textile processing apparatus further includes a hot air control unit configured to change at least one hot air property of hot air supplied to the processing chamber in response to the detected hot air parameter.

The hot air control unit may be configured as a simple control element, such as a PID controller. Alternatively or additionally, the hot air control unit may also include and/or have access to a microprocessor-based or computer-based control system. Similarly, the hot air control unit may access the hot air supply unit in order to change the hot air properties. Specifically, the hot air control unit may be the same as the vapor control unit described above, or the common control unit may perform both the vapor control task and the hot air control task. Alternatively, the hot air control unit may be established independently of the vapor control unit or may be independent of the vapor control unit.

The hot air property is specifically changed by changing the value of the predetermined hot air property. For example, the hot air control unit may increase or decrease the value of the hot air property. For example, the hot air properties may change as the detected hot air parameter (i.e. the actual parameter) deviates from the set point parameter, in particular from a predetermined threshold.

In particular, the hot air properties may be changed on a periodic, and/or occasion-related basis. For example, the hot air properties may change every minute, every 30 seconds, every ten seconds, every second, every 500 milliseconds, or every millisecond. Alternatively or additionally, the hot air properties may occur in accordance with the detection of the hot air parameter, e.g. simultaneously with the detection of the hot air parameter or before or after the detection of the hot air parameter, e.g. one second, ten seconds, 30 seconds or one minute before or after the detection of the hot air parameter.

Referring now to the above-described embodiment, if a textile made of polyester is supplied to the processing chamber and hot air is supplied to the processing chamber at 150 ℃ for a period of, for example, 20 seconds, then the hot air parameter may be detected immediately after the end of the 20 second supply duration, for example, in the vicinity of the textile. Such a detected hot air parameter may be, for example, a hot air temperature of 120 ℃ generated in the atmosphere of the process chamber after the supply duration. This may be 120 ℃, in particular because the textile is made of a particularly dense or thick fabric, which means that the hot air cannot spread optimally.

For this purpose, for example, a setpoint parameter of 125 ℃ can be stored for the textile, wherein the threshold value is 3 ℃. Based on this, the hot air temperature of the hot air supplied again to the process chamber after a rest period of, for example, 10 seconds is then changed in response to a deviation of the detected actual hot air parameter value from the hot air parameter set point value of 5 ℃.

Such a change may comprise, for example, an increase in hot air temperature of the hot air of 3 ℃, an increase from 150 ℃ to 153 ℃, and then the hot air is supplied to the process chamber at the increased hot air temperature.

An advantage of this embodiment is that the textile can be dried particularly accurately.

The textile processing apparatus may be further developed such that the hot air control unit is further configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected vapor parameter.

The hot air properties may in particular be changed as described above, whereby not only the detected hot air parameter is used as a basis for control or change, but also the detected vapour parameter, which may be detected as described above, is used as a basis for control or change.

An advantage of this embodiment is that the textile can be dried particularly accurately. In particular, the vapor parameters may be considered when drying with hot air.

The textile processing apparatus may be further developed such that the hot air control unit is further configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected plasma vapor parameter.

The hot air properties may in particular be changed as described above, whereby not only the detected hot air parameters are used as a basis for control or change, but also the detected plasma vapour parameters, which may be detected as described above.

An advantage of this embodiment is that the textile can be dried particularly accurately. In particular, plasma vapor parameters may be considered when drying with hot air.

The textile processing apparatus may be further developed such that the vapor control unit is further configured to change a vapor property of the plasma activated water vapor supplied to the processing chamber in response to the detected hot air parameter.

The vapor properties may in particular be changed as described above, whereby not only the detected vapor parameters are used as a basis for control or change, but also the detected hot air parameters, which may be detected as described above, are used as a basis for control or change.

An advantage of this embodiment is that the textile can be dried particularly accurately. In particular, the hot air parameters can thus be taken into account when processing with plasma-activated water vapor.

The textile processing apparatus may be further developed such that the vapor control unit is further configured to change a plasma vapor property of the plasma activated water vapor supplied to the processing chamber in response to the detected hot air parameter.

The plasma vapor properties may specifically be changed as described above, whereby not only the detected plasma vapor parameters are used as a basis for control or change, but also the detected hot air parameters, which may be detected as described above, are used as a basis for control or change.

The above object is also achieved by a method of textile processing, comprising the steps of: supplying a textile to a process chamber; and supplying plasma activated water vapor to the process chamber.

The textile processing method may be further developed such that the textile processing method further comprises the steps of: detecting a vapor parameter of plasma activated water vapor supplied to the process chamber; and changing a vapor property of the plasma activated water vapor supplied to the process chamber in response to the detected vapor parameter.

The textile processing method may be further developed such that the step of detecting a vapor parameter of the plasma activated water vapor supplied to the process chamber comprises detecting a plasma vapor parameter of the plasma activated water vapor supplied to the process chamber, and wherein the step of changing a vapor property comprises changing the plasma activated water vapor supplied to the process chamber in response to the detected plasma vapor parameter.

The textile processing method may be further developed by further comprising the step of supplying hot air to said processing chamber.

The textile processing method may be further developed by further comprising the steps of: detecting a hot air parameter of hot air supplied to the process chamber; and changing a hot air property of hot air supplied to the process chamber in response to the detected hot air parameter.

It should be understood that any or all of the steps of the above-described embodiments of the textile processing method may be performed in whole or in part by the above-described embodiments of the textile processing apparatus, in particular the above-described embodiments of the textile supply unit, the vapor detection unit, the vapor control unit, the hot air supply unit, the hot air detection unit, and/or the hot air control unit.

Regarding the configuration and advantages of the textile processing method, reference is additionally made to the configuration and advantages of the above-described embodiments for a textile processing apparatus.

The foregoing objects are also achieved by at least one embodiment of the use of the foregoing textile processing apparatus for sanitizing textiles supplied to a processing chamber.

The foregoing objects are also achieved by at least one embodiment of the use of the foregoing textile processing apparatus for deodorizing textiles supplied to a processing chamber.

The foregoing objects are also achieved by at least one embodiment of the use of the foregoing textile processing method for sanitizing textiles supplied to a processing chamber.

The foregoing objects are also achieved by at least one embodiment of the use of the foregoing textile processing method for deodorizing textiles supplied to a processing chamber.

Embodiments of a textile processing apparatus and a textile processing method will now be described, by way of example, with reference to the accompanying drawings, in which

Figure 1 shows a schematic external side view of an embodiment of a textile processing apparatus,

figure 2 shows a schematic external perspective view of an embodiment of the textile processing apparatus according to figure 1,

Fig. 3 shows a schematic interior view of an embodiment of a textile processing device according to fig. 1, and

figure 4 shows a schematic flow chart of an embodiment of a textile processing method,

wherein like reference numerals designate identical or similar features.

Fig. 1 shows a schematic external side view of an embodiment of a textile processing apparatus 1. The textile processing device is here shown by way of example in the form of a tunnel, in particular as a so-called tunnel ironing machine, in which several individual processing and/or treatment steps of the textile product can be carried out.

The textile processing apparatus 1 here comprises, for example, from left to right, a water mist section 10, a water vapor section 20 and a hot air section 30.

The textile 2 processed by the textile processing apparatus 1 is supplied to the textile processing apparatus 1 along the textile conveying direction T by means of the textile supply unit 40. The textile supply unit 40 is exemplarily shown as a textile transport unit which supplies the textile 2 to the textile processing apparatus 1 by means of a propulsion device, not shown, and transports it through the textile processing apparatus 1, in particular through three parts, namely the water mist part 10, the water vapor part 20 and the hot air part 30, and finally also out of the textile processing apparatus 1 again. Also shown is a processed textile 3, which may be transferred from textile supply 40 to further processing or treatment steps after processing.

The textile processing apparatus 1 further comprises a processing chamber formed inside, which is not shown for viewing reasons. The textile supply unit 40 is configured to supply the textile 2 to be processed to the processing chamber. The process chamber extends over the entire width of the textile processing apparatus 1 and in particular also over the entire width of the mist portion 10, the water vapor portion 20 and the hot air portion 30.

For this purpose, the textile processing apparatus 1 comprises at least one mist supply unit in the mist section 10, which is configured to supply mist having a predetermined mist property to the processing chamber and thus to the textile being supplied to the processing chamber. The mist section 10 is used for wetting textiles.

In the water vapor portion 20, the textile processing apparatus 1 comprises a vapor supply unit configured to supply plasma activated water vapor having predetermined vapor properties to the processing chamber and thus to the textile being supplied to the processing chamber.

Optionally, the water vapor portion further comprises a vapor detection unit configured to detect a vapor parameter of the plasma activated water vapor supplied to the process chamber. In particular, the water vapor portion 20 is used to disinfect and deodorize textiles.

The textile processing apparatus 1 further optionally comprises a vapor control unit configured to change a vapor property of the plasma activated water vapor supplied to the processing chamber in response to the detected vapor parameter.

Further specifically, the vapor detection unit may be configured to detect a plasma vapor parameter of the plasma-activated water vapor supplied to the process chamber, and the vapor control unit may be further configured to change a plasma vapor property of the plasma-activated water vapor supplied to the process chamber in response to the detected plasma vapor parameter.

In the hot air section 30, the textile processing device 1 comprises a hot air supply unit configured to supply hot air having a predetermined hot air property to the processing chamber and thus to the textile being supplied to the processing chamber, and optionally a hot air detection unit configured to detect a hot air parameter of the hot air being supplied to the processing chamber. In particular, the hot air section 30 is used to dry and smooth textiles.

The textile processing apparatus 1 may further comprise a hot air control unit configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected hot air parameter.

In particular, the hot air control unit may be configured to change a hot air property of the hot air supplied to the process chamber in response to the vapor parameter detected by the vapor detection unit.

The hot air control unit may be further configured to change a hot air property of the hot air supplied to the process chamber in response to the plasma vapor parameter detected by the vapor detection unit.

The vapor control unit may be configured to change a vapor property of the plasma-activated water vapor supplied to the process chamber in response to the hot air parameter detected by the hot air detection unit.

The vapor control unit may be further configured to change a plasma vapor property of the plasma-activated water vapor supplied to the process chamber in response to the hot air parameter detected by the hot air detection unit.

By means of the operating unit 60, the operator can select a processing program, for example for textiles made from synthetic fibers, such as polyester, or for textiles made from natural fibers, such as cotton, in which individual processing properties are specified. Specifically, at least one mist property of the water mist supplied in the water mist section 10, at least one vapor property or plasma vapor property of the plasma activated water vapor supplied in the water vapor section 20, and/or at least one hot air property of the hot air supplied in the hot air section 30 may be preset by the operation unit 60. Alternatively or additionally, individual ones of the above or further properties may also be activated/deactivated and/or changed by an operator via the operating unit 60.

Fig. 2 shows a schematic external perspective view of an embodiment of the textile processing apparatus 1 according to fig. 1. In particular, in this view, a process chamber 50 can be seen that extends across the entire width of the textile processing apparatus 1. The process chamber is delimited by the side elements, the bottom element and the top element of the respective parts, no reference signs of which are provided, whereby a controlled climate can be created in the process chamber 50, which climate is different from the external atmosphere surrounding the textile processing device 1 and is configurable.

Alternatively or additionally, three separate process chambers, i.e. a mist chamber, a steam chamber and a hot air chamber, which may optionally have different sizes and/or dimensions, may also be provided. These individual process chambers may also be separated from one another in the atmosphere by suitable means, for example by means of openable and closable dividing walls or doors.

Fig. 3 shows a schematic interior view of an embodiment of the textile processing apparatus 1 according to fig. 1. In a simplified manner it is shown how the side wall 52 is folded open relative to the other side wall 51 of the textile processing apparatus 1 such that a portion of the processing chamber 50 is visible. The illustrated portion of the process chamber 50 is also shown in a simplified manner to include a mist portion 10, a water vapor portion 20, and a hot air portion 30.

In particular, fig. 3 also shows that the mist portion 10, the water vapor portion 20 and the hot air portion 30 are each formed by suitable elements on each side of the textile processing apparatus 1 and portions of the processing chamber 50.

The textile 2 is transported through the processing chamber 50 in a textile transport direction T by a textile transport unit, not shown in detail. For this purpose, the textile is attached to a textile attachment unit 41 that is moved by a textile transport unit.

First, the textile 2 passes through a mist section 10 comprising one or more mist supply units 11 in a textile conveying direction T, which are configured to supply mist having predetermined mist properties to the process chamber 50.

The textile 2 is then passed along a textile transport direction T through a steam section 20 comprising one or more steam supply units 21 configured to supply steam, in particular plasma activated steam, having predetermined steam properties or plasma steam properties to the process chamber 50.

Finally, the textile 2 passes through a hot air section 30 comprising one or more hot air supply units 31 along the textile conveying direction T, which are configured to supply hot air with predetermined hot air properties to the process chamber 50.

The detection unit 15 is arranged at an attachment unit 41 configured to detect a vapor parameter of the plasma-activated water vapor supplied to the process chamber and/or to detect a plasma vapor parameter of the plasma-activated water vapor supplied to the process chamber and/or to detect a hot air parameter of the hot air supplied to the process chamber.

A control unit (not shown) is configured to evaluate the parameter detected by the detection unit and, in response, adjust one or more properties of the plasma-activated water vapor and/or hot air.

Fig. 4 shows a schematic flow chart of an embodiment of a textile processing method 1000, which may be performed in particular by or using the textile processing apparatus 1 shown in fig. 1 to 3.

Textile processing method 1000 first includes a step 1100 of supplying textile to a process chamber.

In a subsequent step, textile processing method 1000 includes a step 1200 of supplying plasma activated water vapor to the process chamber.

In a subsequent optional step, textile processing method 1000 includes a step 1300 of detecting a vapor parameter of plasma activated water vapor supplied to the process chamber.

In a subsequent optional step, textile processing method 1000 includes a step 1400 of changing a vapor property of the plasma activated water vapor supplied to the process chamber in response to the detected vapor parameter.

In a subsequent optional step, textile processing method 1000 includes a step 1500 of supplying hot air having predetermined hot air properties to the process chamber.

In a subsequent optional step, textile processing method 1000 includes a step 1600 of detecting a hot air parameter of hot air supplied to the process chamber.

In a subsequent optional step, textile processing method 1000 includes a step 1700 of changing a hot air property of hot air supplied to the process chamber in response to the detected hot air parameter.

Optionally, the step 1300 of detecting a vapor parameter of the plasma activated water vapor supplied to the process chamber may include detecting a plasma vapor parameter of the plasma activated water vapor supplied to the process chamber.

Also optionally, the step 1400 of changing the vapor property may include changing the plasma activated water vapor supplied to the process chamber in response to the detected plasma vapor parameter.

After step 1700, the method may begin again at step 1100.

The textile processing apparatus and the textile processing method may be specifically configured in the following example embodiments:

example 1: a textile processing apparatus, comprising:

-a processing chamber;

-a textile supply unit configured to supply textiles to the processing chamber; and

-a vapor supply unit configured to supply plasma activated water vapor having predetermined vapor properties to the process chamber.

Example 2: the textile processing apparatus of previous example 1, further comprising:

-a vapor detection unit configured to detect a vapor parameter of the plasma activated water vapor supplied to the process chamber; and

-a vapor control unit configured to change a vapor property of the plasma activated water vapor supplied to the process chamber in response to a detected vapor parameter.

Example 3: the textile processing apparatus of the foregoing example 2, wherein the vapor detection unit is further configured to detect a plasma vapor parameter of the plasma activated water vapor supplied to the processing chamber, and

wherein the vapor control unit is further configured to change a plasma vapor property of the plasma activated water vapor supplied to the process chamber in response to the detected plasma vapor parameter.

Example 4: the textile processing apparatus of any of the preceding examples, further comprising:

-a hot air supply unit configured to supply hot air having predetermined hot air properties to the process chamber.

Example 5: the textile processing apparatus of previous example 4, further comprising:

-a hot air detection unit configured to detect a hot air parameter of the hot air supplied to the process chamber; and

-a hot air control unit configured to change a hot air property of hot air supplied to the process chamber in response to the detected hot air parameter.

Example 6: the textile processing apparatus of previous example 5, wherein the hot air control unit is further configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected vapor parameter.

Example 7: the textile processing apparatus of any of preceding examples 5 or 6, wherein the hot air control unit is further configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected plasma vapor parameter.

Example 8: the textile processing apparatus of any of preceding examples 5, 6, or 7, wherein the vapor control unit is further configured to change a vapor property of the plasma activated water vapor supplied to the processing chamber in response to the detected hot air parameter.

Example 9: the textile processing apparatus of any preceding example 5-8, wherein the vapor control unit is further configured to change a plasma vapor property of the plasma-activated water vapor supplied to the processing chamber in response to the detected hot air parameter.

Example 10: a method of textile processing comprising the steps of:

-supplying a textile to a process chamber;

-supplying plasma activated water vapour to the process chamber.

Example 11: the textile processing method of the preceding example 10, further comprising the steps of:

-detecting a vapor parameter of the plasma activated water vapor supplied to the process chamber; and

-changing a vapor property of the plasma activated water vapor supplied to the process chamber in response to the detected vapor parameter.

Example 12: the textile processing method of the preceding example 11, wherein the step of detecting a vapor parameter of the plasma-activated water vapor supplied to the processing chamber includes detecting a plasma vapor parameter of the plasma-activated water vapor supplied to the processing chamber, and

Wherein the step of changing the vapor property comprises changing the plasma activated water vapor supplied to the process chamber in response to a detected plasma vapor parameter.

Example 13: the textile processing method of any of the preceding examples 10-12, further comprising the steps of:

-supplying hot air having predetermined hot air properties to the process chamber.

Example 14: the textile processing method of previous example 13, further comprising the steps of:

-detecting a hot air parameter of the hot air supplied to the process chamber; and

-changing a hot air property of the hot air supplied to the process chamber in response to the detected hot air parameter.

List of reference numerals

1. Textile processing device

2. Textile to be processed

3. Processed textile

10. Mist part

11. Mist supply unit

15. Detection unit

20. Vapor portion

21. Vapor supply unit

30. Hot air section

31. Hot air supply unit

40. Textile supply unit

41. Textile attachment unit

50. Processing chamber

51. Side wall

52. Side wall

60. Operation unit

1000. Method of

1100. Processing steps

1200. Processing steps

1300. Processing steps

1400. Processing steps

1500. Processing steps

1600. Processing steps

1700. Processing steps

T-textile conveying direction

Claims

1. A textile processing apparatus, comprising:

-a processing chamber;

-a textile supply unit configured to supply textiles to the processing chamber;

-a vapor supply unit configured to supply plasma activated water vapor having predetermined vapor properties to the process chamber;

-a vapor control unit configured to change a vapor property of the plasma-activated water vapor supplied to the process chamber in response to a detected vapor parameter, wherein the vapor detection unit is further configured to detect a plasma vapor parameter of the plasma-activated water vapor supplied to the process chamber, and

2. The textile processing apparatus of any one of the preceding claims, further comprising:

3. The textile processing apparatus of claim 2, further comprising:

4. A textile processing apparatus according to claim 3, wherein the hot air control unit is further configured to vary a hot air property of the hot air supplied to the processing chamber in response to the detected vapor parameter.

5. The textile processing apparatus of any of the preceding claims 3 or 4, wherein the hot air control unit is further configured to change a hot air property of the hot air supplied to the processing chamber in response to the detected plasma vapor parameter.

6. The textile processing apparatus of any of preceding claims 3, 4, or 5, wherein the vapor control unit is further configured to vary a vapor property of the plasma activated water vapor supplied to the processing chamber in response to the detected hot air parameter.

7. The textile processing apparatus of any one of the preceding claims 3 to 6, wherein the vapor control unit is further configured to vary plasma vapor properties of the plasma activated water vapor supplied to the processing chamber in response to the detected hot air parameter.

8. A method of textile processing comprising the steps of:

-supplying a textile to a process chamber;

-supplying plasma activated water vapour to the process chamber;

-changing a vapor property of the plasma activated water vapor supplied to the process chamber in response to the detected vapor parameter, wherein the step of detecting the vapor parameter of the plasma activated water vapor supplied to the process chamber comprises detecting a plasma vapor parameter of the plasma activated water vapor supplied to the process chamber, and wherein the step of changing the vapor property comprises changing the plasma activated water vapor supplied to the process chamber in response to the detected plasma vapor parameter.

9. The textile processing method of claim 8, further comprising the steps of:

10. The textile processing method of claim 9, further comprising the steps of: