CN116445857A - High-strength composite coating, preparation method and application thereof - Google Patents

High-strength composite coating, preparation method and application thereof Download PDF

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Publication number
CN116445857A
CN116445857A CN202310483332.9A CN202310483332A CN116445857A CN 116445857 A CN116445857 A CN 116445857A CN 202310483332 A CN202310483332 A CN 202310483332A CN 116445857 A CN116445857 A CN 116445857A
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layer
target
composite coating
strength composite
crsin
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孙德恩
李茂丽
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Southwest University
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Southwest University
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • C23C14/0652Silicon nitride
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22DCASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D17/00Pressure die casting or injection die casting, i.e. casting in which the metal is forced into a mould under high pressure
    • B22D17/20Accessories: Details
    • B22D17/22Dies; Die plates; Die supports; Cooling equipment for dies; Accessories for loosening and ejecting castings from dies
    • B22D17/2209Selection of die materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • C23C14/0042Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00Aeronautics or air transport
    • Y02T50/60Efficient propulsion technologies, e.g. for aircraft

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Fluid Mechanics (AREA)
  • Manufacturing & Machinery (AREA)
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Abstract

A high-strength composite coating relates to the technical field of surface engineering, and comprises the following components: the substrate, the transition layer and the functional layer are sequentially arranged; wherein the matrix is 4Cr5MoV1Si alloy, the transition layer is metal Cr, and the functional layer is formed by alternately depositing a SiN nano layer and a CrSiN nano layer for multiple times; the invention also provides a preparation method of the high-strength composite coating, which comprises the following steps: pretreatment of a matrix, glow cleaning, preparation of a transition layer and preparation of a functional layer; the invention also provides application of the high-strength composite coating on an aluminum alloy die casting die; the coating has the capability of resisting rapid temperature rise and fall impact, and also has high hardness and high wear resistance.

Description

High-strength composite coating, preparation method and application thereof
Technical Field
The invention relates to the technical field of surface engineering, in particular to a high-strength composite coating, a preparation method and application thereof.
Background
Aluminum alloy die casting is a casting process in which a molten aluminum alloy liquid is rapidly extruded into a precision metal mold cavity by means of high pressure and then solidified to form. The die casting mould is an important part in the die casting process, and the working performance and the service life of the die casting mould have great influence on the quality and the cost of products; the die-casting mold is a mold for forming molten metal under pressure, and has the functions of bearing high impact load, long working time, high working temperature and high alternating stress, which requires the mold material to have good high-temperature strength and thermal fatigue resistance.
In the working process, the aluminum alloy die-casting mold can be corroded in direct contact with the aluminum alloy for a long time, and the die-casting mold is subjected to metal heating and cooling medium cooling for a plurality of times in the use process, so that thermal fatigue is easily caused, and cracking of the die-casting mold can be caused. In order to improve the situation, one of the existing modes is to change the alloy composition of the die to improve the performance and prolong the service life of the die; the other is to improve the strength and the wear resistance of the die-casting mould through surface strengthening, prolong the latency time of thermal cracks, avoid the spread of the thermal cracks so as to achieve the purpose of prolonging the service life of the die-casting mould, and effectively reduce the wear of the die and improve the heat resistance through surface carburization, nitridation and other processes.
In the Chinese invention with the publication number of CN109609905A, a high-hardness anti-impact wear-resistant composite coating, a preparation method and application are provided, wherein the hardness, wear resistance and erosion resistance of the titanium alloy are obviously improved and the service life is prolonged by preparing a composite protective coating consisting of a Cr bonding layer and a Cr/CrSiN working layer on the surface of the titanium alloy; however, the Cr/CrSiN working layer is composed of a Cr layer and a CrSiN layer which are deposited in sequence, the Cr layer is a metal phase, the CrSiN layer is a ceramic phase, the bonding force between the Cr layer and the CrSiN layer is not good, and stripping can occur under the repeated alternating stress conditions of abrasion, erosion and the like, so that the hardness of the coating is low, and the service life of the coating is influenced.
Disclosure of Invention
Aiming at the defects existing in the prior art, the invention provides a high-strength composite coating, a preparation method and application thereof, which solve the problems of poor binding force and low hardness of the coating existing in the prior art.
A high strength composite coating comprising:
the substrate, the transition layer and the functional layer are sequentially arranged;
the substrate is 4Cr5MoV1Si alloy, the transition layer is metal Cr, and the functional layer is formed by alternately depositing a SiN nano layer and a CrSiN nano layer for a plurality of times.
Preferably, the thickness of the transition layer is 150 nm-200 nm.
Preferably, the thickness of the functional layer is 670 nm-750 nm, wherein the modulation period ratio of the SiN nano layer to the CrSiN nano layer is 2:1.
Preferably, the number of alternating depositions of SiN nanolayers and CrSiN nanolayers is 1 to 15.
The invention also provides a preparation method of the high-strength composite coating, which comprises the following steps:
(1) Performing sand blasting, grinding, polishing, cleaning and drying on the matrix for later use;
(2) Placing the processed substrate into an ultrasonic cleaner, and continuously cleaning the substrate for 15 minutes by using a cleaning liquid at the frequency of 15-30 kHZ;
(3) Placing the cleaned substrate into a vacuum chamber of a multi-target magnetron sputtering coating machine, and vacuumizing to 9.0X10 -4 Pa, and then introducing Ar gas with a gas flow of 40sccm, at this time, maintaining the vacuum degree in the vacuum chamber at 3Pa, and finally using sputtering power density at 10-15W/cm 2 Performing ion bombardment on the substrate for 30min by using a radio frequency power supply to perform glow cleaning on the substrate;
(4) Preparation of a transition layer: starting the Cr target, gradually increasing the sputtering current to enable the Cr target to be started, and adjusting the sputtering power density of the Cr target to 10-15W/cm 2 Depositing a transition layer Cr layer for 10min;
(5) Preparation of the functional layer: introducing N with flow rate of 40sccm into vacuum chamber 2 In Ar-N 2 The method comprises the steps of alternately opening a baffle in front of a Si target and a Cr target, and sputtering and depositing a nanoscale multilayer film, wherein the multilayer film is formed by alternately stacking a plurality of SiN nano layers and CrSiN nano layers, and simultaneously adjusting the sputtering power density and the deposition time of the Si target and the Cr target so as to control the modulation period of the SiN nano layers and the CrSiN nano layers.
Preferably, the cleaning solution in step (2) comprises acetone and absolute ethanol.
Preferably, the sputtering power density of the SiN nano layer and the CrSiN nano layer in the step (5) is 10-15W/cm 2
Preferably, the deposition time of the SiN nano layer in the step (5) is 2.5-40 min.
Preferably, the deposition time of the CrSiN nano layer in the step (5) is 5-80 min.
The invention also provides application of the high-strength composite coating on an aluminum alloy die casting die.
Compared with the prior art, the invention has the following beneficial effects:
1. the obtained high-strength composite coating has the capability of resisting rapid temperature rise and fall impact under the condition of not affecting the mechanical structure precision of the aluminum alloy die casting die, and also has high hardness and high wear resistance;
2. the CrSiN nano layer is used as a top layer, belongs to a ceramic structure, has high hardness, good high-temperature red hardness, low friction coefficient, good non-wettability with liquid aluminum and good mold release property, and the high Cr content enables a stable and compact oxide film to be formed on the surface of the coating at a high temperature, so that the high-temperature oxidation resistance of the coating is improved;
3. SiN is an important structural ceramic material, has high hardness, good lubricity, wear resistance, high-temperature oxidation resistance and cold and hot impact resistance, is heated to more than 1000 ℃ in air, is rapidly cooled and then is rapidly heated, and cannot be broken;
4. the SiN/CrSiN multilayer film structure belongs to a ceramic-ceramic multilayer film structure, can effectively adjust the hardness and corrosion resistance of the coating, and reduces the probability of stripping the coating under the repeated alternating stress conditions of abrasion, erosion and the like;
5. the SiN/CrSiN nano multilayer structure coating is adopted, so that the layers have good binding force, and the coating has ultrahigh hardness due to interface interaction, so that the diffusion of coating elements can be prevented at high temperature, and the high-temperature oxidation resistance of the coating is improved; in addition, because of different lattice structures of SiN and CrSiN, microcracks can not rapidly extend to penetrate through the whole coating, and protection of the die in the long-term use process can be realized.
Additional advantages, objects, and features of the invention will be set forth in part in the description which follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from practice of the invention.
Drawings
FIG. 1 is a schematic structural view of a high strength composite coating of the present invention.
Fig. 2 is an SEM surface morphology of a high-intensity composite coating with a modulation period Λ=45 nm,90nm,180 nm.
Detailed Description
In order to make the technical means, the creation characteristics, the achievement of the purpose and the effect of the present invention more clear and easy to understand, the present invention is further described below with reference to the accompanying drawings and the detailed description:
example 1
An aluminum alloy die casting die with the alloy composition of 4Cr5MoV1Si and the size of 600 multiplied by 260 multiplied by 150mm is selected as a matrix, and the matrix is subjected to sand blasting, grinding, polishing, cleaning and drying for later use.
Placing the treated substrate into an ultrasonic cleaner, continuously cleaning with acetone and absolute ethyl alcohol at 15kHz for 15 min, placing the cleaned substrate into a vacuum chamber of a multi-target magnetron sputtering coating machine, and vacuumizing to 9.0X10 - 4 Pa, and then, ar gas of 40sccm was introduced thereinto, at this time, the vacuum degree in the vacuum chamber was maintained at 3Pa, and finally, the sputtering power density was set at 10W/cm 2 Performing ion bombardment on the substrate for 30min by using a radio frequency power supply to perform glow cleaning on the substrate; after the glow cleaning is finished, starting the Cr target, gradually increasing the sputtering current to enable the Cr target to glow, and adjusting the sputtering power density of the Cr target to 10W/cm 2 And (5) depositing a Cr layer of the transition layer for 10min.
Introducing N with air flow of 40sccm into vacuum chamber 2 In Ar-N 2 Alternately opening the baffles of the Si target and the Cr target, and controlling the opening and closing of the baffles in front of the two targets without changing the sputtering power of the Si target and the Cr target in the sputtering deposition processControlling the required deposition time of the coating and the Si target and the Cr target on the substrate to obtain the SiN nano layer and the CrSiN nano layer with required thickness, wherein SiN is 10W/cm 2 Is deposited at a sputtering power of 10W/cm for 2.5min, crSiN 2 Setting the modulation period to Λ=45nm for 5min, and obtaining the SiN/CrSiN nano multilayer film with the thickness of about 670 nm.
Example 2
An aluminum alloy die casting die with the alloy composition of 4Cr5MoV1Si and the size of 600 multiplied by 260 multiplied by 150mm is selected as a matrix, and the matrix is subjected to sand blasting, grinding, polishing, cleaning and drying for later use.
Placing the treated substrate into an ultrasonic cleaner, continuously cleaning with acetone and absolute ethyl alcohol at 23kHz for 15 min, placing the cleaned substrate into a vacuum chamber of a multi-target magnetron sputtering coating machine, and vacuumizing to 9.0X10 - 4 Pa, and then, ar gas of 40sccm was introduced thereinto, at this time, the vacuum degree in the vacuum chamber was maintained at 3Pa, and finally, the sputtering power density was set at 13W/cm 2 Performing ion bombardment on the substrate for 30min by using a radio frequency power supply to perform glow cleaning on the substrate; after the glow cleaning is finished, starting the Cr target, gradually increasing the sputtering current to enable the Cr target to glow, and adjusting the sputtering power density of the Cr target to 12W/cm 2 And (5) depositing a Cr layer of the transition layer for 10min.
Introducing N with air flow of 40sccm into vacuum chamber 2 In Ar-N 2 Alternately opening the baffles of the Si target and the Cr target, and controlling the coating to be deposited and the deposition time of the Si target and the Cr target on the substrate by controlling the opening and closing of the baffles in front of the two targets without changing the sputtering power of the Si target and the Cr target in the sputtering deposition process, thereby obtaining a SiN nano layer and a CrSiN nano layer with required thickness, wherein SiN is 12W/cm 2 Is deposited at 13W/cm for 20min with a sputter power of CrSiN 2 Setting the modulation period to Λ=90 nm for 40min, and obtaining the SiN/CrSiN nano multilayer film with the thickness of about 710 nm.
Example 3
An aluminum alloy die casting die with the alloy composition of 4Cr5MoV1Si and the size of 600 multiplied by 260 multiplied by 150mm is selected as a matrix, and the matrix is subjected to sand blasting, grinding, polishing, cleaning and drying for later use.
Placing the treated substrate into an ultrasonic cleaner, continuously cleaning with acetone and absolute ethyl alcohol at 30kHz for 15 min, placing the cleaned substrate into a vacuum chamber of a multi-target magnetron sputtering coating machine, and vacuumizing to 9.0X10 - 4 Pa, and then, ar gas of 40sccm was introduced thereinto, at this time, the vacuum degree in the vacuum chamber was maintained at 3Pa, and finally, the sputtering power density was 15W/cm 2 Performing ion bombardment on the substrate for 30min by using a radio frequency power supply to perform glow cleaning on the substrate; after the glow cleaning is finished, starting the Cr target, gradually increasing the sputtering current to enable the Cr target to glow, and adjusting the sputtering power density of the Cr target to 15W/cm 2 And (5) depositing a Cr layer of the transition layer for 10min.
Introducing N with air flow of 40sccm into vacuum chamber 2 In Ar-N 2 Alternately opening the baffles of the Si target and the Cr target, and controlling the coating to be deposited and the deposition time of the Si target and the Cr target on the substrate by controlling the opening and closing of the baffles in front of the two targets without changing the sputtering power of the Si target and the Cr target in the sputtering deposition process, thereby obtaining a SiN nano layer and a CrSiN nano layer with required thickness, wherein SiN is 15W/cm 2 40min of sputter power deposition, crSiN at 15W/cm 2 Setting the modulation period to Λ=180 nm for 80min, and obtaining the SiN/CrSiN nano multilayer film with the thickness of about 750 nm.
Finally, it is noted that the above embodiments are only for illustrating the technical solution of the present invention and not for limiting the same, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications and equivalents may be made thereto without departing from the spirit and scope of the technical solution of the present invention, which is intended to be covered by the scope of the claims of the present invention.

Claims (10)

1. A high strength composite coating comprising:
the substrate, the transition layer and the functional layer are sequentially arranged;
the substrate is 4Cr5MoV1Si alloy, the transition layer is metal Cr, and the functional layer is formed by alternately depositing a SiN nano layer and a CrSiN nano layer for a plurality of times.
2. The high strength composite coating according to claim 1, wherein the transition layer has a thickness of 150nm to 200nm.
3. The high strength composite coating according to claim 1, wherein the functional layer has a thickness of 670nm to 750nm, and wherein the modulation period ratio of the SiN nanolayer to the CrSiN nanolayer is 2:1.
4. The high strength composite coating according to claim 1, wherein the number of alternating depositions of SiN nanolayers and CrSiN nanolayers is 1-15.
5. A method of producing a high strength composite coating according to any one of claims 1 to 4, comprising the steps of:
(1) Performing sand blasting, grinding, polishing, cleaning and drying on the matrix for later use;
(2) Placing the processed substrate into an ultrasonic cleaner, and continuously cleaning the substrate for 15 minutes by using a cleaning liquid at the frequency of 15-30 kHZ;
(3) Placing the cleaned substrate into a vacuum chamber of a multi-target magnetron sputtering coating machine, and vacuumizing to 9.0X10 -4 Pa, and then introducing Ar gas with a gas flow of 40sccm, at this time, maintaining the vacuum degree in the vacuum chamber at 3Pa, and finally using sputtering power density at 10-15W/cm 2 Performing ion bombardment on the substrate for 30min by using a radio frequency power supply to perform glow cleaning on the substrate;
(4) Preparation of a transition layer: starting the Cr target, gradually increasing the sputtering current to enable the Cr target to be started, and adjusting the sputtering power density of the Cr target to 10-15W/cm 2 Depositing a transition layer Cr layer for 10min;
(5) Preparation of the functional layer: the flow rate of the air introduced into the vacuum chamber is 4N0 sccm 2 In Ar-N 2 The method comprises the steps of alternately opening a baffle in front of a Si target and a Cr target, and sputtering and depositing a nanoscale multilayer film, wherein the multilayer film is formed by alternately stacking a plurality of SiN nano layers and CrSiN nano layers, and simultaneously adjusting the sputtering power density and the deposition time of the Si target and the Cr target so as to control the modulation period of the SiN nano layers and the CrSiN nano layers.
6. The method of claim 5, wherein the cleaning fluid in step (2) comprises acetone and absolute ethanol.
7. The method for preparing a high-strength composite coating according to claim 5, wherein the sputtering power densities of the SiN nano layer and the CrSiN nano layer in the step (5) are 10-15W/cm 2
8. The method for preparing a high-strength composite coating according to claim 5, wherein the deposition time of the SiN nano-layer in step (5) is 2.5-40 min.
9. The method for preparing a high-strength composite coating according to claim 5, wherein the deposition time of the CrSiN nano layer in the step (5) is 5-80 min.
10. Use of a high strength composite coating according to any one of claims 1 to 4 in an aluminium alloy die casting die.
CN202310483332.9A 2023-04-28 2023-04-28 High-strength composite coating, preparation method and application thereof Pending CN116445857A (en)

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Application Number Priority Date Filing Date Title
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CN116445857A true CN116445857A (en) 2023-07-18

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