CN116419465A - Multi-charge state beam extraction device for negative hydrogen ion cyclotron - Google Patents
Multi-charge state beam extraction device for negative hydrogen ion cyclotron Download PDFInfo
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- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 title claims abstract description 72
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 81
- 229910052739 hydrogen Inorganic materials 0.000 claims description 36
- 239000001257 hydrogen Substances 0.000 claims description 36
- -1 hydrogen ions Chemical class 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 27
- 238000010884 ion-beam technique Methods 0.000 claims description 20
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- 238000013461 design Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
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Abstract
The invention discloses a multi-charge state beam extraction device for a negative hydrogen ion cyclotron, which comprises: a proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device is arranged on a track of accelerating the beam to extract energy; or a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged; or proton and hydrogen atom double-charge state beam extraction devices are arranged; the three-charge state or double-charge state beam extraction devices are respectively provided with stripping targets and/or electrostatic deflection plates, wherein the stripping targets and/or the electrostatic deflection plates are formed by combining stripping films with different thicknesses and different positions, the stripping films at different positions are used for on-line adjustment of the beam duty ratio of each component, the different positions refer to that on the beam extraction track, and the front and rear positions of the stripping films are different and the radial positions of the stripping films are different; the invention solves the problems that the prior art only can lead out the beam current in a single charge state, and can only adjust the total current intensity of the beam current in each charge state on line, but can not adjust the current intensity of the beam current in each charge state respectively.
Description
Technical Field
The invention belongs to the technical field of cyclotrons, and particularly relates to a multi-charge state beam extraction device for a negative hydrogen ion cyclotron.
Background
A cyclotron is a circular accelerator in which charged particles are caused to perform a cyclotron motion along a closed orbit, and the particles are caused to be cyclically and repeatedly accelerated by an electric field that acts on the periodic oscillations of an acceleration gap. The cyclotron can accelerate by repeatedly utilizing a high-frequency electric field, so that particles can be accelerated to higher energy with lower cost, and the cyclotron can be widely applied to various fields such as nuclear physics research, aerospace, weaponry, isotope production, cancer treatment, industrial irradiation and the like. And because of the characteristics of small floor space, low cost, high reliability, easy maintenance, wide application and the like, a large number of commercial and industrial cyclotrons have appeared in the world in the last century.
Among many applications, most applications have no special requirement on the electrical property of the extracted beam, but with the development of scientific research, some applications put new requirements on the beam electrical property: not only is the multi-state charge required to be simultaneously provided at one time, but also the beam intensity of each charge state beam is required to be flexibly adjusted on line. The simultaneous provision of the polymorphic charge at one time is required to provide a negative hydrogen ion beam and/or a hydrogen atom beam in addition to the conventional proton beam.
The difficulty in providing the multi-state charge simultaneously as described above is: if an electrostatic deflection extraction method is adopted, only one of proton beams or negative hydrogen ion beams can be extracted; also, negative hydrogen ion beams cannot be extracted by the method of extraction using a release film.
The difficulty in on-line adjustment of various electric charge amounts is as follows: because each extraction device can only extract one charge state beam, the current intensity of a single charge cannot be adjusted by a method of distributing total current of each charge state beam, and if the current intensity of a single type beam is to be adjusted online, the intensity of an injection beam is adjusted. Assuming that the same extraction device can extract multiple charge state beams at the same time, when the method for adjusting the intensity of the injected beam is adopted to adjust the intensity of each charge state in the multiple charge states, the total intensity of each charge state beam can only be adjusted on line, but the intensity of each charge state beam cannot be adjusted respectively.
Disclosure of Invention
The invention provides a multi-charge state beam extraction structure for a negative hydrogen ion cyclotron, aiming at solving the problems that each extraction device in the prior art can only extract one charge state beam, and when the intensity of each charge state in the multi-charge state beam is adjusted by adopting a method for adjusting the intensity of injected beam, the total intensity of each charge state beam can only be adjusted on line, but the intensity of each charge state beam cannot be respectively adjusted.
The invention provides the following technical scheme for solving the technical problems:
a multi-charge state beam extraction device for a negative hydrogen ion cyclotron is characterized in that: a proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device is arranged on a track of accelerating the beam to extract energy; or a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged; or proton and hydrogen atom double-charge state beam extraction devices are arranged; the three-charge state or double-charge state beam extraction devices are respectively provided with a stripping target and/or an electrostatic deflection plate, wherein the stripping target and/or the electrostatic deflection plate is formed by combining stripping films with different thicknesses and different positions, the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films are set to be different thicknesses according to the requirements of multi-charge state beam extraction; the different positions are that the front and back positions of the plurality of stripping films are different and the radial positions are different on the track of beam extraction;
further, the proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device comprises a stripping target formed by combining a stripping film A, a stripping film B and a stripping film C and an electrostatic deflection plate; the thickness of the stripping film A is the thickness with the highest flow intensity of the hydrogen atoms H when the hydrogen atoms H are led out; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the release film BA rectangular through hole is arranged in the middle of the electrostatic deflection plate and is used for controlling the negative hydrogen ions to pass through the electrostatic deflection plate, and the electrostatic deflection plate is not bombarded by the negative hydrogen ions.
Further, the combined stripping target of the stripping film A, the stripping film B and the stripping film C has the width larger than 150% of the beam spot size so as to ensure that the beam passes through the stripping film instead of the rear end bracket of the stripping film, the radial positions of the inner sides of the stripping film A and the stripping film B are the same, and the duty ratio of the proton beam can be adjusted on line by adjusting the radial position of the stripping film C.
Further, the duty ratio of the proton beam can be adjusted online by adjusting the radial position of the stripping film C, specifically: the proton beam duty ratio is lowest when the inside radius of the release film C is larger than the outside radius of the small hole of the release film B.
Further, the duty ratio of the proton beam can be adjusted online by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam ratio, and the lower the hydrogen atom beam and the negative hydrogen ion beam ratio, and when the inside radius of the release film C is smaller than the inside radius of the small hole of the release film B, only the proton beam is extracted.
Further, the stripping target formed by combining the stripping film A, the stripping film B and the stripping film C can adjust the duty ratio of the hydrogen atom beam on line by adjusting the radial position of the stripping film A.
Further, the ratio of the hydrogen atom beam can be adjusted online by adjusting the radial position of the stripping film A, specifically: the hydrogen atom beam is the highest when the inside radius of the release film a is smaller than the inside radius of the pores of the release film B.
Further, the ratio of the hydrogen atom beam can be adjusted online by adjusting the radial position of the stripping film A, specifically: the hydrogen atom beam duty ratio is lower when the inside radius of the release film a is larger, the proton beam and the negative hydrogen ion beam duty ratio is higher, and the hydrogen atom beam duty ratio is reduced to 0 when the inside radius of the release film a is larger than the outside radius of the small hole of the release film B or the inside radius of the release film C.
Further, the radial positions of the stripping film C and the stripping film A are adjusted simultaneously, so that the on-line adjustment of the duty ratios of the three charge state beams can be realized.
Further, the inside radii of the release film a and the release film C cannot be smaller than the inside radius of the release film B, so as to prevent the release films a and C from peeling particles on the trajectories of the extraction energy regions where the inside radii are smaller than the inside radius of the release film B.
Further, the proton beam and negative hydrogen ion dual-charge state beam extraction device consists of a stripping target formed by combining a stripping film B and a stripping film C and an electrostatic deflection plate; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
Further, the stripping target formed by combining the stripping film B and the stripping film C realizes on-line adjustment of the ratio of protons to negative hydrogen ions by adjusting the position of the stripping film C.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the position of the stripping film C, specifically: when the radius of the inner side of the stripping film C is larger than that of the outer side of the small hole of the stripping film B, the proton beam is the lowest and the negative hydrogen ion beam is the highest.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the negative hydrogen ion beam duty ratio.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the position of the stripping film C, specifically: when the inner radius of the stripping film C is smaller than the inner radius of the small holes of the stripping film B, only the proton beam is extracted.
Further, when the radial position of the peeling film C is adjusted, the inside radius of the peeling film C cannot be smaller than the inside radius of the peeling film B, so as to prevent the peeling film C from peeling particles on the trajectory of the extraction energy region where the inside radius of the peeling film B is smaller.
Further, the proton and hydrogen atom double-charge state beam extraction device consists of a stripping filmA. A release target formed by combining release films C; the thickness of the stripping film A is the thickness with the highest flow intensity of the hydrogen atoms H when the hydrogen atoms H are led out; the thickness of the stripping film C is thick enough to draw out protons H + The ratio is more than 99.9%.
Further, the stripping target formed by combining the stripping film A and the stripping film C realizes on-line adjustment of the ratio of protons to hydrogen atoms by adjusting the radial position of the stripping film C.
Further, the on-line adjustment of the proton and hydrogen atom ratio is realized by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the hydrogen atom beam duty ratio.
Further, the on-line adjustment of the proton and hydrogen atom ratio is realized by adjusting the radial position of the stripping film C, specifically: when the inside radius of the peeling film C is equal to the inside radius of the peeling film a, only the proton beam is extracted.
Further, the on-line adjustment of the proton and hydrogen atom ratio is realized by adjusting the radial position of the stripping film C, specifically: when the radial position of the peeling film C is adjusted, the inner radius of the peeling film C cannot be smaller than the inner radius of the peeling film A, so as to prevent the peeling film C from peeling particles which do not reach the track of the extraction energy region at a position smaller than the inner radius of the peeling film A.
Advantageous effects of the invention
1. According to the invention, the stripping target and/or the electrostatic deflection plate are/is arranged on the beam extraction track, and the stripping films with different thicknesses, different longitudinal positions and different radial positions are arranged on the stripping target, so that the duty ratio of each component beam is adjusted on line by adjusting the radial positions of each stripping film, and the problems that only single-charge-state beams can be extracted, only the total current intensity of each charge-state beam can be adjusted on line, and the current intensity of each charge-state beam cannot be respectively adjusted in the prior art are solved.
2. The invention skillfully utilizes the characteristic that the sum of the beam intensities of various charge states after stripping (namely the total current intensity) is equal to the current intensity before stripping, and solves the problem that the on-line adjustment of the beam ratio of each component is difficult for a person skilled in the art for a long time: because the invention sets a plurality of stripping films aiming at multiple charge states instead of only one stripping film on the beam extraction track, when one stripping film can not extract the injection flow intensity by 100% because of adjusting the radial position of the stripping film, the residual flow intensity can be absorbed by the stripping films of other charge states on the extraction track and can not be combined into the next beam group of the current stripping film again because the residual flow intensity can be removed from the beam group instead of the position, and the residual flow intensity can not be continuously rotated on the accelerator extraction track since the residual flow intensity can be removed from the beam group.
Drawings
FIG. 1 is a schematic diagram of a multi-charge state beam extraction for a negative hydrogen ion cyclotron in accordance with the present invention;
FIG. 2 is a graph showing the variation of each beam current component with the thickness of the stripped film during the stripping process of the negative hydrogen ion beam according to the present invention;
FIG. 3 is a release film structure of the present invention;
FIG. 4a is a proton beam duty cycle adjustment method I;
FIG. 4b illustrates a second proton beam duty cycle adjustment method according to the present invention;
FIG. 4c illustrates a third proton beam duty cycle adjustment method according to the present invention;
FIG. 5a is a schematic diagram of a first method for adjusting the hydrogen atom beam duty cycle according to the present invention;
FIG. 5b is a second method of hydrogen beam duty cycle adjustment according to the present invention;
FIG. 5c is a third method of hydrogen atom beam duty cycle adjustment according to the present invention;
FIG. 6 is a schematic drawing of proton and negative hydrogen ion dual-charge state beam extraction according to the present invention;
FIG. 6a is a schematic diagram of a method for adjusting the duty cycle of a proton beam and a negative hydrogen ion beam according to the present invention
FIG. 6b is a schematic diagram of a second method for adjusting the duty cycle of a proton beam and a negative hydrogen ion beam according to the present invention
FIG. 6c is a third method for adjusting the duty cycle of a proton beam and a negative hydrogen ion beam according to the present invention
FIG. 7 is a schematic drawing of proton and hydrogen atom dual-charge state beam extraction according to the present invention;
FIG. 7a is a schematic diagram of a first method of proton beam and hydrogen beam duty cycle adjustment according to the present invention;
FIG. 7b illustrates a second method of proton beam and hydrogen beam duty cycle adjustment according to the present invention;
FIG. 7c illustrates a third method of proton beam and hydrogen beam duty cycle adjustment according to the present invention;
Detailed Description
Principle of design of the invention
1. And (5) stripping the target structure design. The invention installs three stripping films (only one stripping film is arranged on the conventional stripping target) on the stripping target, and the three stripping films have different film thicknesses, different longitudinal positions and different radial positions. The thickness is different, namely the thickness of the stripping film is selected according to the beam current requirement, the current intensity of each charge state beam current obtained after stripping of each thickness is different, and the sum (namely the total current intensity) of the current intensities of all charge states after stripping is equal to the current intensity before stripping; the longitudinal positions are different in that the three stripping films are positioned in front and back on the beam track, and the radial positions are different in that the three stripping films are positioned along the radius of the accelerator.
2. Principle that each beam component changes along with stripping film thickness in the negative hydrogen ion beam stripping process. As shown in fig. 2, in this embodiment, negative hydrogen ions are injected from the center region of the accelerator, and in the stripping process, electrons of the negative hydrogen ions are stripped as the thickness of the stripping film increases, 1 electron or 2 electrons are stripped when the electrons of the negative hydrogen ions are stripped, 1 electron is stripped to form a hydrogen atom beam, and 2 electrons are stripped to form a proton beam. Wherein, the ratio of the hydrogen atom beam has a peak value in the process of changing the thickness of the stripping film, and the peak value gradually decreases later, and the decrease is caused by the decrease of the total number of negative hydrogen ions, so the number of hydrogen atoms generated by stripping is also decreased; however, as the number of hydrogen atoms decreases, part of the hydrogen atoms are stripped by 1 electron again, and when part of the hydrogen atoms are stripped by 1 electron again, the hydrogen atoms become protons, and the number of protons stripped by the hydrogen atoms increases. At the same time, the protons hardly acquire electrons to be changed into hydrogen atoms H or negative hydrogen ions H - . Therefore, after the stripping film reaches a certain thickness, the beam current can be completely stripped into a proton beam.
3. Multiple lift-off film thickness design principle. The thickness design of the three stripping films is performed according to the principle that the beam current of each component has different ratio when the stripping film thicknesses are different in fig. 2, and as shown in fig. 2, the abscissa represents the stripping film thickness and the ordinate represents the beam current intensity. (1) When the thickness of the stripping film is 6, the flow intensity of hydrogen atoms is the highest and 60, but at this time, the negative hydrogen ions H - And protons H + The flow strength of the hydrogen atoms is only approximately 20, and at a thickness of 6a of the peeling film, the flow strength of the hydrogen atoms is H - And protons H + 3 times the flow strength of (2); (2) as the flow intensity of hydrogen atoms and the flow intensity of negative hydrogen ions gradually decrease as the film is peeled off, they decrease to 0 when the film thickness reaches 40, but the flow intensity of protons reaches at the highest near 99.
By utilizing the above characteristics, the thickness of the hydrogen atom-generating peeling film is designed to be close to 6, and the thickness of the proton-generating peeling film is designed to be 40, and in actual operation, the thickness of the proton-generating peeling film can be as thick as possible, so that the flow intensity is close to 99%. As seen from fig. 2, the negative hydrogen ions have a flux intensity of at most 100 at an abscissa of 0 a release film thickness, and therefore, the negative hydrogen ions are designed to have a thickness of 0 a, that is, no release film is provided. However, since the electrostatic deflection plate is not bombarded by negative hydrogen ions to lose the power of the negative hydrogen ions when the negative hydrogen ions reach the electrostatic deflection plate, a stripping film for the negative hydrogen ions is specially arranged, wherein the stripping film is provided with a rectangular window at the center, and the size of the rectangular window is calculated and is used for controlling the diameter of the beam cluster of the negative hydrogen ions passing through the rectangular window, and the diameter ensures that the beam cluster does not bombard the electrostatic deflection plate when passing through the electrostatic deflection plate.
Fig. 2 shows the result of the beam energy, the thickness required after the beam energy is changed is different, and the maximum value of the beam intensity of the hydrogen atoms may be different. For example, the thickness of the peak of the hydrogen atom beam may be 6 to 12, the corresponding thickness of protons 99 may be 80, etc. These are all computable and belong to the prior art. The thicknesses 6, 40, etc. in this bar are not common to all energies and require additional explanation
4. Multiple release film radial position design principle. The positions include a longitudinal position and a radial position. The longitudinal positions are not in sequence, and can be reversed, because the ratio of the component beams is determined by the thickness of the stripping film instead of the front and back positions of the stripping film, and the positions are changed but the thickness is unchanged. The radial position of the release films is used to adjust the charge duty cycle between the individual release films, and the radial position of each release film must be as desired for its duty cycle, and the radial position cannot be reversed at will. The radial position is the distance from the inside of the release film to the accelerator center point. Since the total length of the release film is constant, the width of the release film varies with the radial distance from the inside of the release film to the accelerator center point.
5. The method of adjusting the radial positions of a plurality of stripping films is used for replacing the method of adjusting the intensity of the injection beam current. Adjusting the radial position of the plurality of stripping films can change the ratio of the plurality of charges relative to each other, but adjusting the radial position of a single stripping film cannot change the flow intensity of a single type of charge, but can only change the flow intensity by adjusting the intensity of the injection beam. Since the total current intensity is constant from input to output, for a single type of flux, even if the radial position of the stripping film C is changed (the radial distance inside the stripping film C becomes large, the width is shortened) so that most of the flux is left without going through the stripping film C to become protons, and only a few of the fluxes become protons, but the remaining fluxes are not lost but continue to rotate at the accelerator and are merged into the next flux, when the next flux passes through the stripping film C, the current intensity thereof is not only the current intensity injected from the injection port but also the remaining flux intensity that has not been extracted last time to continue to rotate at the accelerator extraction track, including the remaining current intensity of the last N times until the remaining current intensity of the flux that has passed through the stripping film C is forced to be equal to the 100% injected current intensity of the last N times. Since the accelerator has millions of clusters in 1 second, the whole process is negligibly fast from only a small fraction of the extracted implant flow to 100% of the extracted implant flow, i.e., for the extracted single charge state beam, the radial position of the stripping film C is moved, but the extracted beam flow is not changed, and still one hundred percent of the beam flow is extracted. The reason for this is that the injected stream strength is not lost and the remaining stream is added to the next cluster.
However, when extracting a beam of multiple charge states, the situation changes: the remaining beam does not continue to rotate on the accelerator exit track, but is instead distributed to other stripping films at different radial positions, which, due to their different thicknesses, produce beams of different duty cycles and different charge states. These different duty cycles and the flow of the beam current of different charge states together impose an injection total flow intensity equal to 100%. Therefore, in the case of extracting the multiple charge states, the duty ratio between the multiple charge state fluxes can be adjusted by adjusting the radial position of the release film. In addition, in the case of extracting multiple charge states, only a method of adjusting the radial position thereof can be adopted, but a method of adjusting the injection current cannot be adopted. Because when the method for adjusting the intensity of the injected beam is adopted to adjust the intensity of each of the multiple charge states, the total intensity of each charge state beam can only be adjusted on line, but the intensity of each charge state beam cannot be adjusted respectively.
Based on the principle, the invention designs a multi-charge state beam extraction device for a negative hydrogen ion cyclotron.
A multi-charge state beam extraction device for a negative hydrogen ion cyclotron is shown in fig. 1, and is characterized in that: a proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device is arranged on the track of the beam accelerated to the extracted energy (3); or a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged; or proton and hydrogen atom double-charge state beam extraction devices are arranged; the three-charge state or double-charge state beam extraction devices are respectively provided with a stripping target (1) and/or an electrostatic deflection plate (2) which are formed by combining stripping films with different thicknesses and different positions, wherein the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films are set to be different thicknesses according to the requirements of multi-charge state beam extraction; the different positions are that the front and back positions of the plurality of stripping films are different and the radial positions are different on the track of beam extraction;
further, as shown in fig. 1 and 3, the proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device comprises a stripping target formed by combining a stripping film A, a stripping film B and a stripping film C, and an electrostatic deflection plate (2); the thickness of the stripping film A is the thickness with the highest flow intensity of the hydrogen atoms H when the hydrogen atoms H are led out; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
Further, the combined stripping target of the stripping film A, the stripping film B and the stripping film C has the width larger than 150% of the beam spot size so as to ensure that the beam passes through the stripping film instead of the rear end bracket of the stripping film, the radial positions of the inner sides of the stripping film A and the stripping film B are the same, and the duty ratio of the proton beam can be adjusted on line by adjusting the radial position of the stripping film C.
Supplementary description
The stripping film A, the stripping film B and the stripping film C are respectively arranged on the film frames, the film frames are connected with the stripping target, the radial back-and-forth movement of each film frame is controlled by a motor and the like, the positions of the film frames are fed back, and the radial position of each stripping film is adjusted on line.
Further, as shown in fig. 4a, the ratio of the proton beam can be adjusted online by adjusting the radial position of the stripping film C, specifically: the proton beam duty ratio is lowest when the inside radius of the release film C is larger than the outside radius of the small hole of the release film B.
Further, as shown in fig. 4C, the ratio of the proton beam can be adjusted online by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam ratio, and the lower the hydrogen atom beam and the negative hydrogen ion beam ratio, and when the inside radius of the release film C is smaller than the inside radius of the small hole of the release film B, only the proton beam is extracted.
Further, the stripping target formed by combining the stripping film A, the stripping film B and the stripping film C can adjust the duty ratio of the hydrogen atom beam on line by adjusting the radial position of the stripping film A.
Further, as shown in fig. 5a, the ratio of the hydrogen atom beam may be adjusted online by adjusting the radial position of the stripping film a, specifically: the hydrogen atom beam is the highest when the inside radius of the release film a is smaller than the inside radius of the pores of the release film B.
Further, as shown in fig. 5c, the ratio of the hydrogen atom beam may be adjusted online by adjusting the radial position of the stripping film a, specifically: the hydrogen atom beam duty ratio is lower when the inside radius of the release film a is larger, the proton beam and the negative hydrogen ion beam duty ratio is higher, and the hydrogen atom beam duty ratio is reduced to 0 when the inside radius of the release film a is larger than the outside radius of the small hole of the release film B or the inside radius of the release film C.
Further, the radial positions of the stripping film C and the stripping film A are adjusted simultaneously, so that the on-line adjustment of the duty ratios of the three charge state beams can be realized.
Further, the inside radii of the release film a and the release film C cannot be smaller than the inside radius of the release film B, so as to prevent the release films a and C from peeling particles on the trajectories of the extraction energy regions where the inside radii are smaller than the inside radius of the release film B.
Further, the proton beam and negative hydrogen ion dual-charge state beam extraction device consists of a stripping target formed by combining a stripping film B and a stripping film C and an electrostatic deflection plate; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
Further, the stripping target formed by combining the stripping film B and the stripping film C realizes on-line adjustment of the proton and negative hydrogen ion ratio by adjusting the radial position of the stripping film C.
Further, as shown in fig. 6a, the on-line adjustment of the duty ratio of protons and negative hydrogen ions is realized by adjusting the radial position of the stripping film C, specifically: when the radius of the inner side of the stripping film C is larger than that of the outer side of the small hole of the stripping film B, the proton beam is the lowest and the negative hydrogen ion beam is the highest.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the negative hydrogen ion beam duty ratio.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the radial position of the stripping film C, specifically: when the inner radius of the stripping film C is smaller than the inner radius of the small holes of the stripping film B, only the proton beam is extracted.
Further, when the radial position of the peeling film C is adjusted, the inside radius of the peeling film C cannot be smaller than the inside radius of the peeling film B, so as to prevent the peeling film C from peeling particles on the trajectory of the extraction energy region where the inside radius of the peeling film B is smaller.
Further, the proton and hydrogen atom double-charge state beam extraction device is composed of a stripping target formed by combining a stripping film A and a stripping film C; the thickness of the stripping film A is the thickness with the highest flow intensity of the hydrogen atoms H when the hydrogen atoms H are led out; the thickness of the stripping film C is thick enough to draw out protons H + The ratio is more than 99.9%.
Further, the stripping target formed by combining the stripping film A and the stripping film C realizes on-line adjustment of the ratio of protons to hydrogen atoms by adjusting the radial position of the stripping film C.
Further, as shown in fig. 7a, 7b, and 7C, the on-line adjustment of the proton and hydrogen atom duty ratio is realized by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the hydrogen atom beam duty ratio.
Further, as shown in fig. 7a, the on-line adjustment of the proton and hydrogen atom duty ratio is realized by adjusting the radial position of the stripping film C, specifically: when the inside radius of the peeling film C is equal to the inside radius of the peeling film a, only the proton beam is extracted.
Further, the on-line adjustment of the proton and hydrogen atom ratio is realized by adjusting the radial position of the stripping film C, specifically: when the radial position of the peeling film C is adjusted, the inner radius of the peeling film C cannot be smaller than the inner radius of the peeling film A, so as to prevent the peeling film C from peeling particles which do not reach the track of the extraction energy region at a position smaller than the inner radius of the peeling film A.
It should be emphasized that the above-described embodiments are merely illustrative of the invention, which is not limited thereto, and that modifications may be made by those skilled in the art, as desired, without creative contribution to the above-described embodiments, while remaining within the scope of the patent laws.
Claims (21)
1. A multi-charge state beam extraction device for a negative hydrogen ion cyclotron is characterized in that: a proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device is arranged on a track of accelerating the beam to extract energy; or a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged; or proton and hydrogen atom double-charge state beam extraction devices are arranged; the three-charge state or double-charge state beam extraction devices are respectively provided with a stripping target and/or an electrostatic deflection plate, wherein the stripping target and/or the electrostatic deflection plate is formed by combining stripping films with different thicknesses and different positions, the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films are set to be different thicknesses according to the requirements of multi-charge state beam extraction; the different positions are that the front and rear positions of the plurality of stripping films are different and the radial positions are different on the track of beam extraction.
2. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 1, wherein: the proton, negative hydrogen ion and hydrogen atom three-charge state beam extraction device comprises a stripping target formed by combining a stripping film A, a stripping film B and a stripping film C and an electrostatic deflection plate; the thickness of the stripping film A is the thickness with the highest flow intensity of the hydrogen atoms H when the hydrogen atoms H are led out; the thickness of the stripping film B and the stripping film C is thick enoughLeading out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
3. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 2, wherein: the combined stripping target of the stripping film A, the stripping film B and the stripping film C has the width larger than 150% of the beam spot size so as to ensure that the beam passes through the stripping film instead of the rear end bracket of the stripping film, the radial positions of the inner sides of the stripping film A and the stripping film B are the same, and the duty ratio of the proton beam can be adjusted on line by adjusting the radial position of the stripping film C.
4. A multi-charge state beam extraction apparatus for a negative hydrogen ion cyclotron according to claim 3, wherein: the duty ratio of the proton beam can be adjusted on line by adjusting the radial position of the stripping film C, specifically: the proton beam duty ratio is lowest when the inside radius of the release film C is larger than the outside radius of the small hole of the release film B.
5. A multi-charge state beam extraction apparatus for a negative hydrogen ion cyclotron according to claim 3, wherein: the duty ratio of the proton beam can be adjusted on line by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam ratio, and the lower the hydrogen atom beam and the negative hydrogen ion beam ratio, and when the inside radius of the release film C is smaller than the inside radius of the small hole of the release film B, only the proton beam is extracted.
6. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 2, wherein: the stripping target formed by combining the stripping film A, the stripping film B and the stripping film C can adjust the duty ratio of the hydrogen atom beam on line by adjusting the radial position of the stripping film A.
7. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 6, wherein: the duty ratio of the hydrogen atom beam can be adjusted on line by adjusting the radial position of the stripping film A, and the method specifically comprises the following steps: the hydrogen atom beam is the highest when the inside radius of the release film a is smaller than the inside radius of the pores of the release film B.
8. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 6, wherein: the duty ratio of the hydrogen atom beam can be adjusted on line by adjusting the radial position of the stripping film A, and the method specifically comprises the following steps: the hydrogen atom beam duty ratio is lower when the inside radius of the release film a is larger, the proton beam and the negative hydrogen ion beam duty ratio is higher, and the hydrogen atom beam duty ratio is reduced to 0 when the inside radius of the release film a is larger than the outside radius of the small hole of the release film B or the inside radius of the release film C.
9. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 6, wherein: and meanwhile, the radial positions of the stripping film C and the stripping film A are adjusted, so that the on-line adjustment of the duty ratios of the three charge state beams can be realized.
10. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 6, wherein: the inside radii of the peeling films a and C cannot be smaller than the inside radius of the peeling film B to prevent the peeling of particles on the trajectories of the extraction energy regions from the peeling films a and C where the inside radii are smaller than the inside radius of the peeling film B.
11. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 1, wherein: the proton beam and negative hydrogen ion dual-charge state beam extraction device consists of a stripping target formed by combining a stripping film B and a stripping film C and an electrostatic deflection plate; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; middle of the release film BRectangular through holes are formed between the electrostatic deflection plates, and the rectangular through holes are used for controlling negative hydrogen ions to pass through the electrostatic deflection plates, so that the electrostatic deflection plates are not bombarded by the negative hydrogen ions.
12. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 11, wherein: the stripping target formed by combining the stripping film B and the stripping film C realizes on-line adjustment of the proton and negative hydrogen ion duty ratio by adjusting the radial position of the stripping film C.
13. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 12, wherein: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: when the radius of the inner side of the stripping film C is larger than that of the outer side of the small hole of the stripping film B, the proton beam is the lowest and the negative hydrogen ion beam is the highest.
14. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 12, wherein: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the negative hydrogen ion beam duty ratio.
15. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 11, wherein: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: when the inner radius of the stripping film C is smaller than the inner radius of the small holes of the stripping film B, only the proton beam is extracted.
16. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 11, wherein: when the radial position of the peeling film C is adjusted, the inner radius of the peeling film C cannot be smaller than the inner radius of the peeling film B, so as to prevent the peeling film C from peeling particles which do not reach the track of the extraction energy region at a position smaller than the inner radius of the peeling film B.
17. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 1, wherein: the proton and hydrogen atom double-charge state beam extraction device consists of a stripping target formed by combining a stripping film A and a stripping film C; the thickness of the stripping film A is the thickness with the highest flow intensity of the hydrogen atoms H when the hydrogen atoms H are led out; the thickness of the stripping film C is thick enough to draw out protons H + The ratio is more than 99.9%.
18. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 17, wherein: the stripping target formed by combining the stripping film A and the stripping film C realizes on-line adjustment of the ratio of protons to hydrogen atoms by adjusting the radial position of the stripping film C.
19. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 18, wherein: the on-line adjustment of the proton and hydrogen atom duty ratio is realized by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the hydrogen atom beam duty ratio.
20. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 18, wherein: the on-line adjustment of the proton and hydrogen atom duty ratio is realized by adjusting the radial position of the stripping film C, specifically: when the inside radius of the peeling film C is equal to the inside radius of the peeling film a, only the proton beam is extracted.
21. The multi-charge state beam extraction device for a negative hydrogen ion cyclotron according to claim 18, wherein: the on-line adjustment of the proton and hydrogen atom ratio is realized by adjusting the position of the stripping film A, specifically: when the position of the stripping film C is adjusted, the inner radius of the stripping film C cannot be smaller than the inner radius of the stripping film A, so as to prevent the stripping film C from stripping particles which do not reach the track of the extraction energy region at the position smaller than the inner radius of the stripping film A.
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