CN116234141A - Proton beam and negative hydrogen ion dual-charge state beam extraction device - Google Patents

Proton beam and negative hydrogen ion dual-charge state beam extraction device Download PDF

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Publication number
CN116234141A
CN116234141A CN202310170775.2A CN202310170775A CN116234141A CN 116234141 A CN116234141 A CN 116234141A CN 202310170775 A CN202310170775 A CN 202310170775A CN 116234141 A CN116234141 A CN 116234141A
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China
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stripping
negative hydrogen
charge state
stripping film
hydrogen ion
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冀鲁豫
安世忠
宋国芳
纪彬
边天剑
王哲
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China Institute of Atomic of Energy
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China Institute of Atomic of Energy
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/10—Arrangements for ejecting particles from orbits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H13/00—Magnetic resonance accelerators; Cyclotrons
    • H05H13/005—Cyclotrons
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Particle Accelerators (AREA)

Abstract

The invention discloses a proton beam and negative hydrogen ion dual-charge state beam extraction device, which is characterized in that: a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged on a track of accelerating beam current to extract energy; the dual-charge state beam extraction device is provided with a stripping target and an electrostatic deflection plate, wherein the stripping target and the electrostatic deflection plate are formed by combining stripping films with different thicknesses and different positions, the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films are set to be different thicknesses according to the requirements of multi-charge state beam extraction; the different positions are that the front and back positions of the plurality of stripping films are different and the radial positions are different on the track of beam extraction; the invention solves the problems that the prior art only can lead out the beam current in a single charge state, and can only adjust the total current intensity of the beam current in each charge state on line, but can not adjust the current intensity of the beam current in each charge state respectively.

Description

Proton beam and negative hydrogen ion dual-charge state beam extraction device
Technical Field
The invention belongs to the technical field of cyclotrons, and particularly relates to a proton beam and negative hydrogen ion dual-charge state beam extraction device.
Background
A cyclotron is a circular accelerator in which charged particles are caused to perform a cyclotron motion along a closed orbit, and the particles are caused to be cyclically and repeatedly accelerated by an electric field that acts on the periodic oscillations of an acceleration gap. The cyclotron can accelerate by repeatedly utilizing a high-frequency electric field, so that particles can be accelerated to higher energy with lower cost, and the cyclotron can be widely applied to various fields such as nuclear physics research, aerospace, weaponry, isotope production, cancer treatment, industrial irradiation and the like. And because of the characteristics of small floor space, low cost, high reliability, easy maintenance, wide application and the like, a large number of commercial and industrial cyclotrons have appeared in the world in the last century.
Among many applications, most applications have no special requirement on the electrical property of the extracted beam, but with the development of scientific research, some applications put new requirements on the beam electrical property: not only is the multi-state charge required to be simultaneously provided at one time, but also the beam intensity of each charge state beam is required to be flexibly adjusted on line. The simultaneous provision of the polymorphic charge at one time is required to provide a negative hydrogen ion beam and/or a hydrogen atom beam in addition to the conventional proton beam.
The difficulty in providing the multi-state charge simultaneously as described above is: if an electrostatic deflection extraction method is adopted, only one of proton beams or negative hydrogen ion beams can be extracted; also, negative hydrogen ion beams cannot be extracted by the method of extraction using a release film.
The difficulty in on-line adjustment of various electric charge amounts is as follows: because each extraction device can only extract one charge state beam, the current intensity of a single charge cannot be adjusted by a method of distributing total current of each charge state beam, and if the current intensity of a single type beam is to be adjusted online, the intensity of an injection beam is adjusted. Assuming that the same extraction device can extract multiple charge state beams at the same time, when the method for adjusting the intensity of the injected beam is adopted to adjust the intensity of each charge state in the multiple charge states, the total intensity of each charge state beam can only be adjusted on line, but the intensity of each charge state beam cannot be adjusted respectively.
Disclosure of Invention
The invention provides a proton beam and negative hydrogen ion dual-charge state beam extraction device aiming at the problems in the prior art, and aims to solve the problems that each extraction device in the prior art can only extract one charge state beam, can only adjust the total current intensity of each charge state beam on line, and can not respectively adjust the current intensity of each charge state beam.
The invention provides the following technical scheme for solving the technical problems:
a proton beam and negative hydrogen ion dual-charge state beam extraction device is characterized in that: a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged on a track of accelerating beam current to extract energy; the dual-charge state beam extraction device is provided with stripping targets and/or electrostatic deflection plates, wherein the stripping targets and/or the electrostatic deflection plates are formed by combining stripping films with different thicknesses and different positions, the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films with different thicknesses are arranged according to the requirements of multi-charge state beam extraction; the different positions are that the front and back positions of the plurality of stripping films are different and the radial positions are different on the track of beam extraction;
further, the proton beam and negative hydrogen ion dual-charge state beam extraction device consists of a stripping target formed by combining a stripping film B and a stripping film C and an electrostatic deflection plate; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
Further, the stripping target formed by combining the stripping film B and the stripping film C realizes on-line adjustment of the ratio of protons to negative hydrogen ions by adjusting the radial position of the stripping film C.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the radial position of the stripping film C, specifically: when the radius of the inner side of the stripping film C is larger than that of the outer side of the small hole of the stripping film B, the proton beam is the lowest and the negative hydrogen ion beam is the highest.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the negative hydrogen ion beam duty ratio.
Further, it is characterized in that: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: when the inner radius of the stripping film C is smaller than the inner radius of the small holes of the stripping film B, only the proton beam is extracted.
Further, when the radial position of the peeling film C is adjusted, the inside radius of the peeling film C cannot be smaller than the inside radius of the peeling film B, so as to prevent the peeling film C from peeling particles on the trajectory of the extraction energy region where the inside radius of the peeling film B is smaller.
Advantageous effects of the invention
1. According to the invention, the stripping target and/or the electrostatic deflection plate are/is arranged on the beam extraction track, and the stripping films with different thicknesses, different longitudinal positions and different radial positions are arranged on the stripping target, so that the duty ratio of each component beam is adjusted on line by adjusting the radial positions of each stripping film, and the problems that only single-charge-state beams can be extracted, only the total current intensity of each charge-state beam can be adjusted on line, and the current intensity of each charge-state beam cannot be respectively adjusted in the prior art are solved.
2. The invention skillfully utilizes the characteristic that the sum of the beam intensities of various charge states after stripping (namely the total current intensity) is equal to the current intensity before stripping, and solves the problem that the on-line adjustment of the beam ratio of each component is difficult for a person skilled in the art for a long time: because the invention sets a plurality of stripping films aiming at multiple charge states instead of only one stripping film on the beam extraction track, when one stripping film can not extract the injection flow intensity by 100% because of adjusting the radial position of the stripping film, the residual flow intensity can be absorbed by the stripping films of other charge states on the extraction track and can not be combined into the next beam group of the current stripping film again because the residual flow intensity can be removed from the beam group instead of the position, and the residual flow intensity can not be continuously rotated on the accelerator extraction track since the residual flow intensity can be removed from the beam group.
Drawings
FIG. 1 is a schematic diagram of a proton beam and negative hydrogen ion dual-charge state beam extraction device according to the present invention;
FIG. 2 is a graph showing the variation of each beam current component with the thickness of the stripped film during the stripping process of the negative hydrogen ion beam according to the present invention;
FIG. 3 is a release film structure of the present invention;
FIG. 4a is a schematic diagram of a first method of adjusting the duty cycle of a proton beam and a negative hydrogen ion beam according to the present invention;
FIG. 4b illustrates a second method of adjusting the duty cycle of a proton beam and a negative hydrogen ion beam according to the present invention;
fig. 4c illustrates a third method of adjusting the duty cycle of the proton beam and the negative hydrogen ion beam according to the present invention.
Detailed Description
Principle of design of the invention
1. And (5) stripping the target structure design. As shown in FIG. 3, the present invention mounts two release films (only one release film is present in a conventional release target) on the release target, and the two release films have different film thicknesses, different longitudinal positions and different radial positions. The thickness is different, namely the thickness of the stripping film is selected according to the beam current requirement, the current intensity of each charge state beam current obtained after stripping of each thickness is different, and the sum (namely the total current intensity) of the current intensities of all charge states after stripping is equal to the current intensity before stripping; the longitudinal positions are different in the front-back positions of the two stripping films on the beam track, and the radial positions are different in the positions of the two stripping films along the radius of the accelerator.
2. Principle that each beam component changes along with stripping film thickness in the negative hydrogen ion beam stripping process. As shown in FIG. 2, the negative hydrogen ions are injected from the center region of the accelerator, and electrons of the negative hydrogen ions are stripped with the increase of the stripping film thickness during stripping of the negative hydrogen ion beamWhen electrons are stripped, 1 electron or 2 electrons are stripped, 1 electron is stripped to become a hydrogen atom beam, and 2 electrons are stripped to become a proton beam. Wherein, the ratio of the hydrogen atom beam has a peak value in the process of changing the thickness of the stripping film, and the peak value gradually decreases later, and the decrease is caused by the decrease of the total number of negative hydrogen ions, so the number of hydrogen atoms generated by stripping is also decreased; however, as the number of hydrogen atoms decreases, part of the hydrogen atoms are stripped by 1 electron again, and when part of the hydrogen atoms are stripped by 1 electron again, the hydrogen atoms become protons, and the number of protons stripped by the hydrogen atoms increases. At the same time, the protons hardly acquire electrons to be changed into hydrogen atoms H or negative hydrogen ions H - . Therefore, after the stripping film reaches a certain thickness, the beam current can be completely stripped into a proton beam.
3. Multiple lift-off film thickness design principle. The thickness design of the two stripping films is performed according to the principle that the beam current of each component has different duty ratios when the stripping film thicknesses are different in fig. 2, and as shown in fig. 2, the abscissa represents the stripping film thickness and the ordinate represents the beam current intensity. (1) When the thickness of the stripping film is 6, the flow intensity of hydrogen atoms is the highest and 60, but at this time, the negative hydrogen ions H - And protons H + The flow strength of the hydrogen atoms is only approximately 20, and at a thickness of 6 a of the peeling film, the flow strength of the hydrogen atoms is H - And protons H + 3 times the flow strength of (2); (2) as the flow intensity of hydrogen atoms and the flow intensity of negative hydrogen ions gradually decrease as the film is peeled off, they decrease to 0 when the film thickness reaches 40, but the flow intensity of protons reaches at the highest near 99.
By utilizing the above characteristics, the thickness of the hydrogen atom-generating peeling film is designed to be close to 6, and the thickness of the proton-generating peeling film is designed to be 40, and in actual operation, the thickness of the proton-generating peeling film can be as thick as possible, so that the flow intensity is close to 99.9%. As seen from fig. 2, the negative hydrogen ions have a flux intensity of at most 100 at an abscissa of 0 a release film thickness, and therefore, the negative hydrogen ions are designed to have a thickness of 0 a, that is, no release film is provided. However, since the electrostatic deflection plate is not bombarded by negative hydrogen ions to lose the power of the negative hydrogen ions when the negative hydrogen ions reach the electrostatic deflection plate, a stripping film for the negative hydrogen ions is specially arranged, wherein the stripping film is provided with a rectangular window at the center, and the size of the rectangular window is calculated and is used for controlling the diameter of the beam cluster of the negative hydrogen ions passing through the rectangular window, and the diameter ensures that the beam cluster does not bombard the electrostatic deflection plate when passing through the electrostatic deflection plate.
Fig. 2 shows the result of the beam energy, the thickness required after the beam energy is changed is different, and the maximum value of the beam intensity of the hydrogen atoms may be different. For example, the thickness of the peak of the hydrogen atom beam may be 6 to 12, the corresponding thickness of protons 99 may be 80, etc. These are all computable and belong to the prior art. The thicknesses 6, 40, etc. in this bar are not common to all energies and require additional explanation
4. Multiple release film radial position design principle. The positions include a longitudinal position and a radial position. The longitudinal positions are not in sequence, and can be reversed, because the ratio of the component beams is determined by the thickness of the stripping film instead of the front and back positions of the stripping film, and the positions are changed but the thickness is unchanged. The radial position of the release films is used to adjust the charge duty cycle between the individual release films, and the radial position of each release film must be as desired for its duty cycle, and the radial position cannot be reversed at will. The radial position is the distance from the inside of the release film to the accelerator center point. Since the total length of the release film is constant, the width of the release film varies with the radial distance from the inside of the release film to the accelerator center point.
5. The method of adjusting the radial positions of a plurality of stripping films is used for replacing the method of adjusting the intensity of the injection beam current. Adjusting the radial position of the plurality of stripping films can change the ratio of the plurality of charges relative to each other, but adjusting the radial position of a single stripping film cannot change the flow intensity of a single type of charge, but can only change the flow intensity by adjusting the intensity of the injection beam. Since the total current intensity is constant from input to output, for a single type of flux, even if the radial position of the stripping film C is changed (the radial distance inside the stripping film C becomes large, the width is shortened) so that most of the flux is left without going through the stripping film C to become protons, and only a few of the fluxes become protons, but the remaining fluxes are not lost but continue to rotate at the accelerator and are merged into the next flux, when the next flux passes through the stripping film C, the current intensity thereof is not only the current intensity injected from the injection port but also the remaining flux intensity that has not been extracted last time to continue to rotate at the accelerator extraction track, including the remaining current intensity of the last N times until the remaining current intensity of the flux that has passed through the stripping film C is forced to be equal to the 100% injected current intensity of the last N times. Since the accelerator has millions of clusters in 1 second, the whole process is negligibly fast from only a small fraction of the extracted implant flow to 100% of the extracted implant flow, i.e., for the extracted single charge state beam, the radial position of the stripping film C is moved, but the extracted beam flow is not changed, and still one hundred percent of the beam flow is extracted. The reason for this is that the injected stream strength is not lost and the remaining stream is added to the next cluster.
However, when extracting a beam of multiple charge states, the situation changes: the remaining beam does not continue to rotate on the accelerator exit track, but is instead distributed to other stripping films at different radial positions, which, due to their different thicknesses, produce beams of different duty cycles and different charge states. These different duty cycles and the flow of the beam current of different charge states together impose an injection total flow intensity equal to 100%. Therefore, in the case of extracting the multiple charge states, the duty ratio between the multiple charge state fluxes can be adjusted by adjusting the radial position of the release film. In addition, in the case of extracting multiple charge states, only a method of adjusting the radial position thereof can be adopted, but a method of adjusting the injection current cannot be adopted. Because when the method for adjusting the intensity of the injected beam is adopted to adjust the intensity of each of the multiple charge states, the total intensity of each charge state beam can only be adjusted on line, but the intensity of each charge state beam cannot be adjusted respectively.
Based on the principle, the invention designs a proton beam and negative hydrogen ion dual-charge state beam current leading-out device.
A proton beam and negative hydrogen ion dual-charge state beam extraction device is shown in figure 1, which is characterized in that: a proton beam 4 and a negative hydrogen ion 5 dual-charge state beam extraction device is arranged on a track 3 for accelerating the beam to extract energy; the dual-charge state beam extraction device is provided with a stripping target 1 and an electrostatic deflection plate 2, wherein the stripping target 1 is formed by combining stripping films with different thicknesses and different positions, the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films are set to be different thicknesses according to the requirements of multi-charge state beam extraction; the different positions are positions of the plurality of release films in front and back directions and in radial directions on the beam-extracted track 3.
Further, as shown in fig. 1 and 3, the proton beam and negative hydrogen ion dual-charge state beam extraction device consists of a stripping target and an electrostatic deflection plate, wherein the stripping target is formed by combining a stripping film B and a stripping film C; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
Further, the stripping target formed by combining the stripping film B and the stripping film C realizes on-line adjustment of the proton and negative hydrogen ion ratio by adjusting the radial position of the stripping film C.
Supplementary description
The stripping film B and the stripping film C are respectively arranged on the film frames, the film frames are connected with the stripping target, the radial back-and-forth movement of each film frame is controlled by a motor and the like, the positions of the film frames are fed back, and the radial position of each stripping film is adjusted on line.
Further, as shown in fig. 4a, the on-line adjustment of the duty ratio of protons and negative hydrogen ions is realized by adjusting the radial position of the stripping film C, specifically: when the radius of the inner side of the stripping film C is larger than that of the outer side of the small hole of the stripping film B, the proton beam is the lowest and the negative hydrogen ion beam is the highest.
Further, the on-line adjustment of the proton and negative hydrogen ion duty ratio is realized by adjusting the radial position of the stripping film C, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the negative hydrogen ion beam duty ratio.
Further, as shown in fig. 4C, the on-line adjustment of the duty ratio of protons and negative hydrogen ions is realized by adjusting the radial position of the stripping film C, specifically: when the inner radius of the stripping film C is smaller than the inner radius of the small holes of the stripping film B, only the proton beam is extracted.
Further, when the radial position of the peeling film C is adjusted, the inside radius of the peeling film C cannot be smaller than the inside radius of the peeling film B, so as to prevent the peeling film C from peeling particles on the trajectory of the extraction energy region where the inside radius of the peeling film B is smaller.
It should be emphasized that the above-described embodiments are merely illustrative of the invention, which is not limited thereto, and that modifications may be made by those skilled in the art, as desired, without creative contribution to the above-described embodiments, while remaining within the scope of the patent laws.

Claims (7)

1. A proton beam and negative hydrogen ion dual-charge state beam extraction device is characterized in that: a proton beam and negative hydrogen ion dual-charge state beam extraction device is arranged on a track of accelerating beam current to extract energy; the dual-charge state beam extraction device is provided with a stripping target and an electrostatic deflection plate, wherein the stripping target and the electrostatic deflection plate are formed by combining stripping films with different thicknesses and different positions, the stripping films with different positions are used for on-line adjustment of the beam duty ratio of each component, and the stripping films are set to be different thicknesses according to the requirements of multi-charge state beam extraction; the different positions are that the front and rear positions of the plurality of stripping films are different and the radial positions are different on the track of beam extraction.
2. The proton beam and negative hydrogen ion dual charge state beam extraction apparatus of claim 1, wherein: the stripping target and the electrostatic bias formed by combining the stripping film B and the stripping film C are provided with the proton beam and negative hydrogen ion dual-charge state beam extraction deviceA rotating plate is formed; the thickness of the stripping film B and the stripping film C is thick enough to lead out protons H + The ratio is more than 99.9 percent; the middle of the stripping film B is provided with a rectangular through hole, and the rectangular through hole is used for controlling the electrostatic deflection plate not to be bombarded by negative hydrogen ions when the negative hydrogen ions pass through the electrostatic deflection plate.
3. The proton beam and negative hydrogen ion dual charge state beam extraction apparatus of claim 2, wherein: the stripping target formed by combining the stripping film B and the stripping film C realizes on-line adjustment of the duty ratio of protons and negative hydrogen ions by adjusting the radial position of the stripping film C.
4. A proton beam and negative hydrogen ion dual charge state beam extraction apparatus as claimed in claim 3, wherein: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: when the radius of the inner side of the stripping film C is larger than that of the outer side of the small hole of the stripping film B, the proton beam is the lowest and the negative hydrogen ion beam is the highest.
5. A proton beam and negative hydrogen ion dual charge state beam extraction apparatus as claimed in claim 3, wherein: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: the smaller the inside radius of the release film C, the higher the proton beam duty ratio, and the lower the negative hydrogen ion beam duty ratio.
6. A proton beam and negative hydrogen ion dual charge state beam extraction apparatus as claimed in claim 3, wherein: the method is characterized in that: the radial position of the stripping film C is adjusted to realize the on-line adjustment of the duty ratio of protons and negative hydrogen ions, specifically: when the inner radius of the stripping film C is smaller than the inner radius of the small holes of the stripping film B, only the proton beam is extracted.
7. A proton beam and negative hydrogen ion dual charge state beam extraction apparatus as claimed in claim 3, wherein: when the position of the stripping film C is adjusted, the inner radius of the stripping film C cannot be smaller than the inner radius of the stripping film B, so as to prevent the stripping film C from stripping particles which do not reach the track of the extraction energy region at the position smaller than the inner radius of the stripping film B.
CN202310170775.2A 2023-02-27 2023-02-27 Proton beam and negative hydrogen ion dual-charge state beam extraction device Pending CN116234141A (en)

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CN202310170775.2A CN116234141A (en) 2023-02-27 2023-02-27 Proton beam and negative hydrogen ion dual-charge state beam extraction device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310170775.2A CN116234141A (en) 2023-02-27 2023-02-27 Proton beam and negative hydrogen ion dual-charge state beam extraction device

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Publication Number Publication Date
CN116234141A true CN116234141A (en) 2023-06-06

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