CN116413924A - Millimeter wave annular beam implementation method and system - Google Patents
Millimeter wave annular beam implementation method and system Download PDFInfo
- Publication number
- CN116413924A CN116413924A CN202310328255.XA CN202310328255A CN116413924A CN 116413924 A CN116413924 A CN 116413924A CN 202310328255 A CN202310328255 A CN 202310328255A CN 116413924 A CN116413924 A CN 116413924A
- Authority
- CN
- China
- Prior art keywords
- reflecting mirror
- mirror
- group
- millimeter wave
- mirror group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 41
- 230000005540 biological transmission Effects 0.000 claims abstract description 30
- 238000013461 design Methods 0.000 claims abstract description 28
- 238000012937 correction Methods 0.000 claims abstract description 26
- 238000010276 construction Methods 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 238000004613 tight binding model Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000007493 shaping process Methods 0.000 abstract description 2
- 238000011160 research Methods 0.000 description 8
- 230000005672 electromagnetic field Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
Abstract
The invention provides a millimeter wave annular beam realization method and a millimeter wave annular beam realization system, belongs to the technical field of millimeter wave transmission and near field shaping, and solves the problem that the realizability and realization method of the annular beam are not researched to improve the power capacity of a dielectric window in the prior art; comprising the following steps: s1, constructing a phase correction model of a ring beam implementation system; s2, carrying out a mirror surface design flow of two groups of reflectors in the annular beam realization system according to the phase correction model; s3, after the mirror surface design flow is completed, a first reflecting mirror group and a second reflecting mirror group are obtained; s4, arranging the first reflecting mirror group and the second reflecting mirror group in the system, arranging a dielectric window between the first reflecting mirror group and the second reflecting mirror group, and realizing millimeter wave annular beams at the dielectric window through mode conversion of the reflecting mirror group on electromagnetic wave beams; the invention reduces peak field intensity and maximum temperature rise on the existing hardware cost, and greatly improves the transmission power at the dielectric window.
Description
Technical Field
The invention belongs to the technical field of millimeter wave transmission and near field shaping, and particularly relates to a millimeter wave annular beam realization method and system.
Background
In experimental research of magnetic confinement thermonuclear fusion, high-power millimeter waves are required to be adopted for electron cyclotron resonance heating. The high-power millimeter wave is generated by a millimeter wave source, and the high-efficiency transmission can not be realized until the millimeter wave enters the transmission line, and vacuum is isolated through a dielectric window. Because of dielectric loss in the process, the high-power millimeter wave can continuously heat the dielectric window during transmission, and the electromagnetic wave power output by the millimeter wave source is generally close to megawatt level, so that severe requirements are put on dielectric window sheets, and the management of the dielectric window is particularly important in experiments.
In the high-power millimeter wave transmission system in the current research field, a fundamental mode Gaussian beam is usually formed at a dielectric window; the field distribution of the Gaussian beam of the fundamental mode is Gaussian, and the maximum value point of the power density of the Gaussian beam is positioned at the center of the dielectric window, so that the liquid cooling and heat dissipation process at the edge of the dielectric window is not facilitated; resulting in a maximum theoretical power capacity of only 2MW even with diamond as the material for the dielectric window. In order to improve the power capacity of the dielectric window, a person skilled in the art researches on several electromagnetic wave distribution modes on the dielectric window, and considers that the annular wave beam can reduce peak field intensity and is easier for radial heat conduction so as to realize the edge liquid cooling heat dissipation process, and the power capacity of the dielectric window is expected to be greatly improved.
However, the existing research only stays in the research stage of temperature rise conditions of different electromagnetic field distribution on a dielectric window, and the feasibility and implementation method of the annular beam are not researched yet; how to obtain a ring beam on the premise of not increasing excessive hardware cost and system complexity in the existing electron cyclotron resonance system has become a key research point of the technicians in the field.
Disclosure of Invention
In order to break through and solve the research problem in the background technology, the invention realizes the annular distribution effect of the electromagnetic field at the dielectric window under the condition of not increasing the complexity and the cost of the existing electron cyclotron resonance system, thereby greatly improving the power capacity at the weak dielectric window area in the whole system and simultaneously keeping the low transmission loss.
The invention adopts the following technical scheme to achieve the purpose:
a millimeter wave ring beam implementation method comprises the following steps:
s1, constructing a phase correction model of a ring beam implementation system;
s2, carrying out a mirror surface design flow of two groups of reflectors in the annular beam implementation system according to the phase correction model;
s3, after the mirror surface design flow is completed, a first reflecting mirror group and a second reflecting mirror group are obtained;
s4, arranging a first reflecting mirror group and a second reflecting mirror group in the annular beam realization system, and arranging a dielectric window between the first reflecting mirror group and the second reflecting mirror group, wherein the millimeter wave annular beam can be realized at the dielectric window;
in the step S3, the first reflecting mirror group after the mirror design flow is finished converts the paraxial complex beam entering the annular beam realization system into an annular beam and outputs the annular beam to the medium window; and the second reflecting mirror group after the mirror design flow is finished converts the annular beam leaving the dielectric window into a fundamental mode Gaussian beam and couples the fundamental mode Gaussian beam into the corrugated waveguide transmission line, so that the process from generation of millimeter waves to entering the transmission line is completed.
Further, the construction process of the phase correction model in S1 specifically includes:
according to the electromagnetic wave diffraction theory, the field distribution of a target area at a dielectric window is obtained through the source field distribution, and the following formula is adopted:
in the method, in the process of the invention,
is a free space green function; />
Is the source field distribution; />
Is the target area field distribution; when an incident electromagnetic wave is reflected by the mirror surface of the mirror, the field distribution due to the mirror surface deformation changes as follows:
U m ＝U 0 exp(jkΔΦ)
wherein k is the wave number; u (U) m Is a field distribution change; u (U) 0 Is the incident field distribution; ΔΦ is the phase distribution change amount; the phase distribution change amount ΔΦ due to the electromagnetic wave propagation distance is as follows:
ΔΦ＝2kΔz cos(θ)
in the formula delta z Is the variation of the propagation distance of electromagnetic waves; θ is the angle of the incident electromagnetic wave; according to the above three formulas, the field distribution caused by the deformation of the final reflecting surface changes as follows:
U m ＝U 0 exp(j2kΔz cos(θ))
the expression is the expression of the phase correction model.
Further, the first reflecting mirror group comprises a first reflecting mirror and a second reflecting mirror, and the first reflecting mirror and the second reflecting mirror are phase correction mirrors; the specific steps of the mirror surface design flow of the first reflecting mirror group are as follows:
a1, arranging a first reflecting mirror and a second reflecting mirror to enable an outgoing beam of the first reflecting mirror to be an incident beam of the second reflecting mirror;
a2, transmitting an input field of the electromagnetic wave to a first reflecting mirror, wherein the field distribution of the first reflecting mirror is A (x) exp (j phi (x));
a3, transmitting the target beam to a second reflector, wherein the field distribution of the second reflector is that
A4, starting an iteration process, and transmitting the electromagnetic wave on the first reflecting mirror to the second reflecting mirror to obtain
Update->
Parameter values;
a5, according to
Obtaining the phase difference on the second reflector, and using the phase distribution delta phi=2kdelta z cos (theta) in the phase correction model, wherein delta phi is +.>
Updating the mirror surface type of the second reflecting mirror;
a6, transmitting the electromagnetic wave on the second reflecting mirror to the first reflecting mirror to obtain D (x) exp (j phi' (x)); updating the value of the phi' (x) parameter;
a7, according to the delta phi=phi (x) -phi' (x), the phase difference on the second reflecting mirror is obtained again, and the mirror surface type of the first reflecting mirror is updated by using the phase distribution delta phi=2kdelta z cos (theta) in the phase correction model;
and A8, when the output field distribution of the second reflecting mirror is consistent with the field distribution of the target area, exiting the iterative loop process, and finishing the mirror surface design flow of the first reflecting mirror group.
The invention also provides a millimeter wave annular beam realization system, which comprises a millimeter wave source, a first reflecting mirror group, a dielectric window, a second reflecting mirror group and a ripple waveguide transmission line which are sequentially arranged on a millimeter wave transmission path; the millimeter wave source is used for generating a paraxial complex beam, and the first reflecting mirror group is used for converting the entered paraxial complex beam into an annular beam and then acting on the dielectric window; the second reflector group is used for converting the annular wave beam entering after passing through the dielectric window into a fundamental mode Gaussian wave beam and coupling the fundamental mode Gaussian wave beam into the corrugated waveguide transmission line.
In summary, by adopting the technical scheme, the invention has the following beneficial effects:
the invention realizes the annular distribution of the electromagnetic field at the dielectric window without increasing the complexity and the cost of the existing electron cyclotron resonance system, greatly improves the transmission power capacity of the electron cyclotron resonance heating system and maintains the high-efficiency transmission process; the invention has the advantages that: 1. the peak field intensity on the dielectric window is reduced, and secondary electron emission effect possibly caused by window defects is reduced; 2. for the edge liquid cooling window, the radial heat dissipation path of the dielectric window is reduced, and the maximum temperature rise on the dielectric window is reduced; 3. the conversion efficiency is high, and the transmission loss is very low. Based on the research theory and the system and method thought provided by the invention, the process of the invention is completed by adopting a scalar diffraction theory equation, a vector diffraction theory equation or an electromagnetic field transmission equation in the field, so that the invention is relatively convenient and has excellent operability.
Drawings
FIG. 1 is a schematic diagram of the structural principle of the system of the present invention;
FIG. 2 is a schematic flow chart of the method of the present invention;
FIG. 3 is a schematic diagram of a phase correction model;
fig. 4 is an enlarged schematic explanatory view at a region S in fig. 3.
The meaning of the symbols in the drawings is specifically as follows:
the device comprises a 1-millimeter wave source, a 2-first reflector group, a 21-first reflector, a 22-second reflector, a 3-dielectric window, a 4-second reflector group, a 41-third reflector, a 42-fourth reflector and a 5-corrugated waveguide transmission line.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
A millimeter wave ring beam implementation method, which can refer to the flow chart of fig. 2, comprises the following steps:
s1, constructing a phase correction model of a ring beam implementation system;
s2, carrying out a mirror surface design flow of two groups of reflectors in the annular beam realization system according to the phase correction model;
s3, after the mirror surface design flow is completed, a first reflecting mirror group and a second reflecting mirror group are obtained;
s4, arranging the first reflecting mirror group and the second reflecting mirror group in the annular beam realization system, and arranging a dielectric window between the first reflecting mirror group and the second reflecting mirror group, wherein the millimeter wave annular beam can be realized at the dielectric window.
In step S3, the first reflecting mirror group after the mirror design flow is finished converts the paraxial complex beam entering the annular beam realization system into an annular beam and outputs the annular beam to the dielectric window; and the second reflecting mirror group after the mirror design flow is finished converts the annular beam leaving the dielectric window into a fundamental mode Gaussian beam and couples the fundamental mode Gaussian beam into the corrugated waveguide transmission line, so that the process from generation of millimeter waves to entering the transmission line is completed.
In this embodiment, the paraxial complex beam is generated by the millimeter wave source and then directly enters the annular beam implementation system.
The following focuses on the details of the phase correction model and the mirror design flow in this embodiment; referring to fig. 3 and 4, the phase correction model construction process in step S1 specifically includes:
according to the electromagnetic wave diffraction theory, the field distribution of a target area at a dielectric window is obtained through the source field distribution, and the following formula is adopted:
in the method, in the process of the invention,
is a free space green function; />
Is the source field distribution; />
Is the target area field distribution; when an incident electromagnetic wave is reflected by the mirror surface of the mirror, the field distribution due to the mirror surface deformation changes as follows:
U m ＝U 0 exp(jkΔΦ)
wherein k is the wave number; u (U) m Is a field distribution change; u (U) 0 Is the incident field distribution; ΔΦ is the phase distribution change amount; the phase distribution change amount ΔΦ due to the electromagnetic wave propagation distance is as follows:
ΔΦ＝2kΔz cos(θ)
in the formula delta z Is the variation of the propagation distance of electromagnetic waves; θ is the angle of the incident electromagnetic wave; according to the three formulas, the final reflecting surface is deformed to causeThe field distribution is changed as follows:
U m ＝U 0 exp(j2kΔz cos(θ))
the expression is an expression of the phase correction model.
In this embodiment, the content of the mirror design flow is as follows: in the mirror design flows of S2 and S3, the design flows of the first mirror group and the second mirror group are the same, so the first mirror group will be taken as an example for the detailed description of the embodiment; in the mirror design flow, the mirror surface type of each mirror in the first mirror group and the second mirror group is continuously updated in an iterative mode until the output field distribution of the first mirror group and the input field distribution of the second mirror group are the same as the field distribution of the target area.
The first reflecting mirror group comprises a first reflecting mirror and a second reflecting mirror, and the first reflecting mirror and the second reflecting mirror are phase correction mirrors; the specific steps of the mirror surface design flow of the first reflecting mirror group are as follows:
a1, arranging a first reflecting mirror and a second reflecting mirror to enable an outgoing beam of the first reflecting mirror to be an incident beam of the second reflecting mirror; the first mirror and the second mirror are placed in the positions shown in fig. 1, and the two mirrors are in a positional relationship similar to that of a periscope;
a2, transmitting an input field of the electromagnetic wave to a first reflecting mirror, wherein the field distribution of the first reflecting mirror is A (x) exp (j phi (x));
a3, transmitting the target beam to a second reflector, wherein the field distribution of the second reflector is that
A4, starting an iteration process, and transmitting the electromagnetic wave on the first reflecting mirror to the second reflecting mirror to obtain
Update->
Parameter values;
a5, according to
Obtaining the phase difference on the second reflector, and using the phase distribution delta phi=2kdelta z cos (theta) in the phase correction model, wherein delta phi is +.>
Updating the mirror surface type of the second reflecting mirror;
a6, transmitting the electromagnetic wave on the second reflecting mirror to the first reflecting mirror to obtain D (x) exp (j phi' (x)); updating the value of the phi' (x) parameter;
a7, according to the delta phi=phi (x) -phi' (x), the phase difference on the second reflecting mirror is obtained again, and the mirror surface type of the first reflecting mirror is updated by using the phase distribution delta phi=2kdelta z cos (theta) in the phase correction model;
and A8, when the output field distribution of the second reflecting mirror is consistent with the field distribution of the target area, exiting the iterative loop process, and completing the mirror surface design flow of the first reflecting mirror group.
In the method of the present embodiment, specifically, the first mirror group includes a first mirror and a second mirror, and the second mirror group includes a third mirror and a fourth mirror; the first reflecting mirror, the second reflecting mirror, the third reflecting mirror and the fourth reflecting mirror are all phase correction mirrors with irregularly curved mirror surfaces.
Example 2
On the basis of embodiment 1, this embodiment describes a millimeter wave ring beam implementation system, and in particular, reference may be made to the schematic diagram of fig. 1; the system comprises a millimeter wave source 1, a first reflector group 2, a dielectric window 3, a second reflector group 4 and a corrugated waveguide transmission line 5 which are sequentially arranged on a millimeter wave transmission path; the millimeter wave source 1 is used for generating a paraxial complex beam, and the first reflector group 2 is used for transforming the incoming paraxial complex beam into an annular beam and then acting on the dielectric window 3; the second mirror group 4 is used to transform the ring beam entering after passing through the dielectric window 3 into a fundamental mode gaussian beam and couple into the corrugated waveguide transmission line 5.
In the present embodiment, the first mirror group 2 includes a first mirror 21 and a second mirror 22; the outgoing beam of the first mirror 21 is the incoming beam of the second mirror 22; the first mirror 21 is used to receive the input of the paraxial complex beam and the second mirror 22 is used to output the ring beam to the dielectric window 3.
In the present embodiment, the second mirror group 4 includes a third mirror 41 and a fourth mirror 42; the outgoing beam of the third mirror 41 is the incoming beam of the fourth mirror 42; the third mirror 41 is used to receive the input of the ring beam at the dielectric window and the fourth mirror 42 is used to couple out the fundamental mode gaussian beam to the corrugated waveguide transmission line 5.
Claims (9)
1. The millimeter wave annular beam implementation method is characterized by comprising the following steps:
s1, constructing a phase correction model of a ring beam implementation system;
s2, carrying out a mirror surface design flow of two groups of reflectors in the annular beam implementation system according to the phase correction model;
s3, after the mirror surface design flow is completed, a first reflecting mirror group and a second reflecting mirror group are obtained;
s4, arranging a first reflecting mirror group and a second reflecting mirror group in the annular beam realization system, and arranging a dielectric window between the first reflecting mirror group and the second reflecting mirror group, wherein the millimeter wave annular beam can be realized at the dielectric window;
in the step S3, the first reflecting mirror group after the mirror design flow is finished converts the paraxial complex beam entering the annular beam realization system into an annular beam and outputs the annular beam to the medium window; and the second reflecting mirror group after the mirror design flow is finished converts the annular beam leaving the dielectric window into a fundamental mode Gaussian beam and couples the fundamental mode Gaussian beam into the corrugated waveguide transmission line, so that the process from generation of millimeter waves to entering the transmission line is completed.
2. The method for realizing the millimeter wave annular beam according to claim 1, wherein the method comprises the following steps: the paraxial complex beam is generated by a millimeter wave source and then directly enters the annular beam implementation system.
3. The millimeter wave ring beam implementation method according to claim 1, wherein the construction process of the phase correction model in S1 specifically includes:
according to the electromagnetic wave diffraction theory, the field distribution of a target area at a dielectric window is obtained through the source field distribution, and the following formula is adopted:
in the method, in the process of the invention,
is a free space green function; />
Is the source field distribution; />
Is the target area field distribution; when an incident electromagnetic wave is reflected by the mirror surface of the mirror, the field distribution due to the mirror surface deformation changes as follows:
U m ＝U 0 exp(jkΔΦ)
wherein k is the wave number; u (U) m Is a field distribution change; u (U) 0 Is the incident field distribution; ΔΦ is the phase distribution change amount; the phase distribution change amount ΔΦ due to the electromagnetic wave propagation distance is as follows:
ΔΦ＝2kΔzcos(θ)
wherein Δz is the electromagnetic wave propagation distance variation; θ is the angle of the incident electromagnetic wave; according to the above three formulas, the field distribution caused by the deformation of the final reflecting surface changes as follows:
U m ＝U 0 exp(j2kΔzcos(θ))
the expression is the expression of the phase correction model.
4. A millimeter wave ring beam implementation method according to claim 3, wherein: in the mirror surface design flow of the S2 and the S3, the design flow of the first reflecting mirror group and the second reflecting mirror group is the same; in the mirror design flow, the mirror surface type of each mirror in the first mirror group and the second mirror group is continuously updated in an iterative mode until the output field distribution of the first mirror group and the input field distribution of the second mirror group are the same as the field distribution of the target area.
5. The method of claim 4, wherein the first mirror group comprises a first mirror and a second mirror, and the first mirror and the second mirror are both phase correction mirrors; the specific steps of the mirror surface design flow of the first reflecting mirror group are as follows:
a1, arranging a first reflecting mirror and a second reflecting mirror to enable an outgoing beam of the first reflecting mirror to be an incident beam of the second reflecting mirror;
a2, transmitting an input field of the electromagnetic wave to a first reflecting mirror, wherein the field distribution of the first reflecting mirror is A (x) exp (j phi (x));
a3, transmitting the target beam to a second reflector, wherein the field distribution of the second reflector is that
A4, starting an iteration process, and transmitting the electromagnetic wave on the first reflecting mirror to the second reflecting mirror to obtain
Update->
Parameter values;
a5, according to
Obtaining the phase difference on the second reflector, and using the phase correctionPhase distribution ΔΦ=2kΔzcos (θ) in positive model, where ΔΦ is +.>
Updating the mirror surface type of the second reflecting mirror;
a6, transmitting the electromagnetic wave on the second reflecting mirror to the first reflecting mirror to obtain D (x) exp (j phi' (x)); updating the value of the phi' (x) parameter;
a7, according to the delta phi=phi (x) -phi' (x), the phase difference on the second reflecting mirror is obtained again, and the mirror surface type of the first reflecting mirror is updated by using the phase distribution delta phi=2kdelta zcos (theta) in the phase correction model;
and A8, when the output field distribution of the second reflecting mirror is consistent with the field distribution of the target area, exiting the iterative loop process, and finishing the mirror surface design flow of the first reflecting mirror group.
6. The method for realizing the millimeter wave annular beam according to claim 1, wherein the method comprises the following steps: the first reflecting mirror group comprises a first reflecting mirror and a second reflecting mirror, and the second reflecting mirror group comprises a third reflecting mirror and a fourth reflecting mirror; the first reflecting mirror, the second reflecting mirror, the third reflecting mirror and the fourth reflecting mirror are all phase correction mirrors with irregularly curved mirror surfaces.
7. A millimeter wave ring beam implementation system, characterized in that: the device comprises a millimeter wave source, a first reflecting mirror group, a dielectric window, a second reflecting mirror group and a corrugated waveguide transmission line which are sequentially arranged on a millimeter wave transmission path; the millimeter wave source is used for generating a paraxial complex beam, and the first reflecting mirror group is used for converting the entered paraxial complex beam into an annular beam and then acting on the dielectric window; the second reflector group is used for converting the annular wave beam entering after passing through the dielectric window into a fundamental mode Gaussian wave beam and coupling the fundamental mode Gaussian wave beam into the corrugated waveguide transmission line.
8. The millimeter wave ring beam implementation system of claim 7 wherein: the first reflector group comprises a first reflector and a second reflector; the emergent beam of the first reflector is the incident beam of the second reflector; the first mirror is used for receiving the input of the paraxial complex beam, and the second mirror is used for outputting the annular beam to a dielectric window.
9. The millimeter wave ring beam implementation system of claim 8 wherein: the second reflector group comprises a third reflector and a fourth reflector; the emergent beam of the third reflector is the incident beam of the fourth reflector; the third mirror is used for receiving the input of the annular wave beam at the dielectric window, and the fourth mirror is used for coupling out the fundamental mode Gaussian wave beam to the corrugated waveguide transmission line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310328255.XA CN116413924A (en) | 2023-03-30 | 2023-03-30 | Millimeter wave annular beam implementation method and system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310328255.XA CN116413924A (en) | 2023-03-30 | 2023-03-30 | Millimeter wave annular beam implementation method and system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116413924A true CN116413924A (en) | 2023-07-11 |
Family
ID=87049103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310328255.XA Pending CN116413924A (en) | 2023-03-30 | 2023-03-30 | Millimeter wave annular beam implementation method and system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116413924A (en) |
-
2023
- 2023-03-30 CN CN202310328255.XA patent/CN116413924A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108134163B (en) | The aiming light mode converting means and its method of Terahertz multimode frequency is adjustable gyrotron | |
| Jin et al. | Quasi-optical mode converter/mirror system for a high-power coaxial-cavity gyrotron | |
| CN108110404B (en) | Large-caliber planar achromatic reflective array antenna | |
| CN102394375B (en) | Double-frequency broadband ripple horn feed antenna | |
| CN111525270B (en) | Reflection-type polarization conversion super-surface orbital angular momentum generation structural design | |
| Zhao et al. | Design of quasi-optical mode converter for 170-GHz TE 32, 9-mode high-power gyrotron | |
| CN105529538A (en) | High-power millimeter-wave broadband mode converter based on continuous grating structure | |
| CN103078162A (en) | MMW (millimeter waves) terahertz quasi optical beam power synthesis network | |
| CN110164742B (en) | Transmission type electromagnetic mode converter for gyrotron based on artificial metamaterial | |
| Du et al. | Theoretical study of a broadband quasi-optical mode converter for pulse gyrotron devices | |
| CN116413924A (en) | Millimeter wave annular beam implementation method and system | |
| CN111081508B (en) | Reflection enhancement type gyrotron | |
| Jin et al. | A new method for synthesis of beam-shaping mirrors for off-axis incident Gaussian beams | |
| CN106505280A (en) | A kind of millimeter wave multi-frequency multi-mode mode excitation device | |
| Yang et al. | Design of high-power millimeter-wave TM/sub 01/-TE/sub 11/mode converters by the differential evolution algorithm | |
| CN207165721U (en) | A kind of millimeter wave multi-frequency multi-mode mode excitation device | |
| CN106602275A (en) | Electromagnetic vortex horn antenna | |
| Sobolev et al. | Minimization of diffraction losses in big gaps of multi-mode waveguides | |
| Xia et al. | Asymmetrical mirror optimization for a 140 GHz TE22, 6 quasi-optical mode converter system | |
| CN103268021B (en) | Method for realizing near field sub-wavelength focusing through artificial peculiar medium plane | |
| Ikeda et al. | Multi-frequency, megawatt-power gyrotron to facilitate a wide range of operations at ITER | |
| Vernon | High-power microwave transmission and mode conversion program | |
| CN216354809U (en) | Wide-band large-opening-angle horn feed source | |
| Liao | Miter bend mirror design for corrugated waveguides | |
| CN117673685A (en) | Radiator design method, radiator and multi-frequency millimeter wave mode conversion system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |