CN116400562A - Optical imprinting preparation method of high-precision sine cycloid diffraction wave plate - Google Patents
Optical imprinting preparation method of high-precision sine cycloid diffraction wave plate Download PDFInfo
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Abstract
The invention discloses a high-precision optical imprinting preparation method of a sine cycloid type diffraction wave plate, which improves the optical preparation precision by taking a sine cycloid type diffraction wave plate with at least two layers of twisted structures as a polarization conversion diffraction wave plate and realizes the optical imprinting of a hundred-nanometer sine cycloid periodic structure. The problems of low speed, poor environment interference resistance, further expansion of cost and high difficulty of an exposure system and the like for limiting mass production of the sine cycloid type diffraction wave plate prepared based on the polarization holographic exposure system are solved.
Description
Technical Field
The invention relates to a high-precision optical imprinting preparation method of a sine cycloid type diffraction wave plate, which comprises, but is not limited to, diffraction wave plates with anisotropic optical axes such as polarization gratings (Polarization gratings), fork gratings (Fork gratings) and polarization lenses (Polarization lens) distributed in a local or whole sine cycloid type.
Background
Compared with the traditional mechanical friction orientation technology, the non-contact photo-control orientation technology based on polarized light irradiation can realize the polarization direction of a high-quality and high-precision recording light field, thereby realizing the spatial distribution orientation of an anisotropic optical axis. For example, sinusoidal polarization gratings are produced by producing sinusoidal polarization directions in space by interference of two circularly polarized light beams of equal intensity and opposite handedness, which exhibit nearly 100% single-order diffraction efficiency, and are of great interest (c.oh and m.j. Escuti, "Numerical analysis of polarization gratings using the finite-difference time-domain method," Phys Rev A76 (2007)). The anisotropic optical axis of the sine cycloid diffraction waveplate exhibits a rotation of a sine function along the coordinate axis. The polarization grating is a typical sine cycloidal diffraction wave plate, and is formed by rotating 180 degrees as one period, and macroscopically countless such periods are repeatedly arranged in space. The polarized lens belongs to a diffraction wave plate with anisotropic optical axes in two-dimensional spatial distribution, and has different sine cycloid type periods along the radial direction, which is called a half-period structure, and can be regarded as a local sine cycloid type diffraction wave plate (L.S.Li, S.J.Shi, J.Kim and M.J. Esculeti, "Color-selective geometric-phase lenses for focusing and imaging based on liquid crystal polymer films," Optics Express 30,2487-2502 (2022)). The anisotropic optical axis of the sine cycloid type diffraction wave plate tends to be arranged in a state of lowest free energy of a body, and when the sine cycloid type period is gradually reduced, the anisotropic optical axis is difficult to maintain the arrangement distribution of the sine cycloid type planar structure, and the sine cycloid type planar structure is only provided when the thickness of the diffraction wave plate does not exceed a critical thickness. The twist axis of the anisotropic optical axis of the diffraction waveplate with twist angle is not exactly perpendicular to the planar structure of the glass substrate (J.H.Xiong, R.Chen, and s.t. wu, "Device simulation of liquid crystal polarization gratings," Optics Express 27,18102-18112 (2019)). The sine cycloid type diffraction wave plate has the advantages of high diffraction efficiency, polarization selectivity, simplicity in preparation, thinness and the like, and has potential huge advantages in the fields of light beam scanning, spectral imaging, augmented reality, virtual reality and the like.
The traditional sine cycloidal diffraction wave plate is based on a polarized holographic interference exposure method, and the method can prepare the high-resolution diffraction wave plate, but further expanding an exposure system increases cost and difficulty, is only suitable for laboratory-level manufacturing at present, and has poor environment interference resistance. Therefore, a need exists for a rapid, low cost imprint lithography process that is resistant to environmental interference to meet the needs of industrial production.
In recent years, imprinting technology of microlens arrays based on patterned grooves has been proposed, but the difficulty in preparing micro-sized grooves is great, and the quality of orientation is also general (Ziqian He, yun-Han Lee, ran Chen, debashis Chanda, and Shin-Tson Wu, "Switchable Pancharatnam-Berry microlens array with nano-imprinted liquid crystal alignment," opt. Lett.43,5062-5065 (2018)). The imprinting technique using a sinusoidal cycloidal polarization grating with a thickness satisfying the half-wave condition as a master can only imprint a polarization grating of a large period (micrometer order), and at a period of 2um or less, the polarization grating with a thickness satisfying the half-wave condition no longer has high diffraction efficiency, and it is difficult to satisfy the requirements as a polarization conversion diffraction wave plate (Sarik r.nerisiyan, nelson v.tabiryan, diane m.steeves, and Brian r.kimball, "Characterization of optically imprinted polarization gratings," appl.opt.48,4062-4067 (2009)).
Therefore, we propose a high-precision sine cycloid type diffraction wave plate optical imprinting preparation method, because the anisotropic optical axis can be controlled in the space dimension, and the distribution of the anisotropic optical axis directly influences the optical performance, based on this, a novel sine cycloid type diffraction wave plate with at least two layers of twisting structures is proposed as a polarization conversion diffraction wave plate to improve the precision of optical preparation. Therefore, the optical imprinting of the hundred-nanometer sine cycloid periodic structure can be realized, and the optical preparation method provides a feasible scheme for mass production with the advantages of high speed, strong environment interference resistance, low required light field energy density and the like.
Disclosure of Invention
A high-precision optical imprinting preparation method of a sine cycloid diffraction wave plate comprises a glass substrate, a photo-alignment film and at least two layers of polarization conversion diffraction wave plates with twisted structures.
The method can spatially regulate and control the polarization state of the light field emitted by the at least partially coherent light source, specifically, the polarization state of the light field is converted into sine cycloidal linear polarization distribution based on the polarization conversion diffraction wave plate, and the period of the distribution is half of that of the polarization conversion diffraction wave plate, so that the diffraction wave plate which is half of that of the polarization conversion diffraction wave plate can be prepared.
The absorption spectrum of the photo-alignment film comprises the wave band of the light source, and the alignment direction of the photo-alignment material is perpendicular to the long axis direction of the elliptical polarization state, so that the polarization information of the irradiated polarized light can be recorded.
The distribution of anisotropic optical axes of the polarization conversion diffraction wave plates of the at least two layers of twisted structures is as follows:
where φ (x, y) is the spatial distribution of the anisotropic optical axis in the x-y plane, which may be a partial or an entire sinusoidal cycloidal periodic structure, e.g., a polarization grating of φ (x) =πx/Λ x ，Λ x The cycle size of the sine cycloid is the cycle size of the sine cycloid; the polarized lens is
Such local periods may be expressed as
f is the focal length. d, d 1 、/>
Is the thickness and twist angle of the first layer diffraction wave plate, d 2 、
Is the thickness and twist angle of the second layer diffraction wave plate, the twist angle is determined by the concentration of chiral agent, phi offset The compensation twist angle for the second layer diffraction waveplate is usually equal to +.>
The high-precision optical imprinting preparation method of the sine cycloid type diffraction wave plate provided by the invention has the advantages that the thickness and the twist angle of at least two layers of diffraction wave plates are changed, namely, the spatial distribution of an anisotropic optical axis is changed to directly influence the optical performance of the device, so that the diffraction efficiency of the sine cycloid type polarization conversion diffraction wave plate is improved to more than 95%, the light field polarization state emitted by a light source is effectively converted into sine cycloid type polarization state distribution, and the sine cycloid type polarization state period is half of that of the polarization conversion diffraction wave plate. The method realizes high-quality, high-precision, stable and rapid batch preparation of the sine cycloid diffraction wave plates.
The preparation process of the polarization conversion diffraction wave plate provided by the invention comprises the following steps: and ultrasonically cleaning the glass substrate, irradiating the glass substrate with ozone ultraviolet light to obtain a clean glass substrate, coating a photo-alignment film on the clean glass substrate, performing interference exposure on the central area of the glass substrate coated with the photo-alignment film, spin-coating a chiral agent-doped liquid crystal polymer on the exposed glass substrate, curing and polymerizing the liquid crystal polymer under the ultraviolet light in a nitrogen environment, and repeating spin-coating of the liquid crystal polymer to obtain the polarization conversion diffraction wave plate.
The optical imprinting principle of the high-precision sine cycloid type diffraction wave plate provided by the invention is based on the polarization conversion diffraction wave plate to carry out sine cycloid type periodic space regulation and control on the polarization state of an incident light source, and the sine cycloid type diffraction wave plate can be converted into a sine cycloid type periodic which is half smaller than the period of the polarization conversion diffraction wave plate. In order to prevent the effect of fresnel reflection and not to damage the polarization conversion diffraction wave plate, the prepared polarization conversion diffraction wave plate was placed back to back with the glass substrate coated with the photo-alignment film, and the incident linearly polarized light was optically embossed without any additional optical elements.
The diffraction efficiency of the polarization conversion diffraction wave plate provided by the invention is higher than 95%, the problems that a polarization holographic interference exposure system is difficult to expand further and the cost is high are solved, and meanwhile, the optical imprinting preparation method has the advantages of strong environment interference resistance, high imprinting speed, low cost, high precision and the like. The realization scheme is provided for mass production of sine cycloidal diffraction wave plates.
Drawings
Fig. 1 is a sinusoidal periodic diffraction waveplate.
Fig. 2 is a partial or full sine cycloid periodic diffraction waveplate.
Fig. 3 is a multilayer twist structure polarization conversion diffraction waveplate.
Fig. 4 is a diagram showing that interference of left circularly polarized light and right circularly polarized light produces sinusoidal linear polarized light in a plane.
Fig. 5 is an optical imprint schematic of a polarization conversion diffraction waveplate.
Fig. 6 is a polarization conversion diffraction waveplate diffraction efficiency plot for a multilayer twisted structure.
FIG. 7 is a diagram of a polarizer grating optical waveguide fabricated by embossing with a period of 500 nm.
Detailed Description
The invention is further described below with reference to the accompanying drawings:
as shown in fig. 1, a sine cycloid type periodic diffraction wave plate in which an anisotropic optical axis 101 is rotated 180 ° to one period is referred to as an integral sine cycloid type periodic diffraction wave plate in the present invention as a diffraction wave plate in which a plurality of periods are repeatedly arranged.
As shown in fig. 2, the local or whole sine diffraction wave plate includes, but is not limited to, a polarization grating 102, a fork grating 103 and a polarization lens 104, and has a sine cycloidal periodic structure in a local area, and the diffraction wave plate can be prepared by spatially regulating and controlling the polarization state of the light field of the light source through a polarization conversion diffraction wave plate.
As shown in fig. 3, the polarization conversion diffraction wave plate with a multilayer twisted structure provided by the invention takes a polarization grating as an example, and includes a glass substrate 105, a photo-alignment film 106, and a multilayer anisotropic optical axis diffraction wave plate 107 with twisted angles, wherein the distribution of anisotropic optical axes is as follows:
the thickness and twist angle of at least two layers of diffraction wave plates are changed, namely the spatial distribution of an anisotropic optical axis is changed to directly influence the optical performance of the device, so that the diffraction efficiency of the sine cycloid type polarization conversion diffraction wave plate is improved to more than 95%, the light field polarization state emitted by a light source is effectively converted into sine cycloid type polarization state distribution, and the sine cycloid type polarization state period is half of that of the polarization conversion diffraction wave plate. The method realizes high-quality, high-precision, stable and rapid batch preparation of the sine cycloid diffraction wave plates.
As shown in fig. 4, a polarization holographic interference system: the two circularly polarized light beams 108 with opposite rotation are interfered, linear polarized light 101 with sine cycloid shape along the space is formed on the surface of the photo-alignment film 106, and the anisotropic optical axis of the spin coating is arranged along the direction perpendicular to the linear polarization direction. Of different periodsThe diffraction wave plate can be determined by the included angle between the two light beams:
where λ is the exposure wavelength, and θ is half of the angle between the two beams.
As shown in fig. 5, the optical imprinting principle of the sinusoidal cycloidal diffraction wave plate provided by the invention is that the sinusoidal cycloidal period space regulation is performed on the polarization state 109 of the incident light source based on the polarization conversion diffraction wave plate, and the sinusoidal cycloidal period can be converted into a sinusoidal cycloidal period which is half less than the period of the polarization conversion diffraction wave plate. In order to prevent the influence of fresnel reflection and not to damage the polarization conversion diffraction wave plate, the prepared polarization conversion diffraction wave plate was placed back to back with the glass substrate coated with the photo-alignment film, and the incident linearly polarized light was optically embossed without any additional optical element.
As shown in fig. 6, the diffraction efficiency diagrams of the polarization conversion diffraction wave plate based on the multilayer twisted structure under different periods show that the simulation efficiencies (solid lines) of the polarization conversion diffraction wave plate with periods of 1um to 2um and 0.8um to 1um are all over 99%, and the experimental efficiencies (stars) are all over 95%, so that the polarization conversion diffraction wave plate is used as a sine cycloidal diffraction wave plate for imprinting 500nm to 1um and 400nm to 500 nm. The optical imprinting method has strong environment interference resistance, high preparation speed and no need of building an interference light path.
As shown in fig. 7, the optical waveguide pattern 110 is obtained by embossing a polarizing body hologram having a period of 500nm based on a polarization conversion diffraction wave plate. The embossed polarizer holographic grating has the performance of optical waveguide, can be used as a master plate for mass production of sub-wavelength period diffraction wave plates, and provides a new preparation scheme for industrial production of core device polarizer holographic gratings of AR and VR.
The embodiments of the present invention have been described in detail above, but the present invention is not limited to the described embodiments, and it will be apparent to those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the spirit and scope of the invention.
Claims (9)
1. A method of optically producing a diffraction waveplate having an anisotropic optical axis oriented in a spatial sinusoidal periodic distribution, the method comprising:
1) The light source used is at least partially coherent and linearly polarized;
2) The wavelength band of the light source is in the absorption spectrum of the photo-alignment material, and the alignment of the photo-alignment material is regulated and controlled by the polarization state of the light source;
3) The polarization state of the light source is regulated and controlled by the space periodicity of the polarization conversion diffraction wave plate, wherein the space periodicity is local or integral and is twice that of the space periodicity which is preset to prepare the diffraction wave plate;
4) The polarization conversion diffraction wave plate comprises at least two layers of diffraction wave plates with twist angles or without twist angles, and the diffraction efficiency of the polarization conversion diffraction wave plate to a light source is higher than 95% in at least a part of the range;
5) The light field emitted by the light source exposes the area with the photo-alignment material through the polarization conversion diffraction wave plate, and the polarization state of the exposure area is regulated and controlled by the space of the polarization conversion diffraction wave plate.
2. The space period of the optically prepared diffraction wave plate is half of the polarization state regulation period of the light source emitted after the light source enters the polarization conversion diffraction wave plate, and the minimum space period can be regulated to hundreds of nanometers.
3. The polarization-converting diffraction waveplate of claim 1, wherein the polarization-converting diffraction waveplate is spatially and periodically distributed by an anisotropic optical axis, and comprises at least two layers of diffraction waveplates having optical axis twist angles or no twist angles, and the twist axes are completely or incompletely perpendicular to the substrate.
4. The polarization-converting diffraction waveplate of claim 1, wherein a portion of the anisotropic optical axis of at least one layer is a sinusoidal periodic distribution.
5. An anisotropic optical axis orientation control device for preparing a predetermined spatial period, the device comprising:
1) The outgoing linearly polarized light source is at least partially coherent;
2) The wave band of the light source is in the absorption spectrum of the photo-alignment material, and the alignment of the photo-alignment material is regulated and controlled by the polarization state of the light beam;
3) The polarization conversion diffraction wave plate periodically regulates the polarization state of an incident light source, and the period of an anisotropic optical axis of the polarization conversion diffraction wave plate is twice the period of a predetermined space;
4) The polarization conversion diffraction wave plate has diffraction efficiency of more than 95% for the light source in at least a part of the range;
5) A glass substrate for stabilizing and curing the photoalignment film;
6) A polarization conversion diffraction wave plate device for spatially regulating the polarization state of the light field emitted by the light source;
7) The space polarization regulation and control of the polarization state of the light field emitted by the light source is converted into an intensity regulation and control device.
6. A glass substrate for coating or sputtering of photo-alignment material according to claim 5.
7. The apparatus of claim 5, wherein the means for modulating the periodic illumination of at least a portion of the region of the photoalignment layer comprises an at least partially coherent light source, a polarization converting diffraction waveplate, and a cured photoalignment film.
8. According to claim 5, at least one of the anisotropic optical axes is affected by a photoalignment material, and the polarization converting diffraction waveplate comprises at least a part of the periodic distribution of the anisotropic optical axis.
9. According to claim 5, a linear polarizer is added after the polarization conversion diffraction wave plate, and the polarization regulation is changed into intensity regulation on the light field polarization state of the light source.
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