CN116398489A - Diffusion pump control system and vacuum system applied to molecular beam epitaxy equipment - Google Patents
Diffusion pump control system and vacuum system applied to molecular beam epitaxy equipment Download PDFInfo
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- CN116398489A CN116398489A CN202310665966.6A CN202310665966A CN116398489A CN 116398489 A CN116398489 A CN 116398489A CN 202310665966 A CN202310665966 A CN 202310665966A CN 116398489 A CN116398489 A CN 116398489A
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- 238000009792 diffusion process Methods 0.000 title claims abstract description 233
- 238000001451 molecular beam epitaxy Methods 0.000 title claims abstract description 53
- 230000001960 triggered effect Effects 0.000 claims abstract description 11
- 239000000498 cooling water Substances 0.000 claims description 10
- 238000000605 extraction Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 7
- 230000007547 defect Effects 0.000 abstract description 4
- 238000000407 epitaxy Methods 0.000 abstract description 2
- 230000002159 abnormal effect Effects 0.000 description 8
- 238000005086 pumping Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000005485 electric heating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
- F04F9/00—Diffusion pumps
- F04F9/08—Control
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention relates to a diffusion pump control system applied to molecular beam epitaxy equipment, which comprises a diffusion pump, a gate valve, a vacuum sensor and a temperature sensor, wherein the diffusion pump is connected with a vacuum reaction chamber of the molecular beam epitaxy equipment and is provided with a forevacuum pipeline, and the diffusion pump is connected with a mechanical pump through the forevacuum pipeline; the gate valve is arranged between the vacuum reaction chamber and the diffusion pump; the vacuum sensor is arranged on a front-stage vacuum pipeline of the diffusion pump; the temperature sensor is arranged on the diffusion pump; when the signals collected by the vacuum sensor and/or the temperature sensor exceed or are lower than the threshold value of each sensor when the set diffusion pump normally operates, the gate valve is triggered to be closed, so that the oil of the diffusion pump is prevented from being reversely pumped into the vacuum reaction chamber. The invention overcomes the defect that the prior art has fatal influence on molecular beam epitaxy equipment and epitaxy materials because medium oil is reversely pumped into a vacuum reaction chamber.
Description
Technical Field
The invention relates to the technical field of vacuum equipment, in particular to a diffusion pump control system and a vacuum system applied to molecular beam epitaxy equipment.
Background
The diffusion pump has the advantages of large pumping speed, no vibration and the like in a high vacuum section compared with a cold pump, so that the diffusion pump has great advantages when being used for growing fine epitaxial materials of molecular beam epitaxy equipment (MBE). The conventional diffusion pump only needs to supply power to the diffusion pump electric heating wire, and the medium oil in the diffusion pump is electrically heated to reach a certain temperature to form an effective pumping speed.
The diffusion pump needs a silicone oil as a working medium, and once the diffusion pump has abnormal pumping speed or stops running, the silicone oil can be reversely pumped into a vacuum reaction chamber of a molecular beam epitaxy equipment (MBE), and the problem of oil reflection of the diffusion pump can cause fatal influence on the quality of epitaxial semiconductor materials and the MBE equipment, so that huge economic loss is caused. Therefore, in order to avoid the back-pumping of the medium oil into the MBE vacuum reaction chamber, it is highly desirable to propose a diffusion pump control system for use in a molecular beam epitaxy apparatus.
Disclosure of Invention
Therefore, the technical problem to be solved by the invention is to overcome the technical defect that the molecular beam epitaxy equipment and the epitaxy material are subjected to fatal influence caused by the fact that medium oil is pumped back into the MBE vacuum reaction chamber in the prior art.
In order to solve the above technical problems, the present invention provides a diffusion pump control system applied to a molecular beam epitaxy apparatus, comprising:
the extraction opening of the diffusion pump is connected with the vacuum reaction chamber of the molecular beam epitaxy equipment, the diffusion pump is provided with a foreline vacuum pipeline, and the diffusion pump is connected with the mechanical pump through the foreline vacuum pipeline;
the gate valve is arranged between the vacuum reaction chamber and the diffusion pump;
the vacuum sensor is arranged on a foreline vacuum pipeline of the diffusion pump and is used for measuring the vacuum value of the foreline vacuum pipeline in real time;
a temperature sensor disposed on the diffusion pump, the temperature sensor being for measuring an actual temperature of the diffusion pump in real time;
and triggering the gate valve to close when the signals acquired by the vacuum sensor and/or the temperature sensor exceed or are lower than the threshold value of each sensor when the set diffusion pump normally operates, so as to prevent the oil of the diffusion pump from being reversely pumped into the vacuum reaction chamber.
In one embodiment of the invention, the intelligent control system further comprises an interlocking module, wherein the interlocking module comprises a diffusion pump interlocking unit, and the diffusion pump interlocking unit comprises an overheat protection switch, a low Wen Jiting switch and a vacuum protection switch, wherein when a signal acquired by the temperature sensor exceeds a set threshold value, the overheat protection switch is triggered to switch in a switching state; when the signal collected by the temperature sensor is lower than a set threshold value, triggering the low-temperature emergency stop switch to switch in a switching state; when the signal collected by the vacuum sensor exceeds a set threshold value, triggering the vacuum protection switch to switch the state of the switch.
In one embodiment of the invention, the interlock module further comprises a mechanical pump operation switch and a diffusion pump operation auxiliary relay contact, the mechanical pump operation switch, diffusion pump operation auxiliary relay contact and the diffusion pump interlock unit being connected in series.
In one embodiment of the invention, the valve further comprises a gate valve interlocking bypass, and two ends of the gate valve interlocking bypass are connected with the interlocking module.
In one embodiment of the invention, the valve further comprises a gate valve opening relay and a gate valve opening relay contact, wherein the gate valve opening relay contact is commonly connected with the interlocking module and the gate valve interlocking bypass, and the gate valve opening relay contact is connected with the gate valve opening relay.
In one embodiment of the invention, the valve further comprises a gate valve opening switch, wherein the gate valve opening switch is commonly connected with the interlocking module and the gate valve interlocking bypass.
In one embodiment of the present invention, a diffusion pump interlock bypass is further included, and both ends of the diffusion pump interlock bypass are connected to the diffusion pump interlock unit.
In one embodiment of the present invention, the diffusion pump further comprises a flow sensor, the diffusion pump is provided with a cooling water pipeline, the flow sensor is arranged on the cooling water pipeline, the flow sensor and the mechanical pump form a front module, the front module is arranged at the front ends of the diffusion pump interlocking unit and the diffusion pump interlocking bypass, after the front module operates, the diffusion pump can be started, and the front module cannot be bypassed.
In one embodiment of the present invention, the diffusion pump further comprises a diffusion pump start auxiliary relay, a diffusion pump start auxiliary relay contact and a diffusion pump operation auxiliary relay, wherein the diffusion pump start auxiliary relay contact is commonly connected with the diffusion pump interlocking unit and the diffusion pump interlocking bypass, the diffusion pump start auxiliary relay contact is connected with the diffusion pump start auxiliary relay, the diffusion pump start auxiliary relay is connected with the diffusion pump operation auxiliary relay, and the diffusion pump operation auxiliary relay is connected with the diffusion pump operation auxiliary relay contact.
In addition, the invention also provides a vacuum system which comprises the diffusion pump control system applied to the molecular beam epitaxy equipment.
Compared with the prior art, the technical scheme of the invention has the following advantages:
the diffusion pump control system and the vacuum system for the molecular beam epitaxy equipment integrate the vacuum sensor and the temperature sensor to monitor the running state of the diffusion pump in real time, and when the operation of the diffusion pump is abnormal, the gate valve between the diffusion pump and the vacuum reaction chamber of the molecular beam epitaxy equipment is automatically closed, so that medium oil is prevented from being reversely pumped into the vacuum reaction chamber, the protection of the vacuum reaction chamber is realized, and the defect that the fatal influence is caused to the molecular beam epitaxy equipment and epitaxial materials because the medium oil is reversely pumped into the vacuum reaction chamber in the prior art is overcome.
Drawings
In order that the invention may be more readily understood, a more particular description of the invention will be rendered by reference to specific embodiments thereof that are illustrated in the appended drawings.
Fig. 1 is a control block diagram of a diffusion pump control system for a molecular beam epitaxy apparatus according to the present invention.
Fig. 2 is another control block diagram of a diffusion pump control system for a molecular beam epitaxy apparatus according to the present invention.
Wherein reference numerals are as follows: 101. a low Wen Jiting switch; 102. an overheat protection switch; 103. a vacuum protection switch; 2. a mechanical pump operation switch; 3. the diffusion pump operates an auxiliary relay contact; 4. a gate valve interlocking bypass; 401. a gate valve interlocking bypass switch; 5. the gate valve opens the relay; 6. the gate valve opens the relay contact; 7. the gate valve is opened; 8. the gate valve stops switching; 9. a diffusion pump interlock bypass; 901. a diffusion pump interlocking bypass switch, 10, a flow trigger switch; 11. a mechanical pump start switch; 12. the diffusion pump starts an auxiliary relay; 13. the diffusion pump starts an auxiliary relay contact; 14. the diffusion pump operates an auxiliary relay; 15. a diffusion pump start switch; 16. a diffusion pump stop switch; 17. operating a relay by a vacuum electromagnetic valve; 18. the vacuum electromagnetic valve is opened and closed; 19. operating a relay contact a by a vacuum electromagnetic valve; 20. the vacuum solenoid valve operates the relay contact b.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and specific examples, which are not intended to be limiting, so that those skilled in the art will better understand the invention and practice it.
Referring to fig. 1 and 2, an embodiment of the present invention provides a diffusion pump control system applied to a molecular beam epitaxy apparatus, including a diffusion pump, a gate valve, a vacuum sensor and a temperature sensor, the diffusion pump being connected with a vacuum reaction chamber of the molecular beam epitaxy apparatus, the diffusion pump having a forevacuum line, the diffusion pump being connected with a mechanical pump through the forevacuum line; the gate valve is arranged between the vacuum reaction chamber and the diffusion pump; the vacuum sensor is arranged on a foreline vacuum pipeline of the diffusion pump and is used for measuring the vacuum value of the foreline vacuum pipeline in real time; the temperature sensor is arranged on the diffusion pump and is used for measuring the actual temperature of the diffusion pump in real time; and triggering the gate valve to close when the signals acquired by the vacuum sensor and/or the temperature sensor exceed or are lower than the threshold value of each sensor when the set diffusion pump normally operates, so as to prevent the oil of the diffusion pump from being reversely pumped into the vacuum reaction chamber.
The diffusion pump control system for the molecular beam epitaxy equipment disclosed by the invention integrates the vacuum sensor and the temperature sensor to monitor the running state of the diffusion pump in real time, and when the operation of the diffusion pump is abnormal, the gate valve between the diffusion pump and the vacuum reaction chamber of the molecular beam epitaxy equipment is automatically closed, so that the medium oil is prevented from being reversely pumped into the vacuum reaction chamber, the protection of the vacuum reaction chamber is realized, and the defect that the fatal influence is caused to the molecular beam epitaxy equipment and epitaxial materials because the medium oil is reversely pumped into the vacuum reaction chamber in the prior art is overcome.
The embodiment of the invention provides a diffusion pump control system applied to molecular beam epitaxy equipment, which further comprises an interlocking module, wherein the interlocking module comprises a diffusion pump interlocking unit, and the diffusion pump interlocking unit comprises an overheat protection switch 102, a low Wen Jiting switch 101 and a vacuum protection switch 103, wherein the overheat protection switch 102, the low Wen Jiting switch 101 and the vacuum protection switch 103 are connected in series, and the overheat protection switch 102, the low Wen Jiting switch 101 and the vacuum protection switch 103 are all in a closed state when a diffusion pump normally operates, but when a signal acquired by a temperature sensor exceeds a set threshold value, the overheat protection switch 102 is triggered to be opened, and the diffusion pump stops working at the moment; similarly, when the signal collected by the temperature sensor is lower than a set threshold value, the low Wen Jiting switch 101 is triggered to be disconnected, and the diffusion pump stops working at the moment; similarly, when the signal collected by the vacuum sensor exceeds a set threshold, the vacuum protection switch 103 is triggered to be turned off, and the diffusion pump stops working at this time.
In order to avoid the environment temperature fluctuation and cause the false triggering protection of the diffusion pump, the working temperature of the diffusion pump is set to be two low-temperature thresholds, including a first threshold and a second threshold. As an example, the first threshold may be 20 ℃, and the second threshold may be 10 ℃, that is, when the actual temperature of the diffusion pump detected by the temperature sensor is lower than the set 20 ℃, an audible and visual alarm is sent out to remind a field worker to intervene in checking the working state of the diffusion pump in time; when the actual temperature of the diffusion pump detected by the temperature sensor is lower than the set temperature of 10 ℃, the low Wen Jiting switch 101 is triggered to be turned off, and a gate valve between the vacuum reaction chamber and the diffusion pump is immediately and automatically closed, so that the vacuum reaction chamber is protected from reverse pumping pollution of diffusion pump oil.
When the molecular beam epitaxy equipment grows epitaxial materials, the vacuum value of the vacuum reaction chamber is continuously changed, so that the dynamic change of the vacuum value of a vacuum pipeline between the diffusion pump and the front-stage mechanical pump is possibly caused, and in order to avoid misjudgment protection of a system caused by the normal dynamic change of the vacuum value, two vacuum value thresholds including a first vacuum value threshold and a second vacuum value threshold are set for the vacuum value of the vacuum pipeline between the diffusion pump and the front-stage mechanical pump. As an example, the first vacuum value threshold may be 50mbar, the second vacuum value threshold may be 100mbar, and when the actual vacuum value detected by the vacuum sensor exceeds 50mbar, an audible and visual alarm is sent to remind the field staff to check the working state of the diffusion pump; when the actual vacuum value detected by the vacuum sensor exceeds 100mbar, the vacuum protection switch 103 is triggered to be turned off, and a gate valve between the vacuum reaction chamber and the diffusion pump is immediately and automatically closed, so that the vacuum reaction chamber is protected from diffusion pump oil back-pumping pollution.
Further, the diffusion pump control system applied to the molecular beam epitaxy device further comprises a diffusion pump interlocking bypass 9, and two ends of the diffusion pump interlocking bypass 9 are connected with the diffusion pump interlocking units. As an example, the diffusion pump interlock bypass 9 of the present embodiment includes a diffusion pump interlock bypass switch 901, that is, the present embodiment designs two working states, and bypasses the interlocking relationship of the collected signals of each sensor through the diffusion pump interlock bypass switch 901, so that the diffusion pump can be freely started or stopped without being affected by the sensor signals, and the maintenance and the repair of the diffusion pump control system are facilitated.
In addition, the diffusion pump control system applied to the molecular beam epitaxy device further comprises a flow sensor, the diffusion pump is provided with a cooling water pipeline, the flow sensor is arranged on the cooling water pipeline, the flow sensor and the mechanical pump form a front module, and the front module is arranged at the front ends of the diffusion pump interlocking unit and the diffusion pump interlocking bypass 9. As an example, the flow sensor corresponds to a flow trigger switch 10 and the mechanical pump corresponds to a mechanical pump start switch 11. The mechanical pump start switch 11 in this embodiment refers to a button switch of the mechanical pump itself, when the mechanical pump start switch 11 is pressed, the mechanical pump is started, and when the mechanical pump start switch is turned off, the mechanical pump stops working. According to the embodiment, the front-end module is added in the starting logic of the diffusion pump, the front-end module comprises two front-end conditions, firstly, the process cooling water flow is normal, secondly, the front-end mechanical pump of the diffusion pump runs normally, the diffusion pump can be started only when the two front-end conditions are met at the same time, and the two front-end conditions cannot be bypassed, so that the situation that an operator starts the diffusion pump by mistake under the condition that the front-end mechanical pump is not started or cooling water is not introduced can be avoided, and the diffusion pump is damaged.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a diffusion pump starting switch 15, a diffusion pump starting auxiliary relay 12, a diffusion pump starting auxiliary relay contact 13 and a diffusion pump operation auxiliary relay 14, wherein the diffusion pump starting switch 15 is commonly connected with the diffusion pump interlocking unit and the diffusion pump interlocking bypass 9, the diffusion pump starting auxiliary relay contact 13 is connected with the diffusion pump starting auxiliary relay 12, the diffusion pump starting auxiliary relay 12 is connected with the diffusion pump operation auxiliary relay 14, and the diffusion pump operation auxiliary relay 14 is connected with the diffusion pump operation auxiliary relay contact 3.
In actual operation, when the process cooling water flow is normal, the diffusion pump front-stage mechanical pump operates normally, and the signals collected by the temperature sensor and the vacuum sensor are all normal, the flow trigger switch 10, the mechanical pump starting switch 11, the low Wen Jiting switch 101, the overheat protection switch 102 and the vacuum protection switch 103 are all closed at this time, after the diffusion pump starting switch 15 is pressed, the diffusion pump starting auxiliary relay contact 13 is electrically closed, the diffusion pump starting auxiliary relay 12 is conducted, meanwhile, the diffusion pump operation auxiliary relay 14 is conducted, and in the diffusion pump operation process, the diffusion pump operation auxiliary relay 14 is always in a conducting state so as to display the working state of the diffusion pump.
In the operation process of the diffusion pump, if the flow of the process cooling water is abnormal, or the operation of a front-stage mechanical pump of the diffusion pump is abnormal, or a signal acquired by a vacuum sensor is abnormal, or a signal acquired by a temperature sensor is abnormal, the diffusion pump stops working, and the gate valve is immediately triggered to be closed, so that the oil of the diffusion pump is prevented from being reversely pumped into the vacuum reaction chamber. It should be emphasized that the conditions for determining that the signals collected by the vacuum sensor and the temperature sensor are abnormal are described in detail in the above description, and the diffusion pump is triggered to stop working only if the specific threshold range is not satisfied, which is not described in detail in this embodiment.
Of course, the diffusion pump control system applied to the molecular beam epitaxy device provided by the embodiment of the invention further comprises the diffusion pump stop switch 16, and the diffusion pump can be stopped by the diffusion pump stop switch 16, so that the operation, the overhaul and the maintenance of the diffusion pump control system are facilitated.
In succession, the above-mentioned interlocking module still includes mechanical pump operation switch 2 and diffusion pump operation auxiliary relay contact 3, mechanical pump operation switch 2, diffusion pump operation auxiliary relay contact 3 and diffusion pump interlocking unit establish ties. The mechanical pump operation switch in this embodiment corresponds to the operation state of the mechanical pump itself, when the mechanical pump is in the operation state, the mechanical pump operation switch 2 is in the closed state, and when the mechanical pump stops working, the mechanical pump operation switch 2 is turned off; similarly, the diffusion pump operation auxiliary relay contact 3 of the present embodiment corresponds to the diffusion pump operation auxiliary relay 14, and when the diffusion pump operation auxiliary relay 14 is in the on state, the diffusion pump operation auxiliary relay contact 3 is closed.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment provided by the embodiment of the invention further comprises a gate valve interlocking bypass 4, and two ends of the gate valve interlocking bypass 4 are connected with the interlocking module. As an example, the gate valve interlocking bypass 4 in this embodiment includes a gate valve interlocking bypass switch 401, that is, this embodiment designs two working states, and bypasses the interlocking relationship of the mechanical pump operation switch 2, the diffusion pump operation auxiliary relay contact 3 and the diffusion pump interlocking unit through the gate valve interlocking bypass 4, so that the gate valve can be freely started or stopped without being affected by the mechanical pump operation switch, and the maintenance and the repair of the diffusion pump control system are facilitated.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a gate valve opening relay 5 and a gate valve opening relay contact 6, wherein the gate valve opening relay contact 6 is jointly connected with the interlocking module and the gate valve interlocking bypass 4, and the gate valve opening relay contact 6 is connected with the gate valve opening relay 5.
In actual operation, when the diffusion pump normally operates, a gate valve between the diffusion pump and the vacuum reaction chamber is in an open state, and when the diffusion pump is in the open state, the gate valve opening relay contact 6 is electrically closed, and the gate valve opening relay 5 is conducted.
In the operation process of the diffusion pump, if any one of the diffusion pump operation auxiliary relay contact 3 or the mechanical pump operation switch 2 or the low-temperature emergency stop switch 101 or the overheat protection switch 102 or the vacuum protection switch 103 is disconnected, the gate valve is immediately triggered to be closed, so that the oil of the diffusion pump is prevented from being reversely pumped into the vacuum reaction chamber.
Of course, the diffusion pump control system applied to the molecular beam epitaxy equipment provided by the embodiment of the invention further comprises a gate valve opening switch 7, wherein the gate valve opening switch 7 is commonly connected with the interlocking module and the gate valve interlocking bypass 4, and the gate valve can be opened through the gate valve opening switch 7, so that the operation, the overhaul and the maintenance of the gate valve are convenient.
The diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a gate valve stop switch 8, wherein the gate valve stop switch 8 is in a normally closed state, when the diffusion pump is in an operating state, the gate valve stop switch 8 is in a closed state, the gate valve can be stopped through the gate valve stop switch, and the operation, the overhaul and the maintenance of the gate valve are facilitated.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a vacuum electromagnetic valve, wherein the vacuum electromagnetic valve is arranged at an exhaust port of the diffusion pump, and can be started and stopped synchronously with the diffusion pump, so that the diffusion pump can be prevented from reversely pumping the front-stage mechanical pump after the diffusion pump stops running, and primary vacuum can be ensured to be obtained before the diffusion pump is started.
As an example, the vacuum solenoid valve corresponds to the vacuum solenoid valve operation relay 17, the vacuum solenoid valve operation relay 17 has a vacuum solenoid valve operation relay contact a19 and a vacuum solenoid valve operation relay contact b20, the vacuum solenoid valve operation relay contact a19 is a pair of normally open contacts of the vacuum solenoid valve operation relay 17, the vacuum solenoid valve operation relay contact b20 is a pair of normally closed contacts of the vacuum solenoid valve operation relay 17, and when the diffusion pump is operated, that is, the diffusion pump operation auxiliary relay 14 is energized, the vacuum solenoid valve operation relay contact a19 is electrically closed, that is, the vacuum solenoid valve is started to operate, and the vacuum solenoid valve operation relay contact b20 is electrically opened. Of course, the vacuum solenoid valve may be independently opened manually, for example, by opening the vacuum solenoid valve via the vacuum solenoid valve opening switch 18.
Corresponding to the above embodiment of a diffusion pump control system for a molecular beam epitaxy apparatus, the present invention further provides a vacuum system, which includes a diffusion pump control system for a molecular beam epitaxy apparatus as described above, and has all the advantages of the diffusion pump control system for a molecular beam epitaxy apparatus as described above, and the present invention is not repeated herein.
It is apparent that the above examples are given by way of illustration only and are not limiting of the embodiments. Other variations and modifications of the present invention will be apparent to those of ordinary skill in the art in light of the foregoing description. It is not necessary here nor is it exhaustive of all embodiments. And obvious variations or modifications thereof are contemplated as falling within the scope of the present invention.
Claims (10)
1. A diffusion pump control system for a molecular beam epitaxy apparatus, characterized by: comprising the following steps:
the extraction opening of the diffusion pump is connected with the vacuum reaction chamber of the molecular beam epitaxy equipment, the diffusion pump is provided with a foreline vacuum pipeline, and the diffusion pump is connected with the mechanical pump through the foreline vacuum pipeline;
the gate valve is arranged between the vacuum reaction chamber and the diffusion pump;
the vacuum sensor is arranged on a foreline vacuum pipeline of the diffusion pump and is used for measuring the vacuum value of the foreline vacuum pipeline in real time;
a temperature sensor disposed on the diffusion pump, the temperature sensor being for measuring an actual temperature of the diffusion pump in real time;
and triggering the gate valve to close when the signals acquired by the vacuum sensor and/or the temperature sensor exceed or are lower than the threshold value of each sensor when the set diffusion pump normally operates, so as to prevent the oil of the diffusion pump from being reversely pumped into the vacuum reaction chamber.
2. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 1, wherein: the intelligent control system comprises a temperature sensor, an interlock module and a control module, wherein the interlock module comprises a diffusion pump interlock unit, the diffusion pump interlock unit comprises an overheat protection switch, a low Wen Jiting switch and a vacuum protection switch, and when a signal acquired by the temperature sensor exceeds a set threshold value, the overheat protection switch is triggered to switch in a switch state; when the signal collected by the temperature sensor is lower than a set threshold value, triggering the low-temperature emergency stop switch to switch in a switching state; when the signal collected by the vacuum sensor exceeds a set threshold value, triggering the vacuum protection switch to switch the state of the switch.
3. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 2, wherein: the interlock module further includes a mechanical pump operation switch and a diffusion pump operation auxiliary relay contact, the mechanical pump operation switch, the diffusion pump operation auxiliary relay contact and the diffusion pump interlock unit being connected in series.
4. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 3, wherein: the valve further comprises a gate valve interlocking bypass, and two ends of the gate valve interlocking bypass are connected with the interlocking module.
5. The diffusion pump control system for a molecular beam epitaxy apparatus of claim 4, wherein: the gate valve opening relay is connected with the gate valve opening relay, and the gate valve opening relay contact is connected with the interlocking module and the gate valve interlocking bypass.
6. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 4 or 5, wherein: the gate valve opening switch is connected with the interlocking module and the gate valve interlocking bypass.
7. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 3, wherein: the diffusion pump interlocking bypass is characterized by further comprising a diffusion pump interlocking bypass, and two ends of the diffusion pump interlocking bypass are connected with the diffusion pump interlocking units.
8. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 7, wherein: the diffusion pump is provided with a cooling water pipeline, the flow sensor is arranged on the cooling water pipeline, the flow sensor and the mechanical pump form a front-end module, the front-end module is arranged at the front ends of the diffusion pump interlocking unit and the diffusion pump interlocking bypass, after the front-end module operates, the diffusion pump can be started, and the front-end module cannot be bypassed.
9. A diffusion pump control system for a molecular beam epitaxy apparatus according to claim 8, wherein: the diffusion pump operation auxiliary relay is characterized by further comprising a diffusion pump starting auxiliary relay, a diffusion pump starting auxiliary relay contact and a diffusion pump operation auxiliary relay, wherein the diffusion pump starting auxiliary relay contact is connected with the diffusion pump interlocking unit and the diffusion pump interlocking bypass jointly, the diffusion pump starting auxiliary relay contact is connected with the diffusion pump starting auxiliary relay, the diffusion pump starting auxiliary relay is connected with the diffusion pump operation auxiliary relay, and the diffusion pump operation auxiliary relay is connected with the diffusion pump operation auxiliary relay contact.
10. A vacuum system, characterized by: a diffusion pump control system comprising a device according to any one of claims 1-9 for use in a molecular beam epitaxy apparatus.
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