CN116381924A - Dark field imaging super surface slide for transmission microscope - Google Patents
Dark field imaging super surface slide for transmission microscope Download PDFInfo
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- CN116381924A CN116381924A CN202310241606.3A CN202310241606A CN116381924A CN 116381924 A CN116381924 A CN 116381924A CN 202310241606 A CN202310241606 A CN 202310241606A CN 116381924 A CN116381924 A CN 116381924A
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- 238000003384 imaging method Methods 0.000 title claims abstract description 48
- 230000005540 biological transmission Effects 0.000 title claims abstract description 36
- 230000003287 optical effect Effects 0.000 claims abstract description 90
- 239000010410 layer Substances 0.000 claims abstract description 38
- 239000002096 quantum dot Substances 0.000 claims abstract description 38
- 238000006243 chemical reaction Methods 0.000 claims abstract description 26
- 239000002344 surface layer Substances 0.000 claims abstract description 19
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 7
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 7
- 238000002834 transmittance Methods 0.000 claims description 26
- 238000002310 reflectometry Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 238000004528 spin coating Methods 0.000 abstract description 16
- 230000005284 excitation Effects 0.000 abstract description 12
- 238000005516 engineering process Methods 0.000 abstract description 5
- 239000011247 coating layer Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 23
- 238000005286 illumination Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 238000001035 drying Methods 0.000 description 6
- 239000011259 mixed solution Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000002070 nanowire Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001446 dark-field microscopy Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004005 microsphere Substances 0.000 description 2
- 239000002077 nanosphere Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 239000012788 optical film Substances 0.000 description 1
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/10—Condensers affording dark-field illumination
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
The invention provides a dark field imaging super surface slide for a transmission microscope, which comprises an optical frequency conversion luminous layer and an optical super surface layer. The optical filter is arranged at the bottom of the light frequency conversion luminous layer, and the spin coating layer composed of quantum dots and polymethyl methacrylate is arranged at the top of the light frequency conversion luminous layer. The light-frequency-converted light-emitting layer filters incident white light, and light with specific wavelength passes through the post-excitation quantum dot to generate excitation light through light-frequency conversion. The optical super-surface layer is composed of a multi-layer dielectric film structure, has a customized light transmission band, and has the functions of small-angle interception and large-angle transmission for excitation light, so that a large-angle emergent light cone required by dark field imaging is formed. The dark field imaging super-surface slide has a compact integral structure, is suitable for a common transmission type optical microscope, and simplifies the dark field imaging technology.
Description
Technical Field
The invention belongs to the field of high-contrast dark field optical microscope imaging, and combines an optical filter spin-coated with quantum dot solution with an optical super-surface to be used for dark field imaging of a transmission microscope by utilizing the working principle of the optical filter and the quantum dot light-emitting principle.
Background
The dark field microscope is an optical microscope, and is different from the common microscope in that a special optical system is used, and a sample is placed in a dark background through a special optical technology, so that an observed object or cell and the like show a bright outline in the microscope, and a better observation effect is achieved. Therefore, dark field microscopy is often used to observe biological cells, bacteria, and other micro-and non-biological particles, and has better detection and observation effects, especially for transparent or colorless samples that cannot be observed by a conventional microscope. The prior dark field microscope has the following problems: (1) The optical structure is complex, and the traditional dark field microscopy method relies on various optical elements such as a dark field ring, a condenser lens and the like to generate high-angle emergent light for dark field imaging. (2) The dark field ring required by the dark field microscope has the defects that the condensing lens is arranged inside the microscope, the replacement is inconvenient and the portability is poor. (3) The use cost is high, various optical elements required by the traditional dark field microscope are high in manufacturing cost, the optical elements are required to be matched with a complete microscope system for construction, and the optical elements cannot be used on a simple bright field microscope.
Disclosure of Invention
The present invention addresses the deficiencies of the prior art described above by providing a dark field imaging super surface slide for a transmission microscope that does not require replacement of the illumination source and the addition of other accessories; the dark field imaging super-surface slide for the transmission microscope can overcome the defects of complex optical structure, high use cost and poor use convenience of the traditional dark field microscope, and obtain a dark field image with high contrast, thereby simplifying the dark field imaging technology.
The invention is realized by the following technical scheme:
a dark field imaging supersurface slide for a transmission microscope comprising a light frequency conversion luminescent layer and an optical supersurface layer;
the light frequency conversion luminous layer comprises a light filter and a quantum dot luminous film, and the quantum dot luminous film consists of quantum dots and polymethyl methacrylate;
the working bandwidth of the optical filter is 380-780 nanometers in a visible light wave band, the optical filter has high transmittance in a wavelength range of 380-600 nanometers, the average transmittance is more than 92 percent, the optical filter has high reflectivity in a wavelength range of 600-780 nanometers, and the average reflectivity is more than 98 percent;
the absorption wavelength range of the quantum dot is overlapped with the high transmission bandwidth of the optical filter, and the wavelength corresponding to the emission peak is positioned in the high reflection bandwidth of the optical filter;
the optical super-surface layer is a multilayer dielectric film formed by stacking high-low refractive index materials, and the thickness of each film layer is in the nanometer level; the optical super-surface layer has customized optical forbidden bands and transmission bands for different wavelengths and different incident angles.
Preferably, the substrate layer material of the optical super surface layer is quartz glass or CaF 2 The high refractive index material includes but is not limited to TiO 2 、Nb 2 O 5 、Ta 2 O 5 、HfO 2 、ZrO 2 Fluoride, sulfide or Si; the low refractive index material includes but is not limited to SiO 2 、Al 2 O 3 Or MgF 2 。
Preferably, the optical super surface layer is capable of achieving a high reflectivity for incident light of 380-600 nm at all angles, i.e. an average reflectivity of more than 90%; for 620 nm incident light, it maintains a high reflectance, i.e., an average reflectance greater than 90%, over 0-20 ° and has a high transmittance, i.e., a frequency transmittance greater than 80%, over 40 °.
Preferably, the optical super surface layer is capable of achieving a high reflectivity for incident light of 380-600 nm at all angles, i.e. an average reflectivity of more than 90%; for 620 nm incident light, it maintains a high reflectance, i.e., an average reflectance greater than 90%, over 0-40 ° and has a high transmittance, i.e., a frequency transmittance greater than 80%, over 60 °.
Compared with the prior art, the invention has the advantages that compared with the prior imaging technology:
(1) The dark field imaging super-surface slide glass provided by the invention uses the self-carried illumination light source of the bright field microscope for the first time, does not need to replace the illumination light source, can realize dark field imaging under objective lenses with different numerical apertures without adding additional optical elements, simplifies the structure to the greatest extent, and successfully realizes dark field imaging with high contrast on the traditional bright field microscope.
(2) The optical structure is simple. The dark field ring, the condensing lens, the dark field collecting objective lens and other optical elements of the traditional dark field microscope are not needed, the structure is not complicated, the occupied space is small, the super surface slide is used for replacing the dark field ring, the condensing lens is convenient to replace, and the portability is good.
(3) The use cost is low. The traditional dark field microscope needs various optical elements, has high manufacturing cost, needs to be matched with a complete microscope system for construction, cannot be used on the original optical microscope, and can be directly used for the bright field optical microscope without changing the system of the original optical microscope.
Drawings
Fig. 1 is a schematic diagram of the principle of use of a dark field imaging subsurface slide for a bright field microscope.
FIG. 2 shows bright field (left) and dark field (right) imaging results for polystyrene nanospheres of 3 microns diameter, color bars are logarithmic distribution of gray scale, scale length 15 microns;
fig. 3 shows bright field (left) and dark field (right) imaging results for 100-600 nm diameter silicon carbide nanowires, with color bars in gray scale distribution and scale length of 5 microns.
Detailed Description
The invention will be described in further detail with reference to the drawings and the detailed description.
As shown in fig. 1, the present invention provides a dark field imaging supersurface slide for a transmission microscope comprising an optical frequency conversion luminescent layer 1 and an optical supersurface layer 2.
The light frequency conversion luminescent layer 1 comprises a light filter 3 and a quantum dot luminescent film 4, wherein the quantum dot luminescent film 4 consists of quantum dots and polymethyl methacrylate.
The working bandwidth of the optical filter 3 is 380-780 nanometers in the visible light wave band, the optical filter has high transmittance in the wavelength range of 380-600 nanometers, the average transmittance is more than 92 percent, the optical filter has high reflectivity in the wavelength range of 600-780 nanometers, and the average reflectivity is more than 98 percent.
The absorption wavelength range of the quantum dot is overlapped with the high transmission bandwidth (380-600 nanometers) of the optical filter 3, and the wavelength corresponding to the emission peak is positioned in the high reflection bandwidth (600-780 nanometers) of the optical filter.
The preparation method of the light frequency conversion luminescent layer 1 comprises the following steps:
and (3) dissolving the quantum dots and polymethyl methacrylate powder in acetone (or other volatile solvents such as ethylene which can dissolve the quantum dots and the polymethyl methacrylate powder simultaneously) to form a mixed solution, and then spin-coating the mixed solution on the optical filter 3 for a plurality of times by adopting a spin-coating mode, and drying, so that a stable quantum dot luminescent film 4 is formed on the film surface of the optical filter 3, and the light frequency conversion luminescent layer 1 is obtained.
The working principle of the light frequency conversion luminous layer 1 is as follows:
when white light is incident from the bottom, light with a wavelength of 600 nanometers or less can pass through the optical filter 3, and then is irradiated onto the quantum dot luminescent film 4 to be absorbed by quantum dots to generate light with a frequency conversion, and light with a wavelength corresponding to the emission peak of the quantum dots with the emission directions of various angles is generated, which is called excitation light. At this time, since the excitation light is located within the high reflection bandwidth of the optical filter 3, the reversely transmitted excitation light is reflected by the optical filter 3, and finally all the excitation light is transmitted along the transmission direction of the incident white light, and enters the optical super-surface layer 2.
The optical super surface layer 2 is a multilayer dielectric film formed by stacking materials with high and low refractive indexes, the thickness of each film layer is in the nanometer level, and the base layer material is quartz glass or CaF 2 The high refractive index material includes but is not limited to TiO 2 、Nb 2 O 5 、Ta 2 O 5 、HfO 2 、ZrO 2 Fluoride, sulfide, siAnd the like; the low refractive index material includes but is not limited to SiO 2 、Al 2 O 3 Or MgF 2 And the like.
The optical super-surface layer 2 has tailored optical forbidden bands and transmission bands for different wavelengths and different angles of incidence. If a specific multilayer film design is chosen, it is possible to achieve high reflectivity (average reflectivity greater than 90%) for incident light of 380-600 nm at all angles; for 620 nm incident light, it maintains high reflectivity (average reflectivity greater than 90%) over 0-20 ° and has high transmittance (frequency transmittance greater than 80%) above 40 °; at this time, it is called a numerical aperture 0.25 super surface. By selecting a specific multilayer film design, the high reflectivity (average reflectivity is more than 90%) of the incident light with 380-600 nanometers at all angles can be realized; for 620 nm incident light, it maintains high reflectivity (average reflectivity greater than 90%) over 0-40 ° and has high transmittance (frequency transmittance greater than 80%) over 60 °; at this time, it is called a numerical aperture 0.65 super surface.
The working principle of the optical super-surface layer 2 is as follows: when light with different frequencies and angles is incident from the light frequency conversion light-emitting layer 1, light with 380-600 nanometer wave bands at all angles and quantum dot excitation light incident at small angles are reflected, and only quantum dot excitation light with angles larger than the numerical aperture of the super surface can be transmitted. After that, the excitation light with a small angle is reflected back to the light frequency conversion luminescent layer 1 formed by the optical filter 3 and the quantum dots, but the excitation light is reflected to the super surface again because the excitation light is not in the transmission wave band of the optical filter 1 below, the angle is changed after the reflection and the refraction are carried out between the two layers for many times, and finally most of the excitation light is emitted from the surface layer of the super surface film substrate with a large angle. Thus, most of light emitted by the visible quantum dots can exit the optical super-surface in a large-angle emergent mode to form a hollow light cone, and the emergent angle is determined by the design of the bandwidth of the optical super-surface and the emission wavelength of the quantum dots.
The optical super-surface transmission numerical aperture is combined according to the difference of the numerical aperture of a microscope, and the numerical aperture is respectively corresponding to 0.25 and 0.65. For the transmission type dark field, the transmission numerical aperture of the optical super surface is required to be larger than the numerical aperture of a collecting system, the incident light is filtered and converted in frequency after the illumination light beam of the optical microscope passes through the light-frequency conversion luminous layer, the illumination light irradiates the optical super surface, finally, dark field transmission occurs at the upper layer of the optical super surface, and high-contrast unmarked microscopic images of various weak scattering materials and unstained samples, such as polystyrene nano-microspheres with diameters of 3 microns and silicon carbide nano-wires with diameters of 100-600 nanometers, are realized.
The light frequency conversion luminous layer 1 and the optical super-surface layer 2 are combined to form a dark field imaging super-surface slide, a sample to be observed is placed on the surface of the slide, and a dark field image can be directly observed in an ocular lens through an objective lens of a bright field optical microscope without adding other accessories.
The optical frequency conversion luminous layer 1 and the optical super-surface layer 2 are processed through physical and chemical film forming processes, when in actual use, the matched super-surface slide is assembled according to the difference of numerical aperture of an objective lens, one side of the film surface of the optical frequency conversion luminous layer 1 is in direct contact fit with one side of the film surface of the optical super-surface layer 2, when in use, a sample is directly placed on one side of the substrate of the super-surface, and after in use, the substrate of the super-surface is cleaned by alcohol.
The preparation method of the dark field imaging super surface slide sheet for the bright field microscope provided by the invention comprises the following steps:
firstly, titanium pentoxide and silicon dioxide which are materials with high and low refractive indexes are deposited on the surface of a glass substrate in a physical mode, and are laminated and processed to form a light filter, the working bandwidth of the light filter is within the range of 380-780 nanometers of the luminous spectrum of the light-emitting diode, the light with short wavelength within 600 nanometers has the transmittance of more than 92%, and the light with long wavelength after 600 nanometers has the transmittance of less than 2%, so that the effect of filtering out the long wave component in the illumination light source is realized.
Then, dissolving an oil-soluble CdSe/CdS core-shell quantum dot solution with the mass fraction of 1mg/1ml and 500-mesh polymethyl methacrylate powder with the mass fraction of 20-25% into an acetone solution with the purity of 99.5%, and 1:1 preparing a mixed solution, spin-coating the mixed solution on the film surface of the short-wave pass filter for a plurality of times, wherein the total spin-coating times are three times, and spin-coating parameters by using a spin-coating instrument are as follows: spin coating is carried out for the first time, the rotation speed is 7000 revolutions per second, and the spin coating time is 30 seconds; spin coating for the second time, wherein the rotation speed is 5000 revolutions per second, and the spin coating time is 30 seconds; and spin coating is performed for the third time, wherein the rotation speed is 3000 rpm, and the spin coating time is 20 seconds. The mixed solution is dripped at the center of the optical filter by using a disposable injection every time, about 0.3ml of the solution is used every time, after the spin coating is finished, the optical filter is flatly wrapped by tinfoil and placed in a drying box, the temperature of the drying box is controlled to be 40-50 ℃, the drying time is three minutes, and the spin-coated quantum dot luminous film can be sufficiently dried by the drying treatment, so that the next spin coating is facilitated. And drying to obtain the light frequency conversion luminescent layer combined by the short-wave pass filter and the quantum dot luminescent film. Due to multiple spin coating, the uneven surface of the quantum dot luminescent film can provide scattering efficiency, and the light frequency conversion efficiency of the quantum dot is improved.
The optical super-surface layer is made of two high-low refractive index materials Nb 2 O 5 (refractive index of 2.2) and SiO 2 The material (with refractive index of 1.49) is alternatively laminated, and the substrate is made of fused silica glass by adopting a double ion beam sputtering technology in a physical vapor deposition method.
For the super surface with the numerical aperture of 0.25, the transmittance is kept low within the range of 0-20 DEG of incidence angle, the transmittance is reduced along with the increase of the angle, and when the transmittance is increased to 40 DEG, the transmittance is over 80%; for the super surface with the numerical aperture of 0.65, the transmittance is kept low within the range of 0-40 degrees, and when the incident angle is larger than 60 degrees, the transmittance is larger than 60 percent, so that the emergent light cone with a large angle is realized.
When the super-surface slide is used, the optical super-surface layer 2 and the light frequency conversion luminous layer 1 are combined together to form a complete dark field imaging quantum dot super-surface slide which can be used for a transmission microscope, and the super-surface slide is placed on a sample stage, so that the super-surface slide has the dark field imaging capability. The illumination light source is incident into the light frequency conversion luminous layer 1 to generate incident light filtration and light frequency conversion, the scattered light beams which are emitted by the quantum dots and meet the emergent condition of the optical super surface can irradiate the sample above the super surface, and the scattered signals of the sample are collected by the objective lens with the numerical aperture smaller than that of the illumination light, so that dark field imaging is realized. The main function of the quantum dot luminescent film is to scatter the incident light beam into various angles, and the light with the wavelength of 380-600 nanometers incident on the quantum dot luminescent film is converted into light with the wavelength of about 620 nanometers plus or minus 10 nanometers. The optical super-surface 2 has the main functions of selecting a required transmitted dark field light beam, and the light beam which does not meet the requirements of the functional layer is reflected back to the light frequency conversion light-emitting layer and subjected to secondary reflection and scattering, so that most of incident energy is confined in the microscopic imaging super-surface slide, and the energy utilization efficiency of the imaging super-surface slide is increased. The nanowires and nanospheres carried by the optical super-surface and the actual biochemical sample can be lightened by the small-angle scattered illumination light emitted by the quantum dots, so that the light is collected and imaged by a common bright field microscope, and the large-angle transmitted illumination light beams emitted by the quantum dots are not collected by a microscope system. The dark field imaging super surface slide based on the bright field microscope is placed on the bright field microscope sample stage, and still has good imaging contrast ratio for a micrometer-level observation sample, and meanwhile, the dark field imaging super surface slide based on the bright field microscope is low in cost and convenient to use.
As shown in fig. 2, a dark field imaging function obtained by placing the dark field imaging super surface slide based on the optical film according to the present invention on a common transmission microscope is compared with the effect of the common transmission microscope. The two images are all taken to observe the imaging effect of the standard polystyrene microsphere with the diameter of 3 micrometers under the condition of the numerical aperture of 0.25, wherein the left image is the imaging effect of a transmission bright field taken by a common transmission microscope, the right image shows the high-contrast dark field microscopic imaging effect taken by the dark field imaging function, and a sample is tightly attached to the surface of a substrate of the angle-tunable optical filter, so that dark field imaging with higher contrast can be realized. As shown in fig. 3, a comparison of the bright field and dark field imaging results of the present invention is obtained by placing the dark field imaging supersurface slide of the present invention on a conventional transmission microscope. The two images are taken to observe the silicon carbide nanowire with the diameter of 100-600 nanometers under the numerical aperture of 0.65, wherein the left image is the imaging effect of a transmission bright field taken by a common transmission imaging function, the imaging contrast of a dark field can be seen to be obviously higher than that of the common transmission type, and the right image shows the high contrast effect achieved by taking the dark field imaging super-surface slide glass.
It will be obvious to those skilled in the art that the present invention may be varied in a number of ways without departing from the scope of the invention. All such modifications as would be obvious to one skilled in the art are intended to be included within the scope of this claims.
Claims (4)
1. A dark field imaging supersurface slide for transmission microscopes, comprising an optical frequency conversion luminescent layer (1) and an optical supersurface layer (2);
the light frequency conversion luminous layer (1) comprises a light filter (3) and a quantum dot luminous film (4), wherein the quantum dot luminous film (4) is composed of quantum dots and polymethyl methacrylate;
the working bandwidth of the optical filter (3) is 380-780 nanometers in a visible light wave band, the optical filter has high transmittance in a wavelength range of 380-600 nanometers, the average transmittance is more than 92 percent, the optical filter has high reflectivity in a wavelength range of 600-780 nanometers, and the average reflectivity is more than 98 percent;
the absorption wavelength range of the quantum dot is overlapped with the high transmission bandwidth of the optical filter (3), and the wavelength corresponding to the emission peak is positioned in the high reflection bandwidth of the optical filter;
the optical super-surface layer (2) is a multilayer dielectric film formed by stacking high-low refractive index materials, and the thickness of each film layer is in the nanometer level; the optical super-surface layer (2) has customized optical forbidden bands and transmission bands for different wavelengths and different incidence angles.
2. Dark-field imaging supersurface slide for transmission microscopes according to claim 1, characterized in that the substrate layer material of the optical supersurface layer (2) is quartz glass or CaF 2 The high refractive index material includes but is not limited to TiO 2 、Nb 2 O 5 、Ta 2 O 5 、HfO 2 、ZrO 2 Fluoride, sulfide or Si; the low refractive index material includes but is not limited to SiO 2 、A1 2 O 3 Or MgF 2 。
3. Dark-field imaging supersurface slide for transmission microscopes according to claim 1, characterized in that the optical supersurface layer (2) enables high reflectivity, i.e. an average reflectivity of more than 90%, for incident light of 380-600 nm at all angles; for 620 nm incident light, it maintains a high reflectance, i.e., an average reflectance greater than 90%, over 0-20 ° and has a high transmittance, i.e., a frequency transmittance greater than 80%, over 40 °.
4. Dark-field imaging supersurface slide for transmission microscopes according to claim 1, characterized in that the optical supersurface layer (2) enables high reflectivity, i.e. an average reflectivity of more than 90%, for incident light of 380-600 nm at all angles; for 620 nm incident light, it maintains a high reflectance, i.e., an average reflectance greater than 90%, over 0-40 ° and has a high transmittance, i.e., a frequency transmittance greater than 80%, over 60 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310241606.3A CN116381924A (en) | 2023-03-08 | 2023-03-08 | Dark field imaging super surface slide for transmission microscope |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310241606.3A CN116381924A (en) | 2023-03-08 | 2023-03-08 | Dark field imaging super surface slide for transmission microscope |
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| Publication Number | Publication Date |
|---|---|
| CN116381924A true CN116381924A (en) | 2023-07-04 |
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|---|---|---|---|
| CN202310241606.3A Pending CN116381924A (en) | 2023-03-08 | 2023-03-08 | Dark field imaging super surface slide for transmission microscope |
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| Country | Link |
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- 2023-03-08 CN CN202310241606.3A patent/CN116381924A/en active Pending
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