CN109031493A - Surpass the narrow band filter and preparation method thereof of surface texture based on medium - Google Patents
Surpass the narrow band filter and preparation method thereof of surface texture based on medium Download PDFInfo
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- CN109031493A CN109031493A CN201810838011.5A CN201810838011A CN109031493A CN 109031493 A CN109031493 A CN 109031493A CN 201810838011 A CN201810838011 A CN 201810838011A CN 109031493 A CN109031493 A CN 109031493A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
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Abstract
The invention discloses a kind of narrow band filters for surpassing surface based on medium, including substrate, dielectric multi-layer optical thin film and the super surface of medium prepared on film.The super surface of medium is sub-wavelength period structure, and the light beam of vertical incidence is capable of the sociability coherent oscillation of the super interior surface light field of exciting media, and interacts with incident light the transmission and reflection characteristic for changing light.By surpassing the design of surface texture unit and arrangement for medium, the bandwidth of resonance can be reduced, to realize the characteristic of narrow-band filtering.The present invention also provides production methods, comprising: after growing dielectric multi-layer optical thin film material on substrate, forms the photoresistive mask of super surface pattern structure；Graphic structure is transferred on top layer dielectric film；Mask is removed, is cleaned.Making step of the present invention is simple and can be compatible with CMOS technology, can be achieved at the same time narrow bandwidth and High Extinction Ratio.Compared with traditional multilayer film narrow band filter, process costs are reduced, realize narrower bandwidth and higher reflectivity.
Description
Technical field
The invention belongs to micro-nano photonic device fields, more particularly, to a kind of narrowband for surpassing surface texture based on medium
Optical filter and preparation method thereof.
Background technique
Optical filter is made of that special dye is added in plastics or glass baseplate or optical film is deposited on its surface, to decline
Subtract certain optical bands in (absorption) light wave or accurately to select small range wave band light wave to pass through, and reflects (or absorption) and fall other
Be not intended to by wave band.By changing the structure of optical filter and the optical parameter of film layer, various spectral characteristics can be obtained, are made
Optical filter can control, adjust and change transmission, reflection, polarization or the phase state of light wave.The classification method of optical filter is general
It is to classify by characteristics such as spectral band, spectral characteristic, film material, application characteristics.Optical filter is classified according to spectral characteristic
Bandpass filter, edge filter, two can be divided into light splitting optical filter (such as semi-transparent semi-reflecting lens), neutral-density filter, anti-
Penetrate optical filter etc.；Optical filter can be divided into ultraviolet band optical filter, visible filter and infrared waves according to spectral band classification
Section optical filter；Optical filter can be divided into mantle optical filter and dura mater optical filter according to application film material classification；Optical filter according to
Application characteristic classification can be divided into medical biochemical instruments optical filter, fluorescence microscope optical filter, Excitation Filter with High etc..
So-called narrow band filter is segmented from bandpass filter, and definition is identical as bandpass filter, that is,
This optical filter allows optical signal to pass through in specific wave band, and deviates two optical signals other than this wave band and be prevented from, narrow
Passband with optical filter is comparatively narrow, generally 5% or less central wavelength value.Based on this characteristic, narrow-band-filter
Piece is widely used in raman study analysis, the research of nanometer material structure, biomedicine and solid state laser system.
The principle of traditional narrow band filter be based on multiple-beam interference, by the thickness of careful design multilayer dielectric film,
A kind of plural serial stage Fabry-Perot interference is constituted, to realize narrow bandwidth.However in this way, even if ultraviolet
Wave band, the minimum bandwidth that can reach also have several nanometers；Meanwhile bandwidth is smaller, the number of plies of the deielectric-coating needed is more, each
The growth of layer dielectric film requires extremely to be accurately controlled, and manufacture difficulty continues to increase, and cost is high.And for laser reflection
The application such as mirror and Raman spectrum analysis, bandwidth is the smaller the better, and the traditional narrow optical filter based on multiple-beam interference can not be real
The further constriction of existing bandwidth.
Summary of the invention
Aiming at the above defects or improvement requirements of the prior art, the present invention provides a kind of narrowbands based on super surface texture
Thus optical filter and preparation method thereof solves high process cost, broader bandwidth existing for traditional multilayer film narrow band filter
And the higher technical problem of reflectivity.
To achieve the above object, according to one aspect of the present invention, a kind of narrowband filter based on super surface texture is provided
Mating plate, comprising: substrate, the several layers dielectric film on the substrate and the super table of medium on the dielectric film
Face functional layer；
Wherein, the surface of the super surface functional layer of the medium is the super surface texture with sub-wavelength period structure, institute
The micro-nano graph array that several splicings are prepared on super surface texture is stated, each micro-nano graph array is multiple identical
The arrangement of micro-nano graph period is constituted.
Preferably, pass through the size and the single micro-nano graph of cyclomorphosis of micro-nano graph in the regulation micro-nano graph array
The reflection wavelength of array, can reduce the bandwidth of resonance, to realize the characteristic of narrow-band filtering.
Preferably, the light beam of vertical incidence can excite the relevant vibration of the sociability of the inside light field of the super surface texture
It swings, the Local oscillating of the internal light field interacts with incident light the transmission and reflection characteristic that can change light.
Preferably, the dielectric film is high refractive index medium layer or low refractive index dielectric layer.
Preferably, the working method of the narrow band filter is narrowband transmission or narrowband reflection.
Preferably, the micro-nano graph arrangement in the micro-nano graph array is tetragonal lattice, hexagoinal lattice or quasi-crystalline lattice.
Preferably, the micro-nano graph is nano-pore, nano-pillar, nanometer bead, nano-rings or nanometer rods.
It is another aspect of this invention to provide that a kind of production method of narrow band filter based on super surface texture is provided,
Include:
After cleaning substrate, it is epitaxially grown on the substrate several layers dielectric film, the shape on the substrate after somatomedin film
At the photoresistive mask of super surfacial pattern array structure；
Photoresistive mask is carried out after the graphic array structure is transferred on top layer dielectric film, is obtained after cleaning operation
Surpass the narrow band filter on surface based on medium.
In general, through the invention it is contemplated above technical scheme is compared with the prior art, can obtain down and show
Beneficial effect:
1, it only needs to grow several layer dielectrics and the super surface functional layer of medium, reduces the cost of manufacture and work of optical filter
Skill complexity；
2, by regulation micro-nano graph array in micro-nano graph size and the single micro-nano graph array of cyclomorphosis it is anti-
Ejected wave is long, can reduce the bandwidth of resonance, is able to achieve narrower bandwidth, and bandwidth can reach nanometer or less.
Detailed description of the invention
Fig. 1 is a kind of sectional view for the narrow band filter for surpassing surface texture based on medium provided in an embodiment of the present invention；
Fig. 2 is the sectional view for the narrow band filter that another kind provided in an embodiment of the present invention surpasses surface texture based on medium；
Fig. 3 is a kind of fabrication processing figure provided in an embodiment of the present invention；
Fig. 4 is a kind of super surface resonance pattern diagram of medium provided in an embodiment of the present invention；
Fig. 5 is a kind of reflection spectral line schematic diagram of narrow band filter provided in an embodiment of the present invention；
In all the appended drawings, identical appended drawing reference is used to denote the same element or structure, in which:
The super surface functional layer of 1- medium, 2- low-refraction wall, 3- substrate, 4- refractive index are collectively formed less than 1 with 1
The super surface functional layer of medium, 5- electronic corrosion-resistant.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.As long as in addition, technical characteristic involved in the various embodiments of the present invention described below
Not constituting a conflict with each other can be combined with each other.
The present invention provides a kind of narrow band filters and preparation method thereof for surpassing surface based on medium, to reduce technique step
Suddenly, under the premise of reducing process costs, the bandwidth of narrow band filter is further decreased.
The super surface of medium is a kind of sub-wavelength period structure, in the case where beam orthogonal incidence, can excite inside
The sociability coherent oscillation of light field, the Local oscillating of this light field interact with incident light the transmission and reflection that can change light
Characteristic.By surpassing the design of surface texture unit and arrangement for medium, the bandwidth of resonance can be reduced, to realize that narrowband is filtered
The characteristic of wave.Unlike traditional narrow band filter based on multiple-beam interference, the super surface of medium is not only had excellent performance, system
Make simple, moreover it is possible to traditional complementary metal oxide semiconductor (Complementary Metal-Oxide-
Semiconductor, CMOS) technique is completely compatible.
Fig. 1 is a kind of sectional view for the narrow band filter for surpassing surface based on medium provided in an embodiment of the present invention, that is, is being served as a contrast
Extension several layers dielectric film 2, the super surface 1 of preparation media on dielectric film above bottom 3.
Wherein, the surface of the super surface functional layer of medium is the super surface texture with sub-wavelength period structure, super surface
The micro-nano graph array of several splicings is prepared in structure, each micro-nano graph array is multiple identical micro-nano graph periods
Arrangement is constituted, and passes through the size of micro-nano graph and the reflection of the single micro-nano graph array of cyclomorphosis in regulation micro-nano graph array
Wavelength, can reduce the bandwidth of resonance, to realize the characteristic of narrow-band filtering.
In an optional embodiment, substrate and dielectric film can be made of arbitrary medium material, it is desirable that should
Dielectric material has lower loss or fully transparent to the light wave of target wave band, specifically using which kind of mode present invention
Embodiment does not do uniqueness restriction.
In an optional embodiment, the super surface functional layer of medium is sub-wavelength period structure, vertical incidence
Light beam is capable of the sociability coherent oscillation of the inside light field on the super surface of exciting media, Local oscillating and the incident light phase of internal light field
Interaction can change the transmission and reflection characteristic of light, so as to be set by surpassing surface texture unit for medium with what is arranged
Meter, reduces the bandwidth of resonance, to realize the characteristic of narrow-band filtering.
In an optional embodiment, dielectric film is high refractive index medium layer or low refractive index dielectric layer.
In an optional embodiment, dielectric film can be one layer or multilayer, can according to actual needs into
Row determines that the embodiment of the present invention does not do uniqueness restriction.
In an optional embodiment, designed using different dielectric films, the working method of narrow band filter can
Think narrowband transmission or narrowband reflection.
In an optional embodiment, the graphic structure period arrangement in sub-wavelength period structure can be four directions
Lattice, hexagoinal lattice or quasi-crystalline lattice etc., the embodiment of the present invention do not do uniqueness restriction.
In an optional embodiment, graphic structure pattern can be nano aperture, and nano-pillar, nanometer bead receives
Rice one of ring or nanometer rods or several mixing composition, the embodiment of the present invention do not do uniqueness restriction.
Fig. 2 is the sectional view for the narrow band filter that another kind provided in an embodiment of the present invention surpasses surface based on medium, wherein
Layer 1 and layer 4 collectively form the functional layer on the super surface of medium, and the refractive index of layer 4 exists lower than the difference in layer 1, with Fig. 1 example
It can be made of two layers of different material in the functional layer that medium surpasses surface, sub-wavelength period structure can both be prepared separately
It on 4, can also prepare simultaneously on 1 and 4, to meet different material and process requirements.
The embodiment of the invention also provides a kind of production methods of narrow band filter based on super surface texture, comprising:
After cleaning substrate, it is epitaxially grown on the substrate several layers dielectric film, the shape on the substrate after somatomedin film
At the photoresistive mask of super surfacial pattern array structure；
Photoresistive mask is carried out after graphic array structure is transferred on top layer dielectric film, is based on after cleaning operation
The narrow band filter on the super surface of medium.
In an optional embodiment, can by extension, deposition, sputtering or other any methods and these
The assembled growth dielectric film of method, the embodiment of the present invention do not do uniqueness restriction.
In an optional embodiment, photoresistive mask can be electron sensitive resist, photoresist, metal or other are resistance to
Corrosion material can use laser direct-writing, holographic exposure, electron beam exposure, extreme ultraviolet photolithographic, nano impression and focused ion
The methods of beam realizes the graphical of photoresistive mask, and the embodiment of the present invention do not do uniqueness restriction.
In an optional embodiment, the electron sensitive resist or photoresist of use can be positivity or negativity.
In an optional embodiment, dry etching can be used or the methods of wet etching and their combination will
Graphic structure is transferred on top layer dielectric film, and the embodiment of the present invention does not do uniqueness restriction.
In embodiments of the present invention, the production method of the above-mentioned narrow band filter for surpassing surface texture based on medium, only conduct
A kind of referential production method for realizing the narrow band filter is not used to particularly limit and constrain the production of other feasibilities
Method.
In Fig. 3 shown in (a), first silicon substrate film is cleaned up according to the cleaning step of standard, to make epitaxial growth
Prepare.
In Fig. 3 shown in (b), the silicon substrate film cleaned up is put into plasma enhanced chemical vapor deposition method
In (Plasma Enhanced Chemical Vapor Deposition, PECVD) epitaxial growth system, then in the system
In two layers continuous epitaxial growth silica, silicon nitride of dielectric film, the wherein thickness 1830nm of silica, the thickness of silicon nitride
Degree is 500nm.
In Fig. 3 shown in (c), spin coating electronic corrosion-resistant 5 on epitaxial wafer after the growth was completed, in embodiments of the present invention
Positive electronic corrosion-resistant ZEP520 can be selected, the revolving speed of sol evenning machine is 400rpm, spin coating time 1min, and is existed using hot plate
3min is toasted under conditions of 180 DEG C, ZEP520 glue thickness is about 360nm at this time.
In Fig. 3 shown in (d), by electron beam exposure and development, it is fixed on the formation super surface of medium in electronic corrosion-resistant
Graphic array.Electron beam exposure can use the EBPG5000+ electron-beam lithography system of VISTEC company, acceleration voltage
100KV, electron dose needed for exposing ZEP520 are 195C/cm2, select beam spot scanning step for 4nm, select electronic beam current
1nA.Sample is put into xylene solution the 70s that develops after the completion of exposure, is then immersed in isopropanol and is fixed 30s, is used after taking-up
It is dried with nitrogen.
In Fig. 3 shown in (e), carved using inductively coupled plasma (Inductively Coupled Plasma, ICP)
The silicon nitride that erosion is not protected by electronic corrosion-resistant, super surface pattern structure is transferred to above silicon nitride.ICP etching machine can be with
Using Oxford Instruments Plasmalab System100 series inductance coupling plasma (ICP) etching machine.Etching
Select gas SF6+C4F8.Electronic corrosion-resistant will not completely consume during etching, it is ensured that the protection to silicon nitride surface.
In Fig. 3 shown in (f), it is cleaned by ultrasonic using the sample for going glue to complete etching, it is so far super based on medium
The production of the narrow band filter on surface just completes.
Fig. 4 is the reflection spectral line using the narrow band filter in the case of above-mentioned parameter theoretically, and reflection peak wavelength is
1356.42nm, halfwidth 0.35nm.
(a) is the top view for surpassing the narrow band filter on surface under the example based on medium in Fig. 5, and (b) is that medium is super in Fig. 5
The mode of resonance schematic diagram on surface.
As it will be easily appreciated by one skilled in the art that the foregoing is merely illustrative of the preferred embodiments of the present invention, not to
The limitation present invention, any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should all include
Within protection scope of the present invention.
Claims (8)
1. a kind of narrow band filter based on super surface texture characterized by comprising if substrate, on the substrate
Dried layer dielectric film and the super surface functional layer of medium on the dielectric film；
Wherein, the surface of the super surface functional layer of the medium is the super surface texture with sub-wavelength period structure, described super
The micro-nano graph array of several splicings is prepared on surface texture, each micro-nano graph array is multiple identical micro-nanos
The arrangement of figure period is constituted.
2. narrow band filter according to claim 1, which is characterized in that by regulating and controlling micro-nano in the micro-nano graph array
The reflection wavelength of the single micro-nano graph array of the size and cyclomorphosis of figure, can reduce the bandwidth of resonance, to realize narrow
Characteristic with filtering.
3. narrow band filter according to claim 1 or 2, which is characterized in that the light beam of vertical incidence can excite described
The Local oscillating of the sociability coherent oscillation of the inside light field of super surface texture, the internal light field interacts with incident light energy
Enough change the transmission and reflection characteristic of light.
4. narrow band filter according to claim 3, which is characterized in that the dielectric film be high refractive index medium layer or
Person's low refractive index dielectric layer.
5. narrow band filter according to claim 4, which is characterized in that the working method of the narrow band filter is narrowband
Transmission or narrowband reflection.
6. narrow band filter according to claim 1, which is characterized in that the micro-nano graph row in the micro-nano graph array
Cloth is tetragonal lattice, hexagoinal lattice or quasi-crystalline lattice.
7. narrow band filter according to claim 1 or 6, which is characterized in that the micro-nano graph is nano-pore, nanometer
Column, nanometer bead, nano-rings or nanometer rods.
8. a kind of production method of the narrow band filter based on super surface texture characterized by comprising
After cleaning substrate, it is epitaxially grown on the substrate several layers dielectric film, is formed on the substrate after somatomedin film super
The photoresistive mask of surfacial pattern array structure；
Photoresistive mask is carried out after the graphic array structure is transferred on top layer dielectric film, is based on after cleaning operation
The narrow band filter on the super surface of medium.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
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| CN201810838011.5A CN109031493A (en) | 2018-07-26 | 2018-07-26 | Surpass the narrow band filter and preparation method thereof of surface texture based on medium |
| PCT/CN2018/114704 WO2020019575A1 (en) | 2018-07-26 | 2018-11-09 | Narrow-band filter based on dielectric metasurface structure and manufacturing method therefor |
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| CN201810838011.5A CN109031493A (en) | 2018-07-26 | 2018-07-26 | Surpass the narrow band filter and preparation method thereof of surface texture based on medium |
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| CN113219565A (en) * | 2021-04-30 | 2021-08-06 | 中国建筑材料科学研究总院有限公司 | Stray light eliminating window element and preparation method and application thereof |
| CN113359221A (en) * | 2021-06-10 | 2021-09-07 | 浙江大学 | Spectral filter insensitive to incident angle based on dielectric dipole and application |
| CN114019589A (en) * | 2021-11-09 | 2022-02-08 | 深圳迈塔兰斯科技有限公司 | Optical attenuation sheet |
| CN114019589B (en) * | 2021-11-09 | 2024-03-22 | 深圳迈塔兰斯科技有限公司 | Optical attenuation sheet |
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| CN114967161A (en) * | 2022-04-29 | 2022-08-30 | 同济大学 | Multilayer film free geometric super surface component and preparation method thereof |
| CN114967161B (en) * | 2022-04-29 | 2023-08-04 | 同济大学 | Multilayer film free geometric super-surface element and preparation method thereof |
| CN115390175A (en) * | 2022-09-20 | 2022-11-25 | 湖南工商大学 | High-reflection and narrow-bandwidth all-dielectric optical filter and preparation method and application thereof |
| CN115390175B (en) * | 2022-09-20 | 2024-04-26 | 湖南工商大学 | High-reflection and narrow-bandwidth all-dielectric filter and preparation method and application thereof |
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