CN116332519A - Glass powder composition, glass powder, conductive silver paste and solar cell - Google Patents
Glass powder composition, glass powder, conductive silver paste and solar cell Download PDFInfo
- Publication number
- CN116332519A CN116332519A CN202111590767.0A CN202111590767A CN116332519A CN 116332519 A CN116332519 A CN 116332519A CN 202111590767 A CN202111590767 A CN 202111590767A CN 116332519 A CN116332519 A CN 116332519A
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- CN
- China
- Prior art keywords
- glass frit
- silver paste
- conductive silver
- frit composition
- solar cell
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- 239000011521 glass Substances 0.000 title claims abstract description 81
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 63
- 239000000203 mixture Substances 0.000 title claims abstract description 44
- 239000000843 powder Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 20
- 229910005793 GeO 2 Inorganic materials 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 25
- 229910052710 silicon Inorganic materials 0.000 claims description 25
- 239000010703 silicon Substances 0.000 claims description 25
- 238000009792 diffusion process Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 14
- -1 fatty acid amine Chemical class 0.000 claims description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 239000012752 auxiliary agent Substances 0.000 claims description 9
- 238000002161 passivation Methods 0.000 claims description 9
- 238000007639 printing Methods 0.000 claims description 9
- 229910004205 SiNX Inorganic materials 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 7
- 238000007650 screen-printing Methods 0.000 claims description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
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- 229910018068 Li 2 O Inorganic materials 0.000 claims description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 6
- 239000002270 dispersing agent Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 238000005245 sintering Methods 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 239000011574 phosphorus Substances 0.000 claims description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 4
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- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Natural products OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 4
- 238000010344 co-firing Methods 0.000 claims description 4
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 4
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- 229920002647 polyamide Polymers 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- 239000004094 surface-active agent Substances 0.000 claims description 4
- 239000013008 thixotropic agent Substances 0.000 claims description 4
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 claims description 3
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 claims description 3
- 239000004359 castor oil Substances 0.000 claims description 3
- 235000019438 castor oil Nutrition 0.000 claims description 3
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 claims description 3
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 claims description 3
- 229920002545 silicone oil Polymers 0.000 claims description 3
- 238000004381 surface treatment Methods 0.000 claims description 3
- 229940116411 terpineol Drugs 0.000 claims description 3
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 claims description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 claims description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims description 2
- 239000004925 Acrylic resin Substances 0.000 claims description 2
- 229920000178 Acrylic resin Polymers 0.000 claims description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims description 2
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 2
- 239000005642 Oleic acid Substances 0.000 claims description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 2
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 claims description 2
- 239000002202 Polyethylene glycol Substances 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- TVXBFESIOXBWNM-UHFFFAOYSA-N Xylitol Natural products OCCC(O)C(O)C(O)CCO TVXBFESIOXBWNM-UHFFFAOYSA-N 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 claims description 2
- 235000020661 alpha-linolenic acid Nutrition 0.000 claims description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N benzene-dicarboxylic acid Natural products OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 claims description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 2
- 150000005323 carbonate salts Chemical class 0.000 claims description 2
- 239000012461 cellulose resin Substances 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N ethyl butylhexanol Natural products CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 claims description 2
- 150000004665 fatty acids Chemical class 0.000 claims description 2
- 150000002191 fatty alcohols Chemical class 0.000 claims description 2
- 229910021485 fumed silica Inorganic materials 0.000 claims description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims description 2
- 229960004488 linolenic acid Drugs 0.000 claims description 2
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 claims description 2
- HEBKCHPVOIAQTA-UHFFFAOYSA-N meso ribitol Natural products OCC(O)C(O)C(O)CO HEBKCHPVOIAQTA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 229910052752 metalloid Inorganic materials 0.000 claims description 2
- 239000003607 modifier Substances 0.000 claims description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 2
- 235000021313 oleic acid Nutrition 0.000 claims description 2
- JLFNLZLINWHATN-UHFFFAOYSA-N pentaethylene glycol Chemical compound OCCOCCOCCOCCOCCO JLFNLZLINWHATN-UHFFFAOYSA-N 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 229920001223 polyethylene glycol Polymers 0.000 claims description 2
- 229920005862 polyol Polymers 0.000 claims description 2
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 2
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 2
- 229960004063 propylene glycol Drugs 0.000 claims description 2
- 239000000600 sorbitol Substances 0.000 claims description 2
- 150000005846 sugar alcohols Polymers 0.000 claims description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000811 xylitol Substances 0.000 claims description 2
- HEBKCHPVOIAQTA-SCDXWVJYSA-N xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 claims description 2
- 229960002675 xylitol Drugs 0.000 claims description 2
- 235000010447 xylitol Nutrition 0.000 claims description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N CuO Inorganic materials [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 abstract description 11
- 230000000694 effects Effects 0.000 description 8
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 239000012634 fragment Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
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- 238000001039 wet etching Methods 0.000 description 3
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 2
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000003981 vehicle Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XNRNVYYTHRPBDD-UHFFFAOYSA-N [Si][Ag] Chemical compound [Si][Ag] XNRNVYYTHRPBDD-UHFFFAOYSA-N 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
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- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
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- 229910052714 tellurium Inorganic materials 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
The invention provides a glass powder composition, glass powder, conductive silver paste and a solar cell. The glass frit composition contains 1-7wt% of WO 3 5-15wt% MoO 3 1-10wt% GeO 2 40-60wt% of TeO 2 . The invention also provides glass powder, conductive silver paste and a solar cell which are prepared from the glass powder composition. The conductive silver paste containing the glass powder or the conductive silver paste provided by the invention can replace a SE doping process, so that the manufacturing cost of the battery is reduced, and the manufactured solar battery can have high conversion efficiency and reliability.
Description
Technical Field
The invention relates to a glass powder composition, glass powder, conductive silver paste and a solar cell, and belongs to the technical field of solar cells.
Background
Solar cells generate electricity using the photovoltaic effect, with the most central structure being the PN junction. Generally, the P-type silicon wafer of the current mainstream is doped with N-type phosphorus, and the SE technology (selective emitter) used in the diffusion process of the current battery mainstream is to carry out heavy doping under metallization and shallow doping in non-metallization places. The existing SE technology is generally realized by firstly diffusing and then carrying out laser doping at the place needing metallization, the technology needs to increase the investment of laser equipment, meanwhile, the SE technology needs to be matched by screen printing technology, the printed fine grid lines are required to be aligned to the laser doped area, the printing requirement is high, and the productivity and the yield of screen printing are affected. If the sheet resistance is low, the doping concentration is high, serious Auger recombination is caused, the minority carrier lifetime is low, the open-circuit voltage and the short-circuit current are reduced, if the sheet resistance is close to the sheet resistance (high sheet resistance) of the shallow doping region of the SE process, the doping concentration is low, the interface state of the silicon surface and the Fermi-pinning effect are caused, the series resistance is large, and the conversion efficiency of the solar cell is low.
Chinese application 201910507352.9.7 discloses a glass composition for crystalline silicon solar PERC cell front side silver paste and a method for preparing the same, which can be used to match the diffusion SE process. Chinese patent application 201880000355.7 discloses a crystalline silicon solar cell front-side conductive paste, a preparation method thereof and a solar cell, wherein the glass composition can be matched with high sheet resistance, but from practical examples, the difference between the effect and the open-circuit voltage and conversion efficiency of the current SE technology is larger, and the difference between the practical sheet resistance and the sheet resistance of the current SE shallow doped region is larger.
The main current doping process of the solar cell uses an SE process, most of current conductive paste is used for matching with a diffusion SE process, less paste is matched with non-SE high sheet resistance, the front conductive paste of China application patent 201880000355.7 is not SE high sheet resistance conductive paste, the actually matched sheet resistance is lower than the sheet resistance of a shallow doping area of the current SE process, the doping concentration is higher than the concentration of the shallow doping area of SE, auger recombination is serious, the open circuit voltage and conversion efficiency of the cell are lower, and the application value is low, so that the current SE process is difficult to replace.
Disclosure of Invention
In order to solve the technical problems, the invention aims to provide a novel glass system and a conductive paste based on the glass system, wherein the conductive paste can form good ohmic contact with a battery under the conditions of high sheet resistance and low doping concentration, can be used for replacing a mass production SE doping process, and reduces the production cost of a solar battery.
To achieve the above object, the present invention provides a glass frit composition comprising, in weight percent, 1 to 7% by weight of WO 3 5-15wt% MoO 3 1-10wt% GeO 2 40-60wt% of TeO 2 。
According to a specific embodiment of the present invention, preferably, the glass frit composition contains 1 to 7wt% of WO 3 5-15wt% MoO 3 1-10wt% GeO 2 40-60wt% of TeO 2 。
According to a particular embodiment of the invention, preferably the TeO 2 The content of (C) is 42-51wt%.
According to a specific embodiment of the present invention, preferably, the glass frit composition contains 1.5 to 6.5wt% of WO in weight percent 3 6.5 to 9.5wt% MoO 2 1-10wt% GeO 2 40-53wt% of TeO 2 。
According to a specific embodiment of the present invention, preferably, the glass frit composition further comprises ZnO, B 2 O 3 、SiO 2 、PbO、Al 2 O 3 、P 2 O 5 、CuO、MgO、CaO、Li 2 O、Na 2 O、K 2 One or more than two of O.
According to a specific embodiment of the present invention, preferably, the glass frit composition further comprises 1 to 3wt% of ZnO,1 to 3wt% of B 2 O 3 1-3wt% of SiO 2 12-20wt% of PbO, 0-2wt% (preferably below 2 wt%) of Al 2 O 3 1-3wt% of P 2 O 5 1-3wt% of CuO, 4-8wt% of MgO, 0-2wt% (preferably less than 2 wt%) of CaO, 5-12wt% of Li 2 O, 0-2wt% Na 2 O、0-2wt% of K 2 One or more than two of O.
According to a specific embodiment of the present invention, preferably, the glass frit composition contains 1.5 to 6.5wt% of WO 3 6.5 to 9.5wt% MoO 2 1-10wt% GeO 2 40-53wt% of TeO 2 1-3wt% ZnO,1-3wt% B 2 O 3 1-2.5wt% SiO 2 12-18wt% of PbO,3-7wt% of MgO,1-3wt% of P 2 O 5 4-9.5wt% of Li 2 O。
According to a specific embodiment of the present invention, preferably, the glass frit composition does not contain Bi element, preferably does not contain Bi 2 O 3 。
According to a particular embodiment of the invention, preferably in the glass frit composition, WO 3 、MoO 3 、GeO 2 、TeO 2 、ZnO、B 2 O 3 、SiO 2 、PbO、Al 2 O 3 、P 2 O 5 、GuO、MgO、CaO、Li 2 O、Na 2 O、K 2 One or a combination of two or more of O is replaced by a carbonate salt of a corresponding metallic or metalloid element capable of providing a molar amount, for example: according to WO 3 The mass of (2) is calculated to give the number of moles of W, assuming Xmol, from which Xmol of W (CO 3 ) 3 The mass of (2) is taken as W (CO) 3 ) 3 The amount to be added to the glass frit composition. Wherein "carbonate" includes not only various elements and Carbonate (CO) 3 2- ) Salts formed, also including bicarbonate (acid carbonate), basic carbonate.
The invention also provides glass powder which is prepared from the glass powder composition provided by the invention.
According to a specific embodiment of the present invention, the glass frit may be prepared by the steps of: mixing the glass powder composition, and heating and melting at 750-1000 ℃ for 30-120 min; cooling to obtain fragments; the fragments are further crushed and then ball-milled to obtain the glass powder with the required particle size distribution.
According to a specific embodiment of the present invention, it is preferable that the fineness of the particle diameter of the glass frit composition satisfies D50. Ltoreq.10. Mu.m.
According to a specific embodiment of the present invention, preferably, the glass frit is one or a combination of two or more of amorphous glass frit, crystalline glass frit, partially amorphous glass frit.
The invention also provides conductive silver paste, wherein the conductive silver paste contains 1-4% of glass powder by weight percent, and the glass powder is the glass powder provided by the invention.
According to a specific embodiment of the present invention, preferably, the conductive silver paste further contains silver powder (conductive phase) and an organic carrier; more preferably, the silver powder is contained in an amount of 85 to 92% by weight and the organic vehicle is contained in an amount of 5 to 12% by weight.
According to a specific embodiment of the present invention, preferably, the silver powder has a particle diameter of 1 to 5 μm and a tap density of 5 to 9g/cm 3 。
According to a specific embodiment of the present invention, in the conductive silver paste: the glass powder is mainly used for wetting silver powder, corroding a passivation layer and bonding silver silicon in the sintering process, and has a main influence on the contact resistance of the conductive silver paste and the battery; silver powder is used as a conductive phase and mainly plays a role in conduction, and is used for collecting photo-generated carriers after sintering; the organic carrier is mainly used for dispersing silver powder, so that the slurry has good rheological property and can be well subjected to screen printing.
According to a specific embodiment of the present invention, preferably, the silver powder is a surface-treated silver powder, and the dispersion stability of the silver powder in the conductive silver paste can be improved by modification; more preferably, the modifier used for the surface treatment of the silver powder comprises one or more of oleic acid, linoleic acid, linolenic acid, a silane coupling agent, hard fatty acid, fatty acid amine, polyvinylpyrrolidone, fatty alcohol polyoxyethylene ether, a block macromolecular surfactant and the like. The surface treatment for the silver powder may be performed in a conventional manner in the art.
According to a specific embodiment of the present invention, preferably, the organic carrier includes a resin, an organic solvent and an auxiliary agent, and the addition amounts of the three are 1% -20%, 75% -95% and 0.1% -4%, respectively.
According to a specific embodiment of the present invention, preferably, the resin is one or a combination of two or more of a cellulose resin, an epoxy resin, and an acrylic resin.
According to a specific embodiment of the present invention, preferably, the organic solvent is one or a combination of two or more of terpineol, butyl carbitol acetate, and dodecanol ester.
According to a specific embodiment of the present invention, preferably, the auxiliary agent includes one or a combination of two or more of a dispersant, a thixotropic agent, a lubricant, a humectant and a plasticizer. Wherein the dispersant is preferably a macromolecular dispersant such as polyether, polyester, polyamide or polysilicone; the lubricant is preferably surfactant and/or silicone oil; the thixotropic agent is preferably one or more than two of hydrogenated castor oil, polyamide, fumed silica and the like; the humectant is preferably one or more of diethylene glycol, triethylene glycol, PEG400, glycerol, ethylene glycol, sorbitol, 1, 2-propylene glycol, diethylene glycol butyl ether, ethylene glycol, polyethylene glycol, N-methyl-2-pyrrolidone, condensate of polyalcohol and ethylene oxide, xylitol, etc.; the plasticizer is preferably one or more of aliphatic dibasic acid ester, phthalic acid ester, terephthalic acid ester, benzene polyacid ester, benzoate, polyol ester epoxy, citric acid ester, polyester and the like.
According to a specific embodiment of the present invention, it is preferable that the average blade fineness of the conductive silver paste is 10 μm or less, more preferably 5 μm or less.
The conductive silver paste can be prepared by the following steps:
1) Preparation of organic vehicle body: mixing resin and organic solvent in proportion, and stirring at room temperature or under heating;
2) And (3) preparing slurry: mixing silver powder, glass powder composition and organic carrier, stirring, and grinding and dispersing with a three-roller machine to obtain conductive silver paste with average scraper fineness below 10 μm, preferably below 5 μm.
In the preparation process of the conductive silver paste, the auxiliary agent can be added in the step 1) of preparing the organic carrier, can also be added in the step 2) of preparing the paste, or can be added in part in the step 1) and in part in the step 2).
The invention also provides a solar cell, wherein the front electrode of the solar cell is made of the conductive silver paste containing the glass powder composition and/or the conductive silver paste provided by the invention. More preferably, the solar cell is a solar cell manufactured by a high sheet resistance process.
The glass powder composition and silver paste formed by the glass powder composition can be used in solar cells with high sheet resistance. The glass system of W-Mo-Ge-Te can corrode the passivation layer and does not further corrode the silicon wafer, so that the doping concentration on the surface of the silicon wafer is not affected by glass, and the silver paste can have good contact resistance with the battery piece and simultaneously maintain good binding force. The solar cell manufactured by the silver paste has high conversion efficiency and reliability, can replace the SE doping process, and reduces the manufacturing cost of the cell.
The invention also provides a preparation method of the solar cell, which is a high sheet resistance process and comprises the following steps:
firstly, preparing an anti-reflection suede on one side surface of a silicon substrate, for example, corroding by using alkali solution or acid solution to form a pyramid-shaped (single crystal) or rugged (polycrystal) anti-reflection suede;
forming an N-type diffusion layer on the other side of the P-type silicon substrate to form a PN junction, forming the N-type diffusion layer (preferably using phosphorus oxychloride as a diffusion source) by adopting a gas phase thermal diffusion method, wherein the diffused sheet resistance is 120-170 omega/sq, and then removing phosphorus at the edge, such as wet etching or dry etching;
thirdly, performing thermal diffusion on the N surface to form SiO 2 Then plating SiNx antireflection layer (or similar other coating with good antireflection and passivation effects) on the P surface 2 O 3 And SiNx dullnessForming a layer, and then carrying out laser grooving at the printing position of the P-surface aluminum back surface field;
fourthly, forming a vertical and horizontal main grid and a fine grid on the N-face anti-reflection film through a screen printing mode by using the conductive silver paste, printing a back electrode and an aluminum back field on one side of the P type, and co-firing at the sintering temperature of 700-900 ℃ to form an electrode body.
The glass powder composition is a glass system of W-Mo-Ge-Te, wherein Ge and Te can form a stable glass network structure, W, mo can enable glass to have a higher softening point temperature, cannot corrode a silicon wafer, and therefore cannot influence the doping concentration of the silicon surface (the conventional glass system can further corrode the silicon wafer surface after corroding a passivation layer, so that the actual doping concentration of a contact part between the silicon wafer surface and slurry becomes low), meanwhile, the formed glass is more uniformly distributed on the silicon wafer, electrons can be better transferred through tunneling effect, and the contact resistance of the slurry and the silicon wafer is reduced, so that under the condition of high sheet resistance, the conductive slurry still has good contact resistance with the silicon, and meanwhile, good bonding force is kept.
The conductive silver paste containing the glass powder or the conductive silver paste provided by the invention can replace a SE doping process, so that the manufacturing cost of the battery is reduced, and the manufactured solar battery can have high conversion efficiency and reliability.
Detailed Description
The technical solution of the present invention will be described in detail below for a clearer understanding of technical features, objects and advantageous effects of the present invention, but should not be construed as limiting the scope of the present invention.
Example 1
This example provides 11 sets of glass frit compositions, in weight percent oxide as shown in table 1, wherein number 11 is the control:
TABLE 1
The preparation method of the glass powder comprises the following steps: mixing the above components in proportion, then placing in a muffle furnace, heating at 900-1100 ℃ for 45-90 min, quenching with water, cooling with a steel plate to obtain glass fragments, further crushing the fragments, and ball milling with a planetary ball mill to obtain glass powder of W-Mo-Ge-Te system with required particle size distribution (D50: 0.1-5 μm) and Pb-Te glass of a control group.
Example 2
The embodiment provides a conductive silver paste, wherein the conductive paste comprises 88.5 parts of silver powder, 2.5 parts of glass powder and 9 parts of an organic carrier based on 100 parts of the total weight of the conductive silver paste. Silver powder requires particle size: 1-5 μm (D50), tap density: 5-9g/cm 3 。
The organic carrier consists of a solvent, resin and an auxiliary agent, wherein the solvent is a mixture of terpineol, butyl carbitol acetate and dodecyl ester with the mass ratio of 1:4:1, the solvent accounts for 78 percent, the resin is a mixture of ethyl cellulose and acrylic acid with the mass ratio of 1:4, the resin accounts for 20 percent, the auxiliary agent is a mixture of hydrogenated castor oil and silicone oil with the mass ratio of 1:5, and the auxiliary agent accounts for 2 percent.
The conductive silver paste is prepared by the following steps:
adding resin into the solvent, fully stirring under the heating condition of 70-100 ℃, and adding an auxiliary agent after the resin is completely dissolved to obtain a required organic carrier;
the glass powder composition, silver powder and organic carrier in table 1 are mixed and stirred uniformly in proportion, and are ground and dispersed by a three-roller machine to obtain the required conductive paste, and the conductive paste with the average scraper fineness of less than 5 mu m is selected for standby.
Example 3
The embodiment provides a solar cell, which is prepared by the following steps:
the semiconductor substrate is a P-type silicon substrate doped with boron or gallium, wherein the P-type silicon substrate is a silicon wafer with the thickness of 150-200 mu m and the side length of 156-210 mm;
etching one side of a silicon substrate by using alkali solution or acid solution to prepare pyramid (single crystal) or rugged (polycrystal) anti-reflection suede;
forming an N-type diffusion layer on the other side of the P-type silicon substrate to form a PN junction, wherein the N-type diffusion layer can be a gas-phase thermal diffusion method with phosphorus oxychloride as a diffusion source, the diffused sheet resistance is 120-170 omega/sq, and removing phosphorus at the edge through wet etching or dry etching;
thirdly, performing thermal diffusion on the N surface to form a layer of SiO 2 Then plating a SiNx antireflection layer, or similar other coating with good antireflection and passivation effects, plating Al on the P surface 2 O 3 And a passivation layer of SiNx, and then carrying out laser grooving at the printing position of the P-surface aluminum back surface field;
fourthly, forming a vertical and horizontal main grid and a fine grid on the N-face anti-reflection film through a screen printing mode by using the conductive silver paste, printing a back electrode and an aluminum back field on one side of the P type, and co-firing at the sintering temperature of 700-900 ℃ to form an electrode body.
The electrical performance test is carried out on the solar cell, specifically: test under standard conditions (atmospheric quality AM 1.5, illumination intensity 1000W/m using a solar simulated electrical efficiency tester 2 Test temperature 25 ℃). The series resistance and conversion efficiency results are shown in table 2, wherein the serial numbers correspond to the corresponding serial numbers in table 1.
TABLE 2
Sequence number | Rs(mΩ) | Conversion efficiency |
1 | 1.31 | 23.06% |
2 | 1.42 | 23.02% |
3 | 1.62 | 22.98% |
4 | 1.33 | 23.08% |
5 | 1.38 | 23.04% |
6 | 1.42 | 23.07% |
7 | 1.45 | 23.02% |
8 | 1.34 | 23.10% |
9 | 1.49 | 22.95% |
10 | 1.43 | 23.11% |
Example 4
The embodiment provides a solar cell, which is prepared by the following steps:
the semiconductor substrate is a P-type silicon substrate doped with boron or gallium, the P-type silicon substrate is a silicon wafer with the thickness of 150-200 mu m and the side length of 156-210 mm;
firstly, etching one side of a silicon substrate by using alkali solution or acid solution to form pyramid-shaped (single crystal) or rugged (polycrystal) anti-reflection suede;
forming an N-type diffusion layer on the other side of the P-type silicon substrate to form a PN junction, wherein the N-type diffusion layer can be a gas-phase thermal diffusion method by taking phosphorus oxychloride as a diffusion source, the diffused sheet resistance is 120-170 omega/sq, then the sheet resistance of a re-doped region after SE is 70-120 omega/sq through laser SE, and then removing the phosphorus at the edge through wet etching or dry etching;
thirdly, performing thermal diffusion on the N surface to form a layer of SiO 2 Then plating a SiNx antireflection layer, or similar other coating with good antireflection and passivation effects, plating Al on the P surface 2 O 3 And a passivation layer of SiNx, and then carrying out laser grooving at the printing position of the P-surface aluminum back surface field;
fourthly, forming a vertical and horizontal main grid and a fine grid on the anti-reflection film of the N surface through a screen printing mode by conducting silver paste manufactured by 11 # glass in the table 1, printing a back electrode and an aluminum back field on the P type side, and co-firing at the sintering temperature of 700-900 ℃ to form the electrode body.
The electrical performance test is carried out on the solar cell, specifically: test under standard conditions (atmospheric quality AM 1.5, illumination intensity 1000W/m using a solar simulated electrical efficiency tester 2 Test temperature 25 ℃). The series resistance and conversion efficiency results are shown in table 3.
TABLE 3 Table 3
Sequence number | Rs(mΩ) | Conversion efficiency |
11 | 1.38 | 23.09% |
From the data, the glass powder system has smaller series resistance on the high-sheet-resistance battery piece than the conventional system slurry, and the conversion efficiency reaches 23% of that of the main flow SE PERC process. The non-SE high sheet resistance process matched with the conductive paste can replace the conventional SE process, reduce the equipment investment of a battery factory, improve the yield and reduce the production cost of the solar battery.
Claims (13)
1. A glass frit composition, wherein the glass frit composition comprises 1-7wt% of WO 3 5-15wt% MoO 3 1-10wt% GeO 2 40-60wt% of TeO 2 。
2. The glass frit composition of claim 1, wherein the TeO 2 The content of (C) is 42-51wt%.
3. The glass frit composition according to claim 1 or 2, wherein the glass frit composition further comprises 1-3wt% ZnO,1-3wt% B 2 O 3 1-3wt% of SiO 2 12-20wt% of PbO, 0-2wt% (preferably below 2 wt%) of Al 2 O 3 1-3wt% of P 2 O 5 1-3wt% of CuO, 4-8wt% of MgO, 0-2wt% (preferably less than 2 wt%) of CaO, 5-12wt% of Li 2 O, 0-2wt% Na 2 O, 0-2wt% K 2 One or more than two of O.
4. A glass frit composition according to any of claims 1-3, wherein the glass frit composition does not comprise Bi element, preferably does not comprise Bi 2 O 3 。
5. The glass frit composition according to any of claims 1-4, wherein the WO 3 、MoO 3 、GeO 2 、TeO 2 、ZnO、B 2 O 3 、SiO 2 、PbO、Al 2 O 3 、P 2 O 5 、CuO、MgO、CaO、Li 2 O、Na 2 O、K 2 One or a combination of two or more of O is replaced by a carbonate salt capable of providing a molar amount of the corresponding metallic element or metalloid element.
6. A glass frit made from the glass frit composition of any of claims 1-5;
preferably, the fineness of the particle diameter of the glass frit composition satisfies D50. Ltoreq.10 μm;
more preferably, the glass frit is one or a combination of two or more of an amorphous glass frit composition, a crystalline glass frit composition, a partially crystalline glass frit composition, and a partially amorphous glass frit composition.
7. A conductive silver paste, wherein the conductive silver paste contains 1% -4% by weight of glass powder, and the glass powder is the glass powder of claim 6.
8. The conductive silver paste of claim 7, wherein the conductive silver paste further comprises silver powder and an organic carrier; preferably, the silver powder is 85-92% by weight, and the organic carrier is 5-12% by weight;
preferably, the grain diameter of the silver powder is 1-5 mu m, and the tap density is 5-9g/cm 3 。
9. The conductive silver paste of claim 8, wherein the silver powder is a surface-treated silver powder;
preferably, the modifier used for the surface treatment of the silver powder comprises one or more than two of oleic acid, linoleic acid, linolenic acid, silane coupling agent, hard fatty acid, fatty acid amine, polyvinylpyrrolidone, fatty alcohol polyoxyethylene ether and block macromolecular surfactant.
10. The conductive silver paste according to any one of claims 7 to 9, wherein the organic carrier comprises resin, an organic solvent and an auxiliary agent, and the addition amounts of the three are 1 to 20%, 75 to 95% and 0.1 to 4%, respectively;
preferably, the resin is one or a combination of more than two of cellulose resin, epoxy resin and acrylic resin;
preferably, the organic solvent is one or a combination of more than two of terpineol, butyl carbitol acetate and dodecanol ester;
preferably, the auxiliary agent comprises one or a combination of more than two of dispersing agent, thixotropic agent, lubricant, humectant and plasticizer;
more preferably, the dispersant is a macromolecular dispersant, such as a polyether, polyester, polyamide or polysilicone; the lubricant is surfactant and/or silicone oil; the thixotropic agent is one or the combination of more than two of hydrogenated castor oil, polyamide and fumed silica; the humectant is one or more than two of diethylene glycol, triethylene glycol, PEG400, glycerol, ethylene glycol, sorbitol, 1, 2-propylene glycol, diethylene glycol butyl ether, ethylene glycol, polyethylene glycol, N-methyl-2-pyrrolidone, condensate of polyalcohol and ethylene oxide and xylitol; the plasticizer is one or more than two of aliphatic dibasic acid ester, phthalic acid ester, terephthalic acid ester, benzene polyacid ester, benzoate, polyol ester epoxy, citric acid ester and polyester.
11. The conductive silver paste according to claim 10, wherein the conductive silver paste has an average blade fineness of 10 μm or less, preferably 5 μm or less.
12. A solar cell, wherein the front electrode of the solar cell is made of the conductive silver paste comprising the glass frit of claim 6 and/or the conductive silver paste of any one of claims 7 to 11; preferably, the solar cell is a solar cell manufactured by a high sheet resistance process.
13. The method for manufacturing a solar cell according to claim 12, comprising the steps of:
firstly, manufacturing an antireflection suede on one side surface of a silicon substrate;
forming an N-type diffusion layer on the other side of the P-type silicon substrate to form a PN junction, forming the N-type diffusion layer (preferably using phosphorus oxychloride as a diffusion source) by adopting a gas phase thermal diffusion method, wherein the diffused sheet resistance is 120-170 omega/sq, and then removing phosphorus at the edge;
thirdly, performing thermal diffusion on the N surface to form SiO 2 Then plating SiNx antireflection layer, plating Al on the P surface 2 O 3 And a passivation layer of SiNx, and then carrying out laser grooving at the printing position of the P-surface aluminum back surface field;
fourthly, forming a vertical and horizontal main grid and a fine grid on the N-face anti-reflection film through a screen printing mode by using the conductive silver paste, printing a back electrode and an aluminum back field on one side of the P type, and co-firing at the sintering temperature of 700-900 ℃ to form an electrode body.
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