CN116280507A - Feeding and filling system, cleaning method thereof and computer readable storage medium - Google Patents

Abstract

A feeding and filling system, a cleaning method thereof and a computer readable storage medium. The feeding and filling system comprises: pretreatment equipment and filling equipment, and a flow regulating valve connected between the pretreatment equipment and the filling equipment. The cleaning method of the feeding and filling system comprises the following steps: cleaning the flow regulating valve; and cleaning the flow regulating valve comprises: introducing a cleaning gas into the feeding and filling system, wherein the flow regulating valve is positioned in the flow path of the cleaning gas; and repeatedly opening and closing the flow regulating valve, and cleaning the flow regulating valve by using the cleaning gas.

Description

Feeding and filling system, cleaning method thereof and computer readable storage medium

Technical Field

At least one embodiment of the present disclosure relates to a method of cleaning a feed and fill system, and a computer readable storage medium.

Background

At present, trade communication between countries and regions is very frequent, and various products are often required to be packaged for storage, transportation and vending. For example, food products such as milk, beverages, purees, broths, etc. are required to be hermetically packaged in various forms of containers such as packages, bags, etc. A feed and fill system is often used in packaging products for filling the products into containers. In the case of a filled product being a food product, it is necessary to ensure the cleanliness and hygiene of the various components of the feeding and filling system in order to be able to meet the national standards of hygiene.

Disclosure of Invention

According to an embodiment of the present disclosure, there is provided a cleaning method of a feeding and filling system including: a pretreatment apparatus and a filling apparatus, and a flow regulating valve connected between the pretreatment apparatus and the filling apparatus, wherein the cleaning method of the feeding and filling system comprises: cleaning the flow regulating valve; and cleaning the flow regulating valve comprises: introducing a cleaning gas into the feeding and filling system, wherein the flow regulating valve is positioned in the flow path of the cleaning gas; and repeatedly opening and closing the flow regulating valve, and cleaning the flow regulating valve by using the cleaning gas.

For example, the cleaning gas is high temperature vapor, the temperature of the high temperature vapor is greater than 100 ℃; and the cleaning method includes: introducing high-temperature water vapor into the feeding and filling system to form a vapor barrier which is located in a space behind the flow regulating valve and passes through the flow regulating valve in a manner intersecting a switching direction of the flow regulating valve, the vapor barrier isolating the pretreatment device and the filling device from each other; and repeatedly switching on and off the flow regulating valve, and cleaning the flow regulating valve by utilizing the high-temperature steam.

For example, the temperature of the high-temperature vapor is 130 degrees celsius or more.

For example, the feeding and filling system comprises a first line, at a first position of which the first line is connected to the pretreatment device, the flow regulating valve being arranged at the first position, the pretreatment device being in communication with the first line when the flow regulating valve is opened; and said forming a vapor barrier comprises: the high temperature water vapor is vented to the first line to form the vapor barrier in the first line.

For example, the opening and closing direction of the flow regulating valve is a first direction; the first line extends in a second direction such that the vapor barrier is disposed in the second direction, the second direction being substantially perpendicular to the first direction; and the second direction is a horizontal direction and the first direction is a vertical direction with respect to the ground.

For example, the feeding and filling system comprises: a gas supply device providing the high temperature water vapor; the first pipeline is provided with a first end and a second end, the first end of the first pipeline is connected with the filling equipment, the second end of the first pipeline is connected with the air supply equipment, and the first position of the first pipeline is located between the first end and the second end of the first pipeline; the feeding and filling system further comprises a first valve and a second valve, wherein the first valve is arranged at the first end of the first pipeline, the first pipeline is communicated with the filling equipment when the first valve is opened, the second valve is arranged at the second end of the first pipeline, and the first pipeline is communicated with the air supply equipment when the second valve is opened; and said forming said vapor barrier in said first line comprises: closing the flow regulating valve and the first valve and opening the second valve to form the vapor barrier in the first line.

For example, the feeding and filling system further comprises: a third valve connected to the first pipeline, the first pipeline being communicated with the outside when the third valve is opened; and said forming said vapor barrier in said first line comprises: closing the flow regulating valve, the first valve and the third valve and opening the second valve to form the vapor barrier in the first line, after which the third valve is opened and closed at least once at intervals of a certain period of time.

For example, the feeding and filling system further comprises a temperature sensor for measuring the temperature of the high-temperature vapor in the first line; and determining the specific time period according to the temperature of the high-temperature steam measured by the temperature sensor, wherein the third valve is opened and closed at least once when the temperature of the high-temperature steam measured by the temperature sensor is lower than a preset value.

For example, the third valve is connected to the first pipeline at a second location of the first pipeline; and in the second direction, the second location is located between the first end of the first pipeline and the first location.

For example, the feeding and filling system further comprises a fourth valve and a fifth valve, the fifth valve being connected between the gas supply device and the fourth valve, the fourth valve being connected between the first line and the third valve, and the fourth valve being further connected between the third valve and the fifth valve; the third valve, the fourth valve and the fifth valve are set as follows: the fourth valve is opened, the fifth valve is closed, and the high-temperature steam in the first pipeline passes through the fourth valve to reach the third valve; the third valve, the fourth valve and the fifth valve are further configured to: the fifth valve is opened and the fourth valve is closed, high-temperature steam provided by the air supply device passes through the fifth valve to the third valve to form a first auxiliary steam barrier, and the first auxiliary steam barrier is positioned in a space behind the fourth valve and passes through the fourth valve in a manner of intersecting with the opening and closing direction of the fourth valve; and forming the vapor barrier in the first line further comprises: the fourth valve is opened and the fifth valve is closed.

For example, the feeding and filling system further comprises a sixth valve and a seventh valve, the sixth valve being connected between the gas supply device and the second valve; the second valve, the sixth valve and the seventh valve are arranged as follows: the second valve is opened, the sixth valve is opened, the seventh valve is closed, and high-temperature steam provided by the air supply device reaches the second valve through the sixth valve and enters the first pipeline through the second valve; the second valve, the sixth valve and the seventh valve are further configured to: the sixth valve is opened, the second valve is closed, the high-temperature steam provided by the air supply device forms a second auxiliary steam barrier, the second auxiliary steam barrier is positioned in a space behind the second valve and passes through the second valve in a mode of intersecting with the opening and closing direction of the second valve, and the seventh valve is used for controlling the second auxiliary steam barrier to be communicated with the outside; and forming the vapor barrier in the first line further comprises: closing the seventh valve.

For example, after forming the vapor barrier, the gas pressure in the first line is 100mbar or less.

For example, the cleaning method according to an embodiment of the present disclosure further includes: and stopping the high-temperature steam from being fed to the feeding and filling system after the high-temperature steam is fed to the feeding and filling system for a first period of time, wherein the flow regulating valve is repeatedly opened and closed before or after the high-temperature steam is fed to the feeding and filling system.

For example, the first period of time is 15 minutes or less.

For example, the pretreatment device is used for pretreating raw materials to be filled, and the filling device is used for filling the raw materials into a container; the method further includes stopping the feed and fill system prior to introducing the purge gas, evacuating the feedstock located in the pretreatment device, between the pretreatment device and the fill device, and in the fill device.

For example, the cleaning method according to an embodiment of the present disclosure further includes: cleaning the pretreatment device with a liquid cleaning stream of a liquid cleaning medium; the cleaning the flow regulating valve includes: the flow regulating valve is repeatedly opened and closed to clean the flow regulating valve with the liquid cleaning flow.

For example, the filling apparatus is for filling a container with a raw material, the filling apparatus including a raw material tank containing the raw material; the method further comprises the steps of: at least one gaseous medium is added to the liquid cleaning medium to form a gas-liquid mixed cleaning stream, and the raw material barrel is cleaned with the gas-liquid mixed cleaning stream.

For example, the raw material tank has a preset level line; cleaning the raw material barrel with the gas-liquid mixed cleaning flow comprises: the liquid cleaning medium is introduced into the raw material tank so that the liquid level of the liquid cleaning medium reaches or approaches the liquid level line, after which the gaseous medium is added to the liquid cleaning medium.

For example, the cleaning method according to an embodiment of the present disclosure further includes: cleaning the pretreatment device and cleaning the filling device, wherein cleaning the flow regulating valve is performed simultaneously with cleaning the pretreatment device and cleaning the filling device.

For example, the pretreatment device, and the filling device are cleaned with the same cleaning medium.

There is also provided, in accordance with an embodiment of the present disclosure, a feed and fill system, including: a processor; a memory including one or more computer program modules; wherein the one or more computer program modules are stored in the memory and configured to be executed by the processor, the one or more computer program modules comprising instructions for implementing the cleaning method as described above.

According to an embodiment of the present disclosure, there is also provided a computer-readable storage medium storing non-transitory computer-readable instructions which, when executed by a computer, can implement the cleaning method as described above.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly described below, and it is apparent that the drawings in the following description relate only to some embodiments of the present disclosure, not to limit the present disclosure.

FIG. 1 is a schematic illustration of a layout of a feed and fill system with clean gas in a first line in accordance with an embodiment of the present disclosure;

FIG. 2 is a schematic diagram of a layout II of a feed and fill system with clean gas in a first line in accordance with an embodiment of the present disclosure;

FIG. 3 is a schematic layout of a feed and fill system in a fill operational state according to an embodiment of the present disclosure;

FIG. 4 is a schematic view of a raw material bowl containing raw materials for a filling apparatus in a feed and fill system according to an embodiment of the present disclosure;

FIG. 5 is a schematic diagram of a frame of a feed and fill system in accordance with an embodiment of the present disclosure;

FIG. 6 is a second schematic frame view of a feed and fill system according to an embodiment of the present disclosure;

Fig. 7 is a schematic diagram of a computer-readable storage medium according to an embodiment of the disclosure.

Detailed Description

For the purpose of making the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. It will be apparent that the described embodiments are some, but not all, of the embodiments of the present disclosure. All other embodiments, which can be made by one of ordinary skill in the art without the need for inventive faculty, are within the scope of the present disclosure, based on the described embodiments of the present disclosure.

Unless defined otherwise, technical or scientific terms used herein should be given the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The terms "first," "second," and the like in the description and in the claims, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. "inner", "outer", "upper", "lower", etc. are used merely to denote relative positional relationships, which may also change accordingly when the absolute position of the object to be described changes.

The drawings in this disclosure are not necessarily to scale, and the specific dimensions and numbers of individual structures may be determined according to actual needs. The drawings described in this disclosure are schematic only.

The feed and fill system includes a pretreatment device and a fill device, and a flow control valve connected between the pretreatment device and the fill device. The flow regulating valve is a communication portal between the pretreatment equipment and the filling equipment; the flow regulating valve is opened, the pretreatment equipment is communicated with the filling equipment, raw materials provided by the pretreatment equipment can enter the filling equipment, and the flow of the raw materials entering the filling equipment can be regulated by regulating the opening degree of the flow regulating valve; the flow regulating valve is closed, the pretreatment equipment is not communicated with the filling equipment, and raw materials provided by the pretreatment equipment cannot enter the filling equipment. In the case of filling food products with a feeding and filling system, it is necessary to ensure cleanliness and hygiene of the various components of the feeding and filling system, including the flow regulating valve, in order to be able to meet the national standards of hygiene. However, cleaning of the flow regulating valve has been a difficult problem. On the one hand, when cleaning the feed and filling system, there is a cleaning mode, in which the flow control valve is closed and the pretreatment device and the filling device are cleaned individually, and in which the flow control valve is a clean blind zone which is substantially impossible to clean. On the other hand, raw materials from the pretreatment equipment can enter the filling equipment only through the flow regulating valve, and residues and accumulation of the raw materials are easy to occur at the valve seat and/or the valve head of the flow regulating valve, so that the cleaning difficulty of the flow regulating valve is greatly increased.

In accordance with an embodiment of the present disclosure, a method of cleaning a feed and fill system is provided. Fig. 1 is a schematic layout diagram one of a feeding and filling system in a state where a cleaning gas is introduced into a first line according to an embodiment of the present disclosure. Referring to fig. 1, a feed and fill system according to an embodiment of the present disclosure includes a pretreatment device 100 and a fill device 200, and a flow regulating valve FDV connected between the pretreatment device 100 and the fill device 200; a method of cleaning a feed and fill system according to an embodiment of the present disclosure includes: cleaning a flow regulating valve FDV; and the cleaning flow rate regulating valve FDV includes: introducing a cleaning gas into the feeding and filling system, wherein a flow regulating valve FDV is positioned in the flow path of the cleaning gas; and repeatedly opening and closing the flow regulating valve FDV, and cleaning the flow regulating valve FDV by using the cleaning gas. According to the embodiment of the disclosure, the cleaning method of the feeding and filling system comprises the step of specially cleaning the flow regulating valve FDV, so that the problem that the flow regulating valve FDV becomes a cleaning blind area is avoided. According to embodiments of the present disclosure, a cleaning gas is introduced into a feed and fill system and a flow path of the cleaning gas passes through a flow regulating valve FDV, the flow regulating valve FDV is opened, the cleaning gas floods into the flow regulating valve FDV and flushes the flow regulating valve FDV, and raw materials remaining and accumulated at a valve seat and/or a valve head of the flow regulating valve can be flushed away; through repeatedly switching on and off the flow regulating valve FDV, clean gas repeatedly flows into the flow regulating valve FDV and repeatedly flushes the flow regulating valve FDV, and residual and accumulated raw materials at a valve seat and/or a valve head of the flow regulating valve can be completely flushed away, so that an excellent cleaning effect on the flow regulating valve FDV is realized.

For example, according to embodiments of the present disclosure, the pretreatment device 100 is used to pre-treat a material to be filled to prepare a material that meets the filling requirements, and may be a single device or a combination of multiple devices. For example, referring to fig. 1, the pretreatment apparatus 100 includes a high temperature treatment (ultra high temperature, UHT) apparatus 110 for performing a high temperature sterilization treatment on a raw material. For example, referring to fig. 1, the pretreatment apparatus 100 further includes a first supply apparatus 131 for supplying a first raw material, a second supply apparatus 132 for supplying a second raw material, and a mixing apparatus 120 for mixing the first raw material and the second raw material, and the mixed raw material obtained by mixing the mixing apparatus 120 is subjected to a high-temperature sterilization treatment by the high-temperature treatment apparatus 110 to become a raw material meeting filling requirements. For example, the first material as described above is a first liquid material, the second material as described above is a second liquid material, and the viscosity of the second liquid material is higher than the viscosity of the first liquid material. For example, the second liquid feedstock contains particulates such as fruit pieces, oat pieces, Q-shot tapioca balls, and the like.

For example, in accordance with an embodiment of the present disclosure, the filling apparatus 200 is used to fill a container with a raw material. For example, the filling apparatus comprises a raw material barrel 210 (see fig. 4) for containing raw material, the raw material barrel 210 comprising an inlet 213 and an outlet 212, raw material entering the raw material barrel 210 via the inlet 213 and exiting the raw material barrel 210 via the outlet 212 into the container. For example, the outlet 212 may be multiple to simultaneously fill the feedstock into multiple containers separately.

For example, according to an embodiment of the present disclosure, the flow regulating valve FDV is a communication portal between the pretreatment device 100 and the filling device 200; the flow regulating valve FDV is opened, the pretreatment device 100 is communicated with the filling device 200, raw materials provided by the pretreatment device 100 can enter the filling device 200, and the flow of the raw materials entering the filling device 200 can be regulated by regulating the opening degree of the flow regulating valve FDV; the flow regulating valve FDV is closed and the pretreatment device 100 and the filling device 200 are not in communication, and the raw material supplied from the pretreatment device 100 cannot enter the filling device 200. For example. The flow regulating valve FDV is a single seat valve.

For example, according to an embodiment of the present disclosure, "the flow regulating valve FDV is located in the flow path of the cleaning gas" means that the cleaning gas flows through the location where the flow regulating valve FDV is located and is in direct contact with at least part of the flow regulating valve FDV; thus, cleaning gas directly flows into the flow regulator valve FDV once it opens. For example, the flow regulating valve FDV includes a valve seat having a valve port and a movable valve head, and the opening and closing direction of the flow regulating valve FDV is the movement direction of the movable valve head; the valve head moves along the positive direction of the opening and closing direction, the valve head is far away from the valve seat, the valve port of the valve seat is opened, and the flow regulating valve FDV is opened; the valve head moves along the negative direction of the opening and closing direction, the valve head is inserted into the valve seat, the valve port of the valve seat is closed, and the flow regulating valve FDV is closed. For example, the purge gas flows through the flow regulating valve in such a manner as to intersect the opening and closing direction of the flow regulating valve FDV; further, for example, the purge gas passes through the flow regulating valve in a manner perpendicular to the opening and closing direction of the flow regulating valve FDV. For example, the purge gas flows through the flow rate adjustment valve FDV in parallel with the opening and closing direction of the flow rate adjustment valve FDV. Referring specifically to fig. 1, as an example, a flow path of the purge gas is indicated by FD1, and the purge gas passes through the flow regulating valve FDV in a manner perpendicular to the opening and closing direction of the flow regulating valve FDV.

For example, in accordance with embodiments of the present disclosure, the cleaning gas may be any gas that meets food safety; the embodiments of the present disclosure do not limit the type of cleaning gas.

For example, repeatedly switching the flow rate regulating valve FDV means that the flow rate regulating valve FDV is switched two or more times, and the specific number of times the flow rate regulating valve FDV is switched may be selected according to the actual situation, which is not limited by the present disclosure. For example, the flow regulating valve FDV is opened and closed 10 times. For example, for each switching of the flow regulating valve FDV, the duration of opening is a few seconds, and the duration of closing is a tens of seconds; for example, the duration of opening is 5 seconds, and the duration of closing is 10 seconds.

For example, with continued reference to fig. 1, in accordance with an embodiment of the present disclosure, the cleaning gas is high temperature water vapor having a temperature greater than 100 degrees celsius; the cleaning method according to the embodiment of the disclosure comprises the following steps: introducing high-temperature water vapor into the feeding and filling system to form a vapor barrier SB0, the vapor barrier SB0 being located in a space behind the flow regulating valve FDV and passing through the flow regulating valve FDV in such a manner as to intersect the opening and closing direction of the flow regulating valve FDV, the vapor barrier SB0 isolating the pretreatment apparatus 100 and the filling apparatus 200 from each other; and repeatedly opening and closing the flow regulating valve FDV, and cleaning the flow regulating valve FDV by utilizing the high-temperature steam.

On the one hand, the high-temperature steam is convenient to obtain materials, economical and applicable, has the sterilization function, is environment-friendly and is convenient to discharge, so that the embodiment of the disclosure preferably adopts the high-temperature steam as the cleaning gas.

On the other hand, it is desirable that the pretreatment device 100 and the filling device 200 be effectively isolated from each other so as not to adversely affect each other when the filling operation is not performed (particularly, the bacteria-carrying state of the pretreatment device 100 and the bacteria-carrying state of the filling device 200 are different from each other); to meet this demand, it is not sufficient to close the flow regulating valve FDV alone, because even if the valve head and the valve seat are closed occasionally, a minute gap may occur due to factors such as processing errors and/or vibration perturbations; furthermore, the need to repeatedly switch the flow regulating valve FDV in accordance with embodiments of the present disclosure makes it more difficult to meet the above-described need to isolate the pretreatment apparatus 100 from the filling apparatus 200. For example, when no filling operation is performed, the feeding and filling system often has a state in which the pretreatment apparatus 100 is in a sterile state and the filling apparatus 200 is in a sterile state; in such a state, closing the flow rate regulating valve FDV alone does not completely ensure that bacteria of the filling apparatus 200 do not enter the pretreatment apparatus 100, and thus a measure is required to effectively isolate the pretreatment apparatus 100 from the filling apparatus 200 to ensure the sterility of the pretreatment apparatus 100. According to an embodiment of the present disclosure, when the filling operation is not performed, high-temperature water vapor is introduced into the feeding and filling system to form a vapor barrier SB0, and the vapor barrier SB0 is located in a space behind the flow rate adjustment valve FDV and passes through the flow rate adjustment valve FDV in a manner intersecting with the switching direction of the flow rate adjustment valve FDV, so that the vapor barrier SB0 effectively isolates the pre-treatment apparatus 100 and the filling apparatus 200 from each other without adversely affecting each other. In the case where the pretreatment apparatus 100 is in a sterile state and the filling apparatus 200 is in a bacteria-carrying state, bacteria in the filling apparatus 200 cannot pass through the vapor barrier SB0 due to the presence of the vapor barrier SB0, and thus cannot enter the pretreatment apparatus 100; due to the presence of the vapor barrier SB0, even if a minute gap occurs between the valve head and the valve seat occasionally in the state where the flow regulating valve FDV is closed or the flow regulating valve FDV is repeatedly opened and closed for the purpose of cleaning the flow regulating valve FDV, it will be high-temperature vapor that enters the pretreatment apparatus 100 without affecting the sterility of the pretreatment apparatus 100. For example, once the filling operation is completed, embodiments of the present disclosure may be vented with high temperature steam to form a steam barrier as described above to isolate the pretreatment device 100 from the filling device 200. For example, the post-valve space of the flow regulating valve FDV refers to a space on a side of the valve head of the flow regulating valve FDV that is remote from the valve port.

On the other hand, according to the embodiment of the present disclosure, the vapor barrier SB0 is formed skillfully with high-temperature vapor used as the cleaning gas, so that the pretreatment device 100 and the filling device 200 can be isolated even during cleaning of the flow rate adjustment valve FDV; from another perspective, according to the embodiment of the present disclosure, the high-temperature water vapor forming the vapor barrier SB0 is smartly utilized as the cleaning gas for cleaning the flow regulating valve FDV, thereby omitting the provision of a dedicated cleaning gas for cleaning the flow regulating valve FDV.

For example, according to embodiments of the present disclosure, the temperature of the high-temperature water vapor is greater than or equal to 130 degrees celsius; in this case, it is possible to perform a more efficient sterilization process on the flow regulating valve FDV while cleaning the flow regulating valve FDV, and the vapor barrier SB0 has a higher temperature, which will more effectively isolate the pretreatment device 100 from the filling device 200. For example, according to embodiments of the present disclosure, the temperature of the high-temperature water vapor is 140 degrees celsius or greater.

For example, with continued reference to fig. 1, in accordance with an embodiment of the present disclosure, the feed and fill system includes a first line 300, the first line 300 being connected to the pretreatment device 100 at a first position P1 of the first line 300, a flow regulator valve FDV being provided at the first position P1, the pretreatment device 100 being in communication with the first line 300 upon opening of the flow regulator valve FDV (in other words, the pretreatment device 100 being not in communication with the first line 300 upon closing of the flow regulator valve FDV); forming the vapor barrier SB0 as described above includes: high-temperature water vapor is introduced into the first line 300 to form a vapor barrier SB0 in the first line 300. In this way, due to the restriction of the gas by the first line 300, the vapor barrier SB0 as described above may be more conveniently formed such that the vapor barrier SB0 is located in the space behind the valve of the flow regulating valve FDV to isolate the pretreatment device 100 from the filling device 200. In fig. 1 and the following fig. 2, the vapor barrier SB0 is drawn wider than the first line 300 for convenience of illustration; in practice, however, vapor barrier SB0 is filled within first line 300 and is constrained by first line 300.

For example, with continued reference to fig. 1, in accordance with an embodiment of the present disclosure, the switching direction of the flow regulating valve FDV is a first direction D1; the first pipe 300 extends in a second direction D2 such that the vapor barrier SB0 is disposed in the second direction D2, the second direction D2 being substantially perpendicular to the first direction D1; and the second direction D2 is a horizontal direction and the first direction D1 is a vertical direction with respect to the ground. The switching direction of the flow regulating valve FDV is the first direction D1, and the vapor barrier SB0 is disposed along the second direction D2, so that the vapor barrier SB0 passes through the flow regulating valve FDV in a manner perpendicular to the switching direction of the flow regulating valve FDV, and once the flow regulating valve FDV is opened, the high-temperature vapor forming the vapor barrier SB0 rapidly floods into the flow regulating valve FDV and flushes the flow regulating valve FDV. The second direction D2 is a horizontal direction and the first direction D1 is a vertical direction with respect to the ground, so that uniformity of the vapor barrier SB0 is better, isolating the pretreatment apparatus 100 and the filling apparatus 200 more stably. The vapor has the inherent property of rising upwards; if the second direction D2 is vertical, the upper gas amount may be larger than the lower gas amount, so that uniformity of the vapor barrier SB0 is deteriorated.

For example, with continued reference to fig. 1, in accordance with an embodiment of the present disclosure, a feed and fill system includes: a gas supply device 400 for supplying high-temperature vapor; the first line 300 has a first end 300E1 and a second end 300E2, the first end 300E1 of the first line 300 being connected to the filling device 200, the second end 300E2 of the first line 300 being connected to the gas supply device 400, the first position P1 of the first line 300 being located between the first end 300E1 and the second end 300E2 of the first line 300; the feeding and filling system further comprises a first valve V1 and a second valve V2, the first valve V1 being arranged at the first end 300E1 of the first line 300, the first line 300 being in communication with the filling device 200 when the first valve V1 is open (in other words, the first line 300 is not in communication with the filling device 200 when the first valve V1 is closed), the second valve V2 being arranged at the second end 300E2 of the first line 300, the first line 300 being in communication with the gas supply device 400 when the second valve V2 is open (in other words, the first line 300 is not in communication with the gas supply device 400 when the second valve V2 is closed); forming vapor barrier SB0 in first line 300 includes: the flow regulating valve FDV and the first valve V1 are closed and the second valve V2 is opened to form the vapor barrier SB0 in the first line 300. Thus, the vapor barrier SB0 is formed as described above. For example, the first valve V1 is a normally open valve, so whether the pre-treatment device 100 communicates with the filling device 200 is controlled only by the flow regulating valve FDV; the first valve V1 is closed only when it is necessary to form the vapor barrier SB0.

For example, referring to fig. 1, in accordance with an embodiment of the present disclosure, the feeding and filling system further comprises: a third valve V3 connected to the first line 300, the first line 300 being in communication with the outside when the third valve V3 is opened (in other words, the first line 300 is not in communication with the outside when the third valve V3 is closed); forming vapor barrier SB0 in first line 300 includes: the flow regulating valve FDV, the first valve V1, and the third valve V3 are closed and the second valve V2 is opened to form the vapor barrier SB0 in the first line 300, after which the third valve V3 is opened and closed at least once at intervals of a certain period of time. High-temperature water vapor is introduced into the first line 300 to form a vapor barrier SB0; in this case, if the high temperature vapor stagnates in the first line 300 without flowing, the high temperature vapor may be cooled down due to heat exchange and condensed water is generated in the first line 300, and at this time, the effect of the vapor barrier SB0 to isolate the pre-treatment apparatus 100 and the filling apparatus 200 may be affected due to the cooling down of the high temperature vapor. Therefore, according to the embodiment of the present disclosure, the third valve V3 is opened and closed at least once at intervals of a certain period of time, and since the third valve V3 is opened, the first line 300 communicates with the outside, the flow of high-temperature water vapor is promoted, so that the vapor barrier SB0 formed by the high-temperature water vapor can maintain a desired high temperature (for example, 130 degrees celsius or more). For example, the number of times the third valve V3 is opened and the duration of time the third valve is opened each time it is opened may be flexibly selected according to practical circumstances as long as the flow of the high-temperature steam can be promoted so that the steam barrier SB0 can maintain a desired high temperature.

For example, with continued reference to fig. 1, in accordance with an embodiment of the present disclosure, the feeding and filling system further includes a temperature sensor 500 for measuring the temperature of the high-temperature vapor in the first line 300; the specific period of time as described above is determined according to the temperature of the high-temperature steam measured by the temperature sensor 500, wherein the third valve V3 is opened and closed at least once when the temperature of the high-temperature steam measured by the temperature sensor 500 is lower than a preset value. For example, the preset value is 100 degrees celsius; further for example, the preset value is 130 degrees celsius; further for example, the preset value is 140 degrees celsius. It should be noted that fig. 1 is only a schematic layout of the feeding and filling system, in which the length of the first pipeline 300 is very short, and the distance between the flow control valve FDV, the first valve V1, the second valve V2 and the third valve V3 is very small, so that it is inconvenient to install the temperature sensor 500; thus, according to the embodiment of the present disclosure, the temperature sensor 500 is provided on the second line 600 between the air supply device 400 and the second valve V2, and the temperature sensor 500 is located very close to the first line 300 in the actual feeding and filling system, so that the measured temperature thereof can be used as the temperature of the high water vapor in the first line 300.

For example, with continued reference to fig. 1, in accordance with an embodiment of the present disclosure, a third valve V3 is connected to the first line 300 at a second position P2 of the first line 300; in the second direction D2, the second position P2 is located between the first end 300E1 of the first pipeline 300 and the first position P1. In this way, the second position P2 is located at the end of the vapor barrier SB0 in the second direction D2, which is advantageous in that the vapor barrier SB0 is maintained at a high and uniform temperature by switching the third valve V3.

FIG. 2 is a schematic diagram of a layout second of a feed and fill system in a first line with clean gas in accordance with an embodiment of the present disclosure; in fig. 2, the path of the high-temperature water vapor used as the cleaning gas is indicated by FD 1. FIG. 3 is a schematic layout of a feed and fill system in a fill operational state according to an embodiment of the present disclosure; in fig. 3, the path of travel of the raw material from the pretreatment device 100 into the filling device is indicated by FD 2. Referring to fig. 2 and 3, the feeding and filling system further includes a fourth valve V4 and a fifth valve V5, the fifth valve V5 being connected between the air supply 400 and the fourth valve V4, the fourth valve V4 being connected between the first line 300 and the third valve V3, and the fourth valve V4 being further connected between the third valve V3 and the fifth valve V5, according to an embodiment of the present disclosure; the third valve V3, the fourth valve V4, the fifth valve V5 are set as: the fourth valve V4 is opened and the fifth valve V5 is closed, and the high-temperature vapor in the first line 300 passes through the fourth valve V4 to the third valve V3, see fig. 2; the third valve V3, the fourth valve V4 and the fifth valve V5 are further provided as: the fifth valve V5 is opened and the fourth valve V4 is closed, and the high-temperature water vapor supplied from the gas supply apparatus 400 reaches the third valve V3 through the fifth valve V5 to form the first auxiliary vapor barrier SB1, the first auxiliary vapor barrier SB0 being located in a space behind the fourth valve V4 and passing through the fourth valve V4 in a manner intersecting (e.g., perpendicular to) the opening and closing direction of the fourth valve V4, see fig. 3; and forming vapor barrier SB0 in first line 300 further comprises: the fourth valve V4 is opened and the fifth valve V5 is closed, see fig. 2. As described above, the third valve V3 is provided to facilitate the flow of high-temperature water vapor in order for the first line 300 to communicate with the outside, so that the vapor barrier SB0 formed by the high-temperature water vapor maintains a desired high temperature; in fig. 1, the third valve V3 is directly connected to the first line 300; in the filling operation state, the flow regulating valve FDV is opened, the first valve V1 is opened, the second valve V2 is closed, and the third valve V3 is closed, but although the third valve V3 is closed, a minute gap may occasionally occur between the valve head and the valve seat of the third valve V3 due to factors such as a processing error and/or a vibration perturbation, so that the first line 300 is undesirably communicated with the outside during filling, and the raw material in the first line 300 is contaminated. According to an embodiment of the present disclosure, the fourth valve V4 and the fifth valve V5 are provided such that the third valve V3 is not directly connected with the first line 300; in the state shown in fig. 2 in which the high temperature vapor is introduced into the first line 300, the fourth valve V4 is opened, the fifth valve V5 is closed, and the high temperature vapor in the first line 300 reaches the third valve V3 through the fourth valve V4, at this time, the vapor barrier SB0 can be maintained at a desired high temperature by the third valve V3 being opened and closed at least once at a certain interval; in the filling operation state shown in fig. 3, the fifth valve V5 is opened and the fourth valve V4 is closed, high-temperature water vapor supplied from the gas supply apparatus 400 reaches the third valve V3 through the fifth valve V5 to form the first auxiliary vapor barrier SB1, and the first auxiliary vapor barrier SB1 is located in the space behind the fourth valve V4 and passes through the fourth valve V4 in a manner crossing the opening and closing direction of the fourth valve V4, so that the first pipe 300 can be isolated from the outside through the first auxiliary vapor barrier SB1 in the filling operation state, avoiding the raw materials in the first pipe 300 from being contaminated; in order to maintain the first auxiliary vapor barrier SB1 at a desired high temperature (e.g., 130 degrees celsius or more), the third valve V3 may be opened and closed at least once according to the actual condition interval characteristic period. For example, the opening and closing direction of the fourth valve V4 is the movement direction of the movable valve head of the fourth valve V4. For example, the valve back space of the fourth valve V4 is the side of the valve head of the fourth valve V4 remote from the valve port. For example, the fifth valve V5, the fourth valve V4, and the third valve V3 are provided on the same line.

For example, with continued reference to fig. 2 and 3, in accordance with an embodiment of the present disclosure, the feeding and filling system further includes a sixth valve V6 and a seventh valve V7, the sixth valve V6 being connected between the air supply 400 and the second valve V2; the second valve V2, the sixth valve V6 and the seventh valve V7 are set as follows: the second valve V2 is opened, the sixth valve V6 is opened, the seventh valve V7 is closed, and the high-temperature water vapor supplied from the gas supply apparatus 400 reaches the second valve V2 through the sixth valve V6 and enters the first line 300 through the second valve V2, see fig. 2; the second valve V2, the sixth valve V6 and the seventh valve V7 are further provided as: the sixth valve V6 is opened, the second valve V2 is closed, the high-temperature water vapor supplied from the gas supply apparatus 400 forms a second auxiliary vapor barrier SB2, the second auxiliary vapor barrier SB2 is located in a space behind the valve of the second valve V2 and passes through the second valve V2 in a manner intersecting the opening and closing direction of the second valve V2, and the seventh valve V7 is used to control the second auxiliary vapor barrier SB2 to communicate with the outside, see fig. 3; and forming vapor barrier SB0 in first line 300 further comprises: the seventh valve V7 is closed, see fig. 2. In the filling working state, the flow regulating valve FDV is opened, the first valve V1 is opened, the second valve V2 is closed, and the third valve V3 is closed; although the second valve V2 has been closed, a minute gap may occasionally occur between the valve head and the valve seat of the second valve V2 due to processing errors and/or vibration perturbations, etc., so that the first line 300 undesirably communicates with the outside at the time of filling, and the raw material in the first line 300 is contaminated. According to an embodiment of the present disclosure, a sixth valve V6 and a seventh valve V7 are provided; in the state of introducing high temperature vapor into the first pipeline 300 shown in fig. 2, the second valve V2 is opened, the sixth valve V6 is opened, the seventh valve V7 is closed, and the high temperature vapor supplied from the gas supply apparatus 400 reaches the second valve V2 through the sixth valve V6 and enters the first pipeline 300 through the second valve V2, forming a vapor barrier SB0; in the filling operation state shown in fig. 3, the sixth valve V6 is opened, the second valve V2 is closed, the high-temperature vapor supplied from the gas supply apparatus 400 forms the second auxiliary vapor barrier SB2, and the second auxiliary vapor barrier SB2 is located in the space behind the valve of the second valve V2 and passes through the second valve V2 in a manner intersecting the opening and closing direction of the second valve V2, so that the first pipeline 300 can be isolated from the outside through the second auxiliary vapor barrier SB2 in the filling operation state, and the raw material in the first pipeline 300 is prevented from being contaminated; the seventh valve V7 is for controlling the second auxiliary vapor barrier SB2 to communicate with the outside, and in order to maintain the second auxiliary vapor barrier SB2 at a desired high temperature (for example, 130 degrees celsius or more), the seventh valve V7 may be opened and closed at least once according to the actual condition interval characteristic period. For example, the opening and closing direction of the second valve V2 is the movement direction of the movable valve head of the second valve V2. For example, the valve back space of the second valve V2 is a space of a side of the valve head of the second valve V2 remote from the valve port. For example, the second valve V2, the sixth valve V6, and the seventh valve V7 are provided on the same line.

For example, according to an embodiment of the present disclosure, after the vapor barrier SB0 is formed, the air pressure in the first line 300 is 100mbar (millibar) or less. At this pressure range, it is ensured that repeated switching of the flow regulating valve FDV does not present a safety risk.

For example, according to embodiments of the present disclosure, the high temperature vapor is stopped from being supplied to the feed and fill system after the high temperature vapor is supplied to the feed and fill system for a first period of time, and the flow regulating valve FDV is repeatedly opened and closed before or after the high temperature vapor is stopped from being supplied to the feed and fill system. If the high-temperature steam is continuously introduced, the raw material remaining at the flow rate adjustment valve FDV may be burned to adhere to the flow rate adjustment valve FDV and be difficult to remove; thus, according to embodiments of the present disclosure, the supply of high temperature water vapor to the feed and fill system is stopped after the supply of high temperature water vapor to the feed and fill system is continued for a first period of time, and the problems described above may be avoided. The flow regulating valve FDV is repeatedly opened and closed before or after the feeding and filling system stops introducing the high-temperature steam, and the flow regulating valve FDV can be selected according to actual conditions; after the supply of the high-temperature steam to the supply and filling system is stopped, the high-temperature steam still fills the first line 300, and thus the flow rate adjustment valve FDV can be cleaned by repeatedly opening and closing the flow rate adjustment valve FDV. For example, after the cleaning process of the flow regulating valve FDV is completed, the high-temperature water vapor is again introduced into the feeding and filling system to form the vapor barrier SB0, so that the vapor barrier SB0 effectively isolates the pretreatment apparatus 100 and the filling apparatus 200 from each other.

For example, according to embodiments of the present disclosure, the first period of time is 15 minutes or less. In this way, it is ensured that the raw material remaining in the flow control valve FDV is not burned and adheres to the flow control valve FDV.

For example, according to an embodiment of the present disclosure, the pretreatment device 100 is used for pretreatment of raw materials to be filled, and the filling device 200 is used for filling the raw materials into containers; the method of cleaning the feed and fill system further includes stopping the feed and fill system prior to introducing the gas, evacuating the raw materials located in the pretreatment device 100, between the pretreatment device 100 and the fill device 200, and in the fill device 200. In this way, the difficulty of cleaning the entire filling and feeding system can be reduced.

For example, the cleaning method according to an embodiment of the present disclosure further includes: cleaning the pretreatment device 100 with a liquid cleaning stream formed of a liquid cleaning medium; and the cleaning flow rate regulating valve FDV includes: the flow regulating valve FDV is repeatedly opened and closed to clean the flow regulating valve FDV with the liquid cleaning flow. In this case, the flow regulating valve FDV may be cleaned with the cleaning flow of the cleaning pretreatment device 100.

Fig. 4 is a schematic view of a raw material tank containing raw materials for a filling apparatus in a feeding and filling system according to an embodiment of the present disclosure. For example, according to an embodiment of the present disclosure, a filling apparatus 200 is used to fill a container with a raw material, the filling apparatus 200 including a raw material barrel 210 containing the raw material, as shown in fig. 4; the cleaning method of the feeding and filling system according to the embodiment of the present disclosure further includes: at least one gaseous medium is added to the liquid cleaning medium to form a gas-liquid mixed cleaning stream, which is used to clean the raw material barrel 210. By adding at least one gaseous medium to the liquid cleaning medium, turbulence may be created, forcefully flushing the raw material barrel 210, enhancing the cleaning effect of the raw material barrel 210.

For example, referring to fig. 4, the raw tub 210 has a preset level line 211; the cleaning raw material barrel 210 using the gas-liquid mixed cleaning flow includes: the liquid cleaning medium is introduced into the raw material tank such that the liquid level of the liquid cleaning medium reaches the liquid level line 210 or is close to the liquid level line 210, after which the gaseous medium is added to the liquid cleaning medium. Generally, a circle of raw material residue may accumulate at the location of the level line 210 or near the level line 210; according to the embodiment of the present disclosure, the raw material residues as described above can be effectively cleaned and removed by adding the gaseous medium to the liquid cleaning medium after the liquid level of the liquid cleaning medium reaches the liquid level line 210 or approaches the liquid level line 210. For example, a liquid level of the liquid cleaning medium approaching the liquid level line 210 refers to: the distance between the level of the liquid cleaning medium and the level line 210 is not more than 10%, even not more than 5% and even not more than 3% of the height of the raw material tank 210.

For example, according to an embodiment of the present disclosure, the method of cleaning a feed and fill system further comprises: the cleaning pretreatment device 100 and the cleaning filling device 200, wherein the cleaning flow control valve FDV is performed simultaneously with the cleaning pretreatment device 100 and the cleaning filling device 200. In this case, not only is the problem that the flow regulating valve FDV becomes a cleaning dead zone avoided, but the cleaning efficiency of the entire system is higher, but the synergy requirement of each system in the entire system is increased.

For example, in the cleaning method of the feeding and filling system according to the embodiment of the present disclosure, the pretreatment device 100, and the filling device 200 are cleaned with the same cleaning medium. In this case, the cleaning efficiency is further improved, but the synergy requirement for each device in the entire system is further improved.

According to an embodiment of the present disclosure, there is also provided a feeding and filling system. Fig. 5 is a schematic diagram of a frame of a feed and fill system according to an embodiment of the present disclosure. Referring to fig. 5, a feeding and filling system 700 according to an embodiment of the present disclosure includes: a processor 710; and a memory 720 comprising one or more computer program modules; wherein one or more computer program modules are stored in the memory 720 and configured to be executed by the processor 710, the one or more computer program modules comprising instructions for implementing the control methods of the feeding and filling system as described above. The working principle and technical effects of the feeding and filling system according to the embodiments of the present disclosure may refer to the feeding and filling system according to the embodiments of the present disclosure and the control method thereof as described above, and will not be described herein.

For example, memory 720 is used to store non-transitory computer-readable instructions (e.g., one or more computer program modules). Processor 710 is configured to execute non-transitory computer readable instructions that, when executed by processor 710, may perform one or more of the steps of the control methods of the feeding and filling system described above. The memory 720 and the processor 710 may be interconnected by a bus system and/or other forms of connection mechanisms (not shown).

For example, processor 710 may be a Central Processing Unit (CPU), a Graphics Processing Unit (GPU), or other form of processing unit having data processing capabilities and/or program execution capabilities. For example, the Central Processing Unit (CPU) may be an X86 or ARM architecture, or the like. The processor 710 may be a general purpose processor or a special purpose processor that can control the feed and other components in the filling system 700 to perform the desired functions.

For example, memory 720 may include any combination of one or more computer program products, which may include various forms of computer-readable storage media, such as volatile memory and/or non-volatile memory. Volatile memory can include, for example, random Access Memory (RAM) and/or cache memory (cache) and the like. The non-volatile memory may include, for example, read-only memory (ROM), hard disk, erasable programmable read-only memory (EPROM), portable compact disc read-only memory (CD-ROM), USB memory, flash memory, and the like. One or more computer program modules may be stored on the computer readable storage medium and the processor 710 may execute the one or more computer program modules to perform the various functions of the feeding and filling system 700. Various applications and various data, as well as various data used and/or generated by the applications, etc., may also be stored in the computer readable storage medium.

Fig. 6 is a schematic diagram of a frame second of a feed and fill system according to an embodiment of the present disclosure. Referring to fig. 6, a feed and fill system 800 is, for example, suitable for use in practicing the control method of the feed and fill system provided by embodiments of the present disclosure. The feeding and filling system 800 may be a terminal device or the like. It should be noted that the feeding and filling system 800 shown in fig. 7 is only one example and does not impose any limitation on the functionality and scope of use of the disclosed embodiments.

As shown in fig. 6, the feeding and filling system 800 may include a processing device (e.g., central processing unit, graphics processor, etc.) 810 that may perform various suitable actions and processes according to programs stored in a Read Only Memory (ROM) 820 or loaded from a storage device 880 into a Random Access Memory (RAM) 830. In RAM 830, various programs and data required for the operation of the feeding and filling system 800 are also stored. The processing device 810, the ROM 820, and the RAM 830 are connected to each other by a bus 840. An input/output (I/O) interface 850 is also connected to bus 840.

In general, the following devices may be connected to the I/O interface 850: input devices 860 including, for example, a touch screen, touchpad, keyboard, mouse, camera, microphone, accelerometer, gyroscope, and the like; an output device 870 including, for example, a Liquid Crystal Display (LCD), a speaker, a vibrator, and the like; storage 880 including, for example, magnetic tape, hard disk, etc.; and communication device 890. Communication device 890 may allow feed and fill system 800 to communicate with other devices wirelessly or by wire to exchange data. While fig. 6 illustrates the feed and fill system 800 with various devices, it should be understood that not all of the illustrated devices are required to be implemented or provided, and that the feed and fill system 800 may alternatively be implemented or provided with more or fewer devices.

For example, according to embodiments of the present disclosure, the control methods of the above-described feeding and filling systems may be implemented as computer software programs. For example, embodiments of the present disclosure include a computer program product comprising a computer program embodied on a non-transitory computer readable medium, the computer program comprising program code for performing the control method of the above-described feeding and filling system. In such an embodiment, the computer program may be downloaded and installed from a network via communications device 890, or from storage 880, or from ROM 820. The functions defined in the control method of filling provided by the embodiments of the present disclosure may be implemented when the computer program is executed by the processing device 810.

According to an embodiment of the present disclosure, there is also provided a computer-readable storage medium. Fig. 7 is a schematic diagram of a computer-readable storage medium according to an embodiment of the disclosure. Referring to fig. 7, a computer readable storage medium 900 is provided in an embodiment of the disclosure for storing non-transitory computer readable instructions 910, which when executed by a computer, implement the method of controlling a feeding and filling system described above. The working principle and technical effect of the computer readable storage medium 900 can refer to the feeding and filling system and the control method thereof as described above, and will not be described herein. For example, the storage medium 900 may be employed in the above-described feeding and filling system 700. For example, the storage medium 900 may be the memory 720 in the feeding and filling system 700 shown in fig. 5.

For example, storage medium 900 may include a memory card for a smart phone, a memory component for a tablet computer, a hard disk for a personal computer, random Access Memory (RAM), read Only Memory (ROM), erasable Programmable Read Only Memory (EPROM), portable compact disc read only memory (CD-ROM), flash memory, or any combination of the foregoing, as well as other suitable storage media.

The foregoing is merely exemplary embodiments of the present disclosure and is not intended to limit the scope of the disclosure, which is defined by the appended claims.

Claims (22)

1. A method of cleaning a feed and fill system, the feed and fill system comprising: a pretreatment device and a filling device, and a flow regulating valve connected between the pretreatment device and the filling device, wherein,

the cleaning method of the feeding and filling system comprises the following steps: cleaning the flow regulating valve; and is also provided with

Cleaning the flow regulating valve includes: introducing a cleaning gas into the feeding and filling system, wherein the flow regulating valve is positioned in the flow path of the cleaning gas; and repeatedly opening and closing the flow regulating valve, and cleaning the flow regulating valve by using the cleaning gas.

2. The cleaning method according to claim 1, wherein,

the cleaning gas is high-temperature steam, and the temperature of the high-temperature steam is higher than 100 ℃; and is also provided with

The cleaning method comprises the following steps: introducing high-temperature water vapor into the feeding and filling system to form a vapor barrier which is located in a space behind the flow regulating valve and passes through the flow regulating valve in a manner intersecting a switching direction of the flow regulating valve, the vapor barrier isolating the pretreatment device and the filling device from each other; and repeatedly switching on and off the flow regulating valve, and cleaning the flow regulating valve by utilizing the high-temperature steam.

3. The cleaning method according to claim 2, wherein,

the temperature of the high-temperature steam is more than or equal to 130 ℃.

4. The cleaning method according to claim 2, wherein,

the feeding and filling system comprises a first pipeline, wherein the first pipeline is connected with the pretreatment equipment at a first position of the first pipeline, the flow regulating valve is arranged at the first position, and the pretreatment equipment is communicated with the first pipeline when the flow regulating valve is opened; and is also provided with

The forming a vapor barrier includes: the high temperature water vapor is vented to the first line to form the vapor barrier in the first line.

5. The cleaning method according to claim 4, wherein,

the opening and closing direction of the flow regulating valve is a first direction;

the first line extends in a second direction such that the vapor barrier is disposed in the second direction, the second direction being substantially perpendicular to the first direction; and is also provided with

The second direction is a horizontal direction and the first direction is a vertical direction relative to the ground.

6. The cleaning method according to claim 4, wherein,

the feeding and filling system comprises: a gas supply device providing the high temperature water vapor;

the first pipeline is provided with a first end and a second end, the first end of the first pipeline is connected with the filling equipment, the second end of the first pipeline is connected with the air supply equipment, and the first position of the first pipeline is located between the first end and the second end of the first pipeline;

the feeding and filling system further comprises a first valve and a second valve, wherein the first valve is arranged at the first end of the first pipeline, the first pipeline is communicated with the filling equipment when the first valve is opened, the second valve is arranged at the second end of the first pipeline, and the first pipeline is communicated with the air supply equipment when the second valve is opened; and is also provided with

The forming the vapor barrier in the first line includes: closing the flow regulating valve and the first valve and opening the second valve to form the vapor barrier in the first line.

7. The cleaning method according to claim 6, wherein,

the feeding and filling system further comprises: a third valve connected to the first pipeline, the first pipeline being communicated with the outside when the third valve is opened; and is also provided with

The forming the vapor barrier in the first line includes: closing the flow regulating valve, the first valve and the third valve and opening the second valve to form the vapor barrier in the first line, after which the third valve is opened and closed at least once at intervals of a certain period of time.

8. The cleaning method according to claim 7, wherein,

the feeding and filling system further comprises a temperature sensor for measuring the temperature of the high-temperature water vapor in the first line; and is also provided with

The specific time period is determined according to the temperature of the high-temperature steam measured by the temperature sensor, wherein the third valve is opened and closed at least once when the temperature of the high-temperature steam measured by the temperature sensor is lower than a preset value.

9. The cleaning method according to claim 7, wherein,

the third valve is connected to the first line at a second location of the first line; and is also provided with

In the second direction, the second location is located between the first end of the first pipeline and the first location.

10. The cleaning method according to claim 7, wherein,

the feeding and filling system further comprises a fourth valve and a fifth valve, the fifth valve being connected between the air supply device and the fourth valve, the fourth valve being connected between the first line and the third valve, and the fourth valve being further connected between the third valve and the fifth valve;

the third valve, the fourth valve and the fifth valve are set as follows: the fourth valve is opened, the fifth valve is closed, and the high-temperature steam in the first pipeline passes through the fourth valve to reach the third valve;

the third valve, the fourth valve and the fifth valve are further configured to: the fifth valve is opened and the fourth valve is closed, high-temperature steam provided by the air supply device passes through the fifth valve to the third valve to form a first auxiliary steam barrier, and the first auxiliary steam barrier is positioned in a space behind the fourth valve and passes through the fourth valve in a manner of intersecting with the opening and closing direction of the fourth valve; and is also provided with

Forming the vapor barrier in the first line further comprises: the fourth valve is opened and the fifth valve is closed.

11. The cleaning method according to claim 8, wherein,

the feeding and filling system further comprises a sixth valve and a seventh valve, the sixth valve being connected between the air supply device and the second valve;

the second valve, the sixth valve and the seventh valve are arranged as follows: the second valve is opened, the sixth valve is opened, the seventh valve is closed, and high-temperature steam provided by the air supply device reaches the second valve through the sixth valve and enters the first pipeline through the second valve;

the second valve, the sixth valve and the seventh valve are further configured to: the sixth valve is opened, the second valve is closed, the high-temperature steam provided by the air supply device forms a second auxiliary steam barrier, the second auxiliary steam barrier is positioned in a space behind the second valve and passes through the second valve in a mode of intersecting with the opening and closing direction of the second valve, and the seventh valve is used for controlling the second auxiliary steam barrier to be communicated with the outside; and is also provided with

Forming the vapor barrier in the first line further comprises: closing the seventh valve.

12. The cleaning method according to claim 2, wherein,

after forming the vapor barrier, the gas pressure in the first line is 100mbar or less.

13. The cleaning method of claim 2, further comprising:

stopping the high temperature steam from being fed to the feeding and filling system after the high temperature steam is fed to the feeding and filling system for a first period of time, wherein,

the repeatedly opening and closing of the flow regulating valve is performed before or after stopping the supply of the high temperature vapor to the supply and filling system.

14. The cleaning method of claim 12, wherein the first period of time is 15 minutes or less.

15. The cleaning method according to any one of claims 1 to 14, wherein,

the pretreatment equipment is used for pretreating raw materials to be filled, and the filling equipment is used for filling the raw materials into a container;

the method further includes stopping the feed and fill system prior to introducing the purge gas, evacuating the feedstock located in the pretreatment device, between the pretreatment device and the fill device, and in the fill device.

16. The cleaning method of any one of claims 1-14, further comprising:

cleaning the pretreatment device with a liquid cleaning stream of a liquid cleaning medium;

the cleaning the flow regulating valve includes: the flow regulating valve is repeatedly opened and closed to clean the flow regulating valve with the liquid cleaning flow.

17. The cleaning method according to any one of claims 1 to 14, wherein,

the filling equipment is used for filling raw materials into a container, and comprises a raw material barrel for containing the raw materials;

the method further comprises the steps of: at least one gaseous medium is added to the liquid cleaning medium to form a gas-liquid mixed cleaning stream, and the raw material barrel is cleaned with the gas-liquid mixed cleaning stream.

18. The cleaning method according to claim 17, wherein,

the raw material barrel is provided with a preset liquid level line;

cleaning the raw material barrel with the gas-liquid mixed cleaning flow comprises:

the liquid cleaning medium is introduced into the raw material tank so that the liquid level of the liquid cleaning medium reaches or approaches the liquid level line, after which the gaseous medium is added to the liquid cleaning medium.

19. The cleaning method of any one of claims 1-14, further comprising: cleaning the pretreatment device and cleaning the filling device, wherein,

Cleaning the flow regulating valve is performed simultaneously with cleaning the pre-treatment device and cleaning the filling device.

20. The cleaning method of claim 19, wherein the pretreatment apparatus, and the filling apparatus are cleaned with the same cleaning medium.

21. A feeding and filling system comprising:

a processor;

a memory including one or more computer program modules;

wherein the one or more computer program modules are stored in the memory and configured to be executed by the processor, the one or more computer program modules comprising instructions for implementing the method of any of claims 1-20.

22. A computer readable storage medium storing non-transitory computer readable instructions which, when executed by a computer, implement the method of any one of claims 1-20.

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