CN116224610A

CN116224610A - Electro-optic crystal optical axis alignment system and method

Info

Publication number: CN116224610A
Application number: CN202310512315.3A
Authority: CN
Inventors: 张朋; 陈宜稳; 李琼; 王妍洁; 吴正容; 张银辉; 王洪刚; 刘建; 蔡文炳; 徐小琴; 赵学军
Original assignee: 63921 Troops of PLA
Current assignee: 63921 Troops of PLA
Priority date: 2023-05-09
Filing date: 2023-05-09
Publication date: 2023-06-06

Abstract

The application provides an electro-optic crystal optical axis alignment system and method, and belongs to the technical field of optical alignment. The system comprises: the optical processing device comprises a light splitting device, a first reflecting device, a first lens, a second reflecting device and an optical processing device. The beam splitting device is used for splitting the original light beam from the light beam generating device into a first light beam and a second light beam; the first reflecting device is used for injecting the reflected light beam of the first light beam into the beam splitting device; the second reflecting device is used for injecting the reflected light beam of the refracted light of the second light beam into the first lens; the beam splitting device is also used for reflecting the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing equipment; the optical processing device is used for determining whether the optical axes of the electro-optical crystals to be aligned are aligned or not based on the interference image, recording the target pose of the electro-optical crystals to be aligned when the optical axes of the electro-optical crystals to be aligned are aligned, and controlling the electro-optical crystals to be aligned to be in the target pose. The alignment precision is ensured, and meanwhile, the applicability is improved and the cost is reduced.

Description

Electro-optic crystal optical axis alignment system and method

Technical Field

The present disclosure relates to the field of optical alignment technology, and in particular, to an electro-optic crystal optical axis alignment system and method.

Background

With the rapid development of optical technology and electronic technology, polarizing optical systems, infrared measurement systems, laser three-dimensional imaging systems, quantum communication systems and the like have also been developed, and electro-optic crystals are very important elements in these optical systems. Since the electro-optic crystal is an anisotropic medium, it is necessary to align the optical axis of the electro-optic crystal with the optical axis of the optical system when the electro-optic crystal is provided in the optical system.

In the related art, the optical axis of the electro-optical crystal can be aligned with the optical axis of the optical system by setting a plurality of groups of symmetrical emission points on one side of the reflection surface of the electro-optical crystal and adjusting the position of the electro-optical crystal in such a way that the reflected light corresponding to each group of emission points is converged at one reflection common point, or the optical axis of the electro-optical crystal is aligned based on setting an auto-collimator in the optical system.

However, the alignment accuracy is poor in the related art based on the reflection co-point mode, and the applicability and the cost are poor in the auto-collimator mode. Therefore, how to achieve the alignment accuracy, cost and applicability at the time of aligning the optical axis of the electro-optical crystal is a current urgent problem to be solved.

Disclosure of Invention

The purpose of the application is to provide an electro-optic crystal optical axis alignment system and method, which can achieve the effects of improving applicability and reducing cost while ensuring alignment precision.

Embodiments of the present application are implemented as follows:

in a first aspect of embodiments of the present application, there is provided an electro-optic crystal optical axis alignment system, the system comprising: a spectroscopic device, a first reflection device, a first lens, a second reflection device, and an optical processing apparatus;

the beam splitting device is used for splitting an original light beam from the light beam generating device into a first light beam and a second light beam, directing the first light beam to the first reflecting device, directing the second light beam to the electro-optical crystal to be aligned, and enabling the electro-optical crystal to be aligned to emit refracted light of the second light beam to the second reflecting device through the first lens based on the current pose of the electro-optical crystal to be aligned;

the first reflecting device is used for reflecting the first light beam and injecting the reflected light beam of the first light beam into the light splitting device;

the second reflecting device is used for reflecting the refraction light of the second light beam and injecting the reflection light beam of the refraction light of the second light beam into the first lens; the first lens is used for carrying out collimation treatment on the reflected light beam of the refraction light of the second light beam, and transmitting the collimated reflected light beam to the light splitting device through the electro-optical crystal to be aligned;

The beam splitting device is further configured to reflect the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing apparatus;

the optical processing device is used for carrying out photoelectric conversion on the reflected light beam of the first light beam and the collimated reflected light beam and generating an interference image, determining whether the optical axis of the electro-optical crystal to be aligned is aligned or not based on the interference image, and recording the target pose of the electro-optical crystal to be aligned when the optical axis of the electro-optical crystal to be aligned is aligned; and controlling the electro-optic crystal to be aligned to be in the target pose.

Optionally, the system further comprises a turntable and a driving device, the electro-optic crystal to be aligned being fixedly placed on the turntable;

the turntable is connected with the optical processing equipment;

the driving device is used for driving the turntable to rotate under the control of the optical processing device;

the turntable is used for rotating under the drive of the driving equipment so as to adjust the pose of the electro-optical crystal to be aligned, and the pose of the electro-optical crystal to be aligned comprises the rotation angles and the heights of the electro-optical crystal to be aligned in the first direction, the second direction and the third direction.

Optionally, the optical processing device comprises an area array detector and a processing unit;

the area array detector is used for converting the reflected light beam of the first light beam and the collimated reflected light beam into a target electric signal and outputting the target electric signal to the processing unit;

the processing unit is used for generating and outputting the interference image according to the target electric signal, determining whether each interference fringe in the interference image meets a preset condition, and determining the optical axis alignment of the electro-optic crystal to be aligned when each interference fringe in the interference image meets the preset condition; the processing unit is also used for controlling the driving device to drive the turntable to rotate.

Optionally, the system further comprises a second lens;

the second lens is arranged between the light splitting device and the optical processing equipment;

the beam splitting device is specifically configured to reflect the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing apparatus via the second lens;

the second lens is used for condensing the reflected light beam of the first light beam and the collimated reflected light beam and emitting the condensed light beam to the optical processing device.

Optionally, the electro-optical crystal to be aligned is specifically configured to split the second light beam into a first refraction light and a second refraction light based on a current pose and a birefringence characteristic of the electro-optical crystal to be aligned, and emit the first refraction light and the second refraction light to the first lens;

the first lens is used for condensing the first refraction light and the second refraction light and emitting the first refraction light after condensing and the second refraction light after condensing to the second reflecting device;

the second reflecting device is used for reflecting the first refraction light after the condensation treatment and the second refraction light after the condensation treatment, and emitting the reflection light beam corresponding to the first refraction light and the reflection light beam corresponding to the second refraction light into the first lens.

Optionally, the system further comprises an optical adjustment device;

the optical adjusting device is arranged on the incident side of the light splitting device;

the optical adjustment device is used for performing adjustment processing on the original light beam and transmitting the adjusted original light beam to the light splitting device, and the adjustment processing comprises at least one of the following steps: filtering, expanding, collimating, and/or adjusting spot size;

The beam splitting device is further configured to split the adjusted original beam into the first beam and the second beam.

Optionally, the optical adjustment device comprises a microscope objective, a first diaphragm, a third lens and a second diaphragm;

the microscope objective is used for carrying out filtering treatment on the original light beam and transmitting the original light beam after the filtering treatment to the first diaphragm;

the first diaphragm is used for performing beam expansion processing on the original beam after the filtering processing and transmitting the original beam after the beam expansion processing to the third lens;

the third lens is used for carrying out collimation treatment on the original beam after the beam expansion treatment to obtain the original beam after the collimation treatment and transmitting the original beam to the second diaphragm;

the second diaphragm is used for adjusting the light spot size of the original light beam after the collimation treatment and transmitting the original light beam after the light spot size adjustment to the light splitting device.

In a second aspect of the embodiments of the present application, there is provided an optical axis alignment method of an electro-optical crystal, which is applied to the optical processing device in the optical axis alignment system of an electro-optical crystal in the first aspect, where the method includes:

receiving a light beam to be processed, and converting the light beam to be processed into a target electric signal;

Generating and outputting an interference image according to the target electrical signal;

determining whether the optical axes of the electro-optic crystals to be aligned are aligned or not based on the interference image pair, and recording the target pose of the electro-optic crystals to be aligned when the optical axes of the electro-optic crystals to be aligned are aligned;

and controlling the electro-optical crystal to be aligned to be in the target pose so as to align the optical axis of the electro-optical crystal to be aligned.

Optionally, the determining whether the optical axes of the electro-optic crystals to be aligned are aligned based on the pair of interference images includes:

extracting each interference fringe in the interference image;

judging whether each interference fringe meets a preset condition;

if yes, determining the optical axis alignment of the electro-optical crystal to be aligned, and recording the target pose of the electro-optical crystal to be aligned;

if not, controlling the driving device to drive the turntable to rotate so as to adjust the pose of the electro-optical crystal to be aligned, receiving a new light beam to be processed, and generating a new interference image according to the new light beam to be processed so as to redetermine whether the optical axes of the electro-optical crystal to be aligned are aligned.

Optionally, the method further comprises:

adjusting the output power of the light beam generating device to be preset power;

Determining the saturation of each pixel in the interference image, and adjusting the output power of the light beam generating device according to the saturation of each pixel;

and taking the output power of the light beam generating device when the saturation of each pixel meets a preset saturation interval as the target output power of the light beam generating device.

The beneficial effects of the embodiment of the application include:

in the system, an original light beam from a light beam generating device is split into a first light beam and a second light beam through a light splitting device, the first light beam is emitted to a first reflecting device, the second light beam is emitted to an electro-optical crystal to be aligned, the first reflecting device reflects the first light beam, the reflected light beam of the first light beam is emitted to the light splitting device, the second reflecting device reflects the refraction light of the second light beam, the reflected light beam of the refraction light of the second light beam is emitted to a first lens, the first lens performs collimation treatment on the reflected light beam of the refraction light of the second light beam, the collimated reflected light beam is emitted to the light splitting device through the electro-optical crystal to be aligned, and the reflected light beam of the first light beam and the collimated reflected light beam are reflected to optical processing equipment through the light splitting device. Then, the optical processing device performs photoelectric conversion on the reflected light beam of the first light beam and the collimated reflected light beam and generates an interference image, determines whether the optical axis of the electro-optical crystal to be aligned is aligned based on the interference image, records a target pose of the electro-optical crystal to be aligned when the optical axis of the electro-optical crystal to be aligned is aligned, and then controls the electro-optical crystal to be aligned to be in the target pose.

From the above, in the present application, the optical processing device can obtain the interference image for recording the interference condition or the interference result by performing the light splitting, reflecting and collimating on the light beam incident or emitted to the electro-optical crystal to be aligned by the light splitting device, the first reflecting device, the first lens and the second reflecting device. And then the interference image is identified and processed by optical processing equipment, so that whether the optical axis of the electro-optical crystal to be aligned is aligned can be accurately determined. When the optical axis of the electro-optic crystal to be aligned is not aligned, the pose of the electro-optic crystal to be aligned can be adjusted so that the optical axis of the electro-optic crystal to be aligned is aligned. And, the target pose of the electro-optic crystal to be aligned can also be recorded when the optical axis of the electro-optic crystal to be aligned is aligned.

That is, the present application can accurately determine whether the optical axes of the electro-optical crystals to be aligned are aligned by the interference image of the interference situation of the reflected light beam of the first light beam and the collimated reflected light beam. And when the electro-optic crystal to be aligned is controlled to be in the target pose, the optical axis of the electro-optic crystal to be aligned is ensured to be aligned, so that the optical axis of the electro-optic crystal to be aligned can be aligned, and the accuracy of the optical axis alignment of the electro-optic crystal is ensured.

In addition, when the optical axis of the electro-optic crystal to be aligned is aligned, the high-precision alignment of the optical axis of the electro-optic crystal to be aligned can be realized through the light splitting device, the first reflecting device, the first lens, the second reflecting device and the optical processing equipment without using an autocollimator with high cost. The optical paths among the beam splitter, the first reflecting device, the first lens, the second reflecting device and the optical processing device are simple, and the beam splitter, the first reflecting device, the first lens, the second reflecting device and the optical processing device can be deployed in the optical paths of various optical systems. Thus, the cost of the optical axis alignment system of the electro-optical crystal can be reduced, and the applicability can be improved.

Thus, the alignment accuracy is ensured, and the applicability is improved and the cost is reduced.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered limiting the scope, and that other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a schematic structural diagram of a first electro-optic crystal optical axis alignment system according to an embodiment of the present disclosure;

FIG. 2 is a schematic diagram of a second electro-optic crystal optical axis alignment system according to an embodiment of the present disclosure;

FIG. 3 is a schematic diagram of a third electro-optic crystal optical axis alignment system according to an embodiment of the present disclosure;

FIG. 4 is a schematic structural diagram of a fourth electro-optic crystal optical axis alignment system according to an embodiment of the present disclosure;

FIG. 5 is a schematic diagram of a fifth electro-optic crystal optical axis alignment system according to an embodiment of the present disclosure;

FIG. 6 is a flowchart of a first method for aligning optical axes of electro-optic crystals according to an embodiment of the present disclosure;

fig. 7 is a flowchart of a second method for aligning optical axes of electro-optic crystals according to an embodiment of the present application.

Detailed Description

For the purposes of making the objects, technical solutions and advantages of the embodiments of the present application more clear, the technical solutions of the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is apparent that the described embodiments are some embodiments of the present application, but not all embodiments. The components of the embodiments of the present application, which are generally described and illustrated in the figures herein, may be arranged and designed in a wide variety of different configurations.

Thus, the following detailed description of the embodiments of the present application, as provided in the accompanying drawings, is not intended to limit the scope of the application, as claimed, but is merely representative of selected embodiments of the application. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments herein without making any inventive effort, are intended to be within the scope of the present application.

It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.

In the description of the present application, it should be noted that, directions or positional relationships indicated by terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., are directions or positional relationships based on those shown in the drawings, or are directions or positional relationships that are conventionally put in use of the inventive product, are merely for convenience of description of the present application and simplification of description, and do not indicate or imply that the apparatus or element to be referred to must have a specific direction, be configured and operated in a specific direction, and thus should not be construed as limiting the present application. Furthermore, the terms "first," "second," "third," and the like are used merely to distinguish between descriptions and should not be construed as indicating or implying relative importance.

Furthermore, the terms "horizontal," "vertical," and the like do not denote a requirement that the component be absolutely horizontal or overhang, but rather may be slightly inclined. As "horizontal" merely means that its direction is more horizontal than "vertical", and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.

In the description of the present application, it should also be noted that, unless explicitly specified and limited otherwise, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art in a specific context.

In the related art, the optical axis of the electro-optical crystal may be aligned with the optical axis of the optical system by setting a plurality of sets of symmetrical emission points on one side of the reflective surface of the electro-optical crystal and adjusting the position of the electro-optical crystal in such a way that reflected light corresponding to each set of emission points is converged at one reflection common point, or the optical axis of the electro-optical crystal may be aligned based on setting an auto-collimator in the optical system. However, the alignment accuracy is poor in the related art based on the reflection co-point mode, and the applicability and the cost are poor in the auto-collimator mode. Therefore, how to achieve the alignment accuracy, cost and applicability at the time of aligning the optical axis of the electro-optical crystal is a current urgent problem to be solved.

To this end, the embodiment of the application provides an electro-optical crystal optical axis alignment system, by arranging a beam splitting device, a first reflecting device, a first lens, a second reflecting device and an optical processing device. The original light beam from the light beam generating device is split into a first light beam and a second light beam through the light splitting device, the first light beam is emitted to the first reflecting device, the second light beam is emitted to the electro-optical crystal to be aligned, the first reflecting device reflects the first light beam, the reflected light beam of the first light beam is emitted to the light splitting device, the second reflecting device reflects the refracted light beam of the second light beam, the reflected light beam of the refracted light beam of the second light beam is emitted to the first lens, the first lens performs collimation treatment on the reflected light beam of the refracted light beam of the second light beam, the collimated reflected light beam is emitted to the light splitting device through the electro-optical crystal to be aligned, and the reflected light beam of the first light beam and the collimated reflected light beam are reflected to the optical processing equipment through the light splitting device. Then, the optical processing device performs photoelectric conversion on the reflected light beam of the first light beam and the collimated reflected light beam and generates an interference image, determines whether the optical axis of the electro-optical crystal to be aligned is aligned based on the interference image, records a target pose of the electro-optical crystal to be aligned when the optical axis of the electro-optical crystal to be aligned is aligned, and then controls the electro-optical crystal to be aligned to be in the target pose. The alignment precision is ensured, and meanwhile, the applicability is improved and the cost is reduced.

The embodiments of the present application will be described by taking an electro-optical crystal optical axis alignment system applied to aligning an optical axis of an electro-optical crystal as an example. It is not intended that the embodiments of the present application be applicable only to electro-optic crystal optical axis alignment in electro-optic crystal optical axis alignment systems.

The following explains in detail the optical axis alignment system for electro-optic crystals provided in the embodiments of the present application.

Fig. 1 is a schematic structural diagram of an electro-optic crystal optical axis alignment system provided in the present application. Referring to fig. 1, an embodiment of the present application provides an electro-optic crystal optical axis alignment system 100, the system 100 comprising: a spectroscopic device 101, a first reflecting device 102, a first lens 103, a second reflecting device 104, and an optical processing apparatus 105.

The beam splitting device 101 is configured to split the original light beam from the light beam generating device 107 into a first light beam and a second light beam, and direct the first light beam to the first reflecting device 102 and direct the second light beam to the electro-optical crystal 106 to be aligned, so that the electro-optical crystal 106 to be aligned emits the refracted light of the second light beam to the second reflecting device 104 via the first lens 103 based on the current pose of the electro-optical crystal 106 to be aligned.

The first reflecting device 102 is configured to reflect the first light beam and inject the reflected light beam of the first light beam into the beam splitting device 101.

The second reflecting device 104 is configured to reflect the refracted light of the second light beam and inject the reflected light beam of the refracted light of the second light beam into the first lens 103.

The first lens 103 is used for collimating the reflected light beam of the refracted light of the second light beam, and transmitting the collimated reflected light beam to the spectroscopic device 101 through the electro-optical crystal 106 to be aligned.

The beam splitting means 101 are also arranged to reflect the reflected beam of the first light beam and the collimated reflected beam to the optical processing device 105.

The optical processing device 105 is configured to photoelectrically convert the reflected light beam of the first light beam and the collimated reflected light beam and generate an interference image, determine whether the optical axes of the electro-optical crystals 106 to be aligned are aligned based on the interference image, and record the target pose of the electro-optical crystals 106 to be aligned when the optical axes of the electro-optical crystals 106 to be aligned are aligned.

The optical processing device 105 is further configured to control the electro-optic crystal 106 to be aligned in the target pose to align the optical axis of the electro-optic crystal 106 to be aligned.

Alternatively, the beam generating means 107 may be a laser capable of emitting a continuous laser beam, and the output power of the beam generating means 107 may be adjustable, i.e. the original beam of the beam generating means 107 may be a continuous laser and the brightness of the original beam may be adjustable. The beam generating device 107 may be disposed in the system 100 or may be disposed outside the system 100, which is not limited in this embodiment.

The first light beam and the second light beam may refer to two outgoing light beams emitted from the spectroscopic device 101 after the original light beam is refracted by the spectroscopic device 101. Generally, the propagation directions of the first beam and the second beam may be determined by the structure of the beam splitting device 101 and the angle at which the original beam enters the beam splitting device 101.

Alternatively, the light splitting device 101 may be a light splitting prism, or may be other devices for splitting light, which is not limited in the embodiment of the present application.

The first and second reflecting means 102, 104 may be flat mirrors and the first and second reflecting means 102, 104 may act as reference mirrors in the system 100.

Generally, the centroids of the first and second reflecting means 102, 104 lie on the same plane, and the plane of the reflecting surface of the first reflecting means 102 is perpendicular to the plane of the reflecting surface of the second reflecting means 104.

The reflected light beam of the first light beam is collimated light.

Alternatively, the electro-optic crystal 106 to be aligned may be any electro-optic crystal that requires optical axis alignment. The electro-optic crystal is an anisotropic medium with birefringent properties, i.e. the electro-optic crystal 106 to be aligned can emit two refracted light beams according to the light beam entering the electro-optic crystal 106 to be aligned.

The first lens 103 may be a convex lens. The collimation process may refer to an operation of adjusting divergent light rays into parallel light beams.

Photoelectric conversion may refer to an operation of converting a received optical signal into an electrical signal.

Alternatively, the pose of the electro-optical crystal 106 to be aligned may refer to information of the height, direction, etc. of the electro-optical crystal 106 to be aligned based on a certain reference. The current pose of the electro-optical crystal 106 to be aligned may refer to the pose of the electro-optical crystal 106 to be aligned at the current time, and in particular, may refer to the pose of the electro-optical crystal 106 to be aligned when the second light beam is incident on the electro-optical crystal 106 to be aligned.

The target pose of the electro-optic crystal 106 to be aligned may refer to the pose of the electro-optic crystal 106 to be aligned when the optical axis of the electro-optic crystal 106 to be aligned is aligned. That is, when the electro-optic crystal 106 to be aligned is in the target pose, it is ensured that the optical axes of the electro-optic crystal 106 to be aligned are aligned.

In general, when the spectroscopic apparatus 101 reflects the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing device 105, an interference phenomenon occurs between the reflected light beam of the first light beam and the collimated reflected light beam.

Then, the interference image may be an image for indicating interference fringes generated when an interference phenomenon occurs between the reflected light beam of the first light beam emitted to the optical processing device 105 according to the spectroscopic apparatus 101 and the collimated reflected light beam. That is, the interference image refers to an image obtained after the reflected light beam of the first light beam and the collimated reflected light beam interfere with each other, for recording the interference condition or the interference result.

Alternatively, the optical processing device 105 may determine whether the optical axes of the electro-optical crystals 106 to be aligned are aligned by recognizing interference fringes in the interference image.

The optical processing device 105 may include a device for receiving a light beam or an optical signal and a device for processing the optical signal. The embodiments of the present application are not limited in this regard.

Alternatively, the electro-optic crystal 106 to be aligned may be included in the system 100 as a device in the system 100, or may be a device that needs to be aligned outside the system 100, which is not limited in this embodiment.

Notably, in using the system 100 for electro-optic crystal optical axis alignment, the operation may be performed as follows: after the components in the system 100 are mounted and fixed, first, the original light beam emitted by the light beam generating device 107 is made to enter the beam splitting device 101, the first light beam and the second light beam are generated by the beam splitting device 101, the first light beam is emitted to the first reflecting device 102, the second light beam is emitted to the electro-optical crystal 106 to be aligned, the refraction light of the second light beam is re-emitted to the first lens 103 by the electro-optical crystal 106 to be aligned, and the collimated reflected light beam is emitted to the second reflecting device 104 by the first lens 103.

The first reflecting device 102 reflects the first light beam and emits the reflected light beam of the first light beam into the beam splitting device 101, the second reflecting device 104 reflects the refracted light beam of the second light beam and emits the reflected light beam of the refracted light beam of the second light beam into the first lens 103, and the first lens 103 re-emits the collimated reflected light beam to the beam splitting device 101 through the electro-optical crystal 106 to be aligned. The beam splitting means 101 reflects the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing device 105, at which point the optical processing device 105 may generate the interference image.

The optical processing device 105 may then display and identify the interference image, and in particular, may identify interference fringes in the interference image, by determining whether each interference fringe is clear, to determine whether the optical axes of the electro-optic crystals 106 to be aligned are aligned.

If the interference fringes are not clear, the optical axis misalignment of the electro-optical crystal 106 to be aligned is represented, and then the pose of the electro-optical crystal 106 to be aligned can be adjusted, when the pose of the electro-optical crystal 106 to be aligned is adjusted, the interference image generated by the optical processing device 105 will change, and whether the optical axis of the electro-optical crystal 106 to be aligned is continuously judged in real time through the interference fringes in the interference image until the optical axis alignment of the electro-optical crystal 106 to be aligned is determined, and the pose of the electro-optical crystal 106 to be aligned is stopped being adjusted.

If the interference fringes are clear, the optical axis alignment of the electro-optical crystal 106 to be aligned is represented, and at this time, the target pose of the electro-optical crystal 106 to be aligned may be recorded.

And, when the optical axes of the electro-optical crystals 106 to be aligned are aligned, the reflected light beam of the first light beam and the collimated reflected light beam are both collimated light, so that when the reflected light beam of the first light beam and the collimated reflected light beam interfere, an interference image with clear interference fringes can be obtained. Therefore, whether the optical axis of the electro-optical crystal 106 to be aligned is aligned can be accurately determined by judging whether the interference fringes are clear.

It should be noted that, in this way, the target pose of the electro-optical crystal 106 to be aligned when the optical axis of the electro-optical crystal 106 to be aligned is aligned can be accurately known, so that when the electro-optical crystal 106 to be aligned is controlled to be in the target pose, the optical axis of the electro-optical crystal 106 to be aligned can be ensured to be necessarily aligned, thus the optical axis of the electro-optical crystal can be aligned, and the accuracy of the optical axis alignment of the electro-optical crystal can be ensured. In addition, if the electro-optic crystal 106 to be aligned needs to be applied in another optical system, the electro-optic crystal 106 to be aligned may also be mounted, disposed and/or fixed in the other optical system based on the target pose of the electro-optic crystal 106 to be aligned at the time of optical axis alignment.

In addition, the system 100 provided in the embodiments of the present application may not only realize self-alignment, but also remove the electro-optical crystal 106 to be aligned from the system 100 if the electro-optical crystal in any other optical system needs to be aligned, and place the electro-optical crystal in any other optical system at the position of the electro-optical crystal 106 to be aligned. In this manner, alignment of the optical axis of the electro-optic crystal in any other optical system may also be achieved by the system 100.

In the embodiment of the present application, in the system 100, the original light beam from the light beam generating device 107 is split into a first light beam and a second light beam by the beam splitting device 101, the first light beam is directed to the first reflecting device 102, the second light beam is directed to the electro-optical crystal to be aligned, the first reflecting device 102 reflects the first light beam, the reflected light beam of the first light beam is directed to the beam splitting device 101, the second reflecting device 104 reflects the refracted light beam of the second light beam, and the reflected light beam of the refracted light beam of the second light beam is directed to the first lens 103, the first lens 103 performs collimation treatment on the reflected light beam of the refracted light beam of the second light beam, and the collimated reflected light beam is emitted to the beam splitting device 101 through the electro-optical crystal to be aligned, and the reflected light beam of the first light beam and the collimated reflected light beam are reflected to the optical processing device 105 by the beam splitting device 101. Then, the optical processing apparatus 105 photoelectrically converts the reflected light beam of the first light beam and the collimated reflected light beam and generates an interference image, determines whether or not the optical axes of the electro-optical crystals 106 to be aligned are aligned based on the interference image, records a target pose of the electro-optical crystals 106 to be aligned when the optical axes of the electro-optical crystals 106 to be aligned are aligned, and then controls the electro-optical crystals 106 to be aligned in the target pose.

As can be seen from the above, in the present application, the optical processing device 105 can obtain the interference image for recording the interference condition or the interference result by the light splitting device 101, the first reflecting device 102, the first lens 103, and the second reflecting device 104 to split, reflect, and collimate the light beam incident or emitted to the electro-optical crystal 106 to be aligned. The interference image is then identified and processed by the optical processing device 105 to accurately determine whether the optical axes of the electro-optic crystals 106 to be aligned are aligned. When the optical axis of the electro-optical crystal 106 to be aligned is misaligned, the pose of the electro-optical crystal 106 to be aligned may be adjusted so that the optical axis of the electro-optical crystal 106 to be aligned is aligned. And, when the optical axis of the electro-optical crystal 106 to be aligned is aligned, the target pose of the electro-optical crystal 106 to be aligned may also be recorded.

That is, the present application can accurately determine whether the optical axes of the electro-optic crystals 106 to be aligned are aligned by interference images of interference conditions of the reflected light beam of the first light beam and the collimated reflected light beam. And, when the electro-optic crystal 106 to be aligned is controlled to be in the target pose, the optical axis of the electro-optic crystal 106 to be aligned is ensured to be necessarily aligned, so that the optical axis of the electro-optic crystal 106 to be aligned can be aligned, and the accuracy of the optical axis alignment of the electro-optic crystal is ensured.

In addition, when the optical axis of the electro-optical crystal 106 to be aligned is aligned, the high-precision alignment of the optical axis of the electro-optical crystal 106 to be aligned can be realized through the light splitting device 101, the first reflecting device 102, the first lens 103, the second reflecting device 104 and the optical processing device 105 without using an autocollimator with high cost. The optical paths among the spectroscopic device 101, the first reflection device 102, the first lens 103, the second reflection device 104, and the optical processing device 105 are simple, and can be disposed in the optical paths of various optical systems. Thus, the cost of the optical axis alignment system of the electro-optical crystal can be reduced, and the applicability can be improved.

In addition, when any one of the electro-optical crystals is applied to the other optical system, it is possible to move any one of the electro-optical crystals, the light beam generating device, and the electro-optical crystal optical axis alignment system as a whole into the other optical system, and then determine whether or not the optical axes of any one of the electro-optical crystals are aligned based on the above-described interference image by adjusting the pose of any one of the electro-optical crystals, and by the optical processing device 105.

And then the optical axis of any electro-optic crystal is controlled to maintain the position of any electro-optic crystal when the optical axis of any electro-optic crystal is aligned. The electro-optic crystal optical axis alignment system is then moved out of the other optical system so that optical axis alignment of any electro-optic crystal in the other optical system can be accomplished.

In a possible implementation, referring to fig. 2, the system 100 further comprises a turntable Z on which the electro-optic crystal 106 to be aligned is fixedly placed, and a drive device D.

The turntable Z is connected to a drive device D which is also connected to the optical processing device 105.

The driving device D drives the turntable Z to rotate under the control of the optical processing device 105.

The turntable Z is used to rotate under the drive of the drive device D to adjust the pose of the electro-optic crystal 106 to be aligned.

The pose of the electro-optic crystal 106 to be aligned includes the rotation angles and heights of the electro-optic crystal 106 to be aligned in the first direction, the second direction, and the third direction.

Alternatively, the turntable Z may be a high-precision three-dimensional turntable, that is, the turntable Z may be rotated in any direction or change in height in any direction, which is not limited in the embodiment of the present application.

Optionally, the first direction, the second direction and the third direction are perpendicular to each other, and the first direction, the second direction and the third direction may respectively point to any direction, which is not limited in the embodiment of the present application.

For example, the first direction may refer to a direction in which the beam generating device 107 emits the original beam or a direction in which the beam splitting device 101 emits the second beam, and the second direction may refer to a direction in which the beam splitting device 101 emits the first beam, and then the third direction may refer to a direction perpendicular to both the first direction and the second direction.

Alternatively, the driving device D may be a motor.

It should be noted that, since the electro-optical crystal 106 to be aligned is fixedly disposed on the turntable Z, when the optical processing device 105 drives the turntable Z to rotate by controlling the driving device D, the pose of the electro-optical crystal 106 to be aligned will change along with the rotation of the turntable Z, so as to achieve the purpose of accurately adjusting the pose of the electro-optical crystal 106 to be aligned. Specifically, the turntable Z may also be driven by controlling the driving device D so that the electro-optical crystal 106 to be aligned is in the above-described target pose to ensure alignment of the optical axis of the electro-optical crystal 106 to be aligned.

Thus, the position of the electro-optical crystal 106 to be aligned can be automatically adjusted, and the electro-optical crystal 106 to be aligned is automatically controlled to be in the target position, so that the optical axis of the electro-optical crystal can be automatically aligned with high precision.

In one possible implementation, with continued reference to FIG. 2, the optical processing device 105 includes an area array detector 1051 and a processing unit 1052.

The area array detector 1051 is configured to convert the reflected light beam of the first light beam and the collimated reflected light beam into a target electrical signal, and output the target electrical signal to the processing unit 1052.

The processing unit 1052 is configured to generate and output the interference image according to the target electrical signal, determine whether each interference fringe in the interference image satisfies a preset condition, and determine optical axis alignment of the electro-optical crystal 106 to be aligned when each interference fringe in the interference image satisfies the preset condition.

The processing unit 1052 is also used for controlling the driving device D to drive the turntable Z to rotate.

Alternatively, the area array detector 1051 may be used to collect optical signals and convert the collected optical signals into electrical signals.

The processing unit 1052 can be any electronic device with processing functionality, such as a computer, smart phone, tablet computer, etc.

Alternatively, the target electrical signal may be an electrical signal obtained after photoelectrically converting the reflected light beam of the first light beam and the collimated reflected light beam.

The target electrical signal may be indicative of an interference result or condition of the reflected light beam of the first light beam and the collimated reflected light beam. Then, the optical processing device 105 may generate the interference image using the target electrical signal.

Specifically, the processing unit 1052 may control the driving device D to drive the turntable Z to rotate when the optical axis of the electro-optical crystal 106 to be aligned is misaligned. It is also possible to control the driving device D to drive the turntable Z to rotate after the target pose is determined so that the electro-optical crystal 106 to be aligned is in the target pose.

Illustratively, when the optical axis of the electro-optical crystal 106 to be aligned is determined to be misaligned based on the interference image, the driving device D described above starts to rotate the turntable Z by a certain angle in the first direction, the second direction and/or the third direction by the processing unit 1052, and acquires a new interference image in real time during the rotation of the turntable Z until, when the optical axis of the electro-optical crystal 106 to be aligned is determined to be aligned based on the new interference image, the driving device D is controlled to stop driving the turntable Z, thereby stopping the rotation of the turntable Z, and determining and recording the target pose when the optical axis of the electro-optical crystal 106 to be aligned is determined according to the initial angle or initial pose of the turntable Z, the rotation direction and the rotation angle of the turntable Z.

For another example, the initial angle or initial pose of the turntable Z may also be stored in advance in the processing unit 1052, and then the driving device D may be controlled by the processing unit 1052 to drive the turntable Z at the initial angle or initial pose before starting the alignment. In this way, the pose of the electro-optic crystal 106 to be aligned can be accurately determined.

In this way, the processing unit 1052 can accurately determine whether the electro-optical crystal 106 to be aligned is aligned in real time, and can determine the pose of the electro-optical crystal 106 to be aligned according to the pose or rotation angle of the turntable Z, so as to accurately record the target pose of the electro-optical crystal 106 to be aligned when the electro-optical crystal 106 to be aligned is aligned. The processing unit 1052 may then drive the turntable Z by controlling the drive device D so that the electro-optic crystal 106 to be aligned is in the target pose to align the optical axis of the electro-optic crystal 106 to be aligned.

In one possible implementation, referring to fig. 3, the system 100 further includes a second lens 108.

The second lens 108 is installed between the spectroscopic apparatus 101 and the optical processing device 105.

The beam splitting means 101 is specifically configured to reflect the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing device 105 via the second lens 108.

The second lens 108 is configured to condense the reflected light beam of the first light beam and the collimated reflected light beam, and to emit the condensed light beam to the optical processing device 105.

Alternatively, the second lens 108 may be a convex lens.

The condensing process may refer to an operation of performing a focusing process on the collimated light.

The condensed light beam may include a reflected light beam of the condensed first light beam, a collimated reflected light beam of the condensed first light beam.

It should be noted that, after the second lens 108 condenses the reflected light beam of the first light beam and the collimated reflected light beam, it can be ensured that the light beam incident on the optical processing device 105 is a focused light beam, so that it can be ensured that the condensed light beam can generate an interference phenomenon, and further, the optical processing device 105 can obtain the interference image, so as to accurately determine whether the optical axis of the electro-optical crystal 106 to be aligned is aligned.

In a possible implementation, the electro-optical crystal 106 to be aligned is specifically configured to split the second light beam into a first refraction light and a second refraction light based on the current pose and the birefringence characteristics of the electro-optical crystal 106 to be aligned, and emit the first refraction light and the second refraction light to the first lens 103.

The first lens 103 is configured to condense the first refraction light and the second refraction light, and to emit the condensed first refraction light and the condensed second refraction light to the second reflection device 104.

The second reflecting device 104 is configured to reflect the condensed first refraction light and the condensed second refraction light, and to transmit a reflected light beam corresponding to the first refraction light and a reflected light beam corresponding to the second refraction light to the first lens 103.

Alternatively, the birefringent property of the electro-optic crystal 106 to be aligned refers to a property that two refracted rays are generated after one incident ray is incident on the electro-optic crystal 106 to be aligned. That is, the propagation directions of the first refraction light and the second refraction light are different.

It should be noted that, the first lens 103 may also perform collimation processing on the reflected light beam corresponding to the first refraction light and the reflected light beam corresponding to the second refraction light, and then inject the collimated light beam into the beam splitting device 101 through the electro-optical crystal 106 to be aligned, so that the light beam injected into the beam splitting device 101 when the optical axis of the electro-optical crystal 106 to be aligned is ensured to be collimated light, and further, an interference image with clear interference fringes can be obtained when the optical axis of the electro-optical crystal 106 to be aligned is ensured to be aligned. In this way, the accuracy and reliability of determining whether the optical axes of the electro-optic crystals 106 to be aligned are aligned can be improved.

In a possible implementation, referring to fig. 4, the system 100 further comprises an optical adjustment device 109.

The optical adjustment device 109 is provided on the incident side of the spectroscopic device 101.

As can be seen from fig. 4, for example, the incident side of the spectroscopic apparatus 101 may refer to the side of the beam generating apparatus 107 that emits the original beam into the spectroscopic apparatus 101.

The optical adjustment device 109 is configured to perform adjustment processing on the original light beam, and transmit the adjusted original light beam to the spectroscopic device 101.

The beam splitting device 101 is further configured to split the adjusted original light beam into the first light beam and the second light beam.

Optionally, the adjusting process includes at least one of: filter, expand, collimate, and/or adjust the spot size.

Illustratively, the filtering process may refer to an operation of filtering stray light in the original light beam. The beam expansion process may refer to an operation of expanding a beam diameter and/or a divergence angle of the original beam. The collimation process may refer to an operation of adjusting divergent light rays into parallel light beams. The operation of adjusting the spot size may specifically refer to the spot size of the original beam being reduced.

It should be noted that, after the original light beam is adjusted by the optical adjusting device 109, the quality of the light beam entering the beam splitting device 101 can be improved, so that the quality of the light beam emitted by the beam splitting device 101 and the quality of the light beam propagating in the optical path of the system 100 are higher. In this way, the accuracy and reliability of alignment of the optical axis of the electro-optic crystal 106 to be aligned can be improved.

In a possible implementation, referring to fig. 5, the optical adjustment device 109 includes a micro objective 1091, a first stop 1092, a third lens 1093, and a second stop 1094.

The micro objective 1091 is configured to filter the original light beam and transmit the filtered original light beam to the first diaphragm 1092.

The first diaphragm 1092 is configured to perform beam expansion processing on the original beam after the filtering processing, and transmit the original beam after the beam expansion processing to the third lens 1093.

The third lens 1093 is configured to collimate the beam-expanded original beam, obtain a collimated original beam, and transmit the collimated original beam to the second diaphragm 1094.

The second diaphragm 1094 is used for adjusting the spot size of the collimated original beam, and transmitting the original beam after the adjustment of the spot size to the spectroscopic device 101.

Generally, the first diaphragm 1092 may be mounted or placed at the focal length position of the microscope objective 1091, and the clear aperture of the first diaphragm 1092 is adjusted to a minimum. Thus, the objective of the filtering process and the beam expanding process can be achieved through the microscope objective 1091 and the first diaphragm 1092.

Optionally, the third lens 1093 may also be a convex lens.

Alternatively, the first diaphragm 1092 and the second diaphragm 1094 may refer to optical devices that may exert a restricting effect on the light beam in the optical system. The second diaphragm 1094 may be specifically used to reduce the spot of the original beam.

In this way, it is ensured that the optical adjustment device 109 can accurately perform an adjustment process on the original light beam to improve the quality of the light propagating in the optical path of the system 100.

In addition, if any one of the electro-optic crystals needs to be applied in the other optical system, the system 100 may perform optical axis alignment on the any one of the electro-optic crystals first, and then mount, set and/or fix the any one of the electro-optic crystals in the other optical system based on the target pose of the any one of the electro-optic crystals in the optical axis alignment, so as to ensure the alignment accuracy of the any one of the electro-optic crystals in the other optical system. The embodiment of the application also provides a possible implementation mode.

When any one of the electro-optical crystals is applied to the other optical system, the any one of the electro-optical crystals, the light beam generating device, and the electro-optical crystal optical axis alignment system may be integrally moved into the other optical system, and then whether the optical axes of any one of the electro-optical crystals are aligned or not may be determined based on the above-described interference image by adjusting the pose of any one of the electro-optical crystals and by the optical processing device 105.

Specifically, the pose of any electro-optical crystal can be adjusted by controlling the driving device D to drive the turntable Z to rotate, and then the rotation angle and/or the height of the turntable Z when the optical axis of any electro-optical crystal is aligned can be kept by controlling the driving device D to drive the turntable Z, namely, the optical axis of any electro-optical crystal is kept at the target pose. The electro-optic crystal optical axis alignment system is then moved out of the other optical system so that optical axis alignment of any one of the electro-optic crystals in the other optical system can be accomplished.

For another example, it is also possible to fix any one of the electro-optical crystals on the turn table Z after recording the pose of the any one of the electro-optical crystals when the optical axes of the any one of the electro-optical crystals are aligned, move any one of the electro-optical crystals, the driving device D, the turn table Z, and the optical processing device 105 into other optical systems, and then control the driving device D to drive the turn table Z to rotate by the optical processing device 105 so that the target pose of the any one of the electro-optical crystals when the optical axes of the other optical systems are maintained.

For another example, after recording the target pose of any one of the electro-optical crystals when the optical axes of the electro-optical crystals are aligned, the pose of any one of the electro-optical crystals when the optical axes of the electro-optical crystals are aligned may be output to any other processing device. And fixing any electro-optical crystal on the turntable Z, moving any electro-optical crystal, the driving device D and the turntable Z into other optical systems, and controlling the driving device D to drive the turntable Z to rotate through any other processing device so as to enable any electro-optical crystal to be in the position when the optical axes of the other optical systems are aligned.

As such, the optical axis alignment of any one of the electro-optic crystals in any other optical system can be achieved based on the electro-optic crystal optical axis alignment system.

That is, the optical axis alignment system of the electro-optical crystal not only can determine the target pose of any electro-optical crystal when the optical axis of any electro-optical crystal is aligned, but also can realize the self-alignment of the optical axis alignment system of the electro-optical crystal, and can realize the optical axis alignment of the electro-optical crystal in any other optical system.

The following describes an electro-optic crystal optical axis alignment method based on the electro-optic crystal optical axis alignment system, and specific implementation processes and technical effects thereof refer to the above, and are not described in detail below.

Fig. 6 is a flowchart of an electro-optic crystal optical axis alignment method according to an embodiment of the present application, which may be applied to the optical processing device 105 in the system 100 described above. Referring to fig. 6, the method includes:

step 201: and receiving a light beam to be processed, and converting the light beam to be processed into a target electric signal.

Alternatively, the beam to be processed may refer to a beam received by the optical processing device 105 or the above-described area array detector 1051. Specifically, the reflected light beam of the first light beam and the collimated reflected light beam may be the first light beam. The embodiments of the present application are not limited in this regard.

The target electric signal is an electric signal obtained by photoelectric conversion of the light beam to be processed. The target electrical signal may be indicative of an interference result or condition of the reflected light beam of the first light beam and the collimated reflected light beam.

Step 202: an interference image is generated and output from the target electrical signal.

Alternatively, the target electrical signal may be subjected to analysis processing by the processing unit 1052 described above to obtain the interference image.

Outputting the interference image may refer to displaying the interference image on any display device electrically connected to the optical processing device 105, or may refer to outputting the interference image to another processing device. The other processing device may be any computer device specified by a person skilled in the relevant art, which is not limited by the embodiments of the present application.

Step 203: and determining whether the optical axes of the electro-optical crystals to be aligned are aligned based on the interference image pair, and recording the target pose of the electro-optical crystals to be aligned when the optical axes of the electro-optical crystals to be aligned are aligned.

Alternatively, it may be determined whether the optical axes of the electro-optic crystals 106 to be aligned are aligned, in particular by identifying interference fringes in the interference image.

Alternatively, the target pose may refer to a pose of the electro-optic crystal to be aligned when the optical axis of the electro-optic crystal to be aligned is aligned.

In addition, after the target pose of the electro-optical crystal to be aligned is recorded, the target pose of the electro-optical crystal to be aligned may be displayed on the display device or output to other processing devices, which is not limited in the embodiment of the present application.

Therefore, whether the optical axis of the electro-optic crystal to be aligned is aligned or not can be accurately determined based on the interference image, and the target pose of the electro-optic crystal to be aligned when the optical axis of the electro-optic crystal to be aligned is accurately determined.

Step 204: and controlling the electro-optic crystal to be aligned to be in the target pose so as to align the optical axis of the electro-optic crystal to be aligned.

Specifically, the turntable Z may be driven to rotate by controlling the driving device D described above to adjust the pose of the electro-optical crystal to be aligned, and to maintain the electro-optical crystal to be aligned in the target pose.

It is worth to say that, since the target pose is the pose of the electro-optic crystal to be aligned when the optical axis of the electro-optic crystal to be aligned is aligned. That is, when the electro-optic crystal to be aligned is in the target pose, it is ensured that the optical axes of the electro-optic crystal to be aligned are aligned.

In addition, the method for aligning the optical axis of the electro-optic crystal does not need to use an autocollimator with higher cost when aligning the optical axis of the electro-optic crystal to be aligned, and can realize high-precision alignment of the optical axis of the electro-optic crystal to be aligned through the system for aligning the optical axis of the electro-optic crystal in the embodiment. The optical path of the electro-optic crystal optical axis alignment system is simple, and the electro-optic crystal optical axis alignment system can be deployed in the optical paths of various optical systems. Thus, the cost of the optical axis alignment system of the electro-optical crystal can be reduced, and the applicability can be improved.

In one possible implementation, referring to fig. 7, determining whether the optical axes of the electro-optic crystals to be aligned are aligned based on the pair of interference images includes:

step 205: each interference fringe in the interference image is extracted.

Alternatively, the interference image may be image-identified by invoking an image-identification algorithm by the processing unit 1052 to obtain each interference fringe.

It should be noted that when two beams of light interfere, some areas become bright and some areas become dark, and the interference fringes may be bright fringes and dark fringes generated when the interference occurs.

Step 206: judging whether each interference fringe meets the preset condition.

Alternatively, the preset condition may be a condition set by a related technician according to actual needs, for example, the preset condition may be whether the definition of each interference fringe is high or whether each interference fringe is sufficiently clear.

Generally, if each interference fringe meets the preset condition, it may indicate that the reflected light beam of the first light beam and the collimated reflected light beam are collimated light, and the optical axis of the optical axis alignment system of the electro-optic crystal is parallel to the normal line of the light passing surface of the electro-optic crystal to be aligned, that is, the optical axis alignment of the electro-optic crystal to be aligned. Otherwise, the optical axis of the electro-optic crystal to be aligned is indicated to be misaligned.

Step 207: if so, determining the optical axis alignment of the electro-optical crystal to be aligned, and recording the target pose of the electro-optical crystal to be aligned.

Therefore, the target pose of the electro-optical crystal to be aligned when the optical axis of the electro-optical crystal to be aligned is aligned can be accurately determined, and the measurement of the optical axis alignment information of the electro-optical crystal can be completed, so that the accuracy of the optical axis of the follow-up aligned electro-optical crystal can be ensured.

Step 208: if not, the driving device is controlled to drive the turntable to rotate so as to adjust the pose of the electro-optical crystal to be aligned, a new light beam to be processed is received, and a new interference image is generated according to the new light beam to be processed so as to determine whether the optical axis of the electro-optical crystal to be aligned is aligned again.

Alternatively, the turntable may be the turntable Z described above.

After generating a new interference image from the new beam to be processed, steps 205-206 may be re-performed to re-determine whether the optical axes of the electro-optic crystals to be aligned are aligned, until the optical axes of the electro-optic crystals to be aligned are determined to be aligned and the target pose of the electro-optic crystals to be aligned is recorded when each interference fringe in the new interference image is determined to satisfy a preset condition.

Therefore, whether the electro-optical crystal to be aligned is aligned or not can be accurately determined in real time, and the target pose of the electro-optical crystal to be aligned when the electro-optical crystal to be aligned is aligned can be accurately determined, so that the electro-optical crystal to be aligned is subsequently controlled to be kept in the target pose, and the high-precision and automatic alignment of the optical axis of the electro-optical crystal to be aligned is realized.

In a possible implementation manner, the method further includes:

the output power of the light beam generating device is adjusted to be preset power.

Alternatively, the preset power may be a smaller output power value set by a skilled person, and in general, the preset power may be a minimum power value that the beam generating apparatus may output.

In this way, light entering the optical processing device 105 or the area array detector 1051 is prevented from being too strong, resulting in damage to the optical processing device 105 or the area array detector 1051.

The saturation of each pixel in the interference image is determined, and the output power of the beam generating device is adjusted according to the saturation of each pixel.

Alternatively, the saturation of each pixel may be used to characterize the brightness of each pixel.

For example, when the output power of the light beam generating device is adjusted according to the saturation of each pixel, the output power of the light beam generating device may be increased in the case where the saturation of each pixel is low, and the output power of the light beam generating device may be decreased in the case where the saturation of each pixel is high.

Since the preset power is smaller, the output power of the beam generating device may be generally increased gradually, which is not limited in the embodiment of the present application.

And taking the output power of the light beam generating device when the saturation of each pixel meets the preset saturation interval as the target output power of the light beam generating device.

Alternatively, the preset saturation interval may be a saturation interval set by a related technician. Generally, when the saturation of each pixel meets a preset saturation interval, the interference image is not too bright or too dark, so that each interference fringe in the interference image is conveniently identified, observed and extracted.

The target output power is the optimum output power of the beam generating device when determining whether the optical axes of the electro-optic crystals to be aligned are aligned.

Thus, the practicability of the optical axis alignment method of the electro-optic crystal can be improved.

The above method is executed based on the system provided in the foregoing embodiment, and its implementation principle and technical effects are similar, and will not be described herein.

One possible way, prior to using the electro-optic crystal optical axis alignment system 100 or performing the electro-optic crystal optical axis alignment method, may be prepared as follows:

when the beam generating device 107 is in the off state, the electro-optical crystal 106 to be aligned is placed between the spectroscopic device 101 and the first lens 103, and a light shielding plate is placed between the spectroscopic device 101 and the optical processing apparatus 105. In this way, it is possible to prevent the intensity of light incident on the optical processing apparatus 105 or the area array detector 1051 from being excessively large after the light beam generating device 107 is turned on, to damage the optical processing apparatus 105 or the area array detector 1051.

Then, before the above-described interference image is obtained, the clear aperture of the second diaphragm 1094 may be adjusted to the minimum aperture, a light shielding plate may be placed before the first lens 103, and then the light beam generating device 107 may be turned on. The propagation direction of the reflected light of the surface of the electro-optical crystal 106 to be aligned, which is closer to the spectroscopic device 101, is determined, and it is determined whether the reflected light of this surface of the electro-optical crystal 106 to be aligned passes through the second diaphragm 1094.

If the light does not pass through the second diaphragm 1094, the turntable Z may be controlled to rotate so as to adjust the pose of the electro-optical crystal 106 to be aligned, until the reflected light on the surface of the electro-optical crystal 106 to be aligned passes through the second diaphragm 1094, and it may be determined that the preliminary alignment of the optical axis of the electro-optical crystal 106 to be aligned is completed. In this way, it may be convenient to quickly and accurately determine whether the optical axes of the electro-optic crystals 106 to be aligned are aligned later.

In addition, in the case where the output power of the beam generating device 107 is adjusted to the above-described preset power, a light shielding plate placed between the spectroscopic device 101 and the optical processing apparatus 105 and before the first lens 103 may be removed. And then gradually increasing the output power of the light beam generating device according to the saturation of each pixel so that the saturation of each pixel meets the preset saturation interval.

The foregoing is merely a specific embodiment of the present application, but the protection scope of the present application is not limited thereto, and any person skilled in the art can easily think about changes or substitutions within the technical scope of the present application, and the changes or substitutions are covered in the protection scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.

The foregoing description is only of the preferred embodiments of the present application and is not intended to limit the same, but rather, various modifications and variations may be made by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. An electro-optic crystal optical axis alignment system, the system comprising: a spectroscopic device, a first reflection device, a first lens, a second reflection device, and an optical processing apparatus;

the beam splitting device is further used for reflecting the reflected light beam of the first light beam and the collimated reflected light beam to the optical processing equipment;

2. The electro-optic crystal optical axis alignment system of claim 1, further comprising a turntable and a drive device, the electro-optic crystal to be aligned being fixedly placed on the turntable;

The turntable is connected with the driving device, and the driving device is also connected with the optical processing device;

3. The electro-optic crystal optical axis alignment system of claim 2, wherein the optical processing device comprises an area array detector and a processing unit;

4. The electro-optic crystal optical axis alignment system of claim 1, further comprising a second lens;

5. The electro-optic crystal optical axis alignment system of claim 1, wherein the electro-optic crystal to be aligned is specifically configured to split the second light beam into a first refracted light and a second refracted light based on a current pose and a birefringence characteristic of the electro-optic crystal to be aligned, and to emit the first refracted light and the second refracted light to the first lens;

6. The electro-optic crystal optical axis alignment system of any of claims 1-5, wherein the system further comprises an optical adjustment device;

7. The electro-optic crystal optical axis alignment system of claim 6 wherein the optical adjustment device comprises a micro objective, a first stop, a third lens, and a second stop;

8. A method of aligning the optical axis of an electro-optic crystal, characterized in that it is applied to an optical processing device in the system of aligning the optical axis of an electro-optic crystal according to any one of claims 1 to 7, the method comprising:

9. The electro-optic crystal optical axis alignment method of claim 8, wherein the determining whether the optical axes of the electro-optic crystals to be aligned are aligned based on the pair of interference images comprises:

extracting each interference fringe in the interference image;

judging whether each interference fringe meets a preset condition;

10. The electro-optic crystal optical axis alignment method of claim 8, further comprising: