CN116203662B - Narrow-band high-reflection film and augmented reality lens - Google Patents
Narrow-band high-reflection film and augmented reality lens Download PDFInfo
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- CN116203662B CN116203662B CN202310245941.0A CN202310245941A CN116203662B CN 116203662 B CN116203662 B CN 116203662B CN 202310245941 A CN202310245941 A CN 202310245941A CN 116203662 B CN116203662 B CN 116203662B
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- 230000003190 augmentative effect Effects 0.000 title claims abstract description 22
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 90
- 230000003287 optical effect Effects 0.000 claims abstract description 56
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 43
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 39
- 238000002310 reflectometry Methods 0.000 claims abstract description 19
- 239000010410 layer Substances 0.000 claims description 83
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 70
- 229910052786 argon Inorganic materials 0.000 claims description 35
- 239000007789 gas Substances 0.000 claims description 32
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 30
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 claims description 29
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 28
- 239000002356 single layer Substances 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 16
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 16
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 16
- 238000010926 purge Methods 0.000 claims description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 6
- 239000012159 carrier gas Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 239000002243 precursor Substances 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 8
- 230000008569 process Effects 0.000 abstract description 7
- 239000000047 product Substances 0.000 description 18
- 238000001179 sorption measurement Methods 0.000 description 18
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 16
- 238000004088 simulation Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000002105 nanoparticle Substances 0.000 description 7
- 238000003795 desorption Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 230000004424 eye movement Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000006750 UV protection Effects 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention relates to a narrow-band high-reflection film and an augmented reality lens, wherein the narrow-band high-reflection film comprises n+1 aluminum oxide film layers and n titanium dioxide film layers which are arranged in a staggered and laminated manner along the thickness direction; the augmented reality lens comprises an optical lens and the narrow-band high-reflection film arranged on the optical lens. The narrow-band high-reflection film has the characteristics of high reflectivity under specific visible light wavelength and high transmissivity under other visible light wavelengths, and has the advantages of improving the display efficiency of an AR lens and reducing the light propagation loss in the non-human eye direction in the optical waveguide process by reflecting part of light transmitted to the non-human eye direction at the position of the diffraction optical waveguide emergent grating back to the grating.
Description
Technical Field
The invention relates to the technical field of optical systems, in particular to a narrow-band high-reflection film and an augmented reality lens.
Background
The optical system is typically composed of a micro-display and imaging optical system for Augmented Reality (AR) and Virtual Reality (VR) near-eye displays (NED). The micro display can actively provide an image like a micro-OLED or micro-LED panel, can indirectly provide an image by indirect illumination on a liquid crystal display (including transmissive LCD and reflective LCOS), a Digital Micromirror Device (DMD), and a laser, and also a Laser Beam Scanner (LBS) based on microelectromechanical system (MEMS) technology. Similar to VR NED, the display pixels of the microdisplay are imaged to a distance and form a virtual image for projection to the human eye. Unlike VR NED, AR NED requires a "see-through" function so that the eye can view the real world at the same time, while the imaging system cannot block the front view, thus requiring one or several additional optical elements to form an "optical combiner". The optical combiner superimposes the virtual content on top of the real scene by reflecting the virtual image while transmitting external light to the human eye so that they complement and "augment" each other.
Waveguides are currently the best augmented reality eyewear solution. The waveguide scheme is further classified into a geometric waveguide scheme, a diffractive optical waveguide scheme (relief grating waveguide scheme and volume hologram waveguide scheme). The geometric waveguide scheme generally comprises a sawtooth structure waveguide and a polarized film array reflector waveguide (polarized array waveguide for short), wherein the polarized array waveguide of the main stream achieves the purpose of displaying virtual information by using a partial transmission partial reflector of an array, and the polarized array waveguide scheme has the advantages of light weight, large eye movement range and uniform color. The embossing grating waveguide scheme can be mass-produced by a nanoimprint process, and is of great interest to AR optical module manufacturers, and has the advantages of large field of view and large eye movement range, but also brings challenges to field of view uniformity and color uniformity, and meanwhile, the related micro-nano processing process is also a great challenge. The volume holographic waveguide solution has advantages in both color uniformity (no rainbow effect) and implementation of monolithic full-color waveguides, but is currently limited in mass production and large field of view.
The chinese patent with the publication number CN106371210B discloses an augmented reality glasses based on transparent imaging glass, which comprises lenses and a glasses frame, wherein the lenses are installed in the glasses frame, the lenses are formed by laminating at least one transparent lens layer and at least one nano particle film layer, nano particles are uniformly distributed in the nano particle film layer, and the mass ratio of the nano particles is 1: the titanium dioxide nano particles and inorganic salt nano particles in the step (0.1-9) are formed, a bracket capable of being provided with a miniature projector is arranged at the top of the mirror frame, the bottom end of the bracket is fixedly connected with the top of the mirror frame, the miniature projector is fixedly connected with the top end of the bracket, and the miniature projector is connected with a control handle keyboard through a data line.
The AR glasses need to expand the light of the micro-display to a certain area to satisfy the requirement that the light entering the eyes of the human has enough coverage, which results in the dispersion of the energy of the light source, that is, the single-point brightness of the expanded light is lower. In addition, for VR glasses using the diffractive optical waveguide scheme, since light emitted by the micro-display generates light in a direction opposite to the human eye at the coupling-out grating, the titanium dioxide nanoparticle film layer cannot well reflect the light, so that the light cannot be acquired and received by the human eye, and the light propagation efficiency is low (about 25%). In order to meet the requirement of the augmented reality display system on the visibility of the ambient light, the conventional common technical scheme is that, relative to the coupling-in coupling-out grating, a film system is coated on the other side of the lens, and the film system has an enhanced transmission effect on the visible light, so that the high transmission characteristic of the ambient light is realized while the display optical waveguide is carried out, but the technical scheme does not collect and reuse the light in the non-human eye direction, and is not helpful for improving the display efficiency of the augmented reality optical system.
Disclosure of Invention
In view of the shortcomings of the prior art, a first object of the present invention is to provide a narrow-band high-reflection film having a characteristic of high reflectivity at specific visible wavelengths (485 nm, 550nm, 620 nm) and high transmittance at other visible wavelengths, which has the advantages of improving the display efficiency of an AR lens and reducing the light propagation loss in the non-human eye direction during the optical waveguide process by reflecting the light transmitted to the non-human eye direction at the exit grating of the diffraction optical waveguide back to the grating.
The second objective of the present invention is to provide an augmented reality lens, which solves the problems of low display brightness, low light utilization rate, and partial light emitted toward the opposite direction of human eyes, so that the display content of the AR glasses can be seen from the outside, and has the advantages of improving the display efficiency of the lens and protecting privacy.
In order to achieve the first object, the present invention provides the following technical solutions:
A narrow-band high-reflection film comprises n+1 aluminum oxide film layers and n titanium dioxide film layers which are arranged in a staggered and laminated mode along the thickness direction, wherein n is an integer.
Further, the narrow-band high-reflection film comprises n+1 aluminum oxide film layers and n titanium dioxide film layers which are arranged in a staggered and laminated mode along the thickness direction, wherein n=50-150.
Specifically, n is 50、51、52、53、54、55、56、57、58、59、60、61、62、63、64、65、66、67、68、69、70、71、72、73、74、75、76、77、78、79、80、81、82、83、84、85、86、87、88、89、90、91、92、93、94、95、96、97、98、99、100、101、102、103、104、105、106、107、108、109、110、111、112、113、114、115、116、117、118、119、120、121、122、123、124、125、126、127、128、129、130、131、132、133、134、135、136、137、138、139、140、141、142、143、144、145、146、147、148、149 or 150.
Further, the total thickness of the narrow-band high-reflection film is 20.0-30.0 μm, wherein the single-layer thickness of the aluminum oxide film layers is 2.0-2650.0 nm, the laminated thickness is 15.0-25.0 μm, and the single-layer thickness of the titanium dioxide film layers is 1.0-250.0 nm, and the laminated thickness is 4.0-6.0 μm.
In particular, the monolayer thickness of these aluminum oxide film layers is 2.5、3.9、9.8、13.7、16.8、21.6、22.7、23.8、25.7、26.7、30.3、32.8、34.9、38.6、42.7、42.8、48.0、49.6、49.8、53.7、55.5、56.6、57.6、58.6、58.9、59.7、67.1、68.3、68.7、69.7、71.7、75.4、76.1、76.9、80.3、83.3、88.7、91.9、100.9、102.5、102.8、107.3、111.5、153.6、155.5、165.8、169.6、172.0、176.1、180.5、183.1、184.4、191.6、192.9、194.5、207.6、208.2、208.4、209.1、219.8、224.9、244.6、274.3、277.6、284.8、287.8、290.8、297.8、325.6、332.9、333.1、336.3、339.6、344.4、354.3、383.9、386.3、406.4、412.6、437.9、442.8、447.4、469.1、475.5、532.2、562.2、581.8、600.3、606.1、708.8、722.7、1150.8、 and/or 2631.5nm.
In particular, the monolayer thickness of these titanium dioxide film layers is 1.9、2.0、2.1、2.4、2.6、2.8、2.8、3.0、3.4、3.8、4.3、4.3、4.4、4.7、4.8、5.1、5.2、5.4、5.5、6.3、6.4、7.0、7.2、7.6、7.7、7.8、8.3、9.0、9.2、9.3、9.4、9.9、10.3、10.6、11.0、11.0、11.1、11.8、12.0、12.1、12.1、12.4、13.3、13.4、13.5、14.0、14.2、14.4、14.4、14.5、14.7、15.0、16.0、16.9、17.7、19.5、20.1、20.6、20.9、21.8、21.9、22.0、23.1、24.5、24.5、24.9、25.3、26.2、27.0、27.3、28.2、29.7、42.1、42.7、52.1、60.9、65.9、86.2、86.5、103.0、108.0、116.6、116.9、121.3、122.1、125.8、126.2、128.5、135.2、141.5、222.5、 and/or 246.3nm.
Further, the aluminum oxide film layer is prepared by using trimethylaluminum as an aluminum precursor, argon as a carrier gas and water as an oxygen source through an atomic deposition method.
Further, the atomic deposition method for preparing the aluminum oxide film layer comprises the steps of firstly introducing trimethylaluminum, combining the trimethylaluminum with hydroxyl radicals on the surface of the optical lens or the titanium dioxide film layer, chemically adsorbing the trimethylaluminum on the surface of the optical lens or the titanium dioxide film layer, generating trimethylaluminum semi-products and methane gas, introducing argon to purge the methane gas, introducing water to provide hydroxyl groups, reacting the hydroxyl groups with methyl groups on the surface of the adsorbed trimethylaluminum semi-products to generate aluminum oxide and methane gas, introducing argon to purge the rest methane gas, water and/or trimethylaluminum semi-products, and finally circulating for a plurality of times according to the steps until the aluminum oxide film layer with the preset single-layer thickness is obtained. Wherein, calibrating an adsorption cycle to be 0.1nm, setting the adsorption cycle according to the simulation parameters, and setting the adsorption and desorption cycle number to be 26315 times if the simulation data of the first layer is 2631.5 nm.
And in the preparation process of the aluminum oxide film by an atomic deposition method, controlling the flow rate of trimethylaluminum to be 150-200 sccm, the flow rate of argon to be 100-150 sccm, the flow rate of water to be 100-150 sccm, the air pressure to be 12-20 mtorr and the temperature to be 100-150 ℃.
Further, the titanium dioxide film layer is prepared by taking titanium tetrachloride as a titanium precursor, taking argon as carrier gas and taking water as an oxygen source through ion beam evaporation, radio frequency sputtering coating or atomic deposition.
Further, the atomic deposition method for preparing the titanium dioxide film layer comprises the steps of firstly introducing titanium tetrachloride, combining hydroxyl radicals on the surface of the aluminum oxide film layer with titanium tetrachloride, chemically adsorbing the hydroxyl radicals on the surface of the aluminum oxide film layer, generating titanium tetrachloride semi-product and hydrogen chloride gas, then introducing argon to purge the hydrogen chloride gas, then introducing water to provide hydroxyl groups, reacting the hydroxyl groups with methyl groups on the surface of the adsorbed titanium tetrachloride semi-product to generate titanium dioxide and hydrogen chloride gas, then introducing argon to purge the residual hydrogen chloride gas, water and/or titanium tetrachloride semi-product, and finally circulating for a plurality of times according to the steps until the titanium dioxide film layer with the preset single-layer thickness is obtained. Wherein, calibrating an adsorption cycle to be 0.1nm, setting the adsorption cycle according to the simulation parameters, and setting the adsorption and desorption cycle number to be 21 times if the simulation data of the first layer is 2.1 nm.
And in the preparation process of the titanium dioxide film by an atomic deposition method, controlling the flow of titanium tetrachloride to be 120-150 sccm, the flow of argon to be 150-200 sccm, the flow of water to be 100-150 sccm, the air pressure to be 12-20 mtorr and the temperature to be 100-150 ℃.
In order to achieve the second object, the present invention provides the following technical solutions:
An augmented reality lens comprises an optical lens and the narrow-band high-reflection film arranged on the optical lens.
Specifically, the optical lens means a diffraction optical waveguide lens requiring a coating film, and the material thereof may be, for example, silica glass or silica glass combined with alumina, without limitation.
In summary, the beneficial technical effects of the invention are as follows:
1. The narrow-band high-reflectivity film has high reflectivity under specific visible light wavelengths (485 nm, 550nm and 620 nm), and has high transmissivity under other visible light wavelengths, so that the optical waveguide propagation efficiency can be improved;
2. the narrow-band high-reflectivity film enables one side of the lens to present high reflectivity at the central wavelength of the micro display screen, reflects light transmitted to the direction of the non-human eyes from the part of the diffraction optical waveguide emergent grating back to the grating, increases the display efficiency of the optical waveguide, can obviously improve the display efficiency of the augmented reality head-mounted device, and reduces the loss of the direction of the non-human eyes in the optical waveguide process;
3. the narrow-band high-reflection film has better adhesive force, chemical corrosion resistance, abrasion resistance, ultraviolet resistance, antistatic performance, anti-glare performance, anti-fog performance and mechanical performance, and is suitable for coating of elements in various optical systems;
4. According to the augmented reality lens, the narrow-band high-reflection film is arranged in the coupling-out area, and has the effect of high reflectivity only for the visible light with specific wavelength of the micro display, and has the effect of high transmissivity for the visible light with other wave bands, so that the display efficiency and the display brightness of the lens are improved, the light utilization rate is as high as more than 95%, and privacy is protected.
Drawings
FIG. 1 is a graph showing the n and k values of the aluminum oxide film layer, the titanium oxide film layer and the narrow-band high-reflection film of example 3 of the present invention.
FIG. 2 is a reflectance spectrum of a narrow band high reflection film of example 3 of the present invention.
Fig. 3 is a schematic view of the structure of an augmented reality lens according to embodiment 4 of the invention.
Fig. 4 is a schematic view of the structure of an augmented reality lens according to embodiment 5 of the invention.
Fig. 5 is a schematic view of the structure of an augmented reality lens according to comparative example 7 of the present invention.
Detailed Description
The invention will be further described with reference to the drawings and detailed description in order to make the technical means, the creation characteristics, the achievement of the objects and the functions of the invention more clear and easy to understand.
Example 1: the narrow-band high-reflection film disclosed by the invention comprises n+1 aluminum oxide film layers (Al 2O3 -ALD) and n titanium dioxide film layers (TiO 2 -01) which are arranged in a staggered and laminated manner along the thickness direction, wherein n is 92.
Specifically, the total thickness of the narrow-band high-reflection film is 25.2 μm, wherein the single-layer thickness of the aluminum oxide film layers is 2.47-2631.48 nm, the laminated thickness is 21.65 μm, the single-layer thickness of the titanium dioxide film layers is 1.89-246.29 nm, and the laminated thickness is 3.38 μm. Wherein the real part of refractive index, extinction coefficient, optical thickness, physical thickness (nm) of each layer of the narrow-band high-reflection film are shown in Table 1.
TABLE 1
| Layer number | Film material | Optical thickness | Physical thickness of | Layer number | Film material | Optical thickness | Physical thickness of |
| 1 | Al2O3-ALD | 7.72152726 | 2631.5 | 93 | Al2O3-ALD | 0.24441288 | 83.3 |
| 2 | TiO2-01 | 0.00841438 | 2.1 | 94 | TiO2-01 | 0.02058205 | 5.2 |
| 3 | Al2O3-ALD | 1.21053937 | 412.6 | 95 | Al2O3-ALD | 0.23562898 | 80.3 |
| 4 | TiO2-01 | 0.02014066 | 5.1 | 96 | TiO2-01 | 0.16820698 | 42.7 |
| 5 | Al2O3-ALD | 2.12063447 | 722.7 | 97 | Al2O3-ALD | 0.12518061 | 42.7 |
| 6 | TiO2-01 | 0.03027227 | 7.7 | 98 | TiO2-01 | 0.10733763 | 27.3 |
| 7 | Al2O3-ALD | 0.54116603 | 184.4 | 99 | Al2O3-ALD | 0.95553644 | 325.6 |
| 8 | TiO2-01 | 0.01479014 | 3.8 | 100 | TiO2-01 | 0.05903495 | 15.0 |
| 9 | Al2O3-ALD | 1.70702574 | 581.8 | 101 | Al2O3-ALD | 1.12650681 | 383.9 |
| 10 | TiO2-01 | 0.01113168 | 2.8 | 102 | TiO2-01 | 0.03252575 | 8.3 |
| 11 | Al2O3-ALD | 3.37667259 | 1150.8 | 103 | Al2O3-ALD | 0.26976434 | 91.9 |
| 12 | TiO2-01 | 0.01696299 | 4.3 | 104 | TiO2-01 | 0.009597 | 2.4 |
| 13 | Al2O3-ALD | 0.5660477 | 192.9 | 105 | Al2O3-ALD | 0.61353416 | 209.1 |
| 14 | TiO2-01 | 0.01109443 | 2.8 | 106 | TiO2-01 | 0.08108729 | 20.6 |
| 15 | Al2O3-ALD | 1.64979255 | 562.2 | 107 | Al2O3-ALD | 0.87373068 | 297.8 |
| 16 | TiO2-01 | 0.02119545 | 5.4 | 108 | TiO2-01 | 0.01683398 | 4.3 |
| 17 | Al2O3-ALD | 1.77842913 | 606.1 | 109 | Al2O3-ALD | 0.85341441 | 290.8 |
| 18 | TiO2-01 | 0.01191807 | 3.0 | 110 | TiO2-01 | 0.04337658 | 11.0 |
| 19 | Al2O3-ALD | 0.99645999 | 339.6 | 111 | Al2O3-ALD | 0.64502088 | 219.8 |
| 20 | TiO2-01 | 0.02820597 | 7.2 | 112 | TiO2-01 | 0.03533737 | 9.0 |
| 21 | Al2O3-ALD | 0.61100387 | 208.2 | 113 | Al2O3-ALD | 0.98672609 | 336.3 |
| 22 | TiO2-01 | 0.02500677 | 6.4 | 114 | TiO2-01 | 0.05283314 | 13.4 |
| 23 | Al2O3-ALD | 1.01050018 | 344.4 | 115 | Al2O3-ALD | 0.30151179 | 102.8 |
| 24 | TiO2-01 | 0.01885559 | 4.8 | 116 | TiO2-01 | 0.05515592 | 14.0 |
| 25 | Al2O3-ALD | 1.39512827 | 475.5 | 117 | Al2O3-ALD | 0.56214325 | 191.6 |
| 26 | TiO2-01 | 0.01844431 | 4.7 | 118 | TiO2-01 | 0.09949782 | 25.3 |
| 27 | Al2O3-ALD | 0.04004077 | 13.7 | 119 | Al2O3-ALD | 0.1574878 | 53.7 |
| 28 | TiO2-01 | 0.02743293 | 7.0 | 120 | TiO2-01 | 0.08230189 | 20.9 |
| 29 | Al2O3-ALD | 0.22334662 | 76.1 | 121 | Al2O3-ALD | 1.76132396 | 600.3 |
| 30 | TiO2-01 | 0.03704518 | 9.4 | 122 | TiO2-01 | 0.04736196 | 12.0 |
| 31 | Al2O3-ALD | 0.61158806 | 208.4 | 123 | Al2O3-ALD | 0.21046892 | 71.7 |
| 32 | TiO2-01 | 0.03675466 | 9.3 | 124 | TiO2-01 | 0.06310659 | 16.0 |
| 33 | Al2O3-ALD | 1.03955564 | 354.3 | 125 | Al2O3-ALD | 0.51671088 | 176.1 |
| 34 | TiO2-01 | 0.02145086 | 5.5 | 126 | TiO2-01 | 0.0909404 | 23.1 |
| 35 | Al2O3-ALD | 0.97689002 | 332.9 | 127 | Al2O3-ALD | 1.29935235 | 442.8 |
| 36 | TiO2-01 | 0.04335628 | 11.0 | 128 | TiO2-01 | 0.04632158 | 11.8 |
| 37 | Al2O3-ALD | 1.31271615 | 447.4 | 129 | Al2O3-ALD | 0.57064467 | 194.5 |
| 38 | TiO2-01 | 0.04059916 | 10.3 | 130 | TiO2-01 | 0.50549495 | 128.5 |
| 39 | Al2O3-ALD | 0.97740057 | 333.1 | 131 | Al2O3-ALD | 0.04922832 | 16.8 |
| 40 | TiO2-01 | 0.03062065 | 7.8 | 132 | TiO2-01 | 0.25927058 | 65.9 |
| 41 | Al2O3-ALD | 0.60927699 | 207.6 | 133 | Al2O3-ALD | 0.00725199 | 2.5 |
| 42 | TiO2-01 | 0.05598577 | 14.2 | 134 | TiO2-01 | 0.34026188 | 86.5 |
| 43 | Al2O3-ALD | 0.65981686 | 224.9 | 135 | Al2O3-ALD | 0.10237804 | 34.9 |
| 44 | TiO2-01 | 0.02485699 | 6.3 | 136 | TiO2-01 | 0.45873835 | 116.6 |
| 45 | Al2O3-ALD | 0.20033573 | 68.3 | 137 | Al2O3-ALD | 0.52975436 | 180.5 |
| 46 | TiO2-01 | 0.06636834 | 16.9 | 138 | TiO2-01 | 0.53217443 | 135.2 |
| 47 | Al2O3-ALD | 0.80481849 | 274.3 | 139 | Al2O3-ALD | 0.02887811 | 9.8 |
| 48 | TiO2-01 | 0.0171489 | 4.4 | 140 | TiO2-01 | 0.9691893 | 246.3 |
| 49 | Al2O3-ALD | 1.37638072 | 469.1 | 141 | Al2O3-ALD | 0.31476099 | 107.3 |
| 50 | TiO2-01 | 0.08565059 | 21.8 | 142 | TiO2-01 | 0.0074281 | 1.9 |
| 51 | Al2O3-ALD | 0.12570273 | 42.8 | 143 | Al2O3-ALD | 0.17294152 | 58.9 |
| 52 | TiO2-01 | 0.11685114 | 29.7 | 144 | TiO2-01 | 0.49662336 | 126.2 |
| 53 | Al2O3-ALD | 0.71770645 | 244.6 | 145 | Al2O3-ALD | 0.14625682 | 49.8 |
| 54 | TiO2-01 | 0.01319698 | 3.4 | 146 | TiO2-01 | 0.10621012 | 27.0 |
| 55 | Al2O3-ALD | 0.19694793 | 67.1 | 147 | Al2O3-ALD | 0.1690757 | 57.6 |
| 56 | TiO2-01 | 0.10294348 | 26.2 | 148 | TiO2-01 | 0.48028533 | 122.1 |
| 57 | Al2O3-ALD | 0.20451561 | 69.7 | 149 | Al2O3-ALD | 0.49777974 | 169.6 |
| 58 | TiO2-01 | 0.08651101 | 22.0 | 150 | TiO2-01 | 0.40512134 | 103.0 |
| 59 | Al2O3-ALD | 0.26027268 | 88.7 | 151 | Al2O3-ALD | 0.06996342 | 23.8 |
| 60 | TiO2-01 | 0.01022105 | 2.6 | 152 | TiO2-01 | 0.04777034 | 12.1 |
| 61 | Al2O3-ALD | 0.29603224 | 100.9 | 153 | Al2O3-ALD | 0.2256243 | 76.9 |
| 62 | TiO2-01 | 0.09657439 | 24.5 | 154 | TiO2-01 | 0.42496157 | 108.0 |
| 63 | Al2O3-ALD | 0.16621133 | 56.6 | 155 | Al2O3-ALD | 0.50461835 | 172.0 |
| 64 | TiO2-01 | 0.08613066 | 21.9 | 156 | TiO2-01 | 0.87567978 | 222.5 |
| 65 | Al2O3-ALD | 2.07980653 | 708.8 | 157 | Al2O3-ALD | 0.09622954 | 32.8 |
| 66 | TiO2-01 | 0.05215353 | 13.3 | 158 | TiO2-01 | 0.05673528 | 14.4 |
| 67 | Al2O3-ALD | 0.06333585 | 21.6 | 159 | Al2O3-ALD | 0.32728976 | 111.5 |
| 68 | TiO2-01 | 0.04166279 | 10.6 | 160 | TiO2-01 | 0.4599618 | 116.9 |
| 69 | Al2O3-ALD | 0.844464 | 287.8 | 161 | Al2O3-ALD | 0.14550229 | 49.6 |
| 70 | TiO2-01 | 0.04878269 | 12.4 | 162 | TiO2-01 | 0.09788525 | 24.9 |
| 71 | Al2O3-ALD | 1.5615636 | 532.2 | 163 | Al2O3-ALD | 0.06654586 | 22.7 |
| 72 | TiO2-01 | 0.07656513 | 19.5 | 164 | TiO2-01 | 0.33917578 | 86.2 |
| 73 | Al2O3-ALD | 0.0781929 | 26.7 | 165 | Al2O3-ALD | 0.17509824 | 59.7 |
| 74 | TiO2-01 | 0.20487002 | 52.1 | 166 | TiO2-01 | 0.03898932 | 9.9 |
| 75 | Al2O3-ALD | 0.07537927 | 25.7 | 167 | Al2O3-ALD | 0.22120524 | 75.4 |
| 76 | TiO2-01 | 0.1107862 | 28.2 | 168 | TiO2-01 | 0.47729502 | 121.3 |
| 77 | Al2O3-ALD | 0.81461734 | 277.6 | 169 | Al2O3-ALD | 0.11316422 | 38.6 |
| 78 | TiO2-01 | 0.04360717 | 11.1 | 170 | TiO2-01 | 0.49503263 | 125.8 |
| 79 | Al2O3-ALD | 0.48662534 | 165.8 | 171 | Al2O3-ALD | 0.45634043 | 155.5 |
| 80 | TiO2-01 | 0.05669499 | 14.4 | 172 | TiO2-01 | 0.55699361 | 141.5 |
| 81 | Al2O3-ALD | 1.19242542 | 406.4 | 173 | Al2O3-ALD | 0.08880682 | 30.3 |
| 82 | TiO2-01 | 0.00798161 | 2.0 | 174 | TiO2-01 | 0.06959037 | 17.7 |
| 83 | Al2O3-ALD | 0.83557493 | 284.8 | 175 | Al2O3-ALD | 0.45055179 | 153.6 |
| 84 | TiO2-01 | 0.04742137 | 12.1 | 176 | TiO2-01 | 0.03628537 | 9.2 |
| 85 | Al2O3-ALD | 1.28500285 | 437.9 | 177 | Al2O3-ALD | 0.17199787 | 58.6 |
| 86 | TiO2-01 | 0.07918511 | 20.1 | 178 | TiO2-01 | 0.05294343 | 13.5 |
| 87 | Al2O3-ALD | 0.53728984 | 183.1 | 179 | Al2O3-ALD | 0.30074221 | 102.5 |
| 88 | TiO2-01 | 0.03008226 | 7.6 | 180 | TiO2-01 | 0.05698614 | 14.5 |
| 89 | Al2O3-ALD | 1.13343236 | 386.3 | 181 | Al2O3-ALD | 0.1407905 | 48.0 |
| 90 | TiO2-01 | 0.0579666 | 14.7 | 182 | TiO2-01 | 0.23970799 | 60.9 |
| 91 | Al2O3-ALD | 0.20152837 | 68.7 | 183 | Al2O3-ALD | 0.01132524 | 3.9 |
| 92 | TiO2-01 | 0.09648276 | 24.5 | 184 | TiO2-01 | 0.16582356 | 42.1 |
| 185 | Al2O3-ALD | 0.16274625 | 55.5 |
Example 2: a narrow-band high-reflection film disclosed by the invention is different from the embodiment 1 in that the preparation method comprises the following steps,
S1 first ALD deposition of aluminum oxide film layer
Under the conditions that the air pressure is 16mtorr and the temperature is 125 ℃, firstly, introducing trimethylaluminum, wherein the flow rate of the trimethylaluminum is 175sccm, the trimethylaluminum is combined with hydroxyl radicals on the surface of an optical lens and is chemically adsorbed on the surface of the optical lens, simultaneously, trimethylaluminum semi-products and methane gas are generated, then, introducing argon to purge the methane gas, the flow rate of the argon is 125sccm, then, introducing water to provide hydroxyl groups, reacting with methyl groups on the surface of the adsorbed trimethylaluminum semi-products to generate aluminum trioxide and methane gas, the flow rate of the water is 125sccm, then, introducing argon to purge the rest methane gas, water and/or trimethylaluminum semi-products, the flow rate of the argon is 125sccm, calibrating an adsorption cycle to be 0.1nm, setting the adsorption cycle according to simulation parameters, and setting the adsorption cycle number to 26315 times until the aluminum trioxide film layer with the preset single-layer thickness is obtained because the first layer simulation data is 2631.5 nm;
s2 first ALD deposition of Titania film
Firstly introducing titanium tetrachloride under the conditions that the air pressure is 16mtorr and the temperature is 125 ℃, wherein the flow rate of the titanium tetrachloride is 135sccm, the titanium tetrachloride combines hydroxyl radicals on the surface of an aluminum oxide film layer and is chemically adsorbed on the surface of the aluminum oxide film layer, titanium tetrachloride half-product and hydrogen chloride gas are generated simultaneously, then argon is introduced to purge the hydrogen chloride gas, the flow rate of the argon is 175sccm, then water is introduced to provide hydroxyl groups and react with methyl groups on the surface of the adsorbed titanium tetrachloride half-product to generate titanium dioxide and hydrogen chloride gas, the flow rate of the water is 125sccm, then argon is introduced to purge the residual hydrogen chloride gas, water and/or titanium tetrachloride half-product, the flow rate of the argon is 175sccm, an adsorption cycle is calibrated to be 0.1nm, and according to the simulation parameters, the adsorption cycle is set, and as the simulation data of the first layer is 2.1nm, the adsorption and desorption cycle number is set to 21 times until the titanium dioxide film layer with the preset single-layer thickness is obtained;
……
S184 deposition of titanium dioxide film layer by ALD 92 th time
Firstly introducing titanium tetrachloride under the conditions that the air pressure is 16mtorr and the temperature is 125 ℃, wherein the flow rate of the titanium tetrachloride is 135sccm, the titanium tetrachloride combines hydroxyl radicals on the surface of an aluminum oxide film layer and is chemically adsorbed on the surface of the aluminum oxide film layer, titanium tetrachloride half-product and hydrogen chloride gas are generated simultaneously, then argon is introduced to purge the hydrogen chloride gas, the flow rate of the argon is 175sccm, then water is introduced to provide hydroxyl groups and react with methyl groups on the surface of the adsorbed titanium tetrachloride half-product to generate titanium dioxide and hydrogen chloride gas, the flow rate of the water is 125sccm, then argon is introduced to purge the residual hydrogen chloride gas, water and/or titanium tetrachloride half-product, the flow rate of the argon is 175sccm, an adsorption cycle is calibrated to be 0.1nm, and according to the simulation parameters, the adsorption cycle is set, and as the simulation data of the first layer is 2.1nm, the adsorption and desorption cycle number is set to 21 times until the titanium dioxide film layer with the preset single-layer thickness is obtained;
S185 deposition of aluminum oxide film layer by 93 rd ALD
Under the conditions that the air pressure is 16mtorr and the temperature is 125 ℃, firstly, trimethylaluminum is introduced, the flow rate of the trimethylaluminum is 175sccm, the trimethylaluminum is combined with hydroxyl radicals on the surface of the titanium dioxide film layer and is chemically adsorbed on the surface of the titanium dioxide film layer, simultaneously, trimethylaluminum semi-products and methane gas are generated, then argon is introduced to purge the methane gas, the flow rate of the argon is 125sccm, then water is introduced to provide hydroxyl groups and react with methyl groups on the surface of the adsorbed trimethylaluminum semi-products to generate aluminum trioxide and methane gas, the flow rate of the water is 125sccm, then argon is introduced to purge the rest methane gas, water and/or trimethylaluminum semi-products, the flow rate of the argon is 125sccm, one adsorption cycle is calibrated to be 0.1nm, the adsorption cycle is set according to the simulation parameters, and as the simulation data of the first layer is 2631.5nm, the adsorption cycle number is 26315 times until the alumina film layer with the preset single-layer thickness is obtained, and the narrow-band high-reflection film is obtained.
Example 3: the narrow-band high-reflection film disclosed by the invention is different from the narrow-band high-reflection film disclosed by the embodiment 2 in that performance detection tests are carried out on the prepared narrow-band high-reflection film.
(1) The n and k values of the material layer obtained by ellipsometry of the test deposited film layer are compared with the n and k values of the aluminum oxide and titanium dioxide of the data set (providing website sources as follows) by taking the aluminum oxide film layer and the titanium dioxide film layer of the prepared narrow-band high-reflection film as the test set, and the result is shown in figure 1. The n and k values of the test group and the data group are identical, and the films deposited by the method can be confirmed to be aluminum oxide and titanium dioxide and match with the parameters of the simulation materials.
TiO 2 optical constant data source: REFRACTIVE INDEX OF TIO 2 (Titanium dioxide) -Jolivet-amorphorus
Al 2O3 optical constant data source: REFRACTIVE INDEX OF AL 2O3 (Aluminium sesquioxide, sapphire, aluminum) -Boidin
(2) In the software Macleod, the film layer materials are titanium dioxide and aluminum oxide, the refractive indexes of the two materials are introduced into the software, and the film system with the effect shown in figure 2 is designed by using the pin optimization of the software. The prepared narrow-band high-reflectivity film has high reflectivity characteristic at specific visible light wavelengths (4815 nm,550nm and 620 nm) of the micro-display and high transmissivity characteristic at other visible light wavelengths.
Example 4: referring to fig. 3, an augmented reality lens according to the present invention includes a pair of optical lenses, an in-grating and an out-grating disposed on one optical lens near the other optical lens surface, and a narrow-band high-reflection film made in example 2 disposed on the other optical lens near the out-grating surface. In the case that the coupling-out grating is a reflective grating, it can be known from the grating equation that light rays with directions opposite to the directions of eyes are generated correspondingly and are perpendicular to the lens. Meanwhile, due to the permeability of the lens, part of light rays are directly emitted to the outside without diffraction. Therefore, the designed film system is coated on the cover layer of the augmented reality diffraction optical waveguide lens, and the light rays of the two parts can be effectively recovered.
Example 5: referring to fig. 4, an augmented reality lens according to the present invention includes an optical lens, an in-coupling grating and an out-coupling grating disposed on one side surface of the optical lens, and the narrow-band high-reflection film of example 2 disposed on the other side surface of the optical lens, or includes a pair of optical lenses, an in-coupling grating and an out-coupling grating disposed on one side surface of the optical lens facing away from the other optical lens, and the narrow-band high-reflection film of example 2 disposed on the other side surface of the optical lens adjacent to the out-coupling grating. For the coupling-out grating, a part of light is emitted towards the opposite direction of the human eye. In this case, the coating may be performed at the position corresponding to the coupling-out grating on the cover, or may be performed at the other side of the waveguide plate, where the coupling-out grating is coupled.
Comparative example 1: the narrow-band high-reflection film disclosed by the invention is different from the embodiment 1 in that the high reflectivity of a specific wavelength cannot be realized without using an alumina film, and the high transmissivity of other wavelengths is realized, but the reflectivity and the transmissivity vibrate along with the wavelength in the visible light range and are high and low complementation.
Comparative example 2: the narrow-band high-reflection film disclosed by the invention is different from the embodiment 1 in that a titanium oxide film is not used, and the high-reflection film cannot realize that a specific wavelength shows high reflectivity, and other wavelengths show high transmittance, but the reflectivity and the transmittance vibrate along with the wavelength and are high and low complementation in a visible light range.
Comparative example 3: the narrow-band high-reflection film disclosed by the invention is different from the embodiment 1 in that the total thickness of the narrow-band high-reflection film is adjusted to 19nm, so that the band width of a high-reflectivity band is larger, the narrow-band high-reflection effect on specific wavelength cannot be realized, and the environmental light intensity is reduced; an excessive thickness of the film material, such as 30nm, can lead to manufacturing difficulties and process difficulties.
Comparative example 4: the difference from example 1 is that adjusting the total thickness of the narrow-band high-reflection film to 31nm results in difficult fabrication and difficult realization in the process.
Comparative example 5: the narrow-band high-reflection film disclosed by the invention is different from the embodiment 1 in that the narrow-band high-reflection film comprises n+1 aluminum oxide film layers and n titanium dioxide film layers which are stacked along the thickness direction, wherein n is 92. Wherein, the lamination structure is set up as the mode of 2 layers of aluminium oxide retes, 3 layers of titanium dioxide retes, 2 layers of aluminium oxide retes, … … layers of aluminium oxide retes, 3 layers of titanium dioxide retes. The narrow-band high-reflectivity film can show reduced effect of high reflectivity of specific wavelength, namely reduced reflectivity and increased bandwidth; transmittance decreases at other wavelengths and has an irregular variation with wavelength.
Comparative example 6: the narrow-band high-reflection film disclosed by the invention is different from the embodiment 2 in that in the ALD deposition step of the aluminum oxide film layer and the titanium dioxide film layer, the flow rate of trimethylaluminum is controlled to be 140sccm, the flow rate of titanium tetrachloride is controlled to be 110sccm, the flow rate of argon is controlled to be 90sccm, the flow rate of water is controlled to be 160sccm, and the temperature is controlled to be 90 ℃. Wherein, because the argon flow is lower than the lower limit of the carrier gas, the desorption of the byproducts is not timely, the film forming speed is affected or the film forming is stopped, otherwise, if the argon flow is too high, the waste is caused; the too slow reaction rate or no reaction can be caused when the flow rate of the precursor TMA/TiCl 4 is smaller or larger than the parameter range of the invention, and the too large flow rate can also cause material waste; water flow rates less than or greater than the parameter ranges of the present invention may result in too slow or non-reactive reaction rates; in the preparation process, the temperature of 100 ℃ is the lowest temperature of equipment, and the temperature exceeding 150 ℃ can generate irreversible heat damage to the diffraction optical waveguide lens (optical lens) to be coated.
Comparative example 7: referring to fig. 5, an augmented reality lens according to the present invention is different from embodiment 4 or 5 in that it includes an optical lens, in-coupling and out-coupling gratings disposed on one side surface of the optical lens, and an anti-reflection film disposed on the other side surface of the optical lens.
Finally, it is noted that the above embodiments are only for illustrating the technical solution of the present invention and not for limiting the same, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications and equivalents may be made thereto without departing from the spirit and scope of the technical solution of the present invention, which is intended to be covered by the scope of the claims of the present invention.
Claims (10)
1. A narrow band high reflection film, characterized in that: comprises n+1 aluminum oxide film layers and n titanium dioxide film layers which are alternately arranged and stacked along the thickness direction, wherein n is an integer;
the total thickness of the narrow-band high-reflection film is 20.0-30.0 mu m, wherein the single-layer thickness of the aluminum oxide film layers is 2.0-2650.0 nm, the laminated thickness is 15.0-25.0 mu m, the single-layer thickness of the titanium dioxide film layers is 1.0-250.0 nm, and the laminated thickness is 4.0-6.0 mu m;
the narrow-band high-reflectivity film has high reflectivity at 485nm, 550nm and 620nm, and high transmittance at other visible light wavelengths, and the light utilization rate is up to more than 95%.
2. A narrow band high reflection film according to claim 1, wherein: the aluminum oxide film comprises n+1 aluminum oxide film layers and n titanium dioxide film layers which are alternately arranged and stacked along the thickness direction, wherein n=50-150.
3. A narrow band high reflection film according to claim 1, wherein: the monolayer thickness of the aluminum oxide film layers is 2.5、3.9、9.8、13.7、16.8、21.6、22.7、23.8、25.7、26.7、30.3、32.8、34.9、38.6、42.7、42.8、48.0、49.6、49.8、53.7、55.5、56.6、57.6、58.6、58.9、59.7、67.1、68.3、68.7、69.7、71.7、75.4、76.1、76.9、80.3、83.3、88.7、91.9、100.9、102.5、102.8、107.3、111.5、153.6、155.5、165.8、169.6、172.0、176.1、180.5、183.1、184.4、191.6、192.9、194.5、207.6、208.2、208.4、209.1、219.8、224.9、244.6、274.3、277.6、284.8、287.8、290.8、297.8、325.6、332.9、333.1、336.3、339.6、344.4、354.3、383.9、386.3、406.4、412.6、437.9、442.8、447.4、469.1、475.5、532.2、562.2、581.8、600.3、606.1、708.8、722.7、1150.8 nm and/or 2631.5nm;
The monolayer thickness of these titanium dioxide film layers is 1.9、2.0、2.1、2.4、2.6、2.8、2.8、3.0、3.4、3.8、4.3、4.3、4.4、4.7、4.8、5.1、5.2、5.4、5.5、6.3、6.4、7.0、7.2、7.6、7.7、7.8、8.3、9.0、9.2、9.3、9.4、9.9、10.3、10.6、11.0、11.0、11.1、11.8、12.0、12.1、12.1、12.4、13.3、13.4、13.5、14.0、14.2、14.4、14.4、14.5、14.7、15.0、16.0、16.9、17.7、19.5、20.1、20.6、20.9、21.8、21.9、22.0、23.1、24.5、24.5、24.9、25.3、26.2、27.0、27.3、28.2、29.7、42.1、42.7、52.1、60.9、65.9、86.2、86.5、103.0、108.0、116.6、116.9、121.3、122.1、125.8、126.2、128.5、135.2、141.5、222.5 and/or 246.3nm.
4. A narrow band high reflection film according to claim 1, wherein: the aluminum oxide film layer is prepared by taking trimethylaluminum as an aluminum precursor, argon as carrier gas and water as oxygen source through an atomic deposition method.
5. The narrow band high reflection film according to claim 4, wherein: the atomic deposition method for preparing the aluminum oxide film layer comprises the steps of firstly introducing trimethylaluminum, combining the trimethylaluminum with hydroxyl radicals on the surface of an optical lens or a titanium dioxide film layer, chemically adsorbing the trimethylaluminum with the surface of the optical lens or the titanium dioxide film layer, generating trimethylaluminum semi-product and methane gas, introducing argon to purge the methane gas, then introducing water to provide hydroxyl groups, reacting with methyl groups on the surface of the adsorbed trimethylaluminum semi-product to generate aluminum oxide and methane gas, introducing argon to purge the rest methane gas, water and/or trimethylaluminum semi-product, and finally circulating for a plurality of times according to the steps until the aluminum oxide film layer with the preset single-layer thickness is obtained.
6. The narrow band high reflection film according to claim 5, wherein: in the atomic deposition method preparation process of the aluminum oxide film, the flow rate of trimethylaluminum is controlled to be 150-200 sccm, the flow rate of argon is controlled to be 100-150 sccm, the flow rate of water is controlled to be 100-150 sccm, the air pressure is controlled to be 12-20 mtorr, and the temperature is controlled to be 100-150 ℃.
7. A narrow band high reflection film according to claim 1, wherein: the titanium dioxide film layer is prepared by taking titanium tetrachloride as a titanium precursor, taking argon as carrier gas and taking water as an oxygen source through ion beam evaporation, radio frequency sputtering coating or atomic deposition.
8. The narrow band high reflection film according to claim 7, wherein: the atomic deposition method for preparing the titanium dioxide film layer comprises the steps of firstly introducing titanium tetrachloride, combining the titanium tetrachloride with hydroxyl radicals on the surface of an aluminum oxide film layer, chemically adsorbing the titanium tetrachloride on the surface of the aluminum oxide film layer, generating titanium tetrachloride semi-product and hydrogen chloride gas simultaneously, then introducing argon to purge the hydrogen chloride gas, then introducing water to provide hydroxyl groups, reacting with methyl groups on the surface of the adsorbed titanium tetrachloride semi-product to generate titanium dioxide and hydrogen chloride gas, then introducing argon to purge the residual hydrogen chloride gas, water and/or titanium tetrachloride semi-product, and finally circulating for a plurality of times according to the steps until the titanium dioxide film layer with the preset single-layer thickness is obtained.
9. The narrow band high reflection film according to claim 8, wherein: in the preparation process of the titanium dioxide film by an atomic deposition method, the flow rate of titanium tetrachloride is controlled to be 120-150 sccm, the flow rate of argon is controlled to be 150-200 sccm, the flow rate of water is controlled to be 100-150 sccm, the air pressure is controlled to be 12-20 mtorr, and the temperature is controlled to be 100-150 ℃.
10. An augmented reality lens, characterized in that: the narrow-band high-reflection film comprises an optical lens and the narrow-band high-reflection film according to any one of claims 1-9, wherein the narrow-band high-reflection film is arranged on the optical lens.
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