CN116184775A - Trigger structure and method of interlocking device of photoetching machine - Google Patents
Trigger structure and method of interlocking device of photoetching machine Download PDFInfo
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- CN116184775A CN116184775A CN202310177028.1A CN202310177028A CN116184775A CN 116184775 A CN116184775 A CN 116184775A CN 202310177028 A CN202310177028 A CN 202310177028A CN 116184775 A CN116184775 A CN 116184775A
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- laser
- shielding plate
- reflecting
- photoetching machine
- machine
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Abstract
The invention discloses a trigger structure and a trigger method of a photoetching machine interlocking device, which belong to the technical field of photoetching machines, wherein the trigger structure of the photoetching machine interlocking device is arranged at an overhaul window of the photoetching machine, a shielding plate is covered on the overhaul window of the photoetching machine, a fixing device is further arranged in the photoetching machine, a detection space is formed between the fixing device and the shielding plate, the trigger structure comprises a laser emitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the photoetching machine and is used for triggering the interlocking device when a laser beam is not received. The laser device is used as a triggering structure, and the interlocking device is triggered when the laser receiving device cannot receive the laser beam, so that the downtime of the photoetching machine caused by external force collision is reduced, and the potential risks of damaging wafers and parts are avoided.
Description
Technical Field
The invention relates to the technical field of lithography machines, in particular to a trigger structure and a trigger method of a lithography machine interlocking device.
Background
The lithography machine is internally provided with various laser light sources and high-speed moving parts, and the laser with partial wavelengths and the high-speed moving parts can cause potential injury to human bodies, so that an interlocking device (interlock) of a cover (shielding plate) arranged on an overhaul window of the lithography machine is very important. The photoetching machine interlocking device is commonly a contact interlocking device, wherein magnetic sensitive elements are respectively arranged on two layers of covers inside and outside a machine, when the covers on the inner layer and the outer layer of the machine are normally locked, the contact magnetic sensitive elements generate electric signals, and when MBDS (Machine BasedDiagnosticSystem, machine-based diagnostic system) software of the machine detects the electric signals generated by the contact magnetic sensitive elements, the inner layer and the outer layer of the machine are normally locked, and the interlocking device normally works; when the cover of the outer layer is taken down from the machine table, electric signals cannot be transmitted between the covers of the inner layer and the outer layer, the MBDS software detects that no electric signals are transmitted, the interlocking device is triggered, the laser light source and the moving part can be closed and stop working, and the machine table stops working, so that personnel safety is protected.
In the actual manufacturing process, the interlocking device on the photoetching machine still has defects, and a shielding plate is quite good frequently, but the interlocking device is triggered, so that the problem of sudden stop of the photoetching machine is caused. Particularly, when external force is slightly collided on shielding plates at the front and rear of a wafer bearing table of a 12-inch photoetching machine, and an inner shielding plate and an outer shielding plate normally cover an overhaul window, an interlocking device is triggered in an alarm mode, so that the photoetching machine is suddenly stopped, and if the interlocking device is triggered when a wafer is being delivered to a mechanical arm, the machine is suddenly stopped, and the wafer is thrown out to cause the damage and rejection risk of the wafer. For this reason, when a photomask is placed, the body of a producer or a cart impacts an outer shielding plate of a machine, when the shielding plate is impacted by external force, the instantaneous current of an electric signal generated by a magneto-sensitive element is excessively large, and the electric signal is fed back to an MBDS system to display that an interlocking device is abnormal, so that the machine is stopped emergently, and unnecessary machine downtime and potential wafer damage or component damage are caused.
Disclosure of Invention
The invention aims to provide a triggering structure and a triggering method of a photoetching machine interlocking device, which are used for solving the problem that a shielding plate is impacted to easily cause the sudden stop of a machine.
In order to solve the technical problems, the invention provides a triggering structure of an interlocking device of a lithography machine, which is arranged at an overhaul window of the lithography machine, wherein a shielding plate is covered on the overhaul window of the lithography machine, a fixing device is further arranged in the lithography machine, a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the lithography machine in position and is used for triggering the interlocking device when a laser beam is not received; wherein:
the laser transmitter is arranged on one side of the fixing device, which faces the shielding plate, and the reflecting device is arranged on one end face of the shielding plate, which is positioned in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver.
Preferably, the reflecting means comprises a first beam splitter and a second beam splitter with perpendicular reflecting surfaces so that the laser beams entering and exiting the reflecting means are parallel.
Preferably, the laser receiver is disposed on a side of the fixing device facing the shielding plate, for receiving the laser beam reflected from the reflecting device.
A lithographic apparatus comprising a trigger structure of a lithographic apparatus interlock according to any one of the preceding claims.
The invention also provides a triggering structure of the interlocking device of the photoetching machine, which is arranged at the overhaul window of the photoetching machine, wherein the overhaul window of the photoetching machine is covered with a shielding plate, the inside of the photoetching machine is also provided with a fixing device, a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser transmitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the inside of the photoetching machine in position and is used for triggering the interlocking device when no laser beam is received; wherein:
the laser transmitter is arranged on one end face of the shielding plate, which is positioned in the photoetching machine, and the reflecting device is arranged on one side of the fixing device, which faces the shielding plate, and is used for reflecting the received laser beam to the laser receiver.
Preferably, the reflecting means comprises a first beam splitter and a second beam splitter with perpendicular reflecting surfaces so that the laser beams entering and exiting the reflecting means are parallel.
Preferably, the laser receiver is disposed on an end surface of the shielding plate located inside the lithography machine, and is configured to receive the laser beam reflected from the reflection device.
A lithographic apparatus comprising a trigger structure of a lithographic apparatus interlock according to any one of the preceding claims.
The invention also provides a triggering method of the interlocking device of the photoetching machine, which is arranged at the overhaul window of the photoetching machine, wherein the overhaul window of the photoetching machine is covered with a shielding plate, the inside of the photoetching machine is also provided with a fixing device, a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser transmitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the inside of the photoetching machine in position and is used for triggering the interlocking device when no laser beam is received; wherein:
the laser transmitter is arranged on one side of the fixing device, which faces the shielding plate, and the reflecting device is arranged on one end face of the shielding plate, which is positioned in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver; or the laser transmitter is arranged at one end face of the shielding plate, which is positioned in the photoetching machine, and the reflecting device is arranged at one side of the fixing device, which faces the shielding plate, and is used for reflecting the received laser beam to the laser receiver;
the method also comprises the following steps:
starting the laser transmitter to emit a laser beam, and reflecting the laser beam to the laser receiver through the reflecting device, wherein the photoetching machine works normally;
when the shielding plate drives the reflecting device or the laser transmitter to move, the laser receiver cannot receive the laser beam reflected by the reflecting device, the interlocking device is triggered, and the photoetching machine stops working.
Preferably, the reflecting means comprises a first beam splitter and a second beam splitter with perpendicular reflecting surfaces so that the laser beams entering and exiting the reflecting means are parallel.
In the triggering structure and the triggering method of the photoetching machine interlocking device, the laser device is used as the triggering structure, when the shielding plate is impacted by external force, the interlocking device can not be triggered as long as the laser receiver in the machine can receive reflected laser beams, the laser receiver can still receive the laser beams when the position of the laser beams is not enough to deviate beyond the receiving range of the laser receiver due to slight displacement on the shielding plate, so that the machine interlocking triggering machine is allowed to move to a certain extent, and unnecessary loss is caused.
Drawings
FIG. 1 is a schematic diagram of one embodiment provided by the present invention.
In the drawing the view of the figure,
1. a laser emitter; 2. a laser receiver; 3. a first spectroscope; 4. a second beam splitter; 5. a shielding plate; 6. a fixing device.
Detailed Description
The trigger structure and method of the interlocking device of the lithography machine according to the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. Advantages and features of the invention will become more apparent from the following description and from the claims. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the invention.
The inventor researches and discovers that a photoetching machine commonly adopts a contact type interlocking device, a magneto-sensitive element is assembled on an inner layer cover and an outer layer cover of the photoetching machine, when the inner layer cover and the outer layer cover are normally locked, the magneto-sensitive element contacted with each other can generate an electric signal, the electric signal sequentially passes through an SHB (safe handling box) - > MSBdevice net (machine base security structure device) -IPC (Industrial PC industrial computer) - > SUN system of a machine-based diagnosis hardware system), when the final machine software MBDS detects the signal, the inner layer cover and the outer layer cover are well contacted, when the outer layer cover is removed, the SHB does not transmit the signal, the MBDS can not detect the signal, the interlocking device is triggered, and the photoetching machine stops working.
The inventor continues to research deeply, and found that when a producer collides with the outer wall of the cover during the process of placing the photomask, the collision can cause the electric signal generated by the magneto-sensitive element to have overlarge instantaneous current, and the electric signal is fed back to the MBDS system to display the abnormality of the interlocking device, so that the machine is suddenly stopped, particularly the wafer bearing table is suddenly stopped in the high-speed movement process, and the wafer is easily damaged accidentally.
Based on the above, the invention has the key points that by improving the triggering structure of the interlocking device of the photoetching machine and using the laser emitter and the laser receiver as the triggering structures, when the shielding plate is impacted by external impact, the slight displacement on the shielding plate is insufficient to enable the position of the laser beam to deviate beyond the receiving range of the laser receiver, and the laser receiver can still receive the laser beam, so that the shielding plate is allowed to move to a certain extent, and the machine is prevented from being suddenly stopped due to external false touch or false impact, and unnecessary loss is caused.
Specifically, please refer to fig. 1, which is a schematic diagram of an embodiment of the present invention. As shown in fig. 1, a triggering structure of an interlocking device of a lithography machine is arranged at an inspection window of the lithography machine, a shielding plate 5 is covered on the inspection window of the lithography machine, a fixing device 6 is further arranged in the lithography machine, a detection space is formed between the fixing device 6 and the shielding plate 5, the triggering structure comprises a laser transmitter 1, a reflecting device and a laser receiver 2, and the laser receiver 2 is fixedly arranged in the lithography machine in position and is used for triggering the interlocking device when no laser beam is received; wherein: the laser transmitter 1 is arranged on the side of the fixing device 6 facing the shielding plate 5, and the reflecting device is arranged on an end face of the shielding plate 5, which is positioned in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver 2.
The laser transmitter 1 is assembled on one side, close to the shielding plate 5, in the machine, the reflecting device is arranged on the inner side, opposite to the shielding plate 5, of the shielding plate 5, for example, two spectroscopes which are at an angle of 45 degrees with the shielding plate 5 are arranged, during normal operation, laser is emitted by the laser transmitter 1 and is emitted to the reflecting device, the laser is reflected to the laser receiver 2 through the reflecting device, when the shielding plate 5 is impacted by external force, as long as the laser receiver 2 on the inner side of the machine can receive reflected laser beams, the interlocking device can not be triggered, and therefore machine interlocking caused by the false collision of the external force is effectively avoided to trigger the machine downtime. When the shielding plate 5 needs to be opened for working, for example, overhauling and maintenance are carried out, the shielding plate 5 is taken away, so that the laser receiver 2 cannot receive laser, the interlocking device is triggered, the machine is down, and related moving parts stop moving, so that personal safety of operators is guaranteed. For safety reasons, the laser transmitter 1 may emit infrared light of low intensity, and the laser transmitter 1 stops emitting laser light at the same time as the interlock is triggered.
In addition, the triggering sensitivity of the triggering structure can be adjusted by setting the receiving range of the laser receiver 2, so that the flexible adjustment according to the working state of the photoetching machine is facilitated.
It is noted that there is inevitably a diffuse reflection of light inside the shielding plate 5, and that to avoid interference of diffuse reflection the laser receiver 2 may be arranged to keep the interlock not triggered upon receiving a laser beam of a predetermined intensity, and to trigger the interlock upon receiving a laser beam of an intensity below the predetermined intensity.
In one embodiment, the fixture 6 may be a device inside the lithographic apparatus opposite to the shielding plate 5 without shielding therebetween, wherein the fixture 6 is used to set an end face of the laser emitter 1 parallel or at an angle to the shielding plate 5, so that a corresponding detection space is formed between the fixture 6 and the opposite shielding plate 5 to enable the laser beam to pass through the detection space. The fixture 6 may be a fixed position device within the lithographic apparatus, such as the base of a wafer carrier.
Wherein, the inner chamber of the device such as setting up wafer plummer in the photoetching machine promptly here, shielding plate 5 is the structure that can be demolishd, removes shielding plate 5 and can spill the inside detection space of photoetching machine to overhaul the inside of photoetching machine through the access window. Although the shielding plate 5 has a double-layer structure, the end surfaces of the shielding plate 5 located inside the lithography machine are all end surfaces of the shielding plate 5 located inside the lithography machine.
In one embodiment, the reflecting means comprises a first beam splitter 3 and a second beam splitter 4 with perpendicular reflecting surfaces to make the laser beams entering and exiting the reflecting means parallel. As shown in fig. 1, the reflecting surfaces of the first beam splitter 3 and the second beam splitter 4 are 45 degrees from the shielding plate 5. The laser transmitter 1 emits laser beams to the first spectroscope 3, the laser beams are reflected to the second spectroscope 4 through the first spectroscope 3, then the laser beams parallel to the laser beams emitted by the laser transmitter 1 are emitted through the second spectroscope 4, when the shielding plate 5 is impacted and dithered (along the normal direction of the shielding plate), the first spectroscope 3 and the second spectroscope 4 can still reflect the laser beams to the laser receiver 2, the laser receiving range of the laser receiver 2 can be enlarged, and the sudden stop of the lithography machine caused by impact of the shielding plate 5 is avoided, so that loss is caused.
In practical operation, since the first beam splitter 3 still receives the laser beam and reflects the laser beam to the second beam splitter 4 when the relative displacement between the laser transmitter 1 and the reflecting device (e.g., in the direction perpendicular to the shielding plate 5) is within a certain range, the displacement due to slight shake of the shielding plate 5 is allowed to be avoided, and the sensitivity of the triggering structure can be adjusted by adjusting the receiving range of the laser receiver 2. For example, the direction of the impact from the outside is not necessarily perpendicular to the direction of the shielding plate 5, and the shielding plate 5 has a tendency to press the inspection window in addition to shaking in the normal direction thereof, so that the lens area of the receiving window at the receiving end of the laser receiver 2 is adjusted to be slightly larger, so that the laser receiver 2 can still receive the reflected laser beam when the shielding plate 5 is slightly displaced up and down or left and right.
In addition, a single spectroscope can be provided as a reflecting device, when the shielding plate 5 receives impact and jitters, the reflected laser beam is easy to drive to shake, so that the receiving range of the laser receiver 2 is required to be enlarged, and the interlocking device is prevented from being triggered by external false touch or impact.
Specifically, as shown in fig. 1, the laser receiver 2 is disposed on a side of the fixing device 6 facing the shielding plate 5, for receiving the laser beam reflected from the reflecting device. If the reflecting device comprises a first beam splitter 3 and a second beam splitter 4 with perpendicular reflecting surfaces, the laser transmitter 1 can be arranged so that the emitted laser beam is perpendicular to the shielding plate 5, and after being reflected by the first beam splitter 3 and the second beam splitter 4, the emitted laser beam is parallel to the incident laser beam, so that the laser receiver 2 can be arranged on the fixing device 6 as well.
As an embodiment of the expansion, the existing laser ranging device can be used as the function of the laser transmitter 1 and the laser receiver 2, the corresponding reflecting device reflects the laser emitted by the laser ranging device, and when the laser ranging device measures that the distance between the fixing device 6 and the shielding plate 5 is smaller than the preset distance, the interlocking device is not triggered; and the laser distance measuring device triggers the interlocking device when measuring that the distance between the fixing device 6 and the shielding plate 5 is smaller than the preset distance.
Based on the trigger structure of the photo-etching machine interlocking device, the photo-etching machine is further provided, and the trigger structure of the photo-etching machine interlocking device comprises any one of the above.
The invention also provides another embodiment, a trigger structure of the interlocking device of the lithography machine, set up in the maintenance window of the lithography machine, cover the shielding plate 5 on the maintenance window of the lithography machine, there are fixing devices 6 in the lithography machine, and form the detection space between fixing device 6 and shielding plate 5, the trigger structure includes laser emitter 1, reflecting device and laser receiver 2, the laser receiver 2 is installed in the interior of the lithography machine fixedly in position, in order to trigger the interlocking device when not receiving the laser beam; wherein: the laser transmitter 1 is arranged at an end face of the shielding plate 5, which is positioned in the photoetching machine, and the reflecting device is arranged at the side of the fixing device 6, which faces the shielding plate 5, and is used for reflecting the received laser beam to the laser receiver 2. The reflecting means comprises a first beam splitter 3 and a second beam splitter 4 with perpendicular reflecting surfaces so that the laser beams entering and exiting the reflecting means are parallel. The laser receiver 2 is arranged on an end face of the shielding plate 5 located inside the lithography machine for receiving the laser beam reflected from the reflecting means.
The reference plane is a plane parallel to the shielding plate 5 and having a predetermined distance from the shielding plate 5 in the detection space, in practice, the laser emitter 1 and the reflecting device may be separately disposed on two sides of the reference plane, and any one of the laser emitter 1 and the reflecting device is disposed on an end surface of the shielding plate 5 inside the lithography machine, and the reflecting device is used for reflecting the received laser beam to the laser receiver 2. Therefore, this embodiment is different from the previous embodiment, where the laser transmitter 1 and the laser receiver 2 are both disposed on the shielding plate 5, and the reflecting device is disposed on the fixing device 6, which is the same as the triggering technical principle of the previous embodiment, and will not be described herein.
Based on the triggering structure of the photo-etching machine interlocking device, another photo-etching machine is also provided, and the triggering structure of the photo-etching machine interlocking device is included.
Based on the triggering structure of the interlocking device of the photoetching machine, the triggering method of the interlocking device of the photoetching machine is further provided, the triggering structure is arranged at the overhaul window of the photoetching machine, the overhaul window of the photoetching machine is covered with the shielding plate 5, the fixing device 6 is further arranged in the photoetching machine, a detection space is formed between the fixing device 6 and the shielding plate 5, the triggering structure comprises a laser transmitter 1, a reflecting device and a laser receiver 2, and the laser receiver 2 is fixedly arranged in the photoetching machine in position and is used for triggering the interlocking device when no laser beam is received; wherein: the laser transmitter 1 is arranged on one side of the fixing device 6 facing the shielding plate 5, and the reflecting device is arranged on one end face of the shielding plate 5, which is positioned in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver 2; alternatively, the laser transmitter 1 is mounted on an end face of the shielding plate 5 located inside the lithography machine, and the reflecting means is mounted on a side of the fixing means 6 facing the shielding plate 5 for reflecting the received laser beam to the laser receiver 2. The method also comprises the following steps:
starting a laser emitter 1 to emit a laser beam, reflecting the laser beam to a laser receiver 2 through a reflecting device, and enabling the photoetching machine to work normally; when the shielding plate 5 drives the reflecting device or the laser transmitter 1 to move, the laser receiver 2 cannot receive the laser beam reflected by the reflecting device, the interlocking device is triggered, and the photoetching machine stops working. The reflecting means comprises a first beam splitter 3 and a second beam splitter 4 with perpendicular reflecting surfaces so that the laser beams entering and exiting the reflecting means are parallel.
In summary, in the trigger structure of the lithography machine interlocking device provided by the embodiment of the invention, by designing a new trigger structure and adopting the laser device as the trigger structure, the interlocking device is triggered when the laser receiving device cannot receive the laser beam, so that the downtime of the lithography machine caused by external force collision is reduced, and the potential risks of damaging wafers and components are avoided.
The above description is only illustrative of the preferred embodiments of the present invention and is not intended to limit the scope of the present invention, and any alterations and modifications made by those skilled in the art based on the above disclosure shall fall within the scope of the appended claims.
Claims (10)
1. The triggering structure of the interlocking device of the photoetching machine is arranged at an overhaul window of the photoetching machine and is characterized in that a shielding plate is covered on the overhaul window of the photoetching machine, a fixing device is further arranged in the photoetching machine, a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser transmitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the photoetching machine in position and used for triggering the interlocking device when no laser beam is received; wherein:
the laser transmitter is arranged on one side of the fixing device, which faces the shielding plate, and the reflecting device is arranged on one end face of the shielding plate, which is positioned in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver.
2. A trigger structure of a lithographic apparatus according to claim 1, wherein said reflecting means comprises a first beam splitter and a second beam splitter having perpendicular reflecting surfaces so that the laser beams entering and exiting said reflecting means are parallel.
3. The trigger structure of a lithographic apparatus according to claim 1, wherein the laser receiver is provided on a side of the fixing means facing the shielding plate for receiving the laser beam reflected from the reflecting means.
4. A lithographic apparatus comprising a trigger structure of a lithographic apparatus interlock according to any one of claims 1 to 3.
5. The trigger structure of the interlocking device of the photoetching machine is characterized by being arranged at an overhaul window of the photoetching machine, and is characterized in that a shielding plate is covered on the overhaul window of the photoetching machine, a fixing device is further arranged in the photoetching machine, a detection space is formed between the fixing device and the shielding plate, the trigger structure comprises a laser transmitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the photoetching machine in position and used for triggering the interlocking device when a laser beam is not received; wherein:
the laser transmitter is arranged on one end face of the shielding plate, which is positioned in the photoetching machine, and the reflecting device is arranged on one side of the fixing device, which faces the shielding plate, and is used for reflecting the received laser beam to the laser receiver.
6. A trigger structure of a lithographic apparatus according to claim 5, wherein said reflecting means comprises a first beam splitter and a second beam splitter having perpendicular reflecting surfaces so that the laser beams entering and exiting said reflecting means are parallel.
7. The trigger structure of a lithographic apparatus according to claim 5, wherein said laser receiver is disposed on an end face of said shielding plate located inside said lithographic apparatus for receiving the laser beam reflected from said reflecting means.
8. A lithographic apparatus comprising a trigger structure of a lithographic apparatus interlock according to any one of claims 5 to 7.
9. The triggering method of the interlocking device of the photoetching machine is arranged at an overhaul window of the photoetching machine and is characterized in that a shielding plate is covered on the overhaul window of the photoetching machine, a fixing device is further arranged in the photoetching machine, a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, and the laser receiver is fixedly arranged in the photoetching machine in position and used for triggering the interlocking device when no laser beam is received; wherein:
the laser transmitter is arranged on one side of the fixing device, which faces the shielding plate, and the reflecting device is arranged on one end face of the shielding plate, which is positioned in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver; or the laser transmitter is arranged at one end face of the shielding plate, which is positioned in the photoetching machine, and the reflecting device is arranged at one side of the fixing device, which faces the shielding plate, and is used for reflecting the received laser beam to the laser receiver;
the method also comprises the following steps:
starting the laser transmitter to emit a laser beam, and reflecting the laser beam to the laser receiver through the reflecting device, wherein the photoetching machine works normally;
when the shielding plate drives the reflecting device or the laser transmitter to move, the laser receiver cannot receive the laser beam reflected by the reflecting device, the interlocking device is triggered, and the photoetching machine stops working.
10. A method of triggering a lithographic apparatus according to claim 9, wherein the reflecting means comprises a first beam splitter and a second beam splitter with perpendicular reflecting surfaces so that the laser beams entering and exiting the reflecting means are parallel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310177028.1A CN116184775A (en) | 2023-02-24 | 2023-02-24 | Trigger structure and method of interlocking device of photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310177028.1A CN116184775A (en) | 2023-02-24 | 2023-02-24 | Trigger structure and method of interlocking device of photoetching machine |
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| CN116184775A true CN116184775A (en) | 2023-05-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202310177028.1A Pending CN116184775A (en) | 2023-02-24 | 2023-02-24 | Trigger structure and method of interlocking device of photoetching machine |
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| Country | Link |
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| CN (1) | CN116184775A (en) |
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- 2023-02-24 CN CN202310177028.1A patent/CN116184775A/en active Pending
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