CN116147286A - High-purity oxygen rectification control method and device thereof - Google Patents
High-purity oxygen rectification control method and device thereof Download PDFInfo
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- CN116147286A CN116147286A CN202211549780.6A CN202211549780A CN116147286A CN 116147286 A CN116147286 A CN 116147286A CN 202211549780 A CN202211549780 A CN 202211549780A CN 116147286 A CN116147286 A CN 116147286A
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 137
- 239000001301 oxygen Substances 0.000 title claims abstract description 137
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 137
- 238000000034 method Methods 0.000 title claims abstract description 51
- 239000012535 impurity Substances 0.000 claims abstract description 48
- 238000009826 distribution Methods 0.000 claims abstract description 28
- 230000008569 process Effects 0.000 claims abstract description 24
- 238000012544 monitoring process Methods 0.000 claims abstract description 16
- 230000001276 controlling effect Effects 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 24
- 238000007599 discharging Methods 0.000 claims description 19
- 239000000523 sample Substances 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 13
- 238000004364 calculation method Methods 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 11
- 230000001105 regulatory effect Effects 0.000 claims description 11
- 230000008859 change Effects 0.000 claims description 7
- 238000004891 communication Methods 0.000 claims description 7
- 238000004821 distillation Methods 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 7
- 238000000605 extraction Methods 0.000 claims description 4
- 230000001960 triggered effect Effects 0.000 claims description 3
- 238000000926 separation method Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000012886 linear function Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000013499 data model Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
- F25J3/04793—Rectification, e.g. columns; Reboiler-condenser
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/08—Separating gaseous impurities from gases or gaseous mixtures or from liquefied gases or liquefied gaseous mixtures
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
- F25J3/04848—Control strategy, e.g. advanced process control or dynamic modeling
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/02—Processes or apparatus using separation by rectification in a single pressure main column system
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/70—Refluxing the column with a condensed part of the feed stream, i.e. fractionator top is stripped or self-rectified
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2210/00—Processes characterised by the type or other details of the feed stream
- F25J2210/06—Splitting of the feed stream, e.g. for treating or cooling in different ways
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/04—Recovery of liquid products
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/50—Oxygen or special cases, e.g. isotope-mixtures or low purity O2
- F25J2215/56—Ultra high purity oxygen, i.e. generally more than 99,9% O2
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2220/00—Processes or apparatus involving steps for the removal of impurities
- F25J2220/50—Separating low boiling, i.e. more volatile components from oxygen, e.g. N2, Ar
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2280/00—Control of the process or apparatus
- F25J2280/50—Advanced process control, e.g. adaptive or multivariable control
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
The invention relates to the technical field of air separation, in particular to a high-purity oxygen rectification control method and a device thereof, wherein the method comprises the following steps: setting high-purity oxygen yield demand FPO, collecting oxygen content data in the feed and pressure data at the top of the rectifying tower, automatically calculating flow control function set points at different positions by a logic controller FUN01, and controlling the opening of a rectifying tower feed control valve V01, a rectifying tower top feed control valve V02 and a rectifying tower top discharge control valve V05 by the logic controller FUN01 so as to ensure that the operating pressure, the temperature distribution and the impurity content at the top of the rectifying tower are in a control range, and finally outputting qualified high-purity oxygen products stably. The invention provides a method for realizing closed-loop feedforward control on the high-purity oxygen rectification process by combining on-line monitoring of the operating pressure, temperature distribution and impurity content of the rectification tower and through a logic controller and a plurality of control valves, thereby improving the stability of product supply.
Description
Technical Field
The invention relates to the technical field of air separation, in particular to a high-purity oxygen rectification control method and a device thereof.
Background
In recent years, with the rise of the semiconductor and electronic information industries, the demand for electronic gases as a base material in the industry has been increasing year by year. Electronic gases are essential consumable materials for the development of the semiconductor and electronic information industries, particularly semiconductor materials, very large scale integrated circuits, and liquid crystal display manufacturing processes, and are called "blood" for the semiconductor and electronic industries.
Conventional industrial gas purity requires a single impurity level in the ppm range (parts per million) and electronic gas purity requires a plurality of impurities therein in the ppb range (parts per billion), even ppt range (parts per trillion). The purity and cleanliness of the electronic gas directly influence the quality and yield of the product, and radically influence the accuracy and stability of the electronic product. High purity oxygen is required as one of the electron gases, in which nitrogen and argon impurity levels are at ppb level. Because the rectification separation effect directly determines the purity of the high-purity oxygen product and the stability of the product supply, strict requirements are imposed on the rectification separation control.
At present, the rectification control of the high-purity oxygen is to feed back and adjust the feeding and discharging of rectification according to the purity analysis result of the high-purity oxygen product, and the mode is simple result control. If the purity is qualified, the high-purity oxygen is sent to customers as a product; if the purity is not acceptable, the high purity oxygen is discharged as waste, and time and raw materials are spent to replace and clean the rectifying tower until the purity is acceptable. Considering the continuous stability of high-purity oxygen product supply, the control mode adopted at present has time hysteresis, can not reflect the quality of the high-purity oxygen product in time, can not continuously adjust the process parameters of the rectifying tower, can not reduce the unqualified risk of the high-purity oxygen product and reduce the waste of raw materials caused by replacement and cleaning.
Disclosure of Invention
The invention provides a high-purity oxygen rectification control method and a device thereof, which are used for judging the quality of high-purity oxygen through a plurality of process variables of a rectification tower and adjusting the operation parameters of the rectification tower in real time, in order to solve the technical problems that the control mode in the prior art has time hysteresis and can not reflect the quality of high-purity oxygen products in time and can not continuously adjust the process parameters of the rectification tower.
In order to solve the technical problems, the invention adopts the following technical scheme: a high purity oxygen rectification control method comprising:
setting a high-purity oxygen yield demand FPO;
detecting the oxygen content in the feed through a rectifying tower feed analyzer AI01;
detecting the pressure at the top of the rectifying tower through a first pressure instrument PI 01;
feeding back oxygen content data in the detected feed and pressure data at the top of the rectifying tower to a logic controller FUN01, wherein the logic controller FUN01 automatically calculates a control function set point of a rectifying tower feed flow meter FI01, a control function set point of the rectifying tower top feed flow meter FI02 and a control function set point of a rectifying tower top discharge flow meter FI 03;
the logic controller FUN01 automatically controls the opening of the rectifying tower feed control valve V01, the opening of the rectifying tower top feed control valve V02 and the opening of the rectifying tower top discharge control valve V05 according to preset control arithmetic logic according to a control function set point of the rectifying tower feed flow meter FI01, a control function set point of the rectifying tower top feed flow meter FI02 and a control function set point of the rectifying tower top discharge flow meter FI03, so that the feed flow of the rectifying tower, the feed flow of the rectifying tower top and the rectifying tower top discharge flow are regulated to corresponding set flows;
monitoring the operating pressure of the rectifying tower in real time; and feeds back the detection data to the logic controller FUN01;
monitoring the temperature distribution of the rectifying tower in real time through a plurality of temperature probes, and feeding back detection data to a logic controller FUN01;
the impurity content of the rectifying tower top is monitored in real time through the rectifying tower top analyzer AI02, and when impurity content data of the rectifying tower top received by the logic controller FUN01 deviates from a control target, the logic controller FUN01 controls the opening of the rectifying tower top feeding control valve V02 and the opening of the rectifying tower top discharging control valve V05 according to preset control operation logic, so that the operation parameters of the rectifying tower are regulated to be within a control target range.
Detecting the liquid level of a rectifying tower kettle through a tower kettle liquid level meter LI01, detecting the impurity content in the high-purity oxygen product discharged from the rectifying tower through a rectifying tower kettle analyzer AI03, feeding back detection data to a logic controller FUN01, and when the liquid level of the rectifying tower kettle and the impurity content in the high-purity oxygen product discharged from the rectifying tower meet the preset condition of the logic controller FUN01, automatically controlling the opening of a rectifying tower kettle product control valve V04 by the logic controller FUN01 to stably output the qualified high-purity oxygen product.
On the basis of setting the yield requirement of high-purity oxygen, the invention combines oxygen content data in the feed and pressure data of the rectifying tower top to automatically calculate a control function set point of a rectifying tower feed flowmeter FI01, a control function set point of a rectifying tower top feed flowmeter FI02 and a control function set point of a rectifying tower top discharge flowmeter FI03 through a logic controller FUN01, namely, the feed flow of the rectifying tower top and the set value of the rectifying tower top discharge flow, and the logic controller FUN01 automatically controls the opening of a rectifying tower top feed control valve V02 and the opening of a rectifying tower top discharge control valve V05 according to the set values of the flows and preset control arithmetic logic so as to realize on-line monitoring and regulation of the feed quantity and the discharge quantity of the rectifying tower, thereby realizing steady-state control on the rectifying process of the high-purity oxygen and reducing the risk of influence of working condition fluctuation on the quality of high-purity oxygen products.
In addition, the operation pressure and the temperature distribution of the rectifying tower and the impurity content of the rectifying tower top are monitored in real time in the rectifying process, the quality of the high-purity oxygen product can be prejudged in advance, the advanced control and adjustment are carried out, when some operation parameters deviate from control targets, the opening of the feeding control valve V02 of the rectifying tower top and the opening of the discharging control valve V05 of the rectifying tower top are timely adjusted, so that the operation pressure and the temperature distribution of the rectifying tower and the impurity content of the rectifying tower top are maintained in a control range, closed-loop feedforward control can be realized for the rectifying process of the high-purity oxygen, compared with the existing feedback of the result according to the purity of the product, the realization is simpler, the reflection is rapid, the risk of unqualified high-purity oxygen products is effectively reduced, and the operation cost is greatly reduced.
Preferably, the calculation formula of the control function set point of the rectifying tower feeding flow meter FI01 is as follows:
FI01＝FPO/X％/R；
wherein FPO is the high-purity oxygen yield requirement, X% is the oxygen content in the feed, and R is the extraction rate of the rectifying tower;
the calculation formula of the control function set point of the rectifying tower top discharge flow meter FI03 is as follows:
f103 =f (PI 01), a function of the pressure at the top of the rectifying column;
the calculation formula of the control function set point of the rectifying tower top feeding flow meter FI02 is as follows:
FI02＝FI03*β-FI01；
wherein beta is a rectifying tower control parameter.
Preferably, the logic controller FUN01 is a DCS discrete control system or a PRC programmable controller.
Preferably, the control targets of the temperature distribution of the rectifying tower are as follows:
the temperature distribution measurement value on the rectifying tower is in the range of [ Tm-2 sigma, tm+3 sigma ];
wherein Tm is a temperature control value of the rectifying tower; sigma is the standard deviation.
Preferably, when the temperature distribution of the rectifying tower is not in the controlled temperature distribution range, the deviation of the rectifying operation state from the target state can be reflected laterally, and the logic controller FUN01 can trigger an alarm to prompt an operator to check the operation parameters and the control set points of the process.
Preferably, the control targets of the impurity content at the top of the rectifying tower are as follows:
O％>98.5％；
Y％<0.9％；
wherein O% is the oxygen content at the top of the rectifying tower; y% is the impurity content at the top of the rectifying tower.
Preferably, when O% and Y% are outside the control range, the logic controller FUN01 corrects the FI02 setpoint, namely:
FI02correct＝FI02+f(AI02)；
wherein f (AI 02) is a function of the impurity content at the top of the rectification column.
Preferably, when the rectification column is to be automatically loaded, a new high purity oxygen production demand FPO2 is set at an allowable rectification column load change rate, and the logic controller FUN01 recalculates control function set points for the rectification column feed flow meter FI01, the rectification column top discharge flow meter FI03, and the rectification column top feed flow meter FI 02.
Preferably, the purity of the high-purity oxygen product is collected in a specified time interval in the automatic load-changing process of the rectifying tower, the load change can be continued only under the condition that the purity of the high-purity oxygen product is proper, otherwise, the operation parameters of the rectifying tower are stabilized to the current state, and an alarm is triggered.
The device for implementing the high-purity oxygen rectification control method comprises a rectification tower, a feeding unit, a high-purity oxygen product output unit, a tower top gas discharge unit and a logic controller FUN01, wherein:
and a feeding unit: comprising a rectifying tower feeding flow meter FI01 for measuring the feeding flow rate of the rectifying tower, a rectifying tower feeding flow meter FI02 for measuring the feeding flow rate of the rectifying tower top, a rectifying tower feeding control valve V01 for controlling the feeding flow rate of the rectifying tower, a rectifying tower feeding control valve V02 for controlling the feeding flow rate of the rectifying tower top, and a rectifying tower feeding analyzer AI01 for measuring the oxygen content in the feeding;
high purity oxygen product output unit: comprises a rectifying tower kettle product control valve V04 for controlling the output quantity of the product;
overhead gas discharge unit: the system comprises a rectifying tower top discharge flow meter FI03 for measuring the tower top discharge flow, a rectifying tower top discharge control valve V05 for controlling the tower top discharge flow and a rectifying tower top analyzer AI02 for measuring the impurity content of the rectifying tower top;
the rectifying tower is connected with a plurality of temperature probes for monitoring the temperature distribution of the rectifying tower, a first pressure instrument PI01 for measuring the pressure at the top of the rectifying tower, a tower kettle liquid level instrument LI01 for measuring the liquid level of the rectifying tower and a rectifying tower kettle analyzer AI03 for collecting the impurity content in discharged high-purity oxygen products;
the rectifying tower feeding flow meter FI01, the rectifying tower top feeding flow meter FI02, the rectifying tower top discharging flow meter FI03, the rectifying tower feeding analyzer AI01 and the rectifying tower top analyzer AI02 are all in communication connection with the signal input end of the logic controller FUN01, and the rectifying tower feeding control valve V01, the rectifying tower top feeding control valve V02 and the rectifying tower top discharging control valve V05 are all in communication connection with the signal output end of the logic controller FUN01.
Compared with the prior art, the invention has the beneficial effects that:
1) The invention adopts the online measurement of the feeding quantity and the feeding oxygen content of the rectifying tower, combines with the operation accumulation and an intelligent logic controller, can realize steady-state control on the high-purity oxygen rectifying process, and reduces the risk of influence of the fluctuation of working conditions on the quality of the high-purity oxygen product;
2) The invention adopts the online measurement of the impurity content in the rectifying tower, combines a monitoring control system and a plurality of control valves, can realize closed-loop feedforward control on the high-purity oxygen rectifying process, does not need manual intervention, reduces the risk of unqualified high-purity oxygen products, and reduces the operation cost;
3) The invention provides the method for pre-judging the quality of the high-purity oxygen product in advance by combining the online monitoring of the operating pressure, the temperature distribution and the impurity content of the rectifying tower, and performing the pre-control adjustment. Compared with the existing feedback according to the result of the product purity, the invention can reflect the product quality in advance, has simpler realization and quick reflection;
4) According to different yield requirements, the load of the rectifying tower can be automatically changed by combining flow calculation and operation experience, the product yield can be automatically adjusted without personnel intervention on the premise of ensuring the product quality, the operation cost can be reduced, and the product supply stability is improved.
Drawings
FIG. 1 is a schematic diagram of the structure of the apparatus for carrying out the control method of high purity oxygen distillation according to the present invention.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the present patent; for the purpose of better illustrating the embodiments, certain elements of the drawings may be omitted, enlarged or reduced and do not represent the actual product dimensions; it will be appreciated by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted. The positional relationship depicted in the drawings is for illustrative purposes only and is not to be construed as limiting the present patent.
The same or similar reference numbers in the drawings of embodiments of the invention correspond to the same or similar components; in the description of the present invention, it should be understood that, if there are orientations or positional relationships indicated by terms "upper", "lower", "left", "right", "long", "short", etc., based on the orientations or positional relationships shown in the drawings, this is merely for convenience in describing the present invention and simplifying the description, and is not an indication or suggestion that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, so that the terms describing the positional relationships in the drawings are merely for exemplary illustration and are not to be construed as limitations of the present patent, and that it is possible for those of ordinary skill in the art to understand the specific meaning of the terms described above according to specific circumstances.
The technical scheme of the invention is further specifically described by the following specific embodiments with reference to the accompanying drawings:
example 1
This embodiment is an embodiment 1 of a method and an apparatus for controlling high purity oxygen distillation, as shown in fig. 1, where the high purity oxygen distillation apparatus includes a distillation column, a feeding unit, a high purity oxygen product output unit, a top gas discharge unit, and a logic controller FUN01.
The feeding unit is used for conveying raw materials to the rectifying tower and monitoring parameters in the feeding process, and the feeding of the rectifying tower can be one or more strands according to actual requirements.
Specifically, the feeding unit comprises a rectifying tower feeding flow meter FI01, a rectifying tower top feeding flow meter FI02, a rectifying tower feeding control valve V01 and a rectifying tower top feeding control valve V02, wherein the rectifying tower feeding flow meter FI01 and the rectifying tower top feeding flow meter FI02 are respectively used for measuring the feeding flow of the rectifying tower and the feeding flow of the rectifying tower top, and the rectifying tower feeding control valve V01 and the rectifying tower top feeding control valve V02 are used for controlling the feeding amount of the rectifying tower and the feeding amount of the rectifying tower top.
The feeding unit further comprises a rectifying tower feeding analyzer AI01 for measuring the oxygen content in the feeding, wherein the rectifying tower feeding analyzer AI01, the rectifying tower feeding flowmeter FI01, the rectifying tower top feeding flowmeter FI02, the rectifying tower feeding control valve V01 and the rectifying tower top feeding control valve V02 are all connected to the rectifying tower through pipelines.
The high-purity oxygen product output unit is used for outputting high-purity oxygen products in the rectifying tower, and specifically comprises a rectifying tower kettle product control valve V04, wherein the rectifying tower kettle product control valve V04 is used for controlling the output quantity of the high-purity oxygen products, and the rectifying tower kettle product control valve V04 is connected to the rectifying tower through a pipeline.
The tower top gas discharge unit is used for discharging gas at the top of the rectification tower, and specifically comprises a rectification tower top discharge flow meter FI03, a rectification tower top discharge control valve V05 and a rectification tower top analyzer AI02, wherein the rectification tower top discharge flow meter FI03 is used for measuring tower top discharge flow, the rectification tower top discharge control valve V05 is used for controlling tower top discharge amount, the rectification tower top analyzer AI02 is used for measuring a step point of impurity content at the top of the rectification tower, and meanwhile, the rectification tower top analyzer AI02 is also used for measuring oxygen content in the rectification tower. The rectifying tower top discharge flow meter FI03, the rectifying tower top discharge control valve V05 and the rectifying tower top analyzer AI02 are all connected to the rectifying tower through pipelines.
Wherein, a plurality of temperature probe, at least one pressure instrument, tower cauldron level gauge LI01 and rectifying column cauldron analysis appearance AI03 that are connected with through the pipeline on the rectifying column, a plurality of temperature probe are used for real-time supervision, gather the temperature distribution of rectifying column during operation, and temperature probe supplies to set up 5 in this embodiment, are temperature probe TE01, TE02, TE03, TE04, TE05 respectively, and temperature probe TE01, TE02, TE03, TE04, TE05 are respectively through the pipeline connection in rectifying column's different positions department.
The pressure instrument is used for real-time supervision rectifying column's operating pressure, and pressure instrument includes first pressure instrument PI01 and second pressure instrument PI01 in this embodiment, and wherein, first pressure instrument PI01 is used for measuring rectifying column top's pressure, and second pressure instrument PI02 is used for measuring rectifying column bottom's pressure, and first pressure instrument PI01 and second pressure instrument PI01 all pass through the pipe connection on the rectifying column.
The tower kettle liquid level meter LI01 is used for measuring the liquid level of the rectifying tower and is connected to the rectifying tower through a pipeline.
The rectifying tower kettle analyzer AI03 is used for collecting impurity content in discharged high-purity oxygen products, and is connected in the rectifying tower through a pipeline, so that the purity of the high-purity oxygen products can be collected at intervals within a specified time, and the purity condition of the high-purity oxygen products can be fed back timely.
According to the on-line collected flow parameters, the logic controller FUN01 automatically controls the opening of each valve according to a preset control operation logic, so as to achieve the purpose of adjusting the running state of the rectifying tower in real time, and specifically, the rectifying tower feeding flowmeter FI01, the rectifying tower top feeding flowmeter FI02, the rectifying tower top discharging flowmeter FI03, the rectifying tower feeding analyzer AI01 and the rectifying tower top analyzer AI02 are in communication connection with the signal input end of the logic controller FUN01, and the rectifying tower feeding control valve V01, the rectifying tower top feeding control valve V02 and the rectifying tower top discharging control valve V05 are all in communication connection with the signal output end of the logic controller FUN01.
In addition, the first pressure instrument PI01, the second pressure instrument PI02, the temperature probe, the tower kettle liquid level instrument LI01, the rectifying tower kettle analyzer AI03 and the rectifying tower kettle product control valve V04 are all in communication connection with the logic controller FUN01. Specifically, pressure data of the rectifying tower detected by the first pressure instrument PI01 and the second pressure instrument PI02 and temperature distribution of the rectifying tower detected by the temperature probe are fed back to the logic controller FUN01, the liquid level of the rectifying tower kettle is detected by the tower kettle liquid level instrument LI01, impurity content in the high-purity oxygen product discharged by the rectifying tower kettle analyzer AI03 is fed back to the logic controller FUN01, and when the liquid level of the rectifying tower kettle and the impurity content in the high-purity oxygen product discharged by the rectifying tower meet preset conditions of the logic controller FUN01, the logic controller FUN01 automatically controls the opening of the rectifying tower kettle product control valve V04 to stably output the qualified high-purity oxygen product.
The invention also provides a high-purity oxygen rectification control method, which comprises the following steps:
setting a high-purity oxygen yield demand FPO;
detecting the oxygen content in the feed through a rectifying tower feed analyzer AI01;
detecting the pressure at the top of the rectifying tower through a first pressure instrument PI 01;
feeding back oxygen content data in the detected feed and pressure data at the top of the rectifying tower to a logic controller FUN01, wherein the logic controller FUN01 automatically calculates a control function set point of a rectifying tower feed flow meter FI01, a control function set point of the rectifying tower top feed flow meter FI02 and a control function set point of a rectifying tower top discharge flow meter FI 03;
the logic controller FUN01 automatically controls the opening of the rectifying tower feed control valve V01, the opening of the rectifying tower top feed control valve V02 and the opening of the rectifying tower top discharge control valve V05 according to preset control arithmetic logic according to a control function set point of the rectifying tower feed flow meter FI01, a control function set point of the rectifying tower top feed flow meter FI02 and a control function set point of the rectifying tower top discharge flow meter FI03, so that the feed flow of the rectifying tower, the feed flow of the rectifying tower top and the rectifying tower top discharge flow are regulated to corresponding set flows;
monitoring the operating pressure of the rectifying tower in real time; and feeds back the detection data to the logic controller FUN01;
monitoring the temperature distribution of the rectifying tower in real time through a plurality of temperature probes, and feeding back detection data to a logic controller FUN01;
the impurity content of the rectifying tower top is monitored in real time through the rectifying tower top analyzer AI02, and when impurity content data of the rectifying tower top received by the logic controller FUN01 deviates from a control target, the logic controller FUN01 controls the opening of the rectifying tower top feeding control valve V02 and the opening of the rectifying tower top discharging control valve V05 according to preset control operation logic, so that the operation parameters of the rectifying tower are regulated to be within a control target range.
Detecting the liquid level of a rectifying tower kettle through a tower kettle liquid level meter LI01, detecting the impurity content in the high-purity oxygen product discharged from the rectifying tower through a rectifying tower kettle analyzer AI03, feeding back detection data to a logic controller FUN01, and when the liquid level of the rectifying tower kettle and the impurity content in the high-purity oxygen product discharged from the rectifying tower meet the preset condition of the logic controller FUN01, automatically controlling the opening of a rectifying tower kettle product control valve V04 by the logic controller FUN01 to stably output the qualified high-purity oxygen product.
Wherein, gather the oxygen content data in the feeding through rectifying column feeding analyzer AI01, measure rectifying column feeding flow through first rectifying column feeding flowmeter FI01, control rectifying column's feeding amount through first rectifying column feeding control valve V01.
The logic controller FUN01 automatically calculates a control function set point of the feeding flowmeter FI01 of the rectifying tower according to the high-purity oxygen yield requirement FPO and oxygen content data in the feeding, and meanwhile, the logic controller FUN01 automatically controls the opening of the feeding control valve V01 of the rectifying tower according to preset control operation logic, so that the feeding flow of the rectifying tower is regulated to the set feeding flow, the control of the feeding quantity of the rectifying tower is realized, and meanwhile, the feeding quantity cannot be larger than the maximum allowable treatment quantity of the rectifying tower.
Specifically, the control function set point for the rectifying column feed flow meter FI01 is calculated as follows:
FI01＝FPO/X％/R；
wherein FPO is the high-purity oxygen yield requirement, X% is the oxygen content in the feed, and R is the extraction rate of the rectifying tower.
The high-purity oxygen yield requirement and the extraction rate of the rectifying tower are parameters which are set in advance, the oxygen content in the feed is acquired through a rectifying tower feed analyzer AI01, a logic controller FUN01 calculates a control function set point of a rectifying tower feed flowmeter FI01 according to a corresponding calculation formula, after the set feed flow of the rectifying tower feed flowmeter FI01 is determined, the logic controller FUN01 automatically controls the opening of a rectifying tower feed control valve V01 according to a preset control operation logic based on the relation between the flow and the valve opening in the conventional high-purity oxygen rectifying process, so that the feed flow of the rectifying tower is regulated to the corresponding set flow, and the control of the feed quantity of the rectifying tower is realized.
Pressure data of the rectifying tower top is collected through a first pressure instrument PI01, the rectifying tower top discharge flow meter FI03 is used for measuring the rectifying tower top discharge flow, the rectifying tower top discharge flow is controlled through the rectifying tower top discharge control valve V05, the rectifying tower feed flow is measured through the rectifying tower top feed flow meter FI02, the rectifying tower top feed flow is specifically measured, the rectifying tower top feed flow is controlled through the rectifying tower top feed control valve V02, and the rectifying tower top feed flow is specifically controlled.
The logic controller FUN01 automatically calculates a control function set point of a rectifying tower top discharge flow meter FI03 according to pressure data of the rectifying tower top, and based on the relation between flow and valve opening in the conventional high-purity oxygen rectifying process, the logic controller FUN01 automatically controls the opening of a rectifying tower top discharge control valve V05 according to preset control operation logic so as to adjust the rectifying tower top discharge flow to the set discharge flow, namely, control the discharging of the rectifying tower. Specifically, the calculation formula of the control function set point of the rectifying tower top discharge flow meter FI03 is as follows:
f103 =f (PI 01), a function of the pressure at the top of the rectifying column;
the functions described above are linear functions or nonlinear functions or a combination of linear functions and nonlinear functions set according to the operation effect, or may be data models or the like set according to the operation effect.
Further, the control function set point of the rectifying tower top feed flow meter FI02 can be calculated according to the control function set points of the rectifying tower feed flow meter FI01 and the rectifying tower top discharge flow meter FI03, and specifically, the calculation formula of the control function set point of the rectifying tower top feed flow meter FI02 is as follows:
FI02＝FI03*β-FI01；
wherein FI03 is a control function set point of a rectifying tower top discharge flow meter FI 03; FI01 is the control function setpoint for the rectifying column feed flow meter FI 01; beta is a control parameter of the rectifying tower, and specifically is an index parameter of the operation effect of the rectifying tower.
Wherein, the high pure oxygen product output measurement value of rectifying column is: fpo=fi 01+fi02-FI03.
After the control function set point of the rectifying tower top feeding flow meter FI02 is calculated, based on the relation between the flow and the valve opening in the conventional high-purity oxygen rectifying process, the logic controller FUN01 automatically controls the opening of the rectifying tower top feeding control valve V02 according to a preset control operation logic, so that the feeding flow of the rectifying tower top is regulated to the set feeding flow, namely the feeding of the rectifying tower top is controlled.
The logic controller FUN01 of the invention combines the input high-purity oxygen output requirement, the feed oxygen content, the working pressure of the rectifying tower and other operation parameters, automatically calculates the control function set points of the rectifying tower feed flowmeter FI01, the rectifying tower top discharge flowmeter FI03 and the rectifying tower top feed flowmeter FI02, and correspondingly adjusts the opening of the rectifying tower feed control valve V01, the rectifying tower top discharge control valve V05 and the rectifying tower top feed control valve V02 according to the control values, thereby realizing the control of the feed and the discharge of the rectifying tower, realizing the steady-state control of the high-purity oxygen rectifying process and reducing the risk of the influence of the fluctuation of working conditions on the quality of high-purity oxygen products.
The method can rapidly, simply and conveniently pre-judge the quality of the high-purity oxygen product by collecting the running state of the rectifying tower, particularly the data such as the tower pressure and the temperature distribution of the rectifying tower and the like in real time and combining the impurity content change in the rectifying process. The quality of the high-purity oxygen product can be prejudged in advance and controlled and regulated in advance by monitoring the running pressure and the temperature distribution of the rectifying tower and the impurity content of the rectifying tower top in real time. The feed flow rate of the rectifying tower can influence the high-purity oxygen yield, and when the operating parameters of the rectifying tower deviate from target values, the logic controller FUN01 adjusts the operating parameters of the rectifying tower to the control target values by adjusting the rectifying tower top feed control valve V02 and the rectifying tower top discharge control valve V05.
Specifically, the temperature distribution of the rectifying tower is monitored in real time through a plurality of temperature probes, and detection data is fed back to the logic controller FUN01, and the control targets of the temperature distribution of the rectifying tower are as follows: the temperature distribution measurement value on the rectifying tower is in the range of [ Tm-2 sigma, tm+3 sigma ]; namely, temperature probes TE01, TE02, TE03, TE04 and TE05 on the rectifying tower have measurement values in the range of [ Tm-2 sigma, tm+3 sigma ]; wherein Tm is a temperature control value of the rectifying tower; sigma is the standard deviation.
The temperature profile control objective of the rectifying column is to set a temperature profile range in combination with a large number and long-term operation experience. When the temperature distribution of the rectifying tower is not in the controlled temperature distribution range, the deviation of the rectifying operation state from the target state can be reflected on the side surface, the logic controller FUN01 can trigger an alarm to prompt an operator to check the operation parameters and the control set points of the process, and the operation state is prevented from finally influencing the purity of the high-purity oxygen product. And then, according to the actual situation, an operator intervenes and adjusts the operation parameters of the rectifying tower, so that the operation risk is eliminated in advance, and the stability of product supply is improved.
The control targets of impurity content at the top of the rectifying tower are as follows:
O％>98.5％；
Y％<0.9％；
wherein O% is the oxygen content at the top of the rectifying tower; y% is the impurity content at the top of the rectifying tower; the impurity content at the top of the rectifying tower is obtained by a rectifying tower top analyzer AI 02.
When the impurity content measured by the rectifying tower top analyzer AI02 is higher than the control range, the trace impurity on the rectifying tower top is possibly accumulated to the rectifying tower kettle, which directly indicates that the impurity content of the high-purity oxygen product in the rectifying tower kettle can exceed the quality requirement in a short time, and the opening of the second rectifying tower feed valve V02 and the rectifying tower top discharge valve V05 are required to be timely adjusted, so that the impurity content is adjusted to the control range, and the defect of unqualified purity of the final high-purity oxygen product is avoided.
When O% and Y% are outside the control range, the logic controller FUN01 corrects the FI02 set point, namely:
FI02correct＝FI02+f(AI02)；
wherein f (AI 02) is a function of the impurity content at the top of the rectifying tower;
the functions described above are linear functions or nonlinear functions or a combination of linear functions and nonlinear functions set according to the operation effect, or may be data models or the like set according to the operation effect.
Furthermore, the invention combines a high-purity oxygen rectification feedforward control method and an on-line monitoring means, and can realize automatic load-changing operation of the rectifying tower according to the requirement of an operator, specifically, under the condition of allowable load-changing speed of the rectifying tower, high-purity oxygen yield demand FPO is modified to obtain new high-purity oxygen yield demand FPO2, a logic controller FUN01 calculates control function set points of a new rectifying tower feeding flowmeter FI01, a rectifying tower top discharging flowmeter FI03 and a rectifying tower top feeding flowmeter FI02 according to the new set high-purity oxygen yield demand FPO2, and the logic controller FUN01 automatically controls opening of a rectifying tower feeding control valve V01, a rectifying tower top discharging control valve V05 and a rectifying tower top feeding control valve V02 according to preset control operation logic, so that the load of the rectifying tower can be automatically adjusted to new operation parameters on the premise of ensuring purity by adjusting a plurality of process parameters such as rectifying tower pressure, rectifying tower inlet and outlet flow and the like.
Detecting the liquid level of a rectifying tower kettle through a tower kettle liquid level meter LI01, detecting the impurity content in the rectifying tower discharged high-purity oxygen product through a rectifying tower kettle analyzer AI03, feeding back detection data to a logic controller FUN01, and when the liquid level of the rectifying tower kettle and the impurity content in the rectifying tower discharged high-purity oxygen product meet the preset condition of the logic controller FUN01, namely when the liquid level meter LI01 detects that the liquid level of the rectifying tower kettle is high enough, and the analysis result of the rectifying tower kettle product analyzer AI03 is qualified, automatically controlling the opening of a rectifying tower kettle product control valve V04 by the logic controller FUN01 according to preset control operation logic, and outputting the qualified high-purity oxygen product stably.
In the present invention, the logic controller FUN01 is a DCS discrete control system or a PRC programmable controller, in which the calculation of the control set point and other related conventional and general control arithmetic logic are preset, and in this embodiment, the logic controller FUN01 is a DCS discrete control system.
In this embodiment, after the data such as the rectifying tower feeding flow meter FI01, the rectifying tower top feeding flow meter FI02 and the rectifying tower top discharging flow meter FI03 are determined, the opening degrees of the corresponding control valve V01, the control valve V02, the control valve V05 and the control valve V04 can be automatically controlled through the material balance of the rectifying tower and the logic operation set in the logic controller FUN01 in advance, that is, the control of the opening degrees of the control valves can be achieved by adopting the conventional technical means in the field.
According to the invention, the material balance and the operation parameters of the rectifying tower are monitored, the operation state of the rectifying tower is fed back in advance, the operation parameters of the rectifying tower are regulated in time, specifically, on the basis of setting the yield requirement of high-purity oxygen, the control function set point of the feeding flowmeter FI01 of the rectifying tower, the control function set point of the feeding flowmeter FI02 of the rectifying tower and the control function set point of the discharging flowmeter FI03 of the rectifying tower are automatically calculated through the logic controller FUN01 in combination with the oxygen content data in the feeding and the pressure data of the rectifying tower top, namely, the feeding flow of the rectifying tower and the set value of the discharging flow of the rectifying tower top, the logic controller FUN01 automatically controls the opening of the feeding control valve V02 of the rectifying tower top and the opening of the discharging control valve V05 of the rectifying tower top according to the flow set values, so that the steady-state control can be realized on the high-purity oxygen process, and the risk of the influence of the working condition fluctuation on the quality of the high-purity oxygen product is reduced.
The invention provides the method for realizing closed-loop feedforward control on the high-purity oxygen rectification process by combining online monitoring of the operating pressure, temperature distribution and impurity content of the rectification tower and through the intelligent logic controller and the plurality of control valves, and can pre-judge the quality of the high-purity oxygen product in advance for advanced control and adjustment.
Example 2
This embodiment is an embodiment 2 of a method and apparatus for controlling high purity oxygen distillation, and the difference between this embodiment and embodiment 1 is that: in the automatic load-changing process of the rectifying tower, the product analyzer AI03 of the rectifying tower kettle can collect the purity of the high-purity oxygen product at a specified time interval, the load change can be continuously carried out only under the condition that the purity of the high-purity oxygen product is proper, otherwise, the operation parameters of the rectifying tower are stable to the current state, and an alarm is triggered.
Example 3
This embodiment is an embodiment 3 of a method and apparatus for controlling high purity oxygen distillation, and the difference between this embodiment and embodiment 1 is that: in this embodiment, the logic controller FUN01 is a PRC programmable controller.
It is to be understood that the above examples of the present invention are provided by way of illustration only and not by way of limitation of the embodiments of the present invention. Other variations or modifications of the above teachings will be apparent to those of ordinary skill in the art. It is not necessary here nor is it exhaustive of all embodiments. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the invention are desired to be protected by the following claims.
Claims (10)
1. A high-purity oxygen rectification control method is characterized in that: comprising the following steps:
setting a high-purity oxygen yield demand FPO;
detecting the oxygen content in the feed through a rectifying tower feed analyzer AI01;
detecting the pressure at the top of the rectifying tower through a first pressure instrument PI 01;
feeding back oxygen content data in the detected feed and pressure data at the top of the rectifying tower to a logic controller FUN01, wherein the logic controller FUN01 automatically calculates a control function set point of a rectifying tower feed flow meter FI01, a control function set point of the rectifying tower top feed flow meter FI02 and a control function set point of a rectifying tower top discharge flow meter FI 03;
the logic controller FUN01 automatically controls the opening of the rectifying tower feed control valve V01, the opening of the rectifying tower top feed control valve V02 and the opening of the rectifying tower top discharge control valve V05 according to preset control arithmetic logic according to a control function set point of the rectifying tower feed flow meter FI01, a control function set point of the rectifying tower top feed flow meter FI02 and a control function set point of the rectifying tower top discharge flow meter FI03, so that the feed flow of the rectifying tower, the feed flow of the rectifying tower top and the rectifying tower top discharge flow are regulated to corresponding set flows;
monitoring the operating pressure of the rectifying tower in real time; and feeds back the detection data to the logic controller FUN01;
monitoring the temperature distribution of the rectifying tower in real time through a plurality of temperature probes, and feeding back detection data to a logic controller FUN01;
the impurity content of the rectifying tower top is monitored in real time through the rectifying tower top analyzer AI02, and when impurity content data of the rectifying tower top received by the logic controller FUN01 deviates from a control target, the logic controller FUN01 controls the opening of the rectifying tower top feeding control valve V02 and the opening of the rectifying tower top discharging control valve V05 according to preset control operation logic, so that the operation parameters of the rectifying tower are regulated to be within a control target range.
Detecting the liquid level of a rectifying tower kettle through a tower kettle liquid level meter LI01, detecting the impurity content in the high-purity oxygen product discharged from the rectifying tower through a rectifying tower kettle analyzer AI03, feeding back detection data to a logic controller FUN01, and when the liquid level of the rectifying tower kettle and the impurity content in the high-purity oxygen product discharged from the rectifying tower meet the preset condition of the logic controller FUN01, automatically controlling the opening of a rectifying tower kettle product control valve V04 by the logic controller FUN01 to stably output the qualified high-purity oxygen product.
2. The method for controlling the rectification of high purity oxygen according to claim 1, wherein:
the calculation formula of the control function set point of the rectifying tower feeding flowmeter FI01 is as follows:
FI01＝FPO/X％/R；
wherein FPO is the high-purity oxygen yield requirement, X% is the oxygen content in the feed, and R is the extraction rate of the rectifying tower;
the calculation formula of the control function set point of the rectifying tower top discharge flow meter FI03 is as follows:
f103 =f (PI 01), a function of the pressure at the top of the rectifying column;
the calculation formula of the control function set point of the rectifying tower top feeding flow meter FI02 is as follows:
FI02＝FI03*β-FI01；
wherein beta is a rectifying tower control parameter.
3. The method for controlling the rectification of high purity oxygen according to claim 1, wherein: the logic controller FUN01 is a DCS discrete control system or a PRC programmable controller.
4. The method for controlling the rectification of high purity oxygen according to claim 1, wherein: the control targets of the temperature distribution of the rectifying tower are as follows:
the temperature distribution measurement value on the rectifying tower is in the range of [ Tm-2 sigma, tm+3 sigma ];
wherein Tm is a temperature control value of the rectifying tower; sigma is the standard deviation.
5. The method for controlling the rectification of high purity oxygen according to claim 4, wherein: when the temperature distribution of the rectifying tower is not in the controlled temperature distribution range, the deviation of the rectifying operation state from the target state can be reflected on the side surface, and the logic controller FUN01 can trigger an alarm to prompt an operator to check the operation parameters and the control set points of the process.
6. The method for controlling the rectification of high purity oxygen according to claim 1, wherein: the control targets of the impurity content at the top of the rectifying tower are as follows:
O％>98.5％；
Y％<0.9％；
wherein O% is the oxygen content at the top of the rectifying tower; y% is the impurity content at the top of the rectifying tower.
7. The method for controlling the rectification of high purity oxygen according to claim 6, wherein: when O% and Y% are outside the control range, the logic controller FUN01 corrects the FI02 set point, namely:
FI02correct＝FI02+f(AI02)；
wherein f (AI 02) is a function of the impurity content at the top of the rectification column.
8. The method for controlling the rectification of high purity oxygen according to claim 1, wherein: when the rectification column is to be subjected to automatic load change, a new high-purity oxygen yield requirement FPO2 is set under the allowable rectification column load change rate, and the logic controller FUN01 recalculates control function set points of the rectification column feed flow meter FI01, the rectification column top discharge flow meter FI03 and the rectification column top feed flow meter FI 02.
9. The high purity oxygen distillation control device according to claim 8 wherein: in the automatic load-changing process of the rectifying tower, the purity of the high-purity oxygen product is collected in a specified time interval, the load change can be continuously carried out only under the condition that the purity of the high-purity oxygen product is proper, otherwise, the operation parameters of the rectifying tower are stabilized to the current state, and an alarm is triggered.
10. An apparatus for carrying out the high purity oxygen rectification control method according to any one of claims 1 to 9, characterized in that: the device comprises a rectifying tower, a feeding unit, a high-purity oxygen product output unit, a tower top gas discharge unit and a logic controller FUN01, wherein:
and a feeding unit: comprising a rectifying tower feeding flow meter FI01 for measuring the feeding flow rate of the rectifying tower, a rectifying tower feeding flow meter FI02 for measuring the feeding flow rate of the rectifying tower top, a rectifying tower feeding control valve V01 for controlling the feeding flow rate of the rectifying tower, a rectifying tower feeding control valve V02 for controlling the feeding flow rate of the rectifying tower top, and a rectifying tower feeding analyzer AI01 for measuring the oxygen content in the feeding;
high purity oxygen product output unit: comprises a rectifying tower kettle product control valve V04 for controlling the output quantity of the product;
overhead gas discharge unit: the system comprises a rectifying tower top discharge flow meter FI03 for measuring the tower top discharge flow, a rectifying tower top discharge control valve V05 for controlling the tower top discharge flow and a rectifying tower top analyzer AI02 for measuring the impurity content of the rectifying tower top;
the rectifying tower is connected with a plurality of temperature probes for monitoring the temperature distribution of the rectifying tower, a first pressure instrument PI01 for measuring the pressure at the top of the rectifying tower, a tower kettle liquid level instrument LI01 for measuring the liquid level of the rectifying tower and a rectifying tower kettle analyzer AI03 for collecting the impurity content in discharged high-purity oxygen products;
the rectifying tower feeding flow meter FI01, the rectifying tower top feeding flow meter FI02, the rectifying tower top discharging flow meter FI03, the rectifying tower feeding analyzer AI01 and the rectifying tower top analyzer AI02 are all in communication connection with the signal input end of the logic controller FUN01, and the rectifying tower feeding control valve V01, the rectifying tower top feeding control valve V02 and the rectifying tower top discharging control valve V05 are all in communication connection with the signal output end of the logic controller FUN01.
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| CN109745723A (en) * | 2018-12-29 | 2019-05-14 | 恒天纤维集团有限公司 | A kind of double tower continuous feeding distillation system and control method |
| CN110898454A (en) * | 2019-11-19 | 2020-03-24 | 万华化学集团股份有限公司 | Rectifying tower control method, storage medium and electronic equipment |
| CN112933638A (en) * | 2021-01-15 | 2021-06-11 | 海宁市英德赛电子有限公司 | 8N electronic grade high-purity ammonia rectification system and quality control method thereof |
| CN113304497A (en) * | 2021-07-30 | 2021-08-27 | 天津渤海石化有限公司 | Control method and control system for rectifying tower under non-constant pressure condition |
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