CN116047641A - Two-dimensional grating processing method and processing system - Google Patents
Two-dimensional grating processing method and processing system Download PDFInfo
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- CN116047641A CN116047641A CN202310095066.2A CN202310095066A CN116047641A CN 116047641 A CN116047641 A CN 116047641A CN 202310095066 A CN202310095066 A CN 202310095066A CN 116047641 A CN116047641 A CN 116047641A
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- light
- optical substrate
- reference light
- material layer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
Abstract
The invention discloses a two-dimensional grating processing method, which relates to the technical field of augmented reality and comprises the following steps: providing an optical substrate, wherein the optical substrate comprises a base and a photosensitive material layer arranged on the base; exposing the optical substrate, wherein the laser light source is used for dividing a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light through the light dividing unit, the object light penetrates through the base from the bottom of the optical substrate and irradiates the photosensitive material layer, the first reference light irradiates the photosensitive material layer from the top of the optical substrate, and the first reference light irradiates the photosensitive material layer from the top of the optical substrate; the first reference light and the second reference light are intersected, and the first reference light and the second reference light are respectively interfered with the object light to realize exposure; obtaining the two-dimensional grating with the honeycomb array structure. The invention also discloses a two-dimensional grating processing system, and the two-dimensional grating processing method and the two-dimensional grating processing system can reduce exposure parameter errors while moderately reducing the difficulty of constructing an optical path, and are beneficial to improving the processing efficiency of the two-dimensional grating.
Description
Technical Field
The invention relates to the technical field of augmented reality, in particular to a two-dimensional grating processing method and a two-dimensional grating processing system.
Background
A head-mounted display device based on augmented reality technology (Augmented Reality) has been attracting attention in recent years as a wearable smart device. A head mounted display device is one of the augmented reality devices, which includes a micro-display and an optical system, wherein the optical system projects an image from the micro-display to the user's eyes and allows the user to see the real world at the same time. Head mounted display devices have many practical and recreational applications.
At present, the two-dimensional grating is generally manufactured by adopting a double-beam double-exposure or four-beam single-exposure method, and the two-dimensional grating is manufactured by adopting a double-beam fractional exposure method, so that factors such as an incident angle and space symmetry among different exposure times are required to be considered, and the parameter errors of front and back double-exposure are larger than those of single exposure; the mode of manufacturing the two-dimensional grating by adopting four-beam single exposure has the problem of high difficulty in debugging an exposure light path and a component.
In view of this, it is necessary to design a two-dimensional grating processing method and processing system, which can reduce the difficulty of constructing the optical path and the exposure parameter error, thereby being beneficial to improving the processing efficiency of the two-dimensional grating.
Disclosure of Invention
The invention aims to provide a two-dimensional grating processing method and a processing system, which can reduce exposure parameter errors while moderately reducing the difficulty of light path construction, thereby being beneficial to improving the processing efficiency of the two-dimensional grating.
To achieve the purpose, the invention adopts the following technical scheme:
a two-dimensional grating processing method comprises the following steps:
s01, providing an optical substrate, wherein the optical substrate comprises a base and a photosensitive material layer arranged on the base;
s02, exposing the optical substrate, wherein a laser light source is used for dividing a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light through a light dividing unit, the object light penetrates through the base from the bottom of the optical substrate and irradiates the photosensitive material layer, the first reference light irradiates the photosensitive material layer from the top of the optical substrate, and the first reference light irradiates the photosensitive material layer from the top of the optical substrate; the first reference light and the second reference light intersect, and the first reference light and the second reference light interfere with the object light respectively to realize exposure;
s03, obtaining the two-dimensional grating with the honeycomb array structure.
Optionally, the object light is directed to the optical substrate perpendicular to the bottom surface of the base, the first reference light is directed to the photosensitive material layer parallel to a preset first direction, and the second reference light is directed to the photosensitive material layer parallel to a preset second direction.
Optionally, the laser light source splits a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light through the beam splitting unit, specifically:
the laser light source emits light rays;
the light rays are emitted into the light splitting unit and are divided into one beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light, the object light is emitted to the photosensitive material layer from the bottom of the optical substrate through a first transmission light path, the first reference light is emitted to the photosensitive material layer from the top of the optical substrate through a second transmission light path, and the second reference light is emitted to the photosensitive material layer from the top of the optical substrate through a third transmission light path.
Optionally, the plurality of beams of the first reference light are arranged in an array, and the plurality of beams of the second reference light are arranged in an array.
Optionally, the preset first direction and the preset second direction are symmetrical to each other about a preset symmetry plane.
A two-dimensional grating processing system comprises a holographic grating manufacturing device for exposing an optical substrate; the optical substrate comprises a base and a photosensitive material layer arranged on the base;
the holographic grating manufacturing device comprises a laser light source and a light splitting unit, wherein the light splitting unit is used for splitting light rays emitted by the laser light source into one beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light; the object light penetrates through the bottom of the optical substrate and irradiates the photosensitive material layer, the first reference light irradiates the photosensitive material layer from the top of the optical substrate, and the first reference light irradiates the photosensitive material layer from the top of the optical substrate, so that a two-dimensional grating with a honeycomb array structure is obtained.
Optionally, the light splitting unit further includes a first transmission light path for transmitting the object light, a second transmission light path for transmitting the first reference light, and a third transmission light path for transmitting the second reference light;
the light emitting end of the first transmission light path extends to one side of the bottom of the optical substrate so that the object light is perpendicular to the bottom surface of the optical substrate;
the second transmission light path extends to one side of the bottom of the optical substrate, a plurality of first light outlet holes are formed in the light outlet end of the second transmission light path, and the first light outlet holes are obliquely arranged relative to the optical substrate;
the third transmission light path extends to one side of the bottom of the optical substrate, the light emitting end of the third transmission light path is provided with a plurality of second light emitting holes, and the second light emitting holes are obliquely arranged relative to the optical substrate.
Optionally, the first light emitting hole is parallel to a preset first direction, and the second light emitting hole is parallel to a preset second direction;
the first direction and the second direction are symmetrical to each other about a predetermined symmetry plane, and the predetermined symmetry plane is perpendicular to the optical substrate.
Optionally, the two-dimensional grating processing system further comprises an industrial control system and a motion platform for bearing the optical substrate, wherein the motion platform, the laser light source and the light splitting unit are respectively and electrically connected with the industrial control system.
Optionally, the first transmission optical path includes a beam expander, a lens, and a reflecting prism.
Compared with the prior art, the invention has the following beneficial effects:
in this embodiment, the laser light source is configured to split a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light by the beam splitting unit, the object light penetrates through the base from the bottom of the optical substrate and irradiates the photosensitive material layer, the first reference light irradiates the photosensitive material layer from the top of the optical substrate, and the first reference light irradiates the photosensitive material layer from the top of the optical substrate; the first reference light and the second reference light are intersected, and the first reference light and the second reference light are respectively interfered with object light to realize exposure, so that a two-dimensional grating with a honeycomb array structure is obtained. In this embodiment, exposure is realized by using three light beams in different directions, which is lower in difficulty in setting up a light path compared with a four-light beam exposure mode, and in which exposure parameter errors are effectively reduced compared with a double-light beam exposure mode, thereby being beneficial to improving the production efficiency of the two-dimensional grating of the honeycomb array structure.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions of the prior art, the drawings which are used in the description of the embodiments or the prior art will be briefly described, it being obvious that the drawings in the description below are only some embodiments of the invention, and that other drawings can be obtained from these drawings without inventive faculty for a person skilled in the art.
The structures, proportions, sizes, etc. shown in the drawings are shown only in connection with the present disclosure, and are therefore not intended to limit the scope of the invention, since any modification, variation in proportions, or adjustment of the size, which would otherwise be used by those skilled in the art, would not have the essential significance of the present disclosure, would still fall within the scope of the present disclosure without affecting the efficacy or achievement of the present disclosure.
FIG. 1 is a step diagram of a two-dimensional grating processing method according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of an installation structure of a two-dimensional grating processing system according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of two-dimensional grating exposure molding according to an embodiment of the present invention;
fig. 4 is a schematic diagram of a two-dimensional grating structure according to an embodiment of the present invention.
Illustration of: 1. an optical substrate; 11. a substrate; 12. a photosensitive material layer; 2. a laser light source; 3. a light splitting unit; 101. a symmetry plane is preset.
Detailed Description
In order to make the objects, features and advantages of the present invention more comprehensible, the technical solutions in the embodiments of the present invention are described in detail below with reference to the accompanying drawings, and it is apparent that the embodiments described below are only some embodiments of the present invention, but not all embodiments of the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the description of the present invention, it should be understood that the directions or positional relationships indicated by the terms "upper", "lower", "top", "bottom", "inner", "outer", etc. are based on the directions or positional relationships shown in the drawings, are merely for convenience of describing the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention. It is noted that when one component is referred to as being "connected" to another component, it can be directly connected to the other component or intervening components may also be present.
The technical scheme of the invention is further described below by the specific embodiments with reference to the accompanying drawings.
Example 1
The embodiment of the invention provides a two-dimensional grating processing method, which can reduce exposure parameter errors while moderately reducing the difficulty of constructing an optical path, thereby being beneficial to improving the processing efficiency of a two-dimensional grating.
Referring to fig. 1, the two-dimensional grating processing method includes the following steps:
s01, providing an optical substrate 1, the optical substrate 1 comprising a base 11 and a photosensitive material layer 12 provided on the base 11.
S02, exposing the optical substrate 1, wherein the laser light source 2 is used for dividing a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light through the light dividing unit 3, the object light penetrates through the base 11 from the bottom of the optical substrate 1 and irradiates the photosensitive material layer 12, the first reference light irradiates the photosensitive material layer 12 from the top of the optical substrate 1, and the first reference light irradiates the photosensitive material layer 12 from the top of the optical substrate 1; the first reference light and the second reference light intersect, and the first reference light and the second reference light interfere with the object light respectively to realize exposure.
S03, obtaining the two-dimensional grating with the honeycomb array structure.
It should be noted that, in this embodiment, the method of exposing the photosensitive material layer 12 to the first reference light, the second reference light and the object light to prepare the two-dimensional grating may prepare the two-dimensional grating with a honeycomb array structure. Compared with the existing preparation method of double-beam secondary exposure, the method has smaller exposure parameter error; compared with the preparation method of four-path light path exposure, the construction difficulty of the light path is lower; the method is beneficial to faster construction of the optical path, ensures the quality of the preparation of the prepared two-dimensional grating, reduces the preparation difficulty and is beneficial to improving the production efficiency. The method for preparing the two-dimensional grating by exposing the photosensitive material layer 12 with the first reference light, the second reference light and the object light in the embodiment has the advantages of single exposure molding, high production stability and lower requirement on the accuracy of an optical path.
Alternatively, the object light is directed perpendicular to the bottom surface of the base 11 towards the optical substrate 1, the first reference light is directed parallel to a predetermined first direction towards the photosensitive material layer 12, and the second reference light is directed parallel to a predetermined second direction towards the photosensitive material layer 12.
It should be further noted that, in fig. 1, the direction of the object light, the direction of the first reference light, and the direction of the second reference light are all adjustable, so as to meet the purpose that the object light is perpendicularly directed to the photosensitive material layer 12, and the first reference light and the second reference light intersect, and the first reference light and the second reference light respectively interfere with the object light to achieve exposure.
Optionally, the laser light source 2 splits a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light by the beam splitting unit 3, specifically:
the laser light source 2 emits light; the light is incident into the light-splitting unit 3 and is split into a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light, the object light is emitted to the photosensitive material layer 12 from the bottom of the optical substrate 1 through the first transmission light path 301, the first reference light is emitted to the photosensitive material layer 12 from the top of the optical substrate 1 through the second transmission light path 302, and the second reference light is emitted to the photosensitive material layer 12 from the top of the optical substrate 1 through the third transmission light path 303.
It should be specifically noted that the object light covers the entire optical substrate 1, and the plurality of first reference light beams and the plurality of second reference light beams are obliquely incident, and the two-dimensional grating is formed by exposure.
In a specific implementation manner, the plurality of beams of first reference light are arranged in an array manner, the plurality of beams of second reference light are arranged in an array manner, and the specific arrangement manner can be specifically set according to specific parameters of the two-dimensional grating of the required honeycomb array structure. In this embodiment a two-dimensional grating is formed as in the honeycomb array structure of fig. 3.
In another specific implementation, the preset first direction and the preset second direction are symmetrical to each other about the preset symmetry plane 101, so that interference can be more conveniently formed.
Example two
The present embodiment discloses a two-dimensional grating processing system, please refer to fig. 2 to 4, including a holographic grating manufacturing device for exposing an optical substrate 1; the optical substrate 1 includes a base 11 and a photosensitive material layer 12 provided on the base 11;
the holographic grating manufacturing device comprises a laser light source 2 and a light splitting unit 3, wherein the light splitting unit 3 is used for splitting light rays emitted by the laser light source 2 into a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light; the object light penetrates through the base 11 from the bottom of the optical substrate 1 and irradiates the photosensitive material layer 12, the first reference light irradiates the photosensitive material layer 12 from the top of the optical substrate 1, and the first reference light irradiates the photosensitive material layer 12 from the top of the optical substrate 1, so as to obtain the two-dimensional grating with the honeycomb array structure.
In this embodiment, the light paths of one beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light are reasonably set, so that a two-dimensional grating with a required honeycomb array structure is formed in exposure.
It should be noted that, in this embodiment, the two-dimensional grating is a volume holographic grating, the photosensitive material layer 12 interferes in the photosensitive material layer 12 under the exposure of the light paths of the object light, the first reference light and the second reference light, and the refractive indexes of different illumination areas of the photosensitive material layer 12 are changed, so that the inside of the photosensitive material layer forms a periodic structure with different refractive indexes, and a two-dimensional grating with a required honeycomb array structure is formed.
Optionally, the light splitting unit 3 further includes a first transmission light path 301 for transmitting the object light, a second transmission light path 302 for transmitting the first reference light, and a third transmission light path 303 for transmitting the second reference light; the light emitting end of the first transmission light path 301 extends to one side of the bottom of the optical substrate 1, so that the object light is perpendicular to the bottom surface of the optical substrate 1; the second transmission light path 302 extends to one side of the bottom of the optical substrate 1, a plurality of first light emitting holes are formed in the light emitting end of the second transmission light path 302, and the first light emitting holes are obliquely arranged relative to the optical substrate 1; the third transmission light path 303 extends to one side of the bottom of the optical substrate 1, and the light emitting end of the third transmission light path 303 is provided with a plurality of second light emitting holes, and the second light emitting holes are obliquely arranged relative to the optical substrate 1.
Specifically, the laser light source 2 forms object light after being split by the beam splitting unit 3, and the first transmission optical path 301 includes a reflecting mirror, a beam splitter, a collimator lens, a focusing lens, and the like. The light splitting unit 3 comprises a first light splitting prism, a reference light beam expander, a collimating lens, a second light splitting prism, a first reflecting mirror, a second reflecting mirror, a diaphragm and a reference light beam splitter, wherein the first light splitting prism splits reference light and object light, and the object light propagates along a first transmission light path; the reference light is directed to the optical substrate 1 through the first collimating lens and the first focusing lens, and the second reference light is directed to the optical substrate 1 through the second collimating lens and the second focusing lens.
It should be noted that the exposure time may be 10s to 60s.
Optionally, the first light emitting hole is parallel to a preset first direction, and the second light emitting hole is parallel to a preset second direction; the first direction and the second direction are symmetrical to each other about a predetermined symmetry plane 101, and the predetermined symmetry plane 101 is perpendicular to the optical substrate 1, so as to satisfy the need for preparing a two-dimensional grating of a honeycomb array structure.
Optionally, the two-dimensional grating processing system further comprises an industrial control system 5 and a motion platform 4 for bearing the optical substrate 1, wherein the motion platform 4, the laser light source 2 and the light splitting unit 3 are respectively and electrically connected with the industrial control system 5.
Optionally, the first transmission optical path 301 includes a beam expander, a lens, a reflecting prism, and the like.
It should be added that the two-dimensional grating needs to be combined with the optical waveguide to form a grating waveguide display, that is, a coupling-out area and a coupling-in area are formed on the optical waveguide, the coupling-out area and the coupling-in area are both provided with a two-dimensional grating, the optical waveguide is a transparent parallel waveguide, light rays of the micro projector are coupled into the optical waveguide through the two-dimensional grating, incident light rays entering the optical waveguide meet the condition of total internal reflection, propagate inside the optical waveguide, are coupled out of the optical waveguide by another two-dimensional grating, and are projected to eyes of a user.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
The above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. The two-dimensional grating processing method is characterized by comprising the following steps:
providing an optical substrate comprising a base and a photosensitive material layer disposed on the base;
exposing the optical substrate, wherein a laser light source is used for dividing a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light through a light dividing unit, the object light penetrates through the base from the bottom of the optical substrate and irradiates the photosensitive material layer, the first reference light irradiates the photosensitive material layer from the top of the optical substrate, and the first reference light irradiates the photosensitive material layer from the top of the optical substrate; the first reference light and the second reference light intersect, and the first reference light and the second reference light interfere with the object light respectively to realize exposure;
obtaining the two-dimensional grating with the honeycomb array structure.
2. The method of claim 1, wherein the object light is directed perpendicular to the bottom surface of the base toward the optical substrate, the first reference light is directed parallel to a predetermined first direction toward the photosensitive material layer, and the second reference light is directed parallel to a predetermined second direction toward the photosensitive material layer.
3. The two-dimensional grating processing method according to claim 1, wherein the laser light source splits a beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light by a beam splitting unit, specifically:
the laser light source emits light rays;
the light rays are emitted into the light splitting unit and are divided into one beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light, the object light is emitted to the photosensitive material layer from the bottom of the optical substrate through a first transmission light path, the first reference light is emitted to the photosensitive material layer from the top of the optical substrate through a second transmission light path, and the second reference light is emitted to the photosensitive material layer from the top of the optical substrate through a third transmission light path.
4. A method of processing a two-dimensional grating according to claim 3, wherein a plurality of the first reference light arrays are arranged and a plurality of the second reference light arrays are arranged.
5. The two-dimensional grating processing method according to claim 2, wherein the preset first direction and the preset second direction are symmetrical to each other with respect to a preset symmetry plane.
6. A two-dimensional grating processing system is characterized by comprising a holographic grating manufacturing device for exposing an optical substrate; the optical substrate comprises a base and a photosensitive material layer arranged on the base;
the holographic grating manufacturing device comprises a laser light source and a light splitting unit, wherein the light splitting unit is used for splitting light rays emitted by the laser light source into one beam of object light, a plurality of beams of first reference light and a plurality of beams of second reference light; the object light penetrates through the bottom of the optical substrate and irradiates the photosensitive material layer, the first reference light irradiates the photosensitive material layer from the top of the optical substrate, and the first reference light irradiates the photosensitive material layer from the top of the optical substrate, so that a two-dimensional grating with a honeycomb array structure is obtained.
7. The two-dimensional grating processing system of claim 6, wherein the light splitting unit further comprises a first transmission light path for transmitting the object light, a second transmission light path for transmitting the first reference light, and a third transmission light path for transmitting the second reference light;
the light emitting end of the first transmission light path extends to one side of the bottom of the optical substrate so that the object light is perpendicular to the bottom surface of the optical substrate;
the second transmission light path extends to one side of the bottom of the optical substrate, a plurality of first light outlet holes are formed in the light outlet end of the second transmission light path, and the first light outlet holes are obliquely arranged relative to the optical substrate;
the third transmission light path extends to one side of the bottom of the optical substrate, the light emitting end of the third transmission light path is provided with a plurality of second light emitting holes, and the second light emitting holes are obliquely arranged relative to the optical substrate.
8. The two-dimensional grating processing system of claim 7, wherein the first light exit aperture is parallel to a preset first direction and the second light exit aperture is parallel to a preset second direction;
the first direction and the second direction are symmetrical to each other about a predetermined symmetry plane, and the predetermined symmetry plane is perpendicular to the optical substrate.
9. The two-dimensional grating processing system according to claim 6, further comprising an industrial control system and a motion platform for carrying an optical substrate, wherein the motion platform, the laser light source and the light splitting unit are respectively electrically connected with the industrial control system.
10. The two-dimensional grating processing system of claim 7, wherein the first transmission optical path comprises a beam expander, a lens, and a reflecting prism.
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| CN202310095066.2A CN116047641A (en) | 2023-01-17 | 2023-01-17 | Two-dimensional grating processing method and processing system |
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| CN202310095066.2A CN116047641A (en) | 2023-01-17 | 2023-01-17 | Two-dimensional grating processing method and processing system |
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