KR20200023058A - Exposure system using optical interference - Google Patents

Exposure system using optical interference Download PDF

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KR20200023058A
KR20200023058A KR1020180099421A KR20180099421A KR20200023058A KR 20200023058 A KR20200023058 A KR 20200023058A KR 1020180099421 A KR1020180099421 A KR 1020180099421A KR 20180099421 A KR20180099421 A KR 20180099421A KR 20200023058 A KR20200023058 A KR 20200023058A
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South Korea
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housing
light rays
incident
prism
photomask
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KR1020180099421A
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Korean (ko)
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KR102149579B1 (en
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박준한
마용원
윤단희
곽청렬
신보성
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부산대학교 산학협력단
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention relates to an exposure system utilizing optical interference and, more specifically, to an integrated exposure system capable of exposing light even on a curved surface by using optical interference. The exposure system according to the present invention includes a housing, a collimator, a lens unit, a housing, a photomask, and a prism. The housing is formed with an incidence hole through which light rays are introduced and an emitting hole through which light rays are injected. The collimator is mounted on the entrance. The lens unit is mounted on the housing in order to enlarge light rays dispersed from the collimator. The photomask is mounted on the housing so as to cut the light rays dispersed from the lens unit into a specific shape. The prism: has an incident unit having a plurality of incident surfaces capable of dividing light rays and a reflective unit having a plurality of reflective surfaces to reflect light rays incident to the incident surfaces to be interfered and an emitting surface where light rays reflected on the reflective surfaces escape; and is mounted on the emitting hole of the housing so that light rays dispersed from the photomask are incident on the plurality of incident surfaces, divided, and then reflected on the reflective surface so as to be dispersed onto the emitting surface. The present invention is able to implement a conventional complex optical system minimally by using a prism, integrate the optical system in the housing, design the same to be used as light rays emitted through optical fibers and thus, easily install a pattern at a desired position. Therefore, the pattern can be formed not only on a flat surface but also on a curved surface.

Description

광 간섭을 활용한 노광시스템{Exposure system using optical interference}Exposure system using optical interference

본 발명은 광 간섭을 활용한 노광시스템에 대한 것으로서, 더욱 상세하게는 광간섭을 활용하여 곡면에도 노광을 할 수 있는 일체형 노광시스템에 대한 것이다.The present invention relates to an exposure system utilizing optical interference, and more particularly, to an integrated exposure system capable of exposing to curved surfaces using optical interference.

노광시스템은 프린트 기판이나 액정 기판 등의 기판의 제조에 이용된다. 포토레지스트 등의 감광 재료를 도포한 기판 표면에, 소정의 패턴을 노광 시스템으로 노광하여, 그 후 에칭 공정에 의해 기판 상에 패턴을 형성하는 포토리소그패피법이 여러 가지의 분야에서 널리 응용되고 있고, 프린트 배선 기판이나 액정 기판 등에서 노광시스템이 활용되고 있다.An exposure system is used for manufacture of board | substrates, such as a printed circuit board and a liquid crystal substrate. The photolithographic method of exposing a predetermined pattern with an exposure system on a substrate surface coated with a photosensitive material such as a photoresist and then forming a pattern on the substrate by an etching process is widely applied in various fields. Exposure systems are utilized in printed wiring boards, liquid crystal substrates, and the like.

이러한 노광시스템은 복수의 광원과 상기 광원을 경로를 조절하는 복수의 렌즈들을 구비하여 광원의 간섭이 이루어지도록 하여 패턴을 형성한다.Such an exposure system includes a plurality of light sources and a plurality of lenses for controlling a path of the light source to form an interference pattern of the light source.

등록특허 제10-1591859호(등록일자 2016년 01월 29일)Patent Registration No. 10-1591859 (Registration date January 29, 2016) 등록특허 제10-0942351호(등록일자 2010년 02월 05일)Registered Patent No. 10-0942351 (Registration date February 05, 2010)

종래의 노광시스템은 복수의 광원과 상기 광원의 초점을 맞추기 위한 복수의 렌즈, 거울 및 프리즘들이 사용되었다. 즉 종래의 노광시스템은 복잡한 광학시스템을 사용함으로써 곡면에 특정한 패턴을 형성하기가 어렵다는 문제점이 있었다.Conventional exposure systems have used a plurality of light sources and a plurality of lenses, mirrors and prisms to focus the light sources. That is, the conventional exposure system has a problem that it is difficult to form a specific pattern on the curved surface by using a complex optical system.

또한 종래의 노광시스템은 원하는 패턴의 형상이 복잡해질 수록 요구되는 광학시스템이 기하급수적으로 복잡해지며, 이를 전부 정렬(alignment)하는 것은 굉장히 고난도의 테크닉 및 전문성이 필요로 한다는 문제점이 있었다.In addition, in the conventional exposure system, as the shape of the desired pattern becomes more complicated, the required optical system becomes exponentially complicated, and there is a problem that aligning all of them requires very difficult techniques and expertise.

본 발명은 상기의 문제점을 해결하기 위한 것이다. 본 발명은 구성요소를 단순화함으로써 원하는 위치에 초점 및 패턴을 용이하게 형성시킬 수 있는 노광시스템을 제공하는 것을 목적으로 한다.The present invention is to solve the above problems. An object of the present invention is to provide an exposure system that can easily form a focus and a pattern at a desired position by simplifying the components.

또한, 본 발명은 프리즘만 교체하면 다른 구성요소들의 추가나 변화없이 원하는 패턴을 형성시킬 수 있는 노광시스템을 제공하는 것을 목적으로 한다.It is also an object of the present invention to provide an exposure system capable of forming a desired pattern without adding or changing other components only by replacing the prism.

본 발명에 따른 노광시스템은 하우징과, 콜리메이터와, 렌저부와, 하우징과, 포토마스크와, 프리즘을 포함한다. 상기 하우징은 광선이 유입되는 입사구와, 상기 광선이 분사되는 출사구가 형성된다. 상기 콜리메이터는 상기 입사구에 장착된다. 상기 렌즈부는 상기 콜리메이터에서 분사되는 광선을 확대시키기 위하여 상기 하우징에 장착된다. 상기 포토마스크는 상기 렌즈부에서 분사되는 광선을 특정한 형태로 잘라주도록 상기 하우징에 장착된다. 상기 프리즘은 광선을 분할시킬 수 있는 복수의 입사면이 형성된 입사부와, 상기 입사면으로 입사된 광선을 간섭시킬 수 있게 반사하도록 복수의 반사면과 상기 반사면에서 반사된 광선이 빠져나가는 출사면이 형성된 반사부를 구비하며, 상기 포토마스크에서 분사된 광선이 상기 복수의 입사면의 입사되어 분할된 후 상기 반사면으로 반사되어 상기 출사면으로 분사될 수 있도록 상기 하우징의 출사구에 장착된다.An exposure system according to the present invention includes a housing, a collimator, a lenser portion, a housing, a photomask, and a prism. The housing is formed with an entrance hole through which light rays are introduced and an exit hole through which the light rays are injected. The collimator is mounted to the entrance port. The lens unit is mounted to the housing to enlarge the light beam emitted from the collimator. The photomask is mounted to the housing to cut a light beam emitted from the lens unit into a specific shape. The prism includes an incidence portion having a plurality of incidence planes capable of dividing light rays, and a plurality of reflection planes and an emission plane from which the light rays reflected from the reflection planes exit so as to reflect the interference light rays incident on the incidence planes. And a reflection part formed thereon, and the light beams emitted from the photomask are mounted on the exit port of the housing so that the light rays emitted from the photomask are incident and divided and then reflected to the reflection surface and jetted to the exit surface.

또한, 상기의 노광시스템은 상기 입사구로 레이저를 이송할 수 있게 콜리메이터에 연결된 광섬유를 더 포함하는 것이 바람직하다.In addition, the exposure system preferably further comprises an optical fiber connected to the collimator to transfer the laser to the inlet.

또한, 상기의 노광시스템에 있어서, 상기 포토마스크는 상기 프리즘의 입사부로 입사되는 광선이 사각형 형태로 입사되도록 사각형인 것이 바람직하다.In the above exposure system, the photomask is preferably rectangular so that light rays incident on the incidence portion of the prism are incident in a rectangular shape.

또한, 상기의 노광시스템에 있어서, 상기 프리즘은 상기 반사면이 알루미늄 또는 절연체로 거울 코팅되며, 상기 입사면과 출사면이 반사방지 코팅된 것이 바람직하다.In the above exposure system, it is preferable that the prism is mirror-coated with aluminum or an insulator, and the incident surface and the exit surface are anti-reflective coating.

또한, 상기의 노광시스템에 있어서, 상기 프리즘은 상기 입사부에 상기 입사면이 2개 또는 4개 형성되며, 상기 반사부에 상기 반사면이 2개 또는 4개 형성된 것이 바람직하다.In the above exposure system, it is preferable that the prism has two or four incidence surfaces formed on the incidence portion, and two or four reflective surfaces on the reflecting portion.

본 발명에 의하면, 프리즘을 사용함으로써 종래의 복잡한 광학시스템을 최소한으로 구현할 수 있으며 이를 하우징 내부에 일체화시킨 뒤 광섬유를 통해 나오는 광선으로 사용할 수 있게 설계하여 패턴을 원하는 위치에 쉽게 설치할 수 있다. 따라서 평면 뿐만 아니라 곡면에도 패턴을 형성할 수 있다.According to the present invention, by using a prism, it is possible to implement a conventional complex optical system to a minimum, and to integrate it into the housing and to use it as a light beam emitted through the optical fiber, so that the pattern can be easily installed in a desired position. Therefore, the pattern can be formed not only on the plane but also on the curved surface.

또한, 본 발명에 의하면 프리즘만 교체하는 다른 구성요소의 추가 없이 패턴을 변경시킬 수 있다.In addition, according to the present invention, the pattern can be changed without the addition of other components replacing only the prism.

도 1은 본 발명에 따른 노광시스템의 일 실시예의 개념도,
도 2는 도 1에 적용되는 프리즘의 실시예들,
도 3은 오각형 형태의 프리즘에서의 광경로 시뮬레이션,
도 4는 도 3의 시뮬레이션으로 제작되는 패턴
도 5는 피라미드 형태의 프리즘에서의 광경로 시뮬레이션,
도 6은 도 5의 시뮬레이션으로 제작되는 패턴이다.1 is a conceptual diagram of one embodiment of an exposure system according to the present invention;
2 illustrates embodiments of a prism applied to FIG. 1;
3 is a light path simulation in a pentagon-shaped prism,
4 is a pattern produced by the simulation of FIG.
5 is a light path simulation in a pyramid-shaped prism,
6 is a pattern produced by the simulation of FIG.

도 1 내지 도 6을 참조하여 본 발명에 따른 노광시스템의 일 실시예를 설명한다.An embodiment of an exposure system according to the present invention will be described with reference to FIGS.

본 발명에 따른 노광시스템은 하우징(10)과, 광섬유(13)와, 콜리메이터(15)와, 렌즈부(17)와, 포토마스크(19) 및 프리즘(20)을 포함한다.The exposure system according to the present invention includes a housing 10, an optical fiber 13, a collimator 15, a lens unit 17, a photomask 19 and a prism 20.

하우징(10)은 광선이 유입되는 입사구 및 유입된 광선이 분사되는 출사구가 형성된다.The housing 10 is formed with an entrance hole through which light rays are introduced and an exit hole through which the light rays are injected.

광섬유(13)는 입사구로 레이저 광선을 이송한다.The optical fiber 13 transfers the laser beam to the entrance hole.

콜리메이터(collimator, 15)는 하우징(10)의 입사구에서 광섬유(13)에 연결된다.A collimator 15 is connected to the optical fiber 13 at the entrance of the housing 10.

렌즈부(17)는 한 쌍의 렌즈(17a, 17b)를 구비하며, 콜리메이터(15)에서 분사되는 광선을 확대시키기 위하여 하우징(10)에 장착된다.The lens unit 17 includes a pair of lenses 17a and 17b and is mounted to the housing 10 to enlarge the light beams emitted from the collimator 15.

포토마스크(19)는 렌즈부(17)에서 분사되는 광선을 대면적 패턴 제작에 용이한 형태로 잘라주며, 본 실시예의 경우 사각 조리개로 구성되어 광선을 사각형 형태로 잘라준다.The photomask 19 cuts the light beams emitted from the lens unit 17 into a form that is easy to manufacture a large area pattern. In the present embodiment, the photomask 19 is formed of a square aperture to cut the light beams into a square shape.

프리즘(20)은 포토마스크(19)에서 분사되는 광선을 분할시킨 후 이송시켜 간섭되도록 한다. 이를 위하여 프리즘(20)은 입사부(21)와, 반사부(23)를 구비한다.The prism 20 divides the light beams emitted from the photomask 19 and then transfers them to cause interference. To this end, the prism 20 includes an incident part 21 and a reflecting part 23.

입사부(21)는 복수의 입사면(21a)이 형성되어 포토마스크(19)에서 분사되는 광선을 분할시킨다. 반사부(23)는 입사면(21a)에서 입사된 광선을 간섭시킬 수 있게 반사하도록 복수의 반사면(23a)과, 반사면(23a)에서 반사된 광선이 빠져나가는 출사면(23b)이 형성된다.The incident part 21 divides the light rays emitted from the photomask 19 by forming a plurality of incident surfaces 21a. The reflector 23 includes a plurality of reflecting surfaces 23a and an exit surface 23b through which light reflected from the reflecting surface 23a exits so as to reflect the light incident on the incident surface 21a so as to interfere. do.

입사면(21a)과 반사면(23a)은 형성시키는 패턴에 따라 다양한 개수로 형성될 수 있으며, 도 2의 (a)는 프리즘(20)이 오각형 형태로 형성되어 두 개의 입사면(21a)와 두 개의 반사면(23a)이 형성되고, 도 2의 (b)는 프리즘(20)이 피라미드 형태로 형성되어 네 개의 입사면(21a)과 네 개의 반사면(23a)이 형성된다.The incident surface 21a and the reflective surface 23a may be formed in various numbers according to the pattern to be formed. In FIG. 2 (a), the prism 20 is formed in a pentagonal shape to form two incident surfaces 21a and Two reflective surfaces 23a are formed, and in FIG. 2B, the prism 20 is formed in a pyramid shape to form four incidence surfaces 21a and four reflective surfaces 23a.

프리즘(20)은 포토마스크(19)에서 분사된 광선이 입사부(21)에서 각각의 입사면(21a)으로 분할되어 반사면(23a)에서 반사되어 출사면(23b)로 분사될 수 있도록 하우징(10)의 출사구에 장착된다. 이때 프리즘(20)은 포토마스크(19)에서 분사된 광선이 각각의 입사면(21a)에서 동일한 광량이 분할될 수 있도록 입사면(21a)이 형성되는 것이 바람직하다.The prism 20 has a housing such that the light beams emitted from the photomask 19 are divided into the respective incidence surfaces 21a at the incidence portion 21 and reflected at the reflection surface 23a to be ejected to the emission surface 23b. It is attached to the exit port of (10). In this case, it is preferable that the incident surface 21a is formed in the prism 20 so that the light beams emitted from the photomask 19 can be divided in the same amount of light on each incident surface 21a.

또한, 입사면(21a)과 출사면(23b)은 예상치 못한 반사로 인한 패턴의 에러를 최소화시키기 위하여 반사율을 낮추고 투과율을 높일 수 있도록 반사방지 코팅(Antireflection coating)이 되는 것이 바람직하고, 반사면(23a)은 손실을 최소화시키면서 반사할 수 있도록 거울 코팅이 되는 것이 바람직하다. 거울 코팅은 알루미늄이나 절연체 등으로 코팅될 수 있다.In addition, the incidence surface 21a and the outgoing surface 23b may be an antireflection coating so as to lower the reflectance and increase the transmittance in order to minimize the error of the pattern due to the unexpected reflection. 23a) is preferably mirror coated so that it can reflect with minimal loss. The mirror coating may be coated with aluminum or an insulator.

도 2의 (a)와 같이 오각형 형태의 프리즘(20)을 사용할 경우 광선은 프리즘(20)에서 2개의 광선으로 분리되어 광경로는 도 3과 같다. 이때 2개의 광선이 간섭하여 발생되는 패턴은 도 4와 같다. 그리고 도 2의 (b)와 같이 피라미드 형태의 프리즘(20)을 사용할 경우 광선은 프리즘(20)에서 4개의 광선으로 분리되어 광경로는 도 5와 같다. 이때 4개의 광선이 갑섭하여 발생되는 패턴은 도 6과 같다.In the case of using the pentagonal prism 20 as shown in FIG. 2A, the light beam is separated into two light beams in the prism 20, and the optical path is as shown in FIG. 3. At this time, the pattern generated by the interference of the two light beams is shown in FIG. In addition, when using the pyramid-shaped prism 20 as shown in (b) of FIG. 2, the light beam is separated into four light beams in the prism 20, and the optical path is as shown in FIG. 5. At this time, the pattern generated by the interference of the four light rays is shown in FIG.

본 실시예의 경우 광섬유(13)로 레이저가 이송되면 레이저 광선은 콜리메이터(15)와, 렌즈부(17) 및 포토마스크(19)를 통하여 프리즘(20)의 입사부(21)로 전달된다. 입사부(21)에서 광선은 입사면(21a)의 개수 만큼 분할되어 반사면(23a)에서 반사되어 간섭 패턴이 형성된다. 여기서 간섭 패턴의 모양은 프리즘(20)을 교환하면 변경시킬 수 있다. In the present embodiment, when the laser is transferred to the optical fiber 13, the laser beam is transmitted to the incident part 21 of the prism 20 through the collimator 15, the lens part 17, and the photomask 19. In the incident part 21, the light beam is divided by the number of incident surfaces 21a and reflected by the reflective surface 23a to form an interference pattern. Here, the shape of the interference pattern can be changed by replacing the prism 20.

또한 곡면에 패턴을 형성할 경우에는 노광시스템을 곡면을 따라 이동시켜야 한다. 본 실시예의 경우 하나의 하우징(10) 내부에 노광시스템이 구성되므로 하우징(10)을 곡면을 따라 이동시키면 곡면에 패턴을 형성시킬 수 있다. 즉 곡면의 경우에도 용이하게 노광을 할 수 있다.In addition, when the pattern is formed on the curved surface, the exposure system must be moved along the curved surface. In the present embodiment, since the exposure system is configured inside one housing 10, a pattern may be formed on the curved surface by moving the housing 10 along the curved surface. That is, even in the case of a curved surface, exposure can be performed easily.

10 : 하우징 13 : 광섬유
15 : 콜리메이터 17 : 렌즈부
19 : 포토마스크 20 : 프리즘
21 : 입사부 21a : 입사면
23 : 반사부 23a : 반사면
23b : 출사면10 housing 13 optical fiber
15 collimator 17 lens unit
19: photomask 20: prism
21: incident part 21a: incident surface
23: reflecting unit 23a: reflecting surface
23b: exit surface

Claims (5)

광선이 유입되는 입사구와, 상기 광선이 분사되는 출사구가 형성된 하우징과,
상기 입사구에 장착된 콜리메이터와,
상기 콜리메이터에서 분사되는 광선을 확대시키기 위하여 상기 하우징에 장착된 렌즈부와,
상기 렌즈부에서 분사되는 광선을 특정한 형태로 잘라주도록 상기 하우징에 장착된 포토마스크와,
광선을 분할시킬 수 있는 복수의 입사면이 형성된 입사부와, 상기 입사면으로 입사된 광선을 간섭시킬 수 있게 반사하도록 복수의 반사면과 상기 반사면에서 반사된 광선이 빠져나가는 출사면이 형성된 반사부를 구비하며, 상기 포토마스크에서 분사된 광선이 상기 복수의 입사면의 입사되어 분할된 후 상기 반사면으로 반사되어 상기 출사면으로 분사될 수 있도록 상기 하우징의 출사구에 장착된 프리즘을 포함하는 것을 특징으로 하는 노광시스템.A housing having an entrance hole through which light rays are introduced, an exit hole through which the light rays are injected, and
A collimator mounted at the entrance hole;
A lens unit mounted to the housing to enlarge the light beam emitted from the collimator,
A photomask mounted to the housing to cut the light beam emitted from the lens into a specific shape;
An incidence portion formed with a plurality of incidence planes capable of dividing the light beams, and a reflection in which a plurality of reflection surfaces and an emission surface from which the light rays reflected from the reflection planes exit so as to reflect the interference light rays incident on the incidence surface And a prism mounted to an exit port of the housing such that the light beams emitted from the photomask are incident and split of the plurality of incidence surfaces and then reflected to the reflective surface and jetted to the exit surface. An exposure system characterized by the above-mentioned. 제1항에 있어서,
상기 입사구로 레이저를 이송할 수 있게 콜리메이터에 연결된 광섬유를 더 포함하는 것을 특징으로 하는 노광시스템.The method of claim 1,
And an optical fiber connected to a collimator to transfer the laser to the entrance hole. 제2항에 있어서,
상기 포토마스크는 상기 프리즘의 입사부로 입사되는 광선이 사각형 형태로 입사되도록 사각형인 것을 특징으로 하는 노광시스템.The method of claim 2,
The photomask is an exposure system, characterized in that the square so that the light incident to the incident portion of the prism is incident in a rectangular shape. 제3항에 있어서,
상기 프리즘은 상기 반사면이 알루미늄 또는 절연체로 거울 코팅되며, 상기 입사면과 출사면이 반사방지 코팅된 것을 특징으로 하는 노광시스템.The method of claim 3,
And said prism is mirror-coated with aluminum or an insulator, and said entrance and exit surfaces are anti-reflective coating. 제4항에 있어서,
상기 프리즘은 상기 입사부에 상기 입사면이 2개 또는 4개 형성되며, 상기 반사부에 상기 반사면이 2개 또는 4개 형성된 것을 특징으로 하는 노광시스템.The method of claim 4, wherein
The prism has two or four incidence surfaces formed on the incidence portion, and two or four reflective surfaces are formed on the reflection portion.
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KR100856539B1 (en) * 2007-03-27 2008-09-04 주식회사 코렌 Prism for forming three images and camera comprising the same
KR100942351B1 (en) 2005-04-08 2010-02-12 우시오덴키 가부시키가이샤 Exposure apparatus
KR101591859B1 (en) 2014-04-21 2016-02-04 주식회사 필옵틱스 exposure apparatus using LED

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JPS6373701U (en) * 1986-11-04 1988-05-17
JPH0611609A (en) * 1992-06-26 1994-01-21 Matsushita Electric Ind Co Ltd Exposure device
JP2004093861A (en) * 2002-08-30 2004-03-25 Matsushita Electric Ind Co Ltd Optical coupling component
KR100942351B1 (en) 2005-04-08 2010-02-12 우시오덴키 가부시키가이샤 Exposure apparatus
KR20080060963A (en) * 2006-12-27 2008-07-02 한국원자력연구원 Plane light transformation apparatus and flow system having the same
KR100856539B1 (en) * 2007-03-27 2008-09-04 주식회사 코렌 Prism for forming three images and camera comprising the same
KR101591859B1 (en) 2014-04-21 2016-02-04 주식회사 필옵틱스 exposure apparatus using LED

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