CN116040319A - Mechanical arm for carrying wafer cleaning - Google Patents

Mechanical arm for carrying wafer cleaning Download PDF

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Publication number
CN116040319A
CN116040319A CN202211304681.1A CN202211304681A CN116040319A CN 116040319 A CN116040319 A CN 116040319A CN 202211304681 A CN202211304681 A CN 202211304681A CN 116040319 A CN116040319 A CN 116040319A
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CN
China
Prior art keywords
wafer
carrying
rotating
screw
assembly
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Granted
Application number
CN202211304681.1A
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Chinese (zh)
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CN116040319B (en
Inventor
李继忠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Kepeida Semiconductor Technology Co ltd
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Jiangsu Kepeida Semiconductor Technology Co ltd
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Priority to CN202211304681.1A priority Critical patent/CN116040319B/en
Publication of CN116040319A publication Critical patent/CN116040319A/en
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Publication of CN116040319B publication Critical patent/CN116040319B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/07Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers Not used, see H01L21/677
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B11/00Machines or apparatus for drying solid materials or objects with movement which is non-progressive
    • F26B11/18Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The invention discloses a carrying mechanical arm for cleaning a wafer, which relates to the technical field of wafer processing and comprises a fixed underframe, wherein two moving blocks are slidably arranged on the fixed underframe, the moving blocks are rotationally connected with rotating rods, the two rotating rods are rotationally connected with a lifting plate, the top of the lifting plate is fixedly provided with a lifting frame, the lifting frame is rotationally provided with a rotating arm, the rotating arm is fixedly provided with a protective shell, a rotating chain is rotationally arranged in the protective shell, the rotating chain is fixedly provided with a plurality of mounting plates, the protective shell is arranged, the wafer is placed in the protective shell in the carrying process of the wafer, the wafer can be effectively protected in the carrying process, meanwhile, the falling ash on the surface of the wafer in the carrying process can be avoided, and the rotating chain capable of circularly rotating is arranged, so that the mechanical arm can continuously take out a plurality of wafers on the wafer frame, and the mechanical arm is not required to repeatedly move to carry the wafer.

Description

Mechanical arm for carrying wafer cleaning
Technical Field
The invention relates to the technical field of wafer processing, in particular to a mechanical arm for carrying, which is used for cleaning a wafer.
Background
A wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the wafer has a circular shape. With the development of semiconductor technology, the need for wafers is increasing, and in the wafer processing process, the residual organic matters, particles, metal impurities, natural oxide layers, quartz, plastics and other pollutants on the surfaces of the wafers need to be removed according to the needs, and the surface characteristics of the wafers are not damaged. For this reason, cleaning is required in the wafer manufacturing process, and the wafer is required to be transported by a robot arm before and after the cleaning.
Wafers are placed on the wafer rack before cleaning, the wafer on the wafer rack is required to be taken down by the mechanical arm during cleaning, and the current mechanical arm cannot take out a plurality of wafers on the wafer rack, so that the mechanical arm is required to be repeatedly moved to carry the wafers during cleaning of the wafers. And in the handling process, the wafer is easy to damage due to false touch, and the mechanical arm is required to wait for drying equipment to dry the wafer and then carry the wafer after cleaning, so that the processing efficiency of the wafer is low.
Disclosure of Invention
Aiming at the defects of the prior art, the invention aims to provide a mechanical arm for carrying for cleaning wafers.
In order to achieve the above purpose, the present invention provides the following technical solutions:
the utility model provides a mechanical arm for abluent transport of wafer, includes fixed chassis, slidable mounting has two movable blocks on the fixed chassis, the movable block rotates and connects the head rod, and two head rods all rotate and connect the jacking board, jacking board top fixed mounting has the jacking frame, rotate on the jacking frame and install the swinging boom, fixed mounting has the protective housing on the swinging boom, rotatory chain is installed to the protective housing internal rotation, fixed mounting has a plurality of mounting panels on the rotatory chain, fixed mounting has the mounting bracket on the mounting panel, slidable mounting has two transport subassemblies on the mounting bracket, transport subassembly is used for driving upset subassembly horizontal migration, upset subassembly is used for driving the transport arm rotation, slidable mounting has two stopper on the transport arm, protective housing inner wall top slidable mounting has drying fan, get to put mouthful has been seted up to protective housing one side.
Further, fixed mounting has adjusting part on the fixed chassis, adjusting part is used for driving first lead screw rotation, first lead screw both ends screw face is the symmetry setting along the middle part, two movable blocks of first lead screw both ends threaded connection.
Further, a rotating assembly is fixedly arranged in the jacking frame and used for driving the rotating arm to rotate.
Further, two rotary disks are rotatably mounted in the protective housing, the two rotary disks are in transmission connection through a rotary chain, a driving assembly is fixedly mounted on the outer wall of the protective housing, and the driving assembly is used for driving the rotary disks to rotate.
Further, fixed mounting has adjustment subassembly on the mounting bracket, adjustment subassembly is used for driving the second lead screw rotation, second lead screw both ends screw thread face is the symmetry setting along the middle part, two transport subassemblies of second lead screw both ends threaded connection.
Further, the third lead screw is rotationally arranged in the carrying arm, threaded surfaces at two ends of the third lead screw are symmetrically arranged along the middle part, and two limiting blocks are connected with two ends of the third lead screw in a threaded mode.
Further, the limiting component is fixedly installed in the carrying arm and used for driving the first gear to rotate, the second gear is fixedly installed on the third screw rod, and the first gear and the second gear are meshed with each other.
Further, the outer wall of the protective housing is fixedly provided with a moving assembly, the moving assembly is used for driving a fourth screw rod to rotate, and the fourth screw rod is in threaded connection with the drying fan.
Compared with the prior art, the invention has the following beneficial effects:
1. the wafer handling device comprises a wafer rack, a wafer, a protective shell, a mechanical arm, a rotating chain, a mechanical arm and a wafer, wherein the protective shell is arranged in the wafer handling process, the wafer is placed in the protective shell, the wafer can be effectively protected in the handling process, meanwhile, the dust falling on the surface of the wafer in the handling process can be avoided, the rotating chain capable of circularly rotating is arranged, the mechanical arm can continuously take out a plurality of wafers on the wafer rack, and the mechanical arm is not required to repeatedly move to carry the wafer. The movable drying fan is arranged in the protective shell, the position of the drying fan can be adjusted, and a plurality of wafers can be uniformly dried by matching with the wafers which circularly move in the protective shell, and the wafers can be dried while being carried;
2. set up two transport subassemblies that can slide on the mounting bracket, not only can take out two wafers on the wafer frame simultaneously, can adjust the distance of two transport arms according to the interval that the wafer on the wafer frame established simultaneously, can adapt to the transport of wafer on the different wafer frames, set up two stopper that can adjust on the transport arm, satisfy and fix a position the wafer of equidimension not.
Drawings
FIG. 1 is a schematic view of a handling robot for wafer cleaning;
FIG. 2 is a cross-sectional view of a stationary chassis of the present invention;
FIG. 3 is a cross-sectional view of the jack-up stand of the present invention;
fig. 4 is a cross-sectional view of the protective case of the present invention;
FIG. 5 is an installation view of the arm of the present invention;
FIG. 6 is a cross-sectional view of the mounting bracket of the present invention;
fig. 7 is a cross-sectional view of a transfer arm of the present invention.
100. Fixing the underframe; 101. an adjustment assembly; 102. a first lead screw; 103. a moving block; 104. rotating a connecting rod; 105. a jacking plate; 106. a jacking frame; 107. a rotating assembly; 108. a rotating arm; 109. a protective shell; 110. a drive assembly; 111. a rotating disc; 112. rotating the chain; 113. a mounting plate; 114. a mounting frame; 115. an adjustment assembly; 116. a second lead screw; 117. a handling assembly; 118. a flip assembly; 119. a carrying arm; 120. a limit component; 121. a first gear; 122. a second gear; 123. a third lead screw; 124. a limiting block; 125. a taking and placing port; 126. a moving assembly; 127. a fourth lead screw; 128. and a drying fan.
Detailed Description
Example 1
Referring to fig. 1 to 5, a mechanical arm for carrying a wafer for cleaning, the mechanical arm comprises a fixed chassis 100, two moving blocks 103 are slidably mounted on the fixed chassis 100, an adjusting assembly 101 is fixedly mounted on the fixed chassis 100, the adjusting assembly 101 can be a motor and a revolving cylinder, the adjusting assembly 101 is used for driving a first screw 102 to rotate, threaded surfaces at two ends of the first screw 102 are symmetrically arranged along the middle part, and two ends of the first screw 102 are in threaded connection with the two moving blocks 103. The movable block 103 is rotationally connected with the rotating rods 104, the two rotating rods 104 are rotationally connected with the jacking plate 105, the jacking frame 106 is fixedly arranged at the top of the jacking plate 105, the rotating assembly 107 is fixedly arranged in the jacking frame 106, the rotating assembly 107 can be a motor or a rotary cylinder, and the rotating assembly 107 is used for driving the rotary arm 108 to rotate. The rotating arm 108 is rotatably mounted on the jacking frame 106, the protective shell 109 is fixedly mounted on the rotating arm 108, the rotating chain 112 is rotatably mounted in the protective shell 109, the two rotating discs 111 are in transmission connection through the rotating chain 112, the driving assembly 110 is fixedly mounted on the outer wall of the protective shell 109, the driving assembly 110 can be a motor or a rotary cylinder, and the driving assembly 110 is used for driving the rotating discs 111 to rotate. A plurality of mounting plates 113 are fixedly mounted on the rotary chain 112, a mounting frame 114 is fixedly mounted on the mounting plates 113, a drying fan 128 is slidably mounted on the top of the inner wall of the protective shell 109, and a taking and placing opening 125 is formed in one side of the protective shell 109. The outer wall of the protective housing 109 is fixedly provided with a moving assembly 126, the moving assembly 126 can be a motor or a revolving cylinder, the moving assembly 126 is used for driving a fourth screw rod 127 to rotate, and the fourth screw rod 127 is in threaded connection with a drying fan 128. The protection shell 109 is arranged, the wafer is placed in the protection shell 109 in the carrying process of the wafer, the wafer can be effectively protected in the carrying process, meanwhile, the ash falling on the surface of the wafer in the carrying process can be avoided, and the rotating chain 112 capable of circularly rotating is arranged, so that the mechanical arm can continuously take out a plurality of wafers on the wafer rack, and the mechanical arm is not required to repeatedly move to carry the wafer. The movable drying fan 128 is provided in the protective case 109, the position of the drying fan 128 can be adjusted, and a plurality of wafers can be uniformly dried in cooperation with the wafers which are circulated in the protective case 109.
Example 2
Referring to fig. 6 to 7, on the basis of embodiment 1, two carrying assemblies 117 are slidably mounted on the mounting frame 114, the carrying assemblies 117 may be cylinders, oil cylinders, the carrying assemblies 117 are used for driving the turning assemblies 118 to horizontally move, the turning assemblies 118 may be motors and turning cylinders, the turning assemblies 118 are used for driving the carrying arms 119 to rotate, and two limiting blocks 124 are slidably mounted on the carrying arms 119. The mounting frame 114 is fixedly provided with an adjusting assembly 115, the adjusting assembly 115 can be a motor and a rotary cylinder, the adjusting assembly 115 is used for driving a second screw rod 116 to rotate, thread surfaces at two ends of the second screw rod 116 are symmetrically arranged along the middle part, and two conveying assemblies 117 are connected at two ends of the second screw rod 116 in a threaded manner. The third lead screw 123 is rotatably installed on the carrying arm 119, threaded surfaces at two ends of the third lead screw 123 are symmetrically arranged along the middle part, and two limiting blocks 124 are in threaded connection with two ends of the third lead screw 123. The carrying arm 119 is fixedly provided with a limiting assembly 120, the limiting assembly 120 can be a motor or a revolving cylinder, the limiting assembly 120 is used for driving the first gear 121 to rotate, the third screw 123 is fixedly provided with a second gear 122, and the first gear 121 and the second gear 122 are meshed with each other. The two carrying assemblies 117 capable of sliding are arranged on the mounting frame 114, so that not only can two wafers on the wafer frame be taken out simultaneously, but also the distance between the two carrying arms 119 can be adjusted according to the distance between the wafers on the wafer frame, so that the wafer carrying device can adapt to carrying of the wafers on different wafer frames, and two adjustable limiting blocks 124 are arranged on the carrying arms 119, so that the wafers with different sizes can be positioned.
Working principle:
step one: when a wafer needs to be taken, the adjusting component 101 drives the first screw 102 to rotate, the first screw 102 drives the two moving blocks 103 to move oppositely, the moving blocks 103 drive the lifting plate 105 to lift through the rotating rod 104, the lifting plate 105 drives the lifting frame 106 to lift, the lifting frame 106 drives the protecting shell 109 to lift through the rotating arm 108, the rotating component 107 on the lifting frame 106 drives the rotating arm 108 to rotate, the rotating arm 108 drives the protecting shell 109 to rotate to the side of the wafer frame, the adjusting component 115 drives the second screw 116 to rotate, the second screw 116 drives the two carrying components 117 to move oppositely, the carrying components 117 drive the carrying arm 119 to move through the overturning component 118, further, the distance between the two carrying arms 119 is adjusted according to the distance between the wafers on the wafer rack, the adjusted carrying assembly 117 pushes the overturning assembly 118 to move, the carrying arms 119 move out from the position of the taking and placing port 125, the two carrying arms 119 are inserted below the two wafers on the wafer rack, the protective shell 109 is lifted, the two carrying arms 119 support the two wafers, the first gear 121 is driven to rotate by the rear limiting assembly 120, the first gear 121 is matched with the second gear 122 to drive the third lead screw 123 to rotate, the third lead screw 123 drives the two limiting blocks 124 to move in opposite directions, the two limiting blocks 124 are contacted with the two sides of the wafers and limit the wafers, and the two carrying arms 119 are retracted into the protective shell 109;
step two: the driving assembly 110 drives the rotating discs 111 to rotate, the two rotating discs 111 drive the rotating chains 112 to rotate, the rotating chains 112 drive the plurality of mounting plates 113 to circularly move, the next mounting plate 113 is adjusted to the side of the taking-out opening 125, the two carrying arms 119 on the mounting plate 113 repeatedly take down the two wafers on the wafer rack, when the wafers on the wafer rack are all taken down, the protective shell 109 moves to the side of the cleaning equipment, the overturning assembly 118 beside the taking-out opening 125 drives the carrying arms 119 to rotate 180 degrees, the carrying arms 119 are moved out of the protective shell 109, the wafers are placed at the cleaning position, the two limiting blocks 124 cancel limiting the wafers, the carrying arms 119 are retracted into the protective shell 109, after the wafers are cleaned, the two limiting blocks 124 on the corresponding carrying arms 119 take out the cleaned wafers, the subsequent wafers repeatedly clean the operation, the rotating chains 112 drive the protective shell 109 to circularly rotate in the protective shell 109, the moving assembly 126 drives the fourth screw 127 to rotate, the fourth screw 127 drives the fan 128 to horizontally move, the position of the drying fan 128 is adjusted, and the fan 128 circularly moves the wafer in the protective shell 109 to circularly dry the wafer 109.
The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above examples, and all technical solutions belonging to the concept of the present invention belong to the protection scope of the present invention. It should be noted that modifications and adaptations to those skilled in the art without departing from the principles of the present invention are intended to be considered as protecting the scope of the present template.

Claims (8)

1. Be used for abluent transport arm of wafer, a serial communication port, including fixed chassis (100), slidable mounting has two movable blocks (103) on fixed chassis (100), movable block (103) rotate and connect swing rod (104), and two swing rod (104) all rotate and connect jacking board (105), jacking board (105) top fixed mounting has jacking frame (106), install swinging boom (108) on jacking frame (106) rotation, fixed mounting has protective housing (109) on swinging boom (108), rotatable mounting has rotatory chain (112) in protective housing (109), fixed mounting has a plurality of mounting plates (113) on rotatory chain (112), fixed mounting has mounting bracket (114) on mounting bracket (113), slidable mounting has two transport subassembly (117) on mounting bracket (114), transport subassembly (117) are used for driving overturning subassembly (118) horizontal migration, overturning subassembly (118) are used for driving the rotation of transport arm (119), slidable mounting has two stopper (124) on transport arm (119), rotatable mounting has rotatory opening of protective housing (109) top (125), protective housing (109) slidable mounting has, top opening (125).
2. The mechanical arm for carrying used for cleaning wafers according to claim 1, wherein an adjusting assembly (101) is fixedly installed on the fixed underframe (100), the adjusting assembly (101) is used for driving a first screw (102) to rotate, threaded surfaces at two ends of the first screw (102) are symmetrically arranged along the middle part, and two moving blocks (103) are connected at two ends of the first screw (102) in a threaded manner.
3. The mechanical arm for carrying used for cleaning wafers according to claim 2, wherein a rotating assembly (107) is fixedly installed in the jacking frame (106), and the rotating assembly (107) is used for driving the rotating arm (108) to rotate.
4. A handling robot arm for wafer cleaning according to claim 3, wherein two rotating discs (111) are rotatably mounted on the protective housing (109), the two rotating discs (111) are in transmission connection through a rotating chain (112), a driving assembly (110) is fixedly mounted on the outer wall of the protective housing (109), and the driving assembly (110) is used for driving the rotating discs (111) to rotate.
5. The mechanical arm for carrying for wafer cleaning according to claim 4, wherein an adjusting assembly (115) is fixedly installed on the mounting frame (114), the adjusting assembly (115) is used for driving a second screw (116) to rotate, threaded surfaces at two ends of the second screw (116) are symmetrically arranged along the middle part, and two carrying assemblies (117) are connected at two ends of the second screw (116) in a threaded manner.
6. The mechanical arm for carrying used for cleaning wafers according to claim 1, wherein a third screw rod (123) is rotatably installed in the carrying arm (119), threaded surfaces at two ends of the third screw rod (123) are symmetrically arranged along the middle, and two limiting blocks (124) are connected at two ends of the third screw rod (123) in a threaded manner.
7. The mechanical arm for carrying used for cleaning wafers according to claim 6, wherein a limiting assembly (120) is fixedly installed in the carrying arm (119), the limiting assembly (120) is used for driving a first gear (121) to rotate, a second gear (122) is fixedly installed on a third screw (123), and the first gear (121) and the second gear (122) are meshed with each other.
8. The mechanical arm for carrying used for cleaning wafers according to claim 7, wherein a moving assembly (126) is fixedly installed on the outer wall of the protective shell (109), the moving assembly (126) is used for driving a fourth screw (127) to rotate, and the fourth screw (127) is in threaded connection with a drying fan (128).
CN202211304681.1A 2022-10-24 2022-10-24 Mechanical arm for carrying wafer cleaning Active CN116040319B (en)

Priority Applications (1)

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CN116040319B CN116040319B (en) 2023-09-01

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117104833A (en) * 2023-09-08 2023-11-24 无锡新得宝金属软管有限公司 Handling mechanical device for machining automobile parts
CN117410226A (en) * 2023-10-10 2024-01-16 新启航半导体有限公司 Wafer carrying manipulator

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08186160A (en) * 1994-12-28 1996-07-16 Nec Corp Carrying equipment of wafer holding box
CN102017120A (en) * 2008-03-27 2011-04-13 朗姆研究公司 High throughput cleaner chamber
CN106796906A (en) * 2014-10-10 2017-05-31 川崎重工业株式会社 Wafer method for carrying and device
CN108555936A (en) * 2018-06-14 2018-09-21 上海众鸿电子科技有限公司 A kind of wafer handling machinery arm
CN212399578U (en) * 2020-04-23 2021-01-26 浙江求是半导体设备有限公司 Manipulator structure for moving multiple wafers
CN112992734A (en) * 2021-02-09 2021-06-18 江苏亚电科技有限公司 Drying device for cleaning semiconductor wafer

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08186160A (en) * 1994-12-28 1996-07-16 Nec Corp Carrying equipment of wafer holding box
CN102017120A (en) * 2008-03-27 2011-04-13 朗姆研究公司 High throughput cleaner chamber
CN106796906A (en) * 2014-10-10 2017-05-31 川崎重工业株式会社 Wafer method for carrying and device
CN108555936A (en) * 2018-06-14 2018-09-21 上海众鸿电子科技有限公司 A kind of wafer handling machinery arm
CN212399578U (en) * 2020-04-23 2021-01-26 浙江求是半导体设备有限公司 Manipulator structure for moving multiple wafers
CN112992734A (en) * 2021-02-09 2021-06-18 江苏亚电科技有限公司 Drying device for cleaning semiconductor wafer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117104833A (en) * 2023-09-08 2023-11-24 无锡新得宝金属软管有限公司 Handling mechanical device for machining automobile parts
CN117410226A (en) * 2023-10-10 2024-01-16 新启航半导体有限公司 Wafer carrying manipulator
CN117410226B (en) * 2023-10-10 2024-08-06 新启航半导体有限公司 Wafer carrying manipulator

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