CN116018430A - Surface treatment device - Google Patents

Abstract

The surface treatment device comprises: treatment tanks (100A, 100B) for storing a treatment liquid; anodes (142, 152) disposed in the processing tank; a jig (10) for holding a work (W) in a hanging manner and setting the work as a cathode; a liquid ejection member (200) disposed between the anode and the workpiece; and moving mechanisms (270A, 270B) for moving the liquid ejection member relative to the workpiece. The liquid discharge member includes at least one pair of plates (210, 220, 230) formed between the anode and the workpiece along an extending direction toward the workpiece and arranged so as to be separated from each other in a direction intersecting the extending direction, and the processing liquid flowing by the movement of the liquid discharge member is guided between the at least one pair of plates to be discharged toward the workpiece.

Description

Surface treatment device

technical field

The present invention relates to a surface treatment device for performing surface treatment such as plating on a workpiece.

Background technique

In an apparatus for plating workpieces such as circuit boards, as shown in Patent Document 1, a plurality of nozzles arranged vertically in the plating solution along the longitudinal direction of the nozzle pipe are directed toward the workpiece hanging down in the plating solution. Spray the plating solution.

In an apparatus for plating workpieces such as circuit boards and semiconductor wafers, as shown in Patent Documents 2 and 3, paddles for agitating a treatment liquid are used instead of nozzle pipes. The paddle of Patent Document 2 is a stirring rod, and the paddle of Patent Document 3 is a rectangular plate having a plurality of elongated holes formed therethrough, and these paddles reciprocate parallel to the main surface of the workpiece. Patent Documents 4 to 6 disclose that the nozzle of Patent Document 1 is provided on the paddle of Patent Document 2 or 3 .

prior art literature

patent documents

Patent Document 1: Japanese Patent Laid-Open No. 2012-046782 (FIG. 5)

Patent Document 2: Japanese Unexamined Patent Publication No. 2006-04172 (Figs. 1-5)

Patent Document 3: Japanese Patent Application Laid-Open No. 2014-185375 (Fig. 1, 3-4, 6)

Patent Document 4: Japanese Unexamined Patent Publication No. 2004-16129 (Figs. 1-4)

Patent Document 5: Japanese Patent Application Laid-Open No. 56-42976 (Fig. 1-3)

Patent Document 6: Japanese Patent Application Laid-Open No. 10-88397 (FIGS. 1-2)

Contents of the invention

The problem to be solved by the invention

However, the nozzle tubes of Patent Document 1 are arranged at intervals in the width direction of the workpiece, and the nozzles are arranged at intervals in the longitudinal direction on each nozzle tube, so it is difficult to uniformly discharge the plating solution to the workpiece. . On the other hand, the paddle of Patent Document 2 merely agitates the plating solution. In Patent Documents 4 to 6, the processing liquid pressurized by the liquid jet pump is sprayed from the moving paddle toward the workpiece, but the in-plane uniformity of processing depends on the position of the nozzle and is not improved, which is the same as Patent Document 1 . Furthermore, in Patent Documents 4 to 6, in order to move the blades, a liquid jet pump is required in addition to the drive source.

The object of the present invention is to provide a surface treatment device that does not require a liquid jet pump, can reduce the in-plane unevenness of the treatment liquid sprayed on the workpiece, improve the in-plane uniformity of the surface treatment of the workpiece, and can improve productivity. .

means to solve the problem

(1) One aspect of the present invention relates to a surface treatment device in which

The surface treatment device has:

a treatment tank, which accommodates a treatment liquid;

an anode, which is arranged in the treatment tank;

a jig that holds the workpiece immersed in the treatment liquid so that the workpiece hangs down, and sets the workpiece as a cathode;

a liquid ejection member disposed in the treatment liquid between the anode and the workpiece; and

a movement mechanism that moves the liquid ejection member relative to the workpiece,

The liquid ejection member includes at least one pair of plates formed between the anode and the work in an extending direction toward the work and in a direction crossing the extending direction. Separately arranged, the processing liquid flowing by the movement of the liquid ejection member is guided between the at least one pair of plates and the processing liquid is ejected toward the workpiece.

According to one aspect of the present invention, the processing liquid can be sprayed toward the workpiece without using a nozzle pipe by moving the liquid ejection member relative to the workpiece suspended in the processing liquid. That is, the treatment liquid flowing in the treatment tank by the movement of the liquid ejection member is guided between at least one pair of plates and ejected toward the workpiece. As a result, fresh processing liquid rich in surface treatment components located in the vicinity of the anode can be supplied to the workpiece by colliding the processing liquid with the workpiece, thereby improving productivity. In addition, since the processing liquid can be discharged to the workpiece through at least a pair of plate members of the moving liquid discharge member, compared with the case where the processing liquid is discharged from a plurality of nozzles of the nozzle tube, the processing within the workpiece surface is more efficient. uniformity is improved.

(2) One aspect (1) of the present invention relates to a surface treatment device in which

the movement mechanism moves the liquid ejection member in a reciprocating direction parallel to the workpiece,

The liquid ejection part includes:

a first guide body having two faces intersecting the reciprocating direction; and

a second guide body and a third guide body which are respectively arranged with a gap between the two surfaces of the first guide body,

The at least one pair of plates comprises:

a first pair of sheets formed by said first guide body and said second guide body; and

a second pair of sheets formed by said first guide body and said third guide body,

When the liquid ejection member moves in a forward movement direction in the reciprocating direction, the treatment liquid blocked by the first guide body is guided along a space between the first pair of plates and ejected toward the workpiece. ,

When the liquid ejection member moves in a return movement direction in the reciprocating direction, the treatment liquid blocked by the first guide body is guided along a space between the second pair of plate materials to be ejected toward the workpiece. .

In this way, when the liquid ejection member moves forward, for example, the treatment liquid guided between the first pair of plates formed by the first and second guides is ejected onto the workpiece, and when the liquid ejection member, for example, returns When moving, the treatment liquid guided along the space between the second pair of plates formed by the first and third guide bodies is sprayed onto the workpiece.

(3) In one aspect (2) of the present invention, the anode may include a first anode and a second anode arranged on both sides of the workpiece, and the liquid ejection member may include a first anode arranged on the first anode. A first liquid ejection member disposed between the anode and the workpiece, and a second liquid ejection member disposed between the second anode and the workpiece, the moving mechanism may include ejecting the first liquid a first movement mechanism that moves the discharge member, and a second movement mechanism that moves the second liquid discharge member. In this way, both sides of the workpiece can be processed.

(4) In one aspect (3) of the present invention, a first drive source that applies a driving force to the first moving mechanism and a second driving source that applies a driving force to the second moving mechanism may be further included. , the first liquid ejection member and the second liquid ejection member are driven asynchronously. When the first and second liquid ejection members face each other across the workpiece, the processing liquid is ejected from the same region of the workpiece to both surfaces thereof. In the case where the workpiece has a through hole penetrating both surfaces, it is difficult for the processing liquid to pass through the through hole. In one reciprocating movement of the first and second liquid ejection members, if the first and second liquid ejection members are moved synchronously, the position where the first and second liquid ejection members are facing is It is always the same, but by moving the first and second liquid ejection members asynchronously, the positions where the first and second liquid ejection members face each other can be changed every time. Thus, the treatment liquid easily passes through the through hole.

(5) In one aspect (3) or (4) of the present invention, the jig holding the workpiece may be lowered from above the processing tank and installed, whereby the processing The slots are divided into first slots and second slots. In this way, the first liquid ejection member can agitate the treatment liquid in the first tank, the second liquid ejection member can agitate the treatment liquid in the second tank, and the agitation in one tank can be eliminated from being brought to the other tank. coming adverse effects.

(6) In one aspect (5) of the present invention, the processing tank may include buffer tanks respectively on the outer sides of the two side wall parts located at both ends in the reciprocating direction, and the buffer tanks are separated from the first tank and the first tank. The second tank communicates to accommodate the treatment liquid. In this way, the processing liquid pushed to both ends of the processing tank by the first liquid ejection member and the second liquid ejection member can escape into the buffer tank. In this way, it is possible to reduce the influence of reflected waves of the treatment liquid generated at both ends of the treatment tank. In addition, the circulation of the treatment liquid between the first tank and the second tank can also be ensured by the buffer tank.

(7) In one aspect (5) of the present invention, the processing tank may include a first processing tank and a second processing tank connected in a direction parallel to the reciprocating direction and divided by a first buffer tank. The jig can include: a first jig that holds a first workpiece and divides the first processing tank into the first tank and the second tank; and a second jig that holds a second workpiece and divides the first processing tank into the first tank and the second tank; The second treatment tank is divided into the first tank and the second tank. The first buffer tank can make the treatment liquid flow in the first tank of the first treatment tank, the first tank of the second treatment tank, and the second tank of the first treatment tank. The communication between the second tank and the second processing tank. The first treatment tank may contain the treatment liquid between the first tank and the second tank in the first treatment tank on the outside of the first side wall portion located at one end in the reciprocating direction. The second buffer tank for circulation. The second treatment tank may contain the first tank and the second tank in which the treatment liquid is contained in the second treatment tank on the outside of the second side wall portion located at the other end in the reciprocating direction. The third buffer tank for circulation between. In this way, the first workpiece and the second workpiece can be processed simultaneously, and in this case, the same operations and effects as those of the embodiment (6) of the present invention can be exhibited.

Description of drawings

Fig. 1 is a plan view of a surface treatment device according to a first embodiment of the present invention.

Fig. 2 is a cross-sectional view of the surface treatment device.

FIG. 3 is a diagram for explaining the structure and operation of a liquid ejection member.

Fig. 4 is a front view of the jig.

Figure 5 is a rear view of the jig.

In FIG. 6 , FIG. 6(A) to FIG. 6(C) are diagrams showing the relationship between the rectifier and the holder, respectively.

Fig. 7 is a plan view of a surface treatment device according to a second embodiment of the present invention.

Detailed ways

In the following disclosure, a number of different implementations or examples are provided for implementing different features of the proposed subject matter. Of course, these are only examples and are not intended to be limited thereto. In addition, in this disclosure, reference numerals and/or characters may be repeated in each example. Such repetition is for the sake of clarity and does not itself require a relationship to the various embodiments and/or illustrated structures. Furthermore, when it is described that the first element and the second element are "connected" or "connected", such description includes embodiments in which the first element and the second element are directly connected or connected to each other, and also includes the first element and the second element. An embodiment in which two elements are indirectly connected or linked with one or more other elements interposed therebetween. In addition, when it is described that the first element “moves” relative to the second element, such description includes an embodiment in which at least one of the first element and the second element moves relative to the other.

1. First Embodiment

FIG. 1 is a schematic diagram of a surface treatment device, such as a plating device, according to the present embodiment. The plating apparatus 1 has a flat-plate jig 10 holding a workpiece W, and a surface treatment tank 100A in which the jig 10 is installed. Regarding the workpiece W, at least one of the first main surface (for example, the front side) _WF and the second main surface (for example, the back side) _WB in the positive and negative relationship is used as the surface to be processed, and in this embodiment, both are used as the surface to be processed. noodle.

1.1. Surface treatment tank

In FIGS. 1 and 2 , a surface treatment tank 100A containing a treatment solution such as a plating solution 2 has support portions 110 and 120 that detachably support a jig 10 that holds a workpiece W in a vertical state. The lower support portion 110 has a slit into which the lower end portion of the jig 10 is inserted. The upper support portion 120 also has a slit into which the side edge portion of the jig 10 is inserted. The jig 10 descends from the upper opening of the surface treatment tank 100A, and is held in a vertical state by the support parts 110 and 120 . The upper support portion 120 has terminal groups (not shown) that are in contact with terminal groups 35A, 35B, 45A, and 45B described later of the jig 10 . Thus, by lowering the jig 10 from above to be supported by the upper support portion 120, the terminal groups 35A, 35B, 45A, and 45B of the jig 10 can be connected to a rectifier (not shown) located outside the surface treatment tank 100A. . Here, as shown in FIG. 1 and FIG. A groove 101 and a second groove 102. Also, the first tank 101 and the second tank 102 do not necessarily need to be sealed liquid-tightly. As shown in FIGS. 1 and 2 , the surface treatment tank 100A has openings 103 and 104 in its lower portion. The opening 103 is formed facing the first groove, and the opening 104 is formed facing the second groove 102 . For the surface treatment tank 100A, the adjusted plating solution 2 is supplied, for example, from the upper opening and discharged from the openings 103 and 104 . The discharged plating solution 2 is repeatedly supplied to the surface treatment tank 100A after being adjusted through filtration treatment, replenishment of each main component, and the like. In addition, the plating liquid 2 may be supplied from the openings 103 and 104 and, for example, the overflowing plating liquid may be discharged.

As shown in FIGS. 1 and 2 , the surface treatment tank 100A has anode parts, for example, a first anode box 140 and a second anode box 150 , which face the front _WF and the back _WB of the workpiece W, respectively. The first anode box 140 holds the first anode 142 facing the front _WF of the workpiece W, and the second anode box 150 holds the second anode 152 facing the back _WB of the workpiece W. For electroplating, at least one rectifier is connected to the first anode 142 and the second anode 152 , and the workpiece W is set as a cathode via the fixture 10 .

As shown in FIGS. 1 and 2 , the surface treatment tank 100A has liquid ejection members 200 ( 200A and 200B) between the workpiece W and the anodes 142 and 152 . The liquid ejection member 200 (200A and 200B) moves in a reciprocating direction parallel to the main surfaces _WF , _WB of the workpiece W. As shown in FIG. The details of the liquid ejection members 200 (200A and 200B) will be described later.

1.2. Artifacts

The workpiece W is, for example, a rectangular circuit board, and is subjected to, for example, copper plating by the plating apparatus 1 . However, the type of plating is not limited. The circuit board W may have a via hole on the front _WF and/or the back _WB , or may have a via hole penetrating the front _WF and the back _WB . In this case, the inner walls of the vias and through-holes are also plated. In addition, the respective plating areas on the front _WF and the back _WB of the workpiece W may be greatly different from each other.

1.3. Fixtures

The jig 10 holding the workpiece W will be described using FIG. 4 , which is a front view of the jig 10 , and FIG. 5 , which is a rear view of the jig 10 . Attachment and detachment of the workpiece W to the jig 10 can be performed by automatic equipment, for example. The jig 10 has a jig body 12 formed, for example, from a flat plate, wherein the flat plate consists of an insulating material. The jig body 12 has a rectangular hole 14 having an area slightly larger than that of the rectangular workpiece W. As shown in FIG. The workpiece W is arranged in the hole 14 . The jig 10 has electrodes 15A to 15D shown in FIG. 4 and electrodes 15E to 15H shown in FIG. 5 along four sides around the rectangular hole 14 . These electrodes 15A to 15H are insulated from each other. A plurality of holders 20 are held on the respective electrodes 15A to 15H. The clamper 20 clamps and clamps the workpiece|work W from the front and back of a workpiece|work W. As shown in FIG. As shown in Figures 4 and 5, the clamper 20 may include: a clamper 21, which clamps the upper edge of the workpiece W; a clamper 22, which clamps the left edge of the workpiece W; 23 which clamps the lower edge of the workpiece W; and a clamper 24 which clamps the right edge of the workpiece W. Here, the clamper 21 includes a clamp piece 31 ( FIG. 4 ) that contacts the front surface _WF of the workpiece W ( FIG. 4 ) and a clamp piece 41 that contacts the back surface _WB of the workpiece W ( FIG. 5 ). In this embodiment, the clamping piece 31 is electrically insulated from the clamping piece 41 . Likewise, the clamper 22 comprises electrically insulating clamping pieces 32 , 42 , the clamper 23 comprises electrically insulating clamping pieces 33 , 43 , and the clamper 24 comprises electrically insulating clamping pieces 34 , 44 . In addition, the clamping piece 31 is connected to the electrode 15A, the clamping piece 32 is connected to the electrode 15B, the clamping piece 33 is connected to the electrode 15C, the clamping piece 34 is connected to the electrode 15D, and the clamping piece 41 is connected to the electrode 15E. The clamping piece 42 is connected to the electrode 15H, the clamping piece 43 is connected to the electrode 15G, and the clamping piece 44 is connected to the electrode 15F. In this manner, the clamp pieces 31 to 34 and 41 to 44 are insulated from each other, whereby different currents can flow to the front and back of the workpiece W, and different currents can flow from the respective four sides of the front and back.

As shown in FIGS. 4 and 5 , conductive patterns 31A, 32A1 , 32A2 , 33A, 31B, 33B, 34B1 , 34B2 electrically connected to the holder 20 are formed on the jig body 12 made of insulating material. In the left area of the front surface of the clip main body 12 , as shown in FIG. 4 , the clamp piece 31L of the clamper 21L located in the left area among the plurality of clampers 21 is connected to the conductive pattern 31A via the electrode 15A. The clamp piece 32U of the clamper 22U located in the upper region among the plurality of clampers 22 is connected to the conductive pattern 32A1 via the electrode 15B. The clamp piece 32L of the clamper 22L located in the lower region among the plurality of clampers 22 is connected to the conductive pattern 32A2 via the electrode 15B. The clamp piece 33L of the clamper 23L located in the left region among the multiple clampers 23 is connected to the conductive pattern 33A via the electrode 15C. These conductive patterns 31A, 32A1, 32A2, and 33A are connected to a terminal group 35A formed, for example, on a protruding portion 16A protruding in the width direction from an upper portion of the jig body 12 via wiring 36A.

In the right area of the front surface of the clip main body 12 , as shown in FIG. 4 , the clamp piece 31R of the clamper 21R located in the right area among the plurality of clampers 21 is connected to the conductive pattern 31B via the electrode 15A. The clamp piece 34U of the clamper 24U located in the upper region among the plurality of clampers 24 is connected to the conductive pattern 34B2 via the electrode 15D. The clamp piece 34L of the clamper 24L located in the lower region among the plurality of clampers 24 is connected to the conductive pattern 34B1 via the electrode 15D. The clamp piece 33R of the clamper 23R located in the right region among the plurality of clampers 23 is connected to the conductive pattern 33B via the electrode 15C. These conductive patterns 31B, 33B, 34B1 , 34B2 are connected, for example, via wiring 36B to a terminal group 35B formed on, for example, the protruding portion 16B protruding in the width direction from the upper portion of the jig body 12 . In this way, on the front surface _WF of the rectangular workpiece W, current control can be independently performed by dividing up, down, left, and right into four at most.

On the other hand, in the right area of the back surface of the clamp main body 12, as shown in FIG. The electrode 15E is connected to the conductive pattern 41A. The clamp piece 42U of the clamper 22U located in the upper region among the plurality of clampers 22 is connected to the conductive pattern 42A1 via the electrode 15H. The clamp piece 42L of the clamper 22L located in the lower region among the plurality of clampers 22 is connected to the conductive pattern 42A2 via the electrode 15H. The clamp piece 43R of the clamper 23R located in the right region (left region when viewed from the front) among the plurality of clampers 23 is connected to the conductive pattern 43A via the electrode 15G. These conductive patterns 41A, 42A1 , 42A2 , and 43A are connected to a terminal group 45A formed on the protruding portion 16A of the jig body 12 , for example, via a wire 37A.

In the left area of the rear surface of the clip body 12 , as shown in FIG. 5 , the clamp piece 41L of the clamper 21L located in the left area among the plurality of clampers 21 is connected to the conductive pattern 41B via the electrode 15E. The clamp piece 44U of the clamper 24U located in the upper region among the plurality of clampers 24 is connected to the conductive pattern 44B1 via the electrode 15F. The clamp piece 44L of the clamper 24L located in the lower region among the plurality of clampers 24 is connected to the conductive pattern 44B2 via the electrode 15F. The clamp piece 43 of the clamper 23 located in the left region among the plurality of clampers 23 is connected to the conductive pattern 43B via the electrode 15G. These conductive patterns 41B, 43B, 44B1 , 44B2 are connected to the terminal group 45B formed on the protruding portion 16B of the jig main body 12 via, for example, wiring 37B. In this way, even on the back surface W _B of the rectangular workpiece W, current control can be independently performed by dividing up, down, left, and right into four at most.

Plating adhesion can be prevented by applying insulating coating to the conductive patterns 41A, 41B, 42A1, 42A2, 43A, 43B, 44B1, and 44B2 formed on the front and back surfaces of the jig 10 . In addition, the electrodes 15A to 15D shown in FIG. 4 and the electrodes 15E to 15H shown in FIG. 5 are arranged near the periphery of the workpiece W, and can function as dummy electrodes, wherein the dummy electrodes are eliminated by the peripheral edge of the workpiece W. The abnormality of the plating thickness caused by the concentration of the electric field is the so-called dog bone. In order to prevent plating adhesion and to adjust the amount of electrode exposure, the electrode 15A shown in FIG. ˜15D and electrodes 15E˜15H shown in FIG. 5 (refer to Japanese Patent Application No. 2019-15827 of the applicant of the present application).

In addition, the clamper may hold the workpiece W by covering a slight gap formed around the workpiece W in the hole 14 of the jig 10 . Thus, the inside of the surface treatment tank 100A can be substantially completely divided into the first tank 101 and the second tank 102 located on the front and back of the workpiece W by the jig 10, the workpiece W, and the support parts 110, 120 of the surface treatment tank 100A.

1.4. Rectifier

In this embodiment, in order to independently set the currents flowing in at least the front _WF and the back _WB of the workpiece W, it is preferable to provide a plurality of rectifiers as shown in FIG. 6(A) to FIG. 6(C). In (A) of FIG. 6 , two rectifiers 300A and 300B are provided. The rectifier 300A is electrically connected to the clamping pieces 31 to 34 that are in contact with the front surface W _F of the workpiece W, and the rectifier 300B is in contact with the back surface W _B of the workpiece W. The clamping pieces 41-44 are electrically connected. By independently controlling the two rectifiers 300A and 300B, the currents flowing through the front _WF and the back _WB of the workpiece W can be set independently. In this way, even if the plating areas on the front _WF and the back _WB of the workpiece W are greatly different, the current can be adjusted according to the plating area or the plating location. In addition, in this case, the contacts electrically connecting the two rectifiers 300A and 300B to the first anode 142 and the second anode 152 are arranged at the respective centers of the first anode 142 and the second anode 152 , for example.

In Figure 6(B), four rectifiers 310A to 310D are provided. The rectifier 310A is electrically connected to the clamping pieces 31, 32U, and 34U that are in contact with the upper area of the front surface _WF of the workpiece W, and the rectifier 310B is electrically connected to the workpiece W. The clamping pieces 33, 32L, 34L in contact with the lower area of the front side W _F of the workpiece W are electrically connected, the rectifier 310C is electrically connected with the clamping pieces 41, 42U, 44U in contact with the upper area of the back side _WB of the workpiece W, and the rectifier 310D is connected with and The clamping pieces 43 , 42L, 44L that are in contact with the lower area of the back surface _WB of the workpiece W are electrically connected. In this way, in each of the front _WF and the back _WB of the workpiece W, the current flowing in the two regions of the upper and lower regions of the workpiece W (that is, four regions in total on the front and back) can be independently controlled. In addition, in this case, the contacts electrically connected to the first anode 142 and the second anode 152 of the four rectifiers 310A to 310D are connected to the upper region of the first anode 142, the lower region of the first anode 142, and the second anode. The upper area of 152 and the lower area of the second anode 152 are arranged corresponding to four areas in total.

In FIG. 6(C), eight rectifiers 320A to 320H are provided. The rectifier 320A is electrically connected to the clamping pieces 31L and 32U in contact with the upper left area of the front surface _WF of the workpiece W, and the rectifier 320B is electrically connected to the front surface of the workpiece W. The clamping pieces 32L and 33L in contact with the lower left area of _WF are electrically connected, the rectifier 320C is electrically connected with the clamping pieces 31R and 34U in contact with the upper right area of the front surface _WF of the workpiece W, and the rectifier 320D is connected with the front surface WF of the workpiece _W The clamping pieces 33R and 34L that are in contact with the lower right area of the workpiece W are electrically connected, the rectifier 320E is electrically connected with the clamping pieces 41L and 44U that are in contact with the upper left area of the back surface W _B of the workpiece W, and the rectifier 320F is connected with the back surface W _B of the workpiece W. The clamping pieces 43L, 44L in contact with the lower left area are electrically connected, the rectifier 320G is electrically connected with the clamping pieces 41R, 42U in contact with the upper right area of the back surface W _B of the workpiece W, and the rectifier 320H is electrically connected with the lower right area of the back surface W _B of the workpiece W. The clamping pieces 42L, 43R of the area contacts are electrically connected. In this way, in each of the front _WF and the back _WB of the workpiece W, the four regions of the upper left region, the lower left region, the upper right region and the lower right region of the workpiece W can be independently controlled (that is, a total of 8 regions on the front and back sides). the current flowing in the region). In addition, in this case, the contacts electrically connected to the first anode 142 and the second anode 152 of the eight rectifiers 320A to 320H are connected to the upper left region, the lower left region, the upper right region and the lower right region of the first anode 142, and The upper left area of the second anode 152 , the upper area of the first anode 142 , the lower area of the first anode 142 , the upper area of the second anode 152 , and the lower area of the second anode 152 are arranged in correspondence with each other. However, the front and back sides may be divided into more than eight divisions in total.

1.5. Liquid ejection parts

The liquid ejection unit 200 can include: a first liquid ejection unit 200A arranged between the front _WF of the workpiece _W and the first anode 142; Two liquid ejection parts 200B. The first liquid ejection member 200A is moved in a reciprocating direction parallel to the front surface WF of the workpiece W by the first reciprocating mechanism 270 (first moving mechanism) A. As shown in _FIG . The second liquid ejection member 200B is moved in a reciprocating direction parallel to the back surface _WB of the workpiece W by a second reciprocating mechanism (second moving mechanism) 270B. For the first and second reciprocating mechanisms 270A and 270B, various rotary motion-reciprocating linear motion conversion mechanisms such as slider crank mechanisms and eccentric cams can be used, and detailed descriptions are omitted here.

In this embodiment, one liquid ejection member 200A, 200B is provided on each of the front _WF and the back _WB of the workpiece W. As shown in FIG. The liquid ejection members 200A, 200B preferably reciprocate with a movement stroke longer than the width of the workpiece W. As shown in FIG. In this way, the liquid ejection members 200A, 200B are not folded back at positions overlapping the ends of the workpiece W in the width direction. Therefore, the timing at which the liquid ejection member 200 becomes the shadow of the electric field between the cathode and the anode does not differ between both ends of the workpiece W and positions other than both ends. A plurality of liquid ejection members may be provided on each of the front _WF and the back _WB of the workpiece W. As shown in FIG. In this way, the moving stroke of each liquid ejection member can be shortened. However, it is disadvantageous in that the time when the liquid ejection member 200 becomes the shadow of the electric field with respect to the anodes 142 and 152 differs depending on the region of the workpiece W (for example, both ends and the center).

As shown in FIG. 3, the liquid ejection member 200 (200A and 200B) includes: a first guide body 210 having two faces intersecting, for example, orthogonal to the reciprocating direction; and a second guide body 220 and a third guide body 230. , they are respectively arranged on both sides of the first guide body 210 and both surfaces of the first guide body 210 with gaps therebetween. Each of the two adjacent guide bodies among the first to third guide bodies 210 to 230 is formed between the anodes 142 and 152 and the workpiece W along the extending direction toward the workpiece W, and is formed in a direction intersecting the extending direction. Each pair of plates arranged separately in the direction. As shown in FIG. 2 , there is a height extending throughout at least the vertical length of the workpiece W. As shown in FIG. A first passage 201 is formed between a first pair of plates formed by the first guide body 210 and the second guide body 220 . A second passage 202 is formed between a second pair of plates formed by the first guide body 210 and the third guide body 230 . For example, the first guide body 210 is formed longer than the second guide body 220 and the third guide body 230 , and both end portions thereof protrude from corresponding end portions of the second guide body 220 and the third guide body 230 . In addition, the end portion of the first guide body 210 facing the workpiece W has, for example, a tapered shape. An end portion of the first guide body 210 on a side closer to the anode case 140 , 150 is fixed to a base end portion 240 extending parallel to the workpiece W, for example. The second guide body 220 and the third guide body 230 may further have a fourth guide body 250 extending, for example, parallel to the base end portion 240 . A third passage 203 is formed between the base end portion 240 and the fourth guide body 250 extending from the second guide body 220 . The third passage 203 communicates with the first passage 201 and guides the treatment liquid to the first passage 201 . Similarly, a fourth passage 204 is formed between the base end portion 240 and the fourth guide body 250 extending from the third guide body 230 . The fourth passage 204 communicates with the second passage 202 and guides the treatment liquid to the second passage 202 . The first guide body 210 is connected to the second guide body 220 and the third guide body 230 with a constant interval maintained by the spacer 260 of the flat plate. As shown in FIG. 2 , a plurality of spacers 260 can be provided at intervals in the height direction.

Regarding the first liquid ejection member 200A, for example, its base end portion 240 is connected to a first reciprocating mechanism 270A that is driven by, for example, a first drive source 280A, whereby the first liquid ejection member 200A reciprocates in FIG. Move in directions A and B. Similarly, for the second liquid ejection member 200B, for example, the base end portion 240 thereof is connected to the second reciprocating mechanism 270B that is driven by the second drive source 280B, so that the second liquid ejection member 200B is shown in FIG. 2 to move in the reciprocating direction A, B. When the liquid ejection member 200 (200A and 200B) moves to the forward moving direction A in FIG. 3 among the reciprocating directions A and B in FIG. The first passage 201 between the pair of plates guides the plating solution blocked by the first guide body 210 to be ejected toward the workpiece W. As shown in FIG. When the liquid ejection member 200A moves to the return movement direction B among the reciprocating directions A and B, it is guided along the second path 202 between the second pair of plate materials formed by the first guide body 210 and the third guide body 230 . The plating solution blocked by the first guide body 210 is ejected toward the workpiece W. As shown in FIG. Similarly to the first liquid ejection member 200A, the second liquid ejection member 200B ejects the plating solution toward the workpiece W through the first passage 201 when moving in the forward movement direction A, and when moving in the return movement direction B The plating solution is discharged toward the workpiece W through the second passage 202 . Furthermore, it is not necessarily necessary to provide both the first passage 201 and the second passage 202 . In any case of the movement of the liquid ejection member 200 (200A and 200B) in the reciprocating directions A and B, the third passage 203 and the fourth passage 204 may be formed by other guides such as inclination or curvature, so as to process The fluid is directed to a common passage between at least one pair of plates.

In this way, when the processing liquid 2 collides with the workpiece W, the processing liquid near the main surfaces _WF and _WB of the workpiece W can be stirred to prevent the processing liquid from stagnating, and the plating near the anode boxes 140 and 150 can also be removed. The workpiece W is supplied with a fresh treatment liquid 2 rich in components. Thus, the plating process is facilitated. In addition, the liquid ejection members 200 ( 200A and 200B ) can uniformly eject the processing liquid 2 to the workpiece W except for the spacer 260 in the longitudinal direction of FIG. 2 . Since the spacer 260 can be formed in a thin plate shape, the in-plane uniformity of the processing of the workpiece W is not impaired.

Here, the first driving source 280A and the second driving source 280B can be driven asynchronously. When the first and second liquid ejection members 200A and 200B face each other across the workpiece W, the processing liquid 2 is ejected from the same region of the workpiece W toward both surfaces thereof. In the case where the workpiece W has a through hole penetrating both surfaces, it is difficult for the processing liquid 2 to pass through the through hole. During one reciprocating movement of the first and second liquid ejection members 200A and 200B, if the first and second liquid ejection members are moved synchronously, the positions where the first and second liquid ejection members face each other are always the same. , but by moving the first and second liquid ejection members asynchronously, the positions where the first and second liquid ejection members face each other can be changed each time. Thereby, irrespective of the position of the through-hole formed in the workpiece W, plating can be reliably performed in the through-hole. In addition, the first drive source 280A and the second drive source 280B may move the liquid ejection members 200A, 200B at different speeds, respectively. In this way, the pressure of the processing liquid 2 acting on the workpiece W differs between the front and back surfaces WF, WB. Utilizing this pressure difference, the processing liquid can easily pass through the through hole. In this case, the first drive source 280A and the second drive source 280B may be driven synchronously, or the first and second drive sources 280A and 280B may be the same drive source.

In addition, the jig 10 holding the workpiece W is lowered from above and installed, whereby the surface treatment tank 100A is divided into a first tank 101 and a second tank 102 . Here, when the first and second liquid ejection members 200A and 200B are reciprocated, the liquid flow blocked by the second and third guides 220 and 230 and bounced becomes an agitation flow that agitates the entire tank. At this time, the first liquid ejection member 200A can agitate the treatment liquid in the first tank 101, the second liquid ejection member 200B can agitate the treatment liquid in the second tank 102, and can eliminate the agitation in one tank. adverse effects on the other side.

In addition, the surface treatment tank 100A may have buffer tanks 107 and 108 on the outer sides of two side wall parts 105 and 106 located at both ends in the reciprocating directions A and B. The opening 105A formed in the side wall portion 105 communicates the first groove 101 with the buffer groove 107 . The opening 105B formed in the side wall portion 105 communicates the second groove 102 with the buffer groove 107 . The opening 106A formed in the side wall portion 106 communicates the first groove 101 with the buffer groove 108 . The opening 106B formed in the side wall portion 106 communicates the second groove 102 with the buffer groove 108 . In this way, the processing liquid pushed to both ends of the processing tank 100A by the liquid ejection members 200 ( 200A and 200B), respectively, can escape into the buffer tanks 107 , 108 . In this way, it is possible to reduce the influence of reflected waves of the processing liquid generated at both ends of the processing tank 100A. In addition, the circulation of the treatment liquid between the first tank 101 and the second tank 102 can also be ensured via the buffer tanks 107 and 108 .

2. Second Embodiment

Fig. 7 is a plan view of a surface treatment device according to a second embodiment of the present invention. In FIG. 7 , the processing tank 100B can include a first processing tank 100B1 and a second processing tank 100B2 connected in a direction parallel to the reciprocating direction and divided by a first buffer tank 109 . The jig may include: a first jig 10A that holds the first workpiece W1 and divides the first processing tank 100B1 into the first tank 101 and the second tank 102; and a second jig 10B that holds the second workpiece W2 and divides the second The processing tank 100B2 is divided into a first tank 101 and a second tank 102 . In this case, the first buffer tank 109 may include the first tank 101 of the first treatment tank 100B1, the first tank 101 of the second treatment tank 100B2, the second tank 102 of the first treatment tank 100B1, the second treatment tank The first to fourth openings 109A1, 109A2, 109B1, 109B2 of the second groove 102 of 100B2 communicate with each other. In addition, the first processing tank 100B1 may include, outside the first side wall portion 105 provided at one end in the reciprocating direction, a second channel for allowing the processing liquid to flow between the first tank 101 and the second tank 102 in the first processing tank 100B1. Two buffer tanks 107. The second processing tank 100B2 may include a third channel for allowing the processing liquid to flow between the first tank 101 and the second tank 102 in the second processing tank 100B2 on the outside of the second side wall portion 106 provided at the other end in the reciprocating direction. Buffer tank 108 . In this way, the first workpiece W1 and the second workpiece W2 can be processed simultaneously, and the same operations and effects as those of the processing tank 100A shown in FIG. 1 can be achieved. In addition, instead of the first buffer tank 109, a central wall may be provided. In this case, the central wall may have: a first opening communicating with the first tank 101 of the first treatment tank 100B1 and the first tank 101 of the second treatment tank 100B2; and making the second tank 102 of the first treatment tank 100B1 A second opening communicating with the second tank 102 of the second processing tank 100B2. However, in this case, the first groove 101 and the second groove 102 cannot be communicated with each other.

In addition, in the second embodiment, the first jig 10A and the second jig 10B may be configured integrally. Alternatively, the two first liquid ejection members 200A may be driven by the same drive source, and the other two second liquid ejection members 200B may be driven by the same drive source. In addition, the surface treatment tank may be configured by connecting first to Nth (N is an integer equal to or greater than 2) treatment tanks in a broad sense. When N≧3, (N−1) partition walls are provided in parallel to the side wall portions located at both ends in the reciprocating direction.

Label description

1: Surface treatment device;

2: treatment liquid;

10, 10A, 10B: Fixtures;

12: main board;

13A: lower part;

13B: first side;

13C: second side;

14: rectangular opening;

16A, 16B: protruding pieces;

21, 41: the first gripper;

22, 42: the second holder;

23, 43: the third gripper;

24, 44: the fourth holder;

31A～34B2, 41A～44B2: conductive patterns;

35A, 35B, 45A, 45B: terminal group;

36A～37B: Wiring;

100A, 100B: surface treatment tank;

101: first slot;

102: second slot;

103, 104: opening;

105, 106: side wall part;

105A, 105B, 106A, 106B: openings;

107, 108, 109: buffer tanks;

109A, 109B: first opening, second opening;

110: lower supporting part;

120: upper supporting part;

142: first anode;

152: second anode;

200 (200A, 200B): liquid ejection parts;

201~204: the first to the fourth passage;

210: the first guiding body;

220: the second guiding body;

230: the third guiding body;

240: base;

250: the fourth guide body;

260: spacer;

270A, 270B: moving mechanism;

270A: first moving mechanism;

270B: the second moving mechanism;

W: workpiece;

W _F : the first main face;

W _B : the second principal surface.

Claims (7)

1. A surface treatment device, characterized in that, The surface treatment device has: a treatment tank, which accommodates a treatment liquid; an anode, which is arranged in the treatment tank; a jig that holds the workpiece immersed in the treatment liquid so that the workpiece hangs down, and sets the workpiece as a cathode; a liquid ejection member disposed in the treatment liquid between the anode and the workpiece; and a movement mechanism that moves the liquid ejection member relative to the workpiece, The liquid ejection member includes at least one pair of plates formed between the anode and the work in an extending direction toward the work and in a direction crossing the extending direction. Separately arranged, the processing liquid flowing by the movement of the liquid ejection member is guided between the at least one pair of plates and the processing liquid is ejected toward the workpiece. 2. The surface treatment device according to claim 1, wherein: the movement mechanism moves the liquid ejection member in a reciprocating direction parallel to the workpiece, The liquid ejection part includes: a first guide body having two faces intersecting the reciprocating direction; and a second guide body and a third guide body which are respectively arranged with a gap between the two surfaces of the first guide body, The at least one pair of plates comprises: a first pair of sheets formed by said first guide body and said second guide body; and a second pair of sheets formed by said first guide body and said third guide body, When the liquid ejection member moves in a forward movement direction in the reciprocating direction, the treatment liquid blocked by the first guide body is guided along a space between the first pair of plates and ejected toward the workpiece. , When the liquid ejection member moves in a return movement direction in the reciprocating direction, the treatment liquid blocked by the first guide body is guided along a space between the second pair of plate materials to be ejected toward the workpiece. . 3. The surface treatment device according to claim 2, characterized in that, The anode includes a first anode and a second anode arranged on both sides of the workpiece, The liquid ejection member includes: a first liquid ejection member arranged between the first anode and the workpiece; and a second liquid ejection member arranged between the second anode and the workpiece between, The movement mechanism includes: a first movement mechanism that moves the first liquid ejection member; and a second movement mechanism that moves the second liquid ejection member. 4. The surface treatment device according to claim 3, characterized in that, The surface treatment device further includes a first drive source for giving a driving force to the first moving mechanism and a second driving source for giving a driving force to the second moving mechanism, and the first liquid ejection member and the The second liquid ejection member is driven asynchronously. 5. Surface treatment device according to claim 3 or 4, characterized in that, The processing tank is divided into a first tank and a second tank by being installed by lowering the jig holding the workpiece from above the processing tank. 6. The surface treatment device according to claim 5, characterized in that, The treatment tank includes a buffer tank on the outside of two side wall parts, wherein the two side wall parts are located at both ends of the treatment tank in the reciprocating direction, and the buffer tank and the first The tank communicates with the second tank to accommodate the treatment liquid. 7. The surface treatment device according to claim 5, characterized in that, The processing tank includes a first processing tank and a second processing tank connected in a direction parallel to the reciprocating direction and divided by a first buffer tank, The jig includes: a first jig that holds a first workpiece and divides the first processing tank into the first tank and the second tank; and a second jig that holds a second workpiece and divides the first processing tank into the first tank and the second tank; the second treatment tank is divided into the first tank and the second tank, The first buffer tank makes the treatment liquid flow in the first tank of the first treatment tank, the first tank of the second treatment tank, and the second tank of the first treatment tank and the communication between the second tanks of the second treatment tanks, The first treatment tank contains the treatment liquid between the first tank and the second tank in the first treatment tank on the outside of the first side wall portion located at one end in the reciprocating direction. a second buffer tank for circulation, The second treatment tank includes, on the outside of the second side wall portion located at the other end in the reciprocating direction, the treatment liquid in the second treatment tank between the first tank and the second tank. The third buffer tank for circulation.

Images