CN115942587A - Beam modulation device and quantum current generation system with same - Google Patents

Beam modulation device and quantum current generation system with same Download PDF

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Publication number
CN115942587A
CN115942587A CN202210310573.9A CN202210310573A CN115942587A CN 115942587 A CN115942587 A CN 115942587A CN 202210310573 A CN202210310573 A CN 202210310573A CN 115942587 A CN115942587 A CN 115942587A
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CN
China
Prior art keywords
slit
slit sheet
stripping
electron beam
electron
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Pending
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CN202210310573.9A
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Chinese (zh)
Inventor
李小飞
周峰
聂琪
雷民
殷小东
胡浩亮
汪胜和
刘京
万鹏
潘瑞
余也凤
黄俊昌
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State Grid Corp of China SGCC
China Electric Power Research Institute Co Ltd CEPRI
State Grid Anhui Electric Power Co Ltd
Original Assignee
State Grid Corp of China SGCC
China Electric Power Research Institute Co Ltd CEPRI
State Grid Anhui Electric Power Co Ltd
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Application filed by State Grid Corp of China SGCC, China Electric Power Research Institute Co Ltd CEPRI, State Grid Anhui Electric Power Co Ltd filed Critical State Grid Corp of China SGCC
Priority to CN202210310573.9A priority Critical patent/CN115942587A/en
Publication of CN115942587A publication Critical patent/CN115942587A/en
Pending legal-status Critical Current

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Abstract

The invention provides a beam modulation device and a quantum current generation system with the same. The device includes: the device comprises a stripping pipe, a beam blocking plate, a slit sheet and a driving mechanism; wherein the beam blocking plate is arranged in the stripping pipe, and the beam blocking plate is provided with a beam penetrating hole; the slit sheet is arranged at the rear side of the beam baffle plate, at least two slit holes with different apertures are arranged on the slit sheet, and the slit sheet is connected with the stripping pipe in a position-adjustable mode along the radial direction of the stripping pipe; the driving mechanism is connected with the slit sheet and used for driving the slit sheet to adjust the position. The beam blocking plate is used for blocking the electron beam group outside the beam penetrating hole, so that the electron beam group at the beam penetrating hole penetrates through the beam blocking plate; the slit sheet is driven by the driving mechanism, so that the position of the slit sheet is adjusted along the radial direction of the stripping tube, different slit holes are adjusted to the beam penetrating holes, different forms of beam modulation are performed on the electron beam clusters through the slit holes with different apertures, and various regulation and control of the electron beam cluster flow strength are realized.

Description

Beam modulation device and quantum current generation system with same
Technical Field
The invention relates to the technical field of electrical metering, in particular to a beam modulation device and a quantum current generation system with the beam modulation device.
Background
The pulse beam is a very important beam required by many nuclear physics experiments, especially nuclear data measurement. The pulsed beam for a specific application is generally generated by an accelerator, and theoretically, the quantum reproduction accuracy of the current intensity is consistent with the electron charge amount and is far higher than all current standards. To realize the quantization of current, how to accurately control the number of emitted electrons is the most critical technical difficulty for ensuring the output accuracy of a quantum current device from the source.
At present, two technical schemes are generally adopted for accurately controlling electrons, one scheme is based on a single electron tunnel effect, the on-off of electrons passing through a tunnel junction can be controlled generally in a radio frequency mode, so that the purpose of controlling the number of the electrons is achieved, the single electron tunnel effect realizes the current fluidization in a very direct mode, but the practical current metering has larger engineering problems, such as nanometer-level processing precision, ultralow-temperature application environment, ultrahigh-frequency technical requirements and weak carrying capacity, and due to the technical limitations, the levels of current intensity and precision of an SEP device are limited.
At present, methods for regulating and controlling an electron beam bunch generally include electric field regulation, magnetic field regulation, target blocking, radio frequency field elimination, collimator tubes and the like, and although the methods can regulate beam current to a certain extent, the regulation and control method has little adjustable parameter change, and generally adopts an X slit mode and a Y slit mode, the stripping size of the X slit mode and the Y slit mode is fixed, and the regulation and control can be carried out only by controlling the state of beam current in front of the slits.
Disclosure of Invention
In view of this, the present invention provides a beam modulation device and a quantum current generation system having the beam modulation device, and aims to solve the problem that the current regulation and control method has little change in the adjustable parameters of the electron beam bunch.
In one aspect, the present invention provides a beam modulation apparatus, including: the device comprises a stripping pipe, a beam baffle plate, a slit sheet and a driving mechanism; the beam blocking plate is arranged in the stripping tube, and is provided with a beam penetrating hole for blocking an electron beam group outside the beam penetrating hole and enabling the electron beam group at the beam penetrating hole to penetrate; the slit sheet is arranged on the rear side of the beam blocking plate along the transmission direction of the electron beam group, at least two slit holes with different apertures are arranged on the slit sheet, and the slit sheet is connected with the stripping pipe in a position-adjustable mode along the radial direction of the stripping pipe and used for adjusting the positions of the slit holes so as to carry out different-form beam modulation on the electron beam group at the position where the beam penetrating hole penetrates through the slit holes with different apertures; the driving mechanism is connected with the slit sheet and used for driving the slit sheet to adjust the position.
Further, in the beam adjusting apparatus, the driving mechanism includes: the slit supporting rod, the driving motor and the transmission component are arranged on the slit supporting rod; the slit supporting rod can be slidably arranged in the stripping tube in a penetrating manner along the radial direction of the stripping tube, the connecting end of the slit supporting rod is positioned in the stripping tube and is connected with the slit sheet, and the driving end of the slit supporting rod is arranged outside the stripping tube; the transmission input end of the transmission assembly is connected with the power output end of the driving motor, the transmission output end of the transmission assembly is connected with the driving end of the slit supporting rod and used for converting the rotation of the driving motor into the reciprocating linear motion of the slit supporting rod, so that the slit supporting rod slides along the radial direction of the stripping pipe to further drive the slit sheet to adjust the position, and the replacement of the slit hole is realized.
Further, in the beam adjusting device, the transmission assembly is a ball screw assembly, which includes: the sliding table comprises a sliding table base, a screw rod and a supporting frame; the screw rod is rotatably arranged on the sliding table base, the support frame is slidably arranged on the sliding table base, and the support frame is used for mounting a slit support rod; the screw rod penetrates through the support frame, is in threaded connection with the support frame and is used for converting the rotation of the screw rod into the reciprocating linear movement of the support frame, and then drives the slit support rod to perform reciprocating linear movement.
Furthermore, in the beam adjusting device, the sliding table base is provided with a guide rail for guiding the reciprocating linear motion of the support frame.
Furthermore, in the beam adjusting device, the stripping tube is a vacuum tube, and is provided with an installation through hole, and the slit support rod is slidably inserted into the installation through hole; the vacuum stripping device is characterized in that a telescopic pipe is further arranged between the transmission output end of the transmission assembly and the stripping pipe, two ends of the telescopic pipe are respectively arranged on the transmission output end of the transmission assembly and the installation through hole, and the telescopic pipe is arranged outside the stripping pipe to form an adjusting cavity which is communicated with a vacuum stripping cavity in the stripping pipe and used for ensuring the vacuum degree of the vacuum stripping cavity.
Further, the beam-adjusting apparatus further includes: the system comprises a position sensor, a control card and a PC (personal computer); the position sensor is used for detecting the current position of the slit sheet; the PC is used for acquiring a target position of the slit sheet; the control card is respectively connected with the position sensor and the PC and is used for receiving the current position of the slit sheet and the target position of the slit sheet and controlling the driving mechanism to control the position adjustment of the slit sheet according to the current position of the slit sheet and the target position of the slit sheet.
Furthermore, in the beam adjusting device, each slit sheet and the beam blocking plate are in one-to-one correspondence, and the slit sheet is arranged on the rear side of the corresponding beam blocking plate along the transmission direction of the electron beam bunch.
Furthermore, in the beam adjusting device, the edges of the two ends of each slit hole are provided with chamfers to form a blade structure.
Further, according to the beam adjusting device, the slit piece comprises a rectangular structure and a semicircular structure arranged at the end of the rectangular structure.
Further, in the beam adjusting apparatus, the slit sheet includes: a slit sheet body having a rectangular structure; the avoidance structure is arranged at the end part of the slit sheet body and is of a semicircular structure and used for avoiding the inner wall of the stripping pipe.
On the other hand, the invention also provides a quantum current generating system which is provided with the beam modulation device.
Further, the quantum current generation system further includes: a cluster generating section for generating an electron cluster; the acceleration section is arranged at the rear side of the beam cluster generation section and is used for accelerating and focusing the electron beam cluster emitted by the beam cluster generation section so as to obtain an electron beam cluster with stronger pulse; the beam modulation device is arranged at the stripping section and used for filtering and collimating the electron beam group with stronger pulse so as to control the quantity of electrons in the electron beam group; and the detection section is arranged at the rear side of the stripping section and is used for detecting the electron beam group regulated and controlled by the beam regulating device.
Further, in the quantum current generation system, the beam cluster generation section is provided with an electron gun and an extraction electrode, the electron gun is configured to provide an electron beam cluster, and the extraction electrode is configured to preliminarily accelerate the electron beam cluster provided by the electron gun to provide energy emitted by the electron beam cluster, so that the electron beam cluster enters the acceleration section.
According to the beam modulation device and the quantum current generation system, the beam blocking plate is used for blocking the electron beam group outside the beam penetrating hole and enabling the electron beam group at the beam penetrating hole to penetrate; the electron beam group penetrating through the beam penetrating hole is modulated through the slit hole on the slit sheet so as to adjust parameters such as the quantity of electrons in the electron beam group. Meanwhile, at least two slit holes with different apertures are formed in the slit sheet, and the slit sheet can be driven by the driving mechanism, so that the position of the slit sheet is adjusted along the radial direction of the stripping tube, different slit holes are adjusted to the beam penetrating holes, and different forms of beam adjustment are performed on electron beam clusters penetrating through the beam penetrating holes by the slit holes with different apertures. When the slit holes with different apertures are positioned at the beam penetrating holes, the beam spots of the electron beam group after penetrating the slit holes are different, the number of electrons in the electron beam group is different, and the flow intensity is different, namely, the positions of the slit holes are adjusted through the position adjustment of the slit sheets, so that the corresponding slit holes are adjusted to the beam penetrating holes, especially can be coaxially arranged with the beam penetrating holes, the adjustment and control of beam adjustment are realized, and the multiple adjustment and control of the flow intensity of the electron beam group are realized. The beam adjusting device and the quantum current generating system have high flexibility, can perform various regulation and control on the same beam state, provide support for wide output range of quantum current, can be applied to high-accuracy multi-unit combined beam regulation and control on a beam transmission line of a particle accelerator, solve the problem that the conventional electron beam cluster regulation and control mode is single and inconvenient to regulate and control, and have low cost and better experimental effect.
Furthermore, the slit pieces can be arranged side by side and at intervals along the stripping pipe, and through the matching of a plurality of slit holes on the slit pieces, the combination of the slit pieces can realize the beam adjustment in a plurality of beam adjustment combination modes.
Drawings
Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Also, like reference numerals are used to refer to like parts throughout the drawings. In the drawings:
fig. 1 is a schematic structural diagram of a quantum current generation system according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a beam adjusting device and an accelerating tube according to an embodiment of the present invention;
FIG. 3 is a rear sectional view of a beam adjusting device and an accelerating tube according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a beam-adjusting device according to an embodiment of the present invention, wherein the driving mechanism is disposed between the slit supporting rod and the slit supporting rod;
FIG. 5 is a block diagram of a control portion of a beam modulation apparatus according to an embodiment of the present invention;
FIG. 6 is a front view of a slit sheet according to an embodiment of the present invention;
FIG. 7 is a side view of a slit sheet provided in accordance with an embodiment of the present invention;
FIG. 8 is an enlarged view of a portion of FIG. 7 at A;
fig. 9 is a partially enlarged view of a slit hole provided in an embodiment of the present invention.
Detailed Description
Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
Referring to fig. 1, a schematic structural diagram of a quantum current generation system according to an embodiment of the present invention is shown. As shown, the quantum current generation system includes: a beam group generation section 1, an acceleration section 2, a stripping section 3 and a detection section 4; wherein, the first and the second end of the pipe are connected with each other,
the cluster generating section 1 is used to generate an electron cluster. In specific implementation, an electron gun 11 and an extraction electrode 12 are arranged in the beam cluster generation section 1, and the electron gun 11 is used as an electron source and is used for providing an electron beam cluster; the extraction electrode 12 is used for preliminarily accelerating the electron beam group provided by the electron gun 11 to provide energy emitted by the electron beam group, so that the electron beam group enters the acceleration section 2.
An acceleration section 2 is arranged at the rear side (right side as viewed in fig. 1) of the beam cluster generation section 1 in the transport direction of the electron beam clusters for accelerating and focusing the electron beam clusters emitted by the beam cluster generation section 1 to obtain a more strongly pulsed electron beam cluster. In particular, a linear accelerator 21 may be provided in the acceleration section 2 to accelerate and focus the electron beam bunch in the acceleration section 2, such that the electron beam bunch is accelerated and focused in the acceleration section 2 to obtain a relatively strongly pulsed electron beam bunch. However, the present invention is not limited thereto, and in other embodiments, the linear accelerator 21 may be other suitable accelerators, which is not limited in this embodiment. In this embodiment, in order to avoid the electron bunch from being accelerated and focused under the condition of not being affected by the scattering of molecules in the air, preferably, as shown in fig. 2, an acceleration tube 22 may be disposed at the acceleration section 2, and the acceleration tube 22 may be a vacuum tube to ensure that the inside is a vacuum acceleration cavity, thereby ensuring that the electron bunch is accelerated and focused under the condition of not being affected by the scattering of molecules in the air; the linear accelerator 21 may be disposed inside the acceleration tube 22 to accelerate the electron bunch under vacuum conditions. Where the front-back direction refers to a direction in which the electron bunch flows, in the present embodiment, the electron bunch flows from left to right in a horizontal direction as shown in fig. 1.
The stripping section 3 is disposed at the rear side (right side as shown in fig. 1) of the accelerating section 2, and the beam adjusting device 5 is disposed at the stripping section 3, and is configured to perform filtering collimation, i.e., stripping, on the electron bunch with strong pulses, so as to control the number of electrons in the electron bunch and achieve adjustment and control of the electron bunch. Specifically, the beam adjusting device 5 may be disposed on the right side of the accelerating tube 22, and the two may be connected by a connecting member such as a flange.
The detecting section 4 is disposed at a rear side (a rear side as shown in fig. 1) of the stripping section 3, and is configured to detect the electron beam group regulated and controlled by the beam regulating device 5, so as to obtain relevant parameters of the electron beam group, such as parameters of the electron beam current intensity, the electron beam current energy, the number of electrons scattered by the current intensity energy, and the like formed by combination. In particular, the detection section 4 is provided with a detector 41 to detect by means of the detector 41.
Referring to fig. 2 to 5, preferred structures of beam adjusting devices provided by the embodiments of the present invention are shown. As shown, the beam-adjusting device 5 includes: a stripping tube 51, a beam blocking plate 52, a slit sheet 53, a driving mechanism 54, a position sensor 55, a control card 56 and a PC 57; wherein the content of the first and second substances,
the beam blocking plate 52 is arranged in the stripping tube 51, and a beam penetrating hole 521 is arranged on the beam blocking plate 52 and is used for blocking electron bunches outside the beam penetrating hole and allowing the electron bunches at the beam penetrating hole 521 to penetrate. In specific implementation, the stripping tube 51 may be a vacuum tube, and a vacuum stripping cavity is formed by enclosing the stripping tube, so that the electron beam group is stripped in the vacuum stripping cavity, and the influence of external air on the stripping of the electron beam group is avoided; both ends of the stripping pipe 51 may be provided with end connecting flanges 513 for connecting flanges or other flange members at the ends of the accelerating pipe 22, thereby ensuring the vacuum degree of the stripping pipe 51 and the accelerating pipe 22. The beam blocking plate 52 may be a circular structure, which is coaxially disposed inside the peeling pipe 51, and a beam penetrating hole 521 may be disposed at a central position of the beam blocking plate 52; in the present embodiment, as shown in fig. 2, the number of the beam baffles 52 is four, and a plurality of the beam baffles 52 are arranged side by side and at intervals on the inner wall of the stripping tube 51 along the axial direction of the stripping tube 51 to sequentially filter the electron bunch; however, the present invention is not limited thereto, and in other embodiments, the number of the beam baffles 52 may be a suitable number, such as one, two, three, etc., which is not limited in this embodiment. As shown in fig. 2, the peeling pipe 51 is provided with an installation through hole 511 arranged along the radial direction of the peeling pipe 51, and the installation through hole 511 is provided with a sealing connection flange 512 for connecting other components in cooperation with the flange and sealing a gap at the installation through hole 511.
The slit sheet 53 is disposed at the rear side (right side as shown in fig. 2 or left side as shown in fig. 3) of the beam stopper, at least two slit holes 531 with different apertures are disposed on the slit sheet 53, and the slit sheet 53 is connected to the stripping tube 51 in a position-adjustable manner along the radial direction (vertical direction as shown in fig. 3) of the stripping tube 51, so as to adjust the positions of the slit holes 531, so as to perform different types of beam modulation on the electron bunch at the position where the beam penetrating hole 521 penetrates through the slit holes 531 with different apertures.
In a specific implementation, four slit sheets 53 may be provided, which may correspond to the beam blocking plates 52 one by one, and each slit sheet 53 is disposed at the rear side of the corresponding beam blocking plate 52, so that after the corresponding beam blocking plate 52 is filtered, the electron beam bunch is modulated by the slit sheet 53 to adjust the number of electrons in the electron beam bunch; in fig. 2, the slit sheets 53 are disposed on the rear sides of the first beam stopper 52 and the fourth beam stopper 52 from left to right, and when the beam stopper is specifically installed, the slit sheets 53 may be disposed on the rear sides of the middle two beam stoppers 52, however, the number and specific positions of the slit sheets 53 are not limited in the present invention, in other embodiments, the slit sheets 53 may be in other numbers, and only the slit sheets 53 are required to be in one-to-one correspondence with the beam stoppers 52, and each slit sheet 53 is disposed on the rear side of the corresponding beam stopper 52, compared with the case where one beam stopper 52 is disposed, the effect of beam adjustment of the slit sheet 53 is affected by mutual influence between the slit holes 531 on the slit sheets 53, so that the slit sheets 53 are in one-to-one correspondence with the beam stoppers 52, and each slit sheet 53 is disposed on the rear side of the corresponding beam stopper 52, and the beam adjustment effect can be ensured. The distance between the slit sheets 53 may be determined according to actual conditions, and is not limited in this embodiment.
In this embodiment, as shown in fig. 4 and 6 to 7, each slit sheet 53 may be provided with at least two slit holes 531 with different apertures along the length direction thereof, in this embodiment, each slit sheet 53 is provided with five slit holes 531, and the apertures between the five slit holes 531 are different from each other, so that different slit holes 531 may be adjusted to the beam through hole 521 by adjusting the positions of the slit sheets 53, so as to modulate, i.e., scrape, the electron beam group transmitted through the beam through hole 521, and the slit holes 531 with different apertures may implement different forms of beam modulation, i.e., when the slit holes 531 with different apertures are located at the beam through hole 521, the beam spots of the electron beam group transmitted through the slit holes 531 are different, and the number of electrons in the electron beam group is different and the flow intensity is different, i.e., the positions of the slit sheets 53 are adjusted to adjust the positions of the respective slit holes 531, so that the corresponding slit holes 531 are adjusted to the beam through hole 521, especially may be coaxially arranged with the beam through hole 521, thereby implementing adjustment and control of beam modulation. Wherein, four slit sheets 53 are provided, and each slit sheet 53 is provided with five slit holes 531 with different aperture, and 625 slit beam-adjusting combinations of 5 × 5 × 5 × 5 in total can be obtained by adjusting the positions of the four slit sheets 53.
The driving mechanism 54 is connected to the slit sheet 53, and is configured to drive the slit sheet 53 to adjust the position. In specific implementation, the driving mechanism 54 drives the slit sheet 53 to adjust the position, so that the slit holes 531 with different apertures are adjusted to the position coaxially arranged with the beam penetrating hole 521, thereby realizing the adjustment control of beam adjustment. In the present embodiment, a driving mechanism 54 is independently connected to each slit sheet 53 to realize independent driving and independent movement of the slit sheets 53, that is, independent position adjustment between the four slit sheets 53. In addition, in the present embodiment, as shown in fig. 5, a switching power supply may be connected to the driving mechanism 54 to supply power to the driving mechanism 54 and control the starting and stopping of the driving mechanism 54.
The position sensor 55 detects the current position of the slit sheet 53. Specifically, the position sensor 55 may be a grating scale position sensor, so that the position of the slit sheet 53 is detected by the grating scale to obtain the current position of the slit sheet 53, and further, the position of each slit hole 531 on the slit sheet 53, especially the current position of the target slit hole 531, can be obtained.
The PC 57 is used to acquire a target position of the slit sheet 53. Specifically, the PC 57 is responsible for man-machine communication to obtain a target position of the slit sheet 53, that is, which slit hole 531 on the slit sheet 53 is the target slit hole 531, and then the slit sheet 53 needs to perform position adjustment until the target slit hole 531 is adjusted to a position coaxially arranged with the beam penetrating hole 521.
The control card 56 is connected to the position sensor 55 and the PC 57, and is configured to receive the current position of the slit sheet 53 and the target position of the slit sheet 53, and control the driving mechanism 54 to control the position adjustment of the slit sheet 53 according to the current position of the slit sheet 53 and the target position of the slit sheet 53. Specifically, the beam-adjusting device adopts a control architecture of "PC + motion control card", that is, a motion controller based on PC performs control, and sends a position command to the driving mechanism 54 according to the position feedback of the position sensor 55 and the target position of the slit sheet 53, so that the driving mechanism 54 drives the slit sheet 53 to realize the control of the position adjustment of the slit sheet 53. The PC 57 and the control card 56 may be connected by a PCI bus.
With continued reference to fig. 4 and 6, the slit sheet 53 may include: the slit sheet comprises a slit sheet body 532 and an avoiding structure 533 arranged at the end of the slit sheet body 532; the avoiding structure 533 is a semicircular structure and is used for avoiding the inner wall of the peeling pipe so as to avoid interference between the slit sheet 53 and the inner wall of the peeling pipe 51. In specific implementation, an end (a left end as shown in fig. 4) of the slit sheet body 532 facing away from the avoiding structure 533 is connected to the driving mechanism 54, and when the slit hole 531 near the driving mechanism 54 is adjusted to a position coaxial with the beam penetrating hole 521, the avoiding structure 533 is disposed to avoid interference between the slit sheet 53 and the inner wall of the peeling tube 51. As shown in fig. 8 and 9, in order to improve the quality of the electron beam bunch after being scraped by the slit holes 531, preferably, the edge of each slit hole 531 is provided with a chamfer and a blade structure 5311; the slit sheet 53 has a certain thickness, and therefore, the edges (the left and right ends as shown in fig. 8) at the two ends of the slit hole 531 are chamfered to form the blade structure 5311, which can reduce the insulation problem caused by the discharge at the edge tip of the slit hole 531 due to the charge accumulation, and can reduce the uncontrollable beam scraping process caused by the thickness, thereby increasing the control accuracy of electronic regulation.
In the present embodiment, the aperture diameter of each slit hole 53 gradually decreases from the end of the slit sheet body 532 away from the avoiding structure 533 to the end of the avoiding structure 533, i.e., from bottom to top as shown in fig. 6. In this embodiment, the size of the electron beam cluster beam spot coming out of the acceleration section is smaller than 4mm, but the electron beam cluster beam spot is increased to 14mm due to the space charge effect in the transmission process of about 400mm, the length of the slit sheet 53 (the length in the vertical direction shown in fig. 6) may be 61.5mm, and the hole diameters of the slit holes 53 from bottom to top are 12mm, 10mm, 6mm, 2mm, and 1mm, respectively; meanwhile, the center distances between two adjacent holes from bottom to top are respectively 14mm, 12mm, 10mm and 9.5mm, so that only one slit hole 531 is positioned at the beam penetrating hole 521; of course, the aperture and the center distance of the holes may be other values, which is not limited in this embodiment; the aperture can be determined according to the beam parameters output by the accelerator 21 and the state distribution on the transmission line, the maximum value and the minimum value of the beam spot are determined, different apertures are processed on the slit sheet 53, and the aperture can also be selected according to the experiment requirements. The aperture of the beam penetrating hole 521 can be determined according to the aperture of the slit hole 53 and the hole center distance, and only when each slit hole 53 and the beam penetrating hole 521 are coaxially arranged, only the beam penetrating hole 521 is located at the beam penetrating hole 521, and other slit holes 53 are all arranged on the rear side of the solid plate of the beam blocking plate 52, so that interaction and mutual influence of the slit holes 53 are avoided. The slit sheet 53 may be made of stainless steel or oxygen-free copper plate, or may be made of other materials, which is not limited in this embodiment.
With continued reference to fig. 4, the drive mechanism 54 includes: a slit supporting rod 541, a driving motor 542 and a transmission component 543; the slit supporting rod 541 is slidably disposed through the peeling tube 51 along a radial direction of the peeling tube 51, a connecting end (a right end shown in fig. 4) of the slit supporting rod 541 is located inside the peeling tube 51 and is connected to the slit sheet 53, and a driving end (a left end shown in fig. 4) of the slit supporting rod 541 is disposed outside the peeling tube 51; the driving input end of the driving component 543 is connected with the power output end of the driving motor 542, and the driving output end of the driving component 543 is connected with the driving end of the slit supporting rod 541, so as to convert the rotation of the driving motor 543 into the reciprocating linear motion of the slit supporting rod 541, so that the slit supporting rod 541 slides along the radial direction of the peeling tube 51, and further drives the slit sheet 53 to adjust the position, thereby realizing the exchange of the slit hole 531.
In a specific implementation, the driving motor 542 and the transmission assembly 543 may be disposed outside the peeling tube 51 and on one side (the lower side as shown in fig. 4) of the slit supporting bar 541, and both may be mounted on the supporting platform to be supported by the supporting platform. The slit support rod 541 is slidably disposed through the installation through hole 511 along the radial direction of the peeling tube 51 to drive the slit piece 53 to perform a reciprocating linear motion under the action of the transmission component 543, thereby achieving a position adjustment. In addition, in the present embodiment, the operation state of the driving motor 542 may be controlled by the control card 56 to adjust the linear motion state of the slit supporting rod 541. In the present embodiment, as shown in fig. 5, the driving motor 542 may include a stepping motor and a stepping driver; the stepping driver processes the signals according to the position instruction of the control card and sends the processed pulse signals to the stepping motor, and the stepping motor receives the electric pulse signals and converts the electric pulse signals into corresponding angular displacement to drive the executive element, so that automatic control such as accurate positioning, synchronization and the like can be realized. Under the normal working condition, the rotating speed of the stepping motor depends on the frequency of the electric pulse signal, and the angular displacement is controlled by the quantity of the input pulses; the rotation direction of the stepping motor is changed by the phase sequence of the input pulse; in addition, the stepping motor has the characteristics of only periodic errors and no accumulated errors, and the like, so that the stepping motor and the driver are considered to be selected as a driving system.
With continued reference to fig. 4, in order to ensure the vacuum degree inside the peeling tube 51, preferably, a telescopic tube 544 is further disposed between the transmission output end of the transmission assembly 543 and the peeling tube 51, two ends of the telescopic tube 544 are respectively disposed on the transmission output end of the transmission assembly 543 and the installation through hole 511, and the telescopic tube 544 forms an adjustment cavity outside the peeling tube 51, which is communicated with the vacuum peeling cavity inside the peeling tube 51, for ensuring the vacuum degree of the vacuum peeling cavity. In specific implementation, the telescopic tube 544 is a welded corrugated tube, end flange connectors 5441 are arranged at both ends of the welded corrugated tube, and the right end of the telescopic tube 544 is connected with the sealing connection flange 512 at the installation through hole 511 through the end flange connectors 5441, so as to ensure the sealing property of the installation through hole 511; the left end of the bellows 544 is connected to the drive output of the drive assembly 543 via an end flange connection 5441 to ensure the sealing of the adjustment cavity. In this embodiment, the slit supporting rod 541, the slit sheet 53 and the transmission output end of the transmission assembly 543 form an integral structure, so as to implement synchronous motion; in the process of synchronous movement of the three components, the telescopic tube 544 can be adjusted in a telescopic manner along with the change of the distance between the transmission output end of the transmission component 543 and the installation through hole 511, so that the movement of the slit supporting rod 541 can be ensured not to be interfered, the vacuum degree of the vacuum stripping cavity can be ensured, and the influence of outside air on electrons in the vacuum stripping cavity can be avoided.
With continued reference to fig. 4, the transmission assembly 543 is a ball screw assembly, comprising: a sliding table base 5431, a screw rod 5432 and a support frame 5433; the screw rod 5432 is rotatably arranged on the sliding table base 5431, the support frame 5433 is slidably arranged on the sliding table base 5431, and the support frame 5433 is used for mounting the slit support rod 541; the lead screw 5432 penetrates through the support frame 5433, and the lead screw 5432 is in threaded connection with the support frame 5433 and is used for converting the rotation of the lead screw 5432 into the reciprocating linear movement of the support frame 5433 and further driving the slit support rod 541 to perform reciprocating linear movement.
In specific implementation, the sliding table base 5431 plays a supporting role; the right end of the screw rod 5432 is connected with an output shaft of the driving motor 542 so as to rotate forward and backward under the action of the driving motor 542; a coupling 5434 can be arranged between the right end of the screw rod 5432 and an output shaft of the driving motor 542 to realize connection between the right end and the output shaft; a lead screw bearing block 5435 may be provided between the lead screw 5432 and the sliding table base 5431 so as to allow relative rotation therebetween. The screw rod 5432 is in threaded connection with the support frame 5433, so that the support frame 5433 is driven to slide in two directions relative to the sliding table base 5431 when the screw rod 5432 rotates in the forward and reverse directions, and reciprocating linear motion is achieved. In order to improve the stability of the linear motion of the support frame 5433, preferably, a guide rail 5436 for guiding the reciprocating linear motion of the support frame 5433 is arranged on the sliding table base 5431, and the support frame 5433 is slidably connected with the guide rail 5436 and performs the reciprocating linear motion along the guide rail 5436. In this embodiment, the supporting frame 5433 may be provided with a flange connector 5437, the slit supporting rod 541 is mounted on the flange connector 5437, and the three perform synchronous reciprocating linear motion under the action of the lead screw 5432; meanwhile, the flange connector 5437 is connected to the end flange connector 5441 at the left end of the telescopic tube 544 to seal the adjustment cavity.
In the embodiment, in order to achieve high repeatability, the slit sheet 53 needs to be accurately adjusted, and the initial design requires that the adjustment step length of each step of the slit sheet 53 can be 5 μm; the slit sheet 53 is driven by a stepping motor to realize the reciprocating motion of the slit sheet 53. Wherein, the resetting precision of the slit sheet 53 is required to reach 0.02mm; the adjustment step size of the slit sheet 53 is 5 μm. To meet these accuracy requirements, the selection of an appropriate stepper motor and driver plays a key role in the functional implementation of the present invention. According to relevant parameters and performance indexes of the ball screw assembly, a two-phase hybrid stepping motor with a step angle of 1.8 degrees is selected; selecting a motor model of 57BYG250C, and searching to obtain the rotor inertia J of the motor m =0.5×10 -4 kg*m 2 The phase current is 3A, the phase resistance is 1.8 omega, the basic step angle is 1.8 degrees, and the length of the machine body is 76mm. At the same time for preventing mechanismWhen the power is suddenly cut off, the automatic sliding phenomenon occurs, so that the slit sheet 53 is inaccurately positioned, and even an unexpected safety accident can occur, therefore, the stepping motor needs to be braked to limit the motor to continuously rotate, and the stepping motor is connected with a brake device for mechanically braking the stepping motor.
In summary, in the beam modulation device and the quantum current generation system provided in the present embodiment, the beam blocking plate 52 blocks the electron beam group outside the beam penetrating hole, and allows the electron beam group at the beam penetrating hole 521 to penetrate through; the electron beam group penetrating through the beam penetrating hole 521 is modulated through the slit holes 531 on the slit sheet 53 to adjust parameters such as the number of electrons in the electron beam group, meanwhile, since at least two slit holes 531 with different apertures are arranged on the slit sheet 53, the slit sheet 53 can be driven through the driving mechanism 54, so that the slit sheet 53 is subjected to position adjustment along the radial direction of the stripping tube 51, so that the different slit holes 531 are adjusted to the beam penetrating hole 521, so as to modulate the electron beam group penetrating through the beam penetrating hole 521 in different forms through the slit holes 531 with different apertures, that is, when the slit holes 531 with different apertures are located at the beam penetrating hole 521, the beam spots of the electron beam group penetrating through the slit holes 531 are different, the number of electrons in the electron beam group is different, the flow intensity is different, that the position of each slit hole 531 is adjusted through the position adjustment of the slit sheet 53, so that the corresponding slit hole 531 is adjusted to the beam penetrating hole 521, especially can be coaxially arranged with the beam penetrating hole 521, thereby realizing beam modulation and adjustment and control, and realizing multiple kinds of electron beam intensity modulation. The beam adjusting device and the quantum current generating system have high flexibility, can perform multiple regulation and control on the same beam state, provide support for wide-range output of quantum current, can be applied to high-accuracy multi-unit combined beam regulation and control on a beam transmission line of a particle accelerator, solve the problem that the conventional electron beam group regulation and control mode is single and inconvenient to regulate and control, and have low cost and good experimental effect.
Further, the slit sheets 53 may be arranged side by side and at intervals along the peeling tube 51, and by the cooperation of the slit holes 531 on the slit sheets 53, the beam adjusting device formed by the combination of the slit sheets 53 can realize more kinds of beam adjusting combinations.
It should be noted that in the description of the present invention, the terms of direction or positional relationship indicated by the terms "upper", "lower", "left", "right", "inner", "outer", etc. are based on the directions or positional relationships shown in the drawings, which are only for convenience of description, and do not indicate or imply that the device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention.
Furthermore, it should be noted that, in the description of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.

Claims (12)

1. A beam conditioning apparatus, comprising: the device comprises a stripping pipe, a beam baffle plate, a slit sheet and a driving mechanism; wherein the content of the first and second substances,
the beam blocking plate is arranged in the stripping tube, and a beam penetrating hole is formed in the beam blocking plate and used for blocking an electron beam group outside the beam penetrating hole and enabling the electron beam group at the beam penetrating hole to penetrate through the beam penetrating hole;
the slit sheet is arranged on the rear side of the beam blocking plate along the transmission direction of the electron beam group, at least two slit holes with different apertures are arranged on the slit sheet, and the slit sheet is connected with the stripping tube along the radial direction of the stripping tube in a position-adjustable mode and is used for adjusting the positions of the slit holes so as to carry out different forms of beam modulation on the electron beam group at the position where the beam penetrating holes penetrate through the slit holes with different apertures;
the driving mechanism is connected with the slit sheet and used for driving the slit sheet to adjust the position.
2. The beam conditioning apparatus according to claim 1, wherein the driving mechanism comprises: the slit supporting rod, the driving motor and the transmission component are arranged on the slit supporting rod; wherein the content of the first and second substances,
the slit supporting rod can be slidably arranged in the stripping pipe in a penetrating manner along the radial direction of the stripping pipe, the connecting end of the slit supporting rod is positioned in the stripping pipe and is connected with the slit sheet, and the driving end of the slit supporting rod is arranged outside the stripping pipe;
the transmission input end of the transmission assembly is connected with the power output end of the driving motor, the transmission output end of the transmission assembly is connected with the driving end of the slit supporting rod and used for converting the rotation of the driving motor into the reciprocating linear motion of the slit supporting rod, so that the slit supporting rod slides along the radial direction of the stripping pipe to further drive the slit sheet to adjust the position, and the replacement of the slit hole is realized.
3. The beam conditioning apparatus of claim 2, wherein the transmission assembly is a ball screw assembly comprising: the sliding table comprises a sliding table base, a screw rod and a supporting frame; wherein the content of the first and second substances,
the screw rod is rotatably arranged on the sliding table base, the support frame is slidably arranged on the sliding table base, and the support frame is used for installing a slit support rod;
the screw rod penetrates through the support frame, is in threaded connection with the support frame and is used for converting the rotation of the screw rod into the reciprocating linear movement of the support frame and further driving the slit support rod to perform reciprocating linear movement.
4. The beam adjusting device according to claim 3, wherein a guide rail for guiding the reciprocating linear motion of the support frame is arranged on the sliding table base.
5. The beam conditioning apparatus according to claim 2,
the stripping pipe is a vacuum pipe, an installation through hole is formed in the stripping pipe, and the slit support rod is slidably arranged in the installation through hole in a penetrating mode;
and a telescopic pipe is further arranged between the transmission output end of the transmission assembly and the stripping pipe, two ends of the telescopic pipe are respectively arranged on the transmission output end of the transmission assembly and the installation through hole, the telescopic pipe is arranged outside the stripping pipe to form an adjusting cavity which is communicated with the vacuum stripping cavity inside the stripping pipe and used for ensuring the vacuum degree of the vacuum stripping cavity.
6. The beam conditioning device according to any one of claims 1 to 5, further comprising: the system comprises a position sensor, a control card and a PC (personal computer); wherein, the first and the second end of the pipe are connected with each other,
the position sensor is used for detecting the current position of the slit sheet;
the PC is used for acquiring a target position of the slit sheet;
the control card is respectively connected with the position sensor and the PC and is used for receiving the current position of the slit sheet and the target position of the slit sheet and controlling the driving mechanism to control the position adjustment of the slit sheet according to the current position of the slit sheet and the target position of the slit sheet.
7. The beam conditioning apparatus according to any one of claims 1 to 5,
the slit sheets and the beam baffles are in one-to-one correspondence, and the slit sheets are arranged on the rear sides of the corresponding beam baffles along the transmission direction of the electron beam clusters.
8. The beam conditioning apparatus according to any one of claims 1 to 5,
and chamfers are arranged on the edges of the two ends of each slit hole to form a blade structure.
9. The beam conditioning device according to any one of claims 1 to 5, wherein the slit sheet comprises:
a slit sheet body having a rectangular structure;
the avoidance structure is arranged at the end part of the slit sheet body and is of a semicircular structure and used for avoiding the inner wall of the stripping pipe.
10. A quantum current generating system, characterized in that a beam modulating device according to any one of claims 1 to 9 is provided.
11. The quantum current generation system of claim 10, further comprising:
a cluster generating section for generating an electron cluster;
the acceleration section is arranged at the rear side of the beam cluster generation section and is used for accelerating and focusing the electron beam cluster emitted by the beam cluster generation section so as to obtain an electron beam cluster with stronger pulse;
the beam modulation device is arranged at the stripping section and used for filtering and collimating the electron beam group with stronger pulse so as to control the quantity of electrons in the electron beam group;
and the detection section is arranged at the rear side of the stripping section and is used for detecting the electron beam group regulated and controlled by the beam regulating device.
12. The quantum current generation system of claim 11,
the beam group generation section is internally provided with an electron gun and an extraction electrode, the electron gun is used for providing an electron beam group, and the extraction electrode is used for preliminarily accelerating the electron beam group provided by the electron gun so as to provide energy emitted by the electron beam group, so that the electron beam group enters the acceleration section.
CN202210310573.9A 2022-03-28 2022-03-28 Beam modulation device and quantum current generation system with same Pending CN115942587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210310573.9A CN115942587A (en) 2022-03-28 2022-03-28 Beam modulation device and quantum current generation system with same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210310573.9A CN115942587A (en) 2022-03-28 2022-03-28 Beam modulation device and quantum current generation system with same

Publications (1)

Publication Number Publication Date
CN115942587A true CN115942587A (en) 2023-04-07

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Family Applications (1)

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Country Link
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