CN115803194A - Optical film with antifouling layer - Google Patents

Optical film with antifouling layer Download PDF

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Publication number
CN115803194A
CN115803194A CN202180049523.3A CN202180049523A CN115803194A CN 115803194 A CN115803194 A CN 115803194A CN 202180049523 A CN202180049523 A CN 202180049523A CN 115803194 A CN115803194 A CN 115803194A
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layer
optical film
antifouling
film
refractive index
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宫本幸大
梨木智刚
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Nitto Denko Corp
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Nitto Denko Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

The optical film (F) is an optical film with an antifouling layer, and comprises a transparent base material (10), an optical functional layer (20), and an antifouling layer (30) in this order. The outer surface (31) of the stain-resistant layer (30) on the side opposite to the optically functional layer (20) has a water contact angle of 110 DEG or more.

Description

Optical film with antifouling layer
Technical Field
The present invention relates to an optical film with an antifouling layer.
Background
A transparent optical film having a layer (optical functional layer) having a predetermined optical function is provided on the outer surface of a display such as a liquid crystal display on the image display side. Examples of the optical film include an antireflection film, a transparent conductive film, and an electromagnetic wave shielding film. The optical film includes, for example, a transparent substrate, an optical functional layer disposed on one surface side of the transparent substrate, and a pressure-sensitive adhesive layer disposed on the other surface of the transparent substrate. A related art of such an optical film is described in, for example, patent document 1 below.
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open publication No. 2017-227898
Disclosure of Invention
Problems to be solved by the invention
In the optical film having the optical functional layer as the outermost layer, contaminants such as hand grease are likely to adhere to the optical functional layer, and it is difficult to remove the contaminants from the optical functional layer. From the viewpoint of ensuring the transparency of the optical film, it is not preferable that contaminants are adhered to the optical film. Therefore, an antifouling layer is provided as an outermost layer on the optical film, for example. In such an optical film with a stain-resistant layer, the stain-resistant layer is required to have high stain resistance.
The invention provides an optical film with an antifouling layer, which is suitable for realizing high antifouling property of the antifouling layer.
Means for solving the problems
The present invention [1] is an optical film with an antifouling layer, which comprises a transparent base material, an optical functional layer, and an antifouling layer in this order, wherein the outer surface of the antifouling layer on the side opposite to the optical functional layer has a water contact angle of 110 ° or more.
The invention [2] is an optical film with an antifouling layer according to the above [1], wherein the outer surface has a surface roughness Ra of more than 2 nm.
The invention [3] comprises the optical film with an antifouling layer according to [1] or [2], wherein the optically functional layer is an antireflection layer.
The invention [4] includes the optical film with an antifouling layer according to [3], wherein the antireflection layer comprises a high refractive index layer having a relatively large refractive index and a low refractive index layer having a relatively small refractive index alternately.
The invention [5] is an optical film with an antifouling layer according to any one of the above [1] to [4], wherein the transparent base material has a hard coat layer on the optical function layer side.
The invention [6] is an optical film with a stain-proofing layer according to the above [5], wherein the hard coat layer contains metal oxide fine particles.
The invention [7] is the optical film with an antifouling layer according to [6], wherein the metal oxide fine particles are nano silica particles.
The invention [8] is an optical film with an antifouling layer according to any one of the above [5] to [7], wherein the surface of the hard coat layer on the optical function layer side has a surface roughness Ra of 0.5nm or more and 20nm or less.
ADVANTAGEOUS EFFECTS OF INVENTION
The optical film with a stain-proofing layer of the present invention is suitable for achieving high stain-proofing property of the stain-proofing layer because the outer surface of the stain-proofing layer on the side opposite to the optical functional layer has a water contact angle of 110 ° or more.
Drawings
FIG. 1 is a schematic cross-sectional view of one embodiment of an optical film of the present disclosure.
Fig. 2 is a schematic cross-sectional view of a modified example of the optical film of the present invention (in this modified example, the optical film includes a pressure-sensitive adhesive layer).
Detailed Description
As shown in fig. 1, an optical film F, which is one embodiment of the optical film with an antifouling layer according to the present invention, includes a transparent substrate 10, an optically functional layer 20, and an antifouling layer 30 in this order on one surface side in the thickness direction D. In the present embodiment, the optical film F includes the transparent base 10, the adhesive layer 40, the optically functional layer 20, and the stain-proofing layer 30 in this order on one side in the thickness direction D, and preferably includes the transparent base 10, the adhesive layer 40, the optically functional layer 20, and the stain-proofing layer 30. The optical film F has a shape spreading in a direction (plane direction) orthogonal to the thickness direction D.
In the present embodiment, the transparent substrate 10 includes the resin film 11 and the hard coat layer 12 in this order on one side in the thickness direction D.
The resin film 11 is a flexible transparent resin film. Examples of the material of the resin film 11 include polyester resins, polyolefin resins, polystyrene resins, acrylic resins, polycarbonate resins, polyether sulfone resins, polysulfone resins, polyamide resins, polyimide resins, cellulose resins, norbornene resins, polyarylate resins, and polyvinyl alcohol resins. As the polyester resin, for example, polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate are cited. As the polyolefin resin, for example, polyethylene, polypropylene and cycloolefin polymer are cited. Examples of the cellulose resin include cellulose triacetate. These materials may be used alone, or two or more of them may be used in combination. From the viewpoint of transparency and strength, a cellulose resin is preferably used as the material of the resin film 11, and cellulose triacetate is more preferably used.
The surface of the resin film 11 on the surface of the hard coat layer 12 may be subjected to a surface modification treatment. As the surface modification treatment, for example, corona treatment, plasma treatment, ozone treatment, primer treatment, glow treatment, and coupling agent treatment can be cited.
From the viewpoint of strength, the thickness of the resin film 11 is preferably 5 μm or more, more preferably 10 μm or more, and further preferably 20 μm or more. The thickness of the resin film 11 is preferably 300 μm or less, more preferably 200 μm or less, from the viewpoint of handling property.
From the viewpoint of transparency, the visible light transmittance of the resin film 11 is preferably 80% or more, and more preferably 90% or more. The visible light transmittance of the resin film 11 is, for example, 100% or less.
The hard coat layer 12 may be disposed on one surface of the resin film 11 in the thickness direction D. The hard coat layer 12 is a layer for making the exposed surface (upper surface in fig. 1) of the optical film F less likely to form scratches.
The hard coat layer 12 is a cured product of a curable resin composition. Examples of the curable resin contained in the curable resin composition include polyester resins, acrylic resins, urethane resins, acrylic urethane resins, amide resins, silicone resins, epoxy resins, and melamine resins. These curable resins may be used alone or in combination of two or more. From the viewpoint of ensuring high hardness of the hard coat layer 12, an acrylic resin and/or an acrylic urethane resin is preferably used as the curable resin.
Examples of the curable resin composition include an ultraviolet curable resin composition and a thermosetting resin composition. From the viewpoint of contributing to an improvement in the production efficiency of the optical film F by curing without heating at a high temperature, it is preferable to use an ultraviolet-curable resin composition as the curable resin composition. The ultraviolet-curable resin composition contains at least one selected from the group consisting of an ultraviolet-curable monomer, an ultraviolet-curable oligomer, and an ultraviolet-curable polymer. Examples of the ultraviolet-curable resin composition include a composition for forming a hard coat layer described in japanese patent application laid-open No. 2016-179686.
The hard coat layer 12 may be a hard coat layer having antiglare property (antiglare hard coat layer). The hard coat layer 12 as an antiglare hard coat layer is a cured product of a curable resin composition containing a curable resin (base resin) and microparticles for expressing antiglare properties (antiglare microparticles). Examples of the antiglare microparticles include metal oxide microparticles and organic microparticles. Examples of the material of the metal oxide fine particles include silica, alumina, titania, zirconia, calcium oxide, tin oxide, indium oxide, cadmium oxide, and antimony oxide. Examples of the material of the organic fine particles include polymethyl methacrylate, silicone, polystyrene, polyurethane, an acrylic-styrene copolymer, benzoguanamine, melamine, and polycarbonate. These fine particles may be used alone, or two or more kinds may be used in combination. From the viewpoint of imparting good antiglare properties to the hard coat layer 12, it is preferable to use at least one selected from the group consisting of nano silica particles, polymethyl methacrylate particles, and silicone particles as the antiglare fine particles.
The average particle diameter of the fine particles is, for example, 10 μm or less, preferably 8 μm or less, and, for example, 1nm or more. When nanoparticles are used as the fine particles, the average particle diameter of the fine particles is, for example, 100nm or less, preferably 70nm or less, and, for example, 1nm or more. The average particle diameter of the fine particles is determined as a D50 value (median diameter at 50% accumulation) from a particle size distribution obtained by a particle size distribution measurement method among laser light scattering methods, for example.
The refractive index of the base resin (after curing) is, for example, 1.46 or more, preferably 1.49 or more, more preferably 1.50 or more, and further preferably 1.51 or more. The refractive index is, for example, 1.60 or less, preferably 1.59 or less, more preferably 1.58 or less, and further preferably 1.57 or less.
The refractive index of the fine particles may be higher or lower than the refractive index of the base resin. When the refractive index of the fine particles is higher than that of the base resin, the refractive index of the fine particles is, for example, 1.62 or less, preferably 1.60 or less, more preferably 1.59 or less, and still more preferably 1.50 or less. When the refractive index of the fine particles is lower than that of the base resin, the refractive index of the fine particles is, for example, 1.40 or more, preferably 1.42 or more, and more preferably 1.44 or more.
The content of the fine particles in the hard coat layer 12 is preferably 1 part by mass or more, and more preferably 3 parts by mass or more, per 100 parts by mass of the base resin. The content of the fine particles in the hard coat layer 12 is preferably 30 parts by mass or less, and more preferably 20 parts by mass or less, with respect to 100 parts by mass of the base resin.
From the viewpoint of securing the hardness of the layer, the thickness of the hard coat layer 12 is preferably 0.5 μm or more, more preferably 1 μm or more. The thickness of the hard coat layer 12 is, for example, 10 μm or less.
The surface of the adhesion layer 40 side of the hard coat layer 12 may be subjected to a surface modification treatment. As the surface modification treatment, for example, plasma treatment, corona treatment, ozone treatment, primer treatment, glow treatment, and coupling agent treatment can be cited. From the viewpoint of ensuring high adhesion between the hard coat layer 12 and the adhesion layer 40, the adhesion layer 40-side surface of the hard coat layer 12 is preferably subjected to glow treatment.
From the viewpoint of strength, the thickness of the transparent substrate 10 is preferably 5 μm or more, more preferably 10 μm or more, and further preferably 20 μm or more. From the viewpoint of handling properties, the thickness of the transparent substrate 10 is preferably 300 μm or less, and more preferably 200 μm or less.
From the viewpoint of transparency, the visible light transmittance of the transparent substrate 10 is preferably 80% or more, more preferably 90% or more. The visible light transmittance of the transparent substrate 10 is, for example, 100% or less.
The surface on the optically functional layer 20 side of the transparent substrate 10 (in the present embodiment, the surface on the optically functional layer 20 side of the hard coat layer 12) preferably has a surface roughness Ra (arithmetic average surface roughness) of 0.5nm or more, more preferably 0.8nm or more. The surface roughness Ra is preferably 20nm or less, more preferably 15nm or less. The surface roughness Ra is obtained from an observation image of 1 μm square by AFM (atomic force microscope), for example.
The adhesion layer 40 is a layer for ensuring adhesion between the transparent substrate 10 and the optical function layer 20. The adhesion layer 40 is disposed on one surface of the transparent substrate 10 (specifically, the hard coat layer 12 of the transparent substrate 10 in the present embodiment) in the thickness direction D. Examples of the material of the adhesion layer 40 include metals such as silicon, nickel, chromium, aluminum, tin, gold, silver, platinum, zinc, titanium, tungsten, zirconium, and palladium; alloys of two or more of these metals; and oxides of these metals. From the viewpoint of satisfying both of the adhesion to the organic layer (specifically, the hard coat layer 12) and the oxide layer (specifically, the first high refractive index layer 21 described later) and the transparency of the adhesion layer 40, it is preferable to use silicon oxide (SiOx) or Indium Tin Oxide (ITO) as the material of the adhesion layer 40. When silicon oxide is used as the material of the adhesion layer 40, siOx, in which the oxygen amount is small as compared with the stoichiometric composition, is preferably used, and SiOx in which x is 1.2 or more and 1.9 or less is more preferably used.
From the viewpoint of securing the adhesive force between the transparent substrate 10 and the optical function layer 20 and also achieving transparency of the adhesive layer 40, the thickness of the adhesive layer 40 is, for example, 1nm or more, and, for example, 10nm or less.
The optically functional layer 20 is disposed on one surface of the adhesion layer 40 in the thickness direction D. In the present embodiment, the optically functional layer 20 is an antireflection layer for suppressing the reflection intensity of external light. That is, the optical film F is an antireflection film in the present embodiment.
The optical function layer 20 (antireflection layer) alternately has a high refractive index layer having a relatively large refractive index and a low refractive index layer having a relatively small refractive index in the thickness direction. The antireflection layer attenuates substantial intensity of reflected light by interference between reflected light at a plurality of interfaces of a plurality of thin layers (high refractive index layer, low refractive index layer) contained therein. In the antireflection layer, the interference action of attenuating the intensity of reflected light can be exhibited by adjusting the optical film thickness (product of refractive index and thickness) of each thin layer. In the present embodiment, specifically, the optical functional layer 20 as such an antireflection layer has a first high refractive index layer 21, a first low refractive index layer 22, a second high refractive index layer 23, and a second low refractive index layer 24 in this order toward one surface side in the thickness direction D.
The first high refractive index layer 21 and the second high refractive index layer 23 are each formed of a high refractive index material having a refractive index of preferably 1.9 or more at a wavelength of 550 nm. From the viewpoint of satisfying both the high refractive index and the low absorption of visible light, the high refractive index material may be, for example, niobium oxide (Nb) 2 O 5 ) Titanium oxide, zirconium oxide, tin-doped indium oxide (ITO) and antimony-doped tin oxide (ATO), preferably niobium oxide is used.
The optical film thickness (product of refractive index and thickness) of the first high refractive index layer 21 is, for example, 20nm or more, and is, for example, 55nm or less. The optical film thickness of the second high refractive index layer 23 is, for example, 60nm or more and, for example, 330nm or less.
The first low refractive index layer 22 and the second low refractive index layer 24 are each formed of a low refractive index material having a refractive index of preferably 1.6 or less at a wavelength of 550 nm. From the viewpoint of satisfying both the low refractive index and the low absorption of visible light, examples of the low refractive index material include silicon dioxide (SiO) 2 ) And magnesium fluoride, preferably dioxygenAnd (5) silicon is oxidized. As the material of the second low refractive index layer 24, silica is preferably used from the viewpoint of securing adhesion between the second low refractive index layer 24 and the stain-proofing layer 30.
The optical film thickness of the first low refractive index layer 22 is, for example, 15nm or more and, for example, 70nm or less. The optical film thickness of second low refractive index layer 24 is, for example, 100nm or more and, for example, 160nm or less.
In the optically functional layer 20, the thickness of the first high refractive index layer 21 is, for example, 1nm or more, preferably 5nm or more, and is, for example, 30nm or less, preferably 20nm or less. The thickness of the first low refractive index layer 22 is, for example, 10nm or more, preferably 20nm or more, and is, for example, 50nm or less, preferably 30nm or less. The thickness of the second high refractive index layer 23 is, for example, 50nm or more, preferably 80nm or more, and is, for example, 200nm or less, preferably 150nm or less. The thickness of the second low refractive index layer 24 is, for example, 60nm or more, preferably 80nm or more, and is, for example, 150nm or less, preferably 100nm or less.
The stain-proofing layer 30 is a layer having a stain-proofing function in the optical film F, and is disposed on one surface in the thickness direction D of the optical function layer 20. The antifouling layer 30 has an outer surface 31 on one surface side in the thickness direction D. The antifouling function of the antifouling layer 30 includes a function of inhibiting adhesion of pollutants such as hand grease to the film exposed surface when the optical film F is used, and a function of easily removing the adhered pollutants.
Examples of the material of the antifouling layer 30 include organic compounds containing a fluorine group. As the organic compound containing a fluorine group, an alkoxysilane compound having a perfluoropolyether group is preferably used. Examples of the alkoxysilane compound having a perfluoropolyether group include compounds represented by the following general formula (1).
R 1 -R 2 -X-(CH 2 ) m -Si(OR 3 ) 3 (1)
In the general formula (1), R 1 A linear fluoroalkyl group or a branched fluoroalkyl group (having 1 to 20 carbon atoms, for example) in which at least one hydrogen atom of an alkyl group is substituted with a fluorine atom, and preferably all hydrogen atoms of the alkyl groupPerfluoroalkyl groups substituted with fluorine atoms.
R 2 Represents a structure comprising a repeating structure of at least one perfluoropolyether (PFPE) group, preferably a structure comprising a repeating structure of two PFPE groups. Examples of the repeating structure of the PFPE group include a repeating structure of a linear PFPE group and a repeating structure of a branched PFPE group. Examples of the repeating structure of the linear PFPE group include- (OC) n F 2n ) p A structure represented by (n represents an integer of 1 or more and 20 or less, and p represents an integer of 1 or more and 50 or less). Examples of the repeating structure of the branched PFPE group include- (OC (CF) 3 ) 2 ) p -structure shown and- (OCF) 2 CF(CF 3 )CF 2 ) p -the structure shown. The repeating structure of the PFPE group is preferably a repeating structure of a linear PFPE group, and more preferably- (OCF) 2 ) p -and- (OC) 2 F 4 ) p -。
R 3 Represents an alkyl group having 1 to 4 carbon atoms, preferably a methyl group.
X represents an ether group, a carbonyl group, an amino group, or an amide group, preferably an ether group.
m represents an integer of 1 or more. M preferably represents an integer of 20 or less, more preferably 10 or less, and still more preferably 5 or less.
Among such alkoxysilane compounds having a perfluoropolyether group, a compound represented by the following general formula (2) is preferably used.
CF 3 -(OCF 2 ) q -(OC 2 F 4 ) r -O-(CH 2 ) 3 -Si(OCH 3 ) 3 (2)
In the general formula (2), q represents an integer of 1 to 50 inclusive, and r represents an integer of 1 to 50 inclusive.
Further, the alkoxysilane compound having a perfluoropolyether group may be used alone, or two or more kinds thereof may be used in combination.
In the present embodiment, the antifouling layer 30 is a film formed by a dry coating method (dry coating film). Examples of the dry coating method include sputtering, vacuum deposition, and CVD. The antifouling layer 30 is preferably a dry coating film, and more preferably a vacuum deposition film.
The configuration in which the material of the stain-proofing layer 30 contains an alkoxysilane compound having a perfluoropolyether group and the stain-proofing layer 30 is a dry coating film (preferably, a vacuum deposition film) is suitable for ensuring high bonding force of the stain-proofing layer 30 to the optical function layer 20, and therefore, is suitable for ensuring peeling resistance of the stain-proofing layer 30. The high peeling resistance of the antifouling layer 30 contributes to maintaining the antifouling performance of the antifouling layer 30.
The thickness of the antifouling layer 30 is preferably 1nm or more, more preferably 2nm or more, and further preferably 3nm or more. The thickness of the antifouling layer 30 is preferably 100nm or less, more preferably 50nm or less, and further preferably 30nm or less.
The outer surface 31 of the antifouling layer 30 has a water contact angle (pure water contact angle) of 110 ° or more, preferably 111 ° or more, more preferably 112 ° or more, further preferably 113 ° or more, and particularly preferably 114 ° or more. A configuration in which the water contact angle of the outer surface 31 is high to this extent is suitable for achieving high antifouling property of the antifouling layer 30. The water contact angle is 130 ° or less, for example. The water contact angle is determined by forming a water droplet (a droplet of pure water) having a diameter of 2mm or less on the outer surface 31 (exposed surface) of the antifouling layer 30 and measuring the contact angle of the water droplet with respect to the surface of the antifouling layer 30. The water contact angle of the outer surface 31 can be adjusted by, for example, adjusting the composition of the antifouling layer 30, the roughness of the outer surface 31, the composition of the hard coat layer 12, and the surface roughness of the optically functional layer 20 side of the hard coat layer 12.
The surface roughness Ra (arithmetic average surface roughness) of the outer surface 31 of the stain-proofing layer 30 is preferably 1nm or more, more preferably 1.3nm or more, and further preferably 2nm or more. This configuration is suitable for preventing the gloss feeling of the outer surface 31 of the stain-proofing layer 30 from becoming excessively strong. The surface roughness Ra is preferably 20nm or less, more preferably 18nm or less, and further preferably 17nm or less. Such a configuration is preferable from the viewpoint of optical characteristics and haze of the optical film F, and is suitable for suppressing white blurring (white blurring) of an image observed through the optical film F when the optical film F is provided on a display surface, for example.
The total reflection (total reflection in Japanese) Y value of the antifouling layer 30 is preferably 1 or less, more preferably 0.9 or less. The specular reflection Y value of the antifouling layer 30 is preferably 0.9 or less, and more preferably 0.8 or less. In the case where the optical film F is provided on a display surface, these constitutions are suitable for suppressing glare of a background at the display surface.
Total reflection Y value (Y) 1 ) And specular reflection Y value (Y) 2 ) The difference DeltaY (Y) 1 -Y 2 ) Preferably more than 0.13, more preferably 0.15 or more, and further preferably 0.17 or more. This configuration is suitable for ensuring the antiglare property of the antifouling layer 30 or the optical film F. The difference Δ Y is preferably 0.8 or less, more preferably 0.7 or less. In the case where the optical film F is provided on the display surface, such a configuration is suitable for suppressing white blurring of an image observed through the optical film F.
Specular reflection Y value (Y) 2 ) Relative to the total reflection Y value (Y) 1 ) Ratio (Y) 2 /Y 1 ) Preferably 0.15 or more, more preferably 0.18 or more. In the case where the optical film F is provided on the display surface, such a configuration is suitable for suppressing white blurring of an image observed through the optical film F. The ratio (Y) 2 /Y 1 ) Preferably 0.6 or less, more preferably 0.58 or less. This configuration is suitable for ensuring the antiglare property of the antifouling layer 30 or the optical film F.
The surface haze (external haze) of the antifouling layer 30 is preferably 20% or less, and more preferably 10% or less. This configuration is suitable for ensuring the transparency of the optical film F. The surface haze of the antifouling layer 30 is, for example, 0.01% or more.
The optical film F can be produced by preparing the transparent base material 10 and then laminating the adhesion layer 40, the optical function layer 20, and the stain-proofing layer 30 in this order on the transparent base material 10 by, for example, a roll-to-roll method. The optically functional layer 20 may be formed by sequentially laminating a first high refractive index layer 21, a first low refractive index layer 22, a second high refractive index layer 23, and a second low refractive index layer 24 on the adhesion layer 40.
The transparent substrate 10 can be produced by forming a hard coat layer 12 on a resin film 11. The hard coat layer 12 can be formed by, for example, applying a curable resin composition containing a curable resin and, if necessary, antiglare fine particles onto the resin film 11 to form a coating film, and then curing the coating film. When the curable resin composition contains an ultraviolet curable resin, the coating film is cured by ultraviolet irradiation. When the curable resin composition contains a thermosetting resin, the coating film is cured by heating.
The exposed surface of the hard coat layer 12 formed on the transparent substrate 10 is subjected to a surface modification treatment as needed. When the plasma treatment is performed as the surface modification treatment, argon gas, for example, is used as the inert gas. The discharge power in the plasma treatment is, for example, 10W or more, and 10000W or less.
The adhesion layer 40, the first high refractive index layer 21, the first low refractive index layer 22, the second high refractive index layer 23, and the second low refractive index layer 24 may be formed by film-forming a material by a dry coating method, respectively. The dry coating method includes sputtering, vacuum deposition, and CVD, and sputtering is preferably used.
In the sputtering method, a gas is introduced into a sputtering chamber under vacuum conditions, and a negative voltage is applied to a target disposed on a cathode. This causes glow discharge to ionize gas atoms, causing the gas ions to strike the target surface at high speed, ejecting the target material from the target surface, and depositing the ejected target material on a predetermined surface. In order to form the metal oxide layer, reactive sputtering is preferable from the viewpoint of film formation rate. In the reactive sputtering, a metal target is used as a target, and a mixed gas of an inert gas such as argon and oxygen (reactive gas) is used as the gas. The ratio of oxygen contained in the metal oxide layer to be formed can be adjusted by adjusting the flow ratio (sccm) of the inert gas to the oxygen gas.
Examples of the power source for performing the sputtering method include a DC power source, an AC power source, an RF power source, and an MFAC power source (an AC power source having a frequency band of several tens to several hundreds MHz). The discharge voltage in the sputtering method is, for example, 200V or more and, for example, 1000V or less. The film forming pressure in the sputtering chamber to be subjected to the sputtering method is, for example, 0.01Pa or more, and 2Pa or less.
The antifouling layer 30 can be formed by forming a film of, for example, an organic compound containing a fluorine group on the optical function layer 20. As a method for forming the antifouling layer 30, a dry coating method is exemplified. Examples of the dry coating method include a vacuum deposition method, a sputtering method, and CVD, and the vacuum deposition method is preferably used.
For example, the optical film F can be manufactured as described above. The optical film F is used by attaching the transparent base material 10 side to an adherend with an adhesive, for example.
The optical film F may be other optical films than the antireflection film. Examples of the other optical film include a transparent conductive film and an electromagnetic wave shielding film.
When the optical film F is a transparent conductive film, the optical functional layer 20 of the optical film F includes, for example, a first dielectric film, a transparent electrode film such as an ITO film, and a second dielectric film in this order toward one surface side in the thickness direction D. The optical function layer 20 having such a laminated structure can achieve both visible light transmittance and electrical conductivity.
When the optical film F is an electromagnetic wave shielding film, the optical functional layer 20 of the optical film F includes, for example, a metal thin film and a metal oxide film having electromagnetic wave reflecting ability alternately in the thickness direction D. The optical function layer 20 having such a laminated structure can achieve both shielding properties against electromagnetic waves of a specific wavelength and visible light transmittance.
As shown in fig. 2, the optical film F may include a pressure-sensitive adhesive layer 50 disposed on the other surface in the thickness direction D of the transparent substrate 10.
The pressure-sensitive adhesive layer 50 is a layer formed from an adhesive composition and has light transmittance. The adhesive composition contains at least a base polymer that causes the adhesive layer 50 to exhibit adhesiveness. Examples of the base polymer include acrylic polymers, rubber polymers, silicone polymers, urethane polymers, polyester polymers, and polyamide polymers. From the viewpoint of achieving both the adhesive strength and high transparency required for the pressure-sensitive adhesive layer 50 of the optical film F, an acrylic polymer is preferably used as the base polymer.
The thickness of the pressure-sensitive adhesive layer 50 is preferably 5 μm or more, more preferably 10 μm or more, and still more preferably 15 μm or more, from the viewpoint of achieving sufficient adhesive strength of the optical film F to an adherend. From the viewpoint of ensuring transparency, the thickness of the pressure-sensitive adhesive layer 50 is preferably 300 μm or less, more preferably 200 μm or less, and still more preferably 100 μm or less.
The optical film F shown in fig. 2 can be manufactured, for example, as follows. First, an adhesive composition is applied to a release liner to form a coating film. Next, the coating film on the release liner is dried as necessary. Thereby, the adhesive layer 50 is formed on the release liner. Next, the exposed surface of the pressure-sensitive adhesive layer 50 is bonded to the other surface (lower surface in fig. 1) in the thickness direction D of the transparent substrate 10 of the optical film F shown in fig. 1. For example, in this manner, the optical film F shown in fig. 2 can be manufactured.
When the optical film F includes the pressure-sensitive adhesive layer 50, no additional adhesive is required for bonding to an adherend.
Examples
The present invention will be specifically explained below with reference to examples. The invention is not limited to the embodiments. Specific numerical values of the amount (content), physical property values, parameters, and the like described below may be replaced with upper limits (numerical values defined as "lower" or "less than") or lower limits (numerical values defined as "upper" or "more than") described in association with the amount (content), physical property values, parameters, and the like described in the above-mentioned "embodiment".
[ example 1]
First, an antiglare hard coat layer was formed on one surface of a cellulose Triacetate (TAC) film (thickness 80 μm) as a transparent resin film (hard coat layer forming step). In this step, first, 50 parts by mass of an ultraviolet-curable urethane acrylate (trade name "UV1700TL", manufactured by Nippon synthetic chemical industries Co., ltd.) and 50 parts by mass of an ultraviolet-curable polyfunctional acrylate (trade name "Viscoat #300", manufactured by Osaka organic chemical industries Co., ltd.) were mixed togetherPolymethyl methacrylate particles (trade name "TECHPOLYMER", average particle diameter 3 μm, refractive index 1.525, manufactured by hydrochemical industries) as antiglare fine particles, silicone particles (trade name "tospearll 130", average particle diameter 3 μm, refractive index 1.42, manufactured by Momentive Performance Materials Japan) as antiglare fine particles, 1.5 parts by mass of a thixotropy imparting agent (trade name "125234012475125124124791245212412442 SAN, synthetic montmorillonite as organoclay, manufactured by Co-op Chemical company) 1.5 parts by mass, a photopolymerization initiator (trade name" omni ", manufactured by BASF company) 3 parts by mass of a leveling agent (trade name" mle 303", manufactured by coorgani Chemical company) 0.15 parts by mass, and a toluene/ethyl acetate/cyclocyclopentanone mixed solvent (mass ratio: 35% 41, a varnish concentration of 24% by mass. An ultrasonic disperser was used in the mixing. Then, a coating film is formed by applying the composition to one side of the TAC film. Subsequently, the coating film is cured by ultraviolet irradiation and then dried by heating. In the ultraviolet irradiation, a high-pressure mercury lamp was used as a light source, and ultraviolet rays having a wavelength of 365nm were used to set the cumulative irradiation light amount to 300mJ/cm 2 . The heating temperature was set to 80 ℃ and the heating time was set to 60 seconds. Thus, an antiglare hard coat layer (first HC layer) having a thickness of 8 μm was formed on the TAC film.
Next, the HC layer surface of the TAC film having the HC layer was subjected to plasma treatment in a vacuum atmosphere of 1.0Pa by a roll-to-roll plasma treatment apparatus. In the plasma treatment, argon gas was used as an inert gas, and the discharge power was 2400W.
Next, an adhesion layer and an antireflection layer are sequentially formed on the HC layer of the TAC film with the HC layer after the plasma treatment (sputtering film formation step). Specifically, a SiOx layer (x) having a thickness of 3.5nm was formed as an adhesion layer in this order on the HC layer of the TAC film with the HC layer after the plasma treatment by a roll-to-roll sputtering film forming apparatus<2) Nb as the first high refractive index layer and having a thickness of 12nm 2 O 5 Layer, siO as first low refractive index layer with a thickness of 28nm 2 Layer as the second high refractive indexNb with a layer thickness of 100nm 2 O 5 Layer and SiO with a thickness of 85nm as second low-refractive-index layer 2 A layer. In the formation of the adhesion layer, an SiOx layer (x) was formed by MFAC sputtering using an Si target, argon gas as an inert gas, and oxygen gas as a reactive gas in an amount of 3 parts by volume per 100 parts by volume of argon gas, with a discharge voltage of 520V and a gas pressure (film forming gas pressure) in a film forming chamber of 0.27Pa<2). In the formation of the first high refractive index layer, nb was film-formed by MFAC sputtering using an Nb target, 100 parts by volume of argon gas and 5 parts by volume of oxygen gas, a discharge voltage of 415V, and a film formation pressure of 0.42Pa 2 O 5 And (3) a layer. In the formation of the first low refractive index layer, siO was formed by MFAC sputtering using an Si target, 100 parts by volume of argon gas and 30 parts by volume of oxygen gas, a discharge voltage of 350V, and a film formation pressure of 0.3Pa 2 And (3) a layer. In the formation of the second high refractive index layer, nb was film-formed by MFAC sputtering using an Nb target, 100 parts by volume of argon gas and 13 parts by volume of oxygen gas, a discharge voltage of 460V, and a film formation pressure of 0.5Pa 2 O 5 A layer. In the formation of the second low refractive index layer, siO was formed by MFAC sputtering using an Si target, 100 parts by volume of argon gas and 30 parts by volume of oxygen gas, a discharge voltage of 340V, and a film formation pressure of 0.25Pa 2 And (3) a layer. As described above, the antireflection layer (first high refractive index layer, first low refractive index layer, second high refractive index layer, second low refractive index layer) was formed by laminating the HC layer of the TAC film having the HC layer with the adhesion layer interposed therebetween.
Next, an antifouling layer is formed on the antireflection layer thus formed (antifouling layer forming step). Specifically, an anti-fouling layer having a thickness of 7nm was formed on the anti-reflection layer by a vacuum deposition method using an alkoxysilane compound containing a perfluoropolyether group as a deposition source. The vapor deposition source was a solid content obtained by drying "Optool UD509" (an alkoxysilane compound containing a perfluoropolyether group represented by the general formula (2) described above, having a solid content concentration of 20 mass%) manufactured by the seikagaku industries co. The heating temperature of the vapor deposition source in the vacuum vapor deposition method was 260 ℃.
In the same manner as above, the optical film of example 1 was produced. The optical film of example 1 includes a transparent base material (resin film, hard coat layer), an adhesion layer, an antireflection layer, and an antifouling layer in this order on one surface side in the thickness direction.
[ example 2]
The optical film of example 2 was produced in the same manner as the optical film of example 1 except that a solid component obtained by drying "Optool UD120" (an alkoxysilane compound containing a perfluoropolyether group) manufactured by dajin industries, inc.
[ example 3]
First, an antiglare hard coat layer was formed on one surface of a cellulose Triacetate (TAC) film (thickness: 80 μm) as a transparent resin film (hard coat layer forming step). In this step, 100 parts by mass of an ultraviolet-curable acrylic monomer (trade name "GRANDIC PC-1070", manufactured by DIC corporation), 25 parts by mass (in terms of nano silica particles) of a silicone sol containing nano silica particles as antiglare fine particles (trade name "MEK-ST-L", average primary particle size of nano silica particles is 50nm, solid content concentration is 30% by mass, manufactured by japanese Chemical), 1.5 parts by mass of a thixotropy imparting agent (trade name "1252312540124753179124124124525279124san", synthetic montmorillonite as organoclay, manufactured by Co-op Chemical corporation), 3 parts by mass of a photopolymerization initiator (trade name "niomrad 907", manufactured by BASF), and 0.15 parts by mass of a leveling agent (trade name "LE303", manufactured by coorony Chemical corporation) were mixed to prepare a composition (varnish) having a solid content concentration of 55% by mass. An ultrasonic disperser was used in the mixing. Then, a coating film is formed by applying the composition to one side of the TAC film. Subsequently, the coating film is cured by ultraviolet irradiation and then dried by heating. In the ultraviolet irradiation, a high-pressure mercury lamp was used as a light source, ultraviolet rays having a wavelength of 365nm were used, and the cumulative irradiation light amount was set to 200mJ/cm 2 . The heating temperature was set to 80 ℃ and the heating time was set to 3 minutes. Thus, an antiglare hard coat layer (second HC layer) having a thickness of 6 μm was formed on the TAC film.
Next, the HC layer surface of the TAC film having the HC layer was subjected to plasma treatment in a vacuum atmosphere of 1.0Pa by using a roll-to-roll plasma treatment apparatus. In the plasma treatment, argon gas was used as an inert gas, and the discharge power was set to 150W.
Next, an adhesion layer and an antireflection layer are sequentially formed on the HC layer of the TAC film with the HC layer after the plasma treatment (sputtering film formation step). Specifically, an Indium Tin Oxide (ITO) layer having a thickness of 1.5nm as an adhesion layer and Nb having a thickness of 12nm as a first high refractive index layer were sequentially formed on the HC layer of the TAC thin film having the HC layer after the plasma treatment by a roll-to-roll sputter film forming apparatus 2 O 5 Layer, siO as first low refractive index layer with a thickness of 28nm 2 Layer of 100nm thick Nb as a second high refractive index layer 2 O 5 Layer and SiO with a thickness of 85nm as second low-refractive-index layer 2 And (3) a layer. In the formation of the adhesion layer, an ITO layer was formed by MFAC sputtering using an ITO target, argon gas as an inert gas, and oxygen gas as a reactive gas in an amount of 10 parts by volume relative to 100 parts by volume of argon gas, with a discharge voltage of 400V, and a gas pressure in the film forming chamber (film forming pressure) of 0.2 Pa. The conditions for forming the first high refractive index layer, the first low refractive index layer, the second high refractive index layer, and the second low refractive index layer in this example were the same as those for forming the first high refractive index layer, the first low refractive index layer, the second high refractive index layer, and the second low refractive index layer in example 1.
Next, an anti-fouling layer is formed on the formed anti-reflection layer (anti-fouling layer forming step). Specifically, the same procedure as in the step of forming the antifouling layer in example 1 was performed (as a vapor deposition source, a solid component obtained by drying "Optool UD509" manufactured by dawn industries, ltd.) was used.
In the same manner as above, the optical film of example 3 was produced. The optical film of example 3 includes a transparent base material (resin film, hard coat layer), an adhesion layer, an antireflection layer, and an antifouling layer in this order on one surface side in the thickness direction.
[ example 4]
The optical film of example 4 was produced in the same manner as the optical film of example 3 except that a solid component obtained by drying "Optool UD120" (an alkoxysilane compound containing a perfluoropolyether group) manufactured by da, inc.
[ example 5]
The optical film of example 5 was produced in the same manner as the optical film of example 3 except that a solid component obtained by drying "KY-1901" (an alkoxysilane compound containing a perfluoropolyether group) manufactured by shin-Etsu chemical Co., ltd., was used as a vapor deposition source in the antifouling layer forming step.
[ example 6]
An optical film of example 6 was produced in the same manner as the optical film of example 3, except for the hard coat layer forming step and the antifouling layer forming step.
In the hard coat layer forming step of example 6, 67 parts by mass of an acrylic monomer composition containing nano silica particles (trade name "NC035", an average primary particle diameter of nano silica particles is 40nm, a solid content concentration is 50% by mass, a proportion of nano silica particles in the solid content is 60% by mass, manufactured by mithrawa Chemical industry corporation), 33 parts by mass of an ultraviolet-curable polyfunctional acrylate (trade name "binder a", a solid content concentration is 100% by mass, manufactured by mithrawa Chemical industry corporation), 3 parts by mass of polymethyl methacrylate particles (trade name "techlymer", an average particle diameter is 3 μm, a refractive index is 1.525, manufactured by water chemicals industry corporation) as antiglare fine particles, 1.5 parts by mass of silicone particles (trade name "TOSPEARL 130", an average particle diameter is 3 μm, a refractive index is 1.42, manufactured by moive Materials Japan) as a thixotropic agent (trade name: 124124795 parts by mass, a synthetic clay (trade name: r) and a photopolymerization initiator (product name: noc — 1257915, manufactured by bas corporation) as a synthetic Co-1251251251255 parts by mass of organic initiator (product corporation)A composition (varnish) having a concentration of 45 mass%. An ultrasonic disperser was used in the mixing. Next, a coating film is formed by applying the composition to one surface of the TAC film. Subsequently, the coating film is cured by ultraviolet irradiation and then dried by heating. In the ultraviolet irradiation, a high-pressure mercury lamp was used as a light source, and ultraviolet rays having a wavelength of 365nm were used to set the cumulative irradiation light amount to 200mJ/cm 2 . The heating temperature was set to 60 ℃ and the heating time was set to 60 seconds. Thus, an antiglare hard coat layer (third HC layer) having a thickness of 7 μm was formed on the TAC film.
In the antifouling layer forming step of example 6, a solid component obtained by drying "Optool UD120" (an alkoxysilane compound containing a perfluoropolyether group) manufactured by the seikagaku industries co.
[ example 7]
The optical film of example 7 was produced in the same manner as the optical film of example 6 except that a solid component obtained by drying "KY-1901" (an alkoxysilane compound containing a perfluoropolyether group) manufactured by shin-Etsu chemical Co., ltd was used as a vapor deposition source in the step of forming the antifouling layer.
[ example 8]
An optical film of example 8 was produced in the same manner as the optical film of example 3, except for the hard coat layer forming step and the antifouling layer forming step.
In the hard coat layer forming step of example 8, 83 parts by mass of an acrylic monomer composition containing nano silica particles (trade name "NC035HS", average primary particle diameter of nano silica particles is 40nm, solid content concentration is 50% by mass, proportion of nano silica particles in solid content is 60% by mass, manufactured by seikagawa chemical industry co.), 17 parts by mass of an ultraviolet-curable polyfunctional urethane acrylate (trade name "BEAMSET 580", solid content concentration is 70% by mass, manufactured by seikagawa chemical industry co.), and 4 parts by mass of polymethyl methacrylate particles (trade name "techlymer", average particle diameter is 3 μm, refractive index is 1.495, manufactured by seikagawa chemical industry co.) as antiglare fine particles were mixed togetherA composition (varnish) having a solid content of 42 mass% was prepared by mixing 0.1 mass parts of silicone particles (trade name "TOSPEARL 130", having an average particle diameter of 3 μm, a refractive index of 1.42, manufactured by Momentive Performance Materials Japan corporation) as antiglare fine particles, 2.0 mass parts of a thixotropy imparting agent (trade name "125234012475125124794, manufactured by Co-op Chemical corporation), 3 mass parts of a photopolymerization initiator (trade name" OMNIRAD907", manufactured by BASF corporation), 0.15 mass parts of a leveling agent (trade name" LE303", manufactured by coyoko Chemical corporation), and butyl acetate. An ultrasonic disperser was used in the mixing. Then, a coating film is formed by applying the composition to one side of the TAC film. Subsequently, the coating film is cured by ultraviolet irradiation and then dried by heating. In the ultraviolet irradiation, a high-pressure mercury lamp was used as a light source, and ultraviolet rays having a wavelength of 365nm were used to set the cumulative irradiation light amount to 200mJ/cm 2 . The heating temperature was 60 ℃ and the heating time was 60 seconds. Thus, an antiglare hard coat layer (fourth HC layer) having a thickness of 8 μm was formed on the TAC film.
In the antifouling layer forming step of example 8, a solid component obtained by drying "KY-1903-1" (an alkoxysilane compound containing a perfluoropolyether group) manufactured by shin-Etsu chemical Co., ltd was used as a vapor deposition source.
[ comparative example 1]
An optical film of comparative example 1 was produced in the same manner as the optical film of example 1, except for the antifouling layer forming step.
In the antifouling layer forming step of comparative example 1, "Optool UD509" (manufactured by seikagaku industries, inc.) as a coating agent was first diluted with a dilution solvent (trade name, "Fluorinert", manufactured by 3M corporation) to prepare a coating liquid having a solid content concentration of 0.1 mass%. Next, a coating solution is applied by gravure coating on the antireflection layer formed by the sputtering film formation step to form a coating film. Subsequently, the coating film was dried by heating at 60 ℃ for 2 minutes. Thus, an anti-fouling layer having a thickness of 7nm was formed on the anti-reflection layer.
Water contact angle
The water contact angles of the surfaces of the stain-repellent layers were examined for the optical films of examples 1 to 8 and comparative example 1. First, about 1. Mu.L of pure water was dropped on the surface of the antifouling layer of the optical film to form water droplets. Subsequently, the angle formed between the surface of the water droplet on the surface of the antifouling layer and the surface of the antifouling layer was measured. A contact angle meter (trade name "DMo-501", manufactured by Kyowa interface science) was used for the measurement. The measurement results are shown in table 1.
Surface roughness Ra
The surface roughness Ra of the antifouling layer was examined for each of the optical films of examples 1 to 8 and comparative example 1. Specifically, the antifouling layer surface of each optical film was observed with an atomic force microscope (trade name "SPI3800", manufactured by Seiko Instruments inc.) to determine the surface roughness Ra (arithmetic average roughness) in an observation image of 1 μm square. The results are shown in table 1.
Total reflection and specular reflection
The total reflection Y value and the specular reflection Y value were measured as follows for each of the optical films of examples 1 to 8 and comparative example 1.
First, the transparent substrate side of a sample film (50 mm × 50 mm) cut out from an optical film was bonded to a black acrylic plate with an adhesive. Next, a total reflectance measurement was performed on the sample attached to the black acrylic plate using a spectrophotometer (trade name "U-4100", manufactured by Hitachi Hipposhu Co., ltd.). From the spectral reflectance at a wavelength of 380 to 780nm obtained by the measurement and the relative spectral distribution of the CIE standard illuminant D65, the tristimulus value Y based on the reflected object color in the XYZ color system defined in JIS Z8701 is calculated, and the total reflection Y value is obtained.
Further, the sample attached to the black acrylic plate was subjected to specular reflection measurement under conditions such that the incident angle of light was 5 ° while scattered light was removed by a tool attached to U-4100 using a spectrophotometer (trade name "U-4100"). The tristimulus value Y based on the reflected object color in the XYZ color system defined in JIS Z8701 is calculated from the spectral reflectance at a wavelength of 380 to 780nm obtained by the measurement and the relative spectral distribution of CIE standard illuminant D65, and the specular reflection Y value is obtained.
The total reflection Y value (Y) 1 ) Specular reflection Y value (Y) 2 ) The difference DeltaY (Y) between the total reflection Y value and the specular reflection Y value 1 -Y 2 ) And the ratio of the specular reflection Y value to the total reflection Y value (Y) 2 /Y 1 ) Shown in table 1.
Surface haze
The surface haze was examined for each of the optical films of examples 1 to 8 and comparative example 1. Specifically, first, with respect to a sample film cut out from an optical film, haze measurement was performed in accordance with JIS K7136 (2000) using a haze meter HM150 manufactured by murakamura color technology research (thereby measuring the total haze value of the sample film). Next, a cycloolefin polymer film was bonded to the surface of the sample film on the side of the antifouling layer via an adhesive, and haze measurement was performed in accordance with JIS K7136 (2000) using a haze meter HM150 manufactured by murakamura color technology research in a state where the surface haze of the sample film was removed (thereby measuring the internal haze value of the sample film). Then, the internal haze value was subtracted from the total haze value to obtain the value of the external haze (surface haze). The values are shown in Table 1.
Evaluation of antifouling Property
The antifouling properties of the antifouling layers were examined for the optical films of examples 1 to 8 and comparative example 1. Specifically, a finger touches the surface of the antifouling layer of the optical film to attach a fingerprint. Next, the fingerprint was wiped with a cotton waste tip 3 times (operation of bringing the waste tip into contact with the area including the fingerprint-adhering portion on the surface of the stain-repellent layer and scanning the waste tip in one direction). In addition, regarding the stain-proofing property of the stain-proofing layer, the evaluation was "good" when the fingerprint was wiped off by 3 wiping operations, and the evaluation was "bad" when the fingerprint was not wiped off by 3 wiping operations (that is, when a part of the fingerprint remained). The results are shown in table 1.
[ Table 1]
Figure BDA0004048010130000211
The above embodiments are illustrative of the present invention, and the present invention is not to be construed as being limited thereto. Variations of the invention that are obvious to those skilled in the art are intended to be encompassed by the foregoing claims.
Industrial applicability
The optical film with an antifouling layer of the present invention is applicable to, for example, an antireflection film with an antifouling layer, a transparent conductive film with an antifouling layer, and an electromagnetic wave shielding film with an antifouling layer.
Description of the reference numerals
F optical film (optical film with antifouling layer)
10. Transparent substrate
11. Resin film
12. Hard coating
20. Optically functional layer
21. First high refractive index layer
22. A first low refractive index layer
23. Second high refractive index layer
24. A second low refractive index layer
30. Antifouling layer
31. Outer surface of
40. Bonding layer
50. Adhesive layer

Claims (8)

1. An optical film with an antifouling layer, comprising a transparent base material, an optical functional layer and an antifouling layer in this order,
the outer surface of the antifouling layer on the side opposite to the optically functional layer has a water contact angle of 110 ° or more.
2. The antifouling-coated optical film according to claim 1, wherein the outer surface has a surface roughness Ra of more than 2 nm.
3. The antifouling-coated optical film according to claim 1 or 2, wherein the optically functional layer is an antireflection layer.
4. The antifouling-coated optical film according to claim 3, wherein the antireflection layer comprises high refractive index layers having a relatively large refractive index and low refractive index layers having a relatively small refractive index alternately.
5. The antifouling-layer-provided optical film according to any one of claims 1 to 4, wherein the transparent base material has a hard coat layer on the optical functional layer side.
6. The antifouling-coated optical film according to claim 5, wherein the hard coat layer contains metal oxide fine particles.
7. The antifouling-coated optical film according to claim 6, wherein the metal oxide fine particles are nano silica particles.
8. The optical film with a stain-proofing layer according to any one of claims 5 to 7, wherein the surface of the hard coat layer on the optical function layer side has a surface roughness Ra of 0.5nm or more and 20nm or less.
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