CN115745427A - Vacuum dehydroxylation furnace for semiconductor quartz glass products - Google Patents
Vacuum dehydroxylation furnace for semiconductor quartz glass products Download PDFInfo
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- CN115745427A CN115745427A CN202211517562.4A CN202211517562A CN115745427A CN 115745427 A CN115745427 A CN 115745427A CN 202211517562 A CN202211517562 A CN 202211517562A CN 115745427 A CN115745427 A CN 115745427A
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- heating furnace
- cover plate
- furnace
- quartz glass
- sliding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Abstract
The invention relates to the technical field of vacuum dehydroxylation furnaces, in particular to a vacuum dehydroxylation furnace for semiconductor quartz glass products, which comprises a heating furnace, a cover plate and a placing frame, and further comprises a movement control assembly, wherein one end of the heating furnace is communicated with the outside, the cover plate can seal the heating furnace, the placing frame is detachably arranged on two main surfaces of the cover plate, the number of the placing frame on each surface is at least one, the movement control assembly is fixedly arranged on the heating furnace, the output end of the movement control assembly can drive the cover plate to be far away from the heating furnace along the linear direction, when the cover plate moves to the position far away from the heating furnace, the output end of the movement control assembly controls the cover plate to rotate 180 degrees on the horizontal plane, and after the cover plate rotates, the movement control assembly drives the heating furnace to be sealed under the condition that the cover plate is ensured. The invention reduces the operation needing manual participation, ensures that the cover plate can not generate errors in movement and rotation, and improves the integral working efficiency.
Description
Technical Field
The invention relates to the technical field of vacuum dehydroxylation furnaces, in particular to a vacuum dehydroxylation furnace for semiconductor quartz glass products.
Background
After the quartz product is produced, the finished product needs to be heated to remove the hydroxyl compounds in the material, and the currently common dehydroxylation equipment is a vacuum dehydroxylation furnace, wherein the quartz product is placed inside the dehydroxylation furnace, and the hydroxyl compounds in the material are removed by heating and other chemical means. Traditional semiconductor is vacuum dehydroxylation stove for quartz glass goods, need lift the rack that is equipped with the product after dehydroxylation finishes, because just having processed, rack and product have higher temperature, unload and need consume more time, equipment needs to shut down for a long time promptly, great reduction machining efficiency.
Chinese patent CN215712589U discloses a vacuum dehydroxylation furnace for semiconductor quartz glass products, through rotating the apron, can exchange both sides rack position, can be with waiting to process and the product position interchange that is processed promptly, can unload and process simultaneously, great reduction equipment down time, machining efficiency has been improved, but this scheme is because apron and heating furnace contact when using, there is high temperature on just keeping away from the apron of heating furnace, must wait for the temperature to remove or use work can just rotate the apron this moment, secondly there is the error in the rack possibility angle through artifical rotatory apron switching position, thereby lead to the rack to take place the friction or collide inside the heating furnace.
Disclosure of Invention
Aiming at the problems, the vacuum dehydroxylation furnace for the semiconductor quartz glass products is provided, and the cover plate can drive the placing frame to stably rotate for a certain angle after being far away from the heating furnace and then return along the original path through the movement control assembly.
In order to solve the problems of the prior art, the invention adopts the technical scheme that:
the utility model provides a vacuum dehydroxylation furnace of semiconductor quartz glass goods, which comprises a heating furnace, apron and rack, vacuum dehydroxylation furnace still includes the mobility control subassembly, the one end and the external intercommunication of heating furnace, the apron can seal the heating furnace, what can dismantle on two main faces of apron is provided with the rack, the quantity of rack is one at least on every side, the mobility control subassembly is fixed to be set up on the heating furnace, the output of mobility control subassembly can drive the apron and keep away from the heating furnace along rectilinear direction, the output control apron of mobility control subassembly is rotatory 180 on the horizontal plane when the apron removes the position of keeping away from the heating furnace, and after the apron is rotatory the mobility control subassembly drive its sealed heating furnace under the state of guaranteeing the apron this moment.
Preferably, the mobile control subassembly includes servo motor, the threaded rod, first slip strip and second slip strip, servo motor's output shaft and threaded rod transmission are connected, the setting that the threaded rod can rotate is in the heating furnace, the threaded rod extends towards the direction of heating furnace and outside intercommunication, first slip strip and threaded rod threaded connection, the length direction of first slip strip is parallel with the axis of threaded rod, first slip strip slides and sets up the inside at the second slip strip, the slip direction of first slip strip is parallel with the length direction of second slip strip, first slip strip and second slip strip elastic connection, can drive apron synchronous movement when the second slip strip removes.
Preferably, the mobile control assembly further comprises a first gear and a rack, the first gear can rotate and is arranged at one end, away from the threaded rod, of the second sliding strip, the axis of the first gear is parallel to the height direction of the heating furnace, the first gear drives the cover plate to rotate synchronously when rotating, the rack is arranged on the first sliding strip, the first sliding strip drives the rack to move synchronously when moving, the rack is meshed with the first gear, a limiting bulge is fixedly arranged on the outer surface of the second sliding strip, and a limiting sliding groove matched with the limiting bulge to work is formed in the heating furnace.
Preferably, a fixed sleeve is fixedly arranged on the rack, the fixed sleeve is slidably sleeved on the first sliding strip, the sliding direction of the fixed sleeve is perpendicular to the length direction of the first sliding strip, the sliding direction of the fixed sleeve is perpendicular to the height direction of the heating furnace, the fixed sleeve is elastically connected with the first sliding strip, a guide inclined table for guiding and guiding the guide sleeve to slide is fixedly arranged on the side wall, away from the rack, of the inside of the second sliding strip, and a magnetic stripe which is matched with the rack in a magnetic force mode is fixedly arranged on the side wall, close to the rack, of the inside of the second sliding strip.
Preferably, the movement control assembly further comprises a pressure sensor, the pressure sensor is fixedly arranged inside the second sliding strip, the pressure sensor is located on a sliding path of the rack, and the pressure sensor is in signal connection with the servo motor.
Preferably, the mobile control assembly further comprises a connecting rod, the connecting rod is connected with the first gear in a sliding mode, one end of the connecting rod extends to the outer portion of the second sliding strip and is connected with a limiting disc in a rotating mode, the limiting disc is connected with the second sliding strip in an elastic mode, and a connecting hole matched with the connecting rod to work is formed in the cover plate.
Preferably, a heat insulation plate is fixedly arranged outside the heating furnace, the servo motor is fixedly arranged on one surface, far away from the heating furnace, of the heat insulation plate, a second gear is coaxially and fixedly connected to an output shaft of the servo motor, a third gear is coaxially and fixedly connected to a threaded rod, and the second gear is in transmission connection with the third gear.
Preferably, two main surfaces of the cover plate are provided with at least one fixed sliding chute, the number of the fixed sliding chutes on each main surface is at least one, all the fixed sliding chutes are uniformly arranged along the height direction of the heating furnace along the cover plate, the length direction of the fixed sliding chutes is parallel to the height direction of the heating furnace, and the placing frame is fixedly provided with fixed sliding strips which are matched with the fixed sliding chutes to slide.
Preferably, the cover plate is provided with a limiting rod in a sliding mode, the sliding direction of the limiting rod is parallel to the height direction of the heating furnace, and the sliding strip is provided with a limiting hole matched with the limiting rod to work.
Preferably, fixed baffles for blocking the sliding of the quartz glass products are fixedly arranged on the periphery of the placing frame.
Compared with the prior art, the invention has the beneficial effects that:
according to the invention, the function that the cover plate can drive the placing frame to stably rotate for a certain angle and then return along the original path after being away from the heating furnace is realized through the movement control assembly, so that the operation needing manual participation is reduced, the movement and rotation of the cover plate are ensured to have no error, and the integral working efficiency is improved.
Drawings
FIG. 1 is a schematic perspective view of a vacuum dehydroxylation furnace for producing a semiconductor quartz glass article in an operating state;
FIG. 2 is a first schematic perspective view showing a state of replacement of a vacuum dehydroxylation furnace for a semiconductor quartz glass article;
FIG. 3 is a second schematic perspective view of a semiconductor quartz glass article in a vacuum dehydroxylation furnace replacement state;
FIG. 4 is a schematic perspective exploded view of a vacuum dehydroxylation furnace for semiconductor quartz glass articles;
FIG. 5 is a schematic perspective view of a heating furnace in a vacuum dehydroxylating furnace for a semiconductor quartz glass article;
FIG. 6 is a schematic perspective exploded view of a heating furnace in a vacuum dehydroxylation furnace for a semiconductor quartz glass article;
FIG. 7 is a perspective view showing a first state of a movement control unit in the vacuum dehydroxylation furnace for a semiconductor quartz glass article;
FIG. 8 is a perspective view showing a second state of a movement control member in the vacuum dehydroxylation furnace for a semiconductor quartz glass article;
FIG. 9 is a first schematic sectional view of a movement control assembly in a vacuum dehydroxylation furnace for semiconductor quartz glass articles;
FIG. 10 is a schematic sectional view II of the movement control unit in the vacuum dehydroxylating furnace for a semiconductor quartz glass article;
FIG. 11 is a schematic perspective exploded view of a movement control unit in a vacuum dehydroxylating furnace for a semiconductor quartz glass article;
FIG. 12 is a schematic perspective view of a cover plate in a vacuum dehydroxylating furnace for semiconductor quartz glass articles;
FIG. 13 is a schematic perspective exploded view of a cover plate in a vacuum dehydroxylation furnace for a semiconductor quartz glass article.
The reference numbers in the figures are:
1-heating furnace;
11-a limiting chute;
12-a heat insulation plate;
2-cover plate;
21-connecting hole;
22-fixed chute;
23-a limiting rod;
3, placing a rack;
31-a fixed runner;
32-a limiting hole;
33-a fixed baffle;
4-a movement control assembly;
41-a servo motor; 411-second gear;
42-threaded rod; 421-third gear;
43-a first slider;
44-a second slider bar; 441-limiting bulges; 442-a guide ramp; 443-a magnetic stripe;
45-a first gear;
46-a rack; 461-fixed sleeve;
47-a pressure sensor;
48-a connecting rod; 481-limiting disk.
Detailed Description
For a better understanding of the features and technical solutions of the present invention, as well as the specific objects and functions attained by the present invention, reference is made to the accompanying drawings and detailed description of the invention.
Referring to fig. 1 to 13, a vacuum dehydroxylation furnace for semiconductor quartz glass products, comprising a heating furnace 1, a cover plate 2 and a placing frame 3, the vacuum dehydroxylation furnace further comprises a mobile control assembly 4, one end of the heating furnace 1 is communicated with the outside, the cover plate 2 can seal the heating furnace 1, the placing frame 3 is detachably arranged on two main surfaces of the cover plate 2, the number of the placing frame 3 on each surface is at least one, the mobile control assembly 4 is fixedly arranged on the heating furnace 1, the output end of the mobile control assembly 4 can drive the cover plate 2 to be away from the heating furnace 1 along the straight line direction, the output end of the mobile control assembly 4 controls the cover plate 2 to rotate 180 degrees on the horizontal plane when the cover plate 2 is moved to the position away from the heating furnace 1, and the mobile control assembly 4 drives the sealing heating furnace 1 under the condition that the cover plate 2 is ensured at the moment after the cover plate 2 rotates.
The cover plate 2 is contacted with the heating furnace 1 in an initial state to complete sealing, no semiconductor quartz glass product is arranged on the placing frames 3 on two sides of the cover plate 2, the semiconductor quartz glass product is placed on the placing frame 3 on one side of the cover plate 2 away from the heating furnace 1, then the mobile control component 4 is started, the output end of the mobile control component 4 drives the whole cover plate 2 to be away from the heating furnace 1 and then controls the cover plate 2 to rotate, the side of the cover plate 2 where the semiconductor quartz glass product is placed faces the heating furnace 1, then the whole cover plate 2 is driven to move towards the direction close to the heating furnace 1 through the mobile control component 4, the cover plate 2 pushes the semiconductor quartz glass product to the inside of the heating furnace 1 and seals the heating furnace 1, and the mobile control component 4 completes one-time work, the temperature inside the heating furnace 1 is heated to a certain degree through a control panel on the heating furnace 1, then a new semiconductor quartz glass product is placed on a placing frame 3 which is arranged on the cover plate 2 and is positioned outside the heating furnace 1, when the semiconductor quartz glass product in the heating furnace 1 is processed, the mobile control component 4 is started to work again, the newly placed semiconductor quartz glass product is moved to the inside of the heating furnace 1 for heating, the processed semiconductor quartz glass product is positioned outside and is convenient for workers to transfer, and then the semiconductor quartz glass product to be processed is placed again, compared with the prior art, the mobile control component 4 of the invention enables the cover plate 2 to drive the placing frame 3 to stably rotate for a certain angle after being far away from the heating furnace 1 and then return along the original path, thereby guaranteeing that the movement and the rotation of the cover plate 2 can not generate errors while reducing the operation needing manual participation, and improving the overall working efficiency.
Referring to fig. 4, 7, 8, 9, 10 and 11: the movement control assembly 4 comprises a servo motor 41, a threaded rod 42, a first sliding strip 43 and a second sliding strip 44, an output shaft of the servo motor 41 is in transmission connection with the threaded rod 42, the threaded rod 42 can be rotatably arranged in the heating furnace 1, the threaded rod 42 extends towards the direction in which the heating furnace 1 is communicated with the outside, the first sliding strip 43 is in threaded connection with the threaded rod 42, the length direction of the first sliding strip 43 is parallel to the axis of the threaded rod 42, the first sliding strip 43 is slidably arranged in the second sliding strip 44, the sliding direction of the first sliding strip 43 is parallel to the length direction of the second sliding strip 44, the first sliding strip 43 is elastically connected with the second sliding strip 44, and the second sliding strip 44 can drive the cover plate 2 to move synchronously when moving.
The servo motor 41 is started, the servo motor 41 drives the threaded rod 42 to rotate, the first sliding strip 43 in threaded connection with the threaded rod 42 moves along the axial direction of the threaded rod 42, and due to the elastic connection between the first sliding strip 43 and the second sliding strip 44, under the condition that no external force exists outside the second sliding strip 44, the second sliding strip 44 moves along with the movement of the first sliding strip 43, and the cover plate 2 also moves synchronously along with the second sliding strip 44.
Referring to fig. 4-11: the movement control assembly 4 further comprises a first gear 45 and a rack 46, the first gear 45 can be rotatably arranged at one end, away from the threaded rod 42, of the second sliding strip 44, the axis of the first gear 45 is parallel to the height direction of the heating furnace 1, the first gear 45 can drive the cover plate 2 to rotate synchronously when rotating, the rack 46 is arranged on the first sliding strip 43, the first sliding strip 43 can drive the rack 46 to move synchronously when moving, the rack 46 is meshed with the first gear 45, a limiting protrusion 441 is fixedly arranged on the outer surface of the second sliding strip 44, and the heating furnace 1 is provided with a limiting sliding groove 11 matched with the limiting protrusion 441 to work.
The threaded rod 42 rotates and simultaneously pushes the first sliding strip 43 to be far away from the heating furnace 1 along the axial direction of the threaded rod 42, the first sliding strip 43 drives the second sliding strip 44 to move simultaneously, at the moment, the gear and the first rack 46 keep a meshed state and do not move, when the limiting protrusion 441 is in contact with the tail end of the limiting sliding groove 11, the second sliding strip 44 stops moving, the first sliding strip 43 continues to move in the direction far away from the heating furnace 1, the first sliding strip 43 drives the rack 46 to move, the gear rotates along with the movement of the rack 46, and the cover plate 2 rotates along with the rotation of the gear.
Referring to fig. 4, 7, 8, 9, 10 and 11: a fixed sleeve 461 is fixedly arranged on the rack 46, the fixed sleeve 461 is slidably sleeved on the first sliding bar 43, the sliding direction of the fixed sleeve 461 is perpendicular to the length direction of the first sliding bar 43, the sliding direction of the fixed sleeve 461 is perpendicular to the height direction of the heating furnace 1, the fixed sleeve 461 is elastically connected with the first sliding bar 43, a guide ramp 442 for guiding the guide sleeve to slide is fixedly arranged on the side wall of the inside of the second sliding bar 44 far away from the rack 46, and a magnetic strip 443 magnetically matched with the rack 46 is fixedly arranged on the side wall of the inside of the second sliding bar 44 near the rack 46.
When the position of the second sliding bar 44 is fixed by the cooperation of the limiting protrusion 441 and the limiting sliding groove 11, at this time, the first sliding bar 43 pushes the rack 46 to move in a direction away from the heating furnace 1, the rack 46 drives the gear to rotate, at the same time, because the fixing sleeve 461 is in contact with the guiding ramp 442, the rack 46 will also move away from the gear in the diameter direction of the gear, at this time, the gear rotates half a turn, the rack 46 is connected with the magnetic strip 443 through magnetic force, at this time, the servo motor 41 rotates in reverse direction, the threaded rod 42 rotates in reverse direction and controls the first sliding bar 43 to move in a direction close to the heating furnace 1, because of the existence of the magnetic strip 443, the magnetic force reduced after the rack 46 moves a certain distance in a direction close to the heating furnace 1 is insufficient to resist the elastic connection between the fixing sleeve 461 and the first sliding bar 43, at this time, the rack 46 approaches in the gear direction and meshes with the gear, the second sliding bar 44 will also approach the heating furnace 1 along with the first sliding bar 43, compared with the prior art, the cooperation of the fixing sleeve 461 and the magnetic strip 443 makes the rack 46 not mesh with the gear when the first sliding bar 43 approaches the heating furnace 1, thereby ensuring that the rack 2 will not rotate in a direction close to the heating furnace 1.
Referring to fig. 4, 7, 8, 9, 10 and 11: the movement control assembly 4 further comprises a pressure sensor 47, the pressure sensor 47 is fixedly arranged inside the second sliding strip 44, the pressure sensor 47 is positioned on the sliding path of the rack 46, and the pressure sensor 47 is in signal connection with the servo motor 41.
The rack 46 is far away from the heating furnace 1 along with the movement of the first sliding strip 43, the rack 46 is disengaged from the gear when the first sliding strip 43 moves to the maximum distance, and at the moment, the front end of the rack 46 is in contact with the pressure sensor 47 and enables the pressure applied to the pressure sensor 47 to reach a rated value, the pressure sensor 47 sends a signal to the controller, and the controller controls the servo motor 41 to rotate reversely.
Referring to fig. 4, 7, 8, 9, 10, 11, 12 and 13: the movement control assembly 4 further comprises a connecting rod 48, the connecting rod 48 is coaxially and slidably connected with the first gear 45, one end of the connecting rod 48 extends to the outside of the second sliding bar 44 and is coaxially and rotatably connected with a limiting disc 481, the limiting disc 481 is elastically connected with the second sliding bar 44, and the cover plate 2 is provided with a connecting hole 21 matched with the connecting rod 48 to work.
The connecting rod 48 is slid, so that the connecting rod 48 moves towards the direction far away from the cover plate 2, then the connecting rod 48 is separated from the connecting hole 21, the cover plate 2 can be taken down by sliding the cover plate 2, and compared with the prior art, the connecting rod 48 and the connecting hole 21 can conveniently install and disassemble the cover plate 2, so that the cover plate 2 can be maintained or replaced quickly when in failure.
Referring to fig. 4 to 11: the heating furnace 1 is fixedly provided with a heat insulation plate 12 outside, a servo motor 41 is fixedly arranged on one surface of the heat insulation plate 12 far away from the heating furnace 1, a second gear 411 is coaxially and fixedly connected to an output shaft of the servo motor 41, a third gear 421 is coaxially and fixedly connected to a threaded rod 42, and the second gear 411 is in transmission connection with the third gear 421.
Compared with the prior art, the servo motor 41 can still drive the threaded rod 42 to rotate at a position far away from the heating furnace 1 when the output shaft of the servo motor 41 works, so that the normal work of the servo motor 41 is prevented from being influenced by high temperature.
Referring to fig. 12-13: two main faces of the cover plate 2 are provided with fixing chutes 22, the number of the fixing chutes 22 on each main face is at least one, all the fixing chutes 22 are uniformly arranged along the height direction of the cover plate 2 along the heating furnace 1, the length direction of the fixing chutes 22 is parallel to the height direction of the heating furnace 1, and fixing slide bars 31 which are matched with the fixing chutes 22 to slide are fixedly arranged on the placing frame 3.
Before the cover plate 2 is not installed, different numbers of placing frames 3 are selected by observing the sizes of the semiconductor quartz glass products, and then the fixing slide bars 31 are inserted into the fixing slide grooves 22 after the intervals between the placing frames 3 are controlled, compared with the prior art, the intervals between the placing frames 3 can be adjusted by the fixing slide grooves 22 and the fixing slide bars 31, so that the semiconductor quartz glass products with different gears can be placed on the placing frames 3 and enter the heating furnace 1.
Referring to fig. 12-13: the cover plate 2 is provided with a limiting rod 23 in a sliding mode, the sliding direction of the limiting rod 23 is parallel to the height direction of the heating furnace 1, and a limiting hole 32 matched with the limiting rod 23 to work is formed in the sliding strip.
The placing frame 3 with a proper amount is inserted into the cover plate 2, then the limiting rod 23 penetrates through the limiting hole 32 to fix the position of the placing frame 3, when the placing frame 3 rotates along with the cover plate 2, the placing frame 3 cannot slide due to the existence of the limiting rod 23, and compared with the prior art, the limiting rod 23 and the limiting hole 32 fix the position of the placing frame 3, so that the placing frame 3 is prevented from sliding along with the rotation of the cover plate 2 and then cannot be inserted into the heating furnace 1.
Referring to fig. 12-13: all fixedly provided with all around of rack 3 is used for blockking the gliding fixed stop 33 of quartz glass spare.
Compared with the prior art, the range limitation of the semiconductor quartz glass product on the placing frame 3 is carried out by the fixing baffle 33, so that the semiconductor quartz glass product is prevented from being separated from the placing frame 3 and colliding with the heating furnace 1 when the placing frame 3 is inserted into the heating furnace 1 because the semiconductor quartz glass product on the placing frame 3 can slide along with the cover plate 2.
The above examples, which are intended to represent only one or more embodiments of the present invention, are described in greater detail and with greater particularity, and are not to be construed as limiting the scope of the invention. It should be noted that various changes and modifications can be made by those skilled in the art without departing from the spirit of the invention, and these changes and modifications are all within the scope of the invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A vacuum dehydroxylation furnace for semiconductor quartz glass products comprises a heating furnace (1), a cover plate (2) and a placing frame (3), and is characterized by further comprising a movement control assembly (4);
one end of the heating furnace (1) is communicated with the outside, the cover plate (2) can seal the heating furnace (1), the two main surfaces of the cover plate (2) are detachably provided with placing frames (3), and the number of the placing frames (3) on each surface is at least one;
the mobile control assembly (4) is fixedly arranged on the heating furnace (1), the output end of the mobile control assembly (4) can drive the cover plate (2) to be away from the heating furnace (1) along the linear direction, the output end of the mobile control assembly (4) controls the cover plate (2) to rotate 180 degrees on the horizontal plane when the cover plate (2) moves to the position away from the heating furnace (1), and the mobile control assembly (4) drives the sealing heating furnace (1) under the state of ensuring the cover plate (2) at the moment after the cover plate (2) rotates.
2. The vacuum dehydroxylation furnace for semiconductor quartz glass articles according to claim 1, wherein the movement control assembly (4) comprises a servo motor (41), a threaded rod (42), a first slide bar (43) and a second slide bar (44);
the output shaft of servo motor (41) is connected with threaded rod (42) transmission, threaded rod (42) can be rotatory set up in heating furnace (1), threaded rod (42) extend with the direction of outside intercommunication towards heating furnace (1), first slider (43) and threaded rod (42) threaded connection, the length direction of first slider (43) is parallel with the axis of threaded rod (42), first slider (43) slide the setting in the inside of second slider (44), the slide direction of first slider (43) is parallel with the length direction of second slider (44), first slider (43) and second slider (44) elastic connection, can drive apron (2) synchronous motion when second slider (44) remove.
3. The vacuum dehydroxylation furnace for semiconductor quartz glass articles according to claim 2, wherein the movement control assembly (4) further comprises a first gear (45) and a rack (46);
first gear (45) can be rotatory set up in the inside one end of keeping away from threaded rod (42) of second slip strip (44), the axis of first gear (45) is parallel with the direction of height of heating furnace (1), will drive apron (2) synchronous revolution when first gear (45) are rotatory, rack (46) set up on first slip strip (43), will drive rack (46) synchronous revolution when first slip strip (43) remove, rack (46) and first gear (45) meshing, fixed spacing arch (441) that is provided with on the surface of second slip strip (44), spacing spout (11) of cooperation spacing arch (441) work are seted up on heating furnace (1).
4. The vacuum dehydroxylation furnace for semiconductor quartz glass articles according to claim 3, wherein a fixing sleeve (461) is fixedly arranged on the rack (46), the fixing sleeve (461) is slidably sleeved on the first sliding bar (43), the sliding direction of the fixing sleeve (461) is perpendicular to the length direction of the first sliding bar (43), the sliding direction of the fixing sleeve (461) is perpendicular to the height direction of the heating furnace (1), the fixing sleeve (461) is elastically connected with the first sliding bar (43), a guide ramp (442) for guiding the guide sleeve to slide is fixedly arranged on the side wall of the second sliding bar (44) far away from the rack (46), and a magnetic strip (443) magnetically matched with the rack (46) is fixedly arranged on the side wall of the second sliding bar (44) near the rack (46).
5. The vacuum dehydroxylation furnace for semiconductor quartz glass articles according to claim 4, wherein the movement control assembly (4) further comprises a pressure sensor (47);
the pressure sensor (47) is fixedly arranged inside the second sliding strip (44), the pressure sensor (47) is positioned on the sliding path of the rack (46), and the pressure sensor (47) is in signal connection with the servo motor (41).
6. The vacuum dehydroxylation furnace for semiconductor quartz glass articles according to claim 5, wherein the movement control assembly (4) further comprises a connecting rod (48);
connecting rod (48) and first gear (45) coaxial sliding connection, the outside and coaxial swivelling joint that the one end of connecting rod (48) extends to second sliding strip (44) have spacing dish (481), and spacing dish (481) and second sliding strip (44) elastic connection offer connecting hole (21) of cooperation connecting rod (48) work on apron (2).
7. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 6, wherein a heat insulation plate (12) is fixedly arranged outside the heating furnace (1), the servo motor (41) is fixedly arranged on one surface of the heat insulation plate (12) far away from the heating furnace (1), a second gear (411) is coaxially and fixedly connected to an output shaft of the servo motor (41), a third gear (421) is coaxially and fixedly connected to the threaded rod (42), and the second gear (411) is in transmission connection with the third gear (421).
8. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 1, wherein the cover plate (2) is provided with at least one fixing chute (22) on two main surfaces, the number of the fixing chutes (22) on each main surface is at least one, all the fixing chutes (22) are uniformly arranged along the height direction of the heating furnace (1) along the cover plate (2), the length direction of the fixing chutes (22) is parallel to the height direction of the heating furnace (1), and the placing frame (3) is fixedly provided with fixing slide bars (31) which are matched with the fixing chutes (22) to slide.
9. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 8, wherein the cover plate (2) is slidably provided with a limiting rod (23), the sliding direction of the limiting rod (23) is parallel to the height direction of the heating furnace (1), and the slide bar is provided with a limiting hole (32) which is matched with the limiting rod (23) to work.
10. The vacuum dehydroxylation furnace for semiconductor quartz glass products according to claim 9, wherein the rack (3) is fixedly provided with fixed baffles (33) around for preventing the quartz glass products from sliding.
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| CN202211517562.4A CN115745427B (en) | 2022-11-30 | 2022-11-30 | Vacuum dehydroxylation furnace for semiconductor quartz glass products |
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|---|---|---|---|
| CN202211517562.4A CN115745427B (en) | 2022-11-30 | 2022-11-30 | Vacuum dehydroxylation furnace for semiconductor quartz glass products |
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| CN115745427A true CN115745427A (en) | 2023-03-07 |
| CN115745427B CN115745427B (en) | 2023-10-20 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116106500A (en) * | 2023-04-12 | 2023-05-12 | 河北沧美园林绿化工程有限公司 | COD detection equipment for agriculture and forestry water system detection |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1069085A2 (en) * | 1999-07-13 | 2001-01-17 | Nippon Sheet Glass Co., Ltd. | Glass quenching apparatus |
| CN2924782Y (en) * | 2006-05-07 | 2007-07-18 | 株洲市德光设备制造厂 | Horizontal vacuum dehydroxylation furnace of arc tube for metal halide discharge lamp |
| WO2014063630A1 (en) * | 2012-10-25 | 2014-05-01 | 东莞市鸿宝锂电科技有限公司 | Backing cooling device and clamp nut locking/unlocking mechanism and clamp fastening mechanism thereof |
| CN104743778A (en) * | 2013-12-27 | 2015-07-01 | 江苏太平洋石英股份有限公司 | Vacuum dehydroxylation furnace for semiconductor quartz glass products |
| CN111235346A (en) * | 2020-03-10 | 2020-06-05 | 安徽云天冶金科技股份有限公司 | Converter slide is slide replacement device for pushing off slag |
| CN211686808U (en) * | 2019-12-29 | 2020-10-16 | 武汉文林科技有限公司 | Built-in laminator commentaries on classics work or material rest of automatic synchronization business turn over material |
| CN113149416A (en) * | 2021-05-17 | 2021-07-23 | 闫莉霞 | Glass tempering furnace |
| CN113267000A (en) * | 2020-09-26 | 2021-08-17 | 东海县晶瑞达石英制品有限公司 | Impurity removal and drying device for high-purity quartz sand and working method of impurity removal and drying device |
| CN216129505U (en) * | 2021-08-06 | 2022-03-25 | 连云港华源石英制品有限公司 | Quartz glass vacuum dehydroxylation furnace |
| CN114789104A (en) * | 2022-04-14 | 2022-07-26 | 孙金凤 | Machining equipment and machining method |
-
2022
- 2022-11-30 CN CN202211517562.4A patent/CN115745427B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1069085A2 (en) * | 1999-07-13 | 2001-01-17 | Nippon Sheet Glass Co., Ltd. | Glass quenching apparatus |
| CN2924782Y (en) * | 2006-05-07 | 2007-07-18 | 株洲市德光设备制造厂 | Horizontal vacuum dehydroxylation furnace of arc tube for metal halide discharge lamp |
| WO2014063630A1 (en) * | 2012-10-25 | 2014-05-01 | 东莞市鸿宝锂电科技有限公司 | Backing cooling device and clamp nut locking/unlocking mechanism and clamp fastening mechanism thereof |
| CN104743778A (en) * | 2013-12-27 | 2015-07-01 | 江苏太平洋石英股份有限公司 | Vacuum dehydroxylation furnace for semiconductor quartz glass products |
| CN211686808U (en) * | 2019-12-29 | 2020-10-16 | 武汉文林科技有限公司 | Built-in laminator commentaries on classics work or material rest of automatic synchronization business turn over material |
| CN111235346A (en) * | 2020-03-10 | 2020-06-05 | 安徽云天冶金科技股份有限公司 | Converter slide is slide replacement device for pushing off slag |
| CN113267000A (en) * | 2020-09-26 | 2021-08-17 | 东海县晶瑞达石英制品有限公司 | Impurity removal and drying device for high-purity quartz sand and working method of impurity removal and drying device |
| CN113149416A (en) * | 2021-05-17 | 2021-07-23 | 闫莉霞 | Glass tempering furnace |
| CN216129505U (en) * | 2021-08-06 | 2022-03-25 | 连云港华源石英制品有限公司 | Quartz glass vacuum dehydroxylation furnace |
| CN114789104A (en) * | 2022-04-14 | 2022-07-26 | 孙金凤 | Machining equipment and machining method |
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| CN116106500A (en) * | 2023-04-12 | 2023-05-12 | 河北沧美园林绿化工程有限公司 | COD detection equipment for agriculture and forestry water system detection |
| CN116106500B (en) * | 2023-04-12 | 2023-07-04 | 河北沧美园林绿化工程有限公司 | COD detection equipment for agriculture and forestry water system detection |
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