CN115739891A - Solar cell silicon chip belt cleaning device - Google Patents
Solar cell silicon chip belt cleaning device Download PDFInfo
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- CN115739891A CN115739891A CN202211407811.4A CN202211407811A CN115739891A CN 115739891 A CN115739891 A CN 115739891A CN 202211407811 A CN202211407811 A CN 202211407811A CN 115739891 A CN115739891 A CN 115739891A
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- drying box
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention discloses a solar cell silicon wafer cleaning device which comprises a cleaning box, wherein a drying box for quickly drying silicon wafers is arranged on the side wall of the cleaning box, a plurality of silicon wafer frames for bearing the silicon wafers are arranged in the drying box, a heating device is arranged at the top in the drying box, and a bearing mechanism for bearing and conveying the silicon wafers is arranged below the drying box; wherein, a rotating structure which leads the silicon wafer frame to be close to and far away from the heating device periodically is arranged in the drying box; the side wall of the drying box is fixedly provided with a suction piece capable of turning over the silicon wafer frame, and when the suction piece does not work, the silicon wafer frame is always kept in the vertical direction. The silicon wafer drying device can periodically adjust the distance between the silicon wafer and the heating device, has the function of quickly, uniformly and safely drying the silicon wafer, can quickly lead out the silicon wafer from the cleaning equipment and transmit the silicon wafer to the next station, greatly improves the working efficiency and saves the labor.
Description
Technical Field
The invention relates to the technical field of solar cell production, in particular to a solar cell silicon wafer cleaning device.
Background
The silicon wafer is an important component of a solar cell, the surface of the silicon wafer is seriously contaminated after the silicon wafer is processed by different procedures such as slicing, chamfering, grinding, surface treatment, polishing, epitaxy and the like in the production and processing process, some impurities exist on the surface of the silicon wafer in an atomic state or an ionic state, and some impurities exist on the surface of the silicon wafer in a film form or a particle form, and the contamination of the impurities, particularly metal impurities, can form lattice defects in high-temperature diffusion, and seriously affect various performance indexes of the cell.
The silicon wafer is strictly cleaned after being processed, and the purpose of cleaning is to remove the pollution of particles, metal ions, organic matters and the like on the surface of the silicon wafer and improve the photoelectric conversion efficiency.
The existing solar cell silicon wafer cleaning device has single function and has the following defects:
1. most of battery silicon wafer cleaning devices do not have a drying function, and are naturally dried after cleaning, so that the drying time is long, and the efficiency is low;
2. according to the cleaning device for the battery silicon wafer with the drying function, the distance between a heating source and the silicon wafer is constant and inconvenient, so that the heating is not uniform, and the silicon wafer close to the heating source is easily damaged due to excessive heating, so that the photoelectric conversion efficiency is influenced;
3. after the cleaning link is finished, the silicon wafer is manually taken out (collected) from the device and transported to the next processing station, and the product cannot be rapidly led out from the cleaning equipment and transported, so that human resources are occupied, and manpower is wasted.
Therefore, the development of a solar cell silicon wafer cleaning device which can dry rapidly, is safe and reliable, saves time and labor and can improve the cleaning efficiency is urgently needed.
Disclosure of Invention
Aiming at the technical defects, the invention aims to provide a solar cell silicon wafer cleaning device which can periodically adjust the distance between a silicon wafer and a heating device, has the function of quickly, uniformly and safely drying the silicon wafer, can quickly lead out the silicon wafer from cleaning equipment and transmit the silicon wafer to the next station, greatly improves the working efficiency and saves the labor.
In order to solve the technical problems, the invention adopts the following technical scheme.
The invention provides a solar cell silicon wafer cleaning device which comprises a cleaning box, wherein a drying box for quickly drying silicon wafers is arranged on the side wall of the cleaning box, a plurality of silicon wafer frames for bearing the silicon wafers are arranged in the drying box, a heating device is arranged at the top in the drying box, and a bearing mechanism for bearing and conveying the silicon wafers is arranged below the drying box;
wherein, a rotating structure which leads the silicon wafer frame to be close to and far away from the heating device periodically is arranged in the drying box;
the side wall of the drying box is fixedly provided with a suction piece capable of turning over the silicon wafer frame, and when the suction piece does not work, the silicon wafer frame is always kept in the vertical direction.
Preferably, the rotating structure comprises a motor fixed on the side wall of the drying box, a rotating shaft is arranged in the drying box in parallel, one end of the rotating shaft is fixed on an output shaft of the motor, and the other end of the rotating shaft is rotatably arranged on the side wall of the drying box far away from the motor; the rotating shaft is symmetrically and fixedly provided with two rotating disks, the rotating shaft penetrates through the circle centers of the rotating disks and is vertical to the rotating disks, the two rotating disks are connected through a plurality of serial shafts with end parts fixed on the circumferential edges of the rotating disks, and the serial shafts are parallel to the rotating shaft; the silicon wafer frame can be rotatably arranged on the tandem axle.
Preferably, the silicon wafer frame comprises a plurality of rotating handles which can be disassembled and arranged on the serial connecting shafts, silicon wafer grooves are formed in the upper ends of the rotating handles, balancing weights are arranged at the lower ends of the rotating handles, and the distance from the balancing weights to the serial connecting shafts is larger than the distance from the silicon wafer grooves to the serial connecting shafts.
Preferably, the silicon wafer grooves are arranged in a hollow manner.
Preferably, the rotary handle is provided with a hanging groove, the connecting shaft is sleeved with a sleeve, the inner diameter of the sleeve is larger than the diameter of the connecting shaft, and the outer diameter of the sleeve is not larger than the width of a notch of the hanging groove.
Preferably, the attraction piece is an electromagnet, the balancing weight is an iron block, a control panel and a power line which are electrically connected are arranged on the side wall of the drying box, the electromagnet and the motor are respectively electrically connected with the control panel, and a control button is arranged on the control panel.
Preferably, a discharge port is formed in the lower wall of the drying box under the suction piece, and a guide-out plate pointing to the bearing mechanism is arranged on the discharge port.
Preferably, the uptake mechanism is a conveyor belt.
Preferably, the heating device is a heating wire plate, and projections of all silicon wafer grooves on a plane where the heating device is located are in the heating device.
The cleaning device for the solar cell silicon wafer has the following beneficial effects:
1. the distance between the silicon wafer groove and the heating device can be periodically adjusted through the rotating structure, and the silicon wafer drying device has the uniformity and the safety of silicon wafer drying;
2. according to the invention, after the attraction piece (electromagnet) is electrified, attraction force is generated on the balancing weight (iron block) to cause the silicon wafer rack to turn on one side, the silicon wafer falls from the silicon wafer groove and slides onto the carrying mechanism (conveyor belt) through the guide-out plate, namely, the silicon wafer is quickly guided out from the cleaning equipment and is conveyed to the next station, so that the labor is saved, and the working efficiency is greatly improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic overall structure diagram of an embodiment of the present invention;
FIG. 2 is a cross-sectional view of an embodiment of the present invention 1;
FIG. 3 is a cross-sectional view of an embodiment of the present invention 2;
FIG. 4 is a front view of a silicon wafer rack;
FIG. 5 is a cross-sectional view of a wafer holder.
Description of reference numerals:
1. cleaning box, 2, drying box, 3, supporting mechanism, 4, silicon wafer frame, 5, heating device, 6, revolution mechanic, 7, motor, 8, rotation axis, 9, rotation disc, 10, tandem axle, 11, sleeve, 12, rotation handle, 13, silicon wafer groove, 14, balancing weight, 15, hanging groove, 16, suction piece, 17, control panel, 18, power cord, 19, discharge gate, 20, leading-out plate.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
Example 1:
as shown in fig. 1 to 5, the invention provides a solar cell silicon wafer cleaning device, which comprises a cleaning box 1, a drying box 2 and a carrying mechanism 3, wherein the cleaning box 1 and the drying box 2 are connected through side walls, as shown in fig. 1, the carrying mechanism 3 is arranged below the drying box 2, the cleaning box 1 is used for cleaning a cell silicon wafer, the drying box 2 is used for drying the silicon wafer, the silicon wafer in the drying box 2 can be uniformly heated, and the carrying mechanism 3 can collect the silicon wafer led out from the drying box 2 and transmit the silicon wafer to the next station, so that the labor is saved, and the working efficiency is greatly improved; in this embodiment, the receiving mechanism 3 is a conveyor belt;
a plurality of silicon wafer frames 4 for bearing silicon wafers are arranged in the drying box 2, a heating device 5 is arranged at the top in the drying box 2, the heating device 5 is used for drying the cleaned silicon wafers, and in the embodiment, the heating device 5 is an electric heating wire plate;
a rotating structure 6 which enables the silicon wafer frame 4 to be close to and far away from the heating device 5 periodically is arranged in the drying box 2;
specifically, the method comprises the following steps:
the rotating structure 6 comprises a motor 7 fixed on the side wall of the drying box 2, a rotating shaft 8 is arranged in the drying box 2 in parallel, one end of the rotating shaft 8 is fixed on an output shaft of the motor 7, and the other end of the rotating shaft 8 is rotatably arranged on the side wall of the drying box 2 far away from the motor 7; the rotating shaft 8 is symmetrically and fixedly provided with two rotating disks 9, the rotating shaft 8 penetrates through the circle center of the rotating disks 9 and is vertical to the rotating disks 9, the two rotating disks 9 are connected through a plurality of serial shafts 10 with the ends fixed on the circumferential edges of the two rotating disks 9, and the serial shafts 10 are parallel to the rotating shaft 8; the silicon wafer rack 4 can be rotatably arranged on a tandem shaft 10; the motor 7 is electrified to rotate to drive the rotating shaft 8 to rotate, the rotating shaft 8 rotates to drive the rotating disc 9 to rotate, namely, the silicon wafer frame 4 and the tandem connection shaft 10 are driven to rotate around the rotating shaft 8, the distance between the silicon wafer frame 4 and the heating device 5 is changed periodically in the rotating process, and one cycle is defined when the silicon wafer frame 4 rotates around the rotating shaft 8.
The tandem shafts 10 are circumferentially arranged on the circumference of the rotating disc 9 at equal intervals, the sleeves 11 are sleeved on the tandem shafts 10, and the sleeves 11 can freely rotate relative to the tandem shafts 10;
specifically, the method comprises the following steps:
In order to heat all the silicon wafers in the silicon wafer grooves 13 uniformly, projections of all the silicon wafer grooves 13 on a plane where the heating device 5 is located are all in the heating device 5.
Furthermore, a hanging groove 15 is formed in the rotating handle 12, the inner diameter of the sleeve 11 is larger than the diameter of the serially connected shaft 10, the outer diameter of the sleeve 11 is not larger than the width of a notch of the hanging groove 15, the design of the hanging groove 15 is convenient for a user to install or disassemble the silicon wafer rack 4 on the rotating structure 6, the silicon wafer after being cleaned can be conveniently placed in the silicon wafer groove 13, and the silicon wafer rack 4 can be conveniently cleaned.
In order to rapidly lead out the drying box 2 after the silicon wafer is dried, a suction piece 16 capable of enabling the silicon wafer frame 4 to turn is fixed on the side wall of the drying box 2, the suction piece 16 is an electromagnet, the balancing weight 14 is an iron block, a control panel 17 and a power line 18 which are electrically connected are arranged on the side wall of the drying box 2, a controller is arranged in the control panel 17, the electromagnet and the motor 7 are respectively electrically connected with the control panel 17, and a control button is arranged on the control panel 17. When the suction piece 16 is not in operation, the silicon wafer rack 4 is always kept in the vertical direction; when a user clicks a control button, the control panel 17 (controller) controls the attraction piece 16 to be powered on, because the attraction piece 16 is an electromagnet, the attraction piece 16 has strong magnetism instantly, when the silicon wafer frame 4 rotates around the rotating shaft 8 and gradually approaches the attraction piece 16, the attraction piece 16 increasingly attracts the counterweight block 14 (iron block), so that the silicon wafer frame 4 can be turned over, (specifically, the rotating handle 12 is static relative to the sleeve 11, and the sleeve 11 rotates relative to the serial shaft 10), as shown in fig. 3.
A discharge port 19 is formed in the lower wall of the drying box 2 under the suction piece 16, and a guide-out plate 20 pointing to the bearing mechanism 3 is arranged on the discharge port 19; after the silicon wafer frame 4 is turned over, the silicon wafers in the silicon wafer groove 13 fall into the discharge port 19.
During the specific use, the user at first places the silicon chip in wasing case 1 and washs, washs the back that finishes, will wash the even silicon chip groove 13 of placing at a plurality of silicon chip frame 4 of after, the user in proper order with silicon chip frame 4 installation with stoving case 2 in on the revolution mechanic 6, specifically be, the user will hang groove 15 and aim at sleeve 11, kowtow sleeve 11 can install smoothly as in the spout.
A user clicks a control button on the control panel 17, the control panel 17 (a controller) respectively controls the motor 7 and the heating device 5 (an electric heating wire plate) to work in a power-on mode, the motor 7 rotates in the power-on mode to drive the rotating shaft 8 to rotate at a constant speed, the rotating shaft 8 rotates to drive the rotating disc 9 to rotate at a constant speed, namely, the silicon wafer frame 4 and the tandem connection shaft 10 are driven to rotate around the rotating shaft 8 at a constant speed, the distance between the silicon wafer frame 4 and the heating device 5 changes periodically in the process of rotating at a constant speed, and one period is defined as one period when the silicon wafer frame 4 rotates around the rotating shaft 8 in a circle.
After the drying is finished, a user presses a control button, the control panel 17 (controller) controls the attraction piece 16 (electromagnet) to be electrified, the attraction piece 16 has strong magnetism instantly, when the silicon wafer frame 4 rotates around the rotating shaft 8 and is gradually close to the attraction piece 16, the attraction piece 16 has larger and larger attraction force on the balancing weight 14 (iron block), the silicon wafer frame 4 can be turned over, after the silicon wafer frame 4 is turned over, the silicon wafer in the silicon wafer groove 13 falls into the discharge port 19 and slides onto the bearing mechanism 3 (conveyor belt) through the guide-out plate 20, and the conveyor belt transports the silicon wafer to the next processing station.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (9)
1. A solar cell silicon wafer cleaning device comprises a cleaning box (1), and is characterized in that a drying box (2) for rapidly drying silicon wafers is arranged on the side wall of the cleaning box (1), a plurality of silicon wafer frames (4) for bearing the silicon wafers are arranged in the drying box (2), a heating device (5) is arranged at the top in the drying box (2), and a bearing mechanism (3) for bearing and conveying the silicon wafers is arranged below the drying box (2);
wherein, a rotating structure (6) which leads the silicon wafer rack (4) to be close to and far away from the heating device (5) periodically is arranged in the drying box (2);
wherein, be fixed with on the stoving case (2) lateral wall and can make silicon wafer frame (4) suction piece (16) of upset, when suction piece (16) do not work, silicon wafer frame (4) remain vertical direction all the time.
2. The solar cell silicon wafer cleaning device according to claim 1, wherein the rotating structure (6) comprises a motor (7) fixed on a side wall of the drying box (2), a rotating shaft (8) is arranged in parallel in the drying box (2), one end of the rotating shaft (8) is fixed on an output shaft of the motor (7), and the other end of the rotating shaft (8) is rotatably arranged on a side wall of the drying box (2) far away from the motor (7); the rotating shaft (8) is symmetrically and fixedly provided with two rotating disks (9), the rotating shaft (8) penetrates through the circle center of the rotating disks (9) and is perpendicular to the rotating disks (9), the two rotating disks (9) are connected through a plurality of serially connected shafts (10) with the ends fixed on the circumferential edge of the two rotating disks, and the serially connected shafts (10) are parallel to the rotating shaft (8); the silicon wafer rack (4) can be rotatably arranged on the tandem shaft (10).
3. The solar cell silicon wafer cleaning device according to claim 2, wherein the silicon wafer rack (4) comprises a plurality of rotating handles (12) detachably arranged on the serial connection shaft (10), a silicon wafer groove (13) is arranged at the upper end of each rotating handle (12), a balancing weight (14) is arranged at the lower end of each rotating handle (12), and the distance from the balancing weight (14) to the serial connection shaft (10) is greater than the distance from the silicon wafer groove (13) to the serial connection shaft (10).
4. The solar cell silicon wafer cleaning device according to claim 3, wherein the silicon wafer grooves (13) are hollowed out.
5. The solar cell silicon wafer cleaning device according to claim 3, wherein a hanging groove (15) is formed in the rotating handle (12), a sleeve (11) is sleeved on the serial shaft (10), the inner diameter of the sleeve (11) is larger than the diameter of the serial shaft (10), and the outer diameter of the sleeve (11) is not larger than the width of a notch of the hanging groove (15).
6. The solar cell silicon wafer cleaning device according to claim 3, wherein the attraction member (16) is an electromagnet, the counter weight (14) is an iron block, the side wall of the drying box (2) is provided with a control panel (17) and a power line (18) which are electrically connected, the electromagnet and the motor (7) are respectively electrically connected with the control panel (17), and the control panel (17) is provided with a control button.
7. The solar cell silicon wafer cleaning device according to claim 6, wherein a discharge port (19) is formed in the lower wall of the drying box (2) under the suction member (16), and a guide-out plate (20) pointing to the support mechanism (3) is arranged on the discharge port (19).
8. The device for cleaning the solar cell silicon wafer according to claim 1, wherein the supporting mechanism (3) is a conveyor belt.
9. The solar cell silicon wafer cleaning device according to claim 2, wherein the heating device (5) is a heating wire plate, and projections of all the silicon wafer grooves (13) on a plane where the heating device (5) is located are in the heating device (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211407811.4A CN115739891A (en) | 2022-11-10 | 2022-11-10 | Solar cell silicon chip belt cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211407811.4A CN115739891A (en) | 2022-11-10 | 2022-11-10 | Solar cell silicon chip belt cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115739891A true CN115739891A (en) | 2023-03-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211407811.4A Pending CN115739891A (en) | 2022-11-10 | 2022-11-10 | Solar cell silicon chip belt cleaning device |
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| CN (1) | CN115739891A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116435230A (en) * | 2023-06-15 | 2023-07-14 | 常州比太科技有限公司 | Silicon wafer plate conveying and cleaning equipment and working method |
-
2022
- 2022-11-10 CN CN202211407811.4A patent/CN115739891A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116435230A (en) * | 2023-06-15 | 2023-07-14 | 常州比太科技有限公司 | Silicon wafer plate conveying and cleaning equipment and working method |
| CN116435230B (en) * | 2023-06-15 | 2023-08-11 | 常州比太科技有限公司 | Silicon wafer plate conveying and cleaning equipment and working method |
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