CN115722487A - Ultrasonic cleaning structure and device with same - Google Patents

Abstract

The invention discloses an ultrasonic cleaning structure and a device with the same, wherein the ultrasonic cleaning structure comprises a supporting mechanism, a lower roller is arranged on the supporting mechanism, a plasma ultrasonic dry cleaning machine head is arranged above the lower roller, a plasma generation chamber is arranged in the plasma ultrasonic dry cleaning machine head, a plasma generation device is arranged in the plasma generation chamber, a plasma jet port is arranged at the bottom end of the plasma ultrasonic dry cleaning machine head, plasma in the plasma generation chamber is jetted out from the plasma jet port, and an ultrasonic generation device is arranged at the bottom end of the plasma ultrasonic dry cleaning machine head. According to the invention, the plasma ultrasonic dry cleaning machine head is used for enabling the glass substrate to be subjected to the double cleaning effects of ultrasonic waves and plasma when the glass substrate is conveyed on the lower roller, so that organic matters and inorganic matters on the substrate are removed, meanwhile, the surface of the substrate is modified, the surface energy of the substrate is increased, and the coating adhesion is increased.

Description

Ultrasonic cleaning structure and device with same

Technical Field

The present invention relates to a cleaning device, and more particularly, to an ultrasonic cleaning structure and a device having the same.

Background

At present, glass substrates are generally subjected to a cleaning process before film coating, so as to clean organic matters and inorganic matters on the glass substrates. In the prior art, two technical schemes, namely an ultrasonic dry cleaning device and a plasma dry cleaning device, are generally used. However, the two technical solutions have the following disadvantages: firstly, the ultrasonic dry cleaning has the disadvantage of poor effect of removing organic matters because the focus is on inorganic matters such as dust particles, and the plasma dry cleaning has the disadvantage of very limited effect of removing inorganic matters because the focus is on organic matters, so that no matter which technical scheme is adopted, the organic matters or the inorganic matters on the substrate are remained, and the cleaning effect is poor; secondly, the plasma can generate gases such as ozone during dry cleaning, and the cleaning of a continuous production line conveyed by a product roller wheel is not provided with a perfect air extractor with good sealing property to extract the gases, so that the gas leakage is easy to influence the health of production line workers, and the possibility that the stains generated by the section are very large can enter the next section of production line process to influence the production quality.

Disclosure of Invention

The invention aims to provide an ultrasonic cleaning structure and a device with the same, which are used for solving the problem that organic matters or inorganic matters are remained when a glass substrate is subjected to dry cleaning in the prior art.

In order to achieve the above purpose, the technical scheme of the invention provides an ultrasonic cleaning structure, which comprises a supporting mechanism, wherein a plurality of lower rollers are arranged on the supporting mechanism, a plasma ultrasonic dry cleaning machine head is arranged above the lower rollers, a plasma generation chamber is arranged in the plasma ultrasonic dry cleaning machine head, a plasma generation device is arranged in the plasma generation chamber, a plasma jet orifice is arranged at the bottom end of the plasma ultrasonic dry cleaning machine head, and plasma in the plasma generation chamber is jetted out from the plasma jet orifice; the bottom end of the plasma ultrasonic dry cleaning machine head is provided with an ultrasonic generating device.

Furthermore, the ultrasonic wave generating device is a U-shaped ultrasonic wave generating device; the quantity of plasma jet orifice includes two, the plasma jet orifice is left right direction and distributes, U type ultrasonic wave generating device's left side part is located between the plasma jet orifice to form from the right side to the ultrasonic cleaning region of left side range, plasma cleaning region, ultrasonic cleaning region, plasma cleaning region.

As a preferred embodiment, the ultrasonic wave generating device comprises a U-shaped gas ultrasonic wave generator, a U-shaped ultrasonic wave outlet; an ultrasonic wave generation chamber is arranged in the plasma ultrasonic wave dry cleaning machine head, and the U-shaped gas ultrasonic generator is positioned in the ultrasonic wave generation chamber; the U-shaped ultrasonic outlet is positioned at the bottom end of the plasma ultrasonic dry cleaning machine head, and ultrasonic waves in the ultrasonic generation cavity are emitted from the U-shaped ultrasonic outlet; the left side part of the U-shaped ultrasonic outlet is positioned between the plasma jet orifices.

Further, the ultrasonic wave generating cavity is a U-shaped cavity; the left side part of the ultrasonic wave generating chamber is positioned at the inner bottom end of the plasma generating chamber, and the right side part of the ultrasonic wave generating chamber is positioned at the outer bottom end of the plasma generating chamber;

furthermore, the left side and the right side of the ultrasonic outlet are respectively positioned at the bottom ends of the left side and the right side of the ultrasonic generating chamber; the plasma jet ports are respectively positioned at the bottom ends of the left side and the right side of the plasma generation chamber; the pressure in the ultrasonic wave generating chamber is 0.2-0.6 MPa.

In another preferred embodiment, the ultrasonic generator is a U-shaped transistor ultrasonic generator.

Furthermore, an upper cover is arranged above the lower roller, a lower cover is arranged below the lower roller, and the upper cover and the lower cover are matched to form a cover with a closed space inside; the plasma ultrasonic dry cleaning machine head is positioned inside the upper cover; an output port is formed in the left side of the upper cover, and an inlet port is formed in the right side of the upper cover, so that the lower roller can convey an object to be cleaned to enter and exit the upper cover; the upper cover is provided with an air suction opening, and the air suction opening is connected with an external air suction pipe so that the external air suction pipe can suck dirt and ozone in the cover away.

Furthermore, air knives are respectively arranged on the left side and the right side in the upper cover, the air knife on the left side forms an air flow wall at the output port, and the air knife on the right side forms an air flow wall at the inlet port.

Furthermore, the back of the plasma generation chamber is provided with a wire port and an air inlet, and the back of the upper cover is provided with a through hole; the electric wire in the plasma generation cavity is electrically connected with an external radio frequency high-voltage power supply through the electric wire port and the through hole in sequence; the gas inlet is connected with one end of a gas supply pipe, the other end of the gas supply pipe is connected with the outside through the through hole, and the gas supply pipe is used for conveying required gas to the plasma generation cavity.

Further, an ozone removing device is arranged below the lower cover; and sealing the through hole by using sealant after the electric wire and the air supply pipe pass through the through hole.

The technical scheme of the invention also provides an ultrasonic cleaning device which is provided with the ultrasonic cleaning structure in the technical scheme.

The ultrasonic cleaning structure and the device with the cleaning structure of the invention comprise the following steps when ultrasonic cleaning operation is carried out:

s1, placing a product to be cleaned on the surface of a lower roller for conveying and feeding;

s2, the lower roller drives a product to be cleaned to enter a plasma ultrasonic dry cleaning machine head area;

s3, removing dust particles with weak adhesive force on the surface of a product to be cleaned by using an air knife at the inlet of the plasma ultrasonic dry cleaning machine head;

s4, cleaning inorganic matters which cannot be cleaned in the step S3 by using ultrasonic waves;

s5, covering organic matters on the surface of the whole-area cleaning product by using plasma jet, or decomposing the organic matters to form micromolecular organic matters with low adhesion;

s6, removing the micromolecule organic matters and the residual inorganic matters after the step S5 by using ultrasonic waves;

s7, cleaning the surface of the product by using plasma jet;

s8, conveying the product to be cleaned by the lower roller through an air knife at an outlet, and performing secondary cleaning and cooling treatment;

s9, the lower roller drives the product after the step S8 to be discharged;

and S10, obtaining a cleaned product through the steps S1 to S9.

In summary, the technical scheme of the invention has the following beneficial effects: the plasma ultrasonic dry cleaning machine head is arranged above the lower roller, the plasma generation chamber is arranged in the plasma ultrasonic dry cleaning machine head, the plasma generation device is arranged in the plasma generation chamber, the plasma jet port and the ultrasonic generation device are arranged at the bottom end of the plasma ultrasonic dry cleaning machine head, plasma in the plasma generation chamber is jetted out from the plasma jet port, and the ultrasonic generation device emits ultrasonic waves, so that an object to be cleaned, namely a substrate, can be subjected to double cleaning effects of the ultrasonic waves and the plasma when conveyed on the lower roller, organic matters and inorganic matters on the substrate are cleaned, and the problem that the organic matters or the inorganic matters are remained when the substrate is subjected to dry cleaning in the prior art is solved. Four dry cleaning processing areas, namely an ultrasonic cleaning area, a plasma area, an ultrasonic cleaning area and a plasma cleaning area, which are arranged from right to left are formed at the bottom end of the plasma ultrasonic dry cleaning machine head, so that the surface of the substrate is modified on the basis of cleaning the surface of an object to be cleaned, namely the substrate, to increase the surface energy of the substrate and increase the adhesive force of a coating film. And through setting up cover and cover down, and go up the cover and form inside the cover that is airtight space with the cooperation of cover down, and set up the extraction opening on the cover, the extraction opening is connected with outside exhaust tube to dirty and ozone in will covering are taken away through outside exhaust tube, thereby prevent harmful gas leakage such as ozone, the effectual dirty of taking away simultaneously, the dirty one section assembly line technology that gets into of dirty entering that prevents this section production. Through set up the air knife respectively at inlet port and delivery outlet, the air knife can carry out cleaning action and cooling action once more to the base plate, and the air current wall that the air knife formed simultaneously can prevent harmful gas such as ozone from revealing.

Drawings

FIG. 1 is a schematic diagram of an ultrasonic cleaning structure and an exploded structure of an apparatus having the same according to the present invention;

FIG. 2 is a schematic perspective view of an ultrasonic cleaning structure and an apparatus having the same according to the present invention;

FIG. 3 is a schematic left side view of an ultrasonic cleaning structure and an apparatus having the same according to the present invention;

FIG. 4 is a schematic diagram of a rear view of an ultrasonic cleaning structure and an apparatus having the same according to the present invention;

FIG. 5 is a schematic perspective view of the interior of a first plasma-ultrasonic dry cleaning head of an ultrasonic cleaning structure and an apparatus having the same according to the present invention;

FIG. 6 is a schematic perspective view of an ultrasonic cleaning structure and an ultrasonic generating chamber of a first plasma ultrasonic dry cleaning handpiece of an apparatus having the cleaning structure according to the present invention;

FIG. 7 is a schematic perspective view of the bottom end of the ultrasonic generating chamber of the first plasma ultrasonic dry cleaning handpiece of the ultrasonic cleaning structure and the apparatus having the same of the present invention;

FIG. 8 is a schematic perspective view of a U-shaped gas ultrasonic generator of an ultrasonic cleaning structure and an apparatus having the same according to the present invention;

FIG. 9 is a schematic view of a second plasma ultrasonic dry cleaning head of the present invention with an ultrasonic cleaning structure and an apparatus having the cleaning structure;

description of reference numerals:

1-a support mechanism; 2-rolling down the roller; 3-plasma ultrasonic dry cleaning machine head, 301-plasma generation chamber, 3011-plasma generation device, 3012-wire port, 3013-air inlet, 3014-plasma jet port, 302-ultrasonic generation chamber, 3021-U type gas ultrasonic generator, 3022-ultrasonic outlet, 3023-U type transistor ultrasonic generator; 4-air knife; 5-lower cover; 6-upper cover, 601-air extraction opening, 602-through hole; 7-an ozone removal device; 8-the object to be cleaned.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, but the technical solutions in the embodiments of the present invention are not limited to the scope of the present invention.

In the present invention, for a clearer description, the following explanation is made: when an observer views the attached drawings 1, the left side of the observer is set as left, the right side of the observer is set as right, the front side of the observer is set as back, the rear side of the observer is set as front, the upper side of the observer is set as top, and the lower side of the observer is set as bottom, it should be noted that the terms "back", "front", "left", "right", "middle", "upper", "lower", and the like in the text indicate that the directions or positional relationships are the directions or positional relationships set on the basis of the attached drawings, and are only for the convenience of clearly describing the present invention, but do not indicate or imply that the structures or components referred to must have a specific direction, be configured in a specific direction, and thus cannot be understood as limiting the present invention. Furthermore, the terms "first," "second," "third," and "fourth" are used merely for purposes of clarity or simplicity of description and are not intended to indicate or imply relative importance or quantity.

Referring to fig. 1, 5 and 6, the present embodiment provides an ultrasonic cleaning structure and an apparatus having the same, including a support mechanism 1, preferably, the support mechanism 1 is a front support plate and a rear support plate which are oppositely disposed, and the shape of the support plates is preferably rectangular, but other support mechanisms 1 having a support function may be used. The supporting mechanism 1 is provided with a plurality of lower rollers 2, the rolling direction of the lower rollers 2 is preferably from right to left, the heights between the lower rollers 2 are preferably kept consistent, and the lower rollers are mainly used for conveying the object 8 to be cleaned, of course, the object 8 to be cleaned in the embodiment can be a base plate, other products and is selected according to the actual situation. The upper part of the lower roller 2 is provided with a plasma ultrasonic dry cleaning machine head 3, and the upper part of the lower roller 2 is used for carrying out dry cleaning treatment on the belt cleaning objects conveyed on the lower roller 2. A plasma generation chamber 301 is arranged in the plasma ultrasonic dry cleaning machine head 3, and preferably, the shape of the plasma generation chamber 301 is rectangular; a plasma generation device 3011 is provided in the plasma generation chamber 301. A plasma jet port 3014 is arranged at the bottom end of the plasma ultrasonic dry cleaning machine head 3, and plasma in the plasma generation chamber 301 is ejected from the plasma jet port 3014; the bottom end of the plasma ultrasonic dry cleaning machine head 3 is provided with an ultrasonic generating device. Therefore, when the plasma and the ultrasonic wave are emitted, the object 8 to be cleaned on the lower roller 2 can be cleaned, and inorganic matters and organic matters on the object 8 to be cleaned are removed.

Referring to fig. 9, the ultrasonic wave generating device is a U-shaped ultrasonic wave generating device; the number of the plasma jet orifices 3014 includes two, the plasma jet orifices 3014 are distributed in the left-right direction, and the left side part of the U-shaped ultrasonic wave generating device is located between the plasma jet orifices 3014 to form an ultrasonic cleaning area, a plasma cleaning area, an ultrasonic cleaning area and a plasma cleaning area which are arranged from right to left. The sequential arrangement has the effects that a better cleaning effect can be achieved, and the method is suitable for a dry cleaning process before film coating, specifically, inorganic matters on the surface of an object 8 to be cleaned are removed through ultrasonic waves, organic matters on the surface of the object 8 to be cleaned are removed through plasma, or the organic matters are decomposed to form micromolecule organic matters with weak adhesion, the micromolecule organic matters can be removed through ultrasonic waves in the next ultrasonic wave area, surface dirt of the object 8 to be cleaned is removed completely, a substrate is selected for the object 8 to be cleaned, then the substrate passes through the next plasma jet flow covering area, the plasma mainly carries out surface modification on the substrate, the surface energy of the substrate is increased, and the adhesive force of the film coating is increased. The surface of a substrate, particularly a glass substrate, is subjected to hydrophobic modification by the plasma, the plasma bonds a compact hydrophobic film on the surface of the glass, the modification effect is different along with different processing voltages and processing time, the optimal processing time is achieved under constant processing voltage, and the generated surface layer has better ageing resistance.

The preferred first plasma ultrasonic dry cleaning handpiece 3, see fig. 5, 6, 7, 8: the ultrasonic generator comprises a U-shaped gas ultrasonic generator 3021 and a U-shaped ultrasonic outlet 3022. An ultrasonic generating chamber 302 is arranged in the plasma ultrasonic dry cleaning machine head 3, and a U-shaped gas ultrasonic generator 3021 is positioned in the ultrasonic generating chamber 302; a U-shaped ultrasonic outlet 3022 is positioned at the bottom end of the plasma ultrasonic dry cleaning handpiece 3, and the ultrasonic wave in the ultrasonic wave generating chamber 302 is emitted from the U-shaped ultrasonic outlet 3022; the left part of the U-shaped ultrasonic outlet 3022 is located between the plasma jet orifices 3014.

Specifically, referring to fig. 5, the ultrasonic wave generating chamber 302 is a U-shaped cavity; the left part of the ultrasonic wave generating chamber 302 is positioned at the inner bottom end of the plasma generating chamber 301, and the right part of the ultrasonic wave generating chamber 302 is positioned at the outer bottom end of the plasma generating chamber 301;

specifically, referring to fig. 5, the left and right sides of the ultrasonic wave outlet port 3022 are respectively located at the bottom ends of the left and right sides of the ultrasonic wave generation chamber 302; the plasma jet ports 3014 are respectively located at the bottom ends of the left side and the right side of the plasma generation chamber 301; the pressure in the ultrasonic wave generating chamber 302 is 0.2 to 0.6MPa.

Fig. 9, another preferred plasma ultrasonic dry cleaning handpiece 3: the ultrasonic generator is a U-shaped transistor ultrasonic generator 3023, i.e., the ultrasonic generator 3023 is mounted at the bottom end of the plasma ultrasonic dry cleaning handpiece 3 without the ultrasonic generating chamber 302.

Specifically, referring to fig. 2 and 3, an upper cover 6 is arranged above the lower roller 2, a lower cover 5 is arranged below the lower roller 2, and the upper cover 6 and the lower cover 5 are matched to form a cover with a closed space inside; specifically, the upper cover 6 and the lower cover 5 can be mounted and fixed on the supporting mechanism 1. The plasma ultrasonic dry cleaning machine head 3 is positioned in the upper cover 6, so that when the plasma ultrasonic dry cleaning machine head 3 works, the generated ozone and dirt can be prevented from being leaked or flowing into the next process; specifically, the plasma ultrasonic dry cleaning head 3 may be mounted and fixed on the inner wall of the upper cover 6. An output port is arranged on the left side of the upper cover 6, and an inlet port is arranged on the right side of the upper cover 6, so that the lower roller 2 can convey the object 8 to be cleaned into and out of the upper cover 6; the upper cover 6 is provided with an air exhaust opening 601, preferably, the top of the upper cover 6 is provided with the air exhaust opening 601, and the air exhaust opening 601 is connected with an external air exhaust pipe, so that the external air exhaust pipe can exhaust dirt and ozone in the cover, and the health of workers can be prevented from being harmed by the ozone.

Specifically, referring to fig. 1, the left and right sides in the upper cover 6 are respectively provided with the air knives 4, the left air knives 4 form an airflow wall at the output port, the air knives 4 can perform the function of cleaning the outgoing substrate again, and simultaneously play a role of cooling the substrate, because the substrate generates heat when acting with plasma, and meanwhile, the airflow wall of the air knives 4 can prevent ozone and dirt from leaking; the air knife 4 on the right side forms an air flow wall at the inlet, and the air flow wall formed by the air knife 4 can perform the primary cleaning function on the incoming substrate and can prevent the leakage of ozone, dirt and the like.

Specifically, referring to fig. 4 and 5, the back surface of the plasma generation chamber 301 is provided with a wire port 3012 and an air inlet port 3013, and the back surface of the upper cover 6 is provided with a through hole 602; the electric wires in the plasma generation chamber 301 are electrically connected with an external radio frequency high-voltage power supply through the electric wire port 3012 and the through hole 602 in sequence, and the electric wires in the plasma generation chamber 301 are connected with the plasma generation device 3011, so that the plasma generation device 3011 obtains energy required for generating plasma; the gas inlet 3013 is connected to one end of a gas supply pipe, the other end of which is connected to the outside through a through hole 602, the gas supply pipe being used to supply a desired gas to the plasma generation chamber 301, and further supplying the gas to the plasma generation apparatus 3011 to generate plasma.

Specifically, referring to fig. 1, 2, 4 and 5, an ozone removing device 7 is provided below the lower cover 5, the ozone removing device 7 is preferably mounted on the support mechanism 1, and the ozone removing device 7 is a box in which an article such as activated carbon or a catalyst having a reducing action is placed to absorb a trace amount of ozone which may leak out. The through hole 602 is sealed with a sealant after the electric wire and the air supply pipe pass through the through hole, thereby preventing leakage of harmful gas in the cover.

While the foregoing is directed to the preferred embodiment of the present invention, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention.

Claims (10)

1. The utility model provides an ultrasonic cleaning structure, includes supporting mechanism, the last running roller that sets up of supporting mechanism, its characterized in that: the top of running roller is equipped with the dry cleaning machine head of plasma ultrasonic wave down, it takes place the cavity to be equipped with plasma in the dry cleaning machine head of plasma ultrasonic wave, be equipped with plasma generating device in the plasma takes place the cavity, the bottom that the dry cleaning machine head of plasma ultrasonic wave is equipped with the plasma jet orifice, plasma in the plasma generation cavity is followed the plasma jet orifice jets out, the bottom that the dry cleaning machine head of plasma ultrasonic wave is equipped with ultrasonic generating device.

2. An ultrasonic cleaning structure according to claim 1, wherein: the ultrasonic generating device is a U-shaped ultrasonic generating device; the quantity of plasma efflux mouth includes two, the plasma efflux mouth is left right direction and distributes, U type ultrasonic wave generating device's left side part is located between the plasma efflux mouth to form from the right side to the ultrasonic cleaning region of left side range, plasma cleaning region, ultrasonic cleaning region and plasma cleaning region.

3. An ultrasonic cleaning structure according to claim 2, wherein: the ultrasonic generating device comprises a U-shaped gas ultrasonic generator and a U-shaped ultrasonic outlet; an ultrasonic generating chamber is arranged in the plasma ultrasonic dry cleaning machine head, and the U-shaped gas ultrasonic generator is positioned in the ultrasonic generating chamber; the U-shaped ultrasonic outlet is positioned at the bottom end of the plasma ultrasonic dry cleaning machine head, and ultrasonic waves in the ultrasonic generation chamber are emitted from the U-shaped ultrasonic outlet; the left side part of the U-shaped ultrasonic outlet is positioned between the plasma jet orifices.

4. An ultrasonic cleaning structure according to claim 3, wherein: the ultrasonic wave generating cavity is a U-shaped cavity; the left side part of the ultrasonic wave generating chamber is positioned at the inner bottom end of the plasma generating chamber, and the right side part of the ultrasonic wave generating chamber is positioned at the outer bottom end of the plasma generating chamber.

5. An ultrasonic cleaning structure according to claim 4, wherein: the left side and the right side of the ultrasonic outlet are respectively positioned at the bottom ends of the left side and the right side of the ultrasonic generating chamber; the plasma jet ports are respectively positioned at the bottom ends of the left side and the right side of the plasma generation chamber; the pressure in the ultrasonic wave generating chamber is 0.2-0.6 MPa.

6. An ultrasonic cleaning structure according to claim 2, wherein: the ultrasonic wave generating device is a U-shaped transistor ultrasonic wave generator.

7. An ultrasonic cleaning structure according to claim 1, wherein: an upper cover is arranged above the lower roller, a lower cover is arranged below the lower roller, and the upper cover and the lower cover are matched to form a cover with a closed space inside; the plasma ultrasonic dry cleaning machine head is positioned inside the upper cover; an output port is formed in the left side of the upper cover body, and an inlet port is formed in the right side of the upper cover body, so that the lower roller can convey an object to be cleaned into and out of the upper cover body; the upper cover is provided with an air suction opening, and the air suction opening is connected with an external air suction pipe so that the external air suction pipe can suck dirt and ozone in the cover away.

8. An ultrasonic cleaning structure according to claim 7, wherein: the left side and the right side in the upper cover are respectively provided with an air knife, the air knife on the left side forms an air flow wall at the output port, and the air knife on the right side forms an air flow wall at the inlet port.

9. An ultrasonic cleaning structure according to claim 7, wherein: an ozone removing device is arranged below the lower cover; and sealing the through hole by using a sealant after the electric wire and the air supply pipe pass through the through hole.

10. An ultrasonic cleaning device, characterized in that: the ultrasonic cleaning apparatus includes the ultrasonic cleaning structure according to any one of claims 1 to 9.

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