CN115705984A - Lower electrode cavity of ion beam etching machine and assembling method thereof - Google Patents

Abstract

The invention discloses a lower electrode cavity of an ion beam etching machine and an assembling method thereof, wherein the lower electrode cavity comprises a shell and a shell cover, and the shell is provided with: the first sealing surface is in sealing fit with the shell cover, the jack is used for being plugged with a rotary sealing shaft of the ion beam etching machine, the second sealing surface surrounds the periphery of the jack and is used for being in sealing fit with the rotary sealing shaft, a via hole for the conducting circuit, the gas conveying pipeline or the liquid conveying pipeline to extend into the lower electrode cavity is formed, and the third sealing surface surrounds the periphery of the via hole and is used for being in sealing connection with a rotating shaft outside the vacuum cavity. The lower electrode cavity is isolated from the vacuum cavity through three sealing joint parts, and the sealing joint parts are few, so that the leakage rate is low. Moreover, the lower electrode cavity is simple in overall structure, the shell and the shell cover can be formed by turning, the machining process is simple, and the lower electrode cavity is easy to assemble.

Description

Lower electrode cavity of ion beam etching machine and assembling method thereof

Technical Field

The invention relates to the technical field of ion beam etching, in particular to a lower electrode cavity of an ion beam etching machine and an assembling method of the lower electrode cavity.

Background

Ion beam etching, also known as ion milling, decomposes argon gas into argon ions by using the glow discharge principle, and the argon ions physically bombard the surface of a sample through the acceleration of an anode electric field so as to achieve the etching effect. In the etching process, ar gas is filled into an ion source discharge chamber and ionized to form plasma, ions are led out in a beam shape by a grid and accelerated, the ion beam with certain energy enters a vacuum chamber and is emitted to the surface of a material to bombard surface atoms, so that the material atoms are sputtered, and the purpose of etching is achieved.

The ion beam etching machine comprises a slide holder, a rotary sealing shaft connected with the slide holder, a lower electrode cavity and other structures, liquid, gas or electricity required by the operation of the slide holder is introduced into the lower electrode cavity from the outside, and the lower electrode cavity is required to be mutually isolated from the vacuum cavity of the ion beam etching machine so as to prevent the liquid and the gas in the lower electrode cavity from entering the vacuum cavity to influence the cleanliness and the vacuum degree of the vacuum cavity.

Generally, the leakage rate is higher when the number of the sealing joint parts is larger, and the number of the sealing joint parts of the lower electrode cavity of the existing ion beam etching machine is larger (generally more than 4), so that the leakage rate is higher, and the structural design of the lower electrode cavity is more complex, so that the processing and assembling difficulty is higher.

Therefore, how to alleviate or avoid the above disadvantages of the lower electrode chamber of the existing ion beam etcher is a technical problem to be solved by those skilled in the art.

Disclosure of Invention

In order to solve the technical problem, the invention provides a lower electrode cavity of an ion beam etching machine, which comprises a shell and a shell cover, wherein the shell is provided with:

a first sealing surface in sealing engagement with the housing cover;

the jack is used for plugging a rotary sealing shaft of the ion beam etching machine;

a second sealing surface surrounding the periphery of the receptacle for sealing engagement with the rotary seal shaft;

a via hole for the conducting line, the gas conveying pipeline or the liquid conveying pipeline to extend into the lower electrode cavity;

and the third sealing surface surrounds the periphery of the through hole and is used for being in sealing fit with the rotating shaft outside the vacuum cavity.

In one embodiment, the housing includes a first tray, the housing cover is attached to the lower side of the first tray, the first sealing surface is disposed on the lower end surface of the first tray, the insertion hole is disposed on the first tray, and the second sealing surface is disposed on the upper end surface of the first tray.

In one embodiment, the housing includes a second tray located on a side of an outer periphery of the first tray, the via hole is provided in the second tray, an end surface of the second tray is farther from the first tray than another end surface of the second tray, and the third sealing surface is provided on an end surface of the second tray farther from the first tray.

In one embodiment, the housing includes a connecting portion connecting the first tray and the second tray, the connecting portion smoothly transitioning from an outer circumferential surface of the first tray to an outer circumferential surface of the second tray.

In one embodiment, the housing is of unitary construction.

In one embodiment, the housing cover has an annular peripheral wall portion and a horizontal bottom wall portion that blocks a bottom end of the annular peripheral wall portion, and the housing cover is of an integrally molded structure.

In one embodiment, the housing cover and the rotary seal shaft are provided with seal grooves, and seal rings are mounted in the seal grooves, and the seal rings are in close contact with the first seal surface or the second seal surface.

In one embodiment, the ion beam etching device further comprises an upper guard ring which is connected above the first disk body and encloses the periphery of the wafer carrying table of the ion beam etching machine for protecting the wafer carrying table.

In one embodiment, a stepped portion is provided at a position where the first disk body connects the upper retainer, the rotary seal shaft, and the housing cover.

In addition, the invention also provides an assembly method of the lower electrode cavity of the ion beam etching machine, which comprises the following steps:

firstly, inserting a rotary sealing shaft assembled with a slide holder into an insertion hole of the shell, and fixing a shaft sleeve of the rotary sealing shaft and the shell;

then, assembling a motor, a conductive joint and a pipe joint on a rotary sealing shaft, wherein the motor, the conductive joint and the pipe joint are positioned in the lower electrode cavity, penetrating a conductive line, a liquid conveying pipeline and a gas conveying pipeline into the lower electrode cavity from a through hole of the shell, and connecting the conductive joint and the conductive line, the pipe joint and the liquid conveying pipeline, and the pipe joint and the gas conveying pipeline;

then, conducting power-on, ventilation and water-on tests, rotating the slide holder after no problem exists, checking whether the rotation is abnormal or not, and debugging until the rotation is abnormal or not if the rotation is abnormal;

then, checking whether the conductive joint and the pipe joint have abnormality, and if the conductive joint and the pipe joint have abnormality, debugging until the conductive joint and the pipe joint have no abnormality;

then, the case cover is mounted.

The lower electrode cavity provided by the invention realizes the isolation from the vacuum cavity through three sealing joint parts (one is positioned between the first sealing surface and the shell, the other is positioned between the second sealing surface and the rotary sealing shaft, and the other is positioned between the third sealing surface and the rotating shaft), and the sealing joint parts are few, so the leakage rate is low. Moreover, the lower electrode cavity is simple in overall structure, the shell and the shell cover can be formed by turning, and the lower electrode cavity is simple in machining process and easy to assemble.

Drawings

FIG. 1 is a perspective view of one embodiment of a lower electrode cavity configuration provided by the present invention;

FIG. 2 is a sectional view of the lower electrode chamber shown in FIG. 1 in an exploded configuration;

FIG. 3 is an enlarged view of the circled portion in FIG. 2;

FIG. 4 is a sectional view of the assembled lower electrode chamber structure shown in FIG. 1;

FIG. 5 is an enlarged view of the circled portion in FIG. 4;

FIG. 6 is a cross-sectional view of the lower electrode chamber structure shown in FIG. 1 assembled with components such as a rotary seal shaft, electrodes, and joints;

fig. 7 is an enlarged view of the circled portion in fig. 6.

The reference numerals are illustrated below:

1 lower electrode cavity structure;

11 cases, 111 first tray, 111a first annular step, 111b second annular step, 111c third annular step, 112 second tray, 113 connection; 12 a case cover, 121 an annular peripheral wall part, 122 a horizontal bottom wall part; 13 an upper retainer;

a1 a first sealing surface, A2 a second sealing surface, A3 a third sealing surface; b1, inserting holes and B2 through holes; c, sealing a groove; d, sealing rings; e, fastening pieces;

2, rotating a sealing shaft, 21, a shaft body and 22 shaft sleeves;

3, a slide holder;

4, a motor;

5, a conductive joint;

6, connecting a pipeline;

7 conductive circuits;

8 gas conveying pipeline

9 liquid delivery line.

Detailed Description

In order to make those skilled in the art better understand the technical solution of the present invention, the technical solution of the present invention is further described in detail below with reference to the accompanying drawings and the detailed description.

The lower electrode cavity of the prior ion beam etching machine is generally isolated from the vacuum cavity by more than four sealing joint parts, the leakage rate is high due to the large number of the sealing joint parts, and the lower electrode cavity has a complex structure and is difficult to process and assemble. In view of the above, the present invention provides a lower electrode chamber of an ion beam etcher.

As shown in fig. 1, the lower electrode chamber includes a housing 11 and a housing cover 12, and the housing 11 includes a first tray 111, a second tray 112, and a connection portion 113 connected between the first tray 111 and the second tray 112. The cover 12 is attached to the housing 11 below the first plate 111.

Alternatively, the upper retainer 13 may be provided, the upper retainer 13 is connected to the first disk 111, the upper retainer 13 is cylindrical, as shown in fig. 3, the upper end surface of the first disk 111 is provided with a second annular step portion 111b, as shown in fig. 5, in an assembled state, the lower end of the upper retainer 13 is fitted into a recessed portion of the second annular step portion 111b, a protruding portion of the second annular step portion 111b protrudes into the upper retainer 13 and abuts against an inner peripheral wall surface of the upper retainer 13, and a fastening member E is screwed into a screw hole of the protruding portion of the second annular step portion 111b after penetrating the upper retainer 13 in a radial direction, thereby connecting the upper retainer 13 and the first disk 111. Of course, the upper retainer 13 and the first disk 111 may be screwed together by an internal thread and an external thread, or may be engaged by a claw and a bayonet, etc. Referring to fig. 6, the wafer stage 3 of the assembled ion beam etcher is located in the enclosed space of the upper guard ring 13, or the upper guard ring 13 is enclosed around the wafer stage 3, so as to protect the wafer stage 3.

As shown in fig. 2, the housing 11 is provided with a first sealing surface A1, a second sealing surface A2 and a third sealing surface A3. The first sealing surface A1 is adapted to sealingly engage the housing cover 12. The second sealing surface A2 is intended to sealingly engage a rotary seal shaft 2 (see fig. 6) inserted into the housing 11, the rotary seal shaft 2, the housing 11 and the housing cover 12 together enclosing an inner chamber forming a lower electrode chamber. The third sealing surface A3 is used for sealing and matching with a rotating shaft (not shown in the figure) outside the vacuum chamber, and the whole ion beam etching machine can rotate around the axis L of the rotating shaft. And under the sealing action of the first sealing surface A1, the second sealing surface A2 and the third sealing surface A3, the lower electrode cavity is isolated from the vacuum cavity.

As shown in fig. 3, the first sealing surface A1 is provided on the first disc body 111. Specifically, the lower end surface of the first disc body 111 is provided with a third annular stepped portion 111c, and the first seal surface A1 is provided in a recessed portion of the third annular stepped portion 111 c. As shown in fig. 5, the housing cover 12 is connected to the first tray 111 by a fastener E, and of course, the housing cover 12 and the first tray 111 may be connected by an internal thread and an external thread, or may be engaged by a claw and a bayonet, etc. A sealing groove C is formed in the upper end of the wall of the shell cover 12, a sealing ring D is mounted in the sealing groove C, and in an assembly state, the upper end of the wall of the shell cover 12 extends into a concave part of the third annular step part 111C and is tightly contacted with the first sealing surface A1 through the sealing ring D, so that the first sealing surface A1 is in sealing fit with the shell cover 12; the convex part of the third annular step part 111c extends into the housing cover 12 and abuts against the inner peripheral wall surface of the housing cover 12, thereby playing a role in limiting and guiding assembly.

As shown in fig. 3, the second sealing surface A2 is also provided on the first disk body 111, and the first disk body 111 is provided with an insertion hole B1 for inserting the rotary seal shaft 2, and the second sealing surface A2 surrounds the insertion hole B1. Specifically, the upper end surface of the first disc body 111 is provided with a first annular stepped portion 111a, and the second sealing surface A2 is provided in a recessed portion of the first annular stepped portion 111 a. As shown in fig. 6 and 7, the rotary seal shaft 2 includes a shaft sleeve 22, an annular flange is disposed on the periphery of the main body of the shaft sleeve 22, a seal groove C is disposed at the lower end of the annular flange, a seal ring D is installed in the seal groove C, in an assembled state, the main body of the shaft sleeve 22 is fittingly inserted into the insertion hole B1, the annular flange of the shaft sleeve 22 is inserted into the recessed portion of the first annular step portion 111a, and is connected with the first disc portion 111 by a fastener, a snap, a thread, or the like, and is in close contact with the second seal surface A2 by the seal ring D, so that the seal fit between the second seal surface A2 and the rotary seal shaft 2 is achieved. In the assembled state, the protruding portion of the first annular step portion 111a is located at the periphery of the annular flange of the shaft sleeve 22, and abuts against the outer peripheral surface of the annular flange of the shaft sleeve 22, thereby performing the functions of limiting and guiding the assembly.

In addition, as shown in fig. 6, the rotary seal shaft 2 further includes a shaft body 21, the shaft body 21 is inserted into an inner hole of the shaft sleeve 22, the upper end of the shaft body 21 is connected with the slide holder 3, the shaft body 21 is further connected with the motor 4, the conductive connector 5 and the pipe connector 6 which are installed in the lower electrode cavity, and the pipe connector 6 is provided with an air path interface and a liquid path interface. The conductive connector 5 is connected with the conductive circuit 7 to provide power for the motor 4, and the motor 4 can drive the shaft body 21 to rotate so as to drive the slide holder 3 to rotate. The gas path interface of the pipe joint 6 is connected with the gas conveying pipeline 8 to provide lifting force for the shaft body 21, so that the slide holder 3 is driven to lift. The liquid path interface of the pipe joint 6 is connected with a liquid conveying pipeline 9 to supply cooling liquid for the slide holder 3, so that the slide holder 3 is ensured to be at a proper working temperature and avoid overheating. A through hole B2 is formed in the shell 11, and the gas conveying pipeline 8, the liquid conveying pipeline 9 and the conducting circuit 7 penetrate into the lower electrode cavity from the through hole B2.

As shown in fig. 2, a third sealing surface A3 and a via B2 are provided on the second disc 112. Specifically, the second tray body 112 is located on one side of the outer periphery of the first tray body 111, the end face of the second tray body 112 is approximately perpendicular to the end face of the first tray body 111, one end face (referred to as a distal end face) of the second tray body 112 is farther from the first tray body 111 than the other end face (referred to as a proximal end face), the third sealing surface A3 is located on the distal end face of the second tray body 112, and the third sealing surface A3 surrounds the outer periphery of the through hole B2.

As shown in fig. 1 and 2, the connection portion 113 of the housing 11 smoothly transitions from the outer circumferential surface of the first tray 111 to the outer circumferential surface of the second tray 112, and the connection portion 113 is tangent to the outer circumferential surfaces of the first tray 111 and the second tray 112. The shell 11 is simple in structure, can be integrally formed, can be formed by turning a blank, and is simple in machining process. The casing cover 12 has an annular peripheral wall portion 121 and a horizontal bottom wall portion 122, the casing cover 12 is shaped like a bowl, the casing cover 12 can be integrally formed, specifically, the casing cover can be formed by turning a blank, and the machining process is simple.

The lower electrode cavity provided by the invention is isolated from the vacuum cavity by three sealing joint parts, and the sealing joint parts are few, so that the leakage rate is low, the whole structure is simple, and the parts are few, thereby being convenient for processing and assembling.

In addition, the invention also provides an assembly method of the lower electrode cavity, which specifically comprises the following steps:

firstly, inserting the rotary seal shaft 2 assembled with the slide holder 3 into the insertion hole B1 of the shell 11, and fixing the shaft sleeve 22 of the rotary seal shaft 2 and the shell 11;

then, assembling the motor 4, the conductive joint 5 and the pipe joint 6 on the rotary sealing shaft 2, wherein the motor 4, the conductive joint 5 and the pipe joint 6 are positioned in the lower electrode cavity, penetrating the conductive circuit 7, the liquid conveying pipeline 9 and the gas conveying pipeline 8 into the lower electrode cavity from the through hole B2 of the shell 11, and connecting the conductive joint 5 and the conductive circuit 7, the pipe joint 6 and the liquid conveying pipeline 9, and the pipe joint 6 and the gas conveying pipeline 8;

then, conducting power-on, ventilation and water-on tests, rotating the slide holder 3 and checking whether the rotation is abnormal or not after no problem exists, and debugging until the rotation is abnormal or not if the rotation is abnormal; if the upper guard ring 13 is provided, the upper guard ring 13 is also installed before the wafer stage 3 is rotated;

then, whether the conductive joint 5 and the pipe joint 6 are abnormal or not is checked, and if the conductive joint and the pipe joint are abnormal, debugging is carried out until no abnormality exists;

then, the case cover 12 is mounted.

The structure of the lower electrode cavity of the ion beam etching machine and the assembling method thereof provided by the invention are described in detail above. The principles and embodiments of the present invention are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.

Claims (10)

1. Lower electrode chamber of ion beam etching machine, its characterized in that, including casing (11) and cap (12), casing (11) are equipped with:

a first sealing surface (A1) in sealing engagement with the housing cover (12);

the inserting hole (B1) is used for inserting a rotary sealing shaft (2) of the ion beam etching machine;

a second sealing surface (A2) surrounding the periphery of the insertion hole (B1) and used for being in sealing fit with the rotary sealing shaft (2);

a via hole (B2) for the conducting line (7), the gas conveying pipeline (8) or the liquid conveying pipeline (9) to extend into the lower electrode cavity;

and a third sealing surface (A3) which surrounds the periphery of the through hole (B2) and is used for being in sealing fit with the rotating shaft outside the vacuum cavity.

2. The lower electrode chamber of the ion beam etching machine as set forth in claim 1, wherein said housing (11) includes a first tray (111), said housing cover (12) is attached under said first tray (111), said first sealing surface (A1) is provided on a lower end surface of said first tray (111), said insertion hole (B1) is provided on said first tray (111), and said second sealing surface (A2) is provided on an upper end surface of said first tray (111).

3. The lower electrode chamber of the ion beam etcher as set forth in claim 2, wherein the housing (11) includes a second tray body (112), the second tray body (112) is located on a side of an outer periphery of the first tray body (111), the via hole (B2) is provided in the second tray body (112), an end surface of one end of the second tray body (112) is farther from the first tray body (111) than an end surface of the other end, and the third seal surface (A3) is provided at an end surface of the second tray body (112) which is farther from the first tray body (111).

4. The lower electrode chamber of the ion beam etcher as claimed in claim 3, wherein the housing (11) includes a connecting portion (113), the connecting portion (113) connects the first tray (111) and the second tray (112), and the connecting portion (113) smoothly transitions from an outer circumferential surface of the first tray (111) to an outer circumferential surface of the second tray (112).

5. The lower electrode chamber of the ion beam etcher as claimed in claim 4, wherein the housing (11) is of an integrally formed structure.

6. The lower electrode chamber of the ion beam etching machine as claimed in claim 4, wherein the housing cover (12) has an annular peripheral wall portion (121) and a horizontal bottom wall portion (122), the horizontal bottom wall portion (122) is blocked at a bottom end of the annular peripheral wall portion (121), and the housing cover (12) is of an integrally formed structure.

7. The lower electrode chamber of the ion beam etching machine of any one of claims 1 to 5, wherein the housing cover (12) and the rotary seal shaft (2) are provided with a seal groove (C) and a seal ring (D) is mounted in the seal groove (C), and the seal ring (D) is in close contact with the first seal surface (A1) or the second seal surface (A2).

8. The lower electrode chamber of the ion beam etcher as defined in any one of claims 2 to 5, further comprising an upper guard ring (13), wherein the upper guard ring (13) is connected above the first tray (111) and encloses a stage (3) of the ion beam etcher for protecting the stage (3).

9. A lower electrode chamber according to claim 8, characterized in that the first disc (111) is stepped at a position connecting the upper retainer (13), the rotary seal shaft (2) and the housing cover (12).

10. The method for assembling the lower electrode chamber of the ion beam etcher as defined in any one of claims 1 to 9, comprising the steps of:

firstly, inserting a rotary sealing shaft (2) assembled with a slide holder (3) into an insertion hole (B1) of the shell (11), and fixing a shaft sleeve (22) of the rotary sealing shaft (2) and the shell (11);

then, assembling a motor (4), a conductive joint (5) and a pipe joint (6) on a rotary sealing shaft (2), wherein the motor (4), the conductive joint (5) and the pipe joint (6) are positioned in a lower electrode cavity, and penetrating a conductive circuit (7), a liquid conveying pipeline (9) and a gas conveying pipeline (8) into the lower electrode cavity from a through hole (B2) of a shell (11) and connecting the conductive joint (5), the conductive circuit (7), the pipe joint (6), the liquid conveying pipeline (9), the pipe joint (6) and the gas conveying pipeline (8);

then, conducting power-on, ventilation and water-on tests, rotating the slide holder (3) and checking whether the rotation is abnormal or not after no problem exists, and debugging until the rotation is abnormal or not if the rotation is abnormal;

then, whether the conductive joint (5) and the pipe joint (6) are abnormal or not is checked, and if the conductive joint and the pipe joint are abnormal, debugging is carried out until no abnormality exists;

then, the case cover (12) is mounted.

Images