CN115636389B - Fabrication method and application of monomolecular junction based on controllable nano-gap of piezoelectric sheet - Google Patents

Fabrication method and application of monomolecular junction based on controllable nano-gap of piezoelectric sheet Download PDF

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CN115636389B
CN115636389B CN202211262272.XA CN202211262272A CN115636389B CN 115636389 B CN115636389 B CN 115636389B CN 202211262272 A CN202211262272 A CN 202211262272A CN 115636389 B CN115636389 B CN 115636389B
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piezoelectric sheet
gold wire
piezoelectric
groove
gap
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向东
尹凯凯
赵雪妍
张旭斌
许晓娜
王懋宁
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Nankai University
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Abstract

The invention discloses a preparation method of a single-molecule junction based on a controllable nano gap of a piezoelectric sheet, which comprises the following steps: the piezoelectric sheet, the driving electrode, the insulating layer and the gold wire with the pre-circular cutting; the piezoelectric sheet is a substrate/substrate; the upper and lower surfaces of the piezoelectric sheet are provided with driving electrodes; the insulating layer is positioned on the upper layer of the driving electrode; the gold wire with the pre-circular cutting is fixed on the insulating layer; when a driving voltage is applied to the driving electrode, the piezoelectric sheet is deformed transversely/horizontally, and the gold wires fixed on the insulating layer are correspondingly stretched, so that the size of the nanogap is precisely controlled. The invention constructs an in-situ adjustable on-chip metal nano gap with angstrom-level adjustment precision by using a piezoelectric sheet expanding in the horizontal direction, and further develops the in-plane controllable crack; technical support is provided for manufacturing on-chip devices with integration potential by taking single molecules as building blocks.

Description

基于压电片可控纳米间隙的单分子结制备方法和应用Fabrication method and application of monomolecular junction based on controllable nano-gap of piezoelectric sheet

技术领域technical field

本发明属于纳米电极的技术领域,具体涉及一种基于压电片可控纳米间隙的单分子结制备方法。The invention belongs to the technical field of nanometer electrodes, and in particular relates to a method for preparing a monomolecular junction based on a controllable nanometer gap of a piezoelectric sheet.

背景技术Background technique

随着半导体工艺特征尺寸缩小至十纳米以下,电极之间由隧穿效应所导致的漏电流将成为制约器件进一步小型化的关键技术挑战。分子具有合成成本低、结构多样性,可自组装等优点,利用单个分子自身特性来构建出具有特殊功能的分子器件成为当前分子电子学的研究热点。实现单分子功能器件的一个先决条件是能将微观的分子连接到宏观电路中测量并控制通过分子的电荷输运,因此制备电极-分子-电极结构的分子结成为首要任务。As the feature size of the semiconductor process shrinks to less than ten nanometers, the leakage current caused by the tunneling effect between electrodes will become a key technical challenge restricting the further miniaturization of devices. Molecules have the advantages of low synthesis cost, structural diversity, and self-assembly. Using the properties of individual molecules to construct molecular devices with special functions has become a research hotspot in molecular electronics. A prerequisite for the realization of single-molecule functional devices is the ability to connect microscopic molecules to macroscopic circuits to measure and control the charge transport through molecules. Therefore, the preparation of molecular junctions with electrode-molecule-electrode structures has become a top priority.

而构建单分子结的关键就是使电极与分子之间通过化学键来稳定高效地连接起来。通常,单分子结的电极主要是由金属来充当,形成金属-单分子-金属结。金属点电极的加工工艺复杂,且难以精确控制电极的形貌及所测量的分子的数目。The key to constructing unimolecular junctions is to connect electrodes and molecules stably and efficiently through chemical bonds. Usually, the electrodes of the unimolecular junction are mainly acted by metals, forming a metal-monimolecular-metal junction. The processing technology of the metal point electrode is complex, and it is difficult to precisely control the shape of the electrode and the number of molecules to be measured.

目前获得单分子结的主要方法有机械可控裂结技术,扫描探针显微技术,纳米间隙电极的电化学沉积技术和电迁移技术。但是这些方法中,机械可控裂结技术可在针尖形的电极间提供连续可调的纳米间隙,具有高度的机械稳定性,但是机械可控裂结技术装置需要借助压电陶瓷或步进电机通过弯曲基片以改变电级间的距离,无法实现片上集成。At present, the main methods to obtain unimolecular junctions are mechanically controllable split junction technology, scanning probe microscopy technology, electrochemical deposition technology of nano-gap electrodes and electromigration technology. However, in these methods, the mechanically controllable fission junction technology can provide continuously adjustable nanometer gaps between needle-shaped electrodes, and has a high degree of mechanical stability. However, the mechanically controllable fission junction technology device needs to use piezoelectric ceramics or stepping motors to change the distance between electrodes by bending the substrate, which cannot achieve on-chip integration.

因此,如何提供一种片上可控纳米裂结的单分子结制备方法是本领域技术人员急需解决的问题。Therefore, how to provide an on-chip controllable nano-splitting monomolecular junction preparation method is an urgent problem to be solved by those skilled in the art.

发明内容Contents of the invention

鉴于此,本发明提供了一种基于压电片可控纳米间隙的单分子结制备方法,通过使用水平可膨胀压电片构建具有埃级调制分辨率的原位可调片上金属纳米间隙,进一步发展为平面内的断裂及连接,其中该纳米间隙可以重复断裂和连接数百万次,实现具有自由调节间隙尺寸的片上裂结;以单分子作为构建模块制造具有集成潜力的高产量片上分子器件提供技术支撑。In view of this, the present invention provides a single-molecule junction preparation method based on the controllable nanogap of the piezoelectric sheet. By using the horizontal expandable piezoelectric sheet to construct an in-situ adjustable on-chip metal nanogap with angstrom-level modulation resolution, it can be further developed into in-plane fracture and connection, wherein the nanogap can be repeatedly broken and connected millions of times, realizing an on-chip split junction with freely adjustable gap size; using single molecules as building blocks to manufacture high-yield on-chip molecular devices with integration potential provides technical support.

为实现上述目的,本发明采用如下技术方案:To achieve the above object, the present invention adopts the following technical solutions:

一种基于压电片可控纳米间隙的单子分结制备方法,包括:压电片、驱动电极、绝缘层、带有预环切的金线;A method for preparing single-element junctions based on the controllable nano-gap of piezoelectric sheets, including: piezoelectric sheets, driving electrodes, insulating layers, and gold wires with pre-ring cuts;

其中,所述压电片为基片/衬底;所述压电片的上下表面均设置有驱动电极;Wherein, the piezoelectric sheet is a substrate/substrate; the upper and lower surfaces of the piezoelectric sheet are provided with driving electrodes;

所述绝缘层位于所述驱动电极的上层;所述带有预环切的金线固定在所述绝缘层上;The insulating layer is located on the upper layer of the driving electrodes; the gold wires with pre-cutting are fixed on the insulating layer;

当驱动电压施加至所述驱动电极时,夹在所述驱动电极中间的所述压电片将发生横向/水平变形,固定在所述绝缘层上的所述金线被相应拉伸,精确控制纳米间隙大小。When a driving voltage is applied to the driving electrodes, the piezoelectric sheet sandwiched between the driving electrodes will undergo lateral/horizontal deformation, and the gold wires fixed on the insulating layer will be stretched accordingly, precisely controlling the size of the nano-gap.

优选的,所述带有预环切的金线的制备方法如下:Preferably, the preparation method of the gold wire with pre-circumcision is as follows:

1)在金线一的中间部分进行环切形成凹槽,将所述金线一切割成相对对称的沙漏形;1) Carry out circumcision in the middle part of the gold wire 1 to form a groove, and cut the gold wire 1 into a relatively symmetrical hourglass shape;

2)将经过步骤1)处理的所述金线一固定在涂有绝缘胶的压电片上;2) fixing the gold wires treated in step 1) on the piezoelectric sheet coated with insulating glue;

3)将金线二置于压电片的上层,且所述金线二的一端置于接近所述金线一的凹槽中心;3) placing the second gold wire on the upper layer of the piezoelectric sheet, and placing one end of the second gold wire at the center of the groove close to the first gold wire;

4)将电解质滴在所述凹槽附近的所述压电基片上,以浸没所述金线二的末端位置和金线一的凹槽部分;4) dropping an electrolyte on the piezoelectric substrate near the groove to immerse the end position of the second gold wire and the groove portion of the first gold wire;

5)在所述金线二上施加低电位,使其作为电化学反应的阴极,在所述金线一上施加高电位,使其作为阳极,通过电化学反应进行蚀刻;随着阳极的逐渐腐蚀,所述凹槽的直径减小。5) Applying a low potential on the second gold wire to make it a cathode for electrochemical reaction, and applying a high potential to the first gold wire to make it an anode for etching by electrochemical reaction; with the gradual corrosion of the anode, the diameter of the groove decreases.

优选的,步骤1)所述环切后凹槽直径为10-15μm;且经过步骤5)化学腐蚀后凹槽直径减小到≤1μm。Preferably, the groove diameter after circumcision in step 1) is 10-15 μm; and the groove diameter is reduced to ≤1 μm after chemical etching in step 5).

和/或,步骤2)所述压电基片为压电陶瓷基片;所述金线一通过环氧树脂固定在所述压电基片上;And/or, step 2) the piezoelectric substrate is a piezoelectric ceramic substrate; the gold wires are fixed on the piezoelectric substrate by epoxy resin;

和/或,步骤4)所述电解质为含有0.01摩尔每毫升的氯金酸和氯化硼1:1的水溶液。And/or, the electrolyte in step 4) is an aqueous solution containing 0.01 mole per milliliter of chloroauric acid and boron chloride at a ratio of 1:1.

优选的,所述压电片为纵向极化的矩形压电陶瓷片。Preferably, the piezoelectric sheet is a longitudinally polarized rectangular piezoelectric ceramic sheet.

优选的,所述驱动电极为银膜,所述银膜分别镀在所述压电片的上下表面。Preferably, the driving electrode is a silver film, and the silver film is respectively plated on the upper and lower surfaces of the piezoelectric sheet.

优选的,所述金线是通过粘结的方式固定在所述绝缘层上。Preferably, the gold wire is fixed on the insulating layer by bonding.

优选的,所述金线的拉伸断裂过程中通过电流信号分析仪测量通过所述金线的电流进行监控。Preferably, the tensile fracture process of the gold wire is monitored by measuring the current passing through the gold wire with a current signal analyzer.

优选的,当驱动电压增加时,所述金线的凹槽部分将受到张力,凹槽的横截面减小,直至断裂,形成纳米间隙。Preferably, when the driving voltage increases, the groove part of the gold wire will be subjected to tension, and the cross section of the groove will decrease until it breaks to form a nano-gap.

优选的,所述金线凹槽部分的最小直径为初始直径为1%,且悬空部分长度为初始直径的两倍,纳米桥的总拉伸长度为悬置部分长度的0.1%,其最大应变力产生在凹槽的最细部分。Preferably, the minimum diameter of the groove part of the gold wire is 1% of the initial diameter, and the length of the suspended part is twice the initial diameter, the total stretching length of the nanobridge is 0.1% of the length of the suspension part, and the maximum strain force is generated in the thinnest part of the groove.

本发明的另一目的是提供一种基于压电片可控纳米裂结制备单分子结的应用;将上述基于压电片可控纳米裂结的制备方法获得的单分子结在制备分子裂结阵列方面的应用。Another object of the present invention is to provide an application for the preparation of unimolecular junctions based on the controllable nano-splitting of piezoelectric sheets; the application of the unimolecular junctions obtained by the above-mentioned preparation method based on the controllable nano-splitting of piezoelectric sheets in the preparation of molecular splitting arrays.

经由上述的技术方案,与现有技术相比可知,本发明至少具有以下技术效果:Through the above-mentioned technical solution, compared with the prior art, it can be seen that the present invention has at least the following technical effects:

1)本发明考虑到面内集成和间隙可调的要求,提出了通过可横向膨胀的压电片实现片上可调纳米间隙的方法;1) The present invention considers the requirements of in-plane integration and adjustable gap, and proposes a method for realizing on-chip adjustable nano-gap through laterally expandable piezoelectric sheets;

2)本发明原则上可以在基片/衬底上制作成千上万的平行电极对,为制作分子结阵列提供了技术支持;2) In principle, the present invention can make tens of thousands of parallel electrode pairs on the substrate/substrate, which provides technical support for making molecular junction arrays;

3)本发明设计的方案每对电极的分离距离可以通过改变电极对的初始相对位置来独立调节,因此间隙尺寸调制精度及总间隙尺寸变化范围可以根据实际应用的需要进行微调;3) The separation distance of each pair of electrodes in the scheme designed by the present invention can be adjusted independently by changing the initial relative position of the electrode pair, so the gap size modulation accuracy and the total gap size variation range can be fine-tuned according to the needs of practical applications;

4)芯片上的间隙可以调整并保持在亚纳米分辨率,提供了在极限光学的应用,例如尖端增强拉曼光谱、局域表面等离激元中的应用。4) The gap on the chip can be adjusted and maintained at sub-nanometer resolution, providing applications in extreme optics, such as tip-enhanced Raman spectroscopy and localized surface plasmons.

附图说明Description of drawings

为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单的介绍,显而易见地,下面描述中的附图仅仅是本发明一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without creative work.

图1为本发明实施例1基于压电片可控纳米间隙的工作原理图。Fig. 1 is a schematic diagram of the working principle based on the controllable nano-gap of the piezoelectric sheet in Embodiment 1 of the present invention.

图2为本发明实施例2不同驱动电压下不同电极间距的扫描电镜图像。Fig. 2 is a scanning electron microscope image of different electrode spacings under different driving voltages in Example 2 of the present invention.

图3为本发明实施例3基于电子束光刻的可调片上纳米间隙的原理图。3 is a schematic diagram of an adjustable on-chip nanogap based on electron beam lithography according to Embodiment 3 of the present invention.

具体实施方式Detailed ways

下面将对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

实施例1Example 1

本实施例提供了一种基于压电片可控纳米间隙的单子分结制备方法,包括:压电片、驱动电极、绝缘层、带有预环切的金线;This embodiment provides a method for preparing single-element junctions based on the controllable nano-gap of piezoelectric sheets, including: piezoelectric sheets, driving electrodes, insulating layers, and gold wires with pre-ringing;

其中,压电片为基片/衬底;压电片的上下表面均设置有驱动电极;Wherein, the piezoelectric sheet is a substrate/substrate; the upper and lower surfaces of the piezoelectric sheet are provided with driving electrodes;

绝缘层位于驱动电极的上层;带有预环切的金线固定在绝缘层上;The insulating layer is located on the upper layer of the driving electrodes; the gold wire with pre-ring cut is fixed on the insulating layer;

当驱动电压施加至驱动电极时,夹设在驱动电极中间的压电片将方法是横向/水平变形,固定在绝缘层上的金线被相应拉伸,精确控制纳米间隙大小。When the driving voltage is applied to the driving electrodes, the piezoelectric sheet sandwiched between the driving electrodes will deform laterally/horizontally, and the gold wires fixed on the insulating layer will be stretched accordingly, precisely controlling the size of the nano-gap.

为了进一步优化上述技术方案,带有预环切的金线的制备方法如下:In order to further optimize the above-mentioned technical scheme, the preparation method of the gold wire with pre-circumcision is as follows:

1)在金线一的中间部分进行环切,将金线一切割成相对对称的沙漏型;1) Carry out circumcision in the middle part of the gold thread 1, and cut the gold thread 1 into a relatively symmetrical hourglass shape;

2)将经过步骤1)处理的金线一固定在绝缘的压电片上;2) fixing the gold wire 1 treated in step 1) on the insulating piezoelectric sheet;

3)将金线二置于压电片的上层,且金线二的一端置于接近金线一的凹槽中心;3) Place the gold wire 2 on the upper layer of the piezoelectric sheet, and place one end of the gold wire 2 in the center of the groove close to the gold wire 1;

4)将电解质滴在凹槽附近的压电片上,以浸没金线二的末端位置和金线一的凹槽部分;4) Drop the electrolyte on the piezoelectric sheet near the groove to immerse the end position of the gold wire two and the groove part of the gold wire one;

5)在金线二上施加低电位,使其作为电化学反应的阴极,在金线一上施加高电位,使其作为阳极,通过电化学反应进行蚀刻;随着阳极的逐渐腐蚀,凹槽的直径减小。5) Apply a low potential on the gold wire 2 to make it a cathode for electrochemical reactions, and apply a high potential to the gold wire 1 to make it an anode for etching through electrochemical reactions; with the gradual corrosion of the anode, the diameter of the groove decreases.

为了进一步优化上述技术方案,步骤1)环切后凹槽直径为10-15μm;In order to further optimize the above-mentioned technical scheme, step 1) the diameter of the groove after circumcision is 10-15 μm;

和/或,步骤2)压电片为压电陶瓷片;金线一通过环氧树脂固定在压电片上;And/or, step 2) the piezoelectric sheet is a piezoelectric ceramic sheet; the gold wire is fixed on the piezoelectric sheet through epoxy resin;

和/或,步骤4)电解质为含有0.01摩尔每毫升的氯金酸和氯化硼1:1的水溶液。And/or, step 4) the electrolyte is an aqueous solution containing 0.01 mole per milliliter of chloroauric acid and boron chloride at a ratio of 1:1.

为了进一步优化上述技术方案,压电片为纵向极化的矩形压电陶瓷片。In order to further optimize the above technical solution, the piezoelectric sheet is a longitudinally polarized rectangular piezoelectric ceramic sheet.

为了进一步优化上述技术方案,驱动电极为银膜,银膜分别镀在压电片的上下表面。In order to further optimize the above technical solution, the driving electrode is a silver film, and the silver film is respectively plated on the upper and lower surfaces of the piezoelectric sheet.

为了进一步优化上述技术方案,金线是通过粘结的方式固定在绝缘层上。In order to further optimize the above technical solution, the gold wire is fixed on the insulating layer by bonding.

为了进一步优化上述技术方案,金线的拉伸断裂过程中通过电流信号分析仪测量通过金线的电流进行监控。In order to further optimize the above technical solution, the gold wire is monitored by measuring the current passing through the gold wire through a current signal analyzer during the tensile fracture process.

为了进一步优化上述技术方案,当驱动电压增加时,金线的凹槽部分将受到张力,凹槽的横截面减小,直至断裂,形成纳米间隙。In order to further optimize the above technical solution, when the driving voltage increases, the groove part of the gold wire will be under tension, and the cross section of the groove will decrease until it breaks, forming a nano-gap.

为了进一步优化上述技术方案,金线凹槽部分的最小直径为初始直径为1%,且悬空部分长度为初始直径的两倍,纳米桥的总拉伸长度为悬空部分长度的0.1%,其最大应变力产生在凹槽的最细部分。In order to further optimize the above-mentioned technical scheme, the minimum diameter of the groove part of the gold wire is 1% of the initial diameter, and the length of the suspended part is twice the initial diameter, the total stretching length of the nanobridge is 0.1% of the length of the suspended part, and the maximum strain force is generated in the thinnest part of the groove.

更进一步,金线的初始直径为100μm,凹槽的最小直径≤1μm,且悬空部分长度为200μm,纳米桥的总拉伸长度为200nm,其最大应变力产生在凹槽的最细部分,最大应变力为1.35×1010N/m2Furthermore, the initial diameter of the gold wire is 100 μm, the minimum diameter of the groove is ≤1 μm, and the length of the suspended part is 200 μm, the total stretching length of the nanobridge is 200 nm, and the maximum strain force is generated in the thinnest part of the groove, and the maximum strain force is 1.35×10 10 N/m 2 .

附图图1基于压电片可控纳米间隙的工作原理图。Figure 1 is a working principle diagram based on the controllable nano-gap of the piezoelectric sheet.

其中a图为片上裂结技术的工作原理;纵向极化的压电陶瓷被用作衬底。当在衬底上施加驱动电压(Vd)时,将产生横向形变,进而拉伸固定与其上方的金线,以产生分离的电极对。通过观测金线两端的电流监控金线的伸长程度。Figure a shows the working principle of the on-chip split junction technology; a longitudinally polarized piezoelectric ceramic is used as the substrate. When a driving voltage (V d ) is applied to the substrate, a lateral deformation occurs, which in turn stretches the gold wire fixed above it to create separated electrode pairs. The elongation of the gold wire is monitored by observing the current at both ends of the gold wire.

b图为悬空部分金线的放大区域,具有凹槽的金线通过两滴黑胶固定在衬底上,初始间隔距离为d。凹槽部分将被拉长,直到下面的基底达到一定横向变形时最终断裂。Figure b shows the enlarged area of the suspended part of the gold wire. The gold wire with grooves is fixed on the substrate by two drops of black glue, and the initial spacing distance is d. The grooved portion will be elongated until it eventually breaks when the underlying substrate reaches a certain lateral deformation.

c图为模拟凹槽部分金线被拉伸时其周围的应力分布,具体为使用COMSOL软件包拉伸金线时的应力分布。Figure c shows the stress distribution around the simulated groove when the gold wire is stretched, specifically the stress distribution when the gold wire is stretched using the COMSOL software package.

d图为减少凹槽部分的金线直径的蚀刻过程示意图。Figure d is a schematic diagram of the etching process to reduce the diameter of the gold wire in the groove part.

实施例2Example 2

本实施例是在实施例1的基础上进一步验证:This embodiment is further verified on the basis of embodiment 1:

控制间隙尺寸调制的精确度的能力对于建立分子器件是非常重要的。本实施例采用16位电压输出模块(0V~10V)来控制施加在压电片上的电压,即压电陶瓷片的横向变形。该电压通过线性放大器放大并施加到压电片上,以产生横向拉伸形变。压电陶瓷的形变与施加的驱动电压成线性比例,在最大驱动电压(Vmax)下,最大横向变形是压电片总长度(L)的0.1%。在施加的驱动电压(Vd)下,两个黑胶固定金线点(d)之间的线的伸长率(Δd)可以估计为:The ability to control the precision of gap size modulation is very important for building molecular devices. In this embodiment, a 16-bit voltage output module (0V-10V) is used to control the voltage applied to the piezoelectric sheet, that is, the lateral deformation of the piezoelectric ceramic sheet. This voltage is amplified by a linear amplifier and applied to the piezoelectric sheet to produce transverse tensile deformation. The deformation of the piezoelectric ceramic is linearly proportional to the applied driving voltage. Under the maximum driving voltage (V max ), the maximum lateral deformation is 0.1% of the total length (L) of the piezoelectric sheet. Under the applied driving voltage ( Vd ), the elongation (Δd) of the wire between two vinyl-fixed gold wire points (d) can be estimated as:

Δd=(L×0.1%)×(Vd/Vmax)×(d/L)=Vd/Vmax×0.1%×d (1)Δd=(L×0.1%)×(V d /V max )×(d/L)=V d /V max ×0.1%×d (1)

那么所施加的驱动电压(Vmin)的最小步长是由输出模块确定的1mV,因此线的最小/最大伸长可以计算为:Then the minimum step size of the applied drive voltage (V min ) is 1mV determined by the output module, so the minimum/maximum elongation of the wire can be calculated as:

Δdmin=Vmin/Vmax×0.1%×d=1mV/10V×0.1%×d=10-7×d (2)Δd min = V min /V max × 0.1% × d = 1mV/10V × 0.1% × d = 10 -7 × d (2)

Δdmax=Vmax/Vmax×0.1%×d=10-3×d (3)Δd max = V max /V max × 0.1% × d = 10 -3 × d (3)

附图2中可知:不同驱动电压下不同间距的金电极对的扫描电镜图像。It can be seen in accompanying drawing 2: scanning electron microscope images of gold electrode pairs with different distances under different driving voltages.

其中,a-c图为在粗略调节模式下,当施加1V、4V和10V的驱动电压时,电极分离的SEM图像,分别获得约0.4μm,2.4μm和5.2μm的间隙尺寸。比例尺:2μm。箭头表示间隙尺寸增加的方向。此时,固定金线的两黑胶之间的初始距离d大约为8毫米。Among them, a-c are the SEM images of the electrode separation when the driving voltages of 1V, 4V and 10V are applied in the coarse adjustment mode, and the gap sizes of about 0.4μm, 2.4μm and 5.2μm are obtained, respectively. Scale bar: 2 μm. Arrows indicate the direction of increasing gap size. At this time, the initial distance d between the two black glues fixing the gold wire is about 8mm.

d-f图为在精细调控模式下,当施加1V、4V和10V的驱动电压时,分别获得约82nm、124nm和232nm的间隙尺寸。比例尺:200nm。Figures d-f show that in fine regulation mode, when driving voltages of 1V, 4V and 10V are applied, gap sizes of about 82nm, 124nm and 232nm are obtained, respectively. Scale bar: 200 nm.

基于公式(2),电极分离的最小步长(Δdmin)线性地依赖于两个固定点之间的初始距离(d),这为间隙尺寸控制提供了可调节的精度。Based on Equation (2), the minimum step size of electrode separation (Δd min ) is linearly dependent on the initial distance (d) between two fixed points, which provides adjustable precision for gap size control.

在精细模式下,金线由两滴距离较近的黑胶(例如,d≈1mm)固定,依据公式(2)可以得到Δdmin=10-7×d≈0.1nm,也就是说可以亚纳米精度精确调节间隙大小。在粗调模式下,金线由相距较远的两滴黑胶(例如,d≈10mm)固定,根据公式(3),可以得到Δdmax=10-3×d≈10μm,也就是说,我们可以获得微米级别间隙变化范围。In the fine mode, the gold wire is fixed by two drops of black glue (for example, d≈1mm) that are close to each other. According to the formula (2), Δd min =10 -7 ×d≈0.1nm can be obtained, which means that the gap size can be precisely adjusted with sub-nanometer precision. In the coarse adjustment mode, the gold wire is fixed by two drops of black glue far apart (for example, d≈10mm). According to the formula (3), Δd max =10 -3 ×d≈10μm can be obtained, that is to say, we can obtain the micron-level gap variation range.

实施例3Example 3

本实施例是在实施例1-2的基础上制作电极阵列This embodiment is to make electrode array on the basis of embodiment 1-2

实施例1-2证明了在压电陶瓷上固定金属电极可以得到从亚纳米到微米的间隙尺寸,并具有可调的控制精度。Examples 1-2 prove that fixing metal electrodes on piezoelectric ceramics can obtain gap sizes from sub-nanometer to micron, and have adjustable control precision.

然而,产生数千个这样的电极阵列仍然是一个巨大的挑战,这对于实现高度集成的功能器件是必不可少的。为了制作电极阵列,实施例3利用光刻技术在压电陶瓷片上制作了纳米级金属桥。随着施加在压电陶瓷片即基板上的电压(Vd)增加,固定在基板上的纳米桥将被拉长,直到最终断裂,如图3a所示。However, it remains a great challenge to generate thousands of such electrode arrays, which are essential to realize highly integrated functional devices. In order to make an electrode array, in Embodiment 3, a nanoscale metal bridge is made on a piezoelectric ceramic sheet by photolithography. As the voltage (V d ) applied to the piezoelectric ceramic sheet, ie, the substrate, increases, the nanobridge fixed on the substrate will be stretched until it finally breaks, as shown in Figure 3a.

为了制造样品,首先将聚(均苯四甲酸二酐-co-4,4’-氧化二苯胺)酰胺酸(PAA)溶液旋涂在压电陶瓷顶电极的上层,这可以将金纳米结构与压电陶瓷电绝缘,随后进行加热处理以固化绝缘层。接下来,采用标准光刻和反应离子蚀刻技术,在绝缘层上获得了具有对称凹槽(约80nm宽和约40nm厚)的悬浮纳米桥(d~2μm),如图3b所示。图3c-3e展示出了在不同驱动电压下凹槽位置的放大SEM图像。它表明,当没有施加驱动电压时,可以观察到绝缘层上未拉伸的纳米桥(图3c)。当向压电片施加5V的驱动电压时,观察到纳米桥断裂和尺寸约为25nm的间隙(图3d)。当驱动电压增加到10V时,间隙尺寸扩大到大约42nm。To fabricate the samples, a solution of poly(pyromellitic dianhydride-co-4,4’-diphenylamine oxide)amic acid (PAA) was first spin-coated on the upper layer of the piezoceramic top electrode, which can electrically insulate the gold nanostructures from the piezoceramic, followed by heat treatment to cure the insulating layer. Next, using standard photolithography and reactive ion etching techniques, suspended nanobridges (d ~ 2 μm) with symmetrical grooves (about 80 nm wide and about 40 nm thick) were obtained on the insulating layer, as shown in Figure 3b. Figures 3c–3e show enlarged SEM images of the groove positions under different driving voltages. It shows that when no driving voltage is applied, unstretched nanobridges on the insulating layer can be observed (Fig. 3c). When a driving voltage of 5 V was applied to the piezoelectric sheet, nanobridge breakage and gaps with a size of approximately 25 nm were observed (Fig. 3d). When the driving voltage is increased to 10V, the gap size expands to about 42nm.

附图3a基于电子束光刻的可调片上纳米间隙的工作原理。Figure 3a shows the working principle of the tunable on-chip nanogap based on e-beam lithography.

附图3b为样品的SEM图像,比例尺:2μm。Figure 3b is the SEM image of the sample, scale bar: 2 μm.

附图3c悬浮纳米桥位于衬底上层,没有驱动电压(Vb=0V),比例尺:200nm。Figure 3c shows the suspended nanobridge located on the upper layer of the substrate, without driving voltage (V b =0V), scale bar: 200nm.

附图3d纳米桥被拉伸,当驱动电压(Vb=5V)施加在下面的压电基板上时,观察到纳米间隙(~25nm),比例尺:200nm。Figure 3d shows that the nanobridge is stretched and a nanogap (~25nm) is observed when a driving voltage ( Vb = 5V) is applied to the underlying piezoelectric substrate, scale bar: 200nm.

附图3e当施加驱动电压(~10V)时,纳米间隙增加到~42nm。比例尺:200nm。Figure 3e The nanogap increases to ~42nm when a driving voltage (~10V) is applied. Scale bar: 200 nm.

对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下,在其它实施例中实现。因此,本发明将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。The above description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention will not be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (8)

1.一种基于压电片可控纳米间隙的单子分结制备方法,其特征在于,包括:压电片、驱动电极、绝缘层、带有预环切的金线;1. A preparation method based on a piezoelectric sheet controllable nano-gap, comprising: a piezoelectric sheet, a driving electrode, an insulating layer, and a gold wire with a pre-ring cut; 其中,所述压电片为基片/衬底;所述压电片的上下表面均设置有驱动电极;Wherein, the piezoelectric sheet is a substrate/substrate; the upper and lower surfaces of the piezoelectric sheet are provided with driving electrodes; 所述绝缘层位于所述驱动电极的上层;所述带有预环切的金线固定在所述绝缘层上;The insulating layer is located on the upper layer of the driving electrodes; the gold wires with pre-cutting are fixed on the insulating layer; 当驱动电压施加至所述驱动电极时,夹在所述驱动电极中间的所述压电片将发生横向/水平变形,固定在所述绝缘层上的所述金线被相应拉伸,精确控制纳米间隙大小;其中,纳米间隙是通过压电片基底发生横向/水平变形的机械拉伸使固定在其表面的金线断裂形成可控裂结;When a driving voltage is applied to the driving electrodes, the piezoelectric sheet sandwiched between the driving electrodes will be deformed laterally/horizontally, and the gold wires fixed on the insulating layer will be correspondingly stretched to accurately control the size of the nano-gap; wherein, the nano-gap is mechanically stretched by the lateral/horizontal deformation of the piezoelectric sheet substrate to break the gold wires fixed on the surface to form controllable splits; 且,所述带有预环切的金线的制备方法如下:And, the preparation method of the gold wire with pre-ring cutting is as follows: 1)在金线一的中间部分进行环切形成凹槽,将所述金线一切割成相对对称的沙漏形;1) Carry out circumcision in the middle part of the gold wire 1 to form a groove, and cut the gold wire 1 into a relatively symmetrical hourglass shape; 2)将经过步骤1)处理的所述金线一固定在涂有绝缘胶的压电基片上;2) fixing the gold wires treated in step 1) on the piezoelectric substrate coated with insulating glue; 3)将金线二置于压电基片的上层,且所述金线二的一端置于接近所述金线一的凹槽中心;3) placing the second gold wire on the upper layer of the piezoelectric substrate, and placing one end of the second gold wire at the center of the groove close to the first gold wire; 4)将电解质滴在所述凹槽附近的所述压电基片上,以浸没所述金线二的末端位置和金线一的凹槽部分;4) dropping an electrolyte on the piezoelectric substrate near the groove to immerse the end position of the second gold wire and the groove portion of the first gold wire; 5)在所述金线二上施加低电位,使其作为电化学反应的阴极,在所述金线一上施加高电位,使其作为阳极,通过电化学反应进行蚀刻;随着阳极的逐渐腐蚀,所述凹槽的直径减小。5) Applying a low potential to the second gold wire to make it a cathode for electrochemical reaction, and applying a high potential to the first gold wire to make it an anode for etching by electrochemical reaction; as the anode corrodes gradually, the diameter of the groove decreases. 2.根据权利要求1所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,步骤1)所述环切后凹槽直径为10-15μm;且经过步骤5)所述凹槽直径减小到≤1μm;2. The method for preparing a monomolecular junction based on a controllable nano-gap of a piezoelectric sheet according to claim 1, wherein the diameter of the groove after the circular cutting in step 1) is 10-15 μm; and after step 5), the diameter of the groove is reduced to ≤1 μm; 和/或,步骤2)所述压电基片为压电陶瓷基片;所述金线一通过环氧树脂固定在所述压电基片上;And/or, step 2) the piezoelectric substrate is a piezoelectric ceramic substrate; the gold wires are fixed on the piezoelectric substrate by epoxy resin; 和/或,步骤4)所述电解质为0.01摩尔每毫升的氯金酸和氯化硼1:1的水溶液。And/or, the electrolyte in step 4) is a 1:1 aqueous solution of chloroauric acid and boron chloride at 0.01 mole per milliliter. 3.根据权利要求1所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,所述压电片为纵向极化的矩形压电陶瓷片。3 . The method for preparing monomolecular junctions based on piezoelectric sheet controllable nano-gap according to claim 1 , wherein the piezoelectric sheet is a longitudinally polarized rectangular piezoelectric ceramic sheet. 4 . 4.根据权利要求1所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,所述驱动电极为银膜,所述银膜分别镀在所述压电片的上下表面。4. The method for preparing a monomolecular junction based on a controllable nanogap of a piezoelectric sheet according to claim 1, wherein the driving electrode is a silver film, and the silver film is respectively plated on the upper and lower surfaces of the piezoelectric sheet. 5.根据权利要求1所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,所述金线是通过粘结的方式固定在所述绝缘层上。5 . The method for preparing a monomolecular junction based on a controllable nano-gap of a piezoelectric sheet according to claim 1 , wherein the gold wire is fixed on the insulating layer by bonding. 5 . 6.根据权利要求1所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,所述金线的拉伸断裂过程中通过电流信号分析仪测量通过所述金线的电流进行监控。6 . The method for preparing a monomolecular junction based on a controllable nano-gap of a piezoelectric sheet according to claim 1 , wherein the gold wire is monitored by measuring the current passing through the gold wire during the tensile fracture process by a current signal analyzer. 7 . 7.根据权利要求6所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,当驱动电压增加时,所述金线的凹槽部分将受到张力,凹槽的横截面减小,直至断裂,形成纳米间隙。7. The method for preparing monomolecular junctions based on piezoelectric sheet controllable nanogap according to claim 6, characterized in that, when the driving voltage increases, the groove part of the gold wire will be subjected to tension, and the cross section of the groove will decrease until it breaks to form a nanogap. 8.根据权利要求7所述的基于压电片可控纳米间隙的单分子结制备方法,其特征在于,所述金线凹槽部分的最小直径为初始直径为1%,且悬空部分长度为初始直径的两倍,纳米桥的总拉伸长度为悬空部分长度的0.1%,其最大应变力产生在凹槽的最细部分。8. The single molecular junction preparation method based on the controllable nanogap of the piezoelectric sheet according to claim 7, wherein the minimum diameter of the groove part of the gold wire is 1% of the initial diameter, and the length of the suspended part is twice the initial diameter, the total stretching length of the nanobridge is 0.1% of the length of the suspended part, and the maximum strain force is generated in the thinnest part of the groove.
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