CN115594415A - Film structure for building single-silver Low-E glass and manufacturing process thereof - Google Patents

Film structure for building single-silver Low-E glass and manufacturing process thereof Download PDF

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Publication number
CN115594415A
CN115594415A CN202211172477.9A CN202211172477A CN115594415A CN 115594415 A CN115594415 A CN 115594415A CN 202211172477 A CN202211172477 A CN 202211172477A CN 115594415 A CN115594415 A CN 115594415A
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film layer
layer
glass
film
sin
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文继志
高畅
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Xiaorui Vacuum Equipment Jiaxing Co ltd
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Xiaorui Vacuum Equipment Jiaxing Co ltd
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Priority to CN202211172477.9A priority Critical patent/CN115594415A/en
Publication of CN115594415A publication Critical patent/CN115594415A/en
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639Multilayers containing at least two functional metal layers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366Low-emissivity or solar control coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • C03C2218/156Deposition methods from the vapour phase by sputtering by magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to a film structure for building single-silver Low-E glass and a manufacturing process thereof. The conventional LowE film is easily damaged in subsequent processing without using ZrO as an outermost protective layer, resulting in irreparable damage to the film appearance and rejection. When ZrO is used as the outermost layer for protection, the cost is higher. The glass substrate comprises a glass substrate layer, and is characterized in that an SiN film layer, an NiCr film layer, an Ag film layer, an NiCr film layer, an SiN film layer and an SiNxCy film layer are sequentially arranged outside the glass substrate layer. The invention adopts SiNxCy with high hardness and lower friction coefficient to replace ZrO, thereby ensuring that the Low-E glass has a protective film layer with better performance. The hardware cost required to be increased in the preparation process is only one linear ion source, the initial investment is realized, the value is not more than 2 ZrO targets, the consumable material is CH4 gas, and the practical cost is low.

Description

Film structure for building single-silver Low-E glass and manufacturing process thereof
Technical Field
The invention belongs to a film structure for building single-silver Low-E glass and a manufacturing process thereof.
Background
At present, the building LowE market in China is mature day by day, and the traditional LowE film layer formula is effectively applied to industrial production. However, the conventional LowE film, if it is not used with ZrO as the outermost protective layer, is easily damaged in the subsequent processing, resulting in irreparable damage to the film appearance. The high cost of ZrO, when used as the outermost protection, results in a further compression of the space for cost reduction of the manufacturer in the ever-increasing market environment. Therefore, obtaining a protective film layer with effective fastening and low cost is a priority of LowE manufacturers.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a film structure for building single-silver Low-E glass and a manufacturing process thereof, which can obviously reduce the cost and have stronger performance parameter indexes.
Therefore, the invention adopts the following technical scheme: the utility model provides a rete structure for building single silver Low-E glass, includes the glass stratum basale, its characterized in that, the outside of glass stratum basale sets gradually SiN rete, niCr rete, ag rete, niCr rete, siN rete and SiNxCy rete.
Preferably, the glass substrate layer is 6mm float glass, the thickness of the Ag film layer is 9-11nm, and the thickness of the SiNxCy film layer is 9-11nm.
Preferably, the thickness of the Ag film layer and the SiNxCy film layer are both 10nm.
Preferably, the thickness of the NiCr film layer is 6nm.
Preferably, the thickness of the SiN film layer in the inner layer is 30nm, and the thickness of the SiN film layer in the outer layer is 50nm.
The invention also discloses a film layer manufacturing process for the building single-silver Low-E glass, wherein the glass substrate layer is float glass cleaned by adopting ultrapure water, the SiN layer is coated by adopting medium-frequency magnetron sputtering, the NiCr film layer and the Ag film layer are coated by adopting direct-current pulse sputtering, and the SiNxCy film layer is coated by adopting ion source assisted medium-frequency magnetron sputtering.
Preferably, the ion source power is 5kw, the process gas is Ar: N in the process of manufacturing the SiNxCy film layer 2 :CH 4 300, process gas pressure of 1 × 10 -2 mbar。
Preferably, the process conditions of the inner SiN film layer are Ar: n2=500:900 at a process pressure of 5 × 10 -3 mbar。
Preferably, the process conditions of the NiCr film layer are Ar =1000sccm, and the process gas pressure is 5 × 10 -3 mbar。
Preferably, the process conditions of the Ag film layer are Ar =1000sccm, and the process gas pressure is 5 × 10 -3 mbar。
The invention adopts SiNxCy with high hardness and a Low friction coefficient to replace ZrO, so that the Low-E glass has a protective film with good performance. The hardware cost required to be increased in the preparation process is only one linear ion source, the initial investment is realized, the value is not more than 2 ZrO targets, the consumable material is CH4 gas, and the practical cost is low.
Detailed Description
The present invention is described in further detail below in conjunction with the following description.
The invention discloses a film structure for building single-silver Low-E glass, which comprises a glass substrate layer and is characterized in that an SiN film layer, an NiCr film layer, an Ag film layer, an NiCr film layer, an SiN film layer and an SiNxCy film layer are sequentially arranged outside the glass substrate layer.
The glass substrate layer is 6mm float glass, and the thickness of the Ag film layer and the thickness of the SiNxCy film layer are both 10nm.
The thickness of the NiCr film layer is 6nm. The thickness of the SiN film layer on the inner layer is 30nm, and the thickness of the SiN film layer on the outer layer is 50nm. The NiCr layer can be used to protect Ag from corrosion from the outside.
The materials and thickness parameters of the above film layers are shown in table 1:
film layer Material Thickness of
7 SiN x C y 10nm
6 SiN 50nm
5 NiCr 6nm
4 Ag Ag10nm
3 NiCr 6nm
2 SiN 30nm
1 Float glass 6mm
TABLE 1
Therefore, the invention also discloses a film layer manufacturing process for the building single-silver Low-E glass, wherein a glass substrate layer is float glass cleaned by ultra-pure water, siN is coated by adopting intermediate-frequency magnetron sputtering, niCr and Ag are coated by adopting direct-current pulse sputtering, and SiNxCy is coated by adopting ion source assisted intermediate-frequency magnetron sputtering.
Specifically, the method comprises the following steps:
1. the glass substrate is a substrate of a coated film made of float glass cleaned by ultrapure water.
2. SiN with the thickness of 30nm is plated through medium-frequency magnetron sputtering to serve as a substrate of the film layer, and the process conditions are that Ar: n2=500:900 at a process pressure of 5 × 10 -3 mbar。
3. Plating NiCr of 6nm by direct current pulse sputtering as a protective layer for absorbing and Ag on the film layer to prevent residual water molecules from floating glass surface from penetrating and corroding Ag, wherein the process conditions are Ar =1000, and the process pressure is 5 ×10 -3 mbar。
4. Plating Ag by direct current pulse sputtering to be used as a functional layer of LowE glass, wherein the process conditions are Ar =1000sccm, and the process air pressure is 5 × 10 -3 mbar。
5. Plating a 6nm NiCr layer by direct current pulse sputtering for protecting Ag from external corrosion, wherein the process condition is Ar =1000sccm, and the process gas pressure is 5 × 10 -3 mbar。
6. And plating SiN with the thickness of 50nm as a dielectric layer through medium-frequency magnetron sputtering.
7. Plating of 10nm SiN by ion source assisted medium frequency magnetron sputtering x C y A film layer, wherein the power of an ion source is 5kw, and the process gas is Ar: N 2 :CH 4 300, process gas pressure of 1 × 10 -2 mbar。
The invention adopts SiNxCy with high hardness and lower friction coefficient to replace ZrO, thereby ensuring that the Low-E glass has a protective film layer with better performance. The hardware cost required to be increased in the preparation process is only one linear ion source, the initial investment is realized, the value is not more than 2 ZrO targets, the consumable material is CH4 gas, and the practical cost is low.
The foregoing shows and describes the general principles and broad features of the present invention and advantages thereof. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.

Claims (10)

1. The utility model provides a rete structure for building single silver Low-E glass, includes the glass stratum basale, its characterized in that, the outside of glass stratum basale sets gradually SiN rete, niCr rete, ag rete, niCr rete, siN rete and SiNxCy rete.
2. The film structure of claim 1, wherein the glass substrate layer is 6mm float glass, the thickness of the Ag film layer is 9-11nm, and the thickness of the SiNxCy film layer is 9-11nm.
3. The film structure for architectural single silver Low-E glass as recited in claim 2, wherein the Ag film and the SiNxCy film are both 10nm thick.
4. The film structure for building single silver Low-E glass according to claim 3, wherein the thickness of the NiCr film is 6nm.
5. The film structure for architectural single silver Low-E glass according to any one of claims 1 to 4, wherein the thickness of the SiN film layer on the inner layer is 30nm, and the thickness of the SiN film layer on the outer layer is 50nm.
6. A film layer manufacturing process for building single-silver Low-E glass according to any one of claims 1 to 5, wherein the glass substrate layer is float glass cleaned by ultrapure water, the SiN layer is coated by medium-frequency magnetron sputtering, the NiCr film layer and the Ag film layer are coated by direct-current pulse sputtering, and the SiNxCy film layer is coated by medium-frequency magnetron sputtering assisted by an ion source.
7. The process of claim 6, wherein said SiNxCy film layer is made with an ion source power of 5kw and Ar: N as process gas 2 :CH 4 300, process gas pressure of 1 × 10 -2 mbar。
8. The process according to claim 6, wherein the conditions of the SiN film layer as the inner layer are Ar: n2=500:900 at a process pressure of 5 × 10 -3 mbar。
9. The process of claim 6, wherein said NiCr film layer is processed under Ar =1000sccm and under a pressure of 5X 10 -3 mbar。
10. The process according to claim 5, wherein the process conditions of the Ag film layer are Ar =1000sccm, and the process gas pressure is 5X 10 -3 mbar。
CN202211172477.9A 2022-09-26 2022-09-26 Film structure for building single-silver Low-E glass and manufacturing process thereof Pending CN115594415A (en)

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CN202211172477.9A CN115594415A (en) 2022-09-26 2022-09-26 Film structure for building single-silver Low-E glass and manufacturing process thereof

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100055442A1 (en) * 2008-09-03 2010-03-04 International Business Machines Corporation METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES
CN204702661U (en) * 2015-06-12 2015-10-14 中山市格兰特实业有限公司 Single-silver LOW-E glass capable of being tempered
CN107586047A (en) * 2017-09-04 2018-01-16 咸宁南玻节能玻璃有限公司 A kind of skyblue double-silver low-emissivity coated glass and preparation method
CN108218253A (en) * 2018-01-11 2018-06-29 中建材光电装备(太仓)有限公司 A kind of high-permeability, tempered three silver medal Low-E glass and preparation method thereof
WO2022016283A1 (en) * 2020-07-22 2022-01-27 National Research Council Of Canada Coated substrates and methods for the preparation thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100055442A1 (en) * 2008-09-03 2010-03-04 International Business Machines Corporation METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES
CN204702661U (en) * 2015-06-12 2015-10-14 中山市格兰特实业有限公司 Single-silver LOW-E glass capable of being tempered
CN107586047A (en) * 2017-09-04 2018-01-16 咸宁南玻节能玻璃有限公司 A kind of skyblue double-silver low-emissivity coated glass and preparation method
CN108218253A (en) * 2018-01-11 2018-06-29 中建材光电装备(太仓)有限公司 A kind of high-permeability, tempered three silver medal Low-E glass and preparation method thereof
WO2022016283A1 (en) * 2020-07-22 2022-01-27 National Research Council Of Canada Coated substrates and methods for the preparation thereof

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