CN115486756B - Self-cleaning method of cleaning equipment, cleaning equipment and base station - Google Patents

Self-cleaning method of cleaning equipment, cleaning equipment and base station Download PDF

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Publication number
CN115486756B
CN115486756B CN202211105234.3A CN202211105234A CN115486756B CN 115486756 B CN115486756 B CN 115486756B CN 202211105234 A CN202211105234 A CN 202211105234A CN 115486756 B CN115486756 B CN 115486756B
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CN
China
Prior art keywords
cleaning
sewage
water
self
water level
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Active
Application number
CN202211105234.3A
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Chinese (zh)
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CN115486756A (en
Inventor
王远
吴培
闾浩
蒋洪彬
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Tineco Intelligent Technology Co Ltd
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Tineco Intelligent Technology Co Ltd
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Priority to CN202211105234.3A priority Critical patent/CN115486756B/en
Publication of CN115486756A publication Critical patent/CN115486756A/en
Priority to PCT/CN2023/117774 priority patent/WO2024051829A1/en
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Publication of CN115486756B publication Critical patent/CN115486756B/en
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Classifications

    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/29Floor-scrubbing machines characterised by means for taking-up dirty liquid
    • A47L11/30Floor-scrubbing machines characterised by means for taking-up dirty liquid by suction
    • A47L11/302Floor-scrubbing machines characterised by means for taking-up dirty liquid by suction having rotary tools
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4013Contaminants collecting devices, i.e. hoppers, tanks or the like
    • A47L11/4016Contaminants collecting devices, i.e. hoppers, tanks or the like specially adapted for collecting fluids
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4036Parts or details of the surface treating tools
    • A47L11/4041Roll shaped surface treating tools
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4091Storing or parking devices, arrangements therefor; Means allowing transport of the machine when it is not being used
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B40/00Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers

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  • Cleaning In General (AREA)

Abstract

The embodiment of the application provides a self-cleaning method of cleaning equipment, the cleaning equipment and a base station. In this application embodiment, to the clean problem of sewage bucket on the cleaning equipment, improve the structure and the function of basic station, under the cooperation of basic station and cleaning equipment, can realize the self-cleaning to the cleaning equipment complete machine, both include the self-cleaning to the cleaning subassembly on the cleaning equipment, also include the self-cleaning to the sewage bucket on the cleaning equipment, need not user intervention in the whole self-cleaning process, simplified the cleaning operation to the cleaning equipment, improve the cleaning efficiency of sewage bucket and complete machine.

Description

Self-cleaning method of cleaning equipment, cleaning equipment and base station
Technical Field
The application relates to the technical field of cleaning equipment, in particular to a self-cleaning method of cleaning equipment, the cleaning equipment and a base station.
Background
The traditional cleaning machine is provided with a clean water bucket and a sewage bucket, wherein the clean water bucket is used for storing clean liquid used for cleaning the ground, and the sewage bucket is used for collecting sewage after cleaning the ground. With the execution of the cleaning task, the liquid in the clean water bucket is continuously consumed, and the sewage in the sewage bucket is continuously increased.
When the liquid in the fresh water tank is exhausted, it is necessary for the user to manually detach the fresh water tank and then reinstall the fresh water tank to the body of the washing machine after adding enough clean liquid to the fresh water tank. Accordingly, when the sewage in the sewage tank is full or the cleaning task is finished, a user is required to manually detach the sewage tank, pour out the sewage in the sewage tank, clean the sewage tank, and then reinstall the sewage tank on the body of the cleaner, thereby preventing the odor.
The existing sewage bucket is complex in cleaning operation and low in cleaning efficiency; in addition, if the user fails to wash the sewage bucket in time, it may cause bad smell and experience.
Disclosure of Invention
Aspects of the application provide a self-cleaning method of cleaning equipment, the cleaning equipment and a base station, which are used for realizing self-cleaning of the whole machine of the cleaning equipment, simplifying cleaning operation and improving cleaning efficiency of a sewage bucket and the whole machine.
The embodiment of the application provides a self-cleaning method of cleaning equipment, which is applied to a self-cleaning system and comprises the following steps: the cleaning device at least comprises a sewage bucket and a ground brush; the method comprises the following steps: acquiring the current water level state of the sewage bucket under the condition that the cleaning equipment is in butt joint with the base station; determining a first target complete machine cleaning flow matched with the current water level state from target complete machine cleaning flows corresponding to different water level states; and performing complete machine self-cleaning on the cleaning equipment according to the first target complete machine cleaning process, wherein each target complete machine cleaning process comprises self-cleaning of the sewage tank and self-cleaning of the ground brush.
The embodiment of the application also provides a base station, which comprises: the cleaning device comprises a base station main body and a base for bearing cleaning equipment, wherein a controller and a memory are arranged on the base station main body, the memory is used for storing a computer program, and the controller is coupled with the memory and used for executing the computer program so as to execute the steps in the self-cleaning method of the cleaning equipment.
The embodiment of the application also provides a cleaning device, which comprises: the sewage treatment device comprises a handle, a machine body and a cleaning assembly, wherein the machine body is at least provided with a sewage bucket and a treatment system, and the cleaning assembly at least comprises a ground brush; the processor system is configured to: detecting a current water level state of the sewage bucket in a case that the cleaning device is docked with the base station; the current water level state of the sewage bucket is sent to the base station, so that the base station determines a first target complete machine cleaning flow which is matched with the current water level state from target complete machine cleaning flows corresponding to different water level states; and carrying out complete machine self-cleaning on the cleaning equipment according to the first target complete machine cleaning process by matching with the base station, wherein each target complete machine cleaning process comprises self-cleaning of the sewage tank and self-cleaning of the ground brush.
In this application embodiment, to the clean problem of sewage bucket on the cleaning equipment, improve the structure and the function of basic station, under the cooperation of basic station and cleaning equipment, can realize the self-cleaning to the cleaning equipment complete machine, both include the self-cleaning to the cleaning subassembly on the cleaning equipment, also include the self-cleaning to the sewage bucket on the cleaning equipment, need not user intervention in the whole self-cleaning process, simplified the cleaning operation to the cleaning equipment, improve the cleaning efficiency of sewage bucket and complete machine.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiments of the application and together with the description serve to explain the application and do not constitute an undue limitation to the application. In the drawings:
fig. 1a is a schematic structural diagram of a cleaning machine system, a cleaning machine and a base station according to an embodiment of the present application;
fig. 1b is a schematic diagram illustrating a state of docking a washer with a base station in a washer system according to an embodiment of the present disclosure;
fig. 2 is a schematic partial structure diagram of a cleaning machine according to an embodiment of the present application when the cleaning machine is docked with a base station;
FIG. 3a is a schematic flow chart of a self-cleaning method of a cleaning machine according to an embodiment of the present disclosure;
FIG. 3b is a schematic flow chart of another self-cleaning method of the cleaning machine according to the embodiment of the present application;
FIGS. 4 a-4 d are schematic flow diagrams illustrating a method of self-cleaning a cleaning machine according to several other embodiments of the present application;
FIGS. 4 e-4 f are schematic views of a partial structure and a liquid flow direction of a washer according to an embodiment of the present disclosure when the washer is docked with a base station;
FIG. 5 is a schematic flow chart of a self-cleaning method of a cleaning machine from the perspective of the cleaning machine according to an embodiment of the present application;
FIG. 6a is a schematic flow chart of a self-cleaning method of a cleaning machine according to an embodiment of the present disclosure;
fig. 6b is a schematic flow chart of another self-cleaning method of the cleaning machine from the perspective of the cleaning machine according to the embodiment of the present application.
Detailed Description
For the purposes, technical solutions and advantages of the present application, the technical solutions of the present application will be clearly and completely described below with reference to specific embodiments of the present application and corresponding drawings. It will be apparent that the described embodiments are only some, but not all, of the embodiments of the present application. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present disclosure, are within the scope of the present disclosure.
In response to the technical problem of inconvenient cleaning of the sewage bucket faced by the existing cleaning device, in some embodiments of the present application, there is provided a cleaning device system, as shown in fig. 1a, including: cleaning device 10 and base station 20. Wherein the cleaning device 10 and the base station 20 can communicate with each other and perform information interaction. The communication manner between the cleaning device 10 and the base station 20 is not limited, for example, an infrared transceiver may be disposed on the cleaning device 10 and the base station 20, and communication is performed between the two via infrared signals; for another example, bluetooth modules are provided on both the cleaning apparatus 10 and the base station 20, and communication between the two may be performed through bluetooth signals; for another example, the cleaning device 10 and the base station 20 are both additionally provided with a WiFi module, and the two modules communicate through WiFi signals; for another example, the cleaning device 10 and the base station 20 may each be additionally provided with a mobile communication module, and the two may communicate with each other through a mobile communication network. Of course, the cleaning device 10 may also be communicatively connected to the base station 20 by wire. In this embodiment, the cleaning device is a hand-held suction cleaner, and in other embodiments, the cleaning device may be a cleaning device for cleaning various surfaces to be cleaned, such as a floor sweeping robot, a carpet cleaner, a cloth cleaner, etc.
In this embodiment, the base station 20 may provide some basic services for the cleaning device 10, for example, the base station 20 may provide docking services for the cleaning device 10, and the cleaning device 10 may dock with the base station 20 when it is not necessary to perform a floor cleaning task; for another example, the base station 20 may also provide charging service for the cleaning device 10, and charging and energy storage may be performed simultaneously when the cleaning device 10 is parked at the base station 20, and of course, charging and energy storage may also be performed by returning to the base station 20 when the electric quantity of the cleaning device 10 is insufficient.
In addition to the basic service described above, in the embodiment of the present application, the functions of the base station 20 are further extended, and the base station 20 may cooperate with the cleaning device 10 to provide a complete cleaning service for the cleaning device 10. In order to achieve the purpose of providing the cleaning device 10 with the cleaning service of the whole machine, a plurality of hardware components, such as a water storage tank, a sewage draining tank, various pipelines communicated with the water storage tank, the sewage draining tank and the like, are additionally arranged on the base station 20; at the same time, the control logic of the base station 20 is improved, and the control logic related to providing the cleaning equipment 10 with the complete machine cleaning service is added to the base station 20, and is implemented in a software program mode. The base station 20 can provide the cleaning device 10 with the overall cleaning service by running the software programs and cooperating with hardware components added to provide the overall cleaning service for the cleaning device 10. The sewage draining groove refers to parts on the base station which are needed for assisting in draining sewage from the sewage bucket on the cleaning equipment, and the structure of the sewage draining groove is not limited, for example, the sewage draining groove can be a sewage draining structure containing a cavity or a sewage draining pipeline without the cavity. For the blowdown structure containing the cavity, the cavity has a certain volume, can accommodate a certain sewage amount, is convenient for carry out sewage discharge with a larger capacity, and can be flexibly arranged according to product requirements. In addition, as can be appreciated by those skilled in the art, the drain tank can flexibly select a drain structure including the cavity or a drain pipe not including the cavity according to application requirements or different scenes.
In the embodiment of the application, the base station 20 provides the cleaning device 10 with the complete machine cleaning service, which is to automatically perform the cleaning process on the cleaning device 10, and the cleaning operation of the cleaning device can be simplified without user intervention in the process, thereby improving the cleaning efficiency. The overall cleaning service provided for the cleaning device 10 mainly comprises two parts, namely self-cleaning of cleaning components on the cleaning device 10 and self-cleaning of a sewage tank on the cleaning device 10. The self-cleaning of the cleaning component mainly comprises the cleaning process of cleaning and drying the cleaning component, so that the self-cleaning task of the cleaning component of the cleaning device 10 is completed; the self-cleaning of the sewage bucket mainly refers to a cleaning process of discharging and cleaning the sewage bucket, namely, discharging sewage in the sewage bucket and flushing the sewage bucket clean, so that the self-cleaning task of the sewage bucket on the cleaning device 10 is automatically completed. Further, in the process that the base station 20 provides the cleaning apparatus 10 with the complete machine cleaning service, cleaning can be performed with respect to the suction passage between the sewage bucket and the cleaning assembly.
Based on the complete machine cleaning service that the base station 20 provided for the cleaning equipment 10, after the cleaning equipment 10 carries out the floor cleaning task and finishes, the user only needs to place the cleaning equipment 10 on the base station 20, and the base station 20 and the cleaning equipment 10 mutually cooperate and can accomplish the self-cleaning of cleaning assembly and the self-cleaning of sewage bucket automatically, after carrying out the self-cleaning action of cleaning assembly, can reach the cleaning purpose of cleaning assembly, after carrying out the self-cleaning action of sewage bucket, can reach the cleaning purpose of sewage bucket to the self-cleaning action of cleaning assembly and sewage bucket that this embodiment provided can also reach better cleaning effect. The user does not need to disassemble the sewage bucket for manual cleaning, the purpose of cleaning the sewage bucket can be achieved, and even self-cleaning of the whole cleaning equipment can be realized, so that the use experience of the user is greatly improved.
It should be noted that, in the whole machine cleaning service, the self-cleaning of the cleaning assembly and the self-cleaning of the sewage bucket may be related to each other or may be independent from each other. For example, the base station 20 may provide self-cleaning services of the sewer piping for the cleaning device 10 alone, or may provide self-cleaning services of the cleaning assembly for the cleaning device 10 alone. Of course, considering that the self-cleaning of the cleaning assembly depends on the sewage bucket, the sewage bucket is required to store sewage generated by the cleaning assembly in the self-cleaning process, so in a preferred embodiment, the two self-cleaning processes can be fused together to be completed in the same process, thereby realizing self-cleaning of the whole machine.
Further, the base station 20 can provide water injection service for the clean water bucket on the cleaning device 10 in addition to the overall cleaning service for the cleaning device 10. Therefore, when the clean water barrel needs to be supplemented with clean liquid, a user can automatically supplement the clean water barrel with the clean liquid without detaching the clean water barrel from the machine body. Here, the clean liquid in the clean water tank may be clean water or various cleaning liquids to which a cleaning agent is added, and is not limited thereto.
Further, the base station 20 can provide the cleaning service for the cleaning device 10 alone, and can also provide the water injection service for the clean water bucket of the cleaning device 10 alone; the cleaning device 10 may be provided with the complete machine cleaning service and the water filling service simultaneously in the same process, for example, the water filling service may be provided for the clean water tank of the cleaning device 10 together in the process of providing the complete machine cleaning service for the cleaning device 10.
It should be noted that, in the process that the base station 20 provides the cleaning device 10 with the complete cleaning service and/or the water filling service, the cleaning device 10 needs to communicate with the base station 20 to synchronize related information or status. The process of performing the self-cleaning of the whole machine by the cooperation of the cleaning device 10 and the base station 20 can be referred to in the following embodiments, and before describing the self-cleaning process of the whole machine, the structures of the cleaning device 10 and the base station 20 according to the embodiments of the present application will be briefly described with reference to fig. 1a and fig. 2.
The following provides a brief description of the cleaning apparatus 10 according to embodiments of the present application. As shown in fig. 1a, the cleaning device 10 comprises at least: a handle assembly 11, a body 12, a cleaning assembly 13, a treatment system (not shown), a fresh water bucket 16 and a waste water bucket 17 disposed on the body 12.
In this embodiment, the handle assembly 11 may be provided at the upper end of the body 12, or may be provided at the side (back, left or right) of the body 12. Alternatively, if the handle assembly 11 is disposed at the upper end of the body 12, the axial direction (the direction in which the center of gravity is located) thereof is parallel to the axial direction of the body 12.
Alternatively, the handle assembly 11 may include: a handle for the user's hand to grasp, and an extension bar connecting the handle to the body 12. Further, the length of the extension rod may be fixed or adjustable. Optionally, if the length of the extension rod is adjustable, the structure is a telescopic structure. Correspondingly, the user can flexibly adjust the length of the extension rod according to the self requirement.
In this embodiment, the processing system may be disposed within the fuselage or may be disposed on the surface of the fuselage, and the processing system is not illustrated in fig. 1 a. The processing system can be carried on a main board of the cleaning device, for example, the processing system can be a CPU, a controller or a GPU, and the processing system is a control system of the cleaning device and is mainly responsible for various control logics of the cleaning device and can control the use state and the working state of other components connected with the processing system. In the following embodiments, the cleaning apparatus 10 cooperates with the base station 20 to implement the self-cleaning process, and the operations performed by the cleaning apparatus 10 can be understood to be performed under the control of the processing system of the cleaning apparatus 10, and in the following embodiments, the cleaning apparatus 10 is described as an execution body, and those skilled in the art can understand that the execution body may also be the processing system of the cleaning apparatus 10.
In this embodiment, the cleaning assembly 13 includes a floor brush (or a roll brush), a water pump, and a floor brush motor; the floor brush is provided with a floor brush nozzle, the clean water barrel 16 is communicated with the floor brush nozzle through a water delivery pipeline, the water delivery pipeline comprises a hose connected between the clean water barrel and the floor brush nozzle, but the floor brush is not limited to, a water pump is arranged on the water delivery pipeline between the clean water barrel 16 and the floor brush nozzle. For ease of description and distinction, the water supply line between the water tub and the brush nozzle on the cleaning device is referred to as the first water supply line. When the floor cleaning task is executed, the floor brush motor drives the floor brush to rotate on one hand, floor cleaning is realized by means of friction force between the floor brush and the floor, and on the other hand, the water pump is driven to convey clean liquid in the clean water bucket 16 to the floor brush nozzle through the first water conveying pipeline, and the floor brush nozzle sprays the clean liquid to the floor and/or the floor brush to perform the floor cleaning task. After performing the cleaning task, the clean liquid becomes a dirty liquid, which is sucked by the suction nozzle on the cleaning assembly 13 and fed into the sewage bucket 17 through the suction channel. It should be noted that the object of the cleaning device to perform the cleaning task is not limited to the floor, but may be other cleaning objects such as a floor, a table top, etc. As shown in fig. 2, the suction channel 174, i.e., the air duct of the cleaning apparatus, may include a hose connected between the suction nozzle of the cleaning assembly 13 and the sewage bucket 17, but is not limited thereto.
In some alternative embodiments, a display may also be provided on the body 12, which is not illustrated in FIG. 1 a. The display is electrically connected with the processing system and is used for displaying the working state of the cleaning equipment, the electric quantity information and the working state information of at least one component on the cleaning equipment. The display may include at least one display area for displaying operational status information of the different components. Optionally, the operating status information of the at least one component includes at least one of: (1) liquid level information of the liquid storage device; (2) cleaning degree information of the cleaning object by the cleaning component; (3) power information of the power supply unit; (4) self-cleaning information of the cleaning device; (5) main motor power information; (6) cleaning the locked rotor information of the component; (7) operational status information of the communication component; (8) self-cleaning stage information. The liquid storage device can be a clean water bucket of the cleaning equipment or a sewage bucket of the cleaning equipment.
In the embodiments of the present application, the specific shape of the display is not limited. Alternatively, the display may be in a regular shape such as a circle, square, oval, trapezoid, or polygon, or any irregular shape, which is not illustrated herein.
Alternatively, the display may be fixedly disposed on the surface of the body 12 or telescopically disposed on the body 12. For example, the display may be provided on the top of the body, or may be provided on the front, left, or right of the body. Alternatively, if the display is disposed on top of the body 12, the plane of the display may be perpendicular or at an angle to the axis of the body 12. The main body 12 includes a main motor and a liquid storage device (e.g., a fresh water tank and a sewage tank), and optionally, a display is provided above the liquid storage device, i.e., the display is provided above the fresh water tank or the sewage tank, preferably, above the fresh water tank. Further, to meet the viewing angle of the user, a display may be provided in front of the handle assembly 11.
In the present embodiment, in order to realize self-cleaning of the sewage bucket 17, a drain 171 (as shown in fig. 1 a) is added to the bottom of the sewage bucket 17; accordingly, in order to automatically fill the fresh water tub 16, a water filling port (not shown) is additionally provided at the bottom of the main body 12 adjacent to the drain 171. The water filling port is communicated with a liquid outlet of the clean water barrel 16 through a liquid pipeline and is used for supplementing cleaning liquid for the clean water barrel 16 through the liquid outlet, and when the cleaning equipment cleans a surface to be cleaned, water in the clean water barrel 16 is discharged to the water outlet pipeline through the liquid outlet and is conveyed to the floor brush nozzle. Wherein, drain, water injection mouth need use with the hardware component cooperation that corresponds on the basic station. The positions of the drain and the water inlet are not limited, and may be set at positions convenient for use with corresponding components on the base station 20.
The following provides a brief description of the base station 20 according to the embodiment of the present application. As shown in fig. 1a, the base station 20 includes a base station main body 21 and a base 22 for supporting the cleaning apparatus 10. The base station main body 21 is provided with a controller and a memory, in which a computer program is stored, and the controller executes the computer program in the memory to realize various control logics for the base station 20, for example, the whole cleaning process for the cleaning apparatus 10 can be controlled and executed by the controller of the base station 20. The controller and memory are not illustrated in the various figures.
The base 22 may also be referred to as a base tray, and the base 22 is provided with a receiving groove 221 for receiving the cleaning assembly 13 (specifically, receiving the floor brush), and when the cleaning apparatus 10 is placed on the base 22, the floor brush in the cleaning assembly 13 is located in the receiving groove 221. In addition, the base 22 is further provided with a first charging portion 223, one end of the first charging portion 223 is used for docking with a second charging portion on the cleaning device 10, and the other end is connected to a power source end, which may be a charging power source or a mains power source in an environment where the base station 20 is located, which is not limited, so as to charge and store energy for the cleaning device 10 when the cleaning device 10 is parked at the base station 20. The first charging unit 223 may be a wireless charging interface, for implementing wireless charging. Further, other components, such as fastening members for fastening or stabilizing the cleaning device 10, may be provided on the base 22, not shown.
Further, referring to fig. 1a and 2, the base station main body 21 is provided with at least a water storage tank 211, a water injection valve 212 communicating with the water storage tank 211, a drain tank 213, and an inlet portion 214 of the drain tank 213; further, as shown in fig. 4e and 4f, the water storage tank 211 is connected to the sewage tank 213 via a third water supply line 219, and the other end of the sewage tank 213 is connected to a sewer pipe which is connected to a sewer or other sewage passage.
As shown in fig. 1b, when the cleaning apparatus 10 is docked with the base station 20, the inlet portion 214 of the drain tank 213 is docked with the drain outlet 171 of the sewage bucket 17 of the cleaning apparatus 10 when the cleaning apparatus 10 is placed on the base 22, so that when the sewage bucket 17 is self-cleaned, sewage in the sewage bucket 17 flows to the inlet portion 214 through the drain outlet 171, flows into the drain tank 213 through the inlet portion 214, and is finally discharged into a sewer or other drain through the drain tank 213. Alternatively, the drain may be provided in a lower region of the sidewall of the wastewater tank, in addition to the bottom of the wastewater tank.
As shown in fig. 1b, when the cleaning apparatus 10 is docked with the base station 20, the water filling port on the clean water tub 16 of the cleaning apparatus 10 is docked with the water filling valve 212 on the base station 20, which water filling valve 212 communicates with the water storage tank 211 on the base station 20, when the cleaning apparatus 10 is placed on the base station 22. In this way, in the state that the water injection valve 212 is opened, clean liquid in the water storage tank 211 can enter the clean water barrel 16 through the water injection valve 212 and the water injection port, so that automatic water injection is realized; in a state where the water filling valve 212 is closed, the water filling into the fresh water tub 16 is stopped. Alternatively, the water filling port may be provided on a bottom bracket of the fresh water bucket or the sewage bucket, not limited thereto.
Further, as shown in fig. 1b, the base station main body 21 of the base station 20 is further provided with a display 218, and the display 218 is electrically connected with the controller of the base station, so as to display the working state of the base station and the working state information of each component on the base station, and further, may display the information such as the stage and the step of the self-cleaning of the whole cleaning device.
Similarly, in the present embodiment, the specific shape of the display 218 on the base station 20 is not limited. Alternatively, the display 218 may be in a regular shape such as a circle, square, oval, trapezoid, or polygon, or any irregular shape, which is not illustrated herein. Alternatively, the display 218 may be fixedly provided on the surface of the base station body 21 or may be telescopically provided on the base station body 21. For example, the display 218 may be provided on the top of the base station body 21, or may be provided on the front, left, or right of the base station body 21. Alternatively, if the display 218 is disposed on the top of the base station body 21, the plane of the display may be perpendicular or at an angle to the axis of the base station body 21. In fig. 1b, a display 218 is illustrated as being provided on the top of the base station main body 21.
Further alternatively, as shown in fig. 2, a flushing nozzle 222 is provided inside the accommodation groove 221, and the flushing nozzle 222 communicates with the water storage tank 211 through the second water supply line 215. The second water supply line 215 may be a water pipe or a hose connected between the water tank 211 and the shower nozzle 222, and is not limited thereto. When the cleaning apparatus 10 is placed on the base 22, the clean liquid in the water storage tank 211 is conveyed to the flushing nozzle 222 through the second water conveying pipeline 215, the flushing nozzle 222 sprays the clean liquid onto the ground brush in the accommodating groove 221, the main motor of the cleaning apparatus is started, the liquid is recovered into the sewage bucket 17, and water is injected into the sewage bucket 17. In other embodiments, the brush may be self-cleaning in this manner without the use of water in the bucket.
Further alternatively, as shown in fig. 2, a moving mechanism 216 capable of opening and closing the sewage bucket 17 is provided on the base station main body 21. The drain outlet of the sewage bucket 17 is provided with a cover plate 172, the movement mechanism 216 corresponds to the cover plate on the sewage bucket 17, and the movement mechanism 216 can open the cover plate through movement, so that the drain outlet of the sewage bucket 17 is communicated with the drain tank 213; the movement mechanism 216 is operated in the opposite direction to close the cover plate of the sewage bucket 17, and the latch 173 on the sewage bucket locks the cover plate 172 in the closed state of the cover plate 172 to close the sewage bucket 17.
Further alternatively, as shown in fig. 2, a flushing device 217 for flushing the wastewater tank 17 is further provided on the base station main body 21, the flushing device 217 being provided corresponding to the wastewater outlet 171 of the wastewater tank, and the flushing device 217 being repeatedly movable toward the wastewater tank and extending into the wastewater tank from the wastewater outlet 171 in a state in which the cover 172 of the wastewater tank is opened, thereby flushing the wastewater tank.
The structures of the cleaning apparatus 10 and the base station 20 described above are only exemplary, and these structures are some of the structures related to the overall cleaning service, but it is not meant that the cleaning apparatus 10 and the base station 20 of the present embodiment include only the structures described above, nor that the cleaning apparatus 10 and the base station 20 must include all the structures described above.
Based on the above-described related structures of the cleaning apparatus 10 and the base station 20, the following embodiments of the present application provide several kinds of logic of methods for performing overall cleaning on the cleaning apparatus 10 by the cleaning apparatus 10 and the base station 20 in cooperation with each other.
In some alternative embodiments, the cleaning device 10 and the base station 20 cooperate to perform overall self-cleaning on the cleaning device 10 according to a uniform overall cleaning procedure, as shown in fig. 3a, where the overall cleaning procedure includes:
step 31, under the condition that the cleaning equipment is in butt joint with the base station, the base station carries out first self-cleaning on the sewage bucket;
step 32, after the sewage bucket is self-cleaned for the first time, the cleaning equipment self-cleans the floor brush;
and 33, after the cleaning equipment finishes self-cleaning of the floor brush, the base station performs secondary self-cleaning on the sewage bucket.
Further, as shown in fig. 3b, after step 33, the method further includes:
and step 34, after the secondary self-cleaning of the sewage bucket is finished, the base station self-cleans a sewage draining tank used in the self-cleaning process.
In the embodiments shown in fig. 3a and 3b, the base station may also control the water storage tank to fill the water tub synchronously in all steps. If the cleaning device provides cleaning fluid from the clean water bucket of the cleaning device during self-cleaning of the floor brush in step 32, the base station controls the water storage tank to synchronously fill water into the clean water bucket in other steps than step 32. This patent is exemplified in step 32 by the fresh water bucket of the cleaning apparatus.
Further, the self-cleaning process of the sewage bucket is split into: three operations of sewage bucket water injection and sewage bucket emptying and sewage bucket flushing, wherein the sewage bucket water injection refers to a process of injecting water into the sewage bucket to enable the sewage bucket to be in a water full state; emptying the sewage bucket refers to a process of opening a sewage outlet of the sewage bucket to discharge sewage to a base station; the bilge tank flushing refers to a process of flushing the inside of the bilge tank until the flushing is finished after the bilge tank is emptied.
It should be noted that in the embodiments shown in fig. 3a and 3b, the first self-cleaning of the wastewater tank includes at least a step of emptying the wastewater tank, and the two steps of filling the wastewater tank and flushing the wastewater tank are optional steps; accordingly, the secondary cleaning of the sewage bucket at least comprises: the steps of emptying the bilge tank and flushing the bilge tank are optional steps for filling the bilge tank with water. Based on this, the process of performing the overall self-cleaning of the cleaning apparatus 10 according to the unified overall cleaning flow shown in fig. 3a and 3b includes the following embodiments:
in specific embodiment A1, as shown in fig. 4a, the whole self-cleaning process of the cleaning device includes the following steps:
(1) The sewage bucket is filled with water, optionally, the clear water bucket is filled with water synchronously;
(2) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(3) Flushing the sewage bucket, and optionally synchronously injecting water into the clean water bucket;
(4) The cleaning equipment automatically cleans the ground brush;
(5) The sewage bucket is filled with water, optionally, the clear water bucket is filled with water synchronously;
(6) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(7) Flushing the sewage bucket, and optionally synchronously injecting water into the clean water bucket;
further, the whole machine cleaning process of the embodiment shown in fig. 3b further includes the following steps after step (7):
(8) Flushing the sewage draining tank, and optionally, synchronously injecting water into the clean water barrel;
(9) And (5) starting drying and/or sterilizing.
In the step (1), if the water in the clean water barrel is full, the water injection is stopped in the steps (2) and (3), and if the water in the clean water barrel in the step (1) is not full, the water is continuously injected into the clean water barrel in the following steps. And (5) the same as the step (5). In the step (9), drying and/or degerming means drying and/or degerming the floor brush, and the degerming can be performed by adopting a UV lamp.
In specific embodiment A2, as shown in fig. 4b, the whole self-cleaning process of the cleaning device includes the following steps:
(1) The sewage bucket is filled with water, optionally, the clear water bucket is filled with water synchronously;
(2) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(3) Flushing the sewage bucket, and optionally synchronously injecting water into the clean water bucket;
(4) The cleaning equipment automatically cleans the ground brush;
(6) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(7) Flushing the sewage bucket, and optionally synchronously injecting water into the clean water bucket;
further, the whole machine cleaning process of the embodiment shown in fig. 3b further includes the following steps after step (7):
(8) Flushing the sewage draining tank, and optionally, synchronously injecting water into the clean water barrel;
(9) And (5) starting drying and/or sterilizing.
In specific embodiment A3, as shown in fig. 4c, the whole self-cleaning process of the cleaning device includes the following steps:
(1) The sewage bucket is filled with water, optionally, the clear water bucket is filled with water synchronously;
(2) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(4) The cleaning equipment automatically cleans the ground brush;
(5) The sewage bucket is filled with water, optionally, the clear water bucket is filled with water synchronously;
(6) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(7) Flushing the sewage bucket, and optionally synchronously injecting water into the clean water bucket;
further, the whole machine cleaning process of the embodiment shown in fig. 3b further includes the following steps after step (7):
(8) Flushing the sewage draining tank, and optionally, synchronously injecting water into the clean water barrel;
(9) And (5) starting drying and/or sterilizing.
In specific embodiment A4, as shown in fig. 4d, the whole self-cleaning process of the cleaning device includes the following steps:
(1) The sewage bucket is filled with water, optionally, the clear water bucket is filled with water synchronously;
(2) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(4) The cleaning equipment automatically cleans the ground brush;
(6) The sewage bucket is emptied, and optionally, the clear water bucket is synchronously filled with water;
(7) Flushing the sewage bucket, and optionally synchronously injecting water into the clean water bucket;
further, the whole machine cleaning process of the embodiment shown in fig. 3b further includes the following steps after step (7):
(8) Flushing the sewage draining tank, and optionally, synchronously injecting water into the clean water barrel;
(9) And (5) starting drying and/or sterilizing.
In the above embodiments A1 to A4, the step (1) is a step that needs to be performed when the wastewater tank is not in a water-full state, and if the wastewater tank is in a water-full state, the step (2) may be directly performed in each embodiment.
In each of the embodiments A1-A4 corresponding to the embodiment shown in fig. 3a, the step (4) may be taken as a division point, the step before the step (4) is a first self-cleaning process for the sewage tank, the step after the step (4) is a second self-cleaning process for the sewage tank, and the step (4) is a self-cleaning process for the floor brush itself. In the above embodiments A1-A4, there is a certain difference in the first self-cleaning process of the wastewater tank, namely, the wastewater tank emptying is an essential step, and the wastewater tank water injection and wastewater tank flushing are optional steps; accordingly, there is a distinction between the secondary self-cleaning process of the wastewater tank, i.e. the wastewater tank emptying and the wastewater tank flushing are essential steps, whereas the wastewater tank filling is an optional step.
The overall flow of the above embodiments A1 to A4 and detailed implementation procedures of the respective steps therein are described below.
Specifically, the user uses the cleaning device to perform a floor cleaning task, and during the floor cleaning task, if any of the following occurs, the user may interrupt the floor cleaning task and place the cleaning device on the base of the base station and complete docking with the base station.
Case 1: in the process of executing the floor cleaning task, the alarm information of insufficient electric quantity sent by the cleaning equipment is received, wherein the alarm information of insufficient electric quantity can be graphic information (such as battery map for highlighting) displayed through a display screen, can be a lamplight signal (such as continuously flashing red light signal) output through a display lamp, and can also be a voice signal output in a voice mode, such as 'insufficient electric quantity of a battery, please charge'.
Case 2: in the process of executing the floor cleaning task, when the sewage tank water full warning information on the cleaning equipment is received, the sewage tank water full warning information can be graphic information (such as a sewage tank map is highlighted or text information of 'sewage tank water full') displayed through a display screen, can be a light signal (such as a continuously flashing green light signal) output through a display lamp, and can also be a voice signal output in a voice mode, such as 'sewage tank water full, please clean'.
Case 3: in the process of executing the floor cleaning task, when the warning information of the insufficient water quantity of the clean water bucket on the cleaning equipment is received, the warning information of the insufficient water quantity of the clean water bucket can be graphic information (such as the graphic information of the clean water bucket, for example, the graphic information of the clean water bucket, or the text information of the too low water level of the clean water bucket) displayed through a display screen, can be a lamplight signal (such as a continuously flashing blue light signal) output through a display lamp, and can also be a voice signal output in a voice mode, such as the voice signal of the insufficient water quantity of the clean water bucket, requesting to add water.
When different alarm information is output through the display lamp, the color of the light signal is different, the light signal with the same color can also be used, but the flashing frequency of the light signal is different, and only the light signal expression mode capable of distinguishing different alarm information is suitable for the embodiment of the application.
In addition to the above, during the performance of the floor cleaning task, if other problems occur, it may also cause interruption of the floor cleaning task, requiring the cleaning device to be placed on the base of the base station and docked with the base station. In addition, after the floor cleaning task is completed, the user may also place the cleaning device on the base of the base station and complete the docking with the base station.
The base station and the cleaning device can detect whether the docking with the opposite end is completed or not. The detection manner of completing the docking is not limited in the embodiment of the present application. When the base station and the cleaning equipment are in butt joint, the cleaning component of the cleaning equipment is positioned in the accommodating groove on the base station base, the sewage outlet of the sewage bucket is in butt joint with the inlet part of the sewage groove, and the water filling port of the clean water bucket is in butt joint with the water filling valve of the water storage bucket; of course, the docking may be accomplished if there are other components to be docked.
Under the condition that the butt joint of the cleaning equipment and the base station is determined, the whole cleaning process of any one of the cleaning equipment in the specific embodiments A1-A4 can be entered, and the whole cleaning process of the finally used cleaning equipment is preset when the product leaves the factory or can be preset by a user.
In embodiments A1-A4, the base station first obtains the water level status of the wastewater tank upon determining that the cleaning device is docked therewith; if the sewage bucket is in a water full state, starting to execute the step (2) in each specific real-time mode; if the wastewater tank is not in a full state, the method starts from the step (1) in each specific embodiment. Here, the water full state may be flexibly defined according to application requirements, for example, a certain ratio (for example, 90%, 4/5) of the entire sewage tank capacity may be defined as a water full state, and a ratio lower than the certain ratio is a water not full state, and a ratio equal to the certain ratio or higher than the certain ratio is defined as a water full state; of course, the ratio may be 100%, i.e. 100% of the capacity of the wastewater tank is defined as a water full state, and all capacity states below 100% are in a water not full state; the range of 80-90% of the capacity of the wastewater tank may also be defined as a water full state, and for the case of more than 90% capacity, an overfill or overflow state, a capacity state of less than 80% as a water not full state.
In the above-described alternative embodiment, a set of electrode pads for detecting whether the sewage tank is in a water-full state is provided in the sewage tank 17 of the cleaning apparatus 10, the ends of the set of electrode pads representing the water-full state; when the sewage in the sewage tank 17 passes the end of the set of electrode pads, the set of electrode pads generates an electrical signal indicating a water full state due to conduction, the set of electrode pads is electrically connected with the processing system of the cleaning device 10, the electrical signal is sent to the processing system of the cleaning device 10, and the processing system can identify whether the sewage tank 17 is in the water full state according to whether the electrical signal indicating the water full state is received or not.
Wherein the cleaning apparatus 10 may detect whether the sewage bucket is in a full state in real time or at a fixed time and transmit indication information of whether the sewage bucket is in a full state to the base station 20, and the base station 20 determines whether the sewage bucket is in a full state according to the indication information of whether the sewage bucket is in a full state transmitted from the cleaning apparatus. Alternatively, the cleaning apparatus 10 detects a water full signal and transmits a state that the wastewater tank is full of water to the base station. Of course, the cleaning apparatus may also transmit the current water level information of the wastewater tank to the base station 20, and the base station 20 may automatically determine whether the wastewater tank is in a full state according to the current water level information of the wastewater tank. If the sewage bucket is in a water full state, directly carrying out sewage disposal treatment on the sewage bucket so as to empty sewage in the sewage bucket; if the sewage bucket is not in the water full state, the water injection treatment is carried out on the sewage bucket, and when the sewage bucket is in the water full state, the sewage discharge treatment is carried out on the sewage bucket so as to empty the sewage in the sewage bucket.
Among these, the water filling treatment of the wastewater tank includes, but is not limited to, the following two methods:
mode 1: the cleaning apparatus is injected into the sewage tank through the fresh water tank. That is, the clean water tank of the cleaning apparatus 10 conveys clean liquid to the cleaning assembly (such as a floor brush or a roll brush) or the accommodating tank through the first water conveying pipeline (the first water conveying pipeline refers to a pipeline between the clean water tank and the nozzles on the cleaning assembly), and then the main motor (also referred to as a suction motor) is started to suck the liquid (i.e. sewage) in the cleaning assembly or the accommodating tank back to the sewage tank through the suction channel until the sewage tank is full of water, so that the purpose of filling the sewage tank with water is achieved. In this embodiment, the receiving tank communicates with the fresh water bucket via a first water supply line and with the sewage bucket via a suction channel.
Alternatively, in mode 1, the cleaning apparatus 10 may actively fill the wastewater tank. Specifically, in case it is determined to dock with the base station, the cleaning apparatus starts to detect whether the sewage bucket is in a water-full state; if the cleaning equipment detects that the sewage bucket is not in the water full state, on the one hand, the indication information that the sewage bucket is not in the water full state can be sent to the base station, so that the base station can know that the sewage bucket is not in the water full state currently, on the other hand, the floor brush motor can be directly controlled to open the water pump to convey clean liquid in the clean water bucket into the cleaning assembly or the accommodating groove, and the main motor is started to suck the liquid in the cleaning assembly or the accommodating groove back into the sewage bucket until an electric signal which is generated by the electrode plate and represents the water full state of the sewage bucket due to the conduction of the water full state is received. When the sewage bucket is filled with water to a water full state, the cleaning equipment can control the clear water bucket to stop conveying liquid and control the main motor to stop sucking. Wherein, when the cleaning device detects the electric signal of the sewage bucket water full, the indication information of the sewage bucket in the water full state is sent to the base station, so that the base station can know that the sewage bucket is in the water full state. Or alternatively
Alternatively, in mode 1, the cleaning apparatus 10 fills the wastewater tank according to the control of the base station 20. In case of determining to dock with the base station, the cleaning device starts to detect whether the sewage tank is in a full state; if the cleaning equipment detects that the sewage bucket is not in the water full state, sending indication information of the sewage bucket not in the water full state to the base station so that the base station can know that the sewage bucket is not in the water full state currently; and the base station returns a water injection instruction to the cleaning equipment according to the indication information that the sewage bucket is not in the water full state, and indicates that the cleaning equipment injects water into the sewage bucket. For the cleaning equipment, according to the water injection instruction returned by the base station, the floor brush motor is controlled to open the water pump to convey clean liquid in the clean water bucket to the cleaning assembly or the accommodating groove, and the main motor is started to suck sewage in the cleaning assembly or the accommodating groove back to the sewage bucket until the cleaning equipment receives an electric signal representing that the sewage bucket is full of water, which is generated by the electrode plate due to full conduction of water. At this time, the cleaning apparatus may control the fresh water tub to stop transporting the liquid and the main motor to stop pumping.
Mode 2: a rinse head is provided in the receiving tank of the base station, the rinse head being in communication with the water storage tank and being capable of spraying liquid towards the receiving tank or the cleaning assembly in the receiving tank, optionally the rinse head being provided on the front wall of the receiving tank, but not limited thereto, for example being capable of being provided around the receiving tank, the number of rinse heads being one or more. Based on this, the base station may fill the wastewater tank through the water storage tank.
Specifically, in case it is determined to dock with the base station, the cleaning apparatus starts to detect whether the sewage bucket is in a water-full state; if the cleaning equipment detects that the sewage bucket is not in the water full state, sending indication information of the sewage bucket not in the water full state to the base station so that the base station can know that the sewage bucket is not in the water full state currently; the base station controls the water storage tank to be filled with water into the accommodating groove through a second water conveying pipeline according to the indication information that the sewage tank is not in a water full state, wherein the second water conveying pipeline comprises a pipeline between the water storage tank and the flushing nozzle, specifically, the water storage tank conveys clean liquid to the flushing nozzle, the flushing nozzle sprays the clean liquid into the cleaning assembly or the accommodating groove, and a suction instruction is sent to the cleaning equipment; according to the suction instruction, the cleaning device starts the main motor to suck the sewage in the cleaning component or the accommodating groove back to the sewage bucket through the suction channel until the sewage bucket is full of water, so that the aim of filling water into the sewage bucket is fulfilled. In the process of filling water into the sewage bucket, the cleaning equipment can continuously detect whether the sewage bucket is in a water full state, and when the sewage bucket is detected to be in the water full state, on one hand, the indication information that the sewage bucket is in the water full state can be sent to the base station, so that the base station can stop filling water into the sewage bucket from the water storage tank according to the notification information, and on the other hand, the main motor can be closed, so that sewage suction is stopped. In this embodiment, the receiving tank communicates with the water storage tank via a second water supply line and with the sewage tank via a suction channel.
In the above-described mode 2, in addition to the main motor being started according to the suction command transmitted from the base station, the cleaning apparatus may automatically start the main motor for sucking the liquid in the accommodating tank or the cleaning assembly into the sewage tank when it is detected that the sewage tank is not in the full state.
In the two embodiments of water injection to the sewage tank, after the clean liquid is delivered to the cleaning assembly or the accommodating groove from the clean water tank on the cleaning device or the water storage tank on the base station, the main motor is started to suck the sewage on the cleaning assembly back to the sewage tank through the suction channel after the clean liquid stays on the cleaning assembly for a certain time, so that the pre-soaking of the floor brush in the cleaning assembly is achieved, and a certain condition is provided for self-cleaning of the follow-up floor brush. In the above process, the residence time of the clean liquid on the cleaning member is not limited, and may be, for example, 2s, 5s, or 5-10s, etc. Of course, the sewage on the cleaning assembly can be sucked back into the sewage bucket in time while the cleaning assembly or the accommodating groove is sprayed with the liquid.
In both embodiments of filling the wastewater tank with water, whether clean liquid is released from the clean water tank of the cleaning device or from the water storage tank of the base station, as indicated by the flow direction of the liquid shown by the gray arrows in fig. 4e, the finally generated wastewater enters the wastewater tank through the floor brush and the suction channel (such as a hose connecting the wastewater tank and the floor brush), and the floor brush and the suction channel are cleaned at the same time, so that the consumption of clean liquid is saved; in addition, after the sewage bucket is filled with liquid, some stains remained on the side wall of the sewage bucket can be taken away, so that more dirt can be taken away, and the cleaning effect is enhanced.
In the above embodiments A1 to A4, after the step (1) is performed, the process proceeds to the step (2). Wherein, in the first self-cleaning process of the sewage bucket, the process of emptying the sewage bucket comprises the following steps: the base station controls the motion mechanism of the base station for opening and closing the sewage bucket to start moving towards the sewage outlet of the sewage bucket until the base station is abutted with the sewage outlet and pushes up the cover plate of the sewage outlet, so that sewage in the sewage bucket flows into the sewage tank through the sewage outlet and the inlet part of the sewage tank to realize sewage discharge. Optionally, the cover plate of the sewage outlet can be fixed through a lock catch, the cover plate is closed in a lock catch closed state, and the cover plate is opened in a lock catch opened state. Based on this, the base station can control the motion of motion towards the drain, and the hasp of closure drain apron is opened in the top, and then opens the apron of drain, and sewage in the sewage bucket flows into the drain groove on the base station through the entry portion of drain and drain groove, and external drain that is finally connected by the drain groove is with sewage drainage sewer or other sewage passageway, realizes the blowdown.
In order to judge whether the sewage bucket emptying process is finished, a threshold value of the sewage bucket time period required for emptying from full water can be preset on the base station, based on the threshold value, the sewage bucket time period is counted at the beginning of the sewage bucket emptying operation, and when the sewage bucket time period reaches the preset sewage time period threshold value, the sewage bucket emptying operation is determined to be finished. At this time, in the specific embodiments A3-A4, the base station may send a notification message to the cleaning device that the sewage tank is empty, so as to instruct the cleaning device to perform self-cleaning on the floor brush or inform the cleaning device to enter the next step; in embodiments A1-A2, the base station may begin performing the bilge tank flushing operation.
In the above embodiments A1 to A2, after the step (2) is performed, the process proceeds to the step (3). Wherein, in the first self-cleaning process of the sewage bucket, one implementation process of the sewage bucket flushing includes: under the condition that the sewage outlet of the sewage bucket is opened, the base station controls the flushing device for flushing the sewage bucket to start moving towards the sewage outlet (for example upwards) until the flushing device stretches into the sewage bucket and reaches a designated position, then the flushing device starts to reciprocate, the sewage bucket is flushed in the reciprocating motion process, and liquid for flushing the sewage bucket flows into the sewage tank through the sewage outlet and the inlet part of the sewage tank and is discharged, so that flushing of the sewage bucket is realized; and when the flushing times reach the set first time number threshold value or the flushing time reaches the set first time length threshold value, ending the flushing action, and restoring the flushing device for flushing the sewage bucket to the original position. For example, the first time threshold may be 3 times, 5 times, or the like, and the first time threshold may be 3s, 7s, 10s, or the like, which is not limited.
Wherein, in the first self-cleaning process of the sewage bucket, another implementation process of the sewage bucket flushing includes: the water storage barrel is also communicated with the water injection port of the sewage barrel, the base station controls the water storage barrel to inject clean liquid into the sewage barrel through the water injection port of the sewage barrel, preferably, the liquid can be injected into a first designated position of the sewage barrel through the water injection port, the first designated position is a relatively higher position of the sewage barrel, such as a barrel cover position, so that the liquid can be in a downward injection state from a high position, the aim of flushing the sewage barrel is fulfilled, and finally, the liquid injected into the sewage barrel flows to the sewage outlet and flows out to the sewage draining groove through the sewage outlet and the inlet part of the sewage draining groove. Alternatively, the water filling opening of the sewage tank may be provided at the bottom bracket of the sewage tank, and for this arrangement, the liquid may be allowed to reach the first designated position in the sewage tank by a larger water pressure or a larger amount of water, but is not limited thereto. Alternatively, in another alternative embodiment, a water filling port may be formed at a higher position of the sewage tank, for example, near a side wall of the tank cover, or near the tank cover, so that the liquid is filled into the sewage tank through the water filling port, and a state of spraying from a higher position to a lower position may be achieved.
In order to judge whether the washing process of the sewage bucket is finished, a first washing frequency threshold value or a first time length threshold value required in the first self-cleaning process of the sewage bucket can be preset on the base station; based on this, the number of times of flushing or flushing time of the wastewater tank is counted at the beginning of the wastewater tank flushing operation, and when the number of times of flushing or flushing time of the wastewater tank reaches a preset first flushing number threshold or first time threshold, it is determined that the wastewater tank flushing operation is ended. Alternatively, in the solution of flushing the wastewater tank based on the flushing device, the base station may also detect whether the flushing device is returned to the original position to determine whether the wastewater tank flushing operation is ended, and determine that the wastewater tank flushing operation is ended when detecting that the flushing device is returned to the original position. In the scheme of performing the flushing operation on the sewage bucket through the flushing device, the flushing times can be determined according to the reciprocating times of the flushing device, for example, the reciprocating times are the flushing times when the reciprocating times are calculated once, or the reciprocating times are the flushing times when the reciprocating times are calculated twice, and the like. Of course, in the solution of performing the flushing operation of the sewage tank by the flushing device, the flushing time period may also be counted, and the end of the flushing operation is determined when the flushing time period reaches the first time period threshold. Accordingly, in the scheme of injecting liquid into the sewage tank through the water storage tank to perform flushing operation on the sewage tank, the time period of injecting the liquid into the sewage tank from the water storage tank (simply referred to as water injection time period) can be counted, and when the water injection time period reaches a set first water injection time period threshold value, the end of the flushing operation of the sewage tank is determined. At this time, in embodiments A1-A2, the base station may send a notification message to the cleaning device that the bilge tank flushing is complete to instruct the cleaning device to self-clean the floor brush.
After the first self-cleaning of the sewage bucket is completed, the method enters the step (4) in the specific embodiments A1-A4 to perform self-cleaning on the ground brush. The cleaning equipment determines that the floor brush needs to be self-cleaned according to a notification message sent by the base station that the sewage bucket is emptied or cleaned, and then the cleaning equipment controls the water cleaning bucket and the main motor to alternately execute water outlet operation and water pumping operation on the cleaning assembly or the accommodating groove so as to realize the self-cleaning of the floor brush.
Specifically, the floor brush self-cleaning includes two stages, namely a first stage and a second stage. In the first stage, the cleaning device controls the water cleaning barrel to output a specified amount of liquid to the accommodating groove in the first water outlet operation, specifically controls the floor brush motor to turn on the water pump, so that clean liquid in the water cleaning barrel is sprayed to the accommodating groove by a specified amount through a first water conveying pipeline (the first water conveying pipeline comprises a pipeline from the water cleaning barrel to a nozzle on the cleaning assembly and the nozzle); and after waiting for the third period of time, controlling the main motor to perform first pumping operation at a fourth period of time, namely sucking the sewage generated by soaking the floor brush back to the sewage bucket through the suction channel, wherein the suction process lasts for the fourth period of time. Wherein the purpose of waiting for the third period of time is to allow the liquid to soak the brush sufficiently, and the first stage is to output a specified amount of liquid from the water tub in order to allow a sufficient amount of liquid to soak the brush.
In an alternative embodiment, the threshold value of the liquid amount released by the clean water bucket for the first time in the self-cleaning process of the floor brush can be preset, a water amount detection sensor is arranged in the accommodating groove of the base, the water amount detection sensor is used for detecting whether the liquid amount released by the clean water bucket reaches the set threshold value of the liquid amount, and when the set threshold value of the liquid amount is reached, the clean water bucket is controlled to stop releasing clean liquid, and the liquid amount is considered to reach the designated amount required by soaking the floor brush. Or in another alternative embodiment, a threshold value of the time period for the clean water bucket to release the liquid for the first time in the self-cleaning process of the floor brush, for example, a third time period threshold value, is preset, and when the time period for the clean water bucket to release the clean liquid reaches the third time period threshold value, the clean water bucket is controlled to stop releasing the clean liquid, so that the liquid amount reaches the designated amount required for soaking the floor brush at the moment.
In the second stage, the water outlet operation and the water pumping operation are alternately performed by controlling the water cleaning barrel and the main motor according to the first time length and the second time length which are respectively corresponding to each other, for example, the water cleaning barrel performs the water outlet operation each time according to the first time length, and then the main motor performs the water pumping operation according to the second time length, wherein the water pumping operation refers to pumping liquid released by the water cleaning barrel into the sewage barrel through the pumping channel.
The water outlet operation and the water pumping operation are alternately executed for a plurality of times until reaching a preset second time threshold, or the water outlet operation and the water pumping operation are alternately executed for a plurality of times until reaching a specified second time threshold, or the water outlet operation and the water pumping operation are alternately executed for a plurality of times until the sewage bucket is in a water full state again, so that self-cleaning of the floor brush is completed. The first duration and the second duration may be the same, for example, both 1s, 3s, etc. Alternatively, the first time period and the second time period are different, preferably the second time period is longer than the first time period, for example, the first time period may be 1s, the second time period may be 2s, the first time period may be 2s, the second time period may be 3s, and so on. Accordingly, the value of the fourth duration is not limited, and may be, for example, 5s, 7s, or the like, alternatively, the fourth duration may be greater than the second duration, but is not limited thereto. The fourth time period is related to the amount of the specified first water outlet, and is longer if the specified first water outlet is larger, and shorter if the specified first water outlet is smaller. Correspondingly, the longer the first time length is, the more water is required to be pumped, so the longer the second time length is, the shorter the first time length is, the less water is required to be pumped, and the shorter the second time length is.
In this embodiment, the value of the third period is not limited to the above, and may be, for example, 3s, 5s, 10s, 20s, etc., and the third period may be a preset value, or may be flexibly set according to the dirt level of the floor brush. A soil degree sensor can be arranged on the floor brush, and the soil degree of the floor brush is collected through the soil degree sensor and reported to a processing system of the cleaning equipment; or, the cleaning equipment can be provided with a camera, the image of the floor brush is collected through the camera, and the cleaning equipment or the service end identifies the image to obtain the dirt degree information of the floor brush. After the soil program information of the floor brush is obtained, the third time period may be set according to the soil degree information of the floor brush, and the third time period may also be referred to as a soaking time period of the floor brush. Besides the image of the ground brush collected by the camera on the cleaning device, the image of the ground brush can also be collected by the camera on the base station or the camera on other terminal devices (such as a mobile phone provided with the cleaning device APP) and uploaded to a server for image recognition, which is not limited.
In the self-cleaning process of the floor brush, the clean liquid released by the clean water barrel is used for soaking the cleaning component for a certain time, so that dirt on the floor brush can be dissolved in advance, and dirt which is difficult to clean can be removed, and the floor brush can be cleaned better; in addition, a certain time is reserved, and more liquid released by the clear water barrel can be accumulated, so that when the main motor works, enough liquid can flush the suction channel (such as a hose) to clean the whole air channel better.
Furthermore, when the self-cleaning end condition of the local brush is that the sewage bucket is in a water full state again, more dirty dirt in the sewage bucket can be further taken away, a certain burden is reduced for the subsequent secondary self-cleaning process of the sewage bucket, the cleaning effect is enhanced, and the water consumption is saved.
In an alternative embodiment, the clean water bucket is provided with the electrolyzed water preparation equipment, the cleaning equipment can control the electrolyzed water preparation equipment to prepare electrolyzed water for a period of time, and then the water pump is turned on by the floor brush motor to enable the electrolyzed water in the clean water bucket to be sprayed out of a specified amount through the nozzle on the cleaning assembly, so that the floor brush can be soaked and cleaned by using the electrolyzed water, and the sterilization effect can be achieved.
In this embodiment, when the self-cleaning end condition of the floor brush is that the number of times of alternately performing the water outlet operation and the water pumping operation reaches the second time threshold, the cleaning device may count the number of times of alternately performing the water outlet operation and the water pumping operation in the self-cleaning process of the floor brush, and determine that the self-cleaning operation of the floor brush is ended when the second time threshold is reached, send a notification message of completion of self-cleaning of the floor brush to the base station to instruct the base station to enter the secondary self-cleaning process of the sewage tank. Or under the condition that the self-cleaning end condition of the floor brush is that the time for alternately executing the water outlet operation and the water pumping operation reaches a second time threshold, in the self-cleaning process of the floor brush, the cleaning equipment can count the time for alternately executing the water outlet operation and the water pumping operation, and when the time for alternately executing the water outlet operation and the water pumping operation reaches the second time threshold, the self-cleaning end of the floor brush is determined, and a notification message for the self-cleaning completion of the floor brush is sent to the base station so as to instruct the base station to enter the secondary self-cleaning process of the sewage bucket. Or in the case that the self-cleaning end condition of the floor brush is that the sewage bucket is in the water full state again, the cleaning equipment can also detect the state of the sewage bucket in the self-cleaning process of the floor brush, and when the sewage bucket is determined to be in the water full state again, determine that the self-cleaning of the floor brush is ended, send a notification message of the self-cleaning completion of the floor brush to the base station so as to instruct the base station to enter the secondary self-cleaning process of the sewage bucket.
After the self-cleaning operation of the floor brush is completed, the secondary self-cleaning process of the sewage bucket is entered in each of the above-described embodiments A1 to A4, but the secondary cleaning process of the sewage bucket is different in the above-described embodiments A1 to A4. Specifically, in embodiments A1 and A3, steps (5) - (7) are sequentially performed, namely, the wastewater tank is filled first, the wastewater tank is emptied after the wastewater tank is filled, and the wastewater tank is flushed after the wastewater tank is emptied; in embodiments A2 and A4, steps (6) and (7) are performed sequentially, i.e. the bilge tank is emptied first, followed by a bilge tank flush.
In the embodiments A1 and A3, since the self-cleaning of the floor brush will not normally be performed in a state of full water, water can be directly injected into the sewage tank, and the foregoing manner 1 and 2 are referred to for the manner of injecting water into the sewage tank, and will not be repeated here.
In embodiments A1-A4, each includes a step (6) of bilge tank emptying and a step (7) of bilge tank flushing. The specific implementation flow and the parameters related to the step (6) are the same as those of the step (2), and are not described herein. The specific implementation flow of the step (7) is the same as that of the step (3), and will not be described here again. Step (7) belongs to the sewage bucket flushing operation in the secondary self-cleaning process, and step (3) belongs to the sewage bucket flushing operation in the primary self-cleaning process, wherein the two flushing parameters can be the same or different.
For example, in the wastewater tank flushing operation of step (7), when the condition for the end of the flushing operation may be set to a third time threshold or a third time period threshold, based on which, during the execution of step (7), in a case where the wastewater outlet of the wastewater tank is opened, the base station controls the flushing device on the base station to start moving upward until reaching into the wastewater tank and reaching a designated position, and then starts to reciprocate, flushing the wastewater tank during the reciprocation; and when the flushing times reach a set third time threshold or the flushing time reaches a set third duration threshold, ending the flushing action, and restoring the flushing device for flushing the sewage bucket to the original position. For example, the third time threshold may be 5 times, 8 times, 10 times, etc., and the third time period threshold may be 5s, 10s, 15s, etc., which is not limited. Of course, in the execution of step (7), the base station may also detect whether the flushing device returns to the original position to determine whether the flushing operation is finished, and determine that the flushing operation is finished when detecting that the flushing device returns to the original position again, otherwise, the re-operation is not finished yet. In the scheme of performing the flushing operation on the sewage bucket through the flushing device, the flushing times can be determined according to the reciprocating times of the flushing device, for example, the reciprocating times are the flushing times when the reciprocating times are calculated once, or the reciprocating times are the flushing times when the reciprocating times are calculated twice, and the like. Of course, in the solution of performing the flushing operation on the sewage tank by the flushing device, the flushing time period may also be counted, and when the flushing time period reaches the third time period threshold value, the end of the flushing operation is determined. Accordingly, in the scheme of injecting liquid into the sewage tank through the water storage tank to perform flushing operation on the sewage tank, the time period of injecting liquid into the sewage tank from the water storage tank (simply referred to as water injection time period) can be counted, and when the water injection time period reaches a set second water injection time period threshold value, the end of the flushing operation of the sewage tank is determined.
Optionally, the number of times of flushing the wastewater tank may be greater or the flushing time may be longer during the second self-cleaning of the wastewater tank, for example, the third time threshold may be greater than the first time threshold, or the third time period threshold may be greater than the first time period threshold, or the second water injection time period threshold may be greater than the first water injection time period threshold, relative to the number of times of flushing or the flushing time in the first self-cleaning, to ensure the cleaning effect of the wastewater tank. However, the third time threshold is not limited to be greater than the first time threshold, or the third time threshold is greater than the first time threshold, or the second water injection time threshold is greater than the first water injection time threshold, and if the number of times of flushing is enough or the flushing time is long enough in the first self-cleaning process, and a certain cleaning effect has been achieved on the sewage tank, then in the second self-cleaning process, fewer times of flushing or flushing time or water injection time can be used, so long as the sewage tank can be ensured to be cleaned in the second self-cleaning process.
Further, in the above embodiments A1 to A4, after the step (7) is performed, the base station controls the movement mechanism of the opening and closing sewage tank to move in a direction away from the sewage outlet of the sewage tank, thereby closing the cover plate of the sewage outlet of the sewage tank, closing the latch of the sewage tank to lock the sewage tank, and then sending a notification message of complete machine cleaning completion to the cleaning device, so that the cleaning device knows that complete machine self-cleaning is completed.
Further, as shown in the embodiment of fig. 3b, after the complete machine of the complete cleaning apparatus is cleaned, step 34 may be entered to perform self-cleaning on the drain tank on the base station. Specifically, as shown in fig. 4f, there is a third water supply line 219 between the water storage tank 211 and the sewage tank 213, and a switch valve lever is provided on the third water supply line 219, optionally, the switch valve lever is provided in the water storage tank for opening or closing the third water supply line 219; after the sewage tank is thoroughly cleaned, the base station controls the valve rod in the water storage tank 211 to be opened, the water storage tank releases clean liquid, the clean liquid directly flows to the sewage tank 213 through the third water supply pipeline 219 connected with the sewage tank, the sewage tank 213 is washed, and the liquid after washing the sewage tank flows into a sewer through the sewer connecting pipe connected with the sewage tank 213, so that self-cleaning of the sewage tank is realized. In fig. 4f, the grey arrow lines indicate the flow of liquid when the drain tank is flushed.
In the above embodiments A1-A4, after flushing the drain tank, the cleaning assembly may also be sterilized by turning on a UV lamp provided on the base station. Optionally, the UV lamp is arranged on a base of the base station, and is used for emitting ultraviolet rays with sterilization, and is used for carrying out irradiation sterilization on the cleaning component (particularly the floor brush) so as to prevent bacteria from breeding on the floor brush; in addition, the UV lamp also has the functions of heating and drying the cleaning assembly, and accelerates the drying speed of the floor brush. Furthermore, a set of drying system can be additionally arranged on the base, and the system comprises a heating module arranged in the base, a diversion channel and an exhaust hole arranged in the accommodating groove, wherein the exhaust hole is communicated with the diversion channel; after the drying system is started, the heating module starts to work to generate hot air, the hot air reaches the air outlet through the flow guide channel, the hot air is blown out from the air outlet towards the cleaning assembly, and the cleaning assembly can be dried simultaneously in the process of sterilizing the cleaning assembly by UV and the like.
In the self-cleaning process of the whole machine, the cleaning equipment can also detect the water level state of the clean water barrel through a group of electrode plates in the clean water barrel, wherein the electrode plates are used for detecting whether the clean water barrel is in a water full state, the tail end positions of the electrode plates represent the water full state of the clean water barrel, and in the water full state, the group of electrode plates can generate an electric signal representing the water full state; in a non-water full state, the electric signal is not generated; the cleaning apparatus may determine whether the fresh water tub is in a water full state according to whether the electric signal is received. When the clear water barrel is not in a water full state, the cleaning equipment sends indication information that the clear water barrel is not in the water full state to the base station, and the base station injects water to the clear water barrel through the water storage tank according to the information, specifically, a water injection valve communicated with the water storage tank is opened, so that clean liquid in the water storage tank flows to the clear water barrel through the water injection valve and a water injection port of the clear water barrel, and the aim of injecting water to the clear water barrel is fulfilled. In the process, when the water level information of the water purifying barrel exceeds the tail end position of the electrode slice, the electrode slice generates an electric signal which indicates that the water purifying barrel is in a water full state and sends the electric signal to a processing system of the cleaning equipment; the cleaning device judges whether the water cleaning barrel is in a water full state according to whether the electric signal is received or not. In the water injection process to the clear water barrel, when the cleaning equipment receives the electric signal generated by the electrode plate, the cleaning equipment sends indication information that the clear water barrel is in a water full state to the base station, and the base station closes the water injection valve according to the indication information, so that water injection to the clear water barrel is stopped.
In the above embodiment, when the clean water bucket is not in the water full state, the base station is required to fill the clean water bucket, so that the clean water bucket is always kept in the water full state, but the present invention is not limited thereto. For example, two groups of electrode plates can be arranged in the clean water barrel, the tail end position of the first group of electrode plates is lower than the tail end position of the second group of electrode plates, namely, the tail end position of the first group of electrode plates is closer to the bottom position of the clean water barrel, the tail end position of the second group of electrode plates is closer to the top position of the shoulder clean water barrel, the first group of electrode plates are used for detecting the lowest water level of the clean water barrel, and the second group of electrode plates are used for detecting the water full state of the clean water barrel. When the water level in the clean water bucket is lower than the tail end position of the first group of electrode plates, the first group of electrode plates are disconnected, an electric signal generated by the first group of electrode plates can be informed, the cleaning equipment can judge that the water level of the clean water bucket is lower than the lowest water level according to the disappearance of the electric signal, and then a water injection request is sent to the base station, so that the base station injects water into the clean water bucket through the water storage tank. Along with continuous water injection, the water level in the clean water barrel gradually rises, when the water level rises to the tail end position of the second group of electrode plates, the second group of electrode plates are conducted to generate an electric signal, at the moment, the cleaning equipment can judge that the water level of the clean water barrel exceeds the highest water level according to the electric signal, namely, the clean water barrel is in a water full state, and then a notification message that the clean water barrel is in the water full state is sent to the base station, so that the base station stops water injection to the clean water barrel.
Further alternatively, a plurality of groups of electrode plates can be further arranged, the tail end positions of different electrode plates are positioned at different positions in the clean water barrel, a plurality of water level detection can be performed on the clean water barrel, and whether water needs to be injected into the clean water barrel is judged according to the detection result of each water level.
In the above embodiments A1 to A4, in the case that the wastewater tank is not in a water full state, the reason why the water injection of step (1) into the wastewater tank is performed is as follows: after the cleaning device performs floor cleaning, the dirt level in the waste water tank may be serious, and some solid waste or waste adhered to the tank wall may be in the waste water tank, so that the waste water tank is filled with water first, which is helpful for flushing the waste on the tank wall from the tank wall or discharging the drier and sticky waste, and therefore, the waste water tank needs to be filled before the waste water tank is emptied to be beneficial for dirt discharge.
The reason for performing steps (1) - (3) prior to step (4) is: before the self-cleaning of the floor brush, the sewage bucket is emptied and primarily cleaned, the dirt recovered from the cleaning ground of the cleaning equipment is discharged and the residual dirt in the sewage bucket is washed away, so that the sewage bucket is in a relatively clean state, the floor brush of the cleaning equipment is then self-cleaned, the dirt degree at the moment is generally lighter than the dirt recovered from the cleaning ground, and the subsequent re-washing of the recycling bin becomes relatively easy because the sewage bucket is pre-cleaned, so that the floor brush is convenient to self-clean. If the sewage bucket is in a water full or full state, the floor brush cannot be self-cleaned or the self-cleaning of the floor brush cannot be completed at one time, so that the cleaning efficiency is low. On the other hand, since the user is not finished cleaning the floor while the sewage tank is full and/or the fresh water tank is empty, the user may only need to empty the sewage tank to fill the fresh water tank instead of brushing the floor self-cleaning, and thus steps (1) - (3) are performed before step (4).
In addition, in the embodiments A1 and A2, the reason for providing the step (3) between the steps (2) to (4) is that: the floor cleaning is performed by the cleaning device, although the sewage bucket is emptied in the step (2), the sewage recovered by the cleaning device for cleaning the floor may be heavy, the sewage bucket may still be dirty, the sewage brought by the floor cleaning is washed away firstly, and the sewage bucket is more easily washed clean when the sewage bucket is washed in the step (7) after the step (4).
It should be noted that, in the embodiments of the present application, in the case that a display screen is provided on the main body of the cleaning apparatus, the display screen may display what stage the cleaning process of the whole machine is currently, and the progress condition of the cleaning process of the whole machine (for example, specifically performed step information), and these stage information and step information may be sent to the cleaning apparatus by the base station, and the cleaning apparatus may display the stage and step information through the display screen, so that the user may know the current cleaning stage and step.
Fig. 5 is a schematic flow chart of a self-cleaning method of a cleaning device described from the perspective of the cleaning device according to an embodiment of the present application. As shown in fig. 5, the method includes:
51. determining whether the sewage bucket is in a water full state in a case that the cleaning device is docked with the base station;
52. Sending indication information of whether the sewage bucket is in a water full state to the base station so that the base station carries out first self-cleaning on the sewage bucket according to the indication information;
53. when a cleaning instruction sent by a base station is received, self-cleaning the ground brush, wherein the cleaning instruction is sent by the base station under the condition that the first self-cleaning of the sewage bucket is determined to be finished;
54. and sending a notification message of the completion of the self-cleaning of the floor brush to the base station so that the base station can continuously perform secondary self-cleaning on the sewage bucket.
In an alternative embodiment, the cleaning apparatus body is further provided with a water cleaning tank, and the method further includes: under the condition that the floor brush is positioned in the accommodating groove on the base station base, receiving a water injection instruction sent by the base station, controlling the water-cleaning bucket to inject water into the accommodating groove through the first water supply pipeline and inject water into the sewage bucket through the suction channel until the sewage bucket is in a water full state, and communicating the accommodating groove with the first water supply pipeline and the suction channel.
In an alternative embodiment, the self-cleaning of the floor brush comprises: controlling the water purifying barrel to output a specified amount of liquid to the accommodating groove in the first water outlet operation, and controlling the main motor to perform the first water pumping operation on the accommodating groove in the fourth time after waiting for the third time; and controlling the water purifying barrel and the main motor to alternately perform water outlet and water pumping operations according to the first time length and the second time length which correspond to each other until the self-cleaning finishing condition of the floor brush is met.
In an alternative embodiment, the method further comprises: detecting whether the water tank is in a water full state or not, and sending indication information of whether the water tank is in the water full state or not to the base station so as to enable the base station to perform water injection treatment on the water tank.
For detailed implementation of the above method steps, reference may be made to the description of the foregoing system embodiments, which are not repeated here.
In addition to the above methods and systems, embodiments of the present application provide a base station and a cleaning device. The structure of the base station may refer to the embodiment shown in fig. 1a, 1b or 2, and the details of the steps that may be executed by the base station in the above embodiments may be realized by executing the computer program stored in the memory by the controller in the base station, and the details of the steps of the methods are also referred to the above embodiments, and are not repeated herein.
Similarly, the structure of the cleaning apparatus may be referred to in the embodiment shown in fig. 1a, 1b or 2, and the processing system in the cleaning apparatus may implement the steps that may be performed by the cleaning apparatus in the above method embodiments, and the detailed description of the method steps is referred to in the foregoing embodiments, which are not repeated herein.
A specific scenario example 1 is given below:
after the user finishes the work such as floor cleaning by using the cleaning machine, the cleaning machine is put back on the base of the base station and is in butt joint with the base station. And under the condition that the base station detects that the butt joint with the cleaning machine is finished, starting a complete machine self-cleaning process of the cleaning machine. The base station controls the water storage barrel to fill the sewage barrel with clean water until the sewage barrel is full of water, and controls the driving mechanism to open the cover plate on the sewage outlet of the sewage barrel for sewage drainage, and sewage flows into the sewer through the sewage drainage groove; after sewage is discharged for 10 seconds, the flushing device for flushing the sewage bucket is driven to rise to a designated position in the sewage bucket, repeated up-and-down movement is started, clear water is sprayed out in the repeated up-and-down movement process (for example, the flushing device can be provided with a rotary spray head for spraying water towards the periphery or a plurality of spray heads for spraying water towards different directions towards the periphery) so as to flush all positions in the sewage bucket; after flushing the wastewater tank 30s, the flushing device returns to the original position (i.e., reset); at this time, the moving mechanism for opening and closing the sewage bucket is driven to move in the reverse direction, so that the cover plate is closed to close the sewage bucket. The washer is then notified that the brush is ready for self-cleaning. The cleaning machine starts to prepare electrolyzed water in the clean water bucket for 30s, the clean water bucket sprays a certain amount of electrolyzed water through a nozzle on the cleaning component, and after soaking the rolling brush for 15s, the main motor is driven to work for 3s so as to suck sewage into the sewage bucket; then, the clear water bucket sprays water for 1s to the accommodating groove through the nozzle, the main motor is driven to work for 1s, after the main motor circulates for several times in sequence, finally, the main motor pumps the sewage in the accommodating groove into the sewage bucket completely, and the floor brush is air-dried, so that self-cleaning of the floor brush and the whole air duct is completed. Then, driving the motion mechanism to move towards the sewage outlet of the sewage bucket again, opening a cover plate on the sewage outlet to carry out sewage, driving a flushing device for flushing the sewage bucket to rise to a designated position in the sewage bucket after sewage is discharged for 10 seconds, starting flushing the sewage bucket, and returning the flushing device to an initial position (namely resetting) after flushing the sewage bucket for 30 seconds; at this time, the moving mechanism for opening and closing the sewage bucket is driven to move in the reverse direction, so that the cover plate is closed to close the sewage bucket. Finally, the water storage tank on the base station is drained to flush the sewage draining tank, and the whole self-cleaning process is completed. In the whole process, the user does not need to clean the cleaning machine, so that the purpose that the hands of the user are not stained is achieved.
Here, the base station automatically starts the whole cleaning process for the cleaning device in the case that the cleaning device is docked with the base station, but is not limited thereto. For example, after the user places the cleaning device on the base station, a voice command to start the overall cleaning process may be sent to the base station and/or the cleaning device via a voice signal. The voice command for starting the whole machine cleaning flow can be sent towards the base station, and then the base station sends a control command to the cleaning equipment so that the cleaning equipment enters the whole machine cleaning flow and completes the whole machine cleaning flow in cooperation with the base station; or, the voice command for starting the whole machine cleaning flow can be sent out by facing the cleaning equipment, and then the cleaning equipment sends a notification message to the base station so that the base station enters the whole machine cleaning flow and completes the whole machine cleaning flow in cooperation with the cleaning equipment; or, the voice command for starting the whole machine cleaning flow can be sent out simultaneously by facing the cleaning equipment and the base station, and the cleaning equipment and the base station enter the whole machine cleaning flow simultaneously. For another example, after the user places the cleaning device on the base station, the user may send an instruction to start the complete machine cleaning process to the cleaning device or the base station through a self-cleaning button on the display screen of the cleaning device or a self-cleaning button on the display screen of the base station, so as to start the complete machine cleaning process. Of course, the user can also send an instruction for starting the whole machine cleaning process to the cleaning equipment or the base station through a physical button on the cleaning equipment or the base station, so that the whole machine cleaning process is started.
In addition to the above-mentioned self-cleaning of the cleaning apparatus 10 by the cleaning apparatus 10 and the base station 20 in cooperation with each other according to a unified overall cleaning procedure, the method procedure provided in the following embodiments may also be used to perform overall self-cleaning of the cleaning apparatus 10. The whole self-cleaning process is applied to the self-cleaning system shown in fig. 1a, 1b or 2, and can be completed by the cooperation of the base station 20 and the cleaning device 10. As shown in fig. 6a, the whole machine cleaning process includes:
step 61, under the condition that the cleaning equipment is in butt joint with the base station, acquiring the current water level state of the sewage bucket;
step 62, determining a first target complete machine cleaning flow adapted to the current water level state from target complete machine cleaning flows corresponding to different water level states;
step 63, performing overall self-cleaning on the cleaning equipment according to a first target overall cleaning process, wherein each target overall cleaning process comprises self-cleaning of a sewage tank and self-cleaning of a floor brush.
It should be noted that, the steps 61 and 62 may be performed by the base station, and the step 63 may be performed by the base station and the cleaning apparatus, and the specific matching process may be described in the following detailed embodiments.
In the present embodiment, the water level state of the wastewater tank is divided into several categories, and the categories and the number of the divided water level states are not limited. For example, the water level state of the wastewater tank may be classified into three types, i.e., an empty tank state, a full water state, and a water-filled but not full state; the water level state of the sewage bucket can be divided into two types, namely a water full state and a water not full state; alternatively, the water level state of the wastewater tank may be classified into two types, that is, a water level greater than a set water level threshold (including a full water state) and a water level less than or equal to the set water level threshold (including an empty water tank state). The set water level threshold may be a 70% water level position, an 80% water level position, an 85% water level position, or a 90% water level position of the wastewater tank, which is not limited.
In the embodiment of the application, for different water level states, different target complete machine cleaning processes can be set, wherein the target complete machine cleaning process refers to a complete machine cleaning process which can be finally used in the water level state; each target complete machine cleaning process comprises self-cleaning of a sewage tank and self-cleaning of a ground brush, so that complete machine self-cleaning of cleaning equipment is realized. For different target complete machine cleaning processes, at least one self-cleaning process is different between the self-cleaning of the sewage tank and the self-cleaning of the floor brush. The same self-cleaning process in the whole machine cleaning process with different targets can be different in operation steps contained in the self-cleaning process, or different in operation parameters related in the self-cleaning process, or different in operation steps and operation parameters.
The water level states of the sewage barrels are different, the working time of the cleaning equipment is represented to a certain extent, and in general, the longer the working time is, the higher the water level of the sewage barrels is. And the longer the cleaning device is operated, the more serious the dirt level of the dirt drum, the cleaning assembly (in particular the floor brush in the cleaning assembly) of the cleaning device. In this embodiment, different target complete machine cleaning processes are set for different water level states, which is equivalent to cleaning requirements for different dirt levels to a certain extent, and different complete machine cleaning processes are configured. For example, in less severe situations (i.e., low or unsatisfied wastewater tank levels), some whole machine cleaning processes with fewer operating steps or relatively smaller operating parameters may be used; conversely, for the case of serious dirt (i.e. the case of high water level or full water in the sewage tank), the whole machine cleaning process with more working steps or relatively larger working parameters can be used. Therefore, different complete machine cleaning processes can be selected according to different dirt levels, the self-cleaning requirement of the complete machine can be met, unnecessary operation steps can be reduced according to the cleaning requirements of different dirt programs, electric quantity is saved, and the service lives of cleaning equipment and base stations are prolonged.
In this embodiment, in case that the cleaning apparatus is docked with the base station, the base station obtains a current water level state of the sewage bucket; then, determining a target complete machine cleaning process adapted to the current water level state from target complete machine cleaning processes corresponding to different water level states, and for convenience of description and distinction, the target complete machine cleaning process adapted to the current water level state is called a first target complete machine cleaning process; and then, performing complete machine self-cleaning on the cleaning equipment according to a first target complete machine cleaning process.
The detailed manner of the base station for acquiring the current water level state of the sewage bucket is the same as or similar to the manner of the base station for acquiring whether the sewage bucket is in a water full state in the above embodiment, and the water level state can be detected by the cleaning device through the electrode pad for detecting the water level information and provided to the base station. It should be noted that in this embodiment, more groups of electrode plates may be disposed in the wastewater tank according to the number of divisions of the water level states, so as to implement detection of different water level states.
In an alternative embodiment, the water level states of the wastewater tank may be divided into two types, i.e., a first water level state and a second water level state. In one application scenario, the first water level state includes a water full state and the second water level state includes a water not full state. In another application scenario, the first water level state includes a state where the water level is greater than the set water level threshold (in this scenario, the state includes a water full state), and the second water level state includes a state where the water level is less than or equal to the set water level threshold (in this scenario, the state includes an empty tub state).
Based on the classification of the water level states, determining a first target complete machine cleaning process adapted to the current water level state from the target complete machine cleaning processes corresponding to different water level states, including:
when the current water level state is a first water level state, determining a target complete machine cleaning flow corresponding to the first water level state as a first target complete machine cleaning flow; and when the current water level state is the second water level state, determining a target complete machine cleaning process corresponding to the second water level state as a first target complete machine cleaning process. The target complete machine cleaning flow corresponding to the first water level state and the target complete machine cleaning flow corresponding to the second water level state are not completely identical, and may be at least one of different operation steps and different operation parameters.
It should be noted that, the cleaning process of the target whole machine corresponding to different water level states may include the same self-cleaning process with the first granularity, or may include the self-cleaning process with the first granularity. The following description is given of the scene:
in an application scenario B1, a target complete machine cleaning process corresponding to different water level states sequentially includes: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket. In the application scenario, the target complete machine cleaning process corresponding to the first water level state sequentially comprises: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket. The target complete machine cleaning flow corresponding to the second water level state also sequentially comprises: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket. The first self-cleaning of the sewage bucket and the self-cleaning of the floor brush are called as the second self-cleaning of the sewage bucket with the first granularity. From the perspective of the included self-cleaning processes of the first granularity, the two target complete machine cleaning processes are identical, and the difference is that at least one self-cleaning process is different in the three self-cleaning processes of the first granularity (namely the self-cleaning process of the sewage bucket for the first time, the self-cleaning process of the ground brush and the secondary self-cleaning process of the sewage bucket). The difference of the self-cleaning process mainly refers to that the same self-cleaning process with the first granularity is different in detailed implementation for different target complete machine cleaning processes, and can be different in operation steps contained in the self-cleaning process, different in operation parameters related in the self-cleaning process, and different in operation steps and operation parameters.
In the application scenario B1, under any water level state, the sewage bucket is firstly self-cleaned for the first time, sewage in the sewage bucket is emptied through the first self-cleaning, so that on one hand, the effect of cleaning the sewage bucket is achieved, on the other hand, the sewage bucket can also have enough space to accommodate sewage generated in the self-cleaning process of the floor brush, the self-cleaning process of the floor brush is ensured to be completed once and can not be interrupted due to the full water of the sewage bucket, the self-cleaning efficiency of the floor brush is improved, and the self-cleaning efficiency of the whole machine is further improved.
In another application scenario B2, according to the different water level states, the self-cleaning process of the first granularity sequentially included in the cleaning process of the corresponding target whole machine is different. Taking the first water level state and the second water level state as examples, the target complete machine cleaning process corresponding to the first water level state sequentially includes: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket; the target complete machine cleaning flow corresponding to the second water level state sequentially comprises: self-cleaning of the floor brush, and secondary self-cleaning of the sewage bucket.
In the application scenario B2, under the condition that the sewage bucket is in a water full state or the water level is higher, the sewage in the sewage bucket can be firstly self-cleaned, and the sewage in the sewage bucket is emptied through the first self-cleaning, so that on one hand, the effect of cleaning the sewage bucket is achieved, on the other hand, the sewage bucket can be provided with enough space to accommodate sewage generated in the self-cleaning process of the floor brush, the self-cleaning process of the floor brush is ensured to be completed once without being interrupted due to the water full state of the sewage bucket, the self-cleaning efficiency of the floor brush is improved, and the self-cleaning efficiency of the whole machine is further improved. Under the lower condition of sewage bucket water level, indicate that the sewage bucket has enough space to hold the sewage that the scrubbing brush produced from the cleaning process, consequently can directly carry out the self-cleaning to the scrubbing brush, later carry out the self-cleaning to the sewage bucket, through reducing the link of self-cleaning, can reduce the interaction between basic station and the cleaning equipment, be favorable to improving complete machine self-cleaning efficiency.
The definition and description of the self-cleaning process of the first granularity related to the application scenarios B1 and B2 are the same as the self-cleaning process of the same concept in the foregoing embodiments, and the foregoing embodiments may be referred to and will not be repeated herein. From the foregoing description of the self-cleaning process of each first granularity in the foregoing embodiment, it can be appreciated that there may be a plurality of different implementations of the self-cleaning process of each first granularity, for example, the foregoing embodiments A1-A4, and these different implementations may form a plurality of candidate complete machine cleaning flows in this embodiment. That is, in the embodiment of the present application, each water level state corresponds to a plurality of candidate complete machine cleaning processes, and different candidate complete machine cleaning processes are not completely identical.
Based on this, before determining the first target complete machine cleaning process adapted to the current water level state from the target complete machine cleaning processes corresponding to different water level states, it is necessary to determine, for different water level states, the corresponding target complete machine cleaning process from a plurality of candidate complete machine cleaning processes corresponding to the first target complete machine cleaning process, where the target complete machine cleaning process is a complete machine cleaning process that is ultimately used for each water level state. The process of determining the target complete machine cleaning flow for each water level state can be finished in advance, can be finished in real time in the self-cleaning process of the cleaning equipment, and can also be preset before the equipment leaves the factory, so that the target complete machine cleaning flow corresponding to each water level state can be directly built in when the equipment leaves the factory.
The implementation of determining the target overall cleaning procedure for each water level state is the same or more detailed, and the implementation of determining the target overall cleaning procedure for the first or second water level state will be described below with respect to the application scenario B1 and the application scenario B2.
For the application scenario B1, before determining the target complete machine cleaning flow adapted to the first water level state as the first target complete machine cleaning flow, the method further includes: and determining a target complete machine cleaning process corresponding to the first water level state from the plurality of candidate complete machine cleaning processes corresponding to the first water level state. In the application scenario B1, each candidate complete machine cleaning flow sequentially includes: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket; and for different candidate complete machine cleaning processes, at least one self-cleaning process is different in the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the secondary self-cleaning of the sewage bucket. The differences here may be differences in the working steps involved in the self-cleaning process and/or in the working parameters involved.
Further, continuing with the above embodiments, the first self-cleaning of the wastewater tank in each candidate complete machine cleaning process may include performing a wastewater tank emptying step; or includes sequentially performing the steps of bilge tank emptying and bilge tank flushing. Correspondingly, the secondary self-cleaning of the sewage bucket in each candidate complete machine cleaning process is carried out, or the steps of sewage bucket water injection, sewage bucket emptying and sewage bucket flushing are sequentially carried out; or includes sequentially performing the steps of bilge tank emptying and bilge tank flushing. In the present embodiment, the operation steps involved in self-cleaning of the floor brush may be considered to be the same for each water level state, but are not limited thereto.
Based on the above, the first self-cleaning implementation manner of the sewage bucket and the second self-cleaning implementation manner of the sewage bucket are combined, so that a plurality of candidate complete machine cleaning processes corresponding to the first water level state can be obtained, and the method specifically comprises the following steps:
candidate complete machine cleaning process a1: sequentially comprises (P1) sewage bucket emptying, (P2) sewage bucket flushing, (P3) self-cleaning of a floor brush, (P4) sewage bucket water injection, (P5) sewage bucket emptying and (P6) sewage bucket flushing;
candidate complete machine cleaning process a2: sequentially comprises (P1) sewage bucket emptying, (P3) self-cleaning of a ground brush, (P4) sewage bucket water injection, (P5) sewage bucket emptying and (P6) sewage bucket flushing;
candidate complete machine cleaning process a3: sequentially comprises (P1) sewage bucket emptying, (P3) self-cleaning of a ground brush, (P5) sewage bucket emptying and (P6) sewage bucket flushing;
candidate complete machine cleaning process a4: comprising (P1) emptying of the sewage bucket, (P2) flushing of the sewage bucket, (P3) self-cleaning of the floor brush, (P5) emptying of the sewage bucket and (P6) flushing of the sewage bucket in sequence.
Further, a target whole machine cleaning process corresponding to the first water level state may be determined from the above-described candidate whole machine cleaning processes a1 to a 4. The detailed implementation of determining the target complete machine cleaning process corresponding to the first water level state from the plurality of candidate complete machine cleaning processes includes, but is not limited to, the following:
Mode C1: displaying a first setting page, wherein the first setting page comprises detailed information of a plurality of candidate complete machine cleaning processes corresponding to a first water level state; and responding to the selection operation on the first setting page, and determining the selected candidate complete machine cleaning process as a target complete machine cleaning process corresponding to the first water level state. The detailed information of the candidate complete machine cleaning flow comprises the name of the candidate complete machine cleaning flow, the included operation steps, the related operation parameters, the corresponding water level state and other information. The display form of the first setting page is not limited, different subareas can be distinguished, different tag pages can be embedded, and each tag page or each subarea displays detailed information of a candidate complete machine cleaning flow.
The first setting page can be displayed on a display screen of the base station, the first setting page can be displayed on a display screen of the cleaning device, and the first setting page can be displayed on a display screen of the terminal device where the APP bound with the cleaning device or the base station is located. The transmission of the page information and the detailed information of the candidate complete machine cleaning process may be involved when the first setting page is displayed on the display screen of the cleaning device or the terminal device, and the transmission process is not limited.
Mode C2: determining target cleaning force according to a water level value corresponding to the current water level state; determining a candidate complete machine cleaning process matched with the target cleaning force from a plurality of candidate complete machine cleaning processes corresponding to the first water level state as a target complete machine cleaning process corresponding to the first water level state; wherein, the cleaning forces corresponding to the cleaning processes of different candidate complete machines are different.
In the mode C2, the cleaning forces of the plurality of candidate complete machine cleaning processes are distinguished. Specifically, the cleaning strength of each candidate complete machine cleaning process can be determined according to the number of operation steps included in each candidate complete machine cleaning process and the related operation parameters. Further, the cleaning force can be divided into a plurality of grades according to the number of the candidate complete machine cleaning processes, for example, the cleaning force is first-stage cleaning force, second-stage cleaning force, third-stage cleaning force and the like from small to large or from large to small in sequence. Generally, the more the number of operation steps, the larger the operation parameters, and the stronger the cleaning strength corresponding to the candidate complete machine cleaning flow. In addition, in this embodiment, the base station may not only obtain the water level state of the sewage tank, but also obtain a specific water level value corresponding to the water level state, and for different water level values in the same water level state, may further distinguish the working time length of the cleaning device, where the working time length corresponding to different water level values is different, and the higher the water level value, the longer the working time length, the higher the dirt degree, and the stronger the cleaning force is required. Based on the above, the water level value can be divided into a corresponding number of numerical intervals according to the number of the candidate complete machine cleaning processes, and then the corresponding relation between each water level value interval and the cleaning force is established. Further, according to the water level value corresponding to the current water level state, inquiring the corresponding relation, determining a water level value interval in which the water level value corresponding to the current water level state is located, and taking the cleaning force corresponding to the water level value interval as a target cleaning force; and determining a candidate complete machine cleaning process matched with the target cleaning force from the plurality of candidate complete machine cleaning processes corresponding to the first water level state as a target complete machine cleaning process corresponding to the first water level state.
Mode C3: before the equipment leaves the factory, determining a target complete machine cleaning process corresponding to the first water level state from a plurality of candidate complete machine cleaning processes corresponding to the first water level state in a certain mode in advance, and setting the target complete machine cleaning process in a base station or cleaning equipment.
For the application scenario B1, before determining the target complete machine cleaning flow adapted to the second water level state as the second target complete machine cleaning flow, the method further includes: and determining a target complete machine cleaning process corresponding to the second water level state from the plurality of candidate complete machine cleaning processes corresponding to the second water level state. The process is the same as the process of determining the target complete machine cleaning flow corresponding to the first water level state, and will not be described again.
Here, in the application scenario B1, the operation steps included in the target complete machine cleaning process corresponding to the different water level states may be the same, for example, the target complete machine cleaning process corresponding to the first water level state is the candidate complete machine cleaning process a1, and the target complete machine cleaning process corresponding to the second water level state is the candidate complete machine cleaning process a1. For this case, the operation parameters involved in the different target complete machine cleaning processes are at least partially different, for example, in the process of filling water into the sewage bucket, the number of times of filling water, the water filling amount or the water filling time period can be different, for example, in the process of flushing the sewage bucket, the number of times of flushing and the flushing time period can be different, so that different complete machine cleaning processes are formed. Further alternatively, following the above embodiment, the above operation parameters may be associated with cleaning forces corresponding to the overall cleaning process, so as to form overall cleaning processes with different cleaning forces, so as to facilitate selection of the overall cleaning process according to the required cleaning forces.
For the application scenario B2, before determining the target complete machine cleaning flow adapted to the first water level state as the first target complete machine cleaning flow, the method further includes: and determining a target complete machine cleaning process corresponding to the first water level state from the plurality of candidate complete machine cleaning processes corresponding to the first water level state. Since the first water level state in the application scenario B2 is the same as the first water level state in the application scenario B1 in definition, the process of determining the target overall cleaning flow corresponding to the first water level state is also the same as that in the application scenario B1, and will not be described again here.
For the application scenario B2, before determining the target complete machine cleaning flow adapted to the second water level state as the second target complete machine cleaning flow, the method further includes: and determining a target complete machine cleaning process corresponding to the second water level state from the plurality of candidate complete machine cleaning processes corresponding to the second water level state. In the application scenario B1, each candidate complete machine cleaning process corresponding to the second water level state sequentially includes: self-cleaning of the floor brush and the sewage bucket; and for different candidate complete machine cleaning processes, at least one self-cleaning process is different in the self-cleaning of the floor brush and the self-cleaning of the sewage bucket. The differences here may be differences in the working steps involved in the self-cleaning process and/or in the working parameters involved.
Further, continuing with the above-described embodiment, the self-cleaning of the wastewater tank in each of the candidate complete machine cleaning processes corresponding to the second water level state, or including sequentially performing wastewater tank emptying and wastewater tank flushing steps; or includes sequentially performing the steps of filling the wastewater tank, emptying the wastewater tank, and flushing the wastewater tank; or comprises the steps of sequentially performing the steps of emptying the sewage tank and flushing the sewage tank when the sewage tank is in a full state; the steps of filling the sewage tank, emptying the sewage tank and flushing the sewage tank are sequentially performed when the sewage tank is not in a full state of water. In the present embodiment, the operation steps involved in self-cleaning of the floor brush may be considered to be the same for each water level state, but are not limited thereto.
Based on the above, the implementation manner of self-cleaning of the ground brush and self-cleaning of the sewage bucket is combined, and a plurality of candidate complete machine cleaning processes corresponding to the second water level state can be obtained, which are specifically as follows:
candidate complete machine cleaning process b1: the method sequentially comprises (P3) self-cleaning of a floor brush, (P4) water injection of a sewage bucket, (P5) emptying of the sewage bucket and (P6) flushing of the sewage bucket;
candidate complete machine cleaning process b2: comprising (P3) self-cleaning of the floor brush, (P5) emptying of the sewage bucket and (P6) flushing of the sewage bucket in sequence.
Further, a target whole machine cleaning process corresponding to the second water level state may be determined from the above-described candidate whole machine cleaning processes b1-b 2. The detailed implementation of determining the target complete machine cleaning process corresponding to the second water level state from the plurality of candidate complete machine cleaning processes is the same as the detailed implementation of determining the target complete machine cleaning process corresponding to the first water level state, and is referred to in the foregoing modes C1-C3, and will not be described herein again.
The first target complete machine cleaning process may be any one of the candidate complete machine cleaning processes a1-a4 and B1-B2, and is specifically determined according to the target complete machine cleaning processes corresponding to the two water level states, continuing to the application scene B1 and the application scene B2. The process of performing the whole machine self-cleaning on the cleaning device according to the first target whole machine cleaning process, that is, the process of performing the whole machine self-cleaning on the cleaning device according to any one of the candidate whole machine cleaning processes a1-a4 and b1-b 2.
For example, when the target complete machine cleaning process corresponding to the first water level state is the candidate complete machine cleaning process a1 and the first target complete machine cleaning process is the target complete machine cleaning process corresponding to the first water level state, the process of performing complete machine self-cleaning on the cleaning device according to the first target complete machine cleaning process includes: sequentially performing (P1) a wastewater tank emptying, (P2) a wastewater tank flushing, (P3) self-cleaning of a floor brush, (P4) wastewater tank water filling, (P5) wastewater tank emptying, and (P6) wastewater tank flushing.
For another example, when the target complete machine cleaning process corresponding to the first water level state is the candidate complete machine cleaning process a2 and the first target complete machine cleaning process is the target complete machine cleaning process corresponding to the first water level state, the process of performing complete machine self-cleaning on the cleaning device according to the first target complete machine cleaning process includes: sequentially performing (P1) the wastewater tank emptying, (P3) self-cleaning of the floor brush, (P4) wastewater tank water filling, (P5) wastewater tank emptying, and (P6) wastewater tank flushing.
For another example, when the target complete machine cleaning process corresponding to the first water level state is the candidate complete machine cleaning process a3 and the first target complete machine cleaning process is the target complete machine cleaning process corresponding to the first water level state, the process of performing complete machine self-cleaning on the cleaning device according to the first target complete machine cleaning process includes: sequentially performing (P1) the drain of the wastewater tank, (P3) self-cleaning of the floor brush, (P5) the drain of the wastewater tank, and (P6) the rinse of the wastewater tank.
For another example, when the target complete machine cleaning process corresponding to the first water level state is the candidate complete machine cleaning process a4 and the first target complete machine cleaning process is the target complete machine cleaning process corresponding to the first water level state, the process of performing complete machine self-cleaning on the cleaning device according to the first target complete machine cleaning process includes: sequentially performing (P1) a wastewater tank emptying, (P2) a wastewater tank flushing, (P3) self-cleaning of the floor brush, (P5) a wastewater tank emptying, and (P6) a wastewater tank flushing.
For another example, when the target complete machine cleaning process corresponding to the second water level state is the candidate complete machine cleaning process b1 and the first target complete machine cleaning process is the target complete machine cleaning process corresponding to the second water level state, the process of performing complete machine self-cleaning on the cleaning device according to the first target complete machine cleaning process includes: the self-cleaning of the floor brush (P3), the filling of the wastewater tank (P4), the emptying of the wastewater tank (P5) and the flushing of the wastewater tank (P6) are sequentially performed.
For another example, when the target complete machine cleaning process corresponding to the second water level state is the candidate complete machine cleaning process b2 and the first target complete machine cleaning process is the target complete machine cleaning process corresponding to the second water level state, the process of performing complete machine self-cleaning on the cleaning device according to the first target complete machine cleaning process includes: the self-cleaning of the floor brush (P3), the emptying of the wastewater tank (P5) and the washing of the wastewater tank (P6) are sequentially performed.
For the detailed implementation of the above-described execution of (P4) the filling of the wastewater tank, (P5) the emptying of the wastewater tank, (P6) the flushing of the wastewater tank, and (P3) the self-cleaning of the floor brush, reference is made to the foregoing embodiments, and the detailed description thereof will be omitted.
Further, in the above embodiment, further comprising: and after the last sewage bucket flushing operation is finished, the sewage tank is self-cleaned. In the application scenario B1, the last bilge tank flushing operation is a bilge tank flushing operation during a secondary self-cleaning of the bilge tank; in the application scenario B2, the last bilge tank washing operation is a bilge tank washing operation during self-cleaning of the bilge tank.
Further alternatively, in the self-cleaning process of the whole machine, when the clear water barrel is not in a water full state, the base station can also fill water into the clear water barrel so that the clear water barrel is in the water full state, and the detailed implementation process is referred to the foregoing embodiment and will not be repeated here.
Fig. 6b is a schematic flow chart of another self-cleaning method of a cleaning apparatus from the perspective of the cleaning apparatus according to an embodiment of the present application. As shown in fig. 6b, the method comprises:
601. detecting a current water level state of the sewage bucket under the condition that the cleaning equipment is determined to be in butt joint with the base station;
602. the method comprises the steps that the current water level state of a sewage bucket is sent to a base station, so that the base station determines a first target complete machine cleaning flow matched with the current water level state from target complete machine cleaning flows corresponding to different water level states;
603. and carrying out complete machine self-cleaning on the cleaning equipment according to a first target complete machine cleaning process by matching with the base station, wherein each target complete machine cleaning process comprises self-cleaning of a sewage tank and self-cleaning of a floor brush.
In an alternative embodiment, the cleaning device is self-cleaned by the base station according to a first target complete cleaning procedure, including: when a cleaning instruction sent by a base station is received, self-cleaning the ground brush, wherein the cleaning instruction is directly sent by the base station after determining a first target complete machine cleaning flow or is sent under the condition that the first self-cleaning of the sewage bucket is determined to be completed; and sending a notification message of the completion of the self-cleaning of the floor brush to the base station so that the base station can continuously perform self-cleaning on the sewage bucket according to the first target complete machine cleaning process.
For detailed implementation of the above method steps, reference may be made to the description of the foregoing system embodiments, which are not repeated here.
In addition to the above methods and systems, embodiments of the present application provide a base station and a cleaning device. The structure of the base station may refer to the embodiment shown in fig. 1a, 1b or 2, and the details of the steps that may be performed by the base station in the embodiment of the method shown in fig. 6a may be realized by executing the computer program stored in the memory by the controller in the base station, and the details of the steps of the method are also referred to the foregoing embodiments, and are not repeated herein.
Similarly, the structure of the cleaning apparatus may be referred to in the embodiment shown in fig. 1a, 1b or 2, and the processing system in the cleaning apparatus may implement the steps that may be performed by the cleaning apparatus in the method embodiment shown in fig. 6b, and the detailed description of the steps of the method is also referred to in the foregoing embodiment, and is not repeated herein.
A specific scenario example 2 is given below:
the sewage bucket state is divided into a water full state and a water non-full state, wherein the water full state corresponds to the ultra-strong complete machine cleaning process, and the water non-full state corresponds to the standard or quick complete machine cleaning process. Compared with the ultra-strong complete machine cleaning process, the standard or quick complete machine cleaning process comprises the same operation steps, but the operation parameters related to the operation steps are smaller. For example, in the ultra-strong complete machine cleaning process, the time for flushing the sewage bucket is 40s, the time for preparing electrolytic water is 40s, the time for soaking the floor brush is 30s, the time for spraying water each time is 5s, and the time for working the main motor each time is 5s; in the standard or quick complete machine cleaning process, the time for flushing the sewage bucket is 30s, the time for preparing electrolytic water is 30s, the time for soaking the floor brush is 15s, the time for spraying water each time is 1s, and the time for working the main motor each time is 1s.
Based on the above, after the user finishes the work of floor cleaning and the like by using the cleaning machine, the cleaning machine is put back on the base of the base station to finish the butt joint with the base station. And under the condition that the base station detects that the butt joint with the cleaning machine is finished, starting a complete machine self-cleaning process of the cleaning machine. The base station receives the water level state of the sewage bucket reported by the cleaning machine; if the current water level state is the water full state, selecting a super-strong complete machine cleaning process, and entering the super-strong complete machine cleaning process; and if the current water level state is the water not full state, selecting a standard or quick complete machine cleaning process, and entering the standard or quick complete machine cleaning process.
Taking the selection of the cleaning process of the super-strong complete machine as an example, the process of executing the cleaning process of the super-strong complete machine comprises the following steps: the base station controls the water storage barrel to fill the sewage barrel with clean water until the sewage barrel is full of water, and controls the driving mechanism to open the cover plate on the sewage outlet of the sewage barrel for sewage drainage, and sewage flows into the sewer through the sewage drainage groove; after sewage is discharged for 10 seconds, the flushing device for flushing the sewage bucket is driven to rise to a designated position in the sewage bucket, repeated up-and-down movement is started, clear water is sprayed out in the repeated up-and-down movement process (for example, the flushing device can be provided with a rotary spray head for spraying water towards the periphery or a plurality of spray heads for spraying water towards different directions towards the periphery) so as to flush all positions in the sewage bucket; after flushing the wastewater tank 40s, the flushing device returns to the original position (i.e., reset); at this time, the moving mechanism for opening and closing the sewage bucket is driven to move in the reverse direction, so that the cover plate is closed to close the sewage bucket. The washer is then notified that the brush is ready for self-cleaning. The cleaning machine starts to prepare electrolytic water 40s in the clean water bucket, the clean water bucket sprays a certain amount of electrolytic water through a nozzle on the cleaning component, and after soaking the rolling brush for 30s, the main motor is driven to work for 5s so as to suck sewage into the sewage bucket; then, the clear water bucket sprays water to the accommodating groove for 5s through the nozzle, the main motor is driven to work for 5s, after the main motor circulates for several times in sequence, finally, the main motor pumps the sewage in the accommodating groove into the sewage bucket completely, and the floor brush is air-dried, so that self-cleaning of the floor brush and the whole air duct is completed. Then, driving the motion mechanism to move towards the sewage outlet of the sewage bucket again, opening a cover plate on the sewage outlet to carry out sewage, driving a flushing device for flushing the sewage bucket to rise to a designated position in the sewage bucket after sewage is discharged for 10 seconds, starting flushing the sewage bucket, and returning the flushing device to an initial position (namely resetting) after flushing the sewage bucket for 40 seconds; at this time, the moving mechanism for opening and closing the sewage bucket is driven to move in the reverse direction, so that the cover plate is closed to close the sewage bucket. Finally, the water storage tank on the base station is drained to flush the sewage draining tank, and the whole self-cleaning process is completed. In the whole process, the user does not need to clean the cleaning machine, so that the purpose that the hands of the user are not stained is achieved.
In another scene, the base station receives the water level state of the sewage bucket reported by the cleaning machine; the current water level state is displayed through a display screen of the cleaning machine or a display screen of the cleaning machine so as to be used for a user to select the cleaning flow of the whole machine to be used. After the user sees the current water level state, the user can see the optional whole machine cleaning flow through the display screen, and the scene specifically comprises: and (3) a super-strong complete machine cleaning process corresponding to the water full state and a standard or quick complete machine cleaning process corresponding to the water not full state. The user selects the whole machine cleaning flow to be used according to the current water level state. If the water is full, the cleaning flow of the super-strong complete machine can be selected; if the water is not full, a standard or quick complete machine cleaning process can be selected.
It should be noted that, when the user selects the whole machine cleaning process according to the current water level state, the user may select the whole machine cleaning process adapted to the current water level state, or may flexibly select other whole machine cleaning processes according to his own preference or actual application situation.
In the embodiments described above or below, the docking of the cleaning device with the base station mainly refers to the docking of the related structures on the two devices in positions, and further includes the docking of communication signals between the two devices.
It should be noted that, the execution subjects of each step of the method provided in the above embodiment may be the same device, or the method may also be executed by different devices. For example, the execution subject of steps 31 to 33 may be device a; for another example, the execution subject of steps 31 and 32 may be device a, and the execution subject of step 32 may be device B; etc.
In addition, in some of the flows described in the above embodiments and the drawings, a plurality of operations appearing in a specific order are included, but it should be clearly understood that the operations may be performed out of the order in which they appear herein or performed in parallel, the sequence numbers of the operations such as 31, 32, etc. are merely used to distinguish between the various operations, and the sequence numbers themselves do not represent any order of execution. In addition, the flows may include more or fewer operations, and the operations may be performed sequentially or in parallel. It should be noted that, the descriptions of "first" and "second" herein are used to distinguish different messages, devices, modules, etc., and do not represent a sequence, and are not limited to the "first" and the "second" being different types.
Accordingly, the present application also provides a computer-readable storage medium storing a computer program, which when executed can implement the steps in the above-described method embodiments.
It will be appreciated by those skilled in the art that embodiments of the present application may be provided as a method, system, or computer program product. Accordingly, the present application may take the form of an entirely hardware embodiment, an entirely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present application may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.
The present application is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems) and computer program products according to embodiments of the application. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
In one typical configuration, a computing device includes one or more processors (CPUs), input/output interfaces, network interfaces, and memory.
The memory may include volatile memory in a computer-readable medium, random Access Memory (RAM) and/or nonvolatile memory, such as Read Only Memory (ROM) or flash memory (flash RAM). Memory is an example of computer-readable media.
Computer readable media, including both non-transitory and non-transitory, removable and non-removable media, may implement information storage by any method or technology. The information may be computer readable instructions, data structures, modules of a program, or other data. Examples of storage media for a computer include, but are not limited to, phase change memory (PRAM), static Random Access Memory (SRAM), dynamic Random Access Memory (DRAM), other types of Random Access Memory (RAM), read Only Memory (ROM), electrically Erasable Programmable Read Only Memory (EEPROM), flash memory or other memory technology, compact disc read only memory (CD-ROM), digital Versatile Discs (DVD) or other optical storage, magnetic cassettes, magnetic tape disk storage or other magnetic storage devices, or any other non-transmission medium, which can be used to store information that can be accessed by a computing device. Computer-readable media, as defined herein, does not include transitory computer-readable media (transmission media), such as modulated data signals and carrier waves.
It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article or apparatus that comprises the element.
The foregoing is merely exemplary of the present application and is not intended to limit the present application. Various modifications and changes may be made to the present application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc. which are within the spirit and principles of the present application are intended to be included within the scope of the claims of the present application.

Claims (21)

1. A self-cleaning method of a cleaning apparatus, characterized by being applied to a self-cleaning system, comprising: the cleaning device at least comprises a sewage bucket and a ground brush; the method comprises the following steps:
acquiring the current water level state of the sewage bucket under the condition that the cleaning equipment is in butt joint with the base station;
determining a first target complete machine cleaning process adapted to a current water level state from target complete machine cleaning processes corresponding to different water level states, wherein the different water level states at least comprise a first water level state and a second water level state, the first water level state is a water full state or a state that the water level is greater than a set water level threshold, and the second water level state is a water not full state or a state that the water level is less than or equal to the set water level threshold; the target complete machine cleaning flow corresponding to the first water level state sequentially comprises: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket; the target complete machine cleaning flow corresponding to the second water level state sequentially comprises: the self-cleaning of the floor brush and the self-cleaning of the sewage bucket;
And performing complete machine self-cleaning on the cleaning equipment according to the first target complete machine cleaning flow.
2. The method of claim 1, wherein determining a first target overall cleaning process that is adapted to the current water level state from among target overall cleaning processes corresponding to different water level states comprises:
when the current water level state is a first water level state, determining a target complete machine cleaning process corresponding to the first water level state as a first target complete machine cleaning process;
and when the current water level state is the second water level state, determining a target complete machine cleaning process corresponding to the second water level state as a first target complete machine cleaning process.
3. The method of claim 2, wherein each target whole machine cleaning process comprises, in order: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket;
and for different target complete machine cleaning processes, the first self-cleaning of the sewage bucket, and at least one self-cleaning process in the self-cleaning of the floor brush and the second self-cleaning of the sewage bucket is different.
4. A method according to any one of claims 1-3, further comprising:
Determining a target complete machine cleaning process corresponding to the first water level state from a plurality of candidate complete machine cleaning processes corresponding to the first water level state;
each candidate complete machine cleaning flow sequentially comprises: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket;
for different candidate complete machine cleaning processes, the first self-cleaning of the sewage bucket, and at least one self-cleaning process in the self-cleaning of the floor brush and the second self-cleaning of the sewage bucket is different.
5. The method of claim 4, wherein the first self-cleaning of the wastewater tank in each candidate complete machine cleaning process comprises: performing a sewage bucket emptying step; alternatively, the steps of emptying the wastewater tank and flushing the wastewater tank are sequentially performed;
correspondingly, the secondary self-cleaning of the sewage bucket in each candidate complete machine cleaning process comprises the following steps: sequentially performing the steps of filling the sewage tank, emptying the sewage tank and flushing the sewage tank; alternatively, the steps of the bilge bucket emptying and the bilge bucket flushing are sequentially performed.
6. The method of claim 4, wherein determining a target overall cleaning process corresponding to the first water level state from a plurality of candidate overall cleaning processes corresponding to the first water level state comprises:
Displaying a first setting page, wherein the first setting page comprises detailed information of a plurality of candidate complete machine cleaning processes corresponding to the first water level state; responding to the selection operation on the first setting page, and determining the selected candidate complete machine cleaning flow as a target complete machine cleaning flow corresponding to the first water level state;
or alternatively
Determining target cleaning force according to a water level value corresponding to the current water level state; determining a candidate complete machine cleaning process adapted to the target cleaning force from a plurality of candidate complete machine cleaning processes corresponding to the first water level state as a target complete machine cleaning process corresponding to the first water level state; wherein, the cleaning forces corresponding to the cleaning processes of different candidate complete machines are different.
7. The method as recited in claim 1, further comprising:
determining a target complete machine cleaning process corresponding to the second water level state from a plurality of candidate complete machine cleaning processes corresponding to the second water level state;
each candidate complete machine cleaning flow sequentially comprises: the self-cleaning of the floor brush and the self-cleaning of the sewage bucket;
for different candidate complete machine cleaning processes, at least one self-cleaning process is different between the self-cleaning of the floor brush and the self-cleaning of the sewage bucket.
8. The method of claim 7, wherein the self-cleaning of the bilge bucket in each candidate complete machine cleaning process comprises:
sequentially performing the steps of emptying the sewage bucket and flushing the sewage bucket; or,
sequentially performing the steps of filling the sewage tank, emptying the sewage tank and flushing the sewage tank; or,
sequentially performing the steps of emptying the sewage tank and flushing the sewage tank when the sewage tank is in a full state; the steps of filling the sewage tank, emptying the sewage tank and flushing the sewage tank are sequentially performed when the sewage tank is not in a full state of water.
9. The method of claim 1, wherein determining a first target overall cleaning process that is adapted to the current water level state from among target overall cleaning processes corresponding to different water level states comprises:
displaying a second setting page, wherein the second setting page comprises detailed information of different water level states and corresponding target complete machine cleaning processes;
and responding to the selection operation on the second setting page, and determining the selected target complete machine cleaning flow as a first target complete machine flow which is adaptive to the current water level state.
10. The method of claim 5, wherein performing a complete machine self-cleaning of the cleaning device in accordance with the first target complete machine cleaning procedure comprises:
Sequentially executing the steps of emptying the sewage bucket, self-cleaning the ground brush, filling water into the sewage bucket, emptying the sewage bucket and flushing the sewage bucket;
or alternatively
Sequentially performing the steps of emptying the sewage bucket, flushing the sewage bucket, self-cleaning the ground brush, filling water into the sewage bucket, emptying the sewage bucket and flushing the sewage bucket;
or alternatively
Sequentially executing the steps of emptying the sewage bucket, self-cleaning the ground brush, emptying the sewage bucket and flushing the sewage bucket;
or alternatively
The steps of the drain tank emptying, the drain tank flushing, the self-cleaning of the floor brush, the drain tank emptying and the drain tank flushing are sequentially performed.
11. The method of claim 8, wherein performing a complete machine self-cleaning of the cleaning device in accordance with the first target complete machine cleaning procedure comprises:
sequentially performing the self-cleaning, the sewage bucket emptying and the sewage bucket flushing steps of the floor brush;
or alternatively
And sequentially executing the steps of self-cleaning of the ground brush, water injection of the sewage bucket, emptying of the sewage bucket and flushing of the sewage bucket.
12. The method of claim 10, wherein the operating parameters in the target whole machine cleaning process corresponding to the first water level state are at least partially different from the operating parameters in the target whole machine cleaning process corresponding to the second water level state if the operating steps in the target whole machine cleaning process corresponding to the first water level state are the same as the operating steps in the target whole machine cleaning process corresponding to the second water level state.
13. The method according to claim 10 or 11, wherein the floor brush of the cleaning device is positioned in a receiving groove on the base station base, and performing the wastewater tank filling step comprises:
a water injection instruction is sent to the cleaning equipment so as to instruct the cleaning equipment to control the clean water bucket of the cleaning equipment to inject water into the accommodating groove through the first water delivery pipeline and inject water into the sewage bucket through the suction channel until the sewage bucket is in a water full state, and the accommodating groove is communicated with the first water delivery pipeline and the suction channel;
or alternatively
The base station controls the water storage tank to be filled with water into the accommodating groove through the second water conveying pipeline and sends a suction instruction to the cleaning equipment so as to instruct the cleaning equipment to be filled into the sewage bucket through the suction channel until the sewage bucket is in a water full state, and the accommodating groove is communicated with the second water conveying pipeline and the suction channel.
14. A method according to claim 10 or 11, characterized in that the base station is provided with a movement mechanism for opening and closing the sewage tank, which movement mechanism is in butt joint with the sewage outlet of the sewage tank;
a step of performing a wastewater tank emptying, comprising: and controlling the movement mechanism to move towards the sewage outlet of the sewage bucket until the movement mechanism is abutted against the sewage outlet and pushes up the cover plate of the sewage outlet, so that sewage in the sewage bucket flows into the sewage tank in butt joint on the base station through the sewage outlet to realize sewage discharge.
15. A method according to claim 10 or 11, characterized in that the base station is provided with a flushing device for flushing the sewage tank, which flushing device is arranged in correspondence with the sewage outlet of the sewage tank; the step of performing the bilge tank washing includes: controlling the flushing device to start moving towards the sewage outlet until the flushing device stretches into the sewage bucket and reaches a designated position, starting reciprocating motion of the flushing device, spraying liquid to flush the sewage bucket in the reciprocating motion process, and enabling the liquid to flow into a butted sewage tank on the base station through the sewage outlet;
or alternatively
A water storage tank is arranged on the base station and is communicated with a water injection port of the sewage bucket; the step of performing the bilge tank washing includes: and controlling the water storage tank to inject liquid into the sewage bucket through a water injection port of the sewage bucket, and enabling the liquid to flow into a sewage tank in butt joint on the base station through the sewage outlet.
16. The method as recited in claim 15, further comprising:
and after the last sewage bucket flushing operation is finished, the sewage tank is self-cleaned.
17. A method according to any one of claims 1-3, 5-12, characterized in that the self-cleaning of the floor brush comprises:
Controlling a clear water barrel on the cleaning equipment to output a specified amount of liquid to a containing groove on the base station in the first water outlet operation, and controlling a main motor to perform the first water pumping operation on the containing groove at a fourth time after waiting for a third time;
and controlling the clear water barrel and the main motor to alternately perform water outlet and water pumping operations according to the first time length and the second time length which are respectively corresponding to each other until the self-cleaning finishing condition of the floor brush is met.
18. The method of any one of claims 1-3, 5-12, wherein the base station further comprises a water storage tank, and wherein the water storage tank is in communication with a water fill port of a cleaning tank of the cleaning apparatus;
the method further comprises the steps of: acquiring information of whether the clear water barrel is in a water full state; and when the water cleaning barrel is not in a water full state, carrying out water injection treatment on the water cleaning barrel.
19. A base station, comprising: a base station body and a base for carrying a cleaning device, the base station body being provided with a controller and a memory for storing a computer program, the controller being coupled to the memory for executing the computer program for performing the steps of the method of any one of claims 1-18.
20. A cleaning apparatus, comprising: the sewage treatment device comprises a handle, a machine body and a cleaning assembly, wherein the machine body is at least provided with a sewage bucket and a treatment system, and the cleaning assembly at least comprises a ground brush; the processing system is used for:
detecting a current water level state of the sewage bucket under the condition that the cleaning device is in butt joint with a base station;
the current water level state of the sewage bucket is sent to the base station, so that the base station determines a first target complete machine cleaning process which is matched with the current water level state from target complete machine cleaning processes corresponding to different water level states, wherein the different water level states at least comprise a first water level state and a second water level state, the first water level state is a water full state or a state that the water level is greater than a set water level threshold value, and the second water level state is a state that the water level is not full or is less than or equal to the set water level threshold value; the target complete machine cleaning flow corresponding to the first water level state sequentially comprises: the first self-cleaning of the sewage bucket, the self-cleaning of the ground brush and the second self-cleaning of the sewage bucket; the target complete machine cleaning flow corresponding to the second water level state sequentially comprises: the self-cleaning of the floor brush and the self-cleaning of the sewage bucket; and
And carrying out complete machine self-cleaning on the cleaning equipment according to the first target complete machine cleaning flow by matching with the base station.
21. The cleaning apparatus as set forth in claim 20, wherein the performing, in conjunction with the base station, the complete machine self-cleaning of the cleaning apparatus according to the first target complete machine cleaning procedure includes:
when a cleaning instruction sent by the base station is received, self-cleaning the floor brush, wherein the cleaning instruction is directly sent by the base station after determining the cleaning flow of the first target whole machine or is sent under the condition that the first self-cleaning of the sewage bucket is determined to be completed;
and sending a notification message of the completion of the self-cleaning of the floor brush to the base station so that the base station can continuously self-clean the sewage bucket according to the cleaning flow of the first target whole machine.
CN202211105234.3A 2022-09-09 2022-09-09 Self-cleaning method of cleaning equipment, cleaning equipment and base station Active CN115486756B (en)

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CN202211105234.3A CN115486756B (en) 2022-09-09 2022-09-09 Self-cleaning method of cleaning equipment, cleaning equipment and base station
PCT/CN2023/117774 WO2024051829A1 (en) 2022-09-09 2023-09-08 Cleaning process interruption adjustment method, base station, cleaning and dirty water discharging system, and storage medium

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