CN115480454A - Shutter device, exposure system and photoetching machine - Google Patents

Abstract

The invention provides a shutter device, which comprises a shading unit, a motion execution unit, a switching unit and a housing unit provided with a light through hole, wherein the switching unit is provided with an inclined surface, the motion execution unit is arranged on the inclined surface of the switching unit, the motion execution unit is connected with the shading unit and drives the shading unit to move, and when the motion execution unit is powered off, the shading unit arranged on the motion execution unit can be automatically closed under the action of gravity of the motion execution unit so as to achieve the purpose of shading the light path of the light through hole and play a role of automatic power-off protection of the whole photoetching machine.

Description

Shutter device, exposure system and photoetching machine

Technical Field

The invention relates to the technical field of photoetching machines, in particular to a shutter device, an exposure system and a photoetching machine.

Background

Photolithography is a technique used to print a pattern having features on a surface of a substrate. The substrates frequently used are silicon wafers or glass substrates coated with light-sensitive media on the surface. In a lithographic process, a substrate is placed on a stage and a pattern of features is projected onto the surface of the substrate by an exposure apparatus located in a lithographic apparatus.

With the increase of the high yield requirement of the lithography machine and the development of the lithography machine light source technology, the power of the light source used by the lithography machine is higher and higher, for example, the ultraviolet GHI line mercury lamp has been increased from the original power of hundreds of watts to the power of tens of thousands of watts. The lithography machine dose control module, i.e. the shutter device, must be free from light leakage.

In the prior art, a shutter device for an open-loop control shutter adopts two blades and is respectively driven by two voice coil motors, the opening and closing time of the two blades of the shutter is controlled by adjusting the acceleration time and the deceleration time of the shutter, and the opening or closing time can reach 20ms. However, when the light aperture of the shutter is 40mm, the design output constant of the voice coil motor is small, the motor coil needs a large amount of cooling gas to cool, and when the blades are closed, the overlapped blades have serious light leakage when a power light source larger than 2500W is used, so that the exposure quality of the photoetching machine is affected.

The patent US6188193B1 discloses a multi-blade closed-loop control shutter, but the shutter is suitable for the film printing industry, the requirement of optical power is very low, the patent mentions that auxiliary light shielding needs to be performed by other additional devices if the optical power reaches 1000W, otherwise light leakage is serious, and meanwhile, the cost is high due to the adoption of multi-axis closed-loop motion control.

In the existing shutter device, the shutter device comprises an executing motion mechanism and blades, wherein the executing motion mechanism is used for driving the blades to move to cover a light through hole, and the blades arranged on the motion executing structure can not automatically close to cover a light path of the light through hole when the executing motion mechanism is powered off, so that the shutter device can not play a role of automatic protection when the whole photoetching machine is powered off.

In addition, the motion cable in the existing shutter device is used for connecting the fan-shaped coil and providing current for the fan-shaped coil, and the fan-shaped coil reciprocates, so that the motion cable is bent, and the reliability of the motion cable is influenced.

Therefore, the existing shutter device has the problem of serious light leakage of a plurality of blades, and the existing shutter device is lack of automatic power-off protection; the motion cable is easy to bend, and the motion service life is shortened.

Disclosure of Invention

The invention aims to provide a shutter device, which aims to solve the problems that the existing shutter device has serious light leakage and is lack of automatic power-off protection; the motion cable is easy to bend, and the motion service life is shortened.

In order to solve the technical problem, the invention provides a shutter device for an exposure system of a lithography machine, which comprises a light shading unit, a motion execution unit, a switching unit and a housing unit provided with a light through hole, wherein the switching unit is provided with an inclined plane, the motion execution unit is arranged on the inclined plane of the switching unit, the motion execution unit is connected with the light shading unit and drives the light shading unit to move, and when the motion execution unit is not electrified, the light shading unit shades the light through hole.

Optionally, a motion cable switching column is arranged on the housing unit, and the motion cable switching column is arranged at an angle with the horizontal plane.

Optionally, the shutter device is a coil motion shutter, the shutter device further includes a coil motion cable, one end of the coil motion cable is connected to the motion cable switching column, the other end of the coil motion cable is connected to the motion execution unit, and the coil motion cable is in a U-shaped configuration.

Optionally, the housing unit includes a plurality of metal housings, and the surface of the metal housing is treated by an anodic oxidation or micro-arc oxidation process.

Optionally, two metal housings are arranged on the front side and the rear side of the shading unit, and a gap between each of the two metal housings and the shading unit is 0.1mm-1mm.

Optionally, the motion execution unit includes a rotating shaft mechanism and an encoder, the rotating shaft mechanism includes a rotating shaft, and the encoder is located on one side of the rotating shaft and is used for detecting the position of the rotating shaft.

Optionally, the motion execution unit includes a voice coil motor, the voice coil motor includes four permanent magnets and a sector coil, and the sector coil is fixed on the rotating shaft.

Optionally, when the device is powered off, the sector coil drives the shading unit to shade the light through hole under the action of gravity.

Optionally, the shading unit includes a shutter blade and an adapter plate, and the shutter blade is installed on the rotating shaft through the adapter plate.

Optionally, the light shielding unit includes a shutter blade.

Optionally, an included angle is formed between the inclined plane of the switching unit and the horizontal plane, and the included angle ranges from 10 degrees to 30 degrees.

Optionally, the spatial position of the switching unit is located obliquely above the light-passing hole.

Based on the same inventive concept, the invention also provides an exposure system comprising any one of the shutter devices.

Based on the same inventive concept, the invention also provides a photoetching machine comprising the exposure system.

Compared with the prior art, the invention has the following beneficial effects:

the shutter device comprises a light shading unit, a movement execution unit, a switching unit and a cover shell unit provided with a light through hole, wherein the movement execution unit is connected with the light shading unit and drives the light shading unit to move, an inclined plane is arranged on the switching unit, and the movement execution unit is arranged on the inclined plane of the switching unit.

Furthermore, a motion cable switching column is arranged on the upper portion of the housing unit, and the motion cable switching column and the horizontal plane are arranged at an angle. One end of the coil movement cable is connected with the movement cable switching column, and the other end of the coil movement cable is connected with the movement execution unit, so that the coil movement cable is always kept in a U shape, the bending radius of the movement cable is increased, the reliability is improved, and the movement service life is prolonged. Furthermore, the shutter device only has one shutter blade, so that the problem of serious light leakage at the overlapping part of a plurality of shutter blades is avoided.

Drawings

Fig. 1 is a schematic view of the overall structure of a shutter device according to an embodiment of the present invention;

FIG. 2 is a partial structural diagram of a shutter device according to an embodiment of the present invention;

fig. 3 and 4 are schematic views of the structure of a motion performing unit of the shutter device according to the embodiment of the present invention;

FIG. 5 is a schematic view of a voice coil motor of the shutter device according to the embodiment of the present invention;

FIG. 6 is a schematic diagram illustrating the voice coil motor coil motion control of the shutter device according to the embodiment of the present invention;

FIG. 7 is a schematic view of the motion cable position of the shutter device of an embodiment of the present invention;

FIG. 8 is a schematic diagram of the shutter motion trajectory and current output of the shutter device according to the embodiment of the present invention;

in the figure, the position of the upper end of the main shaft,

10-a housing unit; 10A-metal can; 10B-metal housing; 10C — metal can; 10D-metal can;

20A-metal pillars; 20B-metal pillars;

30-a metal base plate;

a 40-DB linker;

50-light through hole;

60-a motion cable patch post;

70-a switching unit;

80-a motion execution unit; 801-voice coil motor; 8011-permanent magnet; 8012-sector coil; 802A-magnet backing plate; 802B-magnet backing plate; 803-bearing seats; 804A-a limiting block; 804B-a limiting block; 805-an encoder; 806A-bearing; 806B-bearing; 807-a rotating shaft; 808-an adapter plate;

90-a light shielding unit;

100-coil motion cable.

Detailed Description

The shutter device, the exposure system and the lithography machine according to the present invention will be described in detail with reference to the accompanying drawings and specific embodiments. Advantages and features of the present invention will become apparent from the following description and from the claims. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is provided for the purpose of facilitating and clearly illustrating embodiments of the present invention.

Fig. 1 is a schematic overall structure diagram of a shutter device according to an embodiment of the present invention, and fig. 2 is a schematic partial structure diagram of the shutter device according to the embodiment of the present invention, as shown in fig. 1 and 2, the embodiment provides a shutter device which can be used in an exposure system of a lithography machine, the shutter device includes a light shielding unit 90, a motion executing unit 80, a switching unit 70, and a housing unit 10 provided with a light through hole, the switching unit 70 has an inclined surface, the motion executing unit 80 is installed on the inclined surface of the switching unit 70, the motion executing unit 80 is connected with the light shielding unit 90 and drives the light shielding unit 90 to move, when the motion executing unit 80 is stationary, the light shielding unit 90 shields the light through hole 50 under the action of gravity, thereby achieving the purpose of shielding the light through hole light path, and playing a role of automatic protection of power failure of the lithography machine.

With continued reference to fig. 1 and fig. 2, the shutter device further includes a metal base plate 30, two metal pillars 20A and 20B are fixedly disposed on the metal base plate 30, and the adapter unit 70 is fixedly mounted on the metal pillars 20A and 20B. In this embodiment, the two metal pillars 20A and 20B are both of a flat plate structure, and are arranged in parallel with each other.

The adapter unit 70 is provided with an inclined surface for installing the movement executing unit 80, and the inclined surface has an included angle with a horizontal plane, and the included angle is, for example, 10 degrees to 30 degrees. The spatial position of the switching unit 70 is located obliquely above the light-passing hole 50, and under the condition of power failure of the motion execution unit 80, due to the action of gravity of the motion execution unit 80, the light shielding unit 90 installed on the motion execution unit 80 can achieve the purpose of shielding the light path of the light-passing hole 50, and the function of automatic power failure protection of the whole photoetching machine is achieved.

With reference to fig. 1 and fig. 2, the housing unit 10 includes a first metal housing 10A, a second metal housing 10B, a third metal housing 10C, and a fourth metal housing 10D, wherein the first metal housing 10A, the second metal housing 10B, the third metal housing 10C, and the fourth metal housing 10D are all of a flat plate structure, the first metal housing 10A and the second metal housing 10B are arranged in parallel, and the third metal housing 10C and the fourth metal housing 10D are arranged in parallel and located at front and rear sides of the light shielding unit 90, that is, the third metal housing 10C and the fourth metal housing 10D are located at two sides of the light shielding unit in the thickness direction. The first metal housing 10A, the second metal housing 10B, the third metal housing 10C and the fourth metal housing 10D are fixed to the metal support column 20A and the metal support column 20B by screws, wherein the third metal housing 10C is provided with a first light through hole, the fourth metal housing 10D is provided with a second light through hole, and the first light through hole and the second light through hole have the same preset diameter and position. The first light through hole and the second light through hole jointly form a light through hole 50 for light through.

The first metallic casing 10A, the second metallic casing 10B, the third metallic casing 10C, and the fourth metallic casing 10D may be made of the same material, or may not be completely the same material. In this embodiment, the first metallic housing 10A, the second metallic housing 10B, the third metallic housing 10C, and the fourth metallic housing 10D are made of aluminum alloy, and the surface treatment is anodic oxidation or micro-arc oxidation, which has a high light absorption rate (up to 90% or more).

With continued reference to fig. 1 and fig. 2, a data interface (DB connector) 40 is installed on the second metal casing 10B for connecting cables of the encoder and the motor. A motion cable transit post 60 is fixedly arranged on the first metal casing 10A and the second metal casing 10B, the motion cable transit post 60 is located above the transit unit 70 and the motion execution unit 80, the motion cable transit post 60 is rectangular, for example, and a groove is arranged on the motion cable transit post 60 for transit of a motion cable.

With continued reference to fig. 1 and 2, the light shielding unit 90 is a shutter blade, i.e., a single-blade structure. In a preferable scheme, the shutter blade is made of aluminum alloy, the thickness of the shutter blade is 0.5mm-3mm, the surface of the shutter blade facing the light source is a mirror surface, the mirror surface can be achieved by polishing and diamond precision turning processes, the roughness of the shutter blade is smaller than Ra0.06, and the light reflectivity of the shutter blade can reach more than 90%. The backlight surface of the shutter blade is a rough surface, and the surface treatment is anodic oxidation or micro-arc oxidation. The design of the blades can greatly reduce the temperature of the shutter device, greatly improve the environmental suitability of the shutter, and enable the shutter device to be suitable for the scene of a light source with the power of a megawatt mercury lamp. The third metal housing 10C and the fourth metal housing 10D are respectively disposed on two sides of the shutter blade, a gap between the third metal housing 10C and the shutter blade and a gap between the fourth metal housing 10D and the shutter blade are, for example, 0.1mm to 1mm, a diameter of a light blocking portion of the shutter blade is larger than a diameter of the light through hole 50, and a difference between the diameter of the light blocking portion of the shutter blade and the diameter of the light through hole 50 is, for example, larger than 10 mm. In addition, one shutter blade avoids the problem of serious light leakage at the overlapping part of two or more shutter blades. The problem that the exposure yield is influenced by the slow starting speed of the rotating motor with the three blades in reciprocating rotation is also solved.

Fig. 3 and 4 are schematic diagrams of the motion performing unit of the shutter device according to the embodiment of the present invention. As shown in fig. 3 and 4, the motion performing unit 80 includes a bearing seat 803, a bearing 806A, a bearing 806B and a rotating shaft 807, two sides of the bearing seat 803 are respectively equipped with a bearing 806A and a bearing 806B, the rotating shaft 807 is installed with the bearing 806A and the bearing 806B for rotation, the light shielding unit 90 includes a shutter blade and an adapter plate 808, and the shutter blade is installed on the rotating shaft 807 through the adapter plate 808 for rotation of the light shielding unit 90. Further, an encoder 805 is installed at one end of the rotating shaft 807, and is used for realizing position detection of the rotating shaft 807 and realizing single-shaft closed-loop control.

Fig. 5 is a schematic structural diagram of a voice coil motor of a shutter device according to an embodiment of the present invention, and fig. 6 is a schematic diagram of a voice coil motor coil motion control of the shutter device according to the embodiment of the present invention. As shown in fig. 5 and 6, the movement actuator 80 includes a voice coil motor 801, and the voice coil motor 801 includes four permanent magnets 8011 and 1 segment coil 8012. The sector coil 8012 is fixed on the rotating shaft 807, and four permanent magnets 8011 are respectively fixed on the magnet back plate 802A and the magnet back plate 802B. In this embodiment, the sector coil 8012 is wound from flat enameled wire. The principle of operation of a voice coil motor is that an energized coil, placed in a magnetic field, generates a force whose magnitude is proportional to the current applied to the coil. The motion form of the voice coil motor manufactured based on the principle can be a straight line or a circular arc.

Fig. 6 shows a state in which sector coil 8012 and permanent magnet 8011 are arranged symmetrically, and the N-stage magnet and the S-stage magnet constitute 180 °. The sector coil 8012 rotates about point O. The direction of movement of the sector coil 8012 is controlled by controlling the coil current I of the sector coil 8012 in a counter clockwise or clockwise direction. By controlling the magnitude of the current I of the sector coil 8012, the rotational movement speed of the sector coil 8012 is controlled. Where point O is located on the axis of the shaft 807 to minimize moment of inertia. As shown in fig. 6, a movement stroke of the sector coil 8012 is less than or equal to 2a, the movement executing unit 80 is further provided with a limiting block 804A and a limiting block 804B, and the limiting block 804A and the limiting block 804B limit the sector coil 8012. Meanwhile, b is larger than or equal to a, so that the stress direction and the stress size of the coil in the moving process are controllable, wherein b is 1/2 of the fan-shaped angle of the fan-shaped coil 8012, and a = pi/2-b.

Referring to fig. 2, fig. 3 and fig. 6, in the power-on state of the apparatus, by controlling the amount of the supplied current and the clockwise and counterclockwise directions of the current, the motion of the sector-shaped coil 8012 is controlled, and the sector-shaped coil 8012 drives the rotating shaft 807 to move, and the rotating shaft 807 drives the light shielding unit 90 to move so as to close or open the light passing hole 50. The control of the movement speed and the movement direction can be realized by controlling the magnitude of the current and the direction of the current. Under the condition of power failure, the sector coil 8012 moves downwards around the rotating shaft 807 under the action of gravity of the sector coil 8012, the left bearing seat 803 is limited, at this time, the sector coil 8012 drives the light shielding unit 90 to move, and the light shielding unit 90 shields the light passing hole 50 to play a role in automatic power failure protection of the whole photoetching machine.

Fig. 7 is a schematic diagram of the position of the motion cables of the shutter device according to the embodiment of the present invention. As shown in fig. 7, in this embodiment, the shutter device is a coil motion shutter, so the position planning of the motion cable is particularly important, on one hand, there is no interference around the motion cable when the motion cable moves, and on the other hand, the bending radius of the motion cable needs to be increased as much as possible, so as to improve the reliability. The coil movement cable 100 is a long-life bending-resistant movement cable, and in order to reduce the resistance of the movement coil, the coil movement cable 100 is, for example, a flexible movement cable. Coil motion cable 100 one end welding in on the fan-shaped coil 8012 enameled wire, the solder joint is fixed with gluing, and the other end is fixed with glue in the wire casing of motion cable switching post 60, in order to increase coil motion cable radius of bending, motion cable switching post 60 is placed with inclination angle c, and the size of angle c is 10-60 for example, fan-shaped coil 8012 is when being the swing, coil motion cable 100 remains for the U type all the time, improves coil motion cable 100's motion life-span.

Fig. 8 is a schematic diagram of the shutter motion trajectory and current output of the shutter device according to the embodiment of the invention. As shown in fig. 8, the design value of the clear aperture 50 of the shutter device is, for example, 62mm, the light shielding diameter of the light shielding unit 90 is, for example, 80mm, and the center of the rotation shaft 807 of the sector coil 8012 is, for example, 105.5mm from the center of the clear aperture 50. In the present embodiment, a Copley commercial controller is used, the encoder 805 adopts 3600 lines/turns, for example, and the controller performs subdivision, namely 14400 counts/turn. When the shutter blade is moved from the open position to the closed position, the sector coil 8012 moves from-200 counts to-1500 counts, that is, the sector coil 8012 moves by a stroke 2a =42.5 °, and the time is only 21ms. The aperture of the clear aperture of the shutter device is improved, and the large-aperture single-shaft high-speed closed-loop control of the shutter device is realized.

Based on the same inventive concept, embodiments of the present invention further provide an exposure system, which includes the shutter device described above, and other components may all adopt technologies known to those skilled in the art, which are not described herein again.

In addition, the embodiment of the invention also provides a photoetching machine which comprises the exposure system.

In summary, in the shutter device, the exposure system and the lithography machine provided in the embodiments of the present invention, the shutter device includes a light shielding unit, a movement executing unit, a switching unit and a housing unit provided with a light through hole, the movement executing unit is connected to the light shielding unit and drives the light shielding unit to move, the movement executing unit is installed on the inclined plane of the switching unit by setting an inclined plane on the switching unit, when the movement executing unit is powered off, the light shielding unit installed on the movement executing unit can be automatically closed to cover the light path of the light through hole due to the gravity of a coil in the movement executing unit, so as to achieve the automatic power-off protection function of the whole machine of the lithography machine, further, the movement cable switching column is provided on the upper portion of the housing unit, and the movement cable switching column is arranged at an angle with the horizontal plane. One end of the coil movement cable is connected with the movement cable switching column, and the other end of the coil movement cable is connected with the movement execution unit, so that the coil movement cable is always kept in a U shape, the bending radius of the movement cable is increased, the reliability is improved, and the movement service life is prolonged. Furthermore, the shutter device only has one shutter blade, so that the problem of serious light leakage at the overlapping part of a plurality of shutter blades is avoided.

The above description is only for the purpose of describing the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention, and any variations and modifications made by those skilled in the art based on the above disclosure are within the scope of the appended claims.

Claims (14)

1. A shutter device is used for an exposure system and is characterized by comprising a shading unit, a motion execution unit, a switching unit and a housing unit, wherein the switching unit is provided with an inclined plane, the motion execution unit is installed on the inclined plane of the switching unit, the housing unit is provided with a light through hole, the motion execution unit is connected with the shading unit and used for driving the shading unit to move, and the shading unit shades the light through hole when the motion execution unit is not electrified.

2. The shutter apparatus of claim 1, wherein a motion cable patch post is provided on the housing unit, the motion cable patch post being disposed at an angle to the horizontal.

3. The shutter device according to claim 2, wherein the shutter device is a coil motion shutter, the shutter device further comprising a coil motion cable, one end of the coil motion cable is connected to the motion cable switching post, the other end of the coil motion cable is connected to the motion performing unit, and the coil motion cable is in a U-shaped configuration.

4. The shutter device according to claim 2, wherein the housing unit comprises a plurality of metallic housings, and surfaces of the plurality of metallic housings are treated by an anodic oxidation or micro-arc oxidation process.

5. The shutter device according to claim 4, wherein two metal cases are provided on both front and rear sides of said light shielding unit, and a gap between said two metal cases and said light shielding unit is 0.1mm to 1mm.

6. The shutter apparatus according to claim 1, wherein the motion performing unit includes a rotation shaft mechanism including a rotation shaft and an encoder provided at one side of the rotation shaft for detecting a position of the rotation shaft.

7. The shutter apparatus of claim 6, wherein the motion performing unit comprises a voice coil motor including four permanent magnets and a sector coil fixed to the rotary shaft.

8. The shutter apparatus according to claim 7, wherein said fan-shaped coil drives said light shielding unit to shield said light passing hole due to gravity when the apparatus is powered off.

9. The shutter apparatus according to claim 6, wherein said light shielding unit includes a shutter blade and an adapter plate, said shutter blade being mounted on said rotary shaft through the adapter plate.

10. The shutter apparatus of claim 1, wherein the shutter unit comprises a shutter blade.

11. The shutter apparatus according to claim 1, wherein the inclined surface of the adapting unit has an angle with a horizontal plane, and the angle is in a range of 10 degrees to 30 degrees.

12. The shutter device according to claim 1, wherein a spatial position of the transit unit is located obliquely above the light passing hole.

13. An exposure system comprising the shutter device according to any one of claims 1 to 12.

14. A lithography machine comprising an exposure system according to claim 13.

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