CN114779590B - Exposure machine - Google Patents
Exposure machine Download PDFInfo
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- CN114779590B CN114779590B CN202210611262.6A CN202210611262A CN114779590B CN 114779590 B CN114779590 B CN 114779590B CN 202210611262 A CN202210611262 A CN 202210611262A CN 114779590 B CN114779590 B CN 114779590B
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- module
- reflector
- preset
- light path
- suspension
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
Abstract
The invention provides an exposure machine, which relates to the field of exposure machines and comprises a light source, a preposed light path module, a postposition light path module, a mask module and a processing platform module, wherein the preposed light path module comprises more than two stages of reflecting components, and one stage of the reflecting components in the more than two stages of reflecting components is a rotating component; the rotating assembly comprises a reflector rotating around a preset space axis; the reflector is provided with at least one reflecting surface for laser light path treatment; in the process that the reflector rotates around the axis of the preset space, the reflector has at least one correct posture, and under the correct posture, one reflecting surface of the reflector faces to the preset direction; when the reflector is in the correct posture, the reflecting surface faces to the preset direction. The exposure machine replaces one group of reflection assemblies in the front light path module with the rotating assemblies, and replaces the radioactivity of the fixed posture with the periodically rotating reflector, so that the function of periodically cutting off and controlling the continuous light source is realized.
Description
Technical Field
The invention relates to the field of exposure machines, in particular to an exposure machine.
Background
The exposure machine is a machine device which emits laser by starting light and transfers image information on a film or other transparent bodies to the surface coated with photosensitive substances, and the exposure machine is generally applied to the field of high-precision processing, such as the field of chip processing, and a chip circuit is required to be transferred to a wafer by utilizing the exposure machine. Due to the blockade of foreign technologies, china is in a lagging status in the field of processing and manufacturing of exposure machines, and the processing and manufacturing of the exposure machines mainly involve various problems, such as manufacturing of laser sources, vibration elimination and the like. Aiming at the technical problems, the prior art provides more solutions. For example, in the aspect of manufacturing a laser source, a document with application publication No. CN111610697A discloses an LED optical system of a DI lithography machine, which solves the problems of insufficient power of a semiconductor laser in certain wave bands; the application publication No. CN110376851A discloses a light source of an exposure machine, which modifies the light path of an LED in a spiral manner to obtain a light source with pure light beam and no stray light. In the aspect of processing the laser light path, the light path may be processed by using a mirror group or a lens group according to the characteristics of the laser.
Fig. 1 is a schematic diagram of an exposure machine in the prior art, and an emergent laser of a laser 1 is converged to a mask 4 by a reflector 3, and then focused to a wafer 5 by a reflection manner to realize lithography. Since the mask or the wafer needs to be moved to adapt to the laser striking position, unlike a pulsed light source, when a laser needle adopts a continuous light source, a mechanism is required to periodically cut off the light of the continuous light source to adapt to the action of the mask or the wafer.
Disclosure of Invention
In order to perform periodic light ray cutting control on a continuous light source, the invention provides an exposure machine, wherein one group of reflecting components in a front light path module is replaced by a rotating component, and the periodically rotating reflecting mirror is used for replacing radioactivity with a fixed posture, so that the periodic light ray cutting control function on the continuous light source is realized.
Correspondingly, the invention provides an exposure machine, which comprises a light source, a preposed light path module, a postposed light path module, a mask module and a processing platform module, wherein processing laser emitted by the light source reaches the processing platform module after being processed by the preposed light path module, the mask module and the postposed light path module in sequence,
the prepositive light path module comprises more than two stages of reflecting components, wherein one stage of reflecting component in the more than two stages of reflecting components is a rotating component;
the rotating assembly comprises a reflector rotating around a preset space axis;
the reflecting mirror is provided with at least one reflecting surface for laser light path processing;
in the process that the reflector rotates around the preset space axis, the reflector has at least one correct posture, and in the correct posture, one reflecting surface of the reflector faces to a preset direction;
when the reflector is in a correct posture, the reflecting surface faces a preset direction.
In an alternative embodiment, the rotating assembly further comprises a support module;
the supporting module comprises a suspension unit, a rotating shaft unit and a suspension control unit;
the suspension unit comprises prism rods and fixed round sleeves, the prism rods are provided with prism side faces in a preset number, each prism side face is embedded with a suspension permanent magnet, and the fixed round sleeves surround the prism rods;
the axis of the fixed round sleeve is collinear with the axis of the preset space;
the rotating shaft unit comprises a matching sliding sleeve, the matching sliding sleeve is arranged outside the fixed round sleeve and is in rotating fit with the fixed round sleeve, and one end of the matching sliding sleeve is fixedly connected with the reflector;
the suspension control unit comprises control rings, the inner contour shapes of the cross sections of the control rings are regular polygons of which the number is consistent with the preset number, the control rings are provided with inner wall surfaces of which the number is consistent with the preset number, and each inner wall surface is provided with suspension electromagnets;
the control ring surrounds outside the cooperation sliding sleeve, and based on the cooperation of suspension electromagnet with the suspension permanent magnet, the prism pole fixed circle cover with the cooperation sliding sleeve suspension in the cooperation sliding sleeve.
In an alternative embodiment, the number of the support modules is two, and the two support modules are symmetrically arranged with respect to the reflector.
In an optional embodiment, the support module further comprises an axial limiting unit;
the axial limiting unit comprises a fixing ring and a driven ring, the fixing ring and the driven ring are arranged oppositely along the direction of the axis of the preset space, the fixing ring and the control ring are fixed in relative positions, and the driven ring and the matching sliding sleeve are fixed in relative positions;
the fixed ring is provided with an axial electromagnet, and the driven ring is provided with an axial permanent magnet;
the position of the reflector on the preset spatial axis is kept stable based on the magnetic field cooperation of the axial electromagnet and the axial permanent magnet in each group of support modules.
In an alternative embodiment, the rotating assembly further comprises a counterweight module;
the counterweight module is arranged on the reflector and enables the integral gravity center of the reflector and the counterweight module to be positioned on the preset space axis.
In an alternative embodiment, the rotating assembly further comprises an inertia module;
the inertia module comprises an inertia disc, the inertia disc is fixedly connected with the reflector, and the axis of the inertia disc is collinear with the axis of the preset space.
In an alternative embodiment, the rotating assembly further comprises a driving module;
the driving module comprises a contact driving unit and a non-contact driving unit;
the inertia turntable is driven to a preset rotating speed based on the contact driving unit, and the inertia turntable is driven to keep the preset rotating speed based on the non-contact driving unit.
In an alternative embodiment, the outer circumference of the circular disk has meshing teeth for contact-driving the contact-driving unit.
In an optional embodiment, a driving permanent magnet is embedded in the side wall of each meshing tooth in the same side direction;
the non-contact driving unit comprises a driving electromagnet, and the non-contact driving unit drives the inertia turntable to keep the preset rotating speed based on the matching of the driving electromagnet and the driving permanent magnet.
The working principle of the exposure machine provided by the invention is as follows: the position of the reflector is limited in the longitudinal direction and the axial direction, wherein the longitudinal limit is realized by using a suspension unit, a rotating shaft unit and a suspension control unit in the supporting module, the suspension control unit controls and keeps the suspension of the suspension unit through a multidirectional magnetic field, and the rotating shaft unit rotates by taking the suspension unit as a fixed shaft, so that the transmission and the interference of vibration can be avoided; the axial positioning is realized through the axial limiting units, and the axial positions of the reflectors are jointly controlled by utilizing the magnetic fields of the axial limiting units on the two sides of the reflectors so as to avoid the transmission and the interference of vibration; the driving and the rotating speed maintaining of the reflecting mirror are realized through a driving module, the driving module comprises a two-part driving structure, wherein the contact driving unit drives the reflecting mirror to reach a preset rotating speed in a direct contact force transmission mode, then the loss energy of the reflecting mirror is supplemented in a non-contact mode through a non-contact driving unit, and in the rotating speed maintaining stage, the driving force is sourced from the non-contact driving unit, so that the vibration transmission and interference are avoided; the exposure machine replaces one group of reflection assemblies in the front light path module with a rotating assembly, and replaces the radioactivity of a fixed posture with a periodically rotating reflector, so that the function of periodically cutting off and controlling light of a continuous light source is realized; in the rotating process of the reflecting mirror, each reflecting surface is periodically and sequentially in the correct state according to the rotating speed to play a role, in unit time, the light path (energy) processed by each reflecting surface is reduced, the requirements on the material manufacturing of the reflecting mirror are greatly reduced, the requirements on the rotating speed of the reflecting mirror are greatly reduced, and the whole manufacturing cost of the exposure machine is favorably reduced.
Drawings
FIG. 1 is a schematic diagram of an exposure machine according to the prior art.
FIG. 2 is a schematic diagram of the cross-sectional structure of an exposure machine according to an embodiment of the present invention.
FIG. 3 isbase:Sub>A schematic cross-sectional view of an exposure machine A-A' according to an embodiment of the present invention.
Fig. 4 is a schematic three-dimensional structure diagram of a reflector according to an embodiment of the invention.
Fig. 5 is a schematic diagram of a driving module according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that, in the embodiment of the exposure machine provided by the present invention, the technical problem to be solved is the problem of discontinuous control of the continuous light source, and accordingly, the technical personnel also expand according to the actual requirements in the research and development process, thereby solving the problems of insufficient material performance, etc.
Fig. 2 isbase:Sub>A schematic diagram ofbase:Sub>A cross-sectional structure of an exposure machine according to an embodiment of the present invention, fig. 3 isbase:Sub>A schematic diagram ofbase:Sub>A cross-sectional structure of an exposure machinebase:Sub>A-base:Sub>A' according to an embodiment of the present invention, and fig. 4 isbase:Sub>A schematic diagram ofbase:Sub>A three-dimensional structure ofbase:Sub>A mirror 10 according to an embodiment of the present invention.
The embodiment of the invention provides an exposure machine, which comprises a light source, a preposed light path module, a postposition light path module, a mask module and a processing platform module, wherein basically, processing laser emitted by the light source sequentially passes through the preposed light path module, the mask module and the postposition light path module to reach the processing platform module. The light source, the front light path module, the rear light path module, the mask module and the processing platform module are necessary component structures in the exposure machine, and can be understood by referring to the attached drawing figure 1, and particularly, the light source is responsible for providing a laser source; according to the trend of the light path, the preposed light path module is positioned at the preposed position of the mask module and is used for processing the laser light path of the light source; the mask module is provided with a mask for the laser source to imitate; the rear light path module is used for exposing the wafer on the processing platform module after the laser light processed by the mask module is subjected to light path processing.
In the embodiment of the invention, the main improvement point of the prior art is that a group of reflecting components in the front light path module is replaced by a rotating component.
Specifically, the front light path module includes more than two stages of reflecting components, and one of the reflecting components in the more than two stages of reflecting components is a rotating component;
the rotating assembly comprises a reflector 10 rotating around a preset spatial axis;
the reflector 10 has at least one reflecting surface 19 for the laser beam path treatment;
during the rotation of the mirror 10 around the predetermined spatial axis, the mirror 10 has at least one correct posture in which one of the reflecting surfaces 19 of the mirror 10 faces a predetermined direction.
Specifically, when the reflector 10 rotating around the preset spatial axis is in a correct posture, the corresponding reflecting surface 19 is used for correctly processing the laser light path, so that the light path can reach the next group of reflecting assemblies or mask modules.
Referring to the three-dimensional structure of the reflector 10 illustrated in fig. 4, the number of the reflecting surfaces 19 on the reflector 10 may be more than one, and when the number of the reflecting surfaces 19 is more than two, if the frequency of the laser light to be reflected is constant, the number of times of reflection of each reflecting surface 19 is correspondingly reduced, and by this embodiment, at least two advantages are brought: on one hand, the required rotation speed of the reflector 10 is reduced, which is beneficial to simplifying the power requirement of the driving mechanism, and on the other hand, the heat resistance requirement and the heat dissipation requirement of the material of the reflector 10 are reduced, which is beneficial to reducing the performance requirement of the material; especially for the latter, the requirement of continuous processing is difficult to be realized by the single reflecting surface 19 based on domestic material accumulation, and the breakthrough in material is more difficult than the vibration influence and precision influence brought by replacing the reflecting mirror 10 in a static mode by the reflecting mirror 10 in a rotating mode. In terms of energy dissipation, the rotating component is mainly used for replacing the reflecting component of the last stage in the front light path module.
Specifically, the rotation of the mirror 10 first requires solving the problem of the arrangement of the pivot axis of the mirror 10.
Specifically, in the embodiment of the present invention, the rotating assembly further includes a supporting module, and the supporting module is used for solving the problem of the arrangement of the rotating shaft of the reflector 10.
Referring to fig. 3 of the drawings, the support module includes a levitation unit, a rotation shaft unit, and a levitation control unit;
the suspension unit comprises a prism rod 18 and a fixed circular sleeve 17, the prism rod 18 is provided with a preset number of prism side faces, each prism side face is embedded with a suspension permanent magnet, and the fixed circular sleeve 17 surrounds the prism rod 18; the axis of the fixed round sleeve 17 is collinear with the axis of the preset space; in particular, the suspension unit can be regarded as a fixed structure, the prismatic rod 18 is used for being supported by the outside through the magnetic field, and the fixed circular sleeve 17 is matched with the matching sliding sleeve 16. The magnets arranged on the side surfaces of each prism are permanent magnets, and the arrangement reason is that in order to prevent vibration transmission and heat generation, electromagnets with better controllability cannot be used, so that the permanent magnets are adopted, and connection of circuits and heat generation reduction can be avoided. Specifically, the overall gravity center of the suspension unit is required to fall on a preset spatial axis, so that the rotary motion is more balanced and convenient to control.
The rotating shaft unit comprises a matching sliding sleeve 16, the matching sliding sleeve 16 is arranged outside the fixed round sleeve 17 and is in rotating fit with the fixed round sleeve 17, and one end of the matching sliding sleeve 16 is fixedly connected with the reflector 10; specifically, the reflector 10 determines its rotation axis based on the matching sliding sleeve 16, and the matching sliding sleeve 16 is matched on the fixed round sleeve 17 and can rotate relatively with the fixed round sleeve 17.
The levitation control unit comprises control rings 15, the cross-sectional inner contour shape of each control ring 15 is a regular polygon in accordance with the preset number, each control ring 15 is provided with inner wall surfaces in accordance with the preset number, and each inner wall surface is provided with a levitation electromagnet; the control ring 15 surrounds the outside of the matching sliding sleeve 16, and based on the matching of the suspension electromagnet and the suspension permanent magnet, the prism rod 18, the fixed circular sleeve 17 and the matching sliding sleeve 16 are suspended in the matching sliding sleeve 16. The suspension control unit is a component structure positioned outside the suspension unit and the rotating shaft unit, and has the main function of suspending the suspension unit in the air through a magnetic field so as to avoid positioning and fixing the suspension unit in a mechanical connection mode. The suspension electromagnets on each surface of the control ring 15 and the suspension permanent magnets on the side surfaces of each prism are correspondingly arranged, and the suspension positions of the prisms are cooperatively controlled through multidirectional acting forces. The beneficial effects of this embodiment have mainly been in having avoided the transmission of outside vibrations, when vibrations transmission takes place, can adjust fast through magnetic field, and the sensitive precision of its control is higher and fast than the precision of physical contact control.
It should be noted that, in order to meet the implementation conditions, a corresponding magnetic field blocking structure may be added according to the needs of the prior art; in addition, in the aspect of material selection, the matching sliding sleeve 16 and the fixed round sleeve 17 are preferably made of ceramic materials with better performance, so that the transmission of a blocking magnetic field is avoided, the matching sliding sleeve 16 and the fixed round sleeve 17 have mutual contact friction, and the ceramic materials can be used for well reducing the generation of heat and prolonging the service life of the matching sliding sleeve 16 and the fixed round sleeve 17.
Furthermore, in consideration of the stress uniformity of the reflection assembly, the number of the support modules is two, and the two support modules are symmetrically arranged about the reflector 10.
Further, although theoretically, the support module can meet the positioning requirement of the reflector 10 in the absence of external force, in practical implementation, photons also have kinetic energy, and therefore, the limitation of the reflector 10 in the axial direction needs to be considered.
Specifically, in the embodiment of the present invention, the support module further includes an axial limiting unit;
the axial limiting unit comprises a fixing ring 14 and a driven ring 13, the fixing ring 14 and the driven ring 13 are arranged in a right-facing mode along the direction of the axis of the preset space, the fixing ring 14 and the control ring 15 are fixed in relative positions, and the driven ring 13 and the matching sliding sleeve 16 are fixed in relative positions; an axial electromagnet is arranged on the fixed ring 14, and an axial permanent magnet is arranged on the driven ring 13; the position of the mirror 10 on the preset spatial axis remains stable based on the magnetic field coordination of the axial electromagnets and axial permanent magnets in each set of support modules.
Specifically, in the embodiment of the present invention, since there are many positions for fixing, the fixing positions of the fixing ring 14 and the driven ring 13 cannot be purely defined, and theoretically, any embodiment may be adopted in which the relative positions of the fixing ring 14 and the control ring 15 are fixed and the relative positions of the driven ring 13 and the mating sliding sleeve 16 are fixed. Based on the aforementioned differences between the electromagnets and the permanent magnets and their advantages and disadvantages, in the embodiment of the present invention, the fixing ring 14 is provided with an axial electromagnet, and the driven ring 13 is provided with an axial permanent magnet. In an alternative embodiment, the fixing ring 14 is continuously distributed with a plurality of axial electromagnets along the circumferential direction, correspondingly, the driven ring 13 is distributed with a corresponding number of even denser axial permanent magnets along the circumferential direction, and the axial driving and positioning effects can be achieved through the repulsion effect of the magnetic field.
Further, in order to maintain the stability of the rotation and prevent the problem of difficult control of the spatial position caused by the shift of the center of gravity, in the embodiment of the present invention, the rotating assembly further includes a counterweight module 11; the counterweight module 11 is disposed on the reflector 10, and the overall center of gravity of the reflector 10 and the counterweight module 11 is located on the preset spatial axis.
Further, in order to maintain the stability of the rotating speed, the rotating assembly further comprises an inertia module; the inertia module comprises an inertia disc 12, the inertia disc 12 is fixedly connected with the reflector 10, and the axis of the inertia disc 12 is collinear with the axis of the preset space. The inertia disc 12 has a relatively large mass, and can maintain a relatively stable rotating speed under the inertia of rotation, so that the difficulty of controlling the rotating speed is reduced.
Specifically, with respect to the rotation of the mirror 10, the rotating assembly further includes a driving module; the driving module comprises a contact driving unit and a non-contact driving unit;
the inertia turntable is driven to a preset rotating speed based on the contact driving unit, and the inertia turntable is driven to keep the preset rotating speed based on the non-contact driving unit.
Specifically, due to the magnitude relationship of the driving force, the uniform-speed rotation driving of the reflecting mirror 10 needs to be performed in two steps, and firstly, the inertia turntable is driven to a preset rotating speed through a contact driving unit in a direct force transmission manner; then, the inertia turntable is driven by the non-contact driving unit to keep the preset rotating speed, so that on one hand, energy lost due to friction can be supplemented, and on the other hand, the transmission of vibration can be avoided.
Fig. 5 is a schematic diagram of an embodiment of the driving module, in which the disc 12 has engaging teeth on its outer periphery, and the engaging teeth are used for contact driving of the contact driving unit. Basically, the gear transmission is a rotation transmission structure with high transmission efficiency, and correspondingly, meshing teeth are arranged on the periphery of the disc 12, so that the disc 12 can be driven by an external contact driving unit. Specifically, the external contact driving unit may be a driving gear 7, and the driving gear 7 is engaged with the turntable to realize transmission.
Furthermore, a driving permanent magnet is embedded in the side wall of each meshing tooth in the same side direction; the non-contact driving unit comprises a driving electromagnet, and the non-contact driving unit drives the inertia turntable to keep the preset rotating speed based on the matching of the driving electromagnet and the driving permanent magnet.
Specifically, the meshing teeth are provided with driving permanent magnets for realizing the function that the non-contact driving unit drives the inertia turntable to keep the preset rotating speed, correspondingly, the external non-contact driving unit can be a magnetic gear 8, and each tooth of the magnetic gear 8 is provided with a rotating electromagnet; the magnetic gear 8 and the meshing teeth of the disc 12 are in a non-contact relationship, and when the inertia rotary table keeps the preset rotating speed, the magnetic gear 8 needs to keep a matched rotating speed, so that each tooth of the magnetic gear 8 can periodically fall between two adjacent meshing teeth of the disc 12, and the rotating speed of the disc 12 is maintained to be constant by supplying energy to the disc 12 through a magnetic field of a rotating electromagnet. Accordingly, the control is performed on the premise that the rotation speed of the disc 12 needs to be monitored, and the rotation speed monitoring of the disc 12 can be performed by non-contact measurement in the prior art.
Further, in conjunction with the schematic structure shown in fig. 2, in an alternative embodiment, the driving gear 7 and the magnetic gear 8 may be disposed on the same driving shaft, the driving of the driving shaft is realized by the motor 6, and the position correspondence between the driving gear 7 and the magnetic gear 8 and the turntable is realized by a switch (essentially, a sliding switch mechanism 9) similar to a transmission.
The working principle of the exposure machine provided by the embodiment of the invention is as follows: the position of the reflector 10 is limited in the longitudinal direction and the axial direction, wherein the longitudinal limit is realized by using a suspension unit, a rotating shaft unit and a suspension control unit in the supporting module, the suspension control unit controls and keeps the suspension of the suspension unit through a multidirectional magnetic field, and the rotating shaft unit rotates by taking the suspension unit as a fixed shaft, so that the transmission and the interference of vibration can be avoided; the axial positioning is realized through an axial limiting unit, and the axial position of the reflector 10 is controlled by the magnetic field of the axial limiting units at two sides of the reflector 10 in a combined manner so as to avoid the transmission and interference of vibration; the driving and the rotating speed maintaining of the reflecting mirror 10 are realized through a driving module, the driving module comprises a two-part driving structure, wherein a contact driving unit drives the reflecting mirror 10 to reach a preset rotating speed in a direct contact force transmission mode, then lost energy of the reflecting mirror 10 is supplemented in a non-contact mode through a non-contact driving unit, and in a rotating speed maintaining stage, the driving force is sourced from the non-contact driving unit, so that the embodiment avoids the transmission and the interference of vibration; the exposure machine replaces one group of reflection assemblies in the front light path module with a rotating assembly, and replaces the radioactivity of a fixed posture with a periodically rotating reflector 10, so that the function of periodically cutting off and controlling light of a continuous light source is realized; in the rotating process of the reflector 10, each reflecting surface 19 is periodically and sequentially in the correct state according to the rotating speed to play a role, in unit time, the light path (energy) processed by each reflecting surface 19 is reduced, the requirement on the material manufacturing of the reflector 10 is greatly reduced, the requirement on the rotating speed of the reflector 10 is greatly reduced, and the whole manufacturing cost of the exposure machine is favorably reduced.
The exposure machine provided by the embodiment of the present invention is described in detail above, and the principle and the embodiment of the present invention are explained by applying a specific example herein, and the description of the above embodiment is only used to help understanding the method and the core idea of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (5)
1. An exposure machine comprises a light source, a preposed light path module, a postposition light path module, a mask module and a processing platform module, wherein processing laser emitted by the light source reaches the processing platform module after being processed by the preposed light path module, the mask module and the postposition light path module in sequence,
the prepositive light path module comprises more than two stages of reflecting components, wherein one stage of reflecting component in the more than two stages of reflecting components is a rotating component;
the rotating assembly comprises a reflector, a support module, an inertia module and a driving module, wherein the reflector rotates around a preset space axis;
the reflector is provided with at least one reflecting surface for laser light path processing;
in the process that the reflector rotates around the preset space axis, the reflector has at least one correct posture, and in the correct posture, one reflecting surface of the reflector faces to a preset direction;
the supporting module comprises a suspension unit, a rotating shaft unit, a suspension control unit and an axial limiting unit;
the suspension unit comprises prism rods and fixed round sleeves, the prism rods are provided with prism side faces in a preset number, each prism side face is embedded with a suspension permanent magnet, and the fixed round sleeves surround the prism rods;
the axis of the fixed round sleeve is collinear with the axis of the preset space;
the rotating shaft unit comprises a matching sliding sleeve, the matching sliding sleeve is arranged outside the fixed round sleeve and is in rotating fit with the fixed round sleeve, and one end of the matching sliding sleeve is fixedly connected with the reflector;
the suspension control unit comprises control rings, the inner contour shapes of the cross sections of the control rings are regular polygons of which the number is consistent with the preset number, the control rings are provided with inner wall surfaces of which the number is consistent with the preset number, and each inner wall surface is provided with suspension electromagnets;
the control ring surrounds the matching sliding sleeve, and based on the matching of the suspension electromagnet and the suspension permanent magnet, the prism rod, the fixed circular sleeve and the matching sliding sleeve are suspended in the control ring;
the axial limiting unit comprises a fixing ring and a driven ring, the fixing ring and the driven ring are arranged oppositely along the axis direction of the preset space, the fixing ring and the control ring are fixed in relative positions, and the driven ring and the matching sliding sleeve are fixed in relative positions;
the fixed ring is provided with an axial electromagnet, and the driven ring is provided with an axial permanent magnet;
the position of the reflector on the preset space axis is kept stable based on the magnetic field matching of the axial electromagnet and the axial permanent magnet in each group of support modules;
the inertia module comprises an inertia disc, the inertia disc is fixedly connected with the reflector, and the axis of the inertia disc is collinear with the axis of the preset space;
the driving module comprises a contact driving unit and a non-contact driving unit;
the inertia turntable is driven to a preset rotating speed based on the contact driving unit, and the inertia turntable is driven to keep the preset rotating speed based on the non-contact driving unit.
2. Exposure machine according to claim 1, wherein the number of support modules is two, the two groups of support modules being arranged symmetrically with respect to the mirror.
3. Exposure machine according to claim 1, wherein the rotation assembly further comprises a counterweight module;
the counterweight module is arranged on the reflector and enables the integral gravity center of the reflector and the counterweight module to be positioned on the preset space axis.
4. Exposure machine according to claim 1, characterised in that the disc has meshing teeth on its periphery for contact-driven by the contact-drive unit.
5. The exposure apparatus according to claim 4, wherein a driving permanent magnet is embedded in a side wall of each of said engaging teeth in the same side direction;
the non-contact driving unit comprises a driving electromagnet, and the non-contact driving unit drives the inertia turntable to keep the preset rotating speed based on the matching of the driving electromagnet and the driving permanent magnet.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210611262.6A CN114779590B (en) | 2022-06-01 | 2022-06-01 | Exposure machine |
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| CN202210611262.6A CN114779590B (en) | 2022-06-01 | 2022-06-01 | Exposure machine |
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| CN114779590A CN114779590A (en) | 2022-07-22 |
| CN114779590B true CN114779590B (en) | 2022-11-29 |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5673134A (en) * | 1994-07-15 | 1997-09-30 | Sony Corporation | Light exposure and illuminating apparatus |
| JPH11153769A (en) * | 1997-11-20 | 1999-06-08 | Sanyo Electric Co Ltd | Rotor device for polygon mirror motor |
| JP2000338432A (en) * | 1999-05-31 | 2000-12-08 | Dainippon Screen Mfg Co Ltd | Laser exposure device and its method |
| CN201138394Y (en) * | 2007-12-17 | 2008-10-22 | 建凖电机工业股份有限公司 | Rotary polygon mirror counter weight construction of colorful laser printer |
| CN101300528A (en) * | 2005-09-07 | 2008-11-05 | 富士胶片株式会社 | Pattern exposure method and pattern exposure apparatus |
| CN201340481Y (en) * | 2009-01-16 | 2009-11-04 | 深圳市斯尔顿科技有限公司 | Multi-faced reflector device |
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2022
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|---|---|---|---|---|
| US5673134A (en) * | 1994-07-15 | 1997-09-30 | Sony Corporation | Light exposure and illuminating apparatus |
| JPH11153769A (en) * | 1997-11-20 | 1999-06-08 | Sanyo Electric Co Ltd | Rotor device for polygon mirror motor |
| JP2000338432A (en) * | 1999-05-31 | 2000-12-08 | Dainippon Screen Mfg Co Ltd | Laser exposure device and its method |
| CN101300528A (en) * | 2005-09-07 | 2008-11-05 | 富士胶片株式会社 | Pattern exposure method and pattern exposure apparatus |
| CN201138394Y (en) * | 2007-12-17 | 2008-10-22 | 建凖电机工业股份有限公司 | Rotary polygon mirror counter weight construction of colorful laser printer |
| CN201340481Y (en) * | 2009-01-16 | 2009-11-04 | 深圳市斯尔顿科技有限公司 | Multi-faced reflector device |
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| CN114779590A (en) | 2022-07-22 |
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