CN115430916A - Method and system for preparing micro-nano structure based on laser of matching layer - Google Patents

Method and system for preparing micro-nano structure based on laser of matching layer Download PDF

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CN115430916A
CN115430916A CN202211128295.1A CN202211128295A CN115430916A CN 115430916 A CN115430916 A CN 115430916A CN 202211128295 A CN202211128295 A CN 202211128295A CN 115430916 A CN115430916 A CN 115430916A
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micro
laser
nano structure
nano
film
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CN115430916B (en
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江绍基
李锐豪
黄敏
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Sun Yat Sen University
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Sun Yat Sen University
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Optics & Photonics (AREA)
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  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)

Abstract

The invention discloses a method and a system for preparing a micro-nano structure by laser based on a matching layer, wherein the method comprises the following steps: forming a thin film by coating a matching material on a surface of a substrate; focusing laser light generated by a laser on the surface of the thin film; placing the substrate coated with the matching material on a moving scanning platform to control the scanning direction of the laser on the surface of the film; adjusting the processing parameters of a laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; and adjusting processing parameters to change the unit area laser power density to form an erasable micro-nano structure or a permanent micro-nano structure, and erasing the erasable micro-nano structure and the residual matching layer by ultrasonic cleaning in a specific solvent. The invention realizes the preparation of the micro-nano structure under the condition of not damaging the base material, generates the micro-nano structure such as regular grating and the like on the surface of the noble metal for the first time, and can be applied to the fields of surface coloring, multiple anti-counterfeiting, information encryption and the like.

Description

Method and system for preparing micro-nano structure based on laser of matching layer
Technical Field
The invention relates to the technical field of micro-nano structure preparation, in particular to a method and a system for preparing a micro-nano structure based on laser of a matching layer and the micro-nano structure.
Background
The surface micro-nano structure processing can improve or endow the material surface with some novel characteristics, such as wettability, optical characteristics, frictional wear performance and the like. Compared with a random micro-nano structure on the surface, the ordered periodic micro-nano structure has strong repeatability in production and preparation, and the surface performance can be deduced according to the structural parameters. In order to realize the preparation of the periodic micro-nano structure, various micro-nano processing technologies are developed. The laser surface micro-nano preparation technology has the advantages of wide applicable materials, flexibility, high efficiency, environmental friendliness and the like, and becomes one of the common micro-nano preparation technologies.
The laser direct writing technology is a technology for directly preparing a micro-nano structure on the surface of a base material by using a focused laser beam, and when the laser flux exceeds the damage threshold of a material, the micro-nano structure consistent with a laser scanning path can be generated. The laser induced periodic surface structure technology is one of simple and convenient laser preparation technologies for preparing periodic microstructures, and can directly induce periodic micro-nano structures on the surface of a material through laser irradiation. The laser interference direct writing technology can prepare linear, porous and even more complex periodic structures by adjusting the interference arrangement of two or more coherent light beams.
The prior art has the following defects: laser direct writing techniques are generally limited in accuracy by diffraction limits and are inefficient to process. Laser induced periodic surface structure techniques are not applicable to all materials and have proven difficult to produce on noble metals such as gold and silver. The optical devices required by the laser interference direct writing technology are complex and high in cost. The existing technology for preparing the micro-nano structure by laser is to directly prepare the micro-nano structure on the surface of a material, so that the material is damaged, and the prepared homogeneous micro-nano structure can not be repeatedly erased.
Disclosure of Invention
The invention provides a method and a system for preparing a micro-nano structure by laser based on a matching layer, which are used for solving the technical problems that the existing technology for preparing the micro-nano structure by laser damages a base material and the same micro-nano structure cannot be repeatedly erased, realizing the preparation of an erasable micro-nano structure and avoiding damaging the base material.
In order to solve the technical problem, in a first aspect, an embodiment of the present invention provides a method for preparing a micro-nano structure based on a laser of a matching layer, where the method includes:
forming a thin film by coating a matching material on a surface of a substrate;
focusing laser light generated by a laser on the surface of the thin film;
placing the substrate coated with the matching material on a moving scanning platform, and controlling the scanning direction of the laser on the surface of the film through the moving scanning platform;
adjusting the processing parameters of the laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; adjusting the processing parameters to change the unit area laser power density processing window to form an erasable micro-nano structure or a permanent micro-nano structure;
and carrying out ultrasonic cleaning on the prepared micro-nano structure in a specific solvent.
Compared with the existing technology for preparing the micro-nano structure on the material body, the method has the advantages that the matching material is coated to form the film, namely the matching layer, and the micro-nano structure is prepared on the matching layer, so that the damage to the base material is avoided, meanwhile, the local high temperature generated in the laser processing is controlled, the physicochemical property of the matching material is changed, the micro-nano structure is endowed with the erasable or non-erasable (namely permanent) characteristic, the ultrasonic cleaning is carried out in different specific solvents without damaging the base material, and the residual matching layer or the erasable micro-nano structure is selectively removed.
In a further embodiment, the adjusting the processing parameter to change the laser power density per unit area processing window to form an erasable micro-nano structure or a permanent micro-nano structure includes:
and adjusting the processing parameter of the laser to be a first processing parameter, so that the light field reaches a first unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film, and the erasable micro-nano structure is prepared.
In a further embodiment, the adjusting the processing parameter to change the laser power density per unit area processing window to form an erasable micro-nano structure or a permanent micro-nano structure includes:
and adjusting the processing parameter of the laser to be a second processing parameter to enable the light field to reach a second unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film so as to prepare the permanent micro-nano structure.
The first unit area laser power density processing window is different from the second unit area laser power density processing window, the first unit area laser power density processing window and the second unit area laser power density processing window have different modification degrees on matched materials, and an erasable micro-nano structure and a permanent micro-nano structure are correspondingly prepared respectively. And the energy of the first unit area laser power density processing window and the second unit area laser power density processing window is smaller than the damage threshold of the base material, so that the damage of the laser to the base material is avoided.
In a further embodiment, the first and second processing parameters each comprise a laser fluence and an effective pulse number.
In a further embodiment, the matching material is a material with partially transmissive, partially absorbing laser light properties.
The laser partially transmits on the interface of the substrate-matching layer, and the generated plasmon and interference effect determine the periodic electric field distribution, so that a periodic temperature field is generated; the matching material absorbs part of laser energy, and a periodic micro-nano structure is generated on the matching layer under the condition that the local electric field or temperature peak value of the periodic electric field and the temperature field exceeds the damage threshold value of the matching material, the modification degree of the matching material is determined by the amount of the absorbed laser energy, and an erasable micro-nano structure or a permanent micro-nano structure is further generated.
In a second aspect, the embodiment of the invention provides a micro-nano structure, and the micro-nano structure is prepared by any one of the methods for preparing the micro-nano structure based on the laser of the matching layer.
In a further embodiment of the second aspect, the periodic micro-nano structure is a micro-nano grating, and the period is 950-1020nm.
The period of the micro-nano grating is smaller than the wavelength of the laser, namely Λ is smaller than λ (Λ is the period of the micro-nano grating, λ is the laser wavelength), the laser condition can be changed even to reach a deep sub-wavelength region, namely Λ is smaller than λ/2, a plurality of wire grids can be prepared on the matching layer in a light spot under the direct irradiation of the laser, for example, dozens or even hundreds of micro-nano gratings can be generated at one time under the irradiation of a laser light spot with the diameter of 100 mu m, and the preparation efficiency of the micro-nano structure is improved.
In a further embodiment of the second aspect, the substrate is a metal, a semiconductor, or a dielectric.
The type of the base material is not limited, the laser can partially transmit on the interface of the base material and the matching layer to generate a periodic electric field and a temperature field, and the problem that a periodic micro-nano structure cannot be generated on noble metals such as gold and silver in a laser direct irradiation mode in the prior art can be well solved.
In a third aspect, an embodiment of the present invention provides a system for preparing a micro-nano structure by using laser based on a matching layer, where the system includes: a coating unit, a laser processing unit and an ultrasonic cleaning unit, wherein,
the coating unit is used for coating a matching material on the surface of the substrate to form a film;
the laser processing unit comprises a laser, a focusing lens and a moving scanning platform;
the laser is used for generating laser and focusing on the surface of the thin film; adjusting the processing parameters of the laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; adjusting the processing parameters to change the unit area laser power density processing window to form an erasable micro-nano structure or a permanent micro-nano structure; the focusing lens is used for focusing laser on the surface of the thin film; the motion scanning platform is used for bearing the substrate which is coated with the matching material so as to control the scanning direction of the laser on the surface of the film;
and the ultrasonic cleaning unit is used for carrying out ultrasonic cleaning on the micro-nano structure in a specific solvent.
The embodiment of the invention provides a method and a system for preparing a micro-nano structure by laser based on a matching layer. Coating a matching material on the surface of a base material to form a thin film, irradiating the thin film on the surface of the material by laser to prepare a periodic micro-nano structure, and adjusting the processing parameters of the laser to form an erasable micro-nano structure and a permanent micro-nano structure. Compared with the existing technology for preparing the micro-nano structure by laser, the method is strong in universality, compatible with various coating technologies, suitable for various base materials, capable of preparing the repeatedly-erased micro-nano structure under the condition of not damaging the base materials, and applicable to the fields of surface coloring, anti-counterfeiting, information encryption and the like.
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Fig. 1 is a schematic diagram of steps of a method for preparing a micro-nano structure by laser based on a matching layer according to an embodiment of the invention;
fig. 2 is a schematic flow chart of a method for preparing a micro-nano structure by laser based on a matching layer according to an embodiment of the present invention;
fig. 3 is a schematic diagram of a system for preparing a micro-nano structure by laser based on a matching layer according to an embodiment of the present invention;
fig. 4 is a micro-nano structure pattern prepared on a gold plate with a thickness of 1mm and an area of 3cm × 3cm by using the method and system for preparing a micro-nano structure by using laser based on a matching layer according to the embodiment of the invention;
fig. 5 is a scanning electron microscope result diagram of a micro-nano structure prepared on a gold surface by a method and a system for preparing a micro-nano structure by laser based on a matching layer according to an embodiment of the present invention;
fig. 6 shows a large-area micro-nano structure prepared on a nickel, copper, silver, gold plate with a thickness of 1mm and an area of 2.5cm × 2.5cm by using the method and system for preparing a micro-nano structure by using laser based on a matching layer according to an embodiment of the present invention, which shows a rainbow color pattern of "zhongshan university";
Detailed Description
The embodiments of the present invention will be described in detail below with reference to the accompanying drawings, which are given for illustrative purposes only and are not to be construed as limiting the invention, and the drawings are included for reference and illustrative purposes only and are not to be construed as limiting the scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example one
Referring to fig. 1 and 2, in an embodiment of the present invention, a method for preparing a micro-nano structure by using laser based on a matching layer is provided, where the method includes the following steps S1 to S5:
s1, coating a matching material on the surface of a base material to form a film.
S2, focusing laser generated by a laser on the surface of the film.
And S3, placing the base material coated with the matching material on a motion scanning platform, and controlling the scanning direction of the laser on the surface of the film through the motion scanning platform.
S4, adjusting the processing parameters of the laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; and adjusting the processing parameters to change the unit area laser power density processing window so as to form an erasable micro-nano structure or a permanent micro-nano structure.
S5, carrying out ultrasonic cleaning on the prepared micro-nano structure in a specific solvent.
In the embodiment of the invention, in order to solve the problem that the existing laser micro-nano structure preparation technology damages the base material, the matching material is coated on the surface of the base material to form a film, the film formed on the base material by the matching material is used as a material layer of the laser micro-nano structure, and the micro-nano structure is prepared under the condition of not damaging the base material, wherein the base material is not limited in type and can be metal, semiconductor or dielectric medium. The matching material is selected from materials which partially transmit and partially absorb laser, and at least comprises marking pen ink, metal chromium, polystyrene and the like, wherein the main pigment components of the marking pen ink at least comprise carbon black, aniline black, lithopone, lemon yellow, scarlet powder, phthalocyanine blue and the like. The laser partially transmits on the interface of the substrate-matching layer, and the generated plasmon and interference effect determine the periodic electric field distribution, so that a periodic temperature field is generated; the matching material absorbs part of laser energy, and the periodic electric field and the local electric field of the temperature field or the temperature peak value exceed the damage threshold of the matching material, so that the temperature is increased, melted and modified, and the periodic micro-nano structure is etched on the matching layer without damaging the surface of the base material.
It should be noted that, because different materials have different optical properties, for different base materials and matching materials, the wavelength, pulse width and repetition frequency of the light source of the laser can be adjusted according to the absorption peak of the material spectrum, and appropriate laser parameters are selected to improve the quality of the laser for preparing the micro-nano structure.
In the embodiment of the present invention, the coating method includes, but is not limited to, a physical vapor deposition method, a chemical vapor deposition method, a spin coating method, a manual coating method, and the coating tool includes, but is not limited to, a magnetron sputtering coater, an electron beam coater, a spin coater, an electroless plating apparatus, a marker pen, a stamp, a brush, and the like. In a preferred embodiment of the invention, the coating process is a hand coating process and the coating tool is a marker.
In the embodiment of the invention, in order to obtain the micro-nano structure on the basis of protecting the base material from being damaged, the micro-nano structure is formed on the matching material coated on the surface of the base material by utilizing a laser irradiation technology. The method comprises the steps of firstly expanding laser beams by using a beam expander, improving the quality of the light beams, focusing the expanded laser beams on the surface of a film through a focusing lens, and adjusting the processing parameters of a laser. The processing parameters include a first processing parameter and a second processing parameter, and the first processing parameter and the second processing parameter both include a laser flux and an effective pulse number. Referring to fig. 2, the processing parameter of the laser is adjusted to be a first processing parameter, so that the optical field reaches a first unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film, so as to prepare the erasable micro-nano structure. Such erasable micro-nano structures can be removed by a specific solvent in an ultrasonic cleaning process. And adjusting the processing parameter of the laser to be a second processing parameter to enable the light field to reach a second unit area laser power density processing window for generating the periodic micro-nano structure on the surface of the film so as to prepare the permanent micro-nano structure. Such permanent micro-nano structures are not removed by a specific solvent in the ultrasonic cleaning treatment.
For a specific solvent, selecting according to the dissolving characteristics of the matching layer and the erasable micro-nano structure, and if the prepared micro-nano structure comprises the erasable micro-nano structure and the permanent micro-nano structure, and the erasable micro-nano structure and the permanent micro-nano structure are required to be reserved, selecting a solvent which can dissolve the rest matching layer but can not damage the erasable micro-nano structure; and if the prepared micro-nano structure and the permanent micro-nano structure are utilized to perform anti-counterfeiting, selecting a solvent capable of dissolving the erasable micro-nano structure.
Example two
Correspondingly, referring to fig. 3, an embodiment of the present invention further provides a system for laser preparation of a micro-nano structure based on a matching layer, where the system is used to execute the above-mentioned method for preparing a micro-nano structure, and the method includes: a coating unit 1, a laser processing unit 2, and an ultrasonic cleaning unit 3, wherein,
the coating unit 1 is used for coating matching materials on the surface of a substrate to form a film.
The laser processing unit 2 comprises a laser 201, a focusing lens 202 and a moving scanning platform 203;
the laser 201 is used for generating laser and focusing on the surface of the film; adjusting the processing parameters of the laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; adjusting the processing parameters to change the laser power density of the unit area so as to form an erasable micro-nano structure or a permanent micro-nano structure; the focusing lens 202 is used for focusing laser on the surface of the thin film; the moving scanning platform 203 is used for carrying the substrate with the matching material coating completed, so as to control the scanning direction of the laser on the surface of the film.
The ultrasonic cleaning unit 3 is used for carrying out ultrasonic cleaning on the micro-nano structure in a specific solvent.
YAG infrared nanosecond laser 201 is Nd, the wavelength is 1064nm, the pulse width is 10ns-50ns, the output pulse energy is 0.01mJ-0.15mJ, and the repetition frequency is 1kHz-10kHz; the focal length of the focusing lens 202 is 15cm, and the diameter of a focusing light spot is 100 micrometers; the period of the prepared micro-nano structure grating is about 1 mu m, and is specifically 950-1020nm. The motion scanning platform 203 is a stepping motor, the moving speed of the stepping motor is 0.1mm/s-0.6mm/s, and the filling space is 0.1mm-0.2mm. The stepping motor can be replaced by a galvanometer system to prepare a large-area micro-nano structure.
For specific limitation of a system for preparing a micro-nano structure by laser based on a matching layer, reference may be made to the above limitation on a method for preparing a micro-nano structure by laser based on a matching layer, and details are not repeated here. Those of ordinary skill in the art will appreciate that the various method steps described in connection with the embodiments disclosed herein can be implemented in a one-to-one correspondence of unit modules and hardware. The specific implementation depends on the specific application of the solution and on design constraints. Skilled artisans may implement the described functionality in varying ways for each particular application, but such implementation decisions should not be interpreted as causing a departure from the scope of the present application.
EXAMPLE III
According to the embodiment of the invention, by the method and the system for preparing the micro-nano structure by the laser based on the matching layer, the laser scanning processing of the grating type micro-nano structure is realized on the surface of the metal gold serving as the base material.
In this example, the coating method was a hand coating method, the coating tool was a marker, the substrate was gold metal, the thickness of the square gold sample material was 1mm, the side length was 3cm, and the matching material was a marker ink containing nigrosine as a main component. YAG infrared 1064nm nanosecond laser, 50ns pulse width, linearly polarized light, 15cm focal length of the focusing lens 202, 100 μm diameter of focusing spot, and 1.4J/cm laser flux in the first processing parameter 2 The effective pulse number is 250, and the laser flux is 1.3J/cm in the second processing parameter 2 The number of effective pulses was 5000. The specific solvent is absolute ethyl alcohol.
Correspondingly, referring to fig. 4, an alcoholic marker pen ink containing nigrosine is coated on the surface of a gold substrate to prepare a thin film, the pattern is "Light", a coated sample is placed on a moving scanning platform 203, the processing parameter of a laser 201 is adjusted to be a first processing parameter, laser emitted by the laser 201 can be expanded by a beam expander, the expanded laser passes through a focusing lens 202 and is focused on the gold substrate surface thin film which is coated, the moving scanning platform 203 is used for generating an erasable periodic micro-nano structure "gt" under the direct irradiation of the laser, at this time, a grating structure is engraved on the ink by plasmon (approximate sine type electric field distribution) of a laser-induced metal interface, and a matching material is not completely modified and can still be dissolved in absolute ethyl alcohol. And then the processing parameters of the laser 201 are adjusted to be second processing parameters, a permanent periodic micro-nano structure Lih is prepared, and the matching material is modified by a temperature peak value in a temperature field generated by a plasmon of a laser-induced metal interface to become a material insoluble in absolute ethyl alcohol. The scanning prepared micro-nano structure 'Light' has diffraction effect under white Light and shows rainbow color from red to purple. The Lih and the gt are permanent and erasable micro-nano structures respectively, and only the Lih and the gt are left to be erased after absolute ethyl alcohol ultrasonic cleaning.
The surface morphology of the grating type micro-nano structure prepared in this embodiment is characterized by a scanning electron microscope, referring to fig. 5, the period of the grating type micro-nano structure prepared in this embodiment is about 1 μm, and is between 950 nm and 1020nm.
In the embodiment of the invention, the laser colorization function of the handwritten pattern can be realized, a mark pen is directly used for coating on the surface of the noble metal, and the micro-nano structure is prepared and generated by using the method and the system for preparing the micro-nano structure based on the laser of the matching layer, so that the color pattern with the diffraction characteristic can be formed. Can be applied to: 1. in the creation of artistic works, if the laser irradiation is not satisfactory and has a modification space, the local unsatisfactory place can be wiped off by alcohol to be redrawn. 2. Anti-counterfeiting: the color micro-nano structure is prepared on the noble metal, and if the color micro-nano structure is a genuine product, the color micro-nano structure can be completely dissolved in a specific solvent, so that the color micro-nano structure is proved to be a unique genuine product, and the imitated product does not have the technology. As with the personalized signature, the uniqueness of the hand-drawn pattern ensures its unique anti-counterfeiting authentication. 3. Encryption: hiding real information, for example, in fig. 4, light is false information, real information is "Light", and the information receiver dissolves the false information with a specific solvent and displays the real information. If the thief cracks the information midway, the receiver can see the information and also understand that the encrypted information is damaged midway.
Example four
According to the method and the system for preparing the micro-nano structure by the laser based on the matching layer, the laser scanning processing of the grating type micro-nano structure is realized on the surface of the substrate which is metal nickel, copper, silver and gold.
In this example, the coating method was a manual coating method, the coating tool was a marker, the substrate was metallic nickel, copper, silver, gold, the thickness of the square sample material was 1mm, the side length was 2.5cm, and the matching material was a marker ink containing nigrosine as a main component. YAG infrared 1064nm nanosecond laser is adopted as the laser 201, the pulse width is 50ns, linearly polarized light is adopted, the focal length of the focusing lens 202 is 15cm, and the diameter of a focusing spot is 100 micrometers. The laser flux and the number of effective pulses are respectively: [0.57J/cm ] 2 ,5000](Nickel) [0.89J/cm ] 2 ,4000](copper), [0.45J/cm 2 ,20000](silver), [0.89J/cm 2 ,5000](gold). Correspondingly, the prepared 'middle' is an erasable micro-nano structure, and the 'mountain', 'big', 'school' is a permanent micro-nano structure.
Correspondingly, referring to fig. 6, an alcohol marker ink containing nigrosine is coated on the surface of a nickel, copper, silver or gold substrate to prepare a thin film, the pattern is "zhongshan university", a coated sample is placed on a moving scanning platform 203, processing parameters of a laser 201 are adjusted, laser emitted from the laser 201 can be expanded by a beam expander, the expanded laser passes through a focusing lens 202 and then is focused on the surface of the coated nickel, copper, silver or gold substrate, and a large-area micro-nano structure is prepared by the moving scanning platform 203 under direct irradiation of the laser. The periodic micro-nano structure prepared by the method and the system for preparing the micro-nano structure based on the laser of the matching layer is a micro-nano grating, the period is about 1 mu m, diffraction is carried out under the irradiation of white light between 950 nm and 1020nm, and a rainbow color pattern of a red to purple rainbow color of Zhongshan university is displayed.
In summary, in the embodiment of the present invention, a matching material is coated on the surface of a substrate to form a thin film, and a laser irradiation technology is used to adjust the processing parameters of a laser, so that a light field reaches a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the thin film, thereby preparing a micro-nano structure. And forming an erasable micro-nano structure and a permanent micro-nano structure by adjusting different processing parameters of the laser. Compared with the prior art, the laser preparation micro-nano structure has the following advantages:
1. compared with the laser direct writing technology, the preparation precision of the invention is smaller than the laser wavelength scale, and the precision is higher.
2. Compared with the laser-induced periodic surface structure technology, the method can be widely applied to various materials, and particularly can be prepared on noble metal materials such as gold and silver.
3. Compared with a laser interference direct writing technology, the method can prepare the micro-nano structure on the surface of the base material through direct laser irradiation, and does not need a complex and expensive optical device to generate an interference light field to prepare the micro-nano structure.
4. According to the invention, the micro-nano structure is prepared on the matching layer under the condition of not damaging the base material, mild processing is realized, regular micro-nano gratings are generated on noble metal gold and silver by direct laser irradiation for the first time, the micro-nano structure can be repeatedly erased, and the erasable micro-nano structure has an information encryption characteristic.
5. The invention is compatible with various coating methods, various matching materials and base materials, the preparation mechanism does not limit the types of lasers, and the invention has universality.
6. The technical scheme of the invention is compatible with the preparation of digital patterns, can be applied to the creation of art works, and directly creates the art works such as signature, calligraphy, seal cutting, drawing and the like on the surface of the substrate by using a coating tool to carry out laser colorization on the patterns of the art works. The artwork processed by the embodiment of the invention has a colorful effect and can be permanently retained on the substrate, and the uniqueness and the color effect of the artwork enable the artwork to have extremely high anti-counterfeiting value.
The above-mentioned embodiments only express some preferred embodiments of the present invention, and the purpose, technical solutions and advantages of the present invention are further described in detail, it should be understood that the above-mentioned are only specific examples of the present invention, and are not used to limit the protection scope of the present invention. It should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (10)

1. A method for preparing a micro-nano structure based on laser of a matching layer is characterized by comprising the following steps:
forming a thin film by coating a matching material on a surface of a substrate;
focusing laser light generated by a laser on the surface of the thin film;
placing the substrate coated with the matching material on a moving scanning platform, and controlling the scanning direction of laser on the surface of the film through the moving scanning platform;
adjusting the processing parameters of the laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; adjusting the processing parameters to change the unit area laser power density processing window to form an erasable micro-nano structure or a permanent micro-nano structure;
and carrying out ultrasonic cleaning on the prepared micro-nano structure in a specific solvent.
2. The method for laser fabrication of micro-nano structures based on matching layers according to claim 1, wherein the adjusting the processing parameters to change the laser power density processing window per unit area to form erasable micro-nano structures or permanent micro-nano structures comprises:
and adjusting the processing parameter of the laser to be a first processing parameter, so that the light field reaches a first unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film, and the erasable micro-nano structure is prepared.
3. The method for laser fabrication of micro-nano structures based on matching layers according to claim 1, wherein the adjusting the processing parameters to change the laser power density processing window per unit area to form erasable micro-nano structures or permanent micro-nano structures comprises:
and adjusting the processing parameter of the laser to be a second processing parameter, so that the optical field reaches a second unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film, and the permanent micro-nano structure is prepared.
4. The method for preparing a micro-nano structure based on the laser of the matching layer according to claim 3, wherein the first processing parameter and the second processing parameter comprise laser flux and effective pulse number.
5. The method for preparing a micro-nano structure based on the laser of the matching layer according to claim 1, wherein the matching material is a material with partial transmission and partial laser absorption characteristics.
6. A micro-nano structure, characterized in that it is prepared by the method according to any of claims 1 to 5.
7. A micro-nano structure according to claim 6, wherein the periodic micro-nano structure is a micro-nano grating with a period of 950-1020nm.
8. A micro-nano structure according to claim 6, wherein the substrate is a metal, a semiconductor or a dielectric.
9. A system for preparing a micro-nano structure based on laser of a matching layer is characterized by comprising: a coating unit, a laser processing unit and an ultrasonic cleaning unit, wherein,
the coating unit is used for coating a matching material on the surface of the substrate to form a film;
the laser processing unit comprises a laser, a focusing lens and a moving scanning platform;
the laser is used for generating laser and focusing on the surface of the film; adjusting the processing parameters of the laser to enable the light field to reach a unit area laser power density processing window for generating a periodic micro-nano structure on the surface of the film; adjusting the processing parameters to change the unit area laser power density processing window to form an erasable micro-nano structure or a permanent micro-nano structure; the focusing lens is used for focusing laser on the surface of the thin film; the motion scanning platform is used for bearing the substrate which is coated with the matching material so as to control the scanning direction of the laser on the surface of the film;
and the ultrasonic cleaning unit is used for carrying out ultrasonic cleaning on the micro-nano structure in a specific solvent.
10. A system for preparing a micro-nano structure by laser based on a matching layer according to claim 8, wherein the wavelength of the laser is 1064nm, linearly polarized light is obtained, the pulse width is 10ns-50ns, the output pulse energy range is 0.01mJ-0.15mJ, and the frequency range is 1kHz-40kHz.
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