CN115425941A - Resonator, filter and electronic device - Google Patents

Resonator, filter and electronic device Download PDF

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Publication number
CN115425941A
CN115425941A CN202210912555.8A CN202210912555A CN115425941A CN 115425941 A CN115425941 A CN 115425941A CN 202210912555 A CN202210912555 A CN 202210912555A CN 115425941 A CN115425941 A CN 115425941A
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metal layer
edge region
bus bar
electrode fingers
electrode
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李天年
杜波
王华磊
倪建兴
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Ruishi Chuangxin Chongqing Technology Co ltd
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Ruishi Chuangxin Chongqing Technology Co ltd
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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02637Details concerning reflective or coupling arrays
    • H03H9/02685Grating lines having particular arrangements
    • H03H9/02724Comb like grating lines
    • H03H9/02732Bilateral comb like grating lines
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02818Means for compensation or elimination of undesirable effects
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/64Filters using surface acoustic waves

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

The application provides a resonator, a filter and electronic equipment, the resonator includes piezoelectric substrate, interdigital transducer and reflection configuration, and interdigital transducer includes first busbar, second busbar, a plurality of first electrode finger and a plurality of second electrode finger. The first electrode fingers are connected to the first bus bar and extend toward the second bus bar, and the second electrode fingers are connected to the second bus bar and extend toward the first bus bar. The interdigital transducer further includes at least one piston structure located on at least a portion of the first electrode finger, at least one of the piston structures located on the first electrode finger including two metal layers having different thicknesses, and at least one of the piston structures located on the second electrode finger including two metal layers having different thicknesses. Acoustic reflection is formed by changing the transmission speed of the acoustic wave signals on the piezoelectric substrate in the region where the two metal layers are located, so that the leakage of the acoustic wave signals is avoided, and the transverse mode of the resonator is further suppressed.

Description

谐振器、滤波器及电子设备Resonators, Filters and Electronics

技术领域technical field

本申请涉及通信技术领域,尤其涉及一种谐振器、一种具有该谐振器的滤波器以及一种具有该滤波器的电子设备。The present application relates to the technical field of communication, and in particular to a resonator, a filter with the resonator, and an electronic device with the filter.

背景技术Background technique

声表面波器件利用声-电换能器的特征对压电基片表面上传播的声信号进行处理。声表面波器件具有成本低、体积小和功能多等优点,因此在雷达、通信、导航、识别等领域获得了广泛的应用。声表面波器件主要是由压电基片上的多个叉指换能器(Interdigital Transducer,IDT),叉指换能器可将电信号转化为声信号或将声信号转化为电信号。其中,叉指换能器包括两个平行的汇流条以及垂直连接于汇流条的多个电极指。Surface acoustic wave devices use the characteristics of acoustic-electric transducers to process acoustic signals propagating on the surface of piezoelectric substrates. Surface acoustic wave devices have the advantages of low cost, small size and multiple functions, so they have been widely used in radar, communication, navigation, identification and other fields. The surface acoustic wave device is mainly composed of multiple interdigital transducers (Interdigital Transducer, IDT) on the piezoelectric substrate, and the interdigital transducer can convert electrical signals into acoustic signals or convert acoustic signals into electrical signals. Wherein, the IDT includes two parallel bus bars and a plurality of electrode fingers vertically connected to the bus bars.

声表面波器的高次横向模态(Transverse Mode)会引起声波泄漏,从而造成声能损耗,降低品质因数值。为抑制声表面波器的横向模态,通常在汇流条上增加假指或在电极指的端部增加活塞(piston)改变声表面波的声速分布。但通过增加假指或电极指的端部增加活塞的方式并不能完全抑制横向模态的激发。The high-order transverse mode (Transverse Mode) of the surface acoustic wave device will cause sound wave leakage, which will cause loss of sound energy and reduce the value of quality factor. In order to suppress the transverse mode of the surface acoustic wave device, dummy fingers are usually added to the bus bar or pistons are added to the ends of the electrode fingers to change the sound velocity distribution of the surface acoustic wave. However, the excitation of the transverse mode cannot be completely suppressed by adding a dummy finger or a piston at the end of the electrode finger.

因此,如何解决进一步地抑制横向模态的激发以避免声表面波泄漏是本领域技术人员亟待解决的问题。Therefore, how to further suppress the excitation of the transverse mode to avoid surface acoustic wave leakage is an urgent problem to be solved by those skilled in the art.

发明内容Contents of the invention

鉴于上述现有技术的不足,本申请的目的在于提供一种谐振器、一种具有该谐振器的滤波器以及一种具有该滤波器的电子设备,其旨在解决现有技术中由于声表面波泄漏导致声表面波器的品质因数值降低的问题。In view of the above-mentioned deficiencies in the prior art, the purpose of this application is to provide a resonator, a filter with the resonator and an electronic device with the filter, which aim to solve the problem of surface acoustics in the prior art. Wave leakage leads to a problem that the quality factor value of the surface acoustic wave device decreases.

为解决上述技术问题,本申请实施例提供一种谐振器,包括压电基片、位于所述压电基片上的叉指换能器以及设置于所述叉指换能器的相对两侧的反射结构,所述叉指换能器包括:In order to solve the above technical problems, an embodiment of the present application provides a resonator, including a piezoelectric substrate, an interdigital transducer located on the piezoelectric substrate, and A reflective structure, the interdigital transducer comprising:

相对设置的第一汇流条以及第二汇流条;the first bus bar and the second bus bar arranged oppositely;

多个第一电极指以及多个第二电极指,多个所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,多个所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸,多个所述第一电极指与多个所述第二电极指依次交替间隔排列;A plurality of first electrode fingers and a plurality of second electrode fingers, the plurality of first electrode fingers are connected to the first bus bar and extend toward the second bus bar, the plurality of second electrode fingers are connected to the second bus bar The second bus bar is connected to and extends toward the first bus bar, and a plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged in sequence;

设置于至少部分所述第一电极指上的至少一个活塞结构,所述活塞结构至少位于所述第一电极指背对所述第一汇流条的端部,设置于至少部分所述第二电极指上的至少一个活塞结构,所述活塞结构至少位于所述第二电极指背对所述第二汇流条的端部;At least one piston structure disposed on at least part of the first electrode fingers, the piston structure is at least located at the end of the first electrode finger facing away from the first bus bar, and disposed on at least part of the second electrode at least one piston structure on a finger, the piston structure is located at least at the end of the second electrode finger facing away from the second bus bar;

位于所述第一电极指上的所述活塞结构中的至少一个包括厚度不同的两个金属层,位于所述第二电极指上的所述活塞结构中的至少一个包括厚度不同的两个金属层。At least one of the piston structures on the first electrode finger includes two metal layers with different thicknesses, and at least one of the piston structures on the second electrode finger includes two metal layers with different thicknesses. Floor.

综上所述,本申请实施例提供的谐振器包括压电基片以及位于所述压电基片上的叉指换能器,所述叉指换能器包括第一汇流条、第二汇流条、多个第一电极指以及多个第二电极指。所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸。所述叉指换能器还包括设置于所述第一电极指上的至少一个活塞结构以及设置于所述第二电极指上的至少一个所述活塞结构,位于所述第一电极指上的活塞结构中的至少一个包括厚度不同的两个金属层,位于所述第二电极指上的活塞结构中的至少一个包括厚度不同的两个金属层。因此,本申请的谐振器通过在至少部分电极指上设置厚度不同的金属层,可以改变两个所述金属层所在的区域内的压电基片上的声波信号传输速度,形成声学反射,避免了声波信号泄漏,将声波信号限制在所述叉指换能器内,进而提高了对所述谐振器的横向模态的抑制。In summary, the resonator provided in the embodiment of the present application includes a piezoelectric substrate and an interdigital transducer located on the piezoelectric substrate, and the interdigital transducer includes a first bus bar, a second bus bar , a plurality of first electrode fingers and a plurality of second electrode fingers. The first electrode fingers are connected to the first bus bar and extend toward the second bus bar, and the second electrode fingers are connected to the second bus bar and extend toward the first bus bar. The IDT further includes at least one piston structure disposed on the first electrode finger and at least one piston structure disposed on the second electrode finger, and the piston structure disposed on the first electrode finger At least one of the piston structures includes two metal layers with different thicknesses, and at least one of the piston structures located on the second electrode finger includes two metal layers with different thicknesses. Therefore, the resonator of the present application can change the transmission speed of the acoustic wave signal on the piezoelectric substrate in the area where the two metal layers are located by arranging metal layers with different thicknesses on at least part of the electrode fingers, thereby forming acoustic reflection and avoiding Acoustic signal leakage confines the acoustic signal within the IDT, thereby improving suppression of transverse modes of the resonator.

在示例性实施方式中,位于所述第一电极指上的所述活塞结构中的至少一个包括相邻接且厚度不同的两个金属层,位于所述第二电极指上的所述活塞结构中的至少一个包括相邻接且厚度不同的两个金属层。或者,位于所述第一电极指上的所述活塞结构中的至少一个包括间隔预设距离且厚度不同的两个金属层,位于所述第二电极指上的所述活塞结构中的至少一个包括间隔预设距离且厚度不同的两个金属层。In an exemplary embodiment, at least one of the piston structures on the first electrode finger includes two adjacent metal layers with different thicknesses, and the piston structure on the second electrode finger At least one of them includes two adjacent metal layers of different thicknesses. Alternatively, at least one of the piston structures located on the first electrode finger includes two metal layers with a predetermined distance apart and different thicknesses, and at least one of the piston structures located on the second electrode finger It includes two metal layers separated by a preset distance and having different thicknesses.

在示例性实施方式中,多个所述第一电极指与多个所述第二电极指沿着所述第一汇流条和所述第二汇流条的延伸方向依次交替排列形成一交替区域,所述交替区域包括由所述第一汇流条指向所述第二汇流条的方向依次设置的第一边缘区域、第二边缘区域、中间区域、第三边缘区域以及第四边缘区域。In an exemplary embodiment, a plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged in sequence along the extending direction of the first bus bar and the second bus bar to form an alternating region, The alternating regions include a first edge region, a second edge region, a middle region, a third edge region and a fourth edge region which are sequentially arranged in a direction from the first bus bar to the second bus bar.

在示例性实施方式中,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括间隔设置的第一活塞结构与第二活塞结构,所述第一活塞结构包括第一金属层以及第二金属层,所述第二活塞结构包括第三金属层以及第四金属层。其中,所述第一金属层的厚度与所述第二金属层的厚度不同,所述第三金属层的厚度与所述第四金属层的厚度不同;所述第三金属层、所述第四金属层、所述第一金属层以及所述第二金属层沿着所述第一电极指的延伸方向依次位于所述第一边缘区域、所述第二边缘区域、所述第三边缘区域以及所述第四边缘区域,且所述第二金属层位于所述第一电极指背对所述第一汇流条的端部。所述第三金属层、所述第四金属层、所述第一金属层以及所述第二金属层沿着所述第二电极指的延伸方向依次位于所述第四边缘区域、所述第三边缘区域、所述第二边缘区域以及所述第一边缘区域,且所述第二金属层位于所述第二电极指背对所述第二汇流条的端部。In an exemplary embodiment, at least one piston structure disposed on at least part of the first electrode fingers and at least part of the second electrode fingers includes a first piston structure and a second piston structure arranged at intervals, and the first piston structure A piston structure includes a first metal layer and a second metal layer, and the second piston structure includes a third metal layer and a fourth metal layer. Wherein, the thickness of the first metal layer is different from the thickness of the second metal layer, and the thickness of the third metal layer is different from the thickness of the fourth metal layer; the third metal layer, the first metal layer The four metal layers, the first metal layer and the second metal layer are sequentially located in the first edge region, the second edge region, and the third edge region along the extending direction of the first electrode fingers. and the fourth edge region, and the second metal layer is located at the end of the first electrode finger facing away from the first bus bar. The third metal layer, the fourth metal layer, the first metal layer and the second metal layer are sequentially located in the fourth edge region, the first metal layer along the extending direction of the second electrode fingers. There are three edge regions, the second edge region and the first edge region, and the second metal layer is located at an end of the second electrode finger facing away from the second bus bar.

在示例性实施方式中,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括间隔设置的第一活塞结构以及第二活塞结构,所述第一活塞结构包括第一金属层,所述第二活塞结构包括第三金属层以及第四金属层,其中,所述第三金属层与所述第四金属层的厚度不同。所述第三金属层、所述第四金属层以及所述第一金属层沿着所述第一电极指的延伸方向依次位于所述第一边缘区域、所述第二边缘区域以及所述第三边缘区域;所述第三金属层、所述第四金属层以及所述第一金属层沿着所述第二电极指的延伸方向依次位于所述第四边缘区域、所述第三边缘区域以及所述第二边缘区域。In an exemplary embodiment, at least one piston structure disposed on at least a part of the first electrode fingers and at least a part of the second electrode fingers includes a first piston structure and a second piston structure arranged at intervals, the first piston structure A piston structure includes a first metal layer, and the second piston structure includes a third metal layer and a fourth metal layer, wherein the thickness of the third metal layer is different from that of the fourth metal layer. The third metal layer, the fourth metal layer and the first metal layer are sequentially located in the first edge region, the second edge region and the first electrode finger along the extending direction of the first electrode finger. Three edge regions; the third metal layer, the fourth metal layer, and the first metal layer are located in the fourth edge region, the third edge region in sequence along the extending direction of the second electrode fingers and the second edge region.

在示例性实施方式中,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括间隔设置的第一活塞结构以及第二活塞结构,所述第一活塞结构包括第二金属层,所述第二活塞结构包括第三金属层以及第四金属层,其中,所述第三金属层与所述第四金属层的厚度不同。所述第三金属层、所述第四金属层以及所述第二金属层沿着所述第一电极指的延伸方向依次位于所述第一边缘区域、所述第二边缘区域以及所述第四边缘区域,且所述第二金属层位于所述第一电极指背对所述第一汇流条的端部。所述第三金属层、所述第四金属层以及所述第二金属层沿着所述第二电极指的延伸方向依次位于所述第四边缘区域、所述第三边缘区域以及所述第一边缘区域,且所述第二金属层位于所述第二电极指背对所述第二汇流条的端部。In an exemplary embodiment, at least one piston structure disposed on at least a part of the first electrode fingers and at least a part of the second electrode fingers includes a first piston structure and a second piston structure arranged at intervals, the first piston structure A piston structure includes a second metal layer, the second piston structure includes a third metal layer and a fourth metal layer, wherein the thickness of the third metal layer is different from that of the fourth metal layer. The third metal layer, the fourth metal layer, and the second metal layer are sequentially located in the first edge region, the second edge region, and the first electrode finger along the extending direction of the first electrode finger. four edge regions, and the second metal layer is located at the end of the first electrode finger facing away from the first bus bar. The third metal layer, the fourth metal layer and the second metal layer are sequentially located in the fourth edge region, the third edge region and the first electrode finger along the extending direction of the second electrode finger. An edge region, and the second metal layer is located at the end of the second electrode finger facing away from the second bus bar.

在示例性实施方式中,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括第一活塞结构,所述第一活塞结构包括第一金属层以及第二金属层,其中,所述第一金属层的厚度与所述第二金属层的厚度不同。所述第一金属层以及所述第二金属层沿着所述第一电极指的延伸方向依次位于所述第三边缘区域以及所述第四边缘区域,且所述第二金属层位于所述第一电极指背对所述第一汇流条的端部。所述第一金属层以及所述第二金属层沿着所述第二电极指的延伸方向依次位于所述第二边缘区域以及所述第一边缘区域,且所述第二金属层位于所述第二电极指背对所述第二汇流条的端部。In an exemplary embodiment, at least one piston structure disposed on at least part of the first electrode fingers and at least part of the second electrode fingers each includes a first piston structure including a first metal layer And a second metal layer, wherein the thickness of the first metal layer is different from the thickness of the second metal layer. The first metal layer and the second metal layer are located in the third edge area and the fourth edge area in sequence along the extending direction of the first electrode fingers, and the second metal layer is located in the The first electrode refers to the end facing away from the first bus bar. The first metal layer and the second metal layer are located in the second edge area and the first edge area in sequence along the extending direction of the second electrode fingers, and the second metal layer is located in the The second electrode refers to the end facing away from the second bus bar.

在示例性实施方式中,位于所述第一边缘区域的金属层的厚度大于位于所述第二边缘区域的金属层的厚度,位于所述第四边缘区域的金属层的厚度大于位于所述第三边缘区域的金属层的厚度。In an exemplary embodiment, the thickness of the metal layer located in the first edge area is greater than the thickness of the metal layer located in the second edge area, and the thickness of the metal layer located in the fourth edge area is greater than the thickness of the metal layer located in the second edge area. The thickness of the metal layer in the tri-edge area.

在示例性实施方式中,位于所述第一边缘区域的金属层的长度与位于所述第二边缘区域的金属层的长度的比值为0.8至1.2,位于所述第四边缘区域的金属层的长度与位于所述第三边缘区域的金属层的长度的比值为0.8至1.2。In an exemplary embodiment, the ratio of the length of the metal layer located in the first edge area to the length of the metal layer located in the second edge area is 0.8 to 1.2, and the ratio of the length of the metal layer located in the fourth edge area The ratio of the length to the length of the metal layer located in the third edge region is 0.8 to 1.2.

在示例性实施方式中,位于所述第一边缘区域的金属层的宽度与位于所述第二边缘区域的金属层的宽度的比值为0.8至1.2,位于所述第四边缘区域的金属层的宽度与位于所述第三边缘区域的金属层的宽度的比值为0.8至1.2。In an exemplary embodiment, the ratio of the width of the metal layer located in the first edge area to the width of the metal layer located in the second edge area is 0.8 to 1.2, and the ratio of the width of the metal layer located in the fourth edge area The ratio of the width to the width of the metal layer located in the third edge region is 0.8 to 1.2.

在示例性实施方式中,位于所述第一边缘区域的金属层的厚度与位于所述第二边缘区域的金属层的厚度的比值为1.2至5,位于所述第四边缘区域的金属层的厚度与位于所述第三边缘区域的金属层的厚度的比值为1.2至5。In an exemplary embodiment, the ratio of the thickness of the metal layer located in the first edge area to the thickness of the metal layer located in the second edge area is 1.2 to 5, and the ratio of the thickness of the metal layer located in the fourth edge area The ratio of the thickness to the thickness of the metal layer located in the third edge region is 1.2 to 5.

在示例性实施方式中,位于所述第一边缘区域的金属层的长度与位于所述第二边缘区域的金属层的长度的比值为1,位于所述第四边缘区域的金属层的长度与位于所述第三边缘区域的金属层的长度的比值为1。位于所述第一边缘区域的金属层的宽度与位于所述第二边缘区域的金属层的宽度的比值为1,位于所述第四边缘区域的金属层的宽度与位于所述第三边缘区域的金属层的宽度的比值为1。位于所述第一边缘区域的金属层的厚度与位于所述第二边缘区域的金属层的厚度的比值为2,位于所述第四边缘区域的金属层的厚度与位于所述第三边缘区域的金属层的厚度的比值为2。In an exemplary embodiment, the ratio of the length of the metal layer located in the first edge region to the length of the metal layer located in the second edge region is 1, and the ratio of the length of the metal layer located in the fourth edge region to The ratio of the lengths of the metal layers located in the third edge region is 1. The ratio of the width of the metal layer located in the first edge area to the width of the metal layer located in the second edge area is 1, and the width of the metal layer located in the fourth edge area is equal to the width of the metal layer located in the third edge area The ratio of the width of the metal layer is 1. The ratio of the thickness of the metal layer located in the first edge area to the thickness of the metal layer located in the second edge area is 2, the thickness of the metal layer located in the fourth edge area is the same as the thickness of the metal layer located in the third edge area The ratio of the thickness of the metal layer is 2.

在示例性实施方式中,所述中间区域对应的声速大于所述第一边缘区域对应的声速以及所述第二边缘区域对应的声速,且所述第一边缘区域对应的声速与所述第二边缘区域对应的声速不同。所述中间区域对应的声速大于所述第三边缘区域对应的声速以及所述第四边缘区域对应的声速,且所述第三边缘区域对应的声速与所述第四边缘区域对应的声速不同。In an exemplary embodiment, the sound velocity corresponding to the middle region is greater than the sound velocity corresponding to the first edge region and the sound velocity corresponding to the second edge region, and the sound velocity corresponding to the first edge region is different from that of the second edge region. The sound speeds corresponding to the edge regions are different. The sound velocity corresponding to the middle region is greater than the sound velocity corresponding to the third edge region and the sound velocity corresponding to the fourth edge region, and the sound velocity corresponding to the third edge region is different from the sound velocity corresponding to the fourth edge region.

在示例性实施方式中,所述第二边缘区域对应的声速大于所述第一边缘区域对应的声速,所述第三边缘区域对应的声速大于所述第四边缘区域对应的声速。In an exemplary embodiment, the sound velocity corresponding to the second edge region is greater than the sound velocity corresponding to the first edge region, and the sound velocity corresponding to the third edge region is greater than the sound velocity corresponding to the fourth edge region.

在示例性实施方式中,所述第一电极指上的金属层的宽度小于或等于所述第一电极指的宽度,所述第二电极指上的金属层的宽度小于或等于所述第二电极指的宽度。In an exemplary embodiment, the width of the metal layer on the first electrode finger is less than or equal to the width of the first electrode finger, and the width of the metal layer on the second electrode finger is less than or equal to the width of the second electrode finger. The width of the electrode fingers.

在示例性实施方式中,所述第一电极指上的金属层的厚度小于所述第一电极指的厚度,所述第二电极指上的金属层的厚度小于所述第二电极指的厚度。In an exemplary embodiment, the thickness of the metal layer on the first electrode finger is smaller than the thickness of the first electrode finger, and the thickness of the metal layer on the second electrode finger is smaller than the thickness of the second electrode finger .

在示例性实施方式中,所述叉指换能器还包括多个第一假指以及多个第二假指,所述第一假指设置于所述第一电极指与所述第二汇流条之间,且所述第一假指与所述第二汇流条连接;所述第二假指设置于所述第二电极指与所述第一汇流条之间,且所述第二假指与所述第一汇流条连接。In an exemplary embodiment, the IDT further includes a plurality of first dummy fingers and a plurality of second dummy fingers, and the first dummy fingers are arranged between the first electrode fingers and the second busbar. between the bars, and the first dummy finger is connected to the second bus bar; the second dummy finger is arranged between the second electrode finger and the first bus bar, and the second dummy The fingers are connected to the first bus bar.

在示例性实施方式中,所述谐振器还包括温度补偿层,所述温度补偿层将所述叉指换能器罩设于所述压电基片上。In an exemplary embodiment, the resonator further includes a temperature compensation layer covering the IDT on the piezoelectric substrate.

基于同样的发明构思,本申请实施例还提供一种谐振器,包括压电基片以及位于所述压电基片上的叉指换能器,所述叉指换能器包括:Based on the same inventive concept, an embodiment of the present application also provides a resonator, including a piezoelectric substrate and an interdigital transducer located on the piezoelectric substrate, the interdigital transducer including:

相对设置的第一汇流条以及第二汇流条;the first bus bar and the second bus bar arranged oppositely;

多个第一电极指以及多个第二电极指,多个所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,多个所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸,多个所述第一电极指与多个所述第二电极指依次交替间隔排列;A plurality of first electrode fingers and a plurality of second electrode fingers, the plurality of first electrode fingers are connected to the first bus bar and extend toward the second bus bar, the plurality of second electrode fingers are connected to the second bus bar The second bus bar is connected to and extends toward the first bus bar, and a plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged in sequence;

多个所述第一电极指与多个所述第二电极指沿着所述第一汇流条和所述第二汇流条的延伸方向依次交替排列形成一交替区域,所述交替区域包括由所述第一汇流条指向所述第二汇流条的方向依次设置的至少两个第五边缘区域、中间区域以及至少两个第六边缘区域;A plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged sequentially along the extending direction of the first bus bar and the second bus bar to form an alternating area, and the alternating area includes the At least two fifth edge regions, a middle region and at least two sixth edge regions arranged sequentially in a direction in which the first bus bar points to the second bus bar;

所述中间区域对应的声速分别大于所述至少两个第五边缘区域对应的声速以及所述至少两个第六边缘区域对应的声速;The sound velocity corresponding to the middle region is respectively greater than the sound velocity corresponding to the at least two fifth edge regions and the sound velocity corresponding to the at least two sixth edge regions;

由所述中间区域指向所述第一汇流条的方向依次排列的所述至少两个第五边缘区域对应的声速依次减小;The sound velocities corresponding to the at least two fifth edge regions arranged sequentially from the middle region to the direction of the first bus bar decrease successively;

由所述中间区域指向所述第二汇流条的方向依次排列的所述至少两个第六边缘区域对应的声速依次减小。The sound velocities corresponding to the at least two sixth edge regions arranged sequentially in a direction from the middle region to the second bus bar decrease successively.

综上所述,本申请实施例提供的谐振器,包括压电基片以及位于所述压电基片上的叉指换能器,所述叉指换能器包括第一汇流条、第二汇流条、多个第一电极指以及多个第二电极指。所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸以及所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸。多个所述第一电极指与多个所述第二电极指依次交替排列形成一交替区域,所述交替区域包括由所述第一汇流条指向所述第二汇流条的方向依次设置的至少两个第五边缘区域、中间区域以及至少两个第六边缘区域。所述中间区域对应的声速分别大于所述至少两个第五边缘区域对应的声速以及所述至少两个第六边缘区域对应的声速,从而在所述压电基片上,形成声学反射,避免了声波信号泄漏,将声波信号限制在所述叉指换能器内,进而提高了对所述谐振器的横向模态的抑制。In summary, the resonator provided in the embodiment of the present application includes a piezoelectric substrate and an interdigital transducer located on the piezoelectric substrate, and the interdigital transducer includes a first bus bar, a second bus bar strips, a plurality of first electrode fingers and a plurality of second electrode fingers. The first electrode fingers are connected to the first bus bar and extend toward the second bus bar, and the second electrode fingers are connected to the second bus bar and extend toward the first bus bar. A plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged in turn to form an alternating area, and the alternating area includes at least Two fifth edge regions, a middle region and at least two sixth edge regions. The sound velocities corresponding to the middle regions are respectively greater than the sound velocities corresponding to the at least two fifth edge regions and the sound velocities corresponding to the at least two sixth edge regions, so that acoustic reflection is formed on the piezoelectric substrate, avoiding Acoustic signal leakage confines the acoustic signal within the IDT, thereby improving suppression of transverse modes of the resonator.

基于同样的发明构思,本申请实施例还提供一种滤波器,至少包括多个上述的谐振器。Based on the same inventive concept, an embodiment of the present application further provides a filter, which at least includes a plurality of the above-mentioned resonators.

综上所述,所述滤波器包括多个谐振器,所述谐振器包括压电基片以及位于所述压电基片上的叉指换能器,所述叉指换能器包括第一汇流条、第二汇流条、多个第一电极指以及多个第二电极指。所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸。所述叉指换能器还包括设置于所述第一电极指上的至少一个活塞结构以及设置于所述第二电极指上的至少一个所述活塞结构,位于所述第一电极指上的活塞结构中的至少一个包括厚度不同的两个金属层,位于所述第二电极指上的活塞结构中的至少一个包括厚度不同的两个金属层。从而改变两个所述金属层所在的区域内的压电基片上的声波信号传输速度,形成声学反射,将声波信号限制在所述叉指换能器内,避免了声波信号泄漏,进而提高了对所述谐振器的横向模态的抑制。In summary, the filter includes a plurality of resonators, the resonators include a piezoelectric substrate and an interdigital transducer located on the piezoelectric substrate, and the interdigital transducer includes a first bus a bar, a second bus bar, a plurality of first electrode fingers and a plurality of second electrode fingers. The first electrode fingers are connected to the first bus bar and extend toward the second bus bar, and the second electrode fingers are connected to the second bus bar and extend toward the first bus bar. The IDT further includes at least one piston structure disposed on the first electrode finger and at least one piston structure disposed on the second electrode finger, and the piston structure disposed on the first electrode finger At least one of the piston structures includes two metal layers with different thicknesses, and at least one of the piston structures located on the second electrode finger includes two metal layers with different thicknesses. Thereby changing the transmission speed of the acoustic wave signal on the piezoelectric substrate in the region where the two metal layers are located, forming acoustic reflection, confining the acoustic wave signal in the interdigital transducer, avoiding the leakage of the acoustic wave signal, and further improving the suppression of the transverse modes of the resonator.

基于同样的发明构思,本申请实施例还提供一种电子设备,包括基板以及上述的滤波器,所述滤波器安装于所述基板上,并与所述基板电连接。Based on the same inventive concept, an embodiment of the present application further provides an electronic device, including a substrate and the above-mentioned filter, where the filter is mounted on the substrate and electrically connected to the substrate.

综上所述,本申请实施例提供的电子设备包括基板以及滤波器,所述滤波器包括多个谐振器,所述谐振器包括压电基片以及位于所述压电基片上的叉指换能器,所述叉指换能器包括第一汇流条、第二汇流条、多个第一电极指以及多个第二电极指。所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸。所述叉指换能器还包括设置于所述第一电极指上的至少一个活塞结构以及设置于所述第二电极指上的至少一个所述活塞结构,位于所述第一电极指上的活塞结构中的至少一个包括厚度不同的两个金属层,位于所述第二电极指上的活塞结构中的至少一个包括厚度不同的两个金属层。因此,本申请的谐振器通过在至少部分电极指上设置厚度不同的金属层,可以改变两个所述金属层所在的区域内的压电基片上的声波信号传输速度,形成声学反射,避免了声波信号泄漏,将声波信号限制在所述叉指换能器内,进而提高了对所述谐振器的横向模态的抑制。In summary, the electronic device provided by the embodiment of the present application includes a substrate and a filter, and the filter includes a plurality of resonators, and the resonators include a piezoelectric substrate and an interdigital switch located on the piezoelectric substrate. The interdigital transducer includes a first bus bar, a second bus bar, a plurality of first electrode fingers and a plurality of second electrode fingers. The first electrode fingers are connected to the first bus bar and extend toward the second bus bar, and the second electrode fingers are connected to the second bus bar and extend toward the first bus bar. The IDT further includes at least one piston structure disposed on the first electrode finger and at least one piston structure disposed on the second electrode finger, and the piston structure disposed on the first electrode finger At least one of the piston structures includes two metal layers with different thicknesses, and at least one of the piston structures located on the second electrode finger includes two metal layers with different thicknesses. Therefore, the resonator of the present application can change the transmission speed of the acoustic wave signal on the piezoelectric substrate in the area where the two metal layers are located by arranging metal layers with different thicknesses on at least part of the electrode fingers, thereby forming acoustic reflection and avoiding Acoustic signal leakage confines the acoustic signal within the IDT, thereby improving suppression of transverse modes of the resonator.

附图说明Description of drawings

为了更清楚地说明本申请实施例中的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings that need to be used in the embodiments will be briefly introduced below. Obviously, the drawings in the following description are some embodiments of the present application. Those of ordinary skill in the art can also obtain other drawings based on these drawings without any creative effort.

图1为本申请实施例公开的第一种谐振器的层结构示意图;FIG. 1 is a schematic diagram of the layer structure of the first resonator disclosed in the embodiment of the present application;

图2为图1所示的谐振器的叉指换能器的正视结构示意图;Fig. 2 is the schematic diagram of the front view structure of the interdigital transducer of the resonator shown in Fig. 1;

图3为本申请实施例公开的第二种谐振器的层结构示意图;FIG. 3 is a schematic diagram of the layer structure of the second resonator disclosed in the embodiment of the present application;

图4为图3所示的谐振器的叉指换能器的正视结构示意图;Fig. 4 is a front structural schematic view of the interdigital transducer of the resonator shown in Fig. 3;

图5为本申请实施例公开的第三种谐振器的层结构示意图;FIG. 5 is a schematic diagram of the layer structure of the third resonator disclosed in the embodiment of the present application;

图6为图5所示的谐振器的叉指换能器的正视结构示意图;Fig. 6 is a front view structural schematic diagram of the interdigital transducer of the resonator shown in Fig. 5;

图7为本申请实施例公开的第四种谐振器的层结构示意图;FIG. 7 is a schematic diagram of the layer structure of the fourth resonator disclosed in the embodiment of the present application;

图8为图7所示的谐振器的叉指换能器的正视结构示意图;Fig. 8 is a front structural schematic view of the interdigital transducer of the resonator shown in Fig. 7;

图9为本申请实施例公开的叉指换能器的第一优选结构参数对应的导纳曲线示意图;FIG. 9 is a schematic diagram of the admittance curve corresponding to the first preferred structural parameter of the interdigital transducer disclosed in the embodiment of the present application;

图10为本申请实施例公开的叉指换能器的第二优选结构参数对应的导纳曲线示意图;Fig. 10 is a schematic diagram of the admittance curve corresponding to the second preferred structural parameter of the interdigital transducer disclosed in the embodiment of the present application;

图11为本申请实施例公开的叉指换能器的第三优选结构参数对应的导纳曲线示意图;Fig. 11 is a schematic diagram of the admittance curve corresponding to the third preferred structural parameter of the interdigital transducer disclosed in the embodiment of the present application;

图12为现有技术的叉指换能器的结构参数对应的导纳曲线示意图;12 is a schematic diagram of an admittance curve corresponding to structural parameters of an IDT in the prior art;

图13为图1所述的谐振器中各区域对应的声速分布示意图;Fig. 13 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in Fig. 1;

图14为图3所述的谐振器中各区域对应的声速分布示意图;Fig. 14 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in Fig. 3;

图15为图5所述的谐振器中各区域对应的声速分布示意图;Fig. 15 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in Fig. 5;

图16为图7所述的谐振器中各区域对应的声速分布示意图;Fig. 16 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in Fig. 7;

图17为本申请实施例公开的谐振器的第五种层结构示意图;Fig. 17 is a schematic diagram of the fifth layer structure of the resonator disclosed in the embodiment of the present application;

图18为图17所示的谐振器的叉指换能器的正视结构示意图;Fig. 18 is a front view structural schematic diagram of the interdigital transducer of the resonator shown in Fig. 17;

图19为本申请实施例公开的第六种谐振器的结构示意图;FIG. 19 is a schematic structural diagram of a sixth resonator disclosed in the embodiment of the present application;

图20为本申请实施例公开的滤波器的结构示意图。FIG. 20 is a schematic structural diagram of a filter disclosed in an embodiment of the present application.

附图标记说明:Explanation of reference signs:

Q1-第一边缘区域;Q2-第二边缘区域;C-中间区域;Q3-第三边缘区域;Q4-第四边缘区域;1-叉指换能器;7-压电基片;8-衬底;9-温度补偿层;10-第一汇流条;20-第二汇流条;40-第一电极指;50-第二电极指;60-活塞结构;80-第一活塞结构;81-第一金属层;82-第二金属层;90-第二活塞结构;91-第三金属层;92-第四金属层;101-谐振器;102-谐振器;103-谐振器;104-谐振器;105-谐振器;106-谐振器;130-第一假指;140-第二假指;200-滤波器;IN-输入端;OUT-输出端;Bl-串联支路;B2-并联支路;GND-接地端连接。Q1-first edge area; Q2-second edge area; C-middle area; Q3-third edge area; Q4-fourth edge area; 1-interdigital transducer; 7-piezoelectric substrate; 8- Substrate; 9-temperature compensation layer; 10-first bus bar; 20-second bus bar; 40-first electrode finger; 50-second electrode finger; 60-piston structure; 80-first piston structure; 81 - first metal layer; 82 - second metal layer; 90 - second piston structure; 91 - third metal layer; 92 - fourth metal layer; 101 - resonator; 102 - resonator; 103 - resonator; 104 -resonator; 105-resonator; 106-resonator; 130-first false finger; 140-second false finger; 200-filter; IN-input end; OUT-output end; Bl-series branch; B2 -Parallel branch; GND-ground connection.

具体实施方式Detailed ways

为了便于理解本申请,下面将参照相关附图对本申请进行更全面的描述。附图中给出了本申请的较佳实施方式。但是,本申请可以以许多不同的形式来实现,并不限于本文所描述的实施方式。相反地,提供这些实施方式的目的是使对本申请的公开内容理解的更加透彻全面。In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Preferred embodiments of the application are shown in the accompanying drawings. However, the present application can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the application more thorough and comprehensive.

以下各实施例的说明是参考附加的图示,用以例示本申请可用以实施的特定实施例。本文中为部件所编序号本身,例如“第一”、“第二”等,仅用于区分所描述的对象,不具有任何顺序或技术含义。而本申请所说“连接”、“联接”,如无特别说明,均包括直接和间接连接(联接)。本申请中所提到的方向用语,例如,“上”、“下”、“前”、“后”、“左”、“右”、“内”、“外”、“侧面”等,仅是参考附加图式的方向,因此,使用的方向用语是为了更好、更清楚地说明及理解本申请,而不是指示或暗指所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments that the present application can be used to implement. The serial numbers assigned to components in this document, such as "first", "second", etc., are only used to distinguish the described objects, and do not have any sequence or technical meaning. The "connection" and "connection" mentioned in this application all include direct and indirect connection (connection) unless otherwise specified. The directional terms mentioned in this application, such as "upper", "lower", "front", "rear", "left", "right", "inner", "outer", "side", etc., only is to refer to the direction of the attached drawings. Therefore, the direction terms used are for better and clearer description and understanding of the present application, rather than indicating or implying that the referred device or element must have a specific orientation, and must have a specific orientation. construction and operation, therefore should not be construed as limiting the application.

在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸地连接,或者一体地连接;可以是机械连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本申请中的具体含义。需要说明的是,本申请的说明书和权利要求书及所述附图中的术语“第一”、“第二”等是用于区别不同对象,而不是用于描述特定顺序。此外,本申请中使用的术语“包括”、“可以包括”、“包含”、或“可以包含”表示公开的相应功能、操作、元件等的存在,并不限制其他的一个或多个更多功能、操作、元件等。此外,术语“包括”或“包含”表示存在说明书中公开的相应特征、数目、步骤、操作、元素、部件或其组合,而并不排除存在或添加一个或多个其他特征、数目、步骤、操作、元素、部件或其组合,意图在于覆盖不排他的包含。还需要理解的是,本文中描述的“至少一个”的含义是一个及其以上,例如一个、两个或三个等,而“多个”的含义是至少两个,例如两个或三个等,除非另有明确具体的限定。In the description of this application, it should be noted that unless otherwise specified and limited, the terms "installation", "connection", and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Ground connection, or integral connection; can be mechanical connection; can be directly connected, can also be indirectly connected through an intermediary, and can be internal communication between two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in this application in specific situations. It should be noted that the terms "first" and "second" in the specification and claims of the present application and the drawings are used to distinguish different objects, rather than to describe a specific order. In addition, the term "comprising", "may include", "comprises", or "may include" used in this application indicates the existence of the corresponding disclosed functions, operations, elements, etc., and does not limit other one or more more Functions, operations, components, etc. In addition, the term "comprises" or "comprises" means that there are corresponding features, numbers, steps, operations, elements, components or combinations thereof disclosed in the specification, and does not exclude the existence or addition of one or more other features, numbers, steps, Operations, elements, components, or combinations thereof, are intended to cover non-exclusive inclusions. It should also be understood that the meaning of "at least one" described herein is one or more, such as one, two or three, etc., and the meaning of "multiple" is at least two, such as two or three etc., unless expressly and specifically defined otherwise.

除非另有定义,本文所使用的所有的技术和科学术语与属于本申请的技术领域的技术人员通常理解的含义相同。本文中在本申请的说明书中所使用的术语只是为了描述具体的实施方式的目的,不是旨在于限制本申请。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terminology used herein in the description of the application is only for the purpose of describing specific embodiments, and is not intended to limit the application.

请参阅图1,图1为本申请实施例公开的第一种谐振器的层结构示意图。如图1所示,本申请实施例提供的谐振器101至少可以包括压电基片7、位于所述压电基片7一侧的多个叉指换能器1以及设置于所述叉指换能器1相对两侧的反射结构。Please refer to FIG. 1 . FIG. 1 is a schematic diagram of the layer structure of the first type of resonator disclosed in the embodiment of the present application. As shown in Figure 1, the resonator 101 provided by the embodiment of the present application may at least include a piezoelectric substrate 7, a plurality of interdigital transducers 1 located on one side of the piezoelectric substrate 7, and a plurality of interdigital transducers 1 arranged on the interdigital reflective structures on opposite sides of the transducer 1 .

具体为,当所述叉指换能器1接收一交变电信号,并产生与所述交变电信号相对应的交变电场,所述压电基片7在所述交变电场的作用下发生形变。由于所述交变电场的电场强度是变化的,故所述压电基片7的形变程度是随着时间变化的,进而在所述压电基片7的表面上产生声波信号,并在所述压电基片7的表面上传播。所述压电基片7在所述交变电场的作用下发生形变的现象称为逆压电效应(Converse Piezoelectricity Effect)。Specifically, when the interdigital transducer 1 receives an alternating electric signal and generates an alternating electric field corresponding to the alternating electric signal, the action of the piezoelectric substrate 7 on the alternating electric field deformed below. Since the electric field strength of the alternating electric field changes, the degree of deformation of the piezoelectric substrate 7 changes with time, and then an acoustic wave signal is generated on the surface of the piezoelectric substrate 7, and the spread on the surface of the piezoelectric substrate 7. The deformation of the piezoelectric substrate 7 under the action of the alternating electric field is called the Converse Piezoelectricity Effect.

所述声波信号在所述压电基片7上传播至另一个所述叉指换能器1所在的区域。所述声波信号使得该区域的所述压电基片7发生形变,所述压电基片7为抵抗形变会在其相对的表面上产生等量的正负电荷,以在所述叉指换能器1上形成电信号。形变的所述压电基片7产生正负电荷的现象称为正压电效应(Positive Piezoelectric Effect)。The acoustic wave signal propagates on the piezoelectric substrate 7 to another area where the IDT 1 is located. The acoustic wave signal causes the piezoelectric substrate 7 in this area to deform, and the piezoelectric substrate 7 will generate equal amounts of positive and negative charges on its opposite surface to resist deformation, so as to exchange between the fingers. An electrical signal is formed on the energy device 1. The phenomenon that the deformed piezoelectric substrate 7 generates positive and negative charges is called positive piezoelectric effect (Positive Piezoelectric Effect).

请参阅图2,图2为图1所示的谐振器的叉指换能器的正视结构示意图。在本申请实施方式中,每个所述叉指换能器1包括设置于所述压电基片7一侧的第一汇流条10、第二汇流条20、多个第一电极指40以及多个第二电极指50。所述第一汇流条10与所述第二汇流条20相对设置,多个所述第一电极指40与所述第一汇流条10连接并朝向所述第二汇流条20延伸,多个所述第二电极指50与所述第二汇流条20连接并朝向所述第一汇流条10延伸,多个所述第一电极指40与多个所述第二电极指50依次交替间隔排列。Please refer to FIG. 2 . FIG. 2 is a front view structural diagram of the IDT of the resonator shown in FIG. 1 . In the embodiment of the present application, each of the interdigital transducers 1 includes a first bus bar 10, a second bus bar 20, a plurality of first electrode fingers 40 and A plurality of second electrode fingers 50 . The first bus bar 10 is arranged opposite to the second bus bar 20, the plurality of first electrode fingers 40 are connected to the first bus bar 10 and extend toward the second bus bar 20, and the plurality of electrode fingers 40 are connected to the first bus bar 10 and extend toward the second bus bar 20. The second electrode fingers 50 are connected to the second bus bar 20 and extend toward the first bus bar 10 , and the plurality of first electrode fingers 40 and the plurality of second electrode fingers 50 are alternately arranged in sequence.

在本申请实施方式中,所述叉指换能器1还包括多个活塞结构60。至少部分所述第一电极指40背对所述压电基片7的表面上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第一电极指40背对所述第一汇流条10的端部。至少部分所述第二电极指50背对所述压电基片7的表面上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第二电极指50背对所述第二汇流条20的端部。In the embodiment of the present application, the interdigital transducer 1 further includes a plurality of piston structures 60 . At least one piston structure 60 is provided on the surface of at least part of the first electrode finger 40 facing away from the piezoelectric substrate 7, and the piston structure 60 is at least located on the surface of the first electrode finger 40 facing away from the first electrode finger 40. An end of a bus bar 10 . At least one piston structure 60 is provided on the surface of at least part of the second electrode fingers 50 facing away from the piezoelectric substrate 7, and the piston structure 60 is at least located on the surface of the second electrode fingers 50 facing away from the first electrode finger 50. Two ends of the bus bar 20 .

在示例性实施方式中,位于所述第一电极指40上的所述活塞结构60中的至少一个包括厚度不同的两个金属层,位于所述第二电极指50上的所述活塞结构60中的至少一个包括厚度不同的两个金属层。In an exemplary embodiment, at least one of the piston structures 60 on the first electrode finger 40 includes two metal layers with different thicknesses, and the piston structure 60 on the second electrode finger 50 At least one of them includes two metal layers of different thicknesses.

在示例性实施方式中,可以是部分所述第一电极指40背对所述压电基片7的表面上设置有至少一个所述活塞结构60以及部分所述第二电极指50背对所述压电基片7的表面上设置有至少一个所述活塞结构60。还可以是每个所述第一电极指40背对所述压电基片7的表面上设置有至少一个所述活塞结构60以及每个所述第二电极指50背对所述压电基片7的表面上设置有至少一个所述活塞结构60,本申请对此不作具体限制。In an exemplary embodiment, at least one piston structure 60 may be provided on the surface of part of the first electrode fingers 40 facing away from the piezoelectric substrate 7 and part of the second electrode fingers 50 facing away from the piezoelectric substrate 7. At least one piston structure 60 is provided on the surface of the piezoelectric substrate 7 . It is also possible that at least one piston structure 60 is provided on the surface of each of the first electrode fingers 40 facing away from the piezoelectric substrate 7 and each of the second electrode fingers 50 is facing away from the piezoelectric substrate. At least one piston structure 60 is provided on the surface of the sheet 7, which is not specifically limited in the present application.

可以理解的是,通过在所述第一电极指40上至少设置厚度不同的两个金属层以及在所述第二电极指50上至少设置厚度不同的两个金属层,在声波信号的产生的区域形成一个“势阱”区,可将声波能量限制在所述叉指换能器1所在的区域,抑制了横向模态的激发。It can be understood that by arranging at least two metal layers with different thicknesses on the first electrode fingers 40 and at least two metal layers with different thicknesses on the second electrode fingers 50, in the generation of acoustic signals, The area forms a "potential well" area, which can confine the acoustic wave energy to the area where the IDT 1 is located, and suppress the excitation of the transverse mode.

在示例性实施方式中,位于所述第一电极指40上的所述活塞结构60中的至少一个包括相邻接且厚度不同的两个金属层,位于所述第二电极指50上的所述活塞结构60中的至少一个包括相邻接且厚度不同的两个金属层。或者,位于所述第一电极指40上的所述活塞结构60中的至少一个包括间隔预设距离且厚度不同的两个金属层,位于所述第二电极指50上的所述活塞结构60中的至少一个包括间隔预设距离且厚度不同的两个金属层。本申请对此不作具体的限制。In an exemplary embodiment, at least one of the piston structures 60 located on the first electrode finger 40 includes two adjacent metal layers with different thicknesses, and all the piston structures located on the second electrode finger 50 At least one of the piston structures 60 includes two adjacent metal layers with different thicknesses. Alternatively, at least one of the piston structures 60 located on the first electrode finger 40 includes two metal layers with a predetermined distance apart and different thicknesses, and the piston structure 60 located on the second electrode finger 50 At least one of them includes two metal layers separated by a preset distance and having different thicknesses. This application does not specifically limit this.

在本申请其他实施方式中,所述活塞结构60还可设置于所述第一电极指40面对所述压电基片7的表面以及所述第二电极指50面对所述压电基片7的表面,本申请对此不作具体限制。In other embodiments of the present application, the piston structure 60 can also be arranged on the surface of the first electrode finger 40 facing the piezoelectric substrate 7 and the surface of the second electrode finger 50 facing the piezoelectric substrate. The surface of the sheet 7 is not specifically limited in this application.

在示例性实施方式中,所述第一汇流条10的尺寸与所述第二汇流条20的尺寸相同,即所述第一汇流条10的长宽高与所述第二汇流条20的长宽高相同。所述第一电极指40的尺寸与所述第二电极指50的尺寸相同,即所述第一电极指40的长宽高与所述第二电极指50的长宽高相同。In an exemplary embodiment, the size of the first bus bar 10 is the same as that of the second bus bar 20 , that is, the length, width, and height of the first bus bar 10 are the same as the length of the second bus bar 20 Same width and height. The size of the first electrode finger 40 is the same as that of the second electrode finger 50 , that is, the length, width, and height of the first electrode finger 40 are the same as the length, width, and height of the second electrode finger 50 .

在示例性实施方式中,在叉指换能器1的结构中,沿着电极指的交替排列方向,位于两侧的电极指的占空比小于位于中间的电极指的占空比。其中,占空比=电极指的宽度/相邻两电极指中心线之间的距离。In an exemplary embodiment, in the structure of the IDT 1 , along the direction in which the electrode fingers are alternately arranged, the duty cycle of the electrode fingers located on both sides is smaller than that of the electrode fingers located in the middle. Wherein, duty cycle=width of electrode fingers/distance between centerlines of two adjacent electrode fingers.

在示例性实施方式中,所述第一汇流条10与所述第二汇流条20相对且平行设置,所述第一电极指40分别与所述第一汇流条10以及所述第二汇流条20垂直,所述第二电极指50分别与所述第一汇流条10以及所述第二汇流条20垂直。In an exemplary embodiment, the first bus bar 10 and the second bus bar 20 are arranged in parallel to each other, and the first electrode fingers 40 are connected to the first bus bar 10 and the second bus bar respectively. 20 , the second electrode fingers 50 are perpendicular to the first bus bar 10 and the second bus bar 20 respectively.

在示例性实施方式中,所述第一电极指40的数量可为2至20个,例如,2个、6个、11个、16个、20个、或其他数量个,在本申请实施方式中,以所述第一电极指40的数量为6个为例进行说明。所述第二电极指50的数量可为2至20个,例如,2个、5个、11个、15个、20个、或其他数量个,在本申请实施方式中,以所述第一电极指40的数量为5个为例进行说明。In an exemplary embodiment, the number of the first electrode fingers 40 may be 2 to 20, for example, 2, 6, 11, 16, 20, or other numbers. In the description, the number of the first electrode fingers 40 is 6 as an example for illustration. The number of the second electrode fingers 50 can be 2 to 20, for example, 2, 5, 11, 15, 20, or other numbers. In the embodiment of the present application, the first The number of electrode fingers 40 is 5 as an example for description.

在示例性实施方式中,所述压电基片7的材料可以是氮化铝、氧化锌、锆钛酸铅(PZT)或上述材料的一定原子比的稀土元素掺杂材料。所述压电基片7也可以选择单晶压电材料,例如,单晶氮化铝、铌酸锂、钽酸锂、石英等,本申请对此不作具体限制。In an exemplary embodiment, the material of the piezoelectric substrate 7 may be aluminum nitride, zinc oxide, lead zirconate titanate (PZT) or a rare earth element doped material of a certain atomic ratio of the above materials. The piezoelectric substrate 7 can also be a single crystal piezoelectric material, for example, single crystal aluminum nitride, lithium niobate, lithium tantalate, quartz, etc., which is not specifically limited in this application.

在示例性实施方式中,所述叉指换能器1以及所述金属层的材料可以使用单一金属材料或者不同金属的复合或者合金材料。所述叉指换能器1以及所述金属层的材料可以是钼、钨、钌、金、镁、铝、铜、铬、钛、锇、铱或以上金属的复合或其合金等中的一者,本申请对此不作具体限制。In an exemplary embodiment, the material of the interdigital transducer 1 and the metal layer may be a single metal material or a composite or alloy material of different metals. The material of the IDT 1 and the metal layer can be one of molybdenum, tungsten, ruthenium, gold, magnesium, aluminum, copper, chromium, titanium, osmium, iridium or a composite of the above metals or an alloy thereof, etc. Or, this application does not specifically limit it.

在本申请实施方式中,所述谐振器101还包括设置于所述叉指换能器的相对两侧的反射结构,即所述第一汇流条10以及所述第二汇流条20长度方向的两端设置有所述反射结构。可以理解的是,通过在所述叉指换能器1的两侧设置所述反射结构,可以对声波信号进行反射,从而将声波信号约束在两个所述反射结构之间,以提高所述谐振器101的品质因数值以及提升所述谐振器101的性能。In the embodiment of the present application, the resonator 101 further includes reflective structures arranged on opposite sides of the IDT, that is, in the longitudinal direction of the first bus bar 10 and the second bus bar 20 Both ends are provided with the reflective structure. It can be understood that, by arranging the reflective structures on both sides of the IDT 1, the acoustic wave signal can be reflected, thereby confining the acoustic wave signal between the two reflective structures, so as to improve the The quality factor value of the resonator 101 and the performance of the resonator 101 are improved.

综上所述,本申请实施例提供的谐振器101包括压电基片7以及叉指换能器1。所述叉指换能器1包括第一汇流条10、第二汇流条20、多个第一电极指40以及多个第二电极指50。所述第一电极指40上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第一电极指40背对所述第一汇流条10的端部。所述第二电极指50上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第二电极指50背对所述第二汇流条20的端部。位于所述第一电极指40上的所述活塞结构60中的至少一个包括厚度不同的两个金属层,位于所述第二电极指50上的所述活塞结构60中的至少一个包括厚度不同的两个金属层。因此,在所述第一电极指40以及所述第二电极指50上设置至少一个包括两个金属层的所述活塞结构60,且两个金属层不同,从而改变两个金属层所在的区域内的所述压电基片7上的声波信号传输速度,形成声学反射,因此,不但避免了声波信号泄漏,将声波信号限制在所述叉指换能器内,进而提高了对所述谐振器101的横向模态的抑制,而且减小了声能损耗,提高了品质因数值并提升了所述谐振器101的性能。In summary, the resonator 101 provided in the embodiment of the present application includes the piezoelectric substrate 7 and the IDT 1 . The IDT 1 includes a first bus bar 10 , a second bus bar 20 , a plurality of first electrode fingers 40 and a plurality of second electrode fingers 50 . At least one piston structure 60 is disposed on the first electrode finger 40 , and the piston structure 60 is at least located at an end of the first electrode finger 40 facing away from the first bus bar 10 . At least one piston structure 60 is disposed on the second electrode finger 50 , and the piston structure 60 is at least located at an end of the second electrode finger 50 facing away from the second bus bar 20 . At least one of the piston structures 60 located on the first electrode finger 40 includes two metal layers with different thicknesses, and at least one of the piston structures 60 located on the second electrode finger 50 includes two metal layers with different thicknesses. two metal layers. Therefore, at least one piston structure 60 including two metal layers is provided on the first electrode finger 40 and the second electrode finger 50, and the two metal layers are different, thereby changing the area where the two metal layers are located. The transmission speed of the acoustic wave signal on the piezoelectric substrate 7 in the interior forms an acoustic reflection, therefore, not only avoiding the leakage of the acoustic wave signal, but also confining the acoustic wave signal in the described interdigital transducer, thereby improving the response to the resonance The suppression of the transverse mode of the resonator 101 reduces the loss of acoustic energy, increases the value of the quality factor and improves the performance of the resonator 101.

在本申请实施例中,请参阅图2,多个所述第一电极指40与多个所述第二电极指50沿着所述第一汇流条10和所述第二汇流条20的延伸方向依次交替排列形成一交替区域,所述交替区域包括由所述第一汇流条指向所述第二汇流条的方向依次邻接设置的第一边缘区域Q1、第二边缘区域Q2、中间区域C、第三边缘区域Q3以及第四边缘区域Q4。In the embodiment of the present application, please refer to FIG. 2 , a plurality of the first electrode fingers 40 and a plurality of the second electrode fingers 50 extend along the extension of the first bus bar 10 and the second bus bar 20 The directions are alternately arranged in order to form an alternating area, and the alternating area includes the first edge area Q1, the second edge area Q2, the middle area C, The third edge area Q3 and the fourth edge area Q4.

可以理解的是,所述第一电极指40的部分与所述第二电极指50的部分沿着所述第一汇流条10的长度方向重合,多个所述第一电极指40重合的部分与多个所述第二电极指50重合的部分形成一交替区域。It can be understood that the part of the first electrode fingers 40 overlaps with the part of the second electrode fingers 50 along the length direction of the first bus bar 10 , and the overlapping parts of a plurality of the first electrode fingers 40 The portion overlapping with the plurality of second electrode fingers 50 forms an alternating area.

在示例性实施方式中,所述第一边缘区域Q1的长度方向、所述第二边缘区域Q2的长度方向、所述中间区域C的长度方向、所述第三边缘区域Q3的长度方向以及所述第四边缘区域Q4的长度方向与所述第一汇流条10以及所述第二汇流条20的长度方向平行。In an exemplary embodiment, the length direction of the first edge region Q1, the length direction of the second edge region Q2, the length direction of the middle region C, the length direction of the third edge region Q3 and the The length direction of the fourth edge region Q4 is parallel to the length directions of the first bus bar 10 and the second bus bar 20 .

在示例性实施方式中,所述第一边缘区域Q1与所述第一汇流条10之间以及所述第四边缘区域Q4与所述第二汇流条20之间分别形成有间隙区域。In an exemplary embodiment, gap regions are respectively formed between the first edge region Q1 and the first bus bar 10 and between the fourth edge region Q4 and the second bus bar 20 .

在本申请实施方式中,请参阅图2,设置于至少部分所述第一电极指40和至少部分所述第二电极指50上的至少一个活塞结构60均包括间隔设置的第一活塞结构80与第二活塞结构90,所述第一活塞结构80包括第一金属层81以及第二金属层82,所述第二活塞结构90包括第三金属层91以及第四金属层92。所述第一金属层81的厚度与所述第二金属层82的厚度不同,所述第三金属层91的厚度与所述第四金属层92的厚度不同。In the embodiment of the present application, referring to FIG. 2 , at least one piston structure 60 disposed on at least part of the first electrode fingers 40 and at least part of the second electrode fingers 50 includes first piston structures 80 arranged at intervals. As with the second piston structure 90 , the first piston structure 80 includes a first metal layer 81 and a second metal layer 82 , and the second piston structure 90 includes a third metal layer 91 and a fourth metal layer 92 . The thickness of the first metal layer 81 is different from that of the second metal layer 82 , and the thickness of the third metal layer 91 is different from that of the fourth metal layer 92 .

在本申请实施方式中,所述第三金属层91、所述第四金属层92、所述第一金属层81以及所述第二金属层82沿着所述第一电极指40的延伸方向依次位于所述第一边缘区域Q1、所述第二边缘区域Q2、所述第三边缘区域Q3以及所述第四边缘区域Q4,且所述第二金属层82位于所述第一电极指40背对所述第一汇流条10的端部。In the embodiment of the present application, the third metal layer 91 , the fourth metal layer 92 , the first metal layer 81 and the second metal layer 82 are along the extending direction of the first electrode fingers 40 Located in the first edge region Q1, the second edge region Q2, the third edge region Q3 and the fourth edge region Q4 in sequence, and the second metal layer 82 is located in the first electrode finger 40 facing away from the end of the first bus bar 10 .

在本申请实施方式中,所述第三金属层91、所述第四金属层92、所述第一金属层81以及所述第二金属层82沿着所述第二电极指50的延伸方向依次位于所述第四边缘区域Q4、所述第三边缘区域Q3、所述第二边缘区域Q2以及所述第一边缘区域Q1,且所述第二金属层82位于所述第二电极指50背对所述第二汇流条20的端部。In the embodiment of the present application, the third metal layer 91 , the fourth metal layer 92 , the first metal layer 81 and the second metal layer 82 are along the extending direction of the second electrode fingers 50 sequentially located in the fourth edge region Q4, the third edge region Q3, the second edge region Q2 and the first edge region Q1, and the second metal layer 82 is located in the second electrode finger 50 opposite to the end of the second bus bar 20 .

在示例性实施方式中,多个所述第一电极指40上的所述第一金属层81与多个所述第二电极指50上的所述第四金属层92并排交替间隔设置且位于所述第三边缘区域Q3内,多个所述第一电极指40上的所述第二金属层82与多个所述第二电极指50上的所述第三金属层91并排交替间隔设置且位于所述第四边缘区域Q4内。多个所述第一电极指40上的所述第三金属层91与多个所述第二电极指50上的所述第二金属层82并排交替间隔设置且位于所述第一边缘区域Q1内,多个所述第一电极指40上的所述第四金属层92与多个所述第二电极指50上的所述第一金属层81并排交替间隔设置且位于所述第二边缘区域Q2内。In an exemplary embodiment, the first metal layers 81 on the plurality of first electrode fingers 40 and the fourth metal layers 92 on the plurality of second electrode fingers 50 are alternately arranged side by side and located at In the third edge region Q3, the second metal layers 82 on the plurality of first electrode fingers 40 and the third metal layers 91 on the plurality of second electrode fingers 50 are alternately arranged side by side And located in the fourth edge area Q4. The third metal layers 91 on the plurality of first electrode fingers 40 and the second metal layers 82 on the plurality of second electrode fingers 50 are alternately arranged side by side and located in the first edge region Q1 Inside, the fourth metal layers 92 on the plurality of first electrode fingers 40 and the first metal layers 81 on the plurality of second electrode fingers 50 are alternately arranged side by side and located at the second edge In area Q2.

在示例性实施方式中,所述第三金属层91与所述第四金属层92相邻接设置,所述第一金属层81与所述第二金属层82邻接设置。或者,所述第三金属层91与所述第四金属层92间隔预设距离,所述第一金属层81与所述第二金属层82间隔预设距离。In an exemplary embodiment, the third metal layer 91 is disposed adjacent to the fourth metal layer 92 , and the first metal layer 81 is disposed adjacent to the second metal layer 82 . Alternatively, the third metal layer 91 is separated from the fourth metal layer 92 by a preset distance, and the first metal layer 81 is separated from the second metal layer 82 by a preset distance.

在示例性实施方式中,金属层的材料与叉指换能器的材料可以相同或不同,所述第一金属层81与所述第二金属层82的材料可以相同或不同,所述第三金属层91与所述第四金属层92的材料可以相同或不同。In an exemplary embodiment, the material of the metal layer and the material of the IDT may be the same or different, the material of the first metal layer 81 and the second metal layer 82 may be the same or different, and the third Materials of the metal layer 91 and the fourth metal layer 92 may be the same or different.

在示例性实施方式中,所述金属层可以通过涂胶、曝光、显影、金属沉积、湿法剥离等工艺制作金属层。所述第一金属层81与所述第二金属层82可是一体制备,所述第三金属91与所述第四金属层92可以是一体制备,并通过蚀刻工艺制成厚度不同的金属层结构。In an exemplary embodiment, the metal layer may be fabricated by processes such as glue coating, exposure, development, metal deposition, and wet stripping. The first metal layer 81 and the second metal layer 82 can be prepared integrally, the third metal layer 91 and the fourth metal layer 92 can be prepared integrally, and metal layer structures with different thicknesses are formed by etching process .

请参阅图3和图4,图3为本申请实施例公开的第二种谐振器的层结构示意图,图4为图3所示的谐振器的叉指换能器的正视结构示意图。第二种谐振器102与第一种谐振器101的区别点在于:第二种谐振器102的叉指换能器1的第一活塞结构80只包括第一金属层81,未包括第二金属层82。第二种谐振器102与第一种谐振器101的相同之处的描述请参照第一种谐振器101的描述,在此不再赘述。Please refer to FIG. 3 and FIG. 4 , FIG. 3 is a schematic diagram of the layer structure of the second resonator disclosed in the embodiment of the present application, and FIG. 4 is a schematic diagram of the front view structure of the IDT of the resonator shown in FIG. 3 . The difference between the second type of resonator 102 and the first type of resonator 101 is that the first piston structure 80 of the IDT 1 of the second type of resonator 102 only includes the first metal layer 81 and does not include the second metal layer. Layer 82. For the description of the similarities between the second type of resonator 102 and the first type of resonator 101 , please refer to the description of the first type of resonator 101 , which will not be repeated here.

在本申请实施例中,设置于至少部分所述第一电极指40和至少部分所述第二电极指50上的至少一个活塞结构60均包括间隔设置的第一活塞结构80以及第二活塞结构90,所述第一活塞结构80包括第一金属层81,所述第二活塞结构90包括第三金属层91以及第四金属层92。其中,所述第三金属层91与所述第四金属层92的厚度不同。In the embodiment of the present application, at least one piston structure 60 disposed on at least part of the first electrode fingers 40 and at least part of the second electrode fingers 50 includes first piston structures 80 and second piston structures arranged at intervals. 90 , the first piston structure 80 includes a first metal layer 81 , and the second piston structure 90 includes a third metal layer 91 and a fourth metal layer 92 . Wherein, the third metal layer 91 and the fourth metal layer 92 have different thicknesses.

在本申请实施方式中,所述第三金属层91、所述第四金属层92以及所述第一金属层81沿着所述第一电极指40的延伸方向依次位于所述第一边缘区域Q1、所述第二边缘区域Q2以及所述第三边缘区域Q3。所述第三金属层91、所述第四金属层92以及所述第一金属层81沿着所述第二电极指50的延伸方向依次位于所述第四边缘区域Q4、所述第三边缘区域Q3以及所述第二边缘区域Q2。In the embodiment of the present application, the third metal layer 91 , the fourth metal layer 92 and the first metal layer 81 are sequentially located in the first edge region along the extending direction of the first electrode fingers 40 Q1, the second edge area Q2 and the third edge area Q3. The third metal layer 91 , the fourth metal layer 92 and the first metal layer 81 are sequentially located in the fourth edge region Q4 and the third edge along the extending direction of the second electrode fingers 50 . area Q3 and the second edge area Q2.

在示例性实施方式中,多个所述第一电极指40上的所述第一金属层81与多个所述第二电极指50上的所述第四金属层92并排交替间隔设置且位于所述第三边缘区域Q3内,多个所述第二电极指50上的所述第三金属层91并排间隔设置且位于所述第四边缘区域Q4内。多个所述第一电极指40上的所述第三金属层91并排间隔设置且位于所述第一边缘区域Q1内,多个所述第一电极指40上的所述第四金属层92与多个所述第二电极指50上的所述第一金属层81并排交替间隔设置且位于所述第二边缘区域Q2内。In an exemplary embodiment, the first metal layers 81 on the plurality of first electrode fingers 40 and the fourth metal layers 92 on the plurality of second electrode fingers 50 are alternately arranged side by side and located at In the third edge area Q3, the third metal layers 91 on the plurality of second electrode fingers 50 are arranged side by side and at intervals and located in the fourth edge area Q4. The third metal layer 91 on the plurality of first electrode fingers 40 is arranged side by side at intervals and located in the first edge region Q1, and the fourth metal layer 92 on the plurality of first electrode fingers 40 The first metal layers 81 on the plurality of second electrode fingers 50 are arranged side by side, alternately and at intervals, and are located in the second edge region Q2.

请参阅图5和图6,图5为本申请实施例公开的第三种谐振器的层结构示意图,图6为图5所示的谐振器的叉指换能器的正视结构示意图。第三种谐振器103与第一种谐振器101的区别点在于:第三种谐振器103的叉指换能器1的第一活塞结构80只包括第二金属层82,未包括第一金属层81。第三种谐振器103与第一种谐振器101的相同之处的描述请参照第一种谐振器101的描述,在此不再赘述。Please refer to FIG. 5 and FIG. 6. FIG. 5 is a schematic diagram of the layer structure of the third type of resonator disclosed in the embodiment of the present application, and FIG. 6 is a schematic diagram of the front view structure of the IDT of the resonator shown in FIG. 5 . The difference between the third type of resonator 103 and the first type of resonator 101 is that the first piston structure 80 of the IDT 1 of the third type of resonator 103 only includes the second metal layer 82 and does not include the first metal layer. Layer 81. For the description of the similarities between the third type of resonator 103 and the first type of resonator 101 , please refer to the description of the first type of resonator 101 , which will not be repeated here.

在本申请实施例中,设置于至少部分所述第一电极指40和至少部分所述第二电极指50上的至少一个活塞结构60均包括间隔设置的第一活塞结构80以及第二活塞结构90,所述第一活塞结构80包括第二金属层82,所述第二活塞结构90包括第三金属层91以及第四金属层92。其中,所述第三金属层91与所述第四金属层92的厚度不同。In the embodiment of the present application, at least one piston structure 60 disposed on at least part of the first electrode fingers 40 and at least part of the second electrode fingers 50 includes first piston structures 80 and second piston structures arranged at intervals. 90 , the first piston structure 80 includes a second metal layer 82 , and the second piston structure 90 includes a third metal layer 91 and a fourth metal layer 92 . Wherein, the third metal layer 91 and the fourth metal layer 92 have different thicknesses.

在本申请实施方式中,所述第三金属层91、所述第四金属层92以及所述第二金属层82沿着所述第一电极指40的延伸方向依次位于所述第一边缘区域Q1、所述第二边缘区域Q2以及所述第四边缘区域Q4,且所述第二金属层82位于所述第一电极指40背对所述第一汇流条10的端部。In the embodiment of the present application, the third metal layer 91 , the fourth metal layer 92 and the second metal layer 82 are sequentially located in the first edge region along the extending direction of the first electrode fingers 40 Q1 , the second edge area Q2 and the fourth edge area Q4 , and the second metal layer 82 is located at the end of the first electrode finger 40 facing away from the first bus bar 10 .

在本申请实施方式中,所述第三金属层91、所述第四金属层92以及所述第二金属层82沿着所述第二电极指50的延伸方向依次位于所述第四边缘区域Q4、所述第三边缘区域Q3以及所述第一边缘区域Q1,且所述第二金属层82位于所述第二电极指50背对所述第二汇流条20的端部。In the embodiment of the present application, the third metal layer 91 , the fourth metal layer 92 and the second metal layer 82 are sequentially located in the fourth edge region along the extending direction of the second electrode fingers 50 Q4 , the third edge area Q3 and the first edge area Q1 , and the second metal layer 82 is located at the end of the second electrode finger 50 facing away from the second bus bar 20 .

在示例性实施方式中,多个所述第二电极指50上的所述第四金属层92并排间隔设置且位于所述第三边缘区域Q3内,多个所述第一电极指40上的所述第二金属层82与多个所述第二电极指50上的所述第三金属层91并排交替间隔设置且位于所述第四边缘区域Q4内。多个所述第一电极指40上的所述第三金属层91与多个所述第二电极指50上的所述第二金属层82并排交替间隔设置且位于所述第一边缘区域Q1内,多个所述第一电极指40上的所述第四金属层92并排间隔设置且位于所述第二边缘区域Q2内。In an exemplary embodiment, the fourth metal layers 92 on the plurality of second electrode fingers 50 are arranged side by side at intervals and located in the third edge region Q3, and the plurality of first electrode fingers 40 The second metal layer 82 and the third metal layer 91 on the plurality of second electrode fingers 50 are alternately arranged side by side and located in the fourth edge region Q4 . The third metal layers 91 on the plurality of first electrode fingers 40 and the second metal layers 82 on the plurality of second electrode fingers 50 are alternately arranged side by side and located in the first edge region Q1 Inside, the fourth metal layers 92 on the plurality of first electrode fingers 40 are arranged side by side at intervals and located in the second edge region Q2.

请参阅图7和图8,图7为本申请实施例公开的第四种谐振器的层结构示意图,图8为图7所示的谐振器的叉指换能器的正视结构示意图。第四种谐振器104与第一种谐振器101的区别点在于:第四种谐振器104的叉指换能器1只包括第一活塞结构80,未包括第二活塞结构90。第四种谐振器104与第一种谐振器101的相同之处的描述请参照第一种谐振器101的描述,在此不再赘述。Please refer to FIG. 7 and FIG. 8 , FIG. 7 is a schematic diagram of the layer structure of the fourth resonator disclosed in the embodiment of the present application, and FIG. 8 is a schematic diagram of the front view structure of the interdigital transducer of the resonator shown in FIG. 7 . The difference between the fourth type of resonator 104 and the first type of resonator 101 is that the IDT 1 of the fourth type of resonator 104 only includes the first piston structure 80 and does not include the second piston structure 90 . For the description of the similarities between the fourth type of resonator 104 and the first type of resonator 101 , please refer to the description of the first type of resonator 101 , which will not be repeated here.

在本申请实施例中,设置于至少部分所述第一电极指40和至少部分所述第二电极指50上的至少一个活塞结构60均包括第一活塞结构80,所述第一活塞结构80包括第一金属层81以及第二金属层82。其中,所述第一金属层81的厚度与所述第二金属层82的厚度不同。In the embodiment of the present application, at least one piston structure 60 disposed on at least part of the first electrode fingers 40 and at least part of the second electrode fingers 50 includes a first piston structure 80, and the first piston structure 80 It includes a first metal layer 81 and a second metal layer 82 . Wherein, the thickness of the first metal layer 81 is different from the thickness of the second metal layer 82 .

在本申请实施方式中,所述第一金属层81以及所述第二金属层82沿着所述第一电极指40的延伸方向依次位于所述第三边缘区域Q3以及所述第四边缘区域Q4,且所述第二金属层82位于所述第一电极指40背对所述第一汇流条10的端部。所述第一金属层81以及所述第二金属层82沿着所述第二电极指50的延伸方向依次位于所述第二边缘区域Q2以及所述第一边缘区域Q1,且所述第二金属层82位于所述第二电极指50背对所述第二汇流条20的端部。In the embodiment of the present application, the first metal layer 81 and the second metal layer 82 are sequentially located in the third edge region Q3 and the fourth edge region along the extending direction of the first electrode fingers 40 Q4, and the second metal layer 82 is located at the end of the first electrode finger 40 facing away from the first bus bar 10 . The first metal layer 81 and the second metal layer 82 are sequentially located in the second edge region Q2 and the first edge region Q1 along the extending direction of the second electrode finger 50 , and the second The metal layer 82 is located at the end of the second electrode finger 50 facing away from the second bus bar 20 .

在示例性实施方式中,多个所述第一电极指40上的所述第一金属层81并排交替设置且位于所述第三边缘区域Q3内,多个所述第一电极指40上的所述第二金属层82并排间隔设置且位于所述第四边缘区域Q4内。多个所述第二电极指50上的所述第二金属层82并排间隔设置且位于所述第一边缘区域Q1内,多个所述第二电极指50上的所述第一金属层81并排间隔设置且位于所述第二边缘区域Q2内。In an exemplary embodiment, the first metal layers 81 on the plurality of first electrode fingers 40 are alternately arranged side by side and located in the third edge region Q3, and the first metal layers 81 on the plurality of first electrode fingers 40 The second metal layers 82 are arranged side by side at intervals and located in the fourth edge region Q4. The second metal layers 82 on the plurality of second electrode fingers 50 are arranged side by side at intervals and located in the first edge region Q1, and the first metal layers 81 on the plurality of second electrode fingers 50 arranged side by side at intervals and located in the second edge region Q2.

请参阅图1、图3、图5以及图7,在本申请实施例中,位于所述第一边缘区域Q1的金属层的厚度大于位于所述第二边缘区域Q2的金属层的厚度,位于所述第四边缘区域Q4的金属层的厚度大于位于所述第三边缘区域Q3的金属层的厚度。Please refer to FIG. 1 , FIG. 3 , FIG. 5 and FIG. 7 . In the embodiment of the present application, the thickness of the metal layer located in the first edge region Q1 is greater than the thickness of the metal layer located in the second edge region Q2 . The thickness of the metal layer in the fourth edge region Q4 is greater than the thickness of the metal layer in the third edge region Q3.

在示例性实施方式中,所述第二金属层82的厚度大于所述第一金属层81的厚度,所述第三金属层91的厚度大于所述第四金属层92的厚度。In an exemplary embodiment, the thickness of the second metal layer 82 is greater than that of the first metal layer 81 , and the thickness of the third metal layer 91 is greater than that of the fourth metal layer 92 .

在示例性实施方式中,位于所述第一边缘区域Q1的金属层的厚度与位于所述第四边缘区域Q4的金属层的厚度可以相等,也可以不等;位于所述第二边缘区域Q2的金属层的厚度与位于所述第三边缘区域Q3的金属层的厚度可以相等,也可以不等,对此本申请实施例不做限定。In an exemplary embodiment, the thickness of the metal layer located in the first edge area Q1 and the thickness of the metal layer located in the fourth edge area Q4 may be equal or different; the thickness of the metal layer located in the second edge area Q2 The thickness of the metal layer and the thickness of the metal layer located in the third edge region Q3 may be equal or different, which is not limited in this embodiment of the present application.

请参阅图2、图4、图6以及图8,在本申请实施例中,位于所述第一边缘区域Q1的金属层的长度与位于所述第二边缘区域Q2的金属层的长度的比值为0.8至1.2;位于所述第四边缘区域Q4的金属层的长度与位于所述第三边缘区域Q3的金属层的长度的比值为0.8至1.2。Please refer to FIG. 2 , FIG. 4 , FIG. 6 and FIG. 8 , in the embodiment of the present application, the ratio of the length of the metal layer located in the first edge region Q1 to the length of the metal layer located in the second edge region Q2 is 0.8 to 1.2; the ratio of the length of the metal layer located in the fourth edge region Q4 to the length of the metal layer located in the third edge region Q3 is 0.8 to 1.2.

在本申请实施方式中,所述第二金属层82的长度与所述第一金属层81的长度的比值为0.8至1.2,例如,0.8、0.9、1、1.1、1.2、或其他数值,本申请对此不作具体限制。所述第三金属层91的长度与所述第四金属层92的长度的比值为0.8至1.2,例如,0.8、0.9、1、1.1、1.2、或其他数值,本申请对此不作具体限制。In the embodiment of the present application, the ratio of the length of the second metal layer 82 to the length of the first metal layer 81 is 0.8 to 1.2, for example, 0.8, 0.9, 1, 1.1, 1.2, or other values. The application is not specifically limited to this. The ratio of the length of the third metal layer 91 to the length of the fourth metal layer 92 is 0.8 to 1.2, for example, 0.8, 0.9, 1, 1.1, 1.2, or other values, which is not specifically limited in the present application.

在示例性实施方式中,所述第二金属层82的长度与所述第三金属层91的长度相同,所述第一金属层81的长度与所述第四金属层92的长度相同。In an exemplary embodiment, the second metal layer 82 has the same length as the third metal layer 91 , and the first metal layer 81 has the same length as the fourth metal layer 92 .

在示例性实施方式中,位于所述第一边缘区域Q1的金属层的长度与位于所述第四边缘区域Q4的金属层的长度可以相等,也可以不等;位于所述第二边缘区域Q2的金属层的长度与位于所述第三边缘区域Q3的金属层的长度可以相等,也可以不等,对此本申请实施例不做限定。In an exemplary embodiment, the length of the metal layer located in the first edge area Q1 and the length of the metal layer located in the fourth edge area Q4 may be equal or different; the length of the metal layer located in the second edge area Q2 The length of the metal layer and the length of the metal layer located in the third edge region Q3 may be equal or different, which is not limited in this embodiment of the present application.

在本申请实施例中,位于所述第一边缘区域Q1的金属层的宽度与位于所述第二边缘区域Q2的金属层的宽度的比值为0.8至1.2;位于所述第四边缘区域Q4的金属层的宽度与位于所述第三边缘区域Q3的金属层的宽度的比值为0.8至1.2。In the embodiment of the present application, the ratio of the width of the metal layer located in the first edge region Q1 to the width of the metal layer located in the second edge region Q2 is 0.8 to 1.2; The ratio of the width of the metal layer to the width of the metal layer located in the third edge region Q3 is 0.8 to 1.2.

在本申请实施方式中,所述第二金属层82的宽度与所述第一金属层81的宽度的比值为0.8至1.2,例如,0.8、0.9、1、1.1、1.2、或其他数值,本申请对此不作具体限制。所述第三金属层91的宽度与所述第四金属层92的宽度的比值为0.8至1.2,例如,0.8、0.9、1、1.1、1.2、或其他数值,本申请对此不作具体限制。In the embodiment of the present application, the ratio of the width of the second metal layer 82 to the width of the first metal layer 81 is 0.8 to 1.2, for example, 0.8, 0.9, 1, 1.1, 1.2, or other values. The application is not specifically limited to this. The ratio of the width of the third metal layer 91 to the width of the fourth metal layer 92 is 0.8 to 1.2, for example, 0.8, 0.9, 1, 1.1, 1.2, or other values, which is not specifically limited in the present application.

在示例性实施方式中,所述第二金属层82的宽度与所述第三金属层91的宽度相同,所述第一金属层81的宽度与所述第四金属层92的宽度相同。In an exemplary embodiment, the second metal layer 82 has the same width as the third metal layer 91 , and the first metal layer 81 has the same width as the fourth metal layer 92 .

在示例性实施方式中,位于所述第一边缘区域Q1的金属层的宽度与位于所述第四边缘区域Q4的金属层的宽度可以相等,也可以不等;位于所述第二边缘区域Q2的金属层的宽度与位于所述第三边缘区域Q3的金属层的宽度可以相等,也可以不等,对此本申请实施例不做限定。In an exemplary embodiment, the width of the metal layer located in the first edge area Q1 and the width of the metal layer located in the fourth edge area Q4 may be equal or different; the width of the metal layer located in the second edge area Q2 The width of the metal layer and the width of the metal layer located in the third edge region Q3 may be equal or different, which is not limited in this embodiment of the present application.

在本申请实施例中,位于所述第一边缘区域的金属层的厚度与位于所述第二边缘区域的金属层的厚度的比值为1.2至5;位于所述第四边缘区域的金属层的厚度与位于所述第三边缘区域的金属层的厚度的比值为1.2至5。In the embodiment of the present application, the ratio of the thickness of the metal layer located in the first edge area to the thickness of the metal layer located in the second edge area is 1.2 to 5; the ratio of the thickness of the metal layer located in the fourth edge area The ratio of the thickness to the thickness of the metal layer located in the third edge region is 1.2 to 5.

在本申请实施方式中,所述第二金属层82的厚度与所述第一金属层81的厚度的比值为1.2至5,例如,1.2、2、3.2、4.3、5、或其他数值,本申请对此不作具体限制。所述第三金属层91的厚度与所述第四金属层92的厚度的比值为1.2至5,例如,1.2、2、3、3.2、4.3、5、或其他数值,本申请对此不作具体限制。In the embodiment of the present application, the ratio of the thickness of the second metal layer 82 to the thickness of the first metal layer 81 is 1.2 to 5, for example, 1.2, 2, 3.2, 4.3, 5, or other values. The application is not specifically limited to this. The ratio of the thickness of the third metal layer 91 to the thickness of the fourth metal layer 92 is 1.2 to 5, for example, 1.2, 2, 3, 3.2, 4.3, 5, or other values, which are not specified in this application. limit.

可以理解的是,所述第二金属层82与所述第一金属层81需存在一定的厚度差,所述第三金属层91与所述第四金属层92需存在一定的厚度差,且差距不宜太大。所述第二金属层82的厚度需大于所述第一金属层81的厚度,所述第三金属层91的厚度大于所述第四金属层92的厚度,且二者的比值不宜太大;若比值太大,虽然同样有抑制横向模态的效果,但会造成反谐点的品质因数值过低。在所述第二金属层82的厚度与所述第一金属层81的厚度的比值为1.2至5时,所述第三金属层91的厚度与所述第四金属层92的厚度的比值为1.2至5时,可以获得较好的横向模态抑制效果,且能有效地提升品质因数值。It can be understood that there must be a certain thickness difference between the second metal layer 82 and the first metal layer 81, and there must be a certain thickness difference between the third metal layer 91 and the fourth metal layer 92, and The gap should not be too large. The thickness of the second metal layer 82 needs to be greater than the thickness of the first metal layer 81, the thickness of the third metal layer 91 is greater than the thickness of the fourth metal layer 92, and the ratio of the two should not be too large; If the ratio is too large, although it also has the effect of suppressing the transverse mode, it will cause the quality factor value of the antiharmonic point to be too low. When the ratio of the thickness of the second metal layer 82 to the thickness of the first metal layer 81 is 1.2 to 5, the ratio of the thickness of the third metal layer 91 to the thickness of the fourth metal layer 92 is From 1.2 to 5, a better transverse mode suppression effect can be obtained, and the quality factor value can be effectively improved.

在示例性实施方式中,所述第二金属层82的厚度与所述第三金属层91的厚度相同,所述第一金属层81的厚度与所述第四金属层92的厚度相同。In an exemplary embodiment, the second metal layer 82 has the same thickness as the third metal layer 91 , and the first metal layer 81 has the same thickness as the fourth metal layer 92 .

在示例性实施方式中,位于所述第一边缘区域Q1的金属层的厚度与位于所述第四边缘区域Q4的金属层的厚度可以相等,也可以不等;位于所述第二边缘区域Q2的金属层的厚度与位于所述第三边缘区域Q3的金属层的厚度可以相等,也可以不等,对此本申请实施例不做限定。In an exemplary embodiment, the thickness of the metal layer located in the first edge area Q1 and the thickness of the metal layer located in the fourth edge area Q4 may be equal or different; the thickness of the metal layer located in the second edge area Q2 The thickness of the metal layer and the thickness of the metal layer located in the third edge region Q3 may be equal or different, which is not limited in this embodiment of the present application.

在本申请实施例中,位于所述第一边缘区域的金属层的长度与位于所述第二边缘区域的金属层的长度的比值为1,位于所述第四边缘区域的金属层的长度与位于所述第三边缘区域的金属层的长度的比值为1。In the embodiment of the present application, the ratio of the length of the metal layer located in the first edge area to the length of the metal layer located in the second edge area is 1, and the length of the metal layer located in the fourth edge area is equal to The ratio of the lengths of the metal layers located in the third edge region is 1.

在本申请实施例中,位于所述第一边缘区域的金属层的宽度与位于所述第二边缘区域的金属层的宽度的比值为1,位于所述第四边缘区域的金属层的宽度与位于所述第三边缘区域的金属层的宽度的比值为1。In the embodiment of the present application, the ratio of the width of the metal layer located in the first edge region to the width of the metal layer located in the second edge region is 1, and the ratio of the width of the metal layer located in the fourth edge region to The ratio of the width of the metal layer located in the third edge region is 1.

在本申请实施例中,位于所述第一边缘区域的金属层的厚度与位于所述第二边缘区域的金属层的厚度的比值为2,位于所述第四边缘区域的金属层的厚度与位于所述第三边缘区域的金属层的厚度的比值为2。In the embodiment of the present application, the ratio of the thickness of the metal layer located in the first edge area to the thickness of the metal layer located in the second edge area is 2, and the thickness of the metal layer located in the fourth edge area is equal to The thickness ratio of the metal layer located in the third edge region is 2.

在本申请实施方式中,所述第二金属层82的长度与所述第一金属层81的长度的比值为1,所述第三金属层91的长度与所述第四金属层92的长度的比值为1。所述第二金属层82的宽度与所述第一金属层81的宽度的比值为1,所述第三金属层91的宽度与所述第四金属层92的宽度的比值为1。所述第二金属层82的厚度与所述第一金属层81的厚度的比值为2,所述第三金属层91的厚度与所述第四金属层92的厚度的比值为2。In the embodiment of the present application, the ratio of the length of the second metal layer 82 to the length of the first metal layer 81 is 1, the length of the third metal layer 91 to the length of the fourth metal layer 92 The ratio is 1. The ratio of the width of the second metal layer 82 to the width of the first metal layer 81 is 1, and the ratio of the width of the third metal layer 91 to the width of the fourth metal layer 92 is 1. The ratio of the thickness of the second metal layer 82 to the thickness of the first metal layer 81 is 2, and the ratio of the thickness of the third metal layer 91 to the thickness of the fourth metal layer 92 is 2.

在示例性实施方式中,位于所述第一边缘区域Q1的金属层的长度、厚度以及宽度分别与位于所述第四边缘区域Q4的金属层的长度、厚度以及宽度可以相等,也可以不等;位于所述第二边缘区域Q2的金属层的长度、厚度以及宽度分别与位于所述第三边缘区域Q3的金属层的长度、厚度以及宽度可以相等,也可以不等,对此本申请实施例不做限定。In an exemplary embodiment, the length, thickness and width of the metal layer located in the first edge region Q1 may be equal to or different from the length, thickness and width of the metal layer located in the fourth edge region Q4 respectively. The length, thickness and width of the metal layer located in the second edge region Q2 and the length, thickness and width of the metal layer located in the third edge region Q3 may be equal or different, and this application implements Examples are not limited.

请参阅图9至图11,图9为本申请实施例公开的叉指换能器的第一优选结构参数对应的导纳曲线示意图,图10为本申请实施例公开的叉指换能器的第二优选结构参数对应的导纳曲线示意图,图11为本申请实施例公开的叉指换能器的第三优选结构参数对应的导纳曲线示意图。Please refer to Figures 9 to 11, Figure 9 is a schematic diagram of the admittance curve corresponding to the first preferred structural parameter of the IDT disclosed in the embodiment of the present application, and Figure 10 is a schematic diagram of the admittance curve of the IDT disclosed in the embodiment of the present application A schematic diagram of the admittance curve corresponding to the second preferred structural parameter, and FIG. 11 is a schematic diagram of the admittance curve corresponding to the third preferred structural parameter of the interdigital transducer disclosed in the embodiment of the present application.

在本申请实施方式中,在控制金属层宽度以及厚度不变的情况下,调整金属层长度。第一优选结构参数对应为:所述第二金属层82的长度与所述第一金属层81的长度的比值为1,所述第三金属层91的长度与所述第四金属层92的长度的比值为1。从图9中可以看出,当所述叉指换能器1的结构参数为第一优选结构参数时候,谐振点与反谐振点之间的导纳曲线光滑,不存在杂波,导纳实部曲线在谐振点与反谐振点之间没有较尖锐的峰,从而能够很好地抑制横向模态。In the embodiment of the present application, the length of the metal layer is adjusted while controlling the width and thickness of the metal layer. The first preferred structural parameter corresponds to: the ratio of the length of the second metal layer 82 to the length of the first metal layer 81 is 1, the length of the third metal layer 91 to the length of the fourth metal layer 92 The ratio of the lengths is 1. As can be seen from FIG. 9, when the structural parameter of the IDT 1 is the first optimal structural parameter, the admittance curve between the resonance point and the anti-resonance point is smooth, there is no clutter, and the admittance is real. The upper curve has no sharper peak between the resonance point and the anti-resonance point, so that the transverse mode can be well suppressed.

在本申请实施方式中,在控制金属层长度以及厚度不变的情况下,调整金属层宽度。第二优选结构参数对应为:所述第二金属层82的宽度与所述第一金属层81的宽度的比值为1,所述第三金属层91的宽度与所述第四金属层92的宽度的比值为1。从图10中可以看出,当所述叉指换能器1的结构参数为第二优选结构参数时候,谐振点与反谐振点之间的导纳曲线光滑,不存在杂波,导纳实部曲线在谐振点与反谐振点之间没有较尖锐的峰,从而能够很好地抑制横向模态。In the embodiment of the present application, the width of the metal layer is adjusted under the condition that the length and thickness of the metal layer are kept constant. The second preferred structural parameter corresponds to: the ratio of the width of the second metal layer 82 to the width of the first metal layer 81 is 1, the width of the third metal layer 91 to the width of the fourth metal layer 92 The width ratio is 1. As can be seen from FIG. 10, when the structural parameter of the IDT 1 is the second optimal structural parameter, the admittance curve between the resonance point and the anti-resonance point is smooth, there is no clutter, and the admittance is real. The upper curve has no sharper peak between the resonance point and the anti-resonance point, so that the transverse mode can be well suppressed.

在本申请实施方式中,在控制金属层长度以及宽度不变的情况下,调整金属层厚度。第三优选结构参数对应为:所述第二金属层82的厚度与所述第一金属层81的厚度的比值为2,所述第三金属层91的厚度与所述第四金属层92的厚度的比值为2。请一并参阅图11和图12,图12为现有技术的叉指换能器的结构参数对应的导纳曲线示意图,现有技术的叉指换能器的结构参数与第三优选结构参数的区别点在于:现有技术的活塞结构只有一个金属层。从图11中可以看出,当所述叉指换能器1的结构参数为第三优选结构参数时候,谐振点与反谐振点之间的导纳曲线光滑,不存在杂波,导纳实部曲线在谐振点与反谐振点之间没有较尖锐的峰,从而能够很好地抑制横向模态。从图12中可以看出,现有技术的叉指换能器的谐振点与反谐振点之间存在杂波,导纳实部曲线在谐振点处有比较尖锐的峰,从而致使横向模态的激发。In the embodiment of the present application, the thickness of the metal layer is adjusted under the condition that the length and width of the metal layer are kept constant. The third preferred structural parameter corresponds to: the ratio of the thickness of the second metal layer 82 to the thickness of the first metal layer 81 is 2, the thickness of the third metal layer 91 to the thickness of the fourth metal layer 92 The thickness ratio is 2. Please refer to Figure 11 and Figure 12 together, Figure 12 is a schematic diagram of the admittance curve corresponding to the structural parameters of the prior art IDT, the structural parameters of the prior art IDT and the third preferred structural parameter The difference is that the prior art piston structure has only one metal layer. As can be seen from FIG. 11, when the structural parameter of the IDT 1 is the third preferred structural parameter, the admittance curve between the resonance point and the anti-resonance point is smooth, there is no clutter, and the admittance is real. The upper curve has no sharper peak between the resonance point and the anti-resonance point, so that the transverse mode can be well suppressed. It can be seen from Fig. 12 that there is clutter between the resonance point and the anti-resonance point of the IDT in the prior art, and the real part curve of the admittance has a relatively sharp peak at the resonance point, thereby causing the transverse mode the excitation.

请参阅图13至图16,图13为图1所述的谐振器中各区域对应的声速分布示意图,图14为图3所述的谐振器中各区域对应的声速分布示意图,图15为图5所述的谐振器中各区域对应的声速分布示意图,图16为图7所述的谐振器中各区域对应的声速分布示意图。Please refer to Figure 13 to Figure 16, Figure 13 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in Figure 1, Figure 14 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in Figure 3, Figure 15 is a diagram FIG. 16 is a schematic diagram of the sound velocity distribution corresponding to each region in the resonator described in FIG. 7 .

在本申请实施例中,所述中间区域C对应的声速大于所述第一边缘区域Q1对应的声速以及所述第二边缘区域Q2对应的声速,且所述第一边缘区域Q1对应的声速与所述第二边缘区域Q2对应的声速不同。所述中间区域C对应的声速大于所述第三边缘区域Q3对应的声速以及所述第四边缘区域Q4对应的声速,且所述第三边缘区域Q3对应的声速与所述第四边缘区域Q4对应的声速不同。In the embodiment of the present application, the sound velocity corresponding to the middle region C is greater than the sound velocity corresponding to the first edge region Q1 and the sound velocity corresponding to the second edge region Q2, and the sound velocity corresponding to the first edge region Q1 is the same as The sound velocities corresponding to the second edge regions Q2 are different. The sound velocity corresponding to the middle region C is greater than the sound velocity corresponding to the third edge region Q3 and the sound velocity corresponding to the fourth edge region Q4, and the sound velocity corresponding to the third edge region Q3 is the same as the sound velocity corresponding to the fourth edge region Q4 The corresponding speed of sound is different.

在本申请实施方式中,所述第二边缘区域Q2对应的声速大于所述第一边缘区域Q1对应的声速,所述第三边缘区域Q3对应的声速大于所述第四边缘区域Q4对应的声速。In the embodiment of the present application, the sound velocity corresponding to the second edge region Q2 is greater than the sound velocity corresponding to the first edge region Q1, and the sound velocity corresponding to the third edge region Q3 is greater than the sound velocity corresponding to the fourth edge region Q4. .

可以理解的是,金属层的厚度越大,边缘区域对应的声速就越小。It can be understood that the greater the thickness of the metal layer, the lower the corresponding sound velocity in the edge region.

在示例性实施方式中,所述第一边缘区域Q1对应的声速大小与所述第四边缘区域Q4对应的声速大小相等,所述第二边缘区域Q2对应的声速大小与所述第三边缘区域Q3对应的声速大小相等。In an exemplary embodiment, the sound velocity corresponding to the first edge region Q1 is equal to the sound velocity corresponding to the fourth edge region Q4, and the sound velocity corresponding to the second edge region Q2 is equal to the sound velocity corresponding to the third edge region Q3 corresponds to the same speed of sound.

在本申请实施例中,请参阅图2、图4、图6以及图8,所述第一电极指40上的金属层的宽度小于或等于所述第一电极指的宽度,所述第二电极指50上的金属层的宽度小于或等于所述第二电极指的宽度。In the embodiment of the present application, please refer to FIG. 2 , FIG. 4 , FIG. 6 and FIG. 8 , the width of the metal layer on the first electrode finger 40 is less than or equal to the width of the first electrode finger, and the second The width of the metal layer on the electrode finger 50 is smaller than or equal to the width of the second electrode finger.

在本申请实施方式中,所述第一电极指40上的所述第三金属层91的宽度以及所述第四金属层92的宽度小于或等于所述第一电极指40的宽度,所述第一电极指40上的所述第一金属层81的宽度以及所述第二金属层82的宽度小于或等于所述第一电极指40的宽度。In the embodiment of the present application, the width of the third metal layer 91 and the width of the fourth metal layer 92 on the first electrode finger 40 are less than or equal to the width of the first electrode finger 40, the The width of the first metal layer 81 and the width of the second metal layer 82 on the first electrode finger 40 are smaller than or equal to the width of the first electrode finger 40 .

在本申请实施方式中,所述第二电极指50上的所述第三金属层91的宽度以及所述第四金属层92的宽度小于或等于所述第二电极指50的宽度,所述第二电极指50上的所述第一金属层81的宽度以及所述第二金属层82的宽度小于或等于所述第二电极指50的宽度。In the embodiment of the present application, the width of the third metal layer 91 and the width of the fourth metal layer 92 on the second electrode finger 50 are less than or equal to the width of the second electrode finger 50, the The width of the first metal layer 81 and the width of the second metal layer 82 on the second electrode finger 50 are less than or equal to the width of the second electrode finger 50 .

在本申请实施例中,请参阅图1、图3、图5以及图7,所述第一电极指40上的金属层的厚度小于所述第一电极指的厚度;所述第二电极指50上的金属层的厚度小于所述第二电极指的厚度。In the embodiment of the present application, please refer to FIG. 1 , FIG. 3 , FIG. 5 and FIG. 7 , the thickness of the metal layer on the first electrode finger 40 is smaller than the thickness of the first electrode finger; the second electrode finger The thickness of the metal layer on 50 is smaller than the thickness of the second electrode finger.

在本申请实施方式中,所述第一电极指40上的所述第三金属层91的厚度以及所述第四金属层92的厚度小于所述第一电极指40的厚度,所述第一电极指40上的所述第一金属层81的厚度以及所述第二金属层82的厚度小于所述第一电极指40的厚度。In the embodiment of the present application, the thickness of the third metal layer 91 and the thickness of the fourth metal layer 92 on the first electrode finger 40 are smaller than the thickness of the first electrode finger 40 , and the first The thicknesses of the first metal layer 81 and the second metal layer 82 on the electrode fingers 40 are smaller than the thickness of the first electrode fingers 40 .

在本申请实施方式中,所述第二电极指50上的所述第三金属层91的厚度以及所述第四金属层92的厚度小于所述第二电极指50的厚度,所述第二电极指50上的所述第一金属层81的厚度以及所述第二金属层82的厚度小于所述第二电极指50的厚度。In the embodiment of the present application, the thickness of the third metal layer 91 and the thickness of the fourth metal layer 92 on the second electrode finger 50 are smaller than the thickness of the second electrode finger 50 , and the second The thicknesses of the first metal layer 81 and the second metal layer 82 on the electrode fingers 50 are smaller than the thickness of the second electrode fingers 50 .

在本申请实施例中,请参阅图17与图18,图17为本申请实施例公开的谐振器的第五种层结构示意图,图18为图17所示的谐振器的叉指换能器的正视结构示意图。第五种谐振器105与第一种谐振器101的区别点在于:第五种谐振器105的叉指换能器1还包括多个第一假指130以及多个第二假指140。第五种谐振器105与第一种谐振器101的相同之处的描述请参照第一种谐振器101的描述,在此不再赘述。In the embodiment of the present application, please refer to Fig. 17 and Fig. 18, Fig. 17 is a schematic diagram of the fifth layer structure of the resonator disclosed in the embodiment of the present application, and Fig. 18 is the interdigital transducer of the resonator shown in Fig. 17 Schematic diagram of the front view structure. The difference between the fifth type of resonator 105 and the first type of resonator 101 is that the IDT 1 of the fifth type of resonator 105 further includes a plurality of first dummy fingers 130 and a plurality of second dummy fingers 140 . For the description of the similarities between the fifth type resonator 105 and the first type resonator 101 , please refer to the description of the first type resonator 101 , which will not be repeated here.

在本申请实施方式中,所述叉指换能器1还包括多个第一假指130以及多个第二假指140,所述第一假指130设置于所述第一电极指40与所述第二汇流条20之间,且所述第一假指130与所述第二汇流条20连接。所述第二假指140设置于所述第二电极指50与所述第一汇流条10之间,且所述第二假指140与所述第一汇流条10连接。In the embodiment of the present application, the interdigital transducer 1 further includes a plurality of first dummy fingers 130 and a plurality of second dummy fingers 140, and the first dummy fingers 130 are arranged between the first electrode fingers 40 and the second dummy fingers 140. between the second bus bars 20 , and the first dummy finger 130 is connected to the second bus bars 20 . The second dummy finger 140 is disposed between the second electrode fingers 50 and the first bus bar 10 , and the second dummy finger 140 is connected to the first bus bar 10 .

可以理解的是,在所述叉指换能器1上设置所述第一假指130以及所述第二假指140,能在所述第一假指130以及所述第二假指140所在的区域进一步形成低速区,可以进一步抑制所述谐振器101的横向模态。It can be understood that, setting the first dummy finger 130 and the second dummy finger 140 on the interdigital transducer 1 can be located where the first dummy finger 130 and the second dummy finger 140 are located. The region further forms a low-velocity region, which can further suppress the transverse mode of the resonator 101 .

在示例性实施方式中,多个所述第一电极指40与多个所述第二假指140沿着所述第一汇流条10的长度方向依次交替间隔设置,且所述第二假指140的长度小于所述第一电极指40的长度,所述第二假指140的宽高与所述第一电极指40的宽高相等。多个所述第二电极指50与多个所述第一假指130沿着所述第二汇流条20的长度方向依次交替间隔设置,且所述第一假指130的长度小于所述第二电极指50的长度,所述第一假指130的宽高与所述第二电极指50的宽高相等。In an exemplary embodiment, a plurality of the first electrode fingers 40 and a plurality of the second dummy fingers 140 are arranged alternately and alternately along the length direction of the first bus bar 10 , and the second dummy fingers The length of 140 is smaller than the length of the first electrode finger 40 , and the width and height of the second dummy finger 140 are equal to the width and height of the first electrode finger 40 . The plurality of second electrode fingers 50 and the plurality of first dummy fingers 130 are arranged alternately and alternately along the length direction of the second bus bar 20 , and the length of the first dummy fingers 130 is shorter than that of the first dummy fingers 130 . The length of the two electrode fingers 50 , the width and height of the first dummy finger 130 are equal to the width and height of the second electrode fingers 50 .

在示例性实施方式中,所述第一假指130与所述第一电极指40平行设置,且所述第一假指130的数量与所述第一电极指40的数量相同。所述第二假指140与所述第二电极指50平行设置,且所述第二假指140的数量与所述第二电极指50的数量相同。所述第一假指130的长宽高与所述第二假指140的长宽高相等。In an exemplary embodiment, the first dummy fingers 130 are arranged parallel to the first electrode fingers 40 , and the number of the first dummy fingers 130 is the same as the number of the first electrode fingers 40 . The second dummy fingers 140 are arranged parallel to the second electrode fingers 50 , and the number of the second dummy fingers 140 is the same as the number of the second electrode fingers 50 . The length, width, and height of the first dummy finger 130 are equal to the length, width, and height of the second dummy finger 140 .

在本申请实施方式中,请参阅图1、图3、图5、图7以及图16。所述谐振器101还包括温度补偿层9,所述温度补偿层9将所述叉指换能器1罩设于所述压电基片上7。所述温度补偿层9用于调节所述谐振器101的温度频率系数,以避免由于温度的变化导致的谐振器的谐振频率改变。In the implementation manner of this application, please refer to FIG. 1 , FIG. 3 , FIG. 5 , FIG. 7 and FIG. 16 . The resonator 101 also includes a temperature compensation layer 9 , and the temperature compensation layer 9 covers the IDT 1 on the piezoelectric substrate 7 . The temperature compensation layer 9 is used to adjust the temperature frequency coefficient of the resonator 101 to avoid changes in the resonant frequency of the resonator due to temperature changes.

在示例性实施方式中,所述温度补偿层9可以是具有正的温度系数,以补偿所述压电基片7的负温度系数。所述温度补偿层9的材料包括但不限于采用二氧化硅、含氟的二氧化硅以及氮化硅类含硅介质膜等。In an exemplary embodiment, the temperature compensation layer 9 may have a positive temperature coefficient to compensate for the negative temperature coefficient of the piezoelectric substrate 7 . The material of the temperature compensation layer 9 includes, but is not limited to, silicon dioxide, fluorine-containing silicon dioxide, silicon nitride-based silicon-containing dielectric films, and the like.

在示例性实施方式中,所述谐振器101还可以包括钝化层(图未示)和/或调频层(图未示),所述钝化层和/或所述调频层位于所述温度补偿层9背对所述压电基片7的一侧,所述钝化层与所述调频层的材料包括但不限于氮化硅(Si3N4)等。In an exemplary embodiment, the resonator 101 may further include a passivation layer (not shown) and/or a frequency modulation layer (not shown), and the passivation layer and/or the frequency modulation layer are located at the temperature The side of the compensation layer 9 facing away from the piezoelectric substrate 7, the materials of the passivation layer and the frequency modulation layer include but not limited to silicon nitride (Si3N4) and the like.

在示例性实施方式中,所述谐振器101可以是温度补偿型声表面波滤波器(Temperature Compensated SAW,TC-SAW)。In an exemplary embodiment, the resonator 101 may be a temperature compensated surface acoustic wave filter (Temperature Compensated SAW, TC-SAW).

在示例性实施方式中,所述叉指换能器1还可以应用于横向激励薄膜体声波谐振器(X-Film Bulk Acoustic Resonator,X-BAR)。请参阅图19,图19为本申请实施例公开的第六种谐振器的结构示意图。第六种谐振器106与第一种谐振器101的区别点在于:第六种谐振器106的叉指换能器1还包括衬底。所述谐振器106包括依次层叠设置的衬底8、压电基片7以及叉指换能器1,衬底8上形成有空腔,该空腔由衬底8的上表面贯穿至下表面,上表面为设有压电基片7的表面。第六种谐振器106与第一种谐振器101的相同之处的描述请参照第一种谐振器101的描述,在此不再赘述。In an exemplary embodiment, the interdigital transducer 1 can also be applied to a transversely excited film bulk acoustic resonator (X-Film Bulk Acoustic Resonator, X-BAR). Please refer to FIG. 19 . FIG. 19 is a schematic structural diagram of a sixth resonator disclosed in an embodiment of the present application. The difference between the sixth type of resonator 106 and the first type of resonator 101 is that the IDT 1 of the sixth type of resonator 106 also includes a substrate. The resonator 106 includes a substrate 8, a piezoelectric substrate 7, and an interdigital transducer 1 stacked in sequence. A cavity is formed on the substrate 8, and the cavity penetrates from the upper surface of the substrate 8 to the lower surface. , the upper surface is the surface on which the piezoelectric substrate 7 is provided. For the description of the similarities between the sixth type of resonator 106 and the first type of resonator 101 , please refer to the description of the first type of resonator 101 , which will not be repeated here.

在示例性实施方式中,横向激励薄膜体声波谐振器(X-Film Bulk AcousticResonator,X-BAR)的结构也可以是:衬底上形成有开窗,开窗的开口方向为设有压电基片7的表面,压电基片7覆盖在开窗上。In an exemplary embodiment, the structure of the lateral excitation film bulk acoustic resonator (X-Film Bulk Acoustic Resonator, X-BAR) may also be: a window is formed on the substrate, and the opening direction of the window is provided with a piezoelectric substrate On the surface of the sheet 7, the piezoelectric substrate 7 is covered on the window.

在本申请另一实施例中,所述交替区域包括由所述第一汇流条10指向所述第二汇流条20的方向依次设置的至少两个第五边缘区域、中间区域以及至少两个第六边缘区域。In another embodiment of the present application, the alternating regions include at least two fifth edge regions, a middle region and at least two fifth edge regions arranged in sequence from the first bus bar 10 to the second bus bar 20. Six edge regions.

所述中间区域对应的声速分别大于所述至少两个第五边缘区域对应的声速,以及所述至少两个第六边缘区域对应的声速;The speed of sound corresponding to the middle region is respectively greater than the speed of sound corresponding to the at least two fifth edge regions, and the speed of sound corresponding to the at least two sixth edge regions;

由所述中间区域指向所述第一汇流条10的方向依次排列的所述至少两个第五边缘区域对应的声速依次减小;The sound velocities corresponding to the at least two fifth edge regions arranged sequentially from the middle region to the direction of the first bus bar 10 decrease successively;

由所述中间区域指向所述第二汇流条20的方向依次排列的所述至少两个第六边缘区域对应的声速依次减小。The sound velocities corresponding to the at least two sixth edge regions arranged sequentially in a direction from the middle region to the second bus bar 20 decrease successively.

在示例性实施方式中,在至少两个第五边缘区域以及至少两个第六边缘区域分别设置金属层,可以通过控制金属层之间的厚度关系、宽度关系等结构,从而达到由所述中间区域指向所述第一汇流条10的方向依次排列的所述至少两个第五边缘区域对应的声速依次减小,以及由所述中间区域指向所述第二汇流条20的方向依次排列的所述至少两个第六边缘区域对应的声速依次减小的效果。In an exemplary embodiment, at least two fifth edge regions and at least two sixth edge regions are respectively provided with metal layers, and by controlling the thickness relationship and width relationship between the metal layers, the intermediate The sound velocities corresponding to the at least two fifth edge regions that are arranged in sequence pointing to the direction of the first bus bar 10 decrease in sequence, and the sound velocities corresponding to the at least two fifth edge regions that are arranged in sequence from the middle region to the direction of the second bus bar 20 The effect that the speed of sound corresponding to the at least two sixth edge regions decreases sequentially.

基于同样的发明构思,请参阅图20,图20为本申请实施例公开的滤波器的结构示意图。本申请实施例还提供一种滤波器200,所述滤波器200至少包括多个上述的谐振器101。Based on the same inventive concept, please refer to FIG. 20 , which is a schematic structural diagram of a filter disclosed in an embodiment of the present application. The embodiment of the present application further provides a filter 200, the filter 200 at least includes a plurality of the above-mentioned resonators 101 .

在本申请实施方式中,所述滤波器还至少可以包括输入端IN、输出端OUT、串联支路Bl以及至少一个并联支路B2。其中,所述串联支路Bl连接在所述输入端IN和所述输出端OUT之间,所述并联支路B2的一端与所述串联支路Bl连接,另一端与接地端GND连接;所述串联支路Bl中设置有至少两个串联的所述谐振器101,各并联支路B2中设置有并联的所述谐振器101。In the implementation manner of the present application, the filter may further include at least an input terminal IN, an output terminal OUT, a series branch B1 and at least one parallel branch B2. Wherein, the series branch B1 is connected between the input terminal IN and the output terminal OUT, one end of the parallel branch B2 is connected to the series branch B1, and the other end is connected to the ground terminal GND; At least two resonators 101 connected in series are arranged in the series branch B1, and the resonators 101 connected in parallel are arranged in each parallel branch B2.

在本申请实施方式中,以所述滤波器200包括第一种谐振器101进行举例说明。所述滤波器200还可以包括第二种谐振器102、第三种谐振器103、第四种谐振器104、第五种谐振器105以及第六种谐振器106,本申请对此不作具体限制。由于图1至图19所示的实施例已对谐振器进行了详细的介绍,在此不再赘述。In the implementation manner of the present application, the filter 200 includes the first type of resonator 101 as an example for illustration. The filter 200 may also include a second type of resonator 102, a third type of resonator 103, a fourth type of resonator 104, a fifth type of resonator 105, and a sixth type of resonator 106, which is not specifically limited in this application . Since the resonator has been introduced in detail in the embodiments shown in FIGS. 1 to 19 , details are not repeated here.

综上所述,本申请实施例提供的滤波器200包括多个谐振器101,所述谐振器101包括压电基片7以及叉指换能器1。所述叉指换能器1包括第一汇流条10、第二汇流条20、多个第一电极指40以及多个第二电极指50。所述第一电极指40上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第一电极指40背对所述第一汇流条10的端部。所述第二电极指50上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第二电极指50背对所述第二汇流条20的端部。位于所述第一电极指40上的所述活塞结构60中的至少一个包括厚度不同的两个金属层,位于所述第二电极指50上的所述活塞结构60中的至少一个包括厚度不同的两个金属层。因此,在所述第一电极指40以及所述第二电极指50上设置至少一个包括两个金属层的所述活塞结构60,且两个金属层不同,从而改变两个金属层所在的区域内的所述压电基片7上的声波信号传输速度,形成声学反射;从而避免了声波信号泄漏,将声波信号限制在所述叉指换能器内,进而提高了对所述谐振器101的横向模态的抑制;减小了声能损耗,提高了品质因数值并提升了所述谐振器101的性能。To sum up, the filter 200 provided by the embodiment of the present application includes a plurality of resonators 101 , and the resonators 101 include a piezoelectric substrate 7 and an IDT 1 . The IDT 1 includes a first bus bar 10 , a second bus bar 20 , a plurality of first electrode fingers 40 and a plurality of second electrode fingers 50 . At least one piston structure 60 is disposed on the first electrode finger 40 , and the piston structure 60 is at least located at an end of the first electrode finger 40 facing away from the first bus bar 10 . At least one piston structure 60 is disposed on the second electrode finger 50 , and the piston structure 60 is at least located at an end of the second electrode finger 50 facing away from the second bus bar 20 . At least one of the piston structures 60 located on the first electrode finger 40 includes two metal layers with different thicknesses, and at least one of the piston structures 60 located on the second electrode finger 50 includes two metal layers with different thicknesses. two metal layers. Therefore, at least one piston structure 60 including two metal layers is provided on the first electrode finger 40 and the second electrode finger 50, and the two metal layers are different, thereby changing the area where the two metal layers are located. The transmission speed of the acoustic wave signal on the piezoelectric substrate 7 in the interior forms an acoustic reflection; thereby avoiding the leakage of the acoustic wave signal, the acoustic wave signal is limited in the described interdigital transducer, thereby improving the performance of the resonator 101 The suppression of the transverse mode; the acoustic energy loss is reduced, the quality factor value is improved and the performance of the resonator 101 is improved.

基于同样的发明构思,本申请实施例还提供一种电子设备,包括基板以及上述的滤波器200,所述滤波器200倒装于所述基板上,并与所述基板电连接。Based on the same inventive concept, an embodiment of the present application further provides an electronic device, including a substrate and the above-mentioned filter 200 , where the filter 200 is flip-chip mounted on the substrate and electrically connected to the substrate.

在示例性实施方式中,所述基板可为印制电路板(Printed Circuit Board,PCB)。In an exemplary embodiment, the substrate may be a Printed Circuit Board (PCB).

在示例性实施方式中,所述电子设备包括但不局限于:LED面板、平板电脑、笔记本电脑、导航仪、手机和电子手表等任何具有PCBA板组件的电子设备或者部件,本申请对此不作具体限制。In an exemplary embodiment, the electronic equipment includes, but is not limited to: LED panels, tablet computers, notebook computers, navigators, mobile phones and electronic watches, etc., any electronic equipment or components with PCBA board components, and this application does not make any Specific restrictions.

可以理解地,所述电子设备还可包含诸如个人数字助理(Personal DigitalAssistant,PDA)和/或音乐播放器功能的电子设备,诸如手机、平板电脑、具备无线通讯功能的可穿戴电子设备(如智能手表)等。上述电子设备也可以是其它电子装置,诸如具有触敏表面(例如触控面板)的膝上型计算机(Laptop)等。在一些实施例中,所述电子设备可以具有通信功能,即可以通过2G(第二代手机通信技术规格)、3G(第三代手机通信技术规格)、4G(第四代手机通信技术规格)、5G(第五代手机通信技术规格)或W-LAN(无线局域网)或今后可能出现的通信方式与网络建立通信。为简明起见,对此本申请实施例不做进一步限定。Understandably, the electronic device may also include electronic devices such as personal digital assistants (Personal Digital Assistant, PDA) and/or music player functions, such as mobile phones, tablet computers, wearable electronic devices with wireless communication functions (such as smart watch), etc. The aforementioned electronic equipment may also be other electronic devices, such as a laptop computer (Laptop) with a touch-sensitive surface (eg, a touch panel). In some embodiments, the electronic device can have a communication function, that is, it can pass 2G (second-generation mobile phone communication technical specification), 3G (third-generation mobile phone communication technical specification), 4G (fourth-generation mobile phone communication technical specification) , 5G (fifth-generation mobile phone communication technology specification) or W-LAN (wireless local area network) or communication methods that may appear in the future to establish communication with the network. For the sake of brevity, this embodiment of the present application does not make further limitations.

由于图1至图20所示的实施例已对谐振器以及滤波器200进行了详细的介绍,在此不再赘述。Since the resonator and the filter 200 have been introduced in detail in the embodiments shown in FIGS. 1 to 20 , details are not repeated here.

综上所述,本申请实施例提供的电子设备包括滤波器200,所述滤波器包括多个谐振器101,所述谐振器101包括压电基片7以及叉指换能器1。所述叉指换能器1包括第一汇流条10、第二汇流条20、多个第一电极指40以及多个第二电极指50。所述第一电极指40上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第一电极指40背对所述第一汇流条10的端部。所述第二电极指50上设置有至少一个所述活塞结构60,所述活塞结构60至少位于所述第二电极指50背对所述第二汇流条20的端部。位于所述第一电极指40上的所述活塞结构60中的至少一个包括厚度不同的两个金属层,位于所述第二电极指50上的所述活塞结构60中的至少一个包括厚度不同的两个金属层。因此,在所述第一电极指40以及所述第二电极指50上设置至少一个包括两个金属层的所述活塞结构60,且两个金属层不同,从而改变两个金属层所在的区域内的所述压电基片7上的声波信号传输速度,形成声学反射;从而避免了声波信号泄漏,将声波信号限制在所述叉指换能器内,进而提高了对所述谐振器101的横向模态的抑制;减小了声能损耗,提高了品质因数值并提升了所述谐振器101的性能。To sum up, the electronic device provided by the embodiment of the present application includes a filter 200 , the filter includes a plurality of resonators 101 , and the resonators 101 include a piezoelectric substrate 7 and an IDT 1 . The IDT 1 includes a first bus bar 10 , a second bus bar 20 , a plurality of first electrode fingers 40 and a plurality of second electrode fingers 50 . At least one piston structure 60 is disposed on the first electrode finger 40 , and the piston structure 60 is at least located at an end of the first electrode finger 40 facing away from the first bus bar 10 . At least one piston structure 60 is disposed on the second electrode finger 50 , and the piston structure 60 is at least located at an end of the second electrode finger 50 facing away from the second bus bar 20 . At least one of the piston structures 60 located on the first electrode finger 40 includes two metal layers with different thicknesses, and at least one of the piston structures 60 located on the second electrode finger 50 includes two metal layers with different thicknesses. two metal layers. Therefore, at least one piston structure 60 including two metal layers is provided on the first electrode finger 40 and the second electrode finger 50, and the two metal layers are different, thereby changing the area where the two metal layers are located. The transmission speed of the acoustic wave signal on the piezoelectric substrate 7 in the interior forms an acoustic reflection; thereby avoiding the leakage of the acoustic wave signal, the acoustic wave signal is limited in the described interdigital transducer, thereby improving the performance of the resonator 101 The suppression of the transverse mode; the acoustic energy loss is reduced, the quality factor value is improved and the performance of the resonator 101 is improved.

在本说明书的描述中,参考术语“一个实施方式”、“一些实施方式”、“示意性实施方式”、“示例”、“具体示例”或“一些示例”等的描述意指结合所述实施方式或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施方式或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。In the description of this specification, reference to the terms "one embodiment", "some embodiments", "exemplary embodiments", "example", "specific examples" or "some examples" etc. The specific features, structures, materials or features described in the manner or example are included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the described specific features, structures, materials or characteristics may be combined in any suitable manner in any one or more embodiments or examples.

应当理解的是,本申请的应用不限于上述的举例,对本领域普通技术人员来说,可以根据上述说明加以改进或变换,所有这些改进和变换都应属于本申请所附权利要求的保护范围。本领域的一般技术人员可以理解实现上述实施例的全部或部分方法,并依本申请权利要求所作的等同变化,仍属于本申请所涵盖的范围。It should be understood that the application of the present application is not limited to the above examples, and those skilled in the art can make improvements or changes based on the above descriptions, and all these improvements and changes should belong to the protection scope of the appended claims of the present application. Those skilled in the art can understand that all or part of the methods for implementing the above embodiments, and equivalent changes made according to the claims of the present application, still belong to the scope covered by the present application.

Claims (21)

1.一种谐振器,包括压电基片、位于所述压电基片上的叉指换能器以及设置于所述叉指换能器的相对两侧的反射结构,其特征在于,所述叉指换能器包括:1. A resonator comprising a piezoelectric substrate, an interdigital transducer positioned on the piezoelectric substrate and reflective structures arranged on opposite sides of the interdigital transducer, characterized in that the Interdigital transducers include: 相对设置的第一汇流条以及第二汇流条;the first bus bar and the second bus bar arranged oppositely; 多个第一电极指以及多个第二电极指,多个所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,多个所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸,多个所述第一电极指与多个所述第二电极指依次交替间隔排列;A plurality of first electrode fingers and a plurality of second electrode fingers, the plurality of first electrode fingers are connected to the first bus bar and extend toward the second bus bar, the plurality of second electrode fingers are connected to the second bus bar The second bus bar is connected to and extends toward the first bus bar, and a plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged in sequence; 设置于至少部分所述第一电极指上的至少一个活塞结构,所述活塞结构至少位于所述第一电极指背对所述第一汇流条的端部,设置于至少部分所述第二电极指上的至少一个活塞结构,所述活塞结构至少位于所述第二电极指背对所述第二汇流条的端部;At least one piston structure disposed on at least part of the first electrode fingers, the piston structure is at least located at the end of the first electrode finger facing away from the first bus bar, and disposed on at least part of the second electrode at least one piston structure on a finger, the piston structure is located at least at the end of the second electrode finger facing away from the second bus bar; 位于所述第一电极指上的所述活塞结构中的至少一个包括厚度不同的两个金属层,位于所述第二电极指上的所述活塞结构中的至少一个包括厚度不同的两个金属层。At least one of the piston structures on the first electrode finger includes two metal layers with different thicknesses, and at least one of the piston structures on the second electrode finger includes two metal layers with different thicknesses. Floor. 2.如权利要求1所述的谐振器,其特征在于,位于所述第一电极指上的所述活塞结构中的至少一个包括相邻接且厚度不同的两个金属层,位于所述第二电极指上的所述活塞结构中的至少一个包括相邻接且厚度不同的两个金属层;或者,2. The resonator according to claim 1, wherein at least one of the piston structures located on the first electrode finger comprises two adjacent metal layers with different thicknesses, located on the first electrode finger At least one of the piston structures on the two electrode fingers includes two adjacent metal layers with different thicknesses; or, 位于所述第一电极指上的所述活塞结构中的至少一个包括间隔预设距离且厚度不同的两个金属层,位于所述第二电极指上的所述活塞结构中的至少一个包括间隔预设距离且厚度不同的两个金属层。At least one of the piston structures on the first electrode finger includes two metal layers with different thicknesses separated by a predetermined distance, and at least one of the piston structures on the second electrode finger includes a spacer Two metal layers with preset distances and different thicknesses. 3.如权利要求2所述的谐振器,其特征在于,多个所述第一电极指与多个所述第二电极指沿着所述第一汇流条和所述第二汇流条的延伸方向依次交替排列形成一交替区域,所述交替区域包括由所述第一汇流条指向所述第二汇流条的方向依次设置的第一边缘区域、第二边缘区域、中间区域、第三边缘区域以及第四边缘区域。3. The resonator according to claim 2, wherein a plurality of the first electrode fingers and a plurality of the second electrode fingers extend along the extension of the first bus bar and the second bus bar The directions are alternately arranged in order to form an alternating area, and the alternating area includes a first edge area, a second edge area, a middle area, and a third edge area arranged in sequence from the first bus bar to the direction of the second bus bar and the fourth edge region. 4.如权利要求3所述的谐振器,其特征在于,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括间隔设置的第一活塞结构与第二活塞结构,所述第一活塞结构包括第一金属层以及第二金属层,所述第二活塞结构包括第三金属层以及第四金属层,其中,所述第一金属层的厚度与所述第二金属层的厚度不同,所述第三金属层的厚度与所述第四金属层的厚度不同;所述第三金属层、所述第四金属层、所述第一金属层以及所述第二金属层沿着所述第一电极指的延伸方向依次位于所述第一边缘区域、所述第二边缘区域、所述第三边缘区域以及所述第四边缘区域,且所述第二金属层位于所述第一电极指背对所述第一汇流条的端部;4. The resonator according to claim 3, wherein at least one piston structure disposed on at least part of the first electrode fingers and at least part of the second electrode fingers includes first piston structures arranged at intervals With the second piston structure, the first piston structure includes a first metal layer and a second metal layer, and the second piston structure includes a third metal layer and a fourth metal layer, wherein the thickness of the first metal layer is Different from the thickness of the second metal layer, the thickness of the third metal layer is different from the thickness of the fourth metal layer; the third metal layer, the fourth metal layer, the first metal layer and the second metal layer is sequentially located in the first edge region, the second edge region, the third edge region and the fourth edge region along the extending direction of the first electrode fingers, and the The second metal layer is located at the end of the first electrode finger facing away from the first bus bar; 所述第三金属层、所述第四金属层、所述第一金属层以及所述第二金属层沿着所述第二电极指的延伸方向依次位于所述第四边缘区域、所述第三边缘区域、所述第二边缘区域以及所述第一边缘区域,且所述第二金属层位于所述第二电极指背对所述第二汇流条的端部。The third metal layer, the fourth metal layer, the first metal layer and the second metal layer are sequentially located in the fourth edge region, the first metal layer along the extending direction of the second electrode fingers. There are three edge regions, the second edge region and the first edge region, and the second metal layer is located at an end of the second electrode finger facing away from the second bus bar. 5.如权利要求3所述的谐振器,其特征在于,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括间隔设置的第一活塞结构以及第二活塞结构,所述第一活塞结构包括第一金属层,所述第二活塞结构包括第三金属层以及第四金属层,其中,所述第三金属层与所述第四金属层的厚度不同;5. The resonator according to claim 3, wherein at least one piston structure disposed on at least part of the first electrode fingers and at least part of the second electrode fingers includes first piston structures arranged at intervals And a second piston structure, the first piston structure includes a first metal layer, the second piston structure includes a third metal layer and a fourth metal layer, wherein the third metal layer and the fourth metal layer different thicknesses; 所述第三金属层、所述第四金属层以及所述第一金属层沿着所述第一电极指的延伸方向依次位于所述第一边缘区域、所述第二边缘区域以及所述第三边缘区域;所述第三金属层、所述第四金属层以及所述第一金属层沿着所述第二电极指的延伸方向依次位于所述第四边缘区域、所述第三边缘区域以及所述第二边缘区域。The third metal layer, the fourth metal layer and the first metal layer are sequentially located in the first edge region, the second edge region and the first electrode finger along the extending direction of the first electrode finger. Three edge regions; the third metal layer, the fourth metal layer, and the first metal layer are located in the fourth edge region, the third edge region in sequence along the extending direction of the second electrode fingers and the second edge region. 6.如权利要求3所述的谐振器,其特征在于,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括间隔设置的第一活塞结构以及第二活塞结构,所述第一活塞结构包括第二金属层,所述第二活塞结构包括第三金属层以及第四金属层,其中,所述第三金属层与所述第四金属层的厚度不同;6. The resonator according to claim 3, wherein at least one piston structure disposed on at least part of the first electrode fingers and at least part of the second electrode fingers includes first piston structures arranged at intervals And a second piston structure, the first piston structure includes a second metal layer, the second piston structure includes a third metal layer and a fourth metal layer, wherein the third metal layer and the fourth metal layer different thicknesses; 所述第三金属层、所述第四金属层以及所述第二金属层沿着所述第一电极指的延伸方向依次位于所述第一边缘区域、所述第二边缘区域以及所述第四边缘区域,且所述第二金属层位于所述第一电极指背对所述第一汇流条的端部;The third metal layer, the fourth metal layer, and the second metal layer are sequentially located in the first edge region, the second edge region, and the first electrode finger along the extending direction of the first electrode finger. Four edge regions, and the second metal layer is located at the end of the first electrode finger facing away from the first bus bar; 所述第三金属层、所述第四金属层以及所述第二金属层沿着所述第二电极指的延伸方向依次位于所述第四边缘区域、所述第三边缘区域以及所述第一边缘区域,且所述第二金属层位于所述第二电极指背对所述第二汇流条的端部。The third metal layer, the fourth metal layer and the second metal layer are sequentially located in the fourth edge region, the third edge region and the first electrode finger along the extending direction of the second electrode finger. An edge region, and the second metal layer is located at the end of the second electrode finger facing away from the second bus bar. 7.如权利要求3所述的谐振器,其特征在于,设置于至少部分所述第一电极指和至少部分所述第二电极指上的至少一个活塞结构均包括第一活塞结构,所述第一活塞结构包括第一金属层以及第二金属层,其中,所述第一金属层的厚度与所述第二金属层的厚度不同;7. The resonator according to claim 3, wherein at least one piston structure disposed on at least part of the first electrode fingers and at least part of the second electrode fingers comprises a first piston structure, the The first piston structure includes a first metal layer and a second metal layer, wherein the thickness of the first metal layer is different from the thickness of the second metal layer; 所述第一金属层以及所述第二金属层沿着所述第一电极指的延伸方向依次位于所述第三边缘区域以及所述第四边缘区域,且所述第二金属层位于所述第一电极指背对所述第一汇流条的端部;所述第一金属层以及所述第二金属层沿着所述第二电极指的延伸方向依次位于所述第二边缘区域以及所述第一边缘区域,且所述第二金属层位于所述第二电极指背对所述第二汇流条的端部。The first metal layer and the second metal layer are located in the third edge area and the fourth edge area in sequence along the extending direction of the first electrode fingers, and the second metal layer is located in the The first electrode finger faces away from the end of the first bus bar; the first metal layer and the second metal layer are sequentially located in the second edge region and the second metal layer along the extending direction of the second electrode finger. The first edge region, and the second metal layer is located at the end of the second electrode finger facing away from the second bus bar. 8.如权利要求4-7任一项所述的谐振器,其特征在于,位于所述第一边缘区域的金属层的厚度大于位于所述第二边缘区域的金属层的厚度,位于所述第四边缘区域的金属层的厚度大于位于所述第三边缘区域的金属层的厚度。8. The resonator according to any one of claims 4-7, wherein the thickness of the metal layer located in the first edge region is greater than the thickness of the metal layer located in the second edge region, and the thickness of the metal layer located in the second edge region is The thickness of the metal layer in the fourth edge region is greater than the thickness of the metal layer in the third edge region. 9.如权利要求4-7任一项所述的谐振器,其特征在于,位于所述第一边缘区域的金属层的长度与位于所述第二边缘区域的金属层的长度的比值为0.8至1.2;位于所述第四边缘区域的金属层的长度与位于所述第三边缘区域的金属层的长度的比值为0.8至1.2。9. The resonator according to any one of claims 4-7, wherein the ratio of the length of the metal layer located in the first edge region to the length of the metal layer located in the second edge region is 0.8 to 1.2; the ratio of the length of the metal layer located in the fourth edge region to the length of the metal layer located in the third edge region is 0.8 to 1.2. 10.如权利要求4-7任一项所述的谐振器,其特征在于,位于所述第一边缘区域的金属层的宽度与位于所述第二边缘区域的金属层的宽度的比值为0.8至1.2;位于所述第四边缘区域的金属层的宽度与位于所述第三边缘区域的金属层的宽度的比值为0.8至1.2。10. The resonator according to any one of claims 4-7, wherein the ratio of the width of the metal layer located in the first edge region to the width of the metal layer located in the second edge region is 0.8 to 1.2; the ratio of the width of the metal layer located in the fourth edge region to the width of the metal layer located in the third edge region is 0.8 to 1.2. 11.如权利要求4-7任一项所述的谐振器,其特征在于,位于所述第一边缘区域的金属层的厚度与位于所述第二边缘区域的金属层的厚度的比值为1.2至5;位于所述第四边缘区域的金属层的厚度与位于所述第三边缘区域的金属层的厚度的比值为1.2至5。11. The resonator according to any one of claims 4-7, wherein the ratio of the thickness of the metal layer located in the first edge region to the thickness of the metal layer located in the second edge region is 1.2 to 5; the ratio of the thickness of the metal layer at the fourth edge region to the thickness of the metal layer at the third edge region is 1.2 to 5. 12.如权利要求4-7任一项所述的谐振器,其特征在于,位于所述第一边缘区域的金属层的长度与位于所述第二边缘区域的金属层的长度的比值为1;位于所述第四边缘区域的金属层的长度与位于所述第三边缘区域的金属层的长度的比值为1;12. The resonator according to any one of claims 4-7, wherein the ratio of the length of the metal layer located in the first edge region to the length of the metal layer located in the second edge region is 1 ; The ratio of the length of the metal layer located in the fourth edge region to the length of the metal layer located in the third edge region is 1; 位于所述第一边缘区域的金属层的宽度与位于所述第二边缘区域的金属层的宽度的比值为1;位于所述第四边缘区域的金属层的宽度与位于所述第三边缘区域的金属层的宽度的比值为1;The ratio of the width of the metal layer located in the first edge region to the width of the metal layer located in the second edge region is 1; the ratio of the width of the metal layer located in the fourth edge region to the width of the metal layer located in the third edge region The ratio of the width of the metal layer is 1; 位于所述第一边缘区域的金属层的厚度与位于所述第二边缘区域的金属层的厚度的比值为2;位于所述第四边缘区域的金属层的厚度与位于所述第三边缘区域的金属层的厚度的比值为2。The ratio of the thickness of the metal layer located in the first edge area to the thickness of the metal layer located in the second edge area is 2; the thickness of the metal layer located in the fourth edge area is the same as that located in the third edge area The ratio of the thickness of the metal layer is 2. 13.如权利要求3-7任一项所述的谐振器,其特征在于,所述中间区域对应的声速大于所述第一边缘区域对应的声速以及所述第二边缘区域对应的声速,且所述第一边缘区域对应的声速与所述第二边缘区域对应的声速不同;13. The resonator according to any one of claims 3-7, wherein the sound velocity corresponding to the middle region is greater than the sound velocity corresponding to the first edge region and the sound velocity corresponding to the second edge region, and The speed of sound corresponding to the first edge region is different from the speed of sound corresponding to the second edge region; 所述中间区域对应的声速大于所述第三边缘区域对应的声速以及所述第四边缘区域对应的声速,且所述第三边缘区域对应的声速与所述第四边缘区域对应的声速不同。The sound velocity corresponding to the middle region is greater than the sound velocity corresponding to the third edge region and the sound velocity corresponding to the fourth edge region, and the sound velocity corresponding to the third edge region is different from the sound velocity corresponding to the fourth edge region. 14.如权利要求13所述谐振器,其特征在于,所述第二边缘区域对应的声速大于所述第一边缘区域对应的声速,所述第三边缘区域对应的声速大于所述第四边缘区域对应的声速。14. The resonator according to claim 13, wherein the sound velocity corresponding to the second edge region is greater than the sound velocity corresponding to the first edge region, and the sound velocity corresponding to the third edge region is greater than the fourth edge region The speed of sound corresponding to the region. 15.如权利要求1-7任一项所述的谐振器,其特征在于,所述第一电极指上的金属层的宽度小于或等于所述第一电极指的宽度;所述第二电极指上的金属层的宽度小于或等于所述第二电极指的宽度。15. The resonator according to any one of claims 1-7, wherein the width of the metal layer on the first electrode finger is less than or equal to the width of the first electrode finger; the second electrode The width of the metal layer on the finger is less than or equal to the width of the second electrode finger. 16.如权利要求1-7任一项所述的谐振器,其特征在于,所述第一电极指上的金属层的厚度小于所述第一电极指的厚度;所述第二电极指上的金属层的厚度小于所述第二电极指的厚度。16. The resonator according to any one of claims 1-7, wherein the thickness of the metal layer on the first electrode fingers is smaller than the thickness of the first electrode fingers; The thickness of the metal layer is smaller than the thickness of the second electrode finger. 17.如权利要求1-7任一项所述的谐振器,其特征在于,所述叉指换能器还包括多个第一假指以及多个第二假指,所述第一假指设置于所述第一电极指与所述第二汇流条之间,且所述第一假指与所述第二汇流条连接;所述第二假指设置于所述第二电极指与所述第一汇流条之间,且所述第二假指与所述第一汇流条连接。17. The resonator according to any one of claims 1-7, wherein the IDT further comprises a plurality of first dummy fingers and a plurality of second dummy fingers, the first dummy fingers It is arranged between the first electrode finger and the second bus bar, and the first dummy finger is connected to the second bus bar; the second dummy finger is arranged between the second electrode finger and the second bus bar. between the first bus bars, and the second dummy fingers are connected to the first bus bars. 18.如权利要求1-7任一项所述的谐振器,其特征在于,所述谐振器还包括温度补偿层,所述温度补偿层将所述叉指换能器罩设于所述压电基片上。18. The resonator according to any one of claims 1-7, characterized in that, the resonator further comprises a temperature compensation layer, and the temperature compensation layer covers the interdigital transducer on the pressure on the electrical substrate. 19.一种谐振器,包括压电基片以及位于所述压电基片上的叉指换能器,其特征在于,所述叉指换能器包括:19. A resonator comprising a piezoelectric substrate and an interdigital transducer located on the piezoelectric substrate, characterized in that the interdigital transducer comprises: 相对设置的第一汇流条以及第二汇流条;the first bus bar and the second bus bar arranged oppositely; 多个第一电极指以及多个第二电极指,多个所述第一电极指与所述第一汇流条连接并朝向所述第二汇流条延伸,多个所述第二电极指与所述第二汇流条连接并朝向所述第一汇流条延伸,多个所述第一电极指与多个所述第二电极指依次交替间隔排列;A plurality of first electrode fingers and a plurality of second electrode fingers, the plurality of first electrode fingers are connected to the first bus bar and extend toward the second bus bar, the plurality of second electrode fingers are connected to the second bus bar The second bus bar is connected to and extends toward the first bus bar, and a plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged in sequence; 多个所述第一电极指与多个所述第二电极指沿着所述第一汇流条和所述第二汇流条的延伸方向依次交替排列形成一交替区域,所述交替区域包括由所述第一汇流条指向所述第二汇流条的方向依次设置的至少两个第五边缘区域、中间区域以及至少两个第六边缘区域;A plurality of the first electrode fingers and a plurality of the second electrode fingers are alternately arranged sequentially along the extending direction of the first bus bar and the second bus bar to form an alternating area, and the alternating area includes the At least two fifth edge regions, a middle region and at least two sixth edge regions arranged sequentially in a direction in which the first bus bar points to the second bus bar; 所述中间区域对应的声速分别大于所述至少两个第五边缘区域对应的声速以及所述至少两个第六边缘区域对应的声速;The sound velocity corresponding to the middle region is respectively greater than the sound velocity corresponding to the at least two fifth edge regions and the sound velocity corresponding to the at least two sixth edge regions; 由所述中间区域指向所述第一汇流条的方向依次排列的所述至少两个第五边缘区域对应的声速依次减小;The sound velocities corresponding to the at least two fifth edge regions arranged sequentially from the middle region to the direction of the first bus bar decrease successively; 由所述中间区域指向所述第二汇流条的方向依次排列的所述至少两个第六边缘区域对应的声速依次减小。The sound velocities corresponding to the at least two sixth edge regions arranged sequentially in a direction from the middle region to the second bus bar decrease successively. 20.一种滤波器,其特征在于,至少包括多个如权利要求1-19任一项所述的谐振器。20. A filter, characterized by comprising at least a plurality of resonators according to any one of claims 1-19. 21.一种电子设备,其特征在于,包括基板以及如权利要求20所述的滤波器,所述滤波器安装于所述基板上,并与所述基板电连接。21. An electronic device, characterized by comprising a substrate and the filter according to claim 20, the filter being mounted on the substrate and electrically connected to the substrate.
CN202210912555.8A 2022-07-30 2022-07-30 Resonator, filter and electronic device Pending CN115425941A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116073780A (en) * 2022-12-30 2023-05-05 锐石创芯(重庆)科技有限公司 Elastic wave device manufacturing method, resonator and filter
CN116208115A (en) * 2023-02-07 2023-06-02 锐石创芯(重庆)科技有限公司 Elastic wave device, manufacturing method of elastic wave device, filter and electronic equipment
CN116232268A (en) * 2023-02-07 2023-06-06 锐石创芯(重庆)科技有限公司 Elastic wave device, filter, and electronic apparatus
CN116318017A (en) * 2023-02-15 2023-06-23 锐石创芯(重庆)科技有限公司 Resonator, filter, electronic device and method for manufacturing resonator
CN117526889A (en) * 2023-10-07 2024-02-06 锐石创芯(重庆)科技有限公司 Elastic wave device and radio frequency front end module
WO2024245101A1 (en) * 2023-05-29 2024-12-05 锐石创芯(重庆)科技有限公司 Resonator, filter, radio frequency front-end module, and manufacturing method for resonator

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116073780A (en) * 2022-12-30 2023-05-05 锐石创芯(重庆)科技有限公司 Elastic wave device manufacturing method, resonator and filter
CN116073780B (en) * 2022-12-30 2023-08-22 锐石创芯(重庆)科技有限公司 Elastic wave device manufacturing method, resonator and filter
CN116208115A (en) * 2023-02-07 2023-06-02 锐石创芯(重庆)科技有限公司 Elastic wave device, manufacturing method of elastic wave device, filter and electronic equipment
CN116232268A (en) * 2023-02-07 2023-06-06 锐石创芯(重庆)科技有限公司 Elastic wave device, filter, and electronic apparatus
CN116318017A (en) * 2023-02-15 2023-06-23 锐石创芯(重庆)科技有限公司 Resonator, filter, electronic device and method for manufacturing resonator
CN116318017B (en) * 2023-02-15 2024-04-12 锐石创芯(重庆)科技有限公司 Resonator, filter, electronic device and method for preparing resonator
WO2024245101A1 (en) * 2023-05-29 2024-12-05 锐石创芯(重庆)科技有限公司 Resonator, filter, radio frequency front-end module, and manufacturing method for resonator
CN117526889A (en) * 2023-10-07 2024-02-06 锐石创芯(重庆)科技有限公司 Elastic wave device and radio frequency front end module

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