CN115401313A - Two-photon automatic processing method, system and equipment for non-flat substrate - Google Patents
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- 239000000758 substrate Substances 0.000 title claims abstract description 213
- 238000003672 processing method Methods 0.000 title claims abstract description 22
- 238000012545 processing Methods 0.000 claims abstract description 300
- 238000000034 method Methods 0.000 claims abstract description 55
- 239000002086 nanomaterial Substances 0.000 claims abstract description 41
- 230000008569 process Effects 0.000 claims abstract description 30
- 229920001109 fluorescent polymer Polymers 0.000 claims description 74
- 230000033001 locomotion Effects 0.000 claims description 49
- 230000000694 effects Effects 0.000 claims description 22
- 238000003384 imaging method Methods 0.000 claims description 22
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000006073 displacement reaction Methods 0.000 claims description 10
- 238000013461 design Methods 0.000 claims description 9
- 238000007781 pre-processing Methods 0.000 claims description 9
- 230000000704 physical effect Effects 0.000 claims description 6
- 241000316887 Saissetia oleae Species 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 31
- 239000000463 material Substances 0.000 description 11
- 230000008859 change Effects 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 238000001914 filtration Methods 0.000 description 6
- 238000010606 normalization Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000004114 Ammonium polyphosphate Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009432 framing Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 2
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- 229910021532 Calcite Inorganic materials 0.000 description 1
- 208000020564 Eye injury Diseases 0.000 description 1
- 229920001486 SU-8 photoresist Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000799 fluorescence microscopy Methods 0.000 description 1
- 239000000017 hydrogel Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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Abstract
Description
技术领域technical field
本发明涉及激光加工技术领域,特别是涉及一种用于非平基底的双光子自动加工方法、一种用于非平基底的双光子自动加工系统、一种用于非平基底的双光子自动加工设备。The invention relates to the technical field of laser processing, in particular to a two-photon automatic processing method for non-flat substrates, a two-photon automatic processing system for non-flat substrates, a two-photon automatic processing system for non-flat substrates Processing Equipment.
背景技术Background technique
飞秒激光微纳米加工是一种新兴的纳米结构成型方法。它可以被视作是一种特殊的3D打印,即光固化成型技术。飞秒激光双光子直写加工对焦过程中,工作人员需要找到双光子材料与基底分界面作为加工基准面。通过控制三维运动台来控制基底上双光子加工材料与激光焦点的相对位置,当找到合适的加工基准面后对双光子材料进行飞秒激光双光子直接加工。Femtosecond laser micro-nanofabrication is an emerging method for forming nanostructures. It can be regarded as a special kind of 3D printing, that is, stereolithography. During the focusing process of femtosecond laser two-photon direct writing processing, the staff needs to find the interface between the two-photon material and the substrate as the processing reference plane. By controlling the three-dimensional motion table to control the relative position of the two-photon processing material on the substrate and the laser focus, when a suitable processing reference plane is found, the femtosecond laser two-photon direct processing is performed on the two-photon material.
当激光焦点偏离加工基准面时会出现两种状况:a)激光焦点大部分处于基底材料当中时,此时加工结构与设计结构相比不完整,显影后导致部分加工结构丢失。b)焦点完全处于聚合物材料时,会导致加工结构不与基底相连,显影后加工结构被冲掉导致结构完全丢失。When the laser focus deviates from the processing reference plane, there will be two situations: a) When most of the laser focus is in the base material, the processed structure is incomplete compared with the designed structure, and part of the processed structure will be lost after development. b) When the focus is completely on the polymer material, the processed structure will not be connected to the substrate, and the processed structure will be washed away after development, resulting in a complete loss of the structure.
在加工过程中非平基底大致可以分为三种情况:1、柔性基底(如图1.a)。2、图案化基底(如图1.b)。3、倾斜基底(如图1.c)。In the process of processing, the non-flat substrate can be roughly divided into three situations: 1. Flexible substrate (as shown in Figure 1.a). 2. Patterned substrate (as shown in Figure 1.b). 3. Tilt the base (as shown in Figure 1.c).
使用飞秒激光在柔性基底材料上加工微纳结构(如图2.a)。由于基底表面形貌变化没有规律,导致在初始位置对焦完成之后,后续加工的微纳结构有所损失或者完全丢失(如图2.b)。目前工作人员通过加工一个结构后重新手动对焦一次然后继续加工下一个结构这一方法(如图2.c)解决此问题。但此方法操作繁琐,而且手动对焦是通过肉眼观察激光与待加工材料作用时光斑大小来确定焦点轴向位置,肉眼观察存在较大的随机误差,影响加工质量。Use femtosecond lasers to process micro-nano structures on flexible substrate materials (as shown in Figure 2.a). Due to irregular changes in the topography of the substrate surface, after the initial focus is completed, the micro-nano structure of subsequent processing is lost or completely lost (as shown in Figure 2.b). At present, the staff solves this problem by refocusing manually after processing a structure and then continuing to process the next structure (as shown in Figure 2.c). However, this method is cumbersome to operate, and the manual focus is to determine the axial position of the focus by visually observing the spot size when the laser interacts with the material to be processed. There are large random errors in visual observation, which affect the processing quality.
发明内容Contents of the invention
基于此,有必要针对现有使用激光在非平基底上加工过程中,手动对焦操作繁复、耗时长而且存在较大误差的问题。提出一种用于非平基底的双光子自动加工方法、系统及设备。Based on this, it is necessary to address the problems of complicated, time-consuming manual focusing operations and large errors in the existing process of using lasers to process non-flat substrates. A two-photon automatic processing method, system and equipment for non-flat substrates are proposed.
本发明通过以下技术方案实现:一种用于非平基底的双光子自动加工方法,其包括如下步骤:The present invention is achieved through the following technical solutions: a two-photon automatic processing method for non-flat substrates, which includes the following steps:
S1:调节基底的水平位置,使激光焦点的水平位置位于基底的初始加工区域内。初始加工区域表征在该区域内任选一点作为初始加工点时,设计结构所处的水平区域均位于基底上。S1: Adjust the horizontal position of the substrate so that the horizontal position of the laser focus is within the initial processing area of the substrate. The initial processing area means that when any point in this area is used as the initial processing point, the horizontal area where the design structure is located is located on the substrate.
S2:对激光进行对焦,以使基底位于理想的初始加工位置,根据相应的加工策略在初始加工位置进行激光加工。其中,对焦的方法如下:S2: focusing the laser so that the substrate is located at an ideal initial processing position, and performing laser processing at the initial processing position according to a corresponding processing strategy. Among them, the method of focusing is as follows:
S21:以荧光聚合物为取景对象,实时采集荧光聚合物散射荧光的光斑图像。S21: Taking the fluorescent polymer as a framing object, and collecting the light spot image of the fluorescent polymer scattering fluorescence in real time.
S22:调节基底的高度,当光斑图像中光斑的等效直径达到最大值时,计算光斑的最大等效直径作为基准值。S22: adjust the height of the base, and calculate the maximum equivalent diameter of the light spot as a reference value when the equivalent diameter of the light spot in the light spot image reaches a maximum value.
S23:根据荧光聚合物的物理特性与基准值计算光斑等效直径的理想值。S23: Calculate the ideal value of the equivalent diameter of the light spot according to the physical properties of the fluorescent polymer and the reference value.
S24:调节基底的高度直至光斑图像中光斑的等效直径等于理想值。S24: Adjust the height of the base until the equivalent diameter of the spot in the spot image is equal to an ideal value.
S3:根据预设的移动路径控制基底移动到下一加工点,判断光斑图像中光斑的等效直径是否等于理想值,并做出如下决策:S3: Control the substrate to move to the next processing point according to the preset moving path, judge whether the equivalent diameter of the spot in the spot image is equal to the ideal value, and make the following decisions:
(1)是则直接在该位置进行激光加工。(1) Yes, laser processing is performed directly at this position.
(2)否则在该加工点进行对焦,完成对焦后在该加工点进行激光加工。(2) Otherwise, focus at the processing point, and perform laser processing at the processing point after focusing.
S4:判断是否完成加工,若未完成加工,则重复S3直至加工完成。若加工完成,则对加工完成的微纳结构进行显影,得到成品微纳结构。S4: Determine whether the processing is completed, if not, repeat S3 until the processing is completed. If the processing is completed, the processed micro-nano structure is developed to obtain a finished micro-nano structure.
本发明通过对每个加工点进行自动对焦,解决了使用飞秒激光在非平基底上加工过程中,手动对焦操作繁复、耗时而且存在较大误差这一问题。The invention solves the problem of complicated manual focusing operation, time-consuming and large errors during the process of using femtosecond laser to process non-flat substrates by automatically focusing on each processing point.
在其中一个实施例中,始加工区域根据基底覆盖的水平区域及扫描策略覆盖的水平区域计算而得,具体方法如下:In one of the embodiments, the initial processing area is calculated according to the horizontal area covered by the substrate and the horizontal area covered by the scanning strategy. The specific method is as follows:
a、将基底的外形pj、激光焦点的外形pl、加工策略覆盖的水平区域pp和扫描策略覆盖的水平区域ps映射在同一平面上。将pl和pp同心设置,并在pj内沿pp与pj相切的路径移动一周。将pl与pj围成的区域从pj中移除,得到中间外形pm。a. Map the outline p j of the substrate, the outline p l of the laser focus, the horizontal area p p covered by the processing strategy, and the horizontal area p s covered by the scanning strategy on the same plane. Set p l and p p concentrically, and move within p j along the path tangent to p p and p j for one week. Remove the area surrounded by p l and p j from p j to get the intermediate shape p m .
b、对pm进行缩放,直至满足缩放后的图形刚好外接在ps上。设pm为n边形,外接在ps上的图形为pms,则将pms的n个角依次贴合在相应的pm的每个角上。每次贴合时,对与贴合的角不相邻的其他n-2个边做延长线。多个延长线将ps划分为多个分区域,将其中包含pm的每个角的分区域作为初始加工区域。b. Scale p m until the graph after scaling is just circumscribed on p s . Suppose p m is an n-gon, and the figure circumscribed on p s is p ms , then fit the n corners of p ms to each corresponding corner of p m in turn. Every time you fit, make extension lines for the other n-2 sides that are not adjacent to the corner you fit. Multiple extension lines divide p s into multiple sub-areas, and the sub-area containing each corner of p m is used as the initial processing area.
在其中一个实施例中,判断激光焦点位于初始加工区域内的方法如下:In one of the embodiments, the method for judging that the laser focus is located in the initial processing area is as follows:
S11:以基底为取景对象,采集包含激光焦点的基底图像。S11: Taking the substrate as a viewfinder object, collecting a substrate image including a laser focal point.
S12:对基底图像预处理,保留基底的外轮廓和激光焦点的外轮廓。S12: Preprocessing the substrate image, retaining the outer contour of the substrate and the outer contour of the laser focus.
S13:在基底的外轮廓中添加初始加工区域的轮廓线。S13: Adding the contour line of the initial processing area to the outer contour of the base.
S14:观察激光焦点的外轮廓是否完全位于初始加工区域内,是则确认激光焦点位于初始加工区域内。否则移动基底,直至激光焦点的外轮廓完全处于初始加工区域内。S14: Observe whether the outer contour of the laser focus is completely within the initial processing area, and if so, confirm that the laser focus is within the initial processing area. Otherwise move the substrate until the outer contour of the laser focus is completely within the initial processing area.
在其中一个实施例中,获取基准值的方法如下:In one of the embodiments, the method for obtaining the benchmark value is as follows:
S221:观察初始的光斑图像中是否存在光斑,并做出如下决策:若无光斑,则对基底升降直至光斑图像中出现光斑。若存在光斑,则控制基底上移或下移,观察光斑的尺寸变化。S221: Observe whether there is a light spot in the initial light spot image, and make the following decision: if there is no light spot, lift and lower the base until the light spot appears in the light spot image. If there is a light spot, control the substrate to move up or down, and observe the size change of the light spot.
S222:判断光斑的尺寸是否增大,并做出如下决策:若光斑逐渐变小,则反向移动基底,使光斑图像中的光斑尺寸变大。若光斑逐渐变大则控制基底按原方向继续移动,直至光斑的尺寸保持不变。若光斑保持不变,则光斑的等效直径达到最大,获取光斑的最小外接圆,则该最小外接圆的直径即为基准值。S222: Determine whether the size of the light spot increases, and make the following decision: if the light spot gradually becomes smaller, reversely move the substrate to increase the size of the light spot in the light spot image. If the light spot becomes larger gradually, the control substrate continues to move in the original direction until the size of the light spot remains unchanged. If the spot remains unchanged, the equivalent diameter of the spot reaches the maximum, and the minimum circumscribed circle of the spot is obtained, then the diameter of the minimum circumscribed circle is the reference value.
在其中一个实施例中,基底的移动为三维移动,以初始加工点为原点,竖直方向为Z轴,任一水平方向为X轴,另一与X轴垂直的水平方向为Y轴。则移动路径仅包含基底在X轴、Y轴上的移动,对焦过程仅包括基底在Z轴上的移动。In one embodiment, the movement of the substrate is three-dimensional movement, with the initial processing point as the origin, the vertical direction as the Z axis, any horizontal direction as the X axis, and the other horizontal direction perpendicular to the X axis as the Y axis. Then the movement path only includes the movement of the substrate on the X-axis and the Y-axis, and the focusing process only includes the movement of the substrate on the Z-axis.
本发明还提供一种用于非平基底的双光子自动加工系统,其包括:The present invention also provides a two-photon automatic processing system for non-flat substrates, which includes:
成像模块用于实时采集包含荧光聚合物及其散射荧光的光斑图像。The imaging module is used for real-time acquisition of light spot images containing fluorescent polymers and their scattered fluorescence.
图像处理模块用于对光斑图像预处理,并计算光斑图像中光斑的等效直径。光斑图像的预处理包括归一化处理和滤波处理。归一化处理可以将每个光斑图像转换为相同的形式,在多次加工的过程中保持相同标准,提高加工的精度。滤波处理可以在保留图像细节特征的前提下,对图像的噪声进行抑制,提高图像处理的精确度。The image processing module is used for preprocessing the spot image and calculating the equivalent diameter of the spot in the spot image. The preprocessing of spot image includes normalization processing and filtering processing. Normalization processing can convert each spot image into the same form, maintain the same standard in the process of multiple processing, and improve the processing accuracy. Filtering can suppress the noise of the image and improve the accuracy of image processing under the premise of retaining the details of the image.
决策模块用于:一、判断光斑的等效直径是否为最大值,是则记录等效直径的最大值作为基准值。二、判断光斑的等效直径是否为理想值,是则确认对焦完成。The decision-making module is used for: 1. judging whether the equivalent diameter of the light spot is the maximum value, and if so, recording the maximum value of the equivalent diameter as a reference value. 2. Determine whether the equivalent diameter of the light spot is an ideal value, and if so, confirm that the focus is completed.
位移控制模块用于:Ⅰ、根据预设的移动路径输出位移信号,进而控制运动台驱动基底水平移动。Ⅱ、根据预设的加工策略输出位移信号,进而控制运动台驱动基底三维移动。Ⅲ、在对焦时输出升降信号,控制运动台驱动基底升降。The displacement control module is used for: Ⅰ. Outputting a displacement signal according to a preset movement path, and then controlling the movement table to drive the base to move horizontally. Ⅱ. Output the displacement signal according to the preset processing strategy, and then control the motion table to drive the three-dimensional movement of the base. Ⅲ. When focusing, output the lifting signal to control the motion table to drive the base to rise and fall.
本发明还提供一种用于非平基底的双光子自动加工设备,其包括激光器、运动台、光路调节器、物镜、成像装置和控制器。The invention also provides a two-photon automatic processing equipment for non-flat substrates, which includes a laser, a moving table, an optical path adjuster, an objective lens, an imaging device and a controller.
激光器用于发射激光。基底用于承载荧光聚合物,以使荧光聚合物位于激光路径上,荧光聚合物受激光照射发生荧光效应。运动台与基底固定连接,用于驱动基底移动。基底可以通过磁吸等方法与运动台固定连接,以保证在运动台驱动基底移动时,基底不会发生偏移。Lasers are used to emit laser light. The substrate is used to carry the fluorescent polymer, so that the fluorescent polymer is located on the path of the laser light, and the fluorescent polymer produces a fluorescent effect when irradiated by the laser light. The motion table is fixedly connected with the base, and is used to drive the base to move. The base can be fixedly connected to the moving table by means of magnetic attraction to ensure that the base does not shift when the moving table drives the base to move.
光路调节器设置在激光器的发射路径上,用于调节激光的强度和方向,以使激光分别用于加工或对焦。物镜设置在光路调节器的激光出射路径上,用于对激光聚焦。成像装置设置在荧光聚合物散射的荧光路径上,用于实时采集包含荧光聚合物及其散射荧光的光斑图像。成像装置还用于将采集的光斑图像传输到控制器中。The optical path regulator is arranged on the emission path of the laser, and is used to adjust the intensity and direction of the laser, so that the laser can be used for processing or focusing respectively. The objective lens is arranged on the laser output path of the optical path adjuster, and is used for focusing the laser light. The imaging device is arranged on the fluorescence path scattered by the fluorescent polymer, and is used for real-time collection of light spot images including the fluorescent polymer and its scattered fluorescence. The imaging device is also used to transmit the collected light spot images to the controller.
控制器用于:一、控制运动台调节基底的水平位置,使激光焦点的水平位置位于基底的初始加工区域内。二、对激光器发射的激光进行对焦,以使基底位于理想的初始加工位置,根据相应的加工策略在初始加工位置进行激光加工。三、根据预设的移动路径控制运动台驱动基底移动,进而在每个加工点上完成相应的激光加工。四、判断光斑图像中光斑的等效直径是否等于理想值,是则直接在该位置进行激光加工。否则在该加工点进行对焦,完成对焦后在该加工点进行激光加工。The controller is used for: 1. Controlling the moving table to adjust the horizontal position of the substrate so that the horizontal position of the laser focus is located in the initial processing area of the substrate. 2. Focus the laser emitted by the laser so that the substrate is located at the ideal initial processing position, and perform laser processing at the initial processing position according to the corresponding processing strategy. 3. Control the motion table to drive the substrate to move according to the preset moving path, and then complete the corresponding laser processing at each processing point. 4. Judging whether the equivalent diameter of the spot in the spot image is equal to the ideal value, if so, perform laser processing directly at this position. Otherwise, focus at the processing point, and perform laser processing at the processing point after focusing.
在其中一个实施例中,光路调节器包括光闸、前置调节器和分光镜。前置调节器设置在激光器的激光发射路径上,用于调节激光的能量和相位。光闸设置在激光器与前置调节器之间,用于控制激光的通断。分光镜设置在前置调节器的激光出射路径上,用于反射加工的激光并透射成像光线。采用光路调节器对激光的能量和相位进行调节,从而使得激光能够分别用于加工和对焦,同时将激光分为透射光束和反射光束,以便于同步完成激光对焦和光斑图像采集,提高激光对焦的效率和精确度In one of the embodiments, the optical path adjuster includes an optical gate, a pre-adjuster and a beam splitter. The pre-regulator is arranged on the laser emission path of the laser, and is used for adjusting the energy and phase of the laser. The light gate is arranged between the laser and the pre-regulator, and is used to control the on-off of the laser. The beam splitter is arranged on the laser output path of the pre-regulator, and is used to reflect the processed laser and transmit the imaging light. The optical path regulator is used to adjust the energy and phase of the laser, so that the laser can be used for processing and focusing respectively. At the same time, the laser is divided into the transmitted beam and the reflected beam, so as to complete the laser focusing and spot image acquisition synchronously, and improve the efficiency of laser focusing. efficiency and precision
在其中一个实施例中,前置调节器包括沿激光发射路径依次设置的格兰泰勒棱镜、半波片、扩束器、反射镜和衰减片。格兰泰勒棱镜用于控制激光光束的能量。半波片用于调整激光光束的相位。扩束器用于增大激光光束的直径。反射镜用于调节激光光束的发射方向。衰减片用于调节激光光束的能量。In one embodiment, the pre-adjuster includes a Glan-Taylor prism, a half-wave plate, a beam expander, a reflector and an attenuation plate arranged in sequence along the laser emission path. Glan Taylor prisms are used to control the energy of laser beams. Half-wave plates are used to adjust the phase of the laser beam. Beam expanders are used to increase the diameter of a laser beam. The reflector is used to adjust the emission direction of the laser beam. Attenuators are used to adjust the energy of the laser beam.
在其中一个实施例中,激光器为飞秒激光器,成像装置为CCD相机,运动台为三维微纳米运动台。In one embodiment, the laser is a femtosecond laser, the imaging device is a CCD camera, and the moving stage is a three-dimensional micro-nano moving stage.
相较于现有技术,本发明具有如下有益效果:Compared with the prior art, the present invention has the following beneficial effects:
1.本发明通过对每个加工点进行自动对焦,解决了使用飞秒激光在非平基底上加工过程中,手动对焦操作繁复、耗时而且存在较大误差这一问题。1. The present invention solves the problem of complicated, time-consuming manual focusing operations and large errors during the processing of non-flat substrates using femtosecond lasers by automatically focusing on each processing point.
2.本发明采用荧光对焦的方法,通过将激光焦点的对焦转换为荧光图像识别,根据光斑的等效直径来确认是否完成对焦,有效地提高对焦效率及对焦的精确度。2. The present invention adopts the method of fluorescent focusing, by converting the focusing of the laser focus into fluorescent image recognition, and confirming whether the focusing is completed according to the equivalent diameter of the spot, effectively improving the focusing efficiency and focusing accuracy.
3.本发明通过预设初始加工区域,使得激光加工得到的微纳结构能够刚好处于基底上,避免微纳结构的部分丢失,提高加工效率。3. In the present invention, by presetting the initial processing area, the micro-nano structure obtained by laser processing can be just placed on the substrate, so as to avoid partial loss of the micro-nano structure and improve processing efficiency.
4.采用三维微纳级运动台驱动基底移动,可以在三维范围内驱动基底任意移动,使得激光加工设备能够完成复杂的三维结构加工,同时提高加工设备对焦的精确度和对焦效率。4. Using a three-dimensional micro-nano motion table to drive the substrate to move, it can drive the substrate to move freely within the three-dimensional range, so that the laser processing equipment can complete complex three-dimensional structure processing, and at the same time improve the focusing accuracy and focusing efficiency of the processing equipment.
5.采用光路调节器对激光的能量和相位进行调节,从而使得激光能够分别用于加工和对焦,同时将激光分为透射光束和反射光束,以便于同步完成激光对焦和光斑图像采集,提高激光对焦的效率和精确度。5. Use the optical path regulator to adjust the energy and phase of the laser, so that the laser can be used for processing and focusing respectively. At the same time, the laser is divided into the transmitted beam and the reflected beam, so that the laser focusing and spot image acquisition can be completed synchronously, and the laser can be improved. Focus efficiency and precision.
附图说明Description of drawings
图1为本发明背景技术中非平基底分类图;Fig. 1 is non-flat base classification diagram in the background technology of the present invention;
图2为本发明背景技术中三维微纳结构失真图;Fig. 2 is a three-dimensional micro-nano structure distortion diagram in the background technology of the present invention;
图3为本发明实施例1的用于非平基底的双光子自动加工方法的流程图;3 is a flow chart of the two-photon automatic processing method for non-flat substrates according to
图4为图3中获取初始加工区域的中间外形pm的示意图;Fig. 4 is a schematic diagram of obtaining the intermediate profile p m of the initial processing area in Fig. 3;
图5为图3中理想的初始加工区域的角度贴合示意图;Fig. 5 is a schematic diagram of the angle fit of the ideal initial processing area in Fig. 3;
图6为图3中理想的初始加工区域的位置示意图;Fig. 6 is a schematic diagram of the position of the ideal initial processing area in Fig. 3;
图7为图3中实际的初始加工区域的角度贴合示意图;Fig. 7 is a schematic diagram of angle fitting of the actual initial processing area in Fig. 3;
图8为图3中实际的初始加工区域的位置示意图;Fig. 8 is a schematic diagram of the position of the actual initial processing area in Fig. 3;
图9为图3中激光焦点的相对位置与荧光光斑的尺寸变化以及最终加工结果的关系示意图;9 is a schematic diagram of the relationship between the relative position of the laser focus in FIG. 3 and the size change of the fluorescent spot and the final processing result;
图10为图3中激光焦点分别位于不同位置时,荧光光斑的尺寸示意图;Figure 10 is a schematic diagram of the size of the fluorescent spot when the laser focus in Figure 3 is located at different positions;
图11为图3中基底的移动方向的示意图;Fig. 11 is a schematic diagram of the moving direction of the substrate in Fig. 3;
图12为采用图3中用于非平基底的双光子自动加工方法的用于非平基底的双光子自动加工设备的激光路径示意图;12 is a schematic diagram of the laser path of the two-photon automatic processing equipment for non-flat substrates using the two-photon automatic processing method for non-flat substrates in FIG. 3;
图13为激光焦点相对于基底表面在不同高度时的荧光颜色及微柱阵列图;Fig. 13 is the fluorescent color and the microcolumn array diagram when the laser focus is at different heights relative to the substrate surface;
图14为使用自动对焦后实现的荧光颜色及微柱阵列图;Fig. 14 is the fluorescent color and microcolumn array diagram realized after using autofocus;
图15为在图案化基底上不同位置加工微纳结构的实验对比图。Fig. 15 is an experimental comparison diagram of processing micro-nano structures at different positions on a patterned substrate.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
需要说明的是,当组件被称为“安装于”另一个组件,它可以直接在另一个组件上或者也可以存在居中的组件。当一个组件被认为是“设置于”另一个组件,它可以是直接设置在另一个组件上或者可能同时存在居中组件。当一个组件被认为是“固定于”另一个组件,它可以是直接固定在另一个组件上或者可能同时存在居中组件。It should be noted that when a component is said to be "mounted on" another component, it can be directly on the other component or there can also be an intervening component. When a component is said to be "set on" another component, it may be set directly on the other component or there may be an intervening component at the same time. When a component is said to be "fixed" to another component, it may be directly fixed to the other component or there may be an intervening component at the same time.
除非另有定义,本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本发明。本文所使用的术语“或/及”包括一个或多个相关的所列项目的任意的和所有的组合。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention. As used herein, the term "or/and" includes any and all combinations of one or more of the associated listed items.
实施例1Example 1
请参阅图3,其为本实施例的用于非平基底的双光子自动加工方法的流程图。用于非平基底的双光子自动加工方法包括如下步骤:Please refer to FIG. 3 , which is a flow chart of the two-photon automatic processing method for non-flat substrates in this embodiment. The two-photon automatic processing method for non-flat substrates includes the following steps:
S1:调节基底的水平位置,使激光焦点的水平位置位于基底的初始加工区域内。初始加工区域表征在该区域内任选一点作为初始加工点时,设计结构所处的水平区域均位于基底上。S1: Adjust the horizontal position of the substrate so that the horizontal position of the laser focus is within the initial processing area of the substrate. The initial processing area means that when any point in this area is used as the initial processing point, the horizontal area where the design structure is located is located on the substrate.
本实施例中,激光双光子加工根据一个设计结构,在基底上将待加工的荧光聚合物加工成与设计结构尺寸相符的微纳结构。为了保证激光加工的微纳结构完全位于基底上,需要对激光加工的初始加工点进行定位。本实施例采用在基底上预设初始加工区域的方法,将激光焦点定位在初始加工区域内,进而根据初始加工点及基底的放置方向进行激光双光子加工,以使加工完成的微纳结构完全位于基底的表面上。In this embodiment, laser two-photon processing is based on a designed structure, and the fluorescent polymer to be processed is processed on the substrate into a micro-nano structure that matches the size of the designed structure. In order to ensure that the laser-processed micro-nano structure is completely located on the substrate, it is necessary to position the initial processing point of the laser process. In this embodiment, the method of presetting the initial processing area on the substrate is used, the laser focus is positioned in the initial processing area, and then the laser two-photon processing is performed according to the initial processing point and the placement direction of the substrate, so that the processed micro-nano structure is completely on the surface of the substrate.
请结合图4至图8,图4为图3中获取初始加工区域的中间外形pm的示意图;图5为图3中理想的初始加工区域的角度贴合示意图;图6为图3中理想的初始加工区域的位置示意图;图7为图3中实际的初始加工区域的角度贴合示意图;图8为图3中实际的初始加工区域的位置示意图。其中,初始加工区域根据基底覆盖的水平区域及扫描策略覆盖的水平区域计算而得,具体方法如下:Please combine Figure 4 to Figure 8, Figure 4 is a schematic diagram of the intermediate shape p m of the initial processing area in Figure 3; Figure 5 is a schematic diagram of the angle fit of the ideal initial processing area in Figure 3; Figure 6 is the ideal in Figure 3 Figure 7 is a schematic diagram of the angle fitting of the actual initial processing area in Figure 3; Figure 8 is a schematic diagram of the position of the actual initial processing area in Figure 3. Among them, the initial processing area is calculated according to the horizontal area covered by the substrate and the horizontal area covered by the scanning strategy. The specific method is as follows:
a、将基底的外形pj、激光焦点的外形pl、加工策略覆盖的水平区域pp和扫描策略覆盖的水平区域ps映射在同一平面上。将pl和pp同心设置,并在pj内沿pp与pj相切的路径移动一周。将pl与pj围成的区域从pj中移除,得到中间外形pm。a. Map the outline p j of the substrate, the outline p l of the laser focus, the horizontal area p p covered by the processing strategy, and the horizontal area p s covered by the scanning strategy on the same plane. Set p l and p p concentrically, and move within p j along the path tangent to p p and p j for one week. Remove the area surrounded by p l and p j from p j to get the intermediate shape p m .
本实施例中,基底为薄片形,则基底的外轮廓记为pj。激光焦点为椭球型,激光焦点在水平面上形成一个椭圆形投影,将椭圆形投影的外轮廓记为pl。在每一加工点所加工成的微纳结构在水平面上的投影记为pp。而扫描策略中,所有加工点连成的多边形记为pm。以激光焦点的中心为加工中心,若使加工的微纳结构完全落在基底上,则pp不得超出pj,因此初始加工区域不能邻接在基底的外轮廓上。In this embodiment, the substrate is in the shape of a sheet, and the outer profile of the substrate is denoted as p j . The laser focus is an ellipsoid, and the laser focus forms an elliptical projection on the horizontal plane, and the outer contour of the elliptical projection is marked as p l . The projection on the horizontal plane of the micro-nano structure processed at each processing point is denoted as p p . In the scanning strategy, the polygon formed by all processing points is recorded as p m . Taking the center of the laser focus as the processing center, if the processed micro-nano structure falls completely on the substrate, p p must not exceed p j , so the initial processing area cannot be adjacent to the outer contour of the substrate.
b、对pm进行缩放,直至满足缩放后的图形刚好外接在ps上。设pm为n边形,外接在ps上的图形为pms,则将pms的n个角依次贴合在相应的pm的每个角上。每次贴合时,对与贴合的角不相邻的其他n-2个边做延长线。多个延长线将ps划分为多个分区域。将其中包含pm的每个角的分区域作为初始加工区域。b. Scale p m until the graph after scaling is just circumscribed on p s . Suppose p m is an n-gon, and the figure circumscribed on p s is p ms , then fit the n corners of p ms to each corresponding corner of p m in turn. Every time you fit, make extension lines for the other n-2 sides that are not adjacent to the corner you fit. Multiple extension lines divide p s into multiple sub-areas. Take the subregion of each corner containing p m as the initial processing region.
以长方形基底为例,设基底的长为lj,宽为dj,激光焦点的椭圆形投影的长轴为ll,短轴为dl。若加工策略覆盖的水平区域pp和扫描策略覆盖的水平区域ps也为长方形,且ps的长为ls,宽为ds,pp的长为lp,宽为dp。则pm的长和宽分别为lm=(lj-lp+ll)和dm=(dj-dp+dl)。理论的初始加工区域包括位于四角的四个矩形,每个矩形的长和宽分别为(lm-ls)和(dm-ds)。本实施例实际选取的初始加工区域为,每个矩形的场合宽分别为[1-Max(ls/lm-ds/dm)]×lm和[1-Max(ls/lm-ds/dm)]×dm。Taking a rectangular base as an example, let the length of the base be l j , the width d j , the major axis of the elliptical projection of the laser focus be l l , and the minor axis be d l . If the horizontal area p p covered by the processing strategy and the horizontal area p s covered by the scanning strategy are also rectangular, and the length of p s is l s and the width is d s , the length of p p is l p and the width is d p . Then the length and width of p m are respectively l m =(l j -l p +l l ) and d m =(d j -d p +d l ). The theoretical initial processing area includes four rectangles at the four corners, and the length and width of each rectangle are (lm -l s ) and ( d m -d s ) respectively. The initial processing area actually selected in this embodiment is that the field width of each rectangle is [1-Max(l s /l m -d s /d m )]×l m and [1-Max(l s /l m -d s /d m )]×d m .
从中可以看出,理论的初始加工区域大于实际选取的初始加工区域。在pj、pp和ps均为标准的矩形时,计算理论的初始加工区域不仅步骤更加简单,而且区域面积更大。但是,在pj、pp和ps均为非标准矩形时,由于pm和ps的外轮廓各不相同,无法直接将pms的角与pm的角贴合,难以直接处理。通过对pm进行缩放,使缩放形成的pms外接在ps上,极大地减少了运算步骤,提高初始加工区域的选取效率。It can be seen that the theoretical initial processing area is larger than the actual initial processing area. When p j , p p and p s are all standard rectangles, the steps to calculate the theoretical initial processing area are not only simpler, but also larger. However, when p j , p p and p s are all non-standard rectangles, since the outer contours of p m and p s are different, it is difficult to directly fit the corners of p ms and p m . By scaling p m , the p ms formed by scaling is circumscribed on p s , which greatly reduces the operation steps and improves the selection efficiency of the initial processing area.
请结合图9和图10,判断激光焦点位于初始加工区域内的方法如下:Please combine Figure 9 and Figure 10, the method of judging that the laser focus is located in the initial processing area is as follows:
S11:以基底为取景对象,采集包含激光焦点的基底图像。由于基底和激光焦点的尺寸均为微米级,难以直接用肉眼观察到激光焦点相对于基底的位置,因此,通过对基底成像的方式,观察激光焦点相对于基底图像的位置,进而确认激光焦点是否位于初始加工区域内。S11: Taking the substrate as a viewfinder object, collecting a substrate image including a laser focal point. Since the size of the substrate and the laser focus are both on the order of microns, it is difficult to directly observe the position of the laser focus relative to the substrate with the naked eye. Therefore, by imaging the substrate, observe the position of the laser focus relative to the substrate image to confirm whether the laser focus is Located in the initial processing area.
S12:对基底图像预处理,保留基底的外轮廓和激光焦点的外轮廓。对基底图像的预处理包括归一化处理和滤波处理。归一化处理可以将图像转换为相同的形式,在多次加工的过程中保持相同标准,提高加工的精度。滤波处理可以在保留图像细节特征的前提下,对图像的噪声进行抑制,提高图像处理的精确度。基底和激光焦点的外轮廓可以通过图像识别模型获取。将图像处理转换为数学的图形处理,可以简化处理过程,提高处理精度。S12: Preprocessing the substrate image, retaining the outer contour of the substrate and the outer contour of the laser focus. The preprocessing of the base image includes normalization and filtering. Normalization processing can convert the image into the same form, maintain the same standard in the process of multiple processing, and improve the processing accuracy. Filtering can suppress the noise of the image and improve the accuracy of image processing under the premise of retaining the details of the image. The outer contours of the substrate and laser focus can be obtained by image recognition models. Converting image processing into mathematical graphics processing can simplify the processing process and improve processing accuracy.
S13:在基底的外轮廓中添加初始加工区域的轮廓线。初始加工区域可以根据基底的外形pj、激光焦点的外形pl、加工策略覆盖的水平区域pp和扫描策略覆盖的水平区域ps进行计算,进而将初始加工区域添加到基底图像中。S13: Adding the contour line of the initial processing area to the outer contour of the base. The initial processing area can be calculated according to the shape p j of the substrate, the shape p l of the laser focus, the horizontal area p p covered by the processing strategy, and the horizontal area p s covered by the scanning strategy, and then the initial processing area is added to the substrate image.
S14:观察激光焦点的外轮廓是否完全位于初始加工区域内,是则确认激光焦点位于初始加工区域内。否则移动基底,直至激光焦点的外轮廓完全处于初始加工区域内。S14: Observe whether the outer contour of the laser focus is completely within the initial processing area, and if so, confirm that the laser focus is within the initial processing area. Otherwise move the substrate until the outer contour of the laser focus is completely within the initial processing area.
通过图像处理观察激光焦点是否处于初始加工区域内,可以有效地提高对初始加工点定位的精确度,避免加工后的微纳结构超出基底的表面导致部分结构丢失。Observing whether the laser focus is in the initial processing area through image processing can effectively improve the positioning accuracy of the initial processing point, and avoid the loss of part of the structure caused by the processed micro-nano structure exceeding the surface of the substrate.
S2:对激光进行对焦,以使基底位于理想的初始加工位置,根据相应的加工策略在初始加工位置进行激光加工。S2: focusing the laser so that the substrate is located at an ideal initial processing position, and performing laser processing at the initial processing position according to a corresponding processing strategy.
其中,对焦的方法如下:Among them, the method of focusing is as follows:
S21:以荧光聚合物为取景对象,实时采集荧光聚合物散射荧光的光斑图像。荧光聚合物在激光照射下发生荧光效应,通过相机等成像装置对基底实时拍摄,经过视频处理及图片处理后,可以提取出包含荧光光斑的基底图像。S21: Taking the fluorescent polymer as a framing object, and collecting the light spot image of the fluorescent polymer scattering fluorescence in real time. The fluorescent polymer produces fluorescence effect under laser irradiation, and the substrate is photographed in real time by an imaging device such as a camera. After video processing and image processing, the substrate image including fluorescent spots can be extracted.
S22:调节基底的高度,当光斑图像中光斑的等效直径达到最大值时,计算光斑的最大等效直径作为基准值。S22: adjust the height of the base, and calculate the maximum equivalent diameter of the light spot as a reference value when the equivalent diameter of the light spot in the light spot image reaches a maximum value.
获取基准值的方法如下:Here's how to get the baseline value:
S221:观察初始的光斑图像中是否存在光斑,并做出如下决策:若无光斑,则对基底升降直至光斑图像中出现光斑。若存在光斑,则控制基底上移或下移,观察光斑的尺寸变化。S221: Observe whether there is a light spot in the initial light spot image, and make the following decision: if there is no light spot, lift and lower the base until the light spot appears in the light spot image. If there is a light spot, control the substrate to move up or down, and observe the size change of the light spot.
请结合图9,其为图3中激光焦点的相对位置与荧光光斑的尺寸变化的示意图。可以看出,激光焦点完全处于基底中时,荧光聚合物不产生荧光效应,因此,在光斑图像中不存在荧光光斑。当激光焦点从基底向荧光聚合物移动直至接触荧光聚合物时,荧光聚合物产生荧光效应,则在光斑图像中开始出现荧光光斑。当激光焦点继续向荧光聚合物中移动,直至激光焦点的中心刚好位于基底和荧光聚合物的分界面时,荧光聚合物产生的荧光效应达到最大,光斑图像中光斑的等效直径也达到最大。激光焦点继续移动直至完全位于荧光聚合物中,则光斑图像中光斑的尺寸不再发生变化。Please refer to FIG. 9 , which is a schematic diagram of the relative position of the laser focus and the size change of the fluorescent spot in FIG. 3 . It can be seen that when the laser focus is completely in the substrate, the fluorescent polymer does not produce a fluorescent effect, so there is no fluorescent spot in the spot image. When the laser focus moves from the substrate to the fluorescent polymer until it touches the fluorescent polymer, the fluorescent polymer produces a fluorescent effect, and fluorescent spots begin to appear in the spot image. When the laser focus continues to move into the fluorescent polymer until the center of the laser focus is just at the interface between the substrate and the fluorescent polymer, the fluorescence effect produced by the fluorescent polymer reaches the maximum, and the equivalent diameter of the spot in the spot image also reaches the maximum. The laser focus continues to move until it is completely in the fluorescent polymer, and the size of the spot in the spot image does not change.
S222:判断光斑的尺寸是否增大,并做出如下决策:若光斑逐渐变小,则反向移动基底,使光斑图像中的光斑尺寸变大。若光斑逐渐变大则控制基底按原方向继续移动,直至光斑的尺寸保持不变。若光斑保持不变,则光斑的等效直径达到最大,获取光斑的最小外接圆,则该最小外接圆的直径即为基准值。S222: Determine whether the size of the light spot increases, and make the following decision: if the light spot gradually becomes smaller, reversely move the substrate to increase the size of the light spot in the light spot image. If the light spot becomes larger gradually, the control substrate continues to move in the original direction until the size of the light spot remains unchanged. If the spot remains unchanged, the equivalent diameter of the spot reaches the maximum, and the minimum circumscribed circle of the spot is obtained, then the diameter of the minimum circumscribed circle is the reference value.
根据光斑在基底和荧光聚合物中产生的荧光效应的变化,可以通过移动基底将激光焦点移动到刚好位于基底和荧光聚合物的分界面上。在光斑尺寸不再发生变化后,任取一张光斑图像,在光斑上外界最小圆,即为光斑的等效直径。本实施例中,将光斑的最大等效直径记为基准值。According to the change of the fluorescence effect produced by the light spot in the substrate and the fluorescent polymer, the laser focus can be moved to just the interface between the substrate and the fluorescent polymer by moving the substrate. After the spot size does not change any more, take a spot image at random, and the smallest circle on the spot is the equivalent diameter of the spot. In this embodiment, the maximum equivalent diameter of the light spot is recorded as the reference value.
S23:根据荧光聚合物的物理特性与基准值计算光斑等效直径的理想值。S23: Calculate the ideal value of the equivalent diameter of the light spot according to the physical properties of the fluorescent polymer and the reference value.
请结合图10,其为图3中激光焦点分别位于不同位置时,荧光光斑的尺寸示意图。其中,图10.a为激光焦点位于基底中时光斑图像的示意图;图10.b为激光焦点开始接触荧光聚合物时光斑图像的示意图;图10.c为激光焦点位于基底和荧光聚合物的分界面时光斑图像的示意图;图10.d为激光焦点位于理想位置时光斑图像的示意图。由于荧光聚合物的物理特性各不相同,因此,实际选取的理想加工位置并非刚好位于分界面上。以光刻胶为例,当光斑图像中,荧光光斑的等效直径达到基准值的2/3时,激光焦点恰好位于理想的加工位置。即基准值的2/3为光斑等效直径的理想值。Please refer to FIG. 10 , which is a schematic diagram of the size of the fluorescent spot when the laser focus in FIG. 3 is located at different positions. Among them, Figure 10.a is a schematic diagram of the spot image when the laser focus is located in the substrate; Figure 10.b is a schematic diagram of the spot image when the laser focus begins to contact the fluorescent polymer; Figure 10.c is a schematic diagram of the laser focus located on the substrate and the fluorescent polymer Schematic diagram of the spot image at the interface; Figure 10.d is a schematic diagram of the spot image when the laser focus is at an ideal position. Because the physical properties of fluorescent polymers are different, the ideal processing position actually selected is not exactly located on the interface. Taking photoresist as an example, when the equivalent diameter of the fluorescent spot in the spot image reaches 2/3 of the reference value, the laser focus is just at the ideal processing position. That is, 2/3 of the reference value is the ideal value of the equivalent diameter of the spot.
S24:调节基底的高度直至光斑图像中光斑的等效直径等于理想值。S24: Adjust the height of the base until the equivalent diameter of the spot in the spot image is equal to an ideal value.
由于激光焦点的尺寸微小,仅为0.5-2μm。即便在物镜下观察也难以精准对焦。通过荧光聚合物的荧光效应,将激光焦点对焦转换为图像处理,有效地提高对焦的精确度,同时,图像识别的效率比人眼观察的效率更高,也可以避免眼睛受伤,提高对焦的安全性。Due to the tiny size of the laser focus, it is only 0.5-2μm. Even under the objective lens, it is difficult to focus precisely. Through the fluorescent effect of fluorescent polymers, laser focus focusing is converted into image processing, which effectively improves the accuracy of focusing. At the same time, the efficiency of image recognition is higher than that of human eye observation, which can also avoid eye injuries and improve the safety of focusing. sex.
S3:根据预设的移动路径控制基底移动到下一加工点。判断光斑图像中光斑的等效直径是否等于理想值,并做出如下决策:S3: Controlling the substrate to move to the next processing point according to the preset moving path. Determine whether the equivalent diameter of the spot in the spot image is equal to the ideal value, and make the following decisions:
(1)是则直接在该位置进行激光加工。当光斑图像中光斑的等效直径等于理想值,则在该加工点完成对焦,可以直接根据加工策略进行激光加工。(1) Yes, laser processing is performed directly at this position. When the equivalent diameter of the spot in the spot image is equal to the ideal value, the focus is completed at the processing point, and laser processing can be performed directly according to the processing strategy.
(2)否则在该加工点进行对焦,完成对焦后在该加工点进行激光加工。在激光加工的过程中,任一加工点完成激光加工后,基底仅在水平方向移动位置,由于基底的倾斜方向与水平面存在夹角,且基底在完成加工后高度发生变化,因此需要通过继续对焦来确认实际加工位置。(2) Otherwise, focus at the processing point, and perform laser processing at the processing point after focusing. In the process of laser processing, after laser processing is completed at any processing point, the substrate only moves in the horizontal direction. Since there is an angle between the tilt direction of the substrate and the horizontal plane, and the height of the substrate changes after processing, it is necessary to continue focusing To confirm the actual processing position.
请结合图11,其为图3中基底的移动方向的示意图。本实施例中,基底的移动为三维移动,以初始加工点为原点,竖直方向为Z轴,任一水平方向为X轴,另一与X轴垂直的水平方向为Y轴。则基底在各加工点之间的移动路径仅包含基底在X轴、Y轴上的移动。对焦过程仅包括基底在Z轴上的移动。Please refer to FIG. 11 , which is a schematic diagram of the moving direction of the substrate in FIG. 3 . In this embodiment, the movement of the substrate is a three-dimensional movement, with the initial processing point as the origin, the vertical direction as the Z axis, any horizontal direction as the X axis, and the other horizontal direction perpendicular to the X axis as the Y axis. Then the movement path of the substrate between the various processing points only includes the movement of the substrate on the X-axis and the Y-axis. The focusing process only involves movement of the substrate in the Z axis.
S4:判断是否完成加工,若未完成加工,则重复S3直至加工完成。若加工完成,则对加工完成的微纳结构进行显影,得到成品微纳结构。S4: Determine whether the processing is completed, if not, repeat S3 until the processing is completed. If the processing is completed, the processed micro-nano structure is developed to obtain a finished micro-nano structure.
由于设计结构为三维微纳结构,荧光聚合物在基底上需要进行多点加工。根据设计结构及已完成的加工位置可以判断出是否完成加工。在微纳结构加工完成后,需要对微纳结构进行显影处理,去除微纳结构中超出设计结构的部分,得到成品微纳结构。Since the designed structure is a three-dimensional micro-nano structure, the fluorescent polymer needs to be processed at multiple points on the substrate. According to the design structure and the completed processing position, it can be judged whether the processing is completed. After the processing of the micro-nano structure is completed, the micro-nano structure needs to be developed to remove the part of the micro-nano structure that exceeds the designed structure to obtain the finished micro-nano structure.
本实施例提供的用于非平基底的双光子自动加工方法采用分点对焦以及荧光对焦的方法,通过将激光焦点的对焦转换为荧光图像识别,根据光斑的等效直径来确认是否完成对焦,有效地提高对焦效率及对焦的精确度。此外,通过对每个加工点进行自动对焦,解决了使用激光在非平基底上加工过程中,手动对焦操作繁复、耗时而且存在较大误差这一问题。为了实现用于非平基底的双光子自动加工,本实施例还提供一种用于非平基底的双光子自动加工系统。加工系统包括成像模块、图像处理模块、决策模块和位移控制模块。The two-photon automatic processing method for non-flat substrates provided in this embodiment adopts the method of point-point focusing and fluorescent focusing, by converting the focusing of the laser focus into fluorescent image recognition, and confirming whether the focusing is completed according to the equivalent diameter of the spot, Effectively improve focusing efficiency and focusing accuracy. In addition, by automatically focusing on each processing point, the problem of complicated, time-consuming manual focusing operations and large errors in the process of using lasers to process non-flat substrates is solved. In order to realize two-photon automatic processing for non-flat substrates, this embodiment also provides a two-photon automatic processing system for non-flat substrates. The processing system includes imaging module, image processing module, decision-making module and displacement control module.
成像模块用于实时采集包含荧光聚合物及其散射荧光的光斑图像。荧光聚合物在激光焦点的照射下产生荧光效应,通过对基底和荧光聚合物的实时拍摄,获取包含荧光聚合物及其散射荧光的图像。成像模块采集的光斑图像传输到图像处理模块中。The imaging module is used for real-time acquisition of light spot images containing fluorescent polymers and their scattered fluorescence. The fluorescent polymer produces a fluorescent effect under the irradiation of the laser focus, and an image including the fluorescent polymer and its scattered fluorescence is obtained by real-time shooting of the substrate and the fluorescent polymer. The spot image collected by the imaging module is transmitted to the image processing module.
图像处理模块用于对光斑图像预处理,并计算光斑图像中光斑的等效直径。光斑图像的预处理包括归一化处理和滤波处理。归一化处理可以将每个光斑图像转换为相同的形式,在多次加工的过程中保持相同标准,提高加工的精度。滤波处理可以在保留图像细节特征的前提下,对图像的噪声进行抑制,提高图像处理的精确度。光斑的等效直径可以通过图像识别模型获取。如先采用颜色阈值法将图像的颜色空间转换为HSV颜色空间,进而根据颜色阈值将光斑提取出来。随后采用图形识别模型在光斑上添加最小外接圆,获取外接圆的直径作为光斑的等效直径。The image processing module is used for preprocessing the spot image and calculating the equivalent diameter of the spot in the spot image. The preprocessing of spot image includes normalization processing and filtering processing. Normalization processing can convert each spot image into the same form, maintain the same standard in the process of multiple processing, and improve the processing accuracy. Filtering can suppress the noise of the image and improve the accuracy of image processing under the premise of retaining the details of the image. The equivalent diameter of the spot can be obtained through the image recognition model. For example, first use the color threshold method to convert the color space of the image into the HSV color space, and then extract the light spots according to the color threshold. Then the pattern recognition model is used to add the minimum circumscribed circle on the spot, and the diameter of the circumscribed circle is obtained as the equivalent diameter of the spot.
决策模块用于:一、判断光斑的等效直径是否为最大值,是则记录等效直径的最大值作为基准值。The decision-making module is used for: 1. judging whether the equivalent diameter of the light spot is the maximum value, and if so, recording the maximum value of the equivalent diameter as a reference value.
荧光光斑的等效直径与激光焦点位置的变化关系为:激光焦点完全处于基底中时,荧光聚合物不产生荧光效应,因此,在光斑图像中不存在荧光光斑。当激光焦点从基底向荧光聚合物移动直至接触荧光聚合物时,荧光聚合物产生荧光效应,则在光斑图像中开始出现荧光光斑。当激光焦点继续向荧光聚合物中移动,直至激光焦点的中心刚好位于基底和荧光聚合物的分界面时,荧光聚合物产生的荧光效应达到最大,光斑图像中光斑的等效直径也达到最大。激光焦点继续移动直至完全位于荧光聚合物中,则光斑图像中光斑的尺寸不再发生变化。The relationship between the equivalent diameter of the fluorescent spot and the position of the laser focus is as follows: when the laser focus is completely in the substrate, the fluorescent polymer does not produce a fluorescent effect, so there is no fluorescent spot in the spot image. When the laser focus moves from the substrate to the fluorescent polymer until it touches the fluorescent polymer, the fluorescent polymer produces a fluorescent effect, and fluorescent spots begin to appear in the spot image. When the laser focus continues to move into the fluorescent polymer until the center of the laser focus is just at the interface between the substrate and the fluorescent polymer, the fluorescence effect produced by the fluorescent polymer reaches the maximum, and the equivalent diameter of the spot in the spot image also reaches the maximum. The laser focus continues to move until it is completely in the fluorescent polymer, and the size of the spot in the spot image does not change.
由此可知,当荧光光斑的等效直径达到最大时,激光焦点刚好位于基底和荧光聚合物的分界面上。基底和荧光聚合物的分界面即为加工的基准面。It can be seen that when the equivalent diameter of the fluorescent spot reaches the maximum, the laser focus is just located on the interface between the substrate and the fluorescent polymer. The interface between the substrate and the fluorescent polymer is the reference plane for processing.
二、判断光斑的等效直径是否为理想值,是则确认对焦完成。2. Determine whether the equivalent diameter of the light spot is an ideal value, and if so, confirm that the focus is completed.
由于荧光聚合物的物理特性各不相同,因此,实际选取的理想加工位置并非刚好位于分界面上。以光刻胶为例,当光斑图像中,荧光光斑的等效直径达到基准值的2/3时,激光焦点恰好位于理想的加工位置。即基准值的2/3为光斑等效直径的理想值。Because the physical properties of fluorescent polymers are different, the ideal processing position actually selected is not exactly located on the interface. Taking photoresist as an example, when the equivalent diameter of the fluorescent spot in the spot image reaches 2/3 of the reference value, the laser focus is just at the ideal processing position. That is, 2/3 of the reference value is the ideal value of the equivalent diameter of the spot.
位移控制模块用于:Ⅰ、根据预设的移动路径输出位移信号,进而控制运动台驱动基底水平移动。激光加工的过程中,需要设置多个加工点,并分别在每个加工点出进行激光加工。为了保证加工的三维微纳结构与设计结构尽量符合,采用水平移动的方式在基底上对加工点进行定位。The displacement control module is used for: Ⅰ. Outputting a displacement signal according to a preset movement path, and then controlling the movement table to drive the base to move horizontally. In the process of laser processing, it is necessary to set up multiple processing points, and perform laser processing at each processing point. In order to ensure that the processed three-dimensional micro-nano structure conforms to the design structure as much as possible, the processing point is positioned on the substrate by horizontal movement.
Ⅱ、根据预设的加工策略输出位移信号,进而控制运动台驱动基底三维移动。在任一加工点处,根据设计结构的不同,激光焦点的移动路径也不相同。三维微纳结构的加工需要在至少三个自由度上进行移动。Ⅱ. Output the displacement signal according to the preset processing strategy, and then control the motion table to drive the three-dimensional movement of the base. At any processing point, depending on the design structure, the moving path of the laser focus is also different. The processing of three-dimensional micro-nano structures requires movement in at least three degrees of freedom.
Ⅲ、在对焦时输出升降信号,控制运动台驱动基底升降。对任一加工点,在找到该加工点的水平位置后,仅需通过升降基底来完成对焦。对焦方法包括:获取荧光聚合物及其散射荧光的光斑图像,调节基底的高度直至光斑图像中光斑的等效直径等于理想值。Ⅲ. When focusing, output the lifting signal to control the motion table to drive the base to rise and fall. For any processing point, after finding the horizontal position of the processing point, it only needs to complete the focusing by lifting the base. The focusing method includes: acquiring a spot image of the fluorescent polymer and its scattered fluorescence, and adjusting the height of the substrate until the equivalent diameter of the spot in the spot image is equal to an ideal value.
对于任一加工点,对焦的方法还可以包括:调节基底的高度使激光焦点刚好位于基底与荧光聚合物的分界面上,即光斑图像中光斑的等效直径刚好增大至基准值或刚好从基准值开始减小,上移或下移一个预设的距离以使光斑图像中光斑的等效直径等于理想值。对焦过程中,基底的上移或下移可以根据基底与荧光聚合物的相对位置来确定。如基底位于荧光聚合物下方,则在光斑图像中光斑的等效直径等于基准值时,上移基底以使激光焦点向基底方向移动,则光斑图像中光斑的等效直径逐渐减小,记录焦点从基准面移动到理想加工面的距离。则此后每次对焦仅需在激光焦点达到基准面后,将基底下移相应的距离即可。For any processing point, the method of focusing may also include: adjusting the height of the substrate so that the laser focus is just on the interface between the substrate and the fluorescent polymer, that is, the equivalent diameter of the spot in the spot image just increases to the reference value or just from The base value starts to decrease, and moves up or down by a preset distance to make the equivalent diameter of the spot in the spot image equal to the ideal value. During the focusing process, the upward or downward movement of the substrate can be determined according to the relative position of the substrate and the fluorescent polymer. If the base is located under the fluorescent polymer, when the equivalent diameter of the spot in the spot image is equal to the reference value, move the base up to move the laser focus toward the base, then the equivalent diameter of the spot in the spot image will gradually decrease, and the recording focus The distance to move from the reference plane to the ideal machining plane. After that, after each focus, it is only necessary to move the substrate down by a corresponding distance after the laser focus reaches the reference plane.
请结合图12,其为采用图3中用于非平基底的双光子自动加工方法的用于非平基底的双光子自动加工设备的激光路径示意图。本实施例还根据用于非平基底的双光子自动加工方法及系统,对现有双光子直写加工设备进行优化,得到一种用于非平基底的双光子自动加工设备。加工设备包括激光器、运动台、基底、光路调节器、物镜、成像装置和控制器。Please refer to FIG. 12 , which is a schematic diagram of the laser path of the two-photon automatic processing equipment for non-flat substrates using the two-photon automatic processing method for non-flat substrates in FIG. 3 . In this embodiment, according to the two-photon automatic processing method and system for non-flat substrates, the existing two-photon direct writing processing equipment is optimized to obtain a two-photon automatic processing equipment for non-flat substrates. The processing equipment includes a laser, a moving stage, a substrate, an optical path regulator, an objective lens, an imaging device and a controller.
激光器用于发射激光。本实施例采用飞秒激光器。飞秒激光器为Coherent公司生产的型号为ChameleonVision-S的激光器,输出波长调节范围是690nm到1050nm,激光脉冲宽度为75fs,重复频率为80MHz,平均输出功率为2.5W。激光双光子加工所使用的激光波长为800nm。当然,在其他实施例中,激光器还可以选用脉冲激光器或连续激光器等,只要能发射激光加工所需的激光即可。Lasers are used to emit laser light. This embodiment uses a femtosecond laser. The femtosecond laser is a ChameleonVision-S laser produced by Coherent Company. The output wavelength adjustment range is 690nm to 1050nm, the laser pulse width is 75fs, the repetition frequency is 80MHz, and the average output power is 2.5W. The laser wavelength used in laser two-photon processing is 800nm. Of course, in other embodiments, the laser can also be a pulsed laser or a continuous laser, as long as it can emit the laser required for laser processing.
基底用于承载荧光聚合物,以使荧光聚合物位于激光路径上,荧光聚合物受激光照射发生荧光效应。本实施例采用PDMS作为柔性非平基底,荧光聚合物滴加在柔性基底上,在激光作用下,PDMS产生与荧光聚合物具有明显区别的光斑。当然,在其他实施例中,基底也可以采用塑料薄片等透明材料,以使激光能够穿过基底照射在荧光聚合物上。本实施例中,荧光聚合物采用光刻胶(SZ2080),光刻胶具有荧光效应。在加工前,将光刻胶放置在玻片上使用热烘箱60°烘烤15分钟。当然,在其他实施例中,荧光聚合物还可以采用光敏树脂、光敏水凝胶等其他具备荧光效应或掺杂荧光效应物质的光敏材料,只要在激光加工、显影后三维成型为设计的结构即可。当然,选用其他荧光聚合物时,光斑图像中的光斑等效直径的理想值与基准值的比值也随之改变,该比值根据采用的荧光聚合物的物理特性而设置。The substrate is used to carry the fluorescent polymer, so that the fluorescent polymer is located on the path of the laser light, and the fluorescent polymer produces a fluorescent effect when irradiated by the laser light. In this embodiment, PDMS is used as a flexible non-flat substrate, and a fluorescent polymer is dropped on the flexible substrate. Under the action of laser light, PDMS produces a light spot that is clearly different from that of the fluorescent polymer. Of course, in other embodiments, the substrate may also be made of transparent materials such as plastic sheets, so that the laser light can pass through the substrate and irradiate on the fluorescent polymer. In this embodiment, photoresist (SZ2080) is used as the fluorescent polymer, and the photoresist has a fluorescent effect. Before processing, place the photoresist on the slide and bake in a hot oven at 60° for 15 minutes. Of course, in other embodiments, the fluorescent polymer can also use photosensitive resins, photosensitive hydrogels and other photosensitive materials with fluorescent effects or doped with fluorescent effect substances, as long as they are three-dimensionally formed into the designed structure after laser processing and development. Can. Of course, when other fluorescent polymers are selected, the ratio of the ideal value of the equivalent diameter of the spot in the spot image to the reference value also changes accordingly, and the ratio is set according to the physical properties of the fluorescent polymer used.
运动台与基底固定连接,用于驱动基底移动。基底可以通过磁吸等方法与运动台固定连接,以保证在运动台驱动基底移动时,基底不会发生偏移。本实施例中,采用PI-E545纳米运动台,其可以驱动基底向x、y、z三个方向运动。PI-E545纳米运动台电性连接至控制器中,通过控制器控制其运动。激光加工过程中,基底分别绕着x轴和y轴偏转不同的角度,就可以实现激光焦点在xy平面内的扫描,在z轴方向可以直接通过升降移动调节基底的高度。当然,在其他实施例中,还可以采用其他微米级或纳米级运动台,只要能实现基底在三维空间内的精准移动即可。The motion table is fixedly connected with the base, and is used to drive the base to move. The base can be fixedly connected to the moving table by means of magnetic attraction to ensure that the base does not shift when the moving table drives the base to move. In this embodiment, a PI-E545 nano-motion stage is used, which can drive the substrate to move in three directions of x, y, and z. The PI-E545 nano motion table is electrically connected to the controller, and its movement is controlled by the controller. During laser processing, the substrate is deflected at different angles around the x-axis and y-axis, so that the laser focus can be scanned in the xy plane, and the height of the substrate can be directly adjusted by lifting and moving in the z-axis direction. Of course, in other embodiments, other micro-scale or nano-scale motion stages can also be used, as long as the precise movement of the substrate in three-dimensional space can be realized.
光路调节器设置在激光器的发射路径上,用于调节激光的强度和方向,以使激光分别用于加工或对焦。光路调节器包括光闸、前置调节器分光镜。前置调节器设置在激光器的激光发射路径上,用于调节激光的能量和相位。The optical path regulator is arranged on the emission path of the laser, and is used to adjust the intensity and direction of the laser, so that the laser can be used for processing or focusing respectively. The optical path adjuster includes a light gate and a pre-adjuster beam splitter. The pre-regulator is arranged on the laser emission path of the laser, and is used for adjusting the energy and phase of the laser.
前置调节器包括沿激光发射路径依次设置的格兰泰勒棱镜、半波片、扩束器、反射镜和衰减片。格兰泰勒棱镜用于控制激光光束的能量。格兰泰勒棱镜设置在激光器的发射路径上,用于将激光转化为偏振光。格兰泰勒棱镜是一种由天然方解石晶体制成的双折射偏光器件,主要成分为CaCO3的斜方六面体结晶。向格兰泰勒棱镜输入一束无偏的准直激光束,可以得到一束线偏振光(e光)。与其他偏光板相比,格兰泰勒棱镜的透光率和偏光纯度更高。半波片用于调整激光光束的相位。半波片是具有一定厚度的双折射晶体,当法向入射的光透过时,寻常光(o光)和线偏振光(e光)之间的位相差等于π或π的奇数倍。扩束器用于增大激光光束的直径。扩束器是能够改变激光光束直径和发散角的透镜组件。从激光器发出的激光具有一定的发散角,通过扩束器的调节使激光光束变为准直(平行)激光束。反射镜用于调节激光光束的发射方向。衰减片用于调节激光光束的能量。利用物质对光的吸收特性,将物质制成片状,放在光路调节组件上,可以将光强衰减,这种片状元件叫光学衰减片。光通过衰减片的多少与材料种类有关,也与材料的厚度有关。The pre-regulator includes a Glan Taylor prism, a half-wave plate, a beam expander, a reflector and an attenuation plate arranged in sequence along the laser emission path. Glan Taylor prisms are used to control the energy of laser beams. The Glan-Taylor prism is set on the emission path of the laser and is used to convert the laser light into polarized light. The Glan Taylor prism is a birefringent polarizer made of natural calcite crystals, the main component of which is rhombohedral crystals of CaCO 3 . Inputting an unbiased collimated laser beam into the Glan-Taylor prism can obtain a beam of linearly polarized light (e light). Compared with other polarizers, Glan Taylor prisms have higher light transmittance and polarization purity. Half-wave plates are used to adjust the phase of the laser beam. A half-wave plate is a birefringent crystal with a certain thickness. When the normal incident light passes through, the phase difference between ordinary light (o light) and linearly polarized light (e light) is equal to π or an odd multiple of π. Beam expanders are used to increase the diameter of a laser beam. A beam expander is a lens assembly that changes the diameter and divergence of a laser beam. The laser emitted from the laser has a certain divergence angle, and the laser beam becomes a collimated (parallel) laser beam through the adjustment of the beam expander. The reflector is used to adjust the emission direction of the laser beam. Attenuators are used to adjust the energy of the laser beam. Taking advantage of the light absorption characteristics of the material, the material is made into a sheet and placed on the optical path adjustment component to attenuate the light intensity. This sheet-like component is called an optical attenuation sheet. How much light passes through the attenuating sheet is related to the type of material, and also related to the thickness of the material.
光闸设置在激光器与前置调节器之间,用于控制激光的通断。The light gate is arranged between the laser and the pre-regulator, and is used to control the on-off of the laser.
分光镜设置在前置调节器的激光出射路径上,用于反射加工的激光并透射成像光线,并分别使反射激光入射到物镜,透射光线进入到成像装置上。本实施例中,分光镜为二向色镜,具有反射750-850nm波长的红外光并透射400-700nm波长的可见光的特性。激光器发射的800nm波长的激光被反光镜反射后垂直入射到物镜上,其他可见光则直接透射,避免对加工或对焦过程造成影响。此外,由荧光聚合物发射的荧光的波长一般在450-600nm之间,也会直接从分光镜中透射过去,被相机捕获,既可以提高荧光成像的清晰度,又可以避免荧光对激光加工造成干扰。The beam splitter is arranged on the laser output path of the pre-adjuster, and is used to reflect the processed laser and transmit the imaging light, and respectively make the reflected laser incident on the objective lens and the transmitted light enter the imaging device. In this embodiment, the beam splitter is a dichroic mirror, which has the characteristics of reflecting infrared light with a wavelength of 750-850nm and transmitting visible light with a wavelength of 400-700nm. The 800nm wavelength laser emitted by the laser is reflected by the mirror and then incident on the objective lens vertically, while other visible light is directly transmitted to avoid affecting the processing or focusing process. In addition, the wavelength of fluorescence emitted by fluorescent polymers is generally between 450-600nm, and it will also be directly transmitted through the beam splitter and captured by the camera, which can not only improve the clarity of fluorescence imaging, but also avoid the damage caused by fluorescence to laser processing. interference.
当然,在其他实施例中,光路调节组件还可以替换为光纤等导光元件,只要能将激光转换为准直激光束并垂直入射到物镜上即可。Of course, in other embodiments, the optical path adjustment component can also be replaced by a light guide element such as an optical fiber, as long as the laser can be converted into a collimated laser beam and be perpendicularly incident on the objective lens.
物镜设置在光路调节器的激光出射路径上,用于对激光聚焦。本实施例中,物镜的放大倍数为50倍,物镜的数值孔径为0.8。当然,在其他实施例中,物镜的放大倍数和数值孔径还可以更大或者更小。The objective lens is arranged on the laser output path of the optical path adjuster, and is used for focusing the laser light. In this embodiment, the magnification of the objective lens is 50 times, and the numerical aperture of the objective lens is 0.8. Of course, in other embodiments, the magnification and numerical aperture of the objective lens can be larger or smaller.
成像装置设置在荧光聚合物散射的荧光路径上,用于实时采集包含荧光聚合物及其散射荧光的光斑图像。成像装置还用于将采集的光斑图像传输到控制器中。本实施例中,成像装置为CCD相机。CCD相机具有体积小、重量轻、不受磁场影响及具有抗震动撞击的特性。CCD相机采集的图像具有清晰度高、便于传输的特点。当然在其他实施例中,成像装置也可以替换为光电二极管、光电三极管等光电转换元件,只要能将基底和荧光聚合物发出的光信号转换为图像或电信号即可。The imaging device is arranged on the fluorescence path scattered by the fluorescent polymer, and is used for real-time collection of light spot images including the fluorescent polymer and its scattered fluorescence. The imaging device is also used to transmit the collected light spot images to the controller. In this embodiment, the imaging device is a CCD camera. The CCD camera has the characteristics of small size, light weight, no influence of magnetic field and anti-vibration impact. The image collected by the CCD camera has the characteristics of high definition and easy transmission. Of course, in other embodiments, the imaging device can also be replaced with a photoelectric conversion element such as a photodiode, a phototransistor, etc., as long as the optical signal emitted by the substrate and the fluorescent polymer can be converted into an image or an electrical signal.
控制器用于:一、控制运动台调节基底的水平位置,使激光焦点的水平位置位于基底的初始加工区域内。控制器在激光加工的过程中,首先根据设计的微纳结构生成一个扫描策略。扫描策略包含以多个加工点为基础形成的水平移动路径以及在每个加工点生成的加工策略。随后,移动基底,使激光焦点的水平位置位于预设的初始加工区域内,从而避免加工的微纳结构超出基底的表面造成结构丢失。The controller is used for: 1. Controlling the moving table to adjust the horizontal position of the substrate so that the horizontal position of the laser focus is located in the initial processing area of the substrate. In the process of laser processing, the controller first generates a scanning strategy according to the designed micro-nano structure. The scanning strategy includes a horizontal movement path formed on the basis of multiple processing points and a processing strategy generated at each processing point. Subsequently, the substrate is moved so that the horizontal position of the laser focus is located in the preset initial processing area, so as to avoid structure loss caused by the processed micro-nano structure exceeding the surface of the substrate.
二、对激光器发射的激光进行对焦,以使基底位于理想的初始加工位置,根据相应的加工策略在初始加工位置进行激光加工。激光焦点位于初始加工区域内后,需要将基底移动至理想加工位置,从而避免加工结构部分丢失或完全丢失。对焦的方法包括:获取荧光聚合物及其散射荧光的光斑图像,调节基底的高度直至光斑图像中光斑的等效直径等于理想值。2. Focus the laser emitted by the laser so that the substrate is located at the ideal initial processing position, and perform laser processing at the initial processing position according to the corresponding processing strategy. After the laser focus is located in the initial processing area, the substrate needs to be moved to the ideal processing position, so as to avoid partial or complete loss of the processing structure. The focusing method includes: acquiring a spot image of the fluorescent polymer and its scattered fluorescence, and adjusting the height of the substrate until the equivalent diameter of the spot in the spot image is equal to an ideal value.
三、根据预设的移动路径控制运动台驱动基底移动,进而在每个加工点上完成相应的激光加工。在每个加工点均进行激光对焦,减小或消除基底非平对激光加工的影响,提高激光加工的精确度。3. Control the motion table to drive the substrate to move according to the preset moving path, and then complete the corresponding laser processing at each processing point. Laser focusing is performed at each processing point to reduce or eliminate the influence of substrate unevenness on laser processing and improve the accuracy of laser processing.
四、判断光斑图像中光斑的等效直径是否等于理想值,是则直接在该位置进行激光加工。否则在该加工点进行对焦,完成对焦后在该加工点进行激光加工。由于设计结构为三维微纳结构,荧光聚合物在基底上需要进行多点加工。根据设计结构及已完成的加工位置可以判断出是否完成加工。在微纳结构加工完成后,需要对微纳结构进行显影处理,去除微纳结构中超出设计结构的部分,得到成品微纳结构。4. Judging whether the equivalent diameter of the spot in the spot image is equal to the ideal value, if so, perform laser processing directly at this position. Otherwise, focus at the processing point, and perform laser processing at the processing point after focusing. Since the designed structure is a three-dimensional micro-nano structure, the fluorescent polymer needs to be processed at multiple points on the substrate. According to the design structure and the completed processing position, it can be judged whether the processing is completed. After the processing of the micro-nano structure is completed, the micro-nano structure needs to be developed to remove the part of the micro-nano structure that exceeds the designed structure to obtain the finished micro-nano structure.
本实施例提供的用于非平基底的双光子自动加工设备,通过将激光焦点的对焦转换为荧光图像识别,根据光斑的等效直径来确认是否完成对焦,有效地提高对焦效率及对焦的精确度。此外,通过对每个加工点进行自动对焦,解决了使用激光在非平基底上加工过程中,手动对焦操作繁复、耗时而且存在较大误差这一问题。The two-photon automatic processing equipment for non-flat substrates provided in this embodiment converts the focus of the laser focus into fluorescent image recognition, and confirms whether the focus is completed according to the equivalent diameter of the spot, effectively improving the focus efficiency and focus accuracy. Spend. In addition, by automatically focusing on each processing point, the problem of complicated, time-consuming manual focusing operations and large errors in the process of using lasers to process non-flat substrates is solved.
实验验证Experimental verification
实验一:激光焦点位于不同位置时,观察加工的微纳结构与设计结构的变化关系。Experiment 1: When the laser focus is at different positions, observe the relationship between the processed micro-nano structure and the designed structure.
采用一个表面倾斜的基底,并将基底与运动台固定连接。通过光路调节器将激光器发射的激光波长调节为800nm,在一个水平方向上进行阵列加工,保持所有加工点均位于同一水平面上,得到微柱结构色如图13所示。随后,在保持基底和激光波长不变的情况下,对每个加工点均进行对焦,得到的微柱结构色如图14所示。A base with a sloped surface is used, and the base is fixedly connected to the motion table. Adjust the wavelength of the laser emitted by the laser to 800nm through the optical path adjuster, perform array processing in a horizontal direction, keep all processing points on the same horizontal plane, and obtain the microcolumn structural color as shown in Figure 13. Then, under the condition of keeping the substrate and the laser wavelength unchanged, each processing point was focused, and the obtained micro-column structural color is shown in Figure 14.
请参阅图13和图14,图13为因激光焦点与基底表面的相对高度不一致导致的结构色及微柱阵列图;图14为使用自动对焦后实现的荧光颜色及微柱阵列图。可以看出,在未对每个加工点进行对焦时,激光焦点虽然保持在同一水平面上,但由于基底表面倾斜导致激光焦点与基底的相对高度产生变化,在全长为50μm的加工路径上,在第一加工点加工的微柱高度与在最后一个加工点(第6个加工点)加工的微柱高度相差1.5μm,每个微柱散射的荧光颜色依次为绿色、蓝色、红色、橙色、黄色和黄色。Please refer to Figure 13 and Figure 14, Figure 13 is the structural color and micro-column array due to the inconsistency of the relative height of the laser focus and the substrate surface; Figure 14 is the fluorescent color and micro-column array achieved after using autofocus. It can be seen that when each processing point is not focused, although the laser focus remains on the same horizontal plane, the relative height between the laser focus and the substrate changes due to the inclination of the substrate surface. On the processing path with a total length of 50 μm, The difference between the height of the micropillars processed at the first processing point and the height of the micropillars processed at the last processing point (6th processing point) is 1.5 μm, and the fluorescent colors scattered by each micropillar are green, blue, red, and orange in sequence , Yellow And Yellow.
根据实验结果进行分析,因为基底非平会导致加工的同一高度微柱阵列出现高度不一致的情况。其中,不同结构色的微柱产生的原因是:基底非平导致加工高度不一致,进而导致加工的微结构高度不同,因此引起了结构色变化。微柱高度不同的原因是:激光焦点与基底表面的相对位置不同,因此实际的加工结构与设计结构参数不一致的现象。The analysis is based on the experimental results, because the non-flat substrate will lead to inconsistencies in the height of the processed micropillar arrays of the same height. Among them, the reason for the micropillars with different structural colors is that the unevenness of the substrate leads to inconsistent processing heights, which in turn leads to different heights of the processed microstructures, thus causing structural color changes. The reason for the different heights of the micropillars is that the relative positions of the laser focus and the substrate surface are different, so the actual processing structure is inconsistent with the design structure parameters.
图14中可以看出,使用自动对焦可以使加工微柱高度一致,且每个微柱结构色也均为红色。本实验中,实验平台加工基底的非平面度误差或倾斜度在1:50到1:25之间,这对微纳结构影响是比较大的。因此,通过本方法来校正非平面基底影响。当初始位置定位到理想加工位置时,记录此时的荧光光斑大小,在后续加工阵列产生的荧光光斑大小与初始位置进行对比,当出现不一致的情况时控制转镜台移动,直至当前荧光光斑大小与初始位置荧光光斑大小相同。通过基于荧光效应的双光子直写加工过程对非平基底使用自动对焦后,加工出的微柱阵列高度一致,可以减小非平基底变化对加工结构的影响。It can be seen from Figure 14 that the height of the processed microcolumns can be made consistent by using autofocus, and the structural color of each microcolumn is also red. In this experiment, the non-planarity error or inclination of the substrate processed by the experimental platform is between 1:50 and 1:25, which has a relatively large impact on the micro-nano structure. Therefore, the non-planar substrate effect is corrected by this method. When the initial position is positioned at the ideal processing position, record the size of the fluorescent spot at this time, and compare the size of the fluorescent spot generated in the subsequent processing array with the initial position. When there is an inconsistency, control the movement of the turntable until the size of the current fluorescent spot is equal to the original position. The size of the fluorescent spot at the initial position is the same. After autofocusing on the non-flat substrate through the two-photon direct writing process based on the fluorescence effect, the processed micropillar arrays are of consistent height, which can reduce the influence of the non-flat substrate variation on the processed structure.
实验二:使用自动对焦方法和不使用自动对焦方法在图案化基底上加工微纳结构。Experiment 2: Processing micro-nano structures on patterned substrates with and without auto-focusing methods.
请参阅图15,其为在图案化基底上不同位置加工微纳结构的实验对比图。其中,图15a为图案化基底的结构示意图;图15b为未使用自动加工方法在图案化基底上加工微纳阵列效果图;图15c为调节焦点位置,在图案化基底上加工微纳阵列效果图。采用一个图案化基底如图15a所示,图案化基底可以使用光刻方法得到。具体过程为,在玻片上旋涂一层50微米厚的SU-8光刻胶,使用光刻机(型号:ABM6350)曝光图案化光刻胶。曝光后使用显影液去除多余部分,由光刻胶结构在玻片表面形成设计宽度的沟槽结构。本实验中,沟槽深度50微米、宽度80~150微米。Please refer to FIG. 15 , which is an experimental comparison diagram of processing micro-nano structures at different positions on the patterned substrate. Among them, Figure 15a is a schematic structural diagram of a patterned substrate; Figure 15b is an effect diagram of processing a micro-nano array on a patterned substrate without using an automatic processing method; Figure 15c is an effect diagram of processing a micro-nano array on a patterned substrate by adjusting the focus position . Using a patterned substrate as shown in Figure 15a, the patterned substrate can be obtained using photolithographic methods. The specific process is to spin-coat a layer of SU-8 photoresist with a thickness of 50 microns on the glass slide, and use a photolithography machine (model: ABM6350) to expose the patterned photoresist. After exposure, use a developer to remove the excess, and form a groove structure with a designed width on the surface of the glass by the photoresist structure. In this experiment, the groove depth is 50 microns, and the width is 80-150 microns.
在图案化基底上滴加SZ2080光刻胶,以100度前烘30min。将基底与运动台固定连接,通过光路调节器将飞秒激光器发射的激光波长调节为800nm,随后进行阵列加工。SZ2080 photoresist was added dropwise on the patterned substrate, and pre-baked at 100 degrees for 30 minutes. The substrate is fixedly connected to the moving stage, and the laser wavelength emitted by the femtosecond laser is adjusted to 800nm through an optical path regulator, followed by array processing.
从图15b和图15c中可以看出,在未对每个加工点进行自动加工时,激光焦点虽然保持在同一水平面上,但加工的基底为沟槽结构,在沟槽底部和侧壁的过渡区域由于基底高度变化,加工的微柱高度与沟槽底部微柱高度明显不同。导致加工出的部分微柱发生倒塌变形,加工效果不佳。而在使用焦点调节方法,可以看到加工后的微柱阵列高度一致,无倒塌变形整体加工效果较好。It can be seen from Figure 15b and Figure 15c that when automatic processing is not performed on each processing point, although the laser focus remains on the same level, the processed substrate is a groove structure, and the transition between the bottom of the groove and the side wall Due to the variation of the substrate height in the area, the processed micropillar height is significantly different from the micropillar height at the bottom of the trench. As a result, part of the processed microcolumns collapsed and deformed, and the processing effect was not good. However, when using the focus adjustment method, it can be seen that the height of the processed micro-column array is consistent, and the overall processing effect is better without collapse and deformation.
因此,通过本发明的自动加工方法可以校正非平面基底对加工的影响,实现在非平基底上完整三维微纳结构阵列。Therefore, the influence of the non-planar substrate on processing can be corrected through the automatic processing method of the present invention, and a complete three-dimensional micro-nano structure array on the non-flat substrate can be realized.
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only express several implementation modes of the present invention, and the descriptions thereof are relatively specific and detailed, but should not be construed as limiting the patent scope of the invention. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent for the present invention should be based on the appended claims.
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