CN115394513B

CN115394513B - Coaxial symmetrical strong pulse four-coil-set supporting device and coaxial symmetrical strong pulse four-coil set

Info

Publication number: CN115394513B
Application number: CN202210859406.XA
Authority: CN
Inventors: 毛傲华; 徐风雨; 王志斌; 鄂鹏; 王晓钢; 李立毅
Original assignee: Harbin Institute of Technology
Current assignee: Harbin Institute of Technology
Priority date: 2022-07-21
Filing date: 2022-07-21
Publication date: 2023-04-18
Anticipated expiration: 2042-07-21
Also published as: CN115394513A

Abstract

A coaxial symmetrical strong pulse four-coil group supporting device and a coaxial symmetrical strong pulse four-coil group relate to the field of mechanical support. Aiming at the problems that in the prior art, according to a PPPL supporting structure, only a coaxial discrete double-coil scheme can be realized, and the coverage range of a straight area of a wave-projecting surface can only meet the requirements of a few applications, the invention provides the following technical scheme: four coil assembly strutting arrangement of coaxial symmetry strong pulse includes: the guide pipe is sequentially connected with a first support frame, a second support frame, a third support frame and a fourth support frame in a sliding manner along the axis direction of the guide pipe; the first support frame includes: the four first side support arms are respectively fixed at the end parts of the four first support arms along the direction parallel to the guide pipe; the second support frame includes: the four second side support arms are respectively fixed at the end parts of the four second support arms along the direction parallel to the guide pipe; is suitable for being applied to a magnetic control plasma device.

Description

Coaxial symmetrical strong pulse four-coil set supporting device and coaxial symmetrical strong pulse four-coil set

Technical Field

Relates to the technical field of large electromagnetic pulse coils and the technical field of coaxial discrete support.

Background

The strong pulse coil is an important component of the magnetic control plasma device, and the plasma is thrown to the direction far away from the coil under the action of a strong pulse magnetic field. In order to obtain fast changing pulse edges, a single pulse coil has only a few turns; thus, in order to obtain a high magnetic field peak, the pulse current peak needs to be on the order of 10kA to 100 kA. The large-scale strong pulse coil can drive plasma groups with larger volume, and the application range of the magnetron plasma device is expanded, and the device comprises the fields of magnetron sputtering coating, space plasma simulation and the like. When the pulse magnetic field is at the rising edge, the plasmoid is thrown to the direction far away from the coil in the hollow cylinder area outside the outer diameter of the pulse coil. The projectile wave surface is determined by the shape of the magnetic line of force, is in a hyperbolic or parabolic shape under the action of the magnetic field of the single pulse coil, and the proportion of the volume of the plasma group available for utilization (or research) in the area near the symmetry plane is very low, so that the utilization or research requirements cannot be met. In order to improve the utilization efficiency and the projectile strength of the plasmoid, scientists have proposed a solution of constructing a flat wave surface region with magnetic lines of force approximately parallel to the coil axis, in the vicinity of the plane of symmetry.

The plasma physics laboratory, PPPL, university of princeton, usa, first proposed and constructed an experimental setup of a coaxial symmetric dual coil configuration, as shown in fig. 6. To avoid interference of the tip discharge with the plasma, the single pulse coil is usually designed in the shape of a toroid of circular cross section. The coil support is of a tubular structure, the central line of the pipeline penetrates through the circle center of the small circular section of the super-ring body and is parallel to the central axis of the large circle, the coil is fixed through a clamping mechanism acting on the outer surface of the far end of the supporting tube, and the coil lead penetrates out of the supporting tube, so that the coil lead and the coil support structure occupy the surface of the super-ring body as little as possible. The number of support tubes is 4, along the coil circle Zhou Junbu to achieve balanced support. The two coil supporting tubes are coaxial in pairs, so that the sector angle spanned by the interference-free plasma between the two adjacent supporting tubes is 90 degrees. Compared with a single pulse coil, a more uniform magnetic confinement plasma cluster ejection area is obtained. However, the two indexes are still in a lower level for wider magnetron sputtering coating and space plasma simulation application, so that the application scene of the strong pulse coil is also restricted.

Disclosure of Invention

Aiming at the problems that in the prior art, 4 supporting tubes penetrate out from the same side of a large circular plane according to a PPPL supporting structure, a mirror symmetry method is used, the coil supporting structure is limited to only realize a coaxial symmetry double-coil scheme, and the coverage range of a flat wave surface area of a projected wave surface can only meet the requirements of a few applications, the technical scheme provided by the invention is as follows:

four coil assembly strutting arrangement of coaxial symmetry intense pulse, strutting arrangement includes: the guide pipe is sequentially connected with a first support frame, a second support frame, a third support frame and a fourth support frame in a sliding manner along the axis direction of the guide pipe; the first support frame and the fourth support frame are symmetrically arranged along the direction of the guide pipe, and the second support frame and the third support frame are symmetrically arranged along the direction of the guide pipe;

the first support frame includes: the four first supporting arms are perpendicular to the guide pipe and are uniformly distributed and fixed on the outer wall of the first fixing ring, and through holes in the parallel direction along the guide pipe are formed in the middle positions of the four first supporting arms respectively; the four first side support arms are respectively fixed at the end parts of the four first support arms along the direction parallel to the guide pipe; the first fixing ring is used for being connected with the guide pipe in a sliding mode;

the second support frame includes: the four second supporting arms are perpendicular to the guide pipe and are uniformly distributed and fixed on the outer wall of the second fixing ring, strip-shaped bulges in the parallel direction of the guide pipe are respectively arranged in the middle of the four second supporting arms, and the bulges are in sliding fit with the through holes; the four second side support arms are respectively fixed at the end parts of the four second support arms along the direction parallel to the guide pipe; the second fixing ring is used for being connected with the guide pipe in a sliding mode.

Furthermore, the first side support arm is of a hollow structure.

Furthermore, the second side support arm, the protrusion and the part of the second support arm between the second side support arm and the protrusion are all hollow structures.

Preferably, the four first side support arms extend in opposite directions of the second support frame, and the extension length is at least the initial length of the four first side support arms.

Preferably, the end portions of the four protrusions and the end portions of the four first side arms in the extending direction are located on the same horizontal plane.

Further, the virtual projection of the four first side support arms to the plane perpendicular to the guide pipe coincides with the virtual projection of the four second side support arms to the plane perpendicular to the guide pipe.

Further, the first fixing ring includes: self-lubricating layer, two isolation layers and central ring, the self-lubricating layer is located the most inboard of the virtual ring in first solid fixed ring place is outwards an isolation layer, central ring and another isolation layer in proper order, the solid fixed ring's of second structure with first fixed ring constructs the same.

Further, the first support arm with first solid fixed ring with the second support arm with the solid fixed ring's of second connected mode specifically does: and adopting a welding mode for connection.

Based on the same inventive concept, the invention also provides a coaxial symmetrical strong pulse four-coil set, which comprises: the four coils are the same in size, coaxial and respectively arranged on the side support arms of the four support frames.

Further, the specific setting mode that the four coils are arranged on the side supporting arms of the four supporting frames is as follows: the end point of the side support arm is inserted into the coil and is positioned at the center of a virtual circle where the section of the coil is located.

The invention has the advantages that:

the coaxial symmetrical strong pulse four-coil-set supporting device provided by the invention solves the supporting problem of coaxial symmetrical arrangement of four pulse coils, and provides a stable foundation for application of the strong pulse coils.

Compared with the coaxial symmetrical double-coil configuration of PPPL, the coaxial symmetrical strong pulse four-coil set provided by the invention keeps the sector angle spanned by interference-free plasma to be 90 degrees, and simultaneously prolongs the axial length of a straight wave surface area by one time, namely doubles the uniform magnetic confinement plasma cluster projection area.

The method is suitable for the fields of magnetic control plasma devices, space plasma simulation and the like.

Drawings

Fig. 1 is a front view of a coaxial symmetrical strong pulse four-coil assembly provided in the ninth embodiment;

fig. 2 is a top view of a coaxial symmetric strong pulse four-coil set provided in the ninth embodiment;

fig. 3 is a cross-sectional view of a coaxial symmetric intense pulse four-coil assembly provided in the ninth embodiment, taken along the direction a in fig. 2;

FIG. 4 is an enlarged view of portion I of FIG. 3;

FIG. 5 is an enlarged view of section II of FIG. 3;

fig. 6 is a schematic diagram of an experimental apparatus of the coaxial symmetric dual coil configuration mentioned in the background art.

Wherein 1 denotes a coil, 2 denotes a guide tube, 3 denotes a first support frame, 301 denotes a first support arm, 302 denotes a first side arm, 303 denotes a through hole, 304 denotes a first fixing ring, 4 denotes a second support frame, 401 denotes a second support arm, 402 denotes a second side arm, 403 denotes a projection, 404 denotes a second fixing ring, 5 denotes a third support frame, and 6 denotes a fourth support frame.

Detailed Description

In order to make the advantages and benefits of the technical solutions provided by the present invention more apparent, the technical solutions provided by the present invention will now be described in further detail through several specific embodiments, specifically:

the first embodiment is described with reference to fig. 1 to 5, and the first embodiment provides a coaxial symmetric strong pulse four-coil set supporting device, which includes: the guide pipe is sequentially connected with a first support frame, a second support frame, a third support frame and a fourth support frame in a sliding manner along the axis direction of the guide pipe; the first support frame and the fourth support frame are symmetrically arranged along the direction of the guide pipe, and the second support frame and the third support frame are symmetrically arranged along the direction of the guide pipe;

the first support frame includes: the four first supporting arms are perpendicular to the guide pipe, are uniformly distributed and fixed on the outer wall of the first fixing ring, and are respectively provided with through holes in the parallel direction along the guide pipe in the middle; the four first side support arms are respectively fixed at the end parts of the four first support arms along the direction parallel to the guide pipe; the first fixing ring is used for being connected with the guide pipe in a sliding mode;

the second support frame includes: the four second supporting arms are perpendicular to the guide pipe and are uniformly distributed and fixed on the outer wall of the second fixing ring, strip-shaped bulges in the parallel direction of the guide pipe are respectively arranged in the middle of the four second side supporting arms, and the bulges are in sliding fit with the through holes; the four second side support arms are respectively fixed at the end parts of the four second support arms along the direction parallel to the guide pipe; the second fixing ring is used for being connected with the guide pipe in a sliding mode.

In a second embodiment, the first side arm is a hollow structure, and the second side arm is a hollow structure.

In a third aspect of the present invention, the coaxial symmetrical high-intensity pulse four-coil set supporting device according to any one of the first to third aspects is further defined, wherein the second side arm, the protrusion, and a portion of the second supporting arm between the second side arm and the protrusion are all hollow structures.

The beneficial effects of the embodiment are as follows: when the coaxial symmetrical strong-pulse four-coil-set supporting device supports the coil, the lead of the coil is connected with an external circuit through the inside of the supporting arm of the device, so that the interference of pulse current to the outside can be reduced, and the super-annular surface of the pulse coil is not additionally occupied, so that the fan-shaped angle of a uniform magnetic confinement plasma region can still reach 90 degrees.

In a fourth embodiment, the coaxial symmetric strong pulse four-coil set supporting device provided in the third embodiment is further defined, wherein the four first side supporting arms respectively extend in opposite directions of the second supporting frame, and the extending length is at least equal to the initial length of the four first side supporting arms.

In a fifth aspect of the present invention, in the fourth aspect, the end portions of the four protrusions and the end portions of the four first side arms in the extending direction are located on the same horizontal plane.

A sixth implementation manner is further defined by the first implementation manner, wherein the virtual projection of the four first side arms onto the plane perpendicular to the guide tube coincides with the virtual projection of the four second side arms onto the plane perpendicular to the guide tube.

A seventh embodiment is further defined in the first embodiment, wherein the first fixing ring includes: self-lubricating layer, two isolation layers and central ring, the self-lubricating layer is located the most inboard of the virtual ring in first solid fixed ring place is an isolation layer, central ring and another isolation layer outwards in proper order, the solid fixed ring's of second structure with first fixed ring constructs the same.

In an eighth embodiment, the present embodiment is further limited to the first embodiment, in which the first support arm and the first fixed ring and the second support arm and the second fixed ring are connected in a specific manner: and adopting a welding mode for connection.

Ninth, the present embodiment provides a coaxial symmetric strong pulse four-coil set, which includes: the four coils are the same in size, coaxial and respectively arranged on the side support arms of the four support frames.

In particular, the method comprises the following steps of,

the extension direction of the side support arms for supporting the single coil is back to the symmetrical plane, so that the support tube fixing area is far away from the plasma projection area.

The surface of the guide tube is smooth, and the guide tube is used as a guide for the movement of each coil along the guide tube under the action of mutual electromagnetic force, and is also used as a limit in the horizontal direction to limit the movement caused by the magnetic interaction force of other pulse coils in the horizontal direction.

The supporting frames are limited through a damping mechanism to buffer huge electromagnetic interaction force.

Tenth embodiment and the present embodiment are further limited to the coaxial symmetric strong pulse four-coil set provided in the ninth embodiment, and specific arrangement manners of the four coils disposed on the side arms of the four support frames are as follows: the end point of the side support arm is inserted into the coil and is positioned at the center of a virtual circle where the section of the coil is located.

The technical scheme provided by the invention is further described in detail through a plurality of specific embodiments, so that the advantages and benefits of the technical scheme provided by the invention are more clearly shown; however, the above embodiments are not intended to limit the present invention, and any modifications and improvements, combinations of embodiments, and equivalents within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. Four coil assembly strutting arrangement of coaxial strong pulse that stands separately, its characterized in that, strutting arrangement includes: the guide pipe is sequentially connected with a first support frame, a second support frame, a third support frame and a fourth support frame in a sliding manner along the axis direction of the guide pipe; the first support frame and the fourth support frame are symmetrically arranged along the direction of the guide pipe, and the second support frame and the third support frame are symmetrically arranged along the direction of the guide pipe;

the first support frame includes: the four first supporting arms are perpendicular to the guide pipe, are uniformly distributed and fixed on the outer wall of the first fixing ring, and are respectively provided with through holes in the parallel direction along the guide pipe at the middle positions; the four first side support arms are respectively fixed at the end parts of the four first support arms along the direction parallel to the guide pipe; the first fixing ring is used for being connected with the guide pipe in a sliding mode;

2. The coaxial discrete intense pulse four-coil assembly support device of claim 1, wherein the first side arm is of a hollow structure.

3. The coaxial discrete intense pulse four-coil assembly support device according to any one of claims 1 or 2, wherein the second side arm, the protrusion and the portion of the second support arm between the second side arm and the protrusion are all hollow structures.

4. The coaxial discrete intense pulse quadruple coil assembly support device of claim 3 wherein each of said four first side arms extends in a direction opposite to said second support frame by at least the initial length of said four first side arms.

5. The coaxial discrete intense pulse quadruple coil assembly support device of claim 4, wherein the ends of the four protrusions are located on the same horizontal plane as the ends of the four first side arms in the direction of extension.

6. The coaxial discrete intense pulse four-coil assembly support device of claim 1, wherein the virtual projection of the four first side arms onto a plane perpendicular to the guide tube coincides with the virtual projection of the four second side arms onto a plane perpendicular to the guide tube.

7. The coaxial discrete intense pulse four-coil array support device of claim 1, wherein said first retaining ring comprises: self-lubricating layer, two isolation layers and central ring, the self-lubricating layer is located the most inboard of the virtual ring in first solid fixed ring place is outwards an isolation layer, central ring and another isolation layer in proper order, the solid fixed ring's of second structure with first fixed ring constructs the same.

8. The coaxial discrete intense pulse four-coil array supporting device according to claim 1, wherein the first supporting arm and the first fixing ring and the second supporting arm and the second fixing ring are connected in a manner that: and adopting a welding mode for connection.

9. Four coil groups of coaxial discrete intense pulse, its characterized in that, coil group includes: the coaxial discrete intense pulse four-coil array support device of claim 1 and four coils of the same size and coaxial and respectively disposed on the side arms of the four support brackets.

10. The coaxial discrete intense pulse four-coil assembly according to claim 9, wherein the four coils are arranged on the side arms of the four support frames in a manner that: the end point of the side support arm is inserted into the coil and is positioned at the center of a virtual circle where the section of the coil is located.