CN115368165A - Polyamide composition and method for stacking stone slabs - Google Patents
Polyamide composition and method for stacking stone slabs Download PDFInfo
- Publication number
- CN115368165A CN115368165A CN202110539705.0A CN202110539705A CN115368165A CN 115368165 A CN115368165 A CN 115368165A CN 202110539705 A CN202110539705 A CN 202110539705A CN 115368165 A CN115368165 A CN 115368165A
- Authority
- CN
- China
- Prior art keywords
- protective release
- release layer
- stacking
- polyamide
- stone slabs
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004575 stone Substances 0.000 title claims abstract description 127
- 239000004952 Polyamide Substances 0.000 title claims abstract description 66
- 229920002647 polyamide Polymers 0.000 title claims abstract description 66
- 238000000034 method Methods 0.000 title claims abstract description 61
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- 230000001681 protective effect Effects 0.000 claims abstract description 95
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 28
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 25
- -1 polydimethylsiloxane Polymers 0.000 claims description 52
- 238000002360 preparation method Methods 0.000 claims description 24
- 239000003795 chemical substances by application Substances 0.000 claims description 22
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 12
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 12
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 8
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 claims description 8
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 claims description 8
- 150000004982 aromatic amines Chemical group 0.000 claims description 8
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 claims description 8
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 claims description 8
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 claims description 8
- 239000002530 phenolic antioxidant Substances 0.000 claims description 7
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 claims description 6
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229920001296 polysiloxane Polymers 0.000 claims description 5
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 claims description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims description 4
- WXBUUJNOVQVTFV-UHFFFAOYSA-N 10-(azacycloundec-1-yl)-10-oxodecanamide Chemical compound NC(=O)CCCCCCCCC(=O)N1CCCCCCCCCC1 WXBUUJNOVQVTFV-UHFFFAOYSA-N 0.000 claims description 4
- KWVPRPSXBZNOHS-UHFFFAOYSA-N 2,4,6-Trimethylaniline Chemical compound CC1=CC(C)=C(N)C(C)=C1 KWVPRPSXBZNOHS-UHFFFAOYSA-N 0.000 claims description 4
- BSWWXRFVMJHFBN-UHFFFAOYSA-N 2,4,6-tribromophenol Chemical compound OC1=C(Br)C=C(Br)C=C1Br BSWWXRFVMJHFBN-UHFFFAOYSA-N 0.000 claims description 4
- LODHFNUFVRVKTH-ZHACJKMWSA-N 2-hydroxy-n'-[(e)-3-phenylprop-2-enoyl]benzohydrazide Chemical compound OC1=CC=CC=C1C(=O)NNC(=O)\C=C\C1=CC=CC=C1 LODHFNUFVRVKTH-ZHACJKMWSA-N 0.000 claims description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 4
- VIUDTWATMPPKEL-UHFFFAOYSA-N 3-(trifluoromethyl)aniline Chemical compound NC1=CC=CC(C(F)(F)F)=C1 VIUDTWATMPPKEL-UHFFFAOYSA-N 0.000 claims description 4
- BSYNRYMUTXBXSQ-FOQJRBATSA-N 59096-14-9 Chemical compound CC(=O)OC1=CC=CC=C1[14C](O)=O BSYNRYMUTXBXSQ-FOQJRBATSA-N 0.000 claims description 4
- 229920000571 Nylon 11 Polymers 0.000 claims description 4
- 229920002292 Nylon 6 Polymers 0.000 claims description 4
- 229920002302 Nylon 6,6 Polymers 0.000 claims description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N Salicylic acid Natural products OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 claims description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical group OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 229930003836 cresol Natural products 0.000 claims description 4
- 229940086555 cyclomethicone Drugs 0.000 claims description 4
- NSBIQPJIWUJBBX-UHFFFAOYSA-N n-methoxyaniline Chemical compound CONC1=CC=CC=C1 NSBIQPJIWUJBBX-UHFFFAOYSA-N 0.000 claims description 4
- 229940057874 phenyl trimethicone Drugs 0.000 claims description 4
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 claims description 4
- 229920006111 poly(hexamethylene terephthalamide) Polymers 0.000 claims description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims description 4
- 229960004889 salicylic acid Drugs 0.000 claims description 4
- LINXHFKHZLOLEI-UHFFFAOYSA-N trimethyl-[phenyl-bis(trimethylsilyloxy)silyl]oxysilane Chemical compound C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)C1=CC=CC=C1 LINXHFKHZLOLEI-UHFFFAOYSA-N 0.000 claims description 4
- 229950002929 trinitrophenol Drugs 0.000 claims description 4
- IQUPABOKLQSFBK-UHFFFAOYSA-N 2-nitrophenol Chemical compound OC1=CC=CC=C1[N+]([O-])=O IQUPABOKLQSFBK-UHFFFAOYSA-N 0.000 claims description 3
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 3
- FBPFZTCFMRRESA-FBXFSONDSA-N Allitol Chemical compound OC[C@H](O)[C@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-FBXFSONDSA-N 0.000 claims description 2
- 229920000305 Nylon 6,10 Polymers 0.000 claims description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 239000010454 slate Substances 0.000 abstract description 7
- 239000004698 Polyethylene Substances 0.000 description 28
- 229920000573 polyethylene Polymers 0.000 description 28
- 238000012360 testing method Methods 0.000 description 9
- 239000010438 granite Substances 0.000 description 7
- 239000007921 spray Substances 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
- 230000006835 compression Effects 0.000 description 6
- 238000005469 granulation Methods 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 230000032683 aging Effects 0.000 description 3
- GVNWZKBFMFUVNX-UHFFFAOYSA-N Adipamide Chemical compound NC(=O)CCCCC(N)=O GVNWZKBFMFUVNX-UHFFFAOYSA-N 0.000 description 2
- NUZWLKWWNNJHPT-UHFFFAOYSA-N anthralin Chemical compound C1C2=CC=CC(O)=C2C(=O)C2=C1C=CC=C2O NUZWLKWWNNJHPT-UHFFFAOYSA-N 0.000 description 2
- 238000012669 compression test Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229960002311 dithranol Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229920000417 polynaphthalene Polymers 0.000 description 2
- MHSKRLJMQQNJNC-UHFFFAOYSA-N terephthalamide Chemical compound NC(=O)C1=CC=C(C(N)=O)C=C1 MHSKRLJMQQNJNC-UHFFFAOYSA-N 0.000 description 2
- 230000007306 turnover Effects 0.000 description 2
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- IOAISUCAQCEHTA-UHFFFAOYSA-N 5-methyl-2-propan-2-ylphenol Chemical compound CC(C)C1=CC=C(C)C=C1O.CC(C)C1=CC=C(C)C=C1O IOAISUCAQCEHTA-UHFFFAOYSA-N 0.000 description 1
- 230000000181 anti-adherent effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009435 building construction Methods 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007655 standard test method Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/46—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with organic materials
- C04B41/48—Macromolecular compounds
- C04B41/488—Other macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
- C04B41/4892—Polyamides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G57/00—Stacking of articles
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/46—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with organic materials
- C04B41/49—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes
- C04B41/4905—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon
- C04B41/495—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon applied to the substrate as oligomers or polymers
- C04B41/4961—Polyorganosiloxanes, i.e. polymers with a Si-O-Si-O-chain; "silicones"
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D177/00—Coating compositions based on polyamides obtained by reactions forming a carboxylic amide link in the main chain; Coating compositions based on derivatives of such polymers
- C09D177/06—Polyamides derived from polyamines and polycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/20—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for coatings strippable as coherent films, e.g. temporary coatings strippable as coherent films
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/48—Stabilisers against degradation by oxygen, light or heat
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
Abstract
A method for stacking polyamide composition and slate. The stone slab stacking method comprises the following steps: forming a patterned protective release layer comprising a polyamide composition on a first surface of the stone slab to obtain a surface-modified stone slab, wherein the polyamide composition comprises polyamide and an antioxidant, and the content of the polyamide is in a range of 85wt% to 99wt% based on 100wt% of the patterned protective release layer; a plurality of surface modified stone slabs are stacked, and a second surface of each surface modified stone slab opposite to the first surface overlaps a patterned protective release layer of an adjacent surface modified stone slab. The patterned protective release layer is endowed with pressure-resistant and wear-resistant characteristics through the polyamide composition, and the second surface of each surface-modified stone slab can be directly superposed with the patterned protective release layer of the adjacent surface-modified stone slab in the stone slab stacking method, so that the stone slab stacking method has the operation convenience.
Description
Technical Field
The present invention relates to a composition and a method for stacking slates, and more particularly to a polyamide composition and a method for stacking slates using the same.
Background
In order to avoid damage to the ground slates due to pressure, abrasion or impact during storage or during transportation after stacking of a plurality of ground slates, the conventional stone manufacturers have covered the smooth surface of each ground slate with a protective release layer of polyethylene over the entire surface, such that each ground slate is separated from the adjacent ground slate by the protective release layer of polyethylene. However, since the resistance to compression and abrasion of the protective release layer of polyethylene is not good, the protective release layer of polyethylene of the grinded stone slab is overlapped with the protective release layer of polyethylene of another grinded stone slab by a plate turnover machine during the stacking process.
Although the above method can reduce the damage of the polished stone slabs due to the pressure, friction or collision when the polished stone slabs are stacked, the method requires the use of a plate turnover machine, which results in a complicated process, and in addition, because the polyethylene protective release layer has poor pressure resistance and wear resistance, when the polyethylene protective release layer of another polished stone slab is stacked on the smooth surface of the polished stone slabs, the polyethylene protective release layer is more easily adhered to the polished stone slabs due to pressure, and thus the polyethylene protective release layer is not easily torn off from the polished stone slabs when the polyethylene protective release layer is separated, which results in a long separation time.
Disclosure of Invention
Therefore, a first object of the present invention is to provide a method for stacking stone slabs.
Thus, the method for stacking stone slabs according to the invention comprises: forming a patterned protective release layer comprising a polyamide composition on a first surface of the stone slab to obtain a surface-modified stone slab, wherein the polyamide composition comprises polyamide and an antioxidant, and the content of the polyamide is in a range of 85wt% to 99wt% based on 100wt% of the patterned protective release layer; a plurality of surface modified stone slabs are stacked, and a second surface of each surface modified stone slab opposite the first surface overlaps a patterned protective release layer of an adjacent surface modified stone slab.
In the method of stacking slate according to the present invention, the polyamide is selected from polycaprolactam, polyhexamethylene adipamide, decamethylene sebacamide, polyhexamethylene dodecanoamide, polyundecanolactam, polydodecanoamide, polytetramethylene adipamide, polyhexamethylene terephthalamide, polynaphthalene terephthalamide, polytrimethyl-hexamethylene terephthalamide, polyparaphenylene terephthalamide, or any combination thereof.
In the method for stacking stone slabs according to the present invention, the antioxidant is selected from aromatic amine antioxidants, phenolic antioxidants, p-benzoquinone, o-benzoquinone, acetylsalicylic acid, or a combination of any of the above.
In the method for stacking slate according to the present invention, the aromatic amine antioxidant is selected from aniline, o-toluidine, 2,4,6-trimethylaniline, methoxyaniline, m-aminobenzotrifluoride, N-methylaniline, or any combination thereof.
In the method for stacking slate according to the present invention, the phenolic antioxidant is selected from the group consisting of benzenediol, benzenetriol, nitrophenol, trinitrophenol, tribromophenol, pentachlorophenol, cresol, 5-methyl-2- (1-methylethyl) phenol, 2-hydroxybenzoic acid, naphthol, allitol, phenolphthalein, or a combination of any of the above.
In the method for stacking stone slabs according to the present invention, the polyamide composition further comprises an anti-sticking agent.
In the method for stacking stone slabs of the present invention, the anti-sticking agent is a siloxane anti-sticking agent.
In the method for stacking stone slabs according to the present invention, the silicone-based anti-stick agent is selected from the group consisting of polydimethylsiloxane, cyclopentasiloxane, dimethiconol, phenyltrimethicone, amino-terminated polydimethylsiloxane, cyclomethicone, and any combination thereof.
In the method for stacking stone slabs, the antioxidant is included in an amount ranging from 1wt% to 15wt% based on 100wt% of the total amount of the patterned protective release layer.
In the method for stacking stone slabs, the content of the anti-sticking agent ranges from more than 0wt% to 5wt% based on 100wt% of the total amount of the patterned protective release layer.
In the method for stacking stone slabs, the patterned protective release layer has a plurality of protective release pieces respectively disposed at a plurality of corners of the first surface of the stone slab.
In the method for stacking stone slabs, the patterned protective release layer has a plurality of protective release pieces arranged on the first surface of the stone slab and matched with the stone slab in a matrix arrangement.
In the method for stacking stone slabs, the patterned protective release layer has a plurality of protective release pieces arranged on the first surface of the stone slab and matched with the protective release pieces in a zigzag arrangement.
The second object of the present invention is to provide a polyamide composition.
The polyamide composition of the present invention comprises: polyamide and an antioxidant, and the content of the polyamide ranges from 85wt% to 99wt% based on 100wt% of the total amount of the polyamide composition.
The invention has the following effects: the polyamide composition endows the patterned protective release layer with pressure-resistant and wear-resistant characteristics, so that in the stone slab stacking method, the second surface of each surface-modified stone slab can be directly superposed with the patterned protective release layer of the adjacent surface-modified stone slab without a process of turning any grinded stone slab to superpose the polyethylene protective release layer and the polyethylene protective release layer, which is required in the prior art, and therefore, the stone slab stacking method has the advantage of convenient operation. Moreover, because the patterned protective release layer has the characteristics of pressure resistance and wear resistance, the patterned protective release layer does not need to completely cover the first surface of the stone, and therefore, compared with the conventional comprehensive polyethylene protective release layer, the stone slab stacking method provided by the invention has the advantages that the usage amount of the protective release layer can be reduced, and the cost is low. In addition, compared with the time for separating the prior comprehensive polyethylene protective release layer and the generated waste amount, the method for stacking the stone slabs has the advantages of short separation time, small waste amount and environmental protection.
Drawings
Other features and effects of the present invention will be apparent from the embodiments with reference to the accompanying drawings:
FIG. 1 is a top view illustrating a patterned protective release layer in a method for stacking slates according to the present invention;
FIG. 2 is a top view illustrating a patterned protective release layer in the method for stacking stone slabs according to the present invention;
FIG. 3 is a top view illustrating a patterned protective release layer in the method for stacking stone slabs according to the present invention;
FIG. 4 is a schematic view illustrating a method of stacking slates of the present invention; and
FIG. 5 is a schematic view illustrating a method for stacking slates of the present invention.
Detailed Description
The present invention will be described in detail below.
The stone slab stacking method comprises the following steps: forming a patterned protective release layer containing a polyamide composition on a first surface of a stone slab to obtain a surface-modified stone slab, wherein the polyamide composition comprises polyamide and an antioxidant, and the content of the polyamide is 85wt% to 99wt% based on 100wt% of the patterned protective release layer; and (b) stacking a plurality of surface-modified stone slabs, wherein a second surface of each surface-modified stone slab, which is opposite to the first surface, is overlapped with the patterned protective release layer of the adjacent surface-modified stone slab.
< step (a) >
[ Stone plate ]
The stone slab is not particularly limited, and may be, for example, a granite slab or a marble slab.
[ patterned protective Release layer ]
The polyamide is used to impart good resistance to compression and abrasion resistance (abrasion resistance) to the patterned protective release layer, and the surface-modified stone slabs are not damaged by pressure, friction or collision when stacking the surface-modified stone slabs or during transportation or storage after stacking. The polyamide may be used singly or in combination of plural kinds, and the polyamide is exemplified by polycaprolactam, polyhexamethyleneadipamide, decamethylenesebacamide, polyhexamethylenesebacamide, polyhexamethylenedodecanodiamide, polyundecanolactam, polydodecanoamide, polytetramethyleneadipamide, polyhexamethyleneterephthalamide, polynaphthalenediamide, polytrimethylhexamethyleneterephthalamide, polyparaphenyleneterephthalamide, etc. In some embodiments of the invention, the polyamide is selected from polycaprolactam, polyhexamethylene adipamide, decamethylene sebacamide, polyhexamethylene dodecanoamide, polyundecanolactam, polydodecanoamide, polytetramethylene adipamide, polyhexamethylene terephthalamide, polynaphthalene terephthalamide, polytrimethyl-hexamethylene terephthalamide, polyparaphenylene terephthalamide, or combinations of any of the foregoing.
The antioxidant agent serves to extend the lifetime of the patterned protective release layer of each surface-modified stone slab to avoid that the patterned protective release layer reduces the protective capacity of the first surface of a stone slab of the surface-modified stone slab due to polyamide ageing during storage or during transport. The antioxidant may be used singly or in combination of plural kinds, and the antioxidant may be, for example, an aromatic amine-based antioxidant, a phenolic antioxidant, p-benzoquinone, o-benzoquinone, acetylsalicylic acid, or the like. In some embodiments of the present invention, the antioxidant is selected from an aromatic amine antioxidant, a phenolic antioxidant, p-benzoquinone, o-benzoquinone, acetylsalicylic acid, or a combination of any of the foregoing. Examples of the aromatic amine-based antioxidant include aniline, o-toluidine, 2,4,6-trimethylaniline, methoxyaniline, m-aminobenzotrifluoride, and N-methylaniline. In some embodiments of the invention, the aromatic amine antioxidant is selected from aniline, o-toluidine, 2,4,6-trimethylaniline, methoxyaniline, m-aminotrifluorotoluene, N-methylaniline, or combinations of any of the foregoing. Such as benzenediol, benzenetriol, mononitrophenol, trinitrophenol, tribromophenol, pentachlorophenol, cresol, 5-methyl-2- (1-methylethyl) phenol [5-methyl-2- (1-methylethyl) phenol ], 2-hydroxybenzoic acid, naphthol, anthralin (antralin), phenolphthalein, or the like. In some embodiments of the invention, the phenolic antioxidant is selected from the group consisting of benzenediol, benzenetriol, nitrophenol, trinitrophenol, tribromophenol, pentachlorophenol, cresol, 5-methyl-2- (1-methylethyl) phenol, 2-hydroxybenzoic acid, naphthol, anthralin, phenolphthalein, or a combination of any of the foregoing. In some embodiments of the present invention, the antioxidant is included in an amount ranging from 1wt% to 15wt%, based on 100wt% of the total amount of the patterned protective release layer.
In order to enable the patterned protective release layer to be more easily released from the surface-modified stone slab, the polyamide composition further comprises an anti-sticking agent. The anti-tackiness agent may be used singly or in combination of plural kinds, and the anti-tackiness agent is, for example, a silicone type anti-tackiness agent. In some embodiments of the invention, the anti-stick agent is a silicone based anti-stick agent. Such as polydimethylsiloxane, cyclopentasiloxane, dimethiconol, phenyltrimethicone, amino-terminated polydimethylsiloxane, cyclomethicone, or the like. In some embodiments of the invention, the silicone-based anti-stick agent is selected from the group consisting of polydimethylsiloxane, cyclopentasiloxane, dimethiconol, phenyltrimethicone, amino-terminated polydimethylsiloxane, cyclomethicone, and combinations of any of the foregoing. In some embodiments, the anti-sticking agent is present in an amount ranging from greater than 0wt% to 5wt%, based on 100wt% of the total amount of each patterned protective release layer.
The pattern design of the patterned protective release layer can be adjusted according to the hardness or the size of the stone slab. In some embodiments of the present invention, the patterned protection layer includes a plurality of protection release members disposed at intervals and cooperating to form a predetermined pattern. Such as a matrix pattern or a sawtooth pattern. Referring to fig. 1, in some embodiments of the invention, the patterned protective release layer 12 has a plurality of protective release members 121 respectively disposed at corners of the first surface 111 of the stone slab 11. Referring to fig. 2, in some embodiments of the present invention, the patterned protective release layer 12 has a plurality of protective release members 121 disposed on the first surface 111 of the stone slab 11 and disposed in a matrix. Referring to fig. 3, in some embodiments of the present invention, the patterned protective release layer 12 has a plurality of protective release members 121 disposed on the first surface 111 of the stone slab 11 and arranged in a zigzag manner.
The formation method of the patterned protective release layer is not particularly limited, and is, for example, formed by coating. The type of the polyamide composition is not particularly limited, such as particles.
< step (b) >
Referring to fig. 4 and 5, the plurality of surface-modified stone slabs 1 are sequentially conveyed one by one to a temporary storage area, and then each surface-modified stone slab 1 is hung and conveyed to a placement area by a hanging crown device 3 disposed in the temporary storage area, and a second surface 112 of each surface-modified stone slab 1 opposite to the first surface 111 is stacked on a support 4 toward a patterned protective release layer 12 of another surface-modified stone slab 1, so that each surface-modified stone slab 1 is separated from the adjacent surface-modified stone slab 1 by the patterned protective release layer 12. The support 4 is for example a pallet or an a-frame.
When the surface-modified stone slab 1 is moved from the placing area to a mounting area, such as a building construction site, for mounting, the patterned protective release layer of the surface-modified stone slab 1 must be removed, and then the stone slab 11 is mounted to a desired mounting location, so that it is also necessary to consider whether the patterned protective release layer 12 is easily peeled off from the stone slab 11 after the stacked surface-modified stone slabs 1 are pressed, and therefore, in the present invention, the patterned protective release layer 12 is not easily adhered to the surface-modified stone slab 1 by the pressure resistance of the polyamide or the combination of the polyamide and the anti-adhesive, so that the patterned protective release layer 12 still has the easy peeling property after the stacked surface-modified stone slab 1 is pressed, and therefore, the problem that the polyethylene protective release layer is easily adhered to the ground stone slab after the heavy pressing can be solved by using the patterned protective release layer 12 of the present invention.
The invention will be further described in the following examples, but it is to be understood that these examples are illustrative only and are not to be construed as limiting the practice of the invention.
Preparation example 1
99wt% of polyamide (weight average molecular weight: 15000 to 18000; component: polydecamediamide) and 1wt% of 4-methoxyaniline (as an antioxidant) were placed in a spray granulator and subjected to a melting treatment and granulation treatment at 180 ℃ for 4 hours to form a polyamide composition having an average weight of 1g in a plurality of granules.
Preparation example 2
A polyamide composition was prepared by placing 90wt% of polyamide (weight average molecular weight: 15000 to 18000; ingredient: polydecamediamide), 9wt% of 4-methoxyaniline (as an antioxidant), and 1wt% of polydimethylsiloxane (as an anti-tackiness agent) in a spray granulator, and subjecting the mixture to a melting treatment and granulation treatment at 180 ℃ for 4 hours to give a granular polyamide composition having an average weight of 1 g.
Preparation example 3
85.5wt% of polyamide (weight average molecular weight: 15000 to 18000; ingredient: polydecamediyl decamethylene diamine), 9.5wt% of 4-methoxyaniline (as an antioxidant), and 5wt% of polydimethylsiloxane (as an anti-sticking agent) were placed in a spray granulator and subjected to melt treatment and granulation treatment at 180 ℃ for 4 hours to give a granular polyamide composition having an average weight of 1 g.
Preparation example 4
88.58wt% of polyamide (weight average molecular weight: 15000 to 18000; component: polydecamediamide), 10.42wt% of 4-methoxyaniline (as an antioxidant), and 1wt% of polydimethylsiloxane (as an anti-sticking agent) were placed in a spray granulator and subjected to melt treatment and granulation treatment at 180 ℃ for 4 hours to form a granular polyamide composition having an average weight of 1 g.
Preparation example 5
85.27wt% of polyamide (weight average molecular weight: 15000 to 18000; component: polydecamediamide), 9.47wt% of 4-methoxyaniline (as an antioxidant), and 5.26wt% of polydimethylsiloxane (as an anti-sticking agent) were placed in a spray granulator and subjected to melt treatment and granulation treatment at 180 ℃ for 4 hours to form a granular polyamide composition having an average weight of 1 g.
Comparative preparation example 1
A polyethylene film having a length of 5.7 cm, a width of 5.7 cm, a thickness of 5.7 cm and a composition of polyethylene.
Comparative preparation example 2
A polyethylene film having a length of 5 cm, a width of 5 cm and a thickness of 2 cm and consisting of polyethylene.
< evaluation items >
And (3) compression resistance testing: the polyamide compositions of preparation examples 1 to 5 were formed into a test specimen having a length of 5.7 cm, a width of 5.7 cm and a thickness of 5.7 cm. According to the standard detection method of the compression test of the ASTM C170 (2000 edition), the compression strength of the sample to be tested and the polyethylene film of the comparative preparation example 1 is detected by matching with an oil pressure tester (brand name: MTS; model number: 810), and the load bearing speed of the oil pressure tester is 0.48mm/min.
And (3) wear resistance test: the polyamide compositions of preparation examples 1 to 5 were formed into a sample to be tested having a length of 5 cm, a width of 5 cm and a thickness of 2 cm. According to a standard detection method of a pedal abrasion resistance test of the stone material of CNS 11320A3227 (2000 edition), and a wear-resistant test device (brand: weLai; model: ST-002), the pedal abrasion resistance values of the sample to be tested and the polyethylene film of the comparative preparation example 2 were detected.
And (3) aging test: the polyamide compositions of preparation examples 1 to 5 were formed into a test specimen having a length of 5.7 cm, a width of 5.7 cm and a thickness of 5.7 cm. According to ISO 4892-2:2013 and a weather-proof tester (brand name: Q-LAB; model: QUV) is matched to carry out aging treatment on the sample to be tested and the polyethylene film of the comparative preparation example 1 to form an aged sample to be tested and an aged polyethylene film, then the compression strength of the aged sample to be tested and the aged polyethylene film is tested according to the standard test method of the compression test of the rigid plastic material of ASTM C170 (2000 edition) and a hydraulic tester is matched to test the compression strength of the aged sample to be tested and the aged polyethylene film, and the load bearing rate of the hydraulic tester is 0.48mm/min.
Peeling test: the polyamide compositions of preparation examples 1 to 5 were coated on a granite plate and formed into a sample to be measured having an area of 20cm × 20cm and a thickness of 2mm, and the polyethylene films of comparative preparation examples 1 and 2 were disposed on a granite plate and a weight of 20 kg was disposed on the sample to be measured and the polyethylene film, followed by leaving for one week, then, the weight was removed, and the sample to be measured and the polyethylene film were directly peeled off by hand and observed with naked eyes for the presence or absence of residue. Evaluation criteria: the circle indicates complete peeling, and X indicates residue.
TABLE 1
As is clear from the experimental data in table 1, the polyamide composition of the present invention has excellent pressure resistance and wear resistance.
Example 1
The polyamide composition of preparation example 1 was placed in a spray coating device of an automatic spray coater, and a first surface of a granite slab having an area of 2m × 3 m, a thickness of 3 cm and a hardness of 7, which was placed on a carrier table of a carrier conveyor of the automatic spray coater, was subjected to surface coating treatment, and a patterned protective release layer having a plurality of strip-shaped protective release members, which were arranged in a zigzag pattern in a matched manner, and having an area of 5 mm × 15 cm and a thickness of 3 mm, was formed on the first surface of the granite slab.
Referring to fig. 4, the plurality of surface-modified stone slabs 1 are conveyed to a temporary storage area by the carrying and conveying device, and then each surface-modified stone slab 1 is hung and conveyed to a placement area by a hanging crane device 3 disposed in the temporary storage area, and a second surface 112 of each surface-modified stone slab 1 opposite to the first surface 111 is obliquely and abuttingly stacked on an a-type frame toward a patterned protective release layer 12 of another surface-modified stone slab 1, so that each surface-modified stone slab 1 is separated from the adjacent surface-modified stone slab 1 by the patterned protective release layer 12.
Example 2
Placing the polyamide composition prepared in preparation example 2 in a spraying device of an automatic spraying machine, and performing surface coating treatment on a first surface of a granite slab with the area of 2m × 3 m, the thickness of 3 cm and the hardness of 7, which is arranged on a bearing table of a bearing and conveying device of the automatic spraying machine, so as to form a patterned protective release layer on the first surface of the granite slab, thereby preparing a surface-modified stone slab, wherein the patterned protective release layer is provided with a plurality of strip-shaped protective release pieces which are matched and arranged in a matrix manner, have the areas of 5 mm × 15 cm and the thicknesses of 3 mm.
Referring to fig. 5, the plurality of surface-modified stone slabs 1 are conveyed to a temporary storage area by the carrying and conveying device, and then each surface-modified stone slab 1 is hung and conveyed to a placement area by a hanging crane device 3 disposed in the temporary storage area, and a second surface 112 of each surface-modified stone slab 1 opposite to the first surface 111 is obliquely and abuttingly stacked on an a-type frame toward a patterned protective release layer 12 of another surface-modified stone slab 1, so that each surface-modified stone slab 1 is separated from the adjacent surface-modified stone slab 1 by the patterned protective release layer 12.
Example 3
The procedure for the preparation of said example 3 is substantially the same as that of said example 2, the differences being mainly: in the above example 3, the polyamide composition of preparation example 3 was used.
Example 4
The procedure for the preparation of said example 4 is substantially the same as that of said example 2, the differences being mainly: in the above example 4, the polyamide composition of preparation example 4 was used.
Example 5
The procedure for the preparation of said example 5 is substantially the same as that of said example 2, the differences being essentially: in example 5, the polyamide composition of preparation example 5 was used.
In summary, the polyamide composition endows the patterned protective release layer with pressure-resistant and wear-resistant properties, in the method for stacking stone slabs of the present invention, the second surface of each surface-modified stone slab can be directly stacked with the patterned protective release layer of the adjacent surface-modified stone slab, without the need of a process of turning over any surface-modified stone slab to stack the protective release layer and the protective release layer together, as in the prior art, and thus, the method for stacking stone slabs of the present invention has convenient operation. Moreover, because the patterned protective release layer has the characteristics of pressure resistance and wear resistance, the patterned protective release layer does not need to completely cover the first surface of the stone, so that compared with the traditional comprehensive protective release layer, the stone slab stacking method provided by the invention can reduce the usage amount of the protective release layer, and has the advantage of low cost. In addition, compared with the conventional separation time and the waste amount of the protective release layer, the separation time and the waste amount of the stone plate stacking method are short, the waste amount is small, and the stone plate stacking method has the advantage of environmental protection, so the aim of the invention can be really achieved.
It should be understood that the above description is only exemplary of the present invention, and that the scope of the present invention should not be limited thereby, and that the invention is intended to cover all modifications and equivalents of the claims and their equivalents.
Claims (14)
1. A method of stacking stone slabs, characterized by: comprises the following steps:
forming a patterned protective release layer comprising a polyamide composition on a first surface of the stone slab to obtain a surface-modified stone slab, wherein the polyamide composition comprises polyamide and an antioxidant, and the content of the polyamide is in a range of 85wt% to 99wt% based on 100wt% of the patterned protective release layer; and a process for the preparation of a coating,
a plurality of surface modified stone slabs are stacked, and a second surface of each surface modified stone slab opposite to the first surface overlaps a patterned protective release layer of an adjacent surface modified stone slab.
2. A method of stacking stone slabs according to claim 1, wherein: the polyamide is selected from polycaprolactam, polyhexamethyleneadipamide, decamethylenesebacamide, polyhexamethylenesebacamide, polyhexamethylenedodecanoamide, polyundecanolactam, polydodecanoamide, polytetramethyleneadipamide, polyhexamethyleneterephthalamide, polynaphthylenenonanediamide, polytrimethylhexamethyleneterephthalamide, polyparaphenyleneterephthalamide, or any combination thereof.
3. A method of stacking stone slabs according to claim 1, wherein: the antioxidant is selected from aromatic amine antioxidants, phenolic antioxidants, p-benzoquinone, o-benzoquinone, acetylsalicylic acid, or any combination thereof.
4. A method of stacking stone slabs according to claim 3, wherein: the aromatic amine antioxidant is selected from aniline, o-toluidine, 2,4,6-trimethylaniline, methoxyaniline, m-amino trifluorotoluene, N-methylaniline, or any combination thereof.
5. A method of stacking stone slabs according to claim 3, wherein: the phenolic antioxidant is selected from benzenediol, benzenetriol, nitrophenol, trinitrophenol, tribromophenol, pentachlorophenol, cresol, 5-methyl-2- (1-methylethyl) phenol, 2-hydroxybenzoic acid, naphthol, allitol, phenolphthalein, or any combination thereof.
6. A method of stacking stone slabs according to claim 1, wherein: the polyamide composition further comprises an anti-sticking agent.
7. A method of stacking stone slabs according to claim 6, wherein: the anti-adhesion agent is a siloxane anti-adhesion agent.
8. A method of stacking stone slabs according to claim 7, wherein: the silicone based anti-stick agent is selected from the group consisting of polydimethylsiloxane, cyclopentasiloxane, dimethiconol, phenyl trimethicone, amino terminated polydimethylsiloxane, cyclomethicone, or a combination of any of the foregoing.
9. A method of stacking stone slabs according to claim 1, wherein: the antioxidant is contained in an amount ranging from 1wt% to 15wt%, based on 100wt% of the total amount of the patterned protective release layer.
10. A method of stacking stone slabs according to claim 6, wherein: the content range of the anti-sticking agent is more than 0wt% to 5wt% based on 100wt% of the total amount of the patterned protective release layer.
11. A method of stacking stone slabs according to claim 1, wherein: the patterned protective release layer is provided with a plurality of protective release pieces which are respectively arranged at a plurality of corners of the first surface of the stone plate.
12. A method of stacking stone slabs according to claim 1, wherein: the patterned protective release layer is provided with a plurality of protective release pieces which are arranged on the first surface of the stone slab and are matched with each other to form a matrix arrangement.
13. A method of stacking stone slabs according to claim 1, wherein: the patterned protective release layer is provided with a plurality of protective release pieces which are arranged on the first surface of the stone slab and are matched with each other in a zigzag arrangement.
14. A polyamide composition characterized by: comprises the following steps: polyamide and an antioxidant, and the content of the polyamide ranges from 85wt% to 99wt% based on 100wt% of the total amount of the polyamide composition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110539705.0A CN115368165A (en) | 2021-05-18 | 2021-05-18 | Polyamide composition and method for stacking stone slabs |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110539705.0A CN115368165A (en) | 2021-05-18 | 2021-05-18 | Polyamide composition and method for stacking stone slabs |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115368165A true CN115368165A (en) | 2022-11-22 |
Family
ID=84058301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110539705.0A Pending CN115368165A (en) | 2021-05-18 | 2021-05-18 | Polyamide composition and method for stacking stone slabs |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115368165A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0822163A2 (en) * | 1996-08-02 | 1998-02-04 | Amcol International Corporation | Exfoliated layered materials and nanocompositions comprising said exfoliated layered materials having water-insoluble oligomers or polymers adhered thereto |
| CN101362923A (en) * | 2008-09-12 | 2009-02-11 | 上海开林造漆厂 | Resistance-reducing and wear-resisting coatings on concrete substrate |
| WO2016182145A1 (en) * | 2015-05-08 | 2016-11-17 | 주식회사 영우티피 | Environmentally friendly resin composition for outer layer of decoration tile, and decoration tile comprising same |
| CN106147595A (en) * | 2015-05-11 | 2016-11-23 | 九州高科技株式会社 | A kind of coating, the non-maintaining type stone brick being coated with coating and the manufacture method of stone brick |
| CN110099964A (en) * | 2016-12-22 | 2019-08-06 | 株式会社普利司通 | Amilan polyamide resin composition for hose and the hose using Amilan polyamide resin composition |
| CN112203853A (en) * | 2018-10-26 | 2021-01-08 | 株式会社Lg化学 | Cover window for flexible display device and flexible display device |
-
2021
- 2021-05-18 CN CN202110539705.0A patent/CN115368165A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0822163A2 (en) * | 1996-08-02 | 1998-02-04 | Amcol International Corporation | Exfoliated layered materials and nanocompositions comprising said exfoliated layered materials having water-insoluble oligomers or polymers adhered thereto |
| CN101362923A (en) * | 2008-09-12 | 2009-02-11 | 上海开林造漆厂 | Resistance-reducing and wear-resisting coatings on concrete substrate |
| WO2016182145A1 (en) * | 2015-05-08 | 2016-11-17 | 주식회사 영우티피 | Environmentally friendly resin composition for outer layer of decoration tile, and decoration tile comprising same |
| CN106147595A (en) * | 2015-05-11 | 2016-11-23 | 九州高科技株式会社 | A kind of coating, the non-maintaining type stone brick being coated with coating and the manufacture method of stone brick |
| CN110099964A (en) * | 2016-12-22 | 2019-08-06 | 株式会社普利司通 | Amilan polyamide resin composition for hose and the hose using Amilan polyamide resin composition |
| CN112203853A (en) * | 2018-10-26 | 2021-01-08 | 株式会社Lg化学 | Cover window for flexible display device and flexible display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101195734B (en) | Removable pressure-sensitive adhesive composition and pressure-sensitive adhesive tape or sheet | |
| EP1037953B1 (en) | Slip resistant articles | |
| CN1256234C (en) | Crosslinked pressure sensitive adhesive compositions, and adhesive articles based thereon, useful in high temp. applications | |
| KR101297315B1 (en) | Adhesive agent, adhesive sheet, and process for production of electronic component | |
| EP1458617B1 (en) | Plastic shipping and storage containers and composition and method therefor | |
| CN1145202C (en) | Surface protective sheet for chip back grinding and its application method | |
| CN102559106B (en) | Radiation curable binder composition and adhesive sheet | |
| CN101381587A (en) | Pressure-sensitive adhesive sheet for dicing and dicing method | |
| CN1078280A (en) | Conformable pavement marking tape | |
| SI9200321A (en) | Filled cured compositions for the preparation of thermoplastic products | |
| KR101324000B1 (en) | Releasable resin composition, molded object thereof, and layered product | |
| KR101908936B1 (en) | Adhesive sheet | |
| CN115368165A (en) | Polyamide composition and method for stacking stone slabs | |
| CN1796528B (en) | Cleaning sheet and process for cleaning substrate treatment device | |
| KR101522195B1 (en) | Resin composition for non-slip paving material and paved layer formed by usning the same | |
| CN1176757C (en) | Phenolic coated refractory aggregates | |
| CN107210205B (en) | Composite sheet for forming resin film, and method for producing chip with resin film | |
| KR101333626B1 (en) | Adhesive sheet and method for grinding back surface of semiconductor wafer | |
| CN1290927C (en) | Water solution treatment process of polyurethane elastomer to make plastic track | |
| CN1746249A (en) | Adhesive tape and mounting method for image sensor therewith | |
| TW202242045A (en) | Polyamide composition and slate stacking method allowing a surface-modified slate to be directly stacked with a patterned protective release layer of an adjacent surface-modified slate | |
| CN110178203B (en) | Dicing film substrate and dicing film | |
| WO2000059720A3 (en) | High temperature release films | |
| EP1193744A1 (en) | Reinforcement material for silicon wafer and method of manufacturing ic chip using the reinforcement material | |
| CN104231961A (en) | Cutting/chip bonding film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20221122 |
|
| WD01 | Invention patent application deemed withdrawn after publication |