CN115361513A - Single-electron reading circuit and method based on composite dielectric grid photosensitive detector - Google Patents
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Abstract
本发明公开了一种基于复合介质栅光敏探测器的单电子读出电路及方法。其光敏探测器包括形成在同一衬底上的感光晶体管和读取晶体管,这两个晶体管共用一个复合介质栅,复合介质栅包括底层介质层、电荷耦合层、顶层介质层和控制栅。该读出电路包括相关双采样电路、放大电路和量化电路,相关双采样电路用于对读取晶体管的漏极电流采样,放大电路用于对相关双采样电路输出的电压信号进行放大,量化电路用于对放大电路输出的电压信号进行单比特量化。本发明基于复合介质栅光敏探测器提供一种低噪声、高增益、高帧率的读出电路及其方法,能够实现单电子级别的读出,解决了对高分辨低照度场景的高性能成像问题。
The invention discloses a single electron readout circuit and method based on a composite dielectric grid photosensitive detector. Its photosensitive detector includes a photosensitive transistor and a readout transistor formed on the same substrate. These two transistors share a composite dielectric gate. The composite dielectric gate includes a bottom dielectric layer, a charge coupling layer, a top dielectric layer and a control gate. The readout circuit includes a correlated double sampling circuit, an amplifying circuit and a quantization circuit. The correlated double sampling circuit is used to sample the drain current of the read transistor, and the amplifying circuit is used to amplify the voltage signal output by the correlated double sampling circuit. The quantized circuit It is used for single-bit quantization of the voltage signal output by the amplifier circuit. The present invention provides a low-noise, high-gain, high-frame-rate readout circuit and method based on a composite dielectric grating photosensitive detector, which can realize single-electron level readout and solve high-performance imaging for high-resolution low-illuminance scenes question.
Description
技术领域technical field
本发明涉及光敏探测器阵列的读出方式,尤其是一种基于复合介质栅光敏探测器的单电子级别的低噪声、高增益、高帧率的读出电路及其方法。The invention relates to a readout method of a photosensitive detector array, in particular to a single-electron-level low-noise, high-gain, high-frame-rate readout circuit and method based on a composite dielectric grid photosensitive detector.
背景技术Background technique
光敏探测器在日常生活中以及国防安全领域中都发挥着极其重要的作用,目前主流的光敏探测器分为CCD和CMOS-APS两大类,并且随着CMOS工艺的发展,CMOS-APS占据了市场绝大部分份额,但随着像素尺寸越来越小,CMOS-APS的灵敏度和满阱容量越来越低,导致信噪比大幅降低,动态范围低,成像质量差的问题。Photosensitive detectors play an extremely important role in daily life and in the field of national defense and security. At present, the mainstream photosensitive detectors are divided into two categories: CCD and CMOS-APS. With the development of CMOS technology, CMOS-APS occupies The vast majority of the market share, but as the pixel size becomes smaller and smaller, the sensitivity and full well capacity of CMOS-APS are getting lower and lower, resulting in a significant decrease in signal-to-noise ratio, low dynamic range, and poor imaging quality.
为了解决小像素信噪比低的问题,基于复合介质栅的光敏探测器在小像素尺寸下通过扩大满阱容量提高了信噪比。由于普通基于复合介质栅的光敏探测器为了探测大的满阱信号量,不会需求高灵敏度,因此对于极低照度下的光敏探测需要较长的曝光时间,从而容易导致暗电流积累过大,淹没信号。In order to solve the problem of low signal-to-noise ratio of small pixels, the photosensitive detector based on composite dielectric gate improves the signal-to-noise ratio by expanding the full well capacity under small pixel size. Since ordinary photosensitive detectors based on composite dielectric grids do not require high sensitivity in order to detect large full-well signal quantities, a longer exposure time is required for photosensitive detection under extremely low illumination, which easily leads to excessive dark current accumulation. drown out the signal.
发明内容Contents of the invention
鉴于现有的光敏探测器都无法满足对极低照度下的成像需求,特别是在要求高分辨率的场景下,因此为了解决对高分辨低照度场景的高性能成像问题,本发明基于复合介质栅光敏探测器提供一种低噪声、高增益、高帧率的读出电路及其方法,能够实现单电子级别的读出。In view of the fact that none of the existing photosensitive detectors can meet the imaging requirements under extremely low illumination, especially in scenes requiring high resolution, in order to solve the problem of high-performance imaging for high-resolution low-illuminance scenes, the present invention is based on composite media The grid photosensitive detector provides a low-noise, high-gain, high-frame-rate readout circuit and method thereof, which can realize single-electron level readout.
本发明采用的技术方案如下:The technical scheme that the present invention adopts is as follows:
基于复合介质栅光敏探测器的单电子读出电路,其光敏探测器包括形成在同一衬底上的感光晶体管和读取晶体管,这两个晶体管共用一个复合介质栅,所述复合介质栅包括底层介质层、电荷耦合层、顶层介质层和控制栅;所述读出电路包括相关双采样电路、放大电路和量化电路,所述相关双采样电路用于对读取晶体管的漏极电流采样,所述放大电路用于对相关双采样电路输出的电压信号进行放大,所述量化电路用于对放大电路输出的电压信号进行单比特量化。A single-electron readout circuit based on a composite dielectric gate photodetector. The photosensitive detector includes a photosensitive transistor and a read transistor formed on the same substrate. These two transistors share a composite dielectric gate. The composite dielectric gate includes a bottom layer dielectric layer, charge coupling layer, top dielectric layer and control gate; the readout circuit includes a correlated double sampling circuit, an amplification circuit and a quantization circuit, and the correlated double sampling circuit is used for sampling the drain current of the read transistor, so The amplifying circuit is used to amplify the voltage signal output by the correlated double sampling circuit, and the quantization circuit is used to perform single-bit quantization on the voltage signal output by the amplifying circuit.
进一步地,所述顶层介质层的厚度大于10nm,且所述复合介质栅的尺寸小于500nm。Further, the thickness of the top dielectric layer is greater than 10 nm, and the size of the composite dielectric gate is less than 500 nm.
进一步地,所述放大电路采用电荷转移放大电路。Further, the amplifying circuit adopts a charge transfer amplifying circuit.
进一步地,所述量化电路采用单比特ADC或D-latch电路。Further, the quantization circuit adopts a single-bit ADC or a D-latch circuit.
进一步地,当所述光敏探测器为多个形成阵列结构时,所述阵列结构分为多个子阵列,每个子阵列共用一个所述读出电路。Further, when multiple photosensitive detectors form an array structure, the array structure is divided into multiple sub-arrays, and each sub-array shares one readout circuit.
本发明还提供一种上述基于复合介质栅光敏探测器的单电子读出电路的读出方法,包括如下步骤:The present invention also provides a readout method of the above-mentioned single electron readout circuit based on the composite dielectric grating photosensitive detector, comprising the following steps:
(1)复位:在控制栅加-4V的电压,在衬底加-3V的电压,将光敏探测器的感光晶体管收集的电子进行复位,并由相关双采样电路读取复位信号;(1) Reset: add a voltage of -4V to the control gate, and add a voltage of -3V to the substrate to reset the electrons collected by the photosensitive transistor of the photosensitive detector, and read the reset signal by the relevant double sampling circuit;
(2)曝光:在控制栅加0V的电压,在衬底加-3V的电压,当有光照时,光电子的能量大于硅的禁带宽度时,将激发出一个电子空穴对,在耗尽区的电场作用下,感光晶体管收集产生的光电子,感光晶体管的电势将发生改变,并耦合到复合介质栅的电荷耦合层改变电荷耦合层的电势,从而改变开启读取晶体管的阈值电压,阈值电压变化量为U=Q/C,其中Q为收集的光电子的电荷量,C为顶层介质栅的电容;由相关双采样电路读取曝光信号;(2) Exposure: Add a voltage of 0V to the control gate and a voltage of -3V to the substrate. When there is light, when the energy of photoelectrons is greater than the forbidden band width of silicon, an electron-hole pair will be excited. Under the action of the electric field in the region, the phototransistor collects the generated photoelectrons, the potential of the phototransistor will change, and the charge coupling layer coupled to the composite dielectric gate changes the potential of the charge coupling layer, thereby changing the threshold voltage for turning on the read transistor, the threshold voltage The amount of change is U=Q/C, where Q is the amount of charge of the collected photoelectrons, and C is the capacitance of the top dielectric grid; the exposure signal is read by the relevant double sampling circuit;
(3)读取:在读出阶段时,控制栅加2~5V的电压,衬底加-3~0V的电压,这两者的电压需满足光敏探测器的读取晶体管在空阱和满阱下都处于线性区;读取晶体管的漏极给恒定电压,源极给恒定电压0V,由相关双采样电路读出漏极电流。(3) Reading: In the reading stage, the control grid is applied with a voltage of 2 to 5V, and the substrate is applied with a voltage of -3 to 0V. The wells are all in the linear region; the drain of the read transistor is given a constant voltage, the source is given a constant voltage of 0V, and the drain current is read out by the relevant double sampling circuit.
进一步地,所述相关双采样电路在光敏探测器复位后,通过复位信号采样电容对漏极电流进行采样,输出复位信号的电压信号VOUTR;在光敏探测器曝光后,通过曝光信号采样电容对漏极电流进行采样,输出曝光信号的电压信号VOUTS,两个电压信号的差值VOUTS-VOUTR即为由曝光后收集的光电子所对应的信号量。Further, after the photosensitive detector is reset, the correlated double sampling circuit samples the drain current through the reset signal sampling capacitor, and outputs the voltage signal VOUTR of the reset signal; after the photosensitive detector is exposed, the drain current is sampled through the exposure signal sampling capacitor The electrode current is sampled, and the voltage signal VOUTS of the exposure signal is output. The difference between the two voltage signals VOUTS-VOUTR is the signal amount corresponding to the photoelectrons collected after exposure.
本发明的探测器在器件级实现了高增益,使得信号传递链路整体的信噪比提升,有利于成像质量的提高。由于在低照度的成像环境,或者极高帧率的成像条件下,光敏探测器的信号收集量远低于满阱容量,因此电荷到电压的高增益输出满足模拟电路的动态范围,降低了电路设计的难度。在后级电路中,本发明采用相关双采样电路减小复位噪声、散粒噪声等,进一步提高了信噪比;放大电路采用电荷转移放大电路,与传统运算放大器的结构相比,不需要持续的有源输入,因此在功耗上有极大的优势;而在1bit量化需求中,对不同阵列的读出电路中放大电路的放大精度的要求低,因此可以充分发挥电荷转移放大电路的优势,在量化电路中,针对低照度或极高帧率需求,仅需1bit量化即可,因此可以采用单比特ADC或D-latch进行高帧率量化。经此从器件到读出电路的优化,较传统的基于复合介质栅的光敏探测器所采用的斜坡电压扫描器件阈值的读出方式相比,本发明的电路读出方法使得噪声低于0.2e-,仅为传统方案的2%;电荷到电压的转换增益达到1mv/e-,为传统方案的4倍;帧率可达1000fps,而传统方案仅为3fps。The detector of the present invention realizes high gain at the device level, so that the overall signal-to-noise ratio of the signal transmission link is improved, which is beneficial to the improvement of imaging quality. Since the signal collection capacity of the photosensitive detector is far below the full well capacity in low-illuminance imaging environments or extremely high frame rate imaging conditions, the high-gain output from charge to voltage satisfies the dynamic range of analog circuits, reducing circuit Difficulty of design. In the post-stage circuit, the present invention adopts correlated double sampling circuit to reduce reset noise, shot noise, etc., and further improves the signal-to-noise ratio; Active input, so there is a great advantage in power consumption; and in the 1bit quantization requirements, the requirements for the amplification accuracy of the amplifier circuit in the readout circuit of different arrays are low, so the advantages of the charge transfer amplifier circuit can be fully utilized , in the quantization circuit, only 1-bit quantization is required for low illumination or extremely high frame rate requirements, so single-bit ADC or D-latch can be used for high frame rate quantization. Through the optimization from the device to the readout circuit, compared with the readout mode of the slope voltage scanning device threshold adopted by the traditional photosensitive detector based on the composite dielectric gate, the circuit readout method of the present invention makes the noise lower than 0.2e -, only 2% of the traditional solution; the charge-to-voltage conversion gain reaches 1mv/e-, which is 4 times that of the traditional solution; the frame rate can reach 1000fps, while the traditional solution is only 3fps.
附图说明Description of drawings
图1为本发明实施例中基于复合介质栅光敏探测器的结构示意图;FIG. 1 is a schematic structural diagram of a photosensitive detector based on a composite dielectric grating in an embodiment of the present invention;
图2为复合介质栅光敏探测器读取晶体管的结构示意图;Fig. 2 is a structural schematic diagram of a reading transistor of a composite dielectric gate photosensitive detector;
图3为一个m×n的像素子阵列共用一个读出电路的结构示意图;FIG. 3 is a schematic structural diagram of an m×n pixel sub-array sharing a readout circuit;
图4为读出电路的模块示意图;Fig. 4 is the module schematic diagram of readout circuit;
图5为相关双采样电路的结构示意图;Fig. 5 is a schematic structural diagram of a correlated double sampling circuit;
图6为电荷转移放大电路的结构示意图;6 is a schematic structural diagram of a charge transfer amplifier circuit;
图7为D-latch的结构示意图;Figure 7 is a schematic diagram of the structure of D-latch;
图8为一个m×n的光敏传感器子阵列与一个读出电路的模块示意图;Fig. 8 is a module schematic diagram of an m * n photosensitive sensor sub-array and a readout circuit;
图9为一个M×N的光敏传感器阵列与(M/n)×(N/n)个读出电路集成的结构示意图。FIG. 9 is a structural schematic diagram of an M×N photosensitive sensor array integrated with (M/n)×(N/n) readout circuits.
具体实施方式Detailed ways
本实施例利用如图1所示的基于复合介质栅的光敏探测器,其结构为:包括形成在同一P型半导体衬底上方的感光晶体管101和读取晶体管103两部分,这两部分共用一个复合介质栅,其中复合介质栅由下到上依次包括底层介质层107、电荷耦合层106、顶层介质层104和控制栅105。其中,感光晶体管101用来感光将光信号转换为电信号,读取晶体管103用来读取电信号。读取晶体管103的结构如图2所示,还包括漏极201和源极202。This embodiment utilizes a photosensitive detector based on a composite dielectric gate as shown in Figure 1, and its structure is: it includes two parts: a
根据电容公式:C=εrS/4πkd,其中C为电容,εr为介电常数,S为两电极板之间的正对面积,k为库仑常数,d为电容极板的距离。若复合介质栅的面积做小,厚度做大,从而可以获得一个小的复合介质栅电容,根据公式C=Q/U,其中C为电容,Q为电荷量,U为电压,此时一个电荷量可以转化为更大的电压量,从而提高光敏探测器的灵敏度。因此,可以通过增加顶层介质层104厚度以及减小复合介质栅的尺寸,来减小复合介质栅的电容从而提高灵敏度,如增加顶层介质层104厚度大于10nm,且减小复合介质栅的尺寸小于500nm,可以使得复合介质栅的电容小于0.15fF,该条件下电荷到电压的转换增益,即灵敏度,可以大于1mV/e-。According to the capacitance formula: C=ε r S/4πkd, where C is the capacitance, ε r is the dielectric constant, S is the facing area between the two electrode plates, k is the Coulomb constant, and d is the distance between the capacitor plates. If the area of the composite dielectric gate is small and the thickness is large, a small composite dielectric gate capacitance can be obtained. According to the formula C=Q/U, where C is the capacitance, Q is the amount of charge, and U is the voltage. At this time, a charge The amount can be converted into a larger voltage amount, thereby increasing the sensitivity of the photodetector. Therefore, the capacitance of the composite dielectric grid can be reduced to improve sensitivity by increasing the thickness of the top
光敏探测器的感光晶体管101用来将光信号转换为光电子,二者呈现线性关系,衬底102所产生的光电子耦合到电荷耦合层106,通过电容转换为电压,从而改变读取晶体管103的阈值电压。给定固定栅压时,漏极201电流会因阈值电压的不同而不同,采集电流信号即可计算光敏探测器的灰度值。对于大阵列光敏探测器,将大阵列光敏探测器分为多个子阵列,每个子阵列共用一个读出电路(如图3所示),即可并行读出光敏探测器阵列,实现高帧率。The
曝光过程中感光晶体管101收集的光电子在硅和二氧化硅界面处耦合到复合介质栅的电荷耦合层106,改变复合介质栅的电荷耦合层106的电势,从而改变读取晶体管103的阈值电压,在信号读取过程中,控制栅105加正偏压脉冲,漏极201电流的大小会随着阈值电压的改变而改变,从而判断是否收集光电子。During the exposure process, the photoelectrons collected by the
本实施例的读出电路如图4所示,包括相关双采样电路401、放大电路402和量化电路403。在相关双采样电路401的采样过程中,需要先对信号采样电容501和复位信号采样电容502进行复位,并分别读取光敏探测器在复位后的漏极201电流IR以及在曝光后的漏极201电流IS,给复位信号采样电容502和信号采样电容501充电,二者的电压差值即为收集的光电子产生的信号量。在放大电路402中,采用电荷转移放大电路,具有低功耗的优势,可以降低大规模光敏探测器阵列的整体功耗。在量化电路403中,对放大电路402的输出信号进行单比特量化,可以采用单比特ADC或D-latch601,以提高速度并减小读出电路面积,具有有效降低功耗、并具有高速的优势,在低照度情况下能满足成像需求。The readout circuit of this embodiment is shown in FIG. 4 , including a correlated
本实施例提供一种基于复合介质栅光敏探测器的单电子级别的低噪声、高增益、高帧率的读出方法:This embodiment provides a single-electron-level readout method with low noise, high gain, and high frame rate based on a composite dielectric grating photosensitive detector:
(1)复位:在控制栅105加-4V的电压,在P型衬底102加-3V的电压,将光敏探测器的MOS-C部分感光晶体管101收集的电子进行复位,并切换到读取模式,由相关双采样电路读取复位信号;(1) Reset: Add the voltage of -4V to the
(2)曝光:在控制栅105加0V的电压,在P型衬底102加-3V的电压,当有光照时,光电子的能量大于硅的禁带宽度时,将激发出一个电子空穴对,在耗尽区的电场作用下,感光晶体管101将收集产生的光电子,感光晶体管101的电势将发生改变,并耦合到复合介质栅的电荷耦合层106改变电荷耦合层106的电势,从而改变开启读取晶体管103的阈值电压,阈值电压变化量为U=Q/C,其中Q为收集的光电子的电荷量,C为顶层介质栅104的电容,并切换到读取模式,由相关双采样电路读取曝光信号;(2) Exposure: Add a voltage of 0V to the
(3)读取:在读出阶段时,栅压可以为2~5V,如给控制栅105加3V的偏压,衬底可以为-3~0V,如给P型衬底102加-3V的偏压,栅压和衬底电压需满足光敏探测器的读取晶体管在空阱和满阱下都处于线性区,复合介质栅读取晶体管漏极给恒定电压,比如0.2V,源极给恒定电压0V,由相关双采样电路401读出漏极201电流。(3) Read: During the readout phase, the gate voltage can be 2-5V, such as adding a bias voltage of 3V to the
相关双采样电路的VIN输入端与复合介质栅读取晶体管103的漏极201相连接,复位后,读取漏极201电流,如图5所示,通过相关双采样电路的复位信号采样电容CR502对漏极201电流进行采样,输出复位信号的电压信号VOUTR。曝光后,读取漏极201电流,通过相关双采样电路的曝光信号采样电容CS501对漏极201电流进行采样,输出信号的电压信号VOUTS。二者的差值VOUTS-VOUTR即为由曝光后收集的光电子所对应的信号量,采用相关双采样电路可以有效降低复位噪声和散粒噪声等。The VIN input terminal of the relevant double sampling circuit is connected to the
经相关双采样电路输出的信号VOUTR与VOUTS输入到图6所示的电荷转移放大电路的输入端in1和in2,通过闭合开关S1,对电容C1和电容C2进行充电,通过闭合开关S2,对输出端out1和out2进行预充电,通过打开开关S1,电压信号输出到out1和out2,经电荷转移放大器放大后,其增益为C2/C1。由于电荷转移放大器仅在开关闭合时进行充电,因此可以有效地降低功耗。The signals VOUTR and VOUTS output by the correlated double sampling circuit are input to the input terminals in1 and in2 of the charge transfer amplifier circuit shown in Figure 6, and the capacitor C1 and the capacitor C2 are charged by closing the switch S1, and the output is charged by closing the switch S2. The terminals out1 and out2 are pre-charged, and the voltage signal is output to out1 and out2 by opening the switch S1. After being amplified by the charge transfer amplifier, its gain is C2/C1. Because the charge-transfer amplifier charges only when the switch is closed, it effectively reduces power consumption.
量化电路可以使用如图7所示的D-latch电路。电荷转移放大器的输出out1和out2作为D-latch电路的输入进行单比特量化,单比特量化可以极大地提高量化速度,从而可以使得光敏探测器有一个极短的曝光时间,在低照度下满足在曝光时间内单光子成像的需求。The quantization circuit can use a D-latch circuit as shown in FIG. 7 . The output out1 and out2 of the charge transfer amplifier are used as the input of the D-latch circuit for single-bit quantization. Single-bit quantization can greatly improve the quantization speed, so that the photosensitive detector has an extremely short exposure time, which meets the requirements of The need for single-photon imaging during the exposure time.
由于光敏探测器尺寸极小,读出电路尺寸较大,因此为了节省芯片面积,可以采用多个光敏探测器组成一个子阵列801共用一个读出电路802的形式,如图8所示。Since the size of the photosensitive detector is extremely small and the size of the readout circuit is relatively large, in order to save chip area, a sub-array 801 composed of multiple photosensitive detectors can be used to share a form of a
对于光敏探测器阵列,为了实现高速读出,若光敏探测器阵列由M×N个光敏探测器组成,每m×n个光敏探测器子阵列901共用一个读出电路902,如图9所示,则共有(M/n)×(N/n)个光敏探测器子阵列和读出电路,且光敏探测器子阵列901与读出电路902一一对应,相比于只用一个读出电路,读出速度加快了(M/n)×(N/n)倍,实现高帧率快速读出。For the photosensitive detector array, in order to realize high-speed readout, if the photosensitive detector array is composed of M×N photosensitive detectors, each m×n
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