CN115355969A - Novel micro cantilever beam device for detecting micro mass - Google Patents
Novel micro cantilever beam device for detecting micro mass Download PDFInfo
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- CN115355969A CN115355969A CN202211031808.7A CN202211031808A CN115355969A CN 115355969 A CN115355969 A CN 115355969A CN 202211031808 A CN202211031808 A CN 202211031808A CN 115355969 A CN115355969 A CN 115355969A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01G—WEIGHING
- G01G3/00—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances
- G01G3/12—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing
Abstract
The invention discloses a micro-cantilever beam device for detecting micro-quality, which comprises a cantilever beam device, a cantilever beam fixing substrate, a plate electrode fixing substrate, a gasket for adjusting electrode distance and a plate electrode, wherein the cantilever beam device is fixed on the cantilever beam fixing substrate through a spring pressing sheet; a gasket is arranged on the electrode plate fixing substrate, a gasket for adjusting the electrode distance is arranged on the gasket, the electrode plate is arranged on the gasket for adjusting the electrode distance, and the electrode plate is fixed on the electrode plate fixing substrate by a spring pressing sheet; the invention relates to a micro-cantilever beam device for detecting micro-mass, which comprises a micro-cantilever beam consisting of monocrystalline silicon, an electrode plate device and a micro-capacitor detection circuit. The micro mass object acts on the micro channel in the cantilever beam to cause the cantilever beam to deform, and the mass of the micro mass object is calculated by detecting the capacitance change between the cantilever beam and the electrode plate.
Description
Technical Field
The invention mainly relates to the field of MEMS, in particular to a novel micro-cantilever beam device for micro-mass detection.
Background
With the continuous development of nanotechnology, the mechanical response is very sensitive to external force due to the small structure of the MEMS device, and the MEMS device is widely applied to detection and sensors. Detection of minute masses is of great importance for biological and chemical sensing and research in several basic disciplines, such as detection of biological macromolecules, DNA, chemical gases, contaminants, etc. Several typical detection methods are currently available: optical device methods, electrochemical analysis methods, biological detection methods, micro/nano-sensor detection methods.
Patent No. 2016104117634 discloses a micro-cantilever apparatus for weighing DNA molecules. It comprises a micro cantilever beam, micro displacement sensors on the upper and lower sides of the cantilever beam, and a DNA molecule adsorption layer. And placing the DNA molecules to be detected on the upper surface of the DNA molecule adsorption layer close to the free end of the cantilever beam, enabling the cantilever beam to deform to generate displacement, and obtaining the deformation quantity of the cantilever beam according to the micro-displacement sensor so as to calculate the molecular mass. However, the DNA molecule adsorbing layer of such a micro-cantilever device is complicated to process, and errors are likely to occur when the DNA molecule adsorbing layer adsorbs DNA molecules, and the micro-displacement sensor has insufficient detection accuracy, and is likely to cause large errors.
The document 201610408614 discloses a method for measuring the mass of a DNA molecule using the resonance principle. The device comprises a vibration exciter, a hinged support, a micro simple support beam, a DNA molecule adsorption layer on the micro simple support beam, DNA molecules to be measured and an amplitude receiver; the micro simply supported beam is excited by the vibration exciter to vibrate freely, and the amplitude receiver is connected with and detects the corresponding amplitude and frequency, so that the mass of the DNA molecules is calculated. The DNA adsorption layer on the micro simply supported beam is complex to manufacture, the adsorption effect is difficult to control, in addition, the large-area adsorption layer can cause the elastic coefficient change of the cantilever beam, frequency deviation can be generated during frequency measurement, and measurement errors are generated.
The prior art testing device is complex, the cantilever beam manufacturing and processing flow is complex, and the portability degree is low, so that the design of the novel micro-cantilever beam device for detecting the micro quality has important significance.
Disclosure of Invention
The invention aims to solve the problems that the existing method adsorbs an object to be detected in an adsorption mode when measuring the mass of the tiny object, detects the frequency change or displacement to determine the mass of the tiny object, has complex detection device and complex manufacturing process flow, can consider to simplify the manufacturing process of the detection device aiming at the existing problems, and adopts a simpler detection principle.
In order to solve the problems, the technical scheme of the invention is as follows:
a micro-cantilever beam device for detecting micro-quality comprises a cantilever beam device, a cantilever beam fixing substrate, a plate electrode fixing substrate, a gasket for adjusting electrode distance and a plate electrode, wherein the fixed end of the cantilever beam device is fixed on the cantilever beam fixing substrate through a spring pressing sheet; a gasket is arranged on the electrode plate fixing substrate, a gasket for adjusting the electrode distance is arranged on the gasket, the electrode plate is arranged on the gasket for adjusting the electrode distance, and the electrode plate is fixed on the electrode plate fixing substrate by a spring pressing sheet; sputtering a metal electrode on the electrode plate, penetrating the TSV through the through hole to lead the metal electrode to the lower surface of the electrode plate, wherein the gasket for adjusting the electrode distance is U-shaped and is not in contact with the metal electrode on the electrode plate; the electrode plate is fixed on the substrate, the gasket and the gasket for adjusting the electrode distance relative to the electrode plate, a part of free end extends outwards, the free end is matched with the micro cantilever beam of the cantilever beam device and is arranged above the micro cantilever beam, one electrode is led out from the metal electrode, the other electrode is processed on the cantilever beam device and is led out, and an impedance analyzer or a micro-capacitance test circuit is adopted for capacitance measurement.
Furthermore, the electrode plate fixing substrate and the cantilever beam fixing substrate have the same thickness.
Furthermore, the electrode distance adjusting gasket is a silicon steel precision gap gasket, the thickness is adjustable, and the thickness is more than or equal to 5 mu m.
Further, the material of the electrode plate is glass or monocrystalline silicon.
Furthermore, the cantilever beam device is internally provided with a micro-channel, the micro-cantilever beam on the cantilever beam device is processed and formed by adopting a monocrystalline silicon material, and the micro-channel in the cantilever beam is used for placing a micro-quality object to be detected and is processed and manufactured by adopting an SON (silicon on insulator) process; meanwhile, the shape of the micro-channel can be changed according to actual requirements.
Furthermore, when the tail end of the micro-cantilever is placed into an object to be detected, the tail end of the micro-cantilever is stressed to deform, the distance between the metal electrode and the processing electrode on the cantilever device changes, the metal electrode and a lead of the processing electrode on the cantilever device are connected to a micro-capacitance detection circuit, and the micro-capacitance detection circuit detects capacitance change; the computer system processes the capacitance data collected by the micro capacitance detection circuit, and corresponds the capacitance change with the quality of the detected object to finally obtain and display the quality of the detected object.
Compared with the prior art, the invention has the following advantages;
1. the invention relates to a micro-cantilever beam device for detecting micro-mass, which comprises a micro-cantilever beam consisting of monocrystalline silicon, an electrode plate device and a micro-capacitor detection circuit. The micro mass object acts on the micro channel inside the cantilever beam to cause the cantilever beam to deform, and the mass of the micro mass object is calculated by detecting the capacitance change between the cantilever beam and the electrode plate.
2. Compared with the quality detection method in an adsorption mode, the method has the advantages that the manufacturing process and the cost of the cantilever beam are reduced, the production efficiency can be improved, and meanwhile, the manufacturing of the micro-cantilever beam is simpler than that of the cantilever beam with the adsorption layer and the reliability is high.
3. The detection device provided by the invention is convenient to use, reduces the dependency on external optical equipment when detecting the cantilever beam, can be carried outside, realizes mobile detection, and has a high application prospect.
4. The invention adopts a measuring principle different from the existing measuring device, detects the mass of a tiny object by calculating the capacitance, has high sensitivity, can quantitatively reflect the deformation of the cantilever beam and provides absolute deviation.
5. The invention solves the problem that the traditional micro-cantilever beam generates frequency deviation to cause measurement error because of the change of the cantilever beam elastic constant caused by adsorbing a detection object, and meanwhile, the detection device has high integratability and can effectively reduce the measurement error.
Drawings
FIG. 1 is a schematic diagram of a micro-cantilever for micro-mass detection according to the present invention after being inserted into an electrode plate; (a) is a cantilever beam device to be tested; the electrode plate detection device is used for detecting the electrode plate; (c) is a top view of (a); and (d) is a plan view of (b).
FIG. 2 is a schematic diagram of a micro-cantilever device system for micro mass detection according to the present invention.
In the figure, 201-cantilever fixed substrate; 202-cantilever beam; 203-spring pressing sheet for fixing the cantilever beam; 301-electrode plate fixing base plate; 302-a shim; 303-electrode distance adjusting spacer; 304-spring pressing sheet for fixing electrode plate; 305-metal electrodes on the electrode plate; 306-an electrode plate; 3-micro capacitance detection circuit.
Fig. 3 is a test flow block diagram.
Detailed Description
The invention will be further described with reference to the accompanying drawings and specific embodiments.
Referring to fig. 1, a micro-cantilever apparatus for micro mass detection according to the present invention is schematically shown in combination with an electrode plate. Fig. (c) is a top view of fig. (a), and fig. (d) is a top view of fig. (b), in which the cantilever beam device is fixed to the cantilever fixing base plate (201) by the spring pressing plate (203); in the figure (b), the electrode plate fixing substrate (301) has the same thickness as the cantilever beam fixing substrate (201), the electrode distance adjusting gasket (303) is arranged on the gasket (302), and a silicon steel precision gap gasket is adopted, so that the thickness can be adjusted from 5 mu m. The electrode plate (306) is placed on the electrode distance adjusting spacer (303) and fixed to the electrode plate fixing substrate (301) by a spring pressing piece (304). A metal electrode (305) is sputtered on the electrode plate (306), and TSV penetration is performed to lead the metal electrode to the surface of the electrode plate. The electrode distance adjusting spacer (303) is U-shaped and does not contact the metal electrode on the electrode plate. The material of the electrode plate may be glass or single crystal silicon, and fig. 1 (d) is a plan view in the case where the electrode plate is transparent glass.
As a specific embodiment of the present invention, the micro-cantilever for micro-mass detection of the present invention may have a micro-channel inside, and the shape of the micro-channel may be processed according to actual needs. The micro-channel is processed and manufactured by an SON process. The micro cantilever beam is processed and manufactured by monocrystalline silicon.
The micro-cantilever beam for detecting the micro-mass is put into an object to be detected with the micro-mass, and is deformed under stress. The detected object is placed in the micro-channel inside the micro-cantilever, and after the detected object is placed, the micro-cantilever can deform under stress.
Referring to fig. 2, in the micro-cantilever device system for micro-mass detection provided by the invention, during testing, the device shown in fig. 1 (b) and fig. 1 (a) are arranged on the same platform, an electrode plate is arranged on the cantilever, one electrode is led out from a metal electrode (305), and the other electrode is processed on the cantilever and led out, so that capacitance measurement can be carried out by using an impedance analyzer or a micro-capacitance testing circuit.
When the micro-cantilever is not placed in a detection object, the micro-cantilever is not deformed, and the distance from the micro-cantilever to the electrode plate metal electrode (305) is d. The distance between the electrode and the surface of the cantilever beam can be adjusted through the electrode distance adjusting gasket (303), and the distance d can be accurately adjusted by replacing gaskets with different thicknesses. The cantilever beam is made of monocrystalline silicon with low resistivity, lead output can be carried out by a probe, metal electrodes (305) on the surfaces of the electrode plates are led out, and 2 leads are connected to the micro-capacitance detection circuit (3) through leads. The capacitance value of a parallel plate capacitor formed by the electrode plate and the micro cantilever beam is obtained by connecting the micro capacitance detection circuit (3) with a computer processing system and is marked as C 0 . After the micro-cantilever is placed into an object to be detected, a small bending and deformation can be generated, and is marked as delta d. Capacitance value between deformed micro-cantilever and metal electrode of electrode plate
The mass of the object on the micro-cantilever can be obtained by detecting the capacitance value of the micro-cantilever after the object to be detected is placed in the micro-cantilever and then processing the data by a computer system. The specific computer processing process includes a calibration process and a measurement process, and the flow chart of the process is shown in fig. 3. Applying particles with standard mass to several fixed positions of a known cantilever beam, drawing a curve of capacitance and mass and a relation curve of capacitance and cantilever beam position according to measured capacitance, and then obtaining a fitting relation of capacitance, mass and applied position on the beam according to the curve; during measurement, a fitting switch is brought in according to the action position of the measured capacitance and mass on the cantilever beamThe quality to be measured is obtained in the equation.
Claims (6)
1. A micro cantilever beam device for detecting micro mass is characterized by comprising a cantilever beam device (202), a cantilever beam fixing substrate (201), an electrode plate fixing substrate (301), a gasket (302), an electrode distance adjusting gasket (303) and an electrode plate (306), wherein the fixed end of the cantilever beam device (202) is fixed on the cantilever beam fixing substrate (201) through a spring pressing sheet (203); a gasket (302) is arranged on the electrode plate fixing substrate (301), a gasket (303) for adjusting the electrode distance is arranged on the gasket (302), and the electrode plate (306) is arranged on the gasket (303) for adjusting the electrode distance and is fixed on the electrode plate fixing substrate (301) by a spring pressing sheet (304); sputtering a metal electrode (305) on the electrode plate (306), and leading the metal electrode to the lower surface of the electrode plate (306) by carrying out TSV penetration through holes, wherein the electrode distance adjusting gasket (303) is U-shaped and is not in contact with the metal electrode on the electrode plate (306); the electrode plate (306) is fixed on the substrate (301), the gasket (302) and the gasket (303) for adjusting the electrode distance relative to the electrode plate, a part of free end extends outwards, the free end is matched with the micro cantilever beam of the cantilever beam device (202) and is arranged above the micro cantilever beam, one electrode is led out from the metal electrode (305), the other electrode is processed on the cantilever beam device and is led out, and an impedance analyzer or a micro-capacitance test circuit is adopted for capacitance measurement.
2. The micro-cantilever apparatus for micro-mass detection according to claim 1, wherein the electrode plate fixing substrate (301) has the same thickness as the cantilever fixing substrate (201).
3. The micro-cantilever apparatus for micro-mass detection according to claim 1, wherein the electrode distance adjusting spacer (303) is a silicon steel precision gap spacer with a thickness of 5 μm or more.
4. The micro-cantilever apparatus for small mass detection according to claim 1, wherein the material of the electrode plate (306) is glass or monocrystalline silicon.
5. The micro-cantilever device for micro-quality detection according to claim 1, wherein the cantilever device contains a micro-channel therein, the micro-cantilever on the cantilever device is formed by processing a monocrystalline silicon material, and the micro-channel in the cantilever is used for placing a micro-quality object to be detected and is processed and manufactured by using an SON process; meanwhile, the shape of the micro-channel can be changed according to actual requirements.
6. The micro-cantilever device for detecting the micro-mass according to claim 1, wherein when the end of the micro-cantilever is placed into an object to be detected, the end is deformed by a force, the distance between the metal electrode (305) and the processing electrode on the cantilever device is changed, the leads of the metal electrode (305) and the processing electrode on the cantilever device are connected to the micro-capacitance detection circuit (3), and the micro-capacitance detection circuit (3) detects the capacitance change; the computer system processes the capacitance data collected by the micro capacitance detection circuit, and corresponds the capacitance change with the quality of the detected object to finally obtain and display the quality of the detected object.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211031808.7A CN115355969A (en) | 2022-08-26 | 2022-08-26 | Novel micro cantilever beam device for detecting micro mass |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211031808.7A CN115355969A (en) | 2022-08-26 | 2022-08-26 | Novel micro cantilever beam device for detecting micro mass |
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| CN115355969A true CN115355969A (en) | 2022-11-18 |
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| CN202211031808.7A Pending CN115355969A (en) | 2022-08-26 | 2022-08-26 | Novel micro cantilever beam device for detecting micro mass |
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