CN115347448A - Method and system for stably outputting pulse laser energy by adopting gas supply - Google Patents
Method and system for stably outputting pulse laser energy by adopting gas supply Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000007789 gas Substances 0.000 claims description 229
- 238000001514 detection method Methods 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 19
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 16
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 16
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 10
- 229910018503 SF6 Inorganic materials 0.000 claims description 9
- 230000000977 initiatory effect Effects 0.000 claims description 9
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 9
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 9
- 238000004891 communication Methods 0.000 claims description 7
- 230000000087 stabilizing effect Effects 0.000 claims description 7
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 4
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
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- H01—ELECTRIC ELEMENTS
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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Abstract
The invention relates to the technical field of discharge excitation gas laser, and provides a method and a system for stably outputting pulse laser energy by adopting gas supply, wherein the method comprises the following steps: s1: filling gas for generating laser into the laser, wherein the gas for generating the laser comprises a first gas and a second gas; s2: starting a laser; s3: continuously measuring the concentration of the first gas and the second gas in the laser and continuously measuring the energy of the generated pulse laser; s4: continuously judging whether the concentration of the first gas is lower than a concentration threshold value, and if the concentration of the first gas is lower than the concentration threshold value, filling the first gas into the laser to reach a first preset concentration; and simultaneously judging whether the energy of the generated pulse laser is lower than an energy threshold value, and if so, filling a second gas into the laser to a second preset concentration. The invention can stably output pulse laser for a long time.
Description
Technical Field
The invention relates to the technical field of discharge excitation gas laser, in particular to a method and a system for stably outputting pulse laser energy by adopting gas supply.
Background
With the continuous expansion of application requirements, mid-infrared laser has become a research hotspot in the field of laser technology in recent years.
The 3-micron waveband intermediate infrared laser is positioned at the junction of two atmospheric transmission windows of 2-3 microns and 3-4 microns, the transmission characteristic is changed along with the wavelength violently, the transmission transmittances at different heights are also obviously different, and the waveband covers the baseband absorption line and the water absorption peak of various gases, so that the absorption spectrum attenuation characteristic transmitted by the 3-micron waveband laser can be utilized to reflect the content of specific atmospheric components, and the method is an effective means for monitoring atmospheric pollution. The 3 mu m wave band laser can also be used for dangerous goods detection, medical research, infrared detection and the like, can also be used as a driving light source for wavelength conversion, realizes output of mid-infrared super-continuum spectrum and infrared multi-wave band laser, and has wide application in the fields of spectroscopy, national defense scientific research and the like.
In the production technology of mid-infrared laser, the traditional molecular laser mostly adopts chemical reaction heat release to realize the vibration-inversion energy level transition of gas molecules to obtain laser output, but because the system structure is complex and the volume is huge, the mesa operation is difficult to realize. Miniaturized lasers are commonly used in laboratories to achieve hydrogen fluoride chemical laser pulse output using a pulsed discharge initiation approach. SF is generally used for discharge-initiated pulsed hydrogen fluoride lasers 6 And C n H 2n+2 (n is more than or equal to 2) type hydrocarbon mixed gas as working mediumProton, high energy electrons and SF produced by homogeneous body discharge 6 F atoms required by chemical reaction are separated by collision, and then the F atoms and the H-containing compound generate exothermic chemical reaction to generate excited hydrogen fluoride molecules so as to obtain laser output.
From the application requirement, the pulsed hydrogen fluoride laser needs continuous and stable motion in the repetition frequency mode to be practical, and the reality faces great difficulty. Because the working medium is continuously reduced by the chemical reaction which cannot be carried out in the working process of the hydrogen fluoride laser, and the ground state hydrogen fluoride molecules generated after the laser transition have strong relaxation effect on the generated excited state hydrogen fluoride, the subsequent laser pulse energy is obviously reduced.
Therefore, it is necessary to develop a method for outputting a pulsed hydrogen fluoride laser by discharge initiation, which can stably output a pulsed laser for a long period of time.
Disclosure of Invention
The present invention is directed to solving the above-mentioned drawbacks of the prior art, and provides a method and system for stably outputting discharge-induced pulse laser energy by gas supply, which can stably output pulse laser for a long time.
As a first aspect of the present invention, there is provided a method for stably outputting pulsed laser energy using gas supply, comprising the steps of:
s1: filling gas for generating laser into a laser, wherein the laser is a laser which regularly outputs the number of laser pulses in a unit time by utilizing a pulse discharge initiation mode and is provided with a gas circulation device, the gas for generating the laser comprises a first gas and a second gas, and the gas for generating the laser circulates in the gas circulation device and performs chemical reaction in a discharge area to output the laser;
s2: determining the working voltage output by the laser, and starting the laser;
s3: continuously measuring the concentration of the first gas and the second gas in the laser and continuously measuring the energy of the generated pulse laser;
s4: continuously judging whether the concentration of the first gas is lower than a concentration threshold value, and if the concentration of the first gas is lower than the concentration threshold value, filling the first gas into the laser to a first preset concentration;
and simultaneously judging whether the energy of the generated pulse laser is lower than an energy threshold value, and if so, filling a second gas into the laser to a second preset concentration.
According to an exemplary embodiment of the invention, the laser is a hydrogen fluoride laser or a DF laser.
According to an example embodiment of the present invention, the first gas is sulfur hexafluoride; the second gas is ethane or deuterium gas.
According to an exemplary embodiment of the present invention, the laser generates pulses at a frequency of 1 to 100Hz and at an operating voltage of 23 to 27kV, and the laser energy decreases by less than 20% in a time range of 100 seconds of continuous operation of the laser.
According to an exemplary embodiment of the invention, the concentration threshold is 90% -96% of the concentration of the first gas.
According to an exemplary embodiment of the invention, the method for continuously measuring the concentration of the first gas and the second gas inside the laser measures the concentration of the first gas and the second gas based on absorption spectroscopy in step S3.
According to an exemplary embodiment of the invention, the concentration of the first gas and the second gas in the discharge region is measured.
According to a second aspect of the present invention, there is provided an apparatus for stably outputting pulsed laser energy, comprising:
the laser comprises a high-voltage electrode and a gas circulating device, wherein the high-voltage electrode generates pulse laser triggered by discharge, and the gas circulating device enables gas in the laser to circularly flow and to pass through a discharge area of the high-voltage electrode for chemical reaction;
the energy detection device is used for acquiring the energy value of the output laser;
the gas concentration detection system is used for acquiring the concentrations of the first gas and the second gas;
the gas filling device is connected with the gas circulating device and is used for filling the first gas and the second gas into the laser;
and the controller is connected with the high-voltage electrode, the energy detection device, the gas concentration detection system and the gas filling device and is used for controlling the gas filling device to fill the first gas and the second gas into the laser according to the energy value and the concentration of the first gas.
According to an example embodiment of the invention, the gas inflator includes a first inflator and a second inflator;
the first gas charging device comprises a first gas storage chamber, an electromagnetic valve, a flowmeter and a gas path, wherein the first gas storage chamber is connected with the laser through the gas path, and the electromagnetic valve and the flowmeter are arranged on the gas path and are in communication connection with the controller;
the second air charging device comprises a second air storage chamber, an electromagnetic valve, a flowmeter and an air path, the second air storage chamber is connected with the laser through the air path, and the electromagnetic valve and the flowmeter are arranged on the air path and are in communication connection with the controller.
According to an example embodiment of the present invention, the energy detection device employs a photodetector.
The beneficial effects of the invention are:
the invention judges the supply amount of the second gas through the energy of the pulse laser, and judges the consumption amount of the ethane through the concentration of the first gas, so that the two gases are maintained in the range of stable and optimal reaction effect. By the common regulation of the two aspects, the output energy of the pulse laser can be long and stable.
Drawings
FIG. 1 shows a block diagram of a system for stabilizing the output of discharge-induced pulsed laser energy using gas supply.
Fig. 2 shows a schematic diagram of the energy detection device acquiring laser energy.
FIG. 3 shows the steps for stabilizing the output discharge-inducing pulsed laser energy with gas supply.
Fig. 4 shows a graph of laser energy with and without gas supply.
Detailed Description
The following is a detailed description of embodiments of the invention, but the invention can be practiced in many different ways, as defined and covered by the claims.
According to a first embodiment of the present invention, there is provided a system for stabilizing output pulsed laser energy using gas supply, as shown in fig. 1, comprising: the device comprises a laser, an energy detection device, a gas concentration detection system, a gas filling device and a controller.
The laser device is a laser device which regularly outputs the number of laser pulses in a unit time by utilizing a pulse discharge initiation mode and comprises a high-voltage electrode and a gas circulation device. The high voltage electrode generates a pulsed hydrogen fluoride laser induced by the discharge. The high-voltage electrode comprises an anode and a cathode, the anode and the cathode are respectively connected with the energy storage capacitor, and a channel through which gas passes is reserved between the anode and the cathode and is a discharge area. The gas circulation device enables gas for generating laser inside the laser to circularly flow and pass through the discharge area of the high-voltage electrode to carry out chemical reaction.
The reason for using the gas circulation device is that: the total energy efficiency from the charging energy storage of the energy storage capacitor to the laser output is 3% -7%, most discharge energy is converted into waste heat to be deposited in a gas medium and a discharge loop, in addition, the surface of the pulse discharge counter electrode is ablated to form a large number of ablation particles, the waste heat and the ablation particles can damage the uniformity of the gas medium, the pulse discharge quality is reduced, and finally arc discharge is initiated in the subsequent pulse excitation process, so that a gas circulation device must be established for the repetition frequency operation of the pulse hydrogen fluoride laser caused by discharge, and the gas medium in a discharge area is fully replaced in the pulse discharge interval time.
The energy detection device is close to the discharge area of the high-voltage electrode and used for acquiring the energy value of the output laser.
As shown in fig. 2, fig. 2 is a schematic diagram illustrating the energy detection device acquiring laser energy. The energy acquisition device adopts a photoelectric detector and is used for detecting and outputting the energy value of the laser.
During measurement, the temperature and the static input current of the laser are firstly adjusted to ensure that the output wavelength is in a preset wavelength range, and the wavelength can be selected to be 1330.529nm; the data acquisition card is then used to generate a sawtooth voltage to tune the injection current of the laser, preferably to sweep it at a frequency of 5-10kHz within the range of 0mA-80mA, so that the laser output wavelength sweeps the selected absorption line repeatedly at that frequency. The output laser passes through the laser discharge area once after being collimated by the optical fiber collimator; and finally, measuring the change condition of the absorbed light intensity by a photoelectric detector, converting the change condition of the absorbed light intensity into an electric signal and inputting the electric signal into a processor.
The gas detection device is used for acquiring the concentrations of the first gas and the second gas. The gas detection device comprises a first concentration monitoring device and a second concentration monitoring device, the first concentration monitoring device is used for monitoring the concentration of the first gas, and the second concentration monitoring device is used for detecting the concentration of the second gas.
And the gas filling device is connected with the gas circulating device and is used for filling gas into the laser. The gas filling device is far away from the high-voltage electrode, so that the gas is uniformly mixed and then flows to a discharge area of the high-voltage electrode for reaction. As shown in fig. 1, the gas inflator includes a first inflator and a second inflator. The first inflation device comprises a first gas storage chamber, an electromagnetic valve, a flow meter and a gas circuit. The first gas storage chamber contains a first gas, for example an SF laser or DF laser, the first gas being SF 6 . The first gas storage chamber is connected with the laser through a gas path, and the electromagnetic valve and the flowmeter are arranged on the gas path, are in communication connection with the controller and are used for receiving the indication of the controller and adjusting the quantity of the first gas entering the laser. The second inflation device comprises a second gas storage chamber, a solenoid valve, a flow meter and a gas circuit. A second gas, C, is stored in a second gas storage chamber, for example, an SF laser (hydrogen fluoride) in FIG. 1 2 H 6 . If a DF laser is taken as an example, the second gas is deuterium gas. The second gas storage chamber is connected with the laser through a gas path, and the electromagnetic valve and the flowmeter are arranged on the gas path, are in communication connection with the controller and are used for receiving the indication of the controller to adjust the quantity of the second gas entering the laser.
The controller is in communication connection with the high-voltage electrode, the energy detection device, the gas concentration detection system and the gas filling device and is used for controlling the gas filling device to fill gas into the laser according to the energy value detected by the energy detection device and the concentration of the first gas detected by the gas concentration detection system.
According to a second embodiment of the present invention, there is provided a method for stably outputting pulsed laser energy using gas supply, the system of the first embodiment, as shown in fig. 3, comprising the steps of:
s1: and filling gas for generating laser into the laser, wherein the gas for generating laser comprises first gas and second gas, and taking the hydrogen fluoride laser as an example, the first gas adopts sulfur hexafluoride, and the second gas adopts ethane. SF 6 The (sulfur hexafluoride) gas is a synthetic insulating gas commonly used for high-voltage electrical equipment, has very stable physical and chemical properties, is non-toxic and non-combustible, can be stably premixed with a donor material of hydrogen atoms, has strong electronegativity, can effectively maintain a large-volume uniform body discharge process, avoids uneven discharge such as filamentation, arc discharge and the like to cause reduction of initiation efficiency, and is an ideal F atom donor material. If a DF laser is used, sulfur hexafluoride is used as the first gas and deuterium is used as the second gas. The first gas and the second gas circulate in the gas circulation device and carry out chemical reaction in a discharge area of the high-voltage electrode to output laser. Preferably, the concentration of the first gas charged for the first time is 90% -96%, the concentration of the second gas is 4% -10%, the total gas pressure of the mixed gas is 8kPa, and the ratio of the gases, the gas pressure and the working voltage together determine the output energy of the laser. Therefore, when the temperature change is small, the influence of the temperature on the reaction and the gas energy is small, and the factors having a large influence on the gas energy are the gas pressure and the gas concentration.
S2: and determining the working voltage output by the laser, and starting the laser. The operating voltage of the laser output needs to be determined in conjunction with the application requirements and laser output capabilities. The operating voltage is 23-27kV, and it was briefly stated above that the selection of the output energy of the laser is directly related to the voltage when the gas conditions are determined. For a laser, the working gas parameters and the output energy-voltage relationship are usually given, and the user can obtain the required energy by only selecting the voltage according to the requirement. The frequency of the pulse generated by the laser is 1-100Hz, preferably 40-60Hz, the energy value of the laser is reduced by less than 20% within the time range of 100 seconds of continuous operation of the laser, namely, the energy value of the laser is within the range of 85% -115% of the initial energy value within the time range of 100 seconds of continuous operation of the laser.
Taking an HF laser as an example, the kinetics of the discharge region during the laser turn-on are as follows:
SF 6 +e→SF 5 + F + e equation 1
F+C 2 H 6 →HF(v)+C 2 H 5 + Q (v =1,2,3) formula 2
HF (v) → HF (v-1) + hv equation 3
HF (v) + M → HF (v-1) + M equation 4
Equation 1 represents the discharge initiation process to achieve pulsed HF laser output. The discharge initiation process provides the F atoms required for the chemical reaction and also directly determines the photon number yield of the radiative transition process, so that efficient production of F atoms is a prerequisite for achieving laser output. The discharge initiation process is to apply a pulse high-voltage electric field between working media of mixed gas to realize rapid breakdown of gas to obtain a large amount of free electrons, the electrons continuously collide with gas molecules under the acceleration of the electric field to transfer energy, and the energy is transferred from SF through complex interaction 6 Free F atoms are obtained in the gas molecule.
Equation 2 represents the exothermic stimulation process of a chemical reaction. Q is reaction energy release, and v is vibration and/or rotation excitation energy level.
Equation 3 represents the radiative transition process. When the higher energy level HF (v) is converted to the lower energy level HF (v-1), the laser radiation h v is formed by the transition between the vibration and/or rotation excitation energies.
Equation 4 represents a radiationless relaxation process. Relaxation refers to the process of gradually returning from a non-equilibrium state to an equilibrium state. The time to gradually return from the non-equilibrium state to the equilibrium state is the relaxation time. After the rf pulse is stopped, the nuclei release the absorbed energy back to a thermal equilibrium state, a process called relaxation. M is a component playing a role of relaxation in the mixed gas of the first gas and the second gas, each gas molecule plays a role of relaxation to the excited state HF, and the relaxation of the ground state HF is strongest. The excited state HF is an HF molecule excited to a high energy state by energy, and the ground state HF is an HF molecule having the lowest energy. The efficiency of generating laser is reduced by the relaxation, the relaxation is that the ground state and excited state molecules collide with each other, the excited state molecules exchange energy with the ground state molecules in the collision process to gradually return to the ground state, and the excited state molecules are not returned to the ground state through radiation transition, so that few radiation output excited state molecules are formed, and the efficiency of outputting laser is low. Therefore, it is not preferable that the first gas and the second gas are maintained in a predetermined concentration range as more the amounts of the first gas and the second gas are, so that the relaxation effect can be prevented from being expanded.
S3: the concentration of the first gas and the second gas inside the laser is continuously measured, and the energy of the generated pulsed laser is continuously measured. The method for measuring the concentrations of the first gas and the second gas in the laser adopts a gas concentration detection system to measure the concentrations of the first gas and the second gas in a discharge area based on an absorption spectroscopy, and comprises the following specific steps: the processor generates sawtooth wave voltage through the data acquisition card to tune the injection current of the laser controller, the laser controller controls the diode laser to output measurement laser with specified wavelength repeatedly, the measurement laser is collimated through the optical fiber collimator and passes through the discharge area of the high-voltage electrode in the gap between two times of discharge of the high-voltage electrode (namely when the high-voltage electrode does not discharge), part of the measurement laser is absorbed by the first gas and the second gas in the discharge area, the unabsorbed measurement laser emits to the photoelectric detector, the photoelectric detector transmits the acquired light intensity signal to the processor, and the processor acquires the absorption amount of the first gas and the second gas, so that the concentration of the first gas and the concentration of the second gas are calculated.
S4: and continuously judging whether the concentration of the first gas is lower than a concentration threshold value, and if so, filling the first gas into the laser to a first preset concentration. The concentration threshold is 90% -96%, preferably 95%, of the concentration of the first gas. The first predetermined concentration is the initial concentration of the first gas in step S1.
And simultaneously judging whether the energy of the generated pulse laser is lower than an energy threshold value. And if the energy is lower than the energy threshold value, filling the second gas into the laser to a second preset concentration. The second predetermined concentration is the initial concentration of the second gas in step S1.
The gas detection device is used for detecting the concentration of the first gas and the second gas, and the energy detection device is used for detecting the laser energy.
The first gas is sulfur hexafluoride which is the main gas required by the reaction, and the method of detecting the concentration is adopted in the sensitivity angle of the energy, and the first gas is replenished once after the gas is deficient to a certain amount.
The second gas is a small amount of gas, the laser energy is sensitive to the concentration of the gas, and the micro-supply is carried out in real time through judgment of the energy.
The first gas is supplemented in a pulse mode, and is supplemented once at intervals. The second gas is supplied in a real-time micro-supplying mode, and is continuously supplied at a certain speed.
The consumption rate of sulfur hexafluoride in a discharge area by single pulse discharge is much lower than that of ethane, although the consumption rate theoretically exists, the actual reaction process is very complex, and the calculation and the supply cannot be simply carried out in proportion at all. The ethane consumption speed is too high, and the energy of the generated laser is greatly influenced, so that the ethane replenishment quantity is judged according to the energy of the pulse laser, and the output energy of the pulse laser can be maintained in a stable range; and then the consumption of ethane is judged according to the concentration of the sulfur hexafluoride, so that the ethane is maintained in a stable range, and sufficient supply is ensured. The sulfur hexafluoride and ethane must not be supplied in excess, otherwise the gas above the optimum gas fraction ratio rather acts as a relaxation for the excited HF, resulting in energy loss. Through the common adjustment of the two aspects, the output energy of the pulse hydrogen fluoride laser is long and stable.
As shown in FIG. 4, a hydrogen fluoride laser was used to generate a pulsed laser at a frequency f of 50Hz (i.e., 50 pulsed lasers per second). The initial pulse energy is 1.35a.u., laser is generated within the time range of 100 seconds, if gas is not supplemented, the laser energy continuously decreases until the pulse energy reaches 0.9a.u., and the decrease rate is 33.3%; by adopting the gas supply method, the laser energy is reduced, but the reduction range is not large and is reduced to 1.1a.u., and the reduction rate is 18%.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A method for stably outputting pulse laser energy by adopting gas supply is characterized by comprising the following steps:
s1: filling gas for generating laser into a laser, wherein the laser is a laser which regularly outputs the number of laser pulses in a unit time by utilizing a pulse discharge initiation mode and is provided with a gas circulation device, the gas for generating the laser comprises a first gas and a second gas, and the gas for generating the laser circulates in the gas circulation device and performs chemical reaction in a discharge area to output the laser;
s2: determining the working voltage output by the laser, and starting the laser;
s3: continuously measuring the concentration of the first gas and the second gas in the laser and continuously measuring the energy of the generated pulse laser;
s4: continuously judging whether the concentration of the first gas is lower than a concentration threshold value, and if the concentration of the first gas is lower than the concentration threshold value, filling the first gas into the laser to a first preset concentration;
and meanwhile, continuously judging whether the energy of the generated pulse laser is lower than an energy threshold value, and if so, filling a second gas into the laser to a second preset concentration.
2. The method of stabilizing output pulsed laser energy with gas replenishment of claim 1, wherein the laser is a hydrogen fluoride laser or a DF laser.
3. The method of claim 2, wherein the first gas is sulfur hexafluoride; the second gas is ethane or deuterium.
4. The method of claim 1, wherein the laser pulses at a frequency of 1-100Hz and an operating voltage of 23-27kV, and the laser energy decreases by less than 20% during a period of 100 seconds.
5. The method of claim 1, wherein the concentration threshold is between 90% and 96% of the first gas concentration.
6. The method of claim 1, wherein the step of continuously measuring the concentrations of the first gas and the second gas inside the laser comprises measuring the concentrations of the first gas and the second gas based on absorption spectroscopy.
7. The method of claim 1, wherein the concentrations of the first gas and the second gas are measured in the discharge region.
8. A system for stabilizing output pulsed laser energy using the method of any of claims 1-7, comprising:
the laser comprises a high-voltage electrode and a gas circulation device, wherein the high-voltage electrode generates pulse laser triggered by discharge, and the gas circulation device enables gas in the laser to circularly flow and to pass through a discharge area of the high-voltage electrode for chemical reaction;
the energy detection device is used for acquiring the energy value of the output laser;
the gas concentration detection system is used for acquiring the concentrations of the first gas and the second gas;
the gas filling device is connected with the gas circulating device and is used for filling the first gas and the second gas into the laser;
and the controller is connected with the high-voltage electrode, the energy detection device, the gas concentration detection system and the gas filling device and is used for controlling the gas filling device to fill the first gas and the second gas into the laser according to the energy value and the concentration of the first gas.
9. The system for stabilizing output pulsed laser energy of claim 8, wherein said gas inflator comprises a first inflator and a second inflator;
the first gas charging device comprises a first gas storage chamber, an electromagnetic valve, a flowmeter and a gas path, wherein the first gas storage chamber is connected with the laser through the gas path, and the electromagnetic valve and the flowmeter are arranged on the gas path and are in communication connection with the controller;
the second air charging device comprises a second air storage chamber, an electromagnetic valve, a flowmeter and an air path, the second air storage chamber is connected with the laser through the air path, and the electromagnetic valve and the flowmeter are arranged on the air path and are in communication connection with the controller.
10. The system for stabilizing output pulsed laser energy of claim 9, wherein said energy detection device employs a photodetector.
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