CN115340301A - Heater unit of heat treatment furnace - Google Patents
Heater unit of heat treatment furnace Download PDFInfo
- Publication number
- CN115340301A CN115340301A CN202110761476.7A CN202110761476A CN115340301A CN 115340301 A CN115340301 A CN 115340301A CN 202110761476 A CN202110761476 A CN 202110761476A CN 115340301 A CN115340301 A CN 115340301A
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- Prior art keywords
- heat treatment
- heater unit
- treatment furnace
- sleeve
- cooling
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 120
- 238000001816 cooling Methods 0.000 claims abstract description 56
- 239000002245 particle Substances 0.000 claims abstract description 17
- 239000012809 cooling fluid Substances 0.000 claims abstract description 10
- 238000007789 sealing Methods 0.000 claims abstract description 10
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 46
- 238000000034 method Methods 0.000 description 28
- 238000004519 manufacturing process Methods 0.000 description 16
- 230000003749 cleanliness Effects 0.000 description 6
- 238000001035 drying Methods 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B23/00—Heating arrangements
- F26B23/04—Heating arrangements using electric heating
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Sustainable Development (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Furnace Details (AREA)
- Surface Heating Bodies (AREA)
- Resistance Heating (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Abstract
The invention discloses a heater unit of a heat treatment furnace. The present invention relates to a heater unit of a heat treatment furnace, which may include: a sleeve which is installed at one end of an upper plate and a lower plate and is used for guiding the heating wire to be exposed to the outside, wherein the upper plate and the lower plate are respectively combined at the upper side and the lower side in a sandwich structure, and a heating body is clamped in the middle; sleeve fixing blocks positioned at upper and lower sides of the sleeve and respectively mounted at one end portion to improve a sealing degree between the upper and lower plates, thereby suppressing generation of particles due to friction between the upper and lower plates; and a cooling means which is attached to the heater unit and flows a cooling fluid on an outer side.
Description
Technical Field
The present invention relates to a heater unit of a heat treatment furnace, and more particularly, to a heater unit of a heat treatment furnace, which suppresses generation of particles in a chamber of a heat treatment furnace by improving a sealing degree of the heater unit and improves a cooling rate at the time of cooling.
Background
Recently, the display market is being applied to various image devices such as TVs, mobile phones, and screens, and efforts to upgrade the product performance are continuously being made due to the rapid development of technology. Organic light emitting display devices and LCD (hereinafter, referred to as a substrate or a glass substrate) substrates are one of next-generation displays and are used in various product fields. The glass substrate constituting the display device is manufactured through a heat treatment, and in order to satisfy conditions required by each process during the heat treatment, it is possible to prevent performance degradation and reduce product defective rate only by blocking the influence of external gas and minimizing heat released to the outside of the chamber. Further, in order to improve the yield of finished products, it is better to reduce the in-plane variation of the substrate during heat treatment, and therefore, a high-performance heat treatment furnace is required.
Temperature control and temperature uniformity are essential to ensure good substrate quality and yield in the process of manufacturing substrates. For example, in a substrate manufacturing process using a heat treatment furnace, since an organic layer formed on the surface of a substrate may contain a certain amount of moisture, a drying process for evaporating the moisture is required. In the glass substrate manufacturing process, a cleaning process is performed before a photosensitive film is coated on a substrate surface, and a heat drying process for removing moisture is performed after the cleaning process. Thus, most of the substrate manufacturing process performs a heating and drying process to manufacture the substrate. Moisture generated in the substrate manufacturing process can be removed from the substrate by ultraviolet rays or by heating and drying the substrate in a chamber of a heat treatment furnace including a heating element such as a heater (heater). In this regard, "LCD glass furnace chamber" has been proposed in Korean patent laid-open publication No. 10-1238560 and Korean patent laid-open publication No. 10-2013-0028322. However, the arrangement of the heating elements in the conventional heat treatment furnace using the heater as the heating element has a limitation in satisfying the high temperature performance and temperature uniformity required for the substrate manufacturing process. Therefore, it is required to develop a heater heating body which can be used inside a chamber of a heat treatment furnace and maintain temperature uniformity without damaging insulation at high temperature and a heater of a heat treatment furnace which is completely new and can satisfy high temperature performance and temperature uniformity required in a substrate manufacturing process.
In addition, in the process of heat-treating a substrate in a heat treatment furnace, in order to improve the productivity of manufacturing the substrate, it is important to control the cleanliness of a heat treatment space, and a structure capable of cooling at a higher speed is required in cooling.
For example, although it is necessary to increase the cooling rate of the heater and appropriately control the scattering of particles (particles) such as dust and foreign matter generated in the heater unit into the chamber, which results in a decrease in the productivity of the substrate heat treatment, it is difficult to structurally increase the cooling rate and control the scattering of particles generated in the heat treatment process in the conventional heater unit.
That is, in the conventional Heater unit, when the heating element (Ml Heater-micro heated Heater) generates heat, the heating element and the upper and lower plates expand, and friction occurs between the materials due to the difference in the material temperature and the thermal expansion coefficient, thereby generating a large amount of foreign substances (particles).
In this way, if the foreign substances are discharged to the outside through the slits of the upper and lower plates, the defective rate of the heat-treated substrate increases, and the productivity is lowered, so that it is necessary to improve the structure of the heater unit.
Further, when a cooling process is required based on a heat treatment process in a heat treatment furnace, in order to improve productivity in manufacturing a substrate, a cooling rate needs to be increased, but the conventional heater unit has a limitation in artificially increasing or controlling the cooling rate.
Prior art documents
Patent document
Patent document 1, korean granted patent publication No. 10-1238560 (publication date 2013, 02, 28 days)
Patent document 2, korean granted patent publication No. 10-0722154 (published 2007, 05, 28)
Patent document 3 korean laid-open patent publication No. 10-2013-0028322 (publication date 2013, 03 month 19)
Disclosure of Invention
Problems to be solved by the invention
The invention aims to solve the technical problem that the generation of particles in a heat treatment furnace chamber is inhibited by improving the sealing degree of a heater unit.
The invention aims to solve a technical problem that the cooling speed is improved by enabling the heater unit to have cooling performance.
Means for solving the problems
According to the present invention, the above object can be achieved by a heater unit of a heat treatment furnace, comprising: a sleeve mounted on one end of an upper plate and a lower plate for guiding the heating wire to be exposed to the outside, wherein a heating element is sandwiched between the upper plate and the lower plate and is combined with the upper side and the lower side in a sandwich structure; sleeve fixing blocks located at upper and lower sides of the sleeve and respectively installed at one end portion to improve a sealing degree between the upper and lower plates, thereby suppressing generation of particles due to friction between the upper and lower plates; and a cooling means which is attached to the heater unit and flows a cooling fluid on an outer side.
According to an embodiment of the present invention, in order to minimize a gap between the sleeve and the upper and lower plates, the sleeve may be formed in a cylindrical shape, and the sleeve fixing block may be formed with a semicircular groove at a corresponding position for coupling the sleeve so that the sleeves can be closely coupled.
According to an embodiment of the present invention, the sleeve fixing block may be divided into an upper side sleeve fixing block and a lower side sleeve fixing block, and the upper side sleeve fixing block and the lower side sleeve fixing block may have semicircular grooves at corresponding positions so that the circular sleeves can be closely guided and combined.
According to an embodiment of the present invention, the cooling means may be constituted by a cooling pipe which closely contacts along a surface of the lower plate and flows a cooling fluid.
According to an embodiment of the present invention, the cooling duct may be separately mounted on a lower portion of the lower plate.
According to an embodiment of the present invention, the cooling means may further have a cooling air flowing hole formed at the lower plate and flowing a cooling fluid flowing along a cooling pipe and triggering a heat body.
Effects of the invention
The invention can restrain the particles generated by the heater unit from flying in the heat treatment process of the substrate by the heat treatment furnace, thereby realizing the cleanness management in the heat treatment furnace chamber and having the effect of manufacturing high-yield and high-quality substrates.
In addition, the present invention has an effect of shortening the time required for cooling by increasing the cooling rate in the heat treatment process requiring cooling in the heat treatment process of heat-treating the substrate in the heat treatment furnace, thereby shortening the heat treatment process time and improving the productivity of manufacturing the substrate.
Drawings
Fig. 1 is a view showing an example of a heat treatment furnace.
Fig. 2 is an example showing the front surface of the heat treatment furnace.
Fig. 3 is an example of a heat treatment furnace in a plan view.
FIG. 4 is a view showing an example of a side surface of the heat treatment furnace.
Fig. 5 is an example of a heater unit disposed on the heat treatment furnace.
Fig. 6 is a plan view showing an example of an arrangement structure of a plurality of heater units arranged on a heat treatment furnace.
Fig. 7 is a view showing an example of a heater unit of a heat treatment furnace according to an embodiment of the present invention.
Fig. 8 is an example showing a main part of a heater unit of a heat treatment furnace according to an embodiment of the present invention.
Fig. 9 isbase:Sub>A sectional view taken along linebase:Sub>A-base:Sub>A' of fig. 7, showing an example ofbase:Sub>A sectional structure ofbase:Sub>A heater unit ofbase:Sub>A heat treatment furnace according to an embodiment of the present invention.
Description of the reference numerals
100: the heat treatment furnace 200: chamber
300: heater unit 301: busbar (busbar)
310: heating element (Ml Heater-micro sheath Heater)
311: the upper plate 312: lower plate
313: heating wire (wire) 314: sleeve (sleeve)
315: sleeve fixed block 316: semicircular groove
317: upper side sleeve fixing block 318: lower side sleeve fixing block
320: cooling pipe 321: board
Detailed Description
Hereinafter, a "heater unit of a heat treatment furnace" according to a preferred embodiment of the present invention will be described.
Fig. 1 is a view showing an example of a heat treatment furnace. Fig. 2 is an example showing the front surface of the heat treatment furnace. Fig. 3 is an example of a heat treatment furnace in a plan view. FIG. 4 is a view showing an example of a side surface of the heat treatment furnace.
The drawings shown in fig. 1 to 4 show the overall structure of the heat treatment furnace 100, which is an example of the heat treatment furnace 100 including the chamber 200.
As shown in fig. 1 to 4, the heat treatment furnace 100 may have a shutter portion 120 at a front side and a door portion 110 at a rear side in order to load the substrate to be heat-treated into each preset stage in the chamber 200 or to carry the substrate having the heat treatment process completed out of the chamber 200.
In addition, the heat treatment furnace 100 has a chamber 200 for receiving the substrate to be heated or dried, and a plurality of heater units 300 composed of heating bodies are installed in the chamber 200, so that the substrate can be heated by heat generated from the heater units 300 or dried by evaporating moisture.
Further, the heat treatment furnace 100 has a gas supply port through which a fluid containing a process gas flows in and a gas exhaust port through which the fluid in the chamber 200 is exhausted at one side of the chamber 200, and includes a frame having a rest for supporting and lifting the chamber 200 and a conductive portion connected to a plurality of bus bars 301, the bus bars 301 being connected to heating wires of the heater unit 300 to conduct current.
Although the arrangement may be different, in general, the heating plate 311 is disposed in close contact with the upper and lower portions of the heating element 310 constituting the heater unit 300, so that the substrate heating process can be efficiently performed in the chamber.
In addition, reference numerals 210 and 220, which are not illustrated in fig. 1 and 4, are inner and outer cases of the chamber 200. And, unexplained reference numeral 230 is a cooling jacket which cools the chamber to a uniform temperature distribution by forming a cooling air flow in the chamber 200 and passing through a cooling air flow passage formed inside the chamber 200. Unexplained reference numeral 240 is a power supply portion that protrudes the lead wire and supplies power into the chamber 200 through the lead wire.
For reference, the basic components constituting the heat treatment furnace as shown in fig. 1 and 4, for example, the structure of the chamber and the gas supply and exhaust system of the process gas, the conductive part including the bus bar for supplying power to the heater unit, and the components of the power supply part, are not directly related to the present invention. In addition, the basic components of the heat treatment furnace are not related to the gist of the present invention and are known components, and thus the description thereof will be omitted.
As shown in fig. 1 to 4, in general, in order to load substrates to be heat-treated into respective stations preset in a chamber or to carry out substrates, the heat-treatment process of which is completed, from the chamber, a front side of a heat-treatment furnace may have a shutter and a rear side may have a door.
Further, the heat treatment furnace has a chamber for receiving the substrate to be heated or dried, and a heater unit composed of a heating body is installed in the chamber, so that the substrate can be heated by heat generated from the heater unit or dried by evaporating moisture.
Although the arrangement may be different, in general, the upper and lower plates are closely attached to the upper and lower portions of the heating element constituting the heater, and the substrate is heated.
Further, the heat treatment furnace has a gas supply port through which a fluid containing a process gas flows in and a gas exhaust port through which the fluid in the chamber is exhausted at one side of the chamber, and includes a frame having a rest for supporting and lifting the chamber and a conductive portion connected to a plurality of bus bars connected to a heating wire of the heater to conduct current.
In addition, in order to perform heat treatment on a substrate in a heat treatment furnace, conditions required for each process are different, and in order to produce a larger number of samples in the same time, a structure capable of increasing the temperature and cooling more quickly is required, and cleanliness management of a heat treatment space is required.
For example, although it is necessary to increase the cooling rate of the heater and to appropriately control particles (particles) such as dust and foreign matter in the heater unit to be scattered into the chamber, it is difficult to structurally increase the cooling rate and to control the scattering of particles generated in the heat treatment process in the conventional heater unit.
That is, in the conventional heater unit, the heat generating body and the upper and lower plates expand during heat generation, and friction occurs between the materials due to the difference in material temperature and thermal expansion coefficient, thereby generating foreign matter (particles).
If these foreign matters are discharged to the outside through the gaps of the sleeve and the upper and lower plates, they are scattered and flowed in the chamber, which increases the defective rate of the heat-treated substrate and lowers the productivity.
Further, when a cooling process is required according to a heat treatment process in a heat treatment furnace, it is necessary to increase a cooling rate in order to improve productivity of manufacturing a substrate, but it is difficult to artificially increase or control the cooling rate in the conventional heater unit.
Accordingly, in order to manage the cleanliness in the heat treatment furnace chamber, the present invention proposes a heater unit having a structure in which the sleeve is formed in a cylindrical shape and is reinforced by upper and lower sleeve fixing blocks separately provided to fix the sleeve in a sealed structure, in order to seal a relatively weak portion, i.e., a space between the sleeve and the upper and lower plates, in which particles such as dust and foreign substances can be scattered from the inside to the outside of a heating element of the heater unit, in a sealed structure, thereby improving the sealing degree and managing the cleanliness in the heat treatment furnace chamber in a heat treatment process.
In addition, in order to improve the cooling performance of the heater unit, the present invention proposes a heater unit having a structure in which a cooling duct is directly formed on the heater unit, and the time required for cooling is reduced by increasing the cooling rate in a substrate heat treatment process requiring cooling, thereby enabling the heat treatment process time to be reduced and contributing to an increase in the productivity of manufacturing substrates.
The main components of the heater power supply connection device of the heat treatment furnace according to the present invention will be described in detail with reference to fig. 5 to 9.
Fig. 5 is an example of a heater unit disposed in the heat treatment furnace. Fig. 6 is a view showing an example of a planar structure of a heater unit disposed in a heat treatment furnace.
As shown in fig. 7 to 9, the heater unit of the heat treatment furnace according to an embodiment of the present invention can achieve cleanliness management in the heat treatment furnace chamber, increase cooling speed, shorten heat treatment process time, and increase productivity of manufacturing substrates by changing the structure of the heater unit.
Fig. 7 is a view showing an example of a heater unit of a heat treatment furnace according to an embodiment of the present invention.
Fig. 8 is a view showing an example of a main portion of a heater unit of a heat treatment furnace according to an embodiment of the present invention.
Fig. 9 isbase:Sub>A sectional view taken along linebase:Sub>A-base:Sub>A' of fig. 7, showing an example ofbase:Sub>A sectional structure ofbase:Sub>A heater unit ofbase:Sub>A heat treatment furnace according to an embodiment of the present invention.
As shown in fig. 7 to 9, the heater unit 300 of the heat treatment furnace according to an embodiment of the present invention includes a sleeve 314 mounted to one end of an upper plate 311 and a lower plate 312, and guiding a heating wire 313 to be exposed to the outside, the upper plate 311 and the lower plate 312 sandwiching a heating body 310 therebetween and being coupled to an upper side and a lower side, respectively, in a sandwich structure.
Further, sleeve fixing blocks 315 may be further provided, which are positioned at upper and lower sides of the sleeve 314 and are respectively mounted to one end portion to improve a sealing degree between the upper plate 311 and the lower plate 312, thereby preventing generation of particles due to friction between the upper plate 311 and the lower plate 312.
In addition, a cooling means, which is disposed along the heater unit 300 and flows the cooling fluid of the outside side, may be further included.
In addition, as shown in fig. 7 to 9, according to the heater unit 300 of the heat treatment furnace according to the embodiment of the present invention, in order to minimize the gap between the sleeve 314 and the upper and lower plates 311 and 312, the outer shape of the sleeve 314 may be formed in a cylindrical shape, and the sleeve fixing block 315 may be formed in a semicircular groove 316 at a corresponding position for coupling the sleeve 314 in order to enable the sleeves 314 to be closely coupled.
Among them, the cylindrical sleeve 314 and the semicircular groove 316 formed in the sleeve fixing block 315 may have shapes that facilitate assembly in a manner of minimizing a gap between the sleeve 314 and the upper and lower plates 311 and 312 and improving sealing.
In addition, the sleeve fixing block 315 may be divided into an upper side sleeve fixing block 317 and a lower side sleeve fixing block 318. That is, the upper side sleeve fixing block 317 and the lower side sleeve fixing block 318 preferably have separable structures that can be separated and assembled, respectively, and they may have semicircular grooves 316 at corresponding positions to enable the circular sleeve 314 to be closely guided and coupled.
Among them, the cylindrical sleeve 314 and the semicircular grooves 316 formed at the corresponding positions of the upper sleeve fixing block 317 and the lower sleeve fixing block 318 may have shapes advantageous for assembling in such a manner that a gap between the sleeve 314 and the upper plate 311 and the lower plate 312 is minimized and a sealing degree is improved.
Further, the cooling means of the heater unit 300 formed in the heat treatment furnace according to an embodiment of the present invention may be formed of a cooling pipe 320 which closely contacts the surface of the lower plate 312 and flows a cooling fluid.
The cooling duct 320 constituting the cooling means may be configured to be separately attached to the plate 321 below the lower plate 312.
In addition, as shown in fig. 9, the cooling means may further have cooling air flow holes 312a formed at the lower plate 312 and flowing a cooling fluid flowing along the cooling duct 320 and triggering the heat body 310.
As described above, according to the heater unit of the heat treatment furnace of the present invention, the heater unit is manufactured by sealing the relatively weak portion, i.e., the space between the sleeve and the upper and lower plates, in which particles such as dust or foreign substances can be scattered from the inside to the outside of the heating body of the heater unit, in the sealed structure, so that the cleanliness management in the heat treatment furnace chamber in the heat treatment process can be realized, and there is an advantage in that a high-yield and high-quality substrate can be manufactured.
In addition, the present invention can reduce the time required for cooling by increasing the cooling rate in the substrate heat treatment process requiring cooling by forming the cooling duct in the heater unit, thereby having the effects of reducing the heat treatment process time and increasing the productivity of manufacturing the substrate.
Although the present invention has been described with reference to one embodiment shown in the drawings, the present invention is not limited to the embodiment, and modifications and variations can be made within a scope not departing from the gist of the present invention, which belong to the technical idea of the present invention.
Claims (5)
1. A heater unit of a heat treatment furnace, comprising:
a sleeve mounted on one end of an upper plate and a lower plate for guiding the heating wire to be exposed to the outside, wherein a heating element is sandwiched between the upper plate and the lower plate and is combined with the upper side and the lower side in a sandwich structure;
sleeve fixing blocks located at upper and lower sides of the sleeve and respectively installed at one end portion to improve a sealing degree between the upper and lower plates, thereby suppressing generation of particles due to friction between the upper and lower plates; and
and a cooling means which is attached to the heater unit and flows a cooling fluid on an outer side.
2. The heater unit of heat treatment furnace according to claim 1, wherein the sleeve is formed in a cylindrical shape in order to minimize a gap between the sleeve and the upper and lower plates, and the sleeve fixing block is formed with a semicircular groove at a corresponding position for coupling the sleeve in order to allow the sleeves to be closely coupled.
3. The heater unit of heat treatment furnace as claimed in claim 1, wherein the sleeve fixing blocks are divided into upper side sleeve fixing blocks and lower side sleeve fixing blocks, and the upper side sleeve fixing blocks and the lower side sleeve fixing blocks have semicircular grooves at corresponding positions so that the respective circular sleeves can be closely guided and combined.
4. The heater unit of the heat treatment furnace according to claim 1, wherein the cooling means is constituted by a cooling pipe which is in close contact with the surface of the lower plate and through which a cooling fluid flows.
5. The heater unit of heat treatment furnace as claimed in claim 1, wherein the cooling means further has a cooling air flowing hole formed at the lower plate and flowing a cooling fluid flowing along a cooling pipe and triggering a heating body.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2021-0061427 | 2021-05-12 | ||
| KR1020210061427A KR102551053B1 (en) | 2021-05-12 | 2021-05-12 | Heater unit of heat treatment oven |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115340301A true CN115340301A (en) | 2022-11-15 |
| CN115340301B CN115340301B (en) | 2024-04-19 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110761476.7A Active CN115340301B (en) | 2021-05-12 | 2021-07-06 | Heater unit of heat treatment furnace |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7256243B2 (en) |
| KR (1) | KR102551053B1 (en) |
| CN (1) | CN115340301B (en) |
| TW (1) | TWI827943B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102559562B1 (en) * | 2021-03-11 | 2023-07-27 | 주식회사 한국제이텍트써모시스템 | Heat treatment oven exhaust duct integrated heater unit |
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Also Published As
| Publication number | Publication date |
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| JP2022176039A (en) | 2022-11-25 |
| TW202244445A (en) | 2022-11-16 |
| CN115340301B (en) | 2024-04-19 |
| TWI827943B (en) | 2024-01-01 |
| KR20220154302A (en) | 2022-11-22 |
| KR102551053B1 (en) | 2023-07-05 |
| JP7256243B2 (en) | 2023-04-11 |
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