CN115337803A - Full-automatic safe fluorine/inert gas dynamic mixing system - Google Patents
Full-automatic safe fluorine/inert gas dynamic mixing system Download PDFInfo
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- CN115337803A CN115337803A CN202211039008.XA CN202211039008A CN115337803A CN 115337803 A CN115337803 A CN 115337803A CN 202211039008 A CN202211039008 A CN 202211039008A CN 115337803 A CN115337803 A CN 115337803A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/14—Mixing gases with gases with moving mixing elements, e.g. with liquid seal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2111—Flow rate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/213—Measuring of the properties of the mixtures, e.g. temperature, density or colour
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
Abstract
The invention provides a full-automatic safe fluorine/inert gas dynamic mixing system, which comprises: a fluorine gas supply device and a gas distribution device; the fluorine gas supply device comprises: a fluorine gas supply unit; a first inert gas supply unit; a first buffer tank communicated with the fluorine gas supply unit and the first inert gas supply unit, respectively; a second buffer tank in communication with the first buffer tank; the controller is arranged between the first buffer tank and the second buffer tank; a fluorine gas outlet and an absorption tank which are communicated with the second buffer tank; the air distribution device comprises: a second inert gas supply unit; a first flowmeter arranged on the pipeline of the second inert gas supply unit; a fluorine gas input port in communication with the fluorine gas output port; a second flow meter arranged on the fluorine gas input pipeline; a gas mixing tank respectively communicated with the second inert gas supply unit and the fluorine gas input port; and a mixed gas output port communicated with the mixed gas tank.
Description
Technical Field
The invention relates to the field of fluorine-nitrogen mixing and gas distribution, in particular to a full-automatic safe dynamic fluorine/inert gas mixing system.
Background
At present, the fluorine-nitrogen mixed gas is an important raw material in the field of fine chemical engineering, is widely applied to the fields of electronics, laser technology, medical plastics and the like, and can be used for surface passivation treatment of glass etching, metal materials, pipelines and the like. When the fluorine-nitrogen mixed gas is prepared, a static gas distribution method is usually adopted to mix high-purity fluorine gas and nitrogen gas so as to obtain a finished fluorine-nitrogen mixed gas with a preset concentration. However, in the prior art, due to the danger of fluorine gas preparation, there is no related art of dynamically mixing nitrogen gas in the fluorine gas preparation process.
Disclosure of Invention
The invention provides a full-automatic safe fluorine/inert gas dynamic mixing system, which can effectively solve the problems.
The invention is realized by the following steps:
the invention provides a full-automatic safe fluorine/inert gas dynamic mixing system, which comprises: a fluorine gas supply device and a gas distribution device; wherein, the first and the second end of the pipe are connected with each other,
the fluorine gas supply device comprises:
a fluorine gas supply unit;
a first inert gas supply unit;
a first buffer tank communicating with the fluorine gas supply unit and the first inert gas supply unit, respectively;
a second buffer tank in communication with the first buffer tank;
a controller disposed between the first buffer tank and the second buffer tank;
a fluorine gas outlet and an absorption tank which are communicated with the second buffer tank;
the air distribution device comprises:
a second inert gas supply unit;
a first flow meter provided on the second inert gas supply unit pipe;
a fluorine gas input in communication with said fluorine gas output;
a second flow meter disposed in said fluorine gas inlet line;
a gas mixing tank respectively communicated with the second inert gas supply unit and the fluorine gas input port; and
and the mixed gas output port is communicated with the mixed gas tank.
The invention has the beneficial effects that: according to the fully-automatic safe dynamic fluorine/inert gas mixing system, the fluorine gas supply device and the gas distribution device are matched with each other, so that a stable fluorine gas and inert gas source can be provided, the subsequent dynamic mixing and gas distribution are more accurate, and the fully-automatic safe dynamic fluorine/inert gas mixing system is suitable for industrial production. In addition, the first inert gas supply unit and the second inert gas supply unit are arranged, so that air and water vapor are prevented from remaining in the gas mixing tank, and the danger generated during gas mixing and distribution is reduced.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a fluorine gas supply device in a fully automatic and safe dynamic fluorine/inert gas mixing system according to an embodiment of the present invention.
Fig. 2 is a flowchart of a method for controlling the fluorine gas supply device in the fully automatic and safe dynamic fluorine/inert gas mixing system according to the embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a gas distribution device in a fully automatic and safe fluorine/inert gas dynamic mixing system according to an embodiment of the present invention.
Fig. 4 is a partial schematic structural diagram of a gas mixing tank in a gas distribution device of the fully automatic and safe fluorine/inert gas dynamic mixing system according to the embodiment of the present invention.
Fig. 5 is a flowchart of a control method of the gas distribution device in the fully automatic and safe fluorine/inert gas dynamic mixing system according to the embodiment of the present invention.
Fig. 6 is a schematic structural diagram of a fully automatic and safe dynamic fluorine/inert gas mixing system according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the following detailed description of the embodiments of the present invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be obtained by a person skilled in the art without inventive efforts based on the embodiments of the present invention, are within the scope of protection of the present invention.
In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
Referring to fig. 1 and 6, an embodiment of the present invention provides a fully automatic and safe dynamic fluorine/inert gas mixing system, including: a fluorine gas supply device; and a gas distribution device.
Wherein the fluorine gas supply device comprises:
a fluorine gas supply unit 10;
a first nitrogen gas supply unit 11;
a first buffer tank 12 communicating with the fluorine gas supply unit 10 and the first nitrogen gas supply unit 11, respectively;
a second buffer tank 15 communicating with the first buffer tank 12;
a controller 13 disposed between the first buffer tank 12 and the second buffer tank 15;
a fluorine gas outlet 17 and an absorption tank 16 communicating with the second buffer tank 15.
The fluorine gas supply unit 10 is an on-site fluorine production device, for example, a hydrogen fluoride electrolytic cell. The type of the hydrogen fluoride electrolyzer is not limited as long as a stable fluorine gas source can be provided. For example, the Chinese patent application No. CN202110221655.1, application No. 2021-02-27, entitled "novel electrolytic cell for hydrogen fluoride electrolysis" can provide a stable fluorine gas source. Specifically, the novel electrolytic cell can provide a stable fluorine gas source with a volume concentration of about 92% with 7% as HF gas and the rest as water vapor by controlling the electrolytic reaction. The so-called "dynamic mixing system" of the present invention is also different from the conventional "static mixing" in that: the dynamic mixing is to directly mix the fluorine gas prepared in the preparation electrolytic bath with nitrogen or other inert gases; static mixing generally refers to mixing pure fluorine gas stored in a gas storage tank with nitrogen or other inert gas. In contrast to static mixing, the pressure and concentration of the gas produced by dynamic mixing change from time to time, and therefore it is difficult to dynamically control the gas to have a consistent concentration.
As a further modification, the fluorine gas supply unit 10 may further include a pressure sensor provided in the piping and the first online analysis detection unit 101. The pressure sensor is used for detecting the pressure of the fluorine gas supply unit 10, and the first online analysis detection unit 101 is used for detecting the concentration of the fluorine gas.
The first nitrogen gas supply unit 11 is mainly used for exhausting air and moisture in the subsequent pipelines and the first buffer tank 12 and the second buffer tank 15, and preventing the overheating of the fryer or the local pipelines. Since fluorine and hydrogen fluoride react with oxygen and water vapor in the air violently, it is necessary to clean the air and water vapor in the subsequent pipes and the first buffer tank 12 and the second buffer tank 15. Specifically, the first nitrogen gas supply unit 11 may be opened to flush the subsequent line and the first buffer tank 12 and the second buffer tank 15 before the fluorine gas enters. As a further modification, the nitrogen gas in the first nitrogen gas supply unit 11 is high-purity nitrogen gas. In other embodiments, the first nitrogen gas supply unit 11 may further include a second online analysis detection unit 111 for acquiring the concentration of the nitrogen gas. The first nitrogen gas supply unit 11 may be replaced with another inert gas supply unit.
The first buffer tank 12 is used for temporarily storing the entering nitrogen and preventing the generation of turbulent flow. The pressure of the first buffer tank 12 needs to be strictly controlled to prevent the fluorine gas from flowing back, that is, flowing back to the hydrogen fluoride electrolytic cell due to an excessive pressure, thereby causing a risk. Specifically, the pressure of the first buffer tank 12 needs to be slightly lower than the pressure of the fluorine gas supply unit 10. In general, the pressure of the fluorine gas supply unit 10 is slightly higher than the atmospheric pressure, and therefore, the pressure of the first buffer tank 12 needs to be controlled to be lower than the atmospheric pressure. Specifically, the controller 13 may control the first buffer tank 12 to be in a negative pressure state in accordance with the opening degrees of the first valve 102 and the second valve 121 disposed on both sides of the first buffer tank 12. The material of the first buffer tank 12 is treated by some anticorrosion material or process, which will not be described again. As a further improvement, the first buffer tank 12 further comprises a first pressure sensor 122 for monitoring the pressure in the tank in real time.
The controller 13 is configured to bring the second buffer tank 15 to a preset pressure. The controller 13 needs to be a corrosion-resistant controller. As a further modification, the fluorine gas supply device may further include a cooling unit 14 for cooling the controller 13. The cooling unit 14 is not suitable for water cooling and other systems, but needs a liquid nitrogen cooling system, so that the liquid nitrogen cooling system can prevent fluorine gas from being diluted after the controller 13 is corroded and damaged, and the danger is prevented from being enlarged.
The second buffer tank 15 is used for storing fluorine gas and ensuring that the fluorine gas has a stable output pressure. To prevent this from occurring dangerously during mixing, the pressure in the second buffer vessel 15 should not be too high. Of course, if the pressure is too small, a higher concentration of the mixed gas cannot be obtained. Specifically, the pressure of the second buffer tank 15 needs to be controlled to be 1MPa or less and one atmosphere or more. Preferably, the pressure of the second buffer tank 15 is 0.2MPa or more and 0.8MPa or less. In one embodiment, the pressure of the second buffer tank 15 is about 0.5MPa. As a further improvement, the second buffer tank 15 further comprises a second pressure sensor 151 for monitoring the pressure in the tank in real time. The material of the second buffer tank 15 is treated by some anticorrosive material or process, which will not be described again. The second buffer tank 15 is connected to the fluorine gas outlet 17 to output stable fluorine gas.
The absorber 16 is provided between the second buffer tank 15 and the fluorine gas outlet 17, and absorbs corrosive gas such as fluorine gas or hydrogen fluoride. Specifically, when the first nitrogen gas supply unit 11 purges the inside of the pipeline, the absorption tank 16 may be opened for absorption. As a further improvement, a third online analysis and detection unit 161 is further disposed between the absorption tank 16 and the second buffer tank 15, and is used for detecting the purged gas, and determining whether the water vapor and air content in the pipeline are lower than set values, otherwise, nitrogen purging is performed sufficiently to know that the requirements are met. Specifically, the water vapor content in the pipeline needs to be lower than 0.1% by volume.
Referring to fig. 2, the present invention further provides a method for controlling the fluorine gas supply device, which comprises the following steps:
s1, opening a first nitrogen supply unit 11 to blow a pipeline, simultaneously opening an absorption groove 16 to absorb, detecting the gas concentration in the pipeline in real time, finishing blowing when the water vapor concentration is lower than a water vapor set value, and entering a step S2;
s2, opening the controller 13 to make the pressure in the first buffer tank 12 lower than the pressure of the fluorine gas supply unit 10;
s3, opening the fluorine gas supply unit 10 to supply a continuous fluorine gas, storing the continuous fluorine gas in the first buffer tank 12, while maintaining the pressure in the first buffer tank 12 lower than the pressure of the fluorine gas supply unit 10;
and S4, opening the controller 13 to compress the fluorine gas in the first buffer tank 12 into the second buffer tank 15, and controlling the pressure of the second buffer tank 15 to be less than or equal to 1MPa and more than or equal to one atmosphere.
In step S1, the third online analysis and detection unit 161 may be turned on to detect the gas in the purging process, and determine whether the water vapor and air content in the pipeline are lower than the set values, in one embodiment, the purging is finished when the water vapor concentration is lower than 0.1% by volume. As a further improvement, the method may further include:
the second online analysis detection unit 111 is turned on to detect the concentration of nitrogen, and when the concentration of nitrogen is lower than a set value, an alarm is given. Generally, it is necessary to purge the gas with high-purity nitrogen gas having a purity of 99.99% or more.
In step S2, since the pressure in the first buffer tank 12 is lower than the pressure of the fluorine gas supply unit 10, the fluorine gas of the fluorine gas supply unit 10 can automatically flow to the first buffer tank 12 to be stored, so that an additional controller is not required. However, the pressure in the first buffer tank 12 cannot be too low, which would result in an imbalance of pressure in the fluorine gas supply unit 10 and thus in the fluorine supplyThe fluorine gas and the hydrogen gas in the gas supply unit 10 are mixed and explode. Therefore, it is preferable to define the pressure of the fluorine gas supply unit 10 as P 1 Pressure P of the first buffer tank 12 2 Wherein, P 1 >P 2 ≧0.8*P 1 . Preferably, 0.95 × p 1 ≧P 2 ≧0.8*P 1 . In one embodiment, P 2 ＝0.9*P 1 。
As a further improvement, in step S2, the method may further include:
and turning on the cooling unit 14 to cool the controller 13.
In step S3, in the continuous fluorine gas production process, the concentration of the generated fluorine gas can be controlled to about 92% and 7% of the stable fluorine gas source is HF gas and the others are water vapor.
As a further improvement, in step S3, the method may further include:
the first online analysis detection unit 101 is turned on to detect the concentration of the fluorine gas, and when the concentration of the fluorine gas has large deviation, the fluorine gas is fed back to the on-site fluorine generating device to be adjusted in time. The first online analysis and detection unit 101 is a prior art and will not be described in detail here.
In step S4, the pressure of the second buffer tank 15 is preferably maintained to be equal to or higher than 0.2MPa and equal to or lower than 0.8MPa. In one embodiment, the pressure of the second buffer tank 15 is about 0.5MPa.
In step S4, as a further improvement,
the third online analysis and detection unit 161 is further turned on to detect the fluorine gas concentration, and when the fluorine gas concentration reaches the initial concentration, the absorption tank 16 is switched to the fluorine gas output port 17 to stably output the fluorine gas.
Referring to fig. 3 to 4, the air distribution apparatus includes:
a second inert gas supply unit 20;
a first flow meter 21 disposed on a pipe of the second inert gas supply unit 20;
a fluorine gas inlet 23 in communication with the fluorine gas outlet 17;
a second flow meter 24 disposed in the line of the fluorine gas input port 23;
a gas mixing tank 22 communicating with the second inert gas supply unit 20 and the fluorine gas input port 23, respectively; and
and a mixed gas output port 26 communicated with the mixed gas tank 22.
The second inert gas supply unit 20 is for supplying inert gas to be mixed. The inert gas may be nitrogen or a rare gas such as helium, neon, argon, krypton, xenon, radon, or the like. In one embodiment, the inert gas is nitrogen.
The first flow meter 21 is disposed on the pipe of the second inert gas supply unit 20, and is used for measuring the introduction amount of the inert gas. The first flow meter 21 is a conventional art, and will not be described in detail herein.
The second flow meter 24 is arranged on the pipeline of the fluorine gas input port 23 and is used for metering the input amount of fluorine gas. The second flow meter 24 is also prior art and will not be described again here.
The gas mixing tank 22 includes:
a horizontal tank 220;
an inert gas inlet pipe 221 provided at one side of the horizontal tank 220 and communicating with the second inert gas supply unit 20;
a fluorine gas inlet pipe 222 arranged at the top of the horizontal tank 220 and communicated with the fluorine gas inlet port 23;
the rotating shaft 223 transversely arranged in the horizontal tank 220 and a motor driving the rotating shaft to rotate are not shown in the figure;
and a rotary blade 224 disposed on the rotary shaft 223.
One side of the rotary shaft 223 is opened so that the inert gas inlet pipe 221 is extended into the rotary shaft 223. Further, a plurality of gas outlet holes 2232 are formed in the rotating shaft 223 at two sides corresponding to the rotating blades 224, and the inert gas is discharged from the gas outlet holes 2232 and mixed with the fluorine gas for gas distribution. Preferably, the air outlet holes 2232 are arranged in one-to-one correspondence with the blades of the rotating blades 224. Since a part of hydrogen fluoride gas is mixed in the fluorine gas in this case, it has a strong corrosion performance, and corrodes both the rotating shaft 223 and the rotating blade 224. In this case, the inert gas inlet pipe 221 is extended into the rotating shaft 223, and is exhausted from two sides of the rotating blade 224 on the rotating shaft 223, and the inert gas can partially cover the rotating shaft 223 and the rotating blade 224, thereby preventing fluorine gas from corroding the surface of the rotating blade. With the rotation of the rotating blade 224, after the fluorine gas and the inert gas are fully mixed on the side wall of the horizontal tank 220, the corrosion performance is remarkably reduced, and the service life of the stirring device is further remarkably prolonged. The mixing ratio of the fluorine gas and the inert gas can be controlled according to actual requirements, for example, the gas amount introduced is controlled by a flowmeter.
The number of the rotary blades 224 is not limited, and may be 1 to 5 groups. In one embodiment, 3 sets of the rotating blades 224 are included.
As a further improvement, the gas distribution apparatus further includes a fourth online analysis detection unit 27, configured to analyze whether the mixed gas meets a requirement, if yes, the mixed gas is stably output through the mixed gas output port 26, and otherwise, the mixed gas is evacuated and recycled to the absorption tank 16 through the evacuation pipeline 25.
Referring to fig. 5, the present invention further provides a method for controlling the valve actuating apparatus, including the following steps:
s10, opening the second inert gas supply unit 20 to fill inert gas into the gas mixing tank 22 for purging, simultaneously opening the absorption tank 16 for absorption, detecting the gas concentration in the pipeline in real time during the period, finishing purging when the water vapor concentration is lower than the water vapor set value, and entering the step S20;
and S20, opening the fluorine gas input port 23, filling the fluorine gas into the gas mixing tank 22, controlling the introduction ratio of each gas through the first flow meter 21 and the second flow meter 24, and switching to a mixed gas output port 26 to output when the ratio of the fluorine gas to the inert gas is at a set value.
In step S10, the fourth online analysis detecting unit 27 may be turned on to detect the gas in the purging process, and determine whether the water vapor and air content in the gas-mixing tank 22 are lower than the set values, in one embodiment, the purging is finished when the water vapor concentration is lower than 0.1% by volume.
In step S20, since the inert gas is pre-charged into the gas mixing tank 22, in order to quickly reach the preset ratio of the mixed gas, the charging ratio of the fluorine gas may be increased and/or the ratio of the inert gas may be decreased at the initial stage of mixing. Specifically, the preset ratio of the mixed gas is defined as A: and B, wherein A is the fluorine gas introduction ratio, and B is the nitrogen gas introduction ratio. Under an ideal state, the flow meter is required to accurately control the input amount to be A and B respectively. However, since the inert gas is pre-charged into the mixed gas tank 22, the ratio of the fluorine gas may be appropriately increased, for example, 1.05A to 1.2A of fluorine gas is introduced; and/or reducing the proportion of nitrogen, for example, introducing 0.90-0.95A of nitrogen, so that the proportion of the mixed gas quickly reaches the preset proportion. And when the preset ratio is reached, switching to a mixed gas output port 26 for output, and controlling the introduction amount of the fluorine gas and the nitrogen gas to be in an ideal ratio A and an ideal ratio B.
It can be understood that the danger of fluorine gas generated in the process of dynamic mixing gas distribution can be obviously reduced by the device and the control method thereof.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. A fully automatic and safe fluorine/inert gas dynamic mixing system comprises: a fluorine gas supply device and a gas distribution device; wherein the content of the first and second substances,
the fluorine gas supply device comprises:
a fluorine gas supply unit;
a first inert gas supply unit;
a first buffer tank communicating with the fluorine gas supply unit and the first inert gas supply unit, respectively;
a second buffer tank in communication with the first buffer tank;
a controller disposed between the first buffer tank and the second buffer tank;
a fluorine gas outlet and an absorption tank which are communicated with the second buffer tank;
the air distribution device comprises:
a second inert gas supply unit;
a first flow meter provided on the second inert gas supply unit pipe;
a fluorine gas input in communication with said fluorine gas output;
a second flow meter disposed in said fluorine gas inlet line;
a gas mixing tank respectively communicated with the second inert gas supply unit and the fluorine gas input port; and
and the mixed gas output port is communicated with the mixed gas tank.
2. The fully automatic and safe dynamic fluorine/inert gas mixing system according to claim 1, wherein the second inert gas supply unit is used for supplying inert gas to be mixed, the inert gas comprising at least one of nitrogen, helium, neon, argon, krypton, xenon, radon.
3. The fully automatic and safe dynamic fluorine/inert gas mixing system according to claim 1, wherein the gas mixing tank comprises:
a horizontal tank body;
the inert gas inlet pipe is arranged on one side of the horizontal tank body and communicated with the second inert gas supply unit;
the fluorine gas inlet pipe is arranged at the top of the horizontal tank body and is communicated with the fluorine gas inlet;
the rotating shaft transversely arranged in the horizontal tank body and a motor for driving the rotating shaft to rotate are not shown in the drawing;
and the rotating blade is arranged on the rotating shaft.
4. The fully automatic and safe dynamic fluorine/inert gas mixing system as claimed in claim 3, wherein the rotating shaft is opened at one side thereof so that the inert gas inlet pipe is extended into the inside of the rotating shaft.
5. The fully automatic and safe dynamic fluorine/inert gas mixing system according to claim 1, wherein the pressure of the second buffer tank is maintained smoothly within a range of 0.2MPa or more and 0.8MPa or less.
6. The fully automatic, safety type dynamic fluorine/inert gas mixing system according to claim 1, wherein the pressure of said fluorine gas supply unit is defined as P 1 Pressure P of said first buffer tank 2 Wherein P is 1 >P 2 ≧0.8*P 1 。
7. The fully automatic and safe dynamic fluorine/inert gas mixing system according to claim 1, further comprising a cooling unit for cooling said controller.
8. The fully automatic, safe dynamic fluorine/inert gas mixing system according to claim 1, wherein the fluorine gas supply unit further comprises a pressure sensor disposed in the pipeline and a first on-line analyzing and detecting unit.
9. The fully automatic and safe dynamic fluorine/inert gas mixing system as claimed in claim 1, wherein the gas distribution device further comprises a fourth online analysis and detection unit for analyzing whether the mixed gas meets the requirement.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116272727A (en) * | 2023-03-10 | 2023-06-23 | 福建德尔科技股份有限公司 | Process and apparatus for producing hexafluoroethane |
| CN116272727B (en) * | 2023-03-10 | 2024-04-05 | 福建德尔科技股份有限公司 | Process and apparatus for producing hexafluoroethane |
| CN116422222A (en) * | 2023-06-13 | 2023-07-14 | 福建德尔科技股份有限公司 | Flow control system for automatically mixing fluorine gas and nitrogen gas |
| CN116422222B (en) * | 2023-06-13 | 2023-09-01 | 福建德尔科技股份有限公司 | Flow control system for automatically mixing fluorine gas and nitrogen gas |
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| CN115337803B (en) | 2023-03-31 |
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