CN115326364A

CN115326364A - Pose adjusting system for collimating objective and wavefront analyzer

Info

Publication number: CN115326364A
Application number: CN202210966428.6A
Authority: CN
Inventors: 孙明睿; 武震; 王勇威; 曹惠姗
Original assignee: Beijing Semiconductor Equipment Institute
Current assignee: Beijing Semiconductor Equipment Institute
Priority date: 2022-08-12
Filing date: 2022-08-12
Publication date: 2022-11-11

Abstract

The application provides a position appearance adjustment system for collimating objective and wavefront analysis appearance, wherein, this position appearance adjustment system includes laser instrument, light path conduction subassembly and light path correction board, be provided with the light trap on the light path correction board, wherein, the laser instrument is arranged in optical platform's first position department, and wavefront analysis appearance arranges in optical platform's second position department, and the light path correction board arranges in the third position department between light path conduction subassembly and wavefront analysis appearance, and wherein, the laser beam of laser instrument transmission passes through the conduction of light path conduction subassembly, projects on the target surface of wavefront analysis appearance via the light trap on the light path correction board and collimating objective, in order to form the facula on the target surface, according to the facula position of facula on the target surface, adjusts collimating objective's installation angle to make the optical axis of collimating objective coincide with the optical axis of wavefront analysis appearance. The effect of accurately adjusting the collimator objective lens mounted on the wavefront analyzer based on the received light of the collimator objective lens is achieved.

Description

Pose adjusting system for collimating objective and wavefront analyzer

Technical Field

The application relates to the technical field of optical correction, in particular to a pose adjusting system for a collimating objective and a wavefront analyzer.

Background

At present, with the continuous reduction of the chip characteristic size in the integrated circuit industry, the performance requirement on an exposure system is continuously improved, and the aberration control of a projection objective is directly related to the line width quality of an exposure pattern, so that the main performance parameters of the projection objective need to be detected off-line or on-line to ensure that the equipment process requirement is met; the main detection parameters include wave aberration, distortion, magnification, astigmatism, IPD (Integrated Product Development, and Numerical Aperture (NA) of an optical system, and Numerical Aperture (NA) consistency, and the like.

The measuring sensor uses a Hartmann sensor, after light is refracted and condensed by an objective lens, the light needs to be collimated by a collimating objective lens, then passes through a micro-lens array of the Hartmann sensor and is respectively focused on a CCD (Charge-coupled Device) target surface. In order to realize the measurement precision, the relative position of the collimator objective and the wavefront analyzer needs to be corrected first, and the system error caused by the inclination of the collimator objective is eliminated.

When the installation position of the collimating objective lens is corrected, on one hand, the wave aberration fluctuation of an off-axis field is large, which may cause measurement sensitivity errors, and on the other hand, when the image point of the measured objective lens is butted, the posture of the wavefront analyzer is difficult to accurately position to the calibrated image point position of the collimating objective lens, and when the telecentric degree of the measured objective lens is large, the condition that the image point light cone cannot be completely received is brought.

Disclosure of Invention

In view of this, an object of the present application is to provide a pose adjusting system for a collimator objective and a wavefront analyzer, which can ensure that an optical axis of a received light of the collimator objective is perpendicular to a target surface of the wavefront analyzer by adjusting positions of a laser, a light path conducting assembly and a light path correcting plate, and solve problems that in the prior art, when an installation position of the collimator objective is corrected, on one hand, fluctuation of a wave aberration of an off-axis field is large, which may cause a measurement sensitivity error, and on the other hand, when an image point of a measured object is butted, a pose of the wavefront analyzer is difficult to be accurately positioned to a calibrated position of the image point of the collimator objective, and when a telecentricity of the measured object is large, a light cone of the image point cannot be completely received, so that an effect of accurately adjusting the collimator objective installed on the wavefront analyzer based on the received light of the collimator objective is achieved.

The embodiment of the application provides a position appearance adjustment system for collimating objective and wavefront analyzer, position appearance adjustment system includes laser instrument, light path conduction subassembly and light path correcting plate, be provided with the light trap on the light path correcting plate, wherein, the laser instrument is arranged in optical platform's first position department, wavefront analyzer arranges in optical platform's second position department, light path conduction subassembly arranges between laser instrument and wavefront analyzer, light path correcting plate arranges in the third position department between light path conduction subassembly and wavefront analyzer, collimating objective adjustable installation is in the one side of being close to the light path correcting plate of wavefront analyzer, the light trap on the light path correcting plate is located the focus of collimating objective and is located the position, wherein, the laser beam that the laser instrument sent passes through the conduction of light path conduction subassembly, via light trap and the collimating objective on the light path correcting plate project on the target surface of wavefront analyzer on the target surface, in order to form the facula on the target surface, according to facula position on the target surface, the installation angle of collimating objective is adjusted to make the optical axis of collimating objective coincide with the optical axis of wavefront analyzer.

Optionally, the optical path conducting assembly includes a laser beam expander, an abbe prism and a laser focusing mirror, wherein the laser beam expander is arranged at a fourth position of the optical platform, a laser beam emitted by the laser is expanded by the laser beam expander and then is projected onto a target surface of the wavefront analyzer without the collimator objective lens, a light spot is formed on the target surface, an installation angle of the laser beam expander is adjusted according to a position of the light spot on the target surface of the light spot, so that an optical axis of the laser beam expander coincides with an optical axis of the wavefront analyzer, wherein the abbe prism is arranged at a fifth position of the optical platform, the fifth position is located between the fourth position and the wavefront analyzer and is close to the fourth position, and the laser beam expanded by the adjusted laser beam expander is emitted to an incident plane of the abbe prism, the laser beam emitted by the exit plane of the Abbe prism after being reflected by the Abbe prism is projected to a target surface of a wavefront analyzer without a collimating objective lens to form a light spot, the installation angle of the Abbe prism is adjusted according to the position of the light spot on the target surface so that the optical axis of the Abbe prism is coincided with the optical axis of the wavefront analyzer, the laser focusing mirror is arranged at a sixth position of the optical platform, the sixth position is located between the fifth position and the wavefront analyzer, the laser beam emitted by the exit plane of the Abbe prism after being adjusted is projected to the target surface of the wavefront analyzer without the collimating objective lens through the laser focusing mirror, and the installation angle of the laser focusing mirror is adjusted so that the optical axis of the laser focusing mirror is coincided with the optical axis of the laser beam after being reflected by the Abbe prism.

Optionally, the pose adjusting system further includes a flat crystal and an autocollimator, the flat crystal is disposed on a first side surface of the laser focusing plate facing the autocollimator, the laser focusing plate is located above the laser focusing mirror, a second side surface of the laser focusing plate is fixedly connected to an edge of the laser focusing mirror, a setting height of the flat crystal is higher than a height of an upper edge of the wavefront analyzer, the autocollimator is disposed at a seventh position of the optical platform, the seventh position is located on the other side of the wavefront analyzer away from the laser, the setting height of the autocollimator disposed at the seventh position is higher than the height of the upper edge of the wavefront analyzer, and the autocollimator is configured to detect an installation angle of any plane in front of the wavefront analyzer, where a test light emitted by the autocollimator irradiates the flat crystal and receives a feedback light reflected by the flat crystal, and the installation angle of the laser focusing plate is adjusted to coincide the test light with the feedback light, so that an optical axis of the laser focusing mirror on the laser focusing plate coincides with an optical axis of a laser beam reflected by the abbe prism.

Optionally, the pose adjustment system further includes an autocollimator, and the autocollimator performs correction in the following manner: after a laser focusing mirror is not arranged on the optical platform and the optical axis of the Abbe prism is adjusted to be coincident with the optical axis of the wavefront analyzer, test light emitted by the autocollimator irradiates the emergent plane of the Abbe prism, receives feedback light reflected by the emergent plane of the Abbe prism, and adjusts the installation angle of the autocollimator on the optical platform so that the test light of the autocollimator is coincident with the feedback light.

Optionally, the pose adjusting system further includes an autocollimator, and an installation angle of the optical path correction plate is corrected in the following manner: the test light emitted by the autocollimator irradiates the light path correction plate, receives the feedback light reflected by the light path correction plate, and adjusts the installation angle of the light path correction plate to make the test light coincide with the feedback light.

Optionally, the pose adjusting system further includes a micro-motion device, the optical path correcting plate is installed on the micro-motion device, the micro-motion device is arranged at a third position of the optical platform, the optical path correcting plate is provided with a plurality of light transmitting holes, the size of each light transmitting hole is different, the laser focusing lens is removed, the micro-motion device is controlled to move so as to drive the optical path correcting plate to move, so that each light transmitting hole on the optical path correcting plate sequentially moves to a position where a focus of the collimating objective lens is located according to a sequence from large to small, and during each movement, the installation angle of the optical path correcting plate is adjusted, so that a laser beam emitted from an exit plane of the abbe prism is located at the center of the target surface of the wavefront analyzer through the light transmitting holes on the optical path correcting plate.

Optionally, the laser focusing mirror is arranged at the sixth position of the optical platform again, and the installation angle of the laser focusing mirror is adjusted so that the optical axis of the laser focusing mirror coincides with the optical axis of the laser beam reflected by the abbe prism.

Optionally, the pose adjusting system further includes a lens holder and an adjusting screw, the collimator objective is mounted on the wavefront analyzer through the lens holder, and the adjusting screw is used for adjusting a mounting angle of the collimator objective relative to the wavefront analyzer, so that an optical axis of the collimator objective coincides with an optical axis of the wavefront analyzer.

Optionally, the adjusting screw is adjusted according to an offset between a position of the light spot on the target surface and a center of the target surface of the wavefront analyzer, so that an optical axis of the collimator objective coincides with an optical axis of the wavefront analyzer.

Optionally, the outer wall of the lens holder is provided with an internal thread, and the inner wall of the wavefront analyzer is provided with an external thread screwed with the internal thread of the lens holder, so that the collimator objective lens is mounted on the wavefront analyzer through the lens holder.

The position and posture adjusting system for the collimating objective and the wavefront analyzer can ensure that the optical axis of the received light of the collimating objective is perpendicular to the target surface of the wavefront analyzer by adjusting the positions of the laser, the light path conducting component and the light path correcting plate, and solves the problems that in the prior art, when the mounting position of the collimating objective is corrected, on one hand, the fluctuation of the wave aberration of an off-axis field is large, and the measurement sensitivity error can be caused, on the other hand, when the image point of a measured objective is butted, the posture of the wavefront analyzer is difficult to be accurately positioned to the calibrated position of the image point of the collimating objective, and when the tested objective has large telecentricity, the image point light cone cannot be completely received, so that the effect of accurately adjusting the collimating objective mounted on the wavefront analyzer based on the received light of the collimating objective is achieved.

In order to make the aforementioned objects, features and advantages of the present application more comprehensible, preferred embodiments accompanied with figures are described in detail below.

Drawings

To more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and those skilled in the art can also obtain other related drawings based on the drawings without inventive efforts.

Fig. 1 is a schematic diagram of a pose adjustment system for a collimator objective and a wavefront analyzer according to an embodiment of the present disclosure;

fig. 2 is a schematic view of another pose adjustment system for a collimator objective and a wavefront analyzer according to an embodiment of the present disclosure;

fig. 3 is a schematic structural diagram of a connection relationship between a collimator objective lens and a wavefront analyzer according to an embodiment of the present disclosure;

fig. 4 is a schematic structural diagram of a connection relationship between a collimator objective lens and a wavefront analyzer according to an embodiment of the present disclosure.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. Every other embodiment that can be obtained by a person skilled in the art without making creative efforts based on the embodiments of the present application falls within the protection scope of the present application.

First, an application scenario to which the present application is applicable will be described. The method can be applied to the technical field of optical correction.

Research shows that as the characteristic size of chips in the integrated circuit industry is continuously reduced, the performance requirement on an exposure system is continuously improved, and aberration control of a projection objective is directly related to the line width quality of an exposure pattern, so that main performance parameters of the projection objective need to be detected off-line or on-line to ensure that the equipment process requirement is met; the main detection parameters include wave aberration, distortion, magnification, astigmatism, IPD (Integrated Product Development, and Numerical Aperture (NA) of an optical system, and Numerical Aperture (NA) consistency, and the like.

Based on this, the embodiment of the application provides a position and orientation adjustment system for a collimator objective and a wavefront analyzer, and achieves the effect of accurately adjusting the collimator objective installed on the wavefront analyzer based on the received light of the collimator objective.

Referring to fig. 1, fig. 1 is a schematic diagram of a pose adjusting system for a collimator objective and a wavefront analyzer according to an embodiment of the present disclosure. As shown in fig. 1, a pose adjustment system provided in an embodiment of the present application includes: an optical platform 101, a laser 102, an optical path conducting component 103, an optical path correcting plate 104, a collimator objective 105 and a wavefront analyzer 106.

Wherein, the laser 102 is arranged at a first position of the optical platform 101, and a position fixing member is arranged at the first position of the optical platform 101 for fixing the laser 102 and adjusting the height of the laser 102 to a standard height.

The wavefront analyzer 106 is disposed at a second position of the optical platform 101, and a position fixing member is disposed at the first position of the optical platform 101 for fixing the wavefront analyzer 106 and adjusting the height of the wavefront analyzer 106 to a standard height so that the laser 102 and the wavefront analyzer 106 are in the same straight line.

Wherein the optical path conducting component 103 is arranged between the laser 102 and the wavefront analyzer 106,

referring to fig. 2, fig. 2 is a schematic view of another pose adjustment system for a collimator objective and a wavefront analyzer according to an embodiment of the present disclosure. As shown in fig. 2, a pose adjustment system provided by an embodiment of the present application includes: the device comprises an optical platform 101, a laser 102, an optical path correcting plate 104, a collimating objective 105, a wavefront analyzer 106, a laser beam expander 201, an Abbe prism 202, a laser focusing mirror 205, a flat crystal 204, a micro-motion device 206 and an autocollimator 207, wherein the flat crystal 204 and the laser focusing mirror 205 are arranged on a laser focusing plate 203.

Specifically, the optical path conducting assembly 103 includes a laser beam expander 201, an abbe prism 202, and a laser focusing mirror 205.

Wherein, the laser beam expander 201 is arranged at the fourth position of the optical platform 101, and the laser beam expander 201 is fixed by an optical fixture capable of precisely adjusting the pitch and yaw angles.

Specifically, a laser beam emitted by the laser 102 is expanded by the laser beam expander 201 and then is projected onto a target surface of the wavefront analyzer 106, on which the collimator objective 105 is not mounted, to form a light spot on the target surface, and the mounting angle of the laser beam expander 201 is adjusted according to the position of the light spot on the target surface, so that the optical axis of the laser beam expander 201 coincides with the optical axis of the wavefront analyzer 106.

After the adjustment of the position and the installation angle of the laser beam expander 201 is completed, the abbe prism 202 is arranged at a fifth position of the optical platform 101, which is between the fourth position and the wavefront analyzer 106 and is close to the fourth position.

Here, a position fixing member is provided at a fifth position of the optical bench 101 for fixing the abbe prism 202 and adjusting the height of the abbe prism 202 to a standard height.

Specifically, the laser beam expanded by the adjusted laser beam expander 201 is emitted to the incident plane of the abbe prism 202, reflected by the abbe prism 202, emitted by the exit plane of the abbe prism 202, and projected onto the target surface of the wavefront analyzer 106 without the collimator objective lens 105 to form a light spot, and the installation angle of the abbe prism 202 is adjusted according to the position of the light spot on the target surface, so that the optical axis of the abbe prism 202 coincides with the optical axis of the wavefront analyzer 106.

After the adjustment of the position and the installation angle of the abbe prism 202 is completed, the laser focusing mirror 205 is arranged at the sixth position of the optical platform 101, the sixth position is located between the fifth position and the wavefront analyzer 106, the laser beam emitted from the exit plane of the adjusted abbe prism 202 is projected onto the target surface of the wavefront analyzer 106 without the collimator objective lens 105 via the laser focusing mirror 205, and the installation angle of the laser focusing mirror 205 is adjusted so that the optical axis of the laser focusing mirror 205 coincides with the optical axis of the laser beam reflected by the abbe prism 202.

Thus, through the above adjustment of the optical path conducting assembly 103, the optical axes of the laser beam expander 201, the abbe prism 202, and the laser focusing lens 205 of the optical path conducting assembly 103 coincide, which ensures that the laser beam projected by the optical path conducting assembly coincides with the optical axis of the wavefront analyzer 106.

Optionally, referring to fig. 2, the pose adjustment system further includes an autocollimator 207, as shown in fig. 2, the autocollimator 207 is mounted on a fixing member of the optical platform 101 behind the wavefront analyzer 106, and after the autocollimator 207 is mounted on the fixing member of the optical platform 101, the autocollimator 207 may cross an installation angle higher than a plane of the wavefront analyzer 106 in front of the wavefront analyzer 106, which is detected by the wavefront analyzer 106.

It should be noted that after the autocollimator 207 is mounted on the fixing member of the optical platform 101 behind the wavefront analyzer 106, the mounting angle of the autocollimator 207 needs to be corrected, so that the autocollimator 207 can accurately detect the mounting angle of the plane.

Specifically, the autocollimator 207 is calibrated by: after the laser focusing mirror 205 is not disposed on the optical stage 101 and the optical axis of the abbe prism 202 is adjusted to coincide with the optical axis of the wavefront analyzer 106, the test light emitted from the autocollimator 207 is irradiated onto the exit plane of the abbe prism 202, the feedback light reflected by the exit plane of the abbe prism 202 is received, and the installation angle of the autocollimator 207 on the optical stage 101 is adjusted so that the test light of the autocollimator 207 coincides with the feedback light.

Referring to fig. 1, as shown in fig. 1, the optical path calibration plate 104 is disposed at a third position between the optical path conducting element and the wavefront analyzer 106.

Specifically, referring to fig. 2, as shown in fig. 2, the optical path correction plate 104 is mounted on the micro-motion device 206, the micro-motion device 206 is disposed at a third position of the optical platform 101, and the optical path correction plate 104 is provided with a plurality of light holes, each of which has a different size.

The installation angle of the optical path correction plate 104 is corrected by: the test light emitted from the autocollimator 207 irradiates the optical path correction plate 104, receives the feedback light reflected by the optical path correction plate 104, and adjusts the installation angle of the optical path correction plate 104 so that the test light coincides with the feedback light.

After the tilt angle of the optical path correction plate 104 is adjusted by the autocollimator 207, the laser focusing mirror 205 is removed, and the micro-motion device 206 is controlled to move to drive the optical path correction plate 104, so that each light-transmitting hole on the optical path correction plate 104 sequentially moves to the position of the focus of the collimator objective 105 in the order from large to small, and during each movement, the installation angle of the optical path correction plate 104 is adjusted, so that the light spot formed on the target surface of the wavefront analyzer 106 by the laser beam emitted from the exit plane of the abbe prism 202 through the light-transmitting hole on the optical path correction plate 104 is located at the center of the target surface.

After the laser beam emitted from the exit plane of the abbe prism 202 passes through the light-transmitting hole on the optical path correction plate 104 to form a light spot on the target surface of the wavefront analyzer 106, the laser focusing mirror 205 is disposed at the sixth position of the optical platform 101 again, and the installation angle of the laser focusing mirror 205 is adjusted, so that the optical axis of the laser focusing mirror 205 coincides with the optical axis of the laser beam reflected by the abbe prism 202.

At this time, the focal position of the laser focusing mirror 205 after focusing the laser beam emitted from the exit plane of the abbe prism 202 is the position of the light-passing hole with the smallest size of the optical path correction plate 104 after adjustment.

After the laser 102, the optical path correction plate 104, the laser beam expander 201, the abbe prism 202, the laser focusing lens 205, the flat crystal 204, the micro-motion device 206 and the autocollimator 207 are adjusted, the collimator objective lens 105 is adjustably mounted on the wavefront analyzer 106 on the side close to the optical path correction plate 104, and the horizontal position of the wavefront analyzer 106 is adjusted, so that the position of the light hole on the optical path correction plate 104 is the position of the focus of the collimator objective lens 105.

At this time, the laser beam emitted by the laser 102 is projected onto the target surface of the wavefront analyzer 106 through the light-transmitting hole of the optical path correction plate 104 and the collimator objective lens 105 by the conduction of the optical path conduction component to form a spot on the target surface.

And then, adjusting the installation angle of the collimator objective 105 according to the position of the light spot on the target surface, so that the optical axis of the collimator objective 105 coincides with the optical axis of the wavefront analyzer 106.

Specifically, referring to fig. 3, fig. 3 is a schematic structural diagram of a connection relationship between a collimator objective lens and a wavefront analyzer according to an embodiment of the present disclosure, and as shown in fig. 3, a collimator objective lens 105 is mounted on a lens holder 301, and an adjusting screw 302 and an elastic structure 303 are further disposed on the lens holder.

Referring to fig. 4, fig. 4 is a schematic structural diagram of a connection relationship between a collimator lens and a wavefront analyzer according to an embodiment of the present disclosure, as shown in fig. 4, a collimator lens 105 is mounted on a lens holder 301, and an adjusting screw 302 and an elastic structure 303 are further disposed on the lens holder 301.

Specifically, the pose adjusting system further includes a lens holder 301 and an adjusting screw 302, the collimator objective 105 is mounted on the wavefront analyzer through the lens holder 301, and the adjusting screw 302 is used for adjusting a mounting angle of the collimator objective 105 relative to the wavefront analyzer, so that an optical axis of the collimator objective 105 coincides with an optical axis of the wavefront analyzer.

The elastic structure 303 is used for tensioning the collimator objective 105 and the wavefront analyzer to ensure the connection rigidity between the collimator objective 105 and the wavefront analyzer, and further ensure the pretightening force of the adjusting screw 302.

Specifically, the adjusting screw 302 may be adjusted according to an offset between a position of the light spot on the target surface and a center of the target surface of the wavefront analyzer, so that an optical axis of the collimator objective 105 coincides with an optical axis of the wavefront analyzer.

Exemplarily, the deflection angles of the collimator objective lens 105 in the horizontal direction Rx and the vertical direction Ry on the target surface of the wavefront analyzer are θ x and θ y, respectively, and the deflection arm length of the collimator objective lens 105 around the fulcrum is L, where the deflection arm length is a vertical distance between the surface of the housing against which the adjusting screw 302 abuts and the image point position of the collimator objective lens 105, the field deflection amount of the collimator objective lens 105 introduced by the deflection angles of θ x and θ y is Δ hx and Δ hy, and the hartmann upper incident angle deviation introduced by the field deflection amount is θ x 'and θ y', and the relationship between the incident angle of the collimator objective lens 105 and the field is satisfied:

under the requirement of small-range alignment and field deflection, the alignment and adjustment satisfy the following relations:

thetaX＝θx+θx′；

thetaY＝θy+θy′；

Δhx＝L×θx；

Δhy＝L×θy；

thus, the tilt angle to be adjusted can be calculated based on the above formula, and the adjusting screw 302 can be adjusted according to the tilt angle to be adjusted, so that the optical axis of the collimator objective 105 coincides with the optical axis of the wavefront analyzer.

Optionally, the outer wall of the lens holder 301 is provided with an internal thread, and the inner wall of the wavefront analyzer is provided with an external thread screwed with the internal thread of the lens holder 301, so that the collimator objective 105 is mounted on the wavefront analyzer through the lens holder 301.

The position and orientation adjusting system for the collimating objective and the wavefront analyzer can ensure that the optical axis of the received light of the collimating objective is perpendicular to the target surface of the wavefront analyzer by adjusting the positions of the laser, the light path conducting assembly and the light path correcting plate, and solves the problems that in the prior art, when the mounting position of the collimating objective is corrected, on one hand, the fluctuation of wave aberration of an off-axis field is large, and measurement sensitivity errors can be caused, and on the other hand, when the image point of a measured objective is butted, the posture of the wavefront analyzer is difficult to be accurately positioned to the image point position of the calibrated collimating objective, and when the telecentric degree of the measured objective is large, the light cone of the image point cannot be completely received, so that the effect of accurately adjusting the collimating objective mounted on the wavefront analyzer based on the received light of the collimating objective is achieved.

It is clear to those skilled in the art that, for convenience and brevity of description, the specific working processes of the above-described systems, apparatuses and units may refer to the corresponding processes in the foregoing method embodiments, and are not described herein again.

In the several embodiments provided in the present application, it should be understood that the disclosed system, apparatus and method may be implemented in other ways. The above-described embodiments of the apparatus are merely illustrative, and for example, the division of the units is only one logical division, and there may be other divisions when actually implemented, and for example, a plurality of units or components may be combined or integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection of devices or units through some communication interfaces, and may be in an electrical, mechanical or other form.

The units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one position, or may be distributed on multiple network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of the embodiment.

In addition, functional units in the embodiments of the present application may be integrated into one processing unit, or each unit may exist alone physically, or two or more units are integrated into one unit.

The functions, if implemented in software functional units and sold or used as a stand-alone product, may be stored in a non-transitory computer-readable storage medium executable by a processor. Based on such understanding, the technical solution of the present application or portions thereof that substantially contribute to the prior art may be embodied in the form of a software product stored in a storage medium and including instructions for causing a computer device (which may be a personal computer, a server, or a network device) to execute all or part of the steps of the method according to the embodiments of the present application. And the aforementioned storage medium includes: various media capable of storing program codes, such as a usb disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk, or an optical disk.

Finally, it should be noted that: the above-mentioned embodiments are only specific embodiments of the present application, and are used for illustrating the technical solutions of the present application, but not limiting the same, and the scope of the present application is not limited thereto, and although the present application is described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: those skilled in the art can still make modifications or changes to the embodiments described in the foregoing embodiments, or make equivalent substitutions for some features, within the technical scope of the present disclosure; such modifications, changes or substitutions do not depart from the spirit and scope of the exemplary embodiments of the present application, and are intended to be covered by the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.

Claims

1. A pose adjusting system for a collimating objective and a wavefront analyzer is characterized by comprising a laser, a light path conducting component and a light path correcting plate, wherein the light path correcting plate is provided with a light hole,

wherein, the laser is arranged at the first position of the optical platform, the wave front analyzer is arranged at the second position of the optical platform, the light path conduction component is arranged between the laser and the wave front analyzer, the light path correction plate is arranged at the third position between the light path conduction component and the wave front analyzer, the collimating objective lens is adjustably arranged at one side of the wave front analyzer close to the light path correction plate, the position of the light hole on the light path correction plate is the position of the focus of the collimating objective lens,

the laser beam emitted by the laser is transmitted by the light path transmission component and is projected onto a target surface of the wavefront analyzer through the light hole in the light path correcting plate and the collimating objective so as to form a light spot on the target surface, and the mounting angle of the collimating objective is adjusted according to the position of the light spot on the target surface so as to enable the optical axis of the collimating objective to coincide with the optical axis of the wavefront analyzer.

2. The pose adjustment system according to claim 1, wherein the optical path conducting component comprises a laser beam expanding lens, an Abbe prism and a laser focusing lens,

wherein, the laser beam expander is arranged at the fourth position of the optical platform, the laser beam emitted by the laser is expanded by the laser beam expander and then is projected on the target surface of the wavefront analyzer without the collimating objective lens, a light spot is formed on the target surface, the installation angle of the laser beam expander is adjusted according to the position of the light spot on the target surface so as to ensure that the optical axis of the laser beam expander is superposed with the optical axis of the wavefront analyzer,

wherein, the Abbe prism is arranged at a fifth position of the optical platform, the fifth position is positioned between the fourth position and the wavefront analyzer and is close to the fourth position, the laser beam expanded by the adjusted laser beam expanding lens is emitted to an incident plane of the Abbe prism, is reflected by the Abbe prism, is emitted by an emergent plane of the Abbe prism and is projected onto a target surface of the wavefront analyzer without a collimating objective lens to form a light spot, the installation angle of the Abbe prism is adjusted according to the position of the light spot on the target surface so as to ensure that the optical axis of the Abbe prism is coincident with the optical axis of the wavefront analyzer,

the laser focusing mirror is arranged at a sixth position of the optical platform, the sixth position is located between the fifth position and the wavefront analyzer, the laser beam emitted by the adjusted exit plane of the Abbe prism is projected onto the target surface of the wavefront analyzer without the collimating objective lens through the laser focusing mirror, and the installation angle of the laser focusing mirror is adjusted to enable the optical axis of the laser focusing mirror to coincide with the optical axis of the laser beam reflected by the Abbe prism.

3. A pose adjustment system according to claim 2, further comprising a flat crystal and an autocollimator, the flat crystal being disposed on a first side surface of a laser focusing plate facing the collimating autocollimator, the laser focusing plate being located above the laser focusing mirror, a second side surface of the laser focusing plate being fixedly connected to an edge of the laser focusing mirror, the flat crystal being disposed at a height higher than a height of an upper edge of the wavefront analyzer, the autocollimator being disposed at a seventh position of the optical stage, the seventh position being located on the other side of the wavefront analyzer from the laser, the autocollimator disposed at the seventh position being disposed at a height higher than a height of the upper edge of the wavefront analyzer for detecting an installation angle of any plane in front of the wavefront analyzer,

the optical axis of the laser focusing lens on the laser focusing plate is coincided with the optical axis of the laser beam reflected by the Abbe prism.

4. The pose adjustment system according to claim 2, further comprising an autocollimator that corrects by:

after a laser focusing mirror is not arranged on the optical platform and the optical axis of the Abbe prism is adjusted to be coincident with the optical axis of the wavefront analyzer, test light emitted by the autocollimator irradiates the emergent plane of the Abbe prism, receives feedback light reflected by the emergent plane of the Abbe prism, and adjusts the installation angle of the autocollimator on the optical platform so that the test light of the autocollimator is coincident with the feedback light.

5. A pose adjustment system according to claim 2, further comprising an autocollimator, wherein an installation angle of the optical path correction plate is corrected by:

the test light emitted by the autocollimator irradiates the light path correction plate, receives the feedback light reflected by the light path correction plate, and adjusts the installation angle of the light path correction plate to make the test light coincide with the feedback light.

6. The attitude and pose adjustment system according to claim 5, further comprising a micro-motion device on which the optical path correcting plate is mounted, the micro-motion device being arranged at a third position of the optical platform, the optical path correcting plate being provided with a plurality of light transmission holes each having a different size,

and removing the laser focusing lens, controlling the micro-motion device to move to drive the light path correcting plate to move so as to enable each light hole on the light path correcting plate to sequentially move to the position of the focus of the collimating objective lens from large to small, and adjusting the installation angle of the light path correcting plate during each movement so as to enable the laser beam emitted by the emergent plane of the Abbe prism to form a light spot on the target surface of the wavefront analyzer through the light holes on the light path correcting plate to be positioned at the center of the target surface.

7. A pose adjustment system according to claim 6, wherein the laser focusing mirror is newly arranged at a sixth position of the optical platform, and the installation angle of the laser focusing mirror is adjusted so that the optical axis of the laser focusing mirror coincides with the optical axis of the laser beam after being reflected by the abbe prism.

8. A pose adjustment system according to claim 1, further comprising a lens mount through which the collimator objective is mounted on the wavefront analyzer, and an adjustment screw for adjusting a mounting angle of the collimator objective with respect to the wavefront analyzer so that an optical axis of the collimator objective coincides with an optical axis of the wavefront analyzer.

9. The pose adjustment system according to claim 8, characterized in that the adjustment screw is adjusted according to the offset between the position of the spot on the target surface and the center of the target surface of the wavefront analyzer so that the optical axis of the collimator objective coincides with the optical axis of the wavefront analyzer.

10. The pose adjustment system according to claim 8, wherein an outer wall of the lens holder is provided with an internal thread, and an inner wall of the wavefront analyzer is provided with an external thread screwed with the internal thread of the lens holder, so that the collimator objective lens is mounted on the wavefront analyzer through the lens holder.