CN115304815B - Dynamic color low-emissivity film, preparation method and application - Google Patents
Dynamic color low-emissivity film, preparation method and application Download PDFInfo
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- CN115304815B CN115304815B CN202210646291.6A CN202210646291A CN115304815B CN 115304815 B CN115304815 B CN 115304815B CN 202210646291 A CN202210646291 A CN 202210646291A CN 115304815 B CN115304815 B CN 115304815B
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- 238000002360 preparation method Methods 0.000 title abstract description 7
- 230000008859 change Effects 0.000 claims abstract description 51
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- 239000010410 layer Substances 0.000 claims description 70
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 20
- 230000007704 transition Effects 0.000 claims description 20
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 20
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 claims description 18
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 claims description 18
- 239000011521 glass Substances 0.000 claims description 15
- 230000001681 protective effect Effects 0.000 claims description 14
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 9
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 229910000510 noble metal Inorganic materials 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229920006254 polymer film Polymers 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
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Classifications
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J7/06—Coating with compositions not containing macromolecular substances
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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Abstract
The invention discloses a dynamic color low-emissivity film, a preparation method and application thereof, and relates to the technical field of low-emissivity films. The dynamic color low-radiation film prepared by the invention can obviously and reversibly change the self-reflection color according to the ambient temperature while showing the energy-saving effect of the traditional low-radiation film. The transparent plastic can be prepared on the surface of a flexible or rigid transparent substrate, and can be used for the fields of temperature indication, temperature warning and the like besides obtaining a vivid dynamic decorative effect.
Description
Technical Field
The invention relates to the technical field of low-emissivity films, in particular to a dynamic color low-emissivity film, a preparation method and application thereof.
Background
The human eye has a very rich color perception of the environment. For example, we feel colors that change continuously in nature, from gorgeous in spring to green and dense in summer, and golden in autumn, and snowy white in winter. With the continuous improvement of the living tastes of people, the surrounding environment is expected to be more colorful.
This desire may be provided with greater color enjoyment by artificial decoration of the environment, such as the appearance of buildings and automobiles, and upholstery, etc. Not only decoration but also in increasingly developed daily life and military supplies, new demands are continuously emerging, such as giving prompts, warnings, anti-counterfeiting, camouflage stealth, and the like through color changes.
Taking a building as an example, for example, low-radiation energy-saving coated glass or low-radiation flexible energy-saving film with good energy-saving efficiency can obtain different color decorative effects through means of multilayer coating or color laminating and the like. Unfortunately, this color is typically fixed. That is, like color paint, once brushed on, it cannot change its fixed color development. Similarly, the color which is fixed and unchanged cannot be applied to the fields of prompting, warning, anti-counterfeiting, camouflage, stealth and the like. There is an urgent need in this field for dynamically reversible color changes.
Vanadium dioxide (VO) 2 ) Is a special substance, has the precious characteristic of reversible phase change of insulator-metal at the vicinity of room temperature, and is accompanied by great change of physical properties such as optoelectromagnetics and the like. For example, the optical performance thereof is changed from high transmittance in a low temperature state to high reflection in a high temperature state at the time of phase transition. The temperature-controlled reversible optical change is utilized to prepare the film, which can be used as a temperature-controlled intelligent energy-saving window to block infrared rays in summer, the solar radiation can be automatically regulated and controlled without manual control or additional equipment in winter through infrared rays, and the solar radiation is promoted to be warm in winter and cool in summer.
Moreover, despite pure VO 2 The phase transition temperature of the crystal is 68 ℃, and researches show that the phase transition temperature of the crystal can be adjusted up and down in a quite large range by doping elements of the crystal with metal or nonmetal, so that different requirements are met.
However, VO 2 The strong absorption of the short wavelength band of visible light causes the light to appear yellow in transmission. In addition, the optical constants of the substances before and after phase change in the visible light wave band change very little, so that no obvious visual effect is generated during phase change. Such imperfections greatly limit their application as energy-saving windows. Patent CN113683314a discloses a low-emissivity film, coated glass and a preparation method thereof, which have the advantages of color neutrality, high temperature resistance, sun-shading property, wear resistance and good oxidation resistance, but do not have a dynamic reflection effect.
Aiming at the increasingly-changing market demands and the defects of the prior art, the invention focuses on the object surface reflection color with the most environmental decoration effect, invents a novel dynamic color film, and lays a foundation for the application of materials in various fields by arranging a reflection layer on the lower layer, optimizing the whole structure, strengthening the color, increasing the color difference before and after the phase change to the degree that human vision can fully perceive, thereby providing vivid decoration color and dynamic reversible change thereof, and playing the role of the optical constant difference in the field of vanadium dioxide to the maximum extent.
The invention provides a novel dynamic color low-emissivity film, which can obviously and reversibly change the reflection color of the film according to the ambient temperature while exhibiting the energy-saving effect of the traditional low-emissivity film. The transparent plastic can be prepared on the surface of a flexible or rigid transparent substrate, and can be used for the fields of temperature indication, temperature warning and the like besides obtaining a vivid dynamic decorative effect.
Disclosure of Invention
The application solves the problem that in the prior art, no obvious visual effect exists before and after phase change of the radiation film and the application of the radiation film serving as an energy-saving window is limited by providing the dynamic color low-radiation film, the manufacturing method and the application. The novel dynamic color low-emissivity film is provided, and the energy-saving effect of the traditional low-emissivity film is shown, and the reflection color of the film can be changed remarkably and reversibly according to the ambient temperature. The transparent plastic can be prepared on the surface of a flexible or rigid transparent substrate, and can be used for the fields of temperature indication, temperature warning and the like besides obtaining a vivid dynamic decorative effect.
The invention provides a dynamic color low-emissivity film, which structurally comprises a transparent substrate layer, a reflecting layer and a vanadium oxide phase change layer, wherein the reflection color of at least one surface of the dynamic color low-emissivity film changes reversibly with temperature.
The applicant realizes the function of enabling the low-temperature radiation film to have dynamic color by utilizing the reversible phase change of the vanadium oxide phase change layer in the experimental process. And the applicant can further enlarge the reflection chromatic aberration during phase change to be clearly distinguished by human eyes by further arranging a reflecting layer, and finally realize the dynamic color change of the low-radiation film.
The surface of the substance presents different visual colors due to the selective reflection of different wavelengths of visible light, and three thorns can be felt through the retinaThe excitation values are represented on different chromaticity coordinates. The industry introduces a "color difference" standard in the evaluation standards for various coating materials to measure the uniformity of the coating, but no reference has been made to the "color difference" of the coating which is artificially required to have a positive (positive) effect. In the invention, we creatively introduce the concept of chromatic aberration by using reverse thinking, and skillfully uses the international standard of industrial CIELAB chromatic aberration to evaluate, and the formula is delta E = [ (delta L #) 2 +(Δa*) 2 +(Δb*) 2 ] 1/2 Wherein Δe is the difference between the brightness indices of the dynamic color low-emissivity film of the present invention at high and low temperatures, Δl is the difference between the chromaticity indices, and Δa and Δb are the difference between the chromaticity indices. According to the national standard of coated glass in China (GB/T18915.1-2013 coated glass), the color uniformity of the coated glass is expressed by the color difference of CIELAB uniform color space, and the value is less than or equal to 2.5. That is, when Δe exceeds 2.5, the object will undergo a visually discernable color change.
Of course, as a dynamic color film with a decorative or temperature indicating or warning function, Δe of a value of about 2.5 varies considerably less. Therefore, it is necessary to obtain a more vivid color dynamic change, i.e., a much larger dynamic color difference value, in order to achieve the visual change effect that we expect. The total chromatic aberration of the reflection color of the dynamic color low-radiation film prepared in the application under the high-low temperature state is at least more than or equal to 10.0. Therefore, obvious visual color change can be ensured, and the prepared dynamic color low-emissivity film has the function of displaying temperature or warning temperature by utilizing the dynamic change of reflection color, and can clearly reflect the difference of visual colors.
As a preferred embodiment, the transparent substrate layer comprises a flexible or/and rigid transparent substrate. Preferably, the transparent substrate layer comprises various glass or transparent polymer films such as PI and the like. The choice of substrate in the present invention should not be limited in any way as long as the film structure of the present invention can be formed on the transparent substrate and the dynamic color change can be generated.
As a preferable technical scheme, the vanadium oxide phase-change layer is vanadium dioxide and comprises low-valence or high-valence metal element doped vanadium dioxide.
The pure vanadium dioxide has a phase transition temperature of 68 ℃, and the phase transition temperature can be adjusted up and down by means of element doping and the like. Preferably, the low-valence metal element comprises Ti and Al; the high-valence metal element comprises at least one of W, ta, mo and Nb;
the phase transition temperature is adjusted up and down by means of element doping and the like, because doping low-valence elements such as Ti, al and the like can improve the phase transition temperature, for example, the phase transition temperature can be improved to be near 85 ℃ by titanium doping; doping high valence elements such as W, ta, mo, nb, etc. can reduce the phase transition temperature, for example, by doping tungsten, the phase transition temperature can be reduced to the vicinity of the freezing point.
As a preferable technical scheme, the phase transition temperature of the vanadium oxide phase transition layer is 20-90 ℃. Preferably, the phase transition temperature of the vanadium oxide phase transition layer is 20-85 ℃. Further preferably, the phase transition temperature of the vanadium oxide phase transition layer is in the range of 20-80 ℃.
As a preferable technical scheme, the reflecting layer is a multilayer film formed by a noble metal film and a transparent dielectric film. Preferably, the noble metal includes Ag and its alloys. The number of layers is not limited, and the technical effect can be achieved. The transparent dielectric film is TiO 2 ，ZrO 2 One of them.
The present invention preferably uses a multilayer film of noble metal Ag and a transparent dielectric film as the reflective layer in the present invention, and this structure is very similar to a typical single-silver, double-silver or multi-silver low-emissivity film. Multiple practices show that the enough dynamic color change can be obtained through a precise optical optimization design and a precise coating process, and meanwhile, the lower emissivity can be maintained, and the requirements (293K, 4.5-25 mu m and emissivity less than 0.15) of the national standard (GB/T18915.2-2013) are met.
As a preferable technical scheme, the reflecting layer is a transparent conductive film or a multilayer film formed by the transparent conductive film and a transparent dielectric film. Preferably, the transparent conductive film includes ITO, ATO, FTO, AZO, GZO, or at least one of Al, ga, Y, in, B, and F. The number of layers is not limited, and the technical effect can be achieved.
In the present invention, the applicant obtains a desired dynamic color low-emissivity film by using one or more transparent conductive films (e.g., ITO, ATO, FTO, or doped zinc oxide such as AZO, GZO, or Al, ga, Y, in, B, F, etc.), or a multilayer structure of the transparent conductive film and the transparent dielectric film. And the emissivity of the obtained dynamic color low-emissivity film is less than 0.25.
When the reflecting layer adopts a multilayer film formed by a noble metal film or a transparent conductive film and a transparent dielectric film, excellent energy-saving effect can be realized, and the dynamic color low-emissivity film can achieve lower emissivity which is less than 0.25; more preferably, the emissivity of the dynamic color low emissivity film is less than 0.15. At this time, the prepared dynamic color low-emissivity film can maintain excellent energy-saving effect while realizing dynamic color change. In addition, the solar energy transmittance of the dynamic color low-radiation film in a low-temperature state is higher than that in a high-temperature state, so that the dynamic color low-radiation film is more beneficial to enhancing the comfort and energy-saving effects.
As a preferable technical scheme, at least one surface of the vanadium oxide phase-change layer is provided with a transparent protective film.
As a preferable technical scheme, the transparent protective film is transparent oxide or nitride.
The transparent oxide comprises TiO 2 ，ZrO 2 And the like, wherein the transparent nitride is AlN.
The applicant found that when vanadium dioxide is used as the phase change layer, the vanadium element in the vanadium dioxide phase change layer is in an intermediate valence state, so that the vanadium element is easy to contact with environmental substances in use to undergo chemical reaction, and the phase change performance is lost. In the present application, the applicant has made use of by incorporating a transparent protective film, in particular a transparent oxide or nitride, such as TiO 2 ，ZrO 2 AlN and the like, the defect of the phase change performance of the vanadium dioxide phase change layer can be avoided, and the visual change effect of the prepared dynamic color low-emissivity film is ensured.
The present invention is not particularly limited as to the production method, and any production method that can be used for plating an optical multilayer film, or that can realize the structure and function described in the present invention, is not excluded. There may be mentioned magnetron sputtering coating method, vacuum evaporation, chemical vapor deposition, spin coating method, spray coating method and the like. Preferably, the magnetron sputtering coating method is adopted.
The invention also provides a method for preparing the dynamic color low-emissivity film, which is formed by sequentially depositing the dynamic color low-emissivity film on a substrate in a magnetron sputtering coating mode.
In another aspect, the invention also provides the use of a dynamic color low emissivity film, including as a color transparent energy saving glass and a color transparent flexible energy saving film.
The invention has the following beneficial effects: 1) The novel dynamic color low-emissivity film is provided, and the energy-saving effect of the low-emissivity film is shown, and the reflection color of the film can be changed remarkably and reversibly according to the ambient temperature. 2) The transparent plastic can be prepared on the surface of a flexible or rigid transparent substrate, and can be used for the fields of temperature indication, temperature warning and the like besides obtaining a vivid dynamic decorative effect. 3) By arranging the specific reflecting layer once, the color is enhanced and the color difference before and after the phase change is increased to the degree that human vision can be fully perceived, thereby providing vivid decorative colors and dynamic reversible changes thereof and laying a foundation for the application of materials in various fields. 4) By arranging the transparent protective film, the defect of phase change performance of the phase change layer is avoided, and the visual change effect of the prepared dynamic color low-emissivity film is fully ensured.
Detailed Description
Each film layer of the invention is plated by using an ACS-4000-C4 magnetron sputtering instrument of ULVAC company in Japan. The instrument is provided with 4 2 inch targets, which can be configured with RF or DC power, respectively. The sample was placed on a > 4 inch rotatable fixed heated plate, with a heating temperature of up to 500 ℃.3 air paths which can be independently regulated and controlled are arranged. When not specifically described, the coating film adopts a metal target material. Ar is introduced in the required proportion during coating, or Ar and O 2 Or Ar and N 2 The sputtering pressure is kept at 1.0Pa, and the coating time is strictly controlled, so as to obtainAnd (5) forming films with fixed thickness. The preparation process of the multilayer film is continuously carried out in vacuum, so that the quality stability of each layer of film is ensured.
Representative coated samples are described in detail below.
Example 1
The embodiment 1 of the invention particularly provides a novel dynamic color low-emissivity film, the structure of which is composed of a vanadium oxide phase-change layer and a reflecting layer on a transparent substrate, and the reflection color of one surface of the dynamic color low-emissivity film changes reversibly with temperature.
The transparent substrate layer is a transparent polymer film PI substrate.
The vanadium oxide phase change layer is titanium doped vanadium dioxide.
The phase transition temperature of the vanadium oxide phase transition layer is 20-80 ℃.
The reflecting layer is a multilayer film formed by a noble metal Ag film and a transparent dielectric film; the transparent dielectric film is TiO 2 And (3) a film.
Transparent protective films are arranged on two sides of the vanadium oxide phase change layer, and the transparent protective films are transparent oxide titanium dioxide.
A method for preparing dynamic color low-emissivity film is prepared by sequentially depositing magnetron sputtering film coating on a substrate,
use of a dynamic color low emissivity film, the use of the dynamic color low emissivity film comprising as a color transparent energy saving glass and a color transparent flexible energy saving film.
The magnetron sputtering coating method comprises the following steps: on the surface of a PI substrate of a transparent polymer film, (1) a metal Ti target is adopted, and vacuum is pumped to 5x10 -5 Pa, ar+3%O was introduced under the condition that the total flow rate of the gas was controlled to 50sccm 2 TiO is prepared under the conditions of full pressure of 1.0Pa, DC power of 100W and room temperature 2 A membrane; (2) Vacuum-pumping to 5x10 with metal Ag target -5 Pa, introducing Ar under the condition that the total flow rate of the gas is controlled to be 50sccm, and combining with the step (1) under the conditions of full pressure of 1.0Pa, DC power of 100W and room temperature to obtain a reflecting layer; (3) Repeating the operation (1)Preparing transparent protective film TiO 2 A membrane; (4) Vacuum-pumping to 5x10 with metal V target and Ti target -5 Pa, ar+3%O was introduced under the condition that the total flow rate of the gas was controlled to 50sccm 2 Preparing a titanium doped vanadium dioxide phase-change layer under the conditions of the substrate temperature of 300-500 ℃ under the conditions that the full pressure is 1.0Pa, the DC power of a V target is 100W, the power of a Ti target is 5-25W in a co-sputtering mode; (5) Repeating the operation (1) to prepare the transparent protective film TiO 2 And (3) a film. Finally, the TiO with the size of 25-0.15 mm is prepared 2 /Ti-VO 2 /TiO 2 /Ag/TiO 2 Transparent PI multilayer film structure, wherein Ag thickness is10 nm, ti-VO 2 Thickness of 100nm, tiO 2 The total film thickness was 250nm.
The visible light reflectance curves of the front and back surfaces of the sample were measured at a low temperature (20 ℃) and a high temperature (80 ℃) using a spectrophotometer (HITACHI U-4100). The XYZ tristimulus values were obtained in the CIE1931 color space and the brightness (L) and chromaticity and taste (a and b) values of the reflected light on the CIELAB color system were obtained by calculation. Using the formula Δe= [ (Δl:) 2 +(Δa*) 2 +(Δb*) 2 ] 1/2 And calculating the color difference of the sample before and after phase change, and confirming the dynamic color change before and after heating by naked eyes.
The vertical heat radiation of the sample was measured using FTIR (ThermoFisher Nicolet iS 10) and the emissivity εi was calculated according to GB/T2680-94. The experimental results are shown in table 1. In table 1, the film surface is a film coating layer, and the reverse surface is the other surface of the film coating layer.
TABLE 1
It can be seen that the above structure exhibits a considerable colour difference (29.2) at its film face, its colour changing from near white at low temperature to pink at high temperature and at the same time a colour change at the other surface, this dynamic colour change being clearly visible to the naked eye. In addition, the film layer has low radiation characteristic on both front and back surfaces, and the emissivity is less than 0.10. More excellent, the solar energy transmittance at low temperature is obviously higher than that at high temperature, so that the energy-saving effect of the film layer is greatly enhanced.
Example 2
The embodiment 2 of the present invention specifically provides a novel dynamic color low-emissivity film, and the specific embodiment is the same as the embodiment 1, in that the transparent substrate is common glass, and the phase-change layer is pure VO 2 One surface of the phase change layer is provided with a transparent protective film, and the transparent protective film is ZrO 2 The method comprises the steps of carrying out a first treatment on the surface of the The reflecting layer is a two-layer Ag film and a transparent dielectric film ZrO 2 The total thickness of the two Ag layers of the formed double-silver multilayer film is 15.7nm, the thickness of a single-layer Ag is 7.85nm, and VO 2 ZrO with a thickness of 50nm (VO 2 thin film sputtered by using only V target in step (4) of example 1) 2 The total thickness was 93nm. The whole structure is ZrO 2 /Ag/ZrO 2 /VO 2 /Ag/ZrO 2 Ordinary glass representation. The measurement results are shown in Table 2.
Similar to example 1, the above structure exhibited a considerable color difference (32.0) from orange at low temperature to yellowish green at high temperature, a dynamic color change that was clearly visible to the naked eye. In addition, the film layer has low radiation characteristic on both front and back surfaces, and the emissivity is less than 0.10. More excellent, the film layer shows higher visible light transmittance and larger solar energy transmittance adjusting capability, so that the energy-saving effect of the film layer is greatly enhanced.
TABLE 2
Example 3
Embodiment 3 of the present invention specifically provides a novel dynamic color low-emissivity film, which is different from embodiment 1 in that the reflective layer is a transparent conductive film ITO, and Ti-VO with a thickness of 50nm and using ITO as the reflective layer 2 Has ITO/Ti-VO 2 A multilayer film of an ITO/PI structure, wherein the total thickness of two ITO films is about 300nm, and the thickness of each ITO film is the same. The test results are shown in Table 3.
It can be seen that similar dynamic color change and energy saving effects are obtained when a transparent conductive film is used as the reflective layer. And the emissivity is less than 0.20, which accords with the national standard of low-emissivity films.
TABLE 3 Table 3
Comparative example 1
The embodiment of the invention in comparative example 1 specifically provides a novel dynamic color low-emissivity film, and the embodiment is the same as the embodiment in example 2, except that the vanadium oxide phase-change layer is not added, and the transparent substrate is a transparent polymer film PI substrate. Preparation of monolayer Ag film and two ZrO 2 Low-emissivity multilayer film structure, in particular ZrO, formed from a film layer 2 /Ag/ZrO 2 PI, where ZrO 2 The thickness of (C) was 40nm, the Ag film thickness was 15nm, and performance was evaluated. The test results are shown in Table 4. It can be seen that no temperature controlled dynamic color change occurs in this structure without the use of a vanadium oxide film layer.
TABLE 4 Table 4
Comparative example 2
The embodiment of the invention in comparative example 2 specifically provides a novel dynamic color low-emissivity film, and the embodiment is the same as the embodiment in example 3, except that the vanadium oxide phase-change layer is not added, and the transparent substrate is common glass. An ITO single-layer film with a thickness of 315nm, specifically an ITO/common glass, was prepared, and performance evaluation was performed. The test results are shown in Table 5. It can be seen that no temperature controlled dynamic color change occurs in this structure without the use of a vanadium oxide film layer.
TABLE 5
Claims (3)
1. The dynamic color low-radiation film is characterized in that the structure of the dynamic color low-radiation film consists of a vanadium oxide phase-change layer and a reflecting layer on a transparent substrate, and the reflection color of one surface of the dynamic color low-radiation film changes reversibly with temperature;
the transparent substrate layer is a transparent polymer film PI substrate;
the vanadium oxide phase change layer is titanium doped vanadium dioxide;
the phase transition temperature range of the vanadium oxide phase transition layer is 20-80 ℃;
the reflecting layer is a multilayer film formed by a noble metal Ag film and a transparent dielectric film; the transparent dielectric film is TiO 2 A membrane;
transparent protective films are arranged on two sides of the vanadium oxide phase change layer, and the transparent protective films are transparent oxide titanium dioxide;
the overall structure of the dynamic color low-emissivity film is TiO of 25-0.15 mm 2 /Ti-VO 2 /TiO 2 /Ag/TiO 2 Transparent PI multilayer film structure, wherein Ag thickness is10 nm, ti-VO 2 Thickness of 100nm, tiO 2 The total thickness of the film is 250nm;
or the dynamic color low-radiation film is structurally composed of a vanadium oxide phase-change layer and a reflecting layer on a transparent substrate, wherein the reflecting color of one surface of the dynamic color low-radiation film changes reversibly with temperature; the transparent substrate is common glass, and the phase change layer is pure VO 2 One surface of the phase change layer is provided with a transparent protective film, and the transparent protective film is ZrO 2 The method comprises the steps of carrying out a first treatment on the surface of the The reflecting layer is a two-layer Ag film and a transparent dielectric film ZrO 2 The total thickness of the two Ag layers of the formed double-silver multilayer film is 15.7nm, the thickness of a single-layer Ag is 7.85nm, and VO 2 Thickness of 50nm, zrO 2 The total thickness is 93nm; the whole structure is ZrO 2 /Ag/ZrO 2 /VO 2 /Ag/ZrO 2 Ordinary glass representation.
2. A method for manufacturing a dynamic color low-emissivity film of claim 1, wherein said dynamic color low-emissivity film is sequentially deposited on a substrate by magnetron sputtering.
3. Use of the dynamic color low emissivity film of claim 1, comprising as a color transparent energy saving glass and a color transparent flexible energy saving film.
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102757184A (en) * | 2011-04-28 | 2012-10-31 | 中国科学院上海硅酸盐研究所 | Vanadium dioxide-based composite film with adjustable radiance as well as preparation method and application thereof |
| CN102910837A (en) * | 2012-10-16 | 2013-02-06 | 中国科学院上海技术物理研究所 | Intelligent low-emissivity coated glass capable of offline tempering and preparation method thereof |
| CN103507321A (en) * | 2012-06-15 | 2014-01-15 | 三星康宁精密素材株式会社 | Thermochromic window |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP3849008B2 (en) * | 2001-09-20 | 2006-11-22 | 独立行政法人産業技術総合研究所 | High performance automatic light control window coating material |
| US20190196229A9 (en) * | 2014-05-28 | 2019-06-27 | National Technology & Engineering Solutions Of Sandia, Llc | Thermochromic low-emissivity film |
-
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102757184A (en) * | 2011-04-28 | 2012-10-31 | 中国科学院上海硅酸盐研究所 | Vanadium dioxide-based composite film with adjustable radiance as well as preparation method and application thereof |
| CN103507321A (en) * | 2012-06-15 | 2014-01-15 | 三星康宁精密素材株式会社 | Thermochromic window |
| CN102910837A (en) * | 2012-10-16 | 2013-02-06 | 中国科学院上海技术物理研究所 | Intelligent low-emissivity coated glass capable of offline tempering and preparation method thereof |
Non-Patent Citations (3)
| Title |
|---|
| 基于二氧化钒的辐射率可调涂层设计;闫璐;王孝;曹韫真;沈自才;;宇航材料工艺;20160615(第03期);第22-26页 * |
| 张济忠 等.《现代薄膜技术》.冶金工业出版社,2009,(第1版),第421-422页. * |
| 王承遇 等.《玻璃表面装饰》.国防工业出版社,2011,(第2版),第90页. * |
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