CN115286239B - Glass, light sweeping method thereof, cover plate and electronic equipment - Google Patents
Glass, light sweeping method thereof, cover plate and electronic equipment Download PDFInfo
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- CN115286239B CN115286239B CN202210932371.8A CN202210932371A CN115286239B CN 115286239 B CN115286239 B CN 115286239B CN 202210932371 A CN202210932371 A CN 202210932371A CN 115286239 B CN115286239 B CN 115286239B
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- 239000011521 glass Substances 0.000 title claims abstract description 206
- 238000010408 sweeping Methods 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000005498 polishing Methods 0.000 claims abstract description 79
- 239000000843 powder Substances 0.000 claims abstract description 36
- 230000003628 erosive effect Effects 0.000 claims abstract description 25
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 10
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 37
- 238000002834 transmittance Methods 0.000 claims description 18
- 238000012545 processing Methods 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 6
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 abstract description 20
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 abstract description 19
- 239000000292 calcium oxide Substances 0.000 abstract description 18
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 abstract description 17
- 150000002222 fluorine compounds Chemical class 0.000 abstract description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract description 3
- 239000005361 soda-lime glass Substances 0.000 abstract description 3
- 230000000052 comparative effect Effects 0.000 description 19
- 239000000395 magnesium oxide Substances 0.000 description 13
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 13
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 239000011734 sodium Substances 0.000 description 7
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 6
- 229910001948 sodium oxide Inorganic materials 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 3
- 229910001950 potassium oxide Inorganic materials 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 description 1
- JVKRKMWZYMKVTQ-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]pyrazol-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C=NN(C=1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JVKRKMWZYMKVTQ-UHFFFAOYSA-N 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/02—Details
- H05K5/03—Covers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Glass Compositions (AREA)
Abstract
The invention relates to glass, a light sweeping method thereof, a cover plate and electronic equipment. The glass comprises the following components in percentage by mass: siO (SiO) 2 67％～72％、Al 2 O 3 1％～2％、Na 2 O 14％～18％、K 2 0 to 1 percent of O, 3 to 5.8 percent of CaO and 5 to 8 percent of MgO; the erosion resistance coefficient Res of the glass is more than or equal to 0.353,wherein each oxide represents the mass percentage thereof. The glass is prepared by optimizing the composition of the glass, properly reducing the content of calcium oxide on the basis of common soda-lime glass, and introducing proper amount of aluminum oxide, so that the erosion resistance of the glass is improved, polishing powder containing fluorine compounds can be used for polishing, and the polished glass does not generate fog.
Description
Technical Field
The invention relates to the field of glass, in particular to glass, a light sweeping method thereof, a cover plate and electronic equipment.
Background
When the glass is applied to a 2.5D or 3D cover plate, CNC processing is needed to be performed first to form an arc edge, and then a light sweeping machine is used for sweeping light on the arc edge. The main component of polishing powder used in the current polishing process is cerium oxide (CeO) 2 ) Typically, other rare earth oxides are also included,meanwhile, in order to accelerate the glass thinning rate, a small amount of fluoride is generally added. These fluorides can cause erosion to the glass surface during the light sweeping process, thereby causing fogging to be observed under the strong light lamp, affecting the display effect.
Disclosure of Invention
Accordingly, it is necessary to provide a glass which is excellent in etching resistance and does not develop fog after polishing with a polishing powder containing a fluoride.
In addition, there is a need for a method of wiping the glass, a cover plate treated by the glass, and an electronic device including the cover plate.
A glass comprising, in mass percent: siO (SiO) 2 67％～72％、Al 2 O 3 1％～2％、Na 2 O 14％～18％、K 2 0 to 1 percent of O, 3 to 5.8 percent of CaO and 5 to 8 percent of MgO;
the erosion resistance coefficient Res of the glass is more than or equal to 0.353,wherein each oxide represents the mass percentage thereof.
In one embodiment, the glass has an erosion resistance coefficient Res of 0.353 to 0.403.
In one embodiment, the method comprises the following steps of: siO (SiO) 2 70％～72％、Al 2 O 3 1.1％～1.5％、Na 2 O 14％～16％、K 2 0.2 to 0.8 percent of O, 3.5 to 5 percent of CaO and 5.5 to 7 percent of MgO.
A method for sweeping light of glass, comprising the steps of:
providing glass to be scanned, wherein the glass to be scanned is the glass; and
And polishing the glass to be polished by using polishing powder containing fluoride.
In one embodiment, the pressure in the light sweeping process is 0.1MPa to 0.2MPa; and/or the number of the groups of groups,
the time for scanning light is 4-6 min.
In one of the embodiments of the present invention,the fluoride-containing polishing powder comprises the following components in percentage by mass: ceO (CeO) 2 66％～72％、La 2 O 3 20-25% and 5-10% of fluoride.
In one embodiment, in the step of polishing the glass to be polished with a fluoride-containing polishing powder, the fluoride-containing polishing powder is formulated into a polishing liquid having a density of 1.03g/cm 3 ～1.08g/cm 3 。
In one embodiment, before the step of polishing the glass to be polished with the polishing powder containing fluoride, the method further comprises:
CNC processing is carried out on the glass to be scanned so as to form an arc edge on the glass to be scanned.
In one embodiment, the width of the arc edge is 1 mm-1.5 mm.
The cover plate is obtained after being treated by the glass light sweeping method.
In one embodiment, the cover plate is a 2.5D cover plate or a 3D cover plate; and/or the number of the groups of groups,
the haze of the cover plate is less than or equal to 1 percent.
An electronic device comprises the cover plate.
The glass has the advantages that the composition of the glass is optimized, the content of calcium oxide is properly reduced on the basis of common soda-lime glass, and an appropriate amount of aluminum oxide is introduced, so that the erosion resistance of the glass is obviously improved, polishing powder containing fluorine compounds can be used for polishing, and the polished glass does not generate fog.
Drawings
FIG. 1 is a process flow diagram of a method for cleaning glass according to one embodiment;
FIG. 2 is a schematic diagram of a test of whether the glass arc edge is swept up after sweeping up under a strong light in a darkroom;
FIG. 3 is a schematic diagram of a test of glass fogging after sweeping under a strong light in a darkroom.
Detailed Description
In order that the invention may be readily understood, a more complete description of the invention will be rendered by reference to specific embodiments that are now described. Preferred embodiments of the invention are given in the detailed description. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
In this document, the terms "first," "second," "third," "fourth," etc. are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or quantity, nor as implying an importance or quantity of a technical feature being indicated. Moreover, the terms "first," "second," "third," "fourth," and the like are used for non-exhaustive list description purposes only, and are not to be construed as limiting the number of closed forms.
In this context, the technical features described in open form include closed-type technical solutions composed of the listed features, and also include open-type technical solutions containing the listed features.
In this context, reference to numerical intervals is to be construed as continuous throughout the numerical intervals, and includes the minimum and maximum values of the range, as well as each value between such minimum and maximum values, unless specifically stated otherwise. Further, when a range refers to an integer, each integer between the minimum and maximum values of the range is included. Further, when multiple range description features or characteristics are provided, the ranges may be combined. In other words, unless otherwise indicated, all ranges disclosed herein are to be understood to include any and all subranges subsumed therein.
Aiming at the problem of fog after glass is scanned, the following solutions are mainly adopted at present: (1) The polishing is performed by using a high-purity polishing powder containing no fluoride, but the polishing powder mainly used in the market at present contains a certain amount of fluoride, and the polishing powder containing no fluoride has a high price, so that the cost is increased. In addition, if polishing powder containing no fluoride is used for polishing, on one hand, the polishing efficiency is reduced, and longer polishing time is required to ensure the polishing effect, which increases the time cost; on the other hand, since the auxiliary polishing effect of the fluoride is lost, the consumption amount of the polishing powder increases, further increasing the cost. (2) And the light sweeping time is reduced, and if the light sweeping time is reduced, the light sweeping quality of the glass surface does not reach the standard, and the glass cannot be used. (3) adjusting the glass composition. The haze level of the glass is highly related to the glass composition, and the glass with some compositions does not or only slightly haze under the same light sweeping condition, for example, the haze level of the high-alumina glass is relatively light, but the cost is high, and the glass is only suitable for high-end products and has limited application range.
Aiming at the problems, the invention starts from the aspect of optimizing the glass composition, and provides the glass which can improve the erosion resistance of the glass and prevent the glass from fogging after light sweeping under the condition of low cost through a large amount of experiments.
Specifically, the first aspect of the present invention provides a glass according to an embodiment, comprising, in mass percent: siO (SiO) 2 67％～72％、Al 2 O 3 1％～2％、Na 2 O 14％～18％、K 2 0 to 1 percent of O, 3 to 5.8 percent of CaO and 5 to 8 percent of MgO;
the erosion resistance coefficient Res of the glass is more than or equal to 0.353,in the above formula, each oxide represents its mass percent.
Silicon dioxide (SiO) 2 ) Is a main component forming a glass skeleton, is an essential component, and has an effect of improving the strength, chemical stability and the like of glass, but increases the viscosity of the glass. In the glass of the present embodiment, siO 2 Preferably 67 to 72 mass percent. If SiO is 2 If the mass percentage of the glass is less than 67%, the strength and weather resistance of the glass are insufficient, and the glass is not compact enough; if SiO is 2 Above 72% by mass, the glass becomes refractory and is prone to devitrification. In a specific example, siO 2 Is 67%, 67.5%, 68%, 68.5%, 69%, 69.5%, 70%, 70.5%, 71%, 71.5%, 72% or a range of any two of these values. Further, siO 2 The mass percentage of (2) is 70-72%.
Alumina (Al) 2 O 3 ) Can improve the erosion resistance of the glass and greatly increase the ion exchange capacity of the glass, and is an essential component. In the glass of the present embodiment, the mass percentage of alumina is preferably 1% to 2%. If the mass percentage of the alumina is less than 1%, the glass is insufficient in erosion resistance and easy to fog during light sweeping. If the mass percentage of the alumina is higher than 2%, the glass is difficult to clarify, the melting quality is reduced, and various properties of the glass are obviously affected. In a specific example, the alumina is 1%, 1.1%, 1.2%, 1.3%, 1.4%, 1.5%, 1.6%, 1.7%, 1.8%, 1.9%, 2% or a range of any two of these values by mass. Further, the mass percentage of the alumina is 1.1% -1.5%.
Sodium oxide (Na) 2 O) is an essential component for ion exchange and it also significantly improves the meltability of the glass. In the glass of the present embodiment, the mass percentage of sodium oxide is preferably 14% to 18%. If the mass percentage of sodium oxide is less than 14%, the glass is poor in meltability; if the mass percentage of sodium oxide is more than 18%, the weather resistance of the glass becomes poor. In a specific example, the mass percent of sodium oxide is 14%, 14.5%, 15%, 15.5%, 16%, 16.5%, 17%, 17.5%, 18% or a range of any two of these values. Further, the mass percentage of the sodium oxide is 14-16%.
Potassium oxide (K) 2 O) can improve the meltability of the glass, and is not an essential component. In view of introducing K 2 The cost of the raw materials of O is high, and the economic point of viewHair, K 2 The mass percentage of O is preferably 0 to 1%. In a specific example, the mass percent of potassium oxide is 0, 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 0.6%, 0.7%, 0.8%, 0.9%, 1% or a range of any two of these values. Further, the mass percentage of the potassium oxide is 0.2-0.8%.
Calcium oxide (CaO) reduces the viscosity of the glass at high temperatures, promotes melting and fining of the glass, and is an essential component, but calcium oxide has a large negative impact on the fluoride erosion resistance of the glass. Therefore, in the glass of the present embodiment, the mass percentage of calcium oxide is preferably 3% to 5.8%. If the mass fraction of CaO is less than 3%, the glass becomes poor in meltability. If the CaO mass percent is higher than 5.8%, the glass has high crystallization tendency, meanwhile, the viscosity-temperature curve of the glass changes more severely, the molding is not facilitated, and in addition, the fluoride corrosion resistance of the glass is greatly reduced, and the glass is fogged after light sweeping. In a specific example, the mass percent of calcium oxide is 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 5.8% or a range of any two of these values. Further, the mass percentage of the calcium oxide is 3.5% -5%.
Magnesium oxide (MgO) reduces the viscosity of glass at high temperatures, and promotes melting and fining of glass, which is an essential component. In the glass of the present embodiment, if the mass percentage of MgO is less than 5%, the meltability of the glass is deteriorated. If the mass percentage of MgO is more than 8%, the glass is liable to devitrify, and the glass has too short a batch property to be molded. In a specific example, the mass percent of MgO is 5%, 5.5%, 6%, 6.5%, 7%, 7.5%, 8%, or a range of any two of these values. Further, the mass percentage of MgO is 5.5-7%.
Further, in one embodiment, the glass comprises, in mass percent: siO (SiO) 2 70％～72％、Al 2 O 3 1.1％～1.5％、Na 2 O 14％～16％、K 2 0.2 to 0.8 percent of O, 3.5 to 5 percent of CaO and 5.5 to 7 percent of MgO.
Fluoride etch resistance of glass is related to its composition, and for the glass of the present invention, the fluoride etch resistance of the glass is characterized by an etch resistance coefficient Res. The inventor finds in experiments that the erosion resistance coefficient Res of the glass is more than or equal to 0.353, and if the erosion resistance coefficient Res is less than 0.353, the erosion resistance of the glass is insufficient, and the glass is hazy after light sweeping. Further, the erosion resistance coefficient Res is 0.353 to 0.403. Experiments prove that if the erosion resistance coefficient Res is higher than 0.403, the glass does not generate fog after being scanned, but the scanning efficiency is reduced, and the glass cannot be scanned within a specified time.
In addition, the inventors have found in experiments that the haze of glass after the sweep is related to the erosion resistance coefficient Res of the glass under the same sweep conditions. Further, when the erosion resistance coefficient Res is 0.353 to 0.403, the haze h=4.5 to res×10. If Res is greater than 0.403, the formula is no longer applicable because Res is too large. Specifically, the haze H of the glass after the light sweeping is less than or equal to 1 percent. Further, the haze H of the glass after the light sweeping is 0.3-1%.
Further, in some embodiments, the glass has a visible light transmittance of greater than or equal to 91%.
The glass has at least the following advantages:
(1) The glass is prepared by optimizing the composition of the glass, properly reducing the content of calcium oxide on the basis of common soda-lime glass, and introducing proper amount of aluminum oxide, so that the erosion resistance of the glass is improved, polishing powder containing fluorine compounds can be used for polishing, and the polished glass does not generate fog.
(2) The cost of the glass is higher than that of aluminum glass, and in the process of sweeping light, the glass can adopt the commercially available polishing powder containing fluoride, so that the production cost is reduced.
(3) The glass has high visible light transmittance.
The second aspect of the present invention provides a method for cleaning glass according to an embodiment, which is a method for cleaning glass according to the above embodiment.
Specifically, referring to fig. 1, the method for scanning glass includes steps S110 to S130:
step S110: a glass to be swept is provided.
Specifically, the glass to be polished is the glass of the above embodiment. In one specific example, the glass may be prepared by a float process. The specific float process is conventional in the art and will not be described in detail herein.
Step S120: CNC processing is carried out on the glass to be scanned so as to form an arc edge on the glass to be scanned.
Specifically, in the step of CNC processing the glass to be scanned, the width of the arc edge is 1 mm-1.5 mm. For example, the arc width is 1mm, 1.1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, or a range of any two of these values. The specific CNC machining process may be conventional in the art and will not be described in detail herein.
Step S130: and polishing the glass to be polished by using polishing powder containing fluoride.
Specifically, in the polishing powder containing the fluorine compound, the mass percentage of the fluorine compound is 5-10%. For example, in the polishing powder of the fluorine-containing compound, the mass percentage of the fluoride is 5%, 6%, 7%, 8%, 9%, 10% or a range composed of any two of these values. Further, the polishing powder of the fluorine-containing compound also contains cerium oxide and lanthanum oxide. In one embodiment, the fluoride-containing polishing powder comprises, in mass percent: ceO (CeO) 2 66％～72％、La 2 O 3 20-25% and 5-10% of fluoride.
In one embodiment, in the step of polishing the glass to be polished with a fluoride-containing polishing powder, the fluoride-containing polishing powder is formulated into a polishing liquid having a density of 1.03g/cm 3 ～1.08g/cm 3 . Specifically, a polishing solution is prepared by mixing a polishing powder containing fluoride with water. If the density of the polishing solution is too low, the polishing efficiency is low, the polishing solution needs to be polished for a long time, and if the density of the polishing solution is too high, the polishing solution is easy to agglomerate and the polishing is uneven. In a specific example, the polishing liquid has a density of 1.03g/cm 3 、1.04g/cm 3 、1.05g/cm 3 、1.06g/cm 3 、1.07g/cm 3 、1.08g/cm 3 Or a range consisting of any two of these values.
Specifically, the pressure in the light sweeping process is 0.1MPa to 0.2MPa. If the pressure is too small, the glass is easy to throw out, and if the pressure is too large, the glass sheet is easy to break. In a specific example, the pressure during the light sweeping process is 0.1MPa, 0.11MPa, 0.12MPa, 0.13MPa, 0.14MPa, 0.15MPa, 0.16MPa, 0.17MPa, 0.18MPa, 0.19MPa, 0.2MPa, or a range consisting of any two of these values.
The time for scanning light is 4-6 min. If the sweep time is too long, the glass is eroded too much, resulting in fogging. If the time is too short, the arc edge cannot be swept. In a specific example, the time to sweep light is 4min, 4.5min, 5min, 5.5min, 6min, or a range of any two of these values.
Further, the rotation speed of the lower disc is 8rpm and the rotation speed of the upper disc is 300rpm in the light sweeping process.
Further, the haze of the glass after the light sweeping is preferably 0.3% -1%, the haze is lower than 1% to ensure that the display effect is transparent, and the haze is higher than 0.3% to bring a better anti-glare effect to the glass product.
Further, the visible light transmittance of the glass after the light sweeping is more than or equal to 91 percent.
The glass light sweeping method has at least the following advantages:
(1) The glass light sweeping method is simple in process, and the glass does not generate fog after light sweeping and is good in quality.
(2) The glass polishing method adopts fluorine-containing polishing powder to polish, and has high polishing efficiency and low cost.
In a third aspect, the present invention provides an embodiment of a cover plate, where the cover plate is obtained after the treatment of the foregoing glass polishing method according to the embodiment.
Specifically, the cover plate is a 2.5D cover plate or a 3D cover plate.
Further, the haze of the cover plate is less than or equal to 1%. The cover plate has low haze and does not generate fog under a strong light.
Further, the visible light transmittance of the cover plate is more than or equal to 91 percent.
A fourth aspect of the present invention provides an electronic device according to an embodiment, which includes the cover plate of the above embodiment. For example, the electronic device may be a mobile phone, a tablet computer, etc., but is not limited thereto. It will be appreciated that the electronic device may also include other components.
In order to make the objects and advantages of the present invention more apparent, the following more particular description of the glass and the method of cleaning the same will be presented in conjunction with the specific embodiments, it being understood that the specific embodiments described herein are intended to illustrate and not to limit the invention.
Examples 1 to 11 and comparative examples 1 to 3
The compositions of the glasses of examples 1 to 11 and comparative examples 1 to 3 are shown in tables 1 and 2.
The light sweeping process of the glasses of examples 1 to 11 and comparative examples 1 to 3 is specifically as follows:
(1) Glass having a thickness of 0.55mm was produced in the float line according to the compositions of the glasses in tables 1 and 2, cut into 160mm×80mm pieces, washed with pure water and dried, and then tested for visible light transmittance (T,%) with an ultraviolet-visible spectrophotometer, and also tested for haze (H,%) with a haze meter, to obtain visible light transmittance and haze data as shown in tables 1 and 2.
(2) CNC processing is carried out on the glass raw sheet obtained in the step (1), the arc edge width is 1.2mm, after cleaning and drying, the visible light transmittance and the haze are tested again, and the results are shown in tables 1 and 2.
(3) And (3) carrying out light sweeping on the CNC surface of the CNC processed glass, wherein the light sweeping technological parameters are as follows: the rotation speed of the lower disc is 8rpm, the rotation speed of the upper disc is 300rpm, the pressure is 0.2MPa, and the light sweeping time is 5min. The polishing powder comprises 70% of CeO by mass percent 2 25% La 2 O 3 And 5% fluoride, and mixing the above polishing powder with pure water to prepare a polishing liquid so that the density of the polishing liquid is 1.05g/cm 3 . After the light sweeping is finished, cleaning and drying the glass by pure water, and then, re-polishing the glassThe visible light transmittance and haze test were performed again, and the results are shown in tables 1 and 2.
The cleaned glass (which was cleaned with ultrasonic waves and rubbed with alcohol before testing) was visually inspected in a clean room, as shown in fig. 2 and 3.
As shown in fig. 2, the glass arc was aligned at 45 ° using a high-turn lamp, spaced about 10cm apart, and moved along the arc, indicating that the arc had been swept if the arc remained strongly (glare) reflective throughout the process; if the reflected light of the part is softer, the part is not swept.
As shown in fig. 3, a strong light lamp is used to be close to the short side of the glass, light is emitted along the long side direction, the relative positions of the strong light lamp and the glass are kept, and the included angle between the sight line and the glass plane is kept to be about 45 degrees, so that observation is performed. If no foreign matter is observed on the glass, the glass is not fogged; if a certain amount of scattered spot objects are observed, the scattered spot objects cannot be removed through the ear ball cleaning and the alcohol wiping, the scattered spot objects are slightly fogged; if a spot of a certain area is observed (blushing), it is a severe haze.
Comparative examples 4 to 9
The glass compositions of comparative examples 4 to 9 are shown in Table 3 below.
The glass of comparative examples 4 to 9 was subjected to the same polishing step as that of the glass of example 1, except that the glass composition was different.
Experimental data for each stage of the glasses of comparative examples 4 to 9 are shown in table 3 below.
Examples 12 to 15
The compositions of the glasses of examples 12 to 15 were all the same, and they were as follows: the glass comprises the following components in percentage by mass: siO (SiO) 2 70.5％、Al 2 O 3 1.5％、Na 2 O 15.5％、K 2 0.5% of O, 5% of CaO and 7% of MgO. The erosion resistance coefficient Res was 0.3710.
The steps of polishing the glasses of examples 12 to 15 are specifically as follows:
(1) According to the composition of the glass, glass with the thickness of 0.55mm is produced in a floating line, cut into 160mm×80mm small pieces, washed with pure water and dried, and then subjected to visible light transmittance and haze test, and the result is as follows: the raw glass sheet had a visible light transmittance of 91.50% and a haze of 0.039%.
(2) CNC processing is carried out on the glass raw sheet obtained in the step (1), the width of the arc edge is 1.2mm, after cleaning and drying, the visible light transmittance and the haze are tested again, and the result is as follows: the visible light transmittance of the CNC rear glass is 91.47%, and the haze is 0.041%.
(3) And (3) carrying out light sweeping on the CNC surface of the CNC processed glass, wherein the light sweeping technological parameters are as follows: the spin speed of the lower disc was 8rpm, the spin speed of the upper disc was 300rpm, and other process parameters are shown in Table 4. After the completion of the sweep, the glass was washed with pure water and dried, and the visible light transmittance and haze were again measured for the glass after the sweep, and the results are shown in table 4.
Table 1 composition of glass of examples 1 to 7 and experimental data
Table 2 composition of glasses of examples 8 to 11 and comparative examples 1 to 3 and experimental data
TABLE 3 compositions of glasses of comparative examples 4 to 9 and experimental data
Table 4 process parameters and experimental data during the sweep of the glasses of examples 12 to 15
The glasses of examples 1 to 11 in tables 1 to 2 above have a visible light transmittance in the range of 91.4% to 91.7% at any stage, and have a high visible light transmittance, indicating that both CNC and sweep have no significant effect on transmittance. The haze of the CNC rear glass has no obvious change relative to the unprocessed original sheet, and the change amplitude of the haze after the light sweeping is slightly larger, so that the light sweeping process is a decisive process for influencing the fogging. The haze after the glass of examples 1 to 11 was polished was not more than 1%, and no fogging was observed under a strong light. The Res in the glass of example 11 was above 0.402, and did not fog after the sweep, but the arc was not swept.
Examples 12-15 are the optical properties of the glasses of the present invention under different sweep conditions. Example 12 shows that under milder conditions (the minimum values are selected for sweeping pressure, time and fluoride content in the polishing powder), the arc edge can be swept, but the haze is lower, and the anti-dazzle function is not provided. In example 15, the polishing was performed under severe conditions, and although no fogging occurred, the haze reached 0.986, which was close to the limit value. Examples 13 and 14 show that similar effects can be achieved when the sweep conditions are tilted in different directions. From the viewpoint of production efficiency, the high-fluorine polishing powder can shorten the light sweeping time, and has more advantages. As can be seen from Table 4, increasing the sweep pressure, increasing the sweep time, and increasing the fluoride content of the polishing powder significantly increased the haze of the glass, while decreasing the visible light transmittance.
In contrast, in the compositions of the glasses of comparative examples 1 and 2, the content of alumina was low and the content of calcium oxide was too high, and the erosion resistance coefficient Res was 0.35 or less, and although the haze value of the raw sheet was not much different from that of the example, the haze value of the glass after the light sweeping was large, and the fogging phenomenon occurred. In addition, since the erosion resistance coefficient Res of comparative example 2 is smaller, the haze level thereof is more serious.
The glass of comparative example 3 has the mass percent of each component within the scope of the present invention, but has an erosion resistance coefficient Res of less than 0.35, resulting in slight fogging of the glass after the sweep.
SiO in glass of comparative example 4 2 The content of Al is less than 67%, and the glass of comparative example 5 does not contain Al 2 O 3 The glass of comparative example 7, having CaO content higher than 5.8% and the glass of comparative example 9 having MgO content lower than 5%, showed various degrees of fogging, indicating SiO 2 、Al 2 O 3 MgO increases the resistance of the glass to fluoride, whereas CaO increases fluoride attack and affects it to a greater extent.
The glass of comparative example 6 showed no fogging and Res was lower than 0.402, but was due to Na 2 The O content is lower than 14%, resulting in the glass having too strong chemical stability and no arc edge being swept, which indicates that Res criteria can only be effective within the composition of the present invention.
K in the glass of comparative example 8 2 O content is higher than 3%, resulting in its Res being slightly lower than 0.353, and the glass is slightly hazy.
From the above examples and comparative examples, it can be seen that the erosion resistance of the glass can be improved by optimizing and adjusting the composition of the glass, and no fogging can be generated after the polishing treatment with the polishing powder containing fluoride.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples merely represent a few embodiments of the present invention, which facilitate a specific and detailed understanding of the technical solutions of the present invention, but are not to be construed as limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention. It should be understood that, based on the technical solutions provided by the present invention, those skilled in the art can obtain technical solutions through logical analysis, reasoning or limited experiments, which are all within the protection scope of the appended claims. The scope of the patent of the invention should therefore be determined with reference to the appended claims, which are to be construed as in accordance with the doctrines of claim interpretation.
Claims (12)
1. A glass, characterized by comprising, in mass percent: siO (SiO) 2 67％～72％、Al 2 O 3 1％～2％、Na 2 O 14％～18％、K 2 0 to 1 percent of O, 3 to 5.8 percent of CaO and 5 to 8 percent of MgO;
the erosion resistance coefficient Res of the glass is 0.353-0.403,wherein each oxide represents the mass percentage thereof.
2. The glass of claim 1, wherein the glass has a visible light transmittance of greater than or equal to 91%.
3. Glass according to claim 1 or 2, characterized in that it comprises, in mass percent: siO (SiO) 2 70％～72％、Al 2 O 3 1.1％～1.5％、Na 2 O 14％～16％、K 2 0.2 to 0.8 percent of O, 3.5 to 5 percent of CaO and 5.5 to 7 percent of MgO.
4. The glass light sweeping method is characterized by comprising the following steps of:
providing glass to be scanned, wherein the glass to be scanned is the glass of any one of claims 1 to 3; and
And polishing the glass to be polished by using polishing powder containing fluoride.
5. The method for polishing glass according to claim 4, wherein the pressure during polishing is 0.1MPa to 0.2MPa; and/or the number of the groups of groups,
the time for scanning light is 4-6 min.
6. The method for polishing glass according to claim 4, wherein the fluoride-containing polishing powder comprises, in mass percent: ceO (CeO) 2 66％～72％、La 2 O 3 20-25% and 5-10% of fluoride.
7. The method for polishing glass according to claim 6, wherein in the step of polishing the glass to be polished with a fluoride-containing polishing powder, the fluoride-containing polishing powder is formulated into a polishing liquid having a density of 1.03g/cm 3 ～1.08g/cm 3 。
8. The method according to any one of claims 4 to 7, characterized by further comprising, before the step of polishing the glass to be polished with a polishing powder containing a fluoride:
CNC processing is carried out on the glass to be scanned so as to form an arc edge on the glass to be scanned.
9. The method of claim 8, wherein the width of the arc edge is 1mm to 1.5mm.
10. A cover sheet, characterized in that it is obtained by being treated by the method for wiping glass according to any one of claims 4 to 9.
11. The cover plate of claim 10, wherein the cover plate is a 2.5D cover plate or a 3D cover plate; and/or the number of the groups of groups,
the haze of the cover plate is less than or equal to 1 percent.
12. An electronic device comprising a cover plate according to claim 10 or 11.
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| CN1089926A (en) * | 1992-10-22 | 1994-07-27 | 圣戈班玻璃制造国际公司 | Vitrage trempe chimique |
| CN102925106A (en) * | 2012-11-14 | 2013-02-13 | 内蒙古科技大学 | Rare earth polishing powder and preparation method thereof |
| CN105330142A (en) * | 2010-10-27 | 2016-02-17 | 旭硝子株式会社 | Glass plate and process for production thereof |
| CN105505226A (en) * | 2015-12-02 | 2016-04-20 | 包头市新源抛光粉有限公司 | Rare earth polishing powder and preparation method thereof |
| CN108864948A (en) * | 2018-08-17 | 2018-11-23 | 蓝思科技（长沙）有限公司 | Glass polishing powder, polishing fluid and preparation method thereof, glass and electronic product |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3463999B1 (en) * | 2002-05-16 | 2003-11-05 | 三井金属鉱業株式会社 | Manufacturing method of cerium-based abrasive |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1089926A (en) * | 1992-10-22 | 1994-07-27 | 圣戈班玻璃制造国际公司 | Vitrage trempe chimique |
| CN105330142A (en) * | 2010-10-27 | 2016-02-17 | 旭硝子株式会社 | Glass plate and process for production thereof |
| CN102925106A (en) * | 2012-11-14 | 2013-02-13 | 内蒙古科技大学 | Rare earth polishing powder and preparation method thereof |
| CN105505226A (en) * | 2015-12-02 | 2016-04-20 | 包头市新源抛光粉有限公司 | Rare earth polishing powder and preparation method thereof |
| CN108864948A (en) * | 2018-08-17 | 2018-11-23 | 蓝思科技（长沙）有限公司 | Glass polishing powder, polishing fluid and preparation method thereof, glass and electronic product |
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